TWI830259B - Processing device and method of manufacturing processed product - Google Patents
Processing device and method of manufacturing processed product Download PDFInfo
- Publication number
- TWI830259B TWI830259B TW111122761A TW111122761A TWI830259B TW I830259 B TWI830259 B TW I830259B TW 111122761 A TW111122761 A TW 111122761A TW 111122761 A TW111122761 A TW 111122761A TW I830259 B TWI830259 B TW I830259B
- Authority
- TW
- Taiwan
- Prior art keywords
- processing
- processed
- moving
- product
- cutting
- Prior art date
Links
- 238000012545 processing Methods 0.000 title claims abstract description 155
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 230000007246 mechanism Effects 0.000 claims abstract description 426
- 238000012546 transfer Methods 0.000 claims abstract description 63
- 230000005540 biological transmission Effects 0.000 claims abstract description 50
- 238000003860 storage Methods 0.000 claims abstract description 21
- 230000033001 locomotion Effects 0.000 claims description 39
- 230000032258 transport Effects 0.000 claims description 37
- 230000002950 deficient Effects 0.000 claims description 29
- 238000003384 imaging method Methods 0.000 claims description 25
- 230000007723 transport mechanism Effects 0.000 claims description 10
- 239000002699 waste material Substances 0.000 claims description 10
- 238000009434 installation Methods 0.000 claims description 9
- 238000005520 cutting process Methods 0.000 description 151
- 239000000758 substrate Substances 0.000 description 69
- 238000007689 inspection Methods 0.000 description 35
- 238000001179 sorption measurement Methods 0.000 description 33
- 238000004140 cleaning Methods 0.000 description 29
- 238000010586 diagram Methods 0.000 description 11
- 238000011084 recovery Methods 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 10
- 238000003780 insertion Methods 0.000 description 9
- 230000037431 insertion Effects 0.000 description 9
- 238000003754 machining Methods 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000007788 liquid Substances 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67236—Apparatus for manufacturing or treating in a plurality of work-stations the substrates being processed being not semiconductor wafers, e.g. leadframes or chips
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/06—Grinders for cutting-off
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67271—Sorting devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67333—Trays for chips
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Robotics (AREA)
- Dicing (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
本發明不需要使加工台移動的移動機構,並且將經單片化的加工對象物收容於筒狀容器,包括:加工台,保持加工對象物;第一保持機構,為了將所述加工對象物搬送至所述加工台而保持所述加工對象物;加工機構,將保持於所述加工台的所述加工對象物切斷而單片化;移載台,移動藉由所述加工機構而單片化的所述加工對象物;第二保持機構,為了將所述經單片化的所述加工對象物自所述加工台搬送至所述移載台而保持所述經單片化的所述加工對象物;搬送用移動機構,具有沿著所述加工台及所述移載台的排列方向延伸且用以使所述第一保持機構及所述第二保持機構移動的共用的傳遞軸;加工用移動機構,使所述加工機構於水平面上於沿著所述傳遞軸的第一方向及與所述第一方向正交的第二方向上分別移動;容器設置部,用來設置自一端開口部收容所述經單片化的所述加工對象物的筒狀容器;以及搬送收容機構,將所述經單片化的所述加工對象物自所述移載台搬送至設置於所述容器設置部上的所述筒狀容器來收容。The present invention does not require a moving mechanism to move the processing table, and stores the individualized processing objects in a cylindrical container. The invention includes: a processing table to hold the processing objects; and a first holding mechanism to hold the processing objects. The object to be processed is transported to the processing table and held therein; a processing mechanism cuts the object to be processed held on the processing table into individual pieces; and the transfer table is moved individually by the processing mechanism. the pieced object to be processed; and a second holding mechanism that holds the pieced object in order to transport the object to be processed from the processing table to the transfer table. The object to be processed; a moving mechanism for transport, having a common transmission shaft extending along the arrangement direction of the processing table and the transfer table and for moving the first holding mechanism and the second holding mechanism. ; Processing moving mechanism to move the processing mechanism on the horizontal plane in the first direction along the transmission axis and in the second direction orthogonal to the first direction; the container setting part is used to set the automatic a cylindrical container with an opening at one end for accommodating the individualized processing objects; and a transport and storage mechanism for transporting the individualized processing objects from the transfer table to a location provided The cylindrical container is stored on the container setting part.
Description
本發明是有關於一種加工裝置、及加工品的製造方法。The present invention relates to a processing device and a method for manufacturing processed products.
先前,如專利文獻1所示,於切斷系統中,考慮下述結構,即:條帶拾取器(strip picker)於X軸方向上移動,將半導體條帶自裝載裝置移送至切斷裝置的卡盤台,卡盤台吸附半導體條帶並於Y軸方向上移動至系統後方,之後,藉由心軸將半導體條帶切斷成半導體封裝體。另外,卡盤台設為使用滾珠絲桿(滾珠螺桿機構)而於Y軸方向上移動的結構。再者,作為收容經切斷的半導體封裝體的構件,如專利文獻2所示,考慮收納於被稱為棒(stick)的方筒狀的透明殼體中的構件。Previously, as shown in Patent Document 1, in a cutting system, a structure in which a strip picker moves in the X-axis direction and transfers a semiconductor strip from a loading device to a cutting device has been considered. The chuck table absorbs the semiconductor strip and moves it to the rear of the system in the Y-axis direction. After that, the semiconductor strip is cut into semiconductor packages by a mandrel. In addition, the chuck table is configured to move in the Y-axis direction using a ball screw (ball screw mechanism). Furthermore, as a member for accommodating the cut semiconductor package, as shown in Patent Document 2, a member accommodated in a rectangular tube-shaped transparent case called a stick can be considered.
然而,於所述切斷系統中,由於使用滾珠絲桿使卡盤台移動來進行切斷,因此於實際的切斷時,例如如專利文獻3所示,需要設置保護滾珠絲桿免受加工水或加工屑影響的蛇腹構件,進而需要為了保護蛇腹構件而於蛇腹構件上設置多個板構件。其結果,裝置結構變得複雜。However, in the cutting system, since the ball screw is used to move the chuck table for cutting, during actual cutting, as shown in Patent Document 3, for example, it is necessary to provide a protection device for the ball screw from processing. The bellows member affected by water or machining debris further requires a plurality of plate members to be provided on the bellows member in order to protect the bellows member. As a result, the device structure becomes complicated.
另外,於所述切斷系統中,不僅於X軸方向上移送半導體條帶,而且為了切斷半導體條帶而於Y軸方向上移送至系統後方,因此裝置的佔據面積(footprint)變大。 [現有技術文獻] [專利文獻] In addition, in the cutting system, the semiconductor strip is moved not only in the X-axis direction but also in the Y-axis direction to the rear of the system in order to cut the semiconductor strip, so the footprint of the device becomes larger. [Prior art documents] [Patent Document]
[專利文獻1]日本專利特表2007-536727號公報 [專利文獻2]日本專利實開昭63-131902號公報 [專利文獻3]日本專利特開2004-186361號公報 [Patent Document 1] Japanese Patent Publication No. 2007-536727 [Patent Document 2] Japanese Patent Application Publication No. Sho 63-131902 [Patent Document 3] Japanese Patent Application Laid-Open No. 2004-186361
[發明所欲解決之課題][Problem to be solved by the invention]
因此,本發明是為了解決所述問題點而成,其主要課題在於,不需要使保持加工對象物的加工台移動的移動機構,並且將經單片化的加工對象物收容於筒狀容器。 [解決課題之手段] Therefore, the present invention is made to solve the above-mentioned problems, and its main object is to accommodate the individualized processing objects in a cylindrical container without requiring a moving mechanism for moving the processing table holding the processing object. [Means to solve the problem]
即,本發明的加工裝置的特徵在於包括:加工台,保持加工對象物;第一保持機構,為了將所述加工對象物搬送至所述加工台而保持所述加工對象物;加工機構,將保持於所述加工台的所述加工對象物切斷而單片化;移載台,移動藉由所述加工機構而單片化的所述加工對象物;第二保持機構,為了將所述經單片化的所述加工對象物自所述加工台搬送至所述移載台而保持所述經單片化的所述加工對象物;搬送用移動機構,具有沿著所述加工台及所述移載台的排列方向延伸且用以使所述第一保持機構及所述第二保持機構移動的共用的傳遞軸;加工用移動機構,使所述加工機構於水平面上於沿著所述傳遞軸的第一方向及與所述第一方向正交的第二方向上分別移動;容器設置部,用來設置自一端開口部收容所述經單片化的所述加工對象物的筒狀容器;以及搬送收容機構,將所述經單片化的所述加工對象物自所述移載台搬送至設置於所述容器設置部上的所述筒狀容器來收容。 [發明的效果] That is, the processing apparatus of the present invention is characterized by including: a processing table that holds an object to be processed; a first holding mechanism that holds the object to be processed in order to transport the object to the processing table; and a processing mechanism that holds the object to be processed. The object to be processed held on the processing table is cut into pieces; the transfer table moves the object to be processed into pieces by the processing mechanism; and the second holding mechanism is to separate the object into pieces. The singulated object to be processed is transported from the processing table to the transfer table to hold the object to be processed into individual pieces; a transport moving mechanism has a moving mechanism along the processing table and A common transmission axis extends in the arrangement direction of the transfer table and is used to move the first holding mechanism and the second holding mechanism; a processing moving mechanism allows the processing mechanism to move along the horizontal plane The transmission shaft moves in a first direction and a second direction orthogonal to the first direction respectively; a container setting part is used to set a cylinder for receiving the singulated object to be processed from an opening at one end. a container; and a transport and storage mechanism that transports the individualized processing objects from the transfer table to and stores the cylindrical container provided on the container setting part. [Effects of the invention]
根據如此構成的本發明,可不需要使保持加工對象物的加工台移動的移動機構,並且將經單片化的加工對象物收容於筒狀容器。According to the invention configured in this way, it is possible to accommodate the individualized processing objects in the cylindrical container without the need for a moving mechanism for moving the processing table holding the processing object.
接著,舉例對本發明進行更詳細說明。但是,本發明不由以下的說明限定。Next, the present invention will be described in more detail using examples. However, the present invention is not limited by the following description.
如所述般,本發明的加工裝置的特徵在於包括:加工台,保持加工對象物;第一保持機構,為了將所述加工對象物搬送至所述加工台而保持所述加工對象物;加工機構,將保持於所述加工台的所述加工對象物切斷而單片化;移載台,移動藉由所述加工機構而單片化的所述加工對象物;第二保持機構,為了將所述經單片化的所述加工對象物自所述加工台搬送至所述移載台而保持所述經單片化的所述加工對象物;搬送用移動機構,具有沿著所述加工台及所述移載台的排列方向延伸且用以使所述第一保持機構及所述第二保持機構移動的共用的傳遞軸;加工用移動機構,使所述加工機構於水平面上於沿著所述傳遞軸的第一方向及與所述第一方向正交的第二方向上分別移動;容器設置部,用來設置自一端開口部收容所述經單片化的所述加工對象物的筒狀容器;以及搬送收容機構,將所述經單片化的所述加工對象物自所述移載台搬送至設置於所述容器設置部上的所述筒狀容器來收容。As described above, the processing apparatus of the present invention is characterized by including: a processing table that holds the object to be processed; and a first holding mechanism that holds the object to be processed in order to transport the object to the processing table; a mechanism that cuts and separates the object to be processed held on the processing table; a transfer table that moves the object to be processed that is separated into individual pieces by the processing mechanism; and a second holding mechanism to transporting the singulated object to be processed from the processing table to the transfer table and retaining the singulated object to be processed; and a transport moving mechanism having a moving mechanism along the A common transmission shaft extends in the arrangement direction of the processing table and the transfer table and is used to move the first holding mechanism and the second holding mechanism; a processing moving mechanism to move the processing mechanism on a horizontal plane Move along the first direction of the transmission axis and the second direction orthogonal to the first direction respectively; a container setting part is used to set the single-piece processing object from the opening at one end. a cylindrical container of objects; and a transport and storage mechanism that transports the singulated object to be processed from the transfer table to the cylindrical container provided on the container setting part for storage.
若為所述加工裝置,則採用藉由沿著加工台及移載台的排列方向延伸的共用的傳遞軸使第一保持機構及第二保持機構移動的結構,藉由加工用移動機構使加工機構於水平面上於沿著傳遞軸的第一方向及與所述第一方向正交的第二方向上分別移動,因此無需使加工台於第一方向及第二方向上移動便可將加工對象物單片化。因此,可不藉由滾珠螺桿機構等使加工台移動,而無需用以保護滾珠螺桿機構等的蛇腹構件及用以保護該蛇腹構件的蓋構件。其結果,可使加工裝置的裝置結構簡化。 另外,由於成為加工台不於水平面上於第一方向及第二方向上移動的結構,因此可削減加工台的移動空間及其周邊的無用空間,可減少加工裝置的佔據面積。 進而,可藉由搬送收容機構將經單片化的加工對象物自移載台搬送至設置於容器設置部上的筒狀容器,並自該筒狀容器的一端開口部收容經單片化的加工對象物。 In the above-mentioned processing device, a structure is adopted in which the first holding mechanism and the second holding mechanism are moved by a common transmission shaft extending along the arrangement direction of the processing table and the transfer table, and the processing movement mechanism is used to perform processing. The mechanism moves respectively in the first direction along the transmission axis and the second direction orthogonal to the first direction on the horizontal plane, so the processing object can be processed without moving the processing table in the first direction and the second direction. Monolithization of things. Therefore, the processing table can be moved without using a ball screw mechanism or the like, and a bellows member for protecting the ball screw mechanism or the like and a cover member for protecting the bellows member are not required. As a result, the device structure of the processing device can be simplified. In addition, since the processing table is configured not to move in the first direction and the second direction on the horizontal plane, the movement space of the processing table and the useless space around it can be reduced, and the occupied area of the processing device can be reduced. Furthermore, the individualized processing objects can be transported from the transfer stage to the cylindrical container provided on the container setting part by the transportation and storage mechanism, and the individualized objects can be accommodated from the one end opening of the cylindrical container. Processing object.
