TWI797616B - Optical device and method of manufacturing the same - Google Patents

Abstract

A method of manufacturing an optical device includes: depositing a substrate obliquely to form at least a first inorganic oxide membrane pair on a surface of the substrate; and depositing the substrate normally to form a second inorganic oxide membrane pair on the first inorganic oxide membrane pair, in which the material of any of the first inorganic oxide membrane pair and the second inorganic oxide membrane pair includes at least one of a metal element and Si.

Description

Optical element and manufacturing method thereof

The disclosure relates to an optical element and a manufacturing method thereof.

Nowadays, multi-layer films are often used in the manufacture of optical components to achieve the optical functions of linearly polarized light, circularly polarized light, and semi-transparent and semi-reflected light. For example, a linear polarizer is attached to the optical element, and then an anti-reflection functional film is evaporated on the polarizer by evaporation, so that the optical element can achieve the optical function of polarized light and anti-reflection.

However, the existing process requires a bonding step, which makes the manufacturing steps of the optical element complicated. In addition, if the multi-layer film is attached at the same time, the polarization effect will be unsatisfactory due to the accumulation of high stress, and the multi-layer film will cause the optical element to thicken. Finally, the lamination accuracy of the multilayer film will affect the overall light transmittance, haze and thickness of the optical element, and further affect the path of light.

Therefore, how to propose a method for manufacturing optical elements that can solve the above problems is one of the problems that the industry is eager to invest in research and development resources to solve.

In view of this, one purpose of the present disclosure is to propose a method for manufacturing an optical element that can effectively solve the above problems.

The present disclosure relates to a method for manufacturing an optical element, including obliquely evaporating a substrate to form at least one first inorganic oxide film pair on the surface of the substrate, and forward evaporating the substrate to form at least one inorganic oxide film on the surface of the substrate At least one second inorganic oxide film pair is formed on one inorganic oxide film. The material of any one of the first inorganic oxide film pair and the second inorganic oxide film pair includes at least one of metal elements and silicon.

In some current embodiments, the step of obliquely evaporating the substrate includes evaporating the inorganic oxide on the surface along the oblique axis. The tilt axis is tilted with respect to the normal direction on the surface.

In some current embodiments, the step of obliquely evaporating the substrate further includes evaporating another inorganic oxide on the inorganic oxide along the oblique axis.

In some current embodiments, the angle between the tilt axis and the normal direction is in the range of 5 degrees to 89 degrees.

In some current embodiments, the step of obliquely evaporating the substrate further includes evaporating the inorganic oxide on the surface along another oblique axis. The other inclined axis is inclined relative to the normal direction.

In some current embodiments, the step of obliquely evaporating the substrate further includes evaporating another inorganic oxide on the surface along another oblique axis. Another inclined axis is inclined relative to the normal direction.

In some current embodiments, the angle between the other inclined axis and the normal direction is in the range of 5 degrees to 89 degrees.

In some current embodiments, the step of forward evaporating the substrate includes sequentially evaporating two inorganic oxides on the first pair of inorganic oxide films along the forward axis. The positive axis is parallel to the normal direction on the surface.

In some current embodiments, the method for manufacturing an optical element further includes: obliquely evaporating the substrate to form a third inorganic oxide film on the other surface of the substrate, wherein the surface and the other surface are respectively located at the base opposite sides of the material; and forward evaporation on the base material to form a fourth inorganic oxide film on the third inorganic oxide film, wherein any of the third inorganic oxide film pair and the fourth inorganic oxide film pair One material includes at least one of metal elements and silicon.

In some current embodiments, the material of any one of the third inorganic oxide film pair and the fourth inorganic oxide film pair includes WO ₃ , MgF ₂ , Si ₃ N ₄ , SiON, SiO ₂ , TiO ₂ , ZrO ₂ , Al ₂ O ₃ , ZnO ₂ , Cr ₂ O ₃ , SnO, In ₂ O ₃ , Ta ₂ O ₅ , Fe ₂ O ₃ , and NbO ₅ .

In some current embodiments, the material of any one of the first inorganic oxide film pair and the second inorganic oxide film pair includes WO ₃ , MgF ₂ , Si ₃ N ₄ , SiON, SiO ₂ , TiO ₂ , ZrO ₂ , Al ₂ O ₃ , ZnO ₂ , Cr ₂ O ₃ , SnO, In ₂ O ₃ , Ta ₂ O ₅ , Fe ₂ O ₃ , and NbO ₅ .

In some current embodiments, the first inorganic oxide film pair includes a first film layer and a second film layer. The first film layer and the second film layer have a first refractive index for the polarized light in the first direction, and have different second and third refractive indices for the polarized light in the second direction respectively.

The disclosure relates to an optical element, which includes a substrate, a first pair of inorganic oxide films, and a pair of second inorganic oxide films. The substrate has concave and convex surfaces. The pair of first inorganic oxide films is located on at least one of the concave surface and the convex surface. The second pair of inorganic oxide films is located over the first pair of inorganic oxide films.

