TWI815466B - 光學薄膜及其製造方法、偏光板、以及影像顯示裝置 - Google Patents
光學薄膜及其製造方法、偏光板、以及影像顯示裝置 Download PDFInfo
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Abstract
光學薄膜於透明薄膜基材之表面具備易滑層。易滑層含有黏結劑樹脂及微粒子。易滑層之鹼成分含量為5~75ppm。藉由將易滑層形成用組成物塗佈於透明薄膜基材上並加熱可形成易滑層,該易滑層形成用組成物含有黏結劑樹脂或其前驅物質、微粒子、鹼成分及溶劑。光學薄膜可作為偏光件保護薄膜使用。
Description
本發明涉及一種於透明薄膜基材表面具備易滑層之光學薄膜及其製造方法。並且,本發明涉及一種於偏光件表面貼合有具備易滑層之光學薄膜的偏光板、及具備該偏光板之影像顯示裝置。
發明背景
現已廣泛使用液晶顯示裝置或有機EL顯示裝置作為行動機器、汽車導航裝置、個人電腦用監視器、電視機等各種影像顯示裝置。液晶顯示裝置基於其顯示原理,在液晶單元之視辨側表面配置有偏光板。在透射型液晶顯示裝置,則是在液晶單元兩面配置有偏光板。在有機EL顯示裝置為了防止外光被金屬電極(陰極)反射而看似鏡面,有時會於視辨側表面配置圓偏光板(典型上為偏光板與1/4波長板之積層體)。
偏光板一般會在偏光件之單面或兩面具備透明薄膜(偏光件保護薄膜),其目的在於保護偏光件等。如今多廣泛使用使聚乙烯醇(PVA)系薄膜吸附有碘並藉由延伸等使分子進行定向者作為偏光件。
就貼合在偏光件表面之偏光件保護薄膜而言,貼合有由丙烯酸、聚酯、聚碳酸酯、環狀聚烯烴等樹脂材料所構成之低透濕薄膜的偏光板,即使長時間曝露在高濕環境下,光學特性之變化依舊很小,有耐久性優異的傾向。專利文獻1中有記載,於丙烯酸系薄膜表面設置含有微粒子及黏結劑樹脂的易滑層,可抑制將薄膜捲取成捲狀時的黏結。在專利文獻1之實施例中揭示了一種偏光件保護薄膜,該偏光件保護薄膜於丙烯酸系薄膜表面設有含有1~7重量%之二氧化矽微粒子且平均厚度400nm(厚度範圍300~500nm)的胺甲酸乙酯樹脂層。
先前技術文獻
專利文獻
專利文獻1:日本專利第5354733號
發明概要
發明欲解決之課題
在影像顯示裝置朝大型化或高亮度化進展之中,針對構成影像顯示裝置之偏光板亦變得要求即使在嚴峻環境(譬如較高溫、高濕之條件)下,光學特性之變化依舊很小。但如今已確認有一項新課題:具備專利文獻1中所揭示之偏光件保護薄膜的偏光板若長時間暴露在高濕度環境下,會產生筋條狀不均等光學缺陷,招致顯示特性降低的情況。
有鑑於上述課題,本發明目的在於提供一種不易產生黏結且即使長時間曝露在高溫高濕環境下也不易產生光學缺陷的光學薄膜。
用以解決課題之手段
有鑑於上述課題,本發明人等研討的結果發現,在提升微粒子之分散性等目的下添加至易滑層形成用組成物中之氨或胺等鹼成分殘留在易接著層中的情況係加濕環境下耐久性降低之原因之一,並且發現藉由將易滑層中之鹼殘量制定在預定範圍內,可解決上述課題。
本發明涉及一種於透明薄膜基材之表面具備易滑層之光學薄膜及其製造方法。易滑層含有黏結劑樹脂及微粒子。微粒子之平均一次粒徑譬如為10~250nm,宜為10~100nm。易滑層之鹼成分含量宜為5~75ppm。易滑層之厚度宜為40~280nm。
透明薄膜基材可使用丙烯酸系薄膜等。易滑層之黏結劑樹脂則可使用胺甲酸乙酯系樹脂等。易滑層中之微粒子含量宜為3~50重量%左右,較宜為10~50重量%。易滑層之微粒子可埋設在透明薄膜基材中。
於透明薄膜基材之表面塗佈易滑層形成用組成物並加熱而形成易滑層。易滑層形成用組成物含有黏結劑樹脂或其前驅物質、微粒子、鹼成分及溶劑。藉由使易滑層形成用組成物含有鹼成分,可提升微粒子之分散性,獲得平滑性優異的光學薄膜。而且,鹼成分亦可作為促進黏結劑樹脂(前驅物)反應之觸媒起作用。從利用加熱來促進鹼成分揮發的觀點來看,鹼成分之沸點宜為150℃以下。鹼成分可舉胺或氨等。
藉由提高塗佈易滑層形成用組成物後的加熱溫度,可促進鹼成分揮發而形成殘留鹼成分少的易滑層。舉例而言,可在比透明薄膜基材之玻璃轉移溫度高10℃以上的溫度下加熱易滑層形成用組成物。藉由提高加熱溫度,便可輕易形成易滑層之微粒子埋設在透明薄膜基材之區域,而透明薄膜基材與易滑層之密著性有提升的傾向。
於透明薄膜基材上塗佈易滑層形成用組成物後,亦可在加熱透明薄膜基材的同時進行延伸。尤其,藉由在比透明薄膜基材之玻璃轉移溫度高10℃以上之溫度下加熱易滑層形成用組成物的同時,將透明薄膜基材予以延伸,有使透明薄膜基材與易滑層之密著性提升的傾向。
易滑層亦有助於提升與其他薄膜或玻璃基板等的接著性。光學薄膜譬如可作為偏光件保護薄膜使用。舉例而言,於聚乙烯醇系偏光件表面透過接著劑層貼合光學薄膜,可製得偏光板。光學薄膜可將易接著層形成面及易接著層非形成面中之任一面與偏光件貼合。於液晶顯示單元或有機EL單元等影像顯示單元之表面配置偏光板,可形成影像顯示裝置。
發明效果
本發明之光學薄膜接著性佳,不易產生黏結,且即使長時間曝露在高溫高濕環境下也不易產生光學缺陷,可適宜作為偏光件保護薄膜等顯示裝置用薄膜使用。
用以實施發明之形態
圖1係顯示本發明一實施形態之光學薄膜之構成例的概略截面圖。光學薄膜1於薄膜基材11之至少一面具備易滑層15。亦可在薄膜基材兩面設有易滑層。光學薄膜係用來與其他薄膜或玻璃基板等貼合。
就光學薄膜之使用形態而言,可舉偏光件保護薄膜。圖2A及圖2B係顯示具備作為偏光件保護薄膜之光學薄膜1的偏光板之構成例的截面圖。圖2A中所示偏光板100及圖2B中所示偏光板101於偏光件5之一面(第一主面)具備光學薄膜1,該光學薄膜1係透過接著劑層6而貼合。在偏光板100中,光學薄膜1在與薄膜基材11之偏光件5的貼合面具有易滑層15。在圖2B所示之偏光板101中,係在光學薄膜1之未設置易滑層15之面貼合有偏光件5。在圖2A所示之偏光板100及圖2B所示之偏光板101中,於偏光件5之另一面(第二主面)透過接著劑層7貼合有透明保護薄膜2。
[光學薄膜]
光學薄膜1於薄膜基材11之至少一面具備易滑層15。
<薄膜基材>