作為傳遞軸及加工用移動機構的具體的配置態樣,理想的是所述傳遞軸以於所述加工用移動機構的上方橫穿所述加工用移動機構的方式配置。 若為所述結構,則可使沿著傳遞軸移動的第一保持機構於加工用移動機構的上方移動,從而可防止第一保持機構與加工用移動機構發生物理干擾。另外,可使沿著傳遞軸移動的第二保持機構於加工用移動機構的上方移動,從而可防止第二保持機構與加工用移動機構發生物理干擾。 As a specific arrangement aspect of the transmission shaft and the processing moving mechanism, it is desirable that the transmission shaft is arranged above the processing moving mechanism and crosses the processing moving mechanism. According to the above structure, the first holding mechanism that moves along the transmission axis can be moved above the processing moving mechanism, thereby preventing physical interference between the first holding mechanism and the processing moving mechanism. In addition, the second holding mechanism that moves along the transmission axis can be moved above the processing moving mechanism, thereby preventing physical interference between the second holding mechanism and the processing moving mechanism.
作為搬送收容機構的具體的實施態樣,理想的是所述搬送收容機構包括:中間台,暫時載置所述經單片化的所述加工對象物;第一搬送機構,將所述經單片化的所述加工對象物自所述移載台搬送至所述中間台;以及第二搬送機構,將所述經單片化的所述加工對象物自所述中間台搬送至設置於所述容器設置部上的所述筒狀容器來收容。As a specific embodiment of the transport and accommodating mechanism, it is desirable that the transport and accommodating mechanism includes: an intermediate table for temporarily placing the singulated object to be processed; and a first transport mechanism for transferring the single-piece processing object. The pieced processing object is transported from the transfer stage to the intermediate stage; and a second conveying mechanism transports the individualized processing object from the intermediate stage to the intermediate stage. The cylindrical container is stored on the container setting part.
為了可確認或檢查經單片化的加工對象物的狀態,理想的是更包括攝像部,所述攝像部對由所述第一搬送機構保持的所述經單片化的所述加工對象物、或載置於所述移載台的所述經單片化的所述加工對象物進行拍攝。In order to confirm or inspect the state of the individualized processing objects, it is desirable to further include an imaging unit that captures the individualized processing objects held by the first conveying mechanism. , or the singulated processing object placed on the transfer stage is photographed.
為了自動地進行經單片化的加工對象物的良品或不良品的判定,理想的是更包括判定部,所述判定部使用由所述攝像部獲得的攝像資料,進行所述經單片化的所述加工對象物的良否判定。In order to automatically determine whether the individualized processing object is a good product or a defective product, it is desirable to further include a determination unit that performs the singulation process using the imaging data obtained by the imaging unit. The quality judgment of the processing object.
為了基於判定部的判定結果自動地對良品與不良品進行分類,理想的是更包括分類機構,所述分類機構對由所述判定部判定為不良品的所述經單片化的所述加工對象物進行分類。In order to automatically classify good products and defective products based on the judgment results of the judgment unit, it is desirable to further include a classification mechanism that classifies the processed individual pieces that are judged to be defective products by the judgment unit. Classify objects.
作為分類機構的具體的配置態樣,理想的是所述分類機構設置於所述第二搬送機構。As a specific arrangement aspect of the sorting mechanism, it is desirable that the sorting mechanism is provided in the second transport mechanism.
作為分類機構的具體的實施態樣,理想的是所述分類機構於將由所述判定部判定為良品的所述經單片化的所述加工對象物引導至所述筒狀容器的良品路線、與用以將由所述判定部判定為不良品的所述加工對象物廢棄至廢棄容器的不良品路線之間進行切換。As a specific embodiment of the sorting mechanism, it is desirable that the sorting mechanism guides the singulated processing object determined as a good product by the determination unit to a good product line of the cylindrical container, Switching is performed between a defective product route for discarding the processing object determined as a defective product by the determination unit to a waste container.
作為使加工機構至少於作為第一方向的X方向及作為第二方向的Y方向上移動的移動機構的具體的實施態樣,理想的是所述加工用移動機構包括:X方向移動部,使所述加工機構於X方向上直線移動;以及Y方向移動部,使所述加工機構於Y方向上直線移動,所述X方向移動部具有:一對X方向導軌,隔著所述加工台沿著X方向設置;以及支撐體,沿著所述一對X方向導軌移動並且經由所述Y方向移動部支撐所述加工機構。 若為所述結構,則由於在X方向上設置的一對X方向導軌隔著加工台而設置,因此可增大一對X方向導軌的間距。其結果,可減小X方向導軌彼此的Z方向的位置偏移對加工造成的影響。即,可減小旋轉工具(例如刀片)與加工台的正交度的偏移,可提高加工精度。另外,對於X方向導軌,可使用規格較先前低的導軌。 As a specific embodiment of the moving mechanism that moves the processing mechanism in at least the X direction as the first direction and the Y direction as the second direction, it is desirable that the processing moving mechanism includes an X-direction moving portion that moves The processing mechanism moves linearly in the X direction; and the Y direction moving part makes the processing mechanism linearly move in the Y direction. The X direction moving part has: a pair of and a support body that moves along the pair of X-direction guide rails and supports the processing mechanism via the Y-direction moving part. According to the above structure, since the pair of X-direction guide rails provided in the X-direction are provided across the processing table, the distance between the pair of X-direction guide rails can be increased. As a result, the influence on processing caused by the positional deviation of the X-direction guide rails in the Z-direction can be reduced. That is, the deviation of the orthogonality between the rotating tool (such as a blade) and the machining table can be reduced, and machining accuracy can be improved. In addition, for the X-direction guide rail, a guide rail with a lower specification than before can be used.
另外,使用所述加工裝置來製造加工品的、加工品的製造方法亦為本發明的一態樣。In addition, a method for manufacturing a processed product using the processing device is also an aspect of the present invention.
<本發明的一實施形態> 以下,參照圖式對本發明的加工裝置的一實施形態進行說明。再者,關於以下所示的任一圖,均為了容易理解而適當省略或誇張地示意性地描繪。對相同的構成部件標註相同符號,適當省略說明。 <One embodiment of the present invention> Hereinafter, one embodiment of the processing device of the present invention will be described with reference to the drawings. In addition, any of the figures shown below are omitted as appropriate or schematically drawn in an exaggerated manner for easy understanding. The same components are labeled with the same symbols, and descriptions are omitted where appropriate.
<加工裝置的整體結構> 本實施形態的加工裝置100為切斷裝置,所述切斷裝置藉由將作為加工對象物的密封完畢基板W切斷,而單片化為多個作為加工品的製品P。 <Overall structure of processing equipment> The processing device 100 of this embodiment is a cutting device that cuts the sealed substrate W as the processing object into individual pieces into a plurality of products P as the processed product.
此處,所謂密封完畢基板W,是對連接有半導體晶片、電阻元件、電容器元件等電子元件的基板,以至少對電子元件進行樹脂密封的方式進行了樹脂成形而成。作為構成密封完畢基板W的基板,可使用引線框架、印刷配線板,除了該些以外,亦可使用半導體製基板(包含矽晶圓等半導體晶圓)、金屬製基板、陶瓷製基板、玻璃製基板、樹脂製基板等。另外,對於構成密封完畢基板W的基板,可實施配線亦可不實施配線。Here, the sealed substrate W is a substrate to which electronic components such as semiconductor wafers, resistive elements, and capacitor elements are connected, and is formed by resin molding so as to resin seal at least the electronic components. As the substrate constituting the sealed substrate W, a lead frame or a printed wiring board can be used. In addition to these, a semiconductor substrate (including a semiconductor wafer such as a silicon wafer), a metal substrate, a ceramic substrate, a glass substrate can also be used. substrate, resin substrate, etc. In addition, wiring may or may not be implemented on the substrate constituting the sealed substrate W.
另外,本實施形態的密封完畢基板W及製品P的其中一個面成為之後用來安裝的安裝面。於本實施形態的說明中,將之後用來安裝的其中一個面記載「安裝面」,將其相反側的面記載為「相反面」。In addition, one of the surfaces of the sealed substrate W and product P of this embodiment becomes the mounting surface used for subsequent mounting. In the description of this embodiment, one of the surfaces used for mounting later will be described as the "mounting surface", and the surface on the opposite side will be described as the "opposite surface".
具體而言,如圖1所示,切斷裝置100包括:兩個切斷用台(加工台)2A、2B,保持密封完畢基板W;第一保持機構3,為了將密封完畢基板W搬送至切斷用台2A、切斷用台2B而保持密封完畢基板W;切斷機構(加工機構)4,將保持於切斷用台2A、切斷用台2B的密封完畢基板W切斷;移載台5,移動多個製品P;第二保持機構6,為了將多個製品P自切斷用台2A、切斷用台2B搬送至移載台5而保持多個製品P;搬送用移動機構7,具有用以使第一保持機構3及第二保持機構6移動的共用的傳遞軸71;以及切斷用移動機構(加工用移動機構)8,使切斷機構4相對於保持於切斷用台2A、切斷用台2B的密封完畢基板W移動。再者,由第一保持機構3及搬送用移動機構7構成搬送密封完畢基板W的搬送機構(裝載機),由第二保持機構6及搬送用移動機構7構成搬送多個製品P的搬送機構(卸載機)。Specifically, as shown in FIG. 1 , the cutting device 100 includes two cutting tables (processing tables) 2A and 2B that hold the sealed substrate W; and a first holding mechanism 3 that transports the sealed substrate W to The cutting tables 2A and 2B hold the sealed substrate W; the cutting mechanism (processing mechanism) 4 cuts the sealed substrate W held on the cutting tables 2A and 2B; and moves The carrier 5 moves a plurality of products P; the second holding mechanism 6 holds a plurality of products P in order to transport the plurality of products P from the cutting table 2A and the cutting table 2B to the transfer table 5; the transfer movement The mechanism 7 has a common transmission shaft 71 for moving the first holding mechanism 3 and the second holding mechanism 6; and a cutting moving mechanism (processing moving mechanism) 8 to hold the cutting mechanism 4 relative to the cutting mechanism. The sealed substrate W of the cutting table 2A and the cutting table 2B moves. Furthermore, the first holding mechanism 3 and the conveying moving mechanism 7 constitute a conveying mechanism (loader) for conveying the sealed substrate W, and the second holding mechanism 6 and the conveying moving mechanism 7 constitute a conveying mechanism for conveying the plurality of products P. (Unloader).
於以下的說明中,將沿著切斷用台2A、切斷用台2B的上表面的平面(水平面)內相互正交的方向分別設為作為第一方向的X方向及作為第二方向的Y方向,將與X方向及Y方向正交的鉛垂方向設為Z方向。具體而言,將圖1的左右方向設為X方向,將上下方向設為Y方向。雖將後述,但X方向為支撐體812的移動方向,而且為與門型支撐體812的架設有一對腳部的樑部(橫樑部)的長度方向(樑部延伸的方向)正交的方向(參照圖2及圖3)。In the following description, the directions orthogonal to each other in the plane (horizontal plane) along the upper surfaces of the cutting tables 2A and 2B are respectively referred to as the X direction as the first direction and the second direction. In the Y direction, let the vertical direction orthogonal to the X direction and the Y direction be the Z direction. Specifically, let the left-right direction in FIG. 1 be the X direction, and let the up-down direction be the Y direction. Although it will be described later, the X direction is the moving direction of the support body 812 and is a direction orthogonal to the longitudinal direction (the direction in which the beam portion extends) of the beam portion (cross beam portion) of the door-shaped support body 812 that spans a pair of legs. (Refer to Figure 2 and Figure 3).
<切斷用台2A、切斷用台2B> 兩個切斷用台2A、2B於X方向、Y方向及Z方向上固定地設置。再者,切斷用台2A能夠藉由設置於切斷用台2A之下的旋轉機構9A於θ方向上旋轉。另外,切斷用台2B能夠藉由設置於切斷用台2B之下的旋轉機構9B於θ方向上旋轉。 <Cutting table 2A, cutting table 2B> The two cutting tables 2A and 2B are fixedly installed in the X direction, the Y direction, and the Z direction. Furthermore, the cutting table 2A can be rotated in the θ direction by the rotation mechanism 9A provided below the cutting table 2A. In addition, the cutting table 2B can be rotated in the θ direction by the rotation mechanism 9B provided below the cutting table 2B.
該些兩個切斷用台2A、2B於水平面上沿著X方向設置。具體而言,兩個切斷用台2A、2B以該些的上表面位於同一水平面上(於Z方向位於相同高度位置)的方式配置(參照圖4),並且以該些上表面的中心(具體而言為基於旋轉機構9A、旋轉機構9B的旋轉中心)位於沿X方向延伸的同一直線上的方式配置(參照圖2及圖3)。These two cutting tables 2A and 2B are installed along the X direction on the horizontal plane. Specifically, the two cutting tables 2A and 2B are arranged so that their upper surfaces are on the same horizontal plane (at the same height position in the Z direction) (see FIG. 4 ), and the center of the upper surfaces ( Specifically, they are arranged so that the rotation centers of the rotating mechanisms 9A and 9B are located on the same straight line extending in the X direction (see FIGS. 2 and 3 ).
另外,兩個切斷用台2A、2B吸附保持密封完畢基板W,如圖1所示,與兩個切斷用台2A、2B對應地配置有用以吸附保持的兩個真空泵10A、10B。各真空泵10A、10B例如為水封式真空泵。In addition, the two cutting tables 2A and 2B suction and hold the sealed substrate W. As shown in FIG. 1 , two vacuum pumps 10A and 10B are arranged corresponding to the two cutting tables 2A and 2B for suction and holding. Each of the vacuum pumps 10A and 10B is, for example, a water-sealed vacuum pump.
