TWI734761B - 用於全表面薄膜度量之系統及方法 - Google Patents

用於全表面薄膜度量之系統及方法 Download PDF

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Publication number
TWI734761B
TWI734761B TW106110247A TW106110247A TWI734761B TW I734761 B TWI734761 B TW I734761B TW 106110247 A TW106110247 A TW 106110247A TW 106110247 A TW106110247 A TW 106110247A TW I734761 B TWI734761 B TW I734761B
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TW
Taiwan
Prior art keywords
wafer
back surface
light
thin film
film
Prior art date
Application number
TW106110247A
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English (en)
Chinese (zh)
Other versions
TW201801216A (zh
Inventor
緒方 李
蕾娜 妮可雷德思
保羅 霍恩
理查 葛雷茲
Original Assignee
美商克萊譚克公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 美商克萊譚克公司 filed Critical 美商克萊譚克公司
Publication of TW201801216A publication Critical patent/TW201801216A/zh
Application granted granted Critical
Publication of TWI734761B publication Critical patent/TWI734761B/zh

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
    • H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/23—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/27—Structural arrangements therefor
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Quality & Reliability (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Medical Informatics (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Geometry (AREA)
  • Biomedical Technology (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
TW106110247A 2016-03-28 2017-03-28 用於全表面薄膜度量之系統及方法 TWI734761B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201662314276P 2016-03-28 2016-03-28
US62/314,276 2016-03-28
US15/255,605 2016-09-02
US15/255,605 US10563973B2 (en) 2016-03-28 2016-09-02 All surface film metrology system

Publications (2)

Publication Number Publication Date
TW201801216A TW201801216A (zh) 2018-01-01
TWI734761B true TWI734761B (zh) 2021-08-01

Family

ID=59898812

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106110247A TWI734761B (zh) 2016-03-28 2017-03-28 用於全表面薄膜度量之系統及方法

Country Status (8)

Country Link
US (1) US10563973B2 (enExample)
JP (1) JP6774501B2 (enExample)
KR (1) KR102177682B1 (enExample)
CN (1) CN109155263B (enExample)
DE (1) DE112017001576B4 (enExample)
IL (1) IL261451B (enExample)
TW (1) TWI734761B (enExample)
WO (1) WO2017172627A1 (enExample)

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TWI743176B (zh) * 2016-08-26 2021-10-21 美商應用材料股份有限公司 獲得代表在基板上的層的厚度的測量的方法，及量測系統和電腦程式產品
CN108022849B (zh) * 2017-11-30 2020-06-16 上海华力微电子有限公司 一种亮场缺陷检测设备自动优化光强条件的方法及系统
US11164768B2 (en) * 2018-04-27 2021-11-02 Kla Corporation Process-induced displacement characterization during semiconductor production
TWI830864B (zh) * 2019-02-07 2024-02-01 美商應用材料股份有限公司 使用色彩度量術進行的基板的厚度測量
KR102810856B1 (ko) 2019-09-02 2025-05-20 삼성전자주식회사 반도체 소자 제조 장치, 반도체 소자 검사 장치 및 반도체 소자 제조 방법
KR102945628B1 (ko) * 2020-02-11 2026-03-27 삼성전자주식회사 웨이퍼 검사 장치 및 이를 이용한 반도체 소자 제조 방법
US11221300B2 (en) 2020-03-20 2022-01-11 KLA Corp. Determining metrology-like information for a specimen using an inspection tool
US11544838B2 (en) * 2020-03-21 2023-01-03 Kla Corporation Systems and methods of high-resolution review for semiconductor inspection in backend and wafer level packaging
JP7714670B2 (ja) 2021-03-04 2025-07-29 アプライド マテリアルズ インコーポレイテッド 基板画像の処理に基づいたピクセルおよび領域の膜不均一分類
JP7604298B2 (ja) * 2021-03-24 2024-12-23 株式会社ディスコ レーザー加工装置
CN119555020A (zh) * 2025-02-05 2025-03-04 四川省开璞环保包装制品有限公司 一种环保无纺布表面涂层检测方法及系统

Citations (5)

