TWI753109B - Bonding equipment and control method thereof - Google Patents
Bonding equipment and control method thereof Download PDFInfo
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- TWI753109B TWI753109B TW107105662A TW107105662A TWI753109B TW I753109 B TWI753109 B TW I753109B TW 107105662 A TW107105662 A TW 107105662A TW 107105662 A TW107105662 A TW 107105662A TW I753109 B TWI753109 B TW I753109B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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Abstract
本發明公開一種接合設備及其控制方法。接合設備包括:接合頭,用以單獨吸附切割的裸片;驅動器,在垂直方向上移動接合頭並將其傳送到X-Y平面上的位置;接合基板,其上安裝有被接合頭吸附的裸片,接合頭包括:接合部件,真空吸附裸片;第一氣動壓力部件,透過選擇性地向其施加氣動壓力和取消氣動壓力的施加向接合部件供應緩衝動力,其容積根據壓力可變;第二氣動壓力部件,被連續施加氣動壓力,在將接合頭傳送到X-Y平面上的位置的同時,保持施加到第一和第二氣動壓力部件的氣動壓力,且當接合頭垂直向下移動時,在接合頭與接合基板的上部隔開預定高度的狀態下,施加到第一氣動壓力部件的氣動壓力移除,由接合部件吸附的裸片安裝在接合基板上。 The invention discloses a bonding device and a control method thereof. The bonding equipment includes: a bonding head to individually adsorb the diced dies; a driver to move the bonding head in a vertical direction and transfer it to a position on the XY plane; a bonding substrate on which the dies that are sucked by the bonding head are mounted , the bonding head includes: a bonding part, vacuum suction die; a first pneumatic pressure part, by selectively applying pneumatic pressure to it and canceling the application of pneumatic pressure to supply buffer power to the bonding part, and its volume is variable according to pressure; second The pneumatic pressure member, being continuously applied with pneumatic pressure, maintains the pneumatic pressure applied to the first and second pneumatic pressure members while transferring the bonding head to a position on the XY plane, and when the bonding head moves vertically downward, at the In a state where the bonding head is spaced apart from the upper portion of the bonding substrate by a predetermined height, the pneumatic pressure applied to the first pneumatic pressure member is removed, and the die sucked by the bonding member is mounted on the bonding substrate.
Description
本發明關於一種接合設備(bonding apparatus)及其控制方法。更具體而言,本發明關於一種接合設備及其控制方法,接合設備能夠保護待接合的裸片(die)(比如半導體晶片),並且當裸片的底表面透過接合設備的接合構件浸入到助焊劑中時,或者當浸有助焊劑的裸片被安裝在接合基板上以將裸片接合到基板(比如印刷電路板)上時,接合設備能夠防止裸片底表面上的凸塊(bump)損壞;接合設備能夠將裸片高速移動到含有助焊劑的浸漬板(dipping plate)或接合基板上,以最小化將裸片浸入到助焊劑中所需的處理時間,從而最大化生產率;並且接合設備能夠在拾取裸片期間最小化施加到裸片的衝擊,同時當裸片被拾取和翻轉時補償翻轉器(flipper)的旋轉慣性。 The present invention relates to a bonding apparatus and a control method thereof. More specifically, the present invention relates to a bonding apparatus capable of protecting a die to be bonded, such as a semiconductor wafer, and a control method thereof, and when the bottom surface of the die is immersed into the aid through the bonding member of the bonding apparatus. Bonding equipment can prevent bumps on the bottom surface of the die when it is in flux, or when a fluxed die is mounted on a bonding substrate to bond the die to a substrate such as a printed circuit board damage; bonding equipment capable of moving the die at high speed onto a flux-containing dipping plate or bonding substrate to minimize the processing time required to dipping the die into the flux, thereby maximizing productivity; and bonding The device is able to minimize the shock applied to the die during pick up, while compensating for the rotational inertia of the flipper as the die is picked up and flipped.
例如,在作為用以接合裸片(比如半導體晶片)的設備的半導體晶片接合設備中,當從晶片切割出的單獨半導體晶片被翻轉器吸附並拾取、旋轉180°以使得半導體晶片上下顛倒、接著被傳送到接合頭時,拾取半導體晶片的接合頭將半導體晶片的底表面上的凸塊浸入到助焊劑 中,並將半導體晶片接合到基板(比如印刷電路板)上。 通常,將裸片底表面上的凸塊浸入到助焊劑中的處理是通過以下方式執行的:將接合工具向下移動到塗覆有一定厚度的助焊劑的浸漬板上,並將浸漬板的助焊劑塗覆到由接合工具吸附的裸片的底表面上的凸塊上。 For example, in a semiconductor wafer bonding apparatus which is an apparatus for bonding bare chips such as semiconductor wafers, when individual semiconductor wafers cut out from the wafers are sucked and picked up by a flipper, rotated 180° so that the semiconductor wafers are turned upside down, and then The bond head that picks up the semiconductor wafer dips the bumps on the bottom surface of the semiconductor wafer into the flux as it is conveyed to the bond head , and bond the semiconductor wafer to a substrate such as a printed circuit board. Typically, the process of dipping the bumps on the bottom surface of the die into the flux is performed by moving the bonding tool down onto a dip plate coated with a thickness of flux, and placing the The flux is applied to the bumps on the bottom surface of the die that are attracted by the bonding tool.
在接合設備中,翻轉器採用具有低硬度的彈簧作為緩衝墊,以在翻轉器與裸片接觸時最小化施加到裸片的衝擊。 In bonding equipment, the flipper uses a spring with low stiffness as a cushion to minimize shock applied to the die when the flipper is in contact with the die.
為了使翻轉器旋轉到期望的範圍,在翻轉器將要停止的位置處安裝有停止器。當翻轉器與停止器接觸時,翻轉器的旋轉停止。 In order to rotate the flipper to a desired range, a stopper is installed at the position where the flipper is to be stopped. When the flipper comes into contact with the stopper, the rotation of the flipper stops.
在這種情況下,翻轉器的機械部件可能由於翻轉器的旋轉慣性而晃動或可能向翻轉器的機械部件施加衝擊,其中旋轉慣性是在當翻轉器與停止器接觸並因此停止時保持旋轉運動的屬性。 In this case, the mechanical parts of the flipper may shake or shock may be applied to the mechanical parts of the flipper due to the rotational inertia of the flipper, which is to maintain rotational motion when the flipper comes into contact with the stopper and thus stops properties.
此外,由於拾取單元(pickup unit)被安裝為與旋轉驅動器的旋轉中心間隔開,因此更高的旋轉慣性被施加到拾取單元。 Furthermore, since the pickup unit is installed to be spaced apart from the rotation center of the rotary drive, a higher rotational inertia is applied to the pickup unit.
類似地,當翻轉器高速向下移動以拾取裸片時,慣性被施加至翻轉器,因此翻轉器的機械部件產生不必要的運動。考慮到旋轉時產生的機械部件的慣性,翻轉器的旋轉速度被控制以防止由於慣性而出現問題。但是,隨著裝備的每小時產出(Unit Per Hour,UPH)的增加,翻轉器應高速旋轉。在翻轉器的旋轉速度增加的同時,彈簧 不能承受翻轉器的機械部件的慣性,因此機械部件被反復地推出和返回到機械部件的初始位置。由此,衝擊被累積在翻轉器上,因此翻轉器可能被損壞或者被吸附在翻轉器上的裸片可能被向前拋出。 Similarly, when the flipper is moved down at high speed to pick up a die, inertia is applied to the flipper, so the mechanical parts of the flipper create unwanted motion. Taking into account the inertia of the mechanical parts generated when rotating, the rotation speed of the flipper is controlled to prevent problems due to inertia. However, as the unit per hour (UPH) of the equipment increases, the flipper should rotate at high speed. As the rotational speed of the flipper increases, the spring The inertia of the mechanical part of the flipper cannot be sustained, so the mechanical part is repeatedly pushed out and returned to the original position of the mechanical part. As a result, shocks are accumulated on the flipper, so the flipper may be damaged or the die attached to the flipper may be thrown forward.
此外,由於半導體市場趨向于更薄和更小尺寸的半導體材料,對薄膜裸片的需求不斷增加。當與過去使用的相同的拾取力被施加到翻轉器的薄膜裸片時,裸片可能被損壞,例如裸片可能被彎曲或折斷。由此,透過更平緩地控制翻轉器的彈簧來最小化施加到裸片的衝擊是很重要的。 In addition, the demand for thin film die is increasing as the semiconductor market is trending towards thinner and smaller sized semiconductor materials. When the same pickup force as used in the past is applied to the flipper's thin film die, the die may be damaged, eg the die may be bent or broken. Thus, it is important to minimize the shock applied to the die by controlling the spring of the flipper more gently.
另外,由於佈置在薄膜裸片上的凸塊的數量減少,凸塊可被施加到裸片上的接合力損壞,或者裸片可由於當裸片浸入到助焊劑中時施加到裸片上的衝擊而被折斷或碎裂。為了解決這些問題,待施加到接合工具的力被控制在不會引起凸塊損壞的範圍內。 Additionally, as the number of bumps disposed on the thin film die is reduced, the bumps can be damaged by bonding forces applied to the die, or the die can be damaged by shocks applied to the die when the die is dipped in flux Broken or chipped. To solve these problems, the force to be applied to the bonding tool is controlled within a range that does not cause damage to the bumps.
傳統上,使用施加到安裝在接合工具內部的空氣腔室的壓力來控制待施加到接合工具的力。特別是,在接合工具在水準方向上移動的同時,接合工具被高力度支撐,使得被接合工具吸附的裸片不會被振動損壞。緊接在被接合工具吸附的裸片與浸漬板接觸之前,接合工具在浸漬板的上方向下移動時,接合工具被低力度支撐,使得佈置在裸片的底表面上的凸塊可不被損壞。 Traditionally, the force to be applied to the bonding tool is controlled using pressure applied to an air chamber mounted inside the bonding tool. In particular, while the bonding tool is moved in the horizontal direction, the bonding tool is supported with a high force so that the die adsorbed by the bonding tool is not damaged by vibration. Immediately before the die adsorbed by the bonding tool comes into contact with the dip plate, the bonding tool is supported with a low force as the bonding tool moves downward over the dip board, so that the bumps arranged on the bottom surface of the die may not be damaged .
然而,當空氣腔室的容積存將支撐接合工具的壓力從高壓切換到低壓期間隨著壓力而可變化時,接合工 具可能由於空氣腔室的容積的變化而晃動,並且裸片無法浸入到助焊劑中或無法使用接合工具接合,直到接合工具的晃動被穩定為止。因此,可能降低整個裝備的UPH,從而降低生產率。 However, as the volume of the air chamber can vary with pressure during switching the pressure supporting the bonding tool from high pressure to low pressure, the bonding tool The tool may wobble due to changes in the volume of the air chamber, and the die cannot be immersed in the flux or bonded using the bonding tool until the shaking of the bonding tool is stabilized. As a result, the UPH of the entire equipment may be lowered, thereby reducing productivity.
因此,迫切需要一種用於接合裸片(比如半導體晶片)的接合設備及其控制方法,接合設備能夠最小化待施加到薄裸片的衝擊,以在不降低翻轉器的旋轉速度的情況下保護裸片;當裸片的底表面浸入到助焊劑中以將裸片接合到基板(比如印刷電路板)上時,接合設備能夠保護佈置在裸片的底表面上的凸塊,並且接合設備能夠將裸片高速移動到含有助焊劑的浸漬板上,以最小化將裸片浸入到助焊劑中或接合裸片所需的處理時間,從而使生產率最大化。 Therefore, there is an urgent need for a bonding apparatus for bonding dies, such as semiconductor wafers, and a control method thereof, which can minimize the impact to be applied to the thin dies to protect without reducing the rotational speed of the flipper Die; when the bottom surface of the die is dipped in flux to bond the die to a substrate (such as a printed circuit board), the bonding equipment can protect the bumps disposed on the bottom surface of the die, and the bonding equipment can Move the die to a flux-containing dip plate at high speed to minimize the processing time required to dip the die into the flux or bond the die, thereby maximizing productivity.
本發明旨在提供一種接合設備及其控制方法,其中當裸片被翻轉器拾取和翻轉時能夠補償旋轉慣性,並且在拾取裸片期間能夠在不降低翻轉器的旋轉速度的情況下最小化施加到裸片的衝擊。 The present invention aims to provide a bonding apparatus and a control method thereof in which rotational inertia can be compensated when a die is picked up and flipped by a flipper, and in which application of the flipper during pick-up can be minimized without reducing the rotational speed of the flipper shock to the die.
本發明還旨在提供一種接合設備及其控制方法,其中當將裸片浸入到助焊劑中以將裸片接合到基板上時能夠保護佈置在裸片的底表面上的凸塊。 The present invention also aims to provide a bonding apparatus and a control method thereof in which bumps arranged on the bottom surface of the die can be protected when the die is dipped into a flux to bond the die to a substrate.
本發明還旨在提供一種接合設備及其控制方法,能夠控制接合力以當裸片被接合到基板上時防止裸片 被折斷或碎裂。 The present invention also aims to provide a bonding apparatus and a control method thereof capable of controlling the bonding force to prevent the die when the die is bonded to the substrate Broken or chipped.