To sum up, in the method for manufacturing an optical element of the present disclosure, the optical element having both the first inorganic oxide film pair and the second inorganic oxide film pair can simultaneously have polarization function and anti-reflection property. Compared with the current conventional technology, the method for manufacturing the optical element provided by the present disclosure omits the process of attaching the polarizing film, which can be manufactured together with the anti-reflection layer to achieve the effect of saving the manufacturing cost. Moreover, because the method provided by the present disclosure is produced by evaporation technology, it can be produced on the surface of different substrates according to the required specifications, and has a wider application range than the conventional bonding process. In addition, the thickness of the film (film pair) can be precisely controlled by evaporation technology, so that the optical element film (eg, polarizing film) produced by the disclosed method has a thickness of nanometers to micrometers. It is thinner than the film thickness (for example, on the order of millimeters to microns) used by conventional films, and enables optical elements to achieve the same or better optical performance in a smaller volume. In addition, the method disclosed in the present disclosure also improves the stress problem easily caused by the film-attaching process and the flatness of the film-attachment, and thus improves the light path passing through the optical element, so that the optical element has better optical effects.

The following disclosure provides many different embodiments, or examples, for implementing different features of the provided subject matter. Specific examples of components and arrangements are described below to simplify the present disclosure. Of course, these are examples only, and are not intended to be limiting. For example, in the following description a first feature is formed on or on a second feature may include embodiments where the first feature is formed in direct contact with the second feature, and may also include embodiments where additional features may be An embodiment formed between a first feature and a second feature such that the first feature and the second feature may not be in direct contact. In addition, the present disclosure may repeat element symbols and/or letters in various examples. This repetition is for simplicity and clarity and does not in itself indicate a relationship between the various embodiments and/or configurations discussed.

Additionally, for simplicity of description, spatially relative terms such as "below," "beneath," "lower," "above," "upper," and similar terms may be used herein to describe Describes the relationship of one element or feature to another (further) element or feature as shown in the figures. Such spatially relative terms are intended to encompass different orientations of the elements in use or operation in addition to the orientation depicted in the figures. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.

As used herein, "approximately", "approximately", "approximately" or "substantially" means falling within twenty percent, or within ten percent, or within one hundred percent of a given value or range Five out of five. Numerical quantities given herein are approximations, meaning that terms such as "about," "about," "approximately," or "substantially" can be inferred when not expressly stated otherwise.

FIG. 1 is a schematic diagram of a method M1 for manufacturing an optical element according to some embodiments of the present disclosure. A method M1 of manufacturing an optical element includes: obliquely evaporating a substrate to form at least one pair of first inorganic oxide films on the surface of the substrate in step S101; and forward evaporating the substrate to at least Step S102 of forming at least one second inorganic oxide film pair on a first inorganic oxide film. In some embodiments, the material of any one of the first inorganic oxide film pair 120 and the second inorganic oxide film pair 130 includes at least one of a metal element and silicon. For example, in some embodiments, the composition of the inorganic oxide film pair can be represented by the chemical formula I _x O _y or I _a O _b . Wherein I can be metal elements (eg, Ti, Zr, Al, Ta, Zn, Cr, Sn, In, Fe, Nb, Mg, etc.) and Si elements, but the disclosure is not limited thereto. The content of the method M1 for manufacturing an optical element will be described in detail below.

FIG. 2 is a schematic diagram of an optical element 100 according to some embodiments of the present disclosure. In some embodiments, the optical element 100 includes a substrate 110 . The substrate 110 has a first surface 112 and a second surface 114 . In some embodiments, the substrate 110 is an optical element with a 3D curved surface. In the embodiment shown in FIG. 2 , the first surface 112 is concave and the second surface 114 is convex, but this is only an example. This disclosure is not limited thereto. In other embodiments, the two opposite surfaces of the substrate 110 may be both concave or convex, or a combination of both. In some embodiments, the first pair of inorganic oxide films 120 is disposed on the first surface 112 of the substrate 110 , and the second pair of inorganic oxide films 130 is disposed on the first pair of inorganic oxide films 120 . In some other embodiments, the optical element 100 further includes a third inorganic oxide film pair 140 and a fourth inorganic oxide film pair 150 . The third inorganic oxide film pair 140 is disposed on the second surface 114 of the substrate 110 , and the fourth inorganic oxide film pair 150 is disposed on the third inorganic oxide film pair 140 . The manufacturing methods of the first inorganic oxide film pair 120 and the second inorganic oxide film pair 130 will be described in detail below.

