JP2020088312A - Substrate processing device, and substrate processing method - Google Patents

Abstract

To easily customize processing to be applied to a substrate in a substrate processing device.SOLUTION: A substrate processing device comprises two or more liquid medicine processing units, a storage unit and a control unit. Each of the liquid medicine processing units includes a processing tab and a liquid supply section. In the processing tab, processing is applied to a substrate by a process liquid. The liquid supply section supplies the process liquid to the processing tab. The storage unit stores numerical information relating to the quantity of process liquid to be supplied per unit processing amount of the substrate for each liquid medicine processing unit. The control unit includes an acquisition section, a recognition section, calculation section and a supply control section. The calculation section calculates a numerical value relating to the quantity of the process liquid to be supplied to the processing tab of one liquid medicine processing unit on the basis of a numerical value relating to the quantity of process liquid to be supplied per unit processing amount of the substrate corresponding to one liquid medicine processing unit, which is recognized in the numerical information by the recognition section, and a processing information which is acquired by the acquisition section.SELECTED DRAWING: Figure 4

Description

The present invention is for a semiconductor wafer, a liquid crystal display substrate, a plasma display substrate, an organic EL substrate, an FED (Field Emission Display) substrate, an optical display substrate, a magnetic disk substrate, a magneto-optical disk substrate, and a photomask. The present invention relates to a technique of performing etching treatment and cleaning treatment on a substrate and a substrate such as a solar cell substrate with a treatment liquid.

For example, there is a substrate processing apparatus that processes a substrate by immersing the substrate in a processing liquid stored in a processing tank (for example, Patent Document 1). In this substrate processing apparatus, for example, various operations and processes are performed on a substrate according to a recipe that defines a process for the substrate.

Such a substrate processing apparatus has, for example, a plurality of processing tanks for performing the same processing on a substrate, and performs the same processing on the substrates in parallel in the plurality of processing tanks according to the same recipe. is there.

JP, 2009-260257, A

By the way, even if a plurality of processing tanks have the same configuration, due to, for example, the years of use, the condition of the piping, external factors such as vibration and temperature, the number of times of use and the difference in arrangement, the substrates in the plurality of processing tanks are different. There may be a difference in the result of applying the same processing to.

Further, in recent years, for example, there is a tendency that there are many small requests for processing performed on a substrate. Accompanying this, the contents of recipes have become complicated, and the work of creating and editing recipes has become increasingly difficult.

These problems are not limited to the so-called batch type substrate processing apparatus in which the substrate is processed by immersing the substrate in the processing liquid stored in the processing tank. It can occur in general substrate processing apparatuses, such as a so-called single-wafer type substrate processing apparatus that performs the used processing on a substrate.

The present invention has been made in view of the above problems, and an object of the present invention is to provide a technique capable of easily customizing a process performed on a substrate in a substrate processing apparatus.

In order to solve the above problems, the substrate processing apparatus according to the first aspect includes two or more chemical liquid processing units, a storage unit, and a control unit. Each of the two or more chemical liquid processing units has a processing tank and a liquid supply unit. The processing bath processes the substrate with the stored processing liquid. The liquid supply unit supplies a processing liquid to the processing tank. The storage unit stores numerical information regarding the supply amount of the processing liquid per unit processing amount of the substrate for each of the chemical liquid processing units. The control unit includes an acquisition unit, a recognition unit, a calculation unit, and a supply control unit. The acquisition unit acquires processing amount information regarding a processing amount of a substrate to be processed. The recognition unit recognizes one of the two or more chemical liquid processing units, which is used for processing the substrate. The calculation unit acquires a numerical value related to the supply amount of the processing liquid per unit processing amount of the substrate corresponding to the one chemical liquid processing unit recognized by the recognition unit in the numerical information, and the acquisition unit acquiring the numerical value. A numerical value relating to the supply amount of the processing liquid supplied to the processing tank of the one chemical liquid processing unit is calculated based on the processing amount information. The supply control unit causes the liquid supply unit to supply the processing liquid to the processing tank in the one chemical liquid processing unit according to the numerical value calculated by the calculation unit.

The substrate processing apparatus according to the second aspect is the substrate processing apparatus according to the first aspect, further including a sensor unit for measuring the processing amount of the substrate. The acquisition unit acquires the processing amount information based on the measurement result of the sensor unit.

A substrate processing apparatus according to a third aspect is the substrate processing apparatus according to the first or second aspect, wherein the storage unit stores a recipe that includes the numerical information and defines processing conditions.

A substrate processing apparatus according to a fourth aspect is the substrate processing apparatus according to the third aspect, wherein the numerical information is supplied to the two or more chemical liquid processing units with a processing liquid per unit processing amount of the substrate. A reference value related to the amount and an adjustment value related to the supply amount of the processing liquid per unit processing amount of the substrate with respect to at least one chemical processing unit of the two or more chemical processing units. In the numerical value information, the adjustment value corresponding to the reference value and the one chemical liquid processing unit recognized by the recognition unit, and the processing amount information acquired by the acquisition unit, among the numerical information, Based on this, the numerical value relating to the supply amount of the processing liquid supplied to the processing tank is calculated in the one chemical liquid processing unit.

A substrate processing apparatus according to a fifth aspect is the substrate processing apparatus according to the third or fourth aspect, wherein the recipe defines a timing of supplying the processing liquid to the processing bath by the liquid supply unit. is doing.

A substrate processing apparatus according to a sixth aspect is the substrate processing apparatus according to any one of the third to fifth aspects, further including an input unit that inputs a signal in response to a user operation. The control unit processes the substrate per unit processing amount for each of the two or more chemical liquid processing units included in the numerical information according to the signal input by the input unit in response to the user's operation. It further has a recipe creation unit that creates or edits the recipe by describing a numerical value related to the supply amount of the liquid in the recipe.

A substrate processing apparatus according to a seventh aspect is the substrate processing apparatus according to any one of the first to fifth aspects, further including an input unit that inputs a signal in response to a user operation. The control unit further includes a mode switching unit that switches the mode between the first liquid supply mode and the second liquid supply mode in response to a signal input by the input unit in response to a user operation. In the first liquid supply mode, the calculation unit is a numerical value relating to the supply amount of the processing liquid per unit processing amount of the substrate corresponding to the one chemical liquid processing unit recognized by the recognition unit in the numerical information. And, based on the processing amount information acquired by the acquisition unit, calculates a numerical value relating to the supply amount of the processing liquid supplied to the processing tank of the one chemical liquid processing unit, and the supply control unit, In this mode, the liquid supply unit supplies the processing liquid to the processing tank according to the numerical value calculated by the calculation unit. The second liquid supply mode is a mode in which the control unit causes the processing tank of the one chemical liquid processing unit recognized by the recognition unit to supply the amount of the processing liquid preset by the liquid supply unit. ..

A substrate processing apparatus according to an eighth aspect is the substrate processing apparatus according to the sixth aspect, further including a display unit. The control unit further includes a screen creation unit that creates information of a recipe input screen for creating or editing the recipe, and a display control unit that displays the recipe input screen on the display unit. The recipe input screen includes a first area and a second area. The first area includes an area in which a condition is described for each of the plurality of first setting items regarding the condition that does not depend on the passage of time in the process executed according to the recipe. The second area includes an area in which a condition is described for each of the plurality of second setting items regarding the condition depending on the passage of time in the process executed according to the recipe. The recipe creation unit responds to a signal input by the input unit in response to a user's operation, and sets the conditions described for each of the first setting items on the recipe input screen and the conditions on the recipe input screen. The recipe is created or edited based on the condition described for the second setting item. The screen creation unit, in response to a signal input by the input unit in response to a user's operation, in the recipe input screen, one or more first setting items of the plurality of first setting items in the first region. One setting item is changed to one or more second setting items in the plurality of second setting items in the second area, and the recipe is received according to a signal input by the input unit in response to a user operation. On the input screen, one or more second setting items of the plurality of second setting items in the second region are included in the plurality of first setting items in the first region so as to be included in the plurality of first setting items. Change to the first setting item.

A substrate processing apparatus according to a ninth aspect is the substrate processing apparatus according to the eighth aspect, wherein the screen creation unit specifies a preset value of the plurality of first setting items in the first area. It is prohibited to change one or more first setting items of the above into one or more second setting items so as to be included in the plurality of second setting items in the second area.

A substrate processing apparatus according to a tenth aspect is the substrate processing apparatus according to the eighth or ninth aspect, wherein the screen creation unit is configured to display the plurality of first setting items in the first area on the recipe input screen. When there is a first display element related to each group name of a plurality of first setting item groups each including two or more first setting items, the input unit inputs in response to a user operation. According to the signal, the two or more first setting items in the first area are set to the plurality of second setting items in the second area for each first setting item group in the plurality of first setting item groups. Change to two or more second setting items to be included in the item.

A substrate processing apparatus according to an eleventh aspect is the substrate processing apparatus according to the sixth aspect, further including a display unit. The control unit further includes a screen creation unit that creates information of a recipe input screen for creating or editing the recipe, and a display control unit that displays the recipe input screen on the display unit. The recipe input screen includes a first area and a second area. The first area includes an area in which a condition is described for each of the plurality of first setting items regarding the condition that does not depend on the passage of time in the process executed according to the recipe. The second area includes an area in which a condition is described for each of the plurality of second setting items regarding the condition depending on the passage of time in the process executed according to the recipe. The recipe creation unit responds to a signal input by the input unit in response to a user's operation, and sets the conditions described for each of the first setting items on the recipe input screen and the conditions on the recipe input screen. The recipe is created or edited based on the condition described for the second setting item. In the first area, there are first display elements related to respective group names of a plurality of first setting item groups each including two or more first setting items of the plurality of first setting items. In the recipe input screen displayed on the display unit in response to a signal input by the input unit in response to a user operation, the screen creation unit may select one of the plurality of first setting item groups. The display state of the two or more first setting items included in the first setting item group is switched between a displayed expanded state and a non-displayed compressed state.

A substrate processing method according to a twelfth aspect is provided with two or more chemical liquid processing units, each having a processing bath for processing a substrate with a stored processing liquid and a liquid supply unit for supplying the processing liquid to the processing bath. A substrate processing method in a substrate processing apparatus comprising: (a) step, (b) step, (c) step, (d) step, and (e) step. In the step (a), numerical information relating to the supply amount of the processing liquid per unit processing amount of the substrate is stored in the storage unit for each of the chemical liquid processing units. In the step (b), the processing amount of the substrate to be processed is acquired. In the step (c), one of the two or more chemical liquid processing units, which is used for processing the substrate, is recognized. In the step (d), a numerical value relating to the supply amount of the processing liquid per unit processing amount corresponding to the one chemical liquid processing unit recognized in the step (c) of the numerical information, and the (b) A numerical value relating to the supply amount of the processing liquid to be supplied to the processing tank of the one chemical liquid processing unit is calculated based on the processing amount acquired in the step. In the step (e), the processing liquid is supplied to the processing tank by the liquid supply unit in the one chemical liquid processing unit according to the numerical value calculated in the step (d).

Both the substrate processing apparatus according to the first aspect and the substrate processing method according to the twelfth aspect can supply, for example, an amount of the processing liquid corresponding to the processing amount of the substrate to the processing tank for each processing tank. .. As a result, problems such as wasted processing liquid and excessive processing due to excessive supply of the processing liquid are less likely to occur. As a result, for example, in the substrate processing apparatus, it is possible to easily customize the processing performed on the substrate for each processing bath. Therefore, for example, the substrate processing apparatus can easily customize the processing performed on the substrate.