本發明還旨在提供一種接合設備及其控制方法,能夠透過將裸片高速移動到含有助焊劑的浸漬板或接合基板上以將裸片接合到基板上,來最小化浸入或接合裸片所需的處理時間,從而使生產率最大化。 The present invention also aims to provide a bonding apparatus and a control method thereof capable of minimizing immersion or bonding of the die by moving the die onto a dip plate containing flux or a bonding substrate at a high speed to bond the die to the substrate. required processing time to maximize productivity.
本發明提供一種接合設備,所述接合設備包括:接合頭,所述接合頭用以單獨地吸附切割的裸片;驅動器,所述驅動器用以在垂直方向上移動所述接合頭,並將所述接合頭傳送到X-Y平面上的位置;和接合基板,在所述接合基板上安裝有被所述接合頭吸附的裸片,其中所述接合頭包括:接合部件,所述接合部件用以真空吸附所述裸片;第一氣動壓力部件,所述第一氣動壓力部件用以透過選擇性地向所述第一氣動壓力部件施加氣動壓力和取消所述氣動壓力的施加而向所述接合部件供應緩衝動力,其中所述第一氣動壓力部件的容積根據壓力是可變的;和第二氣動壓力部件,所述第二氣動壓力部件被連續施加氣動壓力,其中在將所述接合頭傳送到所述X-Y平面上的位置的同時,保持施加到所述第一氣動壓力部件和所述第二氣動壓力部件的氣動壓力,並且當所述接合頭垂直向下移動時,在所述接合頭與所述接合基板的上部隔開預定高度的狀態下,施加到所述第一氣動壓力部件的氣動壓力被移除,並且由所述接合部件吸附的裸片被安裝在所述接合基板上。 The present invention provides a bonding apparatus, the bonding apparatus comprising: a bonding head for sucking the diced die individually; a driver for moving the bonding head in a vertical direction and moving all the a position where the bonding head is transferred to the XY plane; and a bonding substrate on which the die sucked by the bonding head is mounted, wherein the bonding head includes: a bonding member for vacuuming adsorbing the die; a first pneumatic pressure member to apply pneumatic pressure to the bonding member by selectively applying and canceling application of the pneumatic pressure to the first pneumatic pressure member supplying buffer power, wherein the volume of the first pneumatic pressure member is variable according to the pressure; and a second pneumatic pressure member, the second pneumatic pressure member is continuously applied with pneumatic pressure, wherein the engagement head is transmitted to the While maintaining the position on the XY plane, the pneumatic pressure applied to the first pneumatic pressure member and the second pneumatic pressure member is maintained, and when the engagement head moves vertically downward, the engagement head and the In a state where the upper portion of the bonding substrate is spaced apart by a predetermined height, the pneumatic pressure applied to the first pneumatic pressure member is removed, and the die sucked by the bonding member is mounted on the bonding substrate.
本發明還提供一種接合設備,所述接合設備包 括:接合頭,所述接合頭用以單獨地吸附切割的裸片;驅動器,所述驅動器用以在垂直方向上移動所述接合頭,並將所述接合頭傳送到X-Y平面上的位置;浸漬板,所述浸漬含有助焊劑,所述助焊劑待塗覆到由所述接合頭吸附的裸片的底表面上;和接合基板,在所述接合基板上安裝塗覆有所述助焊劑的裸片,其中所述接合頭包括:接合部件,所述接合部件用以真空吸附所述裸片;第一氣動壓力部件,所述第一氣動壓力部件用以透過選擇性地向所述第一氣動壓力部件施加氣動壓力和取消所述氣動壓力的施加而向所述接合部件供應緩衝動力,其中所述第一氣動壓力部件的容積根據壓力是可變的;和第二氣動壓力部件,所述第二氣動壓力部件被連續施加氣動壓力,其中在將所述接合頭傳送到所述X-Y平面上的位置的同時,保持施加到所述第一氣動壓力部件和所述第二氣動壓力部件的氣動壓力,並且當所述接合頭垂直向下移動時,在所述接合頭與所述浸漬板的上部隔開預定高度的狀態下,施加到所述第一氣動壓力部件的氣動壓力被移除,並且所述助焊劑被塗覆到由所述接合部件吸附的裸片的底表面上。 The present invention also provides a bonding equipment, the bonding equipment package Including: a bonding head, the bonding head is used to suck the diced die individually; a driver, the driver is used to move the bonding head in the vertical direction, and transfer the bonding head to the position on the XY plane; a dip board, the dip containing a flux to be applied to the bottom surface of the die adsorbed by the bond head; and a bond substrate on which the flux is applied is mounted The bare chip, wherein the bonding head comprises: a bonding part, the bonding part is used to vacuum the die; a first pneumatic pressure part, the first pneumatic pressure part is used for selectively feeding the first A pneumatic pressure member applies pneumatic pressure and cancels the application of the pneumatic pressure to supply buffer power to the engagement member, wherein the volume of the first pneumatic pressure member is variable according to the pressure; and a second pneumatic pressure member, so The second pneumatic pressure member is continuously applied with pneumatic pressure, wherein the pressure applied to the first pneumatic pressure member and the second pneumatic pressure member is maintained while the bonding head is transferred to the position on the XY plane. pneumatic pressure, and the pneumatic pressure applied to the first pneumatic pressure member is removed in a state where the engagement head is spaced apart from the upper portion of the impregnating plate by a predetermined height when the engagement head is moved vertically downward , and the flux is applied to the bottom surface of the die adsorbed by the bonding member.
所述第一氣動壓力部件可包括:空氣腔室通道,來自外部空氣箱的空氣透過所述空氣腔室通道而被供應和傳送;空氣腔室,所述空氣腔室用以透過從所述空氣腔室通道供應的空氣而膨脹,以向所述接合部件供應驅動力;力控制調節器,所述力控制調節器用以控制從所述外部空氣箱供應的空氣的壓力;和閥,所述閥用以開始或停 止向所述空氣腔室供應空氣。 The first pneumatic pressure part may include: an air chamber passage through which air from an external air box is supplied and delivered; an air chamber for passing air from the air expansion of the air supplied from the chamber passage to supply driving force to the engagement member; a force control regulator to control the pressure of the air supplied from the external air tank; and a valve, the valve to start or stop Air supply to the air chamber is stopped.
當停止向所述空氣腔室供應空氣時,殘留在所述空氣腔室內的空氣可被排出至外部,由此僅施加至所述第二氣動壓力部件的氣動壓力保留在所述接合部件中,以減小施加至所述接合部件的壓力。 When the air supply to the air chamber is stopped, the air remaining in the air chamber may be discharged to the outside, whereby only the pneumatic pressure applied to the second pneumatic pressure member remains in the engagement member, to reduce the pressure applied to the engagement member.
所述第二氣動壓力部件可包括:氣缸通道,來自外部空氣箱的空氣透過所述氣缸通道而被供應和傳送;氣缸,所述氣缸用以將由所述氣缸通道供應的空氣的壓力傳送至支撐負載;和所述支撐負載,所述支撐負載用以透過根據傳送至所述支撐負載的壓力向所述接合附件供應具有一定壓力的緩衝動力來支撐所述接合部件。 The second pneumatic pressure part may include: a cylinder passage through which air from an external air box is supplied and delivered; an air cylinder for delivering the pressure of the air supplied by the cylinder passage to the support a load; and the support load to support the engagement member by supplying a damping power having a certain pressure to the engagement attachment according to the pressure transmitted to the support load.
當施加至所述第一氣動壓力部件的氣動壓力被移除,並且被供應空氣的所述空氣腔室的容積由此發生變化時,所述支撐負載可使用由所述第二氣動壓力部件保持的氣動壓力支撐,以向所述接合部件供應所述緩衝動力。 When the pneumatic pressure applied to the first pneumatic pressure member is removed and the volume of the air chamber to which air is supplied is thereby changed, the support load may be maintained by the second pneumatic pressure member using The pneumatic pressure support to supply the damping power to the engagement member.
所述接合部件可包括感測器狗,並且所述接合頭可包括感測器部件,所述感測器部件用以感測距所述感測器狗的物理距離,所述感測器部件與所述感測器狗間隔一定距離。 The engagement member may include a sensor dog, and the engagement head may include a sensor member for sensing a physical distance from the sensor dog, the sensor member A certain distance from the sensor dog.
所述接合部件可包括:接合拾取器,所述接合拾取器用以與所述裸片物理接觸並吸附所述裸片;和空氣軸承,所述空氣軸承用以旋轉所述接合拾取器,所述空氣軸承耦接至所述接合拾取器的上部,並且所述接合部件還包括:空氣箱,所述空氣箱用以將空氣供應到所述空氣軸 承;和空氣力調節器,所述空氣力調節器用以控制所供應的空氣的壓力。 The bonding member may include: a bonding pickup for physically contacting and attracting the die; and an air bearing for rotating the bonding pickup, the An air bearing is coupled to the upper portion of the engagement pickup, and the engagement member further includes an air box for supplying air to the air shaft a bearing; and an air regulator for controlling the pressure of the supplied air.
所述接合設備還可包括翻轉器,所述翻轉器用以拾取切割的裸片、使所述裸片旋轉180°以使得所述裸片上下顛倒、並且將所述裸片傳送到所述接合頭,其中所述翻轉器可包括:拾取單元,所述拾取單元用以吸附和拾取所述裸片;翻轉臂,所述拾取單元安裝在所述翻轉臂上,並且所述翻轉臂安裝在主體上且可旋轉並可向上或向下移動;支撐負載,所述支撐負載安裝在所述翻轉臂中且在長度方向上在預定的範圍內是可移位的,並且其中所述拾取單元安裝在所述支撐負載的端部上;彈性構件,所述彈性構件用以吸收在所述拾取單元與所述裸片接觸期間產生的衝擊,所述彈性構件設置在其中包括所述支撐負載的支撐部件和所述拾取單元之間;負壓管,所述負壓管用以向所述拾取單元施加負壓,以在所述裸片被所述拾取單元拾取的同時保持所述負壓,所述負壓管耦接至所述拾取單元;和正壓管,所述正壓管用以透過向所述翻轉臂中施加正壓來向所述支撐負載供應承載動力,所述正壓管耦接至所述翻轉臂,其中保持透過所述正壓管施加到所述支撐負載的正壓以在所述翻轉臂旋轉並向下移動的同時補償所述翻轉臂的慣性,並且緊接在所述拾取單元與所述裸片接觸之前所述正壓被移除。 The bonding apparatus may further include a flipper to pick up the diced die, rotate the die 180° to turn the die upside down, and transfer the die to the bond head , wherein the flipper may include: a pick-up unit for sucking and picking up the die; a flip arm, on which the pick-up unit is mounted, and the flip arm is mounted on the main body and rotatable and movable upward or downward; a supporting load is installed in the turning arm and is displaceable within a predetermined range in the length direction, and wherein the pickup unit is installed in the on the end portion of the supporting load; an elastic member for absorbing the shock generated during the contact between the pickup unit and the die, the elastic member is provided in which the supporting part for supporting the load and the between the pick-up units; a negative pressure pipe for applying negative pressure to the pick-up unit to maintain the negative pressure while the die is picked up by the pick-up unit, the negative pressure a tube coupled to the pickup unit; and a positive pressure tube to supply carrying power to the support load by applying positive pressure into the flip arm, the positive pressure tube coupled to the flip arm, wherein the positive pressure applied to the support load through the positive pressure tube is maintained to compensate the inertia of the flip arm while the flip arm rotates and moves downward, and is immediately connected between the pickup unit and the support load. The positive pressure is removed before the die contacts.
所述接合設備還可包括翻轉器,所述翻轉器用以拾取切割的裸片、使所述裸片旋轉180°以使得所述裸片 上下顛倒、並且將所述裸片傳送到所述接合頭,其中所述翻轉器可包括:拾取單元,所述拾取單元用以吸附和拾取所述裸片;翻轉臂,所述拾取單元安裝在所述翻轉臂上,並且所述翻轉臂安裝在主體上且可旋轉並可向上或向下移動;支撐負載,所述支撐負載安裝在所述翻轉臂中且在長度方向上在預定的範圍內是可移位的,並且其中所述拾取單元安裝在所述支撐負載的端部上;負壓管,所述負壓管用以向所述拾取單元施加負壓,以在所述裸片被所述拾取單元拾取的同時保持所述負壓,所述負壓管耦接至所述拾取單元;和正壓管,所述正壓管用以施加第一正壓或第二正壓,所述正壓管耦接至所述翻轉臂以透過選擇性地向所述翻轉臂施加正壓來向所述支撐負載供應承載動力;其中保持施加到所述支撐負載的第一正壓以在所述翻轉臂旋轉並向下移動的同時補償所述翻轉臂的慣性,並且緊接在所述拾取單元與所述裸片接觸之前,向所述支撐負載施加所述第二正壓,所述第二正壓低於所述第一正壓。 The bonding apparatus may further include a flipper to pick up the diced die, rotate the die 180° so that the die upside down and transfer the die to the bonding head, wherein the flipper may include: a pick-up unit for sucking and picking up the die; a flip arm, the pick-up unit mounted on on the flip arm, and the flip arm is mounted on the main body and is rotatable and movable upward or downward; a support load is installed in the flip arm and is within a predetermined range in the length direction is displaceable, and wherein the pick-up unit is mounted on the end that supports the load; a negative pressure tube for applying negative pressure to the pick-up unit to be The pickup unit picks up while maintaining the negative pressure, the negative pressure pipe is coupled to the pickup unit; and a positive pressure pipe, the positive pressure pipe is used to apply the first positive pressure or the second positive pressure, the positive pressure A pressure tube is coupled to the flip arm to supply carrying power to the support load by selectively applying a positive pressure to the flip arm; wherein the first positive pressure applied to the support load is maintained to apply a positive pressure to the flip arm Rotating and moving downward while compensating for the inertia of the flip arm, and applying the second positive pressure to the support load immediately before the pickup unit comes into contact with the die, the second positive pressure is low at the first positive pressure.