薄膜基材11宜為透明薄膜。透明薄膜基材之全光線透光率宜為80%以上,85%以上較佳,90%以上更佳。構成薄膜基材11之樹脂材料可舉丙烯酸系樹脂、聚酯系樹脂、聚碳酸酯系樹脂、聚烯烴系樹脂、環狀聚烯烴系樹脂、聚苯乙烯系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂等。光學薄膜作為光學各向同性之偏光件保護薄膜使用時,因雙折射小,所以薄膜基材11之樹脂材料宜為丙烯酸系樹脂或環狀聚烯烴系樹脂,且以丙烯酸系樹脂尤佳。
環狀聚烯烴系樹脂可舉如聚降莰烯。環狀聚烯烴系樹脂之市售物可舉日本ZEON製造之Zeonor及ZEONEX、JSR製造之ARTON、三井化學製造之APEL、TOPAS ADVANCED POLYMERS製造之TOPAS等。環狀聚烯烴系薄膜宜為含有50重量%以上環狀烯烴系樹脂者。
丙烯酸系樹脂可舉:聚甲基丙烯酸甲酯等聚(甲基)丙烯酸酯、甲基丙烯酸甲酯-(甲基)丙烯酸共聚物、甲基丙烯酸甲酯-(甲基)丙烯酸酯共聚物、甲基丙烯酸甲酯-丙烯酸酯-(甲基)丙烯酸共聚物、(甲基)丙烯酸甲酯-苯乙烯共聚物(MS樹脂等)、具有脂環族烴基之聚合物(例如甲基丙烯酸甲酯-甲基丙烯酸環己酯共聚物、甲基丙烯酸甲酯-(甲基)丙烯酸降莰酯共聚物等)。
本說明書中,「(甲基)丙烯酸」意指丙烯酸及/或甲基丙烯酸。丙烯酸系樹脂包含以丙烯酸或其衍生物作為構成單體成分者及以甲基丙烯酸或其衍生物作為構成單體成分者。
丙烯酸系樹脂亦可使用日本特開2006-283013號公報、日本特開2006-335902號公報、日本特開2006-274118號公報等中記載之具有戊二酸酐結構的丙烯酸系樹脂;及/或日本特開2000-230016號公報、日本特開2001-151814號公報、日本特開2002-120326號公報、日本特開2002-254544號公報、日本特開2005-146084號公報等中記載之具有內酯環結構的丙烯酸系樹脂。具有戊二酸酐結構之丙烯酸系樹脂及具有內酯環結構之丙烯酸系樹脂具有高耐熱性、高透明性及高機械強度,所以適合用來製造偏光度高且耐久性優異的偏光板。
薄膜基材11為丙烯酸系薄膜時,薄膜基材中之丙烯酸系樹脂含量宜為50重量%以上,60~98重量%較佳,70~97重量%更佳。丙烯酸系薄膜亦可含有丙烯酸系樹脂以外之熱塑性樹脂。譬如,藉由摻混其他熱塑性樹脂,可消除丙烯酸系樹脂之雙折射而獲得光學各向同性優異的丙烯酸系薄膜。另,為了提升薄膜之機械強度等,亦可摻混丙烯酸系樹脂以外之熱塑性樹脂。
丙烯酸系樹脂以外之熱塑性樹脂可舉烯烴系聚合物、鹵化乙烯系聚合物、聚苯乙烯、苯乙烯與丙烯酸系單體之共聚物、聚酯、聚醯胺、聚縮醛、聚碳酸酯、聚伸苯醚、聚伸苯硫、聚醚醚酮、聚碸、聚醚碸、聚氧苯甲酯(polyoxybenzylene)、聚醯胺醯亞胺、橡膠系聚合物等。
薄膜基材11亦可含有抗氧化劑、穩定劑、補強材、紫外線吸收劑、阻燃劑、抗靜電劑、著色劑、充填劑、塑化劑、滑劑、填料等添加劑。亦可將樹脂材料與添加劑等混合,預先做成丸粒等熱塑性樹脂組成物後再予以薄膜化。
薄膜基材11之厚度為5~200μm左右。從機械強度、透明性及處置性等觀點來看,薄膜基材11之厚度宜為10~100μm,15~60μm較佳。
薄膜基材11之玻璃轉移溫度Tg宜為100℃以上,110℃以上較佳。薄膜基材11為丙烯酸系薄膜時,如前述,藉由使用具有戊二酸酐結構之丙烯酸系樹脂或具有內酯環結構之丙烯酸系樹脂作為丙烯酸系樹脂,可提高丙烯酸系薄膜之Tg,並可提升耐熱性。薄膜基材11之Tg上限並無特別限定,但由成形性等觀點則宜為170℃以下。
薄膜基材11之製造方法可舉溶液澆鑄法、熔融擠製法、砑光法、壓縮成形法等。薄膜基材11可為未延伸薄膜及延伸薄膜中任一者。薄膜基材11為丙烯酸系薄膜時,基於提升機械強度之觀點,丙烯酸系薄膜宜為至少朝1方向延伸之延伸薄膜,且以雙軸延伸薄膜尤佳。藉由摻混其他熱塑性樹脂以消除丙烯酸系樹脂之雙折射,可獲得即使將之予以延伸後延遲依舊小且光學各向同性優異的丙烯酸系薄膜。
<易滑層>
設置在薄膜基材11之表面的易滑層15含有黏結劑樹脂及微粒子。藉由易滑層15含有微粒子,可於易滑層15之表面形成微細凹凸,提升薄膜之平滑性。所以,有助於減少光學薄膜1以滾筒輸送時受損或是抑制捲取成卷狀時沾黏。
(黏結劑樹脂)
從與丙烯酸系薄膜等薄膜基材之密著性優異的觀點來看,黏結劑樹脂可使用聚胺甲酸乙酯樹脂、環氧樹脂、異氰酸酯樹脂、聚酯樹脂、分子中含有胺基之聚合物類、具有唑啉基等交聯性官能基之丙烯酸樹脂等具有反應性基的樹脂(聚合物)。易滑層15之黏結劑樹脂以聚胺甲酸乙酯樹脂尤佳。含有聚胺甲酸乙酯樹脂黏結劑的易滑層15與薄膜基材11之密著性很高。
胺甲酸乙酯樹脂代表上為多元醇與聚異氰酸酯之反應生成物。多元醇成分宜使用聚丙烯醯多元醇、聚酯多元醇、聚醚多元醇等高分子多元醇。
聚丙烯醯多元醇代表上可藉由(甲基)丙烯酸酯與含羥基之單體聚合而得。(甲基)丙烯酸酯可舉如(甲基)丙烯酸甲酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸環己酯等。含羥基之單體可舉(甲基)丙烯酸2-羥乙酯、(甲基)丙烯酸2-羥丙酯、(甲基)丙烯酸3-羥丙酯、(甲基)丙烯酸2-羥丁酯、(甲基)丙烯酸4-羥丁酯、(甲基)丙烯酸2-羥戊酯等(甲基)丙烯酸之羥烷酯;甘油、三羥甲丙烷等多元醇之(甲基)丙烯酸單酯;N-羥甲基(甲基)丙烯醯胺等。
聚丙烯醯多元醇亦可含有上述以外之單體成分。其他單體成分可舉(甲基)丙烯酸等不飽和單羧酸;馬來酸等不飽和二羧酸以及其酐及二酯類;(甲基)丙烯腈等不飽和腈類;(甲基)丙烯醯胺、N-羥甲基(甲基)丙烯醯胺等不飽和醯胺類;乙酸乙烯酯、丙酸乙烯酯等乙烯酯類;甲基乙烯基醚等乙烯基醚類;乙烯、丙烯等α-烯烴類;氯乙烯、二氯亞乙烯等鹵化α,β-不飽和脂肪族單體;苯乙烯、α-甲基苯乙烯等α,β-不飽和芳香族單體等。
聚酯多元醇代表上可藉由多元酸與多元醇之反應製得。多元酸可舉鄰苯二甲酸、異酞酸、對酞酸、1,4-萘二羧酸、2,5-萘二羧酸、2,6-萘二羧酸、聯苯二羧酸、四氫酞酸等芳香族二羧酸;草酸、琥珀酸、丙二酸、戊二酸、己二酸、庚二酸、辛二酸、壬二酸、癸二酸、癸烷二羧酸、十二烷二羧酸、十八烷二羧酸、酒石酸、烷基琥珀酸、次亞麻油酸、馬來酸、延胡索酸、中康酸、檸康酸、伊康酸等脂肪族二羧酸;六氫酞酸、四氫酞酸、1,3-環己烷二羧酸、1,4-環己烷二羧酸等脂環式二羧酸;或是該等之酸酐、烷基酯、醯鹵等反應性衍生物等。
