JPH10133253A - Light quantity stopping device - Google Patents

Light quantity stopping device

Info

Publication number
JPH10133253A
JPH10133253A JP28974096A JP28974096A JPH10133253A JP H10133253 A JPH10133253 A JP H10133253A JP 28974096 A JP28974096 A JP 28974096A JP 28974096 A JP28974096 A JP 28974096A JP H10133253 A JPH10133253 A JP H10133253A
Authority
JP
Japan
Prior art keywords
filter
light amount
hard film
plastic
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28974096A
Other languages
Japanese (ja)
Inventor
Munetoshi Yoshikawa
宗利 吉川
Yoshio Kawakami
良男 川上
Hitoshi Nozue
均 野末
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Electronics Inc
Original Assignee
Canon Electronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Electronics Inc filed Critical Canon Electronics Inc
Priority to JP28974096A priority Critical patent/JPH10133253A/en
Publication of JPH10133253A publication Critical patent/JPH10133253A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a plastic filter which has sufficient strength of its surface to sliding and has the performance as an ND filter by using the filter formed with inorg. hard films on one or both surfaces of a plastic base plate. SOLUTION: The filter formed with the inorg. hard films on one or both surfaces of the plastic base plate is used for the light quantity stopping device having plural diaphragm vanes and the plastic ND filter for light quantity adjustment to be arranged in at least part within the aperture formed by these diaphragm vanes. The hard film forming materials are preferably SiOx (x=1 to 2), MgF2 , Al2 O3 , etc. The methods of forming the hard films are preferably vacuum vapor deposition, ion plating, etc. The film thicknesses of the hard films are generally preferably 1.0 to 0.5μm. As a result, the light quantity stopping device has the sufficient strength to sliding contact and can maintain the performance as the ND filter in a wavelength region of 400 to 700nm.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ビデオカメラ等の
撮影機器に使用するに適した光量絞り装置に関するもの
である。
[0001] 1. Field of the Invention [0002] The present invention relates to a light amount aperture device suitable for use in photographing equipment such as a video camera.

【0002】[0002]

【従来の技術】従来の光量絞り装置に使用されているN
D(neutral density)フィルターとし
ては、フィルム状をなす材料[セルロースアセテート、
PET(ポリエチレンテレフタレート)、塩化ビニル
等]中に光を吸収する有機色素または顔料を混ぜ、練り
込むタイプのもの、及び前記材料に光を吸収する染料ま
たは顔料を塗布するタイプのものが用いられている。光
量絞り装置の主要部分であるNDフィルター1及び絞り
羽根2は、図1に示すような構成をとっている。プラス
チックフィルムを使用している主な理由として、図2の
1に示す光量絞り装置を薄く作製できることが挙げられ
る。その結果、図2に示す光学断面図においてレンズ2
Aとレンズ2Bの間隔を短くすることができ、より高倍
率の画像を得ることが可能となる。
2. Description of the Related Art N light used in a conventional light amount diaphragm device
As a D (neutral density) filter, a material in the form of a film [cellulose acetate,
PET (polyethylene terephthalate), vinyl chloride, etc.], a type in which an organic dye or pigment that absorbs light is mixed and kneaded, and a type in which a dye or pigment that absorbs light is applied to the material are used. I have. The ND filter 1 and the aperture blade 2, which are main parts of the light quantity aperture device, have a configuration as shown in FIG. The main reason for using a plastic film is that the light amount aperture device shown in FIG. As a result, in the optical sectional view shown in FIG.
The distance between A and the lens 2B can be shortened, and a higher magnification image can be obtained.

【0003】因みに図2で、1A、1B、1C及び1D
は光量絞り装置1を構成しており、1AがNDフィルタ
ー、1Bと1Cが相対的に駆動される(ここでは、対向
的に移動する)絞り羽根で、2枚の絞り羽根は略菱系で
大きさの可変する開口を形成する。NDフィルターは、
絞り羽根の内の1枚に接着されている。1Dは絞り羽根
支持板である。また、2A、2B、2C及び2Dは撮影
光学系2を構成する成分レンズ、3はローパスフィルタ
ーで4は固体撮像素子である。
In FIG. 2, 1A, 1B, 1C and 1D
1A is an ND filter, 1B and 1C are relatively driven (here, opposed to each other) diaphragm blades, and two diaphragm blades are substantially rhombic. An opening having a variable size is formed. The ND filter is
It is bonded to one of the aperture blades. 1D is an aperture blade support plate. Reference numerals 2A, 2B, 2C, and 2D denote component lenses constituting the photographing optical system 2, 3 denotes a low-pass filter, and 4 denotes a solid-state image sensor.

