TWI821809B - 金屬氧化物分散液 - Google Patents
金屬氧化物分散液 Download PDFInfo
- Publication number
- TWI821809B TWI821809B TW110144952A TW110144952A TWI821809B TW I821809 B TWI821809 B TW I821809B TW 110144952 A TW110144952 A TW 110144952A TW 110144952 A TW110144952 A TW 110144952A TW I821809 B TWI821809 B TW I821809B
- Authority
- TW
- Taiwan
- Prior art keywords
- acrylate
- methacrylate
- metal oxide
- oxide dispersion
- group
- Prior art date
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- 239000006185 dispersion Substances 0.000 title claims abstract description 93
- 229910044991 metal oxide Inorganic materials 0.000 title claims abstract description 57
- 150000004706 metal oxides Chemical class 0.000 title claims abstract description 57
- 239000000178 monomer Substances 0.000 claims abstract description 48
- 239000002105 nanoparticle Substances 0.000 claims abstract description 27
- 239000013078 crystal Substances 0.000 claims abstract description 23
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims abstract description 19
- 229910001928 zirconium oxide Inorganic materials 0.000 claims abstract description 17
- 239000003607 modifier Substances 0.000 claims abstract description 14
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 65
- -1 2-hydroxyethyl acrylate Ester Chemical class 0.000 claims description 50
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 claims description 22
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 18
- 239000007788 liquid Substances 0.000 claims description 17
- 230000003287 optical effect Effects 0.000 claims description 17
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 16
- 235000010290 biphenyl Nutrition 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 13
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 12
- 239000004305 biphenyl Substances 0.000 claims description 12
- 229920000570 polyether Polymers 0.000 claims description 12
- 239000002270 dispersing agent Substances 0.000 claims description 10
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 claims description 7
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 claims description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 6
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims description 6
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 6
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 claims description 6
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 claims description 5
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 claims description 4
- ISIJTNKFVCLMLI-UHFFFAOYSA-N N-(3-dimethoxysilylpropyl)aniline Chemical compound C1(=CC=CC=C1)NCCC[SiH](OC)OC ISIJTNKFVCLMLI-UHFFFAOYSA-N 0.000 claims description 4
- RBVLUTAXWVILBT-UHFFFAOYSA-N ethyl prop-2-eneperoxoate Chemical compound CCOOC(=O)C=C RBVLUTAXWVILBT-UHFFFAOYSA-N 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- SBYHFKPVCBCYGV-UHFFFAOYSA-N quinuclidine Chemical compound C1CC2CCN1CC2 SBYHFKPVCBCYGV-UHFFFAOYSA-N 0.000 claims description 4
- GOUZWCLULXUQSR-UHFFFAOYSA-N (2-chlorophenyl) prop-2-enoate Chemical compound ClC1=CC=CC=C1OC(=O)C=C GOUZWCLULXUQSR-UHFFFAOYSA-N 0.000 claims description 3
- OBSKPJKNWVTXJQ-UHFFFAOYSA-N (2-nitrophenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1[N+]([O-])=O OBSKPJKNWVTXJQ-UHFFFAOYSA-N 0.000 claims description 3
- WBBKYDCLZKGNSD-UHFFFAOYSA-N (2-nitrophenyl)methyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1[N+]([O-])=O WBBKYDCLZKGNSD-UHFFFAOYSA-N 0.000 claims description 3
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 claims description 3
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 claims description 3
- SIADNYSYTSORRE-UHFFFAOYSA-N (4-chlorophenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(Cl)C=C1 SIADNYSYTSORRE-UHFFFAOYSA-N 0.000 claims description 3
- ARWSNPDINLVISQ-UHFFFAOYSA-N (4-nitrophenyl)methyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=C([N+]([O-])=O)C=C1 ARWSNPDINLVISQ-UHFFFAOYSA-N 0.000 claims description 3
