TWI756142B - Substrate cutting device and operating method of substrate cutting device - Google Patents
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67288—Monitoring of warpage, curvature, damage, defects or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67294—Apparatus for monitoring, sorting or marking using identification means, e.g. labels on substrates or labels on containers
Abstract
一種基板切斷裝置,適用於在一封裝基板被切斷成多個封裝體後對該等封裝體進行檢查。該基板切斷裝置包含一第一載台、一第一攝影模組、一第二攝影模組、一第一乾燥模組、一第二乾燥模組、一傳送手臂,及一活動承載台。該第一乾燥模組與該第二乾燥模組可以吹乾該等封裝體,因此能避免洗劑殘留,進而提升檢測精度。又,一種基板切斷裝置的作動方法可應用於前述基板切斷裝置,使得該活動承載台不需在作動過程中進行翻轉,從而避免吸附力不足的問題且易於進行空間規劃。A substrate cutting device is suitable for inspecting a plurality of packages after a package substrate is cut. The substrate cutting device includes a first stage, a first photography module, a second photography module, a first drying module, a second drying module, a transfer arm, and a movable bearing table. The first drying module and the second drying module can dry the packages, so that the residue of lotion can be avoided, thereby improving the detection accuracy. In addition, an operating method of a substrate cutting device can be applied to the aforementioned substrate cutting device, so that the movable stage does not need to be turned over during the operation process, thereby avoiding the problem of insufficient adsorption force and facilitating space planning.
Description
本發明是有關於一種半導體封裝設備,特別是指一種基板切斷裝置及基板切斷裝置的作動方法。The present invention relates to a semiconductor packaging equipment, in particular to a substrate cutting device and an operating method of the substrate cutting device.
封裝積體電路(Integrated Circuit, IC)的過程之中,會以一封裝基板(Substrate)承載積體電路,然後將該封裝基板依據預先設定的切斷線切斷,形成多個封裝體。由於切斷該封裝基板的過程中會產生碎屑,因此切斷後需要清洗該等封裝體。又,切斷時可能會產生缺角或是破裂等瑕疵,使得最終產品的品質以及可靠度下降。因此,切斷後還需要檢查該等封裝體是否有瑕疵,以避免出貨有瑕疵的產品。然而,若在清洗該等封裝體之後,再以影像辨識的方式檢查該等封裝體,會容易因為洗劑殘留而導致檢測精度不佳。In the process of packaging an integrated circuit (IC), a substrate is used to carry the integrated circuit, and then the substrate is cut according to a preset cutting line to form a plurality of packages. Since chips are generated in the process of cutting the package substrate, the packages need to be cleaned after cutting. In addition, defects such as chipping or cracking may occur during cutting, which reduces the quality and reliability of the final product. Therefore, it is also necessary to inspect the packages for defects after cutting, so as to avoid shipment of defective products. However, if the packages are inspected by image recognition after cleaning the packages, the detection accuracy is likely to be poor due to residual lotion.
