TWI769556B - Foup cleaning device - Google Patents
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- TWI769556B TWI769556B TW109135889A TW109135889A TWI769556B TW I769556 B TWI769556 B TW I769556B TW 109135889 A TW109135889 A TW 109135889A TW 109135889 A TW109135889 A TW 109135889A TW I769556 B TWI769556 B TW I769556B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02046—Dry cleaning only
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
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- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
本發明的目的在於提供一種能夠提高前開式晶圓傳送盒主體及前開式晶圓傳送盒蓋的清潔及乾燥效率並提高通氣管噴嘴的乾燥效率的前開式晶圓傳送盒清潔裝置。用於實現此目的的本發明為包括前開式晶圓傳送盒主體及前開式晶圓傳送盒蓋的前開式晶圓傳送盒清潔裝置,其特徵在於,在所述前開式晶圓傳送盒主體配備有用於吹掃所述前開式晶圓傳送盒主體的內部的發泡多孔材質的通氣管噴嘴,包括利用清潔流體清潔所述前開式晶圓傳送盒主體和前開式晶圓傳送盒蓋的清潔腔室,在所述清潔腔室配備有在所述前開式晶圓傳送盒主體的清潔完成之後向所述通氣管噴嘴內注入壓縮乾燥空氣的壓縮乾燥空氣供應部。The object of the present invention is to provide a front-opening wafer transfer cassette cleaning device capable of improving the cleaning and drying efficiency of the front-opening wafer transfer cassette main body and the front-opening wafer transfer cassette cover and improving the drying efficiency of the vent pipe nozzle. The present invention for achieving this object is a front-opening wafer transfer cassette cleaning device comprising a front-opening wafer transfer cassette main body and a front-opening wafer transfer cassette cover, characterized in that the front-opening wafer transfer cassette main body is equipped with There is a vent pipe nozzle for blowing the foamed porous material inside the front-opening wafer transfer box main body, including a cleaning cavity for cleaning the front-opening wafer transfer box main body and the front-opening wafer transfer box cover with a cleaning fluid The cleaning chamber is equipped with a compressed drying air supply that injects compressed drying air into the air duct nozzle after the cleaning of the front-loading pod body is completed.
Description
本發明涉及一種前開式晶圓傳送盒清潔裝置,尤其涉及一種提高了用於基板的保管及搬運的前開式晶圓傳送盒的清潔及乾燥效率的前開式晶圓傳送盒清潔裝置。The present invention relates to a front-opening wafer transfer box cleaning device, in particular to a front-opening wafer transfer box cleaning device that improves the cleaning and drying efficiency of a front-opening wafer transfer box used for storage and transportation of substrates.
半導體製造工藝經過利用多種方法對半導體基板進行加工的一系列工序設備,因此當保管及搬運半導體基板時需要注意避免在外部的衝擊下受到損傷,並且需要進行管理以使基板的表面不被水分、灰塵、各種有機物等雜質污染。The semiconductor manufacturing process is a series of process equipment that processes semiconductor substrates by various methods. Therefore, when storing and transporting semiconductor substrates, care must be taken to avoid damage by external impact, and management must be performed so that the surface of the substrate is not affected by moisture, Dust, various organic matter and other impurities pollution.
因此,當保管及搬運半導體基板時使用單獨的保管容器(前開式晶圓傳送盒(FOUP,Front opening unified pod),以下稱為「FOUP」)。Therefore, a separate storage container (Front opening unified pod (FOUP), hereinafter referred to as "FOUP") is used when storing and transporting semiconductor substrates.
由於在以上述的用途使用的FOUP的內部收納有高精度的半導體基板,因此FOUP需要用於保持高清潔度的管理,為此,FOUP在FOUP清潔裝置中按週期進行清潔及乾燥。Since a high-precision semiconductor substrate is housed in the FOUP used for the above-mentioned purpose, the FOUP needs to be managed to maintain a high degree of cleanliness. For this reason, the FOUP is periodically cleaned and dried in a FOUP cleaning apparatus.
作為關於這種FOUP清潔裝置的現有技術,韓國公開專利第10-2013-0095028號、韓國授權專利第10-1173987中公開了將清潔液噴射到FOUP的表面而清潔FOUP的技術。As a prior art regarding such a FOUP cleaning device, Korean Patent Laid-Open No. 10-2013-0095028 and Korean Granted Patent No. 10-1173987 disclose a technique of cleaning FOUPs by spraying cleaning liquid on the surfaces of FOUPs.
並且,如韓國公開專利第10-2015-0078657號所述,在FOUP內部配備有用於吹掃(purge)收納於FOUP內部的基板的發泡多孔材質的通氣管噴嘴(Snorkel nozzle),但是具有如下問題:使在FOUP的清潔過程中吸收有清潔液的通氣管噴嘴完全乾燥以恢復到原來的性能需要大量的時間,使通氣管噴嘴完全乾燥所需要的時間內無法再使用FOUP,從而發生工藝損失。因此,需要開發一種在清潔FOUP之後使通氣管噴嘴迅速乾燥,從而能夠縮短恢復到原來的性能所需要的時間的FOUP清潔裝置。In addition, as described in Korean Laid-Open Patent Publication No. 10-2015-0078657, a snorkel nozzle of foamed porous material for purging the substrate accommodated in the FOUP is provided inside the FOUP, but has the following Problem: It takes a lot of time to completely dry the snorkel nozzle that has absorbed the cleaning solution during the cleaning process of the FOUP to restore its original performance, and the FOUP can no longer be used within the time required to completely dry the snorkel nozzle, resulting in process losses. . Therefore, there is a need to develop a FOUP cleaning device that can quickly dry the vent pipe nozzle after cleaning the FOUP, thereby reducing the time required to restore the original performance.
本發明為瞭解決上述的所有問題而提出,其目的在於提供一種能夠提高FOUP主體和FOUP蓋的清潔及乾燥效率並提高通氣管噴嘴的乾燥效率的FOUP清潔裝置。The present invention has been made in order to solve all the above-mentioned problems, and an object thereof is to provide a FOUP cleaning device which can improve the cleaning and drying efficiency of the FOUP main body and the FOUP cover and the drying efficiency of the vent pipe nozzle.
用於實現同上所述的目的的本發明的FOUP清潔裝置,用於清潔包括FOUP主體及FOUP蓋的FOUP,所述FOUP清潔裝置的特徵在於,在所述FOUP主體配備有用於吹掃所述FOUP主體的內部的發泡多孔材質的通氣管噴嘴,包括利用清潔流體清潔所述FOUP主體和FOUP蓋的清潔腔室,在所述清潔腔室配備有在所述FOUP主體的清潔完成之後向所述通氣管噴嘴內注入壓縮乾燥空氣的壓縮乾燥空氣供應部。A FOUP cleaning device of the present invention for achieving the above-mentioned object is used for cleaning a FOUP including a FOUP main body and a FOUP cover, and the FOUP cleaning device is characterized in that the FOUP main body is equipped with a device for purging the FOUP A vent pipe nozzle of foamed porous material inside the body, including a cleaning chamber for cleaning the FOUP body and FOUP cover with a cleaning fluid, the cleaning chamber is equipped with a cleaning chamber to the FOUP body after the cleaning of the FOUP body is completed. A compressed dry air supply part that injects compressed dry air into the vent pipe nozzle.
所述壓縮乾燥空氣供應部可以配備為可前後移動,以連接於所述通氣管噴嘴的一側端或解除連接。The compressed dry air supply part may be equipped to be movable back and forth to be connected to or disconnected from one side end of the air pipe nozzle.
