TWI799727B - 脈衝化射頻監視器 - Google Patents

脈衝化射頻監視器 Download PDF

Info

Publication number
TWI799727B
TWI799727B TW109126425A TW109126425A TWI799727B TW I799727 B TWI799727 B TW I799727B TW 109126425 A TW109126425 A TW 109126425A TW 109126425 A TW109126425 A TW 109126425A TW I799727 B TWI799727 B TW I799727B
Authority
TW
Taiwan
Prior art keywords
high frequency
pulsed high
frequency monitor
monitor
pulsed
Prior art date
Application number
TW109126425A
Other languages
English (en)
Other versions
TW202113370A (zh
Inventor
児島寛之
鈴木涼太
Original Assignee
日商京三製作所股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商京三製作所股份有限公司 filed Critical 日商京三製作所股份有限公司
Publication of TW202113370A publication Critical patent/TW202113370A/zh
Application granted granted Critical
Publication of TWI799727B publication Critical patent/TWI799727B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R23/00—Arrangements for measuring frequencies; Arrangements for analysing frequency spectra
    • G01R23/02—Arrangements for measuring frequency, e.g. pulse repetition rate; Arrangements for measuring period of current or voltage
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04L—TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L25/00—Baseband systems
    • H04L25/02—Details ; arrangements for supplying electrical power along data transmission lines
    • H04L25/06—Dc level restoring means; Bias distortion correction ; Decision circuits providing symbol by symbol detection
    • H04L25/069—Dc level restoring means; Bias distortion correction ; Decision circuits providing symbol by symbol detection by detecting edges or zero crossings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32146—Amplitude modulation, includes pulsing
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04L—TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L25/00—Baseband systems
    • H04L25/02—Details ; arrangements for supplying electrical power along data transmission lines
    • H04L25/03—Shaping networks in transmitter or receiver, e.g. adaptive shaping networks
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R21/00—Arrangements for measuring electric power or power factor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R21/00—Arrangements for measuring electric power or power factor
    • G01R21/06—Arrangements for measuring electric power or power factor by measuring current and voltage
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03K—PULSE TECHNIQUE
    • H03K5/00—Manipulating of pulses not covered by one of the other main groups of this subclass
    • H03K5/003—Changing the DC level
    • H03K5/007—Base line stabilisation
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04L—TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L25/00—Baseband systems
    • H04L25/02—Details ; arrangements for supplying electrical power along data transmission lines
    • H04L25/03—Shaping networks in transmitter or receiver, e.g. adaptive shaping networks
    • H04L25/03006—Arrangements for removing intersymbol interference
    • H04L25/03012—Arrangements for removing intersymbol interference operating in the time domain
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04L—TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L25/00—Baseband systems
    • H04L25/02—Details ; arrangements for supplying electrical power along data transmission lines
    • H04L25/06—Dc level restoring means; Bias distortion correction ; Decision circuits providing symbol by symbol detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32293—Microwave generated discharge using particular waveforms, e.g. polarised waves
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03K—PULSE TECHNIQUE
    • H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
    • H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
    • H03K3/53—Generators characterised by the type of circuit or by the means used for producing pulses by the use of an energy-accumulating element discharged through the load by a switching device controlled by an external signal and not incorporating positive feedback

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Signal Processing (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Nonlinear Science (AREA)
  • Measurement Of Current Or Voltage (AREA)
  • Dc Digital Transmission (AREA)
  • Manipulation Of Pulses (AREA)
  • Monitoring And Testing Of Transmission In General (AREA)
TW109126425A 2019-08-06 2020-08-05 脈衝化射頻監視器 TWI799727B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019144918A JP6826165B1 (ja) 2019-08-06 2019-08-06 パルス化高周波モニタ
JP2019-144918 2019-08-06

Publications (2)

Publication Number Publication Date
TW202113370A TW202113370A (zh) 2021-04-01
TWI799727B true TWI799727B (zh) 2023-04-21

Family

ID=74228129

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109126425A TWI799727B (zh) 2019-08-06 2020-08-05 脈衝化射頻監視器

Country Status (7)

Country Link
US (1) US11852665B2 (zh)
EP (1) EP4012994A4 (zh)
JP (1) JP6826165B1 (zh)
KR (1) KR102619282B1 (zh)
CN (1) CN114175585B (zh)
TW (1) TWI799727B (zh)
WO (1) WO2021025076A1 (zh)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006170816A (ja) * 2004-12-16 2006-06-29 Mitsubishi Electric Corp パルス諸元検出回路
JP2013005538A (ja) * 2011-06-14 2013-01-07 Daihen Corp 高周波電源装置及びその制御方法
JP2013021438A (ja) * 2011-07-08 2013-01-31 New Japan Radio Co Ltd 周波数変換回路
TWI439712B (zh) * 2012-02-23 2014-06-01 Test Research Inc 訊號轉態偵測電路及方法
TWI599272B (zh) * 2012-09-14 2017-09-11 蘭姆研究公司 根據三個或更多狀態之功率及頻率調整