- CEXMTZSYTLNAOG-UHFFFAOYSA-N 1,1,2,3,3,3-hexafluoropropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(F)(F)C(F)C(F)(F)F CEXMTZSYTLNAOG-UHFFFAOYSA-N 0.000 claims description 3
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 claims description 3
- HFGOJHZGZKOYOH-UHFFFAOYSA-N 1-(2-methoxyphenyl)-4-[(2-phenylphenyl)methyl]piperazine Chemical compound COC1=CC=CC=C1N1CCN(CC=2C(=CC=CC=2)C=2C=CC=CC=2)CC1 HFGOJHZGZKOYOH-UHFFFAOYSA-N 0.000 claims description 3
- OCJKEFFQAUMPTO-UHFFFAOYSA-N 1-(4-methoxyphenyl)-4-[(2-phenylphenyl)methyl]piperazine Chemical compound C1=CC(OC)=CC=C1N1CCN(CC=2C(=CC=CC=2)C=2C=CC=CC=2)CC1 OCJKEFFQAUMPTO-UHFFFAOYSA-N 0.000 claims description 3
- SQQZOCBNDHOJEJ-UHFFFAOYSA-N 1-[(2-phenylphenyl)methyl]-4-(2-propan-2-yloxyphenyl)piperazine Chemical compound CC(C)OC1=CC=CC=C1N1CCN(CC=2C(=CC=CC=2)C=2C=CC=CC=2)CC1 SQQZOCBNDHOJEJ-UHFFFAOYSA-N 0.000 claims description 3
- UCRKMUUOHCZVJX-UHFFFAOYSA-N 1-phenyl-4-[(2-phenylphenyl)methyl]piperazine Chemical compound C=1C=CC=C(C=2C=CC=CC=2)C=1CN(CC1)CCN1C1=CC=CC=C1 UCRKMUUOHCZVJX-UHFFFAOYSA-N 0.000 claims description 3
- VBHXIMACZBQHPX-UHFFFAOYSA-N 2,2,2-trifluoroethyl prop-2-enoate Chemical compound FC(F)(F)COC(=O)C=C VBHXIMACZBQHPX-UHFFFAOYSA-N 0.000 claims description 3
- FTALTLPZDVFJSS-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl prop-2-enoate Chemical compound CCOCCOCCOC(=O)C=C FTALTLPZDVFJSS-UHFFFAOYSA-N 0.000 claims description 3
- COORVRSSRBIIFJ-UHFFFAOYSA-N 2-[2-(2-hydroxyethoxy)ethoxy]-1-methoxyethanol;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(O)COCCOCCO COORVRSSRBIIFJ-UHFFFAOYSA-N 0.000 claims description 3
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 claims description 3
- CEXQWAAGPPNOQF-UHFFFAOYSA-N 2-phenoxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOC1=CC=CC=C1 CEXQWAAGPPNOQF-UHFFFAOYSA-N 0.000 claims description 3
- RZVINYQDSSQUKO-UHFFFAOYSA-N 2-phenoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CC=CC=C1 RZVINYQDSSQUKO-UHFFFAOYSA-N 0.000 claims description 3
- GUXLAULAZDJOEK-UHFFFAOYSA-N 3-(oxiran-2-ylmethoxy)propyl-triphenoxysilane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)CCCOCC1CO1 GUXLAULAZDJOEK-UHFFFAOYSA-N 0.000 claims description 3
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 claims description 3
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 claims description 3
- 229930185605 Bisphenol Natural products 0.000 claims description 3
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 claims description 3
- IKODBJXODOKUPU-UHFFFAOYSA-N OC(C(CC1=CC(OC2=CC=CC=C2)=CC=C1)=CC1=CC=CC2=CC=CC=C12)=O Chemical compound OC(C(CC1=CC(OC2=CC=CC=C2)=CC=C1)=CC1=CC=CC2=CC=CC=C12)=O IKODBJXODOKUPU-UHFFFAOYSA-N 0.000 claims description 3
- LCXXNKZQVOXMEH-UHFFFAOYSA-N Tetrahydrofurfuryl methacrylate Chemical compound CC(=C)C(=O)OCC1CCCO1 LCXXNKZQVOXMEH-UHFFFAOYSA-N 0.000 claims description 3
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 claims description 3
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 claims description 3
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 claims description 3
- GSJNBCZKEUYYLK-UHFFFAOYSA-N [phenoxy(phenyl)methyl] prop-2-enoate Chemical compound C=1C=CC=CC=1C(OC(=O)C=C)OC1=CC=CC=C1 GSJNBCZKEUYYLK-UHFFFAOYSA-N 0.000 claims description 3
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 3
- DXOGIYKUUNHDSH-UHFFFAOYSA-N benzoic acid;2-ethyl-2-(hydroxymethyl)propane-1,3-diol Chemical compound CCC(CO)(CO)CO.OC(=O)C1=CC=CC=C1 DXOGIYKUUNHDSH-UHFFFAOYSA-N 0.000 claims description 3
- SQJJLIIRJIYBBO-UHFFFAOYSA-N benzoic acid;2-ethyl-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.CCC(CO)(CO)CO.OC(=O)C1=CC=CC=C1 SQJJLIIRJIYBBO-UHFFFAOYSA-N 0.000 claims description 3
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 claims description 3
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 claims description 3
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 claims description 3
- 125000006269 biphenyl-2-yl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C1=C(*)C([H])=C([H])C([H])=C1[H] 0.000 claims description 3