多元醇可舉乙二醇、1,2-丙二醇、1,3-丙二醇、1,3-丁二醇、1,4-丁二醇、新戊二醇、戊二醇、1,6-己二醇、1,8-辛二醇、1,10-癸二醇、1-甲基-1,3-丁二醇、2-甲基-1,3-丁二醇、1-甲基-1,4-戊二醇、2-甲基-1,4-戊二醇、1,2-二甲基-新戊二醇、2,3-二甲基-新戊二醇、1-甲基-1,5-戊二醇、2-甲基-1,5-戊二醇、3-甲基-1,5-戊二醇、1,2-二甲基丁二醇、1,3-二甲基丁二醇、2,3-二甲基丁二醇、1,4-二甲基丁二醇、二乙二醇、三乙二醇、聚乙二醇、二丙二醇、聚丙二醇、1,4-環己烷二甲醇、1,4-環己二醇、雙酚A、雙酚F、加氫雙酚A、加氫雙酚F等。
聚醚多元醇代表上可對多元醇進行開環聚合使其加成環氧烷而製得。多元醇可舉如乙二醇、二乙二醇、丙二醇、二丙二醇、甘油、三羥甲丙烷等。環氧烷可舉如環氧乙烷、環氧丙烷、環氧丁烷、苯環氧乙烷、四氫呋喃等。
聚異氰酸酯可舉二異氰酸四亞甲酯、二異氰酸十二亞甲酯、1,4-丁烷二異氰酸酯、二異氰酸六亞甲酯、2,2,4-三甲基六亞甲基二異氰酸酯、2,4,4-三甲基六亞甲基二異氰酸酯、離胺酸二異氰酸酯、2-甲基戊烷-1,5-二異氰酸酯、3-甲基戊烷-1,5-二異氰酸酯等脂肪族二異氰酸酯;異佛酮二異氰酸酯、加氫伸茬基二異氰酸酯、4,4′-環己基甲烷二異氰酸酯、1,4-環己烷二異氰酸酯、甲基環伸己基二異氰酸酯、1,3-雙(異氰酸酯甲基)環己烷等脂環族二異氰酸酯;苯亞甲基二異氰酸酯、2,2′-二苯甲烷二異氰酸酯、2,4′-二苯甲烷二異氰酸酯、4,4′-二苯甲烷二異氰酸酯、4,4′-二苯基二甲基甲烷二異氰酸酯、4,4′-二苄基二異氰酸酯、1,5-伸萘基二異氰酸酯、伸茬基二異氰酸酯、1,3-伸苯基二異氰酸酯、1,4-伸苯基二異氰酸酯等芳香族二異氰酸酯;二烷基二苯甲烷二異氰酸酯、四烷基二苯甲烷二異氰酸酯、α,α,α,α-四甲基伸茬基二異氰酸酯等芳香脂肪族二異氰酸酯等。
構成易滑層15之胺甲酸乙酯樹脂宜具有羧基。藉由胺甲酸乙酯樹脂具有羧基,可導入交聯結構。具有羧基之胺甲酸乙酯樹脂譬如可藉由使多元醇、聚異氰酸酯與具有游離羧基之鏈增長劑反應而製得。具有游離羧基之鏈增長劑可舉二羥基羧酸、二羥基琥珀酸等。二羥基羧酸可舉二羥甲基烷酸(譬如二羥甲基乙酸、二羥甲基丁烷酸、二羥甲基丙酸、二羥甲基丁酸、二羥甲基戊烷酸)等二烷醇基烷酸(dialkylol alkanoic acid)等。
胺甲酸乙酯樹脂之製造方法並無特別限定,可為使單體成分一次反應之單發法及使單體成分階段性反應之多階段法中之任一者。使用具有游離羧基之鏈增長劑將羧基導入胺甲酸乙酯樹脂時,宜為多階段法。製造胺甲酸乙酯樹脂時,亦可視需求使用胺甲酸乙酯反應觸媒。
胺甲酸乙酯樹脂之數量平均分子量宜為5,000~600,000,10,000~400,000較佳。胺甲酸乙酯樹脂之酸價宜為10~50,20~45較佳。
胺甲酸乙酯樹脂亦可具有交聯結構。藉由於胺甲酸乙酯樹脂導入交聯結構,有提升易滑層15與薄膜基材11之密著性及易滑層15之硬度的傾向。交聯劑可無特別限制使用可與胺甲酸乙酯樹脂之交聯性官能基進行反應者。胺甲酸乙酯樹脂具有羧基時,可使用含有胺基、唑啉基、環氧基、碳二醯亞胺基等的交聯劑。該等中又以具有唑啉基之交聯劑為宜。唑啉基常溫下與羧基的反應性較小,所以與胺甲酸乙酯樹脂混合後的使用期限較長,可彈性應對步驟的前置時間。
交聯劑可為低分子化合物,亦可為聚合物。若從對水系組成物之溶解性高、且與胺甲酸乙酯樹脂之相溶性亦佳的觀點來看,交聯劑宜為丙烯酸系聚合物,且以具有唑啉基之丙烯酸系聚合物尤佳。
交聯劑之使用量宜相對於胺甲酸乙酯樹脂100重量份為1~30重量份,且3~20重量份較佳。
(微粒子)
藉由於易滑層15含有微粒子,可於易滑層表面形成微細的凹凸形狀,提升光學薄膜1之平滑性,從而可抑制沾黏。從形成有助於提升平滑性之凹凸的觀點來看,微粒子之粒徑(平均一次粒徑)宜為10nm以上,15nm以上較佳,20nm以上更佳。微粒子之平均一次粒徑宜小於易滑層之厚度。微粒子之粒徑小於易滑層之厚度,藉此可抑制微粒子從易滑層脫落。微粒子之粒徑宜在250nm以下,且200nm以下較佳。並且,藉由使微粒子之平均一次粒徑小於可見光波長,可抑制可見光在黏結劑樹脂與微粒子之界面散射。從提升透明性的觀點來看點,微粒子之粒徑宜在100nm以下,80nm以下較佳,60nm以下更佳,50nm以下尤佳。
易接著層15之微粒子可為無機微粒子及有機微粒子中之任一者。若從分散性及粒徑之均勻性優異的觀點來看,微粒子宜為無機微粒子。無機微粒子可舉二氧化鈦、氧化鋁、二氧化鋯等無機氧化物;碳酸鈣、滑石、黏土、燒成高嶺土、燒成矽酸鈣、水合矽酸鈣、矽酸鋁、矽酸鎂、磷酸鈣等。該等中又以無機氧化物為佳。有機系微粒子可舉聚矽氧系樹脂、氟系樹脂、丙烯酸系樹脂等。為了抑制因微粒子而產生光散射,黏結劑樹脂(一般折射率約1.5左右)與微粒子之折射率差宜小。若從與黏結劑樹脂之折射率差小、且分散性優異的觀點來看,易滑層15之微粒子宜為二氧化矽粒子。
從水系組成物形成易滑層15時,宜使用水分散性高的微粒子。亦可將微粒子之水分散液摻混至組成物中。為了提高微粒子之分散性,宜添加胺或氨等鹼成分,使易滑層形成用組成物為弱鹼性。
水分散性之二氧化矽粒子宜使用膠質氧化矽。膠質氧化矽亦可使用扶桑化學工業(股)製Quartron PL系列、日產化學工業(股)製SNOWTEX系列、日本Aerosil(股)AERODISP系列及AEROSIL系列、日本觸媒(股)製Seahostar KE系列等市售物。
藉由於易滑層15之表面形成凹凸,可提高光學薄膜1之平滑性,由此觀點來看,易滑層15中之微粒子含量宜為3重量%以上,5重量%以上較佳。尤其,易滑層15之厚度小時(譬如在280nm以下時),宜增加微粒子含量,提高每單位面積之微粒子量(數量密度),藉以在易滑層15之面內均勻形成凹凸。易滑層15中之微粒子含量宜在8重量%以上,10重量%以上較佳,12重量%以上更佳。易滑層15之微粒子含量若太大,恐招致黏結劑樹脂與微粒子之界面光散射增大而招致光學特性降低。又,隨著微粒子含量增大,黏結劑樹脂的相對含量會隨之縮小,而可能降低易滑層之接著性。所以,易滑層15中之微粒子含量宜在50重量%以下,40重量%以下較佳,30重量%以下更佳。
