TW202116641A - Foup cleaning device - Google Patents

Foup cleaning device Download PDF

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Publication number
TW202116641A
TW202116641A TW109135889A TW109135889A TW202116641A TW 202116641 A TW202116641 A TW 202116641A TW 109135889 A TW109135889 A TW 109135889A TW 109135889 A TW109135889 A TW 109135889A TW 202116641 A TW202116641 A TW 202116641A
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Taiwan
Prior art keywords
wafer transfer
transfer box
main body
foup
opening
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TW109135889A
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Chinese (zh)
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TWI769556B (en
Inventor
許東根
朴永秀
柳守烈
崔宇鎮
金學杜
孫侐主
朴商弼
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南韓商系統科技公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041Cleaning
    • H01L21/02043Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02046Dry cleaning only
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68742Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins

Abstract

An object of the present invention is to provide a front opening unified pod (FOUP) cleaning device which can improve the cleaning and drying efficiency of the main body of a FOUP and a cover of the FOUP, and improve the drying efficiency of a purge nozzle. The present invention for achieving this object is a FOUP cleaning device including an FOUP main body and an FOUP cover, which is characterized in that the FOUP main body is equipped with a purge nozzle made of foamed porous material and used for purging the interior of the FOUP main body, including a cleaning chamber for cleaning the FOUP main body and the FOUP cover by using a cleaning fluid, wherein the cleaning chamber is equipped with a compressed dry air supply part which injects compressed dry air into the purge nozzle after the cleaning of the FOUP main body is completed.

Description

前開式晶圓傳送盒清潔裝置Front opening type wafer transfer box cleaning device

本發明涉及一種前開式晶圓傳送盒清潔裝置,尤其涉及一種提高了用於基板的保管及搬運的前開式晶圓傳送盒的清潔及乾燥效率的前開式晶圓傳送盒清潔裝置。The present invention relates to a front-opening wafer transfer box cleaning device, in particular to a front-opening wafer transfer box cleaning device that improves the cleaning and drying efficiency of the front-opening wafer transfer box used for storage and transportation of substrates.

半導體製造工藝經過利用多種方法對半導體基板進行加工的一系列工序設備,因此當保管及搬運半導體基板時需要注意避免在外部的衝擊下受到損傷,並且需要進行管理以使基板的表面不被水分、灰塵、各種有機物等雜質污染。The semiconductor manufacturing process goes through a series of process equipment that uses a variety of methods to process semiconductor substrates. Therefore, when storing and transporting semiconductor substrates, care must be taken to avoid damage to external impacts, and management must be performed to prevent the surface of the substrate from being affected by moisture, Contamination by impurities such as dust and various organic matters.

因此,當保管及搬運半導體基板時使用單獨的保管容器(前開式晶圓傳送盒(FOUP,Front opening unified pod),以下稱為「FOUP」)。Therefore, a separate storage container (Front opening unified pod (FOUP), hereinafter referred to as "FOUP") is used when storing and transporting semiconductor substrates.

由於在以上述的用途使用的FOUP的內部收納有高精度的半導體基板,因此FOUP需要用於保持高清潔度的管理,為此,FOUP在FOUP清潔裝置中按週期進行清潔及乾燥。Since a high-precision semiconductor substrate is housed in the FOUP used for the above-mentioned purposes, the FOUP needs management for maintaining high cleanliness. For this reason, the FOUP is cleaned and dried periodically in a FOUP cleaning device.

作為關於這種FOUP清潔裝置的現有技術,韓國公開專利第10-2013-0095028號、韓國授權專利第10-1173987中公開了將清潔液噴射到FOUP的表面而清潔FOUP的技術。As a prior art related to such a FOUP cleaning device, Korean Published Patent No. 10-2013-0095028 and Korean Granted Patent No. 10-1173987 disclose a technique of spraying a cleaning liquid onto the surface of the FOUP to clean the FOUP.

並且,如韓國公開專利第10-2015-0078657號所述,在FOUP內部配備有用於吹掃(purge)收納於FOUP內部的基板的發泡多孔材質的通氣管噴嘴(Snorkel nozzle),但是具有如下問題:使在FOUP的清潔過程中吸收有清潔液的通氣管噴嘴完全乾燥以恢復到原來的性能需要大量的時間,使通氣管噴嘴完全乾燥所需要的時間內無法再使用FOUP,從而發生工藝損失。因此,需要開發一種在清潔FOUP之後使通氣管噴嘴迅速乾燥,從而能夠縮短恢復到原來的性能所需要的時間的FOUP清潔裝置。In addition, as described in Korean Patent Publication No. 10-2015-0078657, a foamed porous snorkel nozzle (Snorkel nozzle) used to purge the substrate contained in the FOUP is provided inside the FOUP, but it has the following Problem: It takes a lot of time to completely dry the snorkel nozzle that has absorbed the cleaning fluid during the FOUP cleaning process to restore its original performance. The FOUP can no longer be used for the time required for the snorkel nozzle to completely dry, resulting in process loss . Therefore, it is necessary to develop a FOUP cleaning device that can quickly dry the snorkel nozzle after cleaning the FOUP, thereby shortening the time required to restore the original performance.

本發明為瞭解決上述的所有問題而提出,其目的在於提供一種能夠提高FOUP主體和FOUP蓋的清潔及乾燥效率並提高通氣管噴嘴的乾燥效率的FOUP清潔裝置。The present invention is proposed in order to solve all the above-mentioned problems, and its purpose is to provide a FOUP cleaning device that can improve the cleaning and drying efficiency of the FOUP main body and the FOUP cover and the drying efficiency of the vent pipe nozzle.

用於實現同上所述的目的的本發明的FOUP清潔裝置,用於清潔包括FOUP主體及FOUP蓋的FOUP,所述FOUP清潔裝置的特徵在於,在所述FOUP主體配備有用於吹掃所述FOUP主體的內部的發泡多孔材質的通氣管噴嘴,包括利用清潔流體清潔所述FOUP主體和FOUP蓋的清潔腔室,在所述清潔腔室配備有在所述FOUP主體的清潔完成之後向所述通氣管噴嘴內注入壓縮乾燥空氣的壓縮乾燥空氣供應部。The FOUP cleaning device of the present invention used to achieve the above-mentioned purpose is used to clean a FOUP including a FOUP body and a FOUP cover. The FOUP cleaning device is characterized in that the FOUP body is equipped with a device for purging the FOUP. The vent pipe nozzle made of foamed porous material inside the main body includes a cleaning chamber for cleaning the FOUP main body and the FOUP cover with a cleaning fluid, and the cleaning chamber is equipped with the cleaning chamber after the cleaning of the FOUP main body is completed. The compressed dry air supply part injects compressed dry air into the vent nozzle.

所述壓縮乾燥空氣供應部可以配備為可前後移動,以連接於所述通氣管噴嘴的一側端或解除連接。The compressed dry air supply part may be equipped to be movable back and forth to be connected to or disconnected from one side end of the vent pipe nozzle.

在所述FOUP主體的一側面,連接所述通氣管噴嘴的端部的第一端口可以形成於一側,與所述FOUP主體的內部連通的第二端口形成於另一側,所述壓縮乾燥空氣供應部包括:第一噴嘴,向所述第一端口供應壓縮乾燥空氣;以及第二噴嘴,向所述第二端口供應壓縮乾燥空氣。On one side of the FOUP body, a first port connecting the end of the vent pipe nozzle may be formed on one side, and a second port communicating with the inside of the FOUP body may be formed on the other side. The air supply part includes: a first nozzle that supplies compressed dry air to the first port; and a second nozzle that supplies compressed dry air to the second port.

在所述第一端口和第二端口的內側可以分別配備有過濾器,所述過濾器藉由所述壓縮乾燥空氣而得以乾燥。A filter may be respectively provided inside the first port and the second port, and the filter is dried by the compressed dry air.

所述壓縮乾燥空氣供應部可以包括:第一供應管,向所述第一噴嘴供應壓縮乾燥空氣並沿橫向配備;第二供應管,連通於所述第一供應管而向所述第二噴嘴供應壓縮乾燥空氣,並沿縱向配備;以及前後移動氣缸,使所述第一供應管和第二供應管前進或後退移動。The compressed dry air supply unit may include: a first supply pipe, which supplies compressed dry air to the first nozzle and is arranged in a lateral direction; and a second supply pipe, which communicates with the first supply pipe and supplies the compressed dry air to the second nozzle. Supply compressed dry air and equip it in the longitudinal direction; and move the cylinder back and forth to make the first supply pipe and the second supply pipe move forward or backward.

所述通氣管噴嘴可以在所述FOUP主體的內部向兩側隔開而配備為多個,所述第一端口和第二端口在所述FOUP主體的一側面向兩側隔開而配備為多個,配備有所述第一噴嘴的第一供應管和配備有所述第二噴嘴的第二供應管分別向兩側隔開而配備為多個。The snorkel nozzle may be provided in a plurality of spaced apart on both sides inside the FOUP main body, and the first port and the second port may be spaced apart on both sides on one side of the FOUP main body. The first supply pipe equipped with the first nozzle and the second supply pipe equipped with the second nozzle are respectively spaced at two sides and equipped in multiples.

所述FOUP清潔裝置還可以包括:第一供應管支撐部件,支撐多個所述第一供應管並連接於所述前後移動氣缸;以及第二供應管支撐部件,支撐多個所述第二供應管。The FOUP cleaning device may further include: a first supply pipe support member that supports a plurality of the first supply pipes and is connected to the front and rear moving cylinder; and a second supply pipe support member that supports a plurality of the second supply pipes tube.

在所述第一噴嘴和第二噴嘴可以結合有墊,所述墊緊貼於形成有所述第一端口和第二端口的所述FOUP主體的外側面而保持氣密。A pad may be combined with the first nozzle and the second nozzle, and the pad is tightly attached to the outer surface of the FOUP body where the first port and the second port are formed to maintain airtightness.

所述墊可以利用矽材質構成。The pad can be made of silicon material.

在所述清潔腔室可以配備有:止動器,用於支撐所述FOUP主體的一側面,以使所述FOUP主體不會被從所述壓縮乾燥空氣供應部噴射的所述壓縮乾燥空氣推向一側而移動。The cleaning chamber may be equipped with: a stopper for supporting one side of the FOUP body so that the FOUP body will not be pushed by the compressed dry air sprayed from the compressed dry air supply part Move to the side.

所述清潔腔室可以配備有:外部清潔流體噴射部,向所述FOUP主體的外側面及所述FOUP蓋噴射清潔流體;以及內部清潔流體噴射部,向所述FOUP主體的內側面噴射清潔流體。The cleaning chamber may be equipped with: an external cleaning fluid spraying part to spray cleaning fluid to the outer surface of the FOUP main body and the FOUP cover; and an internal cleaning fluid spraying part to spray cleaning fluid to the inner surface of the FOUP main body .

在所述外部清潔流體噴射部可以上下相隔地形成有噴射清潔流體的多個噴嘴,且所述多個噴嘴形成為各自的長度及噴射角不同,以使所述多個噴嘴靠近所述FOUP主體的外側面而佈置。A plurality of nozzles for spraying a cleaning fluid may be formed vertically in the external cleaning fluid spraying portion, and the plurality of nozzles are formed to have different lengths and spray angles, so that the plurality of nozzles are close to the FOUP main body Arranged on the outer side.

所述FOUP主體可以可旋轉地配備於所述清潔腔室內,所述多個噴嘴傾斜地形成,以向與所述FOUP主體所旋轉的方向相向的方向噴射清潔流體。The FOUP main body may be rotatably equipped in the cleaning chamber, and the plurality of nozzles are formed obliquely to spray cleaning fluid in a direction opposite to the direction in which the FOUP main body rotates.

在所述清潔腔室可以配備有:空氣供應部,噴射用於對清潔完畢的所述FOUP主體及FOUP蓋進行乾燥的壓縮乾燥空氣。The cleaning chamber may be equipped with an air supply part that sprays compressed dry air for drying the cleaned FOUP main body and FOUP cover.

所述空氣供應部可以包括:外部空氣供應部,向所述FOUP主體的外側面噴射壓縮乾燥空氣;以及內部空氣供應部,向所述FOUP主體的內側面噴射壓縮乾燥空氣。The air supply part may include: an external air supply part which sprays compressed dry air to the outer side surface of the FOUP body; and an internal air supply part which sprays compressed dry air to the inner side surface of the FOUP body.