According to the substrate processing apparatus of the second aspect, for example, based on the substrate processing amount measured by the substrate processing apparatus, an amount of processing liquid corresponding to the processing amount of the substrate is supplied to the processing tank for each processing tank. can do. Thereby, for example, in the substrate processing apparatus, it is possible to customize the processing performed on the substrate for each processing tank.

According to the substrate processing apparatus of the third aspect, the substrates can be processed in parallel using the two processing baths, for example, according to one recipe. Accordingly, for example, one recipe can supply the processing bath with an amount of the processing liquid corresponding to the processing amount of the substrate for each processing bath. Thereby, for example, the customization of the process performed on the substrate in the substrate processing apparatus can be easily executed.

According to the substrate processing apparatus of the fourth aspect, for example, by changing the adjustment value in one recipe, it is possible to supply the processing liquid in an amount corresponding to the processing amount of the substrate to each processing tank. it can. Thereby, for example, the recipe can be easily created. Therefore, for example, the substrate processing apparatus can easily customize the processing performed on the substrate.

According to the substrate processing apparatus of the fifth aspect, for example, it is possible to supply the processing liquid in an amount corresponding to the processing amount of the substrate for each processing tank to the processing tank at an appropriate timing.

According to the substrate processing apparatus of the sixth aspect, for example, the operator can customize the processing performed on the substrate for each processing tank.

According to the substrate processing apparatus of the seventh aspect, for example, in the case where there is no difference in the processing results of the substrates for each processing tank, by setting the second liquid supply mode, the unit processing amount of the substrate can be reduced. The setting of the numerical value relating to the supply amount of the processing liquid can be omitted. Thereby, for example, the work amount of the operator who sets the processing condition can be reduced.

According to the substrate processing apparatus of the eighth aspect, for example, the operator sets a plurality of setting items for setting conditions that do not depend on the passage of time, and a plurality of setting items for setting conditions that depend on the passage of time. The setting items can be arbitrarily exchanged between. Thereby, for example, the operator can create a recipe that defines a desired condition. As a result, for example, the operator can perform processing on the substrate under desired conditions. Therefore, for example, the substrate processing apparatus can easily customize the processing performed on the substrate.

According to the substrate processing apparatus of the ninth aspect, for example, for a specific setting item for which a condition dependent on the passage of time cannot be set, change to the setting item for the condition dependent on the passage of time is prohibited. can do. Thereby, for example, it is possible to avoid a problem that the operator creates a recipe that defines a process that cannot be executed.

According to the substrate processing apparatus of the tenth aspect, for example, the operator sets a plurality of setting items for setting a condition that does not depend on the passage of time, and a plurality of setting items for setting a condition that depends on the passage of time. The setting items can be efficiently exchanged between.

According to the substrate processing apparatus of the eleventh aspect, for example, a state in which the operator expands so as to display two or more first setting items for each group including two or more first setting items. It is possible to switch between a compressed state such that two or more second setting items are not displayed. Thereby, for example, even if the number of the plurality of first setting items in the first area is increased, the operator creates the recipe while confirming both the first area and the second area on the recipe input screen. It becomes possible to easily perform the work of editing. Therefore, for example, the substrate processing apparatus can easily customize the processing performed on the substrate.

It is a top view which shows the schematic structure of the substrate processing apparatus which concerns on 1st Embodiment. It is a block diagram which shows the functional structure of the substrate processing apparatus which concerns on 1st Embodiment. It is a figure which shows schematic structure of a chemical processing part. It is a block diagram showing a functional composition concerning liquid supply processing realized by a control part. It is a figure which shows the 1st example of a part of recipe input screen. It is a figure which shows the 2nd example of a part of recipe input screen. It is a figure which shows an example of the relationship between the number of substrates and the supply amount of the processing liquid to the processing tank. It is a flowchart which shows an example of the operation|movement flow regarding the supply of the process liquid to a process tank. It is a figure which shows the schematic structure of a recipe input screen. It is a figure which shows the partial reference example of the recipe input part in a recipe input screen. It is a figure which shows a partial example of the recipe input part in a recipe input screen. It is a figure which shows a partial example of the recipe input part in a recipe input screen. It is a figure which shows a partial example of the recipe input part in a recipe input screen. It is a figure which shows a partial example of the recipe input part in a recipe input screen. It is a figure which shows a partial example of the recipe input part in a recipe input screen. It is a figure which shows a partial example of the recipe input part in a recipe input screen. It is a figure which shows a partial example of the recipe input part in a recipe input screen. It is a figure which shows a partial example of the recipe input part in a recipe input screen. It is a figure which shows a partial example of the recipe input part in a recipe input screen. It is a figure which shows a partial example of the recipe input part in a recipe input screen. It is a figure which shows a partial example of the recipe input part in a recipe input screen. It is a figure which shows a partial example of the recipe input part in a recipe input screen.

2. Description of the Related Art There is known a substrate processing apparatus which immerses a substrate in a processing liquid stored in a processing tank to perform a process such as etching on the substrate. In this substrate processing apparatus, for example, an etching process may be performed in which a nitride film formed on the surface of the substrate is eluted with a processing liquid such as a phosphoric acid aqueous solution. In the processing tank for performing such etching processing, it is necessary to exchange the processing liquid stored in the processing tank to some extent every time the concentration of the component eluted from the substrate in the processing liquid increases. In particular, in recent years, for example, when a process in which the amount of an etching target that dissolves in one lot is larger than that in the past, such as the formation of a three-dimensional NAND, the treatment liquid stored in the treatment liquid is removed. The amount and frequency of replacement is increasing.

By the way, many substrate processing apparatuses have a plurality of processing tanks capable of performing the same processing using a processing liquid in parallel on a substrate. When substrates are processed in parallel in a plurality of processing baths using such a substrate processing apparatus, for example, if processing is performed according to the same recipe that defines the processing for the substrates, the number of recipes increases and The amount of work required for creation can be reduced.

However, for example, even when a plurality of processing tanks have the same configuration, if there is a difference in some condition between the plurality of processing tanks, the same processing is performed on the substrates in the plurality of processing tanks. Even if the treatment is performed, a difference may occur in the result of the treatment between a plurality of treatment tanks. Here, as the difference in conditions that can occur between the plurality of processing tanks, for example, years of use, conditions of piping, external factors such as vibration and temperature, the number of times of use, and arrangement are considered. In particular, in the case where the amount of the etching target that dissolves in the process for one lot is larger than the conventional process such as the formation of the above-described three-dimensional NAND, the result of the process between the plurality of processing tanks is increased. A large difference is likely to occur.

Such a problem is common to so-called batch type substrate processing apparatuses in general in which a substrate is processed by immersing the substrate in a processing liquid stored in a processing tank.

Therefore, the inventors of the present application have created a technique capable of easily customizing the processing performed on the substrate for each processing tank in the substrate processing apparatus.

Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the drawings, parts having similar configurations and functions are designated by the same reference numerals, and redundant description will be omitted in the following description. The drawings are schematic illustrations, and the sizes and positional relationships of various structures in the drawings are not accurate illustrations.

<1. First Embodiment>
<1-1. Substrate processing system configuration>
FIG. 1 is a plan view showing an example of a schematic configuration of a substrate processing apparatus 100 according to the first embodiment. FIG. 2 is a block diagram showing an example of a functional configuration of the substrate processing apparatus 100 according to the first embodiment. The substrate processing apparatus 100 can perform, for example, chemical treatment, cleaning treatment, and drying treatment on the substrate W.

As shown in FIG. 1, the substrate processing apparatus 100 includes, for example, an input unit 1, a first transfer unit 2, a second transfer unit 3, a drying processing unit 4, a first liquid processing unit 5, and a second liquid processing unit 6. The payout unit 7, the input unit 8, the output unit 9, the control unit 10, and the storage unit 20 are provided.

The loading unit 1 is, for example, a unit for loading a plurality of unprocessed substrates W into the substrate processing apparatus 100 from outside the substrate processing apparatus 100. The loading unit 1 has, for example, two mounting tables 11 each capable of mounting a cassette C1 in which a plurality of (for example, 25 or less) unprocessed substrates W are stored. The mounting table 11 is provided with, for example, a sensor unit 11m. The sensor unit 11m can measure the number of substrates W stored in the cassette C1, for example. The sensor unit 11m can detect the arrangement of the substrates W in the cassette C1, for example. Here, the sensor unit 11m scans downward, for example, a pair of a light projecting unit and a light receiving unit that configure a transmissive infrared sensor for the inside of the cassette C1, so that the number and position of the infrared rays are blocked. The number of substrates W stored in the cassette C1 can be measured and the arrangement of the substrates W can be detected. The information on the number of substrates W measured by the sensor unit 11m and the information on the arrangement of the substrates W in the cassette C1 detected by the sensor unit 11m are stored in the storage unit 20 together with the identification information of the cassette C1, for example. The information on the number of the substrates W measured by the sensor unit 11m is used, for example, for the processing of the substrates W to be processed in the drying processing unit 4, the first liquid processing unit 5, and the second liquid processing unit 6 in the control unit 10. It is used to acquire information related to the amount (also referred to as processing amount information). That is, the sensor unit 11m can function as a portion for measuring the processing amount of the substrate W, for example.

The payout unit 7 is, for example, a unit for paying out a plurality of processed substrates W from the inside of the substrate processing apparatus 100 to the outside of the substrate processing apparatus 100. The payout unit 7 is located, for example, so as to be adjacent to the charging unit 1. The payout unit 7 has, for example, two mounting tables 71 on which the cassettes C1 can be respectively mounted. The dispensing unit 7 dispenses a plurality of processed substrates W together with the cassette C1 to the outside of the substrate processing apparatus 100 in a state where a plurality of (eg, 25 or less) processed substrates W are stored in the cassette C1. You can

The 1st conveyance part 2 exists in the position which followed the insertion part 1 and the delivery part 7, for example. The first transfer unit 2 can take out, for example, all the substrates W stored in the cassette C1 placed in the loading unit 1 and transfer them to the second transfer unit 3. At this time, for example, all the substrates W accommodated in the two cassettes C1 are transported to the second transport unit 3, so that a substrate group of one lot including a plurality of substrates W is formed. The plurality of substrates W forming one lot of substrate groups are treated as a unit of processing in the drying processing unit 4, the first liquid processing unit 5, and the second liquid processing unit 6. The first transfer unit 2 receives the processed substrate W from the second transfer unit 3, and the processed substrate W with respect to the cassette C1 placed on the mounting table 71 of the payout unit 7. It can be conveyed and stored in the cassette C1.

The second transfer unit 3 can move along the longitudinal direction of the substrate processing apparatus 100, for example. The drying processing unit 4, the first liquid processing unit 5, and the second liquid processing unit 6 are located in order from the side closer to the first transportation unit 2 along the moving direction of the second transportation unit 3. In other words, for example, the first liquid processing unit 5 is present at a position adjacent to the drying processing unit 4, and the second liquid processing unit 6 is present at a position adjacent to the first liquid processing unit 5.

The drying processing unit 4 can store and dry a plurality of substrates W in a low-pressure chamber, for example.

The first liquid processing unit 5 includes, for example, a cleaning processing unit 51, a chemical liquid processing unit 52, and a sub transport unit 53. The cleaning processing unit 51 can perform, for example, a process of cleaning the plurality of substrates W with pure water (also referred to as pure water cleaning process). The chemical liquid processing unit 52 can perform processing (also referred to as chemical liquid processing) on a plurality of substrates W with a processing liquid containing a chemical liquid, for example. The sub-transport unit 53 can transfer the substrate W to and from the second transport unit 3, and can move up and down in each of the cleaning processing unit 51 and the chemical liquid processing unit 52.