此處,切斷用台2A、切斷用台2B於XYZ方向上經固定,因此可縮短自真空泵10A、真空泵10B連接於切斷用台2A、切斷用台2B的配管(未圖示),可減少配管的壓力損失,而防止吸附力的降低。其結果,即便為例如1 mm見方以下的極小封裝體,亦能可靠地吸附於切斷用台2A、切斷用台2B。另外,可防止配管的壓力損失所致的吸附力的降低,因此可減小真空泵10A、真空泵10B的容量,有助於小型化或成本降低。Here, since the cutting table 2A and the cutting table 2B are fixed in the XYZ direction, the pipes (not shown) connected from the vacuum pump 10A and the vacuum pump 10B to the cutting table 2A and the cutting table 2B can be shortened. , which can reduce the pressure loss in the piping and prevent the reduction of adsorption force. As a result, even an extremely small package, for example, 1 mm square or less, can be reliably attracted to the cutting tables 2A and 2B. In addition, it is possible to prevent the reduction in adsorption force due to pressure loss in the piping, so that the capacity of the vacuum pump 10A and the vacuum pump 10B can be reduced, which contributes to downsizing and cost reduction.
<第一保持機構3> 如圖1所示,第一保持機構3為了將密封完畢基板W自基板供給機構11搬送至切斷用台2A、切斷用台2B而保持密封完畢基板W。如圖5及圖6所示,所述第一保持機構3具有:吸附頭31,設置有用以吸附保持密封完畢基板W的多個吸附部311;以及真空泵(未圖示),連接於該吸附頭31的吸附部311。而且,吸附頭31藉由後述的搬送用移動機構7等移動至所期望的位置,藉此將密封完畢基板W自基板供給機構11搬送至切斷用台2A、切斷用台2B。 <First holding mechanism 3> As shown in FIG. 1 , the first holding mechanism 3 holds the sealed substrate W in order to transport the sealed substrate W from the substrate supply mechanism 11 to the cutting stages 2A and 2B. As shown in FIGS. 5 and 6 , the first holding mechanism 3 has: an adsorption head 31 provided with a plurality of adsorption portions 311 for adsorbing and holding the sealed substrate W; and a vacuum pump (not shown) connected to the adsorption unit. The suction part 311 of the head 31. Then, the suction head 31 is moved to a desired position by the conveyance moving mechanism 7 described below, etc., thereby conveying the sealed substrate W from the substrate supply mechanism 11 to the cutting stages 2A and 2B.
如圖1所示,基板供給機構11具有:基板收容部111,自外部收容多個密封完畢基板W;以及基板供給部112,使收容於該基板收容部111的密封完畢基板W移動至由第一保持機構3吸附保持的保持位置RP。所述保持位置RP是以於X方向上與兩個切斷用台2A、2B成為同行的方式設定。再者,基板供給機構11亦可具有為了使由第一保持機構3吸附的密封完畢基板W為柔軟的狀態以容易吸附而對所述密封完畢基板W進行加熱的加熱部113。As shown in FIG. 1 , the substrate supply mechanism 11 has: a substrate accommodating part 111 for accommodating a plurality of sealed substrates W from the outside; and a substrate supply part 112 for moving the sealed substrates W accommodated in the substrate accommodating part 111 to a first position. A holding mechanism 3 adsorbs and holds the holding position RP. The holding position RP is set so as to be aligned with the two cutting tables 2A and 2B in the X direction. Furthermore, the substrate supply mechanism 11 may have a heating unit 113 that heats the sealed substrate W adsorbed by the first holding mechanism 3 in order to make the sealed substrate W soft and easy to adsorb.
<切斷機構4> 如圖1、圖2及圖3所示,作為加工機構的切斷機構4具有包含刀片41A、刀片41B及兩個心軸部42A、42B的兩個旋轉工具40。兩個心軸部42A、42B以該些的旋轉軸沿著Y方向的方式設置,安裝於該些心軸部的刀片41A、刀片41B以相互相向的方式配置(參照圖3)。心軸部42A的刀片41A及心軸部42B的刀片41B藉由在包含X方向及Z方向的面內旋轉,而將保持於各切斷用台2A、2B的密封完畢基板W切斷。再者,如圖4所示,於本實施形態的切斷裝置100設置有液體供給機構12,所述液體供給機構12具有為了抑制由刀片41A、刀片41B產生的摩擦熱而噴射切削水(加工液)的噴射噴嘴121。所述噴射噴嘴121例如支撐於後述的Z方向移動部83。 <Cutting mechanism 4> As shown in FIGS. 1 , 2 , and 3 , the cutting mechanism 4 as a processing mechanism includes two rotating tools 40 including a blade 41A, a blade 41B, and two spindle portions 42A and 42B. The two spindle parts 42A and 42B are provided with their rotation axes along the Y direction, and the blades 41A and 41B attached to the spindle parts are arranged to face each other (see FIG. 3 ). The blade 41A of the spindle part 42A and the blade 41B of the spindle part 42B cut the sealed substrate W held on each cutting table 2A, 2B by rotating in the plane including the X direction and the Z direction. Furthermore, as shown in FIG. 4 , the cutting device 100 of this embodiment is provided with a liquid supply mechanism 12 having a function of injecting cutting water in order to suppress the frictional heat generated by the blades 41A and 41B (processing). liquid) injection nozzle 121. The injection nozzle 121 is supported by, for example, a Z-direction moving portion 83 described below.
<移載台5> 如圖1所示,本實施形態的移載台5為移動由後述的檢查部13進行了檢查的多個製品P的台。所述移載台5被稱為所謂索引台,暫時載置多個製品P。另外,如圖1及圖9所示,移載台5設置成能夠沿著Y方向移動,於藉由第二保持機構6載置多個製品P的移載位置X1與藉由搬送收容機構22搬送多個製品P的取出位置X2之間移動。再者,移載位置X1設定於較傳遞軸71更靠近前側處,且是與兩個切斷用台2A、2B於水平面上沿著X方向配置成一行的位置,取出位置X2設定於較傳遞軸71更靠裏側處。 <Transfer stage 5> As shown in FIG. 1 , the transfer stage 5 of this embodiment is a stage that moves a plurality of products P inspected by an inspection unit 13 to be described later. The transfer table 5 is called a so-called index table, and a plurality of products P are temporarily placed thereon. In addition, as shown in FIGS. 1 and 9 , the transfer stage 5 is provided movably in the Y direction, and is located at the transfer position X1 where a plurality of products P are placed by the second holding mechanism 6 and by the transport and storage mechanism 22 The plurality of products P are transported between the take-out positions X2. Furthermore, the transfer position X1 is set closer to the front side than the transfer shaft 71 and is arranged in line with the two cutting tables 2A and 2B on the horizontal plane in the X direction, and the take-out position X2 is set closer to the transfer shaft 71 . The shaft 71 is further inside.
<檢查部13> 此處,如圖1所示,檢查部13設置於切斷用台2A、切斷用台2B與移載台5之間,對保持於第二保持機構6的多個製品P進行檢查。本實施形態的檢查部13具有檢查製品P的相反面的第一檢查部131、以及檢查製品P的安裝面的第二檢查部132。第一檢查部131為具有用以檢查相反面的光學系統的攝像相機,第二檢查部132為具有用以檢查安裝面的光學系統的攝像相機。再者,亦可將第一檢查部131及第二檢查部132設為共用。 <Inspection Department 13> Here, as shown in FIG. 1 , the inspection unit 13 is provided between the cutting table 2A, the cutting table 2B, and the transfer table 5 , and inspects a plurality of products P held by the second holding mechanism 6 . The inspection unit 13 of this embodiment includes a first inspection unit 131 that inspects the opposite surface of the product P, and a second inspection unit 132 that inspects the mounting surface of the product P. The first inspection unit 131 is an imaging camera having an optical system for inspecting the opposite surface, and the second inspection unit 132 is an imaging camera having an optical system for inspecting the mounting surface. Furthermore, the first inspection part 131 and the second inspection part 132 may be shared.
另外,為了能夠藉由檢查部13來檢查多個製品P的兩面,設置有使多個製品P反轉的反轉機構14(參照圖1)。所述反轉機構14具有保持多個製品P的保持台141、以及使該保持台141以成為表背相反的方式反轉的馬達等反轉部142。In addition, in order to enable the inspection unit 13 to inspect both sides of the plurality of products P, an inversion mechanism 14 for inverting the plurality of products P is provided (see FIG. 1 ). The reversal mechanism 14 includes a holding base 141 that holds a plurality of products P, and a reversing portion 142 such as a motor that reverses the holding base 141 so that the front and back thereof are reversed.
於第二保持機構6自加工台2A、加工台2B保持多個製品P時,製品P的相反面朝向下側。於此狀態下,於自加工台2A、加工台2B向反轉機構14搬送多個製品P的中途,藉由第一檢查部131來檢查製品P的相反面。其後,保持於第二保持機構6的多個製品P由反轉機構14反轉,其後,反轉機構14移動至移載台5的位置。於該移動的期間,藉由第二檢查部132來檢查朝向下側的製品P的安裝面。其後,將製品P交接至移載台5。When the second holding mechanism 6 holds a plurality of products P from the processing tables 2A and 2B, the opposite surface of the products P faces downward. In this state, while the plurality of products P are being transported from the processing tables 2A and 2B to the reversing mechanism 14 , the opposite surface of the products P is inspected by the first inspection unit 131 . Thereafter, the plurality of products P held by the second holding mechanism 6 are reversed by the reversing mechanism 14 , and then the reversing mechanism 14 moves to the position of the transfer table 5 . During this movement, the mounting surface of the product P facing downward is inspected by the second inspection unit 132 . Thereafter, the product P is transferred to the transfer table 5 .
<第二保持機構6> 如圖1所示,第二保持機構6為了將多個製品P自切斷用台2A、切斷用台2B搬送至保持台141或移載台5而保持多個製品P。如圖8所示,所述第二保持機構6具有:吸附頭61,設置有用以吸附保持多個製品P的多個吸附部611;以及真空泵(未圖示),連接於該吸附頭61的吸附部611。然後,吸附頭61藉由後述的搬送用移動機構7等移動至所期望的位置,藉此將多個製品P自切斷用台2A、切斷用台2B搬送至保持台141或移載台5。 <Second holding mechanism 6> As shown in FIG. 1 , the second holding mechanism 6 holds a plurality of products P in order to transport the plurality of products P from the cutting table 2A and the cutting table 2B to the holding table 141 or the transfer table 5 . As shown in FIG. 8 , the second holding mechanism 6 includes: an adsorption head 61 provided with a plurality of adsorption portions 611 for adsorbing and holding a plurality of products P; and a vacuum pump (not shown) connected to the adsorption head 61 . Adsorption part 611. Then, the adsorption head 61 is moved to a desired position by the conveyance moving mechanism 7 described below, etc., thereby conveying the plurality of products P from the cutting table 2A and the cutting table 2B to the holding table 141 or the transfer table. 5.
<搬送用移動機構7> 如圖1所示,搬送用移動機構7使第一保持機構3至少於基板供給機構11與切斷用台2A、切斷用台2B之間移動,並且使第二保持機構6至少於切斷用台2A、切斷用台2B與保持台141之間移動。 <Transportation moving mechanism 7> As shown in FIG. 1 , the transport moving mechanism 7 moves the first holding mechanism 3 to a distance between the substrate supply mechanism 11 and the cutting tables 2A and 2B, and moves the second holding mechanism 6 to a distance between the substrate supply mechanism 11 and the cutting tables 2A and 2B. The table 2A, the cutting table 2B and the holding table 141 move among each other.
而且,如圖1所示,搬送用移動機構7具有共用的傳遞軸71,所述共用的傳遞軸71沿著兩個切斷用台2A、2B及移載台5的排列方向(X方向)呈一直線延伸,用以使第一保持機構3及第二保持機構6移動。Furthermore, as shown in FIG. 1 , the transport moving mechanism 7 has a common transmission shaft 71 along the arrangement direction (X direction) of the two cutting tables 2A, 2B and the transfer table 5 . Extending in a straight line, it is used to move the first holding mechanism 3 and the second holding mechanism 6 .
所述傳遞軸71設於下述範圍,即:第一保持機構3可移動至基板供給機構11的基板供給部112的上方,並且第二保持機構6可移動至移載台5的上方(參照圖1)。另外,相對於所述傳遞軸71,第一保持機構3、第二保持機構6、切斷用台2A、切斷用台2B及移載台5於俯視時設置於相同側(近前側)。此外,檢查部13、反轉機構14、後述的第一清潔機構18、第二清潔機構19、及容器設置部21亦相對於傳遞軸71而設置於相同側(近前側)。The transmission shaft 71 is provided in a range in which the first holding mechanism 3 can move above the substrate supply part 112 of the substrate supply mechanism 11 and the second holding mechanism 6 can move above the transfer stage 5 (see Figure 1). In addition, with respect to the transmission shaft 71 , the first holding mechanism 3 , the second holding mechanism 6 , the cutting table 2A, the cutting table 2B, and the transfer table 5 are provided on the same side (the near side) in plan view. In addition, the inspection part 13 , the reversing mechanism 14 , the first cleaning mechanism 18 and the second cleaning mechanism 19 described below, and the container installation part 21 are also provided on the same side (the near side) with respect to the transmission shaft 71 .
進而,如圖5、圖6及圖8所示,搬送用移動機構7具有:主移動機構72,使第一保持機構3及第二保持機構6沿著傳遞軸71於X方向上移動;升降移動機構73,使第一保持機構3及第二保持機構6相對於傳遞軸71於Z方向上升降移動;以及水平移動機構74,使第一保持機構3及第二保持機構6相對於傳遞軸71於Y方向上水平移動。Furthermore, as shown in FIGS. 5 , 6 and 8 , the transport moving mechanism 7 has: a main moving mechanism 72 for moving the first holding mechanism 3 and the second holding mechanism 6 in the X direction along the transmission shaft 71 ; and a lifting and lowering mechanism. The moving mechanism 73 makes the first holding mechanism 3 and the second holding mechanism 6 move up and down in the Z direction relative to the transmission shaft 71; and the horizontal movement mechanism 74 makes the first holding mechanism 3 and the second holding mechanism 6 move relative to the transmission shaft. 71 moves horizontally in the Y direction.
