TWI771375B - 高寬高比玻璃晶圓 - Google Patents

高寬高比玻璃晶圓 Download PDF

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Publication number
TWI771375B
TWI771375B TW107105940A TW107105940A TWI771375B TW I771375 B TWI771375 B TW I771375B TW 107105940 A TW107105940 A TW 107105940A TW 107105940 A TW107105940 A TW 107105940A TW I771375 B TWI771375 B TW I771375B
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TW
Taiwan
Prior art keywords
equal
glass wafer
less
glass
wafer
Prior art date
Application number
TW107105940A
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English (en)
Chinese (zh)
Other versions
TW201834223A (zh
Inventor
麥可盧西安 格尼爾
約翰泰勒 基奇
羅伯特 撒比亞
Original Assignee
美商康寧公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商康寧公司 filed Critical 美商康寧公司
Publication of TW201834223A publication Critical patent/TW201834223A/zh
Application granted granted Critical
Publication of TWI771375B publication Critical patent/TWI771375B/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C03C2217/732—Anti-reflective coatings with specific characteristics made of a single layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Glass Compositions (AREA)
  • Surface Treatment Of Glass (AREA)
  • Electroluminescent Light Sources (AREA)
TW107105940A 2017-02-24 2018-02-22 高寬高比玻璃晶圓 TWI771375B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201762463320P 2017-02-24 2017-02-24
US62/463,320 2017-02-24

Publications (2)

Publication Number Publication Date
TW201834223A TW201834223A (zh) 2018-09-16
TWI771375B true TWI771375B (zh) 2022-07-21

Family

ID=61599639

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107105940A TWI771375B (zh) 2017-02-24 2018-02-22 高寬高比玻璃晶圓

Country Status (7)

Country Link
US (1) US10935698B2 (https=)
EP (1) EP3585743A1 (https=)
JP (2) JP7594857B2 (https=)
KR (1) KR102536919B1 (https=)
CN (2) CN121878904A (https=)
TW (1) TWI771375B (https=)
WO (1) WO2018156894A1 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
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WO2017178912A1 (en) * 2016-04-13 2017-10-19 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and display device including the semiconductor device
CN116655238A (zh) * 2018-08-31 2023-08-29 Ａｇｃ株式会社 光学玻璃和光学部件
US12037282B2 (en) 2018-11-01 2024-07-16 Corning Incorporated Strengthened glass articles with reduced delayed breakage and methods of making the same
US11022753B2 (en) * 2019-02-14 2021-06-01 Magic Leap, Inc. Biased total thickness variations in waveguide display substrates
US11279614B2 (en) * 2019-06-28 2022-03-22 Analog Devices, Inc. Low-parasitic capacitance MEMS inertial sensors and related methods
EP3970193A2 (en) * 2019-09-17 2022-03-23 Google LLC Suppressing scattering of light transmitted through oled displays
JP7003178B2 (ja) * 2020-04-21 2022-01-20 Hoya株式会社 円盤状ガラス基板の製造方法、薄板ガラス基板の製造方法、導光板の製造方法及び円盤状ガラス基板
CN114180826A (zh) * 2020-09-14 2022-03-15 肖特股份有限公司 低光损耗玻璃制品

Citations (6)

* Cited by examiner, † Cited by third party
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US20030044577A1 (en) * 2001-08-22 2003-03-06 Lisa Dhar Method and apparatus for multilayer optical articles
US20070082179A1 (en) * 2005-10-07 2007-04-12 Wade James J Method and apparatus for forming optical articles
US20100002312A1 (en) * 2008-07-01 2010-01-07 Micron Technology, Inc. Over-molded glass lenses and method of forming the same
US20120302063A1 (en) * 2011-05-27 2012-11-29 Shawn Rachelle Markham Non-polished glass wafer, thinning system and method for using the non-polished glass wafer to thin a semiconductor wafer
US20130264672A1 (en) * 2012-04-10 2013-10-10 Schott Ag Infrared absorbing glass wafer and method for producing same
US20160071981A1 (en) * 2013-04-30 2016-03-10 Corning Incorporated Glass with depleted layer and polycrystalline-silicon tft built thereon