The second liquid processing unit 6 includes, for example, a cleaning processing unit 51, a chemical liquid processing unit 52, and a sub-transporting unit 53, similarly to the first liquid processing unit 5.

The input unit 8 is located, for example, near the mounting table 11. The input unit 8 can input a signal in response to an operation of an operator as a user, for example. As a result, the operator can select or input various information. The input unit 8 is composed of, for example, a touch panel. In addition, the input unit 8 may include, for example, an operation unit including buttons that can perform various operations such as pressing, or may include a microphone that enables voice input. The operator creates and edits a recipe defining a procedure for processing the substrate W and stores it in the storage unit 20 via the input unit 8, or stores a plurality of recipes stored in the storage unit 20, for example. A recipe can be specified for a plurality of substrates W to be processed from the included recipe group.

The output unit 9 is located, for example, near the mounting table 11. The output unit 9 is a unit that can output various kinds of information under the control of the control unit 10, for example. The output unit 9 includes, for example, a display unit capable of visually outputting various information. The display unit may display, for example, a screen (also referred to as a recipe input screen) for the operator to create and edit a recipe in response to a signal input by the input unit 8 in response to the operation of the operator. it can. Further, the output unit 9 may include, for example, a speaker capable of audibly outputting various information. The various information visually or audibly output by the output unit 9 may include, for example, information indicating various states of the substrate processing apparatus 100 and information indicating various alarms. Here, for example, the display units of the input unit 8 and the output unit 9 may be realized by the same display unit having a touch panel.

The storage unit 20 has, for example, a non-volatile storage medium such as a hard disk or a flash memory that stores various information. The storage unit 20 stores various programs such as a schedule creation program and a processing program, a folder in which a recipe group including a plurality of types of recipes is stored, and various data in advance. The various data include, for example, data for configuring a recipe input screen (also referred to as screen configuration data). The screen configuration data includes, for example, information necessary to display a plurality of setting items that make up the recipe and input setting conditions such as numerical values. In the screen configuration data, the plurality of setting items are appropriately classified into categories, for example. In addition, the screen configuration data includes, for example, data that allows or prohibits the change of the category classification in the setting items.

The operation of the substrate processing apparatus 100 having the above configuration is comprehensively controlled by the control unit 10 as shown in FIG. 2, for example.

The control unit 10 has, for example, a calculation unit and a memory. An electric circuit such as a central processing unit (CPU) that functions as at least one processor is applied to the processing unit. An electric circuit such as a random access memory (RAM) that temporarily stores information is applied to the memory. Various types of information temporarily obtained by various types of computations in the computing unit are appropriately stored in the memory or the like. The arithmetic unit realizes various functional configurations for executing the overall control of the operation of the substrate processing apparatus 100 by the control unit 10 by reading and executing the program stored in the storage unit 20, for example. To do. Various functional configurations include, for example, a portion that creates a process schedule for a plurality of substrates W in the substrate processing apparatus 100 (also referred to as a schedule creation unit) and a portion that executes a process for a plurality of substrates W according to the schedule ( (Also called a processing execution unit). Further, the control unit 10 may control the operation of each unit in the first liquid processing unit 5 and the second liquid processing unit 6, for example, according to the measurement results from various sensors of the chemical liquid processing unit 52. Various sensors include, for example, a flow meter and the like.

<1-2. Chemical processing unit>
FIG. 3 is a diagram showing a schematic configuration of the chemical liquid processing unit 52. The chemical treatment unit 52 selectively dissolves the silicon nitride film by immersing the substrate W on which the silicon oxide film and the silicon nitride film are formed in a phosphoric acid aqueous solution as a processing liquid that functions as an etching liquid. A treatment (also referred to as an etching treatment) is performed.

As shown in FIG. 3, the chemical liquid processing unit 52 includes a liquid supply unit SL1, a processing tank CB2, a liquid circulation unit CL2, and a liquid discharge unit EL1. Therefore, in the first embodiment, the substrate processing apparatus 100 includes the two chemical liquid processing units 52 each having the liquid processing unit SL1 and the processing bath CB2.

The liquid supply part SL1 is a part for supplying the processing liquid to the processing bath CB2. The liquid supply unit SL1 has, for example, an adjustment tank CB1, a first liquid supply unit SL1a, a liquid circulation unit CL1 and a second liquid supply unit SL1b.

The adjustment tank CB1 is a part that temporarily stores the phosphoric acid aqueous solution for adjusting the temperature of the phosphoric acid aqueous solution to be supplied to the treatment tank CB2, for example. As the adjustment tank CB1, for example, a tank-shaped tank formed of quartz or a fluororesin material having excellent corrosion resistance against a phosphoric acid aqueous solution can be applied.

The first liquid supply unit SL1a executes, for example, a process (also referred to as a first liquid supply process) of supplying a new processing liquid sent from the processing liquid supply source En0 to the adjustment tank CB1 via the first piping unit Tb1. can do. Here, for example, a new solution of a phosphoric acid aqueous solution having a predetermined concentration, which is a chemical solution functioning as an etching solution (also referred to as a phosphoric acid aqueous solution before use), is supplied as the processing solution. The processing liquid supply source En0 is connected so as to communicate with the first end of the first piping portion Tb1. The processing liquid supply source En0 is, for example, a pump or a gas directed from the tank storing the phosphoric acid aqueous solution installed inside or outside the substrate processing apparatus 100 at room temperature (for example, 25° C.) toward the first piping portion Tb1. The phosphoric acid aqueous solution is pressure-fed. The 1st piping part Tb1 is provided with the 1st flow control part Cf1. The first flow rate control unit Cf1 has, for example, a first valve V1 that opens and closes the flow path of the first piping unit Tb1, and a first flow meter M1 that measures the flow rate of the phosphoric acid aqueous solution. The 2nd end part of the 1st piping part Tb1 is connected so that it may communicate with adjustment tank CB1, for example. Here, the first flow rate control unit Cf1 is connected to the control unit 10. The control unit 10 controls the first valve V1 based on the signal indicating the flow rate transmitted from the first flow meter M1. As a result, in the first liquid supply unit SL1a, for example, the phosphoric acid aqueous solution supplied from the processing liquid supply source En0 passes through the first piping unit Tb1 and at the flow rate set by the first flow rate control unit Cf1. Is supplied to.

The liquid circulation unit CL1 can perform, for example, a process (also referred to as a first liquid circulation process) in which the phosphoric acid aqueous solution discharged from the adjustment tank CB1 is heated and pressure-fed to the adjustment tank CB1 again. The liquid circulation unit CL1 has, for example, a second piping unit Tb2. The second piping part Tb2 has, for example, a first end connected to communicate with the adjustment tank CB1 and a second end connected to communicate with the adjustment tank CB1. The second pipe Tb2 is provided with, for example, a second valve V2, a first pump Pm1, and a first heater Ht1 in order from the upstream side. The second valve V2 opens and closes the flow path of the second piping portion Tb2. The first pump Pm1 pumps the phosphoric acid aqueous solution pumped out from the adjustment tank CB1 through the second pipe portion Tb2 toward the adjustment tank CB1. The first heater Ht1 heats the phosphoric acid aqueous solution flowing through the second pipe portion Tb2 to a predetermined temperature (for example, about 160° C.).

The second liquid supply unit SL1b can perform, for example, a process (also referred to as a second liquid supply process) of supplying a pre-use phosphoric acid aqueous solution as a processing liquid that functions as an etching liquid to the processing bath CB2. The second liquid supply unit SL1b has, for example, a third pipe part Tb3 as a liquid supply pipe part, and supplies the phosphoric acid aqueous solution sent from the adjustment tank CB1 to the treatment tank CB2 via the third pipe part Tb3. be able to. The third pipe portion Tb3 is, for example, a first end portion connected to communicate with a portion of the second pipe portion Tb2 between the first heater Ht1 and the adjustment tank CB1, and the outside of the treatment tank CB2. And a second end connected to communicate with the tank B2b. In other words, the third piping part Tb3 is a piping part branched from the second piping part Tb2. In the third pipe portion Tb3, for example, the phosphoric acid aqueous solution is pressure-fed from the first end portion to the second end portion by the first pump Pm1. A second flow rate control section Cf2 is provided in the third piping section Tb3. The second flow rate control unit Cf2 is provided with, for example, a second flow meter M2, a third valve V3, and a fourth valve V4 in order from the upstream side (adjustment tank CB1 side) with respect to the third piping unit Tb3. Have a configuration. For the second flow meter M2, for example, a flow rate detector capable of detecting the flow rate of the phosphoric acid aqueous solution flowing through the third piping portion Tb3 is applied. As the third valve V3, for example, a flow rate control valve that adjusts the flow rate of the phosphoric acid aqueous solution flowing through the third piping portion Tb3 is applied. As the fourth valve V4, for example, an opening/closing valve that controls opening/closing of the flow path of the phosphoric acid aqueous solution in the third piping portion Tb3 is applied. Here, the second flow rate control unit Cf2 is connected to the control unit 10. The control unit 10 controls the third valve V3 and the fourth valve V4, for example, based on the signal indicating the flow rate transmitted from the second flow meter M2. As a result, the second liquid supply unit SL1b, for example, supplies the phosphoric acid aqueous solution supplied from the adjustment tank CB1 to the outside of the processing tank CB2 at a flow rate controlled by the second flow rate control unit Cf2 via the third piping unit Tb3. It can be supplied to the tank B2b.

The liquid supply unit SL1 has, for example, the same configuration as the second liquid supply unit SL1b to which the processing liquid supply source En is directly connected, without having the first liquid supply unit SL1a, the adjustment tank CB1, and the liquid circulation unit CL1. May have. In this case, for example, the processing liquid supply source En is directly connected to the upstream first end portion of the third piping portion Tb3.

The processing bath CB2 is, for example, a portion for processing the substrate W with the stored processing liquid. In the first embodiment, the processing bath CB2 is, for example, a portion (also referred to as a processing unit) that performs etching processing on the substrate W with a phosphoric acid aqueous solution as a processing liquid that functions as an etching liquid. The processing bath CB2 stores, for example, a phosphoric acid aqueous solution as an etching solution and immerses the substrate W in the phosphoric acid aqueous solution, and an outer bath B2b for recovering the phosphoric acid aqueous solution overflowing from the upper part of the inner bath B2a. It has a double structure composed of The inner tank B2a is, for example, a box-shaped portion having a rectangular shape in plan view, which is formed of quartz or a fluororesin material having excellent corrosion resistance against a phosphoric acid aqueous solution. The total amount (capacity) of the liquid that can be stored in the processing tank CB2 is set to, for example, about 60 liters. The outer tank B2b is also made of, for example, the same material as the inner tank B2a, and is located so as to surround the outer peripheral upper end portion of the inner tank B2a.