參閱圖1,一種現有的基板切斷裝置適用於在一封裝基板(未於圖式中顯示)被切斷成多個封裝體8後對該等封裝體8進行檢查。每一封裝體8包含待檢查的一第一表面81及一相反於該第一表面81的第二表面82。定義一前後軸向D1及一垂直於該前後軸向D1的上下軸向D2。該現有的基板切斷裝置包含一第一載台91、一設置於該第一載台91後方且由下往上拍攝的第一攝影模組92、一設置於該第一攝影模組92後方且由上往下拍攝的第二攝影模組93、一位於該第二攝影模組93下方的第二載台94、一可沿該前後軸向D1移動且可沿該上下軸向D2升降的傳送手臂95,及一可沿該前後軸向D1移動且可繞自身軸心翻轉的活動承載台96。Referring to FIG. 1 , a conventional substrate cutting apparatus is suitable for inspecting a plurality of
該傳送手臂95可在一第一位置、一第二位置、一第三位置,及一第四位置之間移動。在該第一位置時,該傳送手臂95位於該第一載台91上方且遠離該第一載台91。在該第二位置時,該傳送手臂95位於該第一載台91上方且趨近該第一載台91。在該第三位置時,該傳送手臂95位於該第一攝影模組92上方且遠離該第一攝影模組92。在該第四位置時,該傳送手臂95位於該第一攝影模組92上方且趨近該第一攝影模組92。The
該活動承載台96則可在一第五位置及一第六位置之間移動。在該第五位置時,該活動承載台96位於該第一攝影模組92上方。在該第六位置時,該活動承載台96位於該第二攝影模組96與該第二載台94之間。The
參閱圖2與圖3,一開始,該傳送手臂95由該第一位置下降至該第二位置並由該等封裝體8的第一表面81吸附該等封裝體8,使得該等封裝體8隨著該傳送手臂95移動。然後,該傳送手臂95由該第一位置朝後移動至該第三位置。同時,該活動承載台96位於該第五位置且位於該傳送手臂95與該第一攝影模組92之間。接著,參閱圖4與圖5,該傳送手臂95先下降至該第四位置並解除與該等封裝體8之間的吸附關係,隨後再度上升至該第三位置。如此一來,該等封裝體8便被載置於該活動承載台96。然後,該活動承載台96由該等封裝體8的第二表面81吸附該等封裝體8並繞自身軸心翻轉,使得該等封裝體8的第一表面81得以被該第一攝影模組81拍攝並進行影像辨識。接著,參閱圖6與圖7,該活動承載台96由該第五位置朝後移動至該第六位置,並解除與該等封裝體8之間的吸附關係,使得該等封裝體8被載置於該第二載台。然後,該活動承載台96由該第六位置朝前移動至該第五位置,使得該等封裝體8的第二表面82得以被該第二攝影模組93拍攝並進行影像辨識。Referring to FIGS. 2 and 3 , initially, the
依據前述作動方法,該等封裝體8的第一表面81與第二表面82可以透過該第一攝影模組92與該第二攝影模組93拍攝並進行影像辨識,從而能有效地排除有瑕疵的產品並提升最終產品的可靠度。然而,由於在做動過程中該活動承載台96需要進行翻轉,為了克服離心力與重力,吸附該等封裝體8的力道需要高於一定程度,否則會影響到該等封裝體8的排列,甚至導致該等封裝體8被甩落。此外,在機構設計方面,也需要給予該活動承載台96適當的空間才能進行翻轉,造成難以進行空間規劃的問題。According to the aforementioned operation method, the
因此,本發明的目的,即在提供一種能提升檢測精度的基板切斷裝置。Therefore, an object of the present invention is to provide a substrate cutting device capable of improving detection accuracy.
本發明的另一目的,即在提供一種能避免在作動過程中進行翻轉而導致吸附力不足且易於進行空間規劃的基板切斷裝置的作動方法。Another object of the present invention is to provide an operating method of a substrate cutting device which can avoid insufficient adsorption force due to inversion during the operating process and is easy to perform space planning.
於是,本發明基板切斷裝置,適用於在一封裝基板被切斷成多個封裝體後對該等封裝體進行檢查。每一封裝體包含待檢查的一第一表面及一相反於該第一表面的第二表面。該基板切斷裝置包含一第一載台、一第一攝影模組、一第二攝影模組、一第一乾燥模組、一第二乾燥模組、一傳送手臂,及一活動承載台。Therefore, the substrate cutting device of the present invention is suitable for inspecting a plurality of packages after a package substrate is cut into a plurality of packages. Each package includes a first surface to be inspected and a second surface opposite the first surface. The substrate cutting device includes a first stage, a first photography module, a second photography module, a first drying module, a second drying module, a transfer arm, and a movable bearing table.