在所述外部空氣供應部,可以上下相隔地形成有噴射壓縮乾燥空氣的多個噴嘴,且所述多個噴嘴形成為各自的長度及噴射角不同,以使所述多個噴嘴靠近所述FOUP主體的外側面而佈置。In the external air supply part, a plurality of nozzles for spraying compressed dry air may be formed up and down, and the plurality of nozzles are formed to have different lengths and spray angles, so that the plurality of nozzles are close to the FOUP The outer side of the main body is arranged.

所述FOUP主體可以可旋轉地配備於所述清潔腔室內,所述多個噴嘴傾斜地形成,以向與所述FOUP主體所旋轉的方向相向的方向噴射壓縮乾燥空氣。The FOUP main body may be rotatably equipped in the cleaning chamber, and the plurality of nozzles are formed obliquely to spray compressed dry air in a direction opposite to the direction in which the FOUP main body rotates.

所述空氣供應部還可以包括:上部空氣供應部,在所述清潔腔室內部位於所述FOUP主體與所述FOUP蓋之間,且配備為可前後移動,從而向清潔完畢的所述FOUP主體及所述FOUP蓋噴射壓縮乾燥空氣。The air supply part may further include: an upper air supply part, located between the FOUP main body and the FOUP cover inside the cleaning chamber, and is equipped to be movable back and forth, so as to transfer the cleaned FOUP main body And the FOUP cover sprays compressed dry air.

所述清潔腔室可以包括:清潔腔室主體,將所述FOUP主體收容於內部而進行清潔處理;清潔腔室蓋,開閉所述清潔腔室主體的上部,並將所述FOUP蓋支撐而進行清潔處理。The cleaning chamber may include: cleaning the chamber body, accommodating the FOUP body inside for cleaning; cleaning the chamber cover, opening and closing the upper part of the cleaning chamber body, and supporting the FOUP cover. Clean treatment.

在所述清潔腔室主體內可以包括:安置部,配備於所述清潔腔室主體的下部,以安置所述FOUP主體;以及升降部,在所述清潔腔室主體的上部與下部之間升降,並且將所述FOUP主體轉移至所述安置部上或者從所述安置部接收所述FOUP主體,而使所述FOUP主體升降,其中,所述升降部藉由支撐部而與所述清潔腔室蓋連接,所述升降部與所述清潔腔室蓋藉由同一個升降驅動部而一同升降。The cleaning chamber main body may include: a seating part provided at the lower part of the cleaning chamber main body to house the FOUP main body; and a lifting part which lifts and lowers between the upper and lower parts of the cleaning chamber main body , And transfer the FOUP main body to the seating part or receive the FOUP main body from the seating part, so that the FOUP main body is raised and lowered, wherein the lifting part is connected to the cleaning chamber by the supporting part. The chamber cover is connected, and the lifting part and the cleaning chamber cover are lifted and lowered together by the same lifting driving part.

在所述清潔腔室可以配備有:紫外線燈,照射用於對清潔完畢的所述FOUP主體及FOUP蓋進行乾燥的紫外線。The cleaning chamber may be equipped with an ultraviolet lamp to irradiate ultraviolet rays for drying the cleaned FOUP main body and FOUP cover.

所述紫外線燈可以包括:外部紫外線燈,向所述FOUP主體的外側面照射紫外線;以及內部紫外線燈,向所述FOUP主體的內側面照射紫外線。The ultraviolet lamp may include: an external ultraviolet lamp that irradiates ultraviolet rays to the outer surface of the FOUP body; and an internal ultraviolet lamp that irradiates ultraviolet rays to the inner surface of the FOUP body.

所述FOUP清潔裝置還可以包括:真空腔室,使在所述清潔腔室完成清潔的FOUP主體及FOUP蓋被搬送,在所述真空腔室連接有:氮氣供應線,向所述真空腔室內部供應氮氣;以及真空線,將所述真空腔室內部的流體吸入之後排出至外部。The FOUP cleaning device may further include: a vacuum chamber for transporting the FOUP main body and FOUP cover that have been cleaned in the cleaning chamber, and the vacuum chamber is connected with a nitrogen supply line to the vacuum chamber The part supplies nitrogen gas; and a vacuum line, which sucks the fluid inside the vacuum chamber and discharges it to the outside.

在所述真空腔室可以配備有向所述通氣管噴嘴內注入氮氣的氮氣供應部。The vacuum chamber may be equipped with a nitrogen supply part for injecting nitrogen into the vent pipe nozzle.

所述氮氣供應部可以配備為可前後移動,以連接於所述通氣管噴嘴的一側端或解除連接。The nitrogen supply part may be equipped to be movable forwards and backwards to be connected to one side end of the vent pipe nozzle or disconnected.

在所述真空腔室可以配備有:第二止動器,用於支撐所述FOUP主體的一側面,以使所述FOUP主體不會被從所述氮氣供應部噴射的所述氮氣推向一側而移動。The vacuum chamber may be equipped with: a second stopper for supporting one side surface of the FOUP main body so that the FOUP main body will not be pushed toward one side by the nitrogen sprayed from the nitrogen supply part Move sideways.

根據本發明的FOUP清潔裝置,配備有在清潔完FOUP主體之後向通氣管噴嘴內注入壓縮乾燥空氣的壓縮乾燥空氣供應部,從而能夠快速乾燥通氣管噴嘴,因此具有縮短恢復原來的性能所需的時間的效果。The FOUP cleaning device according to the present invention is equipped with a compressed dry air supply unit that injects compressed dry air into the snorkel nozzle after cleaning the FOUP body, so that the snorkel nozzle can be dried quickly, so it has the necessary shortening and restoring the original performance. The effect of time.

並且,使壓縮乾燥空氣供應部前後移動而使第一噴嘴和第二噴嘴同時連接到形成於FOUP主體的一側面的第一端口和第二端口,進而供應壓縮乾燥空氣,從而能夠提高通氣管噴嘴的乾燥及FOUP主體內部的乾燥效率。In addition, the compressed dry air supply unit is moved back and forth so that the first nozzle and the second nozzle are simultaneously connected to the first port and the second port formed on one side of the FOUP main body, and then the compressed dry air is supplied, so that the vent pipe nozzle can be improved. The drying efficiency and the drying efficiency inside the main body of the FOUP.

並且,向在清潔腔室完成清潔的FOUP主體內部所配備的通氣管噴嘴注入壓縮乾燥空氣以進行一次乾燥,並在真空腔室向通氣管噴嘴注入氮氣以進行二次乾燥,從而能夠在短時間內將發泡多孔材質的通氣管噴嘴完全乾燥。In addition, compressed dry air is injected into the snorkel nozzle equipped inside the FOUP body that has been cleaned in the cleaning chamber for primary drying, and nitrogen is injected into the snorkel nozzle in the vacuum chamber for secondary drying, so that it can be dried in a short time The vent pipe nozzle made of foamed porous material is completely dried inside.

並且,通過配備用於支撐FOUP主體的一側面的止動器以防止FOUP主體被用於乾燥通氣管噴嘴的壓縮乾燥空氣或隨著氮氣的供應所產生的壓力被推向一側而移動,從而能夠在固定支撐FOUP主體的狀態下穩定地執行通氣管噴嘴的乾燥作業。In addition, the FOUP body is equipped with a stopper for supporting one side of the FOUP body to prevent the FOUP body from being pushed to one side by the compressed dry air used to dry the snorkel nozzle or by the pressure generated by the supply of nitrogen, thereby The snorkel nozzle can be dried stably while the FOUP body is fixedly supported.

並且,使多個噴嘴各自的長度及噴射角不同,以在清潔腔室進行的清潔及乾燥的過程中,使FOUP主體及FOUP蓋旋轉而使清潔流體及壓縮乾燥空氣對FOUP主體及FOUP蓋的整個區域均勻地噴射,同時使噴射清潔流體及壓縮乾燥空氣的多個噴嘴靠近FOUP主體的外側面而佈置,並且多個噴嘴傾斜地形成,從而向與FOUP主體所旋轉的方向相向的方向噴射清潔流體,從而能夠進一步地提高清潔及乾燥效率。In addition, the lengths and spray angles of the multiple nozzles are different, so that during the cleaning and drying process of the cleaning chamber, the FOUP body and the FOUP cover are rotated to cause the cleaning fluid and compressed dry air to affect the FOUP body and the FOUP cover. The entire area is sprayed evenly. At the same time, multiple nozzles spraying cleaning fluid and compressed dry air are arranged close to the outer side of the FOUP body, and multiple nozzles are formed obliquely to spray the cleaning fluid in the direction opposite to the direction in which the FOUP body rotates. , Which can further improve the cleaning and drying efficiency.

並且,構成為清潔腔室蓋與升降部通過同一升降驅動部的驅動而一同升降,從而能夠簡便並順利地執行將FOUP主體及FOUP蓋搬入並搬出清潔腔室的作業。In addition, it is configured that the cleaning chamber cover and the lifting part are raised and lowered together by the driving of the same lifting driving part, so that the work of carrying the FOUP main body and the FOUP cover into and out of the cleaning chamber can be carried out easily and smoothly.

以下,參照附圖,對關於本發明的優選實施例的構成及作用進行詳細的說明。Hereinafter, with reference to the drawings, the configuration and function of the preferred embodiment of the present invention will be described in detail.

本發明的FOUP清潔裝置1是用於清潔由FOUP主體20和FOUP蓋30構成的FOUP 10的裝置,其特徵在於,在所述FOUP主體20配備有用於吹掃所述FOUP主體20內部的發泡多孔材質的通氣管噴嘴21,並且包括利用清潔流體清潔所述FOUP主體20和FOUP蓋30的清潔腔室600,在所述清潔腔室600配備有在所述FOUP主體20清潔完成之後向所述通氣管噴嘴21內注入壓縮乾燥空氣的壓縮乾燥空氣供應部680。The FOUP cleaning device 1 of the present invention is a device for cleaning the FOUP 10 composed of a FOUP main body 20 and a FOUP cover 30, and is characterized in that the FOUP main body 20 is equipped with foam for purging the inside of the FOUP main body 20 The vent nozzle 21 is made of porous material, and includes a cleaning chamber 600 for cleaning the FOUP main body 20 and the FOUP cover 30 with a cleaning fluid. The cleaning chamber 600 is equipped with the cleaning chamber 600 after the cleaning of the FOUP main body 20 is completed. The compressed dry air supply part 680 of compressed dry air is injected into the vent nozzle 21.

參照圖1及圖2,本發明的FOUP清潔裝置1是對用於保管及移送半導體基板的FOUP10進行清潔及乾燥的裝置。所述FOUP 10包括:FOUP主體20,收納半導體基板(未圖示);以及FOUP蓋30,開閉形成於所述FOUP主體20一側的開口部,其中,所述FOUP主體20及FOUP蓋30構成為藉由鎖定器(locker)(未示出)而分離或結合的結構。1 and 2, the FOUP cleaning device 1 of the present invention is a device for cleaning and drying the FOUP 10 used for storing and transferring semiconductor substrates. The FOUP 10 includes: a FOUP body 20 that houses a semiconductor substrate (not shown); and a FOUP cover 30 that opens and closes an opening formed on one side of the FOUP body 20, wherein the FOUP body 20 and the FOUP cover 30 constitute A structure that is separated or combined by a locker (not shown).

