TWI798232B - 光學測定裝置及光學測定方法 - Google Patents

光學測定裝置及光學測定方法 Download PDF

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Publication number
TWI798232B
TWI798232B TW107121728A TW107121728A TWI798232B TW I798232 B TWI798232 B TW I798232B TW 107121728 A TW107121728 A TW 107121728A TW 107121728 A TW107121728 A TW 107121728A TW I798232 B TWI798232 B TW I798232B
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TW
Taiwan
Prior art keywords
measurement
base
mentioned
sample
optical
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TW107121728A
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English (en)
Chinese (zh)
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TW201907147A (zh
Inventor
泉谷悠介
若山育央
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日商大塚電子股份有限公司
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/02—Investigating particle size or size distribution
    • G01N15/0205—Investigating particle size or size distribution by optical means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/10—Investigating individual particles
    • G01N15/14—Optical investigation techniques, e.g. flow cytometry
    • G01N15/1434—Optical arrangements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/02—Investigating particle size or size distribution
    • G01N15/0205—Investigating particle size or size distribution by optical means
    • G01N15/0211—Investigating a scatter or diffraction pattern
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/08—Measuring arrangements characterised by the use of optical techniques for measuring diameters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N21/03—Cuvette constructions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/49—Scattering, i.e. diffuse reflection within a body or fluid
    • G01N21/51—Scattering, i.e. diffuse reflection within a body or fluid inside a container, e.g. in an ampoule
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N35/00—Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor
    • G01N35/02—Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations
    • G01N35/025—Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor using a plurality of sample containers moved by a conveyor system past one or more treatment or analysis stations having a carousel or turntable for reaction cells or cuvettes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N2015/03—Electro-optical investigation of a plurality of particles, the analyser being characterised by the optical arrangement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/10—Investigating individual particles
    • G01N15/14—Optical investigation techniques, e.g. flow cytometry
    • G01N2015/1493—Particle size
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N2021/0106—General arrangement of respective parts
    • G01N2021/015—Apparatus with interchangeable optical heads or interchangeable block of optics and detector
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/49—Scattering, i.e. diffuse reflection within a body or fluid
    • G01N21/53—Scattering, i.e. diffuse reflection within a body or fluid within a flowing fluid, e.g. smoke
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/02—Mechanical
    • G01N2201/024—Modular construction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/02—Mechanical
    • G01N2201/024—Modular construction
    • G01N2201/0245—Modular construction with insertable-removable part

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  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
TW107121728A 2017-07-05 2018-06-25 光學測定裝置及光學測定方法 TWI798232B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017-132206 2017-07-05
JP2017132206A JP6961406B2 (ja) 2017-07-05 2017-07-05 光学測定装置および光学測定方法

Publications (2)

Publication Number Publication Date
TW201907147A TW201907147A (zh) 2019-02-16
TWI798232B true TWI798232B (zh) 2023-04-11

Family

ID=62816325

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107121728A TWI798232B (zh) 2017-07-05 2018-06-25 光學測定裝置及光學測定方法

Country Status (6)

Country Link
US (1) US10788412B2 (enExample)
EP (1) EP3425370B1 (enExample)
JP (1) JP6961406B2 (enExample)
KR (1) KR102488587B1 (enExample)
CN (1) CN109211741B (enExample)
TW (1) TWI798232B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116096852A (zh) * 2020-07-31 2023-05-09 京瓷株式会社 试样观察装置
JP2025184455A (ja) * 2024-06-07 2025-12-18 大塚電子株式会社 光学測定システムおよびプログラム
CN119198626A (zh) * 2024-09-12 2024-12-27 无锡迅杰光远科技有限公司 光谱采集系统

Citations (2)

* Cited by examiner, † Cited by third party
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US20080151265A1 (en) * 2006-12-21 2008-06-26 Asml Netherlands B.V. Method for positioning a target portion of a substrate with respect to a focal plane of a projection system
US20160077015A1 (en) * 2011-09-25 2016-03-17 Theranos, Inc. Systems and methods for multi-analysis

Family Cites Families (19)

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Publication number Priority date Publication date Assignee Title
CH542716A (de) 1972-01-29 1973-10-15 Krauss Maffei Ag Vorrichtung zum Pressen von länglichen Gegenständen, insbesondere von Skiern
JPH0233158Y2 (enExample) * 1985-01-30 1990-09-06
US4657390A (en) * 1985-02-21 1987-04-14 Laser Precision Corporation Universal spectrometer system having modular sampling chamber
JPH0678978B2 (ja) 1990-05-25 1994-10-05 スズキ株式会社 凝集パターン検出装置
JP3533502B2 (ja) 1994-10-14 2004-05-31 株式会社日立製作所 自動化学分析装置
JP3744650B2 (ja) * 1997-05-28 2006-02-15 石川島播磨重工業株式会社 カラーフィルタ検査装置の基板保持機構
EP1035408A1 (en) * 1997-11-19 2000-09-13 Otsuka Electronics Co., Ltd. Apparatus for measuring characteristics of optical angle
US6232608B1 (en) * 1998-08-18 2001-05-15 Molecular Devices Corporation Optimization systems in a scanning fluorometer
US20020176801A1 (en) * 1999-03-23 2002-11-28 Giebeler Robert H. Fluid delivery and analysis systems
JP3689278B2 (ja) 1999-05-19 2005-08-31 株式会社堀場製作所 粒子径分布測定装置および粒子径分布測定方法
JP2004206760A (ja) * 2002-12-24 2004-07-22 Sankyo Seiki Mfg Co Ltd 光ヘッド装置
US8119066B2 (en) * 2006-02-08 2012-02-21 Molecular Devices, Llc Multimode reader
JP2007315976A (ja) * 2006-05-26 2007-12-06 Japan Aerospace Exploration Agency 微小液滴・気泡・粒子の位置・粒径・速度測定の方法と装置
JP5182913B2 (ja) * 2006-09-13 2013-04-17 大日本スクリーン製造株式会社 パターン描画装置およびパターン描画方法
JP2009293987A (ja) 2008-06-03 2009-12-17 Arkray Inc 分析装置
DE102008064665B4 (de) * 2008-09-15 2016-06-09 Fritsch Gmbh Partikelgrößenmessgerät
CN102159934A (zh) * 2008-09-26 2011-08-17 株式会社堀场制作所 颗粒物性测量装置
JP5947709B2 (ja) * 2012-12-27 2016-07-06 株式会社堀場製作所 分光分析方法及び分光分析装置
JP2016038360A (ja) * 2014-08-11 2016-03-22 シャープ株式会社 微小粒子検出装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080151265A1 (en) * 2006-12-21 2008-06-26 Asml Netherlands B.V. Method for positioning a target portion of a substrate with respect to a focal plane of a projection system
US20160077015A1 (en) * 2011-09-25 2016-03-17 Theranos, Inc. Systems and methods for multi-analysis

Also Published As

Publication number Publication date
US20190011351A1 (en) 2019-01-10
CN109211741A (zh) 2019-01-15
KR20190005112A (ko) 2019-01-15
EP3425370A1 (en) 2019-01-09
JP6961406B2 (ja) 2021-11-05
TW201907147A (zh) 2019-02-16
KR102488587B1 (ko) 2023-01-13
US10788412B2 (en) 2020-09-29
EP3425370B1 (en) 2022-10-05
JP2019015576A (ja) 2019-01-31
CN109211741B (zh) 2022-06-17

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