TWI816937B - Substrate treatment apparatus, and substrate treatment method - Google Patents

Abstract

An object of the present invention is to easily customize the processing performed on a substrate using a substrate processing apparatus.

The substrate processing device is equipped with two or more chemical solution processing parts, a storage part, and a control part. Each chemical liquid treatment unit includes a treatment tank and a liquid supply unit. The processing tank processes the substrate using a processing liquid. The liquid supply unit supplies the processing liquid to the processing tank. The storage unit stores numerical information on the supply amount of the processing liquid per unit processing amount of the substrate for each chemical liquid processing unit. The control unit includes an acquisition unit, a recognition unit, a calculation unit, and a supply control unit. The calculation unit uses the numerical value of the supply amount of the processing liquid per unit processing amount of the substrate corresponding to one chemical liquid processing unit recognized by the recognition unit in the numerical information and the processing amount information acquired by the acquisition unit, Calculate the numerical value regarding the supply amount of the treatment liquid supplied to the treatment tank of one chemical solution treatment unit. The supply control unit supplies the processing liquid to the processing tank through the liquid supply unit based on the numerical value calculated by the calculation unit.

Description

Substrate processing device and substrate processing method

The present invention relates to the treatment of semiconductor wafers, liquid crystal display substrates, plasma display substrates, organic electroluminescence (EL; Electroluminescenee) substrates, field emission display (FED; Field Emission Display) substrates, light Technology for etching and cleaning of substrates such as display substrates, magnetic disk substrates, magneto-optical disk substrates, photomask substrates, and solar cell substrates.

For example, there is a substrate processing apparatus that processes the substrate by immersing the substrate in a processing liquid stored in a processing tank (for example, Patent Document 1, etc.). In this substrate processing apparatus, for example, various actions and processes on the substrate are performed according to a recipe that specifies the processing of the substrate.

For example, there are such substrate processing apparatuses that have a plurality of processing tanks for performing the same processing on the substrates, and perform the same processing on the substrates in parallel in the plurality of processing tanks according to the same recipe.

[Prior technical literature]

[Patent Document]

[Patent Document 1] Japanese Patent Application Laid-Open No. 2009-260257

However, even if a plurality of treatment tanks have the same structure, there will still be differences in external factors such as age, piping conditions, vibration or temperature, usage times, and configurations. Substrates subjected to the same treatment may produce different results.

Furthermore, in recent years, there has been a tendency that, for example, there has been an increase in the demand for minute processing performed on a substrate. Along with this, the content of the recipe becomes complicated, and the work of creating and editing the recipe gradually becomes difficult.

These problems are not limited to the so-called batch-type substrate processing apparatus that processes the substrates by immersing the substrates in the processing liquid stored in the processing tank. The processing liquid is discharged from the nozzle to the substrates and the substrates are treated with the processing liquid. The processing can also occur in general substrate processing equipment such as so-called single-chip substrate processing equipment.

The present invention has been accomplished in view of the above-mentioned problems, and an object thereof is to provide a technology that can easily perform customization of processing performed on a substrate in a substrate processing apparatus.

In order to solve the above-mentioned problems, the substrate processing apparatus of the first aspect includes two or more chemical solution processing units, a storage unit, and a control unit. Each of the two or more chemical solution treatment units has a treatment tank and a liquid supply unit. The above-mentioned processing tank uses the stored processing liquid to process the substrate. The liquid supply part supplies the processing liquid to the processing tank. The storage unit stores numerical information on the supply amount of the processing liquid per unit processing amount of the substrate for each of the chemical liquid processing units. The control unit includes an acquisition unit, a recognition unit, a calculation unit, and a supply control unit. The above-mentioned acquisition department acquires the information that is the subject of processing. Throughput information for substrate throughput. The recognition unit recognizes one of the two or more chemical liquid processing units used to process the substrate. The above-mentioned calculation part is based on the numerical value of the supply amount of the processing liquid per unit processing amount of the substrate corresponding to the above-mentioned one chemical liquid processing part recognized by the above-mentioned recognition part in the above-mentioned numerical information and the above-mentioned acquisition part. The above-mentioned processing amount information is used to calculate a numerical value regarding the supply amount of the processing liquid supplied to the processing tank of the above-mentioned one chemical liquid processing unit. The supply control unit causes the one chemical liquid treatment unit to supply the treatment liquid to the treatment tank through the liquid supply unit based on the numerical value calculated by the calculation unit.

The substrate processing apparatus of the second aspect is the substrate processing apparatus of the first aspect, and further includes a sensor unit for measuring the processing amount of the substrate. The above-mentioned acquisition unit acquires the above-mentioned throughput information based on the measurement result using the above-mentioned sensor unit.

A substrate processing apparatus according to a third aspect is the substrate processing apparatus according to the first or second aspect, wherein the storage unit stores a recipe including the numerical information and specifying processing conditions.

A substrate processing apparatus according to a fourth aspect is a substrate processing apparatus according to the third aspect, wherein the numerical information includes a supply amount of the processing liquid per unit processing amount of the relevant substrate in the two or more chemical liquid processing units. The reference value, and the adjustment value of the supply amount of the processing liquid per unit processing amount of the relevant substrate with respect to at least one of the above two or more chemical liquid processing sections. The calculation unit calculates the calculation based on the reference value in the numerical information, the adjustment value corresponding to the one chemical processing unit recognized by the recognition unit, and the processing amount information acquired by the acquisition unit. Calculate the numerical value of the supply amount of the processing liquid supplied to the above-mentioned treatment tank in the above-mentioned one chemical liquid treatment section.

The substrate processing device of the fifth aspect is the substrate processing unit of the third or fourth aspect. The processing device, wherein the recipe specifies the timing of supplying the processing liquid to the processing tank through the liquid supply part.

The substrate processing apparatus of the sixth aspect is the substrate processing apparatus of any one of the third to fifth aspects, and further includes an input section for inputting a signal in response to a user's action. The above-mentioned control unit further has a recipe creation unit that generates the numerical information contained in the above-mentioned numerical information regarding each of the above-mentioned two or more chemical liquid processing units according to the signal input from the above-mentioned input unit in response to the user's action. The numerical value of the supply amount of the processing liquid per unit processing volume of the substrate is described in the above recipe, thereby creating or editing the above recipe.

A seventh aspect of the substrate processing apparatus is the substrate processing apparatus of any one of the first to fifth aspects, and further includes an input section for inputting a signal in response to a user's action. The control unit further includes a mode switching unit that switches the mode between the first liquid supply mode and the second liquid supply mode based on a signal input from the input unit in response to a user's action. The first liquid supply mode is a mode in which the calculation unit supplies the processing liquid per unit processing amount of the substrate corresponding to the one chemical liquid processing unit recognized by the recognition unit in the numerical information. The numerical value of the amount of the processing liquid supplied to the processing tank of the above-mentioned one chemical liquid processing section and the above-mentioned processing amount information obtained by the above-mentioned acquisition section are calculated. The numerical value calculated by the calculation part is used to supply the treatment liquid to the treatment tank through the liquid supply part in the one chemical solution treatment part. The above-mentioned second liquid supply mode is a mode in which the above-mentioned control part supplies a preset amount of processing liquid to the above-mentioned one chemical solution processing part recognized by the above-mentioned recognition part through the above-mentioned liquid supply part. groove.

The substrate processing apparatus of the eighth aspect is the substrate processing apparatus of the sixth aspect. The device is further equipped with a display part. The control unit further includes: a screen creation unit that creates information for creating or editing a recipe input screen for the recipe; and a display control unit that causes the recipe input screen to be displayed on the display unit. The above-mentioned recipe input screen includes a first area and a second area. The first area includes an area for describing conditions for each of a plurality of first setting items regarding conditions that do not depend on the passage of time in the processing executed according to the recipe. The above-mentioned second area includes an area for describing conditions for each of a plurality of second setting items regarding conditions that depend on the passage of time in the processing executed according to the above-mentioned recipe. The above-mentioned recipe creation unit responds to the signal input from the above-mentioned input unit in response to the user's action, and based on the conditions described for each of the above-mentioned first setting items in the above-mentioned recipe input screen, and the above-mentioned recipe input screen for each of the above-mentioned first setting items. 2Set the conditions described in the project to create or edit the above recipe. The above-mentioned screen creation unit sets one or more first setting items among the above-mentioned plurality of first setting items in the above-mentioned first area in the above-mentioned recipe input screen based on the signal input from the above-mentioned input unit in response to the user's action. , changing to one or more second setting items among the plurality of second setting items in the above-mentioned second area, and in the above-mentioned recipe input screen according to the signal input from the above-mentioned input part in response to the user's action, Changing one or more second setting items among the plurality of second setting items in the above-mentioned second area to one or more first settings in a manner that is included in the plurality of first setting items in the above-mentioned first area. project.

A substrate processing apparatus according to a ninth aspect is a substrate processing apparatus according to the eighth aspect, wherein the screen creation unit prohibits the setting of more than one predetermined preset among the plurality of first setting items in the first area. The first setting item is changed to one or more second setting items in a manner that the plurality of second setting items included in the second area are included.

A substrate processing apparatus of a tenth aspect is a substrate processing apparatus of the eighth or ninth aspect, wherein the screen creation unit includes the plurality of first settings in the recipe input screen in the first area. When the first display element related to the group name of each of the plurality of first setting item groups of two or more first setting items exists, it is input by the above-mentioned input unit in response to the user's action. The signal includes, for each first setting item group in the plurality of first setting item groups, the two or more first setting items in the first area to be included in the plurality of second settings in the second area. The item format is changed to two or more second setting items.

The substrate processing apparatus of the 11th aspect is the substrate processing apparatus of the 6th aspect, and is further equipped with a display part. The control unit further includes: a screen creation unit that creates information for creating or editing a recipe input screen for the recipe; and a display control unit that causes the recipe input screen to be displayed on the display unit. The above-mentioned recipe input screen includes a first area and a second area. The first area includes an area for describing conditions for each of a plurality of first setting items regarding conditions that do not depend on the passage of time in the processing executed according to the recipe. The above-mentioned second area includes an area for describing conditions for each of a plurality of second setting items regarding conditions that depend on the passage of time in the processing executed according to the above-mentioned recipe. The above-mentioned recipe creation unit responds to the signal input from the above-mentioned input unit in response to the user's action, and based on the conditions described for each of the above-mentioned first setting items in the above-mentioned recipe input screen, and the above-mentioned recipe input screen for each of the above-mentioned setting items. The conditions described in the second setting item are used to create or edit the above recipe. A first display element including a group name of each of a plurality of first setting item groups regarding two or more first setting items of the plurality of first setting items exists in the first area. The above-mentioned screen production part responds to the user's action and generates the above-mentioned input The above-mentioned two or more first setting items included in one of the above-mentioned plurality of first setting item groups are included in the above-mentioned recipe input screen displayed by the above-mentioned display unit. The display state switches between the expanded state of display and the compressed state of non-display.

The substrate processing method according to the twelfth aspect is a substrate including two or more chemical liquid processing units each having a processing tank for processing the substrate using the stored processing liquid, and a liquid supply unit for supplying the processing liquid to the processing tank. A substrate processing method of a processing device, which has (a) step, (b) step, (c) step, (d) step, and (e) step. In the above-mentioned step (a), for each of the above-mentioned chemical liquid processing units, numerical information on the supply amount of the processing liquid per unit processing amount of the substrate is stored in the storage unit. In the above step (b), the throughput of the substrate to be processed is obtained. In the above-mentioned step (c), one of the two or more chemical solution processing parts used for processing the substrate is identified. In the above (d) step, based on the numerical value of the supply amount of the processing liquid per unit processing volume corresponding to the above-mentioned one chemical liquid processing unit recognized in the above (c) step in the above numerical information, and the above-mentioned (b) Calculate the numerical value regarding the supply amount of the treatment liquid supplied to the treatment tank of the one chemical liquid treatment unit based on the above-mentioned processing amount obtained in the step (b). The step (e) supplies the treatment liquid to the treatment tank through the liquid supply part in the one chemical solution treatment part based on the numerical value calculated in the step (d).