所述FOUP清潔裝置1包括:工藝室100,執行所述FOUP 10的搬送、清潔及乾燥處理;裝載及卸載部200,用於將FOUP 10搬入及搬出所述工藝室100;待機部300,朝向所述裝載及卸載部200的一側配備於工藝室100內,並且使所述FOUP主體20與FOUP蓋30相互分離或結合;移送單元400,在所述裝載及卸載部200與待機部300之間移送FOUP 10;機器人500,在所述工藝室100內抓持並搬送FOUP主體20及FOUP蓋30;清潔腔室600,藉由所述機器人500接收位於所述待機部300的FOUP主體20及FOUP蓋30,進而利用清潔流體進行清潔後使其乾燥;真空腔室700,藉由所述機器人500接收在所述清潔腔室600經過清潔並乾燥後的FOUP主體20及FOUP蓋30,進而排放殘留於FOUP主體20及FOUP蓋30的包含水分的異物;以及緩衝部800,用於將在所述真空腔室700完成排放處理的FOUP主體20及FOUP蓋30搬送至所述待機部300之前進行臨時保管。並且,在所述工藝室100內部的一側可以配備有:公用部件(utility)910,配備有用於供應作為為了清潔及乾燥FOUP 10而使用的清潔流體的熱去離子水(Hot deionized water)、壓縮乾燥空氣(CDA:Compressed dry air)、氮氣(N2)等的設備;以及蒸汽單元920,配備有用於供應為了清潔FOUP 10而使用的蒸汽的設備。The FOUP cleaning device 1 includes: a process chamber 100 for carrying out the transport, cleaning and drying of the FOUP 10; a loading and unloading part 200 for carrying the FOUP 10 into and out of the process chamber 100; a standby part 300 facing One side of the loading and unloading part 200 is provided in the process chamber 100, and the FOUP main body 20 and the FOUP cover 30 are separated or combined with each other; the transfer unit 400 is located between the loading and unloading part 200 and the standby part 300 Transfer the FOUP 10 in between; the robot 500 grasps and transports the FOUP main body 20 and the FOUP cover 30 in the process chamber 100; cleans the chamber 600, and receives the FOUP main body 20 and the FOUP main body 20 and the FOUP cover in the standby part 300 by the robot 500 The FOUP cover 30 is then cleaned with a cleaning fluid and dried; the vacuum chamber 700 receives the cleaned and dried FOUP body 20 and the FOUP cover 30 in the cleaning chamber 600 by the robot 500, and then discharges Foreign matter containing moisture remaining in the FOUP main body 20 and the FOUP cover 30; and a buffer section 800 for carrying out the FOUP main body 20 and the FOUP cover 30 that have been discharged from the vacuum chamber 700 before being transported to the standby section 300 Temporary storage. In addition, one side of the inside of the process chamber 100 may be equipped with: utility 910, equipped with hot deionized water, which is used to supply cleaning fluid used for cleaning and drying the FOUP 10, Compressed dry air (CDA: Compressed dry air), nitrogen (N2), etc.; and the steam unit 920, equipped with equipment for supplying steam used to clean the FOUP 10.

所述裝載及卸載部200是用於為了將清潔對象FOUP 10搬入工藝室100內而進行裝載(Loading)或者為了將在工藝室100完成清潔、乾燥及排放工序的FOUP 10搬出至工藝室100外部而進行卸載(Unloading)的構成。參照圖3,在所述裝載及卸載部200配備有使FOUP主體20向側方躺臥而使FOUP蓋30以位於一側的狀態安置的支撐板210。The loading and unloading unit 200 is used to load the FOUP 10 to be cleaned into the process chamber 100 or to carry out the FOUP 10 that has completed the cleaning, drying, and discharge processes in the process chamber 100 to the outside of the process chamber 100 And carry out the unloading (Unloading) composition. 3, the loading and unloading part 200 is equipped with a support plate 210 that allows the FOUP main body 20 to lie sideways and the FOUP cover 30 to be placed on one side.

所述待機部300是被移送單元400從所述裝載及卸載部200移送的FOUP 10在被搬送至清潔腔室600之前待機的地方,移送至所述待機部300的FOUP 10的姿勢被機器人500轉換為FOUP蓋30朝向下方。並且,在所述待機部300配備有用於將配備於FOUP主體20及FOUP蓋30的鎖定器鎖定或解鎖的鎖定及解鎖單元(未圖示)。所述鎖定及解鎖單元可以構成為使所述鎖定器向一方向或反方向旋轉,從而將鎖定器鎖定或解鎖。The standby part 300 is a place where the FOUP 10 transferred from the loading and unloading part 200 by the transfer unit 400 waits before being transferred to the clean chamber 600, and the posture of the FOUP 10 transferred to the standby part 300 is controlled by the robot 500. Switch to the FOUP cover 30 facing downwards. In addition, the standby unit 300 is equipped with a locking and unlocking unit (not shown) for locking or unlocking the locker provided in the FOUP main body 20 and the FOUP cover 30. The locking and unlocking unit may be configured to rotate the locker in one direction or the reverse direction to lock or unlock the locker.

在所述待機部300配備有:待機板310,安置FOUP主體20和FOUP蓋30;以及升降氣缸320,使所述待機板310以沿上下方向移動的方式升降。所述升降氣缸320可以連接於移送單元400,從而藉由移送單元400的驅動而在裝載及卸載部200與待機部300之間往返移動。The standby part 300 is equipped with a standby plate 310 for placing the FOUP main body 20 and the FOUP cover 30, and a lifting cylinder 320 to move the standby plate 310 up and down in a vertical direction. The lifting cylinder 320 may be connected to the transfer unit 400 to move back and forth between the loading and unloading part 200 and the standby part 300 by the driving of the transfer unit 400.

所述移送單元400是用於往返移送升降氣缸320的構成,作為一實施例,可以由線性運動導軌構成。The transfer unit 400 is configured to transfer the lifting cylinder 320 back and forth. As an example, it may be formed by a linear motion guide rail.

對從所述裝載及卸載部200向待機部300移送FOUP 10的過程進行說明。若FOUP 10裝載於支撐板210上,則在所述支撐板210的下側待機的升降氣缸320上升移動,從而將位於支撐板210上的FOUP 10提升至支撐板210的上側。這種狀態下,升降氣缸320和FOUP 10藉由移送單元400的驅動而向待機部300側移動。若升降氣缸320和FOUP 10位於待機部300的待機板310上側,則升降氣缸320下降移動,從而將所支撐的FOUP 10放置於待機板310上。接下來,在機器人500的夾持器510抓持FOUP 10之後,旋轉FOUP 10使得FOUP蓋30朝向下方,然後放置於待機板310上,通過配備於待機部300的鎖定及解鎖單元解鎖鎖定器,從而使FOUP主體20與FOUP蓋30處於可分離的狀態。The process of transferring the FOUP 10 from the loading and unloading unit 200 to the standby unit 300 will be described. If the FOUP 10 is loaded on the support plate 210, the lifting cylinder 320 waiting on the lower side of the support plate 210 moves upward, thereby lifting the FOUP 10 on the support plate 210 to the upper side of the support plate 210. In this state, the lift cylinder 320 and the FOUP 10 move to the standby part 300 side by the driving of the transfer unit 400. If the elevating cylinder 320 and the FOUP 10 are located on the upper side of the standby plate 310 of the standby portion 300, the elevating cylinder 320 moves downward, thereby placing the supported FOUP 10 on the standby plate 310. Next, after the gripper 510 of the robot 500 grips the FOUP 10, the FOUP 10 is rotated so that the FOUP cover 30 faces downward, and then placed on the standby plate 310, and the locker is unlocked by the locking and unlocking unit provided in the standby part 300, Thus, the FOUP main body 20 and the FOUP cover 30 are in a separable state.

若同上所述地FOUP主體20與FOUP蓋30處於可分離的狀態,則藉由機器人500將FOUP主體20和FOUP蓋30依次搬送至清潔腔室600。If the FOUP main body 20 and the FOUP cover 30 are in a separable state as described above, the FOUP main body 20 and the FOUP cover 30 are sequentially transported to the clean chamber 600 by the robot 500.

參照圖4及圖5,所述清潔腔室600包括:清潔腔室主體610,將所述FOUP主體20收容於內部而進行清潔及乾燥處理;清潔腔室蓋620,開閉所述清潔腔室主體610的上部,並將所述FOUP蓋30支撐而進行清潔及乾燥處理。4 and 5, the cleaning chamber 600 includes: a cleaning chamber main body 610, which houses the FOUP main body 20 inside for cleaning and drying; a cleaning chamber cover 620, which opens and closes the clean chamber main body The upper part of 610, and supports the FOUP cover 30 for cleaning and drying.

在所述清潔腔室主體610內包括:安置部611,配備於所述清潔腔室主體610的下部,以安置所述FOUP主體20;以及升降部634,在所述清潔腔室主體610的上部與下部之間升降,並且將所述FOUP主體20轉移至所述安置部611上,或者從所述安置部611接收所述FOUP主體20而使所述FOUP主體20升降。所述升降部634可以藉由支撐部633而與清潔腔室蓋620連接,並且所述升降部634與所述清潔腔室蓋620可以藉由同一個升降驅動部631一同升降。The cleaning chamber main body 610 includes: a seating part 611 arranged at the lower part of the cleaning chamber main body 610 to house the FOUP main body 20; and a lifting part 634 on the upper part of the cleaning chamber main body 610 The FOUP body 20 is moved up and down between and the lower part, and the FOUP main body 20 is transferred to the seating part 611, or the FOUP main body 20 is received from the seating part 611 to lift the FOUP main body 20. The lifting part 634 can be connected to the cleaning chamber cover 620 by the support part 633, and the lifting part 634 and the cleaning chamber cover 620 can be lifted and lowered together by the same lifting driving part 631.

在FOUP主體20及FOUP蓋30從所述待機部300移動至清潔腔室600的情況下,升降驅動部631上升移動,據此,清潔腔室蓋620、支撐部633及升降部634一同上升移動,從而清潔腔室主體610的上部被開放的同時,安置部611將向清潔腔室主體610的上部移動而待機於能夠接收FOUP主體20的位置。When the FOUP main body 20 and the FOUP cover 30 move from the standby part 300 to the cleaning chamber 600, the lift driving part 631 moves upward, and accordingly, the cleaning chamber cover 620, the support part 633 and the lift part 634 move upward together As a result, while the upper part of the cleaning chamber main body 610 is opened, the seating part 611 will move to the upper part of the cleaning chamber main body 610 and stand by at a position capable of receiving the FOUP main body 20.

在所述清潔腔室蓋620配備有:FOUP蓋支撐部621及夾具622,用於支撐並固定被機器人500移送的FOUP蓋30。The cleaning chamber cover 620 is equipped with a FOUP cover support part 621 and a clamp 622 for supporting and fixing the FOUP cover 30 transferred by the robot 500.

若FOUP主體20藉由所述機器人500被轉移到升降部634上,且FOUP蓋30被FOUP蓋支撐部621及夾具622支撐並固定於清潔腔室蓋620,則清潔腔室蓋620和固定於清潔腔室蓋620的FOUP蓋30以及藉由支撐部633連接於清潔腔室蓋620的升降部634藉由升降驅動部631的下降驅動而以支撐FOUP主體20的狀態進行下降移動。在這種情況下,升降驅動部631下降驅動至驅動清潔腔室蓋620封閉清潔腔室主體610的上部的位置,在此過程中,升降部634在將FOUP主體20轉移到安置部611之後,位於安置部611的下側並待機。If the FOUP body 20 is transferred to the lifting part 634 by the robot 500, and the FOUP cover 30 is supported by the FOUP cover support part 621 and the clamp 622 and fixed to the cleaning chamber cover 620, the cleaning chamber cover 620 is fixed to The FOUP cover 30 of the cleaning chamber cover 620 and the lifting part 634 connected to the cleaning chamber cover 620 by the support part 633 are driven by the lifting driving part 631 to descend and move while supporting the FOUP main body 20. In this case, the lifting driving part 631 is driven down to drive the cleaning chamber cover 620 to close the upper part of the cleaning chamber main body 610. In this process, the lifting part 634 transfers the FOUP main body 20 to the seating part 611, It is located on the lower side of the placement part 611 and stands by.

參照圖5,在所述升降部634的中央部形成有貫通口634a,在所述貫通口634a的內側佈置有安置部611。因此,當升降部634升降移動時,防止與安置部611的干擾,並且能夠在升降部634與安置部611之間實現FOUP主體20的交接。5, a through opening 634a is formed in the central part of the lifting part 634, and a seating part 611 is arranged inside the through opening 634a. Therefore, when the lifting part 634 moves up and down, interference with the seating part 611 is prevented, and the FOUP body 20 can be handed over between the lifting part 634 and the seating part 611.

另外,在所述清潔腔室主體610配備有:清潔流體噴射部640:640-1、640-2,供應用於清潔FOUP主體20及FOUP蓋30的清潔流體。In addition, the cleaning chamber main body 610 is equipped with cleaning fluid spraying parts 640: 640-1, 640-2 for supplying cleaning fluid for cleaning the FOUP main body 20 and the FOUP cover 30.

