TWI841560B - 半導體裝置 - Google Patents

半導體裝置 Download PDF

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Publication number
TWI841560B
TWI841560B TW108113891A TW108113891A TWI841560B TW I841560 B TWI841560 B TW I841560B TW 108113891 A TW108113891 A TW 108113891A TW 108113891 A TW108113891 A TW 108113891A TW I841560 B TWI841560 B TW I841560B
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TW
Taiwan
Prior art keywords
layer
region
semiconductor layer
insulating layer
transistor
Prior art date
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TW108113891A
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English (en)
Chinese (zh)
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TW202005099A (zh
Inventor
山崎舜平
岡崎健一
神長正美
島行德
Original Assignee
日商半導體能源研究所股份有限公司
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Publication of TW202005099A publication Critical patent/TW202005099A/zh
Application granted granted Critical
Publication of TWI841560B publication Critical patent/TWI841560B/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/421—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having a particular composition, shape or crystalline structure of the active layer
    • H10D86/423—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having a particular composition, shape or crystalline structure of the active layer comprising semiconductor materials not belonging to the Group IV, e.g. InGaZnO
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
    • H05B33/14—Light sources with substantially two-dimensional [2D] radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material, or by the simultaneous addition of the electroluminescent material in or onto the light source
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/6729—Thin-film transistors [TFT] characterised by the electrodes
    • H10D30/673—Thin-film transistors [TFT] characterised by the electrodes characterised by the shapes, relative sizes or dispositions of the gate electrodes
    • H10D30/6733—Multi-gate TFTs
    • H10D30/6734—Multi-gate TFTs having gate electrodes arranged on both top and bottom sides of the channel, e.g. dual-gate TFTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/01—Manufacture or treatment
    • H10D86/021—Manufacture or treatment of multiple TFTs
    • H10D86/0221—Manufacture or treatment of multiple TFTs comprising manufacture, treatment or patterning of TFT semiconductor bodies
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/431—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having different compositions, shapes, layouts or thicknesses of gate insulators in different TFTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/471—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having different architectures, e.g. having both top-gate and bottom-gate TFTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P30/00—Ion implantation into wafers, substrates or parts of devices
    • H10P30/20—Ion implantation into wafers, substrates or parts of devices into semiconductor materials, e.g. for doping
    • H10P30/22—Ion implantation into wafers, substrates or parts of devices into semiconductor materials, e.g. for doping using masks

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thin Film Transistor (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
TW108113891A 2018-04-20 2019-04-19 半導體裝置 TWI841560B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018-081381 2018-04-20
JP2018081381 2018-04-20

Publications (2)

Publication Number Publication Date
TW202005099A TW202005099A (zh) 2020-01-16
TWI841560B true TWI841560B (zh) 2024-05-11

Family

ID=68240045

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108113891A TWI841560B (zh) 2018-04-20 2019-04-19 半導體裝置

Country Status (4)

Country Link
US (1) US11552111B2 (https=)
JP (1) JP7275112B2 (https=)
TW (1) TWI841560B (https=)
WO (1) WO2019202430A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022090361A (ja) * 2020-12-07 2022-06-17 株式会社ジャパンディスプレイ 半導体装置及びその製造方法
US12363952B2 (en) * 2021-12-09 2025-07-15 AUP Corporation Active device substrate and manufacturing method of active device substrate

Citations (6)

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US20110084267A1 (en) * 2009-10-09 2011-04-14 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing the same
TW201250863A (en) * 2009-12-28 2012-12-16 Semiconductor Energy Lab Method for manufacturing semiconductor device
US20150014679A1 (en) * 2013-07-12 2015-01-15 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
US20150187951A1 (en) * 2013-12-27 2015-07-02 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
US20160233342A1 (en) * 2011-01-20 2016-08-11 Semiconductor Energy Laboratory Co., Ltd. Oxide semiconductor element and semiconductor device
US20170263783A1 (en) * 2016-03-11 2017-09-14 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, manufacturing method thereof, and display device including the semiconductor device