Even with any one of the substrate processing apparatus of the first aspect and the substrate processing method of the twelfth aspect, for example, an amount of the processing liquid corresponding to the processing amount of the substrate can be supplied to the processing tank for each processing tank. This makes it less likely to cause problems such as wasteful use of the processing liquid and excessive processing due to excessive supply of the processing liquid. As a result, for example, in a substrate processing apparatus, it is possible to easily perform processing for each processing tank. Customize the processing performed on the substrate. Thus, for example in a substrate processing apparatus, customization of the processing performed on the substrate can be easily performed.

According to the substrate processing apparatus of the second aspect, for example, based on the processing amount of the substrate measured by the substrate processing apparatus, the processing liquid in an amount corresponding to the processing amount of the substrate can be supplied to the processing tank for each processing tank. Thereby, for example, customization of the processing performed on the substrate can be performed for each processing tank in a substrate processing apparatus.

According to the substrate processing apparatus of the third aspect, for example, the substrate can be processed in parallel using two processing tanks according to one recipe. Thereby, for example, one recipe can be used to supply an amount of the processing liquid corresponding to the processing amount of the substrate to the processing tank for each processing tank. Thereby, customization of the processing performed on the substrate can be easily performed, for example, in a substrate processing apparatus.

According to the substrate processing apparatus of the fourth aspect, for example, by changing the adjustment value in one recipe, it is possible to supply an amount of the processing liquid that best corresponds to the processing of the substrate to the processing tank for each processing tank. This makes it possible, for example, to easily prepare recipes. Thus, for example, customization of the processing performed on the substrate can be easily performed in a substrate processing apparatus.

According to the substrate processing apparatus of the fifth aspect, for example, for each processing tank, an amount of processing liquid corresponding to the processing amount of the substrate can be supplied to the processing tank at an appropriate timing.

According to the substrate processing apparatus of the sixth aspect, for example, the operator can customize the processing performed on the substrate for each processing tank.

According to the substrate processing apparatus of the seventh aspect, for example, when there is no difference in the processing results of the substrates in each processing tank, the calculation of the processing amount per unit of the substrate can be omitted by setting the second liquid supply mode. Set the numerical value of the supply amount of treatment liquid. This can reduce the workload of an operator who sets processing conditions, for example.

According to the substrate processing apparatus of the eighth aspect, for example, the operator can arbitrarily switch settings between a plurality of setting items that set conditions that do not depend on the passage of time and a plurality of setting items that set conditions that depend on the passage of time. project. This allows, for example, the operator to create a recipe specifying the required conditions. As a result, for example, the operator can perform processing on the substrate under desired conditions. Thus, for example, customization of the processing performed on the substrate can be easily performed in a substrate processing apparatus.

According to the substrate processing apparatus of the ninth aspect, for example, a predetermined setting item that cannot be set to a condition that depends on the passage of time can be prohibited from being changed toward a setting item that is a condition that depends on the passage of time. This avoids, for example, the undesirable situation of an operator creating a recipe that specifies a process that cannot be performed.

According to the substrate processing apparatus of the tenth aspect, for example, the operator can efficiently switch between a plurality of setting items that set conditions that do not depend on the passage of time and a plurality of setting items that set conditions that depend on the passage of time. Setting items.

According to the substrate processing apparatus of the eleventh aspect, for example, the operator can switch the state of being expanded to display two or more first setting items for each group including two or more first setting items, and The status of method compression for more than 2 second setting items is not displayed. With this, for example, even if the number of first setting items in the first area increases, the operator can easily create and create a recipe while confirming both the first area and the second area on the recipe input screen. Edited assignments. Thus, for example, customization of the processing performed on the substrate can be easily performed in a substrate processing apparatus.

1:Investment Department

2: 1st Transport Department

3: 2nd transport department

4: Drying processing department

5: 1st liquid handling department

6: 2nd liquid processing department

7:Ration Department

8:Input part

9:Output department

10:Control Department

10a: Screen production department

10b: Display control part

10c:Recipe Production Department

10d: Scheduling Production Department

10e: Acquisition Department

10f: Recognition Department

10g: Calculation part

10h: Supply Control Department

10i: Mode switching unit

11: Loading platform

11m: Sensor department

20:Storage Department

51: Washing and processing department

52: Chemical liquid processing department

53:Deputy Transport Department

71: Loading platform

100:Substrate processing device

Ab0: button area

Ar0: recipe display area

Ar1: Area 1

Ar2: Area 2

B2a:Inner tank

B2b:Outer tank

C1: box

CB1: Adjustment slot

CB2: processing tank

Cf1: 1st flow control department

Cf2: 2nd flow control unit

CL1: Liquid circulation department

CL2: Liquid circulation department

Ct1: cooling tank

Dc1~Dc3: the first display element

EL1: Liquid discharge part

Em0: pop-up window

Em1: The second error reporting element

En0: Treatment liquid supply source

Ex0: Processing liquid discharge part

Fl1: filter

Ht1: 1st heater

Ht2: 2nd heater

LF2: Lifter

M1: No. 1 flow meter

M2: 2nd flow meter

Mk1:1st mark

Mk2: 2nd mark

Mp1: Mouse cursor

Pm1: 1st pump

Pm2: 2nd pump

Pr0: Identification information department

Pr1:Recipe input part

R1a: Part of the recipe input screen

R1b: Part of the recipe input screen

R2: Part of the recipe input screen

SL1: Liquid supply department

SL1a: 1st liquid supply part

SL1b: 2nd liquid supply part

Sc0: Recipe input screen

Tb1: 1st piping section

Tb2: 2nd piping section

Tb3: 3rd piping section

Tb4: 4th piping section

Tb5: 5th piping section

Tb6: 6th piping section

Tb7: 7th piping section

Tb8: 8th piping section

Tg1: Liquid discharge pipe part

V1: No. 1 valve

V1a, V1b: numerical value

V2: 2nd valve

V3: The third valve

V4: 4th valve

V5: 5th valve

V6: No. 6 valve

V7:The seventh valve

V8: No. 8 valve

V9: 9th valve

Va1:Adjustment value

Va11: 1st adjustment value

Va12: 2nd adjustment value

Vs1: base value

W: substrate

FIG. 1 is a plan view showing the schematic structure of the substrate processing apparatus according to the first embodiment. Figure.

FIG. 2 is a block diagram showing the functional structure of the substrate processing apparatus according to the first embodiment.

FIG. 3 is a diagram showing the schematic structure of the chemical solution processing unit.

FIG. 4 is a block diagram showing the functional structure of the liquid supply process implemented by the control unit.

5(a) and (b) are diagrams showing a first example of a part of the recipe input screen.

FIG. 6 is a diagram showing a second example of a part of the recipe input screen.

FIG. 7 is a diagram showing an example of the relationship between the number of substrates and the supply amount of the processing liquid to the processing tank.

FIG. 8 is a flowchart showing an example of an operation flow related to the supply of the processing liquid to the processing tank.

FIG. 9 is a diagram showing the schematic structure of the recipe input screen.

FIG. 10 is a diagram showing a reference example of a part of the recipe input section in the recipe input screen.

FIG. 11 is a diagram showing an example of a part of the recipe input section in the recipe input screen.

FIG. 12 is a diagram showing an example of a part of the recipe input section in the recipe input screen.

FIG. 13 is a diagram showing an example of a part of the recipe input section in the recipe input screen.

FIG. 14 is a diagram showing an example of a part of the recipe input section in the recipe input screen.

FIG. 15 is a diagram showing an example of a part of the recipe input section in the recipe input screen.

FIG. 16 is a diagram showing an example of a part of the recipe input section in the recipe input screen.

FIG. 17 is a diagram showing an example of a part of the recipe input section in the recipe input screen.

FIG. 18 is a diagram showing an example of a part of the recipe input section in the recipe input screen.

FIG. 19 is a diagram showing an example of a part of the recipe input section in the recipe input screen.

FIG. 20 is a diagram showing an example of a part of the recipe input section in the recipe input screen.

FIG. 21 is a diagram showing an example of a part of the recipe input section in the recipe input screen.

FIG. 22 is a diagram showing an example of a part of the recipe input section in the recipe input screen.

There is known a substrate processing apparatus that immerses the substrate in a processing liquid stored in a processing tank and performs processing such as etching on the substrate. In this substrate processing apparatus, for example, there are cases where an etching process is performed in which the nitride film formed on the surface of the substrate is eluted with a processing solution such as a phosphoric acid aqueous solution. In a processing tank for performing such an etching process, whenever the concentration of components eluted from the substrate in the processing liquid increases, the processing liquid stored in the processing tank must be replaced to some extent. In particular, in recent years, such as the formation of three-dimensional NAND, when a process is performed in which the amount of etching objects to be dissolved in one batch is larger than in the past, it is necessary to replace the processing liquid stored in the processing liquid. The volume and frequency are increasing.

However, there are many substrate processing apparatuses having a plurality of processing tanks that can perform the same processing using a processing liquid on the substrate in parallel. When such a substrate processing apparatus is used to process substrates in parallel in a plurality of processing tanks, for example, as long as the same recipe for processing the substrate is processed in accordance with regulations, the increase in the number of recipes and the need for recipe production can be reduced. workload, etc.

However, for example, even if a plurality of processing tanks have the same configuration, if there is a certain difference in conditions between the plurality of processing tanks, even if the same processing is performed on the substrate in the plurality of processing tanks, the processing in the plurality of processing tanks will be different. The processing results will also vary between processing tanks. Here, as differences in conditions that may occur between a plurality of treatment tanks, there may be, for example, age of use, condition of piping, external factors such as vibration or temperature, frequency of use, and layout. In particular, for example, in the formation of the above-mentioned three-dimensional NAND, the amount of etching objects dissolved in one batch of processing is larger than in the past. In the case of processing, large differences are likely to occur in the processing results between multiple processing slots.

Such problems are generally common to so-called batch-type substrate processing apparatuses that process substrates by immersing the substrates in a processing liquid stored in a processing tank.

Therefore, the inventors of the present invention have invented a technology that can easily perform customization of the processing performed on the substrate for each processing tank in the substrate processing apparatus.

Hereinafter, each embodiment of the present invention will be described based on the drawings. In the drawings, parts having the same structure and function are designated by the same symbols, and repeated explanations will be omitted in the following description. The drawings are schematically represented, and the dimensions and positional relationships of various structures in each drawing are not accurately illustrated.

<1. First Embodiment>

<1-1. Structure of substrate processing equipment>

FIG. 1 is a plan view showing an example of the schematic configuration of the substrate processing apparatus 100 according to the first embodiment. FIG. 2 is a block diagram showing an example of the functional configuration of the substrate processing apparatus 100 according to the first embodiment. The substrate processing apparatus 100 can perform, for example, a chemical solution treatment, a cleaning process, and a drying process on the substrate W.

As shown in FIG. 1 , the substrate processing apparatus 100 includes, for example, an input unit 1 , a first transport unit 2 , a second transport unit 3 , a drying processing unit 4 , a first liquid processing unit 5 , a second liquid processing unit 6 , and a delivery unit. 7. Input part 8, output part 9, control part 10 and storage part 20.

