TW202042281A - Substrate treatment apparatus, and substrate treatment method - Google Patents

Abstract

The purpose of the present invention is to easily customize a treatment performed on a substrate by a substrate treatment device. In order to achieve the purpose, this substrate treatment device is provided with two or more chemical liquid treatment units, a storage unit, and a control unit. The chemical liquid treatment unit includes a treatment tank and a liquid supply unit. In the treatment tank, a substrate is treated by a treatment liquid. The liquid supply unit supplies the treatment tank with the treatment liquid. The storage unit stores numerical information about the supply amount of the treatment liquid for each unit treatment amount of the substrate with respect to each of the chemical treatment units. The control unit has an acquisition unit, a recognition unit, a calculation unit, and a supply control unit. The calculation unit calculates the numerical value related to the supply amount of the treatment liquid supplied to the treatment tank of one chemical liquid treatment unit on the basis of the numerical value related to the supply amount of the treatment liquid for each unit treatment amount of the substrate corresponding to the one chemical liquid treatment unit recognized by the recognition unit, and treatment amount information acquired by the acquisition unit, among the numerical information. The supply control unit supplies the treatment tank with the treatment liquid through the liquid supply unit according to the numerical value calculated by the calculation unit.

Description

Substrate processing device and substrate processing method

The present invention relates to the treatment of semiconductor wafers, substrates for liquid crystal displays, substrates for plasma displays, substrates for organic electroluminescence (EL; Electroluminescenee), substrates for field emission displays (FED; Field Emission Display), light Technology for etching and cleaning substrates such as substrates for displays, substrates for magnetic disks, substrates for magneto-optical disks, substrates for photomasks, and substrates for solar cells.

For example, there is a substrate processing apparatus that performs processing on a substrate by immersing the substrate in a processing liquid stored in a processing tank (for example, Patent Document 1, etc.). In the substrate processing apparatus, for example, various actions and processing on the substrate are performed in accordance with a prescribed recipe for processing the substrate.

Such substrate processing apparatuses include, for example, the following: having a plurality of processing tanks for performing the same processing on a substrate, and performing the same processing on the substrates in parallel in the plurality of processing tanks according to the same recipe.

[Prior Technical Literature]

[Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open No. 2009-260257

However, even if a plurality of treatment tanks have the same configuration, the difference in external factors such as the number of years of use, the condition of the piping, vibration or temperature, the number of uses, and the configuration will cause the The results of the same treatment on the substrate are different.

In addition, in recent years, for example, there has been a tendency that demands for fine processing of substrates increase. Along with this, the content of the recipe has become complicated, and the work of making and editing the recipe has gradually become difficult.

These problems are not limited to the so-called batch-type substrate processing apparatus that performs processing on the substrate by immersing the substrate in the processing liquid stored in the processing tank. The processing liquid is discharged from the nozzle to the substrate and the processing liquid is applied to the substrate. It also occurs in general substrate processing equipment such as so-called single-chip substrate processing equipment.

The present invention has been accomplished in view of the above-mentioned problems, and its object is to provide a technology that can easily perform customized processing of a substrate in a substrate processing apparatus.

In order to solve the above-mentioned problems, the substrate processing apparatus of the first aspect includes two or more chemical liquid processing sections, storage sections, and control sections. Each of the above-mentioned two or more liquid chemical treatment parts has a treatment tank and a liquid supply part. The processing tank uses the stored processing liquid to process the substrate. The liquid supply unit supplies the processing liquid to the processing tank. The storage section stores numerical information on the supply amount of the processing liquid per unit processing amount of the substrate for each of the chemical liquid processing sections. The control unit has an acquisition unit, a recognition unit, a calculation unit, and a supply control unit. The above-mentioned acquisition department acquires the Processing volume information of substrate processing volume. The recognition part recognizes one of the two or more chemical treatment parts for processing the substrate. The calculation unit is based on the numerical value of the supply amount of processing liquid per unit processing volume of the substrate corresponding to the one chemical liquid processing unit recognized by the recognition unit in the numerical information, and the value obtained by the acquisition unit The above-mentioned processing amount information is used to calculate the numerical value of the supply amount of the processing liquid supplied to the processing tank of the above-mentioned one chemical liquid processing section. The supply control unit causes the processing liquid to be supplied to the processing tank through the liquid supply unit in the one chemical liquid processing unit based on the value calculated by the calculation unit.

The substrate processing apparatus of the second aspect is the substrate processing apparatus of the first aspect, and further includes a sensor unit for measuring the processing amount of the substrate. The acquisition unit acquires the processing amount information based on the measurement result using the sensor unit.

The substrate processing apparatus of the third aspect is the substrate processing apparatus of the first or second aspect, wherein the storage unit stores a recipe that includes the numerical information and specifies processing conditions.

The substrate processing apparatus of the fourth aspect is the substrate processing apparatus of the third aspect, wherein the numerical information includes the relative amount of supply of the processing liquid per unit processing volume of the substrate for the two or more chemical liquid processing parts. The reference value and the adjusted value of the supply amount of the processing liquid per unit processing amount of the substrate with respect to at least one of the two or more chemical liquid processing portions. The calculation unit is based on the reference value in the numerical information, the adjustment value corresponding to the one chemical treatment unit recognized by the recognition unit, and the processing amount information obtained by the acquisition unit. Calculate the numerical value related to the supply amount of the processing liquid supplied to the processing tank in the one chemical liquid processing section.

The substrate processing device of the fifth aspect is at the substrate of the third or fourth aspect The processing apparatus, wherein the formula defines a timing for supplying the processing liquid to the processing tank by the liquid supply unit.

The substrate processing apparatus of the sixth aspect is the substrate processing apparatus of any one of the third to fifth aspects, and is further provided with an input unit that inputs a signal in response to a user's action. The control unit further has a recipe preparation unit that, based on the signal input from the input unit in response to the user's action, calculates the information contained in the numerical value information about each of the two or more liquid medicine processing units. The numerical value of the supply amount of the processing liquid per unit processing amount of the substrate is described in the above formula, so as to create or edit the above formula.

The substrate processing apparatus of the seventh aspect is the substrate processing apparatus of any one of the first to fifth aspects, and further includes an input unit that inputs signals in response to a user's actions. The control unit further has a mode switching unit that switches the mode between the first liquid supply mode and the second liquid supply mode based on a signal input from the input unit in response to a user's action. The first liquid supply mode is a mode in which the calculation section supplies the processing liquid per unit processing volume of the substrate corresponding to the one chemical liquid processing section recognized by the recognition section in the numerical information. To calculate the value of the supply amount of the treatment liquid supplied to the treatment tank of the above-mentioned one chemical liquid treatment unit, and the above-mentioned supply control unit based on According to the numerical value calculated by the calculation unit, the treatment liquid is supplied to the treatment tank through the liquid supply unit in the one chemical liquid treatment unit. The second liquid supply mode is a mode in which the control unit causes a preset amount of treatment liquid to be supplied through the liquid supply unit to the one liquid chemical treatment unit recognized by the recognition unit. groove.

The substrate processing apparatus of the eighth aspect is the substrate processing apparatus of the sixth aspect It is further provided with a display unit. The control unit further includes: a screen creation unit that creates information for creating or editing the formula input screen of the formula; and a display control unit that displays the formula input screen on the display unit. The above recipe input screen includes a first area and a second area. The first area includes an area for describing conditions for each of a plurality of first setting items regarding conditions that are not dependent on the elapse of time in the processing executed in accordance with the recipe. The second area includes an area for describing conditions for each of a plurality of second setting items related to conditions that depend on the passage of time in the processing executed in accordance with the recipe. The recipe creation section is based on the signal input from the input section in response to the user's action, and based on the conditions described in the recipe input screen for each of the first setting items, and on the recipe input screen for each of the first setting items. 2Set the conditions described in the item to create or edit the above recipe. Based on the signal input by the input unit in response to the user's action, the screen creation unit will set one or more of the first setting items in the first area in the recipe input screen , Change to one or more of the second setting items of the plurality of second setting items in the second area, and according to the signal input by the input part in response to the user's action, in the formula input screen, Change one or more of the second setting items of the plurality of second setting items in the second area to one or more first setting items to include the plural first setting items in the first area project.

The substrate processing apparatus of the ninth aspect is the substrate processing apparatus of the eighth aspect, wherein the screen creation section prohibits the preset one or more of the plurality of first setting items in the first area from being set in advance The first setting item is changed to one or more second setting items so as to be included in the plurality of second setting items in the second area.

The substrate processing apparatus of the tenth aspect is the substrate processing apparatus of the eighth or ninth aspect, wherein the screen creation section in the recipe input screen includes the plurality of first settings in the first area. When the first display element related to the group name of each of the plural first setting items in the first setting item group of 2 or more items exists, it will be input by the input section in response to the user's action Signal, for each first setting item group in the plurality of first setting item groups, the two or more first setting items in the first area are included in the plural second settings in the second area The project method is changed to 2 or more second setting projects.

The substrate processing apparatus of the eleventh aspect is the substrate processing apparatus of the sixth aspect, and further includes a display unit. The control unit further includes: a screen creation unit that creates information for creating or editing the formula input screen of the formula; and a display control unit that displays the formula input screen on the display unit. The above recipe input screen includes a first area and a second area. The first area includes an area for describing conditions for each of a plurality of first setting items that are not dependent on the elapse of time in the processing performed in accordance with the recipe. The second area includes an area for describing conditions for each of a plurality of second setting items related to conditions that depend on the elapse of time in the processing executed in accordance with the recipe. The recipe creation section is based on the signal input from the input section in response to the user’s actions, and based on the conditions described in the recipe input screen for each of the first setting items, and on the recipe input screen. The second setting item describes the conditions to create or edit the above recipe. In the first area, there are first display elements each containing the group name of each of the plural first setting item groups related to the two or more first setting items of the plural first setting items. The above-mentioned screen production department uses the above-mentioned input in response to the user's actions In the formula input screen displayed on the display section, the above two or more first setting items included in the first setting item group in the plural first setting item groups The display state of the display can be switched between the expanded state of displaying and the compressed state of not displaying.

The substrate processing method of the twelfth aspect is provided with a substrate having two or more chemical liquid processing sections, each of which has a processing tank for processing the substrate with the stored processing liquid and a liquid supply section for supplying the processing liquid to the processing tank. The substrate processing method of the processing apparatus has (a) step, (b) step, (c) step, (d) step, and (e) step. In the above step (a), for each of the above-mentioned chemical liquid processing sections, numerical information about the supply amount of the processing liquid per unit processing amount of the substrate is stored in the storage section. In the step (b) above, the throughput of the substrate to be processed is acquired. In the above step (c), one of the two or more chemical liquid processing parts used for processing the substrate is identified. In the above step (d), based on the above numerical information, the numerical value related to the supply amount of the processing liquid per unit processing amount corresponding to the above one chemical liquid processing section identified in the above step (c), and the above (b) The above-mentioned processing amount obtained in step is calculated with respect to the supply amount of the processing liquid supplied to the processing tank of the above-mentioned one chemical liquid processing section. The step (e) described above is based on the value calculated in the step (d) above, and in the one chemical solution processing section, the processing liquid is supplied to the processing tank via the liquid supply section.

Even with the substrate processing apparatus of the first aspect and the substrate processing method of the twelfth aspect, for example, for each processing tank, an amount corresponding to the processing volume of the substrate can be supplied to the processing tank. As a result, for example, waste in the use of the processing liquid, and excessive processing due to excessive supply of the processing liquid are less likely to occur. As a result, for example, in a substrate processing apparatus, it can be easily executed for each processing tank. Customize the processing performed on the substrate. Therefore, for example, in a substrate processing apparatus, customization of the processing performed on the substrate can be easily performed.

