CN104407410A - Double-refraction depolarization thin film - Google Patents
Double-refraction depolarization thin film Download PDFInfo
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- CN104407410A CN104407410A CN201410697324.5A CN201410697324A CN104407410A CN 104407410 A CN104407410 A CN 104407410A CN 201410697324 A CN201410697324 A CN 201410697324A CN 104407410 A CN104407410 A CN 104407410A
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- film
- depolarization
- birefringence
- refractive index
- high refractive
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
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Abstract
The invention provides a double-refraction depolarization thin film. The double-refraction depolarization thin film has the advantages that an obliquely-deposited anisotropy high-reflection film system is used, the double-refraction features of the thin film under different deposition angles are utilized, depolarization of TE and TM polarization light waves in a central working wavelength range under a 45-degree oblique incidence condition by the combination of the refraction rates of a high-refraction-rate film layer and a low-refraction-rate film layer, the optical performance of the double-refraction depolarization thin film can be regulated by thin film materials and the inclination angles of the thin film during deposition, and high design flexibility and system integration degree are achieved.
Description
Technical field
The present invention relates to field of manufacturing semiconductor devices, particularly relate to a kind of birefringence depolarization film.
Background technology
A large amount of function such as deflection, polarization using the device of optical film or light beam anti-, anti-reflection with the height realizing light wave in optical system.Along with the development of optical film technique, Film Optics has become an important branch of contemporary optics, and its application is deeply to multiple front line science field such as spacer remote sensing, space communtication.Even to this day, optical thin film has become a part indispensable in contemporary optics system, in national economy and national strategy demand, have great application potential.Depolarization film is as one of important optical thin film, and the depolarized light modulating performance of its excellence has vital impact to whole optical system.
The Design & preparation of conventional optical film is all for isotropic medium rete substantially, for isotropy film, when light wave oblique incidence, according to the plane of incidence that incident light and film interface normal are formed, incident light wave can be decomposed into orthogonal polarized light and horizontal polarization light, i.e. TE (s polarized light) and TM (p polarized light) two kinds of polarization state light waves.Due to Electric and magnetic fields tangential, TE ripple and TM ripple have different equivalent refractive indexs continuously, thus unavoidably must produce polarization separation.The oblique incidence of light wave is very common in contemporary optics system, utilizes this polarization separation characteristic of film under oblique incidence can design multiple polarization spectro-film.But in many optical systems, this polarization separation is again unallowed, such as, just require to eliminate separation between different polarization states light wave in space remote sensing field to obtain target emanation data accurately; In projection systems in order to obtain better demonstrating effect, also need to eliminate polarization separation.In some optical systems, polarization separation even can have a negative impact to whole beam Propagation, thus must reduce polarization separation as far as possible.Traditional Design of Depolarization Thin is utilize quarter-wave film system to be glued to realize depolarization in glass prism mostly, although the method can realize depolarization, need multiple optics combination together, system architecture is comparatively complicated.
Therefore, a kind of simple and feasible how is obtained and the depolarization film that integrated level height is easy to again to realize under oblique incidence condition is extremely necessary.
Summary of the invention
In view of the above problems, the invention provides a kind of birefringence depolarization film.
The technical scheme that technical solution problem of the present invention adopts is:
A kind of birefringence depolarization film, is applied in 45 ° of incident light environment tilted, wherein, comprises:
One substrate and be positioned at described suprabasil anisotropy birefringent film system;
Described anisotropy birefringent film system comprises alternately stacked high refractive index layer and low-index film, and the outermost layer of this anisotropy birefringent film system is high refractive index layer;
Wherein, every layer of described high refractive index layer and described low-index film are anisotropic rete, and the optical thickness of every layer of described high refractive index layer and described low-index film is 1/4th of the wavelength of described incident light.
Described birefringence depolarization film, wherein, described anisotropy birefringent film system is prepared by oblique incidence depositing operation.
Described birefringence depolarization film, wherein, described oblique incidence depositing operation is the physical gas-phase deposition of oblique incidence.
Described birefringence depolarization film, wherein, every layer of described high refractive index layer all adopts the oblique incidence depositing operation of same incident angle to be prepared; Every layer of described low-index film all adopts the oblique incidence depositing operation of same incident angle to be prepared.
Described birefringence depolarization film, wherein, prepares the incident angle that described high refractive index layer adopts identical with the incident angle that the described low-index film of preparation adopts.
Described birefringence depolarization film, wherein, prepares the incident angle that described high refractive index layer adopts identical with the incident angle that the described low-index film of preparation adopts.
Described birefringence depolarization film, wherein, preparing the incident angle that described high refractive index layer adopts is 60 °, and to prepare the incident angle that described low-index film adopts be 70 °.