本發明還提供一種控制接合設備的方法,所述接合設備包括接合頭、驅動器和接合基板,所述接合頭具有接合部件、第一氣動壓力部件和第二氣動壓力部件,所述接合部件用以真空吸附切割的裸片,所述第一氣動壓力部件的容積根據壓力是可變的以向所述接合部件供應緩衝動力,並且在所述第一氣動壓力部件中選擇性地執行施加氣動壓力和取消所述氣動壓力的施加,並且所述第二氣動壓力部件被連續施加氣動壓力,所述驅動器用以在垂直方 向上移動所述接合頭並將所述接合頭傳送到X-Y平面上的位置,在所述接合基板上安裝有被所述接合頭吸附的裸片;所述方法包括如下步驟:在吸附切割的裸片的所述接合頭在所述接合基板上方傳送並垂直向下移動到一定高度的同時,保持施加到所述第一氣動壓力部件和所述第二氣動壓力部件的氣動壓力;在所述一定高度處將施加至所述接合頭的第一氣動壓力部件的氣動壓力排出至外部;當所述氣動壓力的排出完成時,進一步向下移動所述接合頭並將所述接合頭吸附的裸片安裝在所述接合基板上;和當所述裸片的安裝完成時,在相應氣動壓力被施加到所述第一氣動壓力部件、並且在所述接合頭垂直向上移動到一定高度的狀態中被保持的同時,執行後續處理;其中保持施加到所述第一氣動壓力部件和第二氣動壓力部件的氣動壓力的步驟、將施加到所述第一氣動壓力部件的氣動壓力排出的步驟、進一步向下移動所述接合頭並將所述接合頭吸附的裸片安裝在所述接合基板上的步驟、以及執行後續處理的步驟被重複執行。 The present invention also provides a method of controlling a bonding apparatus including a bonding head, a driver and a bonding substrate, the bonding head having a bonding member, a first pneumatic pressure member and a second pneumatic pressure member, the bonding member for The diced die is vacuum suctioned, the volume of the first pneumatic pressure part is variable according to the pressure to supply buffer power to the bonding part, and the application of pneumatic pressure and the application of pneumatic pressure are selectively performed in the first pneumatic pressure part The application of the pneumatic pressure is cancelled, and the second pneumatic pressure member is continuously applied with the pneumatic pressure, and the actuator is used to vertically moving the bonding head upward and transferring the bonding head to a position on the XY plane, where the bare chip sucked by the bonding head is mounted on the bonding substrate; the method includes the steps of: sucking the cut bare chip The bonding head of the sheet is conveyed over the bonding substrate and moved vertically downward to a certain height while maintaining the pneumatic pressure applied to the first pneumatic pressure member and the second pneumatic pressure member; at the certain height At the height, the pneumatic pressure applied to the first pneumatic pressure member of the bonding head is discharged to the outside; when the discharge of the pneumatic pressure is completed, the bonding head is further moved downward and the bonding head is sucked to the die mounted on the bonding substrate; and when the mounting of the die is completed, in a state where a corresponding pneumatic pressure is applied to the first pneumatic pressure member, and the bonding head is moved vertically upward to a certain height While maintaining, subsequent processing is performed; wherein the step of maintaining the pneumatic pressure applied to the first pneumatic pressure member and the second pneumatic pressure member, the step of discharging the pneumatic pressure applied to the first pneumatic pressure member, and the further The steps of moving the bonding head downward and mounting the die sucked by the bonding head on the bonding substrate, and performing subsequent processing are repeatedly performed.
本發明還提供一種控制接合設備的方法,所述接合設備包括接合頭、驅動器、浸漬板和接合基板,所述接合頭具有接合部件、第一氣動壓力部件和第二氣動壓力部件,所述接合部件用以真空吸附切割的裸片,所述第一氣動壓力部件的容積根據壓力是可變的以向所述接合部件供應緩衝動力,並且在所述第一氣動壓力部件中選擇性地執行施加氣動壓力和取消所述氣動壓力的施加,並且所述 第二氣動壓力部件被連續施加氣動壓力,所述驅動器用以在垂直方向上移動所述接合頭並將所述接合頭傳送到X-Y平面上的位置,所述浸漬板含有助焊劑,所述助焊劑待施加至由所述接合頭吸附的裸片的底表面上,在所述接合基板上安裝塗覆有所述助焊劑的裸片,所述方法包括如下步驟:在吸附切割的裸片的所述接合頭在所述浸漬板上方傳送並垂直向下移動到一定高度的同時,保持施加到所述第一氣動壓力部件和所述第二氣動壓力部件的氣動壓力;在所述一定高度處將施加至所述接合頭的第一氣動壓力部件的氣動壓力排出至外部;當相應氣動壓力的排出完成時,進一步向下移動所述接合頭並將包含在所述浸漬板中的助焊劑塗覆到被所述接合頭吸附的裸片的底表面上;當所述助焊劑塗覆到所述裸片的底表面上的步驟完成時,在氣動壓力被施加到所述第一氣動壓力部件並且在所述接合頭垂直向上移動到一定高度的狀態中被保持的同時,在所述接合基板的上方傳送所述裸片;和將塗覆有所述助焊劑的裸片安裝到所述接合基板上,其中保持施加到所述第一氣動壓力部件和第二氣動壓力部件的氣動壓力的步驟、將施加到所述第一氣動壓力部件的氣動壓力排出的步驟、進一步向下移動所述接合頭並將包含在所述浸漬板中的助焊劑塗覆到被所述接合頭吸附的裸片的底表面上的步驟、在所述接合基板的上方傳送所述裸片的步驟、以及將塗覆有所述助焊劑的裸片安裝到所述接合基板上的步驟被重複執行。 The present invention also provides a method of controlling a bonding apparatus comprising a bonding head, a driver, a dip plate and a bonding substrate, the bonding head having a bonding member, a first pneumatic pressure member and a second pneumatic pressure member, the bonding A part is used to vacuum suction the cut die, the volume of the first pneumatic pressure part is variable according to the pressure to supply buffer power to the bonding part, and the application is selectively performed in the first pneumatic pressure part pneumatic pressure and cancel the application of the pneumatic pressure, and the The second pneumatic pressure member is continuously applied with pneumatic pressure, the driver is used to move the bonding head in a vertical direction and transfer the bonding head to a position on the XY plane, the dip plate contains flux, the auxiliary Flux is to be applied to the bottom surface of the die adsorbed by the bond head, the flux-coated die is mounted on the bond substrate, and the method includes the steps of: The engagement head is conveyed over the dip plate and moved vertically downward to a certain height while maintaining the pneumatic pressure applied to the first pneumatic pressure member and the second pneumatic pressure member; at the certain height The pneumatic pressure applied to the first pneumatic pressure part of the bonding head is discharged to the outside; when the discharge of the corresponding pneumatic pressure is completed, the bonding head is further moved downward and the flux contained in the dip plate is applied applied to the bottom surface of the die adsorbed by the bonding head; when the step of applying the flux to the bottom surface of the die is completed, pneumatic pressure is applied to the first pneumatic pressure member and transferring the die over the bonding substrate while being held in a state where the bonding head is moved vertically upward to a certain height; and mounting the die coated with the flux to the bonding on a base plate, wherein the step of maintaining the pneumatic pressure applied to the first pneumatic pressure member and the second pneumatic pressure member, the step of discharging the pneumatic pressure applied to the first pneumatic pressure member, the further downward movement of the engagement the head and the step of applying the flux contained in the dip plate to the bottom surface of the die adsorbed by the bonding head, the step of transferring the die over the bonding substrate, and the step of applying the The step of mounting the flux-coated die on the bonding substrate is repeated.
所述接合設備還可包括翻轉器,所述翻轉器用 以拾取切割的裸片、使所述裸片旋轉180°以使得所述裸片上下顛倒、並且將所述裸片傳送到所述接合頭,其中所述翻轉器可包括:拾取單元,所述拾取單元用以吸附和拾取所述裸片;翻轉臂,所述拾取單元安裝在所述翻轉臂上,並且所述翻轉臂安裝在主體上且可旋轉並可向上或向下移動;支撐負載,所述支撐負載安裝在所述翻轉臂中,且在長度方向上在預定的範圍內是可移位的,並且其中所述拾取單元安裝在所述支撐負載的端部上;彈性構件,所述彈性構件設置在其中包括所述支撐負載的支撐部件和所述拾取單元之間;負壓管,所述負壓管耦接至所述拾取單元以向所述拾取單元施加負壓;和正壓管,所述正壓管耦接至所述翻轉臂以向所述支撐負載供應承載動力,並且其中所述方法還包括如下步驟:保持正壓,以在所述拾取單元旋轉並垂直向下移動至一定高度的同時補償所述翻轉臂的慣性;在所述一定高度處排出所述正壓;在所述正壓的排出完成後,所述拾取單元透過由所述負壓管施加負壓來吸附所述裸片,同時透過使用所述彈性構件來減輕當所述拾取單元進一步向下移動並與所述裸片接觸時產生的衝擊;和在所述正壓被施加並且在所述拾取單元垂直向上移動到一定高度的狀態中被保持的同時,旋轉所述拾取單元,其中保持所述正壓的步驟、排出所述正壓的步驟、由所述拾取單元吸附所述裸片的步驟、以及旋轉所述拾取單元的步驟被連續地執行。 The bonding apparatus may further include a flipper for to pick up the diced die, rotate the die 180° to turn the die upside down, and transfer the die to the bond head, wherein the flipper may include a pick-up unit, the A pick-up unit is used for sucking and picking up the die; a flip arm, the pick-up unit is mounted on the flip arm, and the flip arm is mounted on the main body and can be rotated and moved up or down; supporting a load, The supporting load is installed in the turning arm and is displaceable within a predetermined range in the length direction, and wherein the pickup unit is installed on an end of the supporting load; an elastic member, the An elastic member is provided between a support member in which the load is supported and the pickup unit; a negative pressure pipe coupled to the pickup unit to apply a negative pressure to the pickup unit; and a positive pressure the positive pressure tube is coupled to the flip arm to supply carrying power to the support load, and wherein the method further includes the step of maintaining positive pressure to rotate and move vertically downward as the pick unit rotates Compensate the inertia of the flip arm while reaching a certain height; discharge the positive pressure at the certain height; after the discharge of the positive pressure is completed, the pick-up unit is discharged by applying a negative pressure from the negative pressure pipe. attracting the die while mitigating the shock generated when the pickup unit moves further down and comes into contact with the die by using the elastic member; and when the positive pressure is applied and the pickup unit The pickup unit is rotated while being held in the state of being moved vertically upward to a certain height, wherein the step of maintaining the positive pressure, the step of discharging the positive pressure, the step of sucking the die by the pickup unit, And the step of rotating the pickup unit is performed continuously.
所述接合設備還可包括翻轉器,所述翻轉器用 以拾取切割的裸片、使所述裸片旋轉180°以使得所述裸片上下顛倒、並且將所述裸片傳送到所述接合頭,其中所述翻轉器可包括:拾取單元,所述拾取單元用以吸附和拾取所述裸片;翻轉臂,所述拾取單元安裝在所述翻轉臂上,並且所述翻轉臂安裝在主體上且可旋轉並可向上或向下移動;支撐負載,所述支撐負載安裝在所述翻轉臂中且在長度方向上在預定的範圍內是可移位的,並且其中所述拾取單元安裝在所述支撐負載的端部上;負壓管,所述負壓管耦接至所述拾取單元以向所述拾取單元施加負壓;和正壓管,所述正壓管耦接至所述翻轉臂以向所述支撐負載供應承載動力,所述正壓管分支成第一正壓管和第二正壓管,其中所述方法還包括如下步驟:保持第一正壓,以在所述拾取單元旋轉並垂直向下移動至一定高度的同時補償所述翻轉臂的慣性;在所述一定高度處排出所述第一正壓;在所述第一正壓的排出完成後,施加低於所述第一正壓的第二正壓;所述拾取單元透過由所述負壓管施加負壓來吸附所述裸片,同時透過所述第二正壓來減輕當所述拾取單元進一步向下移動並與所述裸片接觸時產生的衝擊;和在所述正壓被施加並且在所述拾取單元垂直向上移動到一定高度的狀態中被保持的同時,旋轉所述拾取單元,其中保持所述第一正壓的步驟、排出所述第一正壓的步驟、施加所述第二正壓的步驟、由所述拾取單元吸附所述裸片的步驟、以及旋轉所述拾取單元的步驟被連續地執行。 The bonding apparatus may further include a flipper for to pick up the diced die, rotate the die 180° to turn the die upside down, and transfer the die to the bond head, wherein the flipper may include a pick-up unit, the A pick-up unit is used for sucking and picking up the die; a flip arm, the pick-up unit is mounted on the flip arm, and the flip arm is mounted on the main body and can be rotated and moved up or down; supporting a load, The support load is installed in the turning arm and is displaceable within a predetermined range in the length direction, and wherein the pick-up unit is installed on the end of the support load; a negative pressure pipe, the A negative pressure tube is coupled to the pickup unit to apply negative pressure to the pickup unit; and a positive pressure tube is coupled to the flip arm to supply carrying power to the support load, the positive pressure tube The pressure pipe branches into a first positive pressure pipe and a second positive pressure pipe, wherein the method further includes the step of: maintaining the first positive pressure to compensate for all the pressure while the pickup unit rotates and moves vertically downward to a certain height The inertia of the flip arm; the first positive pressure is discharged at the certain height; after the discharge of the first positive pressure is completed, a second positive pressure lower than the first positive pressure is applied; the pick-up the unit sucks the die by applying a negative pressure from the negative pressure tube, while at the same time relieves the shock generated when the pick-up unit moves further down and comes into contact with the die by the second positive pressure; and The pickup unit is rotated while the positive pressure is applied and maintained in a state in which the pickup unit moves vertically upward to a certain height, wherein the step of maintaining the first positive pressure, discharging the first positive pressure The step of pressing, the step of applying the second positive pressure, the step of sucking the die by the pickup unit, and the step of rotating the pickup unit are continuously performed.