The loading part 1 is, for example, a part for loading a plurality of substrates W before processing from outside the substrate processing apparatus 100 into the substrate processing apparatus 100 . The input part 1 has, for example, a base that can separately place and accommodate a plurality of pieces (for example, 25 pieces or less) before processing. The two mounting platforms 11 of the box C1 of the board W are provided. For example, a sensor unit 11m is provided on the mounting table 11 . For example, the sensor unit 11m can count the number of substrates W stored in the cassette C1. Moreover, the sensor part 11m can detect the arrangement|positioning of the board|substrate W in the cassette C1, for example. Here, the sensor unit 11m takes, for example, the inside of the box C1 as a target, and scans downward the light emitting part and the light receiving part that form a pair of the transmissive infrared sensor, whereby the infrared light can be blocked according to the number of times and the position to measure the number of substrates W stored in the cassette C1 and detect the arrangement of the substrates W. The information on the number of substrates W measured by the sensor unit 11m and the information on the arrangement of the substrates W in the cassette C1 detected by the sensor unit 11m are, for example, together with the identification information of the cassette C1. stored in the storage unit 20. The information on the number of substrates W measured by the sensor unit 11m is used, for example, in the control unit 10 to obtain information about the drying processing unit 4, the first liquid processing unit 5, and the second liquid processing unit 6. Information on the throughput of the substrate W to be processed (also called throughput information). That is, the sensor unit 11 m may function as a unit for measuring the throughput of the substrate W, for example.

The sending part 7 is, for example, a part for sending out a plurality of processed substrates W from the inside of the substrate processing apparatus 100 to the outside of the substrate processing apparatus 100 . This delivery part 7 is positioned adjacent to the input part 1, for example. This delivery part 7 has, for example, two mounting bases 71 on which the cassette C1 can be respectively mounted. In the delivery unit 7, while a plurality of processed substrates W (for example, 25 or less) are stored in the cassette C1, the plurality of processed substrates W can be delivered to the substrate processing device for each cassette C1. Beyond 100.

The first conveyance section 2 is present, for example, at a position along the input section 1 and the delivery section 7 . For example, the first transport unit 2 can take out all the substrates W accommodated in the cassette C1 placed in the input unit 1 and transport the substrates W to the second transport unit 3 . At this time, for example, all the substrates W stored in the two cassettes C1 are transported with respect to the second transport unit 3, Thus, a substrate group including a plurality of substrates W is formed into one batch. A plurality of substrates W forming a substrate group of one batch are processed as units of processing in the drying processing unit 4 , the first liquid processing unit 5 , and the second liquid processing unit 6 . In addition, the first transport unit 2 may, for example, receive the processed substrate W from the second transport unit 3 and transport the processed substrate W to the cassette C1 placed on the mounting table 71 of the delivery unit 7. And stored in the box C1.

The second transport unit 3 can move along the longitudinal direction of the substrate processing apparatus 100, for example. Along the moving direction of the second conveying part 3, a drying processing part 4, a first liquid processing part 5 and a second liquid processing part 6 exist in order from the side close to the first conveying part 2. In other words, for example, the first liquid processing part 5 exists at a position adjacent to the drying processing part 4, and the second liquid processing part 6 exists at a position adjacent to the first liquid processing part 5.

For example, the drying processing unit 4 can accommodate a plurality of substrates W in a low-pressure chamber and dry them.

The first liquid processing unit 5 includes, for example, a cleaning processing unit 51 , a chemical liquid processing unit 52 , and a sub-transporting unit 53 . For example, the cleaning processing unit 51 may perform cleaning processing with pure water (also referred to as pure water cleaning processing) on a plurality of substrates W. The chemical solution processing unit 52 can perform processing (also referred to as chemical solution processing) on the plurality of substrates W using, for example, a processing solution containing a chemical solution. The auxiliary conveyance part 53 can transfer the substrate W to, for example, the second conveyance part 3 and can move up and down in the cleaning processing part 51 and the chemical solution processing part 52 respectively.

For example, like the first liquid processing unit 5 , the second liquid processing unit 6 has a cleaning processing unit 51 , a chemical solution processing unit 52 , and a sub-transporting unit 53 .

The input unit 8 is located near the mounting table 11, for example. For example, the input unit 8 can input a signal in response to an action of an operator as a user. This allows the operator to enter Select or enter various information. The input unit 8 is composed of, for example, a touch panel or the like. In addition, the input unit 8 may have, for example, an operation unit including buttons that can perform various operations such as pressing, or may have a microphone that can perform input using sound. For example, the operator can create and edit a recipe that specifies the order for processing the substrate W through the input unit 8 and store it in the storage unit 20, or from a recipe group including a plurality of recipes stored in the storage unit 20, Recipes are specified for a plurality of substrates W to be processed.

The output unit 9 is located near the mounting table 11, for example. The output unit 9 is, for example, a unit that can output various information according to the control of the control unit 10 . The output unit 9 includes, for example, a display unit capable of outputting various information in a visually identifiable manner. For example, the display unit can display a screen for the operator to create and edit a recipe (also called a recipe input screen) using a signal input from the input unit 8 in response to the operator's action. In addition, the output unit 9 may include, for example, a speaker capable of audibly outputting various information. Various information that can be output visually or audibly by the output unit 9 may include, for example, information indicating various states of the substrate processing apparatus 100 and information indicating various warning sounds (alarms). Here, for example, the display portions of the input portion 8 and the output portion 9 can also be implemented by the same display portion having a touch panel.

The storage unit 20 has a non-volatile storage medium that stores various information, such as a hard disk or a flash memory. In the storage unit 20, for example, various programs such as schedule creation programs and processing programs, folders containing recipe groups containing a plurality of recipes, and various data are stored in advance. Various data include, for example, data for configuring a recipe input screen (also referred to as screen configuring data). The data for screen configuration includes, for example, information necessary for displaying a plurality of setting items constituting a recipe and inputting setting conditions such as numerical values. In the screen configuration data, a plurality of setting items are appropriately classified according to categories, for example. In addition, the data for screen configuration includes, for example, permission or prohibition of setting items. Information on changes to the classification of categories.

The operation of the substrate processing apparatus 100 having the above-mentioned configuration is collectively controlled by the control unit 10 as shown in FIG. 2 , for example.

The control unit 10 includes, for example, a calculation unit, a memory, and the like. The arithmetic unit may be, for example, a circuit such as at least one central processing unit (CPU) functioning as a processor. The memory may be a circuit that temporarily stores information such as a random access memory (RAM). Various information temporarily obtained by various operations of the arithmetic unit are appropriately stored in the memory, etc. For example, the arithmetic unit reads and executes a program stored in the storage unit 20 to realize various functional configurations for executing overall control of the operation of the substrate processing apparatus 100 by the control unit 10 . Various functional structures include, for example, a part of the substrate processing apparatus 100 that creates a schedule for processing a plurality of substrates W (also called a schedule creation unit), and a part that executes processing of the plurality of substrates W according to the schedule. (also called processing execution unit), etc. Moreover, the control part 10 may also control the operation of each part of the 1st liquid processing part 5 and the 2nd liquid processing part 6 based on the measurement result from various sensors of the chemical|medical solution processing part 52, for example. Various sensors include, for example, flow meters.

<1-2. Chemical solution processing department>

FIG. 3 is a diagram showing the schematic structure of the chemical solution processing unit 52. The chemical solution processing unit 52 performs, for example, processing (also referred to as etching processing) of immersing the substrate W on which the silicon oxide film and the silicon nitride film are formed in a phosphoric acid aqueous solution serving as a processing liquid that functions as an etching liquid. This selectively dissolves the silicon nitride film.

As shown in FIG. 3 , the chemical liquid treatment unit 52 includes a liquid supply unit SL1, a treatment tank CB2, a liquid circulation unit CL2, and a liquid discharge unit EL1. Therefore, in the 1st In the embodiment, the substrate processing apparatus 100 includes two chemical liquid processing units 52 each having a liquid processing unit SL1 and a processing tank CB2.

The liquid supply part SL1 is a part for supplying the processing liquid to the processing tank CB2. The liquid supply part SL1 has, for example, an adjustment tank CB1, a first liquid supply part SL1a, a liquid circulation part CL1, and a second liquid supply part SL1b.

The adjustment tank CB1 is a part which temporarily stores the phosphoric acid aqueous solution for the purpose of adjusting the temperature of the phosphoric acid aqueous solution supplied to the treatment tank CB2, etc., for example. For example, a box-shaped adjustment tank CB1 made of quartz or a fluororesin material that has excellent corrosion resistance to a phosphoric acid aqueous solution can be used.

The first liquid supply unit SL1a may, for example, perform a process of supplying the new processing liquid transported from the processing liquid supply source En0 to the adjustment tank CB1 via the first piping unit Tb1 (also referred to as the first liquid supply process). Here, for example, a new solution (also called a pre-use phosphoric acid aqueous solution) of a phosphoric acid aqueous solution of a predetermined concentration that functions as an etching solution and functions as a chemical solution is supplied as the processing liquid. The processing liquid supply source En0 is connected to the first end portion of the first piping portion Tb1. The processing liquid supply source En0 pressure-feeds the phosphoric acid aqueous solution toward the first piping part Tb1 from a tank in which the phosphoric acid aqueous solution is stored at normal temperature (for example, 25° C.) at normal temperature (for example, 25° C.) by a pump or gas. . The first flow control part Cf1 is provided in the first piping part Tb1. The first flow control unit Cf1 includes, for example, a first valve V1 that opens and closes the flow path of the first piping unit Tb1, and a first flow meter M1 that measures the flow rate of the phosphoric acid aqueous solution. The second end portion of the first piping portion Tb1 is connected to the adjustment groove CB1, for example. Here, the first flow control unit Cf1 is connected to the control unit 10 . The control unit 10 controls the first valve V1 based on the signal indicating the flow rate sent from the first flow meter M1. Thereby, in the first liquid supply part SL1a, for example, the phosphoric acid aqueous solution supplied from the processing liquid supply source En0 The liquid passes through the first piping part Tb1 and is supplied to the adjustment tank CB1 at a flow rate set by the first flow rate control part Cf1.

For example, the liquid circulation unit CL1 can perform a process of heating the phosphoric acid aqueous solution discharged from the adjustment tank CB1 and causing it to circulate under pressure to the adjustment tank CB1 again (also called a first liquid circulation process). The liquid circulation part CL1 has, for example, a second piping part Tb2. The second piping portion Tb2 has, for example, a first end portion connected to the adjustment groove CB1 and a second end portion connected to the adjustment groove CB1. For example, the second valve V2, the first pump Pm1, and the first heater Ht1 are provided in the second piping part Tb2 in this order from the upstream side. The second valve V2 opens and closes the flow path of the second piping part Tb2. The first pump Pm1 pressure-feeds the phosphoric acid aqueous solution taken out from the adjustment tank CB1 toward the adjustment tank CB1 via the second piping part Tb2. The first heater Ht1 heats the phosphoric acid aqueous solution flowing through the second piping part Tb2 to a predetermined temperature (for example, about 160° C.).

For example, the second liquid supply unit SL1b can perform a process of supplying a pre-use phosphoric acid aqueous solution that functions as an etching liquid to the treatment tank CB2 (also referred to as a second liquid supply process). This second liquid supply part SL1b has, for example, a third piping part Tb3 as a liquid supply pipe part, and can supply the phosphoric acid aqueous solution transported from the adjustment tank CB1 to the treatment tank CB2 via the third piping part Tb3. The third piping part Tb3 has, for example, a first end part connected to a part between the first heater Ht1 and the adjustment tank CB1 in the second piping part Tb2, and a tank connected to the outer tank of the processing tank CB2. The second end of the connection is B2b. In other words, the third piping part Tb3 is a piping part branched from the second piping part Tb2. In the third piping part Tb3, for example, the phosphoric acid aqueous solution is pressure-fed from the first end toward the second end by the first pump Pm1. The second flow control part Cf2 is provided in the third piping part Tb3. The second flow control part Cf2 has, for example, a structure provided sequentially from the upstream side (the adjusting tank CB1 side) with respect to the third piping part Tb3. It is composed of a second flow meter M2, a third valve V3 and a fourth valve V4. For example, a flow detector capable of detecting the flow rate of the phosphoric acid aqueous solution flowing through the third piping part Tb3 can be applied to the second flow meter M2. For example, a flow control valve that adjusts the flow rate of the phosphoric acid aqueous solution flowing through the third piping part Tb3 can be used as the third valve V3. For example, the fourth valve V4 may be an on-off valve that controls opening and closing of the flow path of the phosphoric acid aqueous solution in the third piping part Tb3. Here, the second flow rate control unit Cf2 is connected to the control unit 10 . The control unit 10 controls the third valve V3 and the fourth valve V4 based on a signal indicating the flow rate sent from the second flow meter M2, for example. Thereby, the 2nd liquid supply part SL1b can supply the phosphoric acid aqueous solution supplied from the adjustment tank CB1 to the tank B2b outside the processing tank CB2 via the 3rd piping part Tb3 at the flow rate controlled by the 2nd flow control part Cf2, for example. .