Further, the treatment tank CB2 is provided with a lifter LF2 for immersing the substrate W in the phosphoric acid aqueous solution stored in the treatment tank CB2. The lifter LF2 collects, for example, a plurality of (for example, 50 or less) substrates W arranged in parallel in a standing posture (a posture in which the normal line of the main surface of the substrate is along the horizontal direction) by three holding bars. Hold. The lifter LF2 is provided so as to be able to move up and down along the vertical direction by an elevator mechanism (not shown). The lifter LF2 is provided, for example, between a processing position (a position shown in FIG. 3) in which a plurality of held substrates W are immersed in the phosphoric acid aqueous solution in the inner tank B2a and a delivery position pulled up from the phosphoric acid aqueous solution. Move up and down with. In the processing bath CB2, for example, a plurality of substrates W are positioned at processing positions in the inner bath B2a and immersed in a phosphoric acid aqueous solution, thereby performing an etching process for dissolving the silicon nitride film of the substrate W with the phosphoric acid aqueous solution. be able to. At this time, silicon as a component forming the substrate W (also referred to as a substrate component) is eluted from the substrate W into the phosphoric acid aqueous solution stored in the inner tank B2a.

The liquid circulation unit CL2 can perform, for example, a process (also referred to as a second liquid circulation process) in which the phosphoric acid aqueous solution discharged from the treatment tank CB2 is heated and is recirculated to the treatment tank CB2 under pressure. The liquid circulation unit CL2 has, for example, a fourth piping unit Tb4 that connects the outer tank B2b and the inner tank B2a so as to communicate with each other. For example, the fourth piping part Tb4 has a first end connected to communicate with the bottom of the outer tank B2b and a second end connected to communicate with the bottom of the inner tank B2a. Have. A fifth valve V5, a second pump Pm2, a sixth valve V6, a second heater Ht2, and a filter Fl1 are provided in this order from the upstream side in the fourth piping portion Tb4. The fifth valve V5 opens and closes the flow path of the fourth piping portion Tb4. The second pump Pm2 pumps the phosphoric acid aqueous solution pumped out from the outer tank B2b through the fourth pipe portion Tb4 toward the inner tank B2a. The sixth valve V6 opens and closes the flow path of the fourth piping portion Tb4. The second heater Ht2 heats the phosphoric acid aqueous solution flowing through the fourth piping portion Tb4 to a predetermined temperature (for example, about 160° C.). The filter Fl1 is a filtration filter for removing foreign matter in the phosphoric acid aqueous solution flowing through the fourth piping portion Tb4. Further, the liquid circulation unit CL2 may include, for example, a fifth piping unit Tb5 that heats the phosphoric acid aqueous solution discharged from the inner tank B2a and circulates it to the inner tank B2a. In this case, for example, the fifth piping portion Tb5 is connected to the inner tank B2a so as to communicate with the first end portion, the fifth valve V5 of the fourth piping portion Tb4, and the second pump Pm2. And a second end portion connected so as to communicate with the portion between the two. A seventh valve V7 is provided in the fifth piping portion Tb5, and the seventh valve V7 opens and closes the flow path of the fifth piping portion Tb5.

The liquid discharge part EL1 is, for example, a phosphoric acid aqueous solution (also used as a first phosphoric acid aqueous solution) as a processing liquid (also referred to as a first processing liquid) that has been used for etching the substrate W in the processing bath CB2 as a processing part. This is a part that executes a process of discharging the phosphoric acid aqueous solution) from the processing bath CB2 to the outside of the substrate processing apparatus 100 (also called a liquid discharging process). The used phosphoric acid aqueous solution has a higher concentration (also referred to as a dissolution concentration) in which the substrate component (for example, silicon) is dissolved than the phosphoric acid aqueous solution before use due to the etching treatment of the substrate W in the treatment tank CB2. The liquid discharge part EL1 has, for example, a sixth piping part Tb6, a seventh piping part Tb7, a cooling tank Ct1 and an eighth piping part Tb8. Here, the sixth pipe portion Tb6, the seventh pipe portion Tb7, and the eighth pipe portion Tb8 are portions (also referred to as liquid discharge pipe portions) for discharging the used phosphoric acid aqueous solution from the processing tank CB2 to the outside of the substrate processing apparatus 100. ) Constitutes Tg1.

The sixth piping portion Tb6 is connected to, for example, a first end portion of the fourth piping portion Tb4 that is connected to communicate with a portion between the second pump Pm2 and the sixth valve V6, and the cooling tank Ct1. A second end that is connected in communication. In other words, the sixth piping portion Tb6 and the fourth piping portion Tb4 form a portion (also referred to as a first portion) that connects the processing tank CB2 and the cooling tank Ct1. An eighth valve V8 is provided in the sixth piping portion Tb6. The eighth valve V8 opens and closes the flow path of the sixth piping portion Tb6. Therefore, by appropriately controlling the opening and closing of the sixth valve V6 and the eighth valve V8, the phosphoric acid aqueous solution discharged from the processing bath CB2 is heated and pressure-fed back to the processing bath CB2 again (second liquid circulation process). And a process of discharging the used phosphoric acid aqueous solution from the processing tank CB2 to the outside of the substrate processing apparatus 100 via the cooling tank Ct1 (liquid discharging process) can be selectively executed.

The seventh piping part Tb7 is, for example, a first end connected to communicate with the upper part of the outer tank B2b of the processing tank CB2 and a second end connected to communicate with the cooling tank Ct1. , With. Here, the seventh piping portion Tb7, for example, when the storage amount of the phosphoric acid aqueous solution stored in the outer tank B2b of the processing tank CB2 increases too much, the phosphoric acid aqueous solution does not overflow from the outer tank B2b, A phosphoric acid aqueous solution can be flowed from the outer tank B2b to the cooling tank Ct1.

The cooling tank Ct1 can store and cool the used phosphoric acid aqueous solution.

The eighth piping part Tb8 is connected to, for example, the cooling tank Ct1 and constitutes a part for discharging the used phosphoric acid aqueous solution to the outside of the substrate processing apparatus 100. The eighth piping portion Tb8 is, for example, a first end portion connected to the cooling tank Ct1 and a portion for draining the used phosphoric acid aqueous solution to the outside of the substrate processing apparatus 100 (also referred to as a processing liquid draining portion). ) A second end connected to Ex0. In the processing liquid drainage unit Ex0, for example, a tank (also referred to as a recovery tank) that is detachable from the substrate processing apparatus 100 for recovering the phosphoric acid aqueous solution or a tank for discharging the phosphoric acid aqueous solution (also referred to as a waste liquid tank). Alternatively, a drainage pipe or the like for connecting to a treatment facility for factory wastewater is applied. The eighth pipe portion Tb8 is provided with, for example, a ninth valve V9. The ninth valve V9 can open and close the flow path of the eighth piping portion Tb8. Here, the ninth valve V9 can adjust the drainage of the phosphoric acid aqueous solution from the cooling tank Ct1 to the treatment liquid drainage unit Ex0.

The operation of each unit of the chemical liquid processing unit 52 described above can be controlled by the control unit 10. For example, the control unit 10 performs a process of supplying the pre-use phosphoric acid aqueous solution as the second process liquid to the adjustment tank CB1 by the first liquid supply unit SL1a (first liquid supply process), and circulates the phosphoric acid aqueous solution by the liquid circulation unit CL1. Treatment (first liquid circulation treatment), treatment of supplying the pre-use phosphoric acid aqueous solution to the treatment tank CB2 by the second liquid supply unit SL1b (second liquid supply treatment), and treatment of circulating the phosphoric acid aqueous solution by the liquid circulation unit CL2. It is possible to control the (second liquid circulation process) and the process of discharging the used phosphoric acid aqueous solution as the first processing liquid from the processing tank CB2 by the liquid discharge part EL1 (liquid discharge process). Note that, for example, a densitometer provided along the inner wall of the inner tank B2a detects the dissolved concentration of the specific substance of the substrate W eluted in the phosphoric acid aqueous solution stored in the inner tank B2a. The control unit 10 may open and close the eighth valve V8 and the ninth valve V9 in accordance with the dissolved concentration of the used aqueous solution of phosphoric acid to appropriately send the used phosphoric acid aqueous solution to the processing liquid draining unit Ex0.

<1-3. Control of supply of processing liquid>
In the chemical liquid processing unit 52, for example, the pre-use phosphoric acid aqueous solution as the processing liquid is used as the processing liquid at the timing of at least one of the pretreatment, the main treatment, and the posttreatment for a plurality of substrates W in one lot in the treatment tank CB2. Is supplied to.

Here, in the pretreatment, for example, before the plurality of substrates W are immersed in the phosphoric acid aqueous solution stored in the treatment tank CB2, a treatment such as a bubbling treatment by supplying a pre-use phosphoric acid aqueous solution to the treatment tank CB2 and introducing bubbles is performed. A treatment is applied so that the phosphoric acid aqueous solution stored in the bath CB2 is brought into an active state suitable for the etching treatment. For this process, for example, a process of etching the plurality of substrates W in a state where the plurality of substrates W is immersed in the phosphoric acid aqueous solution stored in the treatment tank CB2 is applied. For the post-treatment, for example, after completion of the main treatment, preparation for execution of the treatment on a plurality of substrates W of one lot to be the next treatment is performed by supplying an aqueous phosphoric acid solution before use to the treatment tank CB2. Processing is applied.

At this time, the control unit 10 controls, for example, the second liquid supply process of supplying the pre-use phosphoric acid aqueous solution as a processing liquid to the processing bath CB2 by the second liquid supply unit SL1b, so that the processing liquid is supplied by the liquid supply unit SL1. The process of supplying the before-use phosphoric acid aqueous solution to the processing tank CB2 (also referred to as a liquid supply process) is controlled. The liquid supply process can be controlled by the control unit 10 according to a recipe designated for a plurality of substrates W of one lot to be processed, for example.

FIG. 4 is a block diagram showing an example of a functional configuration related to the liquid supply process realized by the controller 10. In the control unit 10, various functional configurations are realized while using a memory as a workspace in the arithmetic unit. As shown in FIG. 4, the control unit 10 has, for example, a screen creation unit 10a, a display control unit 10b, a recipe creation unit 10c, a schedule creation unit 10d, an acquisition unit 10e, and a recognition unit as the realized functional configurations. 10f, the calculation part 10g, the supply control part 10h, and the mode switching part 10i. Here, for example, at least a part of the functions realized by the control unit 10 may be realized by a dedicated electronic circuit.

The screen creation unit 10a can create, for example, information of a screen (recipe input screen) for an operator to create or edit a recipe that defines a procedure for processing the substrate W. For example, the screen creation unit 10a creates the information of the recipe input screen based on the screen configuration data stored in the storage unit 20.

The display control unit 10b can display the recipe input screen on the display unit included in the output unit 9 based on the information of the recipe input screen created by the screen creation unit 10a, for example.

The recipe creating unit 10c can create or edit the recipe in response to a signal input by the input unit 8 in response to an operation of the operator, for example. Here, for example, the recipe can be created and edited in the recipe creating unit 10c by the operator inputting various information on the recipe input screen displayed on the display unit.

FIGS. 5A and 5B are diagrams showing a first example of part R1a, R1b of the recipe input screen that defines the processing in the chemical liquid processing unit 52. FIG. 6 is a diagram showing a second example of a part R2 of the recipe input screen that defines the processing in the chemical liquid processing unit 52.

For example, as shown in FIG. 5A, regarding the chemical liquid processing unit 52 of the first liquid processing unit 5, the numerical value V1a relating to the supply amount of the processing liquid per unit processing amount of the substrate W is described on the recipe input screen. The recipe can be stored in the storage unit 20. Further, for example, as shown in FIG. 5B, for the chemical liquid processing unit 52 of the second liquid processing unit 6, a numerical value V1b relating to the supply amount of the processing liquid per unit processing amount of the substrate W is displayed on the recipe input screen. The recipe can be described and stored in the storage unit 20. Here, for example, the volume of the processing liquid is applied to the numerical values V1a and V1b related to the supply amount of the processing liquid per unit processing amount of the substrate W.