在所述FOUP主體的一側面,連接所述通氣管噴嘴的端部的第一端口可以形成於一側,與所述FOUP主體的內部連通的第二端口形成於另一側,所述壓縮乾燥空氣供應部包括:第一噴嘴,向所述第一端口供應壓縮乾燥空氣;以及第二噴嘴,向所述第二端口供應壓縮乾燥空氣。On one side of the FOUP body, a first port connecting the end of the vent pipe nozzle may be formed on one side, and a second port communicating with the interior of the FOUP body may be formed on the other side, and the compression drying The air supply part includes: a first nozzle for supplying compressed dry air to the first port; and a second nozzle for supplying compressed dry air to the second port.
在所述第一端口和第二端口的內側可以分別配備有過濾器,所述過濾器藉由所述壓縮乾燥空氣而得以乾燥。A filter may be provided on the inner side of the first port and the second port, respectively, and the filter is dried by the compressed drying air.
所述壓縮乾燥空氣供應部可以包括:第一供應管,向所述第一噴嘴供應壓縮乾燥空氣並沿橫向配備;第二供應管,連通於所述第一供應管而向所述第二噴嘴供應壓縮乾燥空氣,並沿縱向配備;以及前後移動氣缸,使所述第一供應管和第二供應管前進或後退移動。The compressed dry air supply part may include: a first supply pipe for supplying compressed dry air to the first nozzle and arranged in a lateral direction; and a second supply pipe for communicating with the first supply pipe and for supplying the second nozzle to the second nozzle supplying compressed dry air and equipping it in the longitudinal direction; and moving the air cylinder back and forth to move the first supply pipe and the second supply pipe forward or backward.
所述通氣管噴嘴可以在所述FOUP主體的內部向兩側隔開而配備為多個,所述第一端口和第二端口在所述FOUP主體的一側面向兩側隔開而配備為多個,配備有所述第一噴嘴的第一供應管和配備有所述第二噴嘴的第二供應管分別向兩側隔開而配備為多個。The snorkel nozzles may be provided in multiples spaced on both sides inside the FOUP body, and the first port and the second port may be provided in multiples spaced on one side of the FOUP body facing both sides. Each of the first supply pipes equipped with the first nozzles and the second supply pipes equipped with the second nozzles are separated from each other on both sides and provided in plural.
所述FOUP清潔裝置還可以包括:第一供應管支撐部件,支撐多個所述第一供應管並連接於所述前後移動氣缸;以及第二供應管支撐部件,支撐多個所述第二供應管。The FOUP cleaning device may further include: a first supply pipe support member supporting a plurality of the first supply pipes and connected to the front and rear movement cylinders; and a second supply pipe support member supporting a plurality of the second supply pipes Tube.
在所述第一噴嘴和第二噴嘴可以結合有墊,所述墊緊貼於形成有所述第一端口和第二端口的所述FOUP主體的外側面而保持氣密。A pad may be combined with the first nozzle and the second nozzle, and the pad may be tightly adhered to the outer surface of the FOUP main body on which the first port and the second port are formed to maintain airtightness.
所述墊可以利用矽材質構成。The pad may be formed of silicon material.
在所述清潔腔室可以配備有:止動器,用於支撐所述FOUP主體的一側面,以使所述FOUP主體不會被從所述壓縮乾燥空氣供應部噴射的所述壓縮乾燥空氣推向一側而移動。The cleaning chamber may be equipped with: a stopper for supporting one side surface of the FOUP main body so that the FOUP main body is not pushed by the compressed dry air jetted from the compressed dry air supply part Move to one side.
所述清潔腔室可以配備有:外部清潔流體噴射部,向所述FOUP主體的外側面及所述FOUP蓋噴射清潔流體;以及內部清潔流體噴射部,向所述FOUP主體的內側面噴射清潔流體。The cleaning chamber may be equipped with: an outer cleaning fluid spray portion that sprays cleaning fluid to the outer side of the FOUP body and the FOUP cover; and an inner cleaning fluid spray portion that sprays cleaning fluid to the inner side of the FOUP body .
在所述外部清潔流體噴射部可以上下相隔地形成有噴射清潔流體的多個噴嘴,且所述多個噴嘴形成為各自的長度及噴射角不同,以使所述多個噴嘴靠近所述FOUP主體的外側面而佈置。A plurality of nozzles for jetting cleaning fluid may be formed in the external cleaning fluid jetting portion at intervals up and down, and the plurality of nozzles may be formed to have different lengths and jetting angles so that the plurality of nozzles are close to the FOUP main body arranged on the outer side.
所述FOUP主體可以可旋轉地配備於所述清潔腔室內,所述多個噴嘴傾斜地形成,以向與所述FOUP主體所旋轉的方向相向的方向噴射清潔流體。The FOUP body may be rotatably equipped in the cleaning chamber, and the plurality of nozzles may be obliquely formed to spray cleaning fluid in a direction opposite to the direction in which the FOUP body rotates.
在所述清潔腔室可以配備有:空氣供應部,噴射用於對清潔完畢的所述FOUP主體及FOUP蓋進行乾燥的壓縮乾燥空氣。The cleaning chamber may be provided with an air supply unit for spraying compressed dry air for drying the cleaned FOUP main body and the FOUP cover.
所述空氣供應部可以包括:外部空氣供應部,向所述FOUP主體的外側面噴射壓縮乾燥空氣;以及內部空氣供應部,向所述FOUP主體的內側面噴射壓縮乾燥空氣。The air supply part may include: an external air supply part that sprays compressed dry air to the outer side of the FOUP body; and an inner air supply part that sprays the compressed dry air to the inner side of the FOUP body.
在所述外部空氣供應部,可以上下相隔地形成有噴射壓縮乾燥空氣的多個噴嘴,且所述多個噴嘴形成為各自的長度及噴射角不同,以使所述多個噴嘴靠近所述FOUP主體的外側面而佈置。A plurality of nozzles for jetting compressed dry air may be formed in the external air supply part at intervals up and down, and the plurality of nozzles may be formed to have different lengths and jetting angles so that the plurality of nozzles are close to the FOUP arranged on the outer side of the main body.
所述FOUP主體可以可旋轉地配備於所述清潔腔室內,所述多個噴嘴傾斜地形成,以向與所述FOUP主體所旋轉的方向相向的方向噴射壓縮乾燥空氣。The FOUP main body may be rotatably equipped in the cleaning chamber, and the plurality of nozzles may be formed obliquely to spray compressed dry air in a direction opposite to the direction in which the FOUP main body rotates.
所述空氣供應部還可以包括:上部空氣供應部,在所述清潔腔室內部位於所述FOUP主體與所述FOUP蓋之間,且配備為可前後移動,從而向清潔完畢的所述FOUP主體及所述FOUP蓋噴射壓縮乾燥空氣。The air supply part may further include: an upper air supply part located between the FOUP main body and the FOUP cover inside the cleaning chamber, and equipped to be movable back and forth so as to supply the cleaned FOUP main body. And the FOUP cover sprays compressed dry air.
所述清潔腔室可以包括:清潔腔室主體,將所述FOUP主體收容於內部而進行清潔處理;清潔腔室蓋,開閉所述清潔腔室主體的上部,並將所述FOUP蓋支撐而進行清潔處理。The cleaning chamber may include: a cleaning chamber main body that accommodates the FOUP main body inside to perform cleaning; a cleaning chamber cover that opens and closes an upper portion of the cleaning chamber main body and supports the FOUP cover to perform the cleaning process cleaning process.
