TWI826950B - Machining apparatus and method for manufacturing workpiece - Google Patents
Machining apparatus and method for manufacturing workpiece Download PDFInfo
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- TWI826950B TWI826950B TW111109098A TW111109098A TWI826950B TW I826950 B TWI826950 B TW I826950B TW 111109098 A TW111109098 A TW 111109098A TW 111109098 A TW111109098 A TW 111109098A TW I826950 B TWI826950 B TW I826950B
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- 238000003754 machining Methods 0.000 title abstract description 11
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/06—Grinders for cutting-off
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q7/00—Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting
- B23Q7/04—Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting by means of grippers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B45/00—Means for securing grinding wheels on rotary arbors
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B45/00—Means for securing grinding wheels on rotary arbors
- B24B45/003—Accessories therefor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
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- Engineering & Computer Science (AREA)
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- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
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Abstract
Description
本發明是有關於一種加工裝置及加工品的製造方法。The present invention relates to a processing device and a method for manufacturing processed products.
先前,如專利文獻1所示般,可想到下述切斷系統,即,將由切斷裝置切斷的半導體條帶自裝載裝置供給至引入軌道(inlet rail),自該引入軌道移送至切斷裝置,由切斷裝置切斷為單獨的半導體封裝體。Previously, as shown in Patent Document 1, a cutting system has been conceivable in which a semiconductor strip cut by a cutting device is supplied from a loading device to an inlet rail and transferred from the inlet rail to the cutting device. The device is cut into individual semiconductor packages by a cutting device.
然而,於所述切斷系統中,裝載裝置、引入軌道及切斷裝置沿著X方向配置成一行,因此切斷系統的佔據面積(footprint)變大。 [現有技術文獻] [專利文獻] However, in the cutting system, the loading device, the introduction rail and the cutting device are arranged in a row along the X direction, so the footprint of the cutting system becomes larger. [Prior art documents] [Patent Document]
[專利文獻1]日本專利特表2007-536727號公報[Patent Document 1] Japanese Patent Publication No. 2007-536727
[發明所欲解決之課題][Problem to be solved by the invention]
因此,本發明是為解決所述問題點而成,其主要課題在於減少加工裝置的佔據面積。 [解決課題之手段] Therefore, the present invention is made to solve the above-mentioned problems, and its main subject is to reduce the occupied area of the processing device. [Means to solve the problem]
即,本發明的加工裝置的特徵在於包括:加工對象物收容部,收容加工對象物;加工工作台,藉由加工機構加工所述加工對象物;接收台,自所述加工對象物收容部接收所述加工對象物;台移動機構,具有用以使所述接收台移動至搬送位置的移動軌道;第一保持機構,為了將所述加工對象物搬送至所述加工工作台而保持;以及搬送用移動機構,具有用以使所述第一保持機構於位於所述搬送位置的所述接收台與所述加工工作台之間移動的傳遞軸,所述傳遞軸與所述移動軌道於平面視時相互正交。 [發明的效果] That is, the processing apparatus of the present invention is characterized by including: a processing object storage part that stores the processing object; a processing table that processes the processing object by a processing mechanism; and a receiving table that receives the processing object from the processing object storage part. The object to be processed; a table moving mechanism having a moving rail for moving the receiving table to a transfer position; a first holding mechanism to hold the object to be processed in order to transport the object to the processing table; and transportation A moving mechanism is provided with a transmission shaft for moving the first holding mechanism between the receiving table and the processing table at the transport position, and the transmission shaft and the moving rail are in a plane view. are orthogonal to each other. [Effects of the invention]
根據如此構成的本發明,可減少加工裝置的佔據面積。According to the present invention configured in this way, the occupied area of the processing device can be reduced.
繼而,對本發明舉例加以更詳細說明。但是,本發明不受以下說明的限定。Next, examples of the present invention will be described in more detail. However, the present invention is not limited to the following description.
如上所述,本發明的加工裝置的特徵在於包括:加工對象物收容部,收容加工對象物;加工工作台,藉由加工機構加工所述加工對象物;接收台,自所述加工對象物收容部接收所述加工對象物;台移動機構,具有用以使所述接收台移動至搬送位置的移動軌道;第一保持機構,為了將所述加工對象物搬送至所述加工工作台而保持;以及搬送用移動機構,具有用以使所述第一保持機構於位於所述搬送位置的所述接收台與所述加工工作台之間移動的傳遞軸,所述傳遞軸與所述移動軌道於平面視時相互正交。 若為所述加工裝置,則使接收台移動的移動軌道與使第一保持機構移動的傳遞軸於平面視時相互正交,因此並非為如先前般將加工對象物收容部與加工工作台橫向配置成一行的結構,因此可減少加工裝置的佔據面積。 As described above, the processing device of the present invention is characterized by including: a processing object storage part for storing the processing object; a processing table for processing the processing object by a processing mechanism; and a receiving table for storing the processing object. a section to receive the object to be processed; a table moving mechanism having a moving rail for moving the receiving table to a transfer position; and a first holding mechanism to hold the object to be processed in order to transport the object to the processing table; and a moving mechanism for transportation, having a transmission shaft for moving the first holding mechanism between the receiving table and the processing table located at the transportation position, and the transmission shaft and the moving rail are at Orthogonal to each other when viewed in plan view. In the above-mentioned processing device, the moving rail that moves the receiving table and the transmission axis that moves the first holding mechanism are orthogonal to each other in plan view. Therefore, it is not necessary to arrange the processing object storage portion and the processing table transversely as before. Arranged in a row, the occupied area of the processing equipment can be reduced.
具體而言,理想的是,所述加工對象物收容部與所述第一保持機構於平面視時相對於所述傳遞軸而設置於相互相反側。 若為所述結構,則於傳遞軸的其中一側設置有第一保持機構,於傳遞軸的另一側設置有加工對象物收容部,因此可不受第一保持機構的移動範圍限制地設置加工對象物收容部,另外,加工對象物收容部的配置自由度增加,可減少加工裝置的佔據面積。 Specifically, it is preferable that the object storage portion and the first holding mechanism are provided on opposite sides to each other with respect to the transmission axis in plan view. With the above structure, the first holding mechanism is provided on one side of the transmission shaft, and the processing object receiving portion is provided on the other side of the transmission shaft. Therefore, processing can be performed without being restricted by the movement range of the first holding mechanism. The object storage portion also increases the freedom of arrangement of the processing object storage portion, thereby reducing the area occupied by the processing device.
理想的是,本發明的加工裝置更包括更換所述加工機構的加工工具的加工工具更換機構,且形成可自動地更換所述加工機構的加工工具的結構。 於所述結構中,為了簡化裝置結構,理想的是所述加工工具更換機構能夠藉由所述移動軌道移動。 Preferably, the processing apparatus of the present invention further includes a processing tool replacement mechanism for replacing the processing tool of the processing mechanism, and is structured to automatically replace the processing tool of the processing mechanism. In the above-mentioned structure, in order to simplify the device structure, it is desirable that the processing tool changing mechanism can be moved by the moving rail.
理想的是,所述接收台具有進行所述加工對象物的定位的定位機構。 藉由如此具有定位機構,可於位於搬送位置的接收台上對加工對象物進行定位,能夠可靠地搬送加工對象物。 Desirably, the receiving station has a positioning mechanism for positioning the object to be processed. By having the positioning mechanism in this way, the object to be processed can be positioned on the receiving table located at the transfer position, and the object to be processed can be reliably transported.
理想的是,所述接收台具有:搬入用台,用以搬入所述加工對象物;以及搬出用台,用以搬出經半切的所述加工對象物,本發明的加工裝置將經半切的所述加工對象物自所述加工工作台搬送至所述搬出用台,並將經半切的所述加工對象物經由所述搬出用台收容於所述加工對象物收容部。 若為所述結構,則可將加工對象物半切,並將所述經半切的加工對象物收容於所述加工對象物收容部。 Preferably, the receiving station has a carry-in table for carrying in the object to be processed, and a carry-out table for carrying out the half-cut object to be processed, and the processing device of the present invention carries out all the half-cut objects. The object to be processed is transported from the processing table to the unloading table, and the half-cut object to be processed is stored in the object accommodating portion via the unloading table. According to the above structure, the object to be processed can be cut into half, and the half-cut object to be processed can be stored in the object accommodating portion.
另外,理想的是,本發明的加工裝置包括:移載工作台,移動加工後的所述加工對象物;以及第二保持機構,為了將加工後的所述加工對象物自所述加工工作台搬送至所述移載工作台而保持加工後的所述加工對象物,所述第二保持機構構成為能夠沿著所述傳遞軸移動。 若為所述結構,則第一保持機構及第二保持機構共用傳遞軸,因此可簡化裝置結構。 In addition, preferably, the processing device of the present invention includes: a transfer table for moving the processed object; and a second holding mechanism for removing the processed object from the processing table. The processed object is transported to the transfer table and held, and the second holding mechanism is configured to be movable along the transmission shaft. According to the above structure, the first holding mechanism and the second holding mechanism share the transmission shaft, so the device structure can be simplified.
於本發明的加工裝置中,為了可將加工對象物全切,理想的是所述移載工作台移動經全切的所述加工對象物,所述第二保持機構保持經全切的所述加工對象物。In the processing device of the present invention, in order to completely cut the object to be processed, it is desirable that the transfer table moves the fully-cut object to be processed, and the second holding mechanism holds the fully-cut object. Processing object.