如圖5~圖8所示,主移動機構72具有:共用的導軌721,設置於傳遞軸71、且導引第一保持機構3及第二保持機構6;以及齒條與小齒輪機構722,使第一保持機構3及第二保持機構6沿著該導軌721移動。As shown in Figures 5 to 8, the main moving mechanism 72 has: a common guide rail 721, which is provided on the transmission shaft 71 and guides the first holding mechanism 3 and the second holding mechanism 6; and a rack and pinion mechanism 722, The first holding mechanism 3 and the second holding mechanism 6 are moved along the guide rail 721 .
導軌721沿著傳遞軸71於X方向上呈一直線延伸,與傳遞軸71同樣地設於下述範圍,即:第一保持機構3可移動至基板供給機構11的基板供給部112的上方,並且第二保持機構6可移動至移載台5的上方。於所述導軌721,能夠滑動地設置有滑動構件723,所述滑動構件723經由升降移動機構73及水平移動機構74而設置有第一保持機構3及第二保持機構6。此處,導軌721為第一保持機構3及第二保持機構6所共用,但升降移動機構73、水平移動機構74及滑動構件723是針對第一保持機構3及第二保持機構6的各者各別地設置。The guide rail 721 extends in a straight line in the X direction along the transmission shaft 71 , and is provided in a range where the first holding mechanism 3 can move above the substrate supply part 112 of the substrate supply mechanism 11 , and is similar to the transmission shaft 71 . The second holding mechanism 6 can move above the transfer platform 5 . A sliding member 723 is slidably provided on the guide rail 721 , and the sliding member 723 is provided with a first holding mechanism 3 and a second holding mechanism 6 via a lifting and lowering movement mechanism 73 and a horizontal movement mechanism 74 . Here, the guide rail 721 is common to the first holding mechanism 3 and the second holding mechanism 6 , but the lifting and lowering movement mechanism 73 , the horizontal movement mechanism 74 and the sliding member 723 are specific to each of the first holding mechanism 3 and the second holding mechanism 6 . Set individually.
齒條與小齒輪機構722具有:凸輪齒條722a,為第一保持機構3及第二保持機構6所共用;以及小齒輪722b,分別設置於第一保持機構3及第二保持機構6,藉由致動器(未圖示)旋轉。凸輪齒條722a設置於共用的傳遞軸71,可藉由將多個凸輪齒條要素連結而變更為各種長度。另外,小齒輪722b設置於滑動構件723,被稱為所謂滾子小齒輪(roller pinion),如圖7所示,具有:與馬達的旋轉軸一起旋轉的一對滾子本體722b1;以及於該一對滾子本體722b1之間於圓周方向上等間隔地設置、且設置成能夠相對於滾子本體722b1滾動的多個滾子銷722b2。本實施形態的齒條與小齒輪機構722使用所述滾子小齒輪,因此兩個以上的滾子銷722b2與凸輪齒條722a接觸,於正反方向上不產生背隙(backlash),於使第一保持機構3及第二保持機構6於X方向上移動時定位精度變良好。The rack and pinion mechanism 722 has: a cam rack 722a, which is shared by the first holding mechanism 3 and the second holding mechanism 6; and a pinion 722b, which is respectively provided in the first holding mechanism 3 and the second holding mechanism 6. Rotated by an actuator (not shown). The cam rack 722a is provided on the common transmission shaft 71 and can be changed to various lengths by connecting a plurality of cam rack elements. In addition, the pinion 722b is provided on the sliding member 723 and is called a so-called roller pinion. As shown in FIG. 7, it has a pair of roller bodies 722b1 that rotate together with the rotation axis of the motor; A plurality of roller pins 722b2 are provided at equal intervals in the circumferential direction between the pair of roller bodies 722b1 and are configured to be able to roll relative to the roller body 722b1. The rack and pinion mechanism 722 of this embodiment uses the roller pinion. Therefore, two or more roller pins 722b2 are in contact with the cam rack 722a, and no backlash is generated in the forward and reverse directions, which facilitates operation. When the first holding mechanism 3 and the second holding mechanism 6 move in the X direction, the positioning accuracy becomes better.
如圖5及圖8所示,升降移動機構73與第一保持機構3及第二保持機構6分別對應地設置。如圖5及圖6所示,第一保持機構3的升降移動機構73介隔存在於傳遞軸71(具體而言為主移動機構72)與第一保持機構3之間而設置,具有:Z方向導軌73a,沿著Z方向設置;以及致動器部73b,使第一保持機構3沿著該Z方向導軌73a移動。再者,致動器部73b例如可使用滾珠螺桿機構,亦可使用氣缸,亦可使用線性馬達。再者,如圖8所示,第二保持機構6的升降移動機構73的結構與第一保持機構3的升降移動機構73同樣。As shown in FIGS. 5 and 8 , the lifting and lowering movement mechanism 73 is provided corresponding to the first holding mechanism 3 and the second holding mechanism 6 respectively. As shown in FIGS. 5 and 6 , the lifting and lowering movement mechanism 73 of the first holding mechanism 3 is interposed between the transmission shaft 71 (specifically, the main movement mechanism 72 ) and the first holding mechanism 3 , and has: Z The direction guide rail 73a is provided along the Z direction; and the actuator portion 73b moves the first holding mechanism 3 along the Z direction guide rail 73a. Furthermore, the actuator part 73b may use a ball screw mechanism, a cylinder, or a linear motor, for example. Furthermore, as shown in FIG. 8 , the structure of the lifting and lowering movement mechanism 73 of the second holding mechanism 6 is the same as that of the lifting and lowering movement mechanism 73 of the first holding mechanism 3 .
如圖5、圖6及圖8所示,水平移動機構74與第一保持機構3及第二保持機構6分別對應地設置。如圖5及圖6所示,第一保持機構3的水平移動機構74是介隔存在於傳遞軸71(具體而言為升降移動機構73)與第一保持機構3之間而設置,具有:Y方向導軌74a,沿著Y方向設置;彈性體74b,對第一保持機構3向Y方向導軌74a的其中一側賦予力;以及凸輪機構74c,使第一保持機構3向Y方向導軌74a的另一側移動。此處,凸輪機構74c使用偏心凸輪,藉由利用馬達等致動器使該偏心凸輪旋轉,可調整第一保持機構3向Y方向的移動量。As shown in FIGS. 5 , 6 and 8 , the horizontal movement mechanism 74 is provided corresponding to the first holding mechanism 3 and the second holding mechanism 6 respectively. As shown in FIGS. 5 and 6 , the horizontal movement mechanism 74 of the first holding mechanism 3 is interposed between the transmission shaft 71 (specifically, the lifting movement mechanism 73 ) and the first holding mechanism 3 and has: The Y-direction guide rail 74a is provided along the Y-direction; the elastic body 74b applies force to the first holding mechanism 3 to one side of the Y-direction guide rail 74a; and the cam mechanism 74c makes the first holding mechanism 3 move toward one side of the Y-direction guide rail 74a. Move on the other side. Here, an eccentric cam is used as the cam mechanism 74c. By rotating the eccentric cam using an actuator such as a motor, the movement amount of the first holding mechanism 3 in the Y direction can be adjusted.
再者,如圖8所示,第二保持機構6的水平移動機構74的結構與第一保持機構3的升降移動機構73同樣。另外,可設為於第二保持機構6不設置水平移動機構74的結構,亦可設為於第一保持機構3及第二保持機構6兩者不設置水平移動機構74的結構。進而,水平移動機構74與升降移動機構73同樣地,亦可不使用凸輪機構74c而使用例如滾珠螺桿機構,亦可使用氣缸,亦可使用線性馬達。Furthermore, as shown in FIG. 8 , the structure of the horizontal movement mechanism 74 of the second holding mechanism 6 is the same as that of the lifting movement mechanism 73 of the first holding mechanism 3 . In addition, the second holding mechanism 6 may not be provided with the horizontal movement mechanism 74 , and the first holding mechanism 3 and the second holding mechanism 6 may not be provided with the horizontal movement mechanism 74 . Furthermore, like the up-and-down movement mechanism 73 , the horizontal movement mechanism 74 may not use the cam mechanism 74 c but may use, for example, a ball screw mechanism, a cylinder, or a linear motor.
<切斷用移動機構8(加工用移動機構)> 切斷用移動機構8使兩個心軸部42A、42B的各者於X方向、Y方向及Z方向的各方向上直線移動。 <Moving mechanism for cutting 8 (moving mechanism for processing)> The cutting moving mechanism 8 linearly moves each of the two spindle portions 42A and 42B in each of the X direction, the Y direction, and the Z direction.
具體而言,如圖2、圖3及圖4所示,切斷用移動機構8包括:X方向移動部81,使心軸部42A、心軸部42B於X方向上直線移動;Y方向移動部82,使心軸部42A、心軸部42B於Y方向上直線移動;以及Z方向移動部83,使心軸部42A、心軸部42B於Z方向上直線移動。Specifically, as shown in FIGS. 2 , 3 and 4 , the moving mechanism 8 for cutting includes an X-direction moving part 81 that linearly moves the spindle parts 42A and 42B in the X direction; and moves in the Y direction. The part 82 linearly moves the spindle parts 42A and 42B in the Y direction; and the Z-direction moving part 83 linearly moves the spindle parts 42A and 42B in the Z direction.
X方向移動部81為兩個切斷用台2A、2B所共用,尤其如圖2及圖3所示,具有:一對X方向導軌811,沿著X方向隔著兩個切斷用台2A、2B而設置;以及支撐體812,沿著該一對X方向導軌811移動並且經由Y方向移動部82及Z方向移動部83支撐心軸部42A、心軸部42B。一對X方向導軌811設置於沿著X方向設置的兩個切斷用台2A、2B的側方。另外,支撐體812例如為門型,具有沿Y方向延伸的形狀。具體而言,支撐體812具有自一對X方向導軌811向上方延伸的一對腳部、以及架設於該一對腳部的樑部(橫樑部),該樑部沿Y方向延伸。The X-direction moving part 81 is shared by the two cutting tables 2A and 2B. As shown in FIGS. 2 and 3 , the X-direction moving part 81 has a pair of X-direction guide rails 811 across the two cutting tables 2A along the X direction. , 2B; and the support body 812 moves along the pair of X-direction guide rails 811 and supports the spindle parts 42A and 42B via the Y-direction moving part 82 and the Z-direction moving part 83. A pair of X-direction guide rails 811 are provided on the sides of the two cutting tables 2A and 2B provided along the X-direction. In addition, the support body 812 is, for example, gate-shaped and has a shape extending in the Y direction. Specifically, the support body 812 has a pair of legs extending upward from a pair of X-direction guide rails 811 and a beam (crossbeam) extending along the Y-direction and extending across the pair of legs.
而且,支撐體812例如藉由沿X方向延伸的滾珠螺桿機構813而於一對X方向導軌811上沿著X方向直線性地往返移動。所述滾珠螺桿機構813由伺服馬達等驅動源(未圖示)驅動。除此以外,支撐體812亦可以藉由線性馬達等其他直動機構而往返移動的方式構成。Furthermore, the support body 812 linearly reciprocates along the X direction on a pair of X direction guide rails 811 by, for example, a ball screw mechanism 813 extending in the X direction. The ball screw mechanism 813 is driven by a driving source (not shown) such as a servo motor. In addition, the support body 812 may also be configured to reciprocate by a linear motor or other linear motion mechanism.
尤其如圖3所示,Y方向移動部82具有:Y方向導軌821,於支撐體812中沿著Y方向設置;以及Y方向滑塊822,沿著該Y方向導軌821移動。Y方向滑塊822例如由線性馬達823驅動,於Y方向導軌821上直線性地往返移動。於本實施形態中,與兩個心軸部42A、42B對應地設置有兩個Y方向滑塊822。藉此,兩個心軸部42A、42B能夠相互獨立地於Y方向上移動。除此以外,Y方向滑塊822亦可以藉由使用滾珠螺桿機構的其他直動機構而往返移動的方式構成。Especially as shown in FIG. 3 , the Y-direction moving part 82 has a Y-direction guide rail 821 provided along the Y-direction in the support body 812 and a Y-direction slider 822 that moves along the Y-direction guide rail 821 . The Y-direction slider 822 is driven by a linear motor 823, for example, and moves linearly back and forth on the Y-direction guide rail 821. In this embodiment, two Y-direction sliders 822 are provided corresponding to the two spindle portions 42A and 42B. Thereby, the two spindle parts 42A and 42B can move in the Y direction independently of each other. In addition, the Y-direction slider 822 can also be configured to reciprocate by using other linear motion mechanisms such as ball screw mechanisms.
如圖2~圖4所示,Z方向移動部83具有:Z方向導軌831,於各Y方向滑塊822中沿著Z方向設置;以及Z方向滑塊832,沿著所述Z方向導軌831移動並且支撐心軸部42A、心軸部42B。即,Z方向移動部83與各心軸部42A、42B對應地設置。Z方向滑塊832例如由偏心凸輪機構(未圖示)驅動,於Z方向導軌831上直線性地往返移動。除此以外,Z方向滑塊832亦可以藉由滾珠螺桿機構等其他直動機構而往返移動的方式構成。As shown in FIGS. 2 to 4 , the Z-direction moving part 83 has a Z-direction guide rail 831 provided in each Y-direction slider 822 along the Z-direction; and a Z-direction slider 832 along the Z-direction guide rail 831 The spindle parts 42A and 42B are moved and supported. That is, the Z-direction moving part 83 is provided corresponding to each of the spindle parts 42A and 42B. The Z-direction slider 832 is driven by, for example, an eccentric cam mechanism (not shown), and moves linearly back and forth on the Z-direction guide rail 831 . In addition, the Z-direction slider 832 can also be configured to move back and forth by other linear motion mechanisms such as a ball screw mechanism.
關於所述切斷用移動機構8與傳遞軸71的位置關係,如圖1及圖4所示,以傳遞軸71於切斷用移動機構8的上方橫穿切斷用移動機構8的方式配置。具體而言,傳遞軸71以於支撐體812的上方橫穿該支撐體812的方式配置,傳遞軸71及支撐體812成為相互交叉的位置關係。Regarding the positional relationship between the cutting moving mechanism 8 and the transmission shaft 71 , as shown in FIGS. 1 and 4 , the transmission shaft 71 is arranged above the cutting moving mechanism 8 and traverses the cutting moving mechanism 8 . . Specifically, the transmission shaft 71 is disposed above the support body 812 and crosses the support body 812 , and the transmission shaft 71 and the support body 812 have a mutually intersecting positional relationship.