在所述清潔腔室主體內可以包括:安置部,配備於所述清潔腔室主體的下部,以安置所述FOUP主體;以及升降部,在所述清潔腔室主體的上部與下部之間升降,並且將所述FOUP主體轉移至所述安置部上或者從所述安置部接收所述FOUP主體,而使所述FOUP主體升降,其中,所述升降部藉由支撐部而與所述清潔腔室蓋連接,所述升降部與所述清潔腔室蓋藉由同一個升降驅動部而一同升降。The cleaning chamber body may include: a seating portion provided at a lower portion of the cleaning chamber body to seat the FOUP body; and a lifting portion lifting and lowering between the upper and lower portions of the cleaning chamber body , and transfer the FOUP body to the seating part or receive the FOUP body from the seating part, so as to lift the FOUP body, wherein the lifting part is connected to the cleaning chamber through the support part The chamber cover is connected, and the lifting part and the cleaning chamber cover are lifted and lowered together by the same lifting driving part.
在所述清潔腔室可以配備有:紫外線燈,照射用於對清潔完畢的所述FOUP主體及FOUP蓋進行乾燥的紫外線。The cleaning chamber may be equipped with an ultraviolet lamp for irradiating ultraviolet rays for drying the cleaned FOUP main body and the FOUP cover.
所述紫外線燈可以包括:外部紫外線燈,向所述FOUP主體的外側面照射紫外線;以及內部紫外線燈,向所述FOUP主體的內側面照射紫外線。The ultraviolet lamp may include: an external ultraviolet lamp, which irradiates ultraviolet rays to the outer side of the FOUP body; and an inner ultraviolet lamp, which irradiates ultraviolet rays to the inner side of the FOUP body.
所述FOUP清潔裝置還可以包括:真空腔室,使在所述清潔腔室完成清潔的FOUP主體及FOUP蓋被搬送,在所述真空腔室連接有:氮氣供應線,向所述真空腔室內部供應氮氣;以及真空線,將所述真空腔室內部的流體吸入之後排出至外部。The FOUP cleaning device may further include: a vacuum chamber for conveying the FOUP main body and the FOUP cover cleaned in the cleaning chamber, and a nitrogen gas supply line connected to the vacuum chamber for feeding into the vacuum chamber Nitrogen gas is supplied inside; and a vacuum line sucks the fluid inside the vacuum chamber and discharges it to the outside.
在所述真空腔室可以配備有向所述通氣管噴嘴內注入氮氣的氮氣供應部。The vacuum chamber may be equipped with a nitrogen supply for injecting nitrogen into the snorkel nozzle.
所述氮氣供應部可以配備為可前後移動,以連接於所述通氣管噴嘴的一側端或解除連接。The nitrogen supply part may be equipped to be movable back and forth to be connected to or disconnected from one side end of the snorkel nozzle.
在所述真空腔室可以配備有:第二止動器,用於支撐所述FOUP主體的一側面,以使所述FOUP主體不會被從所述氮氣供應部噴射的所述氮氣推向一側而移動。The vacuum chamber may be equipped with: a second stopper for supporting one side surface of the FOUP body so that the FOUP body is not pushed to a side by the nitrogen gas injected from the nitrogen supply part move sideways.
根據本發明的FOUP清潔裝置,配備有在清潔完FOUP主體之後向通氣管噴嘴內注入壓縮乾燥空氣的壓縮乾燥空氣供應部,從而能夠快速乾燥通氣管噴嘴,因此具有縮短恢復原來的性能所需的時間的效果。The FOUP cleaning device according to the present invention is equipped with a compressed dry air supply part that injects compressed dry air into the vent pipe nozzle after cleaning the FOUP main body, so that the vent pipe nozzle can be quickly dried, and therefore, it is possible to shorten the time required to restore the original performance. effect of time.
並且,使壓縮乾燥空氣供應部前後移動而使第一噴嘴和第二噴嘴同時連接到形成於FOUP主體的一側面的第一端口和第二端口,進而供應壓縮乾燥空氣,從而能夠提高通氣管噴嘴的乾燥及FOUP主體內部的乾燥效率。Further, by moving the compressed dry air supply unit forward and backward, the first nozzle and the second nozzle are connected to the first port and the second port formed on one side of the FOUP main body at the same time, and the compressed dry air is supplied, so that the ventilation pipe nozzle can be increased. drying and drying efficiency inside the FOUP body.
並且,向在清潔腔室完成清潔的FOUP主體內部所配備的通氣管噴嘴注入壓縮乾燥空氣以進行一次乾燥,並在真空腔室向通氣管噴嘴注入氮氣以進行二次乾燥,從而能夠在短時間內將發泡多孔材質的通氣管噴嘴完全乾燥。In addition, compressed dry air is injected into the snorkel nozzle provided inside the FOUP main body that has been cleaned in the cleaning chamber for primary drying, and nitrogen gas is injected into the snorkel nozzle in the vacuum chamber for secondary drying, so that a short time Completely dry the vent tube nozzle of the foamed porous material inside.
並且,通過配備用於支撐FOUP主體的一側面的止動器以防止FOUP主體被用於乾燥通氣管噴嘴的壓縮乾燥空氣或隨著氮氣的供應所產生的壓力被推向一側而移動,從而能夠在固定支撐FOUP主體的狀態下穩定地執行通氣管噴嘴的乾燥作業。And, by equipping a stopper for supporting one side of the FOUP body to prevent the FOUP body from being moved to one side by the compressed drying air used to dry the vent pipe nozzle or by the pressure generated by the supply of nitrogen gas, thereby The drying operation of the snorkel nozzle can be performed stably while the FOUP body is fixed and supported.
並且,使多個噴嘴各自的長度及噴射角不同,以在清潔腔室進行的清潔及乾燥的過程中,使FOUP主體及FOUP蓋旋轉而使清潔流體及壓縮乾燥空氣對FOUP主體及FOUP蓋的整個區域均勻地噴射,同時使噴射清潔流體及壓縮乾燥空氣的多個噴嘴靠近FOUP主體的外側面而佈置,並且多個噴嘴傾斜地形成,從而向與FOUP主體所旋轉的方向相向的方向噴射清潔流體,從而能夠進一步地提高清潔及乾燥效率。In addition, the lengths and spray angles of the plurality of nozzles are made different, so that the FOUP body and the FOUP cover are rotated during the cleaning and drying of the cleaning chamber, and the cleaning fluid and the compressed dry air are applied to the FOUP body and the FOUP cover. The entire area is sprayed uniformly, while a plurality of nozzles for spraying cleaning fluid and compressed dry air are arranged close to the outer side of the FOUP body, and the plurality of nozzles are formed obliquely so as to spray the cleaning fluid in a direction opposite to the direction in which the FOUP body rotates , so that the cleaning and drying efficiency can be further improved.
並且,構成為清潔腔室蓋與升降部通過同一升降驅動部的驅動而一同升降,從而能夠簡便並順利地執行將FOUP主體及FOUP蓋搬入並搬出清潔腔室的作業。In addition, the cleaning chamber cover and the lift unit are configured to be raised and lowered together by the driving of the same lift drive unit, so that the operation of carrying the FOUP main body and the FOUP cover into and out of the cleaning chamber can be performed easily and smoothly.
以下,參照附圖,對關於本發明的優選實施例的構成及作用進行詳細的說明。Hereinafter, with reference to the accompanying drawings, the configuration and operation of the preferred embodiments of the present invention will be described in detail.