1:裸片 1: Die
11:凸塊 11: Bumps
10:接合構件 10: Joining components
100:接合頭 100: Splice head
110:接合部件 110: Joint parts
111:接合什取器 111: Engage the extractor
112:空氣軸承 112: Air bearing
113:感測器狗 113: Sensor Dog
121:第一氣動壓力部件 121: The first pneumatic pressure part
121a:空氣腔室通道 121a: Air chamber channel
121b:空氣腔室 121b: Air Chamber
122:第二氣動壓力部件 122: Second pneumatic pressure part
122a:氣缸通道 122a: Cylinder channel
122b:氣缸 122b: Cylinder
122c:支撐負載 122c: Support load
123:閥 123: Valve
124:力控制調節器 124: Force Control Regulator
130:感測器部件 130: Sensor parts
200:升降驅動器 200: lift drive
300:浸漬板 300: Impregnated Board
310:助焊劑 310: Flux
1000:翻轉器 1000: Flipper
1000a:第一翻轉器 1000a: First flipper
1000b:第二翻轉器 1000b: Second flipper
1100:拾取單元 1100: Pickup Unit
1110:吸附墊 1110: Adsorption pad
1200:負壓管 1200: Negative pressure tube
1300:彈性構件 1300: Elastic components
1400:支撐負載 1400: Support Load
1700:翻轉臂 1700: Flip Arm
1710:旋轉部件 1710: Rotating Parts
1720:旋轉軸 1720: Rotary axis
1730:第二墊 1730: Second Pad
1740:第一墊 1740: First Pad
1760:支撐部件 1760: Support Parts
1770:氣缸空間 1770: Cylinder Space
1800:正壓管 1800: Positive pressure tube
1800a:第一正壓管 1800a: First positive pressure tube
1800b:第二正壓管 1800b: Second positive pressure tube
1810:調節器 1810: Regulator
1810b:調節器 1810b: Regulator
1860:控制閥 1860: Control Valves
1860x:第一控制閥 1860x: First Control Valve
1860y:第二控制閥0
1860y:
1860z:比例閥 1860z: Proportional valve
1900:主體 1900: Subject
1910:升降引導件 1910: Lifting guides
1920:第一停止器 1920: First Stopper
1930:升降驅動單元 1930: Lifting drive unit
1940:第二停止器 1940: Second Stopper
2000:向下視覺單元 2000: Downward Vision Unit
圖1是示意性地示出根據本發明的用於接合設備的接合構件的圖;圖2是示意性地示出根據本發明的由用於接合設備的接合構件執行的用於控制氣動壓力的方法的圖;圖3是表示由根據本發明的接合構件執行的裸片浸漬處理和由根據相關技術的接合構件執行的裸片浸漬處理中的每一個處理中的接合頭的位置和感測器狗(sensor dog)的感測器值的圖表;圖4示意地示出根據本發明的由用於接合設備的接合構件執行的浸漬處理的控制流程;圖5是根據本發明實施方式的接合設備的翻轉器的截面圖;圖6示出了在具有兩個圖5的翻轉器的系統中裸片由第一翻轉器拾取並由第二翻轉器卸載的狀態,以及第一翻轉器和第二翻轉器旋轉的狀態;圖7示出了在圖6的狀態下的第一翻轉器和第二翻轉器的旋轉完成時,由第一翻轉器拾取的裸片被卸載、並且將第二翻轉器向下移動至裸片將被拾取的高度的狀態;圖8是根據本發明另一實施方式的接合設備的翻轉器的截面圖;圖9示出了在具有兩個圖8的翻轉器的系統中裸片由第一翻轉器拾取並由第二翻轉器卸載的狀態,以及第一翻 轉器和第二翻轉器旋轉的狀態;圖10示出了由第一翻轉器拾取的裸片被卸載、並且第二翻轉器向下移動至裸片將在圖9的狀態下的第一翻轉器和第二翻轉器的旋轉完成時的狀態下被拾取的高度的狀態。 1 is a diagram schematically showing a joint member for a joint device according to the present invention; FIG. 2 is a diagram schematically illustrating a method for controlling pneumatic pressure performed by the joint member for a joint device according to the present invention. A diagram of the method; FIG. 3 is a diagram showing the position and sensor of the bonding head in each of the die dipping process performed by the bonding member according to the present invention and the die dipping process performed by the bonding member according to the related art A graph of sensor values of a sensor dog; Fig. 4 schematically shows a control flow of a dipping process performed by a joining member for a joining apparatus according to the present invention; Fig. 5 is a joining apparatus according to an embodiment of the present invention A cross-sectional view of the flipper of FIG. 6; FIG. 6 shows the state in which the die is picked up by the first flipper and unloaded by the second flipper, and the first flipper and the second flipper in a system with two flippers of FIG. 5 The state in which the flipper is rotated; FIG. 7 shows that when the rotation of the first flipper and the second flipper in the state of FIG. 6 is completed, the die picked up by the first flipper is unloaded, and the second flipper is 8 is a cross-sectional view of a flipper of a bonding apparatus according to another embodiment of the present invention; FIG. 9 shows a system with two flippers of FIG. 8 The state in which the middle die is picked up by the first flipper and unloaded by the second flipper, and the first flipper Rotator and second flipper are rotated; FIG. 10 shows that the die picked up by the first flipper is unloaded and the second flipper moves down to the first flip where the die will be in the state of FIG. 9 The state of the height picked up in the state when the rotation of the flipper and the second flipper is completed.
下文將詳細描述本發明的實施方式。 Hereinafter, embodiments of the present invention will be described in detail.
根據本發明的接合設備透過使用射出器(ejector)射出附接到晶片的裸片(比如半導體晶片),透過翻轉器吸附並拾取被射出的裸片,旋轉裸片180°,使得裸片上下顛倒,並將裸片傳送到接合頭。之後,透過將裸片的底表面浸入到助焊劑中而使佈置在由接合頭吸附的裸片的底表面上的凸塊塗覆有助焊劑,並且接著將裸片接合到接合基板(比如印刷電路板)上。 The bonding apparatus according to the present invention ejects a die (such as a semiconductor wafer) attached to a wafer by using an ejector, sucks and picks up the ejected die through a flipper, and rotates the die by 180° so that the die is turned upside down , and transfer the die to the bond head. Thereafter, the bumps disposed on the bottom surface of the die picked up by the bond head are fluxed by dipping the bottom surface of the die into the flux, and the die is then bonded to a bonding substrate (such as printing circuit board).
圖1是示意性地示出根據本發明的用於接合設備的接合構件10的圖。
FIG. 1 is a diagram schematically showing a joining
如圖1所示,在接合設備中,接合構件10具有接合頭100,接合頭100用以在裸片被上下顛倒的狀態下從翻轉器接收並吸附切割的裸片,其中翻轉器拾取裸片並旋轉裸片180°;驅動器(未圖示),用以在垂直方向(Z軸方向)中移動接合頭100並將接合頭100傳送到X-Y平面上的位置;以及接合基板,在接合基板上安裝有由接合頭100吸附的裸片1。接合頭100包含:用以真空吸附裸片1
的接合部件110;第一氣動壓力部件121,第一氣動壓力部件121用以透過選擇性地施加氣動壓力和取消氣動壓力的施加來向接合部件110供應緩衝動力,第一氣動壓力部件121的容積可根據壓力而變化;和第二氣動壓力部件122,第二氣動壓力部件122被連續施加有氣動壓力。在接合頭100被傳送到相應位置的同時,保持施加到第一氣動壓力部件121和第二氣動壓力部件122的氣動壓力。當接合頭100垂直向下移動時,在接合頭100與接合基板的上部間隔開預定高度的狀態下,施加到第一氣動壓力部件121的氣動壓力被移除,並且由接合部件110吸附的裸片1被安裝在接合基板上。
As shown in FIG. 1 , in the bonding apparatus, the bonding
根據本發明的另一實施方式,在接合設備中(其中接合設備包含接合頭100,接合頭100用以單獨地吸附切割的裸片;驅動器,驅動器用以在垂直方向上移動接合頭100,並且將接合頭100傳送到X-Y平面上的位置;浸漬板300,浸漬板300含有助焊劑310以使用助焊劑310塗覆由接合頭100吸附的裸片1的底表面;和接合基板,在接合基板上安裝塗覆有助焊劑310的裸片1),接合頭100包括:用以真空吸附裸片的接合部件110;第一氣動壓力部件121,第一氣動壓力部件121用以透過選擇性地向第一氣動壓力部件121施加氣動壓力和取消氣動壓力的施加來向接合部件110供應緩衝動力(buffering power),並且第一氣動壓力部件121的容積可根據壓力而變化;和第二氣動壓力部件122,第二氣動壓力部件122被連續施加有氣動壓
力。當接合頭100被傳送到相應位置時,保持施加到第一氣動壓力部件121和第二氣動壓力部件122的氣動壓力。
如果在接合頭100的垂直向下運動期間,接合頭100與接合基板的上部間隔開預定高度,則施加到第一氣動壓力部件121的氣動壓力被移除,並且助焊劑被塗覆到由接合部件110吸附的裸片的底表面上。
According to another embodiment of the present invention, in a bonding apparatus (wherein the bonding apparatus includes a
如圖1的(a)所示,用於接合設備的接合構件10被升降驅動器(lifting driver)200升降,然後透過分離的傳送裝置(未圖示)在相對于地面的水準方向(X或Y軸方向)中高速移動,從而將由接合頭100吸附的裸片放置在以一定厚度塗覆在浸漬板300上的助焊劑310上。接著,如圖1的(b)所示,透過升降驅動器200使接合頭100向下移動,從而將佈置在由接合部件110吸附的裸片的底表面上的凸塊11浸入到助焊劑310中。
As shown in (a) of FIG. 1 , the joining
這裡,助焊劑310可以是含有環氧樹脂等的組合物,並且可以用於將裸片與基板接合,並防止由於裸片的底表面上的凸塊11之間的電流的傳導而發生短路。塗覆在浸漬板300上的助焊劑310的厚度可以被控制為與裸片底表面上的凸塊11的高度對應的微米尺寸。
Here, the
當塗覆的助焊劑310的厚度小於凸塊的高度時,凸塊被不充分地塗覆有助焊劑310,並且因此裸片可能不穩定地固定在基板上,並且可能由於凸塊之間電流的傳導而發生短路。相反,當塗覆的助焊劑310的厚度大於凸塊的高度時,凸塊被助焊劑310過度塗覆,因此殘留在凸
塊表面上的助焊劑310的含量可能不必要地過高。因此,異物可能殘留在基板上(基板上接合有裸片),並因此可能在基板中發生電路錯誤等問題。
When the thickness of the applied
詳細地說,接合部件110、包括第一氣動壓力部件121和第二氣動壓力部件122的緩衝部件、感測器部件130等可以包含在接合頭100中。這裡,接合部件110是用於吸附裸片的裝置,並且可以包括:接合拾取器111,接合拾取器111用以與裸片物理接觸來吸附裸片;空氣軸承(air bearing)112,空氣軸承112耦接到接合拾取器111的上部;感測器狗113用以透過使用感測器部件130來感測接合部件110的位置等。
In detail, the
第一氣動壓力部件121可以包括:空氣腔室通道121a,來自外部空氣箱(air tank)的空氣透過空氣腔室通道121a而被供應和傳送;空氣腔室121b,空氣腔室121b用以透過由空氣腔室通道121a供應的空氣而膨脹,以向接合部件110施加驅動力;力控制調節器124,力控制調節器用以控制從外部空氣箱供應的空氣的壓力;和閥123,閥用以開始或停止向空氣腔室121b內供應空氣。
The first
