TWI728569B - Discharge polarization apparatus - Google Patents

Abstract

A polarization apparatus is described. The polarization apparatus includes a conductive carrier, a dielectric barrier discharge (DBD) plasma source, an electric net, an DBD power supply, and a DC power supply. The conductive carrier has a carrying surface which is configured to carry a work piece, in which the work piece includes a piezoelectric material film, and the conductive carrier is grounded. The DBD plasma source is disposed over the carrying surface and is configured to apply plasma toward the piezoelectric material film. The electric net is disposed between the carrying surface and the DBD plasma source. The DBD power supply includes a first electrode and a second electrode, in which the first electrode is electrically connected to the DBD plasma source, and the second electrode is grounded. The DC power supply includes a third electrode and a fourth electrode, in which the third electrode is electrically connected to the electric net, and the fourth electrode is grounded.

Description

Discharge polarization equipment

The present invention relates to a polarization technology of piezoelectric materials, and particularly relates to a polarization device.

In recent years, piezoelectric materials have been widely used. These applications include, for example, electronic product touch sensors, military aircraft echolocation, and ultrasonic buzzers. In order to meet the needs of special applications, piezoelectric materials must sometimes be made into thin films. Generally speaking, piezoelectric coating preparation, piezoelectric coating coating, and polarization treatment of the piezoelectric coating film are required to obtain a film with piezoelectric properties.

Because the molecular structure in piezoelectric materials is asymmetrical, the distribution of positively and negatively charged materials is uneven, resulting in partial positive and partial negative electrodes in the molecular structure. Such characteristics are the source of the polarity of piezoelectric materials, and the direction of polarity is defined as the direction from the local negative electrode to the local positive electrode. The region where the crystal lattice has the same polarity direction is called the electric domain.

The polarity directions of the electrical domains in piezoelectric materials often have no regularity and cancel each other out, which easily causes the entire piezoelectric material to have no polarity, and thus cannot exhibit the piezoelectric properties of the material itself. Therefore, it is usually necessary to perform a polarization process on the piezoelectric material in order to make the direction of the electric domain of the piezoelectric material consistent and exhibit piezoelectric characteristics.

The non-contact polarization technology uses a high electric field for polarization to arrange the molecules in the piezoelectric film neatly along the electric field distribution, so that the piezoelectric film exhibits piezoelectric properties. Since corona discharge is easy to generate and can provide the high electric field environment required for the polarization process, corona discharge technology is currently used to provide a source of electrons. In some polarization equipment using corona discharge technology, electrons will pass through a negative high-voltage grid before reaching the surface to be polarized.

However, the corona discharge polarization technology has many disadvantages. For example, an arc is prone to occur during corona discharge, and breakdown damages the workpiece to be polarized. In order to avoid arc generation, the electric field should not be too strong, which will cause the polarization effect or speed of the piezoelectric material to be limited. In addition, because corona discharge is characterized by partial discharge, such as single-point discharge or multi-point discharge, and is not uniform, there are many problems with processing blind areas or uneven polarization when processing large-area piezoelectric films. In order to improve the uniformity of the polarization process of the piezoelectric film, a transmission mechanism is generally used to move and/or rotate the electrode and/or the workpiece to be polarized, so that all the surfaces of the piezoelectric film on the workpiece to be polarized can fully Exposed in the discharge area. However, this method will lengthen the time of the entire polarization process, and when the size of the piezoelectric film is large, the rotation or movement mechanism requires more space to complete.

Therefore, one object of the present invention is to provide a polarization device that uses a dielectric barrier discharge (DBD) plasma source to replace the conventional corona discharge source, thereby generating a two-dimensional uniform Plasma can avoid the problems of polarization blind zone and uneven discharge, and can improve the uniformity of polarization.

Another object of the present invention is to provide a polarization device that can generate uniform plasma, so there is no need to add a moving mechanism and/or a rotation mechanism, and it does not need to lengthen the time of the polarization treatment, which not only speeds up the polarization, but also It can also reduce equipment costs and reduce equipment space required. Moreover, the polarization equipment can be applied to a batch polarization process, an in-line polarization process, and a continuous roll-to-roll polarization process, with a wide range of applications.