Furthermore, for example, the liquid supply part SL1 may have the same structure as the second liquid supply part SL1b without the first liquid supply part SL1a, the adjustment tank CB1, and the liquid circulation part CL1 but with the processing liquid supply source En directly connected. In this case, for example, the processing liquid supply source En is directly connected to the first end portion on the upstream side of the third piping portion Tb3.

The processing tank CB2 is, for example, a part for processing the substrate W using the stored processing liquid. In the first embodiment, the processing tank CB2 is a part (also referred to as a processing part) that performs an etching process on the substrate W using, for example, a phosphoric acid aqueous solution that functions as an etching solution. The treatment tank CB2 has, for example, a dual structure consisting of an inner tank B2a that stores a phosphoric acid aqueous solution as an etching liquid and the substrate W is immersed in the phosphoric acid aqueous solution, and an outer tank B2b that recovers the phosphoric acid aqueous solution. The phosphoric acid aqueous solution overflowing from the upper part of tank B2a. The inner tank B2a is, for example, a rectangular box-shaped portion in a plan view made of quartz or fluororesin material which is excellent in corrosion resistance to a phosphoric acid aqueous solution. The total amount of liquid that can be stored in treatment tank CB2 (capacity) For example, it is set to about 60 liters. The outer groove B2b is also formed of the same material as the inner groove B2a, for example, and exists so as to surround the outer peripheral upper end of the inner groove B2a.

Furthermore, the processing tank CB2 is provided with a lifter LF2 for immersing the substrate W in the phosphoric acid aqueous solution stored in the processing tank CB2. The lifter LF2 holds a plurality of substrates W (for example, 50 or less) arranged in parallel with each other in an upright posture (the posture in which the normal line of the main surface of the substrate is along the horizontal direction) by using, for example, three holding rods. The lifter LF2 is provided so that it can move up and down in the vertical direction by a lifting mechanism (not shown). The lifter LF2 raises and lowers, for example, the plurality of held substrates W between a processing position (the position in FIG. 3 ) where the substrates W are immersed in the phosphoric acid aqueous solution in the inner tank B2a, and a transfer position after being pulled up from the phosphoric acid aqueous solution. . In the processing tank CB2, for example, a plurality of substrates W are positioned at processing positions in the inner tank B2a and immersed in a phosphoric acid aqueous solution, thereby performing an etching process in which the silicon nitride films of the substrates W are dissolved by the phosphoric acid aqueous solution. At this time, silicon, which is a component constituting the substrate W (also referred to as a substrate component), is eluted from the substrate W into the phosphoric acid aqueous solution stored in the inner tank B2a.

For example, the liquid circulation unit CL2 can perform a process of heating the phosphoric acid aqueous solution discharged from the treatment tank CB2 and causing it to circulate under pressure to the treatment tank CB2 again (also called a second liquid circulation process). The liquid circulation part CL2 has, for example, a fourth piping part Tb4 connected so as to communicate the outer tank B2b and the inner tank B2a. For example, the fourth piping part Tb4 has a first end connected to the bottom of the outer tank B2b and a second end connected to the bottom of the inner tank B2a. The fifth valve V5, the second pump Pm2, the sixth valve V6, the second heater Ht2, and the filter F11 are provided in the fourth piping part Tb4 in this order from the upstream side. The fifth valve V5 opens and closes the flow path of the fourth piping part Tb4. The second pump Pm2 pressure-feeds the phosphoric acid aqueous solution taken out from the outer tank B2b via the fourth piping part Tb4 toward the inner tank B2a. 6th valve V6 opening and closing 4th piping The flow path of Part Tb4. The second heater Ht2 heats the phosphoric acid aqueous solution flowing through the fourth piping part Tb4 to a predetermined temperature (for example, about 160° C.). The filter F11 is a filter for removing foreign matter in the phosphoric acid aqueous solution flowing through the fourth piping part Tb4. Moreover, the liquid circulation part CL2 may have the 5th piping part Tb5 which heats the phosphoric acid aqueous solution discharged from the inner tank B2a, and circulates it to the inner tank B2a, for example. In this case, for example, the fifth piping part Tb5 may have a first end connected to the inner groove B2a and a second end connected to the inner groove B2a. The fourth piping part Tb4 is connected between the fifth valve V5 and the second pump Pm2. The fifth piping part Tb5 is provided with a seventh valve V7 that opens and closes the flow path of the fifth piping part Tb5.

The liquid discharge part EL1 is, for example, a part that performs a process (also called a liquid discharge process) of using the etching process of the substrate W in the processing tank CB2 as the processing part as a processing liquid (also called a first liquid discharge process). The phosphoric acid aqueous solution (also referred to as the used phosphoric acid aqueous solution or the first phosphoric acid aqueous solution) is discharged from the processing tank CB2 to the outside of the substrate processing apparatus 100 . The used phosphoric acid aqueous solution is etched on the substrate W in the treatment tank CB2 and is in a state where the concentration of the substrate component (eg silicon) dissolved (also referred to as the dissolved concentration) is higher than that of the phosphoric acid aqueous solution before use. The liquid discharge part EL1 has, for example, a sixth piping part Tb6, a seventh piping part Tb7, a cooling tank Ct1, and an eighth piping part Tb8. Here, the sixth piping part Tb6, the seventh piping part Tb7, and the eighth piping part Tb8 constitute a part (also called a liquid discharge pipe part) for discharging the completed phosphoric acid aqueous solution from the processing tank CB2 to the outside of the substrate processing apparatus 100. )Tg1.

The sixth piping part Tb6 has, for example, a first end part connected to a part between the second pump Pm2 and the sixth valve V6 in the fourth piping part Tb4 and connected to the cooling tank Ct1 Connect the 2nd end. In other words, the sixth piping part Tb6 and the fourth piping part Tb4 together form a connection between the processing tank CB2 and the cooling The part to which slot Ct1 is connected (also called part 1). The eighth valve V8 is provided in the sixth piping part Tb6. The eighth valve V8 opens and closes the flow path of the sixth piping part Tb6. Therefore, by appropriately controlling the opening and closing of the sixth valve V6 and the eighth valve V8, the phosphoric acid aqueous solution discharged from the treatment tank CB2 can be selectively heated and circulated to the treatment tank CB2 under pressure (the second step). Liquid circulation processing), and processing (liquid discharge processing) of discharging the completed phosphoric acid aqueous solution from the processing tank CB2 to the outside of the substrate processing apparatus 100 through the cooling tank Ct1.

The 7th piping part Tb7 has, for example, a first end part connected to the upper part of the tank B2b outside the processing tank CB2, and a second end part connected to the cooling tank Ct1. Here, for example, when the storage amount of the phosphoric acid aqueous solution stored in the outer tank B2b of the treatment tank CB2 increases excessively, the seventh piping part Tb7 can transfer the phosphoric acid aqueous solution from the outer tank B2b so that the phosphoric acid aqueous solution does not overflow from the outer tank B2b. It flows into cooling tank Ct1.

The cooling tank Ct1 can store and cool the used phosphoric acid aqueous solution.

The eighth piping portion Tb8 is connected to the cooling tank Ct1, for example, and constitutes a portion for discharging the used phosphoric acid aqueous solution to the outside of the substrate processing apparatus 100 . The eighth piping portion Tb8 has, for example, a first end portion connected to the cooling tank Ct1 and a third end portion connected to a portion Ex0 for discharging the completed phosphoric acid aqueous solution to the outside of the substrate processing apparatus 100 (also referred to as a processing liquid discharge portion). 2 ends. The processing liquid discharge part Ex0 may be, for example, a tank for recovering the phosphoric acid aqueous solution (also called a recovery tank) that is detachable from the substrate processing apparatus 100 or a tank for draining the phosphoric acid aqueous solution (also called a drain tank). Or used to connect to the drainage pipes of factory drainage treatment facilities, etc. For example, the ninth valve V9 is provided in the eighth piping part Tb8. The ninth valve V9 can open and close the flow path of the eighth piping part Tb8. Here, the discharge of the phosphoric acid aqueous solution from the cooling tank Ct1 to the processing liquid discharge part Ex0 can be accomplished by the third 9 valve V9 adjusted.

The operations of each component of the above-mentioned chemical solution processing unit 52 can be controlled by the control unit 10 . For example, the control unit 10 may control the process of supplying the pre-use phosphoric acid aqueous solution as the second treatment liquid to the adjustment tank CB1 through the first liquid supply unit SL1a (first liquid supply process), and may control the circulation of the phosphoric acid aqueous solution through the liquid circulation unit CL1 The process (first liquid circulation process), the process of supplying the pre-use phosphoric acid aqueous solution to the treatment tank CB2 through the second liquid supply part SL1b (the second liquid supply process), the process of circulating the phosphoric acid aqueous solution through the liquid circulation part CL2 ( second liquid circulation treatment), and a treatment (liquid discharge treatment) in which the used phosphoric acid aqueous solution as the first treatment liquid is discharged from the treatment tank CB2 through the liquid discharge part EL1. Furthermore, for example, a concentration meter installed along the inner wall of the inner tank B2a may be used to detect the dissolved concentration of a predetermined substance eluted into the substrate W in the phosphoric acid aqueous solution stored in the inner tank B2a. According to As the dissolved concentration of the detection result, the control unit 10 opens and closes the eighth valve V8 and the ninth valve V9, and appropriately sends the used phosphoric acid aqueous solution to the treatment liquid discharge unit Ex0.

<1-3. Control of supply of treatment liquid>

In the chemical solution processing section 52, for example, in the processing tank CB2, at least one of the pre-processing, main processing, and post-processing of a plurality of substrates W in one batch is used as a pre-use phosphoric acid aqueous solution as a processing liquid. It is supplied to the processing tank CB2.

Here, the pretreatment can be applied, for example, by using the phosphoric acid aqueous solution stored in the processing tank CB2 before immersing the plurality of substrates W in the phosphoric acid aqueous solution stored in the processing tank CB2. Preparation is carried out in such a manner that the phosphoric acid aqueous solution is supplied and bubbles are introduced to an active state suitable for the etching process. The main processing can apply, for example, the following processing: The plurality of substrates W are etched while being immersed in the phosphoric acid aqueous solution stored in the treatment tank CB2. The post-processing can be applied to, for example, the following processing: after the main processing is completed, by supplying a pre-use phosphoric acid aqueous solution to the processing tank CB2, etc., a plurality of substrates W of a batch to be processed next are performed. Preparation for execution of processing.

At this time, the control unit 10 controls, for example, the second liquid supply process of supplying the pre-use phosphoric acid aqueous solution as the treatment liquid to the treatment tank CB2 through the second liquid supply unit SL1b, thereby controlling the supply of the pre-use phosphoric acid aqueous solution to the treatment tank CB2 through the liquid supply unit SL1. Treatment of phosphoric acid aqueous solution before use as a treatment liquid (also called liquid supply treatment). This liquid supply process can be controlled, for example, by the control unit 10 based on a recipe specified with respect to a plurality of substrates W in one batch to be processed.