According to the substrate processing apparatus of the second aspect, for example, based on the processing volume of the substrate measured by the substrate processing apparatus, the processing liquid corresponding to the processing volume of the substrate can be supplied to the processing tank for each processing tank. Thereby, for example, in the substrate processing apparatus, customization of the processing performed on the substrate can be performed for each processing tank.

According to the substrate processing apparatus of the third aspect, for example, the substrate can be processed in parallel using two processing tanks in accordance with one recipe. Thereby, for example, one recipe can be used to supply an amount of processing liquid corresponding to the processing volume of the substrate to the processing tank for each processing tank. Thereby, it is possible to easily execute customization of the processing performed on the substrate in the substrate processing apparatus, for example.

According to the substrate processing apparatus of the fourth aspect, for example, by changing the adjustment value in one recipe, it is possible to supply the processing liquid in an amount most corresponding to the processing of the substrate to the processing tank for each processing tank. By this, for example, a recipe can be easily produced. Therefore, it is possible to easily execute customization of the processing performed on the substrate in the substrate processing apparatus, for example.

According to the substrate processing apparatus of the fifth aspect, for example, for each processing tank, an amount of processing liquid corresponding to the processing volume of the substrate can be supplied to the processing tank at an appropriate timing.

According to the substrate processing apparatus of the sixth aspect, for example, the operator can perform customization of the processing performed on the substrate for each processing tank.

According to the substrate processing apparatus of the seventh aspect, for example, when there is no difference in the results of the substrate processing by each processing tank, the second liquid supply mode can be set to omit the processing volume per unit of the substrate. Setting of the numerical value of the supply amount of the treatment liquid. By this, for example, it is possible to reduce the workload of an operator who sets processing conditions.

According to the substrate processing apparatus of the eighth aspect, for example, the operator can arbitrarily replace the settings between a plurality of setting items that set conditions that do not depend on the passage of time and a plurality of setting items that set conditions that depend on the passage of time project. In this way, for example, the operator can make a formula that specifies the required conditions. As a result, for example, the operator can perform the processing of the substrate under the required conditions. Therefore, it is possible to easily execute customization of the processing performed on the substrate in the substrate processing apparatus, for example.

According to the substrate processing apparatus of the ninth aspect, for example, it is possible to prohibit changes to the setting items of the conditions dependent on the passage of time for the established setting items that cannot be set for the conditions dependent on the passage of time. In this way, for example, it is possible to prevent the operator from creating a recipe for a process that cannot be executed.

According to the substrate processing apparatus of the tenth aspect, for example, the operator can efficiently replace a plurality of setting items that set conditions that do not depend on the passage of time and a plurality of setting items that set conditions that depend on the passage of time Set items.

According to the substrate processing apparatus of the 11th aspect, for example, the operator can switch the state of being expanded by displaying more than two first setting items for each group containing more than two first setting items, and The mode compression state of the 2nd setting item above 2 is not displayed. With this, for example, even if the number of multiple first setting items in the first area increases, the operator can easily make recipes and make recipes while confirming both the first area and the second area on the recipe input screen. Edited assignment. Therefore, it is possible to easily execute customization of the processing performed on the substrate in the substrate processing apparatus, for example.

1: Input Department

2: Transport Department 1

3: The second transfer department

4: Drying department

5: The first liquid treatment department

6: The second liquid treatment department

7: Distribution Department

8: Input section

9: Output section

10: Control Department

10a: Screen Production Department

10b: Display control section

10c: Recipe Production Department

10d: Schedule Production Department

10e: Acquisition Department

10f: Identification Department

10g: Calculation part

10h: Supply control department

10i: Mode switching unit

11: Mounting table

11m: Sensor part

20: Storage Department

51: Washing treatment department

52: Liquid Treatment Department

53: Deputy Transport Department

71: Placing Table

100: Substrate processing device

Ab0: Button area

Ar0: formula display area

Ar1: Zone 1

Ar2: Zone 2

B2a: inner tank

B2b: Outer tank

C1: Box

CB1: adjustment slot

CB2: Processing tank

Cf1: The first flow control unit

Cf2: The second flow control unit

CL1: Liquid circulation department

CL2: Liquid circulation department

Ct1: cooling tank

Dc1~Dc3: The first display element

EL1: Liquid discharge part

Em0: Pop-up window

Em1: The second element of error notification

En0: Treatment liquid supply source

Ex0: Treatment liquid discharge part

Fl1: filter

Ht1: No. 1 heater

Ht2: 2nd heater

LF2: Lifter

M1: The first flow meter

M2: 2nd flow meter

Mk1: Mark 1

Mk2: Mark 2

Mp1: Mouse cursor

Pm1: Pump 1

Pm2: 2nd pump

Pr0: Identification Information Department

Pr1: Recipe input section

R1a: Part of the recipe input screen

R1b: Part of the recipe input screen

R2: Part of the recipe input screen

SL1: Liquid supply part

SL1a: The first liquid supply part

SL1b: 2nd liquid supply part

Sc0: Recipe input screen

Tb1: The first piping part

Tb2: 2nd piping part

Tb3: 3rd piping part

Tb4: 4th piping part

Tb5: 5th piping part

Tb6: 6th piping part

Tb7: 7th piping part

Tb8: 8th piping part

Tg1: Liquid discharge pipe

V1: The first valve

V1a, V1b: Numerical value

V2: 2nd valve

V3: 3rd valve

V4: 4th valve

V5: 5th valve

V6: 6th valve

V7: 7th valve

V8: 8th valve

V9: 9th valve

Va1: adjusted value

Va11: 1st adjustment value

Va12: 2nd adjusted value

Vs1: reference value

W: substrate

Figure 1 is a plan view showing the schematic configuration of the substrate processing apparatus of the first embodiment Figure.

Fig. 2 is a block diagram showing the functional configuration of the substrate processing apparatus of the first embodiment.

Fig. 3 is a diagram showing a schematic configuration of a chemical solution processing section.

Fig. 4 is a block diagram showing the functional structure of the liquid supply process implemented by the control unit.

Fig. 5 (a) and (b) are diagrams showing the first example of a part of the recipe input screen.

Fig. 6 is a diagram showing a second example of a part of the recipe input screen.

FIG. 7 is a diagram showing an example of the relationship between the number of substrates and the supply amount of the processing liquid phase to the processing tank.

Fig. 8 is a flowchart showing an example of the operation flow of the supply of the processing liquid to the processing tank.

Fig. 9 is a diagram showing the schematic configuration of a recipe input screen.

Fig. 10 is a diagram showing a partial reference example of the recipe input section on the recipe input screen.

Fig. 11 is a diagram showing an example of a part of the recipe input section on the recipe input screen.

Fig. 12 is a diagram showing an example of a part of the recipe input section on the recipe input screen.

Fig. 13 is a diagram showing an example of a part of the recipe input section on the recipe input screen.

Fig. 14 is a diagram showing an example of a part of the recipe input section on the recipe input screen.

Fig. 15 is a diagram showing an example of a part of the recipe input section on the recipe input screen.

Fig. 16 is a diagram showing an example of a part of the recipe input section on the recipe input screen.

Fig. 17 is a diagram showing an example of a part of the recipe input section on the recipe input screen.

Fig. 18 is a diagram showing an example of a part of the recipe input section on the recipe input screen.

Fig. 19 is a diagram showing an example of a part of the recipe input section on the recipe input screen.

Fig. 20 is a diagram showing an example of a part of the recipe input section on the recipe input screen.

Fig. 21 is a diagram showing an example of a part of the recipe input section on the recipe input screen.

Fig. 22 is a diagram showing an example of a part of the recipe input section on the recipe input screen.

There is known a substrate processing apparatus in which a substrate is immersed in a processing liquid stored in a processing tank to perform processing such as etching on the substrate. In this substrate processing apparatus, for example, there is a case where an etching process is performed in which a nitride film formed on the surface of the substrate is eluted with a processing solution such as a phosphoric acid aqueous solution. In a processing tank where such an etching process is performed, whenever the concentration of the components eluted from the substrate in the processing liquid increases, the processing liquid stored in the processing tank must be replaced to some extent. Particularly, in recent years, such as the formation of three-dimensional NAND, when the amount of etching objects to be dissolved in one batch is larger than in the past, the process liquid stored in the process liquid is replaced. The amount and frequency are increasing.

However, there are many substrate processing apparatuses that have a plurality of processing tanks that can perform the same processing using a processing liquid on a substrate in parallel. When using such a substrate processing device to process substrates in multiple processing tanks in parallel, for example, as long as the same recipe for substrate processing is processed in accordance with regulations, the increase in the number of recipes and the need for recipe production can be reduced The amount of work, etc.

However, for example, even when a plurality of processing tanks have the same configuration, if there is a certain difference in conditions between the plurality of processing tanks, even if the same processing is performed on the substrate in the plurality of processing tanks, There will also be differences in the results of treatment between treatment tanks. Here, as the difference in conditions that may occur between the plurality of treatment tanks, there may be external factors such as the number of years of use, the condition of the piping, vibration or temperature, the number of uses, and the configuration. In particular, for the formation of the above-mentioned three-dimensional NAND, the amount of etched objects dissolved in one batch is more than in the past. In the case of processing, the results of processing are prone to large differences between multiple processing tanks.

Such a problem is generally common to a so-called batch type substrate processing apparatus that performs processing on the substrate by immersing the substrate in a processing liquid stored in a processing tank.

Therefore, the inventors of the present invention and others have invented technologies that can easily execute customized processing for the substrate for each processing tank in the substrate processing apparatus.

Hereinafter, each embodiment of the present invention will be described based on the drawings. In the drawings, the same symbols are assigned to the parts having the same structure and function, and in the following description, repeated descriptions are omitted. The drawings are schematically represented, and the dimensions and positional relationships of various structures in the drawings are not correctly illustrated.

<1. The first embodiment>

<1-1. Composition of substrate processing equipment>

FIG. 1 is a plan view showing an example of a schematic configuration of a substrate processing apparatus 100 according to the first embodiment. FIG. 2 is a block diagram showing an example of the functional configuration of the substrate processing apparatus 100 of the first embodiment. The substrate processing apparatus 100 can perform chemical solution processing, cleaning processing, and drying processing on the substrate W, for example.

As shown in FIG. 1, the substrate processing apparatus 100 includes, for example, an input section 1, a first conveying section 2, a second conveying section 3, a drying processing section 4, a first liquid processing section 5, a second liquid processing section 6, and a delivery section. 7. The input unit 8, the output unit 9, the control unit 10, and the storage unit 20.

The input portion 1 is, for example, a portion for inputting a plurality of substrates W before processing from the outside of the substrate processing apparatus 100 into the substrate processing apparatus 100. The input unit 1 has, for example, a base that can separately hold a plurality of pieces (for example, 25 pieces or less) before processing. Two mounting tables 11 for the cassette C1 of the board W. The mounting table 11 is provided with 11 m of sensor parts, for example. The sensor part 11m can count the number of sheets of the board|substrate W accommodated in the cassette C1, for example. In addition, the sensor part 11m can detect the arrangement of the substrate W in the cassette C1, for example. Here, the sensor section 11m, for example, takes the inside of the cassette C1 as an object, and scans downwards the light projecting section and the light receiving section that constitute a pair of transmissive infrared sensors, so that the number of times and Position, to measure the number of substrates W stored in the cassette C1 and to detect the arrangement of the substrates W. The information of the number of substrates W measured by the sensor unit 11m and the information of the arrangement of the substrate W in the cassette C1 detected by the sensor unit 11m are combined with the identification information of the cassette C1, for example Stored in the storage section 20. The information on the number of substrates W measured by the sensor section 11m is used in the control section 10 to obtain information about the drying process section 4, the first liquid treatment section 5, and the second liquid treatment section 6, for example. Information on the throughput of the substrate W to be processed (also referred to as throughput information). That is, the sensor part 11m can function as a part for measuring the throughput of the substrate W, for example.