In this way, the recipe creating unit 10c responds to the signal input by the input unit 8 in response to the operation of the operator, and thus, the recipe of the processing liquid per unit processing amount of the substrate W for each of the two chemical liquid processing units 52. By describing the numerical values V1a and V1b related to the supply amount in the recipe, the recipe can be created or edited. Thereby, for example, the operator can customize the processing performed on the substrate W for each of the processing baths CB2 in the two chemical liquid processing units 52. Here, the unit processing amount of the substrate W includes, for example, the unit processing number constituted by a predetermined number. The predetermined number may be, for example, one or any number of two or more. For the numerical values V1a and V1b, for example, a value indicating the volume of the processing liquid is applied. In the example of FIG. 5A, the supply amount of the processing liquid of 600 ml is described for one substrate W. In the example of FIG. 5B, the supply amount of the processing liquid of 800 ml is described for one substrate W. Here, the numerical values V1a and V1b can be appropriately input by the operator, for example, according to the result of the processing on the substrate W in the processing bath CB2 of each chemical liquid processing section 52. Thereby, for example, the operator can describe the numerical value related to the supply amount of the processing liquid per unit processing amount of the substrate W in the recipe for each chemical liquid processing unit 52. Numerical information including the numerical values V1a and V1b related to the supply amount of the processing liquid per unit processing amount of the substrate W for each of the two chemical liquid processing units 52 is stored in the storage unit 20.

In the example of FIGS. 5A and 5B, the numerical values V1a and V1b for the two processing baths CB2 are described in different recipes, but the present invention is not limited to this. For example, one recipe may describe numerical information including the numerical values V1a and V1b for each chemical liquid processing unit 52. In this case, for example, it is possible to supply the treatment liquid in an amount corresponding to the treatment amount of the substrate W to the treatment bath CB2 for each chemical treatment unit 52 in one recipe. Thereby, for example, according to one recipe, the substrates W can be processed in parallel using the two processing baths CB2.

Further, as shown in FIG. 6, the numerical value information described in one recipe includes the reference value Vs1 for the two chemical liquid processing units 52 and the two values regarding the supply amount of the processing liquid per unit processing amount of the substrate W. The adjustment value Va1 for at least one of the chemical liquid processing units 52 may be included. In the example of the recipe shown in FIG. 6, the chemical liquid processing unit 52 of the first liquid processing unit 5 is shown by a symbol T2, and the chemical liquid processing unit 52 of the second liquid processing unit 6 is shown by a symbol T4. Here, as the reference value Vs1, for example, a standard value that defines the supply amount of the processing liquid per unit processing amount of the substrate W to one chemical liquid processing unit 52 is applied. As the adjustment value Va1, for example, a value that defines the amount by which the supply amount of the processing liquid per unit processing amount of the substrate W should be increased or decreased for each chemical liquid processing unit 52 is applied with the reference value Vs1 as a reference. For example, the volume of the processing liquid is applied as the reference value Vs1 and the adjustment value Va1. In the example of FIG. 6, 600 ml as the reference value Vs1, 0 ml as the first adjustment value Va11, and 200 ml as the second adjustment value Va12 are described in one recipe. Here, the first adjustment value Va11 is the adjustment value for the chemical liquid processing unit 52 of the first liquid processing unit 5, and the second adjustment value Va12 is the adjustment value for the chemical liquid processing unit 52 of the second liquid processing unit 6. Is.

The schedule creation unit 10d can create a time schedule, for example, according to a recipe specified for a plurality of substrates W to be processed. This time schedule is, for example, the transfer of the plurality of substrates W by the first transfer unit 2, the transfer of the plurality of substrates W of one lot by the second transfer unit 3, the drying processing unit 4, the first liquid processing unit 5, and the first liquid processing unit 5. The timing at which the two-liquid processing unit 6 performs the processing and the like on the plurality of substrates W is defined. The time schedule created by the schedule creating unit 10d is stored in, for example, the memory or the storage unit 20. Then, the substrate processing apparatus 100 can perform various operations according to the time schedule created by the schedule creating unit 10d, for example.

The acquisition unit 10e can acquire the processing amount information of one lot of the substrates W to be processed, based on the measurement result of the sensor unit 11m, for example. Here, for example, when all the substrates W accommodated in the two cassettes C1 are transported to the second transport unit 3 to form a substrate group of one lot including a plurality of substrates W. Assume In this case, for example, the number of all the substrates W stored in each of the two cassettes C1 is acquired as the processing amount information of one lot of the substrates W based on the result measured by the sensor unit 11m. obtain. As a result, for example, based on the processing amount of the substrate W measured by the substrate processing apparatus 100, an amount of the processing liquid corresponding to the processing amount of the substrate W can be supplied to the processing bath CB2 for each chemical liquid processing unit 52. .. As a result, for example, in the substrate processing apparatus 100, it is possible to customize the processing performed on the substrate W for each processing bath CB2.

The recognition unit 10f can recognize one of the two chemical liquid processing units 52, which is used for processing the substrate W, for example. For example, based on the time schedule, of the two chemical liquid processing units 52, the chemical liquid processing unit 52 into which a plurality of substrates W of one lot are loaded can be determined.

The calculating unit 10g, for example, corresponds to one substrate W corresponding to one chemical liquid processing unit 52 recognized by the recognizing unit 10f in the numerical information of the recipe designated for the plurality of substrates W of one lot to be processed. Based on the numerical value relating to the supply amount of the processing liquid per unit processing amount and the processing amount information acquired by the acquisition unit 10e, the supply amount of the processing liquid supplied to the processing tank CB2 of one chemical liquid processing unit 52. The numerical value relating to can be calculated.

Here, it is assumed that the numerical values V1a and V1b for the two processing baths CB2 are described in different recipes as shown in FIGS. 5A and 5B. In this case, for example, when the recognition unit 10f recognizes the chemical liquid processing unit 52 of the first liquid processing unit 5, the unit processing amount of the substrate W is set to 600 ml as the supply amount of the processing liquid per sheet. A value obtained by multiplying the number of substrates W (50 or less) as the processing amount information acquired by the unit 10e is calculated as a numerical value related to the supply amount of the processing liquid supplied to the processing bath CB2 of one chemical liquid processing unit 52. To be done. In the example of FIG. 5A, 600 ml is multiplied by 50, which is the number of substrates W, and 30000 ml, which is a numerical value relating to the supply amount of the treatment liquid to be supplied to the treatment bath CB2 of one chemical treatment portion 52, is calculated. The state is shown. In addition, for example, when the recognition unit 10f recognizes the chemical liquid processing unit 52 of the second liquid processing unit 6, the unit processing amount of the substrate W is set to 800 ml as the supply amount of the processing liquid per sheet, and the acquisition unit 10e. A value multiplied by the number of substrates W (50 or less) as the acquired processing amount information is calculated as a numerical value related to the supply amount of the processing liquid supplied to the processing bath CB2 of one chemical liquid processing unit 52. In the example of FIG. 5B, 50 ml, which is the number of substrates W, is multiplied by 800 ml, and 40000 ml, which is a numerical value related to the supply amount of the treatment liquid supplied to the treatment bath CB2 of one chemical treatment portion 52, is calculated. The state is shown.

The supply control unit 10h causes the liquid supply unit SL1 to supply the processing liquid to the processing tank CB2 in the single chemical liquid processing unit 52 recognized by the recognition unit 10f, for example, according to the numerical value calculated by the calculation unit 10g. You can Therefore, for example, an amount of the processing liquid corresponding to the processing amount of the substrate W can be supplied to the processing bath CB2 for each chemical liquid processing unit 52. As a result, problems such as wasted processing liquid and excessive processing due to excessive supply of the processing liquid are less likely to occur. As a result, for example, in the substrate processing apparatus 100, customization of the processing performed on the substrate W for each processing bath CB2 can be easily executed. Therefore, for example, customization of the process performed on the substrate W in the substrate processing apparatus 100 can be easily performed.

By the way, the calculation unit 10g, for example, in the numerical information described in one recipe, the reference value Vs1 and the adjustment value Va1 corresponding to one chemical liquid processing unit 52 recognized by the recognition unit 10f, and the acquisition unit 10e. It may be possible to calculate a numerical value related to the supply amount of the processing liquid to be supplied to the processing bath CB2 of one chemical liquid processing unit 52, based on the acquired processing amount information. In this case, for example, by changing the adjustment value in one recipe, it is possible to supply the processing liquid in an amount corresponding to the processing amount of the substrate W to the processing bath CB2 for each chemical liquid processing unit 52. Thereby, for example, the recipe can be easily created.

Here, as shown in FIG. 6, it is assumed that the reference value Vs1 and the adjustment value Va1 are described in one recipe. In this case, for example, when the recognition unit 10f recognizes the chemical liquid processing unit 52 of the first liquid processing unit 5, the unit processing amount of the substrate W is set as the reference value Vs1 of the supply amount of the processing liquid per sheet. The value obtained by multiplying 600 ml by the number of substrates W (50 or less) as the processing amount information acquired by the acquisition unit 10e, and the unit processing amount of the substrate W, that is, The sum of a value obtained by multiplying 0 ml as the adjustment value Va11 of 1 by the number (50 or less) of the substrates W as the processing amount information acquired by the acquisition unit 10e is processed by one chemical liquid processing unit 52. It is calculated as a numerical value related to the supply amount of the processing liquid supplied to the bath CB2. In the example of FIG. 6, a value obtained by multiplying the reference value Vs1 of 600 ml by 50, which is the number of substrates W, and a value 0 ml that is the first adjustment value Va11 by 50, which is the number of substrates W, are multiplied. The state in which the sum of the value and 30,000 ml is calculated is shown. Further, for example, when the recognition unit 10f recognizes the chemical liquid processing unit 52 of the second liquid processing unit 6, the unit processing amount of the substrate W is set to 600 ml as the reference value Vs1 of the supply amount of the processing liquid per sheet, Second adjustment of the value multiplied by the number of substrates W (50 or less) as the processing amount information acquired by the acquisition unit 10e and the supply amount of the processing liquid per substrate, which is the unit processing amount of the substrates W The sum of the value Va12 of 200 ml and the value obtained by multiplying the number of substrates W (50 or less) as the processing amount information acquired by the acquisition unit 10e in the processing bath CB2 of one chemical solution processing unit 52. It is calculated as a numerical value related to the supply amount of the processing liquid to be supplied.

FIG. 7 is a diagram showing an example of the relationship between the number of substrates W and the supply amount of the processing liquid to the processing bath CB2. FIG. 7 shows the relationship between the number of substrates W and the supply amount of the processing liquid to the processing bath CB2 along the example of the recipe of FIG. More specifically, in FIG. 7, the relationship between the number of substrates W and the supply amount of the processing liquid in the processing bath CB2 in the chemical liquid processing unit 52 of the first liquid processing unit 5 is shown by a solid line L1. The relationship between the number of substrates W and the supply amount of the processing liquid in the processing bath CB2 in the chemical liquid processing unit 52 of the two-liquid processing unit 6 is shown by a one-dot chain line L2. Here, for example, in the chemical liquid processing unit 52 of the first liquid processing unit 5, since the first adjustment value Va11 is 0 ml, the supply amount of the processing liquid is not adjusted. Accordingly, the supply amount of the processing liquid supplied to the processing bath CB2 of the chemical liquid processing unit 52 of the first liquid processing unit 5 is 600 ml as the reference value Vs1 as the processing amount information as shown by the solid line L1. It is an amount obtained by multiplying the number of substrates W of. Further, for example, in the chemical liquid processing unit 52 of the second liquid processing unit 6, since the second adjustment value Va12 is 200 ml, the processing liquid for increasing the amount of the processing liquid by 200 ml per one substrate W as the unit processing amount. The supply amount of is adjusted. Accordingly, the supply amount of the processing liquid supplied to the processing bath CB2 of the chemical liquid processing unit 52 of the second liquid processing unit 6 is indicated by the solid line L1 along the reference value Vs1 as indicated by the alternate long and short dash line L2. The adjusted amount is obtained by adding a value obtained by multiplying 200 ml as the second adjustment value Va12 by the number of the substrates W as the processing amount information to the supplied supply amount of the processing liquid.