FIG. 3A is a schematic diagram of an oblique evaporation process of the optical element 100 according to some embodiments of the present disclosure. As shown in FIG. 3A , in the configuration of the oblique evaporation process, the evaporation source 900 and the substrate 110 basically face each other, and the evaporation direction of the evaporation source 900 extends along the axis B. Specifically, during the evaporation process, the evaporation material (for example, an inorganic oxide) takes the axis B as the central axis and extends along a solid angle on the side away from the evaporation source 900 . In this way, the evaporation material can be evenly distributed on the surface to be evaporated (eg, the first surface 112 ). In some embodiments, the step S101 of obliquely evaporating the substrate 110 adopts at least one of a thermal evaporation process, an electron gun evaporation process, a laser evaporation process, and a sputtering process. This is the limit. Please refer to FIG. 1 and FIG. 3A , in some embodiments, the step S101 of obliquely evaporating the substrate includes evaporating the inorganic oxide on the first surface 112 along the oblique axis. The inclined axis referred to here is the axis B inclined relative to the normal direction on the first surface 112 . For example, as shown in FIG. 3A , the normal direction is defined as a straight line perpendicular to any point on the first surface 112 of the substrate 110 (such as axis A in FIG. 3A ). Specifically, in some embodiments, the oblique evaporation is performed by rotating the substrate 110 such that there is an angle α between the axis A and the axis B and performing evaporation, but the disclosure is not limited thereto.

FIG. 3B is a schematic diagram of the microstructure of the surface of the optical element 100 after oblique evaporation according to some embodiments of the present disclosure. The direction of the three parallel arrows on the left indicates the direction of oblique evaporation, which is parallel to the axis B. The oblique evaporation will form obliquely grown epitaxial column structures 126 on the first surface 112 of the substrate 110 . Specifically, each epitaxial column 127 in the epitaxial column structure 126 will have a corresponding inclination angle according to the angle α between the axis A and the axis B and the evaporation rate of the material (ie, in FIG. 3B Angle β) the grown and aligned epitaxial columns 127. The angle β is defined as the angle between the normal direction of the first surface 112 and the growth direction of the epitaxial column 127 . The regularly arranged inclined epitaxial column structures 126 have a polarization function, so that the optical element 100 has a polarization effect.

Referring to FIG. 3A and FIG. 3B , in some embodiments, the angle α between the oblique axis (axis B) and the normal direction (axis A) is in the range of 5 degrees to 89 degrees. In addition, the angle β corresponding to the angle α is also in the range of 5 degrees to 89 degrees, but the angle α and the angle β are not necessarily the same. For example, taking the deposition material as aluminum as an example, when the angle α is about 86 degrees (that is, the angle between axis A and axis B is about 86 degrees) and the evaporation rate is 0.5 nm/ When evaporation is carried out under the conditions of s, the angle of the oblique epitaxial column (ie, angle β) obtained by the growth thereof is about 50 degrees. The reason for adopting this range of angle α for oblique evaporation is that, for metal materials, the angle α must be maintained in this range to obtain the oblique epitaxial column structure 126 .

FIG. 3C is a schematic diagram of the macrostructure of the optical element 100 according to FIG. 3B. As shown in FIG. 3C, in some specific embodiments (for example, the metal aluminum epitaxial column structure 126 formed by the aforementioned oblique evaporation method), the P polarized light and the S polarized light with a wavelength of 632.8 nm are emitted from the substrate 110 The transmittance of P polarized light penetrating through the aluminum epitaxial column structure 126 is 58.20%, and the transmittance of S polarized light penetrating through the aluminum epitaxial column structure 126 is 28.32%. It can be known from this that the difference in transmittance between the P polarized light and the S polarized light reaches 29.88%, which indicates that the epitaxial column structure 126 has a polarizing effect. Specifically, when the microstructure of the thin film has regular columnar arrangement (for example, the epitaxial column structure 126 ), the microstructure will have birefringence characteristics. In other words, the epitaxial column structure 126 will produce correspondingly different refractive indices for different polarization directions due to the incident direction of light.

As a further example, in Figures 3B and 3C, the spatial coordinates of the substrate are defined as the direction z parallel to the normal direction (axis A), the direction x perpendicular to the normal direction, and the direction perpendicular to both directions x and Direction y in direction z. Also, as shown in FIG. 3B, the epitaxial column structure 126 can define a three-dimensional refraction direction coordinate. Wherein, the direction k3 is the growth direction of the parallel epitaxial column 127, the direction k1 is the growth direction of the vertical epitaxial column 127, and the direction k2 is the direction perpendicular to the normal direction (axis A) and the growth direction of the epitaxial column 127 (direction k3). the other direction. In addition, in the epitaxial column structure 126, it has a refractive index n1 in the direction k1, has a refractive index n2 in the direction k2, and has a refractive index n3 in the direction k3.