所述清潔流體噴射部640可以包括:外部清潔流體噴射部640-1,向FOUP主體20的外側面及FOUP蓋30噴射清潔流體;以及內部清潔流體噴射部640-2,向所述FOUP主體20的內側面噴射清潔流體。The cleaning fluid spraying part 640 may include: an external cleaning fluid spraying part 640-1 which sprays cleaning fluid to the outer surface of the FOUP body 20 and the FOUP cover 30; and an internal cleaning fluid spraying part 640-2 to the FOUP body 20 Spray cleaning fluid on the inner side of the device.

所述外部清潔流體噴射部640-1中,多個噴嘴可以配備於上下相隔的位置,所述多個噴嘴配備於FOUP主體20的外側周圍且在朝向FOUP主體20的外側面噴射清潔流體的同時朝向FOUP蓋30噴射清潔流體。In the external cleaning fluid ejection portion 640-1, a plurality of nozzles may be provided at positions spaced up and down. The multiple nozzles are provided around the outer side of the FOUP main body 20 and spray cleaning fluid toward the outer side of the FOUP main body 20. The cleaning fluid is sprayed toward the FOUP cover 30.

所述內部清潔流體噴射部640-2以位於FOUP主體20的內側的方式配備於安置部611上,從而朝向FOUP主體20的內側面噴射清潔流體。The internal cleaning fluid spraying part 640-2 is provided on the seating part 611 in a manner of being located on the inner side of the FOUP main body 20 so as to spray the cleaning fluid toward the inner side of the FOUP main body 20.

另外,安置所述FOUP主體20的安置部611配備為能夠藉由馬達670的驅動而旋轉,支撐所述FOUP蓋30的FOUP蓋支撐部621也配備為能夠藉由馬達623的驅動而旋轉。In addition, the placement portion 611 on which the FOUP body 20 is placed is configured to be able to be rotated by the drive of a motor 670, and the FOUP cover support portion 621 that supports the FOUP cover 30 is also configured to be capable of being rotated by the drive of the motor 623.

參照圖4,在所述外部清潔流體噴射部640-1可以上下相隔地形成有噴射清潔流體的多個噴嘴,所述多個噴嘴以靠近所述FOUP主體20的外側面的方式佈置,並且可以形成為各自的長度及噴射角不同。並且,所述FOUP主體20可旋轉地配備於所述清潔腔室600內,所述多個噴嘴可以傾斜地形成,以向與所述FOUP主體20旋轉的方向相向的方向噴射清潔流體。所述噴嘴所傾斜的角度可以形成為以連接噴嘴與FOUP主體20的中心的線為基準具有30°~ 40°範圍的傾斜。4, the external cleaning fluid ejection portion 640-1 may be formed with a plurality of nozzles spraying cleaning fluid spaced up and down, and the plurality of nozzles are arranged close to the outer side surface of the FOUP body 20, and may It is formed so that the respective lengths and spray angles are different. In addition, the FOUP main body 20 is rotatably equipped in the cleaning chamber 600, and the plurality of nozzles may be formed obliquely to spray cleaning fluid in a direction opposite to the direction in which the FOUP main body 20 rotates. The angle at which the nozzle is inclined may be formed to have an inclination ranging from 30° to 40° based on the line connecting the nozzle and the center of the FOUP body 20.

根據同上所述的構成,當清潔FOUP主體20及FOUP蓋30時,外部清潔流體噴射部640-1在靠近旋轉的FOUP主體20的外側面的位置向與FOUP主體20旋轉的方向相向的方向噴射清潔流體,因此能夠提高FOUP主體20的清潔效率。According to the above-mentioned configuration, when cleaning the FOUP main body 20 and the FOUP cover 30, the external cleaning fluid spraying portion 640-1 sprays in a direction opposite to the direction in which the FOUP main body 20 rotates at a position close to the outer surface of the rotating FOUP main body 20 The cleaning fluid can therefore improve the cleaning efficiency of the FOUP body 20.

作為一實施例,通過所述外部清潔流體噴射部640-1噴射的清潔流體可以是熱去離子水(Hot deionized water),通過所述內部清潔流體噴射部640-2噴射的清潔流體可以是蒸汽(Steam)。並且,在所述熱去離子水及蒸汽中可以混合壓縮乾燥空氣CDA而提供。As an example, the cleaning fluid sprayed through the external cleaning fluid spraying part 640-1 may be hot deionized water, and the cleaning fluid sprayed through the internal cleaning fluid spraying part 640-2 may be steam. (Steam). In addition, the hot deionized water and steam may be mixed with compressed dry air CDA and provided.

通過同上所述地向外部清潔流體噴射部640-1供應熱去離子水與壓縮乾燥空氣的混合流體,從而使高溫的氣泡化及微粒子化的水粒子能夠細密地浸透FOUP主體20的外側面及FOUP蓋30,從而能夠提高清潔力並縮短乾燥時間,並且提高噴射的壓力,從而可以提高清潔效率。By supplying the mixed fluid of hot deionized water and compressed dry air to the external cleaning fluid ejection portion 640-1 as described above, the high-temperature bubbled and micronized water particles can finely penetrate the outer surface of the FOUP body 20 and The FOUP cover 30 can improve the cleaning power and shorten the drying time, and increase the spray pressure, so that the cleaning efficiency can be improved.

並且,通過向內部清潔流體噴射部640-2供應蒸汽與壓縮乾燥空氣的混合流體,從而利用相比於熱去離子水進一步微粒子化的蒸汽能夠在FOUP主體20內側面整個區域無死角地更細密地浸透,從而能夠進一步提高清潔力。In addition, by supplying a mixed fluid of steam and compressed dry air to the internal cleaning fluid injection part 640-2, the steam that is further atomized compared to the hot deionized water can be denser on the entire inner surface of the FOUP body 20 without dead spots. The ground is soaked, so that the cleaning power can be further improved.

另外,在所述清潔腔室600配備有:空氣供應部650,噴射用於乾燥完成清潔的所述FOUP主體20及FOUP蓋30的壓縮乾燥空氣。In addition, the cleaning chamber 600 is equipped with an air supply part 650 that sprays compressed dry air for drying the FOUP main body 20 and the FOUP cover 30 that have been cleaned.

所述空氣供應部650包括:外部空氣供應部650-1,向FOUP主體20的外側面噴射壓縮乾燥空氣;以及內部空氣供應部650-2,向所述FOUP主體20的內側面噴射壓縮乾燥空氣。The air supply part 650 includes: an external air supply part 650-1 which sprays compressed dry air to the outer side of the FOUP body 20; and an internal air supply part 650-2 which sprays compressed dry air to the inner side of the FOUP body 20 .

在所述外部空氣供應部650-1,作為與上述外部清潔流體噴射部640-1的構成相似的構成,噴射壓縮乾燥空氣的多個噴嘴上下相隔而形成,所述多個噴嘴靠近所述FOUP主體20的外側面而佈置,且形成為各自的長度及噴射角不同。並且,所述多個噴嘴可以傾斜地形成,以向與所述FOUP主體20所旋轉的方向相向的方向噴射壓縮乾燥空氣。所述噴嘴傾斜的角度可以形成為以連接噴嘴與FOUP主體20的中心的線為基準具有30°~ 40°範圍的傾斜。In the external air supply portion 650-1, as a configuration similar to the configuration of the external cleaning fluid injection portion 640-1 described above, a plurality of nozzles for injecting compressed dry air are formed vertically apart, and the plurality of nozzles are close to the FOUP The main body 20 is arranged on the outer side surface, and is formed to have different lengths and spray angles. Also, the plurality of nozzles may be formed obliquely to spray compressed dry air in a direction opposite to the direction in which the FOUP body 20 rotates. The angle of the nozzle inclination may be formed to have an inclination ranging from 30° to 40° based on the line connecting the nozzle and the center of the FOUP body 20.

根據同上所述的構成,由於當對FOUP主體20進行乾燥時,在靠近旋轉的FOUP主體20的外側面的位置向與FOUP主體20所旋轉的方向相向的方向噴射壓縮乾燥空氣,因此能夠提高FOUP主體20及FOUP蓋30的乾燥效率。According to the above-mentioned configuration, when the FOUP body 20 is dried, the compressed dry air is sprayed in a direction opposite to the direction in which the FOUP body 20 rotates at a position close to the outer surface of the rotating FOUP body 20, so that the FOUP can be improved. The drying efficiency of the main body 20 and the FOUP cover 30.

另外,所述空氣供應部650還可以包括:上部空氣供應部650-3,在清潔腔室600內部位於所述FOUP主體20與所述FOUP蓋30之間,且配備為能夠藉由氣缸651的驅動而前後移動,從而向完成清潔的FOUP主體20及FOUP蓋30噴射壓縮乾燥空氣。通過將所述上部空氣供應部650-3構成為可前後移動,從而如圖4所示,能夠有效地對積聚在開口部朝向下方而安置的FOUP主體20的上表面的水分進行乾燥並去除,並且能夠有效地對殘留於FOUP蓋30的整個區域的水分進行乾燥並去除。In addition, the air supply part 650 may further include: an upper air supply part 650-3, located between the FOUP main body 20 and the FOUP cover 30 inside the cleaning chamber 600, and is equipped to be able to be operated by the air cylinder 651 It is driven to move back and forth, thereby spraying compressed dry air to the cleaned FOUP main body 20 and FOUP cover 30. By configuring the upper air supply part 650-3 to be movable back and forth, as shown in FIG. 4, it is possible to effectively dry and remove moisture accumulated on the upper surface of the FOUP body 20 with the opening facing downward. In addition, the moisture remaining in the entire area of the FOUP cover 30 can be effectively dried and removed.

另外,參照圖4至圖8,在所述FOUP主體20配備有用於吹掃FOUP主體20內部的發泡多孔材質的通氣管噴嘴21,在清潔腔室600配備有在FOUP主體20清潔完畢之後向所述通氣管噴嘴21內注入壓縮乾燥空氣的壓縮乾燥空氣供應部680。In addition, referring to Figures 4 to 8, the FOUP main body 20 is equipped with a vent nozzle 21 made of foamed porous material for purging the inside of the FOUP main body 20, and the cleaning chamber 600 is equipped with a vent nozzle 21 after the FOUP main body 20 is cleaned. The compressed dry air supply part 680 of compressed dry air is injected into the vent nozzle 21.

所述壓縮乾燥空氣供應部680配備為可前後移動,以連接於通氣管噴嘴21的一側端或解除連接。因此,通過借助由上述的空氣供應部650進行的壓縮乾燥空氣噴射執行的乾燥過程而還未得到乾燥並殘留於通氣管噴嘴21的水分,將通過借助所述壓縮乾燥空氣供應部680進行的朝向通氣管噴嘴21內部的壓縮乾燥空氣的注入而再次得到乾燥。The compressed dry air supply part 680 is configured to be movable forwards and backwards to be connected to one side end of the air pipe nozzle 21 or disconnected. Therefore, the moisture remaining in the vent nozzle 21 that has not yet been dried through the drying process performed by the compressed dry air injection performed by the air supply unit 650 will pass through the direction of the compressed dry air supply unit 680. The compressed dry air inside the vent nozzle 21 is injected to dry again.

在所述FOUP主體20的一側面,配備為一對的通氣管噴嘴21的端部分別所連接的第一端口20a、20b形成於一側,與所述FOUP主體20的內部連通的第二端口20c、20d形成於另一側。On one side of the FOUP body 20, first ports 20a and 20b respectively connected to the ends of a pair of vent pipe nozzles 21 are formed on one side, and a second port 20c communicating with the inside of the FOUP body 20 , 20d is formed on the other side.

在基板處理工序中,為了在基板被收納於FOUP 10之前的步驟中在FOUP 10待機的儲料器(Stocker)中乾燥FOUP 10內部,所述第一端口20a、20b與第二端口20c、20d可以作為壓縮乾燥空氣流入及排出的連接端口而發揮功能。In the substrate processing process, in order to dry the inside of the FOUP 10 in the stocker where the FOUP 10 is on standby in the step before the substrate is stored in the FOUP 10, the first ports 20a, 20b and the second ports 20c, 20d It can function as a connection port for the inflow and outflow of compressed dry air.