Described birefringence depolarization film, wherein, the material of described anisotropy birefringent film system is Ta
2o
5.
Described birefringence depolarization film, wherein, the material of described substrate comprises K9 glass and/or quartz glass.
Described birefringence depolarization film, wherein, the main shaft of described high refractive index film is vertical with the main shaft of described low refractive index film.
Technique scheme tool has the following advantages or beneficial effect:
Birefringence depolarization film of the present invention is owing to employing the anisotropy highly reflecting films system of inclined deposition, it makes use of the birefringent characteristic of film under different angle of deposit, by the combination to high low-index film refractive index, the depolarization of TE and TM two kinds of polarization state light waves within the scope of center operating wavelength is achieved under 45 ° of oblique incidence condition, and the optical property of this birefringence depolarization film can be regulated and controled by the selection of deposited thin film material and film deposition process medium dip angle, thus has very high design flexibility and level of integrated system.
Accompanying drawing explanation
With reference to appended accompanying drawing, to describe embodiments of the invention more fully.But, appended accompanying drawing only for illustration of and elaboration, do not form limitation of the scope of the invention.
Fig. 1 is the structural representation of the oblique incidence precipitation equipment preparing birefringence depolarization film in the embodiment of the present invention;
Fig. 2 is the structural representation of 45 ° of oblique incidence birefringence depolarization films in the embodiment of the present invention;
Fig. 3 is the optical transmission spectra figure of birefringence depolarization film TE ripple and TM ripple in the embodiment of the present invention.
Embodiment
The invention provides a kind of birefringence depolarization film, can be applicable in 45 ° of incident light environment tilted, can be applicable to that technology node is 90nm, 65/55nm, 45/40nm, 32/28nm, be more than or equal to 130nm and be less than or equal in the technique of 22nm; Can be applicable in unpolarized thin film technique platform.
Birefringence depolarization film of the present invention mainly comprises: a substrate and the anisotropy birefringent film system be positioned on this substrate; This anisotropy birefringent film system comprises alternately stacked high refractive index layer and low-index film, and the outermost layer of this anisotropy birefringent film system is high refractive index layer; Wherein, every floor height refractivity film layer and low-index film are anisotropic rete, and the optical thickness of every floor height refractivity film layer and low-index film is 1/4th of the wavelength of incident light.
Below in conjunction with the drawings and specific embodiments, birefringence depolarization film of the present invention is described in detail.
As shown in Figure 2, a kind of birefringence depolarization film is provided in the present embodiment, it is by a substrate 201, and anisotropy birefraction film system 202 formation be coated with in this substrate 201, this anisotropy birefraction film system 202 is made up of some alternately stacked high refractive index layer 212 and low-index film 222, and the outermost layer of this anisotropy birefraction film system is high refractive index layer, high refractive index layer wherein and low-index film are anisotropic film.The structure of this anisotropy birefraction film system can use (HL)
xh represents, wherein, H represents anisotropy high refractive index layer, and L represents anisotropy low-index film, and x is high refractive index layer and low-index film periodically alternately repeated number of times.Each floor height refractivity film layer in birefraction film system and the thickness of every one deck low-index film are the wavelength of the incident light 203 of 1/4th.
The preparation method of above-mentioned anisotropy birefraction film system is adopt the physical vapour deposition (PVD) of oblique incidence (Physical Vapor Deposition is called for short: PVD) technology preparation, and adopts same Coating Materials, is preferably Ta in the present embodiment
2o
5, as shown in Figure 1, utilize the mode of electron beam evaporation to be heated by membraneous material after fritting respectively with different tilt angle alpha by evaporation source 101
1and α
2periodically alternately be deposited in the substrate fixed by base sheet rack 102, thus form high refractive index layer and low-index film respectively, above-mentioned tilt angle alpha
1and α
2for substrate normal is relative to the inclined deposition angle of evaporation source, it controls by stepper motor 103.The selection of the angle of deposit in the material of above-mentioned anisotropy birefraction film system and inclined deposition process determines the optical property of birefringence depolarization film.
Can adopt K9 glass and/or quartz glass etc. for above-mentioned substrate, wherein K9 glass is composed as follows: SiO
2=69.13%; B
2o
3=10.75%; BaO=3.07%; Na
2o=10.40%; K
2o=6.29%; As
2o
3=0.36%.
Under the anisotropy birefraction film in the birefringence depolarization film in the present embodiment ties up to the condition of inclination, prepared by electron beam evaporation technique, therefore this film system is obvious column structure, and wherein the anisotropic microstructure of every layer result in the anisotropic optical dielectric constant of rete, so the structural parameters of birefraction depolarization film and substrate find closely related relative to the angle of inclination of evaporation source.The extraction of birefringent film Rotating fields parameter can see H.J.Qi et al., Optical properties and microstructure of Ta
2o
5biaxial film, Appl.Opt.48 (1), 127-133 (2009).