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US7086927B2 (en) 2004-03-09 2006-08-08 Micron Technology, Inc. Methods and systems for planarizing workpieces, e.g., microelectronic workpieces
CN100501932C (zh) * 2005-04-27 2009-06-17 株式会社迪斯科 半导体晶片及其加工方法
JP5390740B2 (ja) * 2005-04-27 2014-01-15 株式会社ディスコ ウェーハの加工方法
US7928026B2 (en) 2005-06-30 2011-04-19 Corning Incorporated Synthetic silica material with low fluence-dependent-transmission and method of making the same
US7691730B2 (en) 2005-11-22 2010-04-06 Corning Incorporated Large area semiconductor on glass insulator
DE102006032047A1 (de) * 2006-07-10 2008-01-24 Schott Ag Verfahren zur Herstellung optoelektronischer Bauelemente und damit hergestellte Erzeugnisse
US20080179755A1 (en) * 2007-01-31 2008-07-31 International Business Machines Corporation Structure and method for creating reliable deep via connections in a silicon carrier
US8062986B2 (en) 2007-07-27 2011-11-22 Corning Incorporated Fused silica having low OH, OD levels and method of making
JP5091066B2 (ja) 2008-09-11 2012-12-05 富士フイルム株式会社 固体撮像装置の製造方法
JP5436876B2 (ja) * 2009-02-02 2014-03-05 株式会社ディスコ 研削方法
JP5060571B2 (ja) * 2010-03-08 2012-10-31 株式会社大川金型設計事務所 ウェーハホルダフレームの製造方法
WO2012056807A1 (ja) * 2010-10-25 2012-05-03 日本碍子株式会社 セラミックス材料、積層体、半導体製造装置用部材及びスパッタリングターゲット部材
US8859103B2 (en) 2010-11-05 2014-10-14 Joseph Eugene Canale Glass wafers for semiconductor fabrication processes and methods of making same
JP6395600B2 (ja) 2012-05-30 2018-09-26 オリンパス株式会社 撮像装置の製造方法および半導体装置の製造方法
WO2013179767A1 (ja) 2012-05-30 2013-12-05 オリンパス株式会社 撮像装置の製造方法および半導体装置の製造方法
US9221289B2 (en) * 2012-07-27 2015-12-29 Apple Inc. Sapphire window
JP2014151376A (ja) 2013-02-05 2014-08-25 Seiko Instruments Inc ウエハ研磨方法及び電子デバイス製造方法
US9966293B2 (en) * 2014-09-19 2018-05-08 Infineon Technologies Ag Wafer arrangement and method for processing a wafer
WO2016115685A1 (en) 2015-01-20 2016-07-28 Schott Glass Technologies (Suzhou) Co. Ltd. Low cte glass with high uv-transmittance and solarization resistance
KR102508645B1 (ko) 2015-03-10 2023-03-10 니폰 덴키 가라스 가부시키가이샤 반도체용 지지 유리 기판 및 이것을 사용한 적층 기판

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030044577A1 (en) * 2001-08-22 2003-03-06 Lisa Dhar Method and apparatus for multilayer optical articles
US20070082179A1 (en) * 2005-10-07 2007-04-12 Wade James J Method and apparatus for forming optical articles
US20100002312A1 (en) * 2008-07-01 2010-01-07 Micron Technology, Inc. Over-molded glass lenses and method of forming the same
US20120302063A1 (en) * 2011-05-27 2012-11-29 Shawn Rachelle Markham Non-polished glass wafer, thinning system and method for using the non-polished glass wafer to thin a semiconductor wafer
US20130264672A1 (en) * 2012-04-10 2013-10-10 Schott Ag Infrared absorbing glass wafer and method for producing same
US20160071981A1 (en) * 2013-04-30 2016-03-10 Corning Incorporated Glass with depleted layer and polycrystalline-silicon tft built thereon

Also Published As

Publication number Publication date
JP2023040087A (ja) 2023-03-22
US20180246257A1 (en) 2018-08-30
EP3585743A1 (en) 2020-01-01
KR102536919B1 (ko) 2023-05-25
JP2020511383A (ja) 2020-04-16
WO2018156894A1 (en) 2018-08-30
CN121878904A (zh) 2026-04-17
KR20190117018A (ko) 2019-10-15
TW201834223A (zh) 2018-09-16
CN110461784A (zh) 2019-11-15
US10935698B2 (en) 2021-03-02
JP7594857B2 (ja) 2024-12-05

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