所述壓縮乾燥空氣供應部680包括:第一噴嘴682:682-1、682-2,向所述第一端口20a、20b供應壓縮乾燥空氣;第二噴嘴684:684-1、684-2,向所述第二端口20c、20d供應壓縮乾燥空氣。在所述第一端口20a、20b和第二端口20c、20d的內側可以分別配備有過濾器22a、22b、22c、22d,在FOUP主體20的清潔過程中,吸收有清潔流體的所述過濾器22a、22b、22c、22d可以藉由壓縮乾燥空氣而快速被乾燥。The compressed dry air supply part 680 includes: first nozzles 682: 682-1, 682-2, which supply compressed dry air to the first ports 20a, 20b; and second nozzles 684: 684-1, 684-2, The compressed dry air is supplied to the second ports 20c, 20d. The inner side of the first port 20a, 20b and the second port 20c, 20d may be equipped with filters 22a, 22b, 22c, 22d, respectively. During the cleaning process of the FOUP body 20, the filter that absorbs the cleaning fluid 22a, 22b, 22c, 22d can be quickly dried by compressed dry air.

參照圖8,所述壓縮乾燥空氣供應部680包括:第一供應管681:681-1、681-2,向所述第一噴嘴682:682-1、682-2供應壓縮乾燥空氣並沿橫向配備;第二供應管683:683-1、683-2,連通於所述第一供應管681:681-1、681-2而向所述第二噴嘴684:684-1、684-2供應壓縮乾燥空氣並沿縱向配備;以及前後移動氣缸685,使所述第一供應管681:681-1、681-2和第二供應管683:683-1、683-2前進或後退移動。8, the compressed dry air supply part 680 includes: first supply pipes 681: 681-1, 681-2, which supply compressed dry air to the first nozzles 682: 682-1, 682-2 in a transverse direction Equipped with; second supply pipe 683: 683-1, 683-2, connected to the first supply pipe 681: 681-1, 681-2 to supply to the second nozzle 684: 684-1, 684-2 Compress the dry air and equip it in the longitudinal direction; and move the cylinder 685 back and forth to make the first supply pipe 681: 681-1, 681-2 and the second supply pipe 683: 683-1, 683-2 move forward or backward.

所述通氣管噴嘴21可以在FOUP主體20的內部向兩側隔開而配備為多個,所述第一端口20a、20b和第二端口20c、20d在所述FOUP主體20的一側面向兩側隔開而配備為多個,並且配備有所述第一噴嘴682:682-1、682-2的第一供應管681:681-1、681-2和配備有所述第二噴嘴684:684-1、684-2的第二供應管683:683-1、683-2分別向兩側隔開而配備為多個。The snorkel nozzle 21 may be provided in a plurality of spaced apart on both sides inside the FOUP main body 20, and the first ports 20a, 20b and the second ports 20c, 20d face two on one side of the FOUP main body 20. The first supply pipes 681: 681-1, 681-2 equipped with the first nozzles 682: 682-1, 682-2 and the second nozzle 684 equipped with the second nozzles 684: The second supply pipes 683 of 684-1 and 684-2: 683-1 and 683-2 are separated on both sides and provided in multiple.

所述多個第一供應管681:681-1、681-2可以被第一供應管支撐部件686支撐,所述多個第二供應管683:683-1、683-2被第二供應管支撐部件689-1、689-2支撐。在所述第一供應管支撐部件686結合有移動塊687,所述移動塊687連接於所述前後移動氣缸685而藉由前後移動氣缸685的驅動而前後移動。所述前後移動氣缸685可以安置而固定於固定框架688上。The plurality of first supply pipes 681: 681-1, 681-2 may be supported by the first supply pipe supporting member 686, and the plurality of second supply pipes 683: 683-1, 683-2 are supported by the second supply pipe The supporting members 689-1 and 689-2 support. The first supply pipe supporting member 686 is combined with a moving block 687 which is connected to the forward and backward moving air cylinder 685 and moves forward and backward by the driving of the forward and backward moving air cylinder 685. The forward and backward moving cylinder 685 can be arranged and fixed on the fixed frame 688.

在所述第一噴嘴682:682-1、682-2和第二噴嘴684:684-1、684-2可以結合有墊682a,所述墊682a緊貼於形成有所述第一端口20a、20b和第二端口20c、20d的所述FOUP主體20的外側面而保持氣密。作為一實施例,所述墊682a可以利用矽材質構成。The first nozzle 682: 682-1, 682-2 and the second nozzle 684: 684-1, 684-2 may be combined with a pad 682a, and the pad 682a is in close contact with the first port 20a, The outer sides of the FOUP main body 20 of 20b and the second ports 20c and 20d are kept airtight. As an embodiment, the pad 682a may be made of silicon material.

參照圖9,在所述清潔腔室600配備有:止動器690,用於支撐所述FOUP主體20的一側面,以使FOUP主體20不會被從所述壓縮乾燥空氣供應部680噴射的所述壓縮乾燥空氣推向一側而移動。9, the cleaning chamber 600 is equipped with a stopper 690 for supporting one side of the FOUP main body 20 so that the FOUP main body 20 will not be sprayed from the compressed dry air supply part 680 The compressed dry air moves to one side.

所述止動器690可以包括:旋轉氣缸691,向兩個方向旋轉驅動;軸693:693-1、693-2,連接於所述旋轉氣缸691的氣缸驅動軸692-1、692-2。The stopper 690 may include: a rotating cylinder 691, which is driven to rotate in two directions; shafts 693: 693-1, 693-2, connected to the cylinder drive shafts 692-1, 692-2 of the rotating cylinder 691.

若所述軸693:693-1、693-2藉由所述旋轉氣缸691的一方向旋轉驅動而向一方向旋轉,則所述軸693:693-1、693-2的端部與所述FOUP主體20的一側面接觸而支撐所述FOUP主體20,若所述軸693:693-1、693-2藉由所述旋轉氣缸691的反方向旋轉驅動而向反方向旋轉,則所述軸693:693-1、693-2的端部從所述FOUP主體20的一側面隔開而使支撐FOUP主體20的狀態解除。If the shafts 693: 693-1, 693-2 are driven to rotate in one direction by the rotating cylinder 691, the ends of the shafts 693: 693-1, 693-2 and the One side of the FOUP main body 20 contacts and supports the FOUP main body 20. If the shafts 693: 693-1, 693-2 rotate in the opposite direction by the rotation of the rotary cylinder 691, the shaft 693: The ends of 693-1 and 693-2 are separated from one side surface of the FOUP main body 20 to release the state of supporting the FOUP main body 20.

所述氣缸驅動軸692-1、692-2可以配備為向所述旋轉氣缸691的兩側凸出,所述軸693:693-1、693-2由分別與向所述兩側凸出的氣缸驅動軸692-1、692-2連接的一對軸693:693-1、693-2構成。所述一對軸693:693-1、693-2可以被軸支撐部件694支撐。The cylinder drive shafts 692-1, 692-2 may be equipped to protrude toward both sides of the rotating cylinder 691, and the shafts 693: 693-1, 693-2 are formed by protruding toward the two sides, respectively. A pair of shafts 693: 693-1, 693-2 connected by cylinder drive shafts 692-1 and 692-2 are formed. The pair of shafts 693:693-1, 693-2 may be supported by the shaft support member 694.

作為用於最小化當與所述FOUP主體20的一側面接觸時由摩擦造成的磨損的構成,軸693:693-1、693-2的端部可以構成為曲面形狀,並且所述軸693:693-1、693-2的端部的外側面進行耐磨損性塗層處理。作為一實施例,所述耐磨損性塗層可以利用聚四氟乙烯(PTFE:Poly-tetrafluoroethylene)材質構成。As a configuration for minimizing wear caused by friction when contacting one side surface of the FOUP main body 20, the ends of the shafts 693:693-1, 693-2 may be configured in a curved shape, and the shaft 693: The outer surfaces of the ends of 693-1 and 693-2 are treated with abrasion resistance coating. As an embodiment, the abrasion resistant coating may be made of polytetrafluoroethylene (PTFE: Poly-tetrafluoroethylene) material.

當進行借助清潔流體噴射部640的清潔以及借助空氣供應部650的乾燥時,安置部611以及安置於安置部611上面的FOUP主體20藉由馬達670的驅動而旋轉,所述壓縮乾燥空氣供應部680及止動器690與FOUP主體20的外側面相隔而佈置。並且,當進行借助所述壓縮乾燥空氣供應部680的通氣管噴嘴21的乾燥時,所述馬達670的驅動將停止,且使安置部611以及安置於該安置部611上面的FOUP主體20不旋轉而維持在原位靜止的狀態,使所述壓縮乾燥空氣供應部680及止動器690佈置為緊貼於FOUP主體20的外側面。When performing cleaning by the cleaning fluid ejection part 640 and drying by the air supply part 650, the seating part 611 and the FOUP main body 20 disposed on the seating part 611 are rotated by the drive of the motor 670, and the compressed dry air supply part The 680 and the stopper 690 are separated from the outer surface of the FOUP main body 20 and arranged. In addition, when drying is performed with the vent nozzle 21 of the compressed dry air supply part 680, the driving of the motor 670 will stop, and the seating part 611 and the FOUP body 20 placed on the seating part 611 will not rotate The compressed dry air supply part 680 and the stopper 690 are arranged in close contact with the outer surface of the FOUP main body 20 while maintaining the in-situ static state.

另外,在所述清潔腔室600配備有照射用於對完成清潔的FOUP主體20及FOUP蓋30進行乾燥的紫外線的紫外線燈660。所述紫外線燈660包括:外部紫外線燈660-1,向所述FOUP主體20的外側面照射紫外線;以及內部紫外線燈660-2,向所述FOUP主體20的內側面照射紫外線。In addition, the cleaning chamber 600 is equipped with an ultraviolet lamp 660 that irradiates ultraviolet rays for drying the cleaned FOUP main body 20 and the FOUP cover 30. The ultraviolet lamp 660 includes: an external ultraviolet lamp 660-1, which irradiates ultraviolet rays to the outer surface of the FOUP body 20; and an internal ultraviolet lamp 660-2, which irradiates ultraviolet rays to the inner surface of the FOUP body 20.

參照圖10至圖15,當進行通氣管噴嘴21的乾燥時,首先,如圖12所示,軸693藉由止動器690的旋轉氣缸691的一方向驅動而沿一方向旋轉,從而支撐FOUP主體20的一側面。接下來,如圖13所示,第一噴嘴682和第二噴嘴684藉由壓縮乾燥空氣供應部680的前後移動氣缸685的前進驅動而前進移動,從而分別與第一端口20a、20b和第二端口20c、20d連接,並且如圖14所示,供應壓縮乾燥空氣CDA。10-15, when the snorkel nozzle 21 is dried, first, as shown in FIG. 12, the shaft 693 is driven in one direction by the rotary cylinder 691 of the stopper 690 to rotate in one direction, thereby supporting the FOUP One side of the main body 20. Next, as shown in FIG. 13, the first nozzle 682 and the second nozzle 684 move forward by the forward drive of the forward and backward moving cylinder 685 of the compressed dry air supply part 680, so as to communicate with the first ports 20a, 20b and the second The ports 20c, 20d are connected, and as shown in FIG. 14, the compressed dry air CDA is supplied.

若通氣管噴嘴21的乾燥完成,則如圖15所示,第一噴嘴682和第二噴嘴684藉由壓縮乾燥空氣供應部680的前後移動氣缸685的後退驅動而後退移動,從而分別從第一端口20a、20b和第二端口20c、20d解除連接,並且軸693藉由止動器690的旋轉氣缸691的反方向驅動而沿反方向旋轉,從而解除支撐FOUP主體20的一側面的狀態。When the drying of the snorkel nozzle 21 is completed, as shown in FIG. 15, the first nozzle 682 and the second nozzle 684 are moved backward by the backward driving of the forward and backward moving cylinder 685 of the compressed dry air supply part 680, respectively, from the first The ports 20a, 20b and the second ports 20c, 20d are disconnected, and the shaft 693 is driven in the opposite direction by the rotation cylinder 691 of the stopper 690 to rotate in the opposite direction, thereby releasing the state of supporting one side surface of the FOUP main body 20.