(鹼殘量)
若為了提高微粒子之分散性而使用胺或氨等鹼成分,將無可避免在易滑層殘留鹼成分。將光學薄膜1作為偏光件保護薄膜使用時,有時會發生易滑層15之殘留鹼成分溶出至水中、穿透薄膜基材11之鹼成分使偏光件劣化而降低偏光板之偏光度、或產生筋條狀不均等光學缺陷的情況。
所以從提高偏光板之加濕耐久性的觀點來看,易滑層15之鹼殘量宜為75ppm以下,70ppm以下較佳,60ppm以下更佳,55ppm以下尤佳。從提升偏光板之加濕耐久性的觀點來看,易滑層15之鹼殘量愈少愈佳。
另一方面,易滑層15之鹼殘量若太少,將有損微粒子之分散性,可能因微粒子凝集而產生白濁等外觀不良。又,可能因為分散性降低使微粒子凝集或從易滑層脫落,而不能在易滑層表面形成適當的凹凸,從而有光學薄膜之平滑性降低的傾向。所以,易滑層15之鹼殘量宜為5ppm以上,10ppm以上較佳,20ppm以上更佳。
易滑層中之殘留鹼成分的具體例可舉胺及氨,易滑層中之胺及氨的含量合計宜在上述範圍內。易滑層中之鹼量可因應鹼成分的種類以液體層析分析或離子層析分析等定量。亦可利用層析分析與質量分析(MS)組合而成的分析法(譬如LC/MS)進行鹼成分之定量。易滑層中含有多種鹼成分時,以各成分之合計為易滑層之鹼成分含量(殘量)。
<形成易滑層>
於薄膜基材11之表面形成易滑層15的形成方法並無特別限定。理想係將含有黏結劑樹脂及微粒子之易滑層形成用組成物(塗液)塗佈於薄膜基材11上並進行加熱而形成易滑層15。
(易滑層形成用組成物)
易滑層形成用組成物宜為以水作為溶劑(及用於微粒子之分散媒)之水系組成物。易滑層形成用組成物中之固體成分(不揮發成分)之濃度宜為1~30重量%,2~20重量%較佳,3~15重量%更佳。
水系易滑層形成用組成物含有作為溶劑(及分散媒)之水、黏結劑樹脂脂或其前驅物質、及微粒子。易滑層形成用組成物更宜含有鹼成分。如前述,鹼成分具有促進微粒子分散的作用。粒徑小的微粒子有易凝集的傾向,但藉由易滑層形成用組成物含有氨或胺等鹼成分,可提升微粒子之分散性,獲得外觀及平滑性優異的光學薄膜。
另一方面,易滑層形成用組成物中所含之鹼若殘留於易滑層,可能會成為偏光板之耐濕熱性降低的原因。尤其,苛性等強鹼僅少量便可能成為使偏光件劣化之原因。所以,易滑層形成用組成物中所含之鹼成分宜為氨或胺等弱鹼成分。若從兼顧提升微粒子之分散性及防止偏光件劣化的觀點來看,易滑層形成用組成物(塗液)之pH宜在7.5~9左右。
若從提升微粒子之分散性的觀點來看,易滑層形成用組成物中所含之鹼成分的量宜相對於易滑層形成用組成物之固體成分為300ppm以上,500ppm以上較佳。另一方面,鹼成分含量若太大,可能會變得很難降低鹼殘量,所以易滑層形成用組成物中所含之鹼成分的量宜相對於易滑層形成用組成物之固體成分為50000ppm以下,10000ppm以下較佳,5000ppm以下更佳。如前述,易滑層形成用組成物中所含之鹼成分的具體例可舉胺及氨,該等鹼成分之含量合計宜在上述範圍內。
易滑層形成用組成物中所含之鹼成分除了可提升微粒子之分散性,亦可為具有觸媒作用等之物。譬如,黏結劑樹脂為胺甲酸乙酯系樹脂時,作為聚胺甲酸乙酯前驅物質(多元醇、異氰酸酯等)之胺甲酸乙酯化觸媒,亦可於易滑層形成用組成物中含有三乙胺等三級胺。
於薄膜基材上塗佈易滑層形成用組成物後進行加熱,揮發去除鹼成分,可減少易滑層15之殘留鹼成分。若從利用加熱來促進鹼成分揮發的觀點來看,易滑層形成用組成物中所含之鹼成分沸點宜為150℃以下。鹼成分的沸點宜為130℃以下較佳,120℃以下更佳,110℃以下尤佳。鹼成分的沸點亦可為100℃以下或90℃以下。易滑層形成用組成物含有多種鹼成分時,宜至少1種鹼成分的沸點在上述範圍內,且更宜2種以上鹼成分的沸點在上述範圍內。相對於易滑層中所含之鹼的全量100重量份,宜有50重量%以上之鹼成分的沸點在上述範圍內。易滑層形成用組成物中所含之全部鹼成分的沸點在上述範圍內為理想。
易滑層形成用組成物除了含有黏結劑樹脂(或其前驅物質)、微粒子及鹼成分以外,亦可含有交聯劑。易滑層形成用組成物亦可含有交聯促進劑等之觸媒、抗氧化劑、紫外線吸收劑、調平劑、抗黏結劑、抗靜電劑、分散穩定劑、消泡劑、增黏劑、分散劑、界面活性劑、滑劑等添加劑。
(於薄膜基材上形成易滑層)
於薄膜基材11上塗佈易滑層形成用組成物之前,可進行薄膜基材之表面處理。藉由進行表面處理,可調整薄膜基材的濡濕張力,提升其與易滑層15之密著性。表面處理可舉電暈處理、電漿處理、噴吹臭氧、紫外線照射、火焰處理、化學藥物處理等。該等中又以電暈處理或電漿處理為宜。
易滑層形成用組成物之塗佈方法可舉棒塗法、輥塗法、凹版塗佈法、桿塗法、狹孔塗佈法、簾幕式塗佈法、噴泉式塗佈法等。將塗佈後之易滑層形成用組成物加熱,去除溶劑,藉此可形成易滑層15。亦可藉由加熱使黏結劑樹脂之前驅物質反應而硬化。譬如,當易滑層形成用組成物含有交聯劑時,藉由加熱可促進交聯反應。
形成易滑層時之加熱溫度譬如為50~200℃左右。從促進易滑層形成用組成物之樹脂成分的硬化反應,並有效揮發去除易滑層形成用組成物中所含之鹼成分的觀點來看,加熱溫度宜為100℃以上,且120℃以上較佳,130℃以上更佳,135℃以上尤佳。又,加熱溫度宜高於易滑層形成用組成物中所含之鹼成分的沸點。
形成易滑層時之加熱溫度宜比薄膜基材之玻璃轉移溫度(Tg)高溫。藉由高溫加熱,可促進易滑層形成用組成物之樹脂成分的硬化反應,並可有效揮發去除易滑層形成用組成物中所含鹼成分。加熱溫度宜為比薄膜基材之Tg高10℃以上的溫度。
吾等認為,藉由以比薄膜基材之Tg更高的溫度進行加熱,可提高易滑層形成用組成物中之鹼揮發去除效率,同時易滑層形成用組成物更容易滲透薄膜基材表面,提升薄膜基材11與易滑層15之密著性。從提升易滑層之密著性的觀點來看,加熱溫度宜為薄膜基材之Tg+10℃以上,且Tg+15℃以上較佳,Tg+20℃以上更佳。