本發明的FOUP清潔裝置1是用於清潔由FOUP主體20和FOUP蓋30構成的FOUP 10的裝置,其特徵在於,在所述FOUP主體20配備有用於吹掃所述FOUP主體20內部的發泡多孔材質的通氣管噴嘴21,並且包括利用清潔流體清潔所述FOUP主體20和FOUP蓋30的清潔腔室600,在所述清潔腔室600配備有在所述FOUP主體20清潔完成之後向所述通氣管噴嘴21內注入壓縮乾燥空氣的壓縮乾燥空氣供應部680。The
參照圖1及圖2,本發明的FOUP清潔裝置1是對用於保管及移送半導體基板的FOUP10進行清潔及乾燥的裝置。所述FOUP 10包括:FOUP主體20,收納半導體基板(未圖示);以及FOUP蓋30,開閉形成於所述FOUP主體20一側的開口部,其中,所述FOUP主體20及FOUP蓋30構成為藉由鎖定器(locker)(未示出)而分離或結合的結構。1 and 2 , the FOUP
所述FOUP清潔裝置1包括:工藝室100,執行所述FOUP 10的搬送、清潔及乾燥處理;裝載及卸載部200,用於將FOUP 10搬入及搬出所述工藝室100;待機部300,朝向所述裝載及卸載部200的一側配備於工藝室100內,並且使所述FOUP主體20與FOUP蓋30相互分離或結合;移送單元400,在所述裝載及卸載部200與待機部300之間移送FOUP 10;機器人500,在所述工藝室100內抓持並搬送FOUP主體20及FOUP蓋30;清潔腔室600,藉由所述機器人500接收位於所述待機部300的FOUP主體20及FOUP蓋30,進而利用清潔流體進行清潔後使其乾燥;真空腔室700,藉由所述機器人500接收在所述清潔腔室600經過清潔並乾燥後的FOUP主體20及FOUP蓋30,進而排放殘留於FOUP主體20及FOUP蓋30的包含水分的異物;以及緩衝部800,用於將在所述真空腔室700完成排放處理的FOUP主體20及FOUP蓋30搬送至所述待機部300之前進行臨時保管。並且,在所述工藝室100內部的一側可以配備有:公用部件(utility)910,配備有用於供應作為為了清潔及乾燥FOUP 10而使用的清潔流體的熱去離子水(Hot deionized water)、壓縮乾燥空氣(CDA:Compressed dry air)、氮氣(N2)等的設備;以及蒸汽單元920,配備有用於供應為了清潔FOUP 10而使用的蒸汽的設備。The
所述裝載及卸載部200是用於為了將清潔對象FOUP 10搬入工藝室100內而進行裝載(Loading)或者為了將在工藝室100完成清潔、乾燥及排放工序的FOUP 10搬出至工藝室100外部而進行卸載(Unloading)的構成。參照圖3,在所述裝載及卸載部200配備有使FOUP主體20向側方躺臥而使FOUP蓋30以位於一側的狀態安置的支撐板210。The loading and
所述待機部300是被移送單元400從所述裝載及卸載部200移送的FOUP 10在被搬送至清潔腔室600之前待機的地方,移送至所述待機部300的FOUP 10的姿勢被機器人500轉換為FOUP蓋30朝向下方。並且,在所述待機部300配備有用於將配備於FOUP主體20及FOUP蓋30的鎖定器鎖定或解鎖的鎖定及解鎖單元(未圖示)。所述鎖定及解鎖單元可以構成為使所述鎖定器向一方向或反方向旋轉,從而將鎖定器鎖定或解鎖。The
在所述待機部300配備有:待機板310,安置FOUP主體20和FOUP蓋30;以及升降氣缸320,使所述待機板310以沿上下方向移動的方式升降。所述升降氣缸320可以連接於移送單元400,從而藉由移送單元400的驅動而在裝載及卸載部200與待機部300之間往返移動。The
所述移送單元400是用於往返移送升降氣缸320的構成,作為一實施例,可以由線性運動導軌構成。The
對從所述裝載及卸載部200向待機部300移送FOUP 10的過程進行說明。若FOUP 10裝載於支撐板210上,則在所述支撐板210的下側待機的升降氣缸320上升移動,從而將位於支撐板210上的FOUP 10提升至支撐板210的上側。這種狀態下,升降氣缸320和FOUP 10藉由移送單元400的驅動而向待機部300側移動。若升降氣缸320和FOUP 10位於待機部300的待機板310上側,則升降氣缸320下降移動,從而將所支撐的FOUP 10放置於待機板310上。接下來,在機器人500的夾持器510抓持FOUP 10之後,旋轉FOUP 10使得FOUP蓋30朝向下方,然後放置於待機板310上,通過配備於待機部300的鎖定及解鎖單元解鎖鎖定器,從而使FOUP主體20與FOUP蓋30處於可分離的狀態。The procedure of transferring the
若同上所述地FOUP主體20與FOUP蓋30處於可分離的狀態,則藉由機器人500將FOUP主體20和FOUP蓋30依次搬送至清潔腔室600。When the FOUP
參照圖4及圖5,所述清潔腔室600包括:清潔腔室主體610,將所述FOUP主體20收容於內部而進行清潔及乾燥處理;清潔腔室蓋620,開閉所述清潔腔室主體610的上部,並將所述FOUP蓋30支撐而進行清潔及乾燥處理。4 and 5 , the
在所述清潔腔室主體610內包括:安置部611,配備於所述清潔腔室主體610的下部,以安置所述FOUP主體20;以及升降部634,在所述清潔腔室主體610的上部與下部之間升降,並且將所述FOUP主體20轉移至所述安置部611上,或者從所述安置部611接收所述FOUP主體20而使所述FOUP主體20升降。所述升降部634可以藉由支撐部633而與清潔腔室蓋620連接,並且所述升降部634與所述清潔腔室蓋620可以藉由同一個升降驅動部631一同升降。The cleaning chamber
在FOUP主體20及FOUP蓋30從所述待機部300移動至清潔腔室600的情況下,升降驅動部631上升移動,據此,清潔腔室蓋620、支撐部633及升降部634一同上升移動,從而清潔腔室主體610的上部被開放的同時,安置部611將向清潔腔室主體610的上部移動而待機於能夠接收FOUP主體20的位置。When the FOUP
在所述清潔腔室蓋620配備有:FOUP蓋支撐部621及夾具622,用於支撐並固定被機器人500移送的FOUP蓋30。The cleaning
若FOUP主體20藉由所述機器人500被轉移到升降部634上,且FOUP蓋30被FOUP蓋支撐部621及夾具622支撐並固定於清潔腔室蓋620,則清潔腔室蓋620和固定於清潔腔室蓋620的FOUP蓋30以及藉由支撐部633連接於清潔腔室蓋620的升降部634藉由升降驅動部631的下降驅動而以支撐FOUP主體20的狀態進行下降移動。在這種情況下,升降驅動部631下降驅動至驅動清潔腔室蓋620封閉清潔腔室主體610的上部的位置,在此過程中,升降部634在將FOUP主體20轉移到安置部611之後,位於安置部611的下側並待機。If the FOUP
參照圖5,在所述升降部634的中央部形成有貫通口634a,在所述貫通口634a的內側佈置有安置部611。因此,當升降部634升降移動時,防止與安置部611的干擾,並且能夠在升降部634與安置部611之間實現FOUP主體20的交接。Referring to FIG. 5 , a through
另外,在所述清潔腔室主體610配備有:清潔流體噴射部640:640-1、640-2,供應用於清潔FOUP主體20及FOUP蓋30的清潔流體。In addition, the cleaning chamber
所述清潔流體噴射部640可以包括:外部清潔流體噴射部640-1,向FOUP主體20的外側面及FOUP蓋30噴射清潔流體;以及內部清潔流體噴射部640-2,向所述FOUP主體20的內側面噴射清潔流體。The cleaning
所述外部清潔流體噴射部640-1中,多個噴嘴可以配備於上下相隔的位置,所述多個噴嘴配備於FOUP主體20的外側周圍且在朝向FOUP主體20的外側面噴射清潔流體的同時朝向FOUP蓋30噴射清潔流體。In the external cleaning fluid ejection portion 640-1, a plurality of nozzles may be provided at upper and lower positions, and the plurality of nozzles are provided around the outer side of the FOUP
所述內部清潔流體噴射部640-2以位於FOUP主體20的內側的方式配備於安置部611上,從而朝向FOUP主體20的內側面噴射清潔流體。The inner cleaning fluid ejection portion 640 - 2 is provided on the
另外,安置所述FOUP主體20的安置部611配備為能夠藉由馬達670的驅動而旋轉,支撐所述FOUP蓋30的FOUP蓋支撐部621也配備為能夠藉由馬達623的驅動而旋轉。In addition, the mounting
參照圖4,在所述外部清潔流體噴射部640-1可以上下相隔地形成有噴射清潔流體的多個噴嘴,所述多個噴嘴以靠近所述FOUP主體20的外側面的方式佈置,並且可以形成為各自的長度及噴射角不同。並且,所述FOUP主體20可旋轉地配備於所述清潔腔室600內,所述多個噴嘴可以傾斜地形成,以向與所述FOUP主體20旋轉的方向相向的方向噴射清潔流體。所述噴嘴所傾斜的角度可以形成為以連接噴嘴與FOUP主體20的中心的線為基準具有30°~ 40°範圍的傾斜。Referring to FIG. 4 , a plurality of nozzles for spraying cleaning fluid may be formed in the outer cleaning fluid spraying part 640 - 1 at intervals up and down, and the plurality of nozzles are arranged in a manner close to the outer surface of the FOUP