。其中，n _p代表P偏振光在磊晶柱結構126中的折射率，其與折射率座標的關係為：

，其中角度β為前述提到的基材110之第一表面112的法線方向(軸A)與磊晶柱127生長方向(方向k3)之間所夾的角度。n _s代表S偏振光在磊晶柱結構126中的折射率，其與折射率座標的關係為：

。d代表磊晶柱結構126之厚度d。如前述所示，由關係式可以知道磊晶柱結構126的厚度d與傾斜角度β與磊晶柱結構126的偏光特性息息相關。因此，可以根據不同偏光特性的需要去調整斜向蒸鍍製程中的軸A與軸B之間之角度α以及蒸鍍速率。在一些實施例中，斜向蒸鍍製作無機氧化物膜對為1對或是2對以上。 Please refer to FIG. 3B and FIG. 3C. In some embodiments, an incident light with wavelength λ and two polarization states of P-polarized light and S-polarized light enters the optical element 100 from one side of the substrate 110 (as shown in FIG. 3C Figure). In addition, the electric field oscillation direction of the P-polarized light is along the direction x of the space coordinate, and the electric field oscillation direction of the S-polarized light is along the direction y of the space coordinate. When the incident light penetrates the inclined epitaxial column structure 126 , an optical path difference δ will be generated between the P-polarized light and the S-polarized light due to the regular arrangement of the epitaxial column structure 126 . This optical path difference δ conforms to the relation:

. Among them, n _p represents the refractive index of P polarized light in the epitaxial column structure 126, and its relationship with the refractive index coordinates is:

, wherein the angle β is the angle included between the aforementioned normal direction (axis A) of the first surface 112 of the substrate 110 and the growth direction (direction k3 ) of the epitaxial column 127 . n _s represents the refractive index of S-polarized light in the epitaxial column structure 126, and its relationship with the refractive index coordinates is:

. d represents the thickness d of the epitaxial column structure 126 . As shown above, it can be known from the relational formula that the thickness d and the tilt angle β of the epitaxial column structure 126 are closely related to the polarization characteristics of the epitaxial column structure 126 . Therefore, the angle α between the axis A and the axis B in the oblique evaporation process and the evaporation rate can be adjusted according to the needs of different polarization characteristics. In some embodiments, there is one pair or more than two pairs of inorganic oxide films formed by oblique evaporation.

Further, in some embodiments, the material used in the oblique evaporation process of the optical element 100 is also related to the refractive index value of the epitaxial column structure 126 obtained through final growth. In some embodiments, the material of any one of the first inorganic oxide film pair 120 and the second inorganic oxide film pair 130 includes WO ₃ , MgF ₂ , Si ₃ N ₄ , SiON, SiO ₂ , TiO ₂ , ZrO _2. At least one of Al ₂ O ₃ , ZnO ₂ , Cr ₂ O ₃ , SnO, In ₂ O ₃ , Ta ₂ O ₅ , Fe ₂ O ₃ , and NbO ₅ , but the present disclosure is not limited thereto. Different materials produced with the same angle α will obtain different values at different refraction direction coordinates. For example, ZrO ₂ and TiO ₂ are obliquely evaporated with the same inclination angle α (both 30°) and the finally obtained epitaxial column structure 126 has the same angle β (both 16.1°). However, by further measuring the refractive index of each material in each direction, it is found that the refractive index of _ZrO2 is n1=1.948, n2=1.969, n3=2.033, and the refractive index of TiO2 is n1=2.437, n2=2.452, n3=2.522, This shows that even if the same angle α and angle β are used as process parameters, different materials will affect the numerical variation of the refractive index in different refraction coordinate directions.

On the other hand, oblique evaporation of the same material at different angles α will also obtain different values in different refractive index directions. For example, the same material _ZrO2 is evaporated obliquely at two different angles α (for example, one α=30°, the other α=65°) and the respective epitaxial column structures 126 obtained finally Directional refractive index found that the refractive index of ZrO ₂ with α=30˚ is n1=1.948, n2=1.969, n3=2.033, and the refractive index of ZrO ₂ with α=65˚ is n1=1.502, n2=1.575, n3= 1.788, which shows that using the same material with different tilt angles for oblique evaporation will affect the numerical changes in different refractive index directions.

FIG. 4 is a schematic diagram of the forward evaporation process of the optical element 100 according to some embodiments of the present disclosure. As shown in FIG. 4 , the evaporation direction of the evaporation source 900 extends along the axis B. As shown in FIG. During the forward evaporation process, the normal direction (axis A) of any point on the first surface 112 of the substrate 110 is parallel to the evaporation direction (axis B). Subsequently, the second inorganic oxide film pair 130 is evaporated over the first inorganic oxide film pair 120 . In some embodiments, the number of inorganic oxide film pairs produced by forward evaporation is 1 pair or more than 2 pairs. In some embodiments, the step S102 of forward evaporation on the substrate 110 adopts at least one of a thermal evaporation process, an electron gun evaporation process, a laser evaporation process, and a sputtering process. This is the limit.