定義一前後軸向及一垂直於該前後軸向的上下軸向。該第一攝影模組設置於該第一載台後方且由下往上拍攝。該第二攝影模組設置於該第一攝影模組後方且由上往下拍攝。該第一乾燥模組沿該前後方向設置於該第一載台與該第一攝影模組之間且由下往上吹送氣流。該第二乾燥模組沿該前後方向設置於該第一攝影模組與該第二攝影模組之間且由上往下吹送氣流。該傳送手臂可沿該前後軸向移動且可沿該上下軸向升降。該活動承載台可沿該前後軸向移動。A front-rear axis and an up-down axis perpendicular to the front-rear axis are defined. The first photographing module is disposed behind the first stage and shoots from bottom to top. The second camera module is arranged behind the first camera module and shoots from top to bottom. The first drying module is disposed between the first stage and the first photographing module along the front-rear direction and blows airflow from bottom to top. The second drying module is disposed between the first photographing module and the second photographing module along the front-rear direction and blows airflow from top to bottom. The transfer arm can move along the front-rear axis and can lift up and down along the up-down axis. The movable bearing platform can move along the front-rear axial direction.
該傳送手臂可在一第一位置、一第二位置、一第三位置,及一第四位置之間移動。在該第一位置時,該傳送手臂位於該第一載台上方且遠離該第一載台。在該第二位置時,該傳送手臂位於該第一載台上方且趨近該第一載台。在該第三位置時,該傳送手臂位於該第一攝影模組上方且遠離該第一攝影模組。在該第四位置時,該傳送手臂位於該第一攝影模組上方且趨近該第一攝影模組。The transfer arm can move between a first position, a second position, a third position, and a fourth position. In the first position, the transfer arm is above the first stage and away from the first stage. In the second position, the transfer arm is located above the first stage and approaches the first stage. In the third position, the transmission arm is located above the first camera module and away from the first camera module. In the fourth position, the transmission arm is located above the first camera module and approaches the first camera module.
該活動承載台可在一第五位置及一第六位置之間移動。在該第五位置時,該活動承載台位於該第一攝影模組上方。在該第六位置時,該活動承載台位於該第二攝影模組下方。The movable platform can move between a fifth position and a sixth position. In the fifth position, the movable stage is located above the first camera module. In the sixth position, the movable stage is located below the second camera module.
本發明基板切斷裝置的作動方法,包含下列步驟:The operating method of the substrate cutting device of the present invention includes the following steps:
(A)製備一種基板切斷裝置,適用於在一封裝基板被切斷成多個封裝體後對該等封裝體進行檢查。每一封裝體包含待檢查的一第一表面及一相反於該第一表面的第二表面。該基板切斷裝置包含一第一載台、一第一攝影模組、一第二攝影模組、一第一乾燥模組、一第二乾燥模組、一傳送手臂,及一活動承載台。(A) Preparation of a substrate cutting device suitable for inspecting a package substrate after a package substrate is cut into a plurality of packages. Each package includes a first surface to be inspected and a second surface opposite the first surface. The substrate cutting device includes a first stage, a first photography module, a second photography module, a first drying module, a second drying module, a transfer arm, and a movable bearing table.
定義一前後軸向及一垂直於該前後軸向的上下軸向。該第一攝影模組設置於該第一載台後方且由下往上拍攝。該第二攝影模組設置於該第一攝影模組後方且由上往下拍攝。該第一乾燥模組沿該前後方向設置於該第一載台與該第一攝影模組之間且由下往上吹送氣流。該第二乾燥模組沿該前後方向設置於該第一攝影模組與該第二攝影模組之間且由上往下吹送氣流。該傳送手臂可沿該前後軸向移動且可沿該上下軸向升降。該活動承載台可沿該前後軸向移動。A front-rear axis and an up-down axis perpendicular to the front-rear axis are defined. The first photographing module is disposed behind the first stage and shoots from bottom to top. The second camera module is arranged behind the first camera module and shoots from top to bottom. The first drying module is disposed between the first stage and the first photographing module along the front-rear direction and blows airflow from bottom to top. The second drying module is disposed between the first photographing module and the second photographing module along the front-rear direction and blows airflow from top to bottom. The transfer arm can move along the front-rear axis and can lift up and down along the up-down axis. The movable bearing platform can move along the front-rear axial direction.