The delivery part 7 is, for example, a part for delivering a plurality of processed substrates W from the inside of the substrate processing apparatus 100 to the outside of the substrate processing apparatus 100. The delivery unit 7 is positioned so as to be adjacent to the input unit 1, for example. The delivery unit 7 has, for example, two mounting tables 71 on which the cassette C1 can be mounted separately. In the delivery unit 7, the processed substrates W (for example, 25 or less) are stored in the cassette C1, and the processed substrates W can be delivered to the substrate processing apparatus for each cassette C1. 100 outside.

The first conveying unit 2 exists, for example, at a position along the input unit 1 and the delivery unit 7. The first transport unit 2 can take out, for example, all the substrates W contained in the cassette C1 placed in the input unit 1 and transport the second transport unit 3. At this time, for example, all the substrates W contained in the two cassettes C1 are transported with respect to the second transport section 3. A single batch of substrate groups including a plurality of substrates W is formed. A plurality of substrates W forming a substrate group of one lot are processed as a unit of processing by the drying processing section 4, the first liquid processing section 5, and the second liquid processing section 6. In addition, the first transport section 2 can receive the processed substrate W from the second transport section 3, and transport the processed substrate W to the cassette C1 placed on the mounting table 71 of the delivery section 7, for example. It is stored in the cassette C1.

The second conveying unit 3 can move along the longitudinal direction of the substrate processing apparatus 100, for example. Along the moving direction of the second conveying section 3, there are a drying processing section 4, a first liquid processing section 5, and a second liquid processing section 6 in order from the side close to the first conveying section 2. In other words, for example, the first liquid processing section 5 exists at a position adjacent to the drying processing section 4, and the second liquid processing section 6 exists at a position adjacent to the first liquid processing section 5.

The drying processing unit 4 can store and dry a plurality of substrates W in a low-pressure chamber, for example.

The first liquid processing unit 5 includes, for example, a washing processing unit 51, a chemical solution processing unit 52, and a sub-conveying unit 53. The cleaning processing unit 51 can, for example, perform a process of cleaning a plurality of substrates W with pure water (also referred to as a pure water cleaning process). The chemical solution processing unit 52 may perform processing (also referred to as chemical solution processing) on a plurality of substrates W using a processing solution containing chemical solution, for example. For example, the sub-conveying unit 53 can transfer the substrate W to and from the second conveying unit 3, and can be raised and lowered in the cleaning processing unit 51 and the chemical solution processing unit 52, respectively.

The second liquid processing unit 6 includes, for example, a washing processing unit 51, a chemical solution processing unit 52, and a sub-conveying unit 53, similarly to the first liquid processing unit 5, for example.

The input part 8 is located near the mounting table 11, for example. The input unit 8 can input a signal in response to an action of an operator as a user, for example. With this, the operator can enter Selection or input of various information. The input unit 8 is composed of, for example, a touch panel or the like. In addition, the input unit 8 may have, for example, an operation unit including buttons that can perform various operations such as pressing, or a microphone that can perform input using sound. For example, the operator can create and edit a formula specifying the order of processing the substrate W via the input unit 8 and store it in the storage unit 20, or from a formula group containing a plurality of formulas stored in the storage unit 20, A recipe is specified for a plurality of substrates W to be processed.

The output part 9 is located near the mounting table 11, for example. The output unit 9 is, for example, a part that can output various information under the control of the control unit 10. The output unit 9 includes, for example, a display unit that can visually output various information. The display unit may, for example, use the signal input from the input unit 8 in response to the operator's action to display a screen (also referred to as a formula input screen) for the operator to make and edit a formula. In addition, the output unit 9 may include, for example, a speaker that can audibly output various information. Various information that can be visually recognized or audibly output by the output unit 9 may include, for example, information indicating various states of the substrate processing apparatus 100 and information indicating various warning sounds (alarms). Here, for example, the display sections of the input section 8 and the output section 9 may also be realized by the same display section with a touch panel.

The storage unit 20 has a non-volatile storage medium such as a hard disk or flash memory for storing various information. In the storage unit 20, for example, various programs such as a schedule creation program and a processing program, a folder of a recipe group including a plurality of recipes, and various data are stored in advance. Various data include, for example, data used to form a recipe input screen (also referred to as data for screen composition). The data for screen configuration includes, for example, information necessary for input of setting conditions such as the display and numerical values of a plurality of setting items constituting the recipe. In the data for screen composition, a plurality of setting items are appropriately classified according to categories, for example. In addition, the data for screen composition includes, for example, permission or prohibition of setting items Only change the data of the classification of the category.

The operation of the substrate processing apparatus 100 having the above-mentioned configuration is collectively controlled by the control unit 10 as shown in, for example, FIG. 2.

The control unit 10 has, for example, a computing unit, a memory, and the like. For the computing unit, for example, at least one circuit such as a central computing unit (CPU) that functions as a processor can be applied. For the memory, for example, a circuit for temporarily storing information such as a random access memory (RAM) can be used. Various information temporarily obtained by various calculations of the arithmetic unit are appropriately stored in memory, etc. The arithmetic unit, for example, reads and executes a program stored in the storage unit 20 to realize various functional configurations for performing comprehensive control of the operations of the substrate processing apparatus 100 performed by the control unit 10. Various functional configurations include, for example, a part of the substrate processing apparatus 100 that produces a schedule for processing a plurality of substrates W (also referred to as a schedule creation part), and a part that executes the processing of the plurality of substrates W according to the schedule (Also called the processing execution unit) and so on. In addition, the control unit 10 may control the operations of the first liquid processing unit 5 and the second liquid processing unit 6 based on measurement results from various sensors of the chemical liquid processing unit 52, for example. Various sensors include, for example, flow meters.

<1-2. Chemical Solution Processing Department>

FIG. 3 is a diagram showing a schematic configuration of the chemical solution processing unit 52. The chemical solution processing section 52 performs, for example, the following processing (also referred to as etching processing): the substrate W on which the silicon oxide film and the silicon nitride film are formed is immersed in an aqueous phosphoric acid solution that functions as an etching solution, by This selectively dissolves the silicon nitride film.

As shown in FIG. 3, the liquid chemical processing part 52 is equipped with the liquid supply part SL1, the processing tank CB2, the liquid circulation part CL2, and the liquid discharge part EL1. Therefore, in the first In the embodiment, the substrate processing apparatus 100 includes two chemical liquid processing sections 52 each having a liquid processing section SL1 and a processing tank CB2.

The liquid supply part SL1 is a part for supplying the processing liquid to the processing tank CB2. The liquid supply part SL1 has, for example, an adjustment tank CB1, a first liquid supply part SL1a, a liquid circulation part CL1, and a second liquid supply part SL1b.

The adjustment tank CB1 is a part that temporarily stores the phosphoric acid aqueous solution in order to adjust the temperature of the phosphoric acid aqueous solution supplied to the processing tank CB2, for example. For the adjustment tank CB1, for example, a box-shaped one formed of quartz or fluororesin material excellent in corrosion resistance to phosphoric acid aqueous solution can be used.

The first liquid supply part SL1a can perform, for example, a process (also referred to as a first liquid supply process) of supplying a new process liquid sent from the process liquid supply source En0 to the adjustment tank CB1 via the first piping part Tb1. Here, for example, a new solution of a phosphoric acid aqueous solution of a predetermined concentration (also referred to as a pre-use phosphoric acid aqueous solution) that functions as an etching solution is supplied as a treatment solution. The processing liquid supply source En0 is connected to communicate with the first end of the first piping portion Tb1. The processing liquid supply source En0 presses and sends the phosphoric acid aqueous solution toward the first piping portion Tb1 from a tank that stores the phosphoric acid aqueous solution installed inside or outside the substrate processing apparatus 100 at room temperature (for example, 25° C.) by a pump or a gas. . A first flow control unit Cf1 is provided in the first piping portion Tb1. The first flow control unit Cf1 has, for example, a first valve V1 that opens and closes the flow path of the first piping portion Tb1, and a first flow meter M1 that measures the flow rate of the phosphoric acid aqueous solution. The second end of the first piping portion Tb1 is connected so as to communicate with the adjustment tank CB1, for example. Here, the first flow control unit Cf1 is connected to the control unit 10. The control unit 10 controls the first valve V1 based on the signal indicating the flow rate sent from the first flow meter M1. Thereby, in the first liquid supply part SL1a, for example, phosphoric acid supplied from the processing liquid supply source En0 is dissolved in water The liquid passes through the first piping portion Tb1, and is supplied to the adjustment tank CB1 at the flow rate set by the first flow control portion Cf1.

The liquid circulation part CL1 can perform, for example, a process of heating the phosphoric acid aqueous solution discharged from the adjustment tank CB1 and pressure-circulating it to the adjustment tank CB1 again (also referred to as a first liquid circulation process). The liquid circulation part CL1 has, for example, a second piping part Tb2. The second piping portion Tb2 has, for example, a first end connected so as to communicate with the adjustment tank CB1, and a second end connected so as to communicate with the adjustment tank CB1. The second piping portion Tb2 is provided with, for example, a second valve V2, a first pump Pm1, and a first heater Ht1 in this order from the upstream side. The second valve V2 opens and closes the flow path of the second piping portion Tb2. The first pump Pm1 pressure-feeds the phosphoric acid aqueous solution taken out from the adjustment tank CB1 toward the adjustment tank CB1 via the second piping portion Tb2. The first heater Ht1 heats the phosphoric acid aqueous solution flowing through the second piping portion Tb2 to a predetermined temperature (for example, about 160°C).

The second liquid supply part SL1b can perform, for example, a process (also referred to as a second liquid supply process) of supplying a pre-use phosphoric acid aqueous solution as a processing liquid that functions as an etching liquid to the processing tank CB2. This second liquid supply part SL1b has, for example, a third piping part Tb3 as a liquid supply pipe part, and can supply the phosphoric acid aqueous solution sent from the adjustment tank CB1 to the treatment tank CB2 via the third piping part Tb3. The third piping portion Tb3 has, for example, a first end connected to a portion between the first heater Ht1 in the second piping portion Tb2 and the adjustment tank CB1, and a first end connected to the outer tank of the processing tank CB2. B2b method to connect the second end. In other words, the third piping portion Tb3 is a piping portion branched by the second piping portion Tb2. In the third piping portion Tb3, for example, the phosphoric acid aqueous solution is pressure-fed from the first end toward the second end by the first pump Pm1. A second flow control unit Cf2 is provided in the third piping part Tb3. The second flow control part Cf2 has, for example, the third piping part Tb3, which is arranged sequentially from the upstream side (the adjustment tank CB1 side). A configuration with a second flow meter M2, a third valve V3, and a fourth valve V4. As the second flow meter M2, for example, a flow rate detector capable of detecting the flow rate of the phosphoric acid aqueous solution flowing through the third piping portion Tb3 can be applied. As the third valve V3, for example, a flow control valve for adjusting the flow rate of the phosphoric acid aqueous solution flowing through the third piping portion Tb3 can be applied. For the fourth valve V4, for example, an on-off valve that controls the opening and closing of the flow path of the phosphoric acid aqueous solution in the third piping portion Tb3 can be applied. Here, the second flow control unit Cf2 is connected to the control unit 10. The control unit 10 controls the third valve V3 and the fourth valve V4 based on, for example, a signal indicating the flow rate sent from the second flow meter M2. Thereby, the second liquid supply part SL1b can supply, for example, the phosphoric acid aqueous solution supplied from the adjustment tank CB1 through the third piping part Tb3 at a flow rate controlled by the second flow control part Cf2 to the tank B2b outside the treatment tank CB2 .