理想的是,更包括加工用移動機構,所述加工用移動機構使所述加工機構於水平面上於沿著所述傳遞軸的第一方向及與所述第一方向正交的第二方向分別移動。 若為所述結構,則藉由加工用移動機構使加工機構於水平面上於沿著傳遞軸的第一方向及與所述第一方向正交的第二方向分別移動,因此可不使加工工作台於第一方向及第二方向移動而對加工對象物進行加工。因此,可不藉由滾珠螺桿機構使加工工作台移動,而無需用以保護滾珠螺桿機構的蛇腹構件及用以保護該蛇腹構件的蓋構件。其結果,可簡化加工裝置的裝置結構。另外,由於形成為加工工作台不於水平面上於第一方向及第二方向移動的結構,因此可削減加工工作台的移動空間及其周邊的無用空間,而可減少加工裝置的佔據面積。 Ideally, it further includes a processing moving mechanism that moves the processing mechanism on a horizontal plane in a first direction along the transmission axis and in a second direction orthogonal to the first direction. Move. According to the above structure, the processing moving mechanism moves the processing mechanism on the horizontal plane in the first direction along the transmission axis and in the second direction orthogonal to the first direction. Therefore, the processing table does not need to be moved. The object is processed by moving in the first direction and the second direction. Therefore, the processing table can be moved without using the ball screw mechanism, and the bellows member for protecting the ball screw mechanism and the cover member for protecting the bellows member are not required. As a result, the device structure of the processing device can be simplified. In addition, since the processing table is configured not to move in the first direction and the second direction on the horizontal plane, the moving space of the processing table and the useless space around it can be reduced, thereby reducing the occupied area of the processing device.
另外,使用所述加工裝置來製造加工品的、加工品的製造方法亦為本發明的一態樣。In addition, a method for manufacturing a processed product using the processing device is also an aspect of the present invention.
進而,作為使用所述加工裝置來製造半切品的加工品的製造方法,其特徵在於包括:搬入步驟,自所述搬入用台將預定要半切的所述加工對象物搬入至所述加工工作台;半切步驟,將藉由所述搬入步驟而被搬入的所述加工對象物半切;搬出步驟,將藉由所述半切步驟而被半切的所述加工對象物搬出至所述搬出用台;以及收容步驟,將藉由所述搬出步驟搬出至所述搬出用台的所述加工對象物收容於所述加工對象物收容部。Furthermore, a method for manufacturing a processed product using the processing device to produce a half-cut product is characterized by including a loading step of loading the object to be processed into half-cut products from the loading table to the processing table. ; a half-cutting step of half-cutting the object to be processed carried in the carrying-in step; a carrying-out step of carrying out the half-cut object to be processed by the half-cutting step to the carrying-out table; and In the accommodation step, the object to be processed carried out to the unloading table in the unloading step is stored in the object accommodating part.
<本發明的一實施形態> 以下,參照圖式對本發明的加工裝置的一實施形態加以說明。再者,關於以下所示的任一圖,均為了容易理解而適當省略或誇張地示意性地描畫。對相同的構成要素標註相同符號,適當省略說明。 <One embodiment of the present invention> Hereinafter, an embodiment of the processing device of the present invention will be described with reference to the drawings. In addition, any of the figures shown below are appropriately omitted or schematically drawn in an exaggerated manner for easy understanding. The same components are labeled with the same symbols, and descriptions are omitted where appropriate.
<加工裝置的總體結構>
本實施形態的加工裝置100為切斷裝置,藉由將作為加工對象物的密封完畢基板W切斷,從而單片化為多個作為加工品的製品P。
<Overall structure of processing equipment>
The
具體而言,如圖1所示,切斷裝置100包括:兩個切斷用工作台(加工工作台)2A、2B,保持密封完畢基板W;第一保持機構3,為了將密封完畢基板W搬送至切斷用工作台2A、切斷用工作台2B而保持密封完畢基板W;切斷機構(加工機構)4,將保持於切斷用工作台2A、切斷用工作台2B的密封完畢基板W切斷;移載工作台5,移動多個製品P;第二保持機構6,為了將多個製品P自切斷用工作台2A、切斷用工作台2B搬送至移載工作台5而保持多個製品P;搬送用移動機構7,具有用以使第一保持機構3及第二保持機構6移動的共用的傳遞軸71;以及切斷用移動機構(加工用移動機構)8,使切斷機構4相對於保持於切斷用工作台2A、切斷用工作台2B的密封完畢基板W移動。Specifically, as shown in FIG. 1 , the
此處,所謂密封完畢基板W,是針對連接有半導體晶片、電阻元件、電容元件等電子元件的基板,以至少將電子元件加以樹脂密封的方式進行樹脂成形而成。作為構成密封完畢基板W的基板,可使用引線框架(lead frame)、印刷配線板,除了該些以外,亦可使用半導體製基板(包含矽晶圓等半導體晶圓)、金屬製基板、陶瓷製基板、玻璃製基板、樹脂製基板等。另外,對於構成密封完畢基板W的基板,可實施有配線亦可未實施配線。Here, the sealed substrate W is a substrate to which electronic components such as semiconductor wafers, resistive elements, and capacitive elements are connected, and is formed by resin molding to seal at least the electronic components with resin. As the substrate constituting the sealed substrate W, a lead frame and a printed wiring board can be used. In addition to these, semiconductor substrates (including semiconductor wafers such as silicon wafers), metal substrates, and ceramic substrates can also be used. Substrates, glass substrates, resin substrates, etc. In addition, the substrate constituting the sealed substrate W may or may not have wiring implemented.
以下的說明中,將沿著切斷用工作台2A、切斷用工作台2B的上表面的平面(水平面)內相互正交的方向分別設為X方向及Y方向,將與X方向及Y方向正交的鉛垂方向設為Z方向。具體而言,將圖1的左右方向設為X方向,將上下方向設為Y方向。雖將後述,但X方向為支持體812的移動方向,另外,為與門型支持體812的架設一對腳部的樑部(橫樑部)的長邊方向(樑部延伸的方向)正交的方向(參照圖2)。In the following description, the directions orthogonal to each other in the plane (horizontal plane) along the upper surfaces of the cutting tables 2A and 2B are respectively referred to as the X direction and the Y direction. The vertical direction orthogonal to the direction is set as the Z direction. Specifically, let the left-right direction in FIG. 1 be the X direction, and let the up-down direction be the Y direction. Although it will be described later, the X direction is the moving direction of the