該傳送手臂可在一第一位置、一第二位置、一第三位置,及一第四位置之間移動。在該第一位置時,該傳送手臂位於該第一載台上方且遠離該第一載台。在該第二位置時,該傳送手臂位於該第一載台上方且趨近該第一載台。在該第三位置時,該傳送手臂位於該第一攝影模組上方且遠離該第一攝影模組。在該第四位置時,該傳送手臂位於該第一攝影模組上方且趨近該第一攝影模組。The transfer arm can move between a first position, a second position, a third position, and a fourth position. In the first position, the transfer arm is above the first stage and away from the first stage. In the second position, the transfer arm is located above the first stage and approaches the first stage. In the third position, the transmission arm is located above the first camera module and away from the first camera module. In the fourth position, the transmission arm is located above the first camera module and approaches the first camera module.
該活動承載台可在一第五位置及一第六位置之間移動。在該第五位置時,該活動承載台位於該第一攝影模組上方。在該第六位置時,該活動承載台位於該第二攝影模組下方。The movable platform can move between a fifth position and a sixth position. In the fifth position, the movable stage is located above the first camera module. In the sixth position, the movable stage is located below the second camera module.
(B) 該傳送手臂由該第一位置下降至該第二位置並由該等封裝體的第一表面吸附該等封裝體,使得該等封裝體隨著該傳送手臂移動。(B) The transfer arm is lowered from the first position to the second position and the packages are adsorbed by the first surfaces of the packages, so that the packages move with the transfer arm.
(C) 該傳送手臂由該第二位置上升至該第一位置,再由該第一位置移動至該第三位置。該傳送手臂由第一位置移動至該第三位置的過程中,該第一乾燥模組將該等封裝體的第二表面吹乾。(C) The transfer arm is raised from the second position to the first position, and then moved from the first position to the third position. During the process of moving the transfer arm from the first position to the third position, the first drying module dries the second surfaces of the packages.
(D) 當該傳送手臂吸附該等封裝體並位於該第三位置時,該第一攝影模組拍攝該等封裝體的第二表面並進行影像辨識。(D) When the transfer arm absorbs the packages and is located at the third position, the first camera module photographs the second surfaces of the packages and performs image recognition.
(E) 當該活動承載台位於該第五位置時,該傳送手臂由該第三位置下降至該第四位置並解除與該等封裝體之間的吸附關係,使得該等封裝體被載置於該活動承載台。(E) When the movable platform is located at the fifth position, the transfer arm descends from the third position to the fourth position and releases the suction relationship with the packages, so that the packages are placed on the event platform.
(F) 該活動承載台由該第五位置移動至該第六位置,使得該第二攝影模組拍攝該等封裝體的第一表面並進行影像辨識。該活動承載台由第五位置移動至該第六位置的過程中,該第二乾燥模組將該等封裝體的第一表面吹乾。(F) The movable stage moves from the fifth position to the sixth position, so that the second camera module captures the first surfaces of the packages and performs image recognition. During the movement of the movable stage from the fifth position to the sixth position, the second drying module dries the first surfaces of the packages.
本發明的功效在於:由於該第一乾燥模組與該第二乾燥模組可以吹乾該等封裝體,因此能避免洗劑殘留,進而提升檢測精度。又,由於該傳送手臂吸附該等封裝體並位於該第三位置時,該第一攝影模組便會拍攝該等封裝體的第二表面並進行影像辨識,該活動承載台不需在作動過程中進行翻轉,從而避免吸附力不足的問題且易於進行空間規劃。The effect of the present invention is that since the first drying module and the second drying module can dry the packages, the residue of lotion can be avoided, thereby improving the detection accuracy. In addition, when the transfer arm absorbs the packages and is located at the third position, the first camera module will photograph the second surfaces of the packages and perform image recognition, and the movable stage does not need to be operated during operation It can be turned over in the middle, thus avoiding the problem of insufficient suction force and easy space planning.