根據同上所述的構成,當清潔FOUP主體20及FOUP蓋30時,外部清潔流體噴射部640-1在靠近旋轉的FOUP主體20的外側面的位置向與FOUP主體20旋轉的方向相向的方向噴射清潔流體,因此能夠提高FOUP主體20的清潔效率。According to the configuration as described above, when cleaning the FOUP
作為一實施例,通過所述外部清潔流體噴射部640-1噴射的清潔流體可以是熱去離子水(Hot deionized water),通過所述內部清潔流體噴射部640-2噴射的清潔流體可以是蒸汽(Steam)。並且,在所述熱去離子水及蒸汽中可以混合壓縮乾燥空氣CDA而提供。As an example, the cleaning fluid sprayed by the external cleaning fluid spraying part 640-1 may be hot deionized water, and the cleaning fluid sprayed by the internal cleaning fluid spraying part 640-2 may be steam (Steam). In addition, compressed dry air CDA may be mixed with the hot deionized water and steam to provide.
通過同上所述地向外部清潔流體噴射部640-1供應熱去離子水與壓縮乾燥空氣的混合流體,從而使高溫的氣泡化及微粒子化的水粒子能夠細密地浸透FOUP主體20的外側面及FOUP蓋30,從而能夠提高清潔力並縮短乾燥時間,並且提高噴射的壓力,從而可以提高清潔效率。By supplying the mixed fluid of hot deionized water and compressed dry air to the external cleaning fluid injection part 640 - 1 as described above, high-temperature bubbled and micronized water particles can finely permeate the outer surface of the FOUP
並且,通過向內部清潔流體噴射部640-2供應蒸汽與壓縮乾燥空氣的混合流體,從而利用相比於熱去離子水進一步微粒子化的蒸汽能夠在FOUP主體20內側面整個區域無死角地更細密地浸透,從而能夠進一步提高清潔力。In addition, by supplying a mixed fluid of steam and compressed dry air to the internal cleaning fluid ejection portion 640-2, the steam that has been finer than that of hot deionized water can be made finer without dead space in the entire inner surface area of the
另外,在所述清潔腔室600配備有:空氣供應部650,噴射用於乾燥完成清潔的所述FOUP主體20及FOUP蓋30的壓縮乾燥空氣。In addition, the
所述空氣供應部650包括:外部空氣供應部650-1,向FOUP主體20的外側面噴射壓縮乾燥空氣;以及內部空氣供應部650-2,向所述FOUP主體20的內側面噴射壓縮乾燥空氣。The
在所述外部空氣供應部650-1,作為與上述外部清潔流體噴射部640-1的構成相似的構成,噴射壓縮乾燥空氣的多個噴嘴上下相隔而形成,所述多個噴嘴靠近所述FOUP主體20的外側面而佈置,且形成為各自的長度及噴射角不同。並且,所述多個噴嘴可以傾斜地形成,以向與所述FOUP主體20所旋轉的方向相向的方向噴射壓縮乾燥空氣。所述噴嘴傾斜的角度可以形成為以連接噴嘴與FOUP主體20的中心的線為基準具有30°~ 40°範圍的傾斜。In the outside air supply part 650-1, a plurality of nozzles for spraying compressed dry air are formed at intervals up and down, and the plurality of nozzles are close to the FOUP, as a configuration similar to that of the above-mentioned external cleaning fluid spraying part 640-1. The outer surface of the
根據同上所述的構成,由於當對FOUP主體20進行乾燥時,在靠近旋轉的FOUP主體20的外側面的位置向與FOUP主體20所旋轉的方向相向的方向噴射壓縮乾燥空氣,因此能夠提高FOUP主體20及FOUP蓋30的乾燥效率。According to the configuration as described above, when drying the FOUP
另外,所述空氣供應部650還可以包括:上部空氣供應部650-3,在清潔腔室600內部位於所述FOUP主體20與所述FOUP蓋30之間,且配備為能夠藉由氣缸651的驅動而前後移動,從而向完成清潔的FOUP主體20及FOUP蓋30噴射壓縮乾燥空氣。通過將所述上部空氣供應部650-3構成為可前後移動,從而如圖4所示,能夠有效地對積聚在開口部朝向下方而安置的FOUP主體20的上表面的水分進行乾燥並去除,並且能夠有效地對殘留於FOUP蓋30的整個區域的水分進行乾燥並去除。In addition, the
另外,參照圖4至圖8,在所述FOUP主體20配備有用於吹掃FOUP主體20內部的發泡多孔材質的通氣管噴嘴21,在清潔腔室600配備有在FOUP主體20清潔完畢之後向所述通氣管噴嘴21內注入壓縮乾燥空氣的壓縮乾燥空氣供應部680。In addition, referring to FIGS. 4 to 8 , the FOUP
所述壓縮乾燥空氣供應部680配備為可前後移動,以連接於通氣管噴嘴21的一側端或解除連接。因此,通過借助由上述的空氣供應部650進行的壓縮乾燥空氣噴射執行的乾燥過程而還未得到乾燥並殘留於通氣管噴嘴21的水分,將通過借助所述壓縮乾燥空氣供應部680進行的朝向通氣管噴嘴21內部的壓縮乾燥空氣的注入而再次得到乾燥。The compressed dry
在所述FOUP主體20的一側面,配備為一對的通氣管噴嘴21的端部分別所連接的第一端口20a、20b形成於一側,與所述FOUP主體20的內部連通的第二端口20c、20d形成於另一側。On one side of the FOUP
在基板處理工序中,為了在基板被收納於FOUP 10之前的步驟中在FOUP 10待機的儲料器(Stocker)中乾燥FOUP 10內部,所述第一端口20a、20b與第二端口20c、20d可以作為壓縮乾燥空氣流入及排出的連接端口而發揮功能。In the substrate processing step, the
所述壓縮乾燥空氣供應部680包括:第一噴嘴682:682-1、682-2,向所述第一端口20a、20b供應壓縮乾燥空氣;第二噴嘴684:684-1、684-2,向所述第二端口20c、20d供應壓縮乾燥空氣。在所述第一端口20a、20b和第二端口20c、20d的內側可以分別配備有過濾器22a、22b、22c、22d,在FOUP主體20的清潔過程中,吸收有清潔流體的所述過濾器22a、22b、22c、22d可以藉由壓縮乾燥空氣而快速被乾燥。The compressed dry
參照圖8,所述壓縮乾燥空氣供應部680包括:第一供應管681:681-1、681-2,向所述第一噴嘴682:682-1、682-2供應壓縮乾燥空氣並沿橫向配備;第二供應管683:683-1、683-2,連通於所述第一供應管681:681-1、681-2而向所述第二噴嘴684:684-1、684-2供應壓縮乾燥空氣並沿縱向配備;以及前後移動氣缸685,使所述第一供應管681:681-1、681-2和第二供應管683:683-1、683-2前進或後退移動。8 , the compressed drying
所述通氣管噴嘴21可以在FOUP主體20的內部向兩側隔開而配備為多個,所述第一端口20a、20b和第二端口20c、20d在所述FOUP主體20的一側面向兩側隔開而配備為多個,並且配備有所述第一噴嘴682:682-1、682-2的第一供應管681:681-1、681-2和配備有所述第二噴嘴684:684-1、684-2的第二供應管683:683-1、683-2分別向兩側隔開而配備為多個。The
所述多個第一供應管681:681-1、681-2可以被第一供應管支撐部件686支撐,所述多個第二供應管683:683-1、683-2被第二供應管支撐部件689-1、689-2支撐。在所述第一供應管支撐部件686結合有移動塊687,所述移動塊687連接於所述前後移動氣缸685而藉由前後移動氣缸685的驅動而前後移動。所述前後移動氣缸685可以安置而固定於固定框架688上。The plurality of first supply pipes 681: 681-1, 681-2 may be supported by the first supply
在所述第一噴嘴682:682-1、682-2和第二噴嘴684:684-1、684-2可以結合有墊682a,所述墊682a緊貼於形成有所述第一端口20a、20b和第二端口20c、20d的所述FOUP主體20的外側面而保持氣密。作為一實施例,所述墊682a可以利用矽材質構成。A
