JP3082389B2 - Cleanroom storage - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a clean room storage facility for temporarily storing semiconductor wafers, liquid crystal display substrates, disks and the like in a clean room.

[0002]

2. Description of the Related Art A conventional article storage facility in a clean room is disclosed in Japanese Patent Publication No. 1-45611. The article storage facility disclosed herein is laid in an article storage room along an article storage shelf having a plurality of partitioned storage spaces in the vertical and horizontal directions, and a central passage between the article storage shelves arranged on both sides. It has a loading / unloading device having a loading / unloading mechanism capable of traveling on a fixed route and capable of moving up and down and moving back and forth in the horizontal direction. In this type of article storage facility, an air supply device is provided at a lower side of the article storage shelf, and the air from the air supply device is made into clean air (clean air) through a filter, and is carried in and out from the back of the article storage shelf. The dust is blown out to the side to prevent the dust from floating and staying on the article storage shelf side.

[0003] Further, since the carrying-in / out device is equipped with a lifting guide device and a lifting / lowering drive device for guiding the loading / unloading mechanism on the self-propelled carriage, dust due to wear is generated. Since it moves to the article storage shelf side and adheres to semiconductor wafers etc. without being sucked and removed below the floor, it is necessary to use a lifting guide device or lifting drive device mounted on the self-propelled carriage of the loading / unloading device. An air suction device is provided on the lower surface side of the self-propelled trolley while covering the entire surface, and the dust generated in the cover is sucked downward by the air suction device, and is suctioned and removed to the lower side of the floor.

As described above, in the conventional article storage facility in the clean room, the airflow of the clean air from the back of the article storage shelf toward the central passage is formed, and the floating dust is removed from the articles (wafer cassettes) of the article storage shelf. (A semiconductor wafer housed therein).

[0005]

However, since this kind of conventional wafer storage has a structure in which the entire inside thereof is maintained in a high-purity atmosphere, a large-scale clean air supply system using a high-performance filter or a circulation system is used. In order to maintain the cleanliness, the entire interior must be used in a structure and shape to maintain cleanliness, and component materials must be used in consideration of this. There was a problem of poor sex.

Further, when a power failure occurs, there is a problem that the clean air supply system or the circulation system stops, and the cleanliness of the entire wafer storage is reduced. However, since contamination due to the failure or maintenance spreads throughout the wafer storage, there is also a problem that maintenance cannot be performed without permission.

[0007] In recent years, as semiconductor ICs have become more highly integrated, formation of an oxide film by natural oxidation during storage has become a problem.

FIGS. 11 and 12 show “Ultra LSI Ultra Clean Technology Symposium” (January 1990).
FIG. 11 shows the relationship between the formation of an oxide film by natural oxidation of a silicon semiconductor wafer and time, and FIG. 12 shows the relationship between the time when the wafer was exposed to the atmosphere. 4 shows the relationship between the resistivity of the wafer and the time when a natural oxide film is formed and epitaxial growth is performed. According to this paper, when a silicon semiconductor wafer is exposed to the atmosphere, as shown in FIG.
After 00 minutes, the growth rate of the oxide film increases, and as shown in FIG. 12, the resistivity sharply increases after about 50 minutes without cleaning.

[0009] In order to prevent the growth of the natural oxide film, the movement of the wafer, it becomes necessary to perform the conveyance and the like in an inert gas (e.g. N ₂ gas) atmosphere, at present, the concentration of O ₂ is 1
An N ₂ gas atmosphere having a concentration of 0 ppm or less and an H ₂ O concentration of 100 ppb or less is required.

For this reason, semiconductor processing conventionally performed in a specially designed clean room is replaced with a mechanical interface device, for example, as disclosed in Japanese Patent Application Laid-Open No. 60-143623. Then, the inside of the mechanical interface device is N ₂
The gas atmosphere was set, and the process was performed in the apparatus.

However, since the article storage usually stores semiconductor wafers for several hours to several days, formation of a natural oxide film in the article storage becomes a problem.

In order to solve such a problem, the present applicant does not store the wafer cassette in a bare state, but instead stores the wafer cassette in an airtight container. We have proposed a storage that can be stored and stored in the factory and has an inert gas purge function.

A specific example of a clean room storage that can be stored in the airtight container will be described below.