A refractive index difference is only had to be with isotropy rete, the birefraction film cording of inclined deposition has three main shaft refractive indexes, and angle of deposit is different, the refractive index of film also can be different, and like this, the equivalent index of thin film of s polarization state light wave and p polarization state light wave is also different, different adjustments will be subject in transmitting procedure, therefore, according to two kinds of differing tilt angles deposit films, commaterial just can be utilized to obtain there is n
sh, n
phand n
sl, n
plthe rete of two groups of height low-refractions, wherein n
shand n
slbe respectively the refractive index of s polarized light in high low-index film, n
phand n
plbe respectively the refractive index of p polarized light in high low-index film.In order to make birefringent characteristic more remarkable, the main shaft of the high refractive index layer deposited and low-index film is because of mutually vertical, namely there is the angle of 90 ° in the optical axis of high refractive index layer and the optical axis of low-index film, the s polarized light of such high refractive index layer is propagated with the characteristic of p polarized light in low-index film, and p polarized light is then propagated with the characteristic of s polarized light in low-index film.Due to n
sh>n
sl, n
ph>n
pl, like this under normal incidence condition, the refractive index difference of s polarized light in high low-index film is less, and p polarized light refractive index difference is comparatively large, more easily realizes depolarization effect.
No matter be isotropic material or anisotropic material, replace stacked anisotropy birefraction film system (HL) for by high refractive index layer and low-index film
xh, its reflectivity and reflection bandwidth are decided by the ratio n of high index of refraction and low-refraction
h/ n
l, when rete number necessarily makes, ratio is larger, the reflectivity in central wavelength:
Higher, the zone of reflections is also wider.
Because the refractive indices of s polarized light increases along with the increase of incident angle, and the refractive indices of p polarized light reduces with the increase of incident angle, during such normal incidence, the bandwidth of s polarized light is narrower, and the broader bandwidth of p polarized light, by discussion above, with the increase of incident angle, s polarized light reflection bandwidth can broaden, p polarized light reflection bandwidth then can narrow, so just having an angle makes the reflection bandwidth of s polarized light and p polarized light substantially overlap, and words reasonable in design just can obtain the birefringence depolarization film under oblique incidence condition.
Be that the present invention is described in detail for the birefringence depolarization film of 632.8nm below in conjunction with centre wavelength.
Birefringence depolarization film in the present embodiment is applied in the oblique incidence luminous environment of 45 °, and this birefringence depolarization film adopts the electron beam evaporation physical gas phase deposition technology of oblique incidence to be prepared, and uses same Coating Materials Ta
2o
5, by replacing stacked high refractive index layer and low-index film with the angle of deposit preparation of 60 ° and 70 ° respectively in K9 substrate, thus form a birefraction film system, its film structure is K9/ (HL)
50h/A, H and L wherein represents that optical thickness is 1/4th high refractive index layer and the low-index films using wavelength (i.e. 158.2nm) respectively, and the underlying membrane system be made up of one deck high refractive index layer and one deck low-index film is repeated 50 times, outermost layer due to whole film system is high refractive index layer, so whole film system is divided into 101 layers, A is wherein incident air layer.Following table 1 gives the material of the anisotropy high and low refractive index rete in the birefringence depolarization film in the present embodiment, angle of deposit, optical thickness, three main shaft refractive indexes of rete and central wavelength two kinds of corresponding transmitances of polarization state light wave TE and TM.
Table 1
In the present embodiment, light wave 45 ° of oblique incidences on birefringence depolarization film.Fig. 3 depicts the optical transmission spectra of birefringence depolarization film TE ripple in the present embodiment and TM ripple.As shown in Figure 3, at centre wavelength 632.8nm place, because anisotropy birefraction film system is to the adjustment effect of two incoming polarization state light waves, the transmitance of TE ripple 301 is 0.0034%, and the transmitance of TM ripple 302 is 0.0181%, and two kinds of polarization state light wave reflection bandwidth overlap substantially, thus just achieve depolarization with same film material under oblique incidence condition.The centre wavelength of this birefringence depolarization film and transmitance number can by the material of the repetition period number and rete that regulate multi-layered anisotropic high and low refractive index rete, thickness and preparation time angle of inclination realize.
In sum, the birefringence depolarization film provided in the present invention and embodiment is owing to employing the anisotropy high reverse--bias HL of inclined deposition)
xh film system, utilize the birefringent characteristic of film under different angle of deposit, and by the combination to high and low refractive index thin-film refractive index, the depolarization of TE and TM two kinds of polarization state light waves within the scope of center operating wavelength is realized under 45 ° of incident conditions, level of integrated system is high, and the optical property of this birefringence depolarization film can carry out flexible modulation by the selection of rete deposition materials and film deposition process medium dip angle.