- GTPDFCLBTFKHNH-UHFFFAOYSA-N chloro(phenyl)silicon Chemical compound Cl[Si]C1=CC=CC=C1 GTPDFCLBTFKHNH-UHFFFAOYSA-N 0.000 claims description 3
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 claims description 3
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 claims description 3
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 claims description 3
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 claims description 3
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 claims description 3
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 claims description 3
- HHBOIIOOTUCYQD-UHFFFAOYSA-N ethoxy-dimethyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(C)CCCOCC1CO1 HHBOIIOOTUCYQD-UHFFFAOYSA-N 0.000 claims description 3
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 claims description 3
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 claims description 3
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 claims description 3
- CUIXFHFVVWQXSW-UHFFFAOYSA-N methyl-[3-(oxiran-2-ylmethoxy)propyl]-diphenoxysilane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(C)CCCOCC1CO1 CUIXFHFVVWQXSW-UHFFFAOYSA-N 0.000 claims description 3
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 claims description 3
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 claims description 3
- PARWUHTVGZSQPD-UHFFFAOYSA-N phenylsilane Chemical compound [SiH3]C1=CC=CC=C1 PARWUHTVGZSQPD-UHFFFAOYSA-N 0.000 claims description 3
- 239000005054 phenyltrichlorosilane Substances 0.000 claims description 3
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 claims description 3
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 claims description 3
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 claims description 3
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 claims description 3
- AFFZTFNQQHNSEG-UHFFFAOYSA-N trifluoromethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(F)(F)F AFFZTFNQQHNSEG-UHFFFAOYSA-N 0.000 claims description 3
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 claims description 3
- OJAJJFGMKAZGRZ-UHFFFAOYSA-N trimethyl(phenoxy)silane Chemical compound C[Si](C)(C)OC1=CC=CC=C1 OJAJJFGMKAZGRZ-UHFFFAOYSA-N 0.000 claims description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 3
- ASULPTPKYZUPFI-UHFFFAOYSA-N (2-nitrophenyl) prop-2-enoate Chemical compound [O-][N+](=O)C1=CC=CC=C1OC(=O)C=C ASULPTPKYZUPFI-UHFFFAOYSA-N 0.000 claims description 2
- NACSMDAZDYUKMU-UHFFFAOYSA-N (4-nitrophenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C([N+]([O-])=O)C=C1 NACSMDAZDYUKMU-UHFFFAOYSA-N 0.000 claims description 2
- XSQUPVXOENTCJV-UHFFFAOYSA-N (6-phenylpyridin-3-yl)boronic acid Chemical compound N1=CC(B(O)O)=CC=C1C1=CC=CC=C1 XSQUPVXOENTCJV-UHFFFAOYSA-N 0.000 claims description 2
- KBFMLDFKMYHWRP-UHFFFAOYSA-N 1-(2-ethoxyphenyl)-4-[(2-phenylphenyl)methyl]piperazine Chemical compound CCOC1=CC=CC=C1N1CCN(CC=2C(=CC=CC=2)C=2C=CC=CC=2)CC1 KBFMLDFKMYHWRP-UHFFFAOYSA-N 0.000 claims description 2
- BDPNJTJORLNNJR-UHFFFAOYSA-N 2-hydroxy-3-phenoxyprop-2-enoic acid Chemical compound OC(=O)C(O)=COC1=CC=CC=C1 BDPNJTJORLNNJR-UHFFFAOYSA-N 0.000 claims description 2
- VJAVYPBHLPJLSN-UHFFFAOYSA-N 3-dimethoxysilylpropan-1-amine Chemical compound CO[SiH](OC)CCCN VJAVYPBHLPJLSN-UHFFFAOYSA-N 0.000 claims description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 claims description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 2
- MNFGEHQPOWJJBH-UHFFFAOYSA-N diethoxy-methyl-phenylsilane Chemical compound CCO[Si](C)(OCC)C1=CC=CC=C1 MNFGEHQPOWJJBH-UHFFFAOYSA-N 0.000 claims description 2
- BQRPSOKLSZSNAR-UHFFFAOYSA-N ethenyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)C=C BQRPSOKLSZSNAR-UHFFFAOYSA-N 0.000 claims description 2
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 claims description 2
- 239000004814 polyurethane Substances 0.000 claims description 2
- 229920002635 polyurethane Polymers 0.000 claims description 2