In addition, the liquid supply part SL1 may have the same structure as the 2nd liquid supply part SL1b which does not have the 1st liquid supply part SL1a, the adjustment tank CB1, and the liquid circulation part CL1, and directly connects the processing liquid supply source En, for example. In this case, for example, the processing liquid supply source En is directly connected to the first end on the upstream side of the third piping portion Tb3.

The processing tank CB2 is, for example, a part used to process the substrate W with the stored processing liquid. In the first embodiment, the processing tank CB2 is, for example, a portion (also referred to as a processing section) where the substrate W is etched by an aqueous phosphoric acid solution that functions as an etching solution. The processing tank CB2 has, for example, a double structure composed of an inner tank B2a and an outer tank B2b. The inner tank B2a stores an aqueous phosphoric acid solution as an etching solution, and the substrate W is immersed in the phosphoric acid aqueous solution, and the outer tank B2b is recovered from the inner tank B2a. The phosphoric acid aqueous solution overflowing from the upper part of tank B2a. The inner tank B2a is, for example, a rectangular box-shaped portion formed of quartz or fluororesin material excellent in corrosion resistance to phosphoric acid aqueous solution. The total amount of liquid (capacity) that can be stored in the treatment tank CB2 For example, it is set to about 60 liters. The outer groove B2b is also formed of, for example, the same material as the inner groove B2a, and exists to surround the upper end of the outer circumference of the inner groove B2a.

In addition, a lifter LF2 for immersing the substrate W in the phosphoric acid aqueous solution stored in the processing tank CB2 is provided in the processing tank CB2. The lifter LF2 is held together by three holding rods, for example, to hold a plurality of (for example, 50 or less) substrates W arranged in parallel to each other in a standing posture (posture where the normal line of the substrate main surface is along the horizontal direction). The lifter LF2 is installed so that it can be raised and lowered in a vertical direction by a lifting mechanism (not shown). The lifter LF2 lifts, for example, a plurality of substrates W held in the inner tank B2a between the processing position (position in FIG. 3) in which the phosphoric acid aqueous solution is immersed in the inner tank B2a and the transfer position after being pulled up from the phosphoric acid aqueous solution. . In the processing tank CB2, for example, by immersing a plurality of substrates W at the processing position in the inner tank B2a and immersing them in a phosphoric acid aqueous solution, an etching process in which the silicon nitride film of the substrate W is dissolved by the phosphoric acid aqueous solution can be performed. At this time, silicon as a component (also referred to as a substrate component) constituting the substrate W is eluted from the substrate W into the phosphoric acid aqueous solution stored in the inner tank B2a.

The liquid circulation part CL2 can perform, for example, a process of heating the phosphoric acid aqueous solution discharged from the treatment tank CB2 and pressure-circulating it to the treatment tank CB2 again (also referred to as a second liquid circulation treatment). The liquid circulation part CL2 has, for example, the fourth piping part Tb4 that connects the outer tank B2b and the inner tank B2a. For example, the fourth piping portion Tb4 has a first end connected to the bottom of the outer tank B2b, and a second end connected to the bottom of the inner tank B2a. A fifth valve V5, a second pump Pm2, a sixth valve V6, a second heater Ht2, and a filter F11 are provided in the fourth piping portion Tb4 in this order from the upstream side. The fifth valve V5 opens and closes the flow path of the fourth piping portion Tb4. The second pump Pm2 pressure-feeds the phosphoric acid aqueous solution taken out from the outer tank B2b through the fourth piping portion Tb4 toward the inner tank B2a. The 6th valve V6 opens and closes the 4th pipe The flow path of part Tb4. The second heater Ht2 heats the phosphoric acid aqueous solution flowing through the fourth piping portion Tb4 to a predetermined temperature (for example, about 160°C). The filter F11 is a filter for removing foreign matter in the phosphoric acid aqueous solution flowing through the fourth piping part Tb4. Moreover, the liquid circulation part CL2 may have, for example, the 5th piping part Tb5 which heats the phosphoric acid aqueous solution discharged from the inner tank B2a, and circulates it to the inner tank B2a. In this case, for example, the fifth piping portion Tb5 may have a first end and a second end. The first end is connected to the inner groove B2a, and the second end is connected to The fifth valve V5 in the fourth piping part Tb4 and the second pump Pm2 are connected in a manner. A seventh valve V7 is provided in the fifth piping portion Tb5, and the seventh valve V7 opens and closes the flow path of the fifth piping portion Tb5.

The liquid discharge part EL1 is, for example, a part that performs the following processing (also referred to as liquid discharge processing): it will be used as a processing liquid (also referred to as the first The phosphoric acid aqueous solution (also referred to as the used phosphoric acid aqueous solution or the first phosphoric acid aqueous solution) of the processing liquid) is discharged from the processing tank CB2 to the outside of the substrate processing apparatus 100. After the used phosphoric acid aqueous solution is etched by the substrate W in the processing tank CB2, the concentration of the substrate component (such as silicon) dissolved (also referred to as the dissolved concentration) is higher than the phosphoric acid aqueous solution before use. The liquid discharge portion EL1 has, for example, a sixth pipe portion Tb6, a seventh pipe portion Tb7, a cooling tank Ct1, and an eighth pipe portion Tb8. Here, the sixth piping portion Tb6, the seventh piping portion Tb7, and the eighth piping portion Tb8 constitute a portion for discharging the used phosphoric acid aqueous solution from the processing tank CB2 to the substrate processing apparatus 100 (also referred to as a liquid discharge pipe portion). ) Tg1.

The sixth piping portion Tb6 has, for example, a first end connected to the portion between the second pump Pm2 and the sixth valve V6 in the fourth piping portion Tb4, and is connected to the cooling tank Ct1. The second end of the connection. In other words, the sixth piping portion Tb6 and the fourth piping portion Tb4 together constitute the treatment tank CB2 and the cooling The part where the groove Ct1 is connected (also called the first part). An eighth valve V8 is provided in the sixth piping portion Tb6. The eighth valve V8 opens and closes the flow path of the sixth piping portion Tb6. Therefore, by appropriately controlling the opening and closing of the sixth valve V6 and the eighth valve V8, it is possible to selectively heat the phosphoric acid aqueous solution discharged from the treatment tank CB2 and send it to the treatment tank CB2 again under pressure (second Liquid circulation processing), and processing (liquid discharge processing) in which the used phosphoric acid aqueous solution is discharged from the processing tank CB2 via the cooling tank Ct1 to the outside of the substrate processing apparatus 100.

The seventh piping portion Tb7 has, for example, a first end connected to communicate with the upper part of the outer tank B2b of the processing tank CB2, and a second end connected to communicate with the cooling tank Ct1. Here, the seventh piping portion Tb7, for example, when the storage amount of the phosphoric acid aqueous solution stored in the outer tank B2b of the processing tank CB2 is excessively increased, the phosphoric acid aqueous solution may be discharged from the outer tank B2b so that the phosphoric acid aqueous solution does not overflow from the outer tank B2b Flow into the cooling tank Ct1.

The cooling tank Ct1 can store and cool the used phosphoric acid aqueous solution.

The eighth piping part Tb8 is connected to the cooling tank Ct1, for example, and constitutes a part for discharging the used phosphoric acid aqueous solution to the outside of the substrate processing apparatus 100. The eighth piping portion Tb8 has, for example, a first end connected to the cooling tank Ct1, and a first end connected to a portion (also referred to as a processing liquid discharge portion) Ex0 for discharging the used phosphoric acid aqueous solution to the outside of the substrate processing apparatus 100 2ends. The processing liquid discharge part Ex0 can be applied to, for example, a tank for recovering phosphoric acid aqueous solution (also called a recovery tank) that can be attached and detached from the substrate processing apparatus 100, or a tank for discharging phosphoric acid aqueous solution (also called a drain tank), Or used to connect to the drainage pipe of the factory's drainage treatment facility. For example, a ninth valve V9 is provided in the eighth piping portion Tb8. The ninth valve V9 can open and close the flow path of the eighth piping portion Tb8. Here, the discharge of the phosphoric acid aqueous solution from the cooling tank Ct1 toward the treatment liquid discharge part Ex0 can be 9 valve V9 adjusted.

The operation of each part of the above-mentioned liquid medicine treatment part 52 can be controlled by the control part 10. For example, the control unit 10 can control the process of supplying the phosphoric acid aqueous solution before use as the second treatment liquid to the adjustment tank CB1 by the first liquid supply part SL1a (first liquid supply process), and the circulation of the phosphoric acid aqueous solution by the liquid circulation part CL1 Treatment (first liquid circulation treatment), treatment of the phosphoric acid aqueous solution before use by the second liquid supply part SL1b to the treatment tank CB2 (second liquid supply treatment), treatment of the phosphoric acid aqueous solution circulation by the liquid circulation part CL2 ( The second liquid circulation treatment), and the treatment (liquid discharge treatment) in which the used phosphoric acid aqueous solution as the first treatment liquid is discharged from the treatment tank CB2 through the liquid discharge part EL1. Furthermore, for example, a concentration meter installed along the inner wall of the inner tank B2a may detect the dissolved concentration of a predetermined substance dissolved into the substrate W in the phosphoric acid aqueous solution stored in the inner tank B2a, according to As the dissolved concentration of the detection result, the control unit 10 opens and closes the eighth valve V8 and the ninth valve V9, and appropriately sends the used phosphoric acid aqueous solution to the processing liquid discharge unit Ex0.

<1-3. Control of the supply of treatment liquid>

In the chemical solution processing unit 52, for example, in the processing tank CB2, at least one of the pre-processing, main processing, and post-processing of a plurality of substrates W in one batch is a phosphoric acid aqueous solution before use as a processing liquid It is supplied to the processing tank CB2.

Here, the pretreatment can be applied, for example, as follows: before immersing a plurality of substrates W in the phosphoric acid aqueous solution stored in the processing tank CB2, the phosphoric acid aqueous solution stored in the processing tank CB2 is used for the processing tank CB2 The preparation of the foaming process by the supply of the aqueous phosphoric acid solution and the introduction of air bubbles, etc., becomes an active state suitable for the etching process. The main processing can apply, for example, the following processing: The plurality of substrates W are etched in a state where the plurality of substrates W are immersed in the phosphoric acid aqueous solution stored in the processing tank CB2. For post-processing, for example, the following processing can be applied: after the main processing is completed, by supplying the phosphoric acid aqueous solution to the processing tank CB2 before use, etc. Preparation for the execution of processing.

At this time, the control unit 10 controls the supply of the second liquid supply process of the pre-use phosphoric acid aqueous solution as the treatment liquid to the treatment tank CB2 by the second liquid supply part SL1b, thereby controlling the supply of the treatment tank CB2 by the liquid supply part SL1 Treatment of aqueous phosphoric acid solution before use as a treatment liquid (also referred to as liquid supply treatment). This liquid supply process can be controlled, for example, by the control unit 10 based on a recipe designated with respect to a plurality of substrates W of a lot as a processing target.

FIG. 4 is a block diagram showing an example of a functional configuration related to the liquid supply processing realized by the control unit 10. In the control unit 10, the arithmetic unit uses a memory as a work area while realizing various functional configurations. As shown in FIG. 4, the control unit 10 is a functional configuration that can be realized, for example, a screen creation unit 10a, a display control unit 10b, a recipe creation unit 10c, a schedule creation unit 10d, an acquisition unit 10e, an identification unit 10f, The calculation unit 10g, the supply control unit 10h, and the mode switching unit 10i. Here, for example, at least a part of the functions that can be realized by the control unit 10 may also be realized by a dedicated electronic circuit.