若以薄膜基材之Tg+10℃以上的溫度進行加熱,薄膜基材會從玻璃狀態變成橡膠狀態,表面變得容易變形,所以在薄膜基材11與易滑層15之界面容易形成一薄膜基材之樹脂成分與易滑層之構成成分混雜的界面層。藉由形成界面層,薄膜基材11與易滑層15之密著性有提升之傾向。
尤其,如圖3之截面觀察影像所示,當薄膜基材11之表面存在易滑層15之微粒子嵌入埋設的區域時,可獲得薄膜基材11與易滑層15之密著性高的光學薄膜。吾等認為,若以將薄膜基材加熱至比Tg更高溫度之橡膠狀態將微粒子埋設至薄膜基材中,然後使薄膜基材恢復到玻璃狀態,則埋設在薄膜基材表面之微粒子及存在其周圍的黏結劑樹脂會固著於薄膜基材之表面上,故而可提升薄膜基材11與易滑層15之密著性。
亦可在薄膜基材之製造步驟中形成易滑層。另,亦可利用形成薄膜基材時的加熱來形成易滑層。譬如,當薄膜基材為延伸薄膜時,可於延伸前之薄膜或縱向延伸後之薄膜表面上塗佈易滑層形成用組成物,並利用以拉幅機進行橫向延伸或同時雙軸延伸時之加熱,使溶劑乾燥或使樹脂硬化。
塗佈易滑層形成用組成物後再將薄膜基材予以延伸時,從抑制對易滑層產生龜裂等不良狀況的觀點來看,延伸倍率宜為5倍以下,且4倍以下較佳,3倍以下更佳,2.5倍以下尤佳。延伸倍率之下限並無特別限定,基於提升薄膜強度之觀點,延伸倍率宜為1.3倍以上,1.5倍以上較佳。薄膜基材若為丙烯酸系薄膜,基於提升薄膜強度之觀點,宜分別於輸送方向(MD)及寬度方向(TD)上,以上述延伸倍率實施延伸。
進行薄膜基材之雙軸延伸時,雙軸延伸可逐次雙軸延伸亦可同時雙軸延伸。另外亦可進行斜向延伸。進行逐次雙軸延伸時,亦可如前述利用輥延伸將薄膜沿1方向(MD)延伸後,於薄膜上塗佈易滑層形成用組成物,並在以拉幅機進行延伸時將易滑層形成用組成物加熱。
延伸溫度就易滑層之加熱溫度而言如同前述,宜為比薄膜基材之Tg高的溫度,且Tg+10℃以上為佳,Tg+15℃以上較佳,Tg+20℃以上更佳。尤其,宜在塗佈易滑層形成用組成物後,以上述溫度沿至少1方向進行延伸。若在比薄膜基材之Tg更高溫的橡膠狀態下進行延伸,便容易在薄膜基材表面形成埋設有易滑層形成用組成物中之微粒子的區域,而薄膜基材11與易滑層15之密著性有提升之傾向。在高溫下進行延伸而變得容易在薄膜基材中埋設微粒子的原因,可舉:若在橡膠狀態下進行延伸,則於薄膜基材變形時易滑層形成用組成物容易濡濕擴散,於是容易變成微粒子嵌入變形時形成之表面凹凸的凹部中之狀態。而且,吾等認為若在延伸後釋放應力的同時進行冷卻,則在薄膜基材收縮之際,嵌入薄膜基材表面的粒子會就此固著,因此容易於薄膜基材形成埋設有微粒子之區域。
藉由調整易滑層形成用組成物之固體成分濃度及塗佈厚度,可調整易滑層15之厚度。在塗佈易滑層形成用組成物後進行薄膜基材之延伸時,亦可藉由延伸倍率來調整易滑層15之厚度。
易滑層15之厚度並無特別限定,若從可促進以加熱去除鹼成分的觀點來看,宜為280nm以下,250nm以下較佳,230nm以下更佳。將光學薄膜1作為偏光件保護薄膜使用時,易滑層15之厚度愈小,愈有提升偏光板之加濕耐久性的傾向。
在易滑層形成用組成物加熱乾燥時,若過度去除鹼成分,有黏結劑樹脂中之微粒子的分散性降低,而容易發生微粒子凝集、或隨之而來的微粒子從易滑層表面脫落等。一旦發生微粒子的凝集或脫落,光學薄膜之平滑性就會降低,而容易在輸送時發生損傷或在捲取時產生黏結。所以,易滑層15之厚度宜為40nm以上,50nm以上較佳,80nm以上更佳,100nm以上尤佳。易滑層之厚度亦可為110nm以上、120nm以上、130nm以上、140nm以上或150nm以上。
[偏光板]
偏光板可僅於偏光件之一面具備透明保護薄膜,亦可如圖2A及圖2B所示於偏光件5之兩面具備透明保護薄膜。藉由於偏光件之一面貼合上述光學薄膜作為偏光件保護薄膜,可形成僅於偏光件之一面具有透明保護薄膜的偏光板。於偏光件之兩面具有偏光件保護薄膜的偏光板只要在偏光件之至少一面貼合有上述光學薄膜即可。偏光板亦可在偏光件兩面貼合有上述光學薄膜。偏光件5與光學薄膜1則可透過接著劑層6貼合。
<偏光件>
作為偏光件5,可使用使聚乙烯醇、部分甲醛化聚乙烯醇等聚乙烯醇系薄膜上吸附碘或二色性染料等二色性物質並以使其朝1方向定向的聚乙烯醇(PVA)系偏光件。譬如,可藉由對聚乙烯醇系薄膜施行碘染色及延伸而製得PVA系偏光件。
在偏光件5之製造步驟中,亦可視需求進行水洗、膨潤、交聯等處理。延伸可在碘染色之前後任擇進行,或可一邊染色一邊進行延伸。延伸可任擇為在空中進行延伸(乾式延伸)、或是在水中或含有硼酸、碘化鉀等之水溶液中進行延伸(濕式延伸),亦可將該等併用。偏光件5之膜厚並無特別限制,一般為1~50μm左右。
偏光件5亦可使用厚度為10μm以下之薄型PVA系偏光件。薄型偏光件可舉如日本特開昭51-069644號公報、日本特開2000-338329號公報、WO2010/100917號手冊、日本專利第4691205號說明書、日本專利第4751481號說明書等中所記載之薄型偏光件。該等薄型偏光件可藉由包含有將PVA系樹脂層與延伸用樹脂基材在積層體之狀態下進行延伸的步驟及進行碘染色的步驟之製法製得。若為此種製法,則即使PVA系樹脂層很薄,因其被延伸用樹脂基材支持著,故可在不因延伸造成斷裂等不良狀況下延伸。
<接著劑>
用來貼合偏光件5與光學薄膜1之接著劑層6只要在光學上呈透明,其材料即無特別限制,可舉環氧系樹脂、聚矽氧系樹脂、丙烯酸系樹脂、聚胺甲酸乙酯、聚醯胺、聚醚、聚乙烯醇等。接著劑層6之厚度譬如為0.01~20μm左右,可因應被黏體之種類或接著劑之材料等來適當設定。使用藉由塗佈後之交聯反應顯現接著性的硬化型接著劑時,接著劑層6之厚度宜為0.01~5μm,0.03~3μm較佳。
接著劑可使用水系接著劑、溶劑系接著劑、熱熔膠接著劑系、活性能量線硬化型接著劑等各種形態的接著劑。該等中,若從可縮小接著劑層厚度的觀點來看,以水系接著劑或活性能量線硬化型接著劑為宜。
水系接著劑之聚合物成分可舉乙烯基聚合物、明膠、乙烯基系乳膠、聚胺甲酸乙酯、聚酯系、環氧等。該等中,若從與偏光件之接著性優異來看,又以乙烯基聚合物為佳,聚乙烯醇系樹脂尤佳。聚乙烯醇系樹脂中又以含乙醯乙醯基之聚乙烯醇為宜。