FIG. 5A is a schematic diagram of an optical element 100 according to some embodiments of the present disclosure. In some embodiments, the step S101 of obliquely evaporating the substrate 110 further includes evaporating another inorganic oxide (for example, the film layer 124 ) on the inorganic oxide (for example, the film layer 122 ) along the inclined axis. superior. That is, the materials of the film layer 122 and the film layer 124 are different. Please refer to FIG. 3B and FIG. 5A . The oblique deposition angle α and thickness d of the film layer 122 and the film layer 124 can be adjusted according to the polarizing function requirement of the optical element 100 . The polarizing effect of the first inorganic oxide film pair 120 composed of the film layer 122 and the film layer 124 is superior to that of the first inorganic oxide film pair 120 composed of only a single layer of material.

For example, taking oblique evaporation to fabricate a thin film device with a heterojunction as an example, the film layers 122 are arranged along a specific direction on the substrate 110 . The specific alignment direction may have an inclination angle (which may correspond to the inclination angle β discussed above). Subsequently, the film layer 124 (for example, the material Alq3) is evaporated and deposited obliquely on the film layer 122 (for example, the material DPVBi), so as to fabricate the second layer of inclined epitaxial column structure 126 with a specific alignment direction. After the oblique evaporation of the plurality of first inorganic oxide film pairs 120 is completed, the structure of the second inorganic oxide film pair 130 can then be forwardly evaporated 124 above the first inorganic oxide film pair 120 . In some embodiments, the number of first inorganic oxide film pairs 120 produced by oblique evaporation can be 1 pair or more than 2 pairs.

獲得。其中I∥與I⊥分別代表平行方向之光強度與垂直方向光強度。以前述的DPVBi(膜層122)與Alq3(膜層124)所組成的膜對舉例來說，當膜層124的厚度為500 Å並且膜層122的厚度為200 Å時，其I∥與I⊥峰值比例(即偏振度P)為13.1236。當膜層124的厚度為400 Å並且膜層122的厚度為300 Å時，其I∥與I⊥峰值比例為24.3816。當膜層124的厚度為300 Å並且膜層122的厚度為400 Å時，其I∥與I⊥峰值比例為9.3273。由前述可知，膜層124的厚度與膜層122的厚度將影響偏光薄膜的偏振度，同時此種具有兩種不同角度β之磊晶柱結構126之偏振度也高於只具有單層磊晶柱結構126之偏振度。因此，藉由調整具有兩種不同角度β之磊晶柱結構126之個別角度β及厚度的光學元件可以藉此提升其偏光效果。 Subsequently, the polarization of the epitaxial column structure 126 with two different angles β can be judged by analyzing the polarization degree P of the structure. The degree of polarization P can be expressed by the relation:

get. Among them, I∥ and I⊥ represent the light intensity in the parallel direction and the light intensity in the vertical direction, respectively. Taking the aforementioned film pair composed of DPVBi (film layer 122) and Alq3 (film layer 124) as an example, when the thickness of the film layer 124 is 500 Å and the thickness of the film layer 122 is 200 Å, its I∥ and I ⊥The peak ratio (that is, the degree of polarization P) is 13.1236. When the thickness of the film layer 124 is 400 Å and the thickness of the film layer 122 is 300 Å, the peak ratio of I∥ to I⊥ is 24.3816. When the thickness of the film layer 124 is 300 Å and the thickness of the film layer 122 is 400 Å, the peak ratio of I∥ to I⊥ is 9.3273. It can be known from the foregoing that the thickness of the film layer 124 and the thickness of the film layer 122 will affect the degree of polarization of the polarizing film. At the same time, the degree of polarization of the epitaxial column structure 126 with two different angles β is also higher than that of a single-layer epitaxial structure. The degree of polarization of the pillar structure 126 . Therefore, by adjusting the individual angles β and thickness of the epitaxial column structure 126 having two different angles β, the polarization effect thereof can be improved.

與

的關係（其中入射光波長λ、n ₀為介質折射率（例如，空氣折射率）、n _s為基材折射率），則由此兩材料所組成的無機氧化物膜對將具有良好的抗反射功效。在一些實施例中，正向蒸鍍所製作的第二無機氧化物膜對130數目可以為1對或2對以上。 Please refer to FIG. 4 and FIG. 5A. In some embodiments, the step S102 of forward evaporation on the substrate 110 includes depositing two inorganic oxides (for example, the film layer shown in FIG. 5A ) along the forward axis. 132 and film layer 134) are sequentially vapor-deposited on the first inorganic oxide film pair 120, wherein the positive axis is parallel to the normal direction on the surface (for example, the first surface 112) (for example, in FIG. 4 Axis A is parallel to axis B). The optical element 100 having the second inorganic oxide film pair 130 can have an anti-reflection function. For example, when two materials with different refractive indices (for example, the film layer 132 and the film layer 134) are overlapped and vapor-deposited on the first inorganic oxide film pair 120 (the structure shown in FIG. 5A ), if the growth structure of two different materials satisfies the condition

and

(wherein incident light wavelength λ, n ₀ is the medium refractive index (for example, air refractive index), n _s is the substrate refractive index), then the inorganic oxide film pair composed of these two materials will have good resistance Reflective effect. In some embodiments, the number of the second inorganic oxide film pairs 130 produced by the forward evaporation can be 1 pair or more than 2 pairs.