<加工屑收容部17> 另外,如圖1所示,本實施形態的切斷裝置100更包括加工屑收容部17,所述加工屑收容部17收容因密封完畢基板W的切斷而產生的端材等加工屑S。 <Machining waste storage part 17> In addition, as shown in FIG. 1 , the cutting device 100 of this embodiment further includes a processing waste storage portion 17 that stores processing waste S such as end materials generated when the sealed substrate W is cut.
如圖2~圖4所示,所述加工屑收容部17設置於切斷用台2A、切斷用台2B的下方,具有:導引滑槽171,具有於俯視時包圍切斷用台2A、切斷用台2B的上部開口171X;以及回收容器172,將由該導引滑槽171所導引的加工屑S回收。藉由將加工屑收容部17設置於切斷用台2A、切斷用台2B的下方,可提高加工屑S的回收率。As shown in FIGS. 2 to 4 , the processing chip storage portion 17 is provided below the cutting tables 2A and 2B, and has a guide chute 171 surrounding the cutting table 2A in plan view. , the upper opening 171X of the cutting table 2B; and the recovery container 172 for recovering the processing chips S guided by the guide chute 171 . By arranging the processing waste storage portion 17 below the cutting tables 2A and 2B, the recovery rate of the processing waste S can be improved.
導引滑槽171將自切斷用台2A、切斷用台2B飛散或掉落的加工屑S引導至回收容器172。本實施形態中,以導引滑槽171的上部開口171X包圍切斷用台2A、切斷用台2B的方式構成(參照圖3),因此不易漏掉加工屑S,可進一步提高加工屑S的回收率。另外,導引滑槽171以包圍設置於切斷用台2A、切斷用台2B之下的旋轉機構9A、旋轉機構9B的方式設置(參照圖4),以保護旋轉機構9A、旋轉機構9B免受加工屑S及切削水的影響的方式構成。The guide chute 171 guides the processing chips S scattered or dropped from the cutting tables 2A and 2B to the recovery container 172 . In this embodiment, the upper opening 171X of the guide chute 171 is configured to surround the cutting tables 2A and 2B (see FIG. 3 ). Therefore, the processing chips S are less likely to be missed, and the processing chips S can be further increased. recovery rate. In addition, the guide chute 171 is provided to surround the rotating mechanisms 9A and 9B provided under the cutting tables 2A and 2B (see FIG. 4 ) to protect the rotating mechanisms 9A and 9B. It is constructed to protect it from the influence of machining chips S and cutting water.
於本實施形態中,加工屑收容部17為兩個切斷用台2A、2B所共用,但亦可與切斷用台2A、切斷用台2B分別對應地設置。In this embodiment, the processing chip receiving part 17 is shared by the two cutting tables 2A and 2B, but may be provided corresponding to the cutting table 2A and the cutting table 2B respectively.
回收容器172將因自重而通過導引滑槽171的加工屑S回收,於本實施形態中,如圖4等所示,與兩個切斷用台2A、2B分別對應地設置。而且,兩個回收容器172配置於傳遞軸的近前側,且以可分別獨立地自切斷裝置100的近前側卸除的方式構成。藉由所述結構,可提高加工屑S的廢棄等的維護性。再者,回收容器172可考慮密封完畢基板W的尺寸或加工屑S的尺寸及量、作業性等而於所有切斷用台的下方整體設置一個,亦可分割成三個以上來設置。The recovery container 172 collects the processing chips S that have passed through the guide chute 171 due to its own weight. In the present embodiment, as shown in FIG. 4 and others, the recovery container 172 is provided corresponding to the two cutting tables 2A and 2B. Furthermore, the two recovery containers 172 are arranged on the front side of the transmission shaft, and are configured to be independently detachable from the front side of the cutting device 100 . With this structure, maintenance such as disposal of machining chips S can be improved. Furthermore, the recovery container 172 may be provided as a whole under all the cutting tables, taking into account the size of the sealed substrate W, the size and amount of the processing chips S, workability, etc., or may be divided into three or more and provided.
另外,如圖4等所示,加工屑收容部17具有將切削水與加工屑S分離的分離部173。作為所述分離部173的結構,例如可考慮於回收容器172的底面上設置使切削水通過的多孔板等過濾器。藉由所述分離部173,可不於在回收容器172蓄積切削水的情況下將加工屑S回收。In addition, as shown in FIG. 4 and others, the machining chip storage portion 17 has a separation portion 173 that separates cutting water and machining chips S. As a structure of the separation unit 173 , for example, a filter such as a porous plate that allows cutting water to pass is provided on the bottom surface of the recovery container 172 . The separation part 173 makes it possible to collect the machining chips S without accumulating cutting water in the recovery container 172 .
<第一清潔機構18> 另外,如圖1及圖5所示,本發明的切斷裝置100更包括第一清潔機構18,所述第一清潔機構18對保持於切斷用台2A、切斷用台2B的多個製品P的上表面側(安裝面)進行清潔。所述第一清潔機構18藉由對保持於切斷用台2A、切斷用台2B的多個製品P的上表面噴射洗淨液及/或壓縮空氣的噴射噴嘴18a(參照圖5),來對製品P的上表面側進行清潔。 <First Cleaning Mechanism 18> In addition, as shown in FIGS. 1 and 5 , the cutting device 100 of the present invention further includes a first cleaning mechanism 18 . The first cleaning mechanism 18 cleans a plurality of cutting tables held on the cutting tables 2A and 2B. Clean the upper surface side (mounting surface) of product P. The first cleaning mechanism 18 uses a spray nozzle 18 a (see FIG. 5 ) that sprays cleaning fluid and/or compressed air onto the upper surfaces of the plurality of products P held on the cutting tables 2A and 2B. to clean the upper surface side of product P.
如圖5所示,所述第一清潔機構18構成為能夠與第一保持機構3一起沿著傳遞軸71移動。此處,第一清潔機構18設置於滑動構件723,所述滑動構件723在設置於傳遞軸71的導軌721上滑動。此處,於第一清潔機構18及滑動構件723之間,設置有用以使第一清潔機構18於Z方向上升降移動的升降移動機構181。關於所述升降移動機構181,例如可考慮使用齒條與小齒輪機構,使用滾珠螺桿機構,或使用氣缸等。As shown in FIG. 5 , the first cleaning mechanism 18 is configured to move along the transmission shaft 71 together with the first holding mechanism 3 . Here, the first cleaning mechanism 18 is provided on the sliding member 723 which slides on the guide rail 721 provided on the transmission shaft 71 . Here, between the first cleaning mechanism 18 and the sliding member 723, an up-and-down movement mechanism 181 for moving the first cleaning mechanism 18 up and down in the Z direction is provided. As the lifting and lowering movement mechanism 181 , for example, it may be considered to use a rack and pinion mechanism, a ball screw mechanism, or a cylinder.
<第二清潔機構> 進而,如圖1所示,本發明的切斷裝置100更包括第二清潔機構19,所述第二清潔機構19對保持於第二保持機構6的多個製品P的下表面側(相反面)進行清潔。所述第二清潔機構19設置於切斷用台2B與檢查部13之間,藉由向保持於第二保持機構6的多個製品P的下表面噴射洗淨液及/或壓縮空氣,而對製品P的下表面側進行清潔。即,於第二保持機構6沿著傳遞軸71移動的中途,第二清潔機構19對製品P的下表面側進行清潔。 <Second cleaning mechanism> Furthermore, as shown in FIG. 1 , the cutting device 100 of the present invention further includes a second cleaning mechanism 19 that cleans the lower surface side (opposite surface) of the plurality of products P held by the second holding mechanism 6 . ) for cleaning. The second cleaning mechanism 19 is provided between the cutting table 2B and the inspection part 13, and injects cleaning liquid and/or compressed air onto the lower surfaces of the plurality of products P held by the second holding mechanism 6. The lower surface side of product P is cleaned. That is, while the second holding mechanism 6 is moving along the transmission shaft 71 , the second cleaning mechanism 19 cleans the lower surface side of the product P.
<管收容的結構> 而且,本實施形態的切斷裝置100以可將多個製品P收容於筒狀容器20(亦稱為「管收容」)的方式構成。再者,筒狀容器20有時被稱為管、料倉棒(magazine stick)、棒料倉(stick magazine)、棒等。 <Containment structure> Furthermore, the cutting device 100 of this embodiment is configured to accommodate a plurality of products P in the cylindrical container 20 (also referred to as “tube accommodation”). Furthermore, the cylindrical container 20 may be called a tube, a magazine stick, a stick magazine, a stick, or the like.
具體而言,如圖1、圖9及圖10的(a)、圖10的(b)所示,切斷裝置100包括:容器設置部21,用來設置自一端開口部20x收容多個製品P的筒狀容器20;以及搬送收容機構22,將多個製品P自移載台5搬送至設置於容器設置部21上的筒狀容器20來收容。Specifically, as shown in FIGS. 1 , 9 , 10(a) and 10(b) , the cutting device 100 includes a container setting part 21 for setting a plurality of products from the one end opening 20x. The cylindrical container 20 of P; and the transport and storage mechanism 22 transport and store a plurality of products P from the transfer table 5 to the cylindrical container 20 provided on the container installation part 21.
容器設置部21設置有未收容製品P的空的筒狀容器20,藉由搬送收容機構22自筒狀容器20的一端開口部20x插入製品P。The container installation part 21 is provided with an empty cylindrical container 20 that does not contain the product P, and the product P is inserted from the one end opening 20x of the cylindrical container 20 by the transport and storage mechanism 22 .
如圖1及圖9所示,本實施形態的容器設置部21包括:空容器收容部211,收容空的筒狀容器20;插入位置設置部212,自該空容器收容部211送出空的筒狀容器20並且將空的筒狀容器20設置於製品P自一端開口部20x插入的插入位置;以及收容完畢容器收容部213,收容呈已滿載製品P或收容有所期望個數的收容完畢的筒狀容器20。As shown in FIGS. 1 and 9 , the container setting part 21 of this embodiment includes an empty container receiving part 211 for accommodating an empty cylindrical container 20 , and an insertion position setting part 212 for feeding the empty cylinder from the empty container receiving part 211 . and the empty cylindrical container 20 is placed at an insertion position where the product P is inserted from the one end opening 20x; and the stored container storage portion 213 is used to store the fully loaded product P or a desired number of stored products. Cylindrical container 20.
此處,如圖10所示,筒狀容器20以呈行狀排列的狀態收容多個製品P。具體而言,筒狀容器20具有呈直線狀延伸的形狀,於內部具有收容製品P的空間。另外,與筒狀容器的長度方向正交的剖面形狀是與製品P的剖面形狀對應的形狀。再者,圖10所示的筒狀容器20為沿著長度方向延伸的側周壁的一部分空出的結構,但亦可為所述側周壁閉合的結構。另外,筒狀容器20除了以呈一行排列的狀態收容多個製品P的結構之外,亦可為以呈多個行排列的狀態收容多個製品P的結構。進而,筒狀容器20可為樹脂製,亦可為金屬製。另外,於圖10中示出了作為製品P有引線的形態,但亦可為四方扁平無引線(Quad Flat No-Lead,QFN)等無引線型。Here, as shown in FIG. 10 , the cylindrical container 20 accommodates a plurality of products P arranged in a row. Specifically, the cylindrical container 20 has a linearly extending shape and has a space for accommodating the product P inside. In addition, the cross-sectional shape orthogonal to the longitudinal direction of the cylindrical container corresponds to the cross-sectional shape of the product P. Furthermore, the cylindrical container 20 shown in FIG. 10 has a structure in which a part of the side peripheral wall extending in the longitudinal direction is left open, but it may also have a structure in which the side peripheral wall is closed. In addition, the cylindrical container 20 may have a structure in which a plurality of products P are stored in a state arranged in a plurality of rows, in addition to a structure in which a plurality of products P are arranged in a row. Furthermore, the cylindrical container 20 may be made of resin or metal. In addition, FIG. 10 shows a form with leads as the product P, but it may also be a leadless type such as Quad Flat No-Lead (QFN).
如圖1及圖9所示,搬送收容機構22包括:中間台23,暫時載置多個製品P;第一搬送機構24,將多個製品P自處於取出位置的移載台5搬送至中間台23;以及第二搬送機構25,將多個製品P自中間台23搬送至設置於容器設置部21上的插入位置設置部212的筒狀容器20來收容。As shown in FIGS. 1 and 9 , the transport and storage mechanism 22 includes an intermediate table 23 for temporarily placing a plurality of products P; and a first transport mechanism 24 for transporting a plurality of products P from the transfer table 5 in the take-out position to the middle. The stage 23; and the second conveying mechanism 25 transport a plurality of products P from the intermediate stage 23 to the cylindrical container 20 provided in the insertion position setting part 212 of the container setting part 21 for storage.
中間台23藉由第一搬送機構24自處於取出位置X2的移載台5搬送製品P並暫時載置。另外,暫時載置於中間台23的製品P藉由第二搬送機構25而被搬送至設置於容器設置部21上的筒狀容器20。本實施形態的中間台23於X方向及Y方向上被固定,但亦可構成為能夠移動。The intermediate table 23 transports the product P from the transfer table 5 at the take-out position X2 via the first transport mechanism 24 and temporarily places it thereon. In addition, the product P temporarily placed on the intermediate table 23 is conveyed to the cylindrical container 20 provided on the container installation part 21 by the second conveyance mechanism 25 . The intermediate table 23 in this embodiment is fixed in the X direction and the Y direction, but may be configured to be movable.
第一搬送機構24自移動至取出位置X2的移載台5向中間台23按規定個數(例如一個)搬送多個製品P。The first conveyance mechanism 24 conveys a predetermined number (for example, one) of a plurality of products P from the transfer stage 5 moved to the take-out position X2 to the intermediate stage 23 .