For a person skilled in the art, after reading above-mentioned explanation, various changes and modifications undoubtedly will be apparent.Therefore, appending claims should regard the whole change and correction of containing true intention of the present invention and scope as.In Claims scope, the scope of any and all equivalences and content, all should think and still belong to the intent and scope of the invention.
Claims (10)
1. a birefringence depolarization film, is applied in 45 ° of incident light environment tilted, it is characterized in that, comprising:
One substrate and be positioned at described suprabasil anisotropy birefringent film system;
Described anisotropy birefringent film system comprises alternately stacked high refractive index layer and low-index film, and the outermost layer of this anisotropy birefringent film system is high refractive index layer;
Wherein, every layer of described high refractive index layer and described low-index film are anisotropic rete, and the optical thickness of every layer of described high refractive index layer and described low-index film is 1/4th of the wavelength of described incident light.
2. birefringence depolarization film as claimed in claim 1, it is characterized in that, described anisotropy birefringent film system is prepared by oblique incidence depositing operation.
3. birefringence depolarization film as claimed in claim 1, it is characterized in that, described oblique incidence depositing operation is the physical gas-phase deposition of oblique incidence.
4. birefringence depolarization film as claimed in claim 3, it is characterized in that, every layer of described high refractive index layer all adopts the oblique incidence depositing operation of same incident angle to be prepared;
Every layer of described low-index film all adopts the oblique incidence depositing operation of same incident angle to be prepared.
5. birefringence depolarization film as claimed in claim 4, is characterized in that, prepares the incident angle that described high refractive index layer adopts identical with the incident angle that the described low-index film of preparation adopts.
6. birefringence depolarization film as claimed in claim 4, is characterized in that, prepares the incident angle that described high refractive index layer adopts identical with the incident angle that the described low-index film of preparation adopts.
7. birefringence depolarization film as claimed in claim 6, is characterized in that, preparing the incident angle that described high refractive index layer adopts is 60 °, and to prepare the incident angle that described low-index film adopts be 70 °.
8. birefringence depolarization film as claimed in claim 1, is characterized in that, the material of described anisotropy birefringent film system is Ta
2o
5.
9. birefringence depolarization film as claimed in claim 1, is characterized in that, the material of described substrate comprises K9 glass and/or quartz glass.
10. birefringence depolarization film as claimed in claim 1, it is characterized in that, the main shaft of described high refractive index film is vertical with the main shaft of described low refractive index film.
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| CN201410697324.5A CN104407410A (en) | 2014-11-26 | 2014-11-26 | Double-refraction depolarization thin film |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105988158A (en) * | 2015-03-19 | 2016-10-05 | 迪睿合株式会社 | Wavelength plate and optical device |
| CN108287384A (en) * | 2018-02-09 | 2018-07-17 | 深圳创维－Rgb电子有限公司 | A kind of liquid crystal display panel and its LCD TV |
| CN110749950A (en) * | 2019-11-29 | 2020-02-04 | 沈阳仪表科学研究院有限公司 | Refractive index matched depolarized film system |
| CN113215534A (en) * | 2021-05-07 | 2021-08-06 | 业成科技（成都）有限公司 | Optical element and method for manufacturing the same |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103713395A (en) * | 2014-01-15 | 2014-04-09 | 福建福特科光电股份有限公司 | Infrared depolarization beamsplitting device |
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2014
- 2014-11-26 CN CN201410697324.5A patent/CN104407410A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103713395A (en) * | 2014-01-15 | 2014-04-09 | 福建福特科光电股份有限公司 | Infrared depolarization beamsplitting device |
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| 王晴云等: ""双折射消偏振膜的设计和制备"", 《光学学报》 * |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105988158A (en) * | 2015-03-19 | 2016-10-05 | 迪睿合株式会社 | Wavelength plate and optical device |
| CN108287384A (en) * | 2018-02-09 | 2018-07-17 | 深圳创维－Rgb电子有限公司 | A kind of liquid crystal display panel and its LCD TV |
| CN110749950A (en) * | 2019-11-29 | 2020-02-04 | 沈阳仪表科学研究院有限公司 | Refractive index matched depolarized film system |
| CN110749950B (en) * | 2019-11-29 | 2021-11-12 | 沈阳仪表科学研究院有限公司 | Refractive index matched depolarized film system |
| CN113215534A (en) * | 2021-05-07 | 2021-08-06 | 业成科技（成都）有限公司 | Optical element and method for manufacturing the same |
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