As can be seen from the foregoing, the embodiment shown in FIG. 5A combines the second inorganic oxide film pair 130 having the film layer 132 and the film layer 134 and the first inorganic oxide film pair 130 having the film layer 122 and the film layer 124 discussed above. Oxide film pair 120 . In some embodiments, when light having a wavelength λ and having P-polarized light and S-polarized light passes through the substrate 110 into the optical element 100 and passes through the first inorganic oxide film pair 120, the first inorganic oxide film pair 120 Different refractive indices will be generated corresponding to P-polarized light and S-polarized light. This phenomenon will make the ratios of P-polarized light and S-polarized light passing through the first inorganic oxide film pair 120 and arriving at the second inorganic oxide film pair 130 different. And by virtue of the antireflection effect of the second inorganic oxide film pair 130 , the polarization direction of the light passing through the second inorganic oxide film pair 130 can be further filtered.

Specifically, in some embodiments, when the refractive index n _p of the film layer 122 and the film layer 124 for the P-polarized light is the same, the P-polarized light will not change the refractive index when passing through the first inorganic oxide film pair 120, Therefore, the first inorganic oxide film pair 120 has a high penetration effect on P polarized light. In other words, according to the above relationship, the refractive index of the material for P-polarized light can be controlled by controlling the refraction directions n1, n3 and the angle β. At the same time, when the refractive index n _s of the film layer 122 and the film layer 124 for S polarized light is different, and the material thickness d satisfies a quarter of the light wavelength λ, there will be a high reflection effect for S polarized light. In other words, according to the above relational expression, the refractive index of the material for S-polarized light can be controlled by controlling the refraction direction n2 and the angle β. In summary, the first inorganic oxide film pair includes one or more film layers 122 and 124, and the film layer 122 and the film layer 124 have a first refractive index for P-polarized light, and have a corresponding phase for S-polarized light. The second refractive index and the third refractive index are different. In this way, the ratio of P-polarized light passing through the first inorganic oxide film pair 120 may be higher than that of S-polarized light. Subsequently, the second inorganic oxide film pair 130 will further increase the transmittance of P-polarized light due to the corresponding material thickness d (that is, the material thickness d satisfies the condition of a quarter of the light wavelength λ). When light and S-polarized light pass through one side of the second inorganic oxide film pair 130, the ratio of S-polarized light will be greatly reduced, and only P-polarized light will be retained, so that the optical element 100 has a good polarizing effect .

Please refer to FIG. 5A, in some embodiments, the substrate 110 of the optical element 100 depicted can be polymethyl methacrylate (Poly(methyl methacrylate), PMMA) or glass, but this disclosure does not limit. Moreover, the optical element 100 is used to make the film layer 122 of the first inorganic oxide film pair 120 is ZrO ₂ , the film layer 124 is TiO ₂ , and is used to make the film layer 132 of the second inorganic oxide film pair 130 is TiO ₂ , the film layer 134 is SiO ₂ , but the present disclosure is not limited thereto.

FIG. 5B is a schematic diagram of an optical element 200 according to some embodiments of the present disclosure. Please refer to FIG. 3B and FIG. 5B at the same time. In some embodiments, the step S101 of obliquely evaporating the substrate 110 further includes alternately evaporating the same inorganic oxide at different angles β along the oblique axis. To form the first inorganic oxide film pair 220 including the film layer 222 and the film layer 224 . In some embodiments, the structures with different angles β can be achieved by rotating the direction of the substrate 110 or changing the tilt angle α during the oblique evaporation process, but the disclosure is not limited thereto. For example, referring to the foregoing, it can be known that the same material (eg, ZrO ₂ ) can be evaporated obliquely at different angles to obtain different refractive indices. Therefore, the same material with different inclination angles α can also be used to achieve the effect that can be achieved by using two different materials to form the first inorganic oxide film pair 220 . Its optical principle is similar to that in Figure 5A above, to control the polarization effect by adjusting the refractive indices n1, n2, n3 and angle β of different refraction directions, and the description will not be repeated here for simplicity and clarity.

Please refer to FIG. 5B. In some embodiments, the substrate 110 of the optical element 200 depicted can be polymethyl methacrylate (Poly(methyl methacrylate), PMMA) or glass, but this disclosure does not limit. Moreover, the film layer 222 of the optical element 200 used to make the first inorganic oxide film pair 220 is Ta ₂ O ₅ , and the film layer 224 is also Ta ₂ O ₅ , but the present disclosure is not limited thereto. Wherein, the angle β between the film layer 222 and the film layer 224 (please refer to FIG. 3B and FIG. 5B ) is different. In addition, the film layer 132 used to make the second inorganic oxide film pair 130 is TiO ₂ , and the film layer 134 is SiO ₂ , but the present disclosure is not limited thereto.