具體而言,如圖9及圖11所示,第一搬送機構24包括:製品吸附機構241,按規定個數(例如一個)吸附保持於移載台5的多個製品P;以及吸附用移動機構242,使該製品吸附機構241沿著X方向移動。Specifically, as shown in FIGS. 9 and 11 , the first conveyance mechanism 24 includes: a product adsorption mechanism 241 that adsorbs a predetermined number (for example, one) of a plurality of products P held on the transfer table 5 ; and an adsorption movement. Mechanism 242 moves the product adsorption mechanism 241 along the X direction.
如圖11所示,製品吸附機構241具有:吸附頭241A,設置有用以吸附保持多個製品P的吸附部241a;以及真空泵或真空噴射器(未圖示),連接於該吸附頭241A的吸附部241a。該製品吸附機構241設為各個吸附部241a吸附一個製品P的結構。另外,多個吸附部241a構成為能夠相互獨立地升降移動,藉由各吸附部241a下降,可各別地吸附製品P。As shown in FIG. 11 , the product adsorption mechanism 241 includes: an adsorption head 241A provided with an adsorption portion 241 a for adsorbing and holding a plurality of products P; and a vacuum pump or vacuum ejector (not shown) connected to the adsorption head 241A. Section 241a. This product adsorption mechanism 241 is configured such that each adsorption portion 241a adsorbs one product P. In addition, the plurality of adsorption portions 241a are configured to move up and down independently of each other, and each adsorption portion 241a is lowered to adsorb the product P individually.
如圖11所示,吸附用移動機構242包括:X方向移動部242a,使製品吸附機構241於X方向上移動;以及Z方向移動部242b,使製品吸附機構241於Z方向上移動。再者,吸附用移動機構242亦可具有使製品吸附機構241於Y方向上移動的Y方向移動部。As shown in FIG. 11 , the suction moving mechanism 242 includes an X-direction moving part 242a that moves the product suction mechanism 241 in the X direction, and a Z-direction moving part 242b that moves the product suction mechanism 241 in the Z direction. Furthermore, the suction moving mechanism 242 may have a Y-direction moving part that moves the product suction mechanism 241 in the Y direction.
X方向移動部242a具有:X方向導軌242a1,於傳遞軸71的裏側沿著X方向設置;以及支撐體242a2,沿著該X方向導軌242a1移動並且經由Z方向移動部242b支撐製品吸附機構241。而且,支撐體242a2例如藉由沿X方向延伸的滾珠螺桿機構(未圖示)而於X方向導軌242a1上沿著X方向直線性地往返移動。該滾珠螺桿機構由伺服馬達等驅動源(未圖示)驅動。除此以外,支撐體242a2亦可以藉由線性馬達等其他直動機構而往返移動的方式構成。The X-direction moving part 242a has an X-direction guide rail 242a1 provided along the X direction on the inner side of the transmission shaft 71, and a support body 242a2 that moves along the X-direction guide rail 242a1 and supports the product suction mechanism 241 via the Z-direction moving part 242b. Furthermore, the support body 242a2 linearly reciprocates along the X direction on the X direction guide rail 242a1 by, for example, a ball screw mechanism (not shown) extending in the X direction. This ball screw mechanism is driven by a drive source (not shown) such as a servo motor. In addition, the support body 242a2 may also be configured to reciprocate by a linear motor or other linear motion mechanism.
如圖11所示,Z方向移動部242b具有:Z方向導軌242b1,於支撐體242a2上沿著Z方向設置;以及Z方向滑塊242b2,沿著該Z方向導軌242b1移動並且支撐製品吸附機構241。而且,Z方向滑塊242b2例如藉由沿Z方向延伸的滾珠螺桿機構(未圖示)而於Z方向導軌242b1上沿著Z方向直線性地往返移動。除此以外,Z方向滑塊242b2亦可以藉由線性馬達等其他直動機構而往返移動的方式構成。As shown in FIG. 11 , the Z-direction moving part 242b has: a Z-direction guide rail 242b1, which is provided along the Z-direction on the support body 242a2; and a Z-direction slider 242b2, which moves along the Z-direction guide rail 242b1 and supports the product adsorption mechanism 241 . Furthermore, the Z-direction slider 242b2 linearly reciprocates along the Z-direction on the Z-direction guide rail 242b1 by, for example, a ball screw mechanism (not shown) extending in the Z-direction. In addition, the Z-direction slider 242b2 may also be configured to reciprocate by a linear motor or other linear motion mechanism.
如圖9及圖12所示,第二搬送機構25將載置於中間台23的製品P搬送至設置於容器設置部21上的插入位置設置部212的筒狀容器20,並自該筒狀容器20的一端開口部20x插入製品P來收容。As shown in FIGS. 9 and 12 , the second transport mechanism 25 transports the product P placed on the intermediate table 23 to the cylindrical container 20 provided in the insertion position setting part 212 of the container setting part 21 , and removes the product from the cylindrical container 20 . The product P is inserted into the one end opening 20x of the container 20 and accommodated therein.
具體而言,第二搬送機構25具有:製品引導部251,將製品P引導至筒狀容器20的一端開口部20x;以及製品移動部252,於該製品引導部251上使製品P朝向筒狀容器20的一端開口部20x移動。Specifically, the second conveyance mechanism 25 has a product guide part 251 that guides the product P to the one end opening 20x of the cylindrical container 20, and a product moving part 252 that moves the product P toward the cylindrical shape. The one end opening 20x of the container 20 moves.
製品引導部251將製品P排列並引導至筒狀容器20。由於本實施形態的筒狀容器20沿著Y方向設置,因此製品引導部251亦沿著Y方向設置。於本實施形態中,由於容器設置部21設置於傳遞軸71的近前側,中間台23設置於傳遞軸71的裏側,因此製品引導部251於傳遞軸71的下方與傳遞軸71正交。The product guide 251 arranges and guides the products P to the cylindrical container 20 . Since the cylindrical container 20 of this embodiment is provided along the Y direction, the product guide 251 is also provided along the Y direction. In this embodiment, the container setting part 21 is provided on the front side of the transmission shaft 71 and the intermediate table 23 is provided on the back side of the transmission shaft 71 . Therefore, the product guide part 251 is perpendicular to the transmission shaft 71 below the transmission shaft 71 .
製品移動部252具有按壓製品P的按壓構件252a、以及使該按壓構件252a沿著Y方向移動的驅動部252b。再者,作為驅動部252b,例如可使用滾珠螺桿機構,亦可使用氣缸,亦可使用線性馬達。The product moving part 252 has a pressing member 252a that presses the product P, and a driving part 252b that moves the pressing member 252a in the Y direction. Furthermore, as the driving part 252b, for example, a ball screw mechanism, a cylinder, or a linear motor may be used.
<不良品的分類功能> 本實施形態的切斷裝置100具有檢查多個製品P的良否來對不良品進行分類的功能。 <Defective product classification function> The cutting device 100 of this embodiment has the function of inspecting the quality of a plurality of products P and classifying defective products.
具體而言,如圖1、圖9及圖12所示,切斷裝置100更包括:攝像部26,對多個製品P進行拍攝;判定部27,使用由攝像部26獲得的攝像資料,進行多個製品P的良否判定;以及分類機構28,對由判定部27判定為不良品的製品P進行分類。Specifically, as shown in FIGS. 1 , 9 and 12 , the cutting device 100 further includes: an imaging unit 26 that photographs a plurality of products P; and a determination unit 27 that uses the imaging data obtained by the imaging unit 26 to perform The quality determination of a plurality of products P; and the classification mechanism 28 classifies the products P determined as defective products by the determination unit 27 .
攝像部26為自下方對保持於第一搬送機構24的製品吸附機構241的製品P進行拍攝的攝像相機,對製品P的下表面(相反面)進行拍攝。除此之外,亦可設為藉由其他攝像部對例如載置於移載台5的製品P的上表面(安裝面)進行拍攝的結構。The imaging unit 26 is an imaging camera that photographs the product P held by the product adsorption mechanism 241 of the first conveyance mechanism 24 from below, and photographs the lower surface (opposite surface) of the product P. In addition, another imaging unit may be used to photograph, for example, the upper surface (mounting surface) of the product P placed on the transfer table 5 .
判定部27使用由攝像部26獲得的攝像資料,檢測製品P的不良(例如引線彎曲、樹脂的未填充、氣泡等),來進行製品P的良否判定。該判定部27包括控制部CTL。The determination unit 27 uses the imaging data obtained by the imaging unit 26 to detect defects in the product P (for example, lead bends, lack of resin filling, air bubbles, etc.), and determines the quality of the product P. This determination unit 27 includes a control unit CTL.
分類機構28設置於第二搬送機構25,如圖12所示,於將由判定部27判定為良品的製品P引導至筒狀容器20的良品路線R1、與用以將由判定部27判定為不良品的製品P廢棄至廢棄容器29的不良品路線R2之間進行切換。The sorting mechanism 28 is provided in the second conveying mechanism 25 and, as shown in FIG. 12 , guides the product P determined to be a defective product by the determination part 27 to a good product route R1 of the cylindrical container 20 and is used to guide the product P determined to be a defective product by the determination part 27 Switching is performed between the discarded product P and the defective product route R2 of the discard container 29 .
具體而言,分類機構28設置於製品引導部251的一部分,於良品路線R1與不良品路線R2之間進行切換。本實施形態的分類機構28具有用來載置製品P的旋轉台281、以及使製品P自該旋轉台281移動至各路線R1、R2的移動機構282,藉由旋轉台281旋轉,來切換良品路線R1與不良品路線R2。此處,良品路線R1為沿著Y方向的方向,不良品路線R2為沿著X方向的方向。再者,移動機構282可設為與所述第二搬送機構25的製品移動部252同樣的結構。Specifically, the sorting mechanism 28 is provided in a part of the product guide part 251 and switches between the good product route R1 and the defective product route R2. The sorting mechanism 28 of this embodiment has a rotary table 281 for placing the product P, and a moving mechanism 282 for moving the product P from the rotary table 281 to each of the routes R1 and R2. The rotation of the rotary table 281 switches the good products. Route R1 and defective product route R2. Here, the good product route R1 is along the Y direction, and the defective product route R2 is along the X direction. Furthermore, the moving mechanism 282 may have the same structure as the product moving part 252 of the second conveying mechanism 25 .
<切斷裝置的動作的一例> 接著,參照圖9、圖11、圖12及圖13對切斷裝置100的動作的一例進行說明。再者,於圖13中示出切斷裝置100的動作中的第一保持機構3的移動路徑及第二保持機構6的移動路徑。於本實施形態中,切斷裝置100的動作、例如密封完畢基板W的搬送、密封完畢基板W的切斷、製品P的檢查、製品P的管收容等所有動作或控制由控制部CTL(參照圖1)進行。 <Example of operation of cutting device> Next, an example of the operation of the cutting device 100 will be described with reference to FIGS. 9 , 11 , 12 and 13 . In addition, FIG. 13 shows the movement path of the first holding mechanism 3 and the movement path of the second holding mechanism 6 during the operation of the cutting device 100. In this embodiment, all operations or controls of the cutting device 100, such as transportation of the sealed substrate W, cutting of the sealed substrate W, inspection of the product P, and tube storage of the product P, are controlled by the control unit CTL (see Figure 1).
基板供給機構11的基板供給部112使收容於基板收容部111的密封完畢基板W朝向由第一保持機構3保持的保持位置RP移動(參照圖1)。The substrate supply part 112 of the substrate supply mechanism 11 moves the sealed substrate W accommodated in the substrate accommodating part 111 toward the holding position RP held by the first holding mechanism 3 (see FIG. 1 ).
接著,如圖13所示,搬送用移動機構7使第一保持機構3移動至保持位置RP,第一保持機構3吸附保持密封完畢基板W。其後,搬送用移動機構7使保持有密封完畢基板W的第一保持機構3移動至切斷用台2A、切斷用台2B,第一保持機構3解除吸附保持,將密封完畢基板W載置於切斷用台2A、切斷用台2B。此時,藉由主移動機構72來調整密封完畢基板W的X方向的位置,藉由水平移動機構74來調整密封完畢基板W的Y方向的位置。而且,切斷用台2A、切斷用台2B吸附保持密封完畢基板W。Next, as shown in FIG. 13 , the transport moving mechanism 7 moves the first holding mechanism 3 to the holding position RP, and the first holding mechanism 3 absorbs and holds the sealed substrate W. Thereafter, the transport moving mechanism 7 moves the first holding mechanism 3 holding the sealed substrate W to the cutting table 2A and the cutting table 2B, and the first holding mechanism 3 releases the adsorption and holding, and holds the sealed substrate W. Place them on the cutting table 2A and the cutting table 2B. At this time, the X-direction position of the sealed substrate W is adjusted by the main moving mechanism 72 , and the Y-direction position of the sealed substrate W is adjusted by the horizontal moving mechanism 74 . Furthermore, the cutting table 2A and the cutting table 2B adsorb and hold the sealed substrate W.
此處,在使保持有密封完畢基板W的第一保持機構3移動至切斷用台2B的情況下,升降移動機構73使第一保持機構3上升至不與切斷用移動機構8(支撐體812)發生物理干擾的位置為止。再者,於使保持有密封完畢基板W的第一保持機構3移動至切斷用台2B時,在使支撐體812自切斷用台2B向移載台5側退避的情況下,無需如所述般使第一保持機構3升降。Here, when the first holding mechanism 3 holding the sealed substrate W is moved to the cutting table 2B, the lifting and lowering movement mechanism 73 raises the first holding mechanism 3 to a position where it is not in contact with the cutting movement mechanism 8 (supporting mechanism). Body 812) to the location where physical interference occurs. Furthermore, when moving the first holding mechanism 3 holding the sealed substrate W to the cutting stage 2B, there is no need to retract the support body 812 from the cutting stage 2B to the transfer stage 5 side. As described above, the first holding mechanism 3 is raised and lowered.
於此狀態下,切斷用移動機構8使兩個心軸部42A、42B於X方向及Y方向上依次移動,並且藉由切斷用台2A、2B旋轉,將密封完畢基板W切斷為格子狀而單片化。In this state, the cutting moving mechanism 8 sequentially moves the two spindle portions 42A and 42B in the X direction and the Y direction, and rotates the cutting tables 2A and 2B to cut the sealed substrate W into Grid-like and monolithic.