The mode switching unit 10i can switch the mode between the first liquid supply mode and the second liquid supply mode, for example, according to the signal input by the input unit 8 in response to the operation of the operator. Here, the first liquid supply mode is a mode in which an amount of the processing liquid corresponding to the processing amount of each chemical liquid processing unit 52 is supplied to the processing bath CB2 as described above. Specifically, in the first liquid supply mode, for example, the calculation unit 10g is a unit of the substrate W corresponding to one chemical liquid processing unit 52 recognized by the recognition unit 10f of the numerical information described in the recipe. Based on the numerical value related to the supply amount of the processing liquid per processing amount and the processing amount information acquired by the acquisition unit 10e, the processing liquid is supplied to the processing tank CB2 of one chemical liquid processing unit 52 recognized by the recognition unit 10f. The supply control unit 10h calculates the numerical value related to the supply amount of the processing liquid, and the liquid supply unit SL1 in the single chemical liquid processing unit 52 recognized by the recognition unit 10f according to the numerical value calculated by the calculation unit 10g. A mode in which the processing liquid is supplied to the processing tank CB2 is applied. The second liquid supply mode is a mode in which a predetermined amount of processing liquid is supplied to the processing bath CB2 regardless of the two chemical liquid processing units 52. Specifically, in the second liquid supply mode, for example, the control unit 10 causes the processing tank CB2 of one chemical liquid processing unit 52 recognized by the recognition unit 10f to have a predetermined amount preset by the liquid supply unit SL1. The mode in which the processing liquid is supplied is applied.

If such mode switching is possible, for example, in the case where there is no difference in the processing results for the substrate W for each processing bath CB2, by setting the second liquid supply mode, each chemical liquid processing unit 52 can be set. It is possible to omit setting the numerical value relating to the supply amount of the processing liquid per unit processing amount of the substrate W. As a result, it is possible to reduce the work amount of the operator who sets the processing conditions by, for example, creating and editing the recipe.

<1-4. Operation related to supply of treatment liquid to treatment tank>
FIG. 8 is a flowchart showing an example of an operation flow relating to the supply of the processing liquid to the processing tank CB2. The operation related to the supply of the processing liquid to the processing tank CB2 includes, for example, the operation related to the creation and editing of the recipe. The operation flow is realized, for example, by the control unit 10 controlling the operation of each unit of the substrate processing apparatus 100. Here, for example, the operations relating to the supply of the processing liquid to the processing bath CB2 are executed by performing the processing of steps S1 to S10 of FIG.

In step S1, the control unit 10 determines whether to start creating and editing the recipe. Here, for example, if a signal for displaying the recipe input screen is not input by the input unit 8 in response to the operation of the operator, the process proceeds to step S5, and the recipe input screen is input by the input unit 8 in response to the operation of the operator. If a signal for displaying is input, the process proceeds to step S2.

In step S2, the display control unit 10b causes the display unit included in the output unit 9 to display the recipe input screen based on the information of the recipe input screen created by the screen creating unit 10a.

In step S3, the recipe creation unit 10c accepts input of information such as description of information on the recipe input screen in response to a signal input by the input unit 8 in response to the operation of the operator. At this time, for example, for each of the two chemical liquid processing units 52 in the first liquid processing unit 5 and the second liquid processing unit 6, numerical information regarding the supply amount of the processing liquid per unit processing amount of the substrate W can be input. ..

In step S4, the control unit 10 determines whether or not to complete the creation and editing of the recipe. Here, for example, if a signal for ending the creation and editing of the recipe is not input by the input unit 8 in response to the operation of the operator, the process returns to step S3, and the recipe is input by the input unit 8 in response to the operation of the operator. If a signal for ending the creation and editing of is input, the process proceeds to step S5.

In step S5, the control unit 10 stores the recipe created and edited on the recipe input screen in the storage unit 20. Thereby, for example, with respect to each of the two chemical liquid processing units 52 in the first liquid processing unit 5 and the second liquid processing unit 6, numerical information relating to the supply amount of the processing liquid per unit processing amount of the substrate W is stored in the storage unit 20. Memorized in.

In step S6, the control unit 10 determines whether or not it is time to start the chemical liquid processing in the chemical liquid processing unit 52. Here, the control unit 10, for example, based on the time schedule created according to the recipe specified for the plurality of substrates W to be processed by the schedule creation unit 10d and stored in the storage unit 20 or the like, It is possible to determine whether or not it is the timing to start the chemical treatment. If it is not the time to start the chemical liquid processing in the chemical liquid processing unit 52, the process returns to step S1. On the other hand, if it is the timing to start the chemical liquid processing in the chemical liquid processing unit 52, the process proceeds to step S7. At this time, the recipe designated for the plurality of substrates W of one lot to be processed can be recognized.

In step S7, the acquisition unit 10e acquires the number of substrates W in one lot as the processing amount of the substrates W to be processed in the chemical liquid processing unit 52.

In step S8, the recognition unit 10f recognizes one of the two chemical liquid processing units 52 in the first liquid processing unit 5 and the second liquid processing unit 6 that is used to process the substrate W. To do. Here, the recognition unit 10f can recognize one processing tank CB2 to be used based on, for example, a time schedule.

In step S9, the calculation unit 10g causes the single chemical solution processing unit 52 recognized in step S8 among the numerical value information described in the recipe specified for the plurality of substrates W of one lot to be processed. The processing bath CB2 of one chemical solution processing unit 52 is based on the corresponding numerical value relating to the supply amount of the processing liquid per unit processing amount and the number of substrates W of one lot as the processing amount acquired in step S7. A numerical value relating to the supply amount of the processing liquid to be supplied to is calculated.

In step S10, the supply control unit 10h causes the liquid supply unit SL1 in the single chemical liquid processing unit 52 recognized in step S8 to supply the processing liquid to the processing bath CB2 in accordance with the numerical value calculated in step S9.

By such an operation, for example, the processing liquid of an amount corresponding to the processing amount of the substrate W can be supplied to the processing bath CB2 for each chemical liquid processing unit 52CB2. As a result, problems such as wasted processing liquid and excessive processing due to excessive supply of the processing liquid are less likely to occur. As a result, for example, in the substrate processing apparatus 100, customization of the processing performed on the substrate W for each processing bath CB2 can be easily executed. Therefore, for example, customization of the process performed on the substrate W in the substrate processing apparatus 100 can be easily performed.

<1-5. Display mode of recipe input screen>
FIG. 9 is a diagram showing a schematic configuration of the recipe input screen Sc0. FIG. 10 is a diagram showing a partial reference example of the recipe input unit Pr1 on the recipe input screen Sc0. 11 to 22 are diagrams each showing a partial example of the recipe input section Pr1 on the recipe input screen Sc0.

As shown in FIG. 9, the recipe input screen Sc0 has, for example, an area (also referred to as a recipe display area) Ar0 in which information about a recipe is displayed and an area in which buttons for inputting various commands are arranged ( Ab0 (also referred to as a button area). In the recipe display area Ar0, for example, a portion (also referred to as an identification information section) Pr0 on which various identification information about the recipe is displayed, setting items of the recipe and setting conditions (numerical values, etc.) for each setting item are displayed and input. Part (also referred to as a recipe input part) Pr1.

Here, as shown in FIG. 10, the recipe input unit Pr1 includes, for example, a first area Ar1 located in the upper part and a second area Ar2 located in the lower part. The first region Ar1 is, for example, a region in which a condition is described for each of a plurality of setting items (also referred to as a first setting item and a header item) regarding a condition that does not depend on the passage of time in the process executed according to the recipe ( It is also called the header area). The second area Ar2 is, for example, an area in which a condition is described for each of a plurality of setting items (also referred to as second setting items and step items) regarding a condition that depends on the passage of time in the process executed according to the recipe ( It is also called a step area). The plurality of first setting items may include, for example, the ascending/descending speed of the lifter LF2, the etching amount of the substrate W, the condition of the treatment with the treatment liquid in the treatment tank CB2, and the presence or absence of bubbling. The plurality of second setting items may include, for example, items such as the supply amount of the chemical liquid to the processing tank CB2 that changes with the passage of time.

Then, for example, the operator can proceed the work of creating and editing the recipe while checking both the first area Ar1 and the second area Ar2 on the recipe input screen Sc0. Then, the recipe creation unit 10c, for example, according to the signal input by the input unit 8 in response to the operation of the operator, the conditions described for each first setting item on the recipe input screen Sc0, and the recipe input screen. A recipe can be created or edited based on the conditions described for each second setting item in Sc0.

<1-5-1. Expansion and compression of items on the recipe input screen>
By the way, in recent years, for example, there is a tendency that many fine requirements are demanded for the treatment performed on the substrate W. This tends to increase the number of first setting items in the first area Ar1. For example, when bubbling using nitrogen gas is performed on the treatment liquid stored in the treatment tank CB2, individual settings such as the increase in the number of gas pipes for bubbling and the presence or absence of gas ejection for each gas pipe are performed. There is a case to be seen. In this case, the number of first setting items relating to bubbling in the first area Ar1 may increase. In particular, in recent years, for example, in the recipe for forming a three-dimensional NAND or the like, the number of items for which processing conditions are to be set finely increases, and the number of the first setting items in the first region Ar1 tends to obviously increase. ..

However, for example, as the number of first setting items in the first area Ar1 increases, the proportion of the first area Ar1 in the recipe input screen Sc0 may increase. At this time, in order to simultaneously display the first area Ar1 and the second area Ar2 on the recipe input screen Sc0, it is conceivable that the recipe input screen Sc0 may be made smaller, for example. Visibility is poor. As a result, for example, the work of creating and changing recipes has become increasingly difficult.

Therefore, in the first embodiment, for example, as shown in FIGS. 11 to 13, in the first area Ar1, a plurality of first setting items are divided into a plurality of groups, and a plurality of first setting items is set for each group. The display and non-display of can be switched. Such a display mode in the first area Ar1 can be realized by, for example, screen configuration data stored in the storage unit 20.

Here, for example, as shown in FIG. 11, in the first region Ar1, a plurality of item groups each including two or more first setting items of the plurality of first setting items (also referred to as a first setting item group). Display elements (also referred to as first display elements) Dc1 to Dc3 associated with the respective group names of (referred to) are provided. Such first display elements Dc1 to Dc3 can be defined by the screen configuration data stored in the storage unit 20. In the example of FIG. 11, in the first region Ar1, a plurality of first setting items are a group (also referred to as a first group) for the first setting items related to the lifting speed of the lifter LF2, and the processing liquid in the processing tank CB2. Are grouped into a group (also referred to as a second group) for the first setting item and a group (also referred to as a third group) for the other first setting item related to the processing condition by. In the first area Ar1, for example, a first display element Dc1 related to the group name of the first group, a first display element Dc2 related to the group name of the second group, and a first display related to the group name of the third group. The element Dc3 is displayed.