According to the above objective of the present invention, a polarization device is provided. This polarization device includes a conductive carrier, a dielectric shielded discharge plasma source, a power grid, a dielectric shielded discharge power supply or a pulsed DC power supply (commonly known as a ``dielectric shielded discharge power supply''), and DC Power Supplier. The conductive carrier has a carrying surface configuration to carry a workpiece, wherein the workpiece includes a piezoelectric material film, and the conductive carrier is grounded. The dielectric shielding discharge plasma source is arranged above the carrying surface and is configured to apply plasma to the piezoelectric material film. The power grid is arranged between the bearing surface and the dielectric shielding discharge plasma source. The dielectric shielding discharge power supply includes a first electrode and a second electrode, wherein the first electrode is electrically connected to the dielectric shielding discharge plasma source, and the second electrode is grounded. The DC power supply includes a third pole and a fourth pole, wherein the third pole is electrically connected to the power grid, and the fourth pole is grounded.

According to an embodiment of the present invention, the above-mentioned dielectric shielding discharge plasma source includes an electrode and a dielectric layer. The electrode is electrically connected to the first electrode. The dielectric layer is bonded to the bottom surface of the electrode.

According to an embodiment of the present invention, the above-mentioned power grid includes a grid-like structure or a plurality of cables, and the cables are arranged at a predetermined interval.

According to the above objective of the present invention, another polarization device is proposed. The polarization equipment includes a conductive carrier, a dielectric shielded discharge plasma source, a dielectric shielded discharge power supply, and a DC bias power supply. The conductive stage has a carrying surface configuration to carry a workpiece, and the workpiece includes a piezoelectric material film. The dielectric shielding discharge plasma source is arranged above the carrying surface and is configured to apply plasma to the piezoelectric material film. The dielectric shielding discharge power supply includes a first electrode and a second electrode, wherein the first electrode is electrically connected to the dielectric shielding discharge plasma source, and the second electrode is grounded. The DC bias power supply includes a fifth pole and a sixth pole, wherein the fifth pole is electrically connected to the conductive carrier, and the sixth pole is grounded to provide a bias voltage of the conductive carrier.

According to an embodiment of the present invention, the aforementioned polarization device further includes a power grid and a DC power supply. The power grid is arranged between the bearing surface and the dielectric shielding discharge plasma source. The DC power supply includes a third pole and a fourth pole, wherein the third pole is electrically connected to the power grid, and the fourth pole is grounded.

According to an embodiment of the present invention, the above-mentioned power grid includes a grid-like structure or a plurality of cables, and the cables are arranged at a predetermined interval.

According to the above objective of the present invention, another polarization device is proposed. The polarization device includes a cavity, a plurality of conductive stages, a plurality of dielectric shielded discharge plasma sources, a plurality of power grids, at least one dielectric shielded discharge power supply, and at least a DC power supply. The cavity has a cavity. The conductive stage is arranged in the chamber, wherein each conductive stage has a bearing surface configuration to carry a workpiece, each workpiece includes a piezoelectric material film, and the conductive stages are grounded. The dielectric shielding discharge plasma sources are arranged in the chamber, and are respectively arranged above the bearing surface, wherein these dielectric shielding discharge plasma sources are arranged to face the corresponding Plasma is applied to the piezoelectric material film on the bearing surface. The power grid is respectively arranged between the bearing surface and the corresponding dielectric shielding discharge plasma source. Each dielectric shielded discharge power supply includes a first pole and a second pole. The first pole is electrically connected to the dielectric shielded discharge plasma source, and the second pole is grounded. Each DC power supply includes a third pole and a fourth pole, the third pole is electrically connected to the power grid, and the fourth pole is grounded.

According to an embodiment of the present invention, each of the aforementioned power grids includes a grid-like structure or a plurality of cables, and the cables are arranged at a predetermined interval.