<切斷用工作台>
兩個切斷用工作台2A、2B於X方向、Y方向及Z方向經固定而設置。再者,切斷用工作台2A能夠藉由設置於切斷用工作台2A之下的旋轉機構9A於θ方向旋轉。另外,切斷用工作台2B能夠藉由設置於切斷用工作台2B之下的旋轉機構9B於θ方向旋轉。
<Workbench for cutting>
The two cutting tables 2A and 2B are fixedly installed in the X direction, the Y direction, and the Z direction. Furthermore, the cutting table 2A can be rotated in the θ direction by the
該些兩個切斷用工作台2A、2B於水平面上沿著X方向設置。具體而言,兩個切斷用工作台2A、2B以該些的上表面位於同一水平面上(於Z方向位於相同高度位置)的方式配置(參照圖4),並且以該些的上表面的中心(具體而言為基於旋轉機構9A、旋轉機構9B的旋轉中心)位於沿X方向延伸的同一直線上的方式配置(參照圖2及圖3)。These two cutting tables 2A and 2B are installed along the X direction on the horizontal plane. Specifically, the two cutting tables 2A and 2B are arranged so that their upper surfaces are located on the same horizontal plane (at the same height position in the Z direction) (see FIG. 4 ), and the upper surfaces of the two cutting tables 2A and 2B are arranged so that The center (specifically, the rotation center of the
另外,兩個切斷用工作台2A、2B吸附保持密封完畢基板W,如圖1所示,與兩個切斷用工作台2A、2B對應地配置有用以吸附保持的兩個真空泵10A、10B。各真空泵10A、10B例如為水封式真空泵。In addition, the two cutting tables 2A and 2B adsorb and hold the sealed substrate W. As shown in FIG. 1 , two
此處,切斷用工作台2A、切斷用工作台2B於XYZ方向經固定,故而可縮短自真空泵10A、真空泵10B連接於切斷用工作台2A、切斷用工作台2B的配管(未圖示),可減小配管的壓力損失,防止吸附力的降低。其結果為,即便為例如1 mm見方以下的極小封裝體,亦能可靠地吸附於切斷用工作台2A、切斷用工作台2B。另外,可防止配管的壓力損失所致的、吸附力的降低,故而可減小真空泵10A、真空泵10B的容量,亦會帶來小型化或成本降低。Here, since the cutting table 2A and the cutting table 2B are fixed in the XYZ direction, the pipes connected from the
<第一保持機構>
如圖1所示,第一保持機構3為了將密封完畢基板W自基板供給機構11搬送至切斷用工作台2A、切斷用工作台2B而保持密封完畢基板W。如圖5及圖6所示,所述第一保持機構3具有:吸附頭31,設置有用以吸附保持密封完畢基板W的多個吸附部311;以及真空泵(未圖示),連接於該吸附頭31的吸附部311。而且,藉由吸附頭31由後述的搬送用移動機構7等移動至所需位置,從而將密封完畢基板W自基板供給機構11搬送至切斷用工作台2A、切斷用工作台2B。
<First holding mechanism>
As shown in FIG. 1 , the
如圖1所示,基板供給機構11具有:基板收容部111,自外部收容多個密封完畢基板W;以及基板供給部112,使收容於該基板收容部111的密封完畢基板W移動至由第一保持機構3吸附保持的保持位置RP。所述保持位置RP是以於X方向與兩個切斷用工作台2A、2B成為同行的方式設定。再者,基板供給機構11亦可為了使由第一保持機構3吸附的密封完畢基板W為柔軟的狀態以容易吸附,而具有進行加熱的基板加熱部113。再者,基板收容部111相當於加工對象物收容部。另外,基板收容部111可構成為直接收容多個作為加工對象物的密封完畢基板W,亦可構成為收容料盒(magazine),所述料盒為收容多個作為加工對象物的密封完畢基板W的容器。其他基板供給機構11的具體結構將後述。As shown in FIG. 1 , the
<切斷機構(加工機構)>
如圖1、圖2及圖3所示,切斷機構4具有包含相當於加工工具的刀片41A、刀片41B及兩個心軸部42A、42B的兩個旋轉工具40。兩個心軸部42A、42B以該些的旋轉軸沿著Y方向的方式設置,安裝於該些心軸的刀片41A、刀片41B以相互相向的方式配置(參照圖3)。心軸部42A的刀片41A及心軸部42B的刀片41B藉由在包含X方向及Z方向的面內旋轉,從而將保持於各切斷用工作台2A、2B的密封完畢基板W切斷。再者,於本實施形態的切斷裝置100,如圖3及圖4所示,為了抑制由刀片41A、刀片41B產生的摩擦熱而設置有液體供給機構12,所述液體供給機構12具有噴射切削水(加工液)的噴射噴嘴121。所述噴射噴嘴121例如支持於後述的Z方向移動部83。
<Cutting mechanism (processing mechanism)>
As shown in FIGS. 1 , 2 and 3 , the
<移載工作台>
如圖1所示,本實施形態的移載工作台5為移動經後述的檢查部13進行了檢查的多個製品P的工作台。所述移載工作台5被稱為所謂的分度工作台(index table),於將多個製品P分類至各種托盤21之前,暫時載置多個製品P。另外,移載工作台5於水平面上沿著X方向與兩個切斷用工作台2A、2B配置成一行。進而,移載工作台5能夠沿著Y方向前後移動,可移動至分類機構20。載置於移載工作台5的多個製品P根據由檢查部13所得的檢查結果(良品、不良品等)而由分類機構20分類至各種托盤21。
<Transfer workbench>
As shown in FIG. 1 , the transfer table 5 of this embodiment is a table that moves a plurality of products P inspected by an
再者,各種托盤21藉由沿著傳遞軸71移動的托盤搬送機構22搬送至所需位置,載置由分類機構20分類的製品P。經分類後,各種托盤21藉由托盤搬送機構22收容於托盤收容部23。於本實施形態中,構成為於托盤收容部23收容例如收容製品P之前的托盤21、收納有良好製品P的托盤21、收容有需要返工(rework)(再檢查)的不良製品P的托盤21等三種托盤21。Furthermore, the
<檢查部>
此處,檢查部13如圖1所示,設置於切斷用工作台2A、切斷用工作台2B與移載工作台5之間,檢查保持於第二保持機構6的多個製品P。本實施形態的檢查部13具有檢查製品P的密封面(封裝面)的第一檢查部131、及檢查製品P的引線面的第二檢查部132。第一檢查部131為具有用以檢查封裝面的光學系統的攝像相機,第二檢查部132為具有用以檢查引線面的光學系統的攝像相機。再者,亦可使第一檢查部131及第二檢查部132共用。
<Inspection Department>
Here, as shown in FIG. 1 , the
本實施形態的密封完畢基板W及製品P為基板的一面經樹脂成形的結構。於此種結構中,經樹脂成形的面是與基板連接的電子元件經樹脂密封而成的面,被稱為「密封面」或「封裝面」。另一方面,與經樹脂成形的面為相反側的未經樹脂成形的面露出了通常作為製品的外部連接電極發揮功能的引線,因此被稱為引線面。於所述引線為球柵陣列(Ball Grid Array,BGA)等的電子零件中使用的突起狀電極的情況下,有時亦被稱為「球面」。進而,與經樹脂成形的面為相反側的未經樹脂成形的面亦有未形成引線的形態,因此有時亦被稱為「基板面」。於本實施形態的說明中,將經樹脂成形的面記載為「密封面」或「封裝面」,將與經樹脂成形的面為相反側的未經樹脂成形的面記載為「引線面」。The sealed substrate W and product P of this embodiment have a structure in which one side of the substrate is resin-molded. In this structure, the resin-molded surface is the surface where the electronic components connected to the substrate are sealed with resin, and is called the "sealing surface" or "packaging surface". On the other hand, the non-resin-molded surface opposite to the resin-molded surface exposes leads that usually function as external connection electrodes of the product, and is therefore called a lead surface. When the lead is a protruding electrode used in electronic components such as a Ball Grid Array (BGA), it is sometimes called a "spherical surface". Furthermore, the surface that is not resin-molded and is opposite to the resin-molded surface may also be in a form where no leads are formed, so it is sometimes called the "substrate surface". In the description of this embodiment, the resin-molded surface is described as the "sealing surface" or "packaging surface", and the non-resin-molded surface opposite to the resin-molded surface is described as the "lead surface".