- QCTJRYGLPAFRMS-UHFFFAOYSA-N prop-2-enoic acid;1,3,5-triazine-2,4,6-triamine Chemical compound OC(=O)C=C.NC1=NC(N)=NC(N)=N1 QCTJRYGLPAFRMS-UHFFFAOYSA-N 0.000 claims description 2
- 229910000077 silane Inorganic materials 0.000 claims description 2
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 claims description 2
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 claims description 2
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 claims description 2
- 125000004182 2-chlorophenyl group Chemical group [H]C1=C([H])C(Cl)=C(*)C([H])=C1[H] 0.000 claims 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 1
- 125000003277 amino group Chemical group 0.000 claims 1
- 125000003700 epoxy group Chemical group 0.000 claims 1
- PYLQTSDBGKCCKH-UHFFFAOYSA-N ethenyl(diphenoxy)silane Chemical compound C(=C)[SiH](OC1=CC=CC=C1)OC1=CC=CC=C1 PYLQTSDBGKCCKH-UHFFFAOYSA-N 0.000 claims 1
- OSFYKIAPYRJIPM-UHFFFAOYSA-N ethenyl-bis(2-methylpropoxy)silane Chemical compound C(C(C)C)O[SiH](C=C)OCC(C)C OSFYKIAPYRJIPM-UHFFFAOYSA-N 0.000 claims 1
- PRGIIDRGNIQJJT-UHFFFAOYSA-N ethenyl-di(propan-2-yloxy)silane Chemical compound CC(C)O[SiH](OC(C)C)C=C PRGIIDRGNIQJJT-UHFFFAOYSA-N 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- IJDPTZAAMQZZKW-UHFFFAOYSA-N methyl prop-2-enoate;prop-1-ene Chemical compound CC=C.COC(=O)C=C IJDPTZAAMQZZKW-UHFFFAOYSA-N 0.000 claims 1
- 125000003396 thiol group Chemical group [H]S* 0.000 claims 1
- 239000002245 particle Substances 0.000 description 23
- 239000010408 film Substances 0.000 description 20
- 230000000052 comparative effect Effects 0.000 description 12
- 238000001027 hydrothermal synthesis Methods 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 229920000089 Cyclic olefin copolymer Polymers 0.000 description 5
- 239000004698 Polyethylene Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 239000013256 coordination polymer Substances 0.000 description 4
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 4
- 229920000573 polyethylene Polymers 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 239000004713 Cyclic olefin copolymer Substances 0.000 description 3
- 239000004696 Poly ether ether ketone Substances 0.000 description 3
- 239000004697 Polyetherimide Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000012788 optical film Substances 0.000 description 3
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920002530 polyetherether ketone Polymers 0.000 description 3
- 229920001601 polyetherimide Polymers 0.000 description 3
- 239000011112 polyethylene naphthalate Substances 0.000 description 3
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 description 3
- 229940095095 2-hydroxyethyl acrylate Drugs 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- SAPGBCWOQLHKKZ-UHFFFAOYSA-N 6-(2-methylprop-2-enoyloxy)hexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCCCOC(=O)C(C)=C SAPGBCWOQLHKKZ-UHFFFAOYSA-N 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- QTDAEXIZRGZAFR-UHFFFAOYSA-L [O--].[O--].[O--].O[Zr+3].O[Zr+3] Chemical compound [O--].[O--].[O--].O[Zr+3].O[Zr+3] QTDAEXIZRGZAFR-UHFFFAOYSA-L 0.000 description 2
- 238000005054 agglomeration Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 150000005215 alkyl ethers Chemical class 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- GNEPOXWQWFSSOU-UHFFFAOYSA-N dichloro-methyl-phenylsilane Chemical compound C[Si](Cl)(Cl)C1=CC=CC=C1 GNEPOXWQWFSSOU-UHFFFAOYSA-N 0.000 description 2
- CVQVSVBUMVSJES-UHFFFAOYSA-N dimethoxy-methyl-phenylsilane Chemical compound CO[Si](C)(OC)C1=CC=CC=C1 CVQVSVBUMVSJES-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- FEHYCIQPPPQNMI-UHFFFAOYSA-N ethenyl(triphenoxy)silane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(C=C)OC1=CC=CC=C1 FEHYCIQPPPQNMI-UHFFFAOYSA-N 0.000 description 2
- DYFMAHYLCRSUHA-UHFFFAOYSA-N ethenyl-tris(2-methylpropoxy)silane Chemical compound CC(C)CO[Si](OCC(C)C)(OCC(C)C)C=C DYFMAHYLCRSUHA-UHFFFAOYSA-N 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- YKZMWXJHPKWFLS-UHFFFAOYSA-N (2-chlorophenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1Cl YKZMWXJHPKWFLS-UHFFFAOYSA-N 0.000 description 1