The screen creation unit 10a can create, for example, information for creating or editing a screen (recipe input screen) that specifies the sequence of the operator for processing the substrate W. For example, the screen creation unit 10a creates the information of the recipe input screen based on the screen configuration data stored in the storage unit 20.

The display control unit 10b may be manufactured according to the use of the screen creation unit 10a, for example Make the information of the formula input screen so that the display part included in the output part 9 displays the formula input screen.

The recipe creation unit 10c can create or edit a recipe, for example, based on a signal input from the input unit 8 in response to an operator's action. Here, for example, an operator can input various information on a recipe input screen displayed on the display unit to create and edit a recipe in the recipe creation unit 10c.

Figs. 5(a) and 5(b) are diagrams showing a first example of a part R1a, R1b of a formula input screen that specifies processing in the chemical solution processing unit 52. FIG. 6 is a diagram showing a second example of a part R2 of a recipe input screen that specifies processing in the chemical solution processing unit 52.

For example, as shown in FIG. 5(a), for the chemical solution processing portion 52 of the first liquid processing portion 5, a numerical value V1a regarding the supply amount of processing liquid per unit processing amount of the substrate W can be described on the recipe input screen, and The recipe is stored in the storage part 20. Also, for example, as shown in FIG. 5(b), for the chemical solution processing portion 52 of the second liquid processing portion 6, a numerical value V1b regarding the supply amount of processing liquid per unit processing amount of the substrate W can be described on the recipe input screen. And the formula is stored in the storage part 20. Here, regarding the numerical values V1a and V1b of the supply amount of the processing liquid per unit processing amount of the substrate W, for example, the volume of the processing liquid can be applied.

In this way, the recipe preparation section 10c can calculate the amount of processing liquid per unit processing volume of the substrate W for each of the two chemical liquid processing sections 52 based on the signal input from the input section 8 in response to the operator’s action. The numerical values V1a and V1b of the supply amount are described in the recipe, and the recipe is created or edited by this. In this way, for example, the operator can execute customization for the processing performed on the substrate W for each processing tank CB2 of the two chemical liquid processing parts 52 respectively. Here, the unit throughput of substrate W includes, for example, The unit processing number of slices constituted by the number of slices. The predetermined number of sheets may be, for example, one sheet, or any number of sheets of two or more sheets. For the values V1a and V1b, for example, a value representing the volume of the treatment liquid can be applied. In the example of FIG. 5(a), the supply amount of the processing liquid of 600 ml with respect to one substrate W is described. In the example of FIG. 5(b), the supply amount of the processing liquid of 800 ml with respect to one substrate W is described. Here, the numerical values V1a and V1b can be appropriately input by the operator according to the result of processing the substrate W in the processing tank CB2 of each chemical liquid processing section 52, for example. In this way, for example, the operator can write the numerical value of the supply amount of the processing liquid per unit processing amount of the substrate W in the recipe for each chemical liquid processing unit 52. Then, for each of the two chemical liquid processing parts 52, numerical information including numerical values V1a and V1b of the supply amount of the processing liquid per unit processing volume of the substrate W is stored in the storage unit 20.

In the examples of Figs. 5(a) and 5(b), although the values V1a and V1b of the two treatment tanks CB2 are described in different recipes, they are not limited to this. For example, the numerical information including the numerical values V1a and V1b of each chemical solution processing unit 52 may also be described in one recipe. In this case, for example, one recipe can be used to supply the processing liquid corresponding to the processing volume of the substrate W to the processing tank CB2 for each chemical liquid processing unit 52. In this way, for example, the substrate W can be processed in parallel using two processing tanks CB2 in accordance with one recipe.

Furthermore, as shown in FIG. 6, the numerical information described in one recipe, regarding the supply amount of the processing liquid per unit processing amount of the substrate W, may also include the reference value Vs1 for the two chemical liquid processing parts 52 and the The adjustment value Va1 of at least one of the two chemical solution processing units 52 is used. Furthermore, in an example of the formulation shown in FIG. 6, the liquid treatment part 52 of the first liquid treatment part 5 is represented by the symbol T2, and the liquid medicine treatment part 52 of the second liquid treatment part 6 is represented by the symbol T4 . Here, the reference value Vs1 For example, it is possible to apply a standard value that defines the supply amount of the processing liquid per unit processing amount of the substrate W of one chemical liquid processing section 52. The adjustment value Va1 can be applied, for example, using the reference value Vs1 as a reference to specify a value by which the supply amount of the processing liquid per unit processing amount of the substrate W should be increased or decreased for each chemical liquid processing unit 52. The reference value Vs1 and the adjustment value Va1 can be applied to the volume of the treatment liquid, for example. In the example of FIG. 6, 600 ml as the reference value Vs1, 0 ml as the first adjustment value Va11, and 200 ml as the second adjustment value Va12 are described in one recipe. Here, the first adjustment value Va11 is an adjustment value for the liquid treatment part 52 of the first liquid treatment part 5, and the second adjustment value Va12 is an adjustment value for the liquid medicine treatment part 52 of the second liquid treatment part 6.

The schedule creation unit 10d can create a time schedule based on a recipe designated for a plurality of substrates W to be processed, for example. This time schedule, for example, specifies that the transport of the plurality of substrates W by the first transport unit 2 and the transport of the plurality of substrates W in one batch by the second transport unit 3, and the drying processing unit 4 are separately performed. , The timing of the processing performed on the plurality of substrates W by the first liquid processing unit 5 and the second liquid processing unit 6; The time schedule created by the schedule creation unit 10d is stored in the memory or the storage unit 20, for example. Furthermore, the substrate processing apparatus 100 can perform various operations in accordance with the time schedule created by the schedule creation unit 10d, for example.

The acquisition part 10e can acquire the processing volume information of the board|substrate W of 1 batch used as a processing object based on the measurement result of the sensor part 11m, for example. Here, suppose, for example, that all the substrates W stored in the two cassettes C1 are transported with respect to the second transport section 3 to form a substrate group of one lot including a plurality of substrates W. In this case, for example, the number of all the substrates W stored in each of the two cassettes C1 can be treated as one batch of substrates W based on the result measured by the sensor unit 11m Information to obtain. In this way, for example, the The processing volume of the substrate W measured by the board processing apparatus 100 supplies the processing liquid corresponding to the processing volume of the substrate W to the processing tank CB2 for each chemical solution processing unit 52. As a result, for example, in the substrate processing apparatus 100, customization of the processing performed on the substrate W can be performed for each processing tank CB2.

The recognition unit 10f can recognize, for example, one of the two chemical treatment units 52 used to process the substrate W. For example, it is possible to determine based on the time schedule the chemical solution processing unit 52 that carries a plurality of substrates W in one batch among the two chemical solution processing units 52.

The calculation unit 10g can, for example, be based on the numerical information of the formula designated for a batch of multiple substrates W as the processing target, for the substrate corresponding to the one chemical solution processing unit 52 recognized by the recognition unit 10f The value of the supply amount of processing liquid per unit processing volume of W and the processing volume information acquired by the acquisition unit 10e are used to calculate the supply volume of the processing liquid supplied to the processing tank CB2 of one chemical liquid processing unit 52 Numerical value.

Here, as shown in FIGS. 5(a) and 5(b), it is assumed that the values V1a and V1b of the two treatment tanks CB2 are described in different recipes. In this case, for example, when the recognition unit 10f has recognized the chemical solution processing portion 52 of the first liquid processing portion 5, the unit processing amount of the substrate W, that is, the supply amount of the processing liquid per sheet, is multiplied by 600 ml as The value obtained by the number of substrates W (50 pieces or less) using the processing volume information acquired by the acquisition unit 10e is used as the value concerning the supply volume of the processing liquid supplied to the processing tank CB2 of one chemical liquid processing unit 52 Be calculated. In the example of FIG. 5(a), it is shown that 600ml is multiplied by 50 pieces as the number of substrates W and calculated as a numerical value related to the supply amount of the treatment liquid supplied to the treatment tank CB2 of one chemical treatment part 52 The state of 30000ml. Also, for example, where the recognition unit 10f has recognized the chemical solution of the second liquid treatment unit 6 In the case of the processing unit 52, the unit processing volume of the substrate W, which is the supply volume of the processing liquid per sheet, multiplied by the number of substrates W (50 sheets or less) as the processing volume information obtained by the acquisition unit 10e The value is calculated as the numerical value of the supply amount of the processing liquid supplied to the processing tank CB2 of one chemical liquid processing unit 52. In the example of FIG. 5(b), it is shown that 800ml is multiplied by 50 pieces as the number of substrates W and calculated as a numerical value related to the amount of processing liquid supplied to the processing tank CB2 of one chemical liquid processing section 52 The state of 40000ml.

The supply control unit 10h can, for example, supply the treatment liquid to the treatment tank CB2 by the liquid supply unit SL1 in one chemical solution treatment unit 52 recognized by the recognition unit 10f based on the numerical value calculated by the calculation unit 10g. . Therefore, for example, for each chemical solution processing unit 52, an amount of processing liquid corresponding to the processing amount of the substrate W can be supplied to the processing tank CB2. As a result, for example, waste in the use of the processing liquid, and excessive processing due to excessive supply of the processing liquid are less likely to occur. As a result, in the substrate processing apparatus 100, for example, customization of the processing performed on the substrate W can be easily performed for each processing tank CB2. Therefore, in the substrate processing apparatus 100, for example, customization of the processing performed on the substrate W can be easily performed.

However, the calculation unit 10g can also be set based on, for example, the reference value Vs1 in the numerical information described in one recipe and the adjustment value Va1 corresponding to the one chemical solution processing unit 52 recognized by the recognition unit 10f, and Using the processing volume information acquired by the acquisition unit 10e, a numerical value concerning the supply volume of the processing liquid supplied to the processing tank CB2 of one chemical liquid processing unit 52 is calculated. In this case, for example, by changing the adjustment value in one recipe, the amount of processing liquid corresponding to the processing amount of the substrate W can be supplied to the processing tank CB2 for each chemical liquid processing unit 52. By this, for example, a recipe can be easily produced.

Here, as shown in Figure 6, it is assumed that the reference value Vs1 and the adjustment value Va1 It is described in the case of 1 recipe. In this case, for example, when the recognition unit 10f has recognized the chemical solution processing unit 52 of the first liquid processing unit 5, the unit processing volume of the substrate W, that is, the reference value Vs1 of the supply volume of the processing liquid per sheet The value obtained by multiplying 600 ml by the number of substrates W (50 or less) as the processing volume information acquired by the acquisition unit 10e, and the unit processing volume of the substrate W, that is, the supply volume of the processing liquid per sheet 1 The value obtained by multiplying 0ml of the adjustment value Va11 by the number of substrates W (50 pieces or less) as the processing volume information obtained by the obtaining unit 10e is used as the sum of the values related to the supply to one chemical treatment unit 52 The value of the supply amount of the processing liquid in the processing tank CB2 is calculated. In the example in FIG. 6, the value obtained by multiplying 600ml as the reference value Vs1 by 50 pieces as the number of substrates W, and 0ml as the first adjustment value Va11 multiplied by the number of substrates W is shown The sum of the values obtained from 50 tablets is the state of 30000ml. Also, for example, when the recognition unit 10f has recognized the liquid chemical treatment unit 52 of the second liquid treatment unit 6, 600 ml of the reference value Vs1 as the unit treatment volume of the substrate W, that is, the supply volume of the treatment liquid per sheet is multiplied The value obtained as the number of substrates W (50 or less) as the processing volume information acquired by the acquisition unit 10e, and the second adjustment value as the unit processing volume of the substrate W, that is, the supply volume of the processing liquid per sheet The sum of 200ml of Va12 multiplied by the number of substrates W (50 pieces or less) as the processing volume information acquired by the acquisition unit 10e is used as the processing tank CB2 supplied to one chemical liquid processing unit 52 The value of the supply amount of the treatment liquid is calculated.