FIG. 4 is a block diagram showing an example of a functional structure related to the liquid supply process implemented by the control unit 10 . In the control unit 10, the calculation unit realizes various functional configurations while using the memory as a workspace. As shown in FIG. 4 , the control unit 10 includes, for example, a screen creation unit 10 a , a display control unit 10 b , a recipe creation unit 10 c , a schedule creation unit 10 d , an acquisition unit 10 e , and a recognition unit 10 f . Calculation unit 10g, supply control unit 10h, and mode switching unit 10i. Here, for example, at least part of the functions that can be implemented by the control unit 10 can also be implemented by a dedicated electronic circuit.

For example, the screen creation unit 10a can create information for creating or editing a screen (recipe input screen) defining a recipe in which the operator processes the substrate W. For example, the screen creation unit 10a creates the information of the recipe input screen based on the screen configuration data stored in the storage unit 20.

The display control unit 10b may be produced by using the screen creation unit 10a, for example. The information on the recipe input screen is created so that the display unit included in the output unit 9 displays the recipe input screen.

The recipe creation part 10c can create or edit a recipe based on the signal input from the input part 8 in response to an operator's action, for example. Here, for example, the operator can create and edit the recipe in the recipe creation unit 10c by inputting various information on the recipe input screen displayed on the display unit.

5(a) and 5(b) are diagrams showing a first example of parts R1a and R1b of the recipe input screen for specifying processing in the chemical solution processing unit 52. FIG. 6 is a diagram showing a second example of a portion R2 of the recipe input screen for specifying processing in the chemical solution processing unit 52.

For example, as shown in FIG. 5(a) , for the chemical liquid treatment unit 52 of the first liquid treatment unit 5, a numerical value V1a regarding the supply amount of the treatment liquid per unit treatment amount of the substrate W may be described on the recipe input screen, and The recipe is stored in the storage unit 20 . In addition, for example, as shown in FIG. 5(b) , for the chemical liquid treatment unit 52 of the second liquid treatment unit 6, a numerical value V1b regarding the supply amount of the treatment liquid per unit treatment amount of the substrate W may be described on the recipe input screen. And the recipe is stored in the storage part 20. Here, for the values V1a and V1b of the supply amount of the processing liquid per unit processing amount of the substrate W, for example, the volume of the processing liquid can be applied.

In this way, the recipe creation unit 10c can calculate the processing liquid per unit processing amount of the substrate W for each of the two chemical liquid processing units 52 based on the signal input from the input unit 8 in response to the operator's action. The numerical values V1a and V1b of the supply amount are described in the recipe, and the recipe is created or edited thereby. Thereby, for example, the operator can customize the processing performed on the substrate W for each processing tank CB2 of the two chemical solution processing units 52 . Here, the unit throughput of the substrate W includes, for example, a predetermined The unit processed by the number of slices consists of the number of slices. The predetermined number of pieces may be, for example, one piece or any number of two or more pieces. The numerical values V1a and V1b may be, for example, values representing the volume of the treatment liquid. In the example of FIG. 5(a) , the supply amount of the processing liquid of 600 ml per one substrate W is described. In the example of FIG. 5( b ), the supply amount of the processing liquid of 800 ml per one substrate W is described. Here, the numerical values V1a and V1b can be appropriately input by the operator based on the result of processing the substrate W in the processing tank CB2 of each chemical solution processing unit 52, for example. With this, for example, the operator can write in the recipe the numerical value of the supply amount of the processing liquid per unit processing amount of the substrate W for each chemical liquid processing unit 52 . Then, numerical information including numerical values V1a and V1b regarding the supply amount of the processing liquid per unit processing amount of the substrate W for each of the two chemical solution processing units 52 is stored in the storage unit 20 .

In the examples of FIG. 5(a) and FIG. 5(b) , although the numerical values V1a and V1b of the two processing tanks CB2 are described in different recipes, they are not limited to this. For example, numerical information including numerical values V1a and V1b of each chemical solution processing unit 52 may be described in one recipe. In this case, for example, one recipe may be used to supply an amount of the processing liquid corresponding to the processing amount of the substrate W to the processing tank CB2 for each chemical liquid processing unit 52 . Thereby, for example, two processing tanks CB2 can be used to process the substrate W in parallel according to one recipe.

In addition, as shown in FIG. 6 , the numerical information described in one recipe may also include the reference value Vs1 for the two chemical solution processing units 52 and the supply amount of the processing liquid per unit processing amount of the substrate W. Adjustment value Va1 of at least one of the two chemical liquid processing units 52 . Furthermore, in the example of the recipe shown in FIG. 6 , the chemical solution processing part 52 of the first liquid processing part 5 is represented by the symbol T2, and the chemical solution processing part 52 of the second liquid processing part 6 is represented by the symbol T4. . Here, the reference value Vs1 For example, a standard value that defines the supply amount of the processing liquid per unit processing amount of the substrate W of one chemical liquid processing unit 52 can be applied. For example, the adjustment value Va1 can be a value that defines an amount by which the supply amount of the processing liquid per unit processing amount of the substrate W should be increased or decreased for each chemical solution processing section 52 using the reference value Vs1 as a reference. The reference value Vs1 and the adjustment value Va1 may be, for example, the volume of the processing liquid. In the example of FIG. 6 , 600 ml as the reference value Vs1, 0 ml as the first adjustment value Va11, and 200 ml as the second adjustment value Va12 are described in one recipe. Here, the first adjustment value Va11 is an adjustment value for the chemical solution processing part 52 of the first liquid processing part 5 , and the second adjustment value Va12 is an adjustment value for the chemical solution processing part 52 of the second liquid processing part 6 .

For example, the schedule creation unit 10d can create a time schedule based on recipes specified for the plurality of substrates W to be processed. For example, the time schedule stipulates that the first transport unit 2 transports a plurality of substrates W, the second transport unit 3 transports a batch of a plurality of substrates W, and the drying processing unit 4 , the timing of processing performed on the plurality of substrates W by the first liquid processing unit 5 and the second liquid processing unit 6. The time schedule created by the schedule creation unit 10d is stored in the memory or the storage unit 20, for example. Furthermore, the substrate processing apparatus 100 can perform various operations based on the time schedule created by the schedule creation unit 10d, for example.

For example, the acquisition unit 10e may acquire the throughput information of one batch of substrates W to be processed based on the measurement results of the sensor unit 11m. Here, for example, assume that a substrate group including a plurality of substrates W in one batch is formed by transporting all the substrates W stored in the two cassettes C1 with respect to the second transport unit 3 . In this case, for example, the number of substrates W contained in each of the two cassettes C1 can be processed as one batch of substrates W based on the results measured by the sensor unit 11m. amount of information to obtain. In this way, for example, based on the utilization base The processing amount of the substrate W measured by the plate processing apparatus 100 is supplied to the processing tank CB2 with an amount of processing liquid corresponding to the processing amount of the substrate W for each chemical solution processing unit 52 . As a result, for example, the processing performed on the substrate W can be customized for each processing tank CB2 in the substrate processing apparatus 100 .

The recognition unit 10f can recognize, for example, one chemical processing unit 52 used to process the substrate W among the two chemical processing units 52 . For example, the chemical liquid processing unit 52 among the two chemical liquid processing units 52 that carries a plurality of substrates W in one batch may be determined based on the time schedule.

For example, the calculation unit 10g can calculate the substrate corresponding to one chemical solution processing unit 52 recognized by the recognition unit 10f based on the numerical information of the recipe specified for one batch of substrates W to be processed. The supply amount of the treatment liquid to the treatment tank CB2 of one chemical liquid treatment unit 52 is calculated using the numerical value of the supply amount of the treatment liquid per unit treatment amount of W and the treatment amount information acquired by the acquisition unit 10e. numerical value.

Here, as shown in FIGS. 5(a) and 5(b) , it is assumed that the numerical values V1a and V1b of the two processing tanks CB2 are described in different recipes. In this case, for example, when the recognition unit 10f has recognized the chemical liquid processing unit 52 of the first liquid processing unit 5, 600 ml, which is the unit processing volume of the substrate W, that is, the supply volume of the processing liquid per one piece, is multiplied by 600 ml. The value obtained by using the number of substrates W (50 or less) of the processing amount information acquired by the acquisition unit 10e is used as a numerical value related to the supply amount of the processing liquid supplied to the processing tank CB2 of one chemical liquid processing unit 52. was figured out. In the example of FIG. 5(a) , 600 ml is multiplied by 50 pieces as the number of substrates W to calculate a numerical value related to the supply amount of the processing liquid supplied to the processing tank CB2 of one chemical liquid processing unit 52 . The state of 30000ml. Also, for example, when the recognition part 10f has recognized the chemical solution of the second liquid processing part 6 When the processing unit 52 is used, 800 ml, which is the unit processing capacity of the substrate W, that is, the supply amount of the processing liquid per piece, is multiplied by the number of substrates W (50 or less) as the processing capacity information acquired by the acquisition unit 10e. The value is calculated as the numerical value of the supply amount of the processing liquid supplied to the processing tank CB2 of one chemical liquid processing unit 52 . In the example of FIG. 5( b ), 800 ml is multiplied by 50 pieces as the number of substrates W to calculate a numerical value regarding the supply amount of the processing liquid supplied to the processing tank CB2 of one chemical liquid processing unit 52 . The state of 40000ml.

For example, the supply control unit 10h can supply the treatment liquid to the treatment tank CB2 through the liquid supply unit SL1 in one chemical liquid treatment unit 52 recognized by the recognition unit 10f based on the numerical value calculated by the calculation unit 10g. . Therefore, for example, an amount of the processing liquid corresponding to the processing amount of the substrate W can be supplied to the processing tank CB2 for each chemical liquid processing unit 52 . This makes it less likely to cause problems such as wasteful use of the processing liquid and excessive processing due to excessive supply of the processing liquid. As a result, for example, in the substrate processing apparatus 100, customization of the processing performed on the substrate W can be easily performed for each processing tank CB2. Therefore, in the substrate processing apparatus 100, for example, customization of the processing performed on the substrate W can be easily performed.

However, the calculation unit 10g may be configured to calculate the calculation unit 10g based on the reference value Vs1 described in the numerical information of one recipe and the adjustment value Va1 corresponding to one chemical solution processing unit 52 recognized by the recognition unit 10f, and The numerical value regarding the supply amount of the processing liquid supplied to the processing tank CB2 of one chemical liquid processing unit 52 is calculated using the processing amount information acquired by the acquisition unit 10e. In this case, for example, by changing the adjustment value in one recipe, an amount of the processing liquid corresponding to the processing amount of the substrate W can be supplied to the processing tank CB2 for each chemical liquid processing unit 52 . This makes it possible, for example, to easily prepare recipes.

Here, as shown in Fig. 6, it is assumed that the reference value Vs1 and the adjustment value Va1 It is described in one recipe. In this case, for example, when the recognition unit 10f has recognized the chemical liquid processing unit 52 of the first liquid processing unit 5, the unit processing amount of the substrate W, that is, the reference value Vs1 of the supply amount of the processing liquid per piece is 600 ml is obtained by multiplying the number of substrates W (50 or less) as the throughput information acquired by the acquisition unit 10e, and the unit throughput of the substrate W, that is, the supply amount of the processing liquid per sheet. The sum of the values of 0 ml of the adjustment value Va11 multiplied by the number of substrates W (50 or less) as the processing amount information acquired by the acquisition unit 10e is supplied to one chemical solution processing unit 52. The numerical value of the supply amount of the processing liquid to the processing tank CB2 is calculated. In the example of FIG. 6 , a value obtained by multiplying 600ml as the reference value Vs1 by 50 as the number of substrates W is shown, and a value obtained by multiplying 0ml as the first adjustment value Va11 by the number of substrates W. The sum of the values obtained from 50 tablets is 30,000ml. Furthermore, for example, when the recognition unit 10f has recognized the chemical liquid processing unit 52 of the second liquid processing unit 6, 600 ml is multiplied by 600 ml which is the reference value Vs1 of the supply amount of the processing liquid per piece as the unit processing capacity of the substrate W. A value obtained by using the number of substrates W (50 or less) as the throughput information acquired by the acquisition unit 10e, and the second adjustment value of the supply amount of the processing liquid per one piece as the unit throughput of the substrate W. The sum of the values obtained by multiplying 200 ml of Va12 by the number of substrates W (50 or less) as the processing amount information acquired by the acquisition unit 10e is the processing tank CB2 supplied to one chemical solution processing unit 52. The numerical value of the supply amount of the treatment liquid is calculated.