- WZFAVDDTRQICHQ-UHFFFAOYSA-N 1-(3-methoxyphenyl)-4-[(2-phenylphenyl)methyl]piperazine Chemical compound COC1=CC=CC(N2CCN(CC=3C(=CC=CC=3)C=3C=CC=CC=3)CC2)=C1 WZFAVDDTRQICHQ-UHFFFAOYSA-N 0.000 description 1
- BUAWXVIWHUELGN-UHFFFAOYSA-N 2-(2-nitrophenyl)prop-2-enoic acid Chemical compound OC(=O)C(=C)C1=CC=CC=C1[N+]([O-])=O BUAWXVIWHUELGN-UHFFFAOYSA-N 0.000 description 1
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- POTUAWAXFYAYJW-UHFFFAOYSA-N C(C=C)(=O)O.ClC1=CC=CC=C1 Chemical compound C(C=C)(=O)O.ClC1=CC=CC=C1 POTUAWAXFYAYJW-UHFFFAOYSA-N 0.000 description 1
- MLOIUPIQFCEGDZ-UHFFFAOYSA-N CC(C(=O)OC)=C.ClC1=CC=CC=C1 Chemical compound CC(C(=O)OC)=C.ClC1=CC=CC=C1 MLOIUPIQFCEGDZ-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- NXQNMWHBACKBIG-UHFFFAOYSA-N OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCCC(O)(O)O Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCCC(O)(O)O NXQNMWHBACKBIG-UHFFFAOYSA-N 0.000 description 1
- 229920002873 Polyethylenimine Polymers 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- SMJGYXFCYAGTOP-UHFFFAOYSA-N [SiH4].C(=C)[Si](OC(C)C)(OC(C)C)OC(C)C Chemical compound [SiH4].C(=C)[Si](OC(C)C)(OC(C)C)OC(C)C SMJGYXFCYAGTOP-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- JUPQTSLXMOCDHR-UHFFFAOYSA-N benzene-1,4-diol;bis(4-fluorophenyl)methanone Chemical compound OC1=CC=C(O)C=C1.C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 JUPQTSLXMOCDHR-UHFFFAOYSA-N 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- CIQDYIQMZXESRD-UHFFFAOYSA-N dimethoxy(phenyl)silane Chemical compound CO[SiH](OC)C1=CC=CC=C1 CIQDYIQMZXESRD-UHFFFAOYSA-N 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- MABAWBWRUSBLKQ-UHFFFAOYSA-N ethenyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)C=C MABAWBWRUSBLKQ-UHFFFAOYSA-N 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 125000005641 methacryl group Chemical group 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000012994 photoredox catalyst Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/02—Emulsion paints including aerosols
- C09D5/024—Emulsion paints including aerosols characterised by the additives
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- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/008—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
- C03C17/009—Mixtures of organic and inorganic materials, e.g. ormosils and ormocers
-
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
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- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
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- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
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- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
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- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/63—Additives non-macromolecular organic
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
-
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- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
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- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
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Abstract
本發明係關於一種金屬氧化物分散液,更具體而言,係關於一種包括氧化鋯奈米粒子、單體及表面改性劑之金屬氧化物分散液,並且,該氧化鋯奈米粒子之正方晶系之峰強度(I
t)及單斜晶系之峰強度(I
m)受到控制。
Description
本發明係關於一種包括氧化鋯粒子之金屬氧化物分散液。
含有金屬氧化物之組合物有用地用於製造用於顯示之薄膜等。用於顯示之薄膜要求具有光學透射率(optical transmittance)、光學霧度(optical haze)、光學透明度(optical clarity)及折射率等特性。用於顯示之薄膜之一個例項係亮度增強膜。
此種顯示用薄膜用於提高顯示器之亮度等。其可應用於文字處理器、桌上型顯示器、電視、攝像機以及汽車及飛機顯示器等。
當使用此種顯示用薄膜時,可較佳地改良包括折射率之特定面板表面上之光學特性及物理特性。例如,當提供亮度增強膜等時,藉由改良亮度,可使用較少功率來照亮顯示器,從而降低功耗,降低發熱程度,延長產品壽命,從而可更有效地使用電子產品。
此種顯示用薄膜之材料仍有待發展,為了更有效地生產此種材料,需要研發出可在包括金屬氧化物的同時保持高折射率,以及在組合物中具有金屬氧化物之高分散性及低黏度之金屬氧化物分散液。
待解決之技術問題
本發明之目的在於解決上述問題,即提供一種金屬氧化物分散液,其藉由調節氧化鋯奈米粉末之晶相之比例,從而具有高折射率及低黏度。
然而,本發明待解決之問題並非受限於上述言及之問題,未言及之其他問題能夠藉由以下記載由熟習此項技術者所明確理解。