FIG. 7 is a diagram showing an example of the relationship between the number of substrates W and the amount of processing liquid supplied to the processing tank CB2. FIG. 7 shows the relationship between the number of substrates W and the supply amount of the processing liquid to the processing tank CB2 according to an example of the recipe in FIG. 6. More specifically, in FIG. 7, the relationship between the number of substrates W in the processing tank CB2 in the chemical liquid processing section 52 of the first liquid processing section 5 and the supply amount of the processing liquid is represented by a solid line L1 As shown, the relationship between the number of substrates W in the processing tank CB2 in the chemical liquid processing section 52 of the second liquid processing section 6 and the supply amount of the processing liquid is shown by a single-dot chain line L2. Here, for example, for the chemical solution processing unit 52 of the first liquid processing unit 5, since the first adjustment value Va11 is 0 ml, the supply amount of the processing liquid is not adjusted. Thereby, the supply amount of the processing liquid supplied to the processing tank CB2 of the chemical liquid processing section 52 of the first liquid processing section 5, as shown by the solid line L1, becomes the reference value Vs1 multiplied by 600ml as the processing The quantity obtained from the number of pieces of the substrate W of the quantity information. In addition, for example, for the chemical solution processing portion 52 of the second liquid processing portion 6, since the second adjustment value Va12 is 200ml, the processing liquid is supplied in increments of 200ml for each substrate W as the unit processing volume. Volume adjustment. As a result, the supply amount of the processing liquid supplied to the processing tank CB2 of the chemical liquid processing section 52 of the second liquid processing section 6 is shown by the one-dot chain line L2, which can be adjusted along the reference value. The supply amount of the processing liquid shown by the solid line L1 of Vs1 is adjusted by adding 200 ml as the second adjustment value Va12 multiplied by the number of substrates W as the processing amount information.

The mode switching unit 10i can switch the mode between the first liquid supply mode and the second liquid supply mode in accordance with a signal input from the input unit 8 in response to an operator's action, for example. Here, the first liquid supply mode is the mode in which the treatment liquid corresponding to the treatment amount is supplied to the treatment tank CB2 for each chemical solution treatment section 52 as described above. Specifically, in the first liquid supply mode, for example, the following mode can be applied: the calculation unit 10g corresponds to one chemical solution processing unit 52 recognized by the recognition unit 10f based on the numerical information described in the formula The numerical value of the supply amount of the processing liquid per unit processing amount of the substrate W and the processing amount information acquired by the acquisition unit 10e are used to calculate the information about the supply to one chemical liquid processing unit 52 recognized by the recognition unit 10f The value of the supply amount of the processing liquid in the processing tank CB2, and the supply control unit 10h uses the calculation unit The calculated value of 10g, among the one chemical liquid treatment part 52 recognized by the recognition part 10f, the treatment liquid is supplied to the treatment tank CB2 by the liquid supply part SL1. The second liquid supply mode is a mode for supplying a predetermined amount of processing liquid to the processing tank CB2 regardless of the two chemical liquid processing units 52. Specifically, for the second liquid supply mode, for example, the following mode can be applied: the control unit 10 supplies a predetermined amount of processing liquid set in advance via the liquid supply unit SL1 to one chemical solution recognized by the recognition unit 10f The processing tank CB2 of the processing unit 52.

If such a mode switch can be performed, for example, when there is no difference in the results of the processing of the substrate W by each processing tank CB2, the second liquid supply mode can be set to omit each chemical liquid processing The setting of the numerical value of the supply amount of the processing liquid per unit processing amount of the substrate W in the section 52. Thereby, for example, it is possible to reduce the workload of an operator who sets processing conditions by formulating and editing.

<1-4. Actions concerning the supply of processing liquid to the processing tank>

FIG. 8 is a flowchart showing an example of an operation flow related to the supply of the processing liquid to the processing tank CB2. The actions related to the supply of the processing liquid to the processing tank CB2 also include, for example, actions related to the preparation and editing of recipes. This operation flow is realized by, for example, the control unit 10 controlling the operation of each unit of the substrate processing apparatus 100. Here, for example, by performing the processing of steps S1 to S10 in FIG. 8, the operation related to the supply of the processing liquid to the processing tank CB2 is executed.

In step S1, the control unit 10 determines whether to start making and editing the recipe. Here, for example, if the signal used to display the formula input screen does not respond to the operator's action and is input by the input unit 8, then proceed to step S5, if the signal used to display the formula input screen responds to the operator's action, Input by the input section 8, before going Proceed to step S2.

In step S2, the display control unit 10b displays the formula input screen on the display unit included in the output unit 9 based on the information of the formula input screen created by the screen creation unit 10a.

In step S3, the recipe creation unit 10c accepts the input of information such as the description of the information on the recipe input screen based on the signal input by the input unit 8 in response to the action of the operator. At this time, for example, for each of the two chemical liquid processing sections 52 of the first liquid processing section 5 and the second liquid processing section 6, numerical information on the supply amount of processing liquid per unit processing amount of the substrate W can be obtained enter.

In step S4, the control unit 10 determines whether to end the preparation and editing of the recipe. Here, for example, if the signal used to end the formulation and editing of the formula does not respond to the operator's action but is input by the input unit 8, step S3 is returned. If the signal used to end the formulation and editing of the formula responds to the operator's The operation is input by the input unit 8, and the process proceeds to step S5.

In step S5, the control unit 10 stores the recipe created and edited on the recipe input screen in the storage unit 20. Thereby, for example, regarding each of the two chemical liquid processing sections 52 in the first liquid processing section 5 and the second liquid processing section 6, numerical information on the supply amount of processing liquid per unit processing amount of the substrate W is stored于Storage section 20.

In step S6, the control unit 10 determines whether or not it is the time for the medical solution treatment unit 52 to start the medical solution treatment. Here, the control unit 10 can determine whether it is the time to start the chemical liquid treatment, for example, based on the time schedule, and the schedule preparation unit 10d uses the schedule preparation unit 10d according to the recipe specified for the plurality of substrates W to be processed. It is made and stored in the storage unit 20 and the like. Here, if it is not the time to start the chemical solution processing in the chemical solution processing unit 52, the process returns to step S1. On the other hand, if the When the chemical liquid processing by the chemical liquid processing unit 52 is performed, the process proceeds to step S7. At this time, the recipe specified for the plurality of substrates W of one batch as the target of processing can be recognized.

In step S7, the acquisition unit 10e acquires the number of substrates W in one batch as the throughput of the substrate W to be processed in the chemical solution processing unit 52.

In step S8, the recognition unit 10f recognizes one of the two chemical liquid processing units 52 of the first liquid processing unit 5 and the second liquid processing unit 6 for processing the substrate W. Here, the recognition unit 10f can recognize, for example, one processing tank CB2 used in accordance with a time schedule or the like.

In step S9, the calculation unit 10g is based on the numerical information described in the formula specified for a batch of multiple substrates W as the processing target and the chemical solution processing unit recognized in step S8 52 corresponds to the numerical value of the supply amount of the processing liquid per unit processing volume, and the number of substrates W per batch obtained as the processing volume in step S7, to calculate the supply to one chemical liquid processing section 52 The value of the supply amount of the treatment liquid in the treatment tank CB2.

In step S10, the supply control unit 10h supplies the processing liquid to the processing tank CB2 by the liquid supply unit SL1 in the one chemical liquid processing unit 52 recognized in step S8 based on the value calculated in step S9.

With such an operation, for example, for each chemical solution processing section 52, an amount of processing liquid corresponding to the processing amount of the substrate W can be supplied to the processing tank CB2. As a result, for example, waste in the use of the processing liquid, and excessive processing due to excessive supply of the processing liquid are less likely to occur. As a result, for example, in the substrate processing apparatus 100, customization of the processing performed on the substrate W can be easily performed for each processing tank CB2. Therefore, for example, the substrate processing apparatus 100 can easily perform the Customization of the implemented processing.

<1-5. Display state of formula input screen>

Fig. 9 is a diagram showing the schematic configuration of the recipe input screen Sc0. Fig. 10 is a diagram showing a partial reference example of the recipe input part Pr1 in the recipe input screen Sc0. 11 to 22 are diagrams showing examples of parts of the recipe input part Pr1 in the recipe input screen Sc0, respectively.

As shown in FIG. 9, the recipe input screen Sc0 has, for example, an area (also referred to as a recipe display area) Ar0 where information about the recipe is displayed, and an area (also referred to as a button area) Ab0 for a button arrangement for inputting various commands. The recipe display area Ar0 includes, for example, a portion (also called an identification information portion) Pr0 that displays various identification information about the recipe, and a portion that displays and enters the setting items of the recipe and the setting conditions (values, etc.) of each setting item. (Also called the recipe input unit) Pr1.

Here, as shown in FIG. 10, the recipe input part Pr1 includes, for example, a first area Ar1 located at the upper portion and a second area Ar2 located at the lower portion. The first area Ar1, for example, describes the conditions for each of a plurality of setting items (also referred to as the first setting item or header item) that does not depend on the elapse of time in the processing executed in accordance with the recipe. Area (also called head area). The second area Ar2 is, for example, an area in which conditions are described for each of a plurality of setting items (also referred to as second setting items or step items) related to conditions that depend on the passage of time in the process executed in accordance with the recipe (Also known as step area). The plurality of first setting items may include, for example, the lifting speed of the lifter LF2, the etching amount of the substrate W, the treatment conditions of the treatment liquid in the treatment tank CB2, and the presence or absence of bubbling. The plurality of second setting items may include, for example, items such as the supply amount of the chemical solution to the treatment tank CB2 that changes with the passage of time.

Then, for example, the operator can confirm both the first area Ar1 and the second area Ar2 on the recipe input screen Sc0 while continuing to make and edit the recipe. Then, the recipe creation unit 10c can, for example, respond to the operator's action by the input unit 8 according to the signal input, and according to the conditions described for each first setting item on the recipe input screen Sc0, and on the recipe input screen Sc0 Create or edit recipes for the conditions described in each second setting item.

<1-5-1. Expansion and compression of items in the recipe input screen>

However, in recent years, for example, there has been a tendency that more detailed requirements are required for the processing performed on the substrate W. As a result, there is a tendency for the number of first setting items in the first area Ar1 to increase. For example, in the case of bubbling using nitrogen gas for the treatment liquid stored in the treatment tank CB2, there may be an increase in the number of gas tubes for bubbling and the presence or absence of individual gas discharge for each gas tube Wait for individual settings. In this case, the number of first setting items related to blistering in the first area Ar1 may increase. In particular, in recent years, for example, in formulations used for three-dimensional NAND formation, the number of items that should be set in detail for processing conditions will increase, and the number of first setting items in the first area Ar1 will increase significantly. The tendency.

However, for example, as the number of first setting items in the first area Ar1 increases, the proportion of the first area Ar1 in the recipe input screen Sc0 may increase. At this time, in the recipe input screen Sc0, in order to display the first area Ar1 and the second area Ar2 at the same time, for example, although a method of reducing characters in the recipe input screen Sc0 can be considered, the visual recognition of the recipe input screen Sc0 Sex will get worse. As a result, for example, the work of preparing and changing the recipe gradually becomes more difficult.