另外,為了能夠藉由檢查部13來檢查多個製品P的兩面,設置有使多個製品P反轉的反轉機構14(參照圖1)。所述反轉機構14具有保持多個製品P的保持工作台141、以及使該保持工作台141以成為表背相反的方式反轉的馬達等反轉部142。In addition, in order to enable the
於第二保持機構6自切斷用工作台2A、切斷用工作台2B保持多個製品P時,製品P的封裝面朝向下側。於此狀態下,於自切斷用工作台2A、切斷用工作台2B向反轉機構14搬送多個製品P的中途,藉由第一檢查部131來檢查製品P的封裝面。其後,保持於第二保持機構6的多個製品P由反轉機構14反轉。於此狀態下,製品P的引線面朝向下側,使反轉機構14移動至第二檢查部132,藉此檢查製品P的引線面。When the
<第二保持機構>
如圖1所示,第二保持機構6為了將多個製品P自切斷用工作台2A、切斷用工作台2B搬送至移載工作台5而保持多個製品P。如圖8所示,所述第二保持機構6具有:吸附頭61,設置有用以吸附保持多個製品P的多個吸附部611;以及真空泵(未圖示),連接於該吸附頭61的吸附部611。繼而,藉由吸附頭61由後述的搬送用移動機構7等移動至所需的位置,從而將多個製品P自切斷用工作台2A、切斷用工作台2B搬送至保持工作台141或移載工作台5。
<Second holding mechanism>
As shown in FIG. 1 , the
<搬送用移動機構>
如圖1所示,搬送用移動機構7使第一保持機構3至少於基板供給機構11與切斷用工作台2A、切斷用工作台2B之間移動,並且使第二保持機構6至少於切斷用工作台2A、切斷用工作台2B與保持工作台141之間移動。
<Moving mechanism for transportation>
As shown in FIG. 1 , the
而且,如圖1所示,搬送用移動機構7具有:共用的傳遞軸71,沿著兩個切斷用工作台2A、2B及移載工作台5的排列方向(X方向)一直線地延伸,用以使第一保持機構3及第二保持機構6移動。Furthermore, as shown in FIG. 1 , the
所述傳遞軸71設置於下述範圍,即:第一保持機構3可移動至基板供給機構11的基板供給部112的上方,並且第二保持機構6可移動至移載工作台5的上方(參照圖1)。另外,相對於所述傳遞軸71,第一保持機構3、第二保持機構6、切斷用工作台2A、切斷用工作台2B及移載工作台5於平面視時設置於同側(近前側)。此外,檢查部13、反轉機構14、各種托盤21、托盤搬送機構22、托盤收容部23、後述的第一清潔機構18及第二清潔機構19、回收容器172亦相對於傳遞軸71而設置於同側(近前側)。The
進而,如圖5、圖6及圖8所示,搬送用移動機構7具有:主移動機構72,使第一保持機構3及第二保持機構6沿著傳遞軸71於X方向移動;升降移動機構73,使第一保持機構3及第二保持機構6相對於傳遞軸71於Z方向升降移動;以及水平移動機構74,使第一保持機構3及第二保持機構6相對於傳遞軸71於Y方向水平移動。Furthermore, as shown in FIGS. 5 , 6 and 8 , the
如圖5~圖8所示,主移動機構72具有:共用的導軌721,設置於傳遞軸71、且導引第一保持機構3及第二保持機構6;以及齒條與小齒輪機構722,使第一保持機構3及第二保持機構6沿著該導軌721移動。As shown in Figures 5 to 8, the main moving
導軌721沿著傳遞軸71於X方向一直線地延伸,與傳遞軸71同樣地設置於下述範圍,即:第一保持機構3可移動至基板供給機構11的基板供給部112的上方,並且第二保持機構6可移動至移載工作台5的上方。於所述導軌721,能夠滑動地設置有滑動構件723,所述滑動構件723經由升降移動機構73及水平移動機構74而設置有第一保持機構3及第二保持機構6。此處,導軌721為第一保持機構3及第二保持機構6所共用,但升降移動機構73、水平移動機構74及滑動構件723是針對第一保持機構3及第二保持機構6各自而分別設置。The
齒條與小齒輪機構722具有:凸輪齒條722a,為第一保持機構3及第二保持機構6所共用;以及小齒輪722b,分別設置於第一保持機構3及第二保持機構6,由致動器(未圖示)旋轉。凸輪齒條722a設置於共用的傳遞軸71,可藉由將多個凸輪齒條要素連結從而變更為各種長度。另外,小齒輪722b設置於滑動構件723,被稱為所謂的滾子小齒輪(roller pinion),如圖7所示,具有:與馬達的旋轉軸一起旋轉的一對滾子本體722b1,以及於該一對滾子本體722b1之間於圓周方向等間隔地設置、且以相對於滾子本體722b1能夠滾動的方式設置的多個滾子銷722b2。本實施形態的齒條與小齒輪機構722使用所述滾子小齒輪,故而兩個以上的滾子銷722b2與凸輪齒條722a接觸,於正反方向不產生背隙(backlash),於使第一保持機構3及第二保持機構6於X方向移動時定位精度變良好。The rack and
如圖5及圖8所示,升降移動機構73是與第一保持機構3及第二保持機構6分別對應地設置。如圖5及圖6所示,第一保持機構3的升降移動機構73介於傳遞軸71(具體而言為主移動機構72)與第一保持機構3之間而設置,具有:Z方向導軌73a,沿著Z方向設置;以及致動器部73b,使第一保持機構3沿著該Z方向導軌73a移動。再者,致動器部73b例如可使用滾珠螺桿機構,亦可使用氣缸,亦可使用線性馬達。再者,如圖8所示,第二保持機構6的升降移動機構73的結構與第一保持機構3的升降移動機構73同樣。As shown in FIGS. 5 and 8 , the lifting and lowering
如圖5、圖6及圖8所示,水平移動機構74是與第一保持機構3及第二保持機構6分別對應地設置。如圖5及圖6所示,第一保持機構3的水平移動機構74是介於傳遞軸71(具體而言為升降移動機構73)與第一保持機構3之間而設置,具有:Y方向導軌74a,沿著Y方向設置;彈性體74b,對第一保持機構3向Y方向導軌74a的其中一側賦予力;以及凸輪機構74c,使第一保持機構3向Y方向導軌74a的另一側移動。此處,凸輪機構74c使用偏心凸輪,藉由利用馬達等致動器使該偏心凸輪旋轉,從而可調整第一保持機構3於Y方向的移動量。As shown in FIGS. 5 , 6 and 8 , the horizontal moving
再者,如圖8所示,第二保持機構6的水平移動機構74的結構與第一保持機構3的升降移動機構73同樣。另外,可設為未對第二保持機構6設置有水平移動機構74的結構,亦可設為未對第一保持機構3及第二保持機構6兩者設置有水平移動機構74的結構。進而,水平移動機構74與升降移動機構73同樣地,不使用凸輪機構74c而例如可使用滾珠螺桿機構,亦可使用氣缸,亦可使用線性馬達。Furthermore, as shown in FIG. 8 , the structure of the
<切斷用移動機構(加工用移動機構)>
切斷用移動機構8使兩個心軸部42A、42B的各個於X方向、Y方向及Z方向分別獨立地直線移動。
<Moving mechanism for cutting (moving mechanism for processing)>
The cutting moving
具體而言,如圖2、圖3、圖9及圖10所示,切斷用移動機構8包括:X方向移動部81,使心軸部42A、心軸部42B於X方向直線移動;Y方向移動部82,使心軸部42A、心軸部42B於Y方向直線移動;以及Z方向移動部83,使心軸部42A、心軸部42B於Z方向直線移動。Specifically, as shown in FIGS. 2 , 3 , 9 and 10 , the moving
X方向移動部81為兩個切斷用工作台2A、2B所共用,尤其如圖2及圖3所示,具有:沿著X方向夾持兩個切斷用工作台2A、2B而設置的一對X方向導軌811;以及支持體812,沿著該一對X方向導軌811移動並且經由Y方向移動部82及Z方向移動部83支持心軸部42A、心軸部42B。一對X方向導軌811設置於沿著X方向設置的兩個切斷用工作台2A、2B的側方。另外,支持體812例如為門型,具有沿Y方向延伸的形狀。具體而言,支持體812具有自一對X方向導軌811向上方延伸的一對腳部、以及架設於該一對腳部的樑部(橫樑部),該樑部沿Y方向延伸。The
而且,支持體812例如藉由沿X方向延伸的滾珠螺桿機構813而於一對X方向導軌811上沿著X方向直線往返移動。所述滾珠螺桿機構813由伺服馬達等驅動源(未圖示)驅動。此外,支持體812亦可以藉由線性馬達等其他直動機構而往返移動的方式構成。Furthermore, the
尤其如圖3所示,Y方向移動部82具有:Y方向導軌821,於支持體812中沿著Y方向設置;以及Y方向滑塊822,沿著該Y方向導軌821移動。Y方向滑塊822例如由線性馬達823驅動,於Y方向導軌821上直線往返移動。於本實施形態中,與兩個心軸部42A、42B對應地設置有兩個Y方向滑塊822。藉此,兩個心軸部42A、42B能夠相互獨立地於Y方向移動。此外,Y方向滑塊822亦可以藉由使用滾珠螺桿機構的其他直動機構而往返移動的方式構成。Especially as shown in FIG. 3 , the Y-
如圖2~圖4所示,Z方向移動部83具有:Z方向導軌831,於各Y方向滑塊822中沿著Z方向設置;以及Z方向滑塊832,沿著所述Z方向導軌831移動並且支持心軸部42A、心軸部42B。即,Z方向移動部83是與各心軸部42A、42B對應地設置。Z方向滑塊832例如由偏心凸輪機構(未圖示)驅動,於Z方向導軌831上直線往返移動。此外,Z方向滑塊832亦可以藉由滾珠螺桿機構等其他直動機構而往返移動的方式構成。As shown in FIGS. 2 to 4 , the Z-
關於所述切斷用移動機構8與傳遞軸71的位置關係,如圖1及圖4所示,以傳遞軸71於切斷用移動機構8的上方橫穿切斷用移動機構8的方式配置。具體而言,傳遞軸71以於支持體812的上方橫穿該支持體812的方式配置,傳遞軸71與支持體812成為於平面視時相互正交的位置關係。Regarding the positional relationship between the cutting moving
<加工屑收容部>
另外,如圖1所示,本實施形態的切斷裝置100更包括:加工屑收容部17,收容因密封完畢基板W的切斷而產生的端材等加工屑S。
<Machining waste storage unit>
In addition, as shown in FIG. 1 , the
如圖2~圖4所示,所述加工屑收容部17設置於切斷用工作台2A、切斷用工作台2B的下方,具有:導引滑槽171,具有於平面視時包圍切斷用工作台2A、切斷用工作台2B的上部開口171X;以及回收容器172,將由該導引滑槽171所導引的加工屑S回收。藉由將加工屑收容部17設置於切斷用工作台2A、切斷用工作台2B的下方,從而可提高加工屑S的回收率。As shown in FIGS. 2 to 4 , the processing