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6481197A (en) * 1987-09-24 1989-03-27 Hitachi Ltd Plasma processing power monitoring device
JPH0783384B2 (ja) * 1988-03-17 1995-09-06 沖電気工業株式会社 適応レベル判定電圧の生成方法
US4939750A (en) 1988-03-17 1990-07-03 Oki Electric Industry, Co., Ltd. Adaptive signal discrimination circuit and a method for discriminating high and low level of data signals
JP4374463B2 (ja) * 2006-12-26 2009-12-02 日本電波工業株式会社 発振周波数制御回路
JP2011130568A (ja) * 2009-12-17 2011-06-30 Kosoku Electric Co Ltd 高周波モータ作動装置
JP2011151576A (ja) * 2010-01-21 2011-08-04 Nec Saitama Ltd 信号検出回路および誤検出防止方法
JP5808012B2 (ja) * 2011-12-27 2015-11-10 東京エレクトロン株式会社 プラズマ処理装置
KR101444582B1 (ko) * 2013-02-19 2014-09-24 삼성전기주식회사 주파수 검출 장치 및 방법
JP5578745B1 (ja) * 2013-08-22 2014-08-27 株式会社京三製作所 Ｄ級増幅器
KR102186072B1 (ko) * 2013-12-20 2020-12-04 세메스 주식회사 플라즈마 발생 장치, 그를 포함하는 기판 처리 장치, 및 플라즈마 발생 방법
KR101757818B1 (ko) * 2015-10-12 2017-07-26 세메스 주식회사 펄스화된 고주파 전력 모니터링 장치 및 그를 포함하는 기판 처리 장치
DE102016109343A1 (de) * 2016-05-20 2017-11-23 Christof-Herbert Diener Schaltungsanordnung zur Bereitstellung von Hochfrequenzenergie und System zur Erzeugung einer elektrischen Entladung
JP2019091526A (ja) * 2017-11-10 2019-06-13 東京エレクトロン株式会社 パルスモニタ装置及びプラズマ処理装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006170816A (ja) * 2004-12-16 2006-06-29 Mitsubishi Electric Corp パルス諸元検出回路
JP2013005538A (ja) * 2011-06-14 2013-01-07 Daihen Corp 高周波電源装置及びその制御方法
JP2013021438A (ja) * 2011-07-08 2013-01-31 New Japan Radio Co Ltd 周波数変換回路
TWI439712B (zh) * 2012-02-23 2014-06-01 Test Research Inc 訊號轉態偵測電路及方法
TWI599272B (zh) * 2012-09-14 2017-09-11 蘭姆研究公司 根據三個或更多狀態之功率及頻率調整

Also Published As

Publication number Publication date
JP2021027495A (ja) 2021-02-22
KR20220042115A (ko) 2022-04-04
EP4012994A4 (en) 2023-08-09
TW202113370A (zh) 2021-04-01
WO2021025076A1 (ja) 2021-02-11
JP6826165B1 (ja) 2021-02-03
CN114175585A (zh) 2022-03-11
US11852665B2 (en) 2023-12-26
CN114175585B (zh) 2024-04-19
US20220276289A1 (en) 2022-09-01
EP4012994A1 (en) 2022-06-15
KR102619282B1 (ko) 2024-01-02

Similar Documents

Publication Publication Date Title
EP3766184A4 (en) BEAM MESSAGE CONFIGURATION FOR MEASURING THE SUPPLYING FREQUENCY
EP3731976A4 (en) HIGH FREQUENCY ULTRASONIC TRANSDUCER
EP3703573A4 (en) ULTRASONIC SYSTEM WITH HIGH FREQUENCY DETAIL
EP3667809A4 (en) HIGH FREQUENCY FILTER
EP3932338A4 (en) TURNSTILE
EP3827772A4 (en) FREEZING DEVICE
EP3870077A4 (en) TOURNIQUET
EP3738433A4 (en) FISH FARMING TANK
EP3984062A4 (en) HIGH-SIDE POWER MONITORING
EP3985327A4 (en) Freezing apparatus
EP3821827A4 (en) HAEMOSTASIS APPARATUS
EP3745939A4 (en) ENDOSCOPE
EP3994078A4 (en) PROBE
EP3847392A4 (en) PROGRAMMABLE HIGH BEAM WITHOUT GLARE
EP4012291A4 (en) COOLING UNIT
TWI799727B (zh) 脈衝化射頻監視器
EP4040083A4 (en) FREEZING APPLIANCE
EP4012444A4 (en) RADAR DEVICE
EP4028155A4 (en) PULSED ELECTRICAL FIELD CHAMBER
EP4038767A4 (en) FREQUENCY CONTROL
EP4027468A4 (en) LASER OSCILLATION DEVICE
EP3849745A4 (en) CLAMP
EP3765482A4 (en) NTCP INHIBITORS
EP3567727A4 (en) FREQUENCY GENERATOR
EP3444890A4 (en) HIGH FREQUENCY SWITCH