FIG. 7 is a diagram showing an example of the relationship between the number of substrates W and the supply amount of the processing liquid to the processing tank CB2. FIG. 7 shows the relationship between the number of substrates W and the supply amount of the processing liquid to the processing tank CB2 according to an example of the recipe of FIG. 6 . More specifically, in FIG. 7 , the relationship between the number of substrates W in the processing tank CB2 in the chemical solution processing section 52 of the first liquid processing section 5 and the supply amount of the processing liquid is represented by the solid line L1 , the relationship between the number of substrates W in the processing tank CB2 in the chemical solution processing section 52 of the second liquid processing section 6 and the supply amount of the processing liquid is represented by a single-point chain line L2. Here, for example, in the chemical liquid treatment section 52 of the first liquid treatment section 5, since the first adjustment value Va11 is 0 ml, the supply amount of the treatment liquid is not adjusted. Thereby, as shown by the solid line L1, the supply amount of the processing liquid supplied to the processing tank CB2 of the chemical solution processing section 52 of the first liquid processing section 5 becomes 600 ml as the reference value Vs1 multiplied by 600 ml. The amount obtained by measuring the number of substrates W of information. In addition, for example, for the chemical liquid processing section 52 of the second liquid processing section 6, since the second adjustment value Va12 is 200 ml, the processing liquid is supplied in an increment of 200 ml per substrate W as the unit processing capacity. Quantity adjustment. Thereby, the supply amount of the processing liquid supplied to the processing tank CB2 of the chemical processing section 52 of the second liquid processing section 6 becomes as shown by the single-point chain line L2 by dividing it along the reference value. The supply amount of the processing liquid shown by the solid line L1 of Vs1 is adjusted by adding the value obtained by multiplying 200 ml as the second adjustment value Va12 by the number of substrates W as the processing amount information.

The mode switching unit 10i can switch the mode between the first liquid supply mode and the second liquid supply mode based on a signal input from the input unit 8 in response to the operator's action, for example. Here, the first liquid supply mode is a mode in which an amount of the processing liquid corresponding to the processing amount is supplied to the processing tank CB2 for each chemical liquid processing unit 52 as described above. Specifically, in the first liquid supply mode, for example, a mode in which the calculation unit 10g corresponds to one chemical liquid processing unit 52 recognized by the recognition unit 10f is described in the numerical information of the recipe may be applied. The numerical value of the supply amount of the processing liquid per unit processing amount of the substrate W and the processing amount information acquired by the acquisition unit 10e are used to calculate the supply amount to one chemical liquid processing unit 52 recognized by the recognition unit 10f. The numerical value of the supply amount of the processing liquid in the processing tank CB2 is determined by the supply control unit 10 h according to the utilization calculation unit The numerical value calculated by 10g is used to supply the processing liquid to the processing tank CB2 through the liquid supply part SL1 in one chemical liquid processing part 52 recognized by the recognition part 10f. The second liquid supply mode is a mode in which a predetermined amount of the processing liquid is supplied to the processing tank CB2 regardless of the two chemical liquid processing units 52 . Specifically, the second liquid supply mode can be applied to, for example, a mode in which the control unit 10 supplies a predetermined amount of the processing liquid set in advance through the liquid supply unit SL1 to one chemical liquid recognized by the recognition unit 10f. The processing tank CB2 of the processing part 52.

If such mode switching is possible, for example, when there is no difference in the processing results of the substrate W in each processing tank CB2, each chemical liquid processing can be omitted by setting to the second liquid supply mode. Part 52 sets the numerical value related to the supply amount of the processing liquid per unit processing amount of the substrate W. This can reduce the operator's workload for setting processing conditions through recipe creation and editing, for example.

<1-4. Operation regarding supply of treatment liquid to treatment tank>

FIG. 8 is a flowchart showing an example of an operation flow regarding supply of the processing liquid to the processing tank CB2. The operation regarding the supply of the processing liquid to the processing tank CB2 also includes, for example, the operation regarding creation and editing of the recipe. This operation flow is realized, for example, by the control unit 10 controlling the operations of each unit of the substrate processing apparatus 100 . Here, for example, by performing the processing of steps S1 to S10 in FIG. 8 , the operation related to supplying the processing liquid to the processing tank CB2 is performed.

In step S1, the control unit 10 determines whether to start creating and editing the recipe. Here, for example, if the signal used to display the recipe input screen is input through the input unit 8 without responding to the operator's action, the process proceeds to step S5. If the signal used to display the recipe input screen is input through the input unit 8 in response to the operator's action, Inputted by the input unit 8, before going to bed Go to step S2.

In step S2, the display control unit 10b displays the recipe input screen on the display unit included in the output unit 9 based on the information of the recipe input screen created by the screen creation unit 10a.

In step S3, the recipe creation unit 10c accepts the input of information such as the description of the information on the recipe input screen based on the signal input through the input unit 8 in response to the operator's action. At this time, for example, for each of the two chemical liquid processing units 52 among the first liquid processing unit 5 and the second liquid processing unit 6, numerical information on the supply amount of the processing liquid per unit processing amount of the substrate W can be obtained. Enter.

In step S4, the control unit 10 determines whether to end the creation and editing of the recipe. Here, for example, if the signal used to end the production and editing of the recipe does not respond to the operator's action and is input through the input unit 8, the process returns to step S3. If the signal used to end the production and editing of the recipe responds to the operator's action, the process returns to step S3. If the action is input through the input unit 8, the process proceeds to step S5.

In step S5, the control unit 10 causes the recipe created and edited on the recipe input screen to be stored in the storage unit 20. Thereby, for example, numerical information on the supply amount of the processing liquid per unit processing amount of the substrate W is stored in each of the two chemical liquid processing sections 52 of the first liquid processing section 5 and the second liquid processing section 6 . in the storage unit 20.

In step S6, the control unit 10 determines whether it is time for the chemical liquid processing unit 52 to start chemical liquid processing. Here, for example, the control unit 10 can determine whether it is time to start chemical liquid processing based on a time schedule based on the recipe specified for the plurality of substrates W to be processed by the schedule creation unit 10d. is created and stored in the storage unit 20 and the like. Here, if it is not the time to start the chemical liquid processing in the chemical liquid processing unit 52, the process returns to step S1. On the other hand, if you are starting to When it is time to perform the chemical liquid processing in the chemical liquid processing unit 52, the process proceeds to step S7. At this time, the recipe specified for a plurality of substrates W of one batch as the object of processing can be recognized.

In step S7, the acquisition unit 10e acquires the number of substrates W in one batch as the processing amount of the substrate W to be processed in the chemical solution processing unit 52.

In step S8, the recognition unit 10f recognizes one of the two chemical liquid processing units 52 of the first liquid processing unit 5 and the second liquid processing unit 6 for processing the substrate W. Here, the recognition unit 10f can recognize one processing tank CB2 that is used according to a schedule or the like, for example.

In step S9 , the calculation unit 10 g determines the chemical liquid processing unit recognized in step S8 based on the numerical information described in the recipe specified for one batch of substrates W to be processed. 52 corresponding to the numerical value of the supply amount of the processing liquid per unit processing capacity and the number of substrates W in one batch as the processing capacity obtained in step S7, to calculate the supply to one chemical liquid processing unit 52 The value of the supply amount of the treatment liquid to the treatment tank CB2.

In step S10, the supply control unit 10h supplies the treatment liquid to the treatment tank CB2 through the liquid supply unit SL1 in the one chemical treatment unit 52 recognized in step S8 based on the numerical value calculated in step S9.

By operating in this manner, for example, an amount of the processing liquid corresponding to the processing amount of the substrate W can be supplied to the processing tank CB2 for each chemical liquid processing unit 52 . This makes it less likely to cause problems such as wasteful use of the processing liquid and excessive processing due to excessive supply of the processing liquid. As a result, for example, in the substrate processing apparatus 100, the processing performed on the substrate W can be easily customized for each processing tank CB2. Therefore, for example, the processing of the substrate W can be easily performed in the substrate processing apparatus 100 Customization of the implementation process.

<1-5. Display mode of recipe input screen>

FIG. 9 is a diagram showing the schematic structure of the recipe input screen Sc0. FIG. 10 is a diagram showing a reference example of a part of the recipe input portion Pr1 in the recipe input screen Sc0. 11 to 22 are diagrams each showing a partial example of the recipe input portion Pr1 in the recipe input screen Sc0.

As shown in FIG. 9 , the recipe input screen Sc0 has, for example, an area Ar0 that displays information about the recipe (also called a recipe display area), and an area where buttons are arranged for inputting various instructions (also called a button area) Ab0 . The recipe display area Ar0 includes, for example, a portion (also called an identification information portion) Pr0 for displaying various identification information about the recipe, and a portion for displaying and inputting setting items of the recipe and setting conditions (numeric values, etc.) for each setting item. (Also known as the recipe input section) Pr1.

Here, as shown in FIG. 10 , the recipe input part Pr1 includes, for example, a first area Ar1 located in the upper part and a second area Ar2 located in the lower part. The first area Ar1 describes conditions for each of a plurality of setting items (also called first setting items or header items) that do not depend on the passage of time in processing executed according to the recipe, for example. area (also called the header area). The second area Ar2 is, for example, an area describing conditions for each of a plurality of setting items (also referred to as second setting items or step items) that depend on the passage of time in processing executed according to the recipe. (Also known as step area). The plurality of first setting items may include, for example, items such as the lifting speed of the lifter LF2, the etching amount of the substrate W, the processing conditions of the processing liquid in the processing tank CB2, and the presence or absence of bubbling. The plurality of second setting items may include, for example, items such as the supply amount of the chemical solution to the treatment tank CB2 that changes with the passage of time.

Then, for example, the operator can continue to create and edit the recipe while confirming both the first area Ar1 and the second area Ar2 on the recipe input screen Sc0. Then, the recipe creation unit 10c can, for example, respond to a signal input from the input unit 8 in response to the operator's action, and based on the conditions described for each first setting item in the recipe input screen Sc0, and the conditions described in the recipe input screen Sc0. Create or edit recipes based on the conditions described in each second setting item.

<1-5-1. Expansion and compression of items in the recipe input screen>

However, in recent years, for example, there is a tendency that more detailed requirements are required for the processing performed on the substrate W. As a result, the number of first setting items in the first area Ar1 tends to increase. For example, when bubbling the treatment liquid stored in the treatment tank CB2 using nitrogen gas, there is a possibility of increasing the number of gas tubes for bubbling and discharging gas individually for each gas tube. Wait for individual settings. In this case, the number of first setting items related to bubbling in the first area Ar1 may increase. In particular, in recent years, for example, in recipes for forming three-dimensional NAND, the number of items that should be set in detail for processing conditions has increased, and the number of first setting items in the first area Ar1 has significantly increased. tendency.

However, for example, as the number of the first setting items in the first area Ar1 increases, the proportion of the first area Ar1 in the recipe input screen Sc0 may increase. At this time, in order to display the first area Ar1 and the second area Ar2 simultaneously in the recipe input screen Sc0, for example, it is possible to consider reducing the text size in the recipe input screen Sc0, but the visual recognition of the recipe input screen Sc0 is limited. Sex will get worse. As a result, operations such as creating and changing recipes gradually become more and more difficult.