如上所述,可以使壓縮乾燥空氣供應部680前後移動而使第一噴嘴682:682-1、682-2和第二噴嘴684:684-1、684-2同時連接到形成於FOUP主體20的一側面的第一端口20a、20b和第二端口20c、20d,進而供應壓縮乾燥空氣CDA,從而能夠提高通氣管噴嘴21的乾燥及FOUP主體20內部的乾燥效率。As described above, the compressed dry air supply part 680 can be moved back and forth so that the first nozzles 682: 682-1, 682-2 and the second nozzles 684: 684-1, 684-2 are simultaneously connected to the FOUP main body 20. The first ports 20a, 20b and the second ports 20c, 20d on one side further supply compressed dry air CDA, so that the drying efficiency of the vent nozzle 21 and the inside of the FOUP body 20 can be improved.

並且,為了支撐FOUP主體20的一側面而防止FOUP主體20被根據用於FOUP主體20的乾燥的壓縮乾燥空氣或氮氣的供應產生的壓力推向一側而移動,止動器690的軸693:693-1、693-2構成為旋轉驅動,從而能夠在FOUP主體20被穩定地固定支撐的狀態下,順利地執行FOUP主體20的乾燥作業。And, in order to support one side of the FOUP body 20 and prevent the FOUP body 20 from being pushed to one side by the pressure generated by the supply of dry compressed dry air or nitrogen for the FOUP body 20, the shaft 693 of the stopper 690: 693-1 and 693-2 are configured to be rotationally driven, so that the drying operation of the FOUP main body 20 can be smoothly performed in a state where the FOUP main body 20 is stably fixed and supported.

若在所述清潔腔室600完成清潔及乾燥,則清潔腔室蓋620以及被其支撐的FOUP蓋30藉由升降驅動部631的驅動而上升,與此同時,藉由支撐部633而與清潔腔室蓋620連接的升降部634上升移動,並且接收安置於安置部611上的FOUP主體20,進而向清潔腔室主體610上部移動,從而處於可搬出的狀態。If the cleaning and drying are completed in the cleaning chamber 600, the cleaning chamber cover 620 and the FOUP cover 30 supported by the cleaning chamber cover 620 are lifted by the driving of the lifting driving part 631, and at the same time, the cleaning chamber cover 620 is combined with the cleaning by the support part 633. The lifting part 634 connected to the chamber cover 620 moves up and receives the FOUP main body 20 placed on the seating part 611, and then moves to the upper part of the cleaning chamber main body 610 so as to be in a carry-out state.

通過同上所述地構成為清潔腔室蓋620及升降部634藉由同一個升降驅動部631的驅動而一同升降,從而能夠簡便並迅速順利地執行將FOUP主體20及FOUP蓋30搬入及搬出清潔腔室600的作業。The cleaning chamber cover 620 and the lifting part 634 are lifted and lowered together by the same lifting driving part 631 as described above, so that the FOUP main body 20 and the FOUP cover 30 can be moved in and out of the FOUP body 20 and the FOUP cover 30 easily and smoothly Operation of chamber 600.

若所述FOUP主體20向清潔腔室主體610上部移動,則FOUP蓋30及FOUP主體20被機器人500搬送至真空腔室700。When the FOUP main body 20 moves to the upper part of the cleaning chamber main body 610, the FOUP cover 30 and the FOUP main body 20 are transferred to the vacuum chamber 700 by the robot 500.

參照圖16,所述真空腔室700包括:真空腔室主體710,將FOUP主體20及FOUP蓋30以分離的狀態收容。Referring to FIG. 16, the vacuum chamber 700 includes a vacuum chamber main body 710, which accommodates the FOUP main body 20 and the FOUP cover 30 in a separated state.

所述FOUP主體20安置於在真空腔室主體710內的下部配備的安置部710a上,FOUP蓋30安置於在真空腔室主體710內的上部配備的支撐部711上。The FOUP main body 20 is disposed on a lower part 710 a in the vacuum chamber main body 710, and the FOUP cover 30 is disposed on a supporting part 711 disposed in the upper part of the vacuum chamber main body 710.

在所述真空腔室700連接有:氮氣供應線713,向真空腔室700內部供應氮氣;以及真空線712,將所述真空腔室700內部的流體藉由真空而吸入並排放至外部。殘留於FOUP主體20及FOUP蓋30的包含水分的異物借助通過所述氮氣供應線713供應的氮氣從FOUP主體20及FOUP蓋30分離並通過真空線712被吸入之後排放至外部。The vacuum chamber 700 is connected with a nitrogen supply line 713 for supplying nitrogen to the inside of the vacuum chamber 700, and a vacuum line 712 for sucking and exhausting the fluid in the vacuum chamber 700 to the outside by vacuum. The foreign matter containing moisture remaining in the FOUP main body 20 and the FOUP cover 30 is separated from the FOUP main body 20 and the FOUP cover 30 by the nitrogen supplied through the nitrogen supply line 713 and is sucked in through the vacuum line 712 and then discharged to the outside.

另外,在所述真空腔室700配備有向配備於FOUP主體20內部的通氣管噴嘴21內注入氮氣的氮氣供應部720。因此,藉由上述的清潔腔室600的壓縮乾燥空氣供應部680還未乾燥而殘留於通氣管噴嘴21的水分可以借助通過真空腔室700的氮氣供應部720注入的氮氣被乾燥並去除。In addition, the vacuum chamber 700 is equipped with a nitrogen gas supply unit 720 that injects nitrogen gas into the vent nozzle 21 provided inside the FOUP main body 20. Therefore, the moisture remaining in the vent nozzle 21 due to the compressed dry air supply part 680 of the cleaning chamber 600 not yet dried can be dried and removed by the nitrogen gas injected through the nitrogen gas supply part 720 of the vacuum chamber 700.

所述氮氣供應部720配備為可前後移動,以連接於通氣管噴嘴21的一側端或解除連接。The nitrogen supply part 720 is equipped to be movable forwards and backwards to be connected to one side of the vent nozzle 21 or disconnected.

所述氮氣供應部720可以構成為與上述的配備於清潔腔室600的壓縮乾燥空氣供應部680相同的構成,並且可以包括第一氮氣供應管721、第一氮氣噴嘴722、第二氮氣供應管723、第二氮氣噴嘴724、第二前後移動氣缸725、第一氮氣供應管支撐部件726、第二移動塊727、第二固定框架728、第二氮氣供應管支撐部件729。The nitrogen supply part 720 may be configured with the same composition as the compressed dry air supply part 680 equipped in the clean chamber 600 described above, and may include a first nitrogen supply pipe 721, a first nitrogen nozzle 722, and a second nitrogen supply pipe. 723, a second nitrogen nozzle 724, a second forward and backward moving cylinder 725, a first nitrogen supply pipe supporting part 726, a second moving block 727, a second fixed frame 728, and a second nitrogen supply pipe supporting part 729.

並且,在所述真空腔室700配備有:第二止動器730,用於支撐所述FOUP主體20的一側面而使FOUP主體20不會被從所述氮氣供應部720噴射的氮氣推向一側而移動。In addition, the vacuum chamber 700 is equipped with a second stopper 730 for supporting one side surface of the FOUP body 20 so that the FOUP body 20 will not be pushed toward by the nitrogen sprayed from the nitrogen supply part 720 Move to one side.

所述第二止動器730可以構成為與上述的配備於清潔腔室600的止動器690相同的構成,並且可以包括第二旋轉氣缸731、第二氣缸驅動軸732、第二軸733,並且構成為在所述第二軸733的端部進行耐磨損性塗層733a處理。The second stopper 730 may have the same structure as the stopper 690 provided in the cleaning chamber 600 described above, and may include a second rotary cylinder 731, a second cylinder drive shaft 732, and a second shaft 733, And it is configured that the end of the second shaft 733 is treated with a wear-resistant coating 733a.

若在所述真空腔室700完成水分及異物的排放以及通氣管噴嘴21的乾燥,則FOUP主體20及FOUP蓋30被機器人500搬送至所述待機部300。在這種情況下,若處於在所述待機部300佈置有其他FOUP的情況,則所述機器人500可以將FOUP主體20及FOUP蓋30搬送至緩衝部800,從而進行臨時保管。When the discharge of moisture and foreign matter and the drying of the vent nozzle 21 are completed in the vacuum chamber 700, the FOUP main body 20 and the FOUP cover 30 are transferred to the standby unit 300 by the robot 500. In this case, if other FOUPs are arranged in the standby section 300, the robot 500 may transport the FOUP main body 20 and the FOUP cover 30 to the buffer section 800 for temporary storage.

之後,若先處於所述待機部300的FOUP主體20及FOUP蓋30通過裝載及卸載部200而被卸載,則將臨時保管於所述緩衝部800的FOUP蓋30及FOUP主體20依次搬送至待機部300的待機板310上,進而以FOUP主體20可鎖定於FOUP蓋30上的狀態進行安置。After that, if the FOUP main body 20 and the FOUP cover 30 first in the standby unit 300 are unloaded by the loading and unloading unit 200, the FOUP cover 30 and the FOUP main body 20 temporarily stored in the buffer unit 800 are sequentially transported to the standby The FOUP main body 20 can be locked on the FOUP cover 30 to be placed on the standby board 310 of the part 300.

之後,藉由配備於所述待機部300的鎖定及解鎖單元而鎖定鎖定器,從而使FOUP主體20與FOUP蓋30結合為一體。After that, the locker is locked by the locking and unlocking unit provided in the standby portion 300, so that the FOUP main body 20 and the FOUP cover 30 are integrated into one body.

通過所述鎖定器的鎖定,FOUP主體20與FOUP蓋30結合而成的FOUP 10被機器人500轉換方向,從而以使FOUP蓋30朝向一側的方式被平放,之後再次安置在待機板310上。並且,若配備於待機部300的升降氣缸320上升而將FOUP 10提升至待機板310的上側,則升降氣缸320以及被其支撐的FOUP 10藉由移送單元400的驅動被移送至裝載及卸載部200的支撐板210上側,被支撐於升降氣缸320的FOUP 10藉由升降氣缸320的下降移動而被轉移到支撐板210上後被卸載。Through the locking of the locker, the FOUP 10 formed by the combination of the FOUP main body 20 and the FOUP cover 30 is switched by the robot 500, so that the FOUP cover 30 faces one side, and then is placed on the standby board 310 again. . In addition, if the lift cylinder 320 provided in the standby part 300 rises to lift the FOUP 10 to the upper side of the standby plate 310, the lift cylinder 320 and the FOUP 10 supported by the lift cylinder 320 are transferred to the loading and unloading part by the driving of the transfer unit 400 On the upper side of the supporting plate 210 of the 200, the FOUP 10 supported by the lifting cylinder 320 is transferred to the supporting plate 210 by the descending movement of the lifting cylinder 320 and then unloaded.

同上所述,本發明並不局限於上述實施例,在不脫離權利要求書中請求保護的本發明的技術思想的情況下,本發明所屬的技術領域中具備基本知識的人員可實現顯而易見的變形實施,這些變形實施屬於本發明的範圍內。As mentioned above, the present invention is not limited to the above-mentioned embodiments. Without departing from the technical idea of the present invention claimed in the claims, a person with basic knowledge in the technical field to which the present invention belongs can realize obvious modifications. Implementation, these modified implementations belong to the scope of the present invention.

