TWI837434B - 照明光學系統、曝光裝置、及物品製造方法 - Google Patents

照明光學系統、曝光裝置、及物品製造方法 Download PDF

Info

Publication number
TWI837434B
TWI837434B TW109138409A TW109138409A TWI837434B TW I837434 B TWI837434 B TW I837434B TW 109138409 A TW109138409 A TW 109138409A TW 109138409 A TW109138409 A TW 109138409A TW I837434 B TWI837434 B TW I837434B
Authority
TW
Taiwan
Prior art keywords
optical system
optical integrator
optical
frame member
integrator
Prior art date
Application number
TW109138409A
Other languages
English (en)
Chinese (zh)
Other versions
TW202122929A (zh
Inventor
村上瑞真
Original Assignee
日商佳能股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商佳能股份有限公司 filed Critical 日商佳能股份有限公司
Publication of TW202122929A publication Critical patent/TW202122929A/zh
Application granted granted Critical
Publication of TWI837434B publication Critical patent/TWI837434B/zh

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
TW109138409A 2019-12-04 2020-11-04 照明光學系統、曝光裝置、及物品製造方法 TWI837434B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019-219854 2019-12-04
JP2019219854A JP7446096B2 (ja) 2019-12-04 2019-12-04 照明光学系、および物品製造方法

Publications (2)

Publication Number Publication Date
TW202122929A TW202122929A (zh) 2021-06-16
TWI837434B true TWI837434B (zh) 2024-04-01

Family

ID=76220027

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109138409A TWI837434B (zh) 2019-12-04 2020-11-04 照明光學系統、曝光裝置、及物品製造方法

Country Status (3)

Country Link
JP (1) JP7446096B2 (ja)
KR (1) KR20210070203A (ja)
TW (1) TWI837434B (ja)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002050564A (ja) * 2000-08-03 2002-02-15 Canon Inc 照明装置、投影露光装置並びにそれを用いたデバイス製造方法
JP2016100461A (ja) * 2014-11-21 2016-05-30 キヤノン株式会社 照明光学装置、およびデバイス製造方法
TW201820045A (zh) * 2016-08-30 2018-06-01 日商佳能股份有限公司 照明光學系統、光刻裝置及物品製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4150472B2 (ja) * 1998-07-03 2008-09-17 松下電器産業株式会社 対物レンズ駆動装置
JP2001155993A (ja) * 1999-09-13 2001-06-08 Nikon Corp 照明光学装置及び該装置を備える投影露光装置
JP2003059799A (ja) * 2001-08-10 2003-02-28 Nikon Corp 照明光学系、露光装置、及びマイクロデバイスの製造方法
JP2004253758A (ja) * 2002-12-27 2004-09-09 Nikon Corp 照明光源ユニット、露光装置及び露光方法
JP2007041455A (ja) * 2005-08-05 2007-02-15 Matsushita Electric Ind Co Ltd 光学装置の像振れ補正装置
JP6451187B2 (ja) * 2014-09-30 2019-01-16 セイコーエプソン株式会社 光学デバイスおよび画像表示装置
JP2016126103A (ja) * 2014-12-26 2016-07-11 セイコーエプソン株式会社 光学デバイス、画像表示装置および光学デバイスの製造方法
JP2018045060A (ja) * 2016-09-13 2018-03-22 キヤノン株式会社 照明装置、露光装置及び物品の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002050564A (ja) * 2000-08-03 2002-02-15 Canon Inc 照明装置、投影露光装置並びにそれを用いたデバイス製造方法
JP2016100461A (ja) * 2014-11-21 2016-05-30 キヤノン株式会社 照明光学装置、およびデバイス製造方法
TW201820045A (zh) * 2016-08-30 2018-06-01 日商佳能股份有限公司 照明光學系統、光刻裝置及物品製造方法

Also Published As

Publication number Publication date
KR20210070203A (ko) 2021-06-14
JP7446096B2 (ja) 2024-03-08
JP2021089371A (ja) 2021-06-10
TW202122929A (zh) 2021-06-16

Similar Documents

Publication Publication Date Title
US7253975B2 (en) Retainer, exposure apparatus, and device fabrication method
JP2001244177A (ja) ステージ装置とホルダ、および走査型露光装置並びに露光装置
US20110085152A1 (en) Vibration control apparatus, vibration control method, exposure apparatus, and device manufacturing method
JP2000012453A (ja) 露光装置及びその使用方法、露光方法、並びにマスクの製造方法
JP5605768B2 (ja) 露光装置及びデバイス製造方法
US20090021847A1 (en) Optical element positioning apparatus, projection optical system and exposure apparatus
TWI784440B (zh) 曝光裝置、平面顯示器之製造方法、元件製造方法、及曝光方法
JP2007113939A (ja) 計測装置及び計測方法、ステージ装置、並びに露光装置及び露光方法
TW200305928A (en) Exposure apparatus and method
JP2021006931A (ja) 物体保持装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、物体の保持方法、及び露光方法
JP2012531027A (ja) 移動体装置、露光装置及びデバイス製造方法
US7236230B2 (en) Exposure apparatus and device fabrication method
JP2004062091A (ja) 保持装置、露光装置及びデバイス製造方法
TWI837434B (zh) 照明光學系統、曝光裝置、及物品製造方法
US20060001889A1 (en) Positioning apparatus and photolithography apparatus including the same
JP6826692B2 (ja) 振動絶縁システムおよびリソグラフィ装置
JP2013083655A (ja) 露光装置、及びデバイス製造方法
JP2013045815A (ja) 露光方法及びデバイス製造方法
JP2012033921A (ja) 露光装置及びデバイス製造方法
JP5414288B2 (ja) 露光方法及び装置、並びにデバイス製造方法
JP2009033062A (ja) 露光方法及び露光装置、並びにデバイス製造方法
JP2004241670A (ja) 組立構造体、ステージ装置および露光装置
TWI841580B (zh) 照明光學系統、曝光裝置及物品製造方法
TWI770414B (zh) 基板保持裝置、曝光裝置及物品之製造方法
JP2008226887A (ja) 保持装置、露光装置、及びデバイス製造方法