導引滑槽171將自切斷用工作台2A、切斷用工作台2B飛散或掉落的加工屑S導引至回收容器172。於本實施形態中,以導引滑槽171的上部開口171X包圍切斷用工作台2A、切斷用工作台2B的方式構成(參照圖3),故而不易漏掉加工屑S,可進一步提高加工屑S的回收率。另外,導引滑槽171以包圍設置於切斷用工作台2A、切斷用工作台2B之下的旋轉機構9A、旋轉機構9B的方式設置(參照圖4),以保護旋轉機構9A、旋轉機構9B免受加工屑S及切削水的方式構成。The
於本實施形態中,加工屑收容部17為兩個切斷用工作台2A、2B所共用,但亦可與切斷用工作台2A、切斷用工作台2B分別對應地設置。In this embodiment, the machining
回收容器172將因自重而通過導引滑槽171的加工屑S回收,於本實施形態中,如圖4等所示,與兩個切斷用工作台2A、2B分別對應地設置。而且,兩個回收容器172配置於傳遞軸71的近前側,以可分別獨立地自切斷裝置100的近前側卸除的方式構成。藉由所述結構,可提高加工屑S的廢棄等的維護性。再者,回收容器172可考慮密封完畢基板W的尺寸或加工屑S的尺寸及量、作業性等而於所有切斷用工作台之下總體設置一個,亦可分為三個以上而設置。The
另外,如圖4等所示,加工屑收容部17具有將切削水與加工屑分離的分離部173。作為所述分離部173的結構,例如可想到於回收容器172的底面設置使切削水通過的多孔板等過濾器。藉由所述分離部173,可不於回收容器172蓄積切削水而將加工屑S回收。In addition, as shown in FIG. 4 etc., the machining
<第一清潔機構>
另外,如圖1及圖5所示,本發明的切斷裝置100更包括:第一清潔機構18,將保持於切斷用工作台2A、切斷用工作台2B的多個製品P的上表面側(引線面)清潔。所述第一清潔機構18藉由對保持於切斷用工作台2A、切斷用工作台2B的多個製品P的上表面噴射洗淨液及/或壓縮空氣的噴射噴嘴18a(參照圖5),來清潔製品P的上表面側。
<First Cleaning Mechanism>
In addition, as shown in FIGS. 1 and 5 , the
如圖5所示,所述第一清潔機構18以能夠與第一保持機構3一起沿著傳遞軸71移動的方式構成。此處,第一清潔機構18設置於滑動構件723,所述滑動構件723於設置於傳遞軸71的導軌721上滑動。此處,於第一清潔機構18與滑動構件723之間,設置有用以使第一清潔機構18於Z方向升降移動的升降移動機構181。關於所述升降移動機構181,例如可想到使用齒條與小齒輪機構,使用滾珠螺桿機構,或使用氣缸等。As shown in FIG. 5 , the
<第二清潔機構>
進而,如圖1所示,本發明的切斷裝置100更包括:第二清潔機構19,將保持於第二保持機構6的多個製品P的下表面側(封裝面)清潔。所述第二清潔機構19設置於切斷用工作台2B與檢查部13之間,藉由向保持於第二保持機構6的多個製品P的下表面噴射洗淨液及/或壓縮空氣,從而清潔製品P的下表面側。即,於第二保持機構6沿著傳遞軸71移動的中途,第二清潔機構19將製品P的下表面側清潔。
<Second cleaning mechanism>
Furthermore, as shown in FIG. 1 , the
<切斷裝置的動作的一例>
繼而,對切斷裝置100的動作的一例加以說明。圖9中,表示切斷裝置10的動作中的第一保持機構3的移動路徑、及第二保持機構6的移動路徑。再者,於本實施形態中,切斷裝置100的動作、例如密封完畢基板W的搬送、密封完畢基板W的切斷、製品P的檢查、後述的刀片的更換、修整(dressing)等所有動作或控制是由控制部CTL(參照圖1)進行。
<Example of operation of cutting device>
Next, an example of the operation of the
基板供給機構11的基板供給部112使收容於基板收容部111的密封完畢基板W向由第一保持機構3保持的保持位置RP移動。The
繼而,搬送用移動機構7使第一保持機構3移動至保持位置RP,第一保持機構3吸附保持密封完畢基板W。其後,搬送用移動機構7使保持有密封完畢基板W的第一保持機構3移動至切斷用工作台2A、切斷用工作台2B,第一保持機構3解除吸附保持,將密封完畢基板W載置於切斷用工作台2A、切斷用工作台2B。此時,藉由主移動機構72來調整密封完畢基板W的X方向的位置,藉由水平移動機構74來調整密封完畢基板W的Y方向的位置。而且,切斷用工作台2A、切斷用工作台2B吸附保持密封完畢基板W。Then, the
此處,於使保持有密封完畢基板W的第一保持機構3移動至切斷用工作台2B的情況下,升降移動機構73使第一保持機構3上升至不與切斷用移動機構8(支持體812)發生物理干擾的位置為止。再者,於使保持有密封完畢基板W的第一保持機構3移動至切斷用工作台2B時,於使支持體812自切斷用工作台2B向移載工作台5側退避的情況下,無需如所述般使第一保持機構3升降。Here, when the
於此狀態下,切斷用移動機構8使兩個心軸部42A、42B於X方向及Y方向依序移動,並且切斷用工作台2A、2B旋轉,藉此將密封完畢基板W切斷為格子狀而單片化。In this state, the cutting moving
於切斷後,搬送用移動機構7使第一清潔機構18移動,將保持於切斷用工作台2A、切斷用工作台2B的多個製品P的上表面側(引線面)清潔。所述清潔之後,搬送用移動機構7使第一保持機構3及第一清潔機構18退避至預先規定的位置。After cutting, the
繼而,搬送用移動機構7使第二保持機構6移動至切斷後的切斷用工作台2A、切斷用工作台2B,第二保持機構6吸附保持多個製品P。其後,搬送用移動機構7使保持有多個製品P的第二保持機構6移動至第二清潔機構19。藉此,第二清潔機構19將保持於第二保持機構6的多個製品P的下表面側(封裝面)清潔。Then, the
於清潔之後,保持於第二保持機構6的多個製品P藉由檢查部13及反轉機構14進行兩面檢查。其後,搬送用移動機構7使第二保持機構6移動至移載工作台5,第二保持機構6解除吸附保持,將多個製品P載置於移載工作台5。載置於移載工作台5的多個製品P根據由檢查部13所得的檢查結果(良品、不良品等)而由分類機構20分類至各種托盤21。After cleaning, the plurality of products P held in the
再者,關於兩面檢查,例如,首先於由第二保持機構6吸附保持的狀態下檢查製品P的其中一個面。繼而,自第二保持機構6將製品P移載至反轉機構14的保持工作台141,於由反轉後的保持工作台141吸附保持的狀態下檢查製品P的另一面,藉此可執行兩面檢查。而且,之後的自反轉機構14向移載工作台5的製品P的搬送可藉由自保持工作台141移載至第二保持機構6來進行。另外,將保持工作台141設為能夠於X方向移動的結構,將保持工作台141或移載工作台5的至少其中一者設為能夠於Z方向移動的結構,使保持工作台141移動至移載工作台5的上方,藉此亦可將製品P搬送至移載工作台5並進行移載。Furthermore, regarding the double-sided inspection, for example, first one of the surfaces of the product P is inspected while being suction-held by the
<基板供給機構的具體結構>
以下,對基板供給機構11的詳細結構進行說明。
<Detailed structure of substrate supply mechanism>
Hereinafter, the detailed structure of the
如上所述,基板供給機構11向第一保持機構3供給密封完畢基板W。具體而言,如圖1、圖10及圖11所示,基板供給機構11具有:基板收容部111,自外部收容多個密封完畢基板W;以及基板供給部112,使收容於該基板收容部111的密封完畢基板W移動至由第一保持機構3吸附保持的保持位置RP。As described above, the
如圖10及圖11所示,於基板收容部111設置有將所收容的密封完畢基板W的一部分推出至基板收容部111的外側的推出機構114。所述推出機構114具有推壓密封完畢基板W的一端部的能夠移動的推壓構件114a以及使該推壓構件114a移動的致動器部114b。作為致動器部114b,可利用使用馬達者、使用氣缸者、或者使用螺線管者等。As shown in FIGS. 10 and 11 , the
如圖10及圖11所示,基板供給部112包括:接收台115,自基板收容部111接收密封完畢基板W;基板移動部116,使密封完畢基板W自基板收容部111移動至接收台115;以及台移動機構,使接收台115移動至預先規定的搬送位置X2。As shown in FIGS. 10 and 11 , the
如圖10所示,本實施形態的接收台115構成為,不僅自基板收容部111接收密封完畢基板W,而且將密封完畢基板W交接至基板收容部111。具體而言,接收台115具有:搬入用台115A,自基板收容部111接收密封完畢基板W;以及搬出用台115B,將密封完畢基板W交接至基板收容部111。搬入用台115A是吸附台,可吸附並保持所載置的密封完畢基板W。另外,本實施形態的搬出用台115B對經半切的密封完畢基板W進行交接。再者,所謂半切是藉由切斷密封完畢基板W的上表面(引線面)的一部分來形成槽的加工。As shown in FIG. 10 , the receiving
如圖11及圖12所示,載置於搬入用台115A的密封完畢基板W一面藉由基板加熱部113自上部被按壓於搬入用台115A的上表面一面被加熱。因此,於搬入用台115A設置有將藉由基板加熱部113進行加熱時的衝擊進行吸收的片狀的緩衝材115x。As shown in FIGS. 11 and 12 , the sealed substrate W placed on the
另外,如圖12所示,於搬入用台115A設置有對密封完畢基板W進行定位的定位機構118。所述定位機構118為下述結構,即,搬入用台115A的一對側壁115m、115n中的其中一個側壁115m能夠相對於另一個側壁115n移動,藉由閉合一對側壁115m、115n的間隔,密封完畢基板W與另一個側壁115n抵接,以另一個側壁115n的內表面為基準而被定位。再者,於本實施形態中,其中一個側壁115m能夠藉由致動器115j移動,另一個側壁115n能夠藉由致動器115k移動。於藉由基板加熱部113加熱密封完畢基板W時,藉由各致動器115j、115k使各側壁115m、115n以不相互發生干擾的方式退避。In addition, as shown in FIG. 12 , a
如圖11所示,基板移動部116具有:夾具部116a,夾持密封完畢基板W的端部;X方向移動部116b,使該夾具部116a於X方向移動;以及Z方向移動部116c,使夾具部116a於Z方向移動。As shown in FIG. 11 , the
使用所述推出機構114及基板移動部116的自基板收容部111向接收台115(搬入用台115A及搬出用台115B)交接密封完畢基板W的順序如下所述。