According to the above-mentioned object of the present invention, another polarization device is proposed. The polarization device includes a cavity, a plurality of conductive stages, a plurality of dielectric shielded discharge plasma sources, at least one dielectric shielded discharge power supply, and at least a DC bias power supply. The cavity has a cavity. The conductive stage is arranged in the cavity, wherein each conductive stage has a bearing surface configuration to carry a workpiece, and each workpiece includes a piezoelectric material film. The dielectric shielding discharge plasma sources are arranged in the chamber and are respectively arranged above the carrying surface, wherein the dielectric shielding discharge plasma sources are configured to apply plasma to the piezoelectric material film on the corresponding carrying surface. Each dielectric shielded discharge power supply includes a first pole and a second pole. The first pole is electrically connected to the dielectric shielded discharge plasma source, and the second pole is grounded. Each DC bias power supply includes a fifth pole and a sixth pole, the fifth pole is electrically connected to the conductive carrier, and the sixth pole is grounded to provide a bias voltage for each conductive carrier.

According to an embodiment of the present invention, the aforementioned polarization device further includes a plurality of power grids and at least a DC power supply. The power grid is arranged between the bearing surface and the dielectric shielding discharge plasma source. Each DC power supply includes a third pole and a fourth pole, wherein the third pole is electrically connected to the power grid, and the fourth pole is grounded.

According to an embodiment of the present invention, each of the aforementioned power grids includes a grid-like structure or a plurality of cables, and the cables are arranged at a predetermined interval.

According to the above-mentioned object of the present invention, another polarization device is proposed. The polarization device includes at least one conductive transmission mechanism, at least one dielectric shielded discharge plasma source, at least one power grid, at least one dielectric shielded discharge power supply, and at least a DC power supply. The conductive transmission mechanism is configured to carry a continuous workpiece in one direction, wherein the continuous workpiece includes a piezoelectric material film, and the conductive transmission mechanism is grounded. The dielectric shielding discharge plasma source is arranged above a predetermined section of the conductive transmission mechanism, and is configured to apply plasma to the piezoelectric material film passing through the predetermined section. The power grid is arranged between the predetermined section of the conductive transmission mechanism and the dielectric shielding discharge plasma source. Each dielectric shielded discharge power supply includes a first pole and a second pole, wherein the first pole is electrically connected to the dielectric shielded discharge plasma source, and the second pole is grounded. Each DC power supply includes a third pole and a fourth pole, wherein the third pole is electrically connected to the power grid, and the fourth pole is grounded.

According to an embodiment of the present invention, the above-mentioned conductive transmission mechanism includes a plurality of rollers, a conveyor belt, or a plurality of rollers and a conveyor belt arranged on the rollers.

According to an embodiment of the present invention, each of the above-mentioned power grids includes a grid-like structure or a plurality of cables, and the cables are arranged at a predetermined interval.

According to the above-mentioned object of the present invention, another polarization device is proposed. The polarization device includes at least one conductive transmission mechanism, at least one dielectric shielded discharge plasma source, at least one dielectric shielded discharge power supply, and at least a DC bias power supply. The conductive transfer mechanism is configured to carry a continuous workpiece in one direction, wherein the continuous workpiece includes a piezoelectric material film. Introduce The electric mass shielding discharge plasma source is arranged above a predetermined section of the conductive transmission mechanism, and is configured to apply plasma to the piezoelectric material film passing through the predetermined section. Each dielectric shielded discharge power supply includes a first pole and a second pole, wherein the first pole is electrically connected to the dielectric shielded discharge plasma source, and the second pole is grounded. Each DC bias power supply includes a fifth pole and a sixth pole, the fifth pole is electrically connected to the conductive transmission mechanism, and the sixth pole is grounded to provide a bias voltage for the conductive transmission mechanism.

According to an embodiment of the present invention, the above-mentioned conductive transmission mechanism includes a plurality of rollers, a conveyor belt, or a plurality of rollers and a conveyor belt arranged on the rollers.