從接著性的觀點來看,聚乙烯醇系樹脂之平均聚合度宜為100~5000左右,1000~4000較佳。聚乙烯醇系樹脂之平均皂化度宜為85莫耳%以上,90莫耳%以上較佳。
水系接著劑組成物(溶液)可含有聚乙烯醇系樹脂等聚合物以及交聯劑。交聯劑可使用於1分子中至少具有2個具有構成接著劑之聚合物與反應性之官能基的化合物。聚乙烯醇系樹脂之交聯劑可舉伸烷基二胺類;異氰酸酯類;環氧類;醛類;羥甲基尿素、羥甲基三聚氰胺等胺基-甲醛。該等中又以胺基-甲醛為宜。胺基-甲醛樹脂以具有羥甲基之化合物為宜,羥甲基三聚氰胺尤佳。接著劑組成物中之交聯劑的摻混量宜相對於聚乙烯醇系樹脂100重量份為10~60重量份左右,且20~50重量份較佳。
活性能量線硬化型接著劑係可藉由照射電子束或紫外線等活性能量線進行自由基聚合、陽離子聚合或陰離子聚合的接著劑。其中,若從可以低能量硬化的觀點來看,以利用紫外線照射引發聚合之光自由基聚合性接著劑、光陽離子聚合性接著劑、或併用光陽離子聚合與光自由基聚合之混成型接著劑為宜。
自由基聚合性接著劑之單體可舉具有(甲基)丙烯醯基之化合物及具有乙烯基之化合物。其中又以具有(甲基)丙烯醯基之化合物為佳。具有(甲基)丙烯醯基之化合物可舉C
1-20鏈狀烷基(甲基)丙烯酸酯、脂環式烷基(甲基)丙烯酸酯、多環式烷基(甲基)丙烯酸酯等烷基(甲基)丙烯酸酯;含羥基之(甲基)丙烯酸酯;(甲基)丙烯酸環氧丙酯等含環氧基之(甲基)丙烯酸酯等。自由基聚合性接著劑亦可含有羥乙基(甲基)丙烯醯胺、N‐羥甲基(甲基)丙烯醯胺、N‐甲氧基甲基(甲基)丙烯醯胺、N‐乙氧基甲基(甲基)丙烯醯胺、(甲基)丙烯醯胺、(甲基)丙烯醯基嗎福林等含氮單體。自由基聚合性接著劑中作為交聯成分可含有三丙二醇二丙烯酸酯、1,9‐壬二醇二丙烯酸酯、三環癸烷二甲醇二丙烯酸酯、環狀三羥甲丙烷甲縮醛丙烯酸酯、二烷二醇二丙烯酸酯、EO改質二甘油四丙烯酸酯等多官能單體。
陽離子聚合性接著劑之硬化性成分可舉如具有環氧基或氧雜環丁烷基之化合物。具有環氧基之化合物只要是分子內具有至少2個環氧基,則無特殊之限制,可使用一般已知的各種硬化性環氧化合物。作為理想之環氧化合物,可列舉為例的是:分子內具有至少2個環氧基與至少1個芳香環之化合物(芳香族系環氧化合物),或分子內具有至少2個環氧基且其中至少1個於構成脂環式環之相鄰之2個碳原子間形成之化合物等(脂環式環氧化合物)。使陽離子聚合性接著劑含有具有(甲基)丙烯醯基之化合物等自由基聚合性化合物,亦可做成混成型接著劑。
光硬化型接著劑宜含有光聚合引發劑。光聚合引發劑亦可視反應種類適宜選擇。譬如,宜於自由基聚合性接著劑摻混可利用光照射生成自由基的光自由基發生劑作為光聚合引發劑。宜於陽離子聚合性接著劑摻混可藉由光照射產生陽離子種或路易斯酸的光陽離子聚合引發劑(光酸產生劑)作為作為光聚合引發劑。宜於混成型接著劑摻混光陽離子聚合引發劑及光自由基產生劑。
相對於單體100重量份,聚合引發劑之含量通常為0.1~10重量份左右,宜為0.5~3重量份。另,將自由基聚合性接著劑作為電子束硬化型使用時,無光聚合引發劑的特別需求。為了使硬化速度或敏感度上升,亦可視需求於活性能量線硬化型接著劑中添加光敏化劑。光敏化劑之使用量相對於單體100重量份通常為0.001~10重量份左右,宜為0.01~3重量份。
接著劑亦可視需求含有適宜的添加劑。添加劑之例可舉矽烷耦合劑、鈦矽烷耦合劑等矽烷耦合劑、環氧乙烷等接著促進劑、紫外線吸收劑、抗劣化劑、染料、加工助劑、離子捕捉劑、抗氧化劑、賦黏劑、充填劑、塑化劑、調平劑、發泡抑制劑、抗靜電劑、耐熱穩定劑、耐水解穩定劑等。
[製作偏光板]
於偏光件5之一面(第一主面)透過接著劑層6貼合光學薄膜1,可製造偏光板。光學薄膜1可如圖2A所示,使易滑層形成面透過接著劑層與偏光件5貼合;亦可如圖2B所示,使易滑層非形成面透過接著劑層與偏光件5貼合。
易滑層15亦可作為易接著層發揮功能。如圖2A所示,於光學薄膜1之易滑層15形成面透過接著劑層6貼合偏光件5時,易滑層15有助於提升偏光件與偏光件保護薄膜(光學薄膜1)之接著性。如圖2B所示,易滑層非形成面過接著劑層與偏光件5貼合時,易滑層15有助於提升與設於光學薄膜1上之其他薄膜、黏著劑層、玻璃基板等之接著性。
在貼合偏光件5與光學薄膜1時,宜於偏光件5及光學薄膜1之任一者或兩者塗佈接著劑組成物後,以輥壓機等將偏光件5與光學薄膜1貼合並使接著劑硬化。將接著劑組成物塗佈至偏光件5及/或光學薄膜1上的塗佈方法可舉輥塗法、噴霧法、浸漬法等。於偏光件5及/或光學薄膜1之表面上塗佈接著劑組成物之前,亦可先進行電暈處理、電漿處理、皂化處理等表面處理。
貼合偏光件5與光學薄膜1後,可因應接著劑之種類使接著劑硬化而形成接著劑層6。使用水系接著劑時,可利用加熱乾燥使接著劑硬化。使用活性能量線硬化型接著劑時,可藉由照射電子束或紫外線等活性能量線來使接著劑硬化。若於易滑層15上設置光陽離子聚合性之接著劑,有時光活性種(陽離子或路易斯酸)便容易因易滑層之殘留鹼成分的作用而去活,產生聚合阻礙的情況。所以,作為接著劑層6使用光陽離子聚合性之接著劑或光陽離子/光自由基混成型接著劑時,如圖2B所示,宜使光學薄膜1之易滑層非形成面與偏光件5貼合。
<透明保護薄膜>
亦可於偏光件5之第二主面透過接著劑層7貼合透明保護薄膜2。透明保護薄膜2可採用任意且適當的透明薄膜。透明保護薄膜2之厚度為5~200μm左右。從機械強度、透明性及處置性等觀點來看,透明保護薄膜2之厚度宜為10~100μm,15~60μm較佳。光學薄膜1與透明保護薄膜2之厚度可相同亦可互異。
形成透明保護薄膜2之材料可舉聚對苯二甲酸乙二酯(PET)、聚對苯二甲酸丁二酯(PBT)、聚萘二甲酸乙二酯(PEN)等聚酯類;二乙醯纖維素或三乙醯纖維素等纖維素系聚合物;聚苯乙烯或丙烯腈・苯乙烯共聚物等苯乙烯系聚合物;聚降莰烯等環狀聚烯烴;聚碳酸酯等。
透明保護薄膜2亦可具備易滑層(未圖示)。亦可於透明保護薄膜2設置與光學薄膜1之易滑層15相同的易滑層。
用於貼合偏光件5與透明保護薄膜2之接著劑層7可使用水系接著劑、溶劑系接著劑、熱熔膠接著劑系、活性能量線硬化型接著劑等各種形態的接著劑。亦可於接著劑層6與接著劑層7使用相同的接著劑組成物。
[偏光板之用途]