參照圖9,在所述清潔腔室600配備有:止動器690,用於支撐所述FOUP主體20的一側面,以使FOUP主體20不會被從所述壓縮乾燥空氣供應部680噴射的所述壓縮乾燥空氣推向一側而移動。9 , the
所述止動器690可以包括:旋轉氣缸691,向兩個方向旋轉驅動;軸693:693-1、693-2,連接於所述旋轉氣缸691的氣缸驅動軸692-1、692-2。The
若所述軸693:693-1、693-2藉由所述旋轉氣缸691的一方向旋轉驅動而向一方向旋轉,則所述軸693:693-1、693-2的端部與所述FOUP主體20的一側面接觸而支撐所述FOUP主體20,若所述軸693:693-1、693-2藉由所述旋轉氣缸691的反方向旋轉驅動而向反方向旋轉,則所述軸693:693-1、693-2的端部從所述FOUP主體20的一側面隔開而使支撐FOUP主體20的狀態解除。If the shafts 693 : 693-1 and 693-2 are rotated in one direction by the rotational driving of the
所述氣缸驅動軸692-1、692-2可以配備為向所述旋轉氣缸691的兩側凸出,所述軸693:693-1、693-2由分別與向所述兩側凸出的氣缸驅動軸692-1、692-2連接的一對軸693:693-1、693-2構成。所述一對軸693:693-1、693-2可以被軸支撐部件694支撐。The cylinder driving shafts 692-1, 692-2 may be equipped to protrude toward both sides of the
作為用於最小化當與所述FOUP主體20的一側面接觸時由摩擦造成的磨損的構成,軸693:693-1、693-2的端部可以構成為曲面形狀,並且所述軸693:693-1、693-2的端部的外側面進行耐磨損性塗層處理。作為一實施例,所述耐磨損性塗層可以利用聚四氟乙烯(PTFE:Poly-tetrafluoroethylene)材質構成。As a constitution for minimizing wear caused by friction when in contact with one side surface of the
當進行借助清潔流體噴射部640的清潔以及借助空氣供應部650的乾燥時,安置部611以及安置於安置部611上面的FOUP主體20藉由馬達670的驅動而旋轉,所述壓縮乾燥空氣供應部680及止動器690與FOUP主體20的外側面相隔而佈置。並且,當進行借助所述壓縮乾燥空氣供應部680的通氣管噴嘴21的乾燥時,所述馬達670的驅動將停止,且使安置部611以及安置於該安置部611上面的FOUP主體20不旋轉而維持在原位靜止的狀態,使所述壓縮乾燥空氣供應部680及止動器690佈置為緊貼於FOUP主體20的外側面。When cleaning by the cleaning
另外,在所述清潔腔室600配備有照射用於對完成清潔的FOUP主體20及FOUP蓋30進行乾燥的紫外線的紫外線燈660。所述紫外線燈660包括:外部紫外線燈660-1,向所述FOUP主體20的外側面照射紫外線;以及內部紫外線燈660-2,向所述FOUP主體20的內側面照射紫外線。In addition, the
參照圖10至圖15,當進行通氣管噴嘴21的乾燥時,首先,如圖12所示,軸693藉由止動器690的旋轉氣缸691的一方向驅動而沿一方向旋轉,從而支撐FOUP主體20的一側面。接下來,如圖13所示,第一噴嘴682和第二噴嘴684藉由壓縮乾燥空氣供應部680的前後移動氣缸685的前進驅動而前進移動,從而分別與第一端口20a、20b和第二端口20c、20d連接,並且如圖14所示,供應壓縮乾燥空氣CDA。10 to 15 , when drying the
若通氣管噴嘴21的乾燥完成,則如圖15所示,第一噴嘴682和第二噴嘴684藉由壓縮乾燥空氣供應部680的前後移動氣缸685的後退驅動而後退移動,從而分別從第一端口20a、20b和第二端口20c、20d解除連接,並且軸693藉由止動器690的旋轉氣缸691的反方向驅動而沿反方向旋轉,從而解除支撐FOUP主體20的一側面的狀態。When the drying of the
如上所述,可以使壓縮乾燥空氣供應部680前後移動而使第一噴嘴682:682-1、682-2和第二噴嘴684:684-1、684-2同時連接到形成於FOUP主體20的一側面的第一端口20a、20b和第二端口20c、20d,進而供應壓縮乾燥空氣CDA,從而能夠提高通氣管噴嘴21的乾燥及FOUP主體20內部的乾燥效率。As described above, the compressed dry
並且,為了支撐FOUP主體20的一側面而防止FOUP主體20被根據用於FOUP主體20的乾燥的壓縮乾燥空氣或氮氣的供應產生的壓力推向一側而移動,止動器690的軸693:693-1、693-2構成為旋轉驅動,從而能夠在FOUP主體20被穩定地固定支撐的狀態下,順利地執行FOUP主體20的乾燥作業。And, in order to support one side of the
若在所述清潔腔室600完成清潔及乾燥,則清潔腔室蓋620以及被其支撐的FOUP蓋30藉由升降驅動部631的驅動而上升,與此同時,藉由支撐部633而與清潔腔室蓋620連接的升降部634上升移動,並且接收安置於安置部611上的FOUP主體20,進而向清潔腔室主體610上部移動,從而處於可搬出的狀態。After the cleaning and drying are completed in the
通過同上所述地構成為清潔腔室蓋620及升降部634藉由同一個升降驅動部631的驅動而一同升降,從而能夠簡便並迅速順利地執行將FOUP主體20及FOUP蓋30搬入及搬出清潔腔室600的作業。As described above, the cleaning
若所述FOUP主體20向清潔腔室主體610上部移動,則FOUP蓋30及FOUP主體20被機器人500搬送至真空腔室700。When the FOUP
參照圖16,所述真空腔室700包括:真空腔室主體710,將FOUP主體20及FOUP蓋30以分離的狀態收容。16 , the
所述FOUP主體20安置於在真空腔室主體710內的下部配備的安置部710a上,FOUP蓋30安置於在真空腔室主體710內的上部配備的支撐部711上。The FOUP
在所述真空腔室700連接有:氮氣供應線713,向真空腔室700內部供應氮氣;以及真空線712,將所述真空腔室700內部的流體藉由真空而吸入並排放至外部。殘留於FOUP主體20及FOUP蓋30的包含水分的異物借助通過所述氮氣供應線713供應的氮氣從FOUP主體20及FOUP蓋30分離並通過真空線712被吸入之後排放至外部。Connected to the
另外,在所述真空腔室700配備有向配備於FOUP主體20內部的通氣管噴嘴21內注入氮氣的氮氣供應部720。因此,藉由上述的清潔腔室600的壓縮乾燥空氣供應部680還未乾燥而殘留於通氣管噴嘴21的水分可以借助通過真空腔室700的氮氣供應部720注入的氮氣被乾燥並去除。In addition, the
所述氮氣供應部720配備為可前後移動,以連接於通氣管噴嘴21的一側端或解除連接。The nitrogen
所述氮氣供應部720可以構成為與上述的配備於清潔腔室600的壓縮乾燥空氣供應部680相同的構成,並且可以包括第一氮氣供應管721、第一氮氣噴嘴722、第二氮氣供應管723、第二氮氣噴嘴724、第二前後移動氣缸725、第一氮氣供應管支撐部件726、第二移動塊727、第二固定框架728、第二氮氣供應管支撐部件729。The nitrogen
並且,在所述真空腔室700配備有:第二止動器730,用於支撐所述FOUP主體20的一側面而使FOUP主體20不會被從所述氮氣供應部720噴射的氮氣推向一側而移動。In addition, the
所述第二止動器730可以構成為與上述的配備於清潔腔室600的止動器690相同的構成,並且可以包括第二旋轉氣缸731、第二氣缸驅動軸732、第二軸733,並且構成為在所述第二軸733的端部進行耐磨損性塗層733a處理。The
若在所述真空腔室700完成水分及異物的排放以及通氣管噴嘴21的乾燥,則FOUP主體20及FOUP蓋30被機器人500搬送至所述待機部300。在這種情況下,若處於在所述待機部300佈置有其他FOUP的情況,則所述機器人500可以將FOUP主體20及FOUP蓋30搬送至緩衝部800,從而進行臨時保管。After the
之後,若先處於所述待機部300的FOUP主體20及FOUP蓋30通過裝載及卸載部200而被卸載,則將臨時保管於所述緩衝部800的FOUP蓋30及FOUP主體20依次搬送至待機部300的待機板310上,進而以FOUP主體20可鎖定於FOUP蓋30上的狀態進行安置。After that, when the FOUP
之後,藉由配備於所述待機部300的鎖定及解鎖單元而鎖定鎖定器,從而使FOUP主體20與FOUP蓋30結合為一體。After that, the locker is locked by the locking and unlocking unit provided in the
通過所述鎖定器的鎖定,FOUP主體20與FOUP蓋30結合而成的FOUP 10被機器人500轉換方向,從而以使FOUP蓋30朝向一側的方式被平放,之後再次安置在待機板310上。並且,若配備於待機部300的升降氣缸320上升而將FOUP 10提升至待機板310的上側,則升降氣缸320以及被其支撐的FOUP 10藉由移送單元400的驅動被移送至裝載及卸載部200的支撐板210上側,被支撐於升降氣缸320的FOUP 10藉由升降氣缸320的下降移動而被轉移到支撐板210上後被卸載。By the locking of the locker, the