當停止向空氣腔室121b中供應空氣時,殘留在空氣腔室121b中的空氣被排出到外部,並且因此僅由第二氣動壓力部件122施加的氣動壓力保留在接合部件110中。因此,施加至接合部件110的壓力較低。由此,可以在低壓下執行接合工作或助焊劑浸漬工作,從而降低待施加至裸片的接合力。
When the supply of air into the
這裡,第二氣動壓力部件122可以包括:氣缸通道122a,來自外部空氣箱的空氣透過氣缸通道122a而被供應和傳送;氣缸122b,氣缸122b用以將由氣缸通道122a供應的空氣的壓力傳送到支撐負載(support load)122c;和支撐負載122c,支撐負載122c用以根據傳送到支撐負載122c的壓力而透過向接合部件110施加具有一定壓力或確定壓力(certain pressure)的緩衝動力來支撐接合部件110。
Here, the second
當施加到第一氣動壓力部件121的氣動壓力被移除並且因此被供應空氣的空氣腔室121b的容積發生變化時,第二氣動壓力部件122可以透過使用由第二氣動壓力部件122保持的壓力支撐支撐負載122c來向接合部件110施加緩衝動力。
When the pneumatic pressure applied to the first
也就是說,根據本發明的接合設備可以包括第一氣動壓力部件121和第二氣動壓力部件122,以作為用於透過向接合部件110施加一定等級的緩衝動力來支撐接合部件110的裝置,特別是作為用於在接合頭100的傳送期間牢固地支撐接合部件110、並且在裸片的底表面上的凸塊在裸片浸入到助焊劑310中期間與浸漬板300接觸時透過吸收待施加至裸片上的接合力來抑制對凸塊的損壞的裝置。
That is, the engagement apparatus according to the present invention may include the first
這裡,第一氣動壓力部件121可以包括:空氣腔室通道121a,來自外部空氣箱(未圖示)的空氣透過空氣腔室通道121a而被供應和傳送;和空氣腔室121b,空氣腔室121b用以透過由空氣腔室通道121a供應的空氣而膨
脹,以向接合部件110施加具有一定動力的緩衝動力,從而支撐接合部件110。
Here, the first
第二氣動壓力部件122可以包括:氣缸通道122a,來自外部空氣箱(未示出)的空氣透過氣缸通道122a而被供應和傳送;氣缸122b,氣缸112b用以將由氣缸通道122a供應的空氣的壓力傳送到支撐負載122c;和支撐負載122c,支撐負載122c用以根據傳送至支撐負載122c的壓力而透過向接合部件110施加具有一定壓力的緩衝動力來支撐接合部件110。
The second
圖2是示意性地示出根據本發明的用於接合設備的接合構件10執行的控制氣動壓力的方法的圖。
FIG. 2 is a diagram schematically illustrating a method of controlling pneumatic pressure performed by the
如圖2所示,空氣透過力控制調節器124在一定的壓力下被注入到空氣腔室121b和氣缸122b中,並且使用手動或自動控制的閥123可以開始或停止向空氣腔室121b中注入空氣。
As shown in FIG. 2, the air
具體地,根據本發明的接合構件10可以緊接在透過將由接合部件110吸附並支撐的裸片1高速移動到浸漬板300的助焊劑310上、並透過升降驅動器200向下移動接合頭100而使裸片1浸入到助焊劑310之前,使用高壓緩衝動力來更穩固地支撐裸片,其中高壓緩衝動力是如圖2的(a)所示的根據注入到空氣腔室121b中的空氣的第一氣動壓力部件121的緩衝動力和根據注入到氣缸122b中的空氣的第二氣動壓力部件122的緩衝動力的總和。由此,可以防止裸片1從接合部件110分離並由於接
合部件110的晃動而損壞,並且可以在由於接合部件110的過度升降而使得接合部件110未與浸漬板300的底部接觸時防止產生錯誤信號(比如觸摸信號)。
Specifically, the bonding
如圖2的(b)所示,緊接在透過使用升降驅動器200進一步地使接合頭100向下移動而使裸片浸入到助焊劑310之後,閥門可被關閉以停止向空氣腔室121b注入空氣,並且將殘留在空氣腔室121b內的空氣快速排出到外部,從而將施加到第一氣動壓力部件121的氣動壓力移除,並且使用根據第二氣動壓力部件122的緩衝動力而降低的低壓緩衝動力來支撐裸片。由此,當裸片的底表面上的凸塊與浸漬板300接觸時,施加到裸片的接合力的大部分可以由支撐負載122c支撐,從而抑制凸塊的損壞。
As shown in (b) of FIG. 2, immediately after the die is dipped into the
此外,接合部件110可使用緩衝動力而被精確地支撐,其中緩衝動力是透過控制從第一氣動壓力部件121供應到接合部件110的相對較大的有效面積的緩衝動力、並同時保持從第二氣動壓力部件122供應至接合部件110的具有相對較小的有效面積的緩衝動力而獲得的。因此,當用於接合部件110的緩衝動力從高壓切換到低壓,以將由接合部件110吸附的裸片浸入到助焊劑310中時,可避免或最小化接合部件110的晃動。由此,可以不需要或者可以減少用於穩定接合部件110的晃動以執行浸漬裸片的處理所需的時間,從而大大提高生產率。
In addition, the
當停止向空氣腔室121b中注入空氣時,可以使用閥將殘留在空氣腔室121b中的空氣快速排出到外部,
並且因此可快速執行透過第一氣動壓力部件121的緩衝動力的切換。因此,生產率可被進一步提高。
When the air injection into the
可以使用一個力控制調節器和具有不同面積的第一氣動壓力部件121和第二氣動壓力部件122來控制多個力,由此簡化了力控制結構。
Multiple forces can be controlled using one force control regulator and the first and second
即使一個力控制調節器向第一氣動壓力部件121和第二氣動壓力部件122施加相同的壓力,也會由於第一氣動壓力部件121和第二氣動壓力部件121的不同的面積而產生不同的力。因此,可以透過對第一氣動壓力部件121和第二氣動壓力部件122施加壓力來單獨測量第一氣動壓力部件121的力和第二氣動壓力部件122的壓力來收集資料;也可以透過對第一氣動壓力部件121和第二氣動壓力部件122施加壓力來同時測量第一氣動壓力部件121和第二氣動壓力部件122的力,並透過僅保持第二氣動壓力部件122的壓力來測量第二氣動壓力部件122的力來收集資料。也就是說,可以實現關於相同壓力的兩個力測量表。
Even if one force control regulator applies the same pressure to the first
如上所述,透過控制來自第一氣動壓力部件121的緩衝動力和來自第二氣動壓力部件122的緩衝動力,可以在較寬的範圍內控制待施加到接合部件110的緩衝動力。因此,本發明可廣泛應用于用於接合具有各種尺寸和各種重量的裸片的接合設備。
As described above, by controlling the cushioning power from the first
當用於接合部件110的緩衝動力從高壓切換到低壓時,支撐接合部件110的空氣軸承112的第一氣動壓
力部件121的緩衝動力降低,因此被接合部件110吸附和支撐的裸片可能被晃動和損壞。因此,需要穩定裸片的晃動所需的時間,並且生產率可能降低。由此,可以附加提供空氣箱和空氣力調節器,其中空氣箱用以向空氣軸承112供應空氣以防止空氣軸承112鬆動,空氣力調節器用以控制被供應的空氣的壓力。
When the buffer power for the
這裡,空氣箱可以增加從空氣力調節器到空氣軸承112的空氣管線(air line)的容積,從而將空氣軸承112的壓力變化控制為相對較低。因此,空氣力調節器可以控制空氣軸承112的內部壓力穩定。
Here, the air box may increase the volume of the air line from the air regulator to the
感測器部件130可以佈置為與包含在接合部件110中的感測器狗113隔開一定距離或確定距離(certain distance),以感測距感測器狗113的物理距離,將感測物理距離的結果轉換為電信號,並將電信號發送到裝置的操作者或自動控制器。
The
詳細地說,感測器部件130可以即時感測感測器部件130與感測器狗113之間的物理距離的變化,並向操作者或自動控制器發送感測信號,其中物理距離的變化是當緩衝部件的緩衝動力從高壓切換到低壓時接合部件110的晃動而導致的。操作者或自動控制器可以控制升降驅動器200不開始向下移動接合頭100,直到接合部件110的晃動穩定為止,因此延遲將裸片浸入到助焊劑310中。
In detail, the
此外,感測器部件130可以感測感測器部件130與感測器狗113之間的物理距離的增加,並且向操作者
或自動控制器發送感測信號,其中物理距離的增加是當接合部件110的晃動被穩定並且裸片1浸入到助焊劑310中時,在裸片的底表面上的凸塊11與浸漬板300接觸期間,由於接合力被施加到裸片上造成接合部件110的微小向上移動而導致的。操作者或自動控制器可以確保浸漬時間,以使用助焊劑310適當地塗覆佈置在裸片1的底表面上的凸塊,可在完成裸片的浸漬時控制升降驅動器200以升降接合頭100,並且可以朝向接合基板(比如晶片)傳送接合構件10,以執行浸漬處理之後的接合處理。
In addition, the
圖3是表示由根據本發明的接合構件執行的裸片浸漬處理和由根據相關技術的接合構件執行的裸片浸漬處理中的每一個處理中的接合頭的位置和感測器狗的感測器值的圖表。在圖3的圖表中,縱軸是表示接合頭和感測器狗的垂直方向上的位置的z軸方向,並且橫軸表示時間。 3 is a diagram showing the position of the bonding head and the sensing of the sensor dog in each of the die dipping process performed by the bonding member according to the present invention and the die dipping process performed by the bonding member according to the related art Graph of device values. In the graph of FIG. 3 , the vertical axis is the z-axis direction representing the positions of the bonding head and the sensor dog in the vertical direction, and the horizontal axis represents time.
如圖3所示,在根據相關技術的接合構件中(接合構件包含僅由具有相對較大的有效壓力面積的空氣腔室組成的緩衝部件),當接合頭向下移動並且緩衝部件的緩衝動力從高壓切換至低壓,以便將裸片浸入到助焊劑中時,如感測器狗的感測器值所示的,接合部件被晃動,並且需要大量的時間來穩定接合部件的晃動,因此降低了生產率。與此相對照,在根據本發明的接合構件10中(接合構件10包含具有如上所述進行控制的第一氣動壓力部件121和第二氣動壓力部件122的緩衝部件120),如感測器狗113的感測器值所示的,即使在將施加到接合部件110的緩衝
力從高壓切換到低壓時,接合部件110也難以被晃動。由此,不再需要或大大減小了穩定接合部件110的晃動所需的時間,從而大大提高了生產率。
As shown in FIG. 3 , in the engaging member according to the related art (the engaging member includes a buffer member composed of only an air chamber having a relatively large effective pressure area), when the joint head moves downward and the buffering power of the buffer member When switching from high voltage to low voltage so that the die is immersed in the flux, the bonding parts are shaken as indicated by the sensor value of the sensor dog, and it takes a lot of time to stabilize the shaking of the bonding parts, thus reducing the productivity. In contrast to this, in the
本發明關於一種由如上所述的用於接合設備的接合構件10執行的將裸片浸入到助焊劑310中的處理的控制方法。
The present invention relates to a control method of a process of dipping a die into a
圖4示意性地示出根據本發明的由用於接合設備的接合構件10執行的浸漬處理的控制流程。
FIG. 4 schematically shows a control flow of the dipping process performed by the joining
如圖4所述,根據本發明的由用於接合設備的接合構件10執行的將裸片浸入到助焊劑310中的處理的控制方法可以包括將在下面描述的操作S100至S700。
As shown in FIG. 4 , the control method of the process of dipping the die into the
在操作S100中,透過升降驅動器200向下移動接合頭100,由接合部件110吸附並拾取待接合的裸片。
In operation S100 , the
在操作S200中,在接合部件110被接合頭100的第一氣動壓力部件121的緩衝動力和第二氣動壓力部件122的緩衝動力支撐的同時,向上移動接合頭100,並且接合構件10被傳送為使得裸片位於浸漬板300中的助焊劑310上。
In operation S200, while the
在操作S300中,緊接在裸片被浸入到助焊劑310中之前,由升降驅動器200向下移動接合頭100。
In operation S300 , immediately before the die is dipped into the
在操作S400中,透過移除第一氣動壓力部件121的緩衝動力,將緩衝部件的緩衝動力從高壓切換到低壓。
In operation S400, by removing the buffer power of the first
在操作S500中,由第一氣動壓力部件121的
緩衝動力的切換而引起的接合部件110的晃動被穩定。
In operation S500, by the first
在操作S600中,透過由升降驅動器200向下移動接合頭100,將裸片的底表面上的凸塊浸入到助焊劑310中,由此使凸塊塗覆有助焊劑310。
In operation S600 , the bumps on the bottom surface of the die are dipped into the
在操作S700中,在凸塊被助焊劑310適當地塗覆之後,由升降驅動器200向上移動接合頭100。
In operation S700 , after the bumps are properly coated with the
下面將更詳細地描述根據本發明實施方式的控制接合設備的方法。 A method of controlling a bonding apparatus according to an embodiment of the present invention will be described in more detail below.