於切斷後,搬送用移動機構7使第一清潔機構18移動,對保持於切斷用台2A、切斷用台2B的多個製品P的上表面側(安裝面)進行清潔。所述清潔之後,搬送用移動機構7使第一保持機構3及第一清潔機構18退避至規定位置。After cutting, the conveyance moving mechanism 7 moves the first cleaning mechanism 18 to clean the upper surfaces (mounting surfaces) of the plurality of products P held on the cutting tables 2A and 2B. After the above cleaning, the transport moving mechanism 7 retracts the first holding mechanism 3 and the first cleaning mechanism 18 to a predetermined position.
接著,搬送用移動機構7使第二保持機構6移動至切斷後的切斷用台2A、切斷用台2B,第二保持機構6吸附保持多個製品P。其後,搬送用移動機構7使保持有多個製品P的第二保持機構6移動至第二清潔機構19。藉此,第二清潔機構19對保持於第二保持機構6的多個製品P的下表面側(相反面)進行清潔。Next, the conveyance moving mechanism 7 moves the second holding mechanism 6 to the cutting tables 2A and 2B after cutting, and the second holding mechanism 6 absorbs and holds the plurality of products P. Thereafter, the transport moving mechanism 7 moves the second holding mechanism 6 holding the plurality of products P to the second cleaning mechanism 19 . Thereby, the second cleaning mechanism 19 cleans the lower surface side (opposite surface) of the plurality of products P held by the second holding mechanism 6 .
於清潔後,保持於第二保持機構6的多個製品P藉由檢查部131來進行下表面側(相反面)的檢查,其後,交接至反轉機構14,於藉由反轉機構14吸附保持相反面之後反轉。於反轉後,反轉機構14移動,藉由檢查部132來檢查製品P的安裝面。於如此進行了雙面檢查之後,製品P自反轉機構14交接至移載台5。After cleaning, the plurality of products P held in the second holding mechanism 6 are inspected on the lower surface side (opposite surface) by the inspection part 131 , and then handed over to the reversing mechanism 14 , where they are passed through the reversing mechanism 14 The adsorption holds the opposite side and then reverses. After the reversal, the reversal mechanism 14 moves, and the mounting surface of the product P is inspected by the inspection unit 132 . After the double-sided inspection is performed in this way, the product P is transferred from the reversing mechanism 14 to the transfer table 5 .
載置有多個製品P的移載台5移動至取出位置X2(參照圖1、圖9及圖11)。另一方面,於容器設置部21的插入位置設置部212設置有空的筒狀容器20(參照圖9及圖12)。The transfer table 5 on which the plurality of products P is mounted moves to the take-out position X2 (see FIGS. 1 , 9 and 11 ). On the other hand, the empty cylindrical container 20 is installed in the insertion position setting part 212 of the container setting part 21 (see FIGS. 9 and 12 ).
於該狀態下,如圖11所示,第一搬送機構24自處於取出位置X2的移載台5吸附保持製品P。然後,向攝像部26的上方移動。藉此,藉由攝像部26對吸附保持於第一搬送機構24的製品P進行拍攝。另外,判定部27使用由攝像部26獲得的攝像資料,進行製品P的良否判定。其後,第一搬送機構24使製品P移動至中間台23,解除製品P的吸附保持,而將製品P載置於中間台23。載置於中間台23的製品P例如藉由分類機構28的移動機構282而被搬送至旋轉台281。In this state, as shown in FIG. 11 , the first conveyance mechanism 24 adsorbs and holds the product P from the transfer table 5 in the take-out position X2. Then, it moves upward of the imaging unit 26 . Thereby, the product P adsorbed and held by the first conveyance mechanism 24 is photographed by the imaging unit 26 . In addition, the determination unit 27 uses the imaging data obtained by the imaging unit 26 to determine the quality of the product P. Thereafter, the first conveyance mechanism 24 moves the product P to the intermediate table 23 , releases the adsorption and holding of the product P, and places the product P on the intermediate table 23 . The product P placed on the intermediate table 23 is conveyed to the turntable 281 by, for example, the moving mechanism 282 of the sorting mechanism 28 .
分類機構28基於判定部27的良否判定的結果,針對每個製品P切換良品路線R1與不良品路線R2。若為良品,則切換至良品路線R1(參照圖12的(a)),並藉由移動機構282將製品P搬送至製品引導部251。被搬送至製品引導部251的製品P藉由第二搬送機構25的製品移動部252而插入至筒狀容器20的內部來收容。另一方面,若為不良品,則切換至不良品路線R2(參照圖12的(b)),並藉由移動機構282將製品P搬送至廢棄容器29來廢棄。The classification mechanism 28 switches the good product route R1 and the defective product route R2 for each product P based on the result of the quality determination by the determination unit 27 . If it is a good product, the product P is switched to the good product route R1 (see (a) of FIG. 12 ), and the product P is transported to the product guide 251 by the moving mechanism 282 . The product P conveyed to the product guide part 251 is inserted into the inside of the cylindrical container 20 by the product moving part 252 of the second conveyance mechanism 25, and is accommodated. On the other hand, if the product is a defective product, the product P is switched to the defective product route R2 (see (b) of FIG. 12 ), and the product P is transported to the waste container 29 by the moving mechanism 282 and discarded.
在筒狀容器20成為滿載的情況下,或在筒狀容器20中收容有所期望個數的製品P的情況下,處於插入位置設置部212的收容完畢的筒狀容器20移動至收容完畢容器收容部213,並且自空容器收容部211送出空的筒狀容器20並設置於插入位置設置部212。When the cylindrical container 20 becomes full, or when a desired number of products P are accommodated in the cylindrical container 20 , the accommodated cylindrical container 20 in the insertion position setting part 212 is moved to the accommodated container. accommodating part 213, and the empty cylindrical container 20 is sent out from the empty container accommodating part 211 and set in the insertion position setting part 212.
<本實施形態的效果> 根據本實施形態的切斷裝置100,設為藉由沿著切斷用台2A、切斷用台2B及移載台5的排列方向延伸的共用的傳遞軸71來使第一保持機構3及第二保持機構6的結構,藉由切斷用移動機構8使切斷機構4於水平面上於沿著傳遞軸71的X方向及與該X方向正交的Y方向上分別移動,因此無需使切斷用台2A、切斷用台2B於X方向及Y方向上移動便可將密封完畢基板W單片化。因此,可不藉由滾珠螺桿機構等使切斷用台2A、切斷用台2B移動,而無需用以保護滾珠螺桿機構等的蛇腹構件及用以保護該蛇腹構件的蓋構件。其結果,可使切斷裝置100的裝置結構簡化。 <Effects of this embodiment> According to the cutting device 100 of this embodiment, the first holding mechanism 3 and the first holding mechanism 3 are moved by the common transmission shaft 71 extending along the arrangement direction of the cutting table 2A, the cutting table 2B, and the transfer table 5 . The second holding mechanism 6 has a structure in which the cutting moving mechanism 8 moves the cutting mechanism 4 on the horizontal plane in the X direction along the transmission shaft 71 and in the Y direction orthogonal to the X direction, so there is no need to use The sealed substrate W can be separated into individual pieces by moving the cutting table 2A and the cutting table 2B in the X direction and the Y direction. Therefore, the cutting table 2A and the cutting table 2B can be moved without using the ball screw mechanism or the like, and a bellows member for protecting the ball screw mechanism or the like and a cover member for protecting the bellows member are not required. As a result, the device structure of the cutting device 100 can be simplified.
另外,由於成為切斷用台2A、切斷用台2B於水平面上不於X方向及Y方向上移動的結構,因此可削減切斷用台2A、切斷用台2B的移動空間及其周邊的無用空間,可減少切斷裝置100的佔據面積。In addition, since the cutting table 2A and the cutting table 2B are configured not to move in the X direction and the Y direction on the horizontal plane, the movement space of the cutting table 2A and the cutting table 2B and their surroundings can be reduced. The useless space can reduce the occupied area of the cutting device 100.
進而,可藉由搬送收容機構22將多個製品P自移載台5搬送至設置於容器設置部21上的筒狀容器20,並自該筒狀容器20的一端開口部20x收容多個製品P。Furthermore, the plurality of products P can be conveyed from the transfer stage 5 to the cylindrical container 20 provided on the container installation part 21 by the conveyance and storage mechanism 22, and the plurality of products P can be accommodated from the one end opening 20x of the cylindrical container 20. P.
<其他變形實施形態> 再者,本發明並不限於所述實施形態。 <Other variations> In addition, the present invention is not limited to the above-described embodiment.
例如,於所述實施形態中,容器設置部21設置於傳遞軸71的近前側,但亦可設置於傳遞軸71的裏側。For example, in the above-mentioned embodiment, the container installation part 21 is provided on the front side of the transmission shaft 71 , but it may be provided on the back side of the transmission shaft 71 .
另外,設置於容器設置部21的筒狀容器20除了為沿著Y方向設置的結構以外,亦可沿著X方向設置,亦可沿著其他方向設置。In addition, the cylindrical container 20 provided in the container installation part 21 may be provided along the X direction in addition to the structure provided along the Y direction, or may be provided along other directions.
進而,就分類機構28而言,只要為可分類為被判定為良品的製品P與被判定為不良品的製品P的結構即可,只要為自良品路線中除去不良品的結構即可。例如,分類機構28亦可如圖14的(a)所示設為於製品引導部251的製品P滑動移動的底面上設置開閉機構283,打開該開閉機構283使不良品落下而除去的結構。另外,分類機構28亦可如圖14的(b)所示設為設置將於製品引導部251中移動的被判定為不良品的製品P向側方按壓的去除機構284,藉由該去除機構284按壓不良品而除去的結構。Furthermore, the classification mechanism 28 may be configured to be capable of classifying products P judged as defective products and products P judged to be defective products, and may be configured to remove defective products from the route of defective products. For example, as shown in FIG. 14( a ), the sorting mechanism 28 may have a structure in which an opening and closing mechanism 283 is provided on the bottom surface of the product guide 251 on which the product P slides, and the opening and closing mechanism 283 is opened to drop and remove defective products. In addition, as shown in (b) of FIG. 14 , the sorting mechanism 28 may be provided with a removal mechanism 284 that presses the product P judged to be a defective product laterally while moving in the product guide 251 . By this removal mechanism 284 is a structure that presses and removes defective products.
所述實施形態的攝像部26對保持於第一搬送機構24的製品P進行拍攝,但亦可對載置於移載台5的製品P進行拍攝。另外,攝像部26亦可安裝於第一搬送機構24的製品吸附機構241,對載置於移載台5或中間台23的製品P進行拍攝。另外,攝像部26除了所述實施形態的攝像部以外,亦可併用安裝於第一搬送機構24的製品吸附機構241的攝像部。The imaging unit 26 of the above embodiment takes an image of the product P held on the first conveyance mechanism 24 , but may also take an image of the product P placed on the transfer table 5 . In addition, the imaging unit 26 may be installed on the product adsorption mechanism 241 of the first conveyance mechanism 24 to photograph the product P placed on the transfer table 5 or the intermediate table 23 . In addition, in addition to the imaging unit of the above-mentioned embodiment, the imaging unit 26 may also use an imaging unit installed in the product suction mechanism 241 of the first conveyance mechanism 24 .
於所述實施形態中,對雙切割台方式且雙心軸結構的切斷裝置進行了說明,但並不限於此,亦可為單切割台方式且單心軸結構的切斷裝置、或單切割台方式且雙心軸結構的切斷裝置等。In the embodiment, a cutting device with a double cutting table type and a double mandrel structure has been described, but the invention is not limited thereto. A cutting device with a single cutting table type and a single mandrel structure may also be used, or a single cutting device may be used. Cutting table type and double mandrel structure cutting device, etc.
另外,構成傳遞軸71的凸輪齒條要素可將多個連結而構成,因此例如可將切斷裝置(加工裝置)100設為於第二清潔機構19與檢查部13之間能夠分離及連結(能夠裝卸)的模組結構。在此情況下,例如可於第二清潔機構19側的模組與檢查部13側的模組之間,追加進行與檢查部13中的檢查為不同種類的檢查的模組。再者,除了此處例示的結構以外,亦可將切斷裝置(加工裝置)100設為於某處能夠分離及連結(能夠裝卸)的模組結構,亦可將追加的模組設為檢查以外的各種功能的模組。In addition, the cam rack element constituting the transmission shaft 71 can be configured by connecting a plurality of cam rack elements. Therefore, for example, the cutting device (processing device) 100 can be configured to be separable and connectable between the second cleaning mechanism 19 and the inspection unit 13 ( Modular structure that can be loaded and unloaded). In this case, for example, a module that performs a different type of inspection from the inspection in the inspection unit 13 may be added between the module on the second cleaning mechanism 19 side and the module on the inspection unit 13 side. Furthermore, in addition to the structure illustrated here, the cutting device (processing device) 100 may be configured as a module structure that can be separated and connected (removable) somewhere, or an additional module may be used as an inspection unit. Modules with various functions other than.
除此以外,本發明不限於所述實施形態,當然能夠於不偏離其主旨的範圍進行各種變形。 [產業上的可利用性] In addition, the present invention is not limited to the above-described embodiments, and various modifications can be made without departing from the gist of the invention. [Industrial availability]
根據本發明,可不需要使加工台移動的移動機構,並且將經單片化的加工對象物收容於筒狀容器。According to the present invention, a moving mechanism for moving the processing table is unnecessary, and the individualized processing objects can be accommodated in the cylindrical container.