1:FOUP清潔裝置 10:FOUP 20:FOUP主體 20a、20b:第一端口 20c、20d:第二端口 22a、22b、22c、22d:過濾器 21:通氣管噴嘴 30:FOUP蓋 100:工藝室 200:裝載及卸載部 210:支撐板 300:待機部 310:待機板 320:升降氣缸 400:移送單元 500:機器人 510:夾持器 600:清潔腔室 610:清潔腔室主體 611:安置部 620:清潔腔室蓋 621:FOUP蓋支撐部 622:夾具 623:馬達 630:升降單元 631:升降驅動部 632:連接部件 633:支撐部 634:升降部 634a:貫通口 640:清潔流體噴射部 640-1:外部清潔流體噴射部 640-2:內部清潔流體噴射部 650:空氣供應部 650-1:外部空氣供應部 650-2:內部空氣供應部 650-3:上部空氣供應部 651:氣缸 660:紫外線燈 660-1:外部紫外線燈 660-2:內部紫外線燈 670:馬達 680:壓縮乾燥空氣供應部 681、681-1、681-2:第一供應管 682、682-1、682-2:第一噴嘴 682a:墊 683、683-1、683-2:第二供應管 684、684-1、684-2:第二噴嘴 685:前後移動氣缸 686:第一供應管支撐部件 687:移動塊 688:固定框架 689、689-1、689-2:第二供應管支撐部件 690:止動器 691:旋轉氣缸 692-1、692-2:氣缸驅動軸 693、693-1、693-2:軸 693a:耐磨損性塗層 694:軸支撐部件 695:固定部件 700:真空腔室 710:真空腔室主體 710a:安置部 711:支撐部 712:真空線 713:氮氣供應線 720:氮氣供應部 721:第一氮氣供應管 722:第一氮氣噴嘴 723:第二氮氣供應管 724:第二氮氣噴嘴 725:第二前後移動氣缸 726:第一氮氣供應管支撐部件 727:第二移動塊 728:第二固定框架 729:第二氮氣供應管支撐部件 730:第二止動器 731:第二旋轉氣缸 732:第二氣缸驅動軸 733:第二軸 733a:第二耐磨損性塗層 800:緩衝部 910:公用部件 920:蒸汽單元 CDA:壓縮乾燥空氣1: FOUP cleaning device 10: FOUP 20: FOUP body 20a, 20b: the first port 20c, 20d: second port 22a, 22b, 22c, 22d: filter 21: Snorkel nozzle 30: FOUP cover 100: Craft room 200: Loading and unloading department 210: Support plate 300: Standby 310: Standby board 320: Lifting cylinder 400: transfer unit 500: Robot 510: gripper 600: Clean the chamber 610: Clean the main body of the chamber 611: Placement Department 620: Clean the chamber cover 621: FOUP cover support part 622: Fixture 623: Motor 630: Lifting unit 631: Lifting drive 632: Connecting Parts 633: Support 634: Elevator 634a: Through mouth 640: Clean the fluid ejection part 640-1: External cleaning fluid injection part 640-2: Internal cleaning fluid injection part 650: Air Supply Department 650-1: External air supply department 650-2: Internal air supply department 650-3: Upper air supply department 651: Cylinder 660: UV lamp 660-1: External UV lamp 660-2: Internal UV lamp 670: Motor 680: Compressed dry air supply department 681, 681-1, 681-2: the first supply pipe 682, 682-1, 682-2: the first nozzle 682a: Pad 683, 683-1, 683-2: second supply pipe 684, 684-1, 684-2: second nozzle 685: Move the cylinder back and forth 686: The first supply pipe support component 687: Moving Block 688: fixed frame 689, 681-1, 689-2: second supply pipe support part 690: Stopper 691: Rotating cylinder 692-1, 692-2: Cylinder drive shaft 693, 693-1, 693-2: shaft 693a: Abrasion resistant coating 694: Shaft support parts 695: fixed parts 700: vacuum chamber 710: The main body of the vacuum chamber 710a: Placement Department 711: Support 712: Vacuum line 713: Nitrogen Supply Line 720: Nitrogen Supply Department 721: The first nitrogen supply pipe 722: The first nitrogen nozzle 723: The second nitrogen supply pipe 724: The second nitrogen nozzle 725: The second moving cylinder back and forth 726: The first nitrogen supply pipe supporting part 727: second moving block 728: second fixed frame 729: The second nitrogen supply pipe supporting part 730: second stop 731: second rotating cylinder 732: second cylinder drive shaft 733: second axis 733a: Second wear resistance coating 800: Buffer 910: Common parts 920: Steam unit CDA: compressed dry air

圖1是示意性地示出本發明的FOUP清潔裝置的構成的側視圖。 圖2是示意性地示出本發明的FOUP清潔裝置的構成的平面圖。 圖3是用於說明在本發明的FOUP清潔裝置中將FOUP從裝載及卸載部移送至待機部的過程的圖。 圖4是示意性地示出配備於本發明的FOUP清潔裝置的清潔腔室的構成的縱剖視圖。 圖5是示出配備於本發明的FOUP清潔裝置的清潔腔室的內部結構的橫剖視圖。 圖6是示出用於乾燥配備於FOUP內部的通氣管噴嘴的壓縮乾燥空氣供應部和止動器配備於FOUP主體的兩側的情形的立體圖。 圖7是示出被供應壓縮乾燥空氣的FOUP主體的右側視圖。 圖8是從另一方向示出圖6所示的壓縮乾燥空氣供應部的立體圖。 圖9是圖6所示的止動器的立體圖。 圖10是圖6的右側視圖。 圖11是根據圖10的A-A線的剖視圖。 圖12至圖15是示出在乾燥通氣管噴嘴的過程中壓縮乾燥空氣供應部和止動器的操作狀態的圖。 圖16是示意性地示出配備於本發明的FOUP清潔裝置的真空腔室的構成的縱剖視圖。Fig. 1 is a side view schematically showing the configuration of the FOUP cleaning device of the present invention. Fig. 2 is a plan view schematically showing the configuration of the FOUP cleaning device of the present invention. 3 is a diagram for explaining the process of transferring the FOUP from the loading and unloading section to the standby section in the FOUP cleaning device of the present invention. Fig. 4 is a longitudinal cross-sectional view schematically showing the configuration of a cleaning chamber provided in the FOUP cleaning device of the present invention. Fig. 5 is a cross-sectional view showing the internal structure of the cleaning chamber provided in the FOUP cleaning device of the present invention. Fig. 6 is a perspective view showing a state in which a compressed dry air supply part and a stopper for drying the vent pipe nozzle provided inside the FOUP are provided on both sides of the FOUP main body. Fig. 7 is a right side view showing the FOUP main body supplied with compressed dry air. Fig. 8 is a perspective view showing the compressed dry air supply part shown in Fig. 6 from another direction. Fig. 9 is a perspective view of the stopper shown in Fig. 6. Fig. 10 is a right side view of Fig. 6. Fig. 11 is a cross-sectional view taken along the line A-A of Fig. 10. 12 to 15 are diagrams showing the operating states of the compressed dry air supply part and the stopper in the process of drying the snorkel nozzle. Fig. 16 is a longitudinal sectional view schematically showing the structure of a vacuum chamber provided in the FOUP cleaning device of the present invention.

20:FOUP主體20: FOUP body

21:通氣管噴嘴21: Snorkel nozzle

30:FOUP蓋30: FOUP cover

600:清潔腔室600: Clean the chamber

610:清潔腔室主體610: Clean the main body of the chamber

611:安置部611: Placement Department

620:清潔腔室蓋620: Clean the chamber cover

621:FOUP蓋支撐部621: FOUP cover support part

622:夾具622: Fixture

623:馬達623: Motor

630:升降單元630: Lifting unit

631:升降驅動部631: Lifting drive

632:連接部件632: Connecting Parts

633:支撐部633: Support

640:清潔流體噴射部640: Clean the fluid ejection part

640-1:外部清潔流體噴射部640-1: External cleaning fluid injection part

640-2:內部清潔流體噴射部640-2: Internal cleaning fluid injection part

650:空氣供應部650: Air Supply Department

650-3:上部空氣供應部650-3: Upper air supply department

651:氣缸651: Cylinder

660:紫外線燈660: UV lamp

660-1:外部紫外線燈660-1: External UV lamp

660-2:內部紫外線燈660-2: Internal UV lamp

670:馬達670: Motor

680:壓縮乾燥空氣供應部680: Compressed dry air supply department

681:第一供應管681: First Supply Pipe

682:第一噴嘴682: first nozzle

683:第二供應管683: second supply pipe

684:第二噴嘴684: second nozzle

685:前後移動氣缸685: Move the cylinder back and forth

690:止動器690: Stopper

691:旋轉氣缸691: Rotating cylinder

693:軸693: Axis

Claims (26)