【0004】[0004]

【発明が解決しようとする課題】しかし、絞り羽根に取
り付けられたプラスチック製NDフィルターは、表面が
プラスチックであるため、光量絞りが写界の明暗に応じ
て摺動する際、絞り羽根及び絞り羽根支持板とNDフィ
ルターが擦れ合い、NDフィルター表面にキズが生じて
しまう。近年、撮像素子の感度が上昇するに従い、その
キズが原因で解像度が低下してしまうという問題が発生
している。
However, since the surface of the plastic ND filter attached to the diaphragm blade is made of plastic, the diaphragm blade and the diaphragm blade when the light amount diaphragm slides in accordance with the brightness of the field of view. The support plate and the ND filter rub against each other, causing scratches on the ND filter surface. In recent years, as the sensitivity of the image sensor has increased, there has been a problem that the resolution is reduced due to the scratch.

【0005】従って、本発明は、前記プラスチックフィ
ルターの摺動に対する表面の十分な強度、及びNDフィ
ルターとしての性能を有した絞り装置の提供を課題とし
ている。
Accordingly, it is an object of the present invention to provide a diaphragm device having a sufficient strength of the surface of the plastic filter against sliding, and having a performance as an ND filter.

【0006】[0006]

【課題を解決するための手段】本発明は、相対的に駆動
されて絞り開口の大きさを可変する複数の絞り羽根と、
前記絞り羽根により形成された開口内の少なくとも一部
に配置される光量調整のためのプラスチック製NDフィ
ルターとを備えた光量絞り装置において、前記フィルタ
ーが、プラスチック基板の片面または両面に無機硬質膜
が形成されているフィルターであることを特徴とする光
量絞り装置である。
SUMMARY OF THE INVENTION The present invention comprises a plurality of aperture blades which are relatively driven to change the size of an aperture opening;
A light-aperture stop device including a plastic ND filter for adjusting a light amount disposed at least in a part of an opening formed by the diaphragm blade, wherein the filter has an inorganic hard film on one or both surfaces of a plastic substrate. A light amount diaphragm device characterized by being a formed filter.

【0007】プラスチック基板表面に形成する無機硬質
膜は、コストの観点からは片面のみに形成することが望
ましいが、絞り装置の設計上、摺動によってNDフィル
ター両面にキズが発生する場合は両面に形成する必要が
ある。
The inorganic hard film formed on the surface of the plastic substrate is desirably formed on only one side from the viewpoint of cost. However, due to the design of the drawing device, if scratches occur on both sides of the ND filter due to sliding, both sides are required. Need to be formed.

【0008】本発明の光量絞り装置は、NDフィルター
表面が絞り装置の開閉時の羽根部分との摺動接触に対し
て十分な強度を有し、かつ、可視光の波長領域400n
m〜700nmにおいて十分にNDフィルターとしての
性能を有するものである。
In the light amount diaphragm device of the present invention, the surface of the ND filter has a sufficient strength against sliding contact with the blade portion when the diaphragm device is opened and closed, and the visible light wavelength region 400n.
It has sufficient performance as an ND filter at m to 700 nm.

【0009】[0009]

【発明の実施の形態】硬質膜形成物質としてはSiOx
(x=1〜2)、MgF2 及びAl23 等が好まし
く、硬質膜の形成方法としては真空蒸着及びイオンプレ
ーティング等が好ましい。また、硬質膜の膜厚は、一般
的には、1.0μm〜0.05μmが好ましい。
BEST MODE FOR CARRYING OUT THE INVENTION As a hard film forming substance, SiO x
(X = 1 to 2), MgF 2, Al 2 O 3 and the like are preferable, and as a method for forming the hard film, vacuum deposition and ion plating are preferable. Generally, the thickness of the hard film is preferably from 1.0 μm to 0.05 μm.

