TWI739894B - 物體交換系統、曝光裝置、平面顯示器之製造方法、元件之製造方法、物體移動方法、及曝光方法 - Google Patents
物體交換系統、曝光裝置、平面顯示器之製造方法、元件之製造方法、物體移動方法、及曝光方法 Download PDFInfo
- Publication number
- TWI739894B TWI739894B TW106128960A TW106128960A TWI739894B TW I739894 B TWI739894 B TW I739894B TW 106128960 A TW106128960 A TW 106128960A TW 106128960 A TW106128960 A TW 106128960A TW I739894 B TWI739894 B TW I739894B
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- TW
- Taiwan
- Prior art keywords
- substrate
- aforementioned
- exposure
- holding
- supporting
- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/063—Transporting devices for sheet glass
- B65G49/064—Transporting devices for sheet glass in a horizontal position
- B65G49/065—Transporting devices for sheet glass in a horizontal position supported partially or completely on fluid cushions, e.g. a gas cushion
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
- B65G2249/04—Arrangements of vacuum systems or suction cups
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Liquid Crystal (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012175778 | 2012-08-08 | ||
JPJP2012-175778 | 2012-08-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201800876A TW201800876A (zh) | 2018-01-01 |
TWI739894B true TWI739894B (zh) | 2021-09-21 |
Family
ID=50067736
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW102128449A TWI600973B (zh) | 2012-08-08 | 2013-08-08 | 物體交換方法、物體交換系統、曝光裝置、平面顯示器之製造方法、及元件製造方法 |
TW106128960A TWI739894B (zh) | 2012-08-08 | 2013-08-08 | 物體交換系統、曝光裝置、平面顯示器之製造方法、元件之製造方法、物體移動方法、及曝光方法 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW102128449A TWI600973B (zh) | 2012-08-08 | 2013-08-08 | 物體交換方法、物體交換系統、曝光裝置、平面顯示器之製造方法、及元件製造方法 |
Country Status (6)
Country | Link |
---|---|
JP (2) | JP6394965B2 (ja) |
KR (1) | KR102216809B1 (ja) |
CN (2) | CN104662478B (ja) |
HK (2) | HK1245416A1 (ja) |
TW (2) | TWI600973B (ja) |
WO (1) | WO2014024483A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110520798B (zh) * | 2017-03-31 | 2021-11-16 | 株式会社尼康 | 物体交换装置、物体处理装置、平板显示器的制造方法、元件制造方法、物体交换方法、以及物体处理方法 |
KR102469192B1 (ko) * | 2017-12-19 | 2022-11-21 | 엘지디스플레이 주식회사 | 디스플레이 장치의 제조 장치 |
KR102469193B1 (ko) * | 2017-12-19 | 2022-11-21 | 엘지디스플레이 주식회사 | 디스플레이 장치의 제조 장치 |
WO2019188274A1 (ja) * | 2018-03-30 | 2019-10-03 | 株式会社ニコン | 保持装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び保持方法 |
CN110858059B (zh) * | 2018-08-24 | 2021-06-04 | 上海微电子装备(集团)股份有限公司 | 一种垂向运动机构及光刻设备 |
JP7196734B2 (ja) * | 2019-03-29 | 2022-12-27 | 株式会社ニコン | 基板搬送装置、露光装置、フラットパネルディスプレイ製造方法、デバイス製造方法、及び露光方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002368065A (ja) * | 2001-06-08 | 2002-12-20 | Hiroshi Akashi | 位置合わせ装置 |
JP2005044882A (ja) * | 2003-07-24 | 2005-02-17 | Nikon Corp | 搬送装置及び露光装置 |
JP2008300723A (ja) * | 2007-06-01 | 2008-12-11 | Nec Electronics Corp | 処理装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999039999A1 (fr) | 1998-02-09 | 1999-08-12 | Nikon Corporation | Appareil de support d'une plaque de base, appareil et procede de transport de cette plaque, appareil de remplacement de cette plaque et appareil d'exposition et procede de fabrication dudit appareil |
JP4249869B2 (ja) * | 1999-12-22 | 2009-04-08 | 株式会社オーク製作所 | 基板搬送装置 |
JP2009073646A (ja) * | 2007-09-21 | 2009-04-09 | Myotoku Ltd | 浮上方法及び浮上ユニット |
JP5338576B2 (ja) * | 2009-09-04 | 2013-11-13 | ウシオ電機株式会社 | 露光装置 |
TWI661505B (zh) * | 2010-02-17 | 2019-06-01 | 日商尼康股份有限公司 | Transfer device, transfer method, exposure device, and component manufacturing method |
CN201886733U (zh) * | 2010-06-24 | 2011-06-29 | 华东师范大学 | 激光显示的多点综合测量装置 |
CN201811787U (zh) * | 2010-07-01 | 2011-04-27 | 华东师范大学 | 激光显示的光色性能的手持式测量装置 |
US20120064460A1 (en) * | 2010-09-07 | 2012-03-15 | Nikon Corporation | Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method |
US20120064461A1 (en) * | 2010-09-13 | 2012-03-15 | Nikon Corporation | Movable body apparatus, exposure apparatus, device manufacturing method, flat-panel display manufacturing method, and object exchange method |
-
2013
- 2013-08-07 WO PCT/JP2013/004763 patent/WO2014024483A1/ja active Application Filing
- 2013-08-07 CN CN201380049087.5A patent/CN104662478B/zh active Active
- 2013-08-07 JP JP2014529315A patent/JP6394965B2/ja active Active
- 2013-08-07 KR KR1020157005676A patent/KR102216809B1/ko active IP Right Grant
- 2013-08-07 CN CN201710587245.2A patent/CN107436540B/zh active Active
- 2013-08-08 TW TW102128449A patent/TWI600973B/zh active
- 2013-08-08 TW TW106128960A patent/TWI739894B/zh active
-
2015
- 2015-06-09 HK HK18104745.0A patent/HK1245416A1/zh unknown
- 2015-06-09 HK HK15105480.9A patent/HK1205277A1/xx not_active IP Right Cessation
-
2018
- 2018-08-31 JP JP2018163084A patent/JP6708233B2/ja active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002368065A (ja) * | 2001-06-08 | 2002-12-20 | Hiroshi Akashi | 位置合わせ装置 |
JP2005044882A (ja) * | 2003-07-24 | 2005-02-17 | Nikon Corp | 搬送装置及び露光装置 |
JP2008300723A (ja) * | 2007-06-01 | 2008-12-11 | Nec Electronics Corp | 処理装置 |
Also Published As
Publication number | Publication date |
---|---|
JP6708233B2 (ja) | 2020-06-10 |
TW201800876A (zh) | 2018-01-01 |
HK1245416A1 (zh) | 2018-08-24 |
CN107436540B (zh) | 2020-05-26 |
WO2014024483A1 (ja) | 2014-02-13 |
HK1205277A1 (en) | 2015-12-11 |
KR20150041038A (ko) | 2015-04-15 |
CN104662478A (zh) | 2015-05-27 |
JP2019016801A (ja) | 2019-01-31 |
JPWO2014024483A1 (ja) | 2016-07-25 |
KR102216809B1 (ko) | 2021-02-17 |
JP6394965B2 (ja) | 2018-09-26 |
CN107436540A (zh) | 2017-12-05 |
TW201407298A (zh) | 2014-02-16 |
CN104662478B (zh) | 2017-08-11 |
TWI600973B (zh) | 2017-10-01 |
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