6 to 10, reference numeral 1 denotes an entire wafer storage. The wafer storage 1 stores two wafer storage units 10 and 10. Both wafer storage units 1
Numerals 0 and 10 are opposed to each other at a predetermined interval in the left-right direction, and define a wafer transfer work space in which the self-propelled transfer device 20 runs between them.

The wafer storage unit 10 is a shelf type storage unit having a multi-stage shelf 11 as shown in FIG. 8, but stores the wafer cassette W in an airtight container 40 (shown in FIG. 10). I do. The shelf 11 is provided with storage sections S at predetermined intervals in the longitudinal direction.

For this reason, the storage object loading / unloading section 2 of the wafer storage 1 has an empty container transfer section 3 for transferring the empty container 40 from the shelf 11 of the storage unit 10, and the storage object loading / unloading section. The wafer cassette W loaded into the container 2 is transferred to the container 4
0 is provided with an automatic transfer unit 30 (shown in FIG. 9) for carrying in the storage object.

Since the storage / unloading section 2 of the wafer storage 1 is located at one end of the wafer transfer work space, the handling section 25 of the self-propelled transfer apparatus 20 is a link mechanism. The transfer device 20 includes floor storage units 10 and 10.
A main body 22 that travels back and forth on a rail 21 laid on the front of the vehicle, a mast 23 that extends upward from the main body 22, and an elevating unit 24 that is guided up and down by a mast 23 and supported by the elevating unit 24 In the stacker clean having the above-described handling unit, the main unit 22 includes a control device (not shown).

In FIG. 9, the automatic storage unit 30 is an elevator provided with a lid elevator 31. In this example, the elevator mechanism comprises a gear unit 32, a motor 33, and a screw shaft 35 housed in a guide cylinder 34. The lower end of the support shaft 36 of the lift 31 is screwed to the screw shaft 35. The lid elevating platform 31 is one component of the storage object carrying-in / out section 2 and also serves as a carrying-in platform. The transfer table of the empty container transfer section 3 is an annular plate 5 having a cassette carrying port 4 and is fixedly supported by a support table 6.
In addition, a hole 8 is formed in a base 7 that divides the storage object loading / unloading section 2. The elevating platform 31 descends into the hole 8 (a carry-in position) to a level where the upper surface level is flush with the platform 7 surface, and rises into the port 4. 9 is a partition wall.

The container 41 with the handle 41A of the container 40 is airtightly closed by a container lid 42 via a sealing member 43. The container lid 42 is a hollow body and has a built-in lock mechanism as shown in FIG. doing. In the figure, reference numeral 44 denotes a cam. Reference numeral 45 denotes a plate-like lock arm, which has a rolling element 45a and is cantilevered so as to be able to advance and retreat in the longitudinal direction and to be tiltable. 46 fulcrum member, 47 Ah spring
You. The cam shaft 44 extends from the center of the upper wall of the lid elevator 31 into the container lid 42, and is spline-engaged with the cam 44 when the container lid 42 is concentrically mounted on the lid elevator 31. The lid elevating table 31 is a hollow body and has a built-in camshaft driving mechanism 49 for rotating the camshaft 48 by a predetermined angle. The cam shaft drive mechanism 49 and the cam shaft 48 constitute a lock opening / closing mechanism.

The cam 44 has a special cam surface,
When the cam 44 rotates, the lock arm 45 is displaced in the direction indicated by the arrow toward the fitting recess 41C, and the tip end engages with the fitting recess 41C. In this engaged state, the container 41
The space between the opening 41p and the container lid 42 is hermetically sealed with a sealing material 43. 43 is a flange 4 of the container 41
1B is a sealing material fixed to the lower surface of 1B.