在根據本發明實施方式的控制接合設備的方法中(其中接合設備包括接合頭、驅動器和接合基板;其中接合頭包括:用以真空吸附諸如半導體晶片之類的裸片的接合部件;第一氣動壓力部件,第一氣動壓力部件用以透過選擇性地向第一氣動壓力部件施加氣動壓力和取消氣動壓力的施加來向接合部件供應緩衝動力,並且第一氣動壓力部件的容積根據壓力是可變的;和第二氣動壓力部件,第二氣動壓力部件被連續地施加氣動壓力;其中驅動器用以在垂直方向上移動接合頭並將接合頭傳送到X-Y平面上的位置;其中在接合基板上安裝有由接合頭吸附的裸片),可重複執行以下步驟:在吸附裸片的接合頭在接合基板上方傳送並垂直向下移動到一定高度的同時,保持施加到第一氣動壓力部件和第二氣動壓力部件的氣動壓力;在一定的高度處,將施加到接合頭的第一氣動壓力部件的氣動壓力排出到外部;當氣動壓力的排出完成時,進一步向下移動接合頭並將由接合頭吸附的裸片安裝在接合基板 上;以及當裸片的安裝完成時,在氣動壓力被施加到第一氣動壓力部件並在接合頭向上移動到一定高度或確定高度(certain height)的狀態下被保持的同時,執行後續處理。 In a method of controlling a bonding apparatus according to an embodiment of the present invention (wherein the bonding apparatus includes a bonding head, a driver, and a bonding substrate; wherein the bonding head includes: a bonding member for vacuum suction of a die such as a semiconductor wafer; a first pneumatic a pressure member, the first pneumatic pressure member is used to supply buffer power to the engagement member by selectively applying and canceling the application of the pneumatic pressure to the first pneumatic pressure member, and the volume of the first pneumatic pressure member is variable according to the pressure and a second pneumatic pressure member, the second pneumatic pressure member is continuously applied with pneumatic pressure; wherein the driver is used to move the bonding head in the vertical direction and transfer the bonding head to a position on the XY plane; wherein the bonding substrate is mounted with dies picked up by the bonding head), the following steps may be repeated: while the bonding head picking up the dies is transported over the bonding substrate and moved vertically downward to a certain height, maintaining the application of the first pneumatic pressure member and the second pneumatic pressure Pneumatic pressure of the pressure part; at a certain height, the pneumatic pressure applied to the first pneumatic pressure part of the joint head is discharged to the outside; when the discharge of the pneumatic pressure is completed, the joint head is further moved downward and will be adsorbed by the joint head. Die mounted on bonded substrate and when the mounting of the die is completed, while the pneumatic pressure is applied to the first pneumatic pressure member and held in a state where the bonding head is moved up to a certain height or a certain height, the subsequent processing is performed.
根據控制接合設備的方法,當接合頭將裸片安裝在接合基板上時施加至裸片的衝擊可被減輕,從而防止裸片碎裂或折斷。 According to the method of controlling the bonding apparatus, the impact applied to the die when the bonding head mounts the die on the bonding substrate can be mitigated, thereby preventing the die from chipping or breaking.
下面將描述根據本發明另一實施方式的控制接合設備的方法。 A method of controlling a bonding apparatus according to another embodiment of the present invention will be described below.
在控制接合設備的方法中,接合設備包括接合頭100、驅動器、浸漬板300和接合基板,其中接合頭100包括:用以真空吸附切割裸片的接合部件110;第一氣動壓力部件121,第一氣動壓力部件121用以透過選擇性地向第一氣動壓力部件施加氣動壓力和取消氣動壓力的施加來向接合部件110供應緩衝動力,並且第一氣動壓力部件121的容積根據壓力是可變的;和第二氣動壓力部件122,第二氣動壓力部件122被連續地施加氣動壓力;其中驅動器用以在垂直方向上移動接合頭100並將接合頭100傳送到X-Y平面上的位置;其中浸漬板300含有待塗覆到由接合頭100吸附的裸片的底表面上的助焊劑310;其中在接合基板上安裝塗覆有助焊劑310的裸片。在此方法中,可重複執行以下步驟:在吸附裸片的接合頭100在浸漬板300上方傳送並被垂直向下移動到一定高度的同時,保持施加到第一氣動壓力部件121和第二氣動壓力部件122的氣動壓力;在一定高度處將施加到接合頭的第一氣動壓力部件的
氣動壓力排出到外部;當氣動壓力的排出完成時,進一步向下移動接合頭100,並將包含在浸漬板300中的助焊劑310施加到由接合頭100吸附的裸片的底表面上;當完成助焊劑310向裸片的底表面的施加時,在接合頭100垂直向上移動到一定高度並且氣動壓力被施加到第一氣動壓力部件121並被保持的狀態下,將接合頭100傳送到接合基板上;以及將塗覆有助焊劑310的裸片安裝在接合基板上。
In the method of controlling the bonding equipment, the bonding equipment includes a
根據控制接合設備的方法,可以減輕當助焊劑310被塗覆到由接合頭100吸附的裸片的底表面上時施加的衝擊,以防止損壞佈置在裸片的底表面上的凸塊。在這種情況下,也可以執行接合力控制,以減輕在接合裸片時施加的衝擊。當裸片被接合頭100吸附和拾取時,也可以執行接合力控制。
According to the method of controlling the bonding apparatus, the impact applied when the
下面將參照附圖描述根據本發明的接合設備的翻轉器及其控制方法。圖5是根據本發明實施方式的翻轉器1000的截面圖和控制翻轉器1000的方法。
The flipper of the joining apparatus and the control method thereof according to the present invention will be described below with reference to the accompanying drawings. 5 is a cross-sectional view of a
根據本發明的翻轉器1000包括:拾取單元1100,拾取單元1100用以吸附和拾取裸片;翻轉臂1700,拾取單元1100安裝在翻轉臂1700上,翻轉臂1700安裝在主體上而可旋轉並可向上或向下移動,並具有第一墊1740和第二墊1730;支撐負載1400,支撐負載1400安裝在翻轉臂中而在預定範圍內在長度方向上可移位元,並且拾取單元1100安裝在支撐負載1400的端部上;彈性構件1300,彈性構件1300設置在其中具有支撐負載1400的支撐部件
和拾取單元1100之間,並且彈性構件1300用以減輕當拾取單元1100與裸片接觸時施加的衝擊;負壓管1200,負壓管1200耦接到拾取單元1100,以向拾取單元1100施加負壓;以及正壓管1800,正壓管1800耦接到翻轉臂1700,以便透過向翻轉臂1700施加正壓來向支撐負載1400提供承載動力。透過正壓管1800施加到支撐負載1400的正壓可以被保持,以在翻轉臂1700旋轉並向下移動的同時補償翻轉臂的慣性,並且可以緊接在拾取單元1100與裸片接觸之前被移除。
The
當第一墊1740和第二墊1730與圖6的第一停止器1920和第二停止器1940接觸時,翻轉臂1700的第一墊1740和第二墊1730限制翻轉臂1700的旋轉範圍。
When the first and
拾取單元1100可以在拾取單元1100的底端包含吸附墊1110,並且當負壓Ps被施加到吸附墊1110時可拾取裸片。因此,吸附墊1110的拾取單元1100可以包括負壓管1200,透過負壓管1200可以選擇性地施加負壓Ps。
The
拾取單元1100可以安裝在翻轉器1000中而可相對地移位,以防止在拾取裸片期間裸片被吸附墊1110加壓和損壞。
The
也就是說,如圖5所示,拾取單元1100耦接到支撐負載1400的一端,支撐負載1400安裝在翻轉臂1700中而可移位元,並且彈性構件1300設置在翻轉臂1700和拾取單元1100之間。
That is, as shown in FIG. 5 , the
因此,在拾取單元1100拾取裸片時施加的衝
擊可以透過支撐負載1400的向後移動以及透過彈性構件1300而吸收。
Therefore, the impulse applied when the
在拾取單元1100與待拾取的裸片接觸的同時,裸片可透過由耦接到拾取單元1100的負壓管1200施加負壓Ps而被吸附和拾取。
While the
在根據本發明的翻轉器1000和控制翻轉器1000的方法中,翻轉器1000用以在裸片被拾取單元1100拾取的狀態下旋轉。在這種情況下,拾取單元1100可以不被直接旋轉,而是其上安裝有拾取單元1100的翻轉臂1700可以被旋轉。
In the
翻轉臂1700可以包括旋轉部件1710,在旋轉部件1710上安裝有旋轉軸1720;以及支撐部件1760,支撐部件1760垂直耦接到旋轉部件1710的一端,並且支撐部件1760中具有支撐負載1400。翻轉臂1700的旋轉部件1710可以被安裝為相對於翻轉器1000的主體1900圍繞旋轉軸1720可旋轉,並且透過升降驅動單元1930沿著升降引導件1910而向上或向下移動。
The
在垂直於旋轉部件1710的方向上延伸的支撐部件1760可以設置在翻轉臂1700的旋轉部件1710的端部上。
A
如上所述,支撐部件1760可以以中空的形式設置,以保護裸片。因此,支撐負載1400可以安裝為在支撐部件1760的長度方向上可移位。
As described above, the
即使支撐負載1400被彈性構件1300彈性地支
撐,在翻轉臂1700在翻轉臂1700的支撐部件1760內部圍繞旋轉軸1720旋轉期間,由於支撐負載1400在位移方向上的旋轉慣性,仍可能發生移動。由於這種移動,在拾取狀態下的拾取單元1100的穩定性可能降低,並且支撐負載1400或拾取單元1100可能與翻轉臂1700等發生碰撞。
Even if the supporting
當翻轉器1000包括第一和第二停止器1920和1940以限制翻轉臂1700的旋轉範圍時,在翻轉臂1700與第一和第二停止器1920和1940接觸時,翻轉臂1700的旋轉停止。因此,翻轉器1000受慣性影響更大。
When the
支撐負載1400的一端位於翻轉臂1700的支撐部件1760的內部氣缸空間1770中。因此,當透過正壓管1800施加正氣動壓力時,承載動力被供應至支撐負載1400的這一端。
One end of the
也就是說,當透過正壓管1800施加正壓Pb時,支撐負載1400可以被阻止進入施加有正壓Pb的內部氣缸空間1770,從而選擇性地提供承載動力。
That is, when the positive pressure Pb is applied through the
可以在翻轉臂1700的內部氣缸空間1770中設置多個O形環(O形環or1,or2和or3),以防止透過正壓管1800施加到翻轉臂1700的內部氣缸空間1770的正壓Pb的洩漏。
A plurality of O-rings (O-rings or1, or2 and or3) may be provided in the
通常,正壓Pb可以僅在翻轉器1000的旋轉期間透過正壓管1800施加到翻轉臂1700,或者正壓Pb可以是可變的。例如,如果在拾取單元1100拾取裸片期間正壓Pb連續保持恒定,則支撐負載1400和翻轉臂1700可被統
一為一個剛性體並且因此可能損壞裸片。
Generally, the positive pressure Pb may be applied to the
根據本發明的控制翻轉器1000、以及根據翻轉器1000的操作狀態控制透過正壓管1800施加的正壓Pb或透過負壓管1200施加的負壓Ps的方法將參照圖6進行描述。
The method of controlling the
具體地,本發明可以提供一種控制翻轉器的方法,翻轉器包括:用以吸附和拾取裸片的拾取單元;翻轉臂,在翻轉臂上安裝有拾取單元,並且翻轉臂安裝在主體上而可旋轉並可向上或向下移動;支撐負載,支撐負載安裝在翻轉臂中,而在長度方向上在預定範圍內可移位元,並且拾取單元安裝在支撐負載的端部上;彈性構件,彈性構件設置在其中具有支撐負載的支撐部件和拾取單元之間;負壓管,負壓管耦接到拾取單元以向拾取單元施加負壓;以及正壓管,正壓管耦接到翻轉臂,以向支撐負載供應承載動力。在此方法中,下述步驟可被連續執行:在拾取單元旋轉並被垂直向下移動到一定高度的同時,保持正壓以補償翻轉臂的慣性;在一定的高度處排出正壓;在正壓的排出完成後,透過由負壓管施加負壓利用拾取單元吸附裸片,並同時透過使用彈性構件來減輕當拾取單元進一步向下移動並與裸片接觸時施加的衝擊;以及在拾取單元垂直向上移動到一定高度並且施加和保持有正壓的狀態下旋轉拾取單元。 Specifically, the present invention can provide a method of controlling a flipper, the flipper comprising: a pick-up unit for sucking and picking up dies; a flip arm, on which the pick-up unit is mounted, and the flip arm is mounted on the main body so as to be able to Rotate and can move up or down; support load, support load is installed in the flip arm, and the unit can be displaced within a predetermined range in the length direction, and the pick-up unit is installed on the end of the support load; elastic member, elastic a member is disposed between a support member having a supporting load therein and the pick-up unit; a negative-pressure tube coupled to the pick-up unit to apply negative pressure to the pick-up unit; and a positive-pressure tube coupled to the flip arm, To supply carrying power to the supporting load. In this method, the following steps can be performed continuously: while the pick-up unit is rotated and moved vertically downward to a certain height, a positive pressure is maintained to compensate the inertia of the flip arm; the positive pressure is discharged at a certain height; After the discharge of the pressure is completed, the die is adsorbed by the pickup unit by applying negative pressure from the negative pressure tube, and at the same time, the impact applied when the pickup unit is further moved down and contacts with the die is relieved by using an elastic member; Rotate the pick-up unit while moving vertically upwards to a certain height and applying and maintaining positive pressure.