同上所述,本發明並不局限於上述實施例,在不脫離權利要求書中請求保護的本發明的技術思想的情況下,本發明所屬的技術領域中具備基本知識的人員可實現顯而易見的變形實施,這些變形實施屬於本發明的範圍內。As described above, the present invention is not limited to the above-mentioned embodiments, and those with basic knowledge in the technical field to which the present invention pertains can implement obvious modifications without departing from the technical idea of the present invention claimed in the claims. implementation, such modified implementations are within the scope of the present invention.
1:FOUP清潔裝置 10:FOUP 20:FOUP主體 20a、20b:第一端口 20c、20d:第二端口 22a、22b、22c、22d:過濾器 21:通氣管噴嘴 30:FOUP蓋 100:工藝室 200:裝載及卸載部 210:支撐板 300:待機部 310:待機板 320:升降氣缸 400:移送單元 500:機器人 510:夾持器 600:清潔腔室 610:清潔腔室主體 611:安置部 620:清潔腔室蓋 621:FOUP蓋支撐部 622:夾具 623:馬達 630:升降單元 631:升降驅動部 632:連接部件 633:支撐部 634:升降部 634a:貫通口 640:清潔流體噴射部 640-1:外部清潔流體噴射部 640-2:內部清潔流體噴射部 650:空氣供應部 650-1:外部空氣供應部 650-2:內部空氣供應部 650-3:上部空氣供應部 651:氣缸 660:紫外線燈 660-1:外部紫外線燈 660-2:內部紫外線燈 670:馬達 680:壓縮乾燥空氣供應部 681、681-1、681-2:第一供應管 682、682-1、682-2:第一噴嘴 682a:墊 683、683-1、683-2:第二供應管 684、684-1、684-2:第二噴嘴 685:前後移動氣缸 686:第一供應管支撐部件 687:移動塊 688:固定框架 689、689-1、689-2:第二供應管支撐部件 690:止動器 691:旋轉氣缸 692-1、692-2:氣缸驅動軸 693、693-1、693-2:軸 693a:耐磨損性塗層 694:軸支撐部件 695:固定部件 700:真空腔室 710:真空腔室主體 710a:安置部 711:支撐部 712:真空線 713:氮氣供應線 720:氮氣供應部 721:第一氮氣供應管 722:第一氮氣噴嘴 723:第二氮氣供應管 724:第二氮氣噴嘴 725:第二前後移動氣缸 726:第一氮氣供應管支撐部件 727:第二移動塊 728:第二固定框架 729:第二氮氣供應管支撐部件 730:第二止動器 731:第二旋轉氣缸 732:第二氣缸驅動軸 733:第二軸 733a:第二耐磨損性塗層 800:緩衝部 910:公用部件 920:蒸汽單元 CDA:壓縮乾燥空氣1: FOUP cleaning device 10:FOUP 20: FOUP main body 20a, 20b: the first port 20c, 20d: Second port 22a, 22b, 22c, 22d: Filters 21: Snorkel nozzle 30:FOUP cover 100: Craft Room 200: Loading and unloading department 210: Support plate 300: Standby Department 310: Standby board 320: Lifting cylinder 400: Transfer unit 500: Robot 510: Gripper 600: Clean the chamber 610: Clean the chamber body 611: Placement Department 620: Clean the chamber cover 621:FOUP cover support 622: Fixtures 623: Motor 630: Lifting unit 631: Lifting drive part 632: Connecting parts 633: Support Department 634: Lifting Department 634a: Through port 640: Clean the fluid jet 640-1: External Cleaning Fluid Jet 640-2: Internal Cleaning Fluid Jet 650: Air Supply Department 650-1: External Air Supply Section 650-2: Internal Air Supply Section 650-3: Upper Air Supply 651: Cylinder 660: UV Lamp 660-1: External UV Lamp 660-2: Internal UV Lamp 670: Motor 680: Compressed dry air supply 681, 681-1, 681-2: First supply pipe 682, 682-1, 682-2: First Nozzle 682a: Pad 683, 683-1, 683-2: Second supply pipe 684, 684-1, 684-2: Second nozzle 685: Moving the cylinder forward and backward 686: First supply pipe support part 687: Move Block 688: Fixed Frame 689, 689-1, 689-2: Second supply pipe support member 690: Stopper 691: Rotary cylinder 692-1, 692-2: Cylinder drive shaft 693, 693-1, 693-2: Shaft 693a: Abrasion Resistant Coatings 694: Shaft Support Parts 695: Fixed parts 700: Vacuum Chamber 710: Vacuum chamber body 710a: Placement Department 711: Support Department 712: Vacuum Line 713: Nitrogen Supply Line 720: Nitrogen Supply Department 721: First nitrogen supply pipe 722: First nitrogen nozzle 723: Second nitrogen supply pipe 724: Second Nitrogen Nozzle 725: Second front and rear moving cylinder 726: First nitrogen supply pipe support part 727: Second moving block 728: Second fixed frame 729: Second nitrogen supply pipe support part 730: Second stop 731: Second rotary cylinder 732: Second cylinder drive shaft 733: Second axis 733a: Second Abrasion Resistant Coating 800: Buffer 910: Common parts 920: Steam unit CDA: Compressed Dry Air
圖1是示意性地示出本發明的FOUP清潔裝置的構成的側視圖。 圖2是示意性地示出本發明的FOUP清潔裝置的構成的平面圖。 圖3是用於說明在本發明的FOUP清潔裝置中將FOUP從裝載及卸載部移送至待機部的過程的圖。 圖4是示意性地示出配備於本發明的FOUP清潔裝置的清潔腔室的構成的縱剖視圖。 圖5是示出配備於本發明的FOUP清潔裝置的清潔腔室的內部結構的橫剖視圖。 圖6是示出用於乾燥配備於FOUP內部的通氣管噴嘴的壓縮乾燥空氣供應部和止動器配備於FOUP主體的兩側的情形的立體圖。 圖7是示出被供應壓縮乾燥空氣的FOUP主體的右側視圖。 圖8是從另一方向示出圖6所示的壓縮乾燥空氣供應部的立體圖。 圖9是圖6所示的止動器的立體圖。 圖10是圖6的右側視圖。 圖11是根據圖10的A-A線的剖視圖。 圖12至圖15是示出在乾燥通氣管噴嘴的過程中壓縮乾燥空氣供應部和止動器的操作狀態的圖。 圖16是示意性地示出配備於本發明的FOUP清潔裝置的真空腔室的構成的縱剖視圖。FIG. 1 is a side view schematically showing the configuration of the FOUP cleaning apparatus of the present invention. Fig. 2 is a plan view schematically showing the configuration of the FOUP cleaning apparatus of the present invention. It is a figure for demonstrating the process of moving a FOUP from a loading and unloading part to a standby part in the FOUP cleaning apparatus of this invention. 