【0010】(実施例1)まず、有機色素が練り込まれ
た厚さ100μmのNDフィルター上に、真空蒸着法に
よって、膜厚0.1μmの無機硬質膜を形成した。蒸着
法は、膜厚を比較的容易に制御でき、かつ光学特性を制
御することができ、さらに低温で成膜可能な方法として
優れているため選択した。得られた膜構造を図3に示
す。NDフィルターの材質としては、耐熱温度(Tg
が高く、また吸湿率の低いPETまたはPEN(ポリエ
チレンナフタレート)を選択した。硬質膜形成物質とし
ては、プラスチックフィルムに比べはるかに硬度が高
く、絞り装置の摺動に対して十分な強度を持つMgF2
またはSiO2 を選択した。これらの薄膜は光の吸収が
無い物質のため、NDフィルターの透過率特性も保持で
きる利点も持っている。
(Example 1) First, an inorganic hard film having a thickness of 0.1 μm was formed on a 100 μm-thick ND filter into which an organic dye was kneaded by a vacuum evaporation method. The vapor deposition method was selected because the film thickness can be controlled relatively easily, the optical characteristics can be controlled, and the film formation method is excellent as a method capable of forming a film at a low temperature. FIG. 3 shows the obtained film structure. The material of the ND filter is heat resistant temperature (T g )
PET or PEN (polyethylene naphthalate) having high moisture absorption and low moisture absorption was selected. As a hard film forming material, MgF 2 having much higher hardness than plastic film and having sufficient strength for sliding of a drawing device.
Alternatively, SiO 2 was selected. Since these thin films do not absorb light, they also have the advantage of maintaining the transmittance characteristics of the ND filter.

【0011】フィルターの形状は作製したNDフィルタ
ーを絞り羽根に接着する際、接着面の判別を容易にする
ために左右非対称とした。また、NDフィルターと絞り
羽根の十分な接着性を確保するため、NDフィルターの
接着部分には硬質膜は形成せず、プラスチック表面が露
出する状態とした。
The shape of the filter is made asymmetrical in order to make it easy to determine the bonding surface when the manufactured ND filter is bonded to the aperture blade. In addition, in order to ensure sufficient adhesion between the ND filter and the aperture blade, a hard film was not formed on the bonded portion of the ND filter, and the plastic surface was exposed.

【0012】以上の方法により作製したNDフィルター
表面の強度を確認するため、実際に光量絞り装置に取り
付け、絞りの開閉を25万回行い摺動させた。その結
果、蒸着法によって硬質膜を形成したNDフィルターの
硬質薄膜表面にはキズが発生していないことを確認した
(図4(a))。なお、同様の試験を硬質膜が形成され
ていないプラスチック製NDフィルターについて行った
ところ、絞り羽根とNDフィルターとの接触軌道上に大
きくキズが発生していることを確認した(図4
(b))。上記結果より、蒸着法で形成した硬質膜によ
って摺動接触に対して十分な強度を持つ光量絞り装置を
作製することができた。
In order to check the strength of the surface of the ND filter produced by the above method, the ND filter was actually mounted on a light amount diaphragm device, and the diaphragm was opened and closed 250,000 times and slid. As a result, it was confirmed that no scratch was generated on the hard thin film surface of the ND filter having the hard film formed by the vapor deposition method (FIG. 4A). When the same test was performed on a plastic ND filter on which a hard film was not formed, it was confirmed that a large scratch was generated on the contact orbit between the diaphragm blade and the ND filter (FIG. 4).
(B)). From the above results, it was possible to manufacture a light amount diaphragm device having sufficient strength against sliding contact by the hard film formed by the vapor deposition method.