藉由推出機構114的推壓構件114a推壓收容於基板收容部111的密封完畢基板W,使密封完畢基板W的一部分自基板收容部111向搬入用台115A側伸出。然後,藉由基板移動部116的夾具部116a夾持密封完畢基板W的自基板收容部111伸出的部分,藉由X方向移動部116b使夾具部116a於X方向移動,自基板收容部111拉出密封完畢基板W並載置於搬入用台115A。
The procedure for transferring the sealed substrate W from the
如圖10及圖11所示,台移動機構117具有:一對移動軌道117a,用以使接收台115(搬入用台115A及搬出用台115B)移動;以及滑動構件117b,沿著該移動軌道117a移動並且設置有接收台115。滑動構件117b例如藉由沿Y方向延伸的滾珠螺桿機構117c於一對移動軌道117a上沿著Y方向直線往復移動。所述滾珠螺桿機構117c由伺服馬達等驅動源(未圖示)驅動。此外,滑動構件117b亦可以藉由線性馬達等其他直動機構而往返移動的方式構成。As shown in FIGS. 10 and 11 , the
移動軌道117a位於傳遞軸71的下方,移動軌道117a與搬送用移動機構7的傳遞軸71於平面視時相互正交。於本實施形態中,傳遞軸71沿X方向延伸,移動軌道117a沿Y方向延伸。再者,「於平面視時相互正交」是指除了傳遞軸71與移動軌道117a垂直(90°)交叉的情況以外,亦包括實質上正交。實質上正交是指自垂直起以若干誤差交叉的狀態,例如為以85°以上且95°以下交叉的狀態。The moving
另外,由於移動軌道117a與傳遞軸71正交,因此移動軌道117a與使切斷用移動機構8的支持體812移動的X方向導軌811正交。換言之,移動軌道117a與切斷用移動機構8的支持體812於平面視時平行。In addition, since the moving
此處,若傳遞軸71與移動軌道117a的周邊結構接觸,則基板收容部111與第一保持機構3相對於傳遞軸71而設置於相互相反側。具體而言,基板收容部111設置於較傳遞軸71於Y方向更靠內裏側,第一保持機構3設置於較傳遞軸71於Y方向更靠近前側。Here, when the
而且,如圖13的(a)~圖13的(c)所示,台移動機構117使搬入用台115A於自基板收容部111接收密封完畢基板W的接收位置X1與藉由第一保持機構3保持密封完畢基板W的搬送位置X2之間直線移動。接收位置X1位於較傳遞軸71於Y軸方向更靠內裏側,並且搬送位置X2位於較傳遞軸71於Y軸方向更靠近前側。另外,位於搬送位置X2的接收台115(搬入用台115A)上的密封完畢基板W位於保持位置RP。Furthermore, as shown in FIGS. 13(a) to 13(c) , the
另外,台移動機構117使搬入用台115A移動至用以藉由基板加熱部113加熱所載置的密封完畢基板W的加熱位置X3(參照圖13的(a)~圖13的(c))。本實施形態的加熱位置X3設定於較接收位置X1於Y方向更靠內裏側。於所述加熱位置X3,基板加熱部113與載置於搬入用台115A的密封完畢基板W的上表面接觸而加熱密封完畢基板W。In addition, the
進而,如圖14的(d)及圖14的(e)所示,台移動機構117使搬出用台115B移動至搬送位置X2。於所述位置,經半切的密封完畢基板W藉由第一保持機構3被搬送至搬出用台115B。另外,台移動機構117使搬出用台115B移動至接收位置X1。於所述位置,藉由基板移動部116自搬出用台115B將密封完畢基板W收容於基板收容部111。再者,雖於接收位置X1收容經半切的密封完畢基板W,但亦可另外設定收容密封完畢基板W的收容位置,於所述收容位置將密封完畢基板W收容於基板收容部111。Furthermore, as shown in FIGS. 14(d) and 14(e) , the
<刀片更換機構>
如圖10及圖15所示,本實施形態的切斷裝置100具有自動地更換刀片41A、刀片41B的刀片更換機構24。具體而言,於本實施形態中,刀片更換機構24可自兩個心軸部42A、42B分別更換刀片41A、刀片41B。而且,刀片更換機構24於保持已卸除的刀片41A、刀片41B的狀態下將刀片41A、刀片41B收容於刀片收容部25,保持新的刀片41A、刀片41B,並搬送至心軸部42A、心軸部42B進行安裝。再者,刀片更換機構24相當於加工工具更換機構。
<Blade replacement mechanism>
As shown in FIGS. 10 and 15 , the
此處,若說明切斷機構4的結構,則如圖16所示,具有:刀片41A、刀片41B;心軸部42A、心軸部42B,使該刀片41A、刀片41B旋轉;以及一對凸緣43、44,將刀片41A、刀片41B能夠裝卸地固定於心軸部42A、心軸部42B。一對凸緣43、44包含:內凸緣43,被固定於心軸部42A、心軸部42B且靠近心軸部42A、心軸部42B;以及外凸緣44,相對於心軸部42A、心軸部42B而能夠裝卸地構成且遠離心軸部42A、心軸部42B。外凸緣44於裝配於內凸緣43的中心軸部的狀態下,藉由例如螺母等的裝卸構件45固定。藉由所述裝卸構件45使刀片41A、刀片41B相對於心軸部42A、心軸部42B而能夠裝卸。Here, the structure of the
而且,如圖10及圖15所示,刀片更換機構24包括:吸附臂241,吸附刀片41A、刀片41B及外凸緣44;以及臂移動機構242,使吸附臂241相對於切斷機構4而相對地移動。再者,臂移動機構242相當於保持部移動機構。Furthermore, as shown in FIGS. 10 and 15 , the
如圖17的(a)及圖17的(b)所示,吸附臂241包括:第一吸附部241a,吸附刀片41A、刀片41B的其中一個的面(外凸緣44側的面);以及第二吸附部241b,位於第一吸附部241a的內側、且吸附外凸緣44的外側的面(與內凸緣43為相反側的面)。進而,吸附臂241包括裝卸構件旋轉部241c,所述裝卸構件旋轉部241c位於第二吸附部241b的內側,且與心軸部42A、心軸部42B的裝卸構件45(此處為螺母)卡合而使裝卸構件45裝卸。再者,第一吸附部241a及第二吸附部241b與設置於吸附臂241的外部的抽吸泵(未圖示)連接。另外,裝卸構件旋轉部241c使用使裝卸構件45旋轉的例如馬達等旋轉機構(未圖示)而構成。As shown in FIGS. 17(a) and 17(b) , the
如圖15所示,臂移動機構242包括:Y方向移動機構242a,使吸附臂241於Y方向移動;以及X方向移動機構242b,使吸附臂241於X方向移動。再者,臂移動機構242亦可具有使吸附臂241於Z方向移動的機構。As shown in FIG. 15 , the
Y方向移動機構242a使用所述台移動機構117的移動軌道117a而構成,具有沿著該移動軌道117a滑動移動的Y方向滑塊242a1。Y方向滑塊242a1例如藉由線性馬達驅動,於移動軌道117a上直線往復移動。再者,Y方向滑塊242a1亦可以藉由使用滾珠螺桿機構的其他直動機構而往返移動的方式構成。The Y-
X方向移動機構242b具有:X方向導軌242b2,於Y方向滑塊242a1沿著X方向設置;以及X方向滑塊242b1,沿著該X方向導軌242b2移動。X方向滑塊242b1例如藉由線性馬達驅動,於X方向導軌242b2上直線往復移動。再者,X方向滑塊242b1亦可以藉由使用滾珠螺桿機構的其他直動機構而往返移動的方式構成。The
藉由如此構成刀片更換機構24,刀片更換機構24的移動方向(沿著移動軌道117a的方向)與加工用移動機構8中的支持體812的移動方向(沿著X方向導軌811的方向)於平面視時相互正交。即,刀片更換機構24的吸附臂241沿著支持體812的長邊方向移動。再者,「於平面視時相互正交」是指除了移動軌道117a與X方向導軌811垂直(90°)交叉的情況以外,亦包括實質上正交。實質上正交是指自垂直起以若干誤差交叉的狀態,例如為以85°以上且95°以下交叉的狀態。By configuring the
另外,於更換刀片41A、刀片41B時,如圖18的(a)及圖18的(b)所示,加工用移動機構8使切斷機構4移動至預先規定的更換位置。具體而言,X方向移動部81使支持體812移動至移動軌道117a側(刀片更換機構24側),而使切斷機構4移動至預先規定的更換位置。另外,刀片更換機構24沿著移動軌道117a移動,卸除位於更換位置的切斷機構4的刀片41A、刀片41B。刀片更換機構24將已卸除的刀片41A、刀片41B收容於刀片收容部25,取出新的刀片41A、刀片41B,並將其安裝於位於更換位置的切斷機構4。於更換兩個切斷機構4的刀片41A、刀片41B時,藉由未圖示的旋轉機構使吸附臂241旋轉180度,進行同樣的動作。再者,當刀片更換機構24沿著移動軌道117a移動時,設置有接收台115的滑動構件117b退避至不妨礙刀片更換機構24的移動的位置。相反地,當設置有接收台115的滑動構件117b沿著移動軌道117a移動時,刀片更換機構24退避至不妨礙滑動構件117b的移動的位置。In addition, when replacing the
如圖10所示,本實施形態的切斷裝置100具有:修整構件收容部26,收容用以對刀片41A、刀片41B進行修整的修整構件DP;以及修整用工作台27,載置修整構件DP而對刀片41A、刀片41B進行修整。As shown in FIG. 10 , the
修整構件收容部26分別收容新的修整構件DP及舊的修整構件DP。本實施形態的修整構件收容部26設置於移動軌道117a上,具體而言設置於使移動軌道117a移動的Y方向滑塊242a1上。The dressing
本實施形態的修整用工作台27設置於兩個切斷用工作台2A、2B之間。藉由第一保持機構3及搬送用移動機構7將修整構件DP搬送至所述修整用工作台27。而且,修整用工作台吸附並保持所搬送的修整構件DP。再者,於第一保持機構3設置有用以吸附並保持修整構件DP的吸附部(未圖示)。於修整用工作台27保持有修整構件DP的狀態下,切斷用移動機構8使切斷機構4移動至修整用工作台27,而對切斷機構4的刀片41A、刀片41B進行修整。The trimming table 27 of this embodiment is provided between the two cutting tables 2A and 2B. The trimming member DP is conveyed to the trimming table 27 by the
繼而,參照圖19的(a)及圖19的(b)說明對密封完畢基板W進行全切(單片化)的情況以及進行半切(槽加工)的情況。再者,全切是指藉由切斷密封完畢基板W而進行單片化的加工。Next, a case where the sealed substrate W is fully cut (single-cut) and a case where half-cut (groove processing) is performed will be described with reference to FIGS. 19(a) and 19(b) . In addition, full cutting refers to a process in which the sealed substrate W is cut into individual pieces.