參閱圖8,本發明基板切斷裝置的一實施例,適用於在一封裝基板(未於圖式中顯示)被切斷成多個封裝體7後對該等封裝體7進行檢查。每一封裝體7包含待檢查的一第一表面71及一相反於該第一表面71的第二表面72。為了簡潔起見,在相關的篇幅中將以「裝置實施例」表示「本發明基板切斷裝置的實施例」。Referring to FIG. 8 , an embodiment of the substrate cutting device of the present invention is suitable for inspecting the
該裝置實施例包含一第一載台1、一第一攝影模組21、一第二攝影模組22、一第一乾燥模組31、一第二乾燥模組32、一傳送手臂4、一活動承載台5、一第一感測器61,及一第二感測器62。The device embodiment includes a
定義一前後軸向X及一垂直於該前後軸向X的上下軸向Y。該第一攝影模組21設置於該第一載台1後方且由下往上拍攝。該第二攝影模組22設置於該第一攝影模組21後方且由上往下拍攝。該第一乾燥模組31沿該前後方向設置於該第一載台1與該第一攝影模組21之間且由下往上吹送氣流,並包括一第一吹風組件311及一第一氣體加熱組件312。該第二乾燥模組32沿該前後方向設置於該第一攝影模組21與該第二攝影模組22之間且由上往下吹送氣流,並包括一第二吹風組件321及一第二氣體加熱組件322。A front-rear axis X and an up-down axis Y perpendicular to the front-rear axis X are defined. The
該傳送手臂4可沿該前後軸向X移動且可沿該上下軸向Y升降,並具有一埋設於內部的加熱模組41。 該傳送手臂4可在一第一位置、一第二位置、一第三位置,及一第四位置之間移動。在該第一位置時,該傳送手臂4位於該第一載台1上方且遠離該第一載台1。在該第二位置時,該傳送手臂4位於該第一載台1上方且趨近該第一載台1。在該第三位置時,該傳送手臂4位於該第一攝影模組21上方且遠離該第一攝影模組21。在該第四位置時,該傳送手臂4位於該第一攝影模組21上方且趨近該第一攝影模組21。The conveying
該活動承載台5可沿該前後軸向X在一第五位置及一第六位置之間移動。在該第五位置時,該活動承載台5位於該第一攝影模組21上方。在該第六位置時,該活動承載台5位於該第二攝影模組22下方。該第一感測器61設置於該第一攝影模組21上方並用於偵測該活動承載台5是否位於該第五位置。該第二感測器62設置於該第二攝影模組22下方並用於偵測該活動承載台5是否位於該第六位置。The
參閱圖9,本發明基板切斷的作動方法的一實施例包含步驟S1~S7,並可應用於前述的裝置實施例。為了簡潔起見,在相關的篇幅中將以「方法實施例」表示「本發明基板切斷的作動方法的實施例」。Referring to FIG. 9 , an embodiment of the operating method for cutting a substrate of the present invention includes steps S1 to S7 , and can be applied to the aforementioned apparatus embodiments. For the sake of brevity, "the method embodiment" will be referred to as "the embodiment of the operation method for cutting the substrate of the present invention" in the relevant sections.
步驟S1,製備一類似或相同於該裝置實施例的基板切斷裝置(如圖8所示)。由於在本方法實施例中是直接應用該裝置實施例進行說明,所以為了簡潔起見,不再針對結構的部分重複說明,並引用相同的元件編號來進行進一步的闡述。In step S1, a substrate cutting device similar or identical to the device embodiment (as shown in FIG. 8) is prepared. Since the embodiment of the method is directly applied to the embodiment of the apparatus for description, for the sake of brevity, the description of the part of the structure will not be repeated, and the same element number will be cited for further description.