Therefore, in the first embodiment, for example, as shown in FIGS. 11 to 13 Generally, in the first area Ar1, the plurality of first setting items can be divided into a plurality of groups, and the display and non-display of the plurality of first setting items can be switched for each group. Such a display mode of the first area Ar1 can be realized by, for example, the screen configuration data stored in the storage unit 20 .

Here, for example, as shown in FIG. 11 , a plurality of item groups each including two or more first setting items among the plurality of first setting items (also referred to as a first setting item group) are provided in the first area Ar1 ) are the display elements (also called the first display elements) Dc1 to Dc3 of each group name. Such first display elements Dc1 to Dc3 can be specified by the screen configuration data stored in the storage unit 20 . In the example of FIG. 11 , in the first area Ar1, a plurality of first setting items are classified into a group (also referred to as a first group) of the first setting items related to the lifting speed of the lifter LF2, and a group of the first setting items related to the lifting speed of the lifter LF2. A group of first setting items (also called a second group) for the processing conditions of the treatment liquid in the treatment tank CB2, and a group of other first setting items (also called a third group). For example, the first display element Dc1 related to the group name of the first group, the first display element Dc2 related to the group name of the second group, and the group name related to the third group are displayed in the first area Ar1. The first display element Dc3.

Furthermore, for example, the screen creation unit 10a is configured so that the recipe input screen Sc0 displayed on the display unit included in the output unit 9 can be configured based on a signal input from the input unit 8 in response to the operator's action. Change the display state of two or more first setting items included in one first setting item group among the plurality of first setting item groups, between a state in which the display is performed (also called an expanded state) and a state in which the display is not performed. (compression state). If such a structure is adopted, for example, the operator can switch the expanded state to display more than two first setting items and the compressed state to not display two first setting items for each group containing two or more first setting items. The first of the above Determine the status of the project. Thereby, for example, even if the number of the plurality of first setting items in the first area Ar1 increases, the operator can easily perform the setting while confirming both the first area Ar1 and the second area Ar2 on the recipe input screen Sc0 Carry out preparation and editing of recipes. Therefore, for example, customization of the processing performed on the substrate W can be easily performed in the substrate processing apparatus 100 .

Here, for example, a configuration may be adopted in which various operations on the first display elements Dc1 to Dc3 are performed based on signals input from the input unit 8 in response to the operator's actions, and each of the first to third groups The display state of more than two first setting items can be switched between the expanded state and the compressed state. Specifically, for example, as shown in FIG. 11 , when the display state of two or more first setting items of the first group is in a compressed state, if the first display element Dc1 is pressed by the mouse When the cursor Mp1 is clicked, as shown in Figure 12, the display state of the two or more first setting items of the first group will change from the compressed state to the expanded state. On the other hand, for example, as shown in FIG. 12 , when the display state of two or more first setting items of the first group is in the expanded state, if the first display element Dc1 is moved by the mouse When the cursor Mp1 is clicked, as shown in Figure 11, the display state of the two or more first setting items of the first group will change from the expanded state to the compressed state. In addition, the following aspect may be adopted: when the display state of two or more first setting items of the second group is in a compressed state as shown in FIG. 11, if the first display element Dc2 is pointed by the mouse cursor Mp1 Click, as shown in Figure 13, the display state of the two or more first setting items of the second group will change from the compressed state to the expanded state. On the other hand, for example, as shown in FIG. 13, when the display state of two or more first setting items of the second group is in the expanded state, if the first display element Dc2 is moved by the mouse Clicked by the cursor Mp1, as shown in Figure 11, there are more than two first setting items in the second group The display state of the item will change from the expanded state to the compressed state. Furthermore, for example, as shown in FIG. 11 , when the display status of two or more first setting items of the third group is in a compressed state, if the first display element Dc3 is moved by the mouse cursor Mp1 When clicked, although the icon is omitted, the display state of the two or more first setting items of the third group will change from the compressed state to the expanded state. On the other hand, it can be as follows: when the display state of more than two first setting items of the third group is in the expanded state, if the first display element Dc3 is clicked by the mouse cursor Mp1, as shown in Figure 11 As shown, the display state of two or more first setting items in the third group will change from the expanded state to the compressed state.

Here, for example, as shown in FIGS. 11 to 13 , if each of the plurality of first display elements Dc1 to Dc3 is displayed in a manner that can be visually distinguished from the plurality of first setting items, the operation The workability of employees can be improved. Specifically, it may be an aspect in which each of the plurality of first display elements Dc1 to Dc3 is displayed using a different color from the display elements of the plurality of first setting items. Furthermore, for example, as shown in FIGS. 11 to 13 , each of the plurality of first display elements Dc1 to Dc3 may be marked with a first mark Mk1 indicating a compressed state or a second mark Mk2 indicating an expanded state. Here, for example, as shown in FIG. 13 , the plurality of first setting items described as 0 as the setting conditions are in a state that is not used in the chemical solution processing. Therefore, for example, the first setting item described as 0 as the setting condition and the first setting item described as other than 0 as the setting condition may be distinguished visually such as by color. display.

Furthermore, here, for example, a configuration may be adopted in which the screen creation unit 10a indicates certain information to each of the first display elements Dc1 to Dc3 based on a signal input from the input unit 8 in response to the operator's action. . For example, as shown in Figure 14, Each of the first display elements Dc1 to Dc3 can be marked with the number of the first setting items included in the group, and the reason for the grouping can also be marked.

However, in the recipe input screen Sc0, for example, by pressing the button for saving the recipe included in the button area Ab0 with the mouse cursor Mp1, the folder of the recipe described in the relevant recipe display area Ar0 will be The recipe preparation part 10c is stored in the storage part 20. Here, for example, when saving the recipe-related folder in the storage unit 20, the recipe creation unit 10c may check whether there is a setting item (also called an error item) in which an erroneous setting condition is described, and the screen creation unit may 10a The element used to report the occurrence of a setting error (also called the first error reporting element) is displayed on the recipe input screen. Here, descriptions of erroneous setting conditions include, for example, a description that the setting item for the speed of the lifter LF2 exceeds an upper limit value corresponding to the type of the treatment liquid, and that an acid and alkali are added simultaneously. As the display of the first error notification element, for example, as shown in FIGS. 15 and 16 , the display of the pop-up window Em0 for notifying the error, the color classification of error items, and other aspects that can be visually recognized can be cited. The display below, the color distinction of the first display element Dc1 of the group to which the error item belongs, and the like can be visually recognized.

<1-5-2. Moving items in the recipe input screen>

However, for example, each user may have different requirements for high precision in the processing performed on the substrate W. For example, in the development stage of products using the substrate W, there is a high demand for testing by slightly changing the processing performed on the substrate W. In such a situation, there may be a request, for example, to change the first setting item (header item) regarding the condition that does not depend on the passage of time in the processing executed according to the recipe. Furthermore, there is a second setting item (step item) regarding conditions that depend on the passage of time in processing executed according to the recipe. On the other hand, for example, even in the development stage of a product using the substrate W, there may be a request to change the second setting item (step item) to the first setting item (head item). Also, for example, in the stage of mass production of a product using the substrate W, there may be an increase in the number of setting items that have the same setting conditions every day, and the second item (step item) may be changed to the first item (head item). ) requirements.

However, in order to respond to all such contrary requirements, if the recipe input screen Sc0 of the substrate processing apparatus 100 is customized for each user and shipped, the manufacturing and shipping steps of the substrate processing apparatus 100 will become significantly complicated. change. Furthermore, even if it is assumed that the recipe input screen Sc0 of the substrate processing apparatus 100 can be customized for each user and shipped, it still cannot fully respond to all changes in requirements corresponding to the usage conditions of the substrate processing apparatus 100 .

Therefore, in the first embodiment, for example, as shown in FIGS. 17 to 22 , in the recipe input screen Sc0 , settings can be made between the first area (head area) Ar1 and the second area (step area) Ar2 Movement of items.

Here, for example, the screen creation unit 10a can set one or more of the plurality of first setting items in the first area Ar1 in the recipe input screen Sc0 based on a signal input from the input unit 8 in response to the operator's action. 1 setting item is changed to one or more second setting items among the plurality of second setting items in the second area Ar2. Furthermore, for example, the screen creation unit 10a may set one or more of the plurality of second setting items in the second area Ar2 in the recipe input screen Sc0 based on a signal input from the input unit 8 in response to the operator's action. The setting items are changed from a plurality of first setting items included in the first area Ar1 to one or more first setting items. Ruocai With this configuration, for example, the operator can arbitrarily replace the setting items between a plurality of first setting items and a plurality of second setting items. By this, for example, the operator can create a recipe specifying the required conditions. As a result, for example, the operator can cause the substrate processing apparatus 100 to perform processing of the substrate W under required conditions. Therefore, for example, customization of the processing performed on the substrate W can be easily performed in the substrate processing apparatus 100 .

For example, as shown in FIG. 17 , in the recipe input screen Sc0 , the mouse cursor Mp1 is aligned with and the left mouse button is pressed, so that the first area Ar1 is displayed. The drag operation to move one of the plurality of first setting items and the drop operation of releasing the left button of the mouse move it to the position as shown in Figure 18 The second area Ar2 becomes the second setting item. On the other hand, for example, as shown in FIG. 19 , in the recipe input screen Sc0 , the mouse cursor Mp1 is aligned with the mouse cursor Mp1 and the left button of the mouse is pressed. One of the plurality of second setting items in the second area Ar2 is moved by a drag operation and a placing operation by releasing the left button of the mouse, as shown in Fig. 20 . The first area Ar1 becomes the first setting item.

Furthermore, for example, as shown in FIG. 17 , in the recipe input screen Sc0 , the mouse cursor Mp1 is aligned with one of the plurality of first setting items displayed in the first area Ar1 By left-clicking the first setting item, the first setting item is moved to the second area Ar2 as shown in FIG. 18 and becomes the second setting item. Furthermore, for example, as shown in FIG. 19 , in the recipe input screen Sc0 , the mouse cursor Mp1 is aligned with one of the plurality of second setting items displayed in the second area Ar2 and left-clicking the second setting item to move the second setting item to the first area as shown in Figure 20 Ar1, and make it the first setting item.

Here, for example, the screen creation unit 10a may prohibit predetermined one or more first setting items among the plurality of first setting items in the first area Ar1 from being included in the plurality of first setting items in the second area Ar2. The method of the second setting item is changed to one or more second setting items. The rule prohibiting the change from the first setting item to the second setting item can be specified by the screen configuration data stored in the storage unit 20 , for example. Here, for example, when it is impossible to change the conditions for bubbling nitrogen gas for the treatment liquid stored in the treatment tank CB2 according to the passage of time, or when it is impossible to individually set each of the plurality of gas tubes, this is relevant. The first setting item of foaming can be set to one or more predetermined first setting items. With such a configuration, for example, it is possible to prohibit changes to a second setting item regarding a condition that depends on the passage of time for a given first setting item that cannot set a condition that depends on the passage of time. This can prevent an operator from creating a recipe that specifies a process that cannot be performed, for example.

Here, for example, the screen creation unit 10a changes one or more predetermined first setting items to the second setting on the recipe input screen Sc0 based on a signal input from the input unit 8 in response to the operator's action. When the item is being operated, as shown in Fig. 21, an element (also called a second error reporting element) Em1 for reporting an error when the movement of the item is designated is displayed on the recipe input screen.

Moreover, here, for example, as shown in FIG. 22 , two or more first setting items in the first area Ar1 may be changed into two or more second setting items in the second area Ar2 in group units. .