Please refer to FIG. 2 , FIG. 5A and FIG. 5B , the foregoing contents are only some embodiments of the present disclosure. For example, the method M1 for manufacturing an optical element may also be implemented on any one of the first surface 112 or the second surface 114 or both, but the present disclosure is not limited thereto. Specifically, in some embodiments, the method M1 for manufacturing an optical element further includes obliquely evaporating the substrate 110 to form at least one third surface on another surface of the substrate 110 (for example, the second surface 114 ). Inorganic oxide film pair 140 ; forward evaporation on the substrate 110 to form at least one fourth inorganic oxide film pair 150 on at least one third inorganic oxide film pair 140 . In some embodiments, the surface (eg, the first surface 112 ) and the other surface (eg, the second surface 114 ) are respectively located on opposite sides of the substrate 110 , but the disclosure is not limited thereto. The material of any one of the third inorganic oxide film pair 140 and the fourth inorganic oxide film pair 150 includes at least one of a metal element and silicon. In some embodiments, the composition of the inorganic oxide film pair can be represented by the chemical formula I _x O _y or I _a O _b . Wherein I can be metal elements (eg, Ti, Zr, Al, Ta, Zn, Cr, Sn, In, Fe, Nb, Mg, etc.) and Si elements, but the disclosure is not limited thereto. And, in some embodiments, the material of any one of the third inorganic oxide film pair 140 and the fourth inorganic oxide film pair 150 includes WO ₃ , MgF ₂ , Si ₃ N ₄ , SiON, SiO ₂ , TiO ₂ , ZrO ₂ , Al ₂ O ₃ , ZnO ₂ , Cr ₂ O ₃ , SnO, In ₂ O ₃ , Ta ₂ O ₅ , Fe ₂ O ₃ , and NbO ₅ . In some embodiments, the third inorganic oxide film pair 140 may be similar to the first inorganic oxide film pair 120, and the fourth inorganic oxide film pair 150 may be similar to the second inorganic oxide film pair 130, but the present disclosure It is not limited to this.

From the above detailed description of the specific embodiments of the present disclosure, it can be clearly seen that in the method for manufacturing an optical element of the present disclosure, the optical element having both the first inorganic oxide film pair and the second inorganic oxide film pair can be At the same time, it has polarizing function and anti-reflection characteristics. Compared with the current conventional technology, the method for manufacturing the optical element provided by the present disclosure omits the process of attaching the polarizing film, which can be manufactured together with the anti-reflection layer to achieve the effect of saving the manufacturing cost. Moreover, because the method provided by the present disclosure is produced by evaporation technology, it can be produced on the surface of different substrates according to the required specifications, and has a wider application range than the conventional bonding process. In addition, the thickness of the film (film pair) can be precisely controlled by evaporation technology, so that the optical element film (eg, polarizing film) produced by the disclosed method has a thickness of nanometers to micrometers. It is thinner than the film thickness (for example, on the order of millimeters to microns) used by conventional films, and enables optical elements to achieve the same or better optical performance in a smaller volume. In addition, the method disclosed in the present disclosure also improves the stress problem easily caused by the film-attaching process and the flatness of the film-attachment, and thus improves the light path passing through the optical element, so that the optical element has better optical effects.

The foregoing outlines features of several embodiments so that those skilled in the art may better understand aspects of the disclosure. Those skilled in the art should appreciate that they can readily use the present disclosure as a basis for designing or modifying other processes and structures for carrying out the same purposes and/or achieving the same advantages of the embodiments described herein. Those skilled in the art should also realize that such equivalent constructions do not depart from the spirit and scope of the present disclosure, and that they may make various changes, substitutions and substitutions herein without departing from the spirit and scope of the present disclosure.

100,200: Optics 110: Substrate 112: first surface 114: second surface 120,220: the first inorganic oxide film pair 126: Epitaxial column structure 127: epitaxial column 130: the second inorganic oxide film pair 122,124,132,134,222,224: film layer 140: the third inorganic oxide film pair 150: the fourth inorganic oxide film pair 900: evaporation source A,B: axis d: thickness M1: method k1, k2, k3, x, y, z: direction S101, S102: steps α, β: angle λ:wavelength

Aspects of the present disclosure are best understood from the following Detailed Description when read in conjunction with the accompanying drawings. It should be noted that, in accordance with the standard practice in the industry, various features are not drawn to scale. In fact, the dimensions of the various features may be arbitrarily increased or reduced for clarity of discussion. FIG. 1 is a schematic diagram of a method of manufacturing an optical element according to some embodiments of the present disclosure. FIG. 2 is a schematic diagram of an optical element according to some embodiments of the present disclosure. FIG. 3A is a schematic diagram of an oblique evaporation process of an optical element according to some embodiments of the present disclosure. FIG. 3B is a schematic diagram of the microstructure of the surface of the optical element after oblique evaporation according to some embodiments of the present disclosure. Fig. 3C is a schematic diagram of the macroscopic structure of the optical element according to Fig. 3B. FIG. 4 is a schematic diagram of a forward evaporation process of an optical element according to some embodiments of the present disclosure. FIG. 5A is a schematic diagram of an optical element according to some embodiments of the present disclosure. Figure 5B is a schematic diagram of an optical element according to some embodiments of the present disclosure.