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US6933527B2 (en) 2001-12-28 2005-08-23 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and semiconductor device production system
JP4627135B2 (ja) * 2001-12-28 2011-02-09 株式会社半導体エネルギー研究所 半導体装置の生産方法
US20080254613A1 (en) 2007-04-10 2008-10-16 Applied Materials, Inc. Methods for forming metal interconnect structure for thin film transistor applications
JP5708910B2 (ja) 2010-03-30 2015-04-30 ソニー株式会社 薄膜トランジスタおよびその製造方法、並びに表示装置
CN107591316B (zh) 2012-05-31 2021-06-08 株式会社半导体能源研究所 半导体装置
JP6400336B2 (ja) 2013-06-05 2018-10-03 株式会社半導体エネルギー研究所 半導体装置
US20150008428A1 (en) 2013-07-08 2015-01-08 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing semiconductor device
JP6072297B2 (ja) * 2013-11-25 2017-02-01 シャープ株式会社 半導体装置およびその書き込み方法
TWI666770B (zh) * 2013-12-19 2019-07-21 日商半導體能源研究所股份有限公司 半導體裝置
US9366953B2 (en) 2014-01-17 2016-06-14 Taiwan Semiconductor Manufacturing Company, Ltd. Lithography mask
TWI702187B (zh) 2014-02-21 2020-08-21 日商半導體能源研究所股份有限公司 半導體膜、電晶體、半導體裝置、顯示裝置以及電子裝置
US10096489B2 (en) 2014-03-06 2018-10-09 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
CN111048509B (zh) 2014-03-28 2023-12-01 株式会社半导体能源研究所 半导体装置
KR102380829B1 (ko) 2014-04-23 2022-03-31 가부시키가이샤 한도오따이 에네루기 켄큐쇼 촬상 장치
KR102865410B1 (ko) 2015-02-06 2025-09-26 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 그 제작 방법
JPWO2017085591A1 (ja) 2015-11-20 2018-09-06 株式会社半導体エネルギー研究所 半導体装置、該半導体装置を有する表示装置、及び該半導体装置を有する電子機器
JP2017112374A (ja) 2015-12-16 2017-06-22 株式会社半導体エネルギー研究所 トランジスタ、半導体装置、および電子機器
US9953695B2 (en) * 2015-12-29 2018-04-24 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, electronic device, and semiconductor wafer
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KR102403389B1 (ko) 2016-09-12 2022-06-03 가부시키가이샤 한도오따이 에네루기 켄큐쇼 표시 장치 및 전자 기기

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US20110084267A1 (en) * 2009-10-09 2011-04-14 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing the same
TW201250863A (en) * 2009-12-28 2012-12-16 Semiconductor Energy Lab Method for manufacturing semiconductor device
US20160233342A1 (en) * 2011-01-20 2016-08-11 Semiconductor Energy Laboratory Co., Ltd. Oxide semiconductor element and semiconductor device
US20150014679A1 (en) * 2013-07-12 2015-01-15 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
US20150187951A1 (en) * 2013-12-27 2015-07-02 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
US20170263783A1 (en) * 2016-03-11 2017-09-14 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, manufacturing method thereof, and display device including the semiconductor device

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期刊 S. J. Kang, et al. Surface-chemistry-sensitive spectral features of In–Ga–Zn–O thin film: Cleaned,air-passivated, and sputter-phase-separated surfaces Chemical Physics Letters,第510冊, 2011年出版 *
期刊 S. J. Kang, et al. Surface-chemistry-sensitive spectral features of In–Ga–Zn–O thin film: Cleaned,air-passivated, and sputter-phase-separated surfaces Chemical Physics Letters,第510冊, 2011年出版。 第510冊 Elsevier 2011 234-236
第510冊 Elsevier 2011 234-236 *

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Publication number Publication date
US11552111B2 (en) 2023-01-10
JPWO2019202430A1 (ja) 2021-05-13
US20210020665A1 (en) 2021-01-21
TW202005099A (zh) 2020-01-16
WO2019202430A1 (ja) 2019-10-24
JP7275112B2 (ja) 2023-05-17

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