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TW200526925A (en) * 2003-09-15 2005-08-16 Zygo Corp Methods and systems for interferometric analysis of surfaces and related applications
TW200604491A (en) * 2004-07-15 2006-02-01 Zygo Corp Transparent film measurements
TW200700694A (en) * 2005-05-19 2007-01-01 Zygo Corp Method and system for analyzing low-coherence interferometry signals for information about thin film structures
US20090142673A1 (en) * 2007-12-04 2009-06-04 Wei Gao Semi-transparent film grayscale mask
US20120026492A1 (en) * 2010-07-30 2012-02-02 Jimin Zhang Detection of layer clearing using spectral monitoring

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US5293214A (en) 1991-12-06 1994-03-08 Hughes Aircraft Company Apparatus and method for performing thin film layer thickness metrology by deforming a thin film layer into a reflective condenser
US5333049A (en) * 1991-12-06 1994-07-26 Hughes Aircraft Company Apparatus and method for interferometrically measuring the thickness of thin films using full aperture irradiation
US6809809B2 (en) * 2000-11-15 2004-10-26 Real Time Metrology, Inc. Optical method and apparatus for inspecting large area planar objects
JP4202841B2 (ja) 2003-06-30 2008-12-24 株式会社Ｓｕｍｃｏ 表面研磨装置
JP2009526240A (ja) 2006-02-09 2009-07-16 ケーエルエー−テンカー テクノロジィース コーポレイション ウエハの特性決定のための方法とシステム
US7463369B2 (en) * 2006-03-29 2008-12-09 Kla-Tencor Technologies Corp. Systems and methods for measuring one or more characteristics of patterned features on a specimen
JP5030604B2 (ja) * 2007-01-29 2012-09-19 セイコーインスツル株式会社 ウェハ外観検査装置
US8611639B2 (en) * 2007-07-30 2013-12-17 Kla-Tencor Technologies Corp Semiconductor device property extraction, generation, visualization, and monitoring methods
US7782452B2 (en) 2007-08-31 2010-08-24 Kla-Tencor Technologies Corp. Systems and method for simultaneously inspecting a specimen with two distinct channels
DE102011101416B4 (de) 2011-05-13 2016-06-16 MTU Aero Engines AG Dickenmessung einer Beschichtung eines rotierenden Bauteils unter Berücksichtigung der Wärmeausdehnung
JP2012251816A (ja) 2011-06-01 2012-12-20 Toshiba Mitsubishi-Electric Industrial System Corp 形状測定装置
US8843875B2 (en) * 2012-05-08 2014-09-23 Kla-Tencor Corporation Measurement model optimization based on parameter variations across a wafer
US9664625B2 (en) * 2012-09-28 2017-05-30 Rudolph Technologies, Inc. Inspection of substrates using calibration and imaging
JP6290637B2 (ja) 2014-01-30 2018-03-07 浜松ホトニクス株式会社 膜厚計測方法及び膜厚計測装置
US9658150B2 (en) 2015-01-12 2017-05-23 Kla-Tencor Corporation System and method for semiconductor wafer inspection and metrology
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TW200526925A (en) * 2003-09-15 2005-08-16 Zygo Corp Methods and systems for interferometric analysis of surfaces and related applications
TW200604491A (en) * 2004-07-15 2006-02-01 Zygo Corp Transparent film measurements
TW200700694A (en) * 2005-05-19 2007-01-01 Zygo Corp Method and system for analyzing low-coherence interferometry signals for information about thin film structures
US20090142673A1 (en) * 2007-12-04 2009-06-04 Wei Gao Semi-transparent film grayscale mask
US20120026492A1 (en) * 2010-07-30 2012-02-02 Jimin Zhang Detection of layer clearing using spectral monitoring

Also Published As

Publication number Publication date
WO2017172627A1 (en) 2017-10-05
CN109155263A (zh) 2019-01-04
TW201801216A (zh) 2018-01-01
WO2017172627A9 (en) 2018-11-22
CN109155263B (zh) 2023-06-02
IL261451A (en) 2018-12-31
US10563973B2 (en) 2020-02-18
DE112017001576T5 (de) 2018-12-20
JP6774501B2 (ja) 2020-10-28
IL261451B (en) 2022-03-01
KR102177682B1 (ko) 2020-11-11
DE112017001576B4 (de) 2025-12-11
KR20180121663A (ko) 2018-11-07
JP2019516239A (ja) 2019-06-13
US20170278236A1 (en) 2017-09-28

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