In this configuration, as shown in FIG. 9, the lid lift 31 of the automatic storage unit
(Delivery position). In this state, when the empty container 40 is transferred from any of the shelves 11 to the empty container transfer section 3 by the stacker crane 20 and is placed on the plate 5, the cam shaft 48 projects into the container lid 42. The cam 44 is spline-engaged.
When the transfer of the empty container 40 onto the plate 5 is completed,
The cam shaft drive mechanism 49 operates, the cam 44 rotates, and the lock arm 45 is displaced toward the center of the container lid.
The engagement with 1C is released and unlocked. When the lock between the container 41 and the container lid 42 is released, the lid elevator 31 descends to the above-described carry-in position. At this time, the container lid 42
Descends together with the lid lift 31. When the lid elevator 31 is positioned at the loading position, the wafer cassette W transferred onto the apron 2A of the storage object loading unit 2 is placed on the lid elevator 31 by a transfer robot (not shown) or the like. 42. When the wafer cassette W is transferred onto the container lid 42, the lid lift 31 is raised to the delivery position. When the lid lift 31 is raised to the delivery position and the container lid 42 closes the opening 41p of the container 41, the camshaft drive mechanism 49 operates to rotate the camshaft 48 in the opposite direction, and the lock arm 45 Is fitting recess 41C
In the direction of the arrow shown in FIG.
Engage with 1C. Thereby, the container lid 42 hermetically seals the opening 41p of the container 41 via the sealing material 43.

In this manner, the wafer cassette W is hermetically stored in the container 40 in the wafer storage 1, and the container 40 storing the wafer cassette W is moved by the stacker crane 20 to the designated position on the designated shelf. In this example,
Since the wafer cassette W is stored and stored in the airtight container 40, it is not necessary to maintain the entire inside of the wafer storage 1 in a highly clean atmosphere.

By the way, in the case of the type which is stored in an airtight container and stored, while the inside of the container of the container or the inner surface of the lid is clean, particle contamination of the storage object does not occur, but the wafer and the like are repeatedly stored. During this time, the contamination of the atmosphere in the container by particles floating in the atmosphere of the wafer storage and the contamination of the container by chemicals from wafers and the like occur, and the merit of storing and storing in an airtight container is reduced. .

SUMMARY OF THE INVENTION The present invention has been made to solve this problem, and it is an object of the present invention to prevent a wafer from being contaminated by particles and the like caused by the contamination of the container when storing the wafers and the like in an airtight container. It is intended to provide a storage room for a clean room that can be used.

[0025]

According to the present invention, there is provided an automatic transfer apparatus having a storage unit having a storage section, and a transfer mechanism for loading and unloading a stored item to and from each storage section of the storage unit. The storage object to be carried in and out is a container having a lid locking mechanism capable of airtightly storing an article that dislikes particle contamination or / and chemical contamination, and a device for automatically taking the article in and out of the container, In the storage provided in the clean room, the container cleaning preparation station 60 and the container cleaning
Container cleaning unit 50 consisting of a cleaning station 70
And the container washing station 70 removes empty containers.
It has a cleaning chamber 80 that is exposed to the cleaning liquid,
The station 60 is located between the container transfer area S1 and the article temporary storage.
In the container transfer area S1.
A plurality of container mounting tables are equipped with ports and lid lifting tables,
In this port, the container bottom lid locking mechanism and the lid lifting platform are unlocked.
The closing mechanism is engaged, and after unlocking, the bottom lid and lid
The platform will move up and down, articles will be taken in and out, and
One of the number of container platforms
To the empty container on this mounting table.
Removed from the unwashed container on the container mounting table
It is characterized in that articles can be transferred .

A second aspect of the present invention is a container cleaning preparation station.
The temporary storage area S2 of the product
It is characterized in that the atmosphere is an active gas atmosphere .

Claim 3 is a container cleaning station.
The cleaning chamber has a cleaning liquid injection system and a dry gas injection system.
Characterized in that the so that

According to a fourth aspect of the present invention, the bottom lid of the container is a container.
Gas cleaning in the temporary storage area S2 of the cleaning preparation station
It is characterized by being purified .

According to a fifth aspect, an ID code is set in the container.
The cleaning history is stored using the ID code.
It is characterized by being processed .

[0030]

[0031]

[0032]

[0033]

According to the present invention, the wafer cassette loaded into and out of the storage object loading / unloading section is stored in the container by the storage item automatic transfer unit in the storage object loading / unloading section, and the transfer device is used to store the wafer in the storage unit shelf. It is transferred to the storage section and stored here. And when it is necessary to wash the container, simply transfer the container to the container automatic washing section, take out the goods from the container, transfer the container to the washing station, wash the container, The storage of articles and the like are automatically performed sequentially.

[0034]

An embodiment of the present invention will be described below with reference to the drawings.

1 to 4, reference numeral 50 denotes a container cleaning unit , which is provided in a part of one of the wafer storage units and includes a container cleaning preparation station 60 and a container cleaning chamber 70.