【0013】(実施例2)次に、NDフィルター作製工
程を簡略化するため、硬質膜形成物質を選択し、透明な
厚さ100μmのPETまたはPEN基板上にNDフィ
ルターとしての機能を兼ね備える硬質膜を成膜した。こ
の方法により、NDフィルターの作製工程が、有機染料
の練り込み、硬質膜の蒸着という二つの工程から、硬質
膜の蒸着のみの単一工程に短縮できる。
Example 2 Next, in order to simplify the ND filter manufacturing process, a hard film forming substance was selected, and a hard film having a function as an ND filter was formed on a transparent PET or PEN substrate having a thickness of 100 μm. Was formed. According to this method, the process of fabricating the ND filter can be shortened from two processes of kneading the organic dye and depositing the hard film to a single process of depositing the hard film only.

【0014】得られた膜構造を図5に示す。いずれの膜
形成物質もプラスチック表面と比べ硬度が十分に高いた
め選択した。さらに第2、4及び6層のTiOy (y=
1〜2)層には、透過率を下げる機能を兼ね備える物質
を選択した。透過率は3層の総膜厚によって変化し、厚
くなるほど透過率は低下する。また、400nm〜70
0nmの波長範囲内での透過率のニュートラル性は、上
記TiOy 膜組成のyによって変化する。前記波長範囲
内で透過率をニュートラルとするためには、yの値を
1.2に設定して成膜することが望ましい。yの値が
1.2より小さい場合、特に400〜550nmの波長
範囲での透過率が減少する傾向がある。また、1.2よ
り大きい場合には400〜550nmの波長範囲で透過
率が増加し、ニュートラル性が悪化する傾向がある。
1、3及び5層はAl23 であり、TiOy と適当な
層厚で積層すると、400nm〜700nmの波長範囲
での反射率を低減する性質を兼ね備えていることから選
択した。上記のようにNDフィルターとしての機能を兼
ね備えた硬質膜を構成し、その上に実施例1と同様にM
gF2 またはSiO2 を形成した。ここでは、各層の膜
厚は、第1層:0.095μm、第2層:0.053μ
m、第3層:0.035μm、第4層:0.047μ
m、第5層:0.053μm、第6層:0.018μm
及び第7層:0.096μmとした。
FIG. 5 shows the obtained film structure. All the film-forming substances were selected because their hardness was sufficiently higher than the plastic surface. Further, the second, fourth and sixth layers of TiO y (y =
For the layers 1 and 2), a substance having a function of lowering the transmittance was selected. The transmittance changes depending on the total thickness of the three layers, and the transmittance decreases as the thickness increases. Also, 400 nm to 70
The neutrality of the transmittance in the wavelength range of 0 nm changes depending on the y of the TiO y film composition. In order to make the transmittance neutral within the above wavelength range, it is desirable to set the value of y to 1.2 and form the film. When the value of y is smaller than 1.2, the transmittance particularly in the wavelength range of 400 to 550 nm tends to decrease. If it is larger than 1.2, the transmittance increases in the wavelength range of 400 to 550 nm, and the neutrality tends to deteriorate.
The first, third and fifth layers are Al 2 O 3 and are selected because they have a property of reducing the reflectance in the wavelength range of 400 nm to 700 nm when laminated with TiO y at an appropriate thickness. As described above, a hard film having a function as an ND filter is formed.
gF 2 or SiO 2 was formed. Here, the thickness of each layer is 0.095 μm for the first layer and 0.053 μm for the second layer.
m, third layer: 0.035 μm, fourth layer: 0.047 μm
m, fifth layer: 0.053 μm, sixth layer: 0.018 μm
And the seventh layer: 0.096 μm.

【0015】作製したNDフィルターについて実施例1
と同様に摺動試験を行った。その結果、NDフィルター
の硬質膜表面はキズが発生しておらず、摺動接触に対し
て十分な強度を有するものであった(図6)。
Example 1 Regarding the ND Filter Produced
A sliding test was performed in the same manner as described above. As a result, the hard film surface of the ND filter was free of scratches and had sufficient strength against sliding contact (FIG. 6).

【0016】なお、作製したNDフィルターの透過率
は、図7に示すように波長領域400nm〜700nm
において一定の透過率を示し、フラット性に優れてい
る。反射率は図8に示すように上記波長領域において十
分低い値を示しており、NDフィルターとして十分許容
できるものである。
The transmittance of the fabricated ND filter is 400 nm to 700 nm as shown in FIG.
Shows a constant transmittance and is excellent in flatness. As shown in FIG. 8, the reflectivity shows a sufficiently low value in the above wavelength range, and is sufficiently acceptable as an ND filter.