4 is a longitudinal cross-sectional view schematically showing the configuration of a cleaning chamber provided in the FOUP cleaning apparatus of the present invention. 5 is a cross-sectional view showing the internal structure of a cleaning chamber equipped with the FOUP cleaning apparatus of the present invention. FIG. 6 is a perspective view showing a state in which a compressed drying air supply and stoppers for drying the vent pipe nozzles provided inside the FOUP are provided on both sides of the FOUP main body. 7 is a right side view showing the main body of the FOUP to which compressed dry air is supplied. Fig. 8 is a perspective view showing the compressed dry air supply part shown in Fig. 6 from another direction. FIG. 9 is a perspective view of the stopper shown in FIG. 6 . FIG. 10 is a right side view of FIG. 6 . FIG. 11 is a cross-sectional view according to line A-A of FIG. 10 . 12 to 15 are diagrams showing the operation states of the compressed drying air supply part and the stopper in the process of drying the air duct nozzle. 16 is a longitudinal cross-sectional view schematically showing a configuration of a vacuum chamber provided in the FOUP cleaning apparatus of the present invention.
20:FOUP主體20: FOUP main body
21:通氣管噴嘴21: Snorkel nozzle
30:FOUP蓋30:FOUP cover
600:清潔腔室600: Clean the chamber
610:清潔腔室主體610: Clean the chamber body
611:安置部611: Placement Department
620:清潔腔室蓋620: Clean the chamber cover
621:FOUP蓋支撐部621:FOUP cover support
622:夾具622: Fixtures
623:馬達623: Motor
630:升降單元630: Lifting unit
631:升降驅動部631: Lifting drive part
632:連接部件632: Connecting parts
633:支撐部633: Support Department
640:清潔流體噴射部640: Clean the fluid jet
640-1:外部清潔流體噴射部640-1: External Cleaning Fluid Jet
640-2:內部清潔流體噴射部640-2: Internal Cleaning Fluid Jet
650:空氣供應部650: Air Supply Department
650-3:上部空氣供應部650-3: Upper Air Supply
651:氣缸651: Cylinder
660:紫外線燈660: UV Lamp
660-1:外部紫外線燈660-1: External UV Lamp
660-2:內部紫外線燈660-2: Internal UV Lamp
670:馬達670: Motor
680:壓縮乾燥空氣供應部680: Compressed dry air supply
681:第一供應管681: First Supply Tube
682:第一噴嘴682: First Nozzle
683:第二供應管683: Second Supply Pipe
684:第二噴嘴684: Second Nozzle
685:前後移動氣缸685: Moving the cylinder forward and backward
690:止動器690: Stopper
691:旋轉氣缸691: Rotary cylinder
693:軸693: Shaft
Claims (24)
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KR1020190129010A KR102351010B1 (en) | 2019-10-17 | 2019-10-17 | FOUP cleaning device |
KR10-2019-0129010 | 2019-10-17 |
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TW202116641A TW202116641A (en) | 2021-05-01 |
TWI769556B true TWI769556B (en) | 2022-07-01 |
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Citations (5)
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US20080251473A1 (en) * | 2005-10-17 | 2008-10-16 | Lutz Rebstock | Apparatus for storing contamination-sensitive flat articles, in particular for storing semiconductor wafers |
US7455180B2 (en) * | 2002-10-25 | 2008-11-25 | Shin-Etsu Polymer Co., Ltd. | Substrate storage container |
CN102017119A (en) * | 2008-03-13 | 2011-04-13 | 安格斯公司 | Wafer container with tubular environmental control components |
TWI450046B (en) * | 2007-02-28 | 2014-08-21 | Entegris Inc | Purge system for a substrate container |
TW201935597A (en) * | 2018-02-09 | 2019-09-01 | 南韓商系統科技公司 | FOUP cleaning device and FOUP cleaning method |
-
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- 2019-10-17 KR KR1020190129010A patent/KR102351010B1/en active IP Right Grant
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Patent Citations (5)
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US7455180B2 (en) * | 2002-10-25 | 2008-11-25 | Shin-Etsu Polymer Co., Ltd. | Substrate storage container |
US20080251473A1 (en) * | 2005-10-17 | 2008-10-16 | Lutz Rebstock | Apparatus for storing contamination-sensitive flat articles, in particular for storing semiconductor wafers |
TWI450046B (en) * | 2007-02-28 | 2014-08-21 | Entegris Inc | Purge system for a substrate container |
CN102017119A (en) * | 2008-03-13 | 2011-04-13 | 安格斯公司 | Wafer container with tubular environmental control components |
TW201935597A (en) * | 2018-02-09 | 2019-09-01 | 南韓商系統科技公司 | FOUP cleaning device and FOUP cleaning method |
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