According to an embodiment of the present invention, the aforementioned polarization device further includes at least one power grid and at least a DC power supply. The power grid is arranged between the predetermined section of the conductive transmission mechanism and the dielectric shielding discharge plasma source. Each DC power supply includes a third pole and a fourth pole, wherein the third pole is electrically connected to the power grid, and the fourth pole is grounded.

According to the above-mentioned object of the present invention, another polarization device is proposed. The polarization device includes a first roller, a dielectric shielded discharge plasma source, a power grid, a second roller, a dielectric shielded discharge power supply, and a DC power supply. The first roller is configured to roll a continuous workpiece, wherein the continuous workpiece includes a piezoelectric material film, and the first roller is grounded. The dielectric shielding discharge plasma source is arranged above the first roller and is configured to apply plasma to the piezoelectric material film. The power grid is arranged between the first roller and the dielectric shielding discharge plasma source. The second roller is configured to wind up the continuous workpiece from the first roller and passing through the plasma. The dielectric shielding discharge power supply includes a first electrode and a second electrode, wherein the first electrode is electrically connected to the dielectric shielding discharge plasma source, and the second electrode is grounded. DC power supply The inverter includes a third pole and a fourth pole, wherein the third pole is electrically connected to the power grid, and the fourth pole is grounded.

According to an embodiment of the present invention, the aforementioned continuous workpiece includes a conductive substrate, and a piezoelectric material film covers a surface of the conductive substrate.

According to an embodiment of the present invention, the aforementioned continuous workpiece is composed of a thin film of piezoelectric material.

According to the above-mentioned object of the present invention, another polarization device is proposed. The polarization device includes a first roller, a dielectric shielded discharge plasma source, a second roller, a dielectric shielded discharge power supply, and a DC bias power supply. The first roller is configured to roll a continuous workpiece, wherein the continuous workpiece includes a piezoelectric material film. The dielectric shielding discharge plasma source is arranged above the first roller and is configured to apply plasma to the piezoelectric material film. The second roller is configured to wind up the continuous workpiece from the first roller and passing through the plasma. The dielectric shielding discharge power supply includes a first electrode and a second electrode, wherein the first electrode is electrically connected to the dielectric shielding discharge plasma source, and the second electrode is grounded. The DC bias power supply includes a fifth pole and a sixth pole, wherein the fifth pole is electrically connected to the first roller, and the sixth pole is grounded to provide a bias of the first roller.

According to an embodiment of the present invention, the aforementioned polarization device further includes a power grid and a DC power supply. The power grid is arranged between the first roller and the dielectric shielding discharge plasma source. The DC power supply includes a third pole and a fourth pole, wherein the third pole is electrically connected to the power grid, and the fourth pole is grounded.

According to an embodiment of the present invention, the aforementioned continuous workpiece includes a conductive substrate and a piezoelectric material film covering the surface of the conductive substrate.

According to an embodiment of the present invention, the aforementioned continuous workpiece is composed of a thin film of piezoelectric material.

100a~100c‧‧‧Polarization equipment

110‧‧‧Conductive carrier

112‧‧‧Loading surface

120‧‧‧Electrically shielded discharge plasma source

122‧‧‧electrode

122a‧‧‧Bottom

124‧‧‧Dielectric layer

130‧‧‧Grid

132‧‧‧Opening

140‧‧‧Dielectric shielding discharge power supply

142‧‧‧First pole

144‧‧‧Second pole

150‧‧‧DC Power Supply

152‧‧‧Third pole

154‧‧‧Fourth pole

160‧‧‧Workpiece

162‧‧‧Substrate

162a‧‧‧surface

164‧‧‧Piezoelectric material film

170‧‧‧DC bias power supply

172‧‧‧Fifth pole

174‧‧‧Sixth pole

200a~200c‧‧‧Polarization equipment

300a~300c‧‧‧Polarization equipment

310‧‧‧Conductive transmission mechanism

312‧‧‧Preset section

320‧‧‧Continuous workpiece

322‧‧‧Substrate

322a‧‧‧surface

324‧‧‧Piezoelectric material film

330‧‧‧direction

400a~400c‧‧‧Polarization equipment

410‧‧‧First roller

420‧‧‧Second roller

430‧‧‧Continuous workpiece

432‧‧‧Conductive substrate

432a‧‧‧surface

434‧‧‧Piezoelectric material film

440‧‧‧direction

In order to make the above and other objectives, features, advantages and embodiments of the present invention more comprehensible, the description of the accompanying drawings is as follows:

[Figure 1] is a schematic diagram showing a polarization device according to the first embodiment of the present invention;

[Figure 2] is a schematic diagram showing a polarization device according to the second embodiment of the present invention;

[Figure 3] is a schematic diagram showing a polarization device according to the third embodiment of the present invention;

[Figure 4] is a schematic diagram showing a polarization device according to the fourth embodiment of the present invention;

[Figure 5] is a schematic diagram showing a polarization device according to the fifth embodiment of the present invention;

[FIG. 6] is a schematic diagram showing a polarization device according to the sixth embodiment of the present invention;

[FIG. 7] is a schematic diagram showing a polarization device according to the seventh embodiment of the present invention;

[FIG. 8] is a schematic diagram showing a polarization device according to the eighth embodiment of the present invention;

[FIG. 9] is a schematic diagram showing a polarization device according to the ninth embodiment of the present invention;

[FIG. 10] is a schematic diagram showing a polarization device according to the tenth embodiment of the present invention;

[FIG. 11] is a schematic diagram showing a polarization device according to the eleventh embodiment of the present invention; and

[Fig. 12] is a schematic diagram showing a polarization device according to the twelfth embodiment of the present invention.

The following disclosure provides many different implementations or examples to implement different features of the disclosed subject matter. The specific examples of components and arrangements described below are used to simplify the implementation of the present invention. Of course, these are only examples and are not intended to limit the present invention. For example, in the description, the first feature is formed on or on the second feature, which may include an embodiment in which the first feature and the second feature are formed in direct contact, or may include additional features that may be formed on the first feature. An implementation between a feature and a second feature, so that the first feature and the second feature may not directly contact.

In addition, spatial relative terms may be used in the manual, such as "beneath", "below", "lower", "above", "upper" and Similar terms are used to conveniently describe the relationship between one component or feature and another (other) component or feature as shown in the figure. In addition to the orientations depicted in the figures, these spatial relative terms are intended to encompass different orientations of components in use or operation. equipment/ The components may be positioned in different ways (rotated by 90 degrees or in other orientations), so the same way can be used to explain the spatial relative description used here.

In view of the fact that the conventional corona discharge electric polarization technology is prone to arcing and damage to the workpiece to be polarized, uneven discharge causes uneven polarization of the piezoelectric material, and additional movement or rotation or elongation of the transmission mechanism is required. The polarization process time and other methods can polarize large-area piezoelectric films and other shortcomings. Therefore, the present invention proposes a polarization device. The polarization device of the embodiment of the present invention replaces the conventional corona discharge source with a dielectric shielded discharge plasma source, so that a two-dimensional uniform plasma can be generated, and the uniformity of polarization can be improved. Due to the improvement of polarization uniformity, a large area of piezoelectric film can be effectively polarized without the use of a transmission mechanism or lengthening the time of polarization treatment. Therefore, it can not only accelerate the polarization speed, but also reduce the cost of equipment and reduce the cost of equipment. It needs space and has excellent applicability.

Please refer to FIG. 1, which is a schematic diagram of a polarization device according to the first embodiment of the present invention. The polarization device 100a can be used to perform polarization processing on the piezoelectric material film, so that the molecules in the piezoelectric material film are neatly arranged along the electric field distribution, thereby making the piezoelectric material film exhibit piezoelectric properties. In some embodiments, the polarization device 100 a mainly includes a conductive stage 110, a dielectric shielded discharge plasma source 120, a power grid 130, a dielectric shielded discharge power supply 140, and a DC power supply 150.