Therefore, in the first embodiment, for example, as shown in FIGS. 11 to 13 Generally, in the first area Ar1, the plural first setting items can be divided into plural groups, and the display and non-display of the plural first setting items can be switched for each group. Such a display aspect of the first area Ar1 can be realized by, for example, the screen composition data stored in the storage unit 20.

Here, for example, as shown in FIG. 11, in the first area Ar1, a plurality of item groups (also referred to as a first setting item group) each including two or more first setting items among the plural first setting items are set The display elements (also called the first display elements) Dc1~Dc3 of the group name of each of ). Such first display elements Dc1 to Dc3 can be specified by the screen composition data stored in the storage unit 20. In the example in Figure 11, in the first area Ar1, a plurality of first setting items are classified into a group (also called a first group) related to the first setting item of the lifting speed of the lifter LF2, and related The group of the first setting item (also referred to as the second group) of the processing condition of the processing liquid in the processing tank CB2, and the group of other first setting items (also referred to as the third group). In the first area Ar1, for example, the first display element Dc1 related to the group name of the first group, the first display element Dc2 related to the group name of the second group, and the group name related to the third group are displayed The first display element Dc3.

Furthermore, for example, the screen creation unit 10a is configured to respond to the operator's action by a signal input from the input unit 8, and the recipe input screen Sc0 displayed on the display unit included in the output unit 9 can be Set the display status of two or more first setting items included in one of the plural first setting item groups in the display state (also called the expanded state) and the non-display state Switch between (compressed state). With such a configuration, for example, the operator can switch the expansion to display the state of more than 2 first setting items for each group containing more than 2 first setting items, and compress to not display 2 The first setting above Determine the status of the project. By this, for example, even if the number of the plural first setting items in the first area Ar1 increases, the operator can easily perform it while confirming both the first area Ar1 and the second area Ar2 on the recipe input screen Sc0 Make and edit the recipe. Therefore, it is possible to easily execute customization of the processing performed on the substrate W in the substrate processing apparatus 100, for example.

Here, for example, the following configuration can be adopted: various operations on each of the first display elements Dc1 to Dc3 are performed based on a signal input from the input unit 8 in response to the action of the operator, each of the first to third groups The display status of 2 or more first setting items can be switched between the expanded state and the compressed state. Specifically, for example, it can be as follows: as shown in FIG. 11, when the display state of two or more first setting items in the first group is in a compressed state, if the first display element Dc1 is displayed by the mouse When the cursor Mp1 is clicked, as shown in Fig. 12, the display status of the first setting items of more than two in the first group will change from the compressed state to the expanded state. On the other hand, for example, it can be the following state: as shown in FIG. 12, when the display state of two or more first setting items in the first group is in the expanded state, if the first display element Dc1 is displayed by the mouse When the cursor Mp1 is clicked, as shown in Fig. 11, the display state of the first setting item of the first group of more than two will change from the expanded state to the compressed state. In addition, it can be the following state: as shown in Figure 11, when the display state of two or more first setting items in the second group is in the compressed state, if the first display element Dc2 is selected by the mouse cursor Mp1 Click, as shown in Figure 13, the display status of the 2 or more first setting items in the second group will change from the compressed state to the expanded state. On the other hand, for example, it may be the following state: as shown in FIG. 13, when the display state of two or more first setting items in the second group is in the expanded state, if the first display element Dc2 is displayed by the mouse When the cursor Mp1 is clicked, as shown in Figure 11, the first setting item of 2 or more in the second group The display state of the project will change from the expanded state to the compressed state. Also, for example, it can be the following state: as shown in FIG. 11, when the display state of two or more first setting items in the third group is in the compressed state, if the first display element Dc3 is moved by the mouse cursor Mp1 Click, although the illustration is omitted, the display status of the 2 or more first setting items in the third group will change from the compressed state to the expanded state. On the other hand, it can be the following state: when the display state of 2 or more first setting items in the third group is in the expanded state, if the first display element Dc3 is clicked by the mouse cursor Mp1, as shown in Figure 11 As shown, the display status of the first setting items of more than two items in the third group will change from the expanded state to the compressed state.

Here, for example, as shown in FIGS. 11 to 13, if each of the plurality of first display elements Dc1 to Dc3 is displayed in a manner that can be distinguished from the plurality of first setting items, the operation The workability of the staff can be improved. Specifically, it may be the following aspect: each of the plurality of first display elements Dc1 to Dc3 is displayed in a different color from the display elements of the plurality of first setting items. Furthermore, as shown in FIGS. 11 to 13, for example, each of the plurality of first display elements Dc1 to Dc3 may be marked with a first mark Mk1 indicating a compressed state or a second mark Mk2 indicating an expanded state. Here, for example, as shown in FIG. 13, the plural first setting items described as 0 as the setting conditions are in a state where the plural first setting items are not used in the chemical solution treatment. Therefore, for example, the first setting item described as 0 as the setting condition and the first setting item other than 0 as the setting condition can also be distinguished visually such as by color. display.

In addition, here, for example, the following configuration may also be adopted: based on a signal input from the input unit 8 in response to an operator's action, the screen creation unit 10a displays certain information on each of the first display elements Dc1 to Dc3 . For example, as shown in Figure 14, The number of the first setting items included in the group can be indicated for each of the first display elements Dc1~Dc3, and the reason for grouping can also be indicated.

However, in the recipe input screen Sc0, for example, the button to save the recipe contained in the button area Ab0 is pressed by the mouse cursor Mp1, and the recipe folder described in the recipe display area Ar0 will be The recipe preparation unit 10c is stored in the storage unit 20. Here, for example, when the folder related to the recipe is stored in the storage unit 20, the recipe creation unit 10c checks whether there is a setting item (also referred to as an error item) describing the setting condition with an error, and the screen creation unit 10a is used to report the element (also known as the first error notification element) that has caused a setting error to be displayed on the recipe input screen on the recipe input screen. Here, as the description of the wrong setting condition, for example, the setting item with respect to the speed of the lifter LF2 exceeds the upper limit value corresponding to the type of the treatment liquid, and the simultaneous input of acid and alkali. As the display of the first error notification element, for example, as shown in Figs. 15 and 16, the display of the pop-up window Em0 to notify the error, the color classification of the error item, etc. can be visually recognized. The display below and the color classification of the first display element Dc1 of the group to which the error item belongs can be visually recognized.

<1-5-2. Movement of items in the recipe input screen>

However, for example, each user has different requirements for the high precision of the processing performed on the substrate W. For example, in the stage of developing a product using the substrate W, there is a high demand for testing the substrate W by slightly changing the processing. In such a situation, a request such as the following may be generated: I want to change the first setting item (head item) regarding the condition that does not depend on the elapse of time in the processing executed in accordance with the recipe More about the second setting item (step item) of the condition that depends on the passage of time in the process executed in accordance with the recipe. On the other hand, for example, even in the stage of developing a product using the substrate W, there may be cases where a request to change the second setting item (step item) to the first setting item (head item) may be generated. Also, for example, at the stage of mass production of products that want to use the substrate W, setting items that become the same setting conditions every day may increase, and the second item (step item) is to be changed to the first item (head item) ) Requirements.

However, if the recipe input screen Sc0 of the substrate processing apparatus 100 is customized for each user and shipped in order to respond to all such contrary requests, the manufacturing and shipping steps of the substrate processing apparatus 100 will be significantly complicated.化. Furthermore, even if it is assumed that the recipe input screen Sc0 of the substrate processing apparatus 100 can be customized for each user and shipped, it is still unable to completely correspond to all the changes in requirements corresponding to the usage conditions of the substrate processing apparatus 100.

Therefore, in the first embodiment, for example, as shown in FIGS. 17 to 22, the recipe input screen Sc0 can be set between the first area (head area) Ar1 and the second area (step area) Ar2 Movement of the project.

Here, for example, the screen creation unit 10a can, based on the signal input from the input unit 8 in response to the action of the operator, in the recipe input screen Sc0, set one or more of the first setting items in the first area Ar1 1 The setting item is changed to one or more of the second setting items in the second area Ar2. In addition, for example, the screen creation unit 10a can set one or more of the second setting items in the second area Ar2 in the recipe input screen Sc0 based on the signal input from the input unit 8 in response to the action of the operator. The setting item is changed to one or more first setting items so as to be included in the plural first setting items in the first area Ar1. Jotze With such a configuration, for example, the operator can arbitrarily replace the setting items between a plurality of first setting items and a plurality of second setting items. With this, for example, the operator can make a formula that specifies the required conditions. As a result, for example, the operator can make the substrate processing apparatus 100 execute the processing of the substrate W under the required conditions. Therefore, it is possible to easily execute customization of the processing performed on the substrate W in the substrate processing apparatus 100, for example.

For example, it can be as follows: as shown in Figure 17, in the recipe input screen Sc0, by aligning the mouse cursor Mp1 and pressing the left mouse button, it is displayed in the first area Ar1 The drag operation of moving one of the plurality of first setting items, and the dropping operation of releasing the left button of the mouse, and as shown in Figure 18, move it to The second area Ar2 becomes the second setting item. On the other hand, for example, it can be the following state: as shown in Figure 19, in the recipe input screen Sc0, by aligning the mouse cursor Mp1 and pressing the left button of the mouse, it is displayed on The drag operation of moving one of the second setting items in the second area Ar2 and the dropping operation of releasing the left mouse button, and move it to The first area Ar1 becomes the first setting item.

Also, for example, the following aspect may also be adopted: as shown in FIG. 17, in the recipe input screen Sc0, aim the mouse cursor Mp1 at one of the plurality of first setting items displayed in the first area Ar1 By left-clicking the first setting item, the one first setting item is moved to the second area Ar2 as shown in FIG. 18 to make it the second setting item. Also, for example, the following aspect can also be adopted: as shown in FIG. 19, in the recipe input screen Sc0, aim the mouse cursor Mp1 at one of the second setting items displayed in the second area Ar2 Left click the second setting item to move the 1 second setting item to the first area as shown in Figure 20 Ar1, making it the first setting item.

Here, for example, the screen creation unit 10a may also prohibit one or more predetermined first setting items set in advance among the plural first setting items in the first area Ar1 to be included in the plural first setting items in the second area Ar2 The mode of the second setting item is changed to one or more second setting items. The rule for prohibiting the change from the first setting item to the second setting item can be specified by, for example, the screen composition data stored in the storage unit 20. Here, for example, when it is impossible to change the bubbling conditions of the processing liquid stored in the processing tank CB2 using nitrogen gas according to the passage of time, or when it is impossible to individually set each of the plural gas pipes. The first setting item of bubbling can be set to more than one preset first setting item. If such a configuration is adopted, for example, it is possible to prohibit the change to the second setting item of the condition dependent on the passage of time for the established first setting item for which the condition dependent on the passage of time cannot be set. In this way, for example, it is possible to avoid the bad situation of the operator making a prescription that cannot be executed.

In addition, here, for example, the screen creation unit 10a changes one or more predetermined first setting items to the second setting in the recipe input screen Sc0 based on the signal input from the input unit 8 in response to the operator's action In the case of the operation of the item, as shown in Figure 21, on the recipe input screen, the element (also called the second error notification element) Em1 for the situation where the movement of the item for reporting the error is specified is displayed.

Also, here, for example, as shown in FIG. 22, the two or more first setting items in the first area Ar1 may be changed to two or more second setting items in the second area Ar2 in a group unit. .