【0017】本発明は以上述べたように、プラスチック
基板上に無機硬質膜を形成することにより、絞り装置開
閉時の羽根部分との摺動接触に対して十分な強度を持
ち、波長領域400nm〜700nmにおいてNDフィ
ルターとしての性能を有する光量絞り装置を提供でき
る。
As described above, by forming an inorganic hard film on a plastic substrate, the present invention has sufficient strength against sliding contact with the blade portion when opening and closing the diaphragm device, and has a wavelength range of 400 nm to 400 nm. It is possible to provide a light amount diaphragm device having a performance as an ND filter at 700 nm.

【図面の簡単な説明】[Brief description of the drawings]

【図1】光量絞り装置の主要部分を示す斜視図。FIG. 1 is a perspective view showing a main part of a light quantity stop device.

【図2】撮影系にNDフィルターを配したときの作用を
示すための光学断面図。
FIG. 2 is an optical cross-sectional view showing an operation when an ND filter is provided in a photographing system.

【図3】本発明の実施例1における硬質膜構造を示す
図。
FIG. 3 is a diagram showing a hard film structure according to the first embodiment of the present invention.

【図4】本発明の実施例1において行った摺動試験後の
NDフィルター表面の概略図。
FIG. 4 is a schematic diagram of an ND filter surface after a sliding test performed in Example 1 of the present invention.

【図5】本発明の実施例2における蒸着NDフィルター
の硬質膜構造を示す図。
FIG. 5 is a diagram showing a hard film structure of a vapor deposition ND filter in Embodiment 2 of the present invention.

【図6】本発明の実施例2において行った摺動試験後の
NDフィルター表面の概略図。
FIG. 6 is a schematic view of an ND filter surface after a sliding test performed in Example 2 of the present invention.

【図7】本発明の実施例2において測定した分光透過率
測定結果。
FIG. 7 shows a result of measurement of spectral transmittance measured in Example 2 of the present invention.

【図8】本発明の実施例2において測定した分光反射率
測定結果。
FIG. 8 shows a result of measuring spectral reflectance measured in Example 2 of the present invention.

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 相対的に駆動されて絞り開口の大きさを
可変する複数の絞り羽根と、前記絞り羽根により形成さ
れた開口内の少なくとも一部に配置される光量調整のた
めのプラスチック製NDフィルターとを備えた光量絞り
装置において、前記フィルターが、プラスチック基板の
片面または両面に無機硬質膜が形成されているフィルタ
ーであることを特徴とする光量絞り装置。
1. A plurality of aperture blades which are relatively driven to change the size of an aperture opening, and a plastic ND for adjusting a light amount disposed in at least a part of an opening formed by the aperture blades. A light amount diaphragm device comprising a filter, wherein the filter is a filter in which an inorganic hard film is formed on one or both surfaces of a plastic substrate.
【請求項2】 前記無機硬質膜が蒸着法によって形成さ
れた膜である請求項1記載の光量絞り装置。
2. The light amount stop device according to claim 1, wherein the inorganic hard film is a film formed by a vapor deposition method.
【請求項3】 前記無機硬質膜の最外層形成物質が、S
iOx またはMgF 2 である請求項1記載の光量絞り装
置。
3. The material for forming the outermost layer of the inorganic hard film is S
iOx Or MgF Two 2. The light amount aperture device according to claim 1, wherein
Place.
【請求項4】 前記プラスチック基板の材質が、PET
またはPENである請求項1記載の光量絞り装置。
4. The plastic substrate is made of PET.
The light amount diaphragm device according to claim 1, wherein the light amount diaphragm device is PEN.
【請求項5】 前記無機硬質膜がTiOy 層及びAl2
3 層を有する膜である請求項1記載の光量絞り装置。
5. The method according to claim 1, wherein the inorganic hard film comprises a TiO y layer and Al 2
The light amount stop device according to claim 1, wherein the light amount stop device is a film having an O 3 layer.
【請求項6】 前記フィルターの形状が左右非対称であ
る請求項1記載の光量絞り装置。
6. The light amount stop device according to claim 1, wherein the shape of the filter is left-right asymmetric.
【請求項7】 前記フィルターの絞り羽根との接着部分
には、プラスチック基板上に無機硬質膜が形成されてい
ないフィルターである請求項1記載の光量絞り装置。
7. The light amount stop device according to claim 1, wherein the filter is a filter in which an inorganic hard film is not formed on a plastic substrate at a portion where the filter is bonded to the stop blade.
JP28974096A 1996-10-31 1996-10-31 Light quantity stopping device Pending JPH10133253A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28974096A JPH10133253A (en) 1996-10-31 1996-10-31 Light quantity stopping device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28974096A JPH10133253A (en) 1996-10-31 1996-10-31 Light quantity stopping device

