TWI800675B - 感光化射線性或感放射線性樹脂組成物、抗蝕劑膜、圖案形成方法、電子器件之製造方法 - Google Patents
感光化射線性或感放射線性樹脂組成物、抗蝕劑膜、圖案形成方法、電子器件之製造方法 Download PDFInfo
- Publication number
- TWI800675B TWI800675B TW108129309A TW108129309A TWI800675B TW I800675 B TWI800675 B TW I800675B TW 108129309 A TW108129309 A TW 108129309A TW 108129309 A TW108129309 A TW 108129309A TW I800675 B TWI800675 B TW I800675B
- Authority
- TW
- Taiwan
- Prior art keywords
- sensitive
- radiation
- manufacturing
- electronic device
- resin composition
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018171620 | 2018-09-13 | ||
JP2018-171620 | 2018-09-13 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202012467A TW202012467A (zh) | 2020-04-01 |
TWI800675B true TWI800675B (zh) | 2023-05-01 |
Family
ID=69777509
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW108129309A TWI800675B (zh) | 2018-09-13 | 2019-08-16 | 感光化射線性或感放射線性樹脂組成物、抗蝕劑膜、圖案形成方法、電子器件之製造方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP7058339B2 (zh) |
TW (1) | TWI800675B (zh) |
WO (1) | WO2020054275A1 (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7134066B2 (ja) * | 2018-11-02 | 2022-09-09 | 東京応化工業株式会社 | レジスト組成物及びレジストパターン形成方法 |
WO2021251055A1 (ja) * | 2020-06-10 | 2021-12-16 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法 |
WO2023054127A1 (ja) * | 2021-09-29 | 2023-04-06 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法及び電子デバイスの製造方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201518861A (zh) * | 2013-08-27 | 2015-05-16 | Fujifilm Corp | 圖案形成方法、感光化射線性或感放射線性樹脂組成物、使用其而成之光阻膜、以及電子裝置之製造方法及電子裝置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5292386A (en) * | 1976-01-29 | 1977-08-03 | Fujikura Ltd | Electric wire for loop coil |
JP5206972B2 (ja) * | 2008-02-20 | 2013-06-12 | 信越化学工業株式会社 | レジストパターンの形成方法並びにこれに用いるポジ型レジスト材料 |
WO2011065207A1 (ja) * | 2009-11-30 | 2011-06-03 | Jsr株式会社 | 感放射線性組成物及びレジストパターン形成方法 |
JP2011180385A (ja) * | 2010-03-01 | 2011-09-15 | Jsr Corp | 感放射線性組成物及びレジストパターン形成方法 |
JP2011227463A (ja) * | 2010-03-30 | 2011-11-10 | Jsr Corp | 感放射線性樹脂組成物およびパターン形成方法 |
JP5752388B2 (ja) * | 2010-10-18 | 2015-07-22 | 東京応化工業株式会社 | ポジ型レジスト組成物、レジストパターン形成方法 |
JP5967082B2 (ja) * | 2011-05-19 | 2016-08-10 | Jsr株式会社 | フォトレジスト組成物 |
JP5764480B2 (ja) * | 2011-11-25 | 2015-08-19 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法及び高分子化合物 |
JP5675664B2 (ja) * | 2012-01-24 | 2015-02-25 | 信越化学工業株式会社 | パターン形成方法 |
JP2013228550A (ja) * | 2012-04-25 | 2013-11-07 | Tokyo Ohka Kogyo Co Ltd | レジスト組成物、レジストパターン形成方法 |
JP5879218B2 (ja) * | 2012-07-03 | 2016-03-08 | 富士フイルム株式会社 | パターン形成方法、電子デバイスの製造方法、感活性光線性又は感放射線性樹脂組成物、並びに、感活性光線性又は感放射線性膜 |
JP5825248B2 (ja) * | 2012-12-12 | 2015-12-02 | 信越化学工業株式会社 | ポジ型レジスト材料並びにこれを用いたパターン形成方法 |
-
2019
- 2019-08-07 WO PCT/JP2019/031107 patent/WO2020054275A1/ja active Application Filing
- 2019-08-07 JP JP2020546767A patent/JP7058339B2/ja active Active
- 2019-08-16 TW TW108129309A patent/TWI800675B/zh active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201518861A (zh) * | 2013-08-27 | 2015-05-16 | Fujifilm Corp | 圖案形成方法、感光化射線性或感放射線性樹脂組成物、使用其而成之光阻膜、以及電子裝置之製造方法及電子裝置 |
Also Published As
Publication number | Publication date |
---|---|
WO2020054275A1 (ja) | 2020-03-19 |
JP7058339B2 (ja) | 2022-04-21 |
JPWO2020054275A1 (ja) | 2021-09-24 |
TW202012467A (zh) | 2020-04-01 |
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