解決問題之技術方法
根據本發明之實施例之金屬氧化物分散液包括:氧化鋯奈米粒子;單體;及表面改性劑,並且,該氧化鋯奈米粒子之正方晶系之峰強度(I
t)及單斜晶系之峰強度(I
m)滿足以下公式:
[式1]
3<I
t/I
m<4。
根據本發明之一實施例,該氧化鋯奈米粒子可包括:單斜晶系之晶體結構30%至40%;及正方晶系之晶體結構60%至70%。
根據本發明之一實施例,該氧化鋯奈米粒子可佔該金屬氧化物分散液之40重量%至70重量%。
根據本發明之一實施例,該單體佔該金屬氧化物分散液之1重量%至50重量%,並且,該單體可包括自由以下各項組成之群組中選擇的至少一種以上:丙烯酸甲酯、丙烯酸月桂酯、乙氧基二甘醇丙烯酸酯、甲氧基三甘醇丙烯酸酯、丙烯酸苯氧基乙酯、丙烯酸四氫糠酯、丙烯酸異冰片酯、2-羥乙基丙烯酸酯、2-羥丙基丙烯酸酯、2-羥基-3-苯氧基丙烯酸酯、新戊二醇二丙烯酸酯、1,6-己二醇二丙烯酸酯、三羥甲基丙烷三丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、雙季戊四醇六丙烯酸酯、三羥甲基丙烷丙烯酸苯甲酸酯、三羥甲基丙烷苯甲酸酯、甲基丙烯酸甲酯、甲基丙烯酸2-乙基己酯、n-甲基丙烯酸硬脂酯、甲基丙烯酸環己酯、甲基丙烯酸四氫糠酯、甲基丙烯酸苯氧乙酯、甲基丙烯酸甲氧基聚乙烯、2-羥乙基甲基丙烯酸酯、甲基丙烯酸2-羥基丁酯-甲基丙烯酸十七氟癸酯、甲基丙烯酸三氟甲酯、丙烯酸三氟乙酯、甲基丙烯酸六氟丙酯、1,6-己二醇二甲基丙烯酸酯、三羥甲基丙烷三甲基丙烯酸酯、二甲基丙烯酸甘油酯六亞甲基二異氰酸酯、乙二醇二甲基丙烯酸酯、聚氨酯丙烯酸酯、環氧丙烯酸酯、三聚氰胺丙烯酸酯、丙烯酸苄酯、甲基丙烯酸苄酯、丙烯酸苯酯、丙烯酸二苯酯、丙烯酸聯苯酯、2-聯苯丙烯酸酯、2-([1,1’-聯苯]-2-芳氧基)丙烯酸乙酯、丙烯酸苯氧基苄酯、3-苯氧基苄基-3-(1-萘基)丙烯酸酯、(2E)-3-羥基-2-(3-苯氧基苄基)丙烯酸乙酯、甲基丙烯酸苯酯、甲基丙烯酸聯苯酯、2-硝基苯基丙烯酸酯、4-硝基苯基丙烯酸酯、2-硝基苯基甲基丙烯酸酯、4-硝基苯基甲基丙烯酸酯、2-硝基苄基甲基丙烯酸酯、4-硝基苄基甲基丙烯酸酯、2-氯苯基丙烯酸酯、4-氯苯基丙烯酸酯、2-氯苯基甲基丙烯酸酯、4-氯苯基甲基丙烯酸酯、鄰苯苯酚丙烯酸乙酯、苯基苯酚、甲基丙烯酸聯苯酯、鄰苯苯酚乙氧基丙烯酸酯、1-(聯苯-2-基甲基)-4-苯基哌嗪、1-(聯苯-2-基甲基)-4-(2-甲氧基苯基)哌嗪、1-(聯苯-2-基甲基)-4-(2-乙氧基苯基)哌嗪、1-(聯苯-2-基甲基)-4-(2-異丙氧基苯基)哌嗪、1-(聯苯-2-基甲基)-4-(3-甲氧基苯基)哌嗪、1-(聯苯-2-基甲基)-4-(4-甲氧基苯基)哌嗪及雙酚二丙烯酸酯。
根據本發明之一實施例,該表面改性劑包括矽烷偶合劑,並且,該矽烷偶合劑可包括自由以下各項組成之群組中選擇的至少一種以上:丙烯酸酯基、(甲基)丙烯酸基、環氧基(epoxy)、烷氧基(alkoxy)、乙烯基(vinyl)、苯基(phenyl)、甲基丙烯醯氧基(methacryloxy)、氨基(amino)、氯矽烷基(chlorosilanyl)、氯丙基(chloropropyl)及巰基(mercapto)。
根據本發明之一實施例,該表面改性劑可包括自由以下各項組成之群組中選擇的至少一種以上:(3-縮水甘油氧基丙基)三甲氧基矽烷、(3-縮水甘油氧基丙基)三乙氧基矽烷、(3-縮水甘油氧基丙基)甲基二甲氧基矽烷、(3-縮水甘油氧基丙基)二甲基乙氧基矽烷、3-(甲基丙烯醯氧基)丙基三甲氧基矽烷、3,4-環氧丁基三甲氧基矽烷、3,4-環氧丁基三乙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、2-(3,4-環氧環己基)乙基三乙氧基矽烷、氨丙基三乙氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三叔丁氧基矽烷、乙烯基三異丁氧基矽烷、乙烯基三異丙氧基矽烷、乙烯基三苯氧基矽烷、氨丙基二甲氧基矽烷、N-苯基-3-氨丙基二甲氧基矽烷、苯基矽烷、苯基二甲氧基矽烷、苯基三乙氧基矽烷、苯基氯矽烷、苯基三氯矽烷、γ-縮水甘油氧基丙基三苯氧基矽烷、γ-縮水甘油氧基丙基甲基二苯氧基矽烷、二氯二苯基矽烷、N-苯基-γ-氨基丙基二甲氧基矽烷、二甲氧基甲基苯基矽烷、二苯基二甲氧基矽烷、二乙氧基二苯基矽烷、甲基苯基二乙氧基矽烷、甲基苯基二氯矽烷及苯氧基三甲基矽烷。
根據本發明之一實施例,針對該金屬氧化物分散液中該氧化鋯奈米粒子之總重量,該表面改性劑可佔10重量份至20重量份。
根據本發明之一實施例,該金屬氧化物分散液亦包括分散劑,並且,該分散劑可包括自由以下各項組成之群組中選擇的至少一種以上:聚醚酸類化合物、聚醚胺類化合物、聚醚酸/胺混合物、包括磷酸基之酯類化合物及包括磷酸基之聚醚類化合物。
根據本發明之一實施例,該金屬氧化物分散液之折射率可係1.60以上。
根據本發明之一實施例,該金屬氧化物分散液之黏度可係400 CP以下。
根據本發明之一實施例,該金屬氧化物分散液可係無溶劑型的。
根據本發明之一實施例的用於柔性顯示之光學元件,該光學元件係使用根據本發明之金屬氧化物分散液而製造。
發明之效應
本發明可藉由施加具有受控晶相比例之氧化鋯奈米粉末來提供具有低黏度及高折射率之氧化鋯單體分散液。此外,該分散液在氧化鋯粒子之分散性方面係最佳的,提供相對低黏度,具有最佳流動性及可塑性,並且其可適用為能夠提高裝置(即,顯示裝置)之效率之顯示溶膠分散液。
以下,對本發明之實施例進行詳細說明。在說明本發明之程序中,當判斷對於相關公知功能或者構成之具體說明不必要地混淆本發明之要旨時,省略對其進行詳細說明。並且,本說明書中所使用之術語用於準確地表達本發明之較佳實施例,能夠根據使用者、利用者之意圖或者本發明所述技術領域之慣例而有所不同。由此,對於本術語之定義應根據本說明書之整體內容進行定義。
在整體說明書中,當說明某一部分「包括」某一構成要素時,不表示排除其他構成要素,亦能夠包括其他構成要素。
以下,參照實施例對本發明之拋光漿料組合物進行具體說明。然而,本發明並非限定於上述實施例。
本發明係關於一種金屬氧化物分散液,根據本發明之一實施例,該金屬氧化物分散液可包括:氧化鋯奈米粒子;單體;及表面改性劑。
根據本發明之一實施例,該氧化鋯奈米粒子可藉由調節粉末之晶相比例來降低金屬氧化物分散液之黏度,並表現出高折射率。亦即,該晶相之比例可調節在XRD圖譜中對應於正方晶系及單斜晶系之峰值強度比例、正方晶系及單斜晶系晶相之比例,或者兩者。
作為本發明之一實例,該氧化鋯奈米粒子之正方晶系之峰強度(I
t)及單斜晶系之峰強度(I
m)可滿足以下公式:
[式1]
3<I
t/I
m<4。
作為本發明之一實例,在該氧化鋯奈米粒子中,單斜晶系之晶體結構可係30%至40%或34%至40%;且正方晶系之晶體結構可係60%至70%或60%至66%,並且,結合根據式1之峰強度比,可在具有高折射率的同時利於降低分散液之黏度。
作為本發明之一實例,該氧化鋯奈米粒子可佔該金屬氧化物分散液之40重量%至70重量%。當包括在上述範圍內時,由於該氧化鋯之含量低,導致分散液之折射率及亮度變低,從而防止難以提供高折射率固化膜之問題,並且,由於過量添加該氧化鋯粒子而導致氧化鋯粒子之間的分散間隔非常短,此會提高分散液之黏度,並且由於氧化鋯粒子之間發生凝聚而抑制分散性,並可減少光學性能之劣化。
作為本發明之一實例,該氧化鋯粒子之尺寸可係1 nm以上;10 nm以上;或50 nm至100 nm。
根據本發明之一實施例,該單體可以包括自由以下各項組成之群組中選擇的至少一種以上:C1-C22烷基丙烯酸酯類單體、C1-C22烷氧基丙烯酸酯類單體、C6-C24芳基丙烯酸酯類單體、C1-C22烷基(甲基)丙烯酸酯類單體、C1-C22烷氧基(甲基)丙烯酸酯類單體、C6-C24芳基(甲基)丙烯酸酯類單體、烷撐二醇二(甲基)丙烯酸酯基單體、烷撐二醇二丙烯酸酯類單體、烷撐二醇烷基醚(甲基)丙烯酸酯類單體、烷撐二醇烷基醚丙烯酸酯類單體、引入甲基丙烯酸酯及/或丙烯酸酯取代基之衍生物。
此外,該單體進一步被分子中之羥基、脂肪族環及芳香環(6至30個碳原子)中之至少一個以上取代,該「亞烷基」具有1至10個碳原子,並被包括為1至20個(n)碳原子;該「烷基醚」可包括具有1至20個碳原子之烷基。該單體可包括1至6個功能性丙烯酸酯,例如,雙功能、三功能等。