Then, for example, in the recipe input screen Sc0 displayed on the display unit included in the output unit 9 in response to the signal input by the input unit 8 in response to the operation of the operator by the screen creation unit 10a, a plurality of first settings are made. A state in which two or more first setting items included in one first setting item group of the item group are displayed and a state where they are not displayed (also referred to as an expanded state) ( (Compressed state). If such a configuration is adopted, for example, the operator expands so as to display two or more first setting items for each group including two or more first setting items, and It is possible to switch between a compressed state in which one or more first setting items are not displayed. Thereby, for example, even if the number of the plurality of first setting items in the first area Ar1 increases, the operator confirms both the first area Ar1 and the second area Ar2 on the recipe input screen Sc0, It is possible to easily perform the work of creating and editing the recipe. Therefore, for example, customization of the process performed on the substrate W in the substrate processing apparatus 100 can be easily performed.

Here, for example, various operations are performed on each of the first display elements Dc1 to Dc3 in response to a signal input by the input unit 8 in response to the operation of the operator, so that each of the first to third groups 2 A configuration in which the display state of one or more first setting items can be switched between the expanded state and the compressed state can be adopted. Specifically, for example, as shown in FIG. 11, when the display state of two or more first setting items of the first group is in the compressed state, the first display element Dc1 is clicked with the mouse pointer Mp1. Then, as shown in FIG. 12, a mode in which the display state of two or more first setting items of the first group changes from the compressed state to the expanded state is conceivable. On the other hand, for example, when the first display element Dc1 is clicked with the mouse pointer Mp1 when the display state of two or more first setting items of the first group is in the expanded state as shown in FIG. As indicated by 11, a mode in which the display state of two or more first setting items of the first group changes from the expanded state to the compressed state is conceivable. Further, as shown in FIG. 11, when the first display element Dc2 is clicked with the mouse pointer Mp1 when the display state of the two or more first setting items of the second group is the compressed state, FIG. As shown in, the display state of the two or more first setting items of the second group may change from the compressed state to the expanded state. On the other hand, for example, as shown in FIG. 13, when the first display element Dc2 is clicked with the mouse pointer Mp1 when the display state of two or more first setting items of the second group is in the expanded state, As shown in FIG. 11, a mode in which the display state of two or more first setting items of the second group changes from the expanded state to the compressed state is conceivable. Further, for example, as shown in FIG. 11, when the first display element Dc3 is clicked with the mouse pointer Mp1 when the display state of the two or more first setting items of the third group is the compressed state, Although illustration is omitted, a mode in which the display state of two or more first setting items of the third group changes from the compressed state to the expanded state is conceivable. On the other hand, when the first display element Dc3 is clicked with the mouse pointer Mp1 when the display state of the two or more first setting items of the third group is the expanded state, the third group is displayed as shown in FIG. It is conceivable that the display state of the two or more first setting items is changed from the expanded state to the compressed state.

Here, for example, as shown in FIGS. 11 to 13, if each of the plurality of first display elements Dc1 to Dc3 is shown in a visually distinguishable manner from the plurality of first setting items. The workability of the operator can be improved. Specifically, a mode in which each of the plurality of first display elements Dc1 to Dc3 is displayed using a color different from that of the display elements of the plurality of first setting items is conceivable. Further, for example, as shown in FIGS. 11 to 13, each of the plurality of first display elements Dc1 to Dc3 is provided with a first mark Mk1 indicating a compressed state or a second mark Mk2 indicating a developed state. Good. Here, for example, as shown in FIG. 13, the plurality of first setting items in which 0 is described as the setting condition is in a state where the plurality of first setting items are not used in the chemical liquid treatment. Therefore, for example, the first setting item in which 0 is described as the setting condition and the first setting item in which other than 0 is described as the setting condition are shown in a visually distinguishable manner such as color coding. Good.

Further, here, for example, in accordance with a signal input by the input unit 8 in response to an operator's operation, the screen creation unit 10a adds some information to each of the first display elements Dc1 to Dc3. It may be adopted. For example, as shown in FIG. 14, the number of the first setting items included in the group may be attached to each of the first display elements Dc1 to Dc3, or the reason for grouping may be attached. You may.

By the way, in the recipe input screen Sc0, for example, a button for saving a recipe, which is included in the button area Ab0, is pressed by the mouse pointer Mp1 to describe in the recipe display area Ar0 by the recipe creating unit 10c. The folder related to the recipe is stored in the storage unit 20. Here, for example, when saving a folder related to a recipe in the storage unit 20, the recipe creation unit 10c checks whether or not there is a setting item (also referred to as an error item) in which an incorrect setting condition is described. The screen creation unit 10a may display an element (also referred to as a first error notification element) for notifying that a setting error has occurred on the recipe input screen. Here, as the description of the erroneous setting condition, for example, description of a value exceeding the upper limit value according to the type of the processing liquid for the setting item of the speed of the lifter LF2, simultaneous injection of acid and alkali, etc. can be considered. .. As the display of the first error notification element, for example, as shown in FIGS. 15 and 16, a pop-up Em0 for notifying an error, a display in a visually recognizable manner such as color coding of error items, and an error are displayed. Examples include display in a visually recognizable manner such as color coding of the first display element Dc1 of the group to which the item belongs.

<1-5-2. Moving items on the recipe input screen>
By the way, for example, different users have different demands for higher precision in processing performed on the substrate W. For example, at the stage of developing a product using the substrate W, there is a strong need to perform a test by finely changing the processing performed on the substrate W. In such a case, for example, regarding the condition that does not depend on the passage of time in the process executed according to the recipe, the first setting item (header item) is set to the condition that depends on the passage of time in the process executed according to the recipe. There may be a desire to change to the second setting item (step item). On the other hand, for example, even at the stage of developing a product using the substrate W, there may be a demand for changing the second setting item (step item) to the first setting item (header item). Further, for example, at the stage of mass-producing products that want to use the substrate W, the number of setting items that have the same setting condition increases every day, and there is a desire to change the second item (step item) to the first item (header item). obtain.

However, if the recipe input screen Sc0 of the substrate processing apparatus 100 is customized and shipped for each user in order to meet all of these contradictory requirements, the manufacturing and shipping steps of the substrate processing apparatus 100 will be significantly complicated. Further, even if the recipe input screen Sc0 of the substrate processing apparatus 100 is customized and shipped for each user, it is not possible to cope with a change in demand according to the usage status of the substrate processing apparatus 100.

Therefore, in the first embodiment, for example, as shown in FIGS. 17 to 22, in the recipe input screen Sc0, the setting is performed between the first area (header area) Ar1 and the second area (step area) Ar2. Items can be moved.

Here, for example, the screen creation unit 10a responds to a signal input by the input unit 8 in response to the operation of the operator, and then selects one of the plurality of first setting items in the first area Ar1 on the recipe input screen Sc0. One or more first setting items can be changed to one or more second setting items in the plurality of second setting items in the second area Ar2. In addition, for example, the screen creation unit 10a is responsive to a signal input by the input unit 8 in response to an operation of the operator, and then, on the recipe input screen Sc0, one of the plurality of second setting items in the second area Ar2. The above second setting items can be changed to one or more first setting items so as to be included in the plurality of first setting items in the first area Ar1. If such a configuration is adopted, for example, the operator can arbitrarily exchange the setting items between the plurality of first setting items and the plurality of second setting items. Thereby, for example, the operator can create a recipe that defines a desired condition. As a result, for example, the operator can cause the substrate processing apparatus 100 to perform processing on the substrate W under desired conditions. Therefore, for example, customization of the process performed on the substrate W in the substrate processing apparatus 100 can be easily performed.

For example, as shown in FIG. 17, in the recipe input screen Sc0, one of the plurality of first setting items displayed in the first area Ar1 is placed on the left side of the mouse with the mouse pointer Mp1 aligned. As shown in FIG. 18, a mode in which the mouse is moved to the second area Ar2 and is set as the second setting item by the drag operation of moving the button while it is pressed and the drop operation of releasing the button of the left mouse button are released. Can be considered. On the other hand, for example, as shown in FIG. 19, in the recipe input screen Sc0, one of the plurality of second setting items displayed in the second area Ar2 is set to the mouse by moving the mouse pointer Mp1 to the second setting item. 20 is moved to the first area Ar1 by the drag operation of moving the left button while pressing the left button of the mouse and the drop operation of releasing the pressing of the left button of the mouse, and the first setting item It is possible to do this.

Further, for example, as shown in FIG. 17, in the recipe input screen Sc0, the mouse pointer Mp1 is aligned with one of the plurality of first setting items displayed in the first area Ar1 and left-clicked. By doing so, a mode may be adopted in which this one first setting item is moved to the second area Ar2 to be the second setting item, as shown in FIG. Further, for example, as shown in FIG. 19, in the recipe input screen Sc0, the mouse pointer Mp1 is aligned with one of the plurality of second setting items displayed in the second area Ar2 and left-clicked. By doing so, a mode may be adopted in which the one second setting item is moved to the first area Ar1 to be the first setting item, as shown in FIG.

Here, for example, the screen creation unit 10a sets one or more specific preset first setting items of the plurality of first setting items in the first area Ar1 to the plurality of second setting areas in the second area Ar2. Changing to one or more second setting items so as to be included in the setting items may be prohibited. The rule that prohibits changing from the first setting item to the second setting item can be defined by the screen configuration data stored in the storage unit 20, for example. Here, for example, when the bubbling condition using nitrogen gas for the treatment liquid stored in the treatment tank CB2 cannot be changed according to the passage of time, or when individual settings cannot be made for each of the plurality of gas pipes. In addition, the first setting item relating to bubbling may be set as one or more specific first setting items. If such a configuration is adopted, for example, for a specific first setting item for which a condition depending on the passage of time cannot be set, a change to the second setting item for the condition depending on the passage of time is performed. Can be banned. Thereby, for example, it is possible to avoid a problem that the operator creates a recipe that defines a process that cannot be executed.

In addition, here, for example, the screen creation unit 10a sets one or more specific first setting items in the recipe input screen Sc0 in response to a signal input by the input unit 8 in response to the operation of the operator. When an operation of changing to two setting items is performed, as shown in FIG. 21, an element (second error notification) for notifying that wrong item movement is designated on the recipe input screen. Em1 (also referred to as an element) may be displayed.

Further, here, for example, as shown in FIG. 22, two or more first setting items in the first area Ar1 are changed to two or more second setting items in the second area Ar2 in group units. You may be able to.

Here, for example, in the recipe input screen Sc0, regarding each group name of the plurality of first setting item groups that respectively include two or more first setting items of the plurality of first setting items in the first area Ar1. It is assumed that the first display elements Dc1 to Dc3 are present. In this case, for example, the screen creation unit 10a responds to a signal input by the input unit 8 in response to the operation of the operator, for each first setting item group of the plurality of first setting item groups, and Two or more first setting items in the one area Ar1 may be changed to two or more second setting items so as to be included in the plurality of second setting items in the second area Ar2. For example, as shown in FIG. 22, in the recipe input screen Sc0, one of the first display elements Dc1 to Dc3 displayed in the first area Ar1 is aligned with the mouse pointer Mp1. The mouse is moved to the second area Ar2 by a drag operation of moving the mouse while holding down the left button of the mouse and a drop operation of releasing the press of the left button of the mouse. A mode in which one setting item is two or more second setting items is conceivable. If such a configuration is adopted, for example, the operator has a plurality of first setting items for setting conditions that do not depend on the passage of time and a plurality of second setting items for setting conditions that depend on the passage of time. Setting items can be efficiently exchanged between and.