偏光板上亦可設置用以貼合至液晶單元或有機EL單元等的黏著劑層。形成黏著劑層之黏著劑可適宜選擇使用以丙烯酸系聚合物、聚矽氧系聚合物、聚酯、聚胺甲酸乙酯、聚醯胺、聚醚、氟系或橡膠系等聚合物作為基底聚合物者。其中,從光學透明性優異、顯示出適度濡濕性與凝集性並且耐候性及耐熱性等優異的觀點來看,尤以丙烯酸系黏著劑為宜。
於偏光板附設黏著劑層可以適宜的方式進行。譬如,可舉使基底聚合物等溶解或分散至甲苯或乙酸乙酯等溶劑中調製出固體成分濃度10~40重量%左右之黏著劑溶液而附設於偏光板上的方式,或是將形成於適宜的基材上之黏著劑層轉印至偏光板上的方法等。
亦可在偏光板兩面設置黏著劑層。於偏光板兩面設置黏著劑層時,表面與背面之黏著劑層之組成及厚度可相同亦可互異。黏著劑層之厚度一般為5~500μm左右。
在防止黏著劑層汙染等目的下,亦可於黏著劑層之表面暫設分離件。分離件宜使用塑膠薄膜表面業以聚矽氧系脫模劑、長鏈烷基系脫模劑、氟系脫模劑等剝離劑進行塗佈處理者。
偏光板亦可為與其他光學層積層而成的積層偏光板。光學層可舉相位差板、視角補償薄膜、亮度提升薄膜等。
藉由將偏光板貼合至液晶單元或有機EL單元等影像顯示單元之表面,可形成影像顯示裝置。液晶顯示裝置之形成可藉由將液晶單元與偏光板以及視需求之照明系統等構成零件適宜組裝並組入驅動電路等來形成。在有機EL顯示裝置中,藉由於有機EL單元表面貼合本發明之偏光板與相位差薄膜(典型上為1/4波長板)組合而成之圓偏光板,可降低外光之反射光因金屬電極等而再出射,提升視辨性。
實施例
以下列舉實施例更具體說明本發明,但本發明不受限於該等實施例。以下符號「%」之記載在未特別說明之前提下表示重量%。
[調製易滑層形成用組成物]
將含有聚酯胺甲酸乙酯及異佛酮二異氰酸酯作為樹脂成分且更含有作為硬化觸媒之三乙胺及作為分散媒之甲基乙基酮的固體成分34%之水系聚胺甲酸乙酯(第一工業製藥製「SuperFlex 210R」)20.6重量份、固體成分25%之含唑啉之聚合物水溶液(日本觸媒製「Epocros WS-700」)5.2重量份、1重量%之氨水2.8重量份、平均一次粒徑35nm之膠質氧化矽的20%水分散液(扶桑化學工業製「Quartron PL-3」)7.5重量份及純水63.9重量份混合,而調製出易滑層形成用組成物。該組成物係相對於固體成分100重量份含有15.3重量份二氧化矽粒子之濃度9.8%的水溶液。在以下的實施例及比較例中,係使用該組成物來形成易滑層。
[實施例1]
使用具備熔融擠製製膜裝置、凹版塗佈機、拉幅機式同時雙軸延伸裝置及捲取裝置之薄膜製造裝置來製作光學薄膜。作為丙烯酸系樹脂,係使用與日本專利特開2017-26939號之實施例中記載用於製作「透明保護薄膜1A」者相同的醯亞胺化MS樹脂(玻璃轉移溫度:120℃)之丸粒。將丙烯酸系樹脂從T型模熔融擠製,以160μm之厚度進行製膜後,於薄膜之一面利用凹版塗佈機以約9μm之濕式厚度塗佈上述組成物,在溫度140℃之加熱爐內以同時雙軸延伸拉幅機於長邊方向(MD)及寬度方向(TD)分別延伸2倍,而獲得於厚度40μm之丙烯酸系薄膜之一面具備厚度50nm之易滑層的光學薄膜。
[實施例2~4及比較例1、2]
除了變更易滑層形成用組成物之塗佈厚度以外,以與實施例1同樣方式獲得光學薄膜。易滑層之厚度(延伸後)如表2所示。
[實施例5、6及比較例3~5]
如表2所示改變拉幅機延伸時之爐內溫度(延伸溫度)。除了變更延伸溫度以外,以與實施例1同樣方式獲得光學薄膜。
[製作偏光板]
(偏光件之製作)
將厚度45μm之聚乙烯醇(PVA)系樹脂薄膜(Kuraray Co., Ltd.製「PE4500」)的長條卷料以滾筒延伸機往長邊方向進行單軸延伸使長邊方向成5.9倍,同時按表1所示之膨潤浴、染色浴、交聯浴1、交聯浴2及洗淨浴依序輸送後,在70℃下乾燥5分鐘而製出厚度18μm之偏光件。染色浴中之碘濃度及碘化鉀濃度已調整成使偏光件之單體透射率為43.4%。
[表1]
(調製紫外線硬化型接著劑)
調製含有N-羥乙基丙烯酸醯胺40重量份及丙烯醯基嗎福林60重量份作為硬化性成分,更含有作為聚合引發劑之2-甲基-1-(4-甲基苯硫基)-2-嗎福林基丙-1-酮(BASF製「IRGACURE 819」)3重量份的紫外線硬化型接著劑。
(貼合偏光件與偏光件保護薄膜)
作為單面的偏光件保護薄膜係使用各實施例及比較例之光學薄膜,另一面的偏光件保護薄膜則使用雙軸延伸環狀聚烯烴薄膜(日本ZEON製「ZeonorFilm ZF-14」)。於光學薄膜之易滑層形成面及ZeonorFilm之表面以約1μm之厚度塗佈上述紫外線硬化型接著劑並以輥壓機貼合至偏光件後,照射累積光量1000/mJ/cm
2之紫外線使接著劑硬化,而獲得於偏光件之一面具備丙烯酸系薄膜(光學薄膜)且於另一面具備ZeonorFilm之偏光板。
[評估]
<易滑層之鹼殘量>
定量出殘留在易滑層之三乙胺及氨之量。三乙胺之殘量係秤量出從光學薄膜表面削出易滑層的粉末並將之溶解於甲醇中後,利用溶液之氣相層析質量分析(GC/MS)法來定量。氨之殘量則係將光學薄膜浸漬於25℃之純水中後,以120℃之乾燥機進行60分鐘加熱萃取後,以離子層析分析定量出溶出在水中之氨。將三乙胺之量與氨之量的合計定為鹼殘量。
<易滑層之密著性>
於光學薄膜之易滑層形成面在線壓8kg/m、壓接速度0.3m/分鐘下壓接黏著膠帶(日東電工製「No.31B」),並在50℃下保存48小時後,把持黏著膠帶的前端以拉伸速度30m/分鐘進行180°剝離試驗,並按下述基準判定易接著層之密著性。
〇:易滑層未從丙烯酸系薄膜剝離而在黏著膠帶與易滑層之界面剝離者
×:在丙烯酸系薄膜與易滑層之界面發生剝離者
<肉眼評估>
以肉眼觀察光學薄膜的表面,評估有無因二氧化矽粒子凝集而產生局部的混濁(霧度上升)及在易滑層非形成面有無損傷。
〇:無二氧化矽粒子凝集、面內均勻性良好且未發現傷傷者
△:雖未因二氧化矽粒子凝集產生混濁,但在易滑層非形成面確認有深度1μm以下的損傷者
×:因二氧化矽粒子凝集產生混濁及確認易滑層非形成面有損傷者
<有無界面層>
以穿透型電子顯微鏡(TEM)觀察光學薄膜之截面,在丙烯酸系薄膜與易滑層之界面確認有無易滑層中之粒子埋設在丙烯酸系薄膜的區域(界面層)。於圖3顯示實施例3(有界面層)之TEM觀察影像,於圖4顯示比較例4(無界面層)之TEM觀察影像。