The conductive stage 110 may be made of metal, for example. In some examples, the conductive stage 110 may be a flat structure. The conductive stage 110 has a bearing surface 112. For example, as shown in FIG. 1, the carrying surface 112 of the conductive stage 110 may be the upper surface of the conductive stage 110. The conductive stage 110 is flat In an example of the structure, the bearing surface 112 is a flat surface. The carrying surface 112 of the conductive stage 110 is configured to carry the workpiece 160 to be polarized. In some examples, the conductive stage 110 is grounded.

The workpiece 160 includes a thin film 164 of piezoelectric material. For example, the piezoelectric material film 164 may include polymer piezoelectric materials such as polyvinylidene fluoride (PVDF), or piezoelectric ceramic materials such as lead zirconate titanate (PZT). In some examples, the workpiece 160 further includes a substrate 162, and the piezoelectric material film 164 covers the surface 162 a of the substrate 162. The substrate 162 may be made of, for example, a conductive material.

The dielectric shielding discharge plasma source 120 is disposed above the carrying surface 112 of the conductive carrier 110 and facing the carrying surface 112. The dielectric shielded discharge plasma source 120 is configured to apply plasma to the piezoelectric material film 164 of the workpiece 160 carried by the carrying surface 112. In some examples, the dielectric shielded discharge plasma source 120 may include an electrode 122 and a dielectric layer 124. The electrode 122 is made of conductive material. The electrode 122 may be, for example, a plate-shaped structure. The electrode 122 has a bottom surface 122a. In the example where the electrode 122 is a flat structure, the bottom surface 122a of the electrode 122 is a flat surface. The dielectric layer 124 covers and is bonded to the bottom surface 122 a of the electrode 122 and faces the carrying surface 112. In this way, the plasma generated from the dielectric layer 124 of the dielectric shielding discharge plasma source 120 can face the carrying surface 112 of the conductive carrier 110.

Please continue to refer to FIG. 1, the power grid 130 is disposed between the carrying surface 112 of the conductive carrier 110 and the dielectric layer 124 of the dielectric shielding discharge plasma source 120. In some exemplary examples, the power grid 130 is adjacent to the carrying surface 112 of the conductive carrier 110. In some examples, the power grid 130 is horizontally disposed above the carrying surface 112 of the conductive carrier 110. The extension direction of the power grid 130 can be, for example, substantially parallel to the The bearing surface 112 of the electric carrier 110. The power grid 130 has a number of openings 132, and the openings 132 can be evenly penetrated in the power grid 130, for example. The grid 130 may include a grid-like structure. In some examples, the power grid 130 may include a plurality of cables, and the cables are arranged at a predetermined interval. For example, the preset spacing between the flat wires is about 1 mm to about 10 mm.

The dielectric shielded discharge power supply 140 is configured to supply power to the dielectric shielded discharge plasma source 120. The dielectric shielded discharge power supply 140 can supply alternating current or pulsed direct current to the dielectric shielded discharge plasma source 120. The dielectric shielded discharge power supply 140 may include a first pole 142 and a second pole 144, wherein the first pole 142 and the second pole 144 have different potentials. The first electrode 142 of the dielectric shielded discharge power supply 140 is electrically connected to the electrode 122 of the dielectric shielded discharge plasma source 120, and the second electrode 144 can be grounded.

The DC power supply 150 is configured to supply power to the grid 130. The DC power supply 150 may include a third pole 152 and a fourth pole 154, wherein the third pole 152 and the fourth pole 154 have different electric potentials. The third pole 152 of the DC power supply 150 is electrically connected to the power grid 130, and the fourth pole 154 can be grounded.

When the dielectric shielded discharge plasma source 120 sprays plasma toward the carrying surface 112 of the conductive carrier 110, the grid 130 can filter one type of electrical charge in the plasma, and make another type of electrical charge in the plasma pass through the grid The opening 132 of the 130 reaches the piezoelectric material film 164 of the workpiece 160 above the carrying surface 112 of the conductive stage 110 to perform a polarization process on the piezoelectric material film 164. For example, part of the electrons in the plasma can pass through the opening 132 of the power grid 130 to polarize the piezoelectric material film 164.