<2. Modification>
The present invention is not limited to the above-described embodiments, and various modifications and improvements can be made without departing from the gist of the present invention.

In the first embodiment, the unit processing amount of the substrates W is not limited to the predetermined number, and may be a value according to another index such as a predetermined weight, for example. For example, if the unit processing amount of the substrate W is a predetermined weight, the sensor unit 11m measures the weight of the plurality of substrates W constituting one lot, and the calculation unit 10g measures the weight measured by the sensor unit 11m. The supply amount of the processing liquid may be calculated based on the above and a numerical value related to the supply amount of the processing liquid per predetermined weight. In addition, for example, a unit time (also referred to as a unit processing time) relating to the time of the chemical liquid processing performed on the substrate W may be applied to the values according to other indexes. In this case, for example, based on the numerical value relating to the supply amount of the processing liquid per unit processing time as the unit processing amount of the substrate W and the total time of the chemical liquid processing applied to the substrate W, The supply amount may be calculated.

In the above-described first embodiment, for example, the recipe may define the timing of supplying the processing liquid to the processing baths CB2 by the liquid supply unit SL1. If such a configuration is adopted, for example, a treatment liquid of an amount corresponding to the treatment amount of the substrate W is treated for each chemical treatment unit 52 at an appropriate timing such as pretreatment of chemical treatment, main treatment, and posttreatment. It can be supplied to the tank CB2.

In the first embodiment, for example, when the supply amount of the processing liquid from the liquid supply unit SL1 to the processing bath CB2 per unit time is constant, the processing per unit processing amount of the substrate W described in the recipe is performed. The reference values Vs1 and adjustment values Va1 related to the supply amount of the processing liquid per unit processing amount of the substrate W included in the numerical values V1a and V1b related to the supply amount of the liquid and the numerical information described in one recipe include the processing liquid. Supply time may be applied.

In the first embodiment, the substrate processing apparatus 100 has the two chemical liquid processing units 52 having the same configuration, but has, for example, three or more chemical liquid processing units 52 having the same configuration. May be.

Although the recipe is created in the substrate processing apparatus 100 in the first embodiment, for example, a configuration may be adopted in which the recipe is transmitted from an external device communicably connected to the substrate processing apparatus 100.

In the first embodiment, for example, the transition between the compressed state and the expanded state of two or more setting items for each group on the recipe input screen Sc0, and the first setting item and the second setting item on the recipe input screen Sc0. Various configurations for changing items between and are not limited to the batch type substrate processing apparatus 100, and can be applied to a single wafer type substrate processing apparatus.

It goes without saying that all or part of each of the above-described one embodiment and various modified examples can be appropriately combined in a consistent range.

5 1st liquid processing part 6 2nd liquid processing part 8 Input part 9 Output part 10 Control part 10a Screen creation part 10b Display control part 10c Recipe creation part 10d Schedule creation part 10e Acquisition part 10f Recognition part 10g Calculation part 10h Supply control part 10i mode switching section 11m sensor section 20 storage section 52 chemical solution processing section 100 substrate processing apparatus Ar0 recipe display area Ar1 first area Ar2 second area CB2 processing tanks Dc1 to Dc3 first display element Mp1 mouse pointer SL1 liquid supply section SL1a first Liquid supply unit SL1b Second liquid supply unit Sc0 Recipe input screen V1a, V1b Numerical value Va1 Adjustment value Va11 First adjustment value Va12 Second adjustment value Vs1 Reference value W Substrate

Claims (12)

Two or more chemical liquid processing units each having a processing bath for processing the substrate with the stored processing liquid and a liquid supply unit for supplying the processing liquid to the processing bath;
A storage unit that stores numerical information relating to the supply amount of the processing liquid per unit processing amount of the substrate for each of the chemical liquid processing units,
And a control unit,
The control unit
An acquisition unit that acquires processing amount information related to the processing amount of the substrate to be processed,
A recognition unit for recognizing one of the two or more chemical liquid processing units, which is used for processing the substrate.
Of the numerical value information, the numerical value related to the supply amount of the processing liquid per unit processing amount of the substrate corresponding to the one chemical liquid processing unit recognized by the recognition unit, and the processing amount information acquired by the acquisition unit And a calculation unit that calculates a numerical value related to the supply amount of the processing liquid to be supplied to the processing tank of the one chemical liquid processing unit,
A substrate processing apparatus comprising: a supply control unit that causes the liquid supply unit to supply a processing liquid to the processing bath according to the numerical value calculated by the calculation unit. The substrate processing apparatus according to claim 1, wherein
Further comprising a sensor unit for measuring the throughput of the substrate,
The acquisition unit is
A substrate processing apparatus that acquires the processing amount information based on a measurement result by the sensor unit. The substrate processing apparatus according to claim 1, wherein
The storage unit is
A substrate processing apparatus that stores a recipe that includes the numerical information and defines processing conditions. The substrate processing apparatus according to claim 3, wherein
The numerical information is
A reference value relating to the supply amount of the processing liquid per unit processing amount of the substrate to the two or more chemical liquid processing units, and a unit of the substrate for at least one chemical liquid processing unit of the two or more chemical liquid processing units. And an adjustment value relating to the supply amount of the processing liquid per processing amount,
The calculation unit
Of the numerical value information, based on the reference value and the adjustment value corresponding to the one chemical liquid processing unit recognized by the recognition unit, and the processing amount information acquired by the acquisition unit, the 1 A substrate processing apparatus for calculating a numerical value relating to a supply amount of a processing liquid supplied to the processing bath in one chemical liquid processing section. The substrate processing apparatus according to claim 3 or 4, wherein
The recipe is
A substrate processing apparatus, wherein a timing for supplying a processing liquid to the processing bath by the liquid supply unit is specified. A substrate processing apparatus according to any one of claims 3 to 5, wherein:
Further comprising an input unit for inputting a signal in response to a user operation,
The control unit is
In response to a signal input by the input unit in response to a user's operation, the supply amount of the processing liquid per unit processing amount of the substrate, which is included in the numerical information, for each of the two or more chemical liquid processing units. A substrate processing apparatus further comprising: a recipe creating unit that creates or edits the recipe by describing the numerical value in the recipe. A substrate processing apparatus according to any one of claims 1 to 5, wherein:
Further comprising an input unit for inputting a signal in response to a user operation,
The control unit is
A mode switching unit that switches the mode between a first liquid supply mode and a second liquid supply mode in response to a signal input by the input unit in response to a user operation,
In the first liquid supply mode,
The calculation unit obtains a numerical value related to the supply amount of the processing liquid per unit processing amount of the substrate corresponding to the one chemical liquid processing unit recognized by the recognition unit in the numerical information, and the acquisition unit. Based on the processing amount information and the processing amount information, a numerical value relating to the supply amount of the processing liquid to be supplied to the processing tank of the one chemical liquid processing unit is calculated, and the supply control unit calculates the numerical value calculated by the calculation unit. Accordingly, in the one chemical liquid processing unit, a mode in which a processing liquid is supplied to the processing tank by the liquid supply unit,
The second liquid supply mode is
The substrate processing apparatus is a mode in which the control unit causes a processing tank of the one chemical liquid processing unit recognized by the recognition unit to supply a predetermined amount of the processing liquid by the liquid supply unit. The substrate processing apparatus according to claim 6, wherein
Further comprising a display unit,
The control unit is
A screen creating unit for creating information of a recipe input screen for creating or editing the recipe,
A display control unit for displaying the recipe input screen on the display unit;
The recipe input screen is
Including a first region and a second region,
The first area is
A region that describes a condition for each of the plurality of first setting items for the condition that does not depend on the passage of time in the process executed according to the recipe,
The second area is
The process executed according to the recipe includes a region describing a condition for each of a plurality of second setting items regarding a condition depending on the passage of time,
The recipe creation unit,
In response to a signal input by the input unit in response to a user's operation, the conditions described for each of the first setting items on the recipe input screen and the conditions for each of the second setting items on the recipe input screen are set. Create or edit the recipe based on the conditions described for
The screen creation unit,
In response to a signal input by the input unit in response to a user operation, in the recipe input screen, one or more first setting items of the plurality of first setting items in the first area are Change to one or more second setting items in the plurality of second setting items in the second area, and in the recipe input screen, in accordance with a signal input by the input unit in response to a user operation, One or more second setting items of the plurality of second setting items in the two areas are changed to one or more first setting items so as to be included in the plurality of the first setting items in the first area. A substrate processing apparatus. The substrate processing apparatus according to claim 8, wherein
The screen creation unit,
One predetermined one or more preset first setting items among the plurality of first setting items in the first area are included in the plurality of second setting items in the second area. A substrate processing apparatus that prohibits changing to the above second setting item. The substrate processing apparatus according to claim 8 or 9, wherein
The screen creation unit,
In the recipe input screen, a first display element related to each group name of a plurality of first setting item groups each including two or more first setting items of the plurality of first setting items in the first area In the first area in response to a signal input by the input unit in response to the user's operation, the second setting in the first area is performed for each first setting item group among the plurality of first setting item groups. A substrate processing apparatus which changes one or more first setting items into two or more second setting items so as to be included in the plurality of second setting items in the second area. The substrate processing apparatus according to claim 6, wherein
Further comprising a display unit,
The control unit is
A screen creating unit for creating information of a recipe input screen for creating or editing the recipe,
A display control unit for displaying the recipe input screen on the display unit;
The recipe input screen is
Including a first region and a second region,
The first area is
A region that describes a condition for each of the plurality of first setting items for the condition that does not depend on the passage of time in the process executed according to the recipe,
The second area is
The process executed according to the recipe includes a region describing a condition for each of a plurality of second setting items regarding a condition depending on the passage of time,
The recipe creation unit,
In response to a signal input by the input unit in response to a user's operation, the conditions described for each of the first setting items on the recipe input screen and the conditions for each of the second setting items on the recipe input screen are set. Create or edit the recipe based on the conditions described for
In the first area, there is a first display element related to each group name of a plurality of first setting item groups each including two or more first setting items of the plurality of first setting items,
The screen creation unit,
In the recipe input screen displayed on the display unit in response to a signal input by the input unit in response to a user operation, one of the plurality of first setting item groups is set to one first setting item group. A substrate processing apparatus for switching a display state of the two or more first setting items included therein between a displayed expanded state and a non-displayed compressed state. A substrate processing method in a substrate processing apparatus comprising two or more chemical liquid processing units each having a processing bath for processing a substrate with a stored processing liquid and a liquid supply unit for supplying the processing liquid to the processing bath. hand,
(a) a step of storing numerical information relating to the supply amount of the processing liquid per unit processing amount of the substrate in the storage unit for each of the chemical liquid processing units,
(b) acquiring the processing amount of the substrate to be processed,
(c) recognizing one of the two or more chemical liquid processing units to be used for processing the substrate,
(d) A numerical value relating to the supply amount of the processing liquid per unit processing amount corresponding to the one chemical liquid processing unit recognized in the step (c) of the numerical information, and acquired in the step (b). Calculating a numerical value relating to the supply amount of the processing liquid supplied to the processing tank of the one chemical liquid processing unit, based on the processing amount
(e) A step of supplying a processing liquid to the processing bath by the liquid supply unit in the one chemical liquid processing unit according to the numerical value calculated in the step (d).

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