Here, for example, assume the following situation: In the recipe input screen Sc0, the first area Ar1 contains two of the plural first setting items respectively. The first display elements Dc1~Dc3 related to the group name of each of the plural first setting item groups of the above first setting item exist. In this case, for example, the screen creation unit 10a may also assign the first setting item group to each of the plurality of first setting item groups according to the signal input from the input unit 8 in response to the operator's action. The two or more first setting items in the area Ar1 are changed to two or more second setting items so as to be included in the plural second setting items in the second area Ar2. For example, it can be as follows: as shown in Fig. 22, in the recipe input screen Sc0, by aligning the mouse cursor Mp1 and pressing the left button of the mouse, it is displayed on the first 1 of the plural first display elements Dc1~Dc3 in the area Ar1. Drag and drop one of the first display elements Dc2 to move, and release the drop operation of the left mouse button to move to the second area Ar2, With this, the first setting item of more than two belonging to the second group is set to the second setting item of more than two. With such a structure, for example, the operator can efficiently replace the first setting items that set conditions that are not dependent on the passage of time and the multiple second setting items that set the conditions that depend on the passage of time. Set items.

<2. Modifications>

The present invention is not limited to the above-mentioned embodiment, and various changes, improvements, etc. can be made without departing from the spirit of the present invention.

In the first embodiment described above, the unit throughput of the substrate W is not limited to the predetermined number of sheets, and may be a value corresponding to other indexes such as a predetermined weight. For example, if the unit throughput of the substrate W is a predetermined weight, the sensor unit 11m can also be used to measure the weight of a plurality of substrates W constituting one batch, and the calculation unit 10g can be used to sense The weight measured by the device part 11m and related Calculate the supply volume of the processing liquid by the value of the weight of the processing liquid supply. In addition, the values corresponding to other indexes, for example, can be applied to the unit time (also referred to as unit processing time) of the time during which the substrate W is processed by the chemical solution. In this case, the supply amount of the processing liquid can be calculated, for example, based on the value of the supply amount of the processing liquid per unit processing time, which is the unit processing amount of the substrate W, and the total time of the chemical liquid treatment performed on the substrate W .

In the above-mentioned first embodiment, for example, the recipe may specify the respective timing of supplying the processing liquid to each processing tank CB2 by the liquid supply part SL1. With such a configuration, for example, the amount of processing liquid corresponding to the processing volume of the substrate W can be supplied for each chemical liquid processing section 52 at appropriate timings such as pretreatment, main processing, and post-processing of the chemical liquid processing. To the processing tank CB2.

In the first embodiment described above, for example, when the supply amount per unit time of the processing liquid from the liquid supply portion SL1 toward the processing tank CB2 is fixed, the amount of processing liquid per unit processing amount of the substrate W described in the recipe The value V1a, V1b of the supply amount and the reference value Vs1 and the adjustment value Va1 of the supply amount of the processing liquid per unit processing amount of the substrate W contained in the numerical information described in a recipe, and the supply of the processing liquid can also be applied time.

In the above-mentioned first embodiment, although the substrate processing apparatus 100 has two chemical solution processing parts 52 having the same configuration, it may have, for example, three or more chemical solution processing parts 52 having the same configuration.

In the above-mentioned first embodiment, although the recipe is made in the substrate processing apparatus 100, for example, a configuration in which the recipe is sent from an external device that is communicably connected to the substrate processing apparatus 100 may be adopted.

In the above-mentioned first embodiment, for example, regarding the recipe input screen Various configurations of the conversion between the compressed state and the expanded state of two or more setting items in each group in Sc0, and the change of the items between the first setting item and the second setting item in the recipe input screen Sc0, It is not limited to the batch type substrate processing apparatus 100, and can also be applied to a single-chip type substrate processing apparatus.

Of course, it is also possible to combine all or a part of the above-mentioned one embodiment and various modifications as appropriate within a range that does not cause contradictions.

10: Control Department

10a: Screen Production Department

10b: Display control section

10c: Recipe Production Department

10d: Schedule Production Department

10e: Acquisition Department

10f: Identification Department

10g: Calculation part

10h: Supply control department

10i: Mode switching unit

Claims (12)

A substrate processing device is provided with: Two or more chemical liquid processing parts, each of which has a processing tank for processing the substrate using the stored processing liquid, and a liquid supply part for supplying the processing liquid to the processing tank; A storage section for storing numerical information about the supply amount of processing liquid per unit processing amount of the substrate for each of the above-mentioned chemical liquid processing sections; and Control department; and The control unit has: An acquisition unit, which acquires processing volume information of the processing volume of the substrate to be processed; Recognition part, which recognizes one of the above two or more chemical liquid processing parts for processing the substrate; The calculation section is based on the numerical value of the supply amount of the processing liquid per unit processing amount of the substrate corresponding to the one chemical liquid processing section recognized by the recognition section in the numerical information, and the value obtained by the acquisition section The obtained processing volume information is used to calculate the numerical value of the supply volume of the processing liquid supplied to the processing tank of the one chemical liquid processing section; and A supply control unit for supplying the treatment liquid to the treatment tank through the liquid supply unit in the one chemical solution treatment unit based on the value calculated by the calculation unit. The substrate processing apparatus according to claim 1, wherein it is further provided with a sensor unit for measuring the processing amount of the substrate, and The acquisition unit acquires the processing amount information based on the measurement result of the sensor unit. Such as the substrate processing apparatus of claim 1 or 2, wherein, The storage unit stores a formula containing the numerical information and specifying processing conditions. Such as the substrate processing apparatus of claim 3, wherein: The above-mentioned numerical information includes the reference value of the supply amount of the processing liquid per unit processing amount of the substrate relative to the above two or more chemical liquid processing sections, and relative to at least one of the above two or more chemical liquid processing sections The adjustment value of the supply volume of the processing liquid per unit processing volume of the substrate in the chemical liquid processing section, and The calculation unit is based on the reference value in the numerical information, the adjustment value corresponding to the one chemical treatment unit recognized by the recognition unit, and the processing amount information obtained by the acquisition unit. Calculate the numerical value related to the supply amount of the processing liquid supplied to the processing tank in the one chemical liquid processing section. Such as the substrate processing apparatus of claim 3, wherein: The above formula defines the timing of supplying the processing liquid to the processing tank by the liquid supply unit. Such as the substrate processing apparatus of claim 3, wherein it is further provided with an input unit that inputs a signal in response to a user's action, and The control unit further has a recipe preparation unit that, based on the signal input from the input unit in response to the user's action, calculates the information contained in the numerical value information about each of the two or more liquid medicine processing units. The numerical value of the supply amount of the processing liquid per unit processing amount of the substrate is described in the above formula, so as to create or edit the above formula. Such as the substrate processing apparatus of claim 1 or 2, wherein it is further provided with an input unit that inputs a signal in response to a user's action, and The control unit further has a mode switching unit that switches the mode between the first liquid supply mode and the second liquid supply mode based on a signal input from the input unit in response to a user's action, The above-mentioned first liquid supply mode is the following mode: the above-mentioned calculation unit is based on the above-mentioned numerical value In the information, the numerical value of the supply volume of the processing liquid per unit processing volume of the relevant substrate corresponding to the above-mentioned one chemical liquid processing part recognized by the above-mentioned recognition unit, and the above-mentioned processing volume information acquired by the acquisition unit, To calculate the numerical value related to the supply amount of the treatment liquid supplied to the treatment tank of the above-mentioned one chemical liquid treatment section, and the above-mentioned supply control section uses the numerical value calculated by the above-mentioned calculation section in the above-mentioned one chemical liquid treatment section. The processing liquid is supplied to the processing tank through the liquid supply unit, The second liquid supply mode is a mode in which the control unit supplies a preset amount of treatment liquid through the liquid supply unit to the treatment tank of the one liquid chemical treatment unit recognized by the recognition unit . Such as the substrate processing apparatus of claim 6, wherein it is further provided with a display unit, The aforementioned control unit further has: The screen production department, which produces the information of the formula input screen used to create or edit the above formula; and A display control unit for displaying the formula input screen on the display unit; and The above formula input screen includes the first area and the second area, The first area includes an area for describing conditions for each of a plurality of first setting items that are not dependent on the elapse of time in the processing performed in accordance with the above recipe, The second area includes an area for describing conditions for each of a plurality of second setting items related to conditions that depend on the passage of time in the processing executed in accordance with the above recipe, The recipe creation section is based on the signal input from the input section in response to the user’s actions, and based on the conditions described in the recipe input screen for each of the first setting items, and on the recipe input screen. 2nd setting item State the conditions to create or edit the above formula, Based on the signal input by the input unit in response to the user's action, the screen creation unit will set one or more of the first setting items in the first area in the recipe input screen , Change to one or more of the second setting items of the plurality of second setting items in the second area, and according to the signal input by the input part in response to the user's action, in the formula input screen, Change one or more of the second setting items of the plurality of second setting items in the second area to one or more first setting items to include the plural first setting items in the first area project. Such as the substrate processing apparatus of claim 8, wherein The above-mentioned screen creation unit prohibits one or more predetermined first setting items from among the plural first setting items in the first area to be included in the plural second setting items in the second area The method is changed to more than one second setting item. Such as the substrate processing apparatus of claim 8, wherein In the above-mentioned recipe input screen, in the above-mentioned screen creation section, there is a group of each of the plural first setting item groups including two or more first setting items related to the plural first setting items in the first area When the first display element of the group name exists, based on the signal input from the input unit in response to the user's action, for each of the plurality of first setting item groups, the above The above two or more first setting items in 1 area are changed to two or more second setting items so as to be included in the plural second setting items in the second area. Such as the substrate processing apparatus of claim 6, wherein it is further provided with a display unit, The aforementioned control unit further has: The screen production department, which produces the information of the formula input screen used to create or edit the above formula; and A display control unit for displaying the formula input screen on the display unit; and The above formula input screen includes the first area and the second area, The first area includes an area for describing conditions for each of a plurality of first setting items that are not dependent on the elapse of time in the processing performed in accordance with the above recipe, The second area includes an area for describing conditions for each of a plurality of second setting items related to conditions that depend on the passage of time in the processing executed in accordance with the above recipe, The recipe creation section is based on the signal input from the input section in response to the user’s actions, and based on the conditions described in the recipe input screen for each of the first setting items, and on the recipe input screen. Create or edit the above formula based on the conditions described in the second setting item, In the above-mentioned first area, there is a first display element containing the group name of each of the plural first setting item groups of two or more of the plural first setting items. The screen creation unit, based on the signal input from the input unit in response to the user's action, will select one of the plurality of first setting item groups in the formula input screen displayed on the display unit The display state of the above two or more first setting items included in the group can be switched between the expanded state that is displayed and the compressed state that is not displayed. A substrate processing method is provided with a processing tank for processing a substrate using a stored processing liquid, and a processing tank for supplying processing liquid to the processing tank. The substrate processing method of a substrate processing device with two or more chemical liquid processing sections of the liquid supply section has the following steps: (a) For each of the above-mentioned chemical liquid processing sections, the step of storing numerical information about the supply amount of processing liquid per unit processing amount of the substrate in the storage section; (b) The step of obtaining the throughput of the substrate to be processed; (c) Identify the steps of one of the above two or more liquid chemical processing parts used to process the substrate; (d) Based on the above numerical information, the numerical value related to the supply amount of the treatment liquid per unit treatment volume corresponding to the above-mentioned one chemical liquid treatment part recognized in the above step (c), and the value in the above step (b) The step of calculating the value of the supply amount of the treatment liquid supplied to the treatment tank of the above-mentioned one chemical liquid treatment section by the obtained treatment amount; and (e) A step of supplying the treatment liquid to the treatment tank through the liquid supply unit in the one chemical liquid treatment section based on the value calculated in the step (d).

Images