參閱圖10,步驟S2,該傳送手臂4由該第一位置下降至該第二位置並由該等封裝體7的第一表面71吸附該等封裝體7,使得該等封裝體7隨著該傳送手臂4移動。Referring to FIG. 10, step S2, the
參閱圖11,步驟S3,該傳送手臂4由該第二位置上升至該第一位置,再由該第一位置移動至該第三位置。該傳送手臂4由第一位置移動至該第三位置的過程中,該第一乾燥模組31將該等封裝體7的第二表面72吹乾。要特別說明的是,由於本方法實施例中該第一乾燥模組31透過該第一氣體加熱組件312加熱氣體並透過該第一吹風組件311吹送加熱後的氣體,且該傳送手臂4具有該加熱模組41,可以進一步提升吹乾該等封裝體7的效率。Referring to FIG. 11 , step S3 , the
步驟S4,當該傳送手臂4吸附該等封裝體7並位於該第三位置時,該第一攝影模組21拍攝該等封裝體7的第二表面72並進行影像辨識。要特別說明的是,由於在進行拍攝之前該等封裝體7的第二表面72已被該第一乾燥模組31吹乾,以該第一攝影模組21進行影像辨識時不會受到殘留的洗劑影響,因此能提升檢測精度。In step S4, when the
要說明的是,為了避免該活動承載台5在該步驟S4中阻礙該第一攝影模組21拍攝,本方法實施例中該活動承載台5的預設位置是在該第六位置。但此處只是舉例而言,該活動承載台5的預設位置也可以是在其他不會阻礙該第一攝影模組21拍攝的位置,不應以此為限。It should be noted that, in order to prevent the
參閱圖12, 步驟S5,該活動承載台5由該第六位置移動至該第五位置。再參閱圖13,當該活動承載台5位於該第五位置時,該傳送手臂4由該第三位置下降至該第四位置並解除與該等封裝體7之間的吸附關係,使得該等封裝體7被載置於該活動承載台5。Referring to FIG. 12, step S5, the
參閱圖14,步驟S6,該等封裝體7被載置於該活動承載台5之後,該傳送手臂4由該第四位置上升至該第三位置,以免該等封裝體7與該傳送手臂4碰撞。Referring to FIG. 14 , step S6 , after the
參閱圖15,步驟S7,該活動承載台5由該第五位置移動至該第六位置,使得該第二攝影模組22拍攝該等封裝體7的第一表面71並進行影像辨識。該活動承載台5由第五位置移動至該第六位置的過程中,該第二乾燥模組32將該等封裝體7的第一表面71吹乾。本方法實施例中,該第二乾燥模組32透過該第二氣體加熱組件322加熱氣體並透過該第二吹風組件321吹送加熱後的氣體,提升吹乾該等封裝體7的效率。Referring to FIG. 15 , step S7 , the
要特別說明的是,由於在進行拍攝之前該等封裝體7的第一表面71已被該第二乾燥模組32吹乾,以該第二攝影模組22進行影像辨識時不會受到殘留的洗劑影響,因此能更進一步提升檢測精度。It should be noted that, since the
如此一來,該等封裝體7的第一表面71與第二表面72分別被該第二攝影模組22與該第一攝影模組21拍攝並進行影像辨識,且拍攝前還透過該加熱模組41、該第一乾燥模組31與該第二乾燥模組32避免洗劑殘留而提升了檢測精度,進而可以有效地避免出貨有瑕疵的封裝體7。此外,在作動的過程中該活動承載台5不需要翻轉,自然就不再需要如同先前技術一般考量離心力與重力所造成的吸附力不足、排列受到干擾、元件被甩落…等問題。又,本裝置實施例相較於先前技術來說,省略了一個承接該等封裝體7的載台(參閱[0003]段中所述的第二載台94),精簡了元件數目。此外,也不需要預備翻轉所需的活動空間,降低機構設計的困難。In this way, the
綜上所述,本發明基板切斷裝置及基板切斷裝置的作動方法,由於該第一乾燥模組31與該第二乾燥模組32可以吹乾該等封裝體7,因此能避免洗劑殘留,進而提升檢測精度。又,由於該傳送手臂4吸附該等封裝體7並位於該第三位置時,該第一攝影模組21便會拍攝該等封裝體7的第二表面72並進行影像辨識,該活動承載台5不需在作動過程中進行翻轉,從而避免吸附力不足的問題且易於進行空間規劃,故確實能達成本發明的目的。To sum up, in the substrate cutting device and the operating method of the substrate cutting device of the present invention, since the
惟以上所述者,僅為本發明的實施例而已,當不能以此限定本發明實施的範圍,凡是依本發明申請專利範圍及專利說明書內容所作的簡單的等效變化與修飾,皆仍屬本發明專利涵蓋的範圍內。However, the above are only examples of the present invention, and should not limit the scope of implementation of the present invention. Any simple equivalent changes and modifications made according to the scope of the patent application of the present invention and the contents of the patent specification are still included in the scope of the present invention. within the scope of the invention patent.