例如,該單體可係丙烯酸甲酯、丙烯酸月桂酯、乙氧基二甘醇丙烯酸酯、甲氧基三甘醇丙烯酸酯、丙烯酸苯氧基乙酯、丙烯酸四氫糠酯、丙烯酸異冰片酯、2-羥乙基丙烯酸酯、2-羥丙基丙烯酸酯、2-羥基-3-苯氧基丙烯酸酯、新戊二醇二丙烯酸酯、1,6-己二醇二丙烯酸酯、三羥甲基丙烷三丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、雙季戊四醇六丙烯酸酯、三羥甲基丙烷丙烯酸苯甲酸酯、三羥甲基丙烷苯甲酸酯、甲基丙烯酸甲酯、甲基丙烯酸2-乙基己酯、n-甲基丙烯酸硬脂酯、甲基丙烯酸環己酯、甲基丙烯酸四氫糠酯、甲基丙烯酸苯氧乙酯、甲基丙烯酸甲氧基聚乙烯、2-羥乙基甲基丙烯酸酯、甲基丙烯酸2-羥基丁酯-甲基丙烯酸十七氟癸酯、甲基丙烯酸三氟甲酯、丙烯酸三氟乙酯、甲基丙烯酸六氟丙酯、1,6-己二醇二甲基丙烯酸酯、三羥甲基丙烷三甲基丙烯酸酯、二甲基丙烯酸甘油酯六亞甲基二異氰酸酯、乙二醇二甲基丙烯酸酯、聚氨酯丙烯酸酯、環氧丙烯酸酯、三聚氰胺丙烯酸酯、丙烯酸苄酯、甲基丙烯酸苄酯、丙烯酸苯酯、丙烯酸二苯酯、丙烯酸聯苯酯、2-聯苯丙烯酸酯、2-([1,1’-聯苯]-2-芳氧基)丙烯酸乙酯、丙烯酸苯氧基苄酯、3-苯氧基苄基-3-(1-萘基)丙烯酸酯、(2E)-3-羥基-2-(3-苯氧基苄基)丙烯酸乙酯、甲基丙烯酸苯酯、甲基丙烯酸聯苯酯、2-硝基苯基丙烯酸酯、4-硝基苯基丙烯酸酯、2-硝基苯基甲基丙烯酸酯、4-硝基苯基甲基丙烯酸酯、2-硝基苄基甲基丙烯酸酯、4-硝基苄基甲基丙烯酸酯、2-氯苯基丙烯酸酯、4-氯苯基丙烯酸酯、2-氯苯基甲基丙烯酸酯、4-氯苯基甲基丙烯酸酯、鄰苯苯酚丙烯酸乙酯、苯基苯酚、甲基丙烯酸聯苯酯、鄰苯苯酚乙氧基丙烯酸酯、1-(聯苯-2-基甲基)-4-苯基哌嗪、1-(聯苯-2-基甲基)-4-(2-甲氧基苯基)哌嗪、1-(聯苯-2-基甲基)-4-(2-乙氧基苯基)哌嗪、1-(聯苯-2-基甲基)-4-(2-異丙氧基苯基)哌嗪、1-(聯苯-2-基甲基)-4-(3-甲氧基苯基)哌嗪、1-(聯苯-2-基甲基)-4-(4-甲氧基苯基)哌嗪及雙酚二丙烯酸酯等。
作為本發明之一實例,該單體可佔該金屬氧化物分散液之1重量%至50重量%;或10重量%至50重量%,並且,當其被包括在上述範圍內時,可藉由提高金屬氧化物之分散性並在後續程序中改良固化來提供具有高折射率及柔性之塗層。
根據本發明之一實施例,當該表面改性劑被包括在上述範圍內時,金屬氧化物溶膠分散液可用於有效分散溶膠分散液中之氧化鋯子,同時保持高折射率、適於形成膜之低黏度水平及有效透光率。藉此,即使當本發明之金屬氧化物分散液填充有高濃度之氧化鋯粒子,也確保了穩定之分散性,從而可製備保持高透明度之金屬氧化物溶膠。
作為本發明之一實例,該表面改性劑包括矽烷偶合劑,並且,該矽烷偶合劑可包括自由以下各項組成之群組中選擇的至少一種以上:丙烯酸酯基、(甲基)丙烯酸基、環氧基(epoxy)、烷氧基(alkoxy)、乙烯基(vinyl)、苯基(phenyl)、甲基丙烯醯氧基(methacryloxy)、氨基(amino)、氯矽烷基(chlorosilanyl)、氯丙基(chloropropyl)及巰基(mercapto)。該丙烯酸酯類單體及甲基丙烯酸酯類單體可被苯基取代。
例如,該表面改性劑可係(3-縮水甘油氧基丙基)三甲氧基矽烷、(3-縮水甘油氧基丙基)三乙氧基矽烷、(3-縮水甘油氧基丙基)甲基二甲氧基矽烷、(3-縮水甘油氧基丙基)二甲基乙氧基矽烷、3-(甲基丙烯醯氧基)丙基三甲氧基矽烷、3,4-環氧丁基三甲氧基矽烷、3,4-環氧丁基三乙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、2-(3,4-環氧環己基)乙基三乙氧基矽烷、氨丙基三乙氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三叔丁氧基矽烷、乙烯基三異丁氧基矽烷、乙烯基三異丙氧基矽烷、乙烯基三苯氧基矽烷、氨丙基三甲氧基矽烷、N-苯基-3-氨丙基三甲氧基矽烷、苯基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、苯基氯矽烷、苯基三氯矽烷、γ-縮水甘油氧基丙基三苯氧基矽烷、γ-縮水甘油氧基丙基甲基二苯氧基矽烷、二氯二苯基矽烷、N-苯基-γ-氨基丙基二甲氧基矽烷、二甲氧基甲基苯基矽烷、二苯基二甲氧基矽烷、二乙氧基二苯基矽烷、甲基苯基二乙氧基矽烷、甲基苯基二氯矽烷及苯氧基三甲基矽烷等。
作為本發明之一實例,針對該金屬氧化物分散液中該氧化鋯奈米粒子之總重量,該表面改性劑佔10重量份至20重量份,並且,當其被包括在上述範圍內時,可適當地保持氧化鋯粒子之表面處理反應之進展速度以增加氧化鋯粒子在分散組合物中之分散性,並且過度使用之表面處理劑附著至氧化鋯粒子之表面,藉由誘導氧化鋯粒子之間的凝聚,可減少分散性之惡化。
根據本發明之一實施例,該金屬氧化物分散液亦包括分散劑,並且,該分散劑可包括自由以下各項組成之群組中選擇的至少一種以上:聚醚酸類化合物、聚醚胺類化合物、聚醚酸/胺混合物、包括磷酸基之酯類化合物及包括磷酸基之聚醚類化合物。
作為本發明之一實例,該分散劑可佔該金屬氧化物分散液之1重量%至20重量%。當該分散劑之含量低於1重量%時,與將在後續處理中所使用之有機化合物製成之樹脂組合物之相容性降低;當該分散劑之含量超過20重量%時,分散劑過度結合至氧化鋯粒子之表面,可能會導致折射率降低。
根據本發明之一實施例,該金屬氧化物分散液亦可包括有機溶劑,該溶劑用於易於分散,其可係30重量%至50重量%。可完全(幾乎)去除該溶劑以進行後續處理,從而形成無溶劑型溶膠分散液。
作為本發明之一實例,當該有機溶劑含量小於該金屬氧化物分散液之30重量%時,其超出了分散介質作用之最小範圍,從而降低分散性以及抑制黏度及光學性質,且超過50重量%時增加了溶劑去除時間,從而可能會降低由金屬氧化物分散液製成之光學膜之折射率及亮度、降低固化膜之透射率及增加霧度。
根據本發明之一實施例,該金屬氧化物分散液之折射率係1.60以上;或1.670以上,其與後續製程中一起應用之組件或組合物具有極好之相容性,並且,可形成具有高亮度效率、高透射率及高折射率特徵之塗層。
根據本發明之一實施例,該金屬氧化物分散液之黏度係400 CP以下;100至400CP;或100至300CP,該金屬氧化物分散液係無溶劑型的,並且可係溶膠分散液。當該黏度較高時,黏度變得過高,從而難以用有機材料製備液體,並且可能會降低分散液中氧化鋯粒子之分散性,並且,當製造薄膜時難以形成均勻之薄膜層,導致光學特性劣化。可使用DV2TLV轉軸(由Brookfield製造)來測量該黏度。此外,該黏度可在25℃之溫度及1.0(1/s)之剪切速率下進行量測。
根據本發明之一實施例的用於柔性顯示之光學元件,該光學元件係使用根據本發明之金屬氧化物分散液而製造。
作為本發明之一實例,該光學元件可係用於顯示之光學元件,例如,用於電子裝置之擴散膜、光學膜、偏振膜、稜鏡片、AR片或顯示膜等。
作為本發明之一實例,該光學元件可包括基板;以及形成在該基板之至少一部分上的根據本發明之金屬氧化物分散液或由包括金屬氧化物分散液之組合物製備之塗層(薄膜等)。當製造該光學元件時,該金屬氧化物分散液或包括金屬氧化物分散液之組合物可在微量溶劑或接近零之溶劑或無(free)溶劑狀態下形成塗層。
作為本發明之一實例,根據光學膜之用途適當選擇該基板,並且可係透明基板。只要是具有透明性之膜,則可不受限制地適用透明基板。例如,可係包括聚對苯二甲酸乙二酯(PET,polyethylene terephthalate)等聚酯(polyester)、乙烯-醋酸乙烯酯(EVA,ethylene vinyl acetate)等聚乙烯(polyethylene)、環烯烴聚合物(COP,cyclic olefin polymer)、環烯烴共聚物(COC,cyclic olefin copolymer)、聚丙烯酸酯(PAC,polyacrylate)、聚碳酸酯(PC,polycarbonate)、聚乙烯(PE,polyethylene)、聚甲基丙烯酸甲酯(PMMA,polymethylmethacrylate)、聚醚醚酮(PEEK,polyetheretherketone)、聚萘二甲酸乙二酯(PEN,Polyethylene Naphthalate)、聚醚醯亞胺(PEI,polyetherimide)、聚醯亞胺(PI,polyimide)、三乙醯纖維素(TAC,triacetyl cellulose)、甲基丙烯酸甲酯(MMA,methyl methacrylate)或氟基樹脂之膜,並且,亦可係具有柔韌性之無機物基板。
下面,將藉由實施例更詳細地描述本發明,然而以下實施例僅用於說明目的,並不意欲限制本發明之範圍。
實施例1
採用水熱法合成了羥基-氧化鋯奈米粒子,此時,合成之氧化鋯粒子係正方晶系65.4%,單斜晶系34.6%,且單方晶系與單斜晶系之峰比值係3.70 (XRD圖譜)。
在用於油漆搖瓶之100 mL容器中,放置28.9 g之四氫呋喃(Tetrahydrofuran,以下簡稱「THF」)及2.1 g的具有甲基丙烯基之矽烷(3-(甲基丙烯氧基)丙基三甲氧基矽烷,粒子固體含量10%至20%),並使用攪拌棒(stirrer bar)在室溫下混合10分鐘。接著,向該溶液中添加38 g之合成之氧化鋯粉末,並使用攪拌棒在室溫下混合30分鐘來形成混合液。此後,向該混合液中添加200 g之0.05 mm珠子,並使用搖漆器分散3小時,以獲得40wt%之氧化鋯-THF溶劑分散液。此後,將氧化鋯-THF溶劑分散液與丙烯酸酯類單體(丙烯酸聯苯甲酯,40重量%)進行混合,並且在減壓下去除溶劑,以獲得氧化鋯-單體(40wt%)分散液。製備之單體分散液之黏度及折射率如表1所示。
實施例2
採用水熱法合成了羥基-氧化鋯奈米粒子,此時,合成之氧化鋯粒子係正方晶系64.2%,單斜晶系35.8%,且單方晶系與單斜晶系之峰比值係3.48。以與實施例1相同之方式製備單體分散液。所製備之單體分散液之黏度及折射率如表1所示。
實施例3
採用水熱法合成了羥基-氧化鋯奈米粒子,此時,所合成之氧化鋯粒子係正方晶系65.8%,單斜晶系34.2%,且單方晶系與單斜晶系之峰比值係3.36。以與實施例1相同之方式製備單體分散液。製備之單體分散液之黏度及折射率如表1所示。
比較例1