The container cleaning preparation station 60 has a container transfer area S1 having container mounting tables 61 and 62 on which the container 40 is transferred.
Is provided with a cassette temporary storage area S2 separated by the partition 63 from the area.
Below 1 and 62, automatic storage article transfer units 300A and 300B having the same shape as the automatic storage article transfer unit 30 shown in FIG.

The container transfer tables 61 and 62 have the same port as the port 4 that can pass through the cassette shown in FIG. 9, and are provided on the left and right sides of the temporary storage section 66 provided on the partition table 65 in the cassette temporary storage area S2. A hole 64 through which the lid elevating table 31 can be retracted is formed. The lid elevating table 31 descends into the hole 64 to a level where the upper surface is flush with the surface of the temporary placing table, and rises into the port 4.

As shown in FIG. 3, in the cassette temporary storage area S2 of the container cleaning preparation station 60, ultra-high-purity gas flows through the high-purity clean air supply unit 100 from the rear wall of the storage unit 10 to the stacker crane 20 side. ing. 101 is a normal filter, 102 is a high-performance filter, and 103 is a fan.

The container cleaning station 70 has a cleaning chamber 80 shown in FIG. In FIG. 4, reference numeral 81 denotes a closed automatic door. 82 is a net rack or pipe rack type container mounting table, 83 is an upper dry gas injection section provided near the ceiling of the cleaning chamber 80 and having a number of downward spray nozzles, 84 is provided below the container mounting table 82 and faces upward Is a lower dry gas injection unit having a number of injection nozzles, and the injection unit is connected to an air supply device outside the wafer storage unit through a pipe 85. As the dry gas, high-purity air or nitrogen gas that has passed through a filter is used. 86 is an exhaust device. 87 is an upper cleaning liquid ejecting unit provided near the ceiling of the cleaning chamber 80 and having a plurality of downward nozzles, 88 is a lower cleaning liquid ejecting unit provided below the container mounting table 82 and having a plurality of upward nozzles,
Both injection units are connected through a pipe 89 to a liquid supply device 90 in a machine room provided below the washing room 80. Liquid supply device 9
Numeral 0 has a filter 90A and a circulation pump 90B, and is connected to a cleaning liquid tank and a pure water tank (not shown) outside the wafer storage unit via opening / closing valves 90C and 90D. Reference numeral 91 denotes a funnel-shaped collected liquid, and the washing liquid dropped on the collected liquid flows to a liquid supply device 90 via an on-off valve 92. As the cleaning liquid, a detergent or pure water, or a mixed liquid of a detergent and pure water is used.

Since other structures are the same as those of the storage 1 shown in FIGS. 6 to 10, the same or corresponding parts are denoted by the same reference numerals.

In this configuration, the container 40 requiring cleaning is moved from the storage section S to the stacker crane 2.
By 0, it is transferred to the container mounting table 61 of the container cleaning preparation station 60.

(1) When the container 40 requiring cleaning is transferred to, for example, the container mounting table 61, the automatic storage / unloading unit 300A is operated to unlock the container 40 and to operate the lid lifting / lowering table 31. Is performed, and
The wafer cassette W in the container 40 is taken out to the cassette temporary storage area S2. At this time, the container lid 42 is located at a position where the container lid 42 is exposed to ultra-high-purity gas through the high-purity clean air supply unit 100.

(2) The wafer cassette W taken out to the cassette temporary storage area S2 is transferred by the stacker crane 20 to the cassette temporary storage section 66 adjacent to the hole 64.

(3) Next, the automatic door 81 of the cleaning chamber 80 is opened, and the empty container 41 of the container 40 is removed by the stacker crane 20 to the container mounting table 82 of the cleaning chamber 80.
And the automatic door 81 is closed.

(4) The cleaning chamber 80 sprays the cleaning liquid onto the outer surface of the container 41 and the inner surface of the container 41 for a predetermined time.
Is washed, and when this washing is completed, a dry gas is blown onto the outer surface of the container 41 and the inner surface of the container 41 for a predetermined period of time.
Dry 1

(5) The dried container 41 is carried out of the washing room 80 by the stacker crane 20, and is transferred to the container mounting table 61.

(6) The wafer cassette W in the cassette temporary storage section 66 is moved onto the container lid 42 which has been lowered to the cassette temporary storage area S2.
Transferred by 0.