(1)進行全切(單片化)的情況(參照圖19的(a))
使用推出機構114及基板移動部116將位於基板收容部111的密封完畢基板交接至接收台115的搬入用台115A。
(1) When performing total cutting (single-cutting) (see (a) of Figure 19)
The sealed substrate located in the
藉由台移動機構117使搬入用台115A移動至搬送位置,藉由第一保持機構3保持密封完畢基板W,並向切斷用工作台2A、切斷用工作台2B搬送(搬入步驟)。The loading table 115A is moved to the transport position by the
然後,藉由切斷用工作台2A、切斷用工作台2B對密封完畢基板W進行全切(切斷)而進行單片化(全切步驟)。Then, the sealed substrate W is completely cut (cut) using the cutting tables 2A and 2B to form individual pieces (full cutting step).
藉由第二保持機構6保持製品P,並向反轉機構14的保持工作台141或移載工作台5搬送(搬出步驟)。其後的動作如所述的<切斷裝置的動作的一例>般。The product P is held by the
(2)進行半切(槽加工)的情況(參照圖19的(b))
使用推出機構114及基板移動部116將位於基板收容部111的預定要半切的密封完畢基板W交接至接收台115的搬入用台115A。
(2) When performing half cutting (grooving) (see (b) of Figure 19)
The sealed substrate W scheduled to be half-cut in the
使搬入用台115A移動至搬送位置X2,藉由第一保持機構3保持密封完畢基板W,並向切斷用工作台2A、切斷用工作台2B搬送(搬入步驟)。The
然後,藉由切斷用工作台2A、切斷用工作台2B對密封完畢基板W進行半切(槽加工)(半切步驟)。Then, the sealed substrate W is half-cut (grooved) using the cutting tables 2A and 2B (half-cutting step).
藉由第一保持機構3保持經半切的密封完畢基板W,並向位於搬送位置X2的搬出用台115B搬送(搬出步驟)。The half-cut sealed substrate W is held by the
將經半切的密封完畢基板W進行了交接的搬出用台115B藉由台移動機構117移動至收容位置(接收位置X1)。然後,基板移動部116將經半切的密封完畢基板W收容於基板收容部111(收容步驟)。The
<本實施形態的效果>
根據本實施形態的切斷裝置100,使接收台115移動的移動軌道117a與使第一保持機構3移動的傳遞軸71於平面視時相互正交,因此並非為如先前般將基板收容部111與切斷用工作台2A、切斷用工作台2B橫向配置成一行的結構,因此可減少切斷裝置100的佔據面積。
<Effects of this embodiment>
According to the
另外,由於在傳遞軸71的其中一側設置有第一保持機構3,於傳遞軸71的另一側設置有基板收容部111,因此可不受第一保持機構3的移動範圍的限制地設置基板收容部111,另外,基板收容部111的配置自由度增加,可減少切斷裝置100的佔據面積。In addition, since the
此外,於本實施形態中,設為藉由沿著切斷用工作台2A、切斷用工作台2B及移載工作台5的排列方向延伸的共用的傳遞軸71來使第一保持機構3及第二保持機構6移動的結構,藉由切斷用移動機構8使切斷機構4於水平面上於沿著傳遞軸71的X方向及與X方向正交的Y方向分別移動,因此可不使切斷用工作台2A、切斷用工作台2B於X方向及Y方向移動而對密封完畢基板W進行加工。因此,可不藉由滾珠螺桿機構使切斷用工作台2A、切斷用工作台2B移動,而無需用以保護滾珠螺桿機構的蛇腹構件及用以保護該蛇腹構件的蓋構件。其結果為,可使切斷裝置100的裝置結構簡化。另外,可設為不使切斷用工作台2A、切斷用工作台2B於X方向及Y方向移動的結構,可減小切斷裝置100的佔據面積。In addition, in this embodiment, it is assumed that the
<其他變形實施形態> 再者,本發明並不限於所述實施形態。 <Other variations> In addition, the present invention is not limited to the above-described embodiment.
例如,於所述實施形態中,刀片更換機構24能夠藉由台移動機構117的移動軌道117a移動,但亦可構成為能夠沿著其他軌道移動。For example, in the above-described embodiment, the
所述實施形態的切斷裝置100進行全切動作及半切動作此兩者,但亦可僅進行全切動作。於此情況下,接收台115只要僅為搬入用台115A即可。另外,亦可僅進行半切動作。於此情況下,無需第二保持機構6等的用以搬出製品P的結構。The
於所述實施形態中,對雙切割工作台方式且雙心軸結構的切斷裝置進行了說明,但並不限於此,亦可為單切割工作台方式且單心軸結構的切斷裝置、或單切割工作台方式且雙心軸結構的切斷裝置等。In the above-mentioned embodiment, the cutting device of the double cutting table type and the double mandrel structure has been described, but it is not limited to this, and a cutting device of the single cutting table type and the single mandrel structure may also be used. Or a cutting device with a single cutting table type and a double mandrel structure, etc.
另外,所述實施形態的移載工作台5為於分類至各種托盤21之前暫時載置的分度工作台,但亦可將移載工作台5設為反轉機構14的保持工作台141。In addition, the transfer table 5 in the above embodiment is an indexing table that is temporarily placed before sorting into
進而,於所述實施形態中,為自移載工作台5分類至托盤21的結構,但亦可為將製品P搬送並貼附於框狀構件的內側所配置的黏接帶上的結構。Furthermore, in the above-described embodiment, the structure is configured to sort the products P from the transfer table 5 to the
另外,構成傳遞軸71的凸輪齒條要素可將多個連結而構成,因此例如可將切斷裝置(加工裝置)100設為於第二清潔機構19與檢查部13之間能夠分離及連結(能夠裝卸)的模組結構。於此情況下,例如可於第二清潔機構19側的模組、與檢查部13側的模組之間,追加進行與檢查部13中的檢查為不同種類的檢查的模組。再者,除了此處例示的結構以外,亦可將切斷裝置(加工裝置)100設為能夠於某處分離及連結(能夠裝卸)的模組結構,亦可將追加的模組設為檢查以外的各種功能的模組。In addition, the cam rack element constituting the
另外,本發明的加工裝置亦可進行切斷以外的加工,例如亦可進行切削或磨削等其他機械加工。In addition, the processing device of the present invention can also perform processing other than cutting, for example, it can also perform other mechanical processing such as cutting or grinding.
此外,本發明不限於所述實施形態,當然能夠於不偏離其主旨的範圍進行各種變形。 [產業上的可利用性] In addition, the present invention is not limited to the above-described embodiments, and various modifications can be made without departing from the gist of the invention. [Industrial availability]
根據本發明,可減少加工裝置的佔據面積。According to the present invention, the occupied area of the processing device can be reduced.
2A、2B:切斷用工作台(加工工作台) 3:第一保持機構 4:切斷機構(加工機構) 5:移載工作台 6:第二保持機構 7:搬送用移動機構 8:切斷用移動機構(加工用移動機構) 9A、9B:旋轉機構 10A、10B:真空泵 11:基板供給機構 12:液體供給機構 13:檢查部 14:反轉機構 17:加工屑收容部 18:第一清潔機構 18a、121:噴射噴嘴 19:第二清潔機構 20:分類機構 21:托盤 22:托盤搬送機構 23:托盤收容部 24:刀片更換機構(加工工具更換機構) 241:吸附臂 241a:第一吸附部 241b:第二吸附部 241c:裝卸構件旋轉部 242:臂移動機構 242a:Y方向移動機構 242b:X方向移動機構 242a1:Y方向滑塊 242b1:X方向滑塊 242b2:X方向導軌 25:刀片收容部 26:修整構件收容部 27:修整用工作台 31、61:吸附頭 40:旋轉工具 41A、41B:刀片 42A、42B:心軸部 43:內凸緣(凸緣) 44:外凸緣(凸緣) 45:裝卸構件 71:傳遞軸 72:主移動機構 73:升降移動機構 73a:Z方向導軌 73b:致動器部 74:水平移動機構 74a:Y方向導軌 74b:彈性體 74c:凸輪機構 81:X方向移動部 82:Y方向移動部 83:Z方向移動部 100:切斷裝置(加工裝置) 111:基板收容部(加工對象物收容部) 112:基板供給部 113:基板加熱部 114:推出機構 114a:推壓構件 114b:致動器部 115:接收台 115x:緩衝材 115m、115n:側壁 115A:搬入用台 115B:搬出用台 115j、115k:致動器 116:基板移動部 116a:夾具部 116b:X方向移動部 116c:Z方向移動部 117a:移動軌道 117b:滑動構件 117c:滾珠螺桿機構 117:台移動機構 118:定位機構 131:第一檢查部 132:第二檢查部 141:保持工作台 142:反轉部 171:導引滑槽 171X:上部開口 172:回收容器 173:分離部 181:升降移動機構 311、611:吸附部 721:導軌 722:齒條與小齒輪機構 722a:凸輪齒條 722b:小齒輪 722b1:滾子本體 722b2:滾子銷 723:滑動構件 811:X方向導軌 812:支持體 813:滾珠螺桿機構 821:Y方向導軌 822:Y方向滑塊 823:線性馬達 831:Z方向導軌 832:Z方向滑塊 CTL:控制部 P:製品(加工品) RP:保持位置 S:加工屑 DP:修整構件 X1:接收位置 X2:搬送位置 X3:加熱位置 W:密封完畢基板(加工對象物) X、Z、θ:方向 Y:方向(軸方向) 2A, 2B: Cutting table (processing table) 3: The first holding mechanism 4: Cutting mechanism (processing mechanism) 5: Transfer workbench 6: Second holding mechanism 7:Moving mechanism for transportation 8: Moving mechanism for cutting (moving mechanism for processing) 9A, 9B: Rotating mechanism 10A, 10B: Vacuum pump 11:Substrate supply mechanism 12:Liquid supply mechanism 13:Inspection Department 14:Reversal mechanism 17: Processing waste collection department 18:The first cleaning agency 18a, 121: Injection nozzle 19:Second cleaning mechanism 20:Classification agency 21:Pallet 22:Pallet transport mechanism 23:Pallet storage department 24: Blade changing mechanism (processing tool changing mechanism) 241:Adsorption arm 241a: First adsorption part 241b: Second adsorption part 241c: Loading and unloading member rotating part 242:Arm moving mechanism 242a:Y direction moving mechanism 242b:X direction moving mechanism 242a1:Y direction slider 242b1:X direction slider 242b2:X direction guide rail 25:Blade storage department 26: Trimming component storage section 27:Workbench for trimming 31, 61: Adsorption head 40: Rotary tool 41A, 41B: Blade 42A, 42B: Spindle part 43: Inner flange (flange) 44:Outer flange (flange) 45: Loading and unloading components 71:Transmission shaft 72: Main moving mechanism 73: Lifting and moving mechanism 73a:Z direction guide rail 73b: Actuator part 74: Horizontal moving mechanism 74a: Y direction guide rail 74b: Elastomer 74c: Cam mechanism 81:X direction moving part 82:Y direction moving