採用水熱法合成了羥基-氧化鋯奈米粒子,此時,所合成之氧化鋯粒子係正方晶系72.6%,單斜晶系27.4%,且單方晶系與單斜晶系之峰比值係5.90。以與實施例1相同之方式製備單體分散液。所製備之單體分散液之黏度及折射率如表1所示。
比較例2
採用水熱法合成了羥基-氧化鋯奈米粒子,此時,所合成之氧化鋯粒子係正方晶系68.7%,單斜晶系31.3%,且單方晶系與單斜晶系之峰比值係5.65。以與實施例1相同之方式製備單體分散液。所製備之單體分散液之黏度及折射率如表1所示。
比較例3
採用水熱法合成了羥基-氧化鋯奈米粒子,此時,所合成之氧化鋯粒子係正方晶系64.1%,單斜晶系35.9%,且單方晶系與單斜晶系之峰比值係4.01。以與實施例1相同之方式製備單體分散液。所製備之單體分散液之黏度及折射率如表1所示。
比較例4
採用水熱法合成了羥基-氧化鋯奈米粒子,此時,所合成之氧化鋯粒子係正方晶系56.1%,單斜晶系43.9%,且單方晶系與單斜晶系之峰比值係2.923。以與實施例1相同之方式製備單體分散液。所製備之單體分散液之黏度及折射率如表1所示。
比較例5
採用水熱法合成了羥基-氧化鋯奈米粒子,此時,所合成之氧化鋯粒子係正方晶系49.0%,單斜晶系51.0%,且單方晶系與單斜晶系之峰比值係1.62。以與實施例1相同之方式製備單體分散液。所製備之單體分散液之黏度及折射率如表1所示。
比較例6
採用水熱法合成了羥基-氧化鋯奈米粒子,此時,所合成之氧化鋯粒子係正方晶系25.4%,單斜晶系74.6%,且單方晶系與單斜晶系之峰比值係0.61。以與實施例1相同之方式製備單體分散液。所製備之單體分散液之黏度及折射率如表1所示。
〈折射率量測方法〉
當根據本實施例製備之塗層液樣品在室溫(25℃)下滴在稜鏡上,並藉由按下開始鍵達到設定溫度時,量測自動開始。其結果值正是組合物之折射率,並如下表所示。
量測設備:阿塔戈(ATAGO)/日本
型號名稱:RX-5000阿爾法(Alpha)
〈黏度量測方法〉
使用DV2T LV主軸裝置來量測黏度。
[表1]
氧化鋯晶相 | 氧化鋯-單體分散液 | ||||||
正方晶系強度(I t) | 單斜晶系強度 (I m) | I t/I m比率 | 正方晶系 比率 (%) | 單斜晶系比率(%) | 折射率 | 黏度 (cP) | |
實施例1 | 5220 | 1410 | 3.70 | 65.4 | 34.6 | 1.6728 | 360.4 |
實施例2 | 3953 | 1063 | 3.48 | 64.2 | 35.8 | 1.6722 | 302.1 |
實施例3 | 5493 | 1637 | 3.36 | 65.8 | 34.2 | 1.6719 | 232.2 |
比較例1 | 4913 | 833 | 5.90 | 72.6 | 27.4 | 1.6720 | 4,079 |
比較例2 | 3427 | 607 | 5.65 | 68.7 | 31.3 | 1.6725 | 1,322 |
比較例3 | 4233 | 1053 | 4.01 | 64.1 | 35.9 | 1.6725 | 876.0 |
比較例4 | 5243 | 2347 | 2.23 | 56.1 | 43.9 | 1.6658 | 1,037 |
比較例5 | 4223 | 2607 | 1.62 | 49.0 | 51.0 | 1.6710 | 1,178 |
比較例6 | 2070 | 3423 | 0.61 | 25.4 | 74.6 | 1.6732 | 1,991 |
自表1可看出,正方晶系與單斜晶系之峰強度之比大於3並小於4,並且,可藉由調節正方晶系比例及單斜晶系等氧化鋯混合晶相之比例(正方晶系比例60%至66%,單斜晶系比例34%至40%晶相比)來具有高折射率的同時降低黏度。
綜上,藉由有限實施例及附圖對實施例進行說明,熟習此項技術者能夠對上述記載進行多種修改與變形。例如,所說明之技術以與所說明之方法不同之順序執行,及/或所說明之構成要素以與所說明之方法不同之形態結合或組合,或者,由其他構成要素或等同物進行替換或置換亦能夠獲得相同效應。由此,其他體現、其他實施例及申請項範圍之均等物全部屬專利申請項之範圍。
Claims (9)
- 一種金屬氧化物分散液,其特徵在於,包括:氧化鋯奈米粒子,該氧化鋯奈米粒子佔該金屬氧化物分散液之40重量%至70重量%;單體,該單體為丙烯酸酯基單體,且佔該金屬氧化物分散液之1重量%至50重量%;及表面改性劑,針對該金屬氧化物分散液中該氧化鋯奈米粒子之總重量,該表面改性劑佔10重量份至20重量份,該氧化鋯奈米粒子之正方晶系之峰強度(It)及單斜晶系之峰強度(Im)滿足以下公式:[式1]3<It/Im<4;及其中該金屬氧化物分散液之黏度係400CP以下。
- 如請求項1之金屬氧化物分散液,其中,該氧化鋯奈米粒子,包括:單斜晶系之晶體結構32%至40%;及正方晶系之晶體結構60%至68%。
- 如請求項1之金屬氧化物分散液,其中,該單體包括自由以下各項組成之群組中選擇的至少一種以上:丙烯 酸甲酯、丙烯酸月桂酯、乙氧基二甘醇丙烯酸酯、甲氧基三甘醇丙烯酸酯、丙烯酸苯氧基乙酯、丙烯酸四氫糠酯、丙烯酸異冰片酯、2-羥乙基丙烯酸酯、2-羥丙基丙烯酸酯、2-羥基-3-苯氧基丙烯酸酯、新戊二醇二丙烯酸酯、1,6-己二醇二丙烯酸酯、三羥甲基丙烷三丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、雙季戊四醇六丙烯酸酯、三羥甲基丙烷丙烯酸苯甲酸酯、三羥甲基丙烷苯甲酸酯、甲基丙烯酸甲酯、甲基丙烯酸2-乙基己酯、n-甲基丙烯酸硬脂酯、甲基丙烯酸環己酯、甲基丙烯酸四氫糠酯、甲基丙烯酸苯氧乙酯、甲基丙烯酸甲氧基聚乙烯、2-羥乙基甲基丙烯酸酯、甲基丙烯酸2-羥基丁酯-甲基丙烯酸十七氟癸酯、甲基丙烯酸三氟甲酯、丙烯酸三氟乙酯、甲基丙烯酸六氟丙酯、1,6-己二醇二甲基丙烯酸酯、三羥甲基丙烷三甲基丙烯酸酯、二甲基丙烯酸甘油酯六亞甲基二異氰酸酯、乙二醇二甲基丙烯酸酯、聚氨酯丙烯酸酯、環氧丙烯酸酯、三聚氰胺丙烯酸酯、丙烯酸苄酯、甲基丙烯酸苄酯、丙烯酸苯酯、丙烯酸二苯酯、丙烯酸聯苯酯、2-聯苯丙烯酸酯、2-([1,1’-聯苯]-2-芳氧基)丙烯酸乙酯、丙烯酸苯氧基苄酯、3-苯氧基苄基-3-(1-萘基)丙烯酸酯、(2E)-3-羥基-2-(3-苯氧基苄基)丙烯酸乙酯、甲基丙烯酸苯酯、甲基丙烯酸聯苯酯、2-硝基苯基丙烯酸酯、4-硝基苯基丙烯酸酯、2-硝基苯基甲基丙烯酸酯、4-硝基苯基甲基丙烯酸酯、2-硝基苄基甲基丙烯酸酯、4-硝基苄基甲基丙烯酸酯、2-氯苯基丙烯酸酯、4-氯苯基丙烯酸酯、2-氯苯基甲基丙烯酸酯、4-氯苯基甲基丙烯酸酯、鄰苯苯酚丙烯酸乙酯、苯基苯酚、甲基丙烯酸聯苯酯、鄰苯苯酚乙氧基丙烯酸酯、1-(聯苯-2-基甲基)-4-苯基哌嗪、1-(聯苯-2-基甲基)-4-(2-甲氧基苯基)哌嗪、1-(聯苯-2-基甲基)-4-(2-乙氧基苯基)哌嗪、1-(聯苯-2-基甲基)-4-(2-異丙氧基苯基)哌嗪、1-(聯苯-2-基甲 基)-4-(3-甲氧基苯基)哌嗪、1-(聯苯-2-基甲基)-4-(4-甲氧基苯基)哌嗪及雙酚二丙烯酸酯。
- 如請求項1之金屬氧化物分散液,其中,該表面改性劑包括矽烷偶合劑,該矽烷偶合劑包括自由以下各項組成之群組中選擇的至少一種以上:丙烯酸酯基、(甲基)丙烯酸基、環氧基、烷氧基、乙烯基、苯基、甲基丙烯醯氧基、氨基、氯矽烷基、氯丙基及巰基。
- 如請求項1之金屬氧化物分散液,其中,該表面改性劑包括自由以下各項組成之群組中選擇的至少一種以上:(3-縮水甘油氧基丙基)三甲氧基矽烷、(3-縮水甘油氧基丙基)三乙氧基矽烷、(3-縮水甘油氧基丙基)甲基二甲氧基矽烷、(3-縮水甘油氧基丙基)二甲基乙氧基矽烷、3-(甲基丙烯醯氧基)丙基三甲氧基矽烷、3,4-環氧丁基三甲氧基矽烷、3,4-環氧丁基三乙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、2-(3,4-環氧環己基)乙基三乙氧基矽烷、氨丙基三乙氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三叔丁氧基矽烷、乙烯基二異丁氧基矽烷、乙烯基二異丙氧基矽烷、乙烯基二苯氧基矽烷、氨丙基二甲氧基矽烷、N-苯基-3-氨丙基三甲氧基矽烷、苯基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、苯基氯矽烷、苯基三氯矽烷、γ-縮水甘油氧基丙基三苯氧基矽烷、γ-縮水甘油氧基丙基甲基二苯氧基矽烷、二氯二苯基矽烷、N-苯基-γ-氨基丙基二甲氧基矽烷、二甲氧基甲基苯基矽烷、二苯基二甲氧基矽烷、二乙氧基二苯基矽烷、甲基苯基二乙氧基矽烷、甲基苯基二氯 矽烷及苯氧基三甲基矽烷。
- 如請求項1之金屬氧化物分散液,其中,該金屬氧化物分散液亦包括分散劑,該分散劑包括自由以下各項組成之群組中選擇的至少一種以上:聚醚酸類化合物、聚醚胺類化合物、聚醚酸/胺混合物、包括磷酸基之酯類化合物及包括磷酸基之聚醚類化合物。
- 如請求項1之金屬氧化物分散液,其中,該金屬氧化物分散液之折射率係1.60以上。
- 如請求項1之金屬氧化物分散液,其中,該金屬氧化物分散液係無溶劑型的。
- 一種用於柔性顯示之光學元件,其特徵在於,該光學元件係使用如請求項1之金屬氧化物分散液而製造。
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