一種前開式晶圓傳送盒清潔裝置,用於清潔包括前開式晶圓傳送盒主體及前開式晶圓傳送盒蓋的前開式晶圓傳送盒,該前開式晶圓傳送盒清潔裝置的特徵在於,在該前開式晶圓傳送盒主體配備有用於吹掃該前開式晶圓傳送盒主體的內部的發泡多孔材質的通氣管噴嘴,包括利用清潔流體清潔該前開式晶圓傳送盒主體和前開式晶圓傳送盒蓋的清潔腔室,在該清潔腔室配備有在該前開式晶圓傳送盒主體的清潔完成之後向該通氣管噴嘴內注入壓縮乾燥空氣的壓縮乾燥空氣供應部。A front-opening wafer transfer box cleaning device for cleaning a front-opening wafer transfer box including a front-opening wafer transfer box body and a front-opening wafer transfer box cover. The front-opening wafer transfer box cleaning device is characterized in that: The body of the front-opening wafer transfer box is equipped with a vent nozzle of foamed porous material for purging the inside of the body of the front-opening wafer transfer box, including cleaning the front-opening wafer transfer box body and the front-opening type with cleaning fluid The cleaning chamber of the wafer transfer box cover is equipped with a compressed dry air supply part that injects compressed dry air into the vent pipe nozzle after the cleaning of the front opening type wafer transfer box body is completed. 根據請求項1所述的前開式晶圓傳送盒清潔裝置,其中該壓縮乾燥空氣供應部配備為前後移動,以連接於該通氣管噴嘴的一側端或解除連接。The front-opening wafer transfer box cleaning device according to claim 1, wherein the compressed dry air supply part is equipped to move back and forth to connect to one side end of the vent pipe nozzle or to disconnect it. 根據請求項2所述的前開式晶圓傳送盒清潔裝置,其中在該前開式晶圓傳送盒主體的一側面,連接該通氣管噴嘴的端部的第一端口形成於一側,與該前開式晶圓傳送盒主體的內部連通的第二端口形成於另一側,該壓縮乾燥空氣供應部包括: 第一噴嘴,向該第一端口供應壓縮乾燥空氣;以及 第二噴嘴,向該第二端口供應壓縮乾燥空氣。The front-opening wafer transfer cassette cleaning device according to claim 2, wherein on one side of the front-opening wafer transfer cassette main body, a first port connected to the end of the vent pipe nozzle is formed on one side, and is connected to the front opening The second port communicating with the inside of the main body of the wafer transfer box is formed on the other side, and the compressed dry air supply part includes: A first nozzle, which supplies compressed dry air to the first port; and The second nozzle supplies compressed dry air to the second port. 根據請求項3所述的前開式晶圓傳送盒清潔裝置,其中在該第一端口和該第二端口的內側分別配備有過濾器,該過濾器藉由該壓縮乾燥空氣而得以乾燥。The front-opening wafer transfer cassette cleaning device according to claim 3, wherein a filter is respectively provided inside the first port and the second port, and the filter is dried by the compressed dry air. 根據請求項3所述的前開式晶圓傳送盒清潔裝置,其中該壓縮乾燥空氣供應部包括: 第一供應管,向該第一噴嘴供應壓縮乾燥空氣,並沿橫向配備; 第二供應管,連通於該第一供應管而向該第二噴嘴供應壓縮乾燥空氣,並沿縱向配備;以及 前後移動氣缸,使該第一供應管和該第二供應管前進或後退移動。The front-opening wafer transfer box cleaning device according to claim 3, wherein the compressed dry air supply unit includes: The first supply pipe, which supplies compressed dry air to the first nozzle, and is equipped horizontally; A second supply pipe, connected to the first supply pipe to supply compressed dry air to the second nozzle, and arranged along the longitudinal direction; and Moving the air cylinder forwards and backwards to move the first supply pipe and the second supply pipe forward or backward. 根據請求項5所述的前開式晶圓傳送盒清潔裝置,其中該通氣管噴嘴在該前開式晶圓傳送盒主體的內部向兩側隔開而配備為多個,該第一端口和該第二端口在該前開式晶圓傳送盒主體的一側面向兩側隔開而配備為多個,配備有該第一噴嘴的該第一供應管和配備有該第二噴嘴的該第二供應管分別向兩側隔開而配備為多個。The front opening type wafer transfer box cleaning device according to claim 5, wherein the vent nozzle is provided in a plurality of spaced apart from both sides inside the front opening type wafer transfer box main body, the first port and the first port Two ports are provided in a plurality of two ports on one side of the main body of the front-opening wafer transfer box, which are separated from each other on both sides, the first supply pipe equipped with the first nozzle and the second supply pipe equipped with the second nozzle Separate on both sides and equip them in multiple. 根據請求項6所述的前開式晶圓傳送盒清潔裝置,其中還包括: 第一供應管支撐部件,支撐該等第一供應管並連接於該前後移動氣缸;以及 第二供應管支撐部件,支撐該等第二供應管。The front-opening wafer transfer box cleaning device according to claim 6, which further includes: The first supply pipe support member supports the first supply pipes and is connected to the front and rear moving cylinder; and The second supply pipe support member supports the second supply pipes. 根據請求項3所述的前開式晶圓傳送盒清潔裝置,其中在該第一噴嘴和該第二噴嘴結合有墊,該墊緊貼於形成有該第一端口和該第二端口的該前開式晶圓傳送盒主體的外側面而保持氣密。The front opening type wafer transfer cassette cleaning device according to claim 3, wherein a pad is combined with the first nozzle and the second nozzle, and the pad is closely attached to the front opening where the first port and the second port are formed. The outer side of the main body of the wafer transfer box is kept airtight. 根據請求項8所述的前開式晶圓傳送盒清潔裝置,其中該墊利用矽材質構成。The front-opening wafer transfer box cleaning device according to claim 8, wherein the pad is made of silicon material. 根據請求項1所述的前開式晶圓傳送盒清潔裝置,其中在該清潔腔室配備有止動器,用於支撐該前開式晶圓傳送盒主體的一側面,以使該前開式晶圓傳送盒主體不會被從該壓縮乾燥空氣供應部噴射的該壓縮乾燥空氣推向一側而移動。The front opening type wafer transfer box cleaning device according to claim 1, wherein the cleaning chamber is equipped with a stopper for supporting a side surface of the front opening type wafer transfer box body so that the front opening type wafer The main body of the transfer box is not pushed to one side by the compressed dry air sprayed from the compressed dry air supply part to move. 根據請求項1所述的前開式晶圓傳送盒清潔裝置,其中該清潔腔室配備有: 外部清潔流體噴射部,向該前開式晶圓傳送盒主體的外側面及該前開式晶圓傳送盒蓋噴射清潔流體;以及 內部清潔流體噴射部,向該前開式晶圓傳送盒主體的內側面噴射清潔流體。The front-opening wafer transfer box cleaning device according to claim 1, wherein the cleaning chamber is equipped with: An external cleaning fluid spraying part spraying cleaning fluid to the outer side surface of the front opening type wafer transfer box main body and the front opening type wafer transfer box cover; and The internal cleaning fluid ejection part ejects the cleaning fluid to the inner surface of the main body of the front-opening wafer transfer cassette. 根據請求項11所述的前開式晶圓傳送盒清潔裝置,其中在該外部清潔流體噴射部上下相隔地形成有噴射清潔流體的多個噴嘴,且該等噴嘴形成為各自的長度及噴射角不同,以使該等噴嘴靠近該前開式晶圓傳送盒主體的外側面而佈置。The front-opening wafer transfer cassette cleaning device according to claim 11, wherein a plurality of nozzles for spraying cleaning fluid are formed up and down in the external cleaning fluid spraying portion, and the nozzles are formed to have different lengths and spray angles , So that the nozzles are arranged close to the outer side of the main body of the front-opening wafer transfer box. 根據請求項12所述的前開式晶圓傳送盒清潔裝置,其中該前開式晶圓傳送盒主體旋轉地配備於該清潔腔室內,該等噴嘴傾斜地形成,以向與該前開式晶圓傳送盒主體所旋轉的方向相向的方向噴射清潔流體。The front-opening wafer transfer box cleaning device according to claim 12, wherein the front-opening wafer transfer box main body is rotatably provided in the cleaning chamber, and the nozzles are formed obliquely to communicate with the front-opening wafer transfer box The direction in which the main body rotates sprays cleaning fluid in opposite directions. 根據請求項1所述的前開式晶圓傳送盒清潔裝置,其中在該清潔腔室配備有空氣供應部,噴射用於對清潔完畢的該前開式晶圓傳送盒主體及前開式晶圓傳送盒蓋進行乾燥的壓縮乾燥空氣。The front opening type wafer transfer box cleaning device according to claim 1, wherein the cleaning chamber is equipped with an air supply part for spraying the cleaned front opening type wafer transfer box main body and the front opening type wafer transfer box The cover is dried by compressed dry air. 根據請求項14所述的前開式晶圓傳送盒清潔裝置,其中該空氣供應部包括: 外部空氣供應部,向該前開式晶圓傳送盒主體的外側面噴射壓縮乾燥空氣;以及 內部空氣供應部,向該前開式晶圓傳送盒主體的內側面噴射壓縮乾燥空氣。The front-opening wafer transfer box cleaning device according to claim 14, wherein the air supply unit includes: An external air supply part spraying compressed dry air to the outer surface of the main body of the front-opening wafer transfer box; and The internal air supply unit sprays compressed dry air to the inner surface of the main body of the front-opening wafer transfer cassette. 根據請求項15所述的前開式晶圓傳送盒清潔裝置,其中在該外部空氣供應部,上下相隔地形成有噴射壓縮乾燥空氣的多個噴嘴,且該等噴嘴形成為各自的長度及噴射角不同,以使該等噴嘴靠近該前開式晶圓傳送盒主體的外側面而佈置。The front-opening wafer transfer cassette cleaning device according to claim 15, wherein a plurality of nozzles for spraying compressed dry air are formed up and down in the external air supply part, and the nozzles are formed to have respective lengths and spray angles The difference is that the nozzles are arranged close to the outer side of the main body of the front-opening wafer transfer box. 根據請求項16所述的前開式晶圓傳送盒清潔裝置,其中該前開式晶圓傳送盒主體旋轉地配備於該清潔腔室內,該等噴嘴傾斜地形成,以向與該前開式晶圓傳送盒主體所旋轉的方向相向的方向噴射壓縮乾燥空氣。The front-opening wafer transfer box cleaning device according to claim 16, wherein the front-opening wafer transfer box body is rotatably provided in the cleaning chamber, and the nozzles are formed obliquely to communicate with the front-opening wafer transfer box Compressed dry air is sprayed in the direction opposite to the direction where the main body rotates. 根據請求項15所述的前開式晶圓傳送盒清潔裝置,其中該空氣供應部還包括上部空氣供應部,在該清潔腔室內部位於該前開式晶圓傳送盒主體與該前開式晶圓傳送盒蓋之間,且配備為可前後移動,從而向清潔完畢的該前開式晶圓傳送盒主體及該前開式晶圓傳送盒蓋噴射壓縮乾燥空氣。The front-opening wafer transfer box cleaning device according to claim 15, wherein the air supply part further includes an upper air supply part located inside the cleaning chamber between the front-opening wafer transfer box main body and the front-opening wafer transfer Between the box covers, it is equipped to be movable back and forth, so that the cleaned front opening type wafer transfer box main body and the front opening type wafer transfer box cover are sprayed with compressed dry air. 根據請求項1所述的前開式晶圓傳送盒清潔裝置,其中該清潔腔室包括: 清潔腔室主體,將該前開式晶圓傳送盒主體收容於內部而進行清潔處理; 清潔腔室蓋,開閉該清潔腔室主體的上部,並將該前開式晶圓傳送盒蓋支撐而進行清潔處理。The front-opening wafer transfer box cleaning device according to claim 1, wherein the cleaning chamber includes: Cleaning the chamber body, and accommodating the front-opening wafer transfer box body inside for cleaning; The chamber cover is cleaned, the upper part of the main body of the cleaning chamber is opened and closed, and the front opening type wafer transfer box cover is supported for cleaning. 根據請求項19所述的前開式晶圓傳送盒清潔裝置,其中在該清潔腔室主體內包括: 安置部,配備於該清潔腔室主體的下部,以安置該前開式晶圓傳送盒主體;以及 升降部,在該清潔腔室主體的上部與下部之間升降,並且將該前開式晶圓傳送盒主體轉移至該安置部上或者從該安置部接收該前開式晶圓傳送盒主體而使該前開式晶圓傳送盒主體升降,其中,該升降部藉由支撐部而與該清潔腔室蓋連接,該升降部與該清潔腔室蓋藉由同一個升降驅動部而一同升降。The front-opening wafer transfer box cleaning device according to claim 19, wherein the cleaning chamber main body includes: The placement part is provided at the lower part of the main body of the cleaning chamber for placement of the main body of the front-opening wafer transfer box; and The lifting part lifts and lowers between the upper part and the lower part of the main body of the cleaning chamber, and transfers the main body of the front-opening wafer transfer cassette to the placement part or receives the main body of the front-opening wafer transfer cassette from the placement part to make the The main body of the front-opening wafer transfer box is raised and lowered, wherein the lifting part is connected with the cleaning chamber cover by a supporting part, and the lifting part and the cleaning chamber cover are raised and lowered together by the same lifting driving part. 根據請求項1所述的前開式晶圓傳送盒清潔裝置,其中在該清潔腔室配備有紫外線燈,照射用於對清潔完畢的該前開式晶圓傳送盒主體及前開式晶圓傳送盒蓋進行乾燥的紫外線。The front opening type wafer transfer box cleaning device according to claim 1, wherein the cleaning chamber is equipped with an ultraviolet lamp for irradiating the cleaned front opening type wafer transfer box main body and front opening type wafer transfer box cover Carry out drying with ultraviolet rays. 根據請求項21所述的前開式晶圓傳送盒清潔裝置,其中該紫外線燈包括: 外部紫外線燈,向該前開式晶圓傳送盒主體的外側面照射紫外線;以及 內部紫外線燈,向該前開式晶圓傳送盒主體的內側面照射紫外線。The front-opening wafer transfer box cleaning device according to claim 21, wherein the ultraviolet lamp includes: An external ultraviolet lamp, irradiating ultraviolet rays to the outer surface of the main body of the front-opening wafer transfer box; and An internal ultraviolet lamp irradiates ultraviolet rays to the inner surface of the main body of the front-opening wafer transfer box. 根據請求項1所述的前開式晶圓傳送盒清潔裝置,其中還包括: 真空腔室,使在該清潔腔室完成清潔的前開式晶圓傳送盒主體及前開式晶圓傳送盒蓋被搬送,在該真空腔室連接有: 氮氣供應線,向該真空腔室內部供應氮氣;以及 真空線,將該真空腔室內部的流體吸入之後排出至外部。The front-opening wafer transfer box cleaning device according to claim 1, which further includes: The vacuum chamber enables the body of the front-opening wafer transfer box and the cover of the front-opening wafer transfer box that have been cleaned in the cleaning chamber to be transported, and the vacuum chamber is connected with: A nitrogen supply line to supply nitrogen to the inside of the vacuum chamber; and The vacuum line sucks the fluid inside the vacuum chamber and discharges it to the outside. 根據請求項23所述的前開式晶圓傳送盒清潔裝置,其中在該真空腔室配備有向該通氣管噴嘴內注入氮氣的氮氣供應部。The front-opening wafer transfer cassette cleaning device according to claim 23, wherein the vacuum chamber is equipped with a nitrogen supply part that injects nitrogen into the vent nozzle. 根據請求項24所述的前開式晶圓傳送盒清潔裝置,其中該氮氣供應部配備為可前後移動,以連接於該通氣管噴嘴的一側端或解除連接。The front-opening wafer transfer box cleaning device according to claim 24, wherein the nitrogen supply part is equipped to be movable back and forth to be connected to one side of the vent pipe nozzle or disconnected. 根據請求項25所述的前開式晶圓傳送盒清潔裝置,其中在該真空腔室配備有第二止動器,用於支撐該前開式晶圓傳送盒主體的一側面,以使該前開式晶圓傳送盒主體不會被從該氮氣供應部噴射的該氮氣推向一側而移動。The front opening type wafer transfer cassette cleaning device according to claim 25, wherein the vacuum chamber is equipped with a second stopper for supporting a side surface of the front opening type wafer transfer cassette body so that the front opening type The main body of the wafer transfer box is not pushed to one side by the nitrogen gas sprayed from the nitrogen gas supply part to move.
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