Here, for example, assume the following situation: in the recipe input screen Sc0, the first area Ar1 includes two of the plurality of first setting items. The first display elements Dc1 to Dc3 related to the group names of each of the plurality of first setting item groups above exist. In this case, for example, the screen creation unit 10a may also set the first setting item group for each of the plurality of first setting item groups based on a signal input from the input unit 8 in response to the operator's action. The two or more first setting items in the area Ar1 are changed to the two or more second setting items in a manner that they are included in the plurality of second setting items in the second area Ar2. For example, as shown in FIG. 22 , in the recipe input screen Sc0 , by aligning the mouse cursor Mp1 and pressing down the left button of the mouse, the first position can be displayed. One of the plurality of first display elements Dc1 to Dc3 in the area Ar1 is moved to the second area Ar2 by the drag operation and the placement operation of releasing the left button of the mouse. Thereby, two or more first setting items belonging to the second group are set to two or more second setting items. With such a structure, for example, the operator can efficiently switch between a plurality of first setting items that set conditions that do not depend on the passage of time and a plurality of second setting items that set conditions that depend on the passage of time. Setting items.

<2.Modification>

The present invention is not limited to the above-described embodiments, and various changes, improvements, etc. can be made without departing from the gist of the present invention.

In the above-mentioned first embodiment, the unit throughput of the substrate W is not limited to a predetermined number of pieces, but may also be a value corresponding to a predetermined weight and other indicators, for example. For example, if the unit throughput of the substrate W is a predetermined weight, the sensor unit 11m can also be used to measure the weight of a plurality of substrates W constituting one batch, and the calculation unit 10g can calculate the weight based on the use of the sensor. The weight measured by the 11m section of the device, and the relevant Calculate the supply amount of the treatment liquid based on the weight of the treatment liquid. In addition, as the value corresponding to other indicators, for example, the unit time (also referred to as the unit processing time) regarding the time of the chemical solution treatment performed on the substrate W can be applied. In this case, the supply amount of the processing liquid can also be calculated based on the numerical value of the supply amount of the processing liquid per unit processing time, which is the unit processing amount of the substrate W, and the total time of the chemical liquid treatment performed on the substrate W. .

In the above-described first embodiment, for example, the recipe may specify the timing of supplying the processing liquid to each processing tank CB2 through the liquid supply part SL1. If such a structure is adopted, for example, an amount of processing liquid corresponding to the processing amount of the substrate W can be supplied to each chemical liquid processing unit 52 at appropriate timings such as preprocessing, main processing, and postprocessing of the chemical liquid processing. to treatment tank CB2.

In the above-described first embodiment, for example, when the supply amount of the processing liquid from the liquid supply part SL1 to the processing tank CB2 per unit time is fixed, the processing liquid per unit processing amount of the substrate W is described in the recipe. The numerical values V1a and V1b of the supply amount and the reference value Vs1 and the adjustment value Va1 of the supply amount of the processing liquid per unit processing amount of the substrate W included in the numerical information described in one recipe can also be applied to the supply of the processing liquid. time.

In the above-described first embodiment, the substrate processing apparatus 100 has two chemical solution processing units 52 having the same configuration. However, the substrate processing apparatus 100 may also have, for example, three or more chemical solution processing units 52 having the same configuration.

In the above-described first embodiment, the recipe is produced in the substrate processing apparatus 100. However, the recipe may be transmitted from an external device communicably connected to the substrate processing apparatus 100, for example.

In the first embodiment described above, for example, regarding the recipe input screen Various structures include the conversion between the compressed state and the expanded state of two or more setting items of each group in the screen Sc0, and the change of the items between the first setting item and the second setting item in the recipe input screen Sc0, It is not limited to the batch type substrate processing apparatus 100, but can also be applied to the single-chip type substrate processing apparatus.

Of course, all or part of the above-mentioned embodiments and various modifications may be appropriately combined within the scope that does not cause contradiction.

10:Control Department

10a: Screen production department

10b: Display control part

10c:Recipe Production Department

10d: Scheduling Production Department

10e: Acquisition Department

10f: Recognition Department

10g: Calculation part

10h: Supply Control Department

10i: Mode switching unit

Claims (9)

A substrate processing apparatus, which is provided with: two or more chemical liquid processing units, each of which has the function of using the stored processing liquid to process the substrate and storing a processing liquid suitable for processing the substrate before processing the substrate. A treatment tank, and a liquid supply unit for supplying treatment liquid to the treatment tank; a storage unit that stores a recipe that specifies treatment conditions, and the above recipe records numerical information, and the above numerical information includes two or more of the above The reference value of the supply amount of the processing liquid per unit processing volume of the relevant substrate in the chemical liquid processing section, and the per unit processing amount of the relevant substrate relative to at least one of the above two or more chemical liquid processing sections. an adjustment value for the supply amount of the processing liquid; and a control unit; and the above-mentioned control unit has: an acquisition unit that acquires the processing amount information of the number of substrates to be processed, that is, the processing amount of the substrate; and a recognition unit that recognizes The above-mentioned one of the above-mentioned two or more chemical solution processing parts is used to process the substrate; the calculation part is based on the above-mentioned reference value and the reason recorded in the above-mentioned recipe stored in the above-mentioned storage part. The above-mentioned adjustment value corresponding to the above-mentioned one chemical liquid processing section recognized by the above-mentioned recognition section and the above-mentioned processing amount information obtained by the above-mentioned acquisition section are used to calculate the processing tank supplied to the above-mentioned one chemical liquid processing section. a numerical value of the supply amount of the processing liquid; and a supply control unit that supplies an amount of the processing liquid corresponding to the numerical value calculated by the above-mentioned calculation unit to the above-mentioned processing through the above-mentioned liquid supply part in one of the above-mentioned chemical solution processing parts groove. The substrate processing device of claim 1, wherein the substrate is The unit processing capacity is 1 substrate. The substrate processing device of claim 1, further comprising a sensor unit for measuring the processing amount of the substrate, and the obtaining unit acquires the processing amount information based on the measurement result of the sensor unit. The substrate processing apparatus of claim 1, further comprising an input unit for inputting a signal in response to a user's action, and the control unit further having a mode switching unit that switches from the above-mentioned mode in response to the user's action. The signal input by the input unit switches the mode between the first liquid supply mode and the second liquid supply mode. The first liquid supply mode is a mode in which the calculation unit determines the unit of the substrate based on the numerical information. The numerical value of the supply amount of the processing liquid, which is the processing amount, and the processing amount information acquired by the acquisition unit are used to calculate the numerical value of the supply amount of the processing liquid supplied to the treatment tank of the chemical liquid processing unit, and the supply control The chemical liquid processing unit supplies the processing liquid to the processing tank through the liquid supply unit based on the numerical value calculated by the calculation unit. The second liquid supply mode is the following mode: the control unit causes the processing liquid to be preliminarily supplied to the treatment tank. The treatment liquid of the set amount is supplied to the treatment tank of the chemical liquid treatment part through the liquid supply part. A substrate processing apparatus, which is provided with: a chemical liquid processing unit, which has a processing tank that processes a substrate using a stored processing liquid and stores a processing liquid suitable for processing the substrate before processing the substrate; and A liquid supply part for supplying treatment liquid to the treatment tank; a storage part that stores a recipe that stipulates treatment conditions, and the above recipe is for Numerical information on the supply amount of the processing liquid per unit processing amount of the substrate is recorded in the above-mentioned chemical liquid processing section; an input section that inputs a signal in response to the user's action; and a control section; and the above-mentioned control section has: an acquisition section , which obtains the throughput information of the number of substrates to be processed, that is, the throughput of the substrates; and the calculation unit, which obtains the throughput per unit of the substrate based on the numerical information recorded in the recipe stored in the storage unit. The numerical value of the supply amount of the processing liquid and the above-mentioned processing amount information obtained by the above-mentioned acquisition unit are used to calculate the numerical value of the supply amount of the processing liquid supplied to the treatment tank of the above-mentioned chemical liquid treatment unit; and a supply control unit, which The liquid supply part supplies an amount of the processing liquid corresponding to the numerical value calculated by the calculation part to the processing tank; the control part further has a recipe creation part that responds to the user's action. The signal input by the input unit describes the numerical value of the supply amount of the processing liquid per unit processing amount of the substrate in the chemical liquid processing unit contained in the numerical information in the recipe, thereby creating or editing the recipe. The substrate processing apparatus of claim 5, further including a display unit, the control unit further including: a screen creation unit that creates information for creating or editing a recipe input screen for the recipe; and a display control unit that The above-mentioned recipe input screen is displayed on the above-mentioned display unit; and the above-mentioned recipe input screen includes a first area and a second area, The first area includes an area for describing conditions for each of a plurality of first setting items that do not depend on the passage of time in processing executed in accordance with the above recipe, and the above second area includes an area describing conditions regarding conditions that do not depend on the passage of time in the processing according to the above recipe. In the area where conditions are described for each of the plurality of second setting items that depend on the elapse of time in the execution of the process, the recipe creation unit generates a condition based on the signal input from the input unit in response to the user's action. The conditions described for each of the above-mentioned first setting items in the above-mentioned recipe input screen and the conditions described for each of the above-mentioned second setting items on the above-mentioned recipe input screen are used to create or edit the above-mentioned recipe, and the above-mentioned screen production part uses the response The signal input from the above-mentioned input part changes one or more first setting items among the above-mentioned plurality of first setting items in the above-mentioned first area to the above-mentioned second area in the above-mentioned recipe input screen due to the action of the operator. More than one second setting item among the plurality of second setting items, and the above-mentioned second area in the above-mentioned second area is changed in the above-mentioned recipe input screen according to the signal input from the above-mentioned input part in response to the user's action. One or more second setting items among the plurality of second setting items are changed into one or more first setting items by being included in the plurality of first setting items in the above-mentioned first area. The substrate processing apparatus of claim 6, wherein the screen creation unit prohibits the predetermined one or more first setting items among the plurality of first setting items in the first area from being included in the above-mentioned first setting items. The mode of the plurality of second setting items in the second area is changed to one or more second setting items. The substrate processing apparatus of claim 6, wherein the screen creation unit has a component in the first area in the recipe input screen. When the first display element including the group name of each of the plurality of first setting items of each of the plurality of first setting items is present, respond to the user's action when there is a first display element The signal input from the above-mentioned input unit includes the above-mentioned two or more first setting items in the above-mentioned first area for each of the above-mentioned plurality of first setting item groups. The mode of the plurality of second setting items in the area is changed to two or more second setting items. The substrate processing apparatus of claim 5, further including a display unit, the control unit further including: a screen creation unit that creates information for creating or editing a recipe input screen for the recipe; and a display control unit that The above-mentioned recipe input screen is displayed on the above-mentioned display unit; and the above-mentioned recipe input screen includes a first area and a second area, and the above-mentioned first area includes conditions that do not depend on the passage of time in the processing executed according to the above recipe. An area for describing conditions for each of the plurality of first setting items, and the second area includes an area for describing conditions for each of the plurality of second setting items regarding conditions that depend on the passage of time in the processing executed according to the above recipe. area, the above-mentioned recipe creation unit responds to the signal input from the above-mentioned input unit in response to the user's action, and based on the conditions described for each of the above-mentioned first setting items in the above-mentioned recipe input screen, and the conditions described in the above-mentioned recipe input screen. The conditions described in each of the above-mentioned second setting items are used to create or edit the above-mentioned recipe, and the above-mentioned first area has a plurality of first setting items each including two or more first setting items related to the above-mentioned plurality of first setting items. The group name of each member of the group 1. The display element exists, and the above-mentioned screen creation part sets one of the above-mentioned plurality of first setting item groups in the above-mentioned recipe input screen displayed on the above-mentioned display part based on the signal input from the above-mentioned input part in response to the user's action. The display state of the two or more first setting items included in the first setting item group is switched between an expanded state where the display is displayed and a compressed state where the display is not performed.

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