1:第一載台 21:第一攝影模組 22:第二攝影模組 31:第一乾燥模組 311:第一吹風組件 312:第一氣體加熱組件 32:第二乾燥模組 321:第二吹風組件 322:第二氣體加熱組件 4:傳送手臂 41:加熱模組 5:活動承載台 61:第一感測器 62:第二感測器 7:封裝體 71:第一表面 72:第二表面 X:前後軸向 Y:上下軸向 S1~S7:步驟1: The first stage 21: The first photography module 22: Second photography module 31: The first drying module 311: The first blowing component 312: First gas heating assembly 32: Second drying module 321: Second blower assembly 322: Second gas heating assembly 4: Teleport Arm 41: Heating module 5: Activity platform 61: First sensor 62: Second sensor 7: Package body 71: First Surface 72: Second Surface X: Front and rear axis Y: up and down axis S1~S7: Steps
本發明的其他的特徵及功效,將於參照圖式的實施方式中清楚地呈現,其中: 圖1是一現有的基板切斷裝置與多個封裝體的一架構示意圖; 圖2是一作動示意圖,說明該現有的基板切斷裝置的一傳送手臂由一第一位置下降至一第二位置; 圖3是一作動示意圖,說明該現有的基板切斷裝置的該傳送手臂由該第一位置朝後移動至一第三位置,且一活動承載台位於一第五位置; 圖4是一作動示意圖,說明該現有的基板切斷裝置的該傳送手臂在一第四位置解除與該等封裝體之間的吸附關係以後上升至該第三位置; 圖5是一作動示意圖,說明該現有的基板切斷裝置的該活動承載台繞自身軸心翻轉; 圖6是一作動示意圖,說明該現有的基板切斷裝置的該活動承載台由該第五位置朝後移動至一第六位置; 圖7是一作動示意圖,說明該現有的基板切斷裝置的該活動承載台解除與該等封裝體之間的吸附關係,使得該等封裝體被載置於一第二載台,並由該第六位置朝前移動至該第五位置; 圖8是本發明基板切斷裝置的一裝置實施例與多個封裝體的一架構示意圖; 圖9是本發明基板切斷的作動方法的一方法實施例的一流程方塊圖; 圖10是一作動示意圖,說明該方法實施例中一傳送手臂由一第一位置下降至一第二位置; 圖11是一作動示意圖,說明該方法實施例中該傳送手臂由該第一位置移動至一第三位置; 圖12是一作動示意圖,說明該方法實施例中一活動承載台由一第六位置移動至一第五位置; 圖13是一作動示意圖,說明該方法實施例中該傳送手臂由該第三位置下降至一第四位置; 圖14是一作動示意圖,說明該方法實施例中該傳送手臂由該第四位置上升至該第三位置;及 圖15是一作動示意圖,說明該方法實施例中該活動承載台由該第五位置朝後移動至該第六位置。 Other features and effects of the present invention will be clearly presented in the embodiments with reference to the drawings, wherein: FIG. 1 is a schematic diagram of a structure of a conventional substrate cutting device and a plurality of packages; FIG. 2 is a schematic action diagram illustrating that a conveying arm of the conventional substrate cutting device is lowered from a first position to a second position; 3 is a schematic diagram of the operation, illustrating that the transfer arm of the conventional substrate cutting device moves backward from the first position to a third position, and a movable stage is positioned at a fifth position; 4 is a schematic diagram of the operation, illustrating that the transfer arm of the conventional substrate cutting device is lifted to the third position after the suction relationship with the packages is released at a fourth position; 5 is a schematic diagram of the operation, illustrating that the movable stage of the conventional substrate cutting device is turned over around its own axis; 6 is a schematic diagram of the operation, illustrating that the movable stage of the conventional substrate cutting device moves backward from the fifth position to a sixth position; 7 is a schematic diagram of the operation, illustrating that the movable stage of the conventional substrate cutting device releases the suction relationship with the packages, so that the packages are placed on a second stage, and the The sixth position is moved forward to the fifth position; 8 is a schematic structural diagram of a device embodiment of the substrate cutting device of the present invention and a plurality of packages; FIG. 9 is a block flow diagram of a method embodiment of the operating method for