Since the dielectric shielded discharge plasma source 120 can generate a two-dimensional uniform plasma, it can improve the uniformity of the polarization of the piezoelectric material film 164, and it is effective without the use of a transmission mechanism or lengthening the time of the polarization treatment. A large-area piezoelectric film is polarized. Therefore, the application of the polarization device 100a can not only accelerate the polarization speed, but also reduce the cost of the device and the space required for the device.

Please refer to FIG. 2, which is a schematic diagram of a polarization device according to the second embodiment of the present invention. The structure of the polarization device 100b is similar to the structure of the polarization device 100a of the above-mentioned embodiment. The difference between the two is that there is no difference between the dielectric shielding discharge plasma source 120 and the conductive stage 110 of the polarization device 100b. The power grid is set, and the polarization device 100b further includes a DC bias power supply 170 to bias the conductive stage 110.

As shown in FIG. 2, the DC bias power supply 170 includes a fifth pole 172 and a sixth pole 174, wherein the fifth pole 172 and the sixth pole 174 have different potentials. The fifth pole 172 of the DC bias power supply 170 is electrically connected to the conductive carrier 110, and the sixth pole 174 can be grounded to provide a bias voltage for the pilot point carrier 110. Therefore, unlike the filtering method used by the polarization device 100a, the polarization device 100b uses a bias voltage applied to the conductive stage 110 to absorb a different electrical charge from the conductive stage 110 to polarize the piezoelectric material film 164 Process. For example, the conductive stage 110 that is positively charged due to the power applied by the DC bias power supply 170 can absorb the negatively charged charges in the plasma, thereby polarizing the voltage carried on the conductive stage 110 Electrical material film 164.

Please refer to FIG. 3, which is a schematic diagram of a polarization device according to the third embodiment of the present invention. The architecture of the polarization device 100c is similar to the architecture of the polarization device 100b in the above embodiment, and the difference between the two is In addition, a power grid 130 is further provided between the dielectric shielded discharge plasma source 120 of the polarization device 100c and the conductive stage 110, and the polarization device 100c also includes a DC power supply 150 for applying power to the power grid 130. Like the polarization device 100a in FIG. 1, the third pole 152 of the DC power supply 150 is electrically connected to the power grid 130, and the fourth pole 154 is grounded.

The polarization device 100c combines the charge filtering method of the polarization device 100a of the above-mentioned embodiment and the attracting charge method of the polarization device 100b, which can more efficiently cause the dielectric shielding discharge plasma source 120 to contain one in the plasma generated by the plasma source 120 A specific electrical charge, such as a negatively charged charge, moves to the piezoelectric material film 164 carried on the conductive stage 110, thereby polarizing the piezoelectric material film 164.

The polarization equipment of the present invention can also perform a batch-type polarization process. Please refer to FIG. 4, which is a schematic diagram of a polarization device according to the fourth embodiment of the present invention. The polarization device 200a includes a cavity 210, a plurality of conductive stages 110, a plurality of dielectric shielded discharge plasma sources 120, a plurality of power grids 130, at least one dielectric shielded discharge power supply 140, and at least a DC Power supply 150.

In the polarization device 200 a, the cavity 210 has a cavity 212. The cavity 212 can accommodate the conductive stage 110, the dielectric shielded discharge plasma source 120, and the power grid 130, and the dielectric shielded discharge power supply 140 and the DC power supply 150 are provided in the cavity 212 of the cavity 210 outer. In some examples, the dielectric shielded discharge power supply 140 and the DC power supply 150 can also be accommodated in the cavity 212. The cavity 210 may be a closed cavity or an open cavity, so the cavity 212 may be a closed space or an open space.