part 83:Z direction moving part 100: Cutting device (processing device) 111: Substrate storage part (processing object storage part) 112:Substrate supply department 113:Substrate heating part 114: Launch organization 114a: Pushing member 114b: Actuator part 115:receiving station 115x: buffer material 115m, 115n: side wall 115A: Move-in table 115B: Move out the table 115j, 115k: actuator 116:Substrate moving part 116a: Fixture Department 116b:X direction moving part 116c:Z direction moving part 117a:Moving track 117b: Sliding member 117c: Ball screw mechanism 117: Taiwan mobile mechanism 118: Positioning mechanism 131:First Inspection Department 132:Second Inspection Department 141:Keep workbench 142:Reversal Department 171:Guide chute 171X: Upper opening 172:Recycling container 173:Separation Department 181: Lifting and moving mechanism 311, 611: Adsorption department 721: Guide rail 722: Rack and pinion mechanism 722a: Cam rack 722b: pinion 722b1:Roller body 722b2:Roller pin 723:Sliding member 811:X direction guide rail 812:Support 813: Ball screw mechanism 821: Y direction guide rail 822:Y direction slider 823: Linear motor 831:Z direction guide rail 832:Z direction slider CTL:Control Department P: products (processed products) RP: maintain position S: Processing chips DP: Trim component X1: receiving position X2:Transportation location X3: Heating position W: Sealed substrate (object to be processed) X, Z, θ: direction Y: direction (axis direction)
圖1為示意性地表示本發明的一實施形態的切斷裝置的結構的圖。 圖2為示意性地表示所述實施形態的切斷用工作台及其周邊結構的立體圖。 圖3為示意性地表示所述實施形態的切斷用工作台及其周邊結構的結構的、自Z方向觀看的圖(平面圖)。 圖4為示意性地表示所述實施形態的切斷用工作台及其周邊結構的結構的、自Y方向觀看的圖(正面圖)。 圖5為示意性地表示所述實施形態的第一保持機構及搬送用移動機構的結構的、自Y方向觀看的圖(正面圖)。 圖6為示意性地表示所述實施形態的第一保持機構及搬送用移動機構的結構的、自X方向觀看的圖(側面圖)。 圖7為示意性地表示所述實施形態的第二保持機構及搬送用移動機構的結構的、自Y方向觀看的圖(正面圖)。 圖8為示意性地表示所述實施形態的齒條與小齒輪(rack and pinion)機構的結構的剖面圖。 圖9為表示所述實施形態的切斷裝置的動作的示意圖。 圖10為示意性地表示所述實施形態的基板供給機構的結構的、自Z方向觀看的圖(平面圖)。 圖11為示意性地表示所述實施形態的基板供給機構的結構的、自Y方向觀看的圖(正面圖)。 圖12為示意性地表示所述實施形態的搬入用台的結構的剖面圖。 圖13的(a)~圖13的(c)為示意性地表示所述實施形態的搬入用台的各位置的、自Z方向觀看的圖(平面圖)。 圖14的(d)及圖14的(e)為示意性地表示所述實施形態的搬出用台的各位置的、自Z方向觀看的圖(平面圖)。 圖15為示意性地表示所述實施形態的刀片更換機構的結構的、自Z方向觀看的圖(平面圖)。 圖16為示意性地表示所述實施形態的切斷機構的結構的剖面圖。 圖17的(a)及圖17的(b)為示意性地表示所述實施形態的基於刀片更換機構的刀片的(a)卸除前的狀態、(b)卸除後的狀態的剖面圖。 圖18的(a)及圖18的(b)為表示所述實施形態的基於刀片更換機構的各刀片的更換狀態的、自Z方向觀看的圖(平面圖)。 圖19的(a)及圖19的(b)為所述實施形態的全切的搬送動作及半切的搬送動作的流程圖。 FIG. 1 is a diagram schematically showing the structure of a cutting device according to an embodiment of the present invention. FIG. 2 is a perspective view schematically showing the cutting table of the embodiment and its surrounding structure. FIG. 3 is a diagram (plan view) viewed from the Z direction, schematically showing the structure of the cutting table and its surrounding structures according to the embodiment. FIG. 4 is a diagram (front view) viewed from the Y direction, schematically showing the structure of the cutting table and its surrounding structures according to the embodiment. 5 is a diagram (front view) viewed from the Y direction, schematically showing the structure of the first holding mechanism and the transport moving mechanism of the embodiment. 6 is a diagram (side view) viewed from the X direction, schematically showing the structure of the first holding mechanism and the transport moving mechanism of the embodiment. 7 is a diagram (front view) viewed from the Y direction schematically showing the structure of the second holding mechanism and the transport moving mechanism of the embodiment. FIG. 8 is a cross-sectional view schematically showing the structure of a rack and pinion mechanism according to the embodiment. Fig. 9 is a schematic diagram showing the operation of the cutting device according to the embodiment. FIG. 10 is a diagram (plan view) viewed from the Z direction, schematically showing the structure of the substrate supply mechanism of the embodiment. FIG. 11 is a diagram (front view) viewed from the Y direction schematically showing the structure of the substrate supply mechanism of the embodiment. FIG. 12 is a cross-sectional view schematically showing the structure of the loading table according to the embodiment. 13(a) to 13(c) are views (plan views) schematically illustrating respective positions of the loading table according to the embodiment, viewed from the Z direction. 14(d) and 14(e) are views (plan views) viewed from the Z direction, schematically showing each position of the carry-out table according to the embodiment. FIG. 15 is a diagram (plan view) viewed from the Z direction schematically showing the structure of the blade replacement mechanism of the embodiment. FIG. 16 is a cross-sectional view schematically showing the structure of the cutting mechanism of the embodiment. 17(a) and 17(b) are cross-sectional views schematically showing (a) a state before removal and (b) a state after removal of the blade using the blade replacement mechanism of the embodiment. . 18(a) and 18(b) are views (plan views) viewed from the Z direction showing the replacement state of each blade by the blade replacement mechanism of the embodiment. 19(a) and 19(b) are flowcharts of the full-cut conveying operation and the half-cut conveying operation of the embodiment.
2A、2B:切斷用工作台(加工工作台) 2A, 2B: Cutting table (processing table)
3:第一保持機構 3: The first holding mechanism
7:搬送用移動機構 7:Moving mechanism for transportation
8:切斷用移動機構(加工用移動機構) 8: Moving mechanism for cutting (moving mechanism for processing)
9A、9B:旋轉機構 9A, 9B: Rotating mechanism
11:基板供給機構 11:Substrate supply mechanism
24:刀片更換機構(加工工具更換機構) 24: Blade replacement mechanism (processing tool replacement mechanism)
25:刀片收容部 25:Blade storage department
26:修整構件收容部 26: Trimming component storage section
27:修整用工作台 27:Workbench for trimming
40:旋轉工具 40: Rotary tool
41A、41B:刀片 41A, 41B: Blade
42A、42B:心軸部 42A, 42B: Spindle part
71:傳遞軸 71:Transmission shaft
81:X方向移動部 81:X direction moving part
111:基板收容部(加工對象物收容部) 111: Substrate storage part (processing object storage part)
113:基板加熱部 113:Substrate heating part
114:推出機構 114: Launch organization
114a:推壓構件 114a: Pushing member
114b:致動器部 114b: Actuator part
115:接收台 115:receiving station
115A:搬入用台 115A: Move-in table
115B:搬出用台 115B: Move out the table
116:基板移動部 116:Substrate moving part
117:台移動機構 117: Taiwan mobile mechanism
117a:移動軌道 117a:Moving track
117b:滑動構件 117b: Sliding member
117c:滾珠螺桿機構 117c: Ball screw mechanism
241:吸附臂 241:Adsorption arm
242:臂移動機構 242:Arm moving mechanism
811:X方向導軌 811:X direction guide rail
812:支持體 812:Support
DP:修整構件 DP: Trim component
W:密封完畢基板(加工對象物) W: Sealed substrate (object to be processed)
X1:接收位置 X1: receiving position
X、Z、θ:方向 X, Z, θ: direction
Y:方向(軸方向) Y: direction (axis direction)
Claims (8)
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