(7) When the transfer is completed, the lid elevator 31 of the automatic storage / unloading unit 300A moves the container lid 4
2 and the wafer cassette W is lifted, the container lid 42 is positioned in the opening of the container 42, and the container 40 is locked.

(8) When the locking of the container 40 is completed, the container is transferred to the original storage section S by the stacker crane 20.

While the container 41 is being cleaned and dried in the cleaning chamber 80, the container lid 42 is gas-cleaned by the ultra-high-purity gas flow flowing to the cassette temporary storage area S2. Further, the container lid 42 may be subjected to gas cleaning using high-pressure air or nitrogen in the drying process of the clean room 80.

The container 40 is a control device (not shown) of the stocker 20 using an ID code provided in the container 41 to manage whether or not the container 40 is empty and in which storage section it is stored. However, in this embodiment, the cleaning history is also managed. Of course, when the container is a closed system used only in the storage, or when the container is managed by the host computer, the cleaning history can be managed without the ID code.

In the above-described cleaning procedure, the container 4
Until the cleaning of the container 0 is completed, the wafer cassette W remains in the cassette temporary storage area S2. Therefore, if a discharge command is issued to the wafer cassette during this time, the wafer cassette W cannot be discharged. In order to prevent this, in the present embodiment, the container transfer table 62 and the automatic storage unit 300B are provided.

In this case, the cleaned empty container is transferred to the container transfer table 62, and the wafer cassette W taken out of the container on the container mounting table 61 to the cassette temporary storage area S2 is stored by the stacker crane 20. It is transferred to the container lid on the lid elevator 31 of the automatic article loading and unloading unit 300B, and is stored in the washed container by the lid elevator 31.

In the above embodiment, the transfer of containers between the cleaning room 80 and the container mounting tables 61 and 62 is performed by the stacker crane 20, but a dedicated transfer robot may be provided.

In the above embodiment, the inner and outer surfaces of the container 41 of the container 40 are cleaned in the cleaning chamber 80.
Instead, a simple cleaning unit for cleaning only the inner surface 41 of the container may be provided.

FIG. 5 shows an example in which this simple cleaning unit is provided. The cleaning preparation station 60 shown in FIG.
Is used as the cleaning unit 80A. The simple cleaning unit 93 is hermetically attached below the container mounting table 62. The container 94 of the simple cleaning unit 93 is a cylindrical body whose upper side is opened and whose lower part is reduced in diameter to a conical shape, and a liquid distribution pipe 95 extends from the center of the bottom. This pipe 95 is connected to the liquid supply device 90 shown in FIG.
Is connected to the liquid supply device having the same configuration as that of A cleaning liquid ejecting unit 8 having a plurality of upward nozzles is provided below the container 94.
8A and a dry gas injection unit 84A are provided. The cleaning liquid ejecting unit 88A is supplied with the cleaning liquid from the liquid supply device outside the wafer storage unit. Dry gas injection unit 84A
Is connected to an air supply device outside the wafer storage unit through a pipe.

In this configuration, after the step (2), the empty container 41 of the container 40 is removed by the stacker crane 20 by the container mounting table 6 of the cleaning chamber 80A.
2, the container 96 is air-tightly fixed to the container mounting table 62 by the fixture 96, and the inner surface of the container is cleaned by the simple cleaning unit 93.

In each of the above embodiments, the container is
When an inert gas purging container is used, the cassette temporary storage area S2 is purged with an inert gas.

[0059]

As described above, the present invention provides a container cleaning unit capable of automatically cleaning a container in a case where a wafer cassette is stored in an airtight container instead of being stored in a bare state. Is provided, it is possible to prevent contamination of wafers and the like due to container contamination, and to sufficiently exert the effect of a storage that is stored and stored in an airtight container.

[Brief description of the drawings]

FIG. 1 is a front view showing a storage unit according to an embodiment of the present invention.

FIG. 2 is an enlarged view of a main part of the embodiment.

FIG. 3 is a diagram showing a cassette temporary storage area in the embodiment.

FIG. 4 is a view showing a container cleaning station in the embodiment.

FIG. 5 is a view showing a simple container cleaning unit in the embodiment.

FIG. 6 is a perspective view showing a specific example of a clean room storage.

FIG. 7 is a front view of the specific example.