圖6示出了在具有兩個圖5的翻轉器1000的系統中,裸片C被第一翻轉器1000a拾取並且被第二翻轉
器1000b卸載的狀態,以及第一翻轉器1000a和第二翻轉器1000b旋轉的狀態。
FIG. 6 shows that in a system with two
具體來說,圖6的(a)示出了在具有兩個翻轉器1000a和1000b(比如圖5的翻轉器1000)的系統中,裸片C被第一翻轉器1000a拾取並且被第二翻轉器1000b卸載的狀態。圖6的(b)示出了第一翻轉器1000a和第二翻轉器1000b旋轉的狀態。圖6的(c)示出了圖5的翻轉器1000的正壓管1800的結構。
Specifically, (a) of FIG. 6 shows that in a system with two
在圖6中示出的翻轉系統可以包括兩個翻轉器1000a和1000b,並且順序地拾取堆疊在晶片上的裸片C並且傳送裸片C以用於後續處理,而不會在翻轉器1000a和1000b之間產生干擾。圖6的翻轉系統可以包括向下視覺單元2000,向下視覺單元2000用以檢查待拾取的裸片的排列。
The flipping system shown in FIG. 6 may include two
在根據本發明的翻轉器1000a和1000b及其控制方法中,在透過翻轉器1000a和1000b的每一個的拾取單元1100吸附和拾取裸片C期間,可以透過負壓管1200施加負壓Ps。
In the
因此,如圖6的(a)所示,第一翻轉器1000a可以在裸片C被吸附之前開始施加負壓Ps,以減少真空產生時間,並且如圖6的(b)所示,即使在第一翻轉器1000a的旋轉期間,也可保持透過負壓管1200施加負壓Ps。這意味著在裸片C被拾取單元1100拾取的同時應當保持負壓Ps的施加。
Therefore, as shown in (a) of FIG. 6 , the
正壓Pb被施加到翻轉臂1700的內部氣缸空間1770,以防止支撐負載1400的移動或晃動,在支撐負載1400上安裝有拾取單元1100。因此,當開始裸片C的吸附以拾取裸片C時,可以不施加正壓Pb。也就是說,如果正壓Pb透過正壓管1800而被施加到翻轉臂1700的氣缸,則可在支撐負載1400處產生承載動力,因此當裸片C與拾取單元1100接觸時,透過彈性構件1300等執行的緩衝操作可能受到干擾。
A positive pressure Pb is applied to the
因此,在由拾取單元1100吸附裸片C期間,可以取消正壓Pb的施加。
Therefore, during the suction of the die C by the
因此,由於圖6的(a)的第一翻轉器1000a執行吸附以拾取裸片C,所以正壓Pb不被施加到第一翻轉器1000a。由於第二翻轉器1000b不拾取裸片C,所以正壓Pb可被施加至第二翻轉器1000b以固定支撐負載1400和拾取單元1100。
Therefore, since the
另外,如圖6的(b)所示,當翻轉器1000a和100b中的每一個的拾取單元1100的位置由於翻轉器1000a和1000b的旋轉而改變時,正壓Pb可以透過翻轉器1000a和1000b的每一個的正壓管1800而被施加,以防止支撐負載1400和拾取單元1100的移動、晃動或振動,從而改善了翻轉器1000a和1000b的旋轉的可靠性和當裸片C被吸附時的裸片C的可靠性。
In addition, as shown in (b) of FIG. 6 , when the position of the
如果第一翻轉器1000a包括第一停止器1920以限制翻轉臂1700的旋轉範圍,則翻轉臂1700上的第一
墊1740可以與第一停止器1920接觸,並且因此當翻轉臂1700的旋轉完成時可以產生高的慣性力。因此,在這種情況下,也可以保持正壓Pb的施加以防止第一翻轉器1000a的移動、晃動或振動。
If the
因此,在翻轉臂1700的旋轉期間可以保持正壓Pb的施加。
Therefore, the application of the positive pressure Pb can be maintained during the rotation of the
如圖6的(c)所示,正壓管1800可耦接到翻轉臂1700的內部氣缸空間1770,並且可以包括調節器1810和控制閥1860,調節器1810用以使透過正壓管1800施加的正壓Pb均勻化,控制閥1860用以選擇性地阻擋正壓Pb。
因此,透過正壓管1800施加到翻轉臂1700的內部氣缸空間1770的正壓Pb被調節器1810均勻化。根據翻轉器1000a或1000b的操作狀態,可以使用控制閥1860來選擇性地施加或阻擋正壓Pb。
As shown in (c) of FIG. 6 , the
當正壓Pb被阻擋時(當正壓Pb的施加被取消時),殘留在內部氣缸空間1770中的空氣可被快速地排出到大氣中,以防止施加到翻轉臂1700的內部氣缸空間1770的正壓Pb殘留並且防止當裸片C被拾取時殘留的正壓Pb被傳送到裸片C。
When the positive pressure Pb is blocked (when the application of the positive pressure Pb is canceled), the air remaining in the
圖7示出了當處於圖6狀態的第一翻轉器1000a和第二翻轉器1000b的旋轉完成時,由第一翻轉器1000a拾取的裸片C被卸載並且第二翻轉器向下移動到裸片C將被拾取的高度的狀態。
7 shows that when the rotation of the
如圖7的(a)所示,在翻轉器1000a和1000b
之間沒有干擾的情況下,完成翻轉器1000a和1000b的旋轉的狀態應當被理解為如下狀態:完成第一翻轉器1000a的旋轉,使得第一翻轉器的拾取單元1100面朝上,並且完成第二翻轉器1000b的旋轉,使得第二翻轉器1000b的拾取單元1100面朝下。
As shown in (a) of FIG. 7, at the
在這種情況下,負壓Ps透過負壓管1200而被施加到吸附裸片C的第一翻轉器1000a,並且正壓Pb透過第一翻轉器1000a和第二翻轉器1000b的正壓管1800而被施加到第一翻轉器1000a和第二翻轉器1000b。
In this case, the negative pressure Ps is applied to the
如上所述,支承負載1400可被透過正壓管1800施加到第一翻轉器1000a和第二翻轉器1000b的正壓Pb支撐,因此無論第一翻轉器1000a和第二翻轉器1000b怎樣旋轉,第一翻轉器1000a和第二翻轉器1000b的移動、晃動或振動都可被最小化。另外,負壓Ps與正壓Pb一起被施加到第一翻轉器1000a,因此可以穩定地保持被拾取的裸片C的吸附狀態。
As described above, the
如圖7的(b)所示,當被第一翻轉器1000a拾取的裸片C被卸載時,施加到第一翻轉器1000a的拾取單元1100的負壓Ps可被移除,並且可完成第二翻轉器1000b的向下移動。因此,透過正壓管1800施加的正壓Pb可以在另一個裸片C被吸附之前被移除。為了吸附另一個裸片C,負壓Pb被施加到拾取單元1100。
As shown in (b) of FIG. 7 , when the die C picked up by the
現在將詳細描述第二翻轉器1000b的向下移動。第二翻轉器1000b在被旋轉的同時可以朝向晶片w向
下移動。在第二翻轉器1000的拾取單元1100與裸片C接觸之前,當第二翻轉器1000的旋轉運動開始時,第二翻轉器1000b可以高速向下移動至預定高度,並且之後第二翻轉器1000可以低速向下移動。
The downward movement of the
當以低速向下移動時,在拾取單元1100與裸片C接觸之前,第二翻轉器1000b可以以均勻的速度移動到靠近裸片C的高度。在這種情況下,第二翻轉器1000b可將內部氣缸空間1770中的空氣排出到大氣中,並向下移動直到拾取單元1100與裸片C接觸為止。
When moving downward at a low speed, the
如上所述的用以拾取並翻轉裸片C的翻轉器1000a和1000b可根據翻轉器1000a和1000b的操作狀態來選擇性地提供正壓Pb和負壓Ps,從而改善裸片C的吸附狀態的穩定性,並最小化當翻轉器1000a和1000b操作時翻轉器1000a和1000b的運動或振動。
The
在裸片C的翻轉和翻轉器1000a和1000b的向下運動期間,正壓Pb可以限制翻轉器1000a和1000b的拾取單元1100的位移,並且因此翻轉器1000a和1000b可以高速旋轉並向下移動,從而提高生產率。
During the flipping of the die C and the downward movement of the
圖8是示出根據本發明另一實施方式的翻轉器1000及其控制方法的截面圖。對圖8的與如上所述的圖5至圖7的各個部分相同的部分的描述在此不再贅述,現在將集中描述圖8與圖5至圖7的不同。
FIG. 8 is a cross-sectional view illustrating a
在圖8的翻轉器1000中,與圖5的實施方式類似,拾取單元1100經由支撐負載1400安裝在翻轉臂1700
中而可移位,但是省略了用於吸收在吸附裸片期間產生的衝擊的彈性構件1300。
In the
也就是說,在圖8的翻轉器1000中,拾取單元1100與翻轉臂1700的支撐部件1760之間未設置彈性構件1300,並且可採用控制經由正壓管1800施加正壓Pb的方法來替代使用彈性構件1300。
That is, in the
更具體地,根據本發明另一個實施方式的翻轉器包括:拾取單元,拾取單元用以吸附和拾取裸片;翻轉臂,在翻轉臂上安裝有拾取單元,並且翻轉臂安裝在主體上而可旋轉並可向上或向下移動;支撐負載,支撐負載安裝在翻轉臂中而在長度方向上在預定範圍內可移位元,並且拾取單元安裝在支撐負載的端部;負壓管,負壓管耦接到拾取單元以向拾取單元施加負壓;和正壓管,正壓管耦接到翻轉臂,以透過向翻轉臂選擇性地施加正壓來向支撐負載提供承載動力,並且正壓管用以施加第一正壓或第二正壓。施加到支撐負載的第一正壓可以被保持,以在翻轉臂旋轉和向下移動的同時補償翻轉臂的慣性,並且緊接在拾取單元接觸裸片之前向支撐負載施加第二正壓。 More specifically, a flipper according to another embodiment of the present invention includes: a pick-up unit for sucking and picking up dies; a flip arm on which the pick-up unit is mounted, and which is mounted on the main body so as to be operable Rotate and can move up or down; support load, support load is installed in the turning arm and displaceable within a predetermined range in the length direction, and the pick-up unit is installed at the end of the support load; negative pressure pipe, negative pressure a tube coupled to the pick unit to apply negative pressure to the pick unit; and a positive pressure tube coupled to the flip arm to provide carrying power to the support load by selectively applying positive pressure to the flip arm, and the positive pressure tube is used for to apply the first positive pressure or the second positive pressure. The first positive pressure applied to the support load can be maintained to compensate for the inertia of the flip arm while the flip arm rotates and moves downward, and a second positive pressure is applied to the support load just before the pick unit contacts the die.
這裡,正壓管可以包括控制閥,以選擇性地施加第一正壓和第二正壓。第一正壓高於第二正壓。 Here, the positive pressure pipe may include a control valve to selectively apply the first positive pressure and the second positive pressure. The first positive pressure is higher than the second positive pressure.