substrate cutting according to the present invention; 10 is a schematic diagram of an operation, illustrating that a conveying arm is lowered from a first position to a second position in an embodiment of the method; FIG. 11 is a schematic diagram of an operation, illustrating the movement of the transfer arm from the first position to a third position in the method embodiment; FIG. 12 is a schematic diagram of an operation, illustrating that a movable platform moves from a sixth position to a fifth position in the method embodiment; FIG. 13 is a schematic diagram of the operation, illustrating that the transfer arm is lowered from the third position to a fourth position in the method embodiment; FIG. 14 is a schematic diagram of the operation, illustrating that the transfer arm is raised from the fourth position to the third position in the embodiment of the method; and FIG. 15 is a schematic diagram of an operation, illustrating that the movable platform moves backward from the fifth position to the sixth position in the embodiment of the method.
1:第一載台 1: The first stage
21:第一攝影模組 21: The first photography module
22:第二攝影模組 22: Second photography module
31:第一乾燥模組 31: The first drying module
311:第一吹風組件 311: The first blowing component
312:第一氣體加熱組件 312: First gas heating assembly
32:第二乾燥模組 32: Second drying module
321:第二吹風組件 321: Second blower assembly
322:第二氣體加熱組件 322: Second gas heating assembly
4:傳送手臂 4: Teleport Arm
41:加熱模組 41: Heating module
5:活動承載台 5: Activity platform
61:第一感測器 61: First sensor
62:第二感測器 62: Second sensor
7:封裝體 7: Package body
71:第一表面 71: First Surface
72:第二表面 72: Second Surface
X:前後軸向 X: Front and rear axis
Y:上下軸向 Y: up and down axis
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Citations (5)
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TW200809947A (en) * | 2006-07-31 | 2008-02-16 | Nitto Denko Corp | Semiconductor wafer mount apparatus |
JP2010062508A (en) * | 2008-09-03 | 2010-03-18 | King Yuan Electronics Co Ltd | Double-side inspection apparatus for bare chip |
US20190355602A1 (en) * | 2016-12-06 | 2019-11-21 | Fuji Corporation | Die component supply device |
US20200043812A1 (en) * | 2017-07-31 | 2020-02-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | Automated inspection tool |
US20200185241A1 (en) * | 2018-12-11 | 2020-06-11 | Disco Corporation | Cutting apparatus and wafer processing method using cutting apparatus |
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TW200809947A (en) * | 2006-07-31 | 2008-02-16 | Nitto Denko Corp | Semiconductor wafer mount apparatus |
JP2010062508A (en) * | 2008-09-03 | 2010-03-18 | King Yuan Electronics Co Ltd | Double-side inspection apparatus for bare chip |
US20190355602A1 (en) * | 2016-12-06 | 2019-11-21 | Fuji Corporation | Die component supply device |
US20200043812A1 (en) * | 2017-07-31 | 2020-02-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | Automated inspection tool |
US20200185241A1 (en) * | 2018-12-11 | 2020-06-11 | Disco Corporation | Cutting apparatus and wafer processing method using cutting apparatus |
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