FIG. 8 is a front view of the wafer storage unit in the above specific example.

FIG. 9 is a view showing an automatic storage and delivery unit in the above specific example.

FIG. 10 is a diagram showing the structure of a container in the above specific example.

FIG. 11 is a diagram showing a relationship between formation of a natural oxide film on a silicon semiconductor wafer and time.

FIG. 12 is a diagram showing a relationship between formation of a natural oxide film on a silicon semiconductor wafer and time.

[Explanation of symbols]

 REFERENCE SIGNS LIST 1 Wafer storage 2 Storage storage 3 Container transfer 3A Container loading and unloading port 10 Wafer storage unit 20 Transfer device 30 Automatic storage and delivery unit 40 Container 41 Container 42 Container lid 44-47 Lock mechanism 48-49 Lock opening / closing Mechanism 50 Automatic Container Cleaning Unit 60 Container Cleaning Preparation Station 70 Container Cleaning Station 80 Cleaning Room 80A Cleaning Unit 96 Simple Container Cleaning Unit

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI H01L 21/304 651 H01L 21/304 651Z (72) Inventor Teppei Yamashita 100 Takegahana-cho, Ise-shi, Mie Prefecture Shinko Electric Machinery Co., Ltd. Ise Works (72) Inventor: Masanao Murata 100, Takegahana-cho, Ise-shi, Mie Prefecture, Shinko Electric Machinery Co., Ltd., Ise Seisakusho (72) Inventor: Miki Tanaka 100, Takegahana-cho, Ise-shi, Mie Prefecture, Shinko Electric Machinery Co., Ltd., Ise Seisakusho (72) Inventor: Moriya Hiya 100, Takegahana-cho, Ise-shi, Mie Prefecture, Shinko Electric Machinery Co., Ltd., Ise Works (72) Inventor: Akio Nakamura 100, Takegahana-cho, Ise City, Mie Prefecture, Japan Shinko Electric Machinery Co., Ltd., Ise Works Co., Ltd. References JP-A-63-22405 (JP, A) JP-A-3-287353 (JP, A) JP-A-63-27025 (JP, A) JP-A-64-44035 (JP, A) JP-A-52-139378 (JP, A) JP-A-63-29923 (JP, A) JP-A-63-32689 (JP, U) International publication 90/14273 (WO , A1) (58) Field surveyed (Int. Cl. ⁷ , DB name) B65G 1/00-1/20 H01L 21/304

Claims (5)

(57) [Claims] 1. A storage unit having a storage section, an automatic transfer device equipped with a transfer mechanism for loading and unloading storage items to and from each storage section of the storage unit, and the storage items to be loaded and unloaded are particles contaminated. And / or a container having a lid locking mechanism capable of airtightly storing an article that dislikes chemical contamination, comprising a device for automatically putting the article in and out of the container, and in a storage provided in a clean room, Container cleaning preparation station 60 and container cleaning station
Equipped with an automatic container cleaning unit 50 comprising
The container cleaning station 70 cleans empty containers with liquid.
The container cleaning preparation station 60 has a cleaning chamber 80 for exposing
It has a rear S1 and an article temporary storage area S2, and transfers containers
Ports are provided for a plurality of container mounting tables in area S1.
And a lid lift table, and locks the container bottom lid in this port
The mechanism and the lock opening and closing mechanism of the lid elevating table are engaged, and after unlocking,
The integrated bottom lid and lid lift are raised and lowered,
And any of the above-mentioned container mounting tables
This is used as the mounting table for the cleaned empty container.
Unwashed container on other container mounting table to empty container on table
A clean room storage , wherein articles taken out of the tena can be transferred . 2. An article temporary in a container washing preparation station.
The storage area S2 is a highly clean atmosphere or an inert gas atmosphere.
The storage room for a clean room according to claim 1, wherein the storage room is clean. 3. The washing room of the container washing station,
Cleanroom depot according to claim 1, characterized in that it has a cleaning liquid injection system and the drying gas injection system. 4. The container bottom cover is provided with a container cleaning preparation step.
4. The storage room for a clean room according to claim 3 , wherein gas cleaning is performed in the temporary storage area S2 of the compartment . 5. The container is provided with an ID code.
Ri, clean room depot according to claim 1, wherein the this <br/> cleaning history by using the ID code is managed.