也就是說,在之前的實施方式中,在透過負壓管1200將負壓Ps施加到拾取單元1100以由拾取單元1100拾取裸片期間,取消了透過正壓管1800施加正壓Pb。與此相對照,在圖8的翻轉器1000中,可透過正壓管1800施
加的正壓Pb可以被分為第一等級正壓Pb1和第二等級正壓Pb2,第一等級正壓Pb1用於在翻轉器1000的操作(比如翻轉器1000的旋轉)期間最小化翻轉器1000的振動或移動,第二等級正壓Pb2透過正壓管1800施加以在拾取裸片期間在透過負壓管1200施加負壓Ps的同時吸收當裸片被吸附時產生的衝擊。
That is, in the previous embodiment, the application of the positive pressure Pb through the
也就是說,第二等級正壓Pb2可以提供低的阻力,此低的阻力足以吸收在射出器銷(ejector pin)被提升時施加到裸片上的壓力,或吸收由於在拾取單元1100的吸附墊1110與裸片接觸的同時裸片被支撐在晶片上而產生的反作用,並且第二等級正壓Pb2可以實現與當使用彈性構件1300用作緩衝墊時基本相同的效果。
That is, the second level positive pressure Pb2 can provide a low resistance enough to absorb the pressure applied to the die when the ejector pin is lifted, or absorb the pressure due to the suction pad of the
圖9示出了在包括兩個翻轉器1000a和1000b(比如圖8的翻轉器1000)的系統中,裸片C由第一翻轉器1000a拾取並且由第二翻轉器1000b卸載的狀態,以及第一翻轉器1000a和第二翻轉器1000b旋轉的狀態。
9 shows the state in which die C is picked up by the
詳細地說,圖9的(a)示出了在包括兩個翻轉器1000a和1000b(例如圖8的翻轉器1000)的系統中,裸片C由第一翻轉器1000a拾取並且由第二翻轉器1000b卸載的狀態。圖9的(b)示出了第一翻轉器1000a和第二翻轉器1000b旋轉的狀態。圖9的(c)示出了圖8的翻轉器1000的正壓管1800的結構。
In detail, (a) of FIG. 9 shows that in a system including two
如圖9的(a)所示,與之前的實施方式不同,在由第一翻轉器1000a拾取裸片C期間,透過正壓管1800
施加第二等級正壓Pb2。第二等級正壓Pb2被施加到翻轉臂1700的內部氣缸空間1770,以吸收當負壓Ps被施加到拾取單元1100時在吸附裸片C期間產生的衝擊,並且裸片C被吸附和拾取。如圖9的(a)所示,正壓Pb被施加到第二翻轉器1000b以固定支撐負載1400和拾取單元1100,並且由於第二翻轉器1000b未吸附裸片C,因此負壓Ps未被施加到第二翻轉器1000b。
As shown in FIG. 9( a ), unlike the previous embodiments, during the pickup of the die C by the
與之前的實施方式類似,如圖9的(b)所示,在第一翻轉器1000a和第二翻轉器1000b兩者均旋轉的同時,第一等級正壓Pb1透過第一翻轉器1000a和第二翻轉器1000b的正壓管1800而被施加,以在由於第一擋板1000a和第二擋板1000b的旋轉而導致拾取單元1100的位置改變時,防止支撐負載1400和拾取單元1100的移動、晃動或振動。因此,可以改善翻轉器1000a和1000b的旋轉可靠性以及裸片C的吸附狀態的可靠性。如之前的實施方式那樣,負壓Ps僅被施加到拾取裸片C的第一翻轉器1000a。
Similar to the previous embodiment, as shown in (b) of FIG. 9 , while both the
如圖9的(c)所示,正壓管1800分支成用以施加第一等級正壓Pb1的第一正壓管1800a和用以施加第二等級正壓Pb2的第二正壓管1800b。第一控制閥1860x設置在內部氣缸空間1770的前方,以根據翻轉器1000a或1000b的操作狀態來選擇性地施加第一等級正壓Pb1或第二等級正壓Pb2。因此,當施加第一等級正壓Pb1時,第一控制閥1860x可將第一正壓管1800a的通道與內部氣缸空間1770連通。當施加第二等級正壓Pb2時,第一控制閥
1860x可將第二正壓管道1800b的通道與內部氣缸空間1770連通。
As shown in FIG. 9( c ), the
在第二正壓管1800b的通道中,可設置調節器1810b、用以根據壓力控制通道的開放程度(degree of openness)的比例閥1860z、用以選擇第二正壓管1800b和大氣的第二控制閥1860y等。
In the passage of the second
由於正壓管1800分支為第一正壓管1800a和第二正壓管1800b,所以當需要降低正壓Pb時,可透過阻擋相應管的通道、移除施加到氣缸的壓力、和施加具有不同幅值的正壓Pb,而不是透過將第一等級正壓Pb1降低到第二等級正壓Pb2,來改善針對由正壓管1800施加的第一等級正壓Pb1和第二等級正壓Pb2的幅值變化的回應以及第一等級正壓Pb1和第二等級正壓Pb2的幅值的可靠性。
Since the
由於使用第二控制閥1860y來選擇第二正壓管1800b和大氣,內部氣缸空間1770的殘餘壓力可被快速排出,並且可以將第二正壓管1800b透過第二控制閥1860y連接到內部氣缸空間1770,以當內部氣缸空間1770的殘餘壓力的排出完成時施加第二等級正壓Pb2,從而改善了正壓切換回應。
Since the second
圖10示出了在處於圖9狀態的第一和第二翻轉器1000a和1000b的旋轉完成的狀態下,由第一翻轉器1000a拾取的裸片C被卸載並且第二翻轉器1000b向下移動到裸片C將被拾取的高度的狀態。
FIG. 10 shows that the die C picked up by the
如圖10的(a)所示,與之前的實施方式類似,
在翻轉器1000a和1000b在翻轉器1000a和1000b之間沒有干擾的情況下完成旋轉的狀態下,第一翻轉器1000a的旋轉完成,使得第一翻轉器1000a的拾取單元1100面朝上,且第二翻轉器1000b的旋轉完成,使得第二翻轉器1000b的拾取單元1100面朝下,負壓Ps透過負壓管1200而被施加到吸附裸片的第一翻轉器1000a,並且第一等級正壓Pb1透過正壓管1800而被施加到第一翻轉器1000a和第二翻轉器1000b。
As shown in (a) of FIG. 10 , similar to the previous embodiment,
In a state in which the
如圖10的(b)所示,當由第一翻轉器1000a拾取的裸片被卸載時,施加到第一翻轉器1000a的拾取單元1100的負壓Ps可以被移除,並且第二翻轉器1000b的向下移動可以完成。因此,在吸附另一個裸片C之前,透過正壓管1800施加第一等級正壓Pb1的操作被取消,並且第一等級正壓Pb1被降低到第二等級正壓Pb2。為了減少真空產生時間,在吸附另一個裸片C之前負壓Ps被施加到拾取單元1100。由此,在由拾取單元1100吸附裸片C期間,正壓被連續施加,並且所施加的正壓可以低於在翻轉臂1700的旋轉期間施加的正壓。在這種情況下,在施加正壓時,可透過在翻轉臂1700的向下運動期間移除所施加的正壓並施加低於該正壓的新的正壓,來降低正壓。
As shown in (b) of FIG. 10 , when the die picked up by the
如上所述,在根據本發明另一實施方式的控制翻轉器的方法中(其中翻轉器包括:拾取單元,拾取單元用以吸附和拾取裸片;翻轉臂,在翻轉臂上安裝有拾取單元,並且翻轉臂安裝在主體上而可旋轉並可向上或向下移 動;支撐負載,支撐負載安裝在翻轉臂中而在長度方向上在預定範圍內可移位元,並且拾取單元安裝在支撐負載的端部上;負壓管,負壓管耦接到拾取單元以向拾取單元施加負壓;和正壓管,正壓管耦接至翻轉臂,以向支撐負載供應承載動力,正壓管分支成第一正壓管和第二正壓管),可連續執行以下步驟:在拾取單元旋轉並垂直向下移動到一定高度的同時,保持第一正壓以補償翻轉臂的慣性;在一定高度處排出第一正壓;在完成第一正壓的排出之後,施加比第一正壓低的第二正壓;當拾取單元被進一步地向下移動並因此與裸片接觸時,透過由負壓管施加負壓,來由拾取單元吸附裸片,同時透過使用第二正壓來減輕在與裸片接觸期間產生的衝擊;和在拾取單元向上垂直移動到一定高度、同時第一正壓被施加和保持的狀態下,旋轉拾取單元。 As described above, in the method for controlling a flipper according to another embodiment of the present invention (wherein the flipper includes: a pick-up unit, the pick-up unit is used for sucking and picking up the die; a flip arm, on which the pick-up unit is mounted, And the flip arm is mounted on the main body and can be rotated and moved up or down moving; a support load, the support load is installed in the flip arm to be displaceable within a predetermined range in the length direction, and the pick-up unit is installed on the end of the support load; a negative pressure tube, the negative pressure tube is coupled to the pick-up unit to apply negative pressure to the pick-up unit; and a positive pressure pipe, which is coupled to the flip arm to supply bearing power to the supporting load, the positive pressure pipe branches into a first positive pressure pipe and a second positive pressure pipe), which can be continuously The following steps are performed: while the pickup unit is rotated and moved vertically downward to a certain height, the first positive pressure is maintained to compensate the inertia of the flip arm; the first positive pressure is discharged at a certain height; after the discharge of the first positive pressure is completed , applying a second positive pressure lower than the first positive pressure; when the pick-up unit is further moved down and thus comes into contact with the die, the die is attracted by the pick-up unit by A second positive pressure to relieve shock generated during contact with the die; and in a state where the pickup unit is vertically moved upward to a certain height while the first positive pressure is applied and maintained, the pickup unit is rotated.
根據上述方法,用以拾取和翻轉裸片C的翻轉器1000a和1000b可以根據翻轉器1000a和1000b的操作狀態來選擇性地施加正壓Pb和負壓Ps,從而改善在吸附狀態下的裸片C的穩定性,並最小化操作翻轉器1000a和1000b時的移動或振動,並且還可以執行彈性構件的功能以保護裸片。
According to the above method, the
在根據本發明的用於接合設備的接合構件及其控制方法中,當裸片(比如半導體晶片)浸入到助焊劑中或者接合到接合基板上時施加至裸片的接合力可被精確控制。由此,可以防止裸片底表面上的凸塊被損壞,並且 可以防止裸片碎裂或破裂。 In the bonding member for the bonding apparatus and the control method thereof according to the present invention, the bonding force applied to the die, such as a semiconductor wafer, when it is dipped into the flux or bonded to the bonding substrate can be precisely controlled. As a result, the bumps on the bottom surface of the die are prevented from being damaged, and The die can be prevented from chipping or cracking.
根據本發明,即使在使用容積可根據壓力而變化的氣動壓力部件時,氣動壓力可被分成兩部分,並且即使氣動壓力部件的容積發生變化,緩衝動力也可被連續地供應至接合部件,從而避免或最小化接合部件的晃動。由此,能夠穩定接合部件。 According to the present invention, even when the pneumatic pressure member whose volume can be changed according to the pressure is used, the pneumatic pressure can be divided into two parts, and even if the volume of the pneumatic pressure member is changed, the damping power can be continuously supplied to the engaging member, thereby Avoid or minimize wobbling of jointed components. Thereby, the joining member can be stabilized.
在根據本發明的接合設備及其控制方法中,由接合部件吸附的裸片(比如半導體晶片)可被高速移動到含有助焊劑的浸漬板或接合基板上,因此可在不降低UPH的情況下最大化生產率。 In the bonding apparatus and the control method thereof according to the present invention, the bare chip (such as a semiconductor wafer) sucked by the bonding member can be moved to the dip plate or the bonding substrate containing the flux at high speed, so that the UPH can be lowered without reducing the UPH. Maximize productivity.
雖然上文已經結合本發明的示例性實施方式描述了本發明,但是所屬領域的技術人員應理解,可以在不脫離本發明的技術構思和範圍的情況下,進行各種改變和修改。因此,很明顯,所有的修改都被包含在本發明的技術範圍內,只要這些修改包括了在本發明的申請專利範圍中所要求保護的部件。 Although the present invention has been described above in conjunction with the exemplary embodiments of the present invention, it should be understood by those skilled in the art that various changes and modifications can be made without departing from the technical spirit and scope of the present invention. Therefore, it is obvious that all modifications are included in the technical scope of the present invention as long as the modifications include components claimed in the scope of the patent application of the present invention.
1:裸片 1: Die
11:凸塊 11: Bumps
10:接合構件 10: Joining components
100:接合頭 100: Splice head
110:接合部件 110: Joint parts
111:接合什取器 111: Engage the extractor
112:空氣軸承 112: Air bearing
113:感測器狗 113: Sensor Dog
121:第一氣動壓力部件 121: The first pneumatic pressure part
121a:空氣腔室通道 121a: Air chamber channel
121b:空氣腔室 121b: Air Chamber
122:第二氣動壓力部件 122: Second pneumatic pressure part
122a:氣缸通道 122a: Cylinder channel
122b:氣缸 122b: Cylinder
122c:支撐負載 122c: Support load
130:感測器部件 130: Sensor parts
200:升降驅動器 200: lift drive
300:浸漬板 300: Impregnated Board
310:助焊劑 310: Flux
Claims (14)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
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??10-2017-0026773 | 2017-02-28 | ||
KR10-2017-0026773 | 2017-02-28 | ||
KR1020170026773A KR20180099379A (en) | 2017-02-28 | 2017-02-28 | Flipping apparatus and controlling method of the same |
KR1020170037607A KR102075198B1 (en) | 2017-03-24 | 2017-03-24 | Bonding apparatus and method for controlling the same |
KR10-2017-0037607 | 2017-03-24 | ||
??10-2017-0037607 | 2017-03-24 |
Publications (2)
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DE102019007194A1 (en) * | 2019-10-16 | 2021-04-22 | Vat Holding Ag | Adjustment device for the vacuum range with pressure measurement functionality |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200708213A (en) * | 2005-05-31 | 2007-02-16 | Toray Eng Co Ltd | Bonding device |
KR20080080358A (en) * | 2005-12-06 | 2008-09-03 | 토레이 엔지니어링 컴퍼니, 리미티드 | Chip mounting apparatus and chip mounting method |
TW200915939A (en) * | 2007-07-31 | 2009-04-01 | Ulvac Inc | Substrate bonding apparatus and method for controlling the same |
KR20110137602A (en) * | 2010-06-17 | 2011-12-23 | 한미반도체 주식회사 | Bond head for die bonding machine |
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JP3031060B2 (en) * | 1992-05-26 | 2000-04-10 | 松下電器産業株式会社 | Electronic component bonding head device and electronic component bonding method |
JP2006137000A (en) * | 2005-11-25 | 2006-06-01 | Origin Electric Co Ltd | Suction head |
JP2009027105A (en) * | 2007-07-24 | 2009-02-05 | Shibuya Kogyo Co Ltd | Bonding device |
JP4788759B2 (en) * | 2008-11-20 | 2011-10-05 | パナソニック株式会社 | Component mounting equipment |
WO2015059839A1 (en) * | 2013-10-21 | 2015-04-30 | Fuji Machine Mfg. Co., Ltd. | Method for mounting an electronic-component onto a substrate and electronic-component mounting machine |
KR102350553B1 (en) * | 2015-06-09 | 2022-01-14 | 세메스 주식회사 | Picker for picking up semiconductor chip |
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2018
- 2018-02-08 CN CN201810127206.9A patent/CN108511381B/en active Active
- 2018-02-14 TW TW107105662A patent/TWI753109B/en active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200708213A (en) * | 2005-05-31 | 2007-02-16 | Toray Eng Co Ltd | Bonding device |
KR20080080358A (en) * | 2005-12-06 | 2008-09-03 | 토레이 엔지니어링 컴퍼니, 리미티드 | Chip mounting apparatus and chip mounting method |
TW200915939A (en) * | 2007-07-31 | 2009-04-01 | Ulvac Inc | Substrate bonding apparatus and method for controlling the same |
KR20110137602A (en) * | 2010-06-17 | 2011-12-23 | 한미반도체 주식회사 | Bond head for die bonding machine |
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CN108511381A (en) | 2018-09-07 |
TW201834519A (en) | 2018-09-16 |
CN108511381B (en) | 2023-05-23 |
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