TWI778144B - 雷射加工裝置 - Google Patents
雷射加工裝置 Download PDFInfo
- Publication number
- TWI778144B TWI778144B TW107135087A TW107135087A TWI778144B TW I778144 B TWI778144 B TW I778144B TW 107135087 A TW107135087 A TW 107135087A TW 107135087 A TW107135087 A TW 107135087A TW I778144 B TWI778144 B TW I778144B
- Authority
- TW
- Taiwan
- Prior art keywords
- liquid
- laser
- laser beam
- workpiece
- axis direction
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/56—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26 semiconducting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
- Dicing (AREA)
- Laser Surgery Devices (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017214473A JP6998178B2 (ja) | 2017-11-07 | 2017-11-07 | レーザー加工装置 |
JP2017-214473 | 2017-11-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201918313A TW201918313A (zh) | 2019-05-16 |
TWI778144B true TWI778144B (zh) | 2022-09-21 |
Family
ID=66401900
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW107135087A TWI778144B (zh) | 2017-11-07 | 2018-10-04 | 雷射加工裝置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6998178B2 (ja) |
KR (1) | KR102616529B1 (ja) |
CN (1) | CN109746572B (ja) |
TW (1) | TWI778144B (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102466684B1 (ko) * | 2020-12-01 | 2022-11-15 | 서울대학교 산학협력단 | 레이저를 이용한 세라믹 재료의 가공시스템 및 이를 이용한 가공방법 |
CN115458468B (zh) * | 2022-11-11 | 2023-03-24 | 扬州韩思半导体科技有限公司 | 一种半导体晶圆激光切割装置及方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201313373A (zh) * | 2011-07-20 | 2013-04-01 | Rena Gmbh | 刀具頭 |
JP2016036818A (ja) * | 2014-08-06 | 2016-03-22 | 株式会社ディスコ | レーザー加工装置 |
JP2016047547A (ja) * | 2014-08-28 | 2016-04-07 | 株式会社ディスコ | レーザー加工装置 |
TW201639652A (zh) * | 2015-01-29 | 2016-11-16 | Imra美國公司 | 雷射式修改透明材料的系統及其方法 |
TW201700206A (zh) * | 2015-06-18 | 2017-01-01 | Gongin Precision Industries Co Ltd | 液體雷射耦合系統及液體雷射加工裝置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57190795A (en) * | 1981-05-20 | 1982-11-24 | Matsushita Electric Ind Co Ltd | Laser working device |
JPS59178189A (ja) * | 1983-03-29 | 1984-10-09 | Inoue Japax Res Inc | レ−ザ加工装置 |
JPH10305420A (ja) | 1997-03-04 | 1998-11-17 | Ngk Insulators Ltd | 酸化物単結晶からなる母材の加工方法、機能性デバイスの製造方法 |
JP3408805B2 (ja) | 2000-09-13 | 2003-05-19 | 浜松ホトニクス株式会社 | 切断起点領域形成方法及び加工対象物切断方法 |
US20030062126A1 (en) * | 2001-10-03 | 2003-04-03 | Scaggs Michael J. | Method and apparatus for assisting laser material processing |
TWI236944B (en) | 2001-12-17 | 2005-08-01 | Tokyo Electron Ltd | Film removal method and apparatus, and substrate processing system |
JP2004188475A (ja) | 2002-12-13 | 2004-07-08 | Disco Abrasive Syst Ltd | レーザー加工方法 |
JP4843212B2 (ja) | 2004-10-29 | 2011-12-21 | 東京エレクトロン株式会社 | レーザー処理装置及びレーザー処理方法 |
JP2007144494A (ja) | 2005-11-30 | 2007-06-14 | Tokyo Electron Ltd | レーザー処理装置及びレーザー処理方法 |
KR101124347B1 (ko) | 2011-01-25 | 2012-03-23 | 주식회사아톤 | 사각 방향으로 조사되는 스캔된 레이저 빔을 이용한 대상물의 가공 방법 및 그 장치 |
JP6151557B2 (ja) | 2013-05-13 | 2017-06-21 | 株式会社ディスコ | レーザー加工方法 |
JP6189178B2 (ja) * | 2013-10-29 | 2017-08-30 | 株式会社ディスコ | レーザー加工装置 |
-
2017
- 2017-11-07 JP JP2017214473A patent/JP6998178B2/ja active Active
-
2018
- 2018-10-04 TW TW107135087A patent/TWI778144B/zh active
- 2018-10-31 KR KR1020180131923A patent/KR102616529B1/ko active IP Right Grant
- 2018-10-31 CN CN201811283324.5A patent/CN109746572B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201313373A (zh) * | 2011-07-20 | 2013-04-01 | Rena Gmbh | 刀具頭 |
JP2016036818A (ja) * | 2014-08-06 | 2016-03-22 | 株式会社ディスコ | レーザー加工装置 |
JP2016047547A (ja) * | 2014-08-28 | 2016-04-07 | 株式会社ディスコ | レーザー加工装置 |
TW201639652A (zh) * | 2015-01-29 | 2016-11-16 | Imra美國公司 | 雷射式修改透明材料的系統及其方法 |
TW201700206A (zh) * | 2015-06-18 | 2017-01-01 | Gongin Precision Industries Co Ltd | 液體雷射耦合系統及液體雷射加工裝置 |
Also Published As
Publication number | Publication date |
---|---|
JP2019084562A (ja) | 2019-06-06 |
CN109746572B (zh) | 2022-04-01 |
JP6998178B2 (ja) | 2022-01-18 |
KR102616529B1 (ko) | 2023-12-20 |
CN109746572A (zh) | 2019-05-14 |
TW201918313A (zh) | 2019-05-16 |
KR20190051822A (ko) | 2019-05-15 |
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