Domestic deposit information (please note in order of depositor, date, and number) none Overseas storage information (please note in order of storage country, institution, date, and number) none

M1: method

S101, S102: steps

Claims (13)

A method for manufacturing an optical element, comprising: obliquely evaporating a substrate to form at least one first inorganic oxide film pair on a surface of the substrate, the at least one first inorganic oxide film pair comprising a A first film layer and a second film layer, the first film layer and the second film layer have the same refractive index for polarized light in a first direction, and have different refractive indices for polarized light in a second direction; and The substrate is forwardly evaporated to form at least one second inorganic oxide film pair on the at least one first inorganic oxide film pair; wherein the at least one first inorganic oxide film pair and the at least one second inorganic oxide film pair are The material of any one of the pair of oxide films includes at least one of a metal element and silicon. The method for manufacturing an optical element according to claim 1, wherein the step of obliquely evaporating the substrate comprises: evaporating an inorganic oxide on the surface along an oblique axis, wherein the oblique axis The system is inclined relative to a normal direction on the surface. The method for manufacturing an optical element according to claim 2, wherein the step of obliquely evaporating the substrate further comprises: evaporating another inorganic oxide on the inorganic oxide along the oblique axis. The method of manufacturing optical elements as described in claim 2 or 3 method, wherein an angle between the inclined axis and the normal direction is in the range of 5 degrees to 89 degrees. The method for manufacturing an optical element as described in claim 2, wherein the step of obliquely evaporating the substrate further comprises: evaporating the inorganic oxide on the surface along another oblique axis, wherein the other A tilted axis is tilted relative to the normal direction. The method for manufacturing an optical element as described in claim 2, wherein the step of obliquely evaporating the substrate further comprises: evaporating another inorganic oxide on the surface along another oblique axis, wherein the Another inclined axis is inclined relative to the normal direction. The method of manufacturing an optical element as claimed in claim 5 or 6, wherein an angle between the other tilt axis and the normal direction is in the range of 5 degrees to 89 degrees. The method for manufacturing an optical element according to claim 1, wherein the step of forward evaporating the substrate includes: sequentially evaporating two inorganic oxides on the at least one first inorganic oxide along a forward axis. On the oxide film, wherein the forward axis is parallel to a normal direction on the surface. The method for manufacturing an optical element as described in Claim 1, further One step includes: obliquely evaporating the substrate to form at least one third inorganic oxide film on the other surface of the substrate, wherein the surface and the other surface are respectively located on opposite sides of the substrate; and forward evaporation deposition on the substrate to form at least one fourth inorganic oxide film on the at least one third inorganic oxide film; wherein the at least one third inorganic oxide film is paired with the at least one fourth inorganic oxide film The material of any one of the pair of oxide films includes at least one of a metal element and silicon. The method for manufacturing an optical element as claimed in claim 9, wherein the material of any one of the at least one third inorganic oxide film pair and the at least one fourth inorganic oxide film pair includes WO ₃ , MgF ₂ , Si ₃ At least one of N ₄ , SiON, SiO ₂ , TiO ₂ , ZrO ₂ , Al ₂ O ₃ , ZnO ₂ , Cr ₂ O ₃ , SnO, In ₂ O ₃ , Ta ₂ O ₅ , Fe ₂ O ₃ , NbO ₅ By. The method for manufacturing an optical element as claimed in claim 1, wherein the material of any one of the at least one first inorganic oxide film pair and the at least one second inorganic oxide film pair includes WO ₃ , MgF ₂ , Si ₃ At least one of N ₄ , SiON, SiO ₂ , TiO ₂ , ZrO ₂ , Al ₂ O ₃ , ZnO ₂ , Cr ₂ O ₃ , SnO, In ₂ O ₃ , Ta ₂ O ₅ , Fe ₂ O ₃ , NbO ₅ By. The method for manufacturing an optical element as described in Claim 1, wherein the first film layer and the second film layer have the polarized light in the second direction respectively A second refractive index and a third refractive index are different. An optical element, comprising: a substrate having two opposite surfaces, both of which are concave or convex or a combination of both concave and convex; a pair of first inorganic oxide films located on at least one of the two surfaces One, the first inorganic oxide film pair includes a first film layer and a second film layer, the first film layer and the second film layer have the same refractive index for polarized light in a first direction, and have the same refractive index for polarized light in a first direction, and for a The polarized light in the second direction has a different refractive index; and a second inorganic oxide film pair located above the first inorganic oxide film pair.

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