TWI815989B - 著色硬化性樹脂組成物、彩色濾光片、顯示元件及固體攝像元件 - Google Patents

著色硬化性樹脂組成物、彩色濾光片、顯示元件及固體攝像元件 Download PDF

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Publication number
TWI815989B
TWI815989B TW108139995A TW108139995A TWI815989B TW I815989 B TWI815989 B TW I815989B TW 108139995 A TW108139995 A TW 108139995A TW 108139995 A TW108139995 A TW 108139995A TW I815989 B TWI815989 B TW I815989B
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TW
Taiwan
Prior art keywords
group
formula
acid
mass
carbon atoms
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TW108139995A
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English (en)
Chinese (zh)
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TW202024174A (zh
Inventor
竹田紘也
岡本信之
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日商住友化學股份有限公司
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Publication of TW202024174A publication Critical patent/TW202024174A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/062—Polyethers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Architecture (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
TW108139995A 2018-11-14 2019-11-05 著色硬化性樹脂組成物、彩色濾光片、顯示元件及固體攝像元件 TWI815989B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2018213509 2018-11-14
JP2018-213509 2018-11-14
JP2019088862A JP7292963B2 (ja) 2018-11-14 2019-05-09 着色硬化性樹脂組成物
JP2019-088862 2019-05-09

Publications (2)

Publication Number Publication Date
TW202024174A TW202024174A (zh) 2020-07-01
TWI815989B true TWI815989B (zh) 2023-09-21

Family

ID=70906611

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108139995A TWI815989B (zh) 2018-11-14 2019-11-05 著色硬化性樹脂組成物、彩色濾光片、顯示元件及固體攝像元件

Country Status (4)

Country Link
JP (1) JP7292963B2 (ja)
KR (1) KR20210090620A (ja)
CN (1) CN113166338B (ja)
TW (1) TWI815989B (ja)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006003860A (ja) * 2003-11-26 2006-01-05 Nippon Steel Chem Co Ltd 感光性樹脂組成物及びそれを用いたカラーフィルター

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200530281A (en) * 2003-11-26 2005-09-16 Nippon Steel Chemical Co Photosensitive resin composition and color filter using the same
JP4570999B2 (ja) 2004-03-30 2010-10-27 新日鐵化学株式会社 感光性樹脂組成物及びそれを用いたカラーフィルター
TWI349677B (en) * 2004-03-30 2011-10-01 Nippon Steel Chemical Co Photosensitive resin composition and color filter using the same
JP4508924B2 (ja) 2005-03-29 2010-07-21 新日鐵化学株式会社 感光性樹脂組成物及びそれを用いたカラーフィルター
JP6463624B2 (ja) 2014-12-08 2019-02-06 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 化合物
JPWO2018211890A1 (ja) 2017-05-19 2020-03-26 ナガセケムテックス株式会社 アルカリ可溶性樹脂

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006003860A (ja) * 2003-11-26 2006-01-05 Nippon Steel Chem Co Ltd 感光性樹脂組成物及びそれを用いたカラーフィルター

Also Published As

Publication number Publication date
JP7292963B2 (ja) 2023-06-19
CN113166338B (zh) 2023-12-26
CN113166338A (zh) 2021-07-23
KR20210090620A (ko) 2021-07-20
JP2020084169A (ja) 2020-06-04
TW202024174A (zh) 2020-07-01

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