2A、2B:切斷用台(加工台) 3:第一保持機構 4:切斷機構(加工機構) 5:移載台 6:第二保持機構 7:搬送用移動機構 8:加工用移動機構(切斷用移動機構) 9A、9B:旋轉機構 10A、10B:真空泵 11:基板供給機構 12:液體供給機構 13:檢查部 14:反轉機構 17:加工屑收容部 18:第一清潔機構 18a、121:噴射噴嘴 19:第二清潔機構 20:筒狀容器 20x:一端開口部 21:容器設置部 22:搬送收容機構 23:中間台 24:第一搬送機構 25:第二搬送機構 26:攝像部 27:判定部 28:分類機構 29:廢棄容器 31、61、241A:吸附頭 40:旋轉工具 41A、41B:刀片 42A、42B:心軸部 71:傳遞軸 72:主移動機構 73、181:升降移動機構 73a、242b1、831:Z方向導軌 73b:致動器部 74:水平移動機構 74a、821:Y方向導軌 74b:彈性體 74c:凸輪機構 81、242a:X方向移動部 82:Y方向移動部 83、242b:Z方向移動部 100:切斷裝置(加工裝置) 111:基板收容部 112:基板供給部 113:加熱部 131:第一檢查部(檢查部) 132:第二檢查部(檢查部) 141:保持台 142:反轉部 171:導引滑槽 171X:上部開口 172:回收容器 173:分離部 211:空容器收容部 212:插入位置設置部 213:收容完畢容器收容部 241:製品吸附機構 241a、311、611:吸附部 242:吸附用移動機構 242a1:X方向導軌 242a2、812:支撐體 242b2、832:Z方向滑塊 251:製品引導部 252:製品移動部 252a:按壓構件 252b:驅動部 281:旋轉台 282:移動機構 283:開閉機構 284:去除機構 721:導軌 722:小齒輪機構 722a:凸輪齒條 722b:小齒輪 722b1:滾子本體 722b2:滾子銷 723:滑動構件 811:一對X方向導軌 813:滾珠螺桿機構 822:Y方向滑塊 823:線性馬達 CTL:控制部 P:製品(加工品) R1:良品路線(路線) R2:不良品路線(路線) RP:保持位置 S:加工屑 W:密封完畢基板(加工對象物) X、Y、Z、θ:方向 X1:移載位置 X2:取出位置 2A, 2B: Cutting table (processing table) 3: The first holding mechanism 4: Cutting mechanism (processing mechanism) 5:Transfer platform 6: Second holding mechanism 7:Moving mechanism for transportation 8: Moving mechanism for processing (moving mechanism for cutting) 9A, 9B: Rotating mechanism 10A, 10B: Vacuum pump 11:Substrate supply mechanism 12:Liquid supply mechanism 13:Inspection Department 14:Reversal mechanism 17: Processing waste collection department 18:The first cleaning agency 18a, 121: Injection nozzle 19:Second cleaning mechanism 20:Tubular container 20x: Open at one end 21: Container setting department 22:Transfer to a shelter 23: Center stage 24:First transport mechanism 25: Second transport mechanism 26:Camera Department 27: Judgment Department 28:Classification agency 29:Abandoned containers 31, 61, 241A: adsorption head 40: Rotary tool 41A, 41B: Blade 42A, 42B: Spindle part 71:Transmission shaft 72: Main moving mechanism 73, 181: Lifting and moving mechanism 73a, 242b1, 831: Z-direction guide rail 73b: Actuator part 74: Horizontal moving mechanism 74a, 821: Y direction guide rail 74b: Elastomer 74c: Cam mechanism 81, 242a: X direction moving part 82:Y direction moving part 83. 242b: Z-direction moving part 100: Cutting device (processing device) 111:Substrate receiving section 112:Substrate supply department 113:Heating part 131:First Inspection Department (Inspection Department) 132:Second Inspection Department (Inspection Department) 141:Keeping platform 142:Reversal Department 171:Guide chute 171X: Upper opening 172:Recycling container 173:Separation Department 211: Empty Container Collection Department 212: Insertion position setting part 213: Containment Completed Container Containment Department 241: Product adsorption mechanism 241a, 311, 611: adsorption part 242:Moving mechanism for adsorption 242a1:X direction guide rail 242a2, 812: Support body 242b2, 832: Z direction slider 251: Product Guidance Department 252: Product Moving Department 252a: Pressing member 252b:Drive Department 281: Rotary table 282:Mobile mechanism 283:Opening and closing mechanism 284:Remove mechanism 721: Guide rail 722:Pinion mechanism 722a: Cam rack 722b: pinion 722b1:Roller body 722b2:Roller pin 723:Sliding member 811: A pair of X-direction guide rails 813: Ball screw mechanism 822:Y direction slider 823: Linear motor CTL:Control Department P: products (processed products) R1: Good product route (route) R2: Defective product route (route) RP: maintain position S: Processing chips W: Sealed substrate (object to be processed) X, Y, Z, θ: direction X1: transfer position X2: take out position
圖1是示意性地表示本發明一實施形態的切斷裝置的結構的圖。 圖2是示意性地表示所述實施形態的切斷用台及其周邊結構的立體圖。 圖3是示意性地表示所述實施形態的切斷用台及其周邊結構的結構的、自Z方向觀察的圖(平面圖)。 圖4是示意性地表示所述實施形態的切斷用台及其周邊結構的結構的、自Y方向觀察的圖(正面圖)。 圖5是示意性地表示所述實施形態的第一保持機構及搬送用移動機構的結構的、自Y方向觀察的圖(正面圖)。 圖6是示意性地表示所述實施形態的第一保持機構及搬送用移動機構的結構的、自X方向觀察的圖(側面圖)。 圖7是示意性地表示所述實施形態的齒條與小齒輪(rack and pinion)機構的結構的剖面圖。 圖8是示意性地表示所述實施形態的第二保持機構及搬送用移動機構的結構的、自Y方向觀察的圖(正面圖)。 圖9是示意性地表示所述實施形態的移載台、容器設置部及搬送收容機構的結構的、自Z方向觀察的圖(平面圖)。 圖10是示意性地表示所述實施形態的筒狀容器的結構的(a)立體圖、及(b)剖面圖。 圖11是示意性地表示所述實施形態的第一搬送機構的結構的、自Y方向觀察的圖(正面圖)。 圖12是表示基於所述實施形態的分類機構的(a)良品路線、及(b)不良品路線的示意圖。 圖13是示意性表示所述實施形態的第一保持機構及第二保持機構的移動路徑的圖。 圖14是表示變形實施形態的分類機構的示意圖。 FIG. 1 is a diagram schematically showing the structure of a cutting device according to an embodiment of the present invention. FIG. 2 is a perspective view schematically showing the cutting table of the embodiment and its surrounding structure. FIG. 3 is a diagram (plan view) schematically showing the structure of the cutting table and its surrounding structures according to the embodiment, viewed from the Z direction. 4 is a diagram (front view) viewed from the Y direction schematically showing the structure of the cutting table and its surrounding structures according to the embodiment. 5 is a diagram (front view) viewed from the Y direction schematically showing the structure of the first holding mechanism and the transport moving mechanism of the embodiment. 6 is a diagram (side view) viewed from the X direction, schematically showing the structure of the first holding mechanism and the transport moving mechanism of the embodiment. 7 is a cross-sectional view schematically showing the structure of a rack and pinion mechanism according to the embodiment. 8 is a diagram (front view) viewed from the Y direction schematically showing the structure of the second holding mechanism and the transport moving mechanism of the embodiment. 9 is a diagram (plan view) viewed from the Z direction, schematically showing the structure of the transfer table, the container installation part, and the transport and storage mechanism of the embodiment. 10 is (a) a perspective view and (b) a cross-sectional view schematically showing the structure of the cylindrical container according to the embodiment. FIG. 11 is a diagram (front view) viewed from the Y direction, schematically showing the structure of the first conveyance mechanism of the embodiment. FIG. 12 is a schematic diagram showing (a) a route for good products and (b) a route for defective products in the classification mechanism according to the embodiment. FIG. 13 is a diagram schematically showing the movement paths of the first holding mechanism and the second holding mechanism of the embodiment. FIG. 14 is a schematic diagram showing a classification mechanism according to a modified embodiment.
2A、2B:切斷用台(加工台) 2A, 2B: Cutting table (processing table)
3:第一保持機構 3: The first holding mechanism
4:切斷機構(加工機構) 4: Cutting mechanism (processing mechanism)
5:移載台 5:Transfer platform
6:第二保持機構 6: Second holding mechanism
7:搬送用移動機構 7:Moving mechanism for transportation
8:加工用移動機構(切斷用移動機構) 8: Moving mechanism for processing (moving mechanism for cutting)
9A、9B:旋轉機構 9A, 9B: Rotating mechanism
10A、10B:真空泵 10A, 10B: Vacuum pump
11:基板供給機構 11:Substrate supply mechanism
13:檢查部 13:Inspection Department
14:反轉機構 14:Reversal mechanism
17:加工屑收容部 17: Processing waste collection department
18:第一清潔機構 18:The first cleaning agency
19:第二清潔機構 19:Second cleaning mechanism
21:容器設置部 21: Container setting department
22:搬送收容機構 22:Transfer to a shelter
23:中間台 23: Center stage
24:第一搬送機構 24:First transport mechanism
25:第二搬送機構 25: Second transport mechanism
26:攝像部 26:Camera Department
27:判定部 27: Judgment Department
28:分類機構 28:Classification agency
29:廢棄容器 29:Abandoned containers
40:旋轉工具 40: Rotary tool
41A、41B:刀片 41A, 41B: Blade
42A、42B:心軸部 42A, 42B: Spindle part
71:傳遞軸 71:Transmission shaft
100:切斷裝置(加工裝置) 100: Cutting device (processing device)
111:基板收容部 111:Substrate receiving section
112:基板供給部 112:Substrate supply department
113:加熱部 113:Heating part
131:第一檢查部(檢查部) 131:First Inspection Department (Inspection Department)
132:第二檢查部(檢查部) 132:Second Inspection Department (Inspection Department)
141:保持台 141:Keeping platform
142:反轉部 142:Reversal Department
172:回收容器 172:Recycling container
211:空容器收容部 211: Empty Container Collection Department
212:插入位置設置部 212: Insertion position setting part
213:收容完畢容器收容部 213: Containment Completed Container Containment Department
241:製品吸附機構 241: Product adsorption mechanism
242:吸附用移動機構 242:Moving mechanism for adsorption
251:製品引導部 251: Product Guidance Department
252:製品移動部 252: Product Moving Department
812:支撐體 812:Support
CTL:控制部 CTL:Control Department
P:製品(加工品) P: products (processed products)
RP:保持位置 RP: maintain position
W:密封完畢基板(加工對象物) W: Sealed substrate (object to be processed)
X、Y、Z、θ:方向 X, Y, Z, θ: direction
X1:移載位置 X1: transfer position
X2:取出位置 X2: take out position
Claims (9)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021-127498 | 2021-08-03 | ||
JP2021127498A JP2023022562A (en) | 2021-08-03 | 2021-08-03 | Processing apparatus and method for manufacturing processed product |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202308023A TW202308023A (en) | 2023-02-16 |
TWI830259B true TWI830259B (en) | 2024-01-21 |
Family
ID=85154178
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW111122761A TWI830259B (en) | 2021-08-03 | 2022-06-20 | Processing device and method of manufacturing processed product |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP2023022562A (en) |
KR (1) | KR20240014506A (en) |
CN (1) | CN117678055A (en) |
TW (1) | TWI830259B (en) |
WO (1) | WO2023013146A1 (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5382261A (en) * | 1976-12-28 | 1978-07-20 | Seiko Epson Corp | Semiconductor wafer dicing method |
JP2007536727A (en) * | 2004-05-07 | 2007-12-13 | ハンミ セミコンダクター カンパニー リミテッド | Cutting and handler system for semiconductor package manufacturing process |
KR100917025B1 (en) * | 2007-09-20 | 2009-09-10 | 세크론 주식회사 | Sawing/sorting system and method of sorting a semiconductor package using the same |
WO2009113236A1 (en) * | 2008-03-11 | 2009-09-17 | Towa株式会社 | Method and apparatus for cutting substrate |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6469039A (en) * | 1987-09-10 | 1989-03-15 | Matsushita Electronics Corp | Resin-sealed semiconductor device |
JP4295496B2 (en) | 2002-12-03 | 2009-07-15 | 株式会社ディスコ | Bellows mechanism and cutting device with bellows mechanism |
JP5785069B2 (en) * | 2011-12-05 | 2015-09-24 | 株式会社ディスコ | Cutting equipment |
-
2021
- 2021-08-03 JP JP2021127498A patent/JP2023022562A/en active Pending
-
2022
- 2022-03-22 KR KR1020237045068A patent/KR20240014506A/en unknown
- 2022-03-22 CN CN202280047979.0A patent/CN117678055A/en active Pending
- 2022-03-22 WO PCT/JP2022/013026 patent/WO2023013146A1/en active Application Filing
- 2022-06-20 TW TW111122761A patent/TWI830259B/en active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5382261A (en) * | 1976-12-28 | 1978-07-20 | Seiko Epson Corp | Semiconductor wafer dicing method |
JP2007536727A (en) * | 2004-05-07 | 2007-12-13 | ハンミ セミコンダクター カンパニー リミテッド | Cutting and handler system for semiconductor package manufacturing process |
KR100917025B1 (en) * | 2007-09-20 | 2009-09-10 | 세크론 주식회사 | Sawing/sorting system and method of sorting a semiconductor package using the same |
WO2009113236A1 (en) * | 2008-03-11 | 2009-09-17 | Towa株式会社 | Method and apparatus for cutting substrate |
Also Published As
Publication number | Publication date |
---|---|
JP2023022562A (en) | 2023-02-15 |
WO2023013146A1 (en) | 2023-02-09 |
CN117678055A (en) | 2024-03-08 |
TW202308023A (en) | 2023-02-16 |
KR20240014506A (en) | 2024-02-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI818861B (en) | Processing apparatus and producing method of processed article | |
TWI806486B (en) | Machining apparatus and method for manufacturing workpiece | |
TWI830259B (en) | Processing device and method of manufacturing processed product | |
TWI810856B (en) | Processing apparatus, and manufacturing method of processed product | |
TWI834199B (en) | Processing device and method of manufacturing processed product | |
TWI823298B (en) | Processing apparatus, and manufacturing method of processed product | |
TWI830247B (en) | Processing device and method for producing processed product | |
TWI826950B (en) | Machining apparatus and method for manufacturing workpiece | |
TWI830233B (en) | Processing device and method for producing processed product | |
TWI819815B (en) | Processing device and manufacturing method of processed product | |
TWI785840B (en) | Machining apparatus and method for manufacturing workpiece |