<偏光板之加濕耐久性>
將偏光板裁切成320mm×240mm之尺寸後,將環狀聚烯烴薄膜側之面透過厚度20μm之丙烯酸系黏著劑貼合至玻璃上。將該試料放入溫度60℃且相對濕度90%(條件1)之恆溫恆濕槽、或溫度85℃、相對濕度85%(條件2)之恆溫恆濕槽中,並保持500小時實施加熱、加濕耐久試驗。
測定耐久試驗前的偏光度P
0及耐久試驗後的偏光度P,算出偏光度的變化量ΔP=|P-P
0|。並且於耐久試驗後的偏光板上將其他偏光板配置成正交偏光後,以肉眼觀察確認有無筋條狀不均,並按以下基準做評估。
◎:在條件1及條件2之耐久試驗後的試料皆未觀察到條痕不均
〇:於條件1之耐久試驗後的試料未觀察到條痕不均,於條件2之耐久試驗後的試料可視辨些許的條痕不均
△:在條件1及條件2之耐久試驗後的試料皆可視辨些許的條痕不均
×:在條件1及條件2之耐久試驗後的試料皆可清楚視辨條痕不均
於表2顯示實施例及比較例之光學薄膜的製作條件(延伸溫度及延伸後的易滑層之厚度)、光學薄膜的評估結果(肉眼、密著性、有無界面層)、以及偏光板的耐久試驗結果(有無條痕不均及偏光度之變化量ΔP)。
[表2]
比較例2之具備厚度350nm之易滑層的光學薄膜,丙烯酸系薄膜與易滑層之密著性良好,光學薄膜之外觀亦佳。但,將該光學薄膜作為偏光件保護薄膜使用的偏光板於加濕耐久試驗後的偏光度降低明顯,確認有顯著的筋條狀不均。在比較例3~5中延伸溫度(易滑層形成時之加熱溫度)為120℃以下,亦與比較例2同樣於加濕耐久試驗後之偏光度降低明顯,確認有顯著的筋條狀不均。
實施例1~4係在延伸溫度140℃下形成有50nm~250nm之易滑層的光學薄膜,於其未見因微粒子凝集而產生的白濁,顯示了良好的外觀。另,實施例1之光學薄膜雖於易滑層非形成面發現微細的損傷,但該損傷程度在與其他構件貼合時,即被黏著劑或接著劑等填埋,不構成光學缺陷。而且,使用實施例1~4之光學薄膜的偏光板,比起使用比較例2之光學薄膜的偏光板,加濕耐久性更為優異,且抑制了條痕不均的發生。
比較例1形成了厚度30nm之易滑層,其光學薄膜的偏光板之加濕耐久性良好,但可確認因二氧化矽微粒子凝集而產生的白濁及易滑層非形成面的損傷,外觀不良。吾等認為,會發生損傷是因為分散性降低使得二氧化矽微粒子從易滑層表面脫落,造成光學薄膜的平滑性降低所致。
從實施例1~4與比較例1、2的對比可知,易滑層之厚度小、且殘留鹼成分愈少,便可抑制於加濕耐久試驗後產生條痕不均,而獲得加濕耐久性優異的偏光板。另外亦知,易滑層之厚度若過小、且殘留鹼成分過小,會因微粒子分散性降低而發生外觀不良或平滑性降低的情況。
實施例5及實施例6係在延伸溫度160℃或180℃下形成厚度200nm之易滑層,與實施例3同樣地,光學薄膜之外觀及偏光板的加濕耐久性優異。另一方面,比較例3~5係在延伸溫度80~120℃下形成厚度200nm之易滑層,易滑層的鹼殘量多,且與比較例2相同偏光板於加濕耐久試驗後確認有明顯的條痕不均。
由該等結果可知,在不使微粒子之分散性降低的範圍內減少易滑層的鹼殘量,可獲得在作為偏光件保護薄膜使用時偏光板之加濕耐久性優異的光學薄膜。
比較例3~5係在低溫下進行延伸,相較於其他例子,丙烯酸系薄膜與易滑層之密著性較差。在實施例3等中,在丙烯酸系薄膜與易滑層之界面形成有粒子埋在丙烯酸系薄膜中之狀態的界面層(參照圖3);相對地,在比較例3~5中並未形成界面層(參照圖4)。由該等結果可知,藉由提高塗佈易滑層形成用組成物後的加熱溫度,可使易滑層形成用組成物中之鹼成分有效揮發而降低鹼殘量,而且可提升薄膜基材與易滑層之界面的密著性。
1:光學薄膜
2:透明保護薄膜
5:偏光件
6、7:接著劑層
11:薄膜基材
15:易滑層
100、101:偏光板
圖1係顯示具備易滑層之光學薄膜之構成例的截面圖。
圖2A係顯示偏光板之構成例的截面圖。
圖2B係顯示偏光板之構成例的截面圖。
圖3係在薄膜基材與易滑層之界面形成有界面層之光學薄膜的截面TEM觀察影像。
圖4係未在薄膜基材與易滑層之界面形成界面層之光學薄膜的截面TEM觀察影像。
1:光學薄膜
11:薄膜基材
15:易滑層
Claims (9)
- 一種偏光板,具備聚乙烯醇系偏光件及光學薄膜,前述聚乙烯醇系偏光件具有第一主面及第二主面,前述光學薄膜透過接著劑層貼合在前述偏光件之第一主面, 前述光學薄膜於透明薄膜基材之表面具備易滑層, 前述易滑層含有黏結劑樹脂及無機微粒子, 前述易滑層之胺及氨之含量合計為5~75ppm,並且 前述光學薄膜之易滑層非形成面貼合在前述偏光件之第一主面。
- 如請求項1之偏光板,其中前述光學薄膜之易滑層非形成面透過光陽離子聚合性接著劑、或光陽離子聚合與光自由基聚合之混成型接著劑而貼合在前述偏光件之第一主面。
- 如請求項1或2之偏光板,其中前述易滑層之厚度為40~280nm。
- 如請求項1或2之偏光板,其中在前述透明薄膜基材與前述易滑層之界面,存在一前述透明薄膜基材中埋設有前述無機微粒子之區域。
- 如請求項1或2之偏光板,其中前述無機微粒子之平均一次粒徑為10~250nm。
- 如請求項1或2之偏光板,其中前述易滑層中之前述無機微粒子的含量為3~50重量%。
- 如請求項1或2之偏光板,其中前述透明薄膜基材為丙烯酸系薄膜。
- 如請求項1或2之偏光板,其中前述易滑層之前述黏結劑樹脂為胺甲酸乙酯系樹脂。
- 一種影像顯示裝置,具有影像顯示單元與如請求項1至8中任一項之偏光板。
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CN102112899A (zh) * | 2008-07-29 | 2011-06-29 | 日东电工株式会社 | 偏振片保护膜和使用了偏振片保护膜的偏振板以及图像显示装置 |
TW201706638A (zh) * | 2015-06-15 | 2017-02-16 | Nitto Denko Corp | 雙面附黏著劑層之偏光薄膜及影像顯示裝置 |
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