Publications (1)

Publication Number Publication Date
JPH10133253A true JPH10133253A (en) 1998-05-22

Family

ID=17747153

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28974096A Pending JPH10133253A (en) 1996-10-31 1996-10-31 Light quantity stopping device

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Cited By (8)

* Cited by examiner, † Cited by third party
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JP2002277612A (en) * 2001-03-15 2002-09-25 Canon Electronics Inc Nd filter, method for manufacturing nd filter, device for controlling light quantity, and image pickup device
US6671109B2 (en) 2001-07-27 2003-12-30 Nidec Copal Corporation ND filter having composite PVD film of metal and its oxide
US6842302B2 (en) * 2002-06-28 2005-01-11 Nisca Corporation ND filter, method for producing the ND filter, and aperture device including the ND filter
US6952314B2 (en) 2002-07-30 2005-10-04 Canon Denshi Kabushiki Kaisha Method of manufacturing ND filter, and aperture device and camera having ND filter
JP2007017642A (en) * 2005-07-06 2007-01-25 Tamron Co Ltd Optical filter, manufacturing method of the optical filter and optical apparatus
US7666527B2 (en) 2004-11-24 2010-02-23 Sumitomo Metal Mining Co., Ltd. Absorption type multi-layer film ND filter
US7932952B2 (en) * 2001-10-12 2011-04-26 Canon Kabushiki Kaisha Light quantity adjusting device, optical system having the same, and image taking apparatus
US8665520B2 (en) 2006-08-30 2014-03-04 Canon Denshi Kabushiki Kaisha Neutral density optical filter and image pickup apparatus

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002277612A (en) * 2001-03-15 2002-09-25 Canon Electronics Inc Nd filter, method for manufacturing nd filter, device for controlling light quantity, and image pickup device
JP4637383B2 (en) * 2001-03-15 2011-02-23 キヤノン電子株式会社 ND filter, ND filter manufacturing method, light amount adjusting device, and photographing device
US6671109B2 (en) 2001-07-27 2003-12-30 Nidec Copal Corporation ND filter having composite PVD film of metal and its oxide
US7932952B2 (en) * 2001-10-12 2011-04-26 Canon Kabushiki Kaisha Light quantity adjusting device, optical system having the same, and image taking apparatus
US6842302B2 (en) * 2002-06-28 2005-01-11 Nisca Corporation ND filter, method for producing the ND filter, and aperture device including the ND filter
US6952314B2 (en) 2002-07-30 2005-10-04 Canon Denshi Kabushiki Kaisha Method of manufacturing ND filter, and aperture device and camera having ND filter
US7666527B2 (en) 2004-11-24 2010-02-23 Sumitomo Metal Mining Co., Ltd. Absorption type multi-layer film ND filter
US8067102B2 (en) 2004-11-24 2011-11-29 Sumitomo Metal Mining Co., Ltd. Absorption type multi-layer film ND filter
JP2007017642A (en) * 2005-07-06 2007-01-25 Tamron Co Ltd Optical filter, manufacturing method of the optical filter and optical apparatus
US8665520B2 (en) 2006-08-30 2014-03-04 Canon Denshi Kabushiki Kaisha Neutral density optical filter and image pickup apparatus

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