The conductive stage 110 is disposed in the cavity 212 of the cavity 210, and each conductive stage 110 has a bearing surface 112 that can carry the workpiece 160, so that the piezoelectric material film 164 of the workpiece 160 can be polarized in the cavity 212 Process. The structure of the conductive stage 110 and the workpiece 160 has been described in the above-mentioned embodiment, and will not be repeated here. In this embodiment, these conductive stages 110 can be grounded. These conductive stages 110 can be connected to a set of ground wires in parallel. In other examples, the conductive stages 110 may be connected to multiple sets of grounding wires, respectively. These conductive stages 110 can be static, move back and forth, or rotate during the polarization process.

The dielectric shielded discharge plasma source 120 is also disposed in the cavity 212 of the cavity 210, and respectively corresponds to the conductive carrier 110, and is respectively located above the carrying surface 112 of the corresponding conductive carrier 110. Thereby, the dielectric shielded discharge plasma source 120 can apply plasma to the piezoelectric material film 164 of the workpiece 160 carried on the carrying surface 112 of the corresponding conductive stage 110.

The power grid 130 is respectively arranged between the bearing surface 112 of the conductive carrier 110 and the dielectric layer 124 of the corresponding dielectric shielding discharge plasma source 120. In some exemplary examples, the number of the power grid 130, the conductive carrier 110, and the dielectric shielded discharge plasma source 120 are the same. The power grids 130 are transversely arranged above the carrying surface 112 of the conductive carrier 110 and can be respectively adjacent to the corresponding carrying surface 112 of the conductive carrier 110. The power grid 130 has many openings 132 evenly pierced in the power grid 130. The power grid 130 may, for example, include a grid-like structure or a plurality of cables arranged at a predetermined interval. The structure and arrangement of the power grid 130, the conductive carrier 110, and the dielectric shielded discharge plasma source 120 are similar to the above-mentioned embodiments, and will not be repeated here.

The polarization device 200a may include one or more dielectric shielded discharge power supplies 140. For example, as shown in FIG. 4, the polarization device 200a includes a plurality of dielectric shielded discharge power supplies 140, and the number of these dielectric shielded discharge power supplies 140 is equivalent to the dielectric shielded discharge plasma source 120 The number is the same. In such an example, the dielectric shielded discharge power supply 140 is configured to respectively supply power to the corresponding dielectric shielded discharge plasma source 120. In an example in which the polarization device 200a has only one dielectric shielded discharge power supply 140, the dielectric shielded discharge power supply 140 can supply power to all the dielectric shielded discharge plasma sources 120. The electrodes 122 of the dielectric shielded discharge plasma source 120 are connected to the dielectric shielded discharge power supply 140 in parallel. Each dielectric shielded discharge power supply 140 may include a first electrode 142 and a second electrode 144 with different potentials, wherein the first electrode 142 is electrically connected to the electrode 122 of the dielectric shielded discharge plasma source 120. Diode 144 can be grounded.

The polarization device 200a may include one or more DC power supplies 150. For example, as shown in FIG. 4, the polarization device 200 a includes a plurality of DC power supplies 150, and the number of these DC power supplies 150 is the same as the number of the power grid 130. In such an example, the DC power supply 150 is configured to supply power to the corresponding grid 130 respectively. In an example where the polarization device 200a has only one DC power supply 150, the DC power supply 150 can supply power to all the power grids 130, and the power grids 130 are connected to the DC power supply 150 in parallel. The DC power supply 150 may include a third pole 152 and a fourth pole 154 having different potentials, wherein the third pole 152 is electrically connected to the power grid 130, and the fourth pole 154 can be grounded.

With this design, the polarization process of the piezoelectric material film 164 of multiple workpieces 160 can be performed at the same time to achieve the effect of the batch-type polarization process, and the polarization efficiency can be greatly improved.

Please refer to FIG. 5, which is a schematic diagram of a polarization device according to the fifth embodiment of the present invention. The structure of the polarization device 200b in this embodiment is similar to the structure of the polarization device 200a. The difference between the two is that the dielectric shielding discharge plasma source 120 of the polarization device 200b and the conductive stage 110 are not The power grid is set, and the polarization device 200b further includes at least one DC bias power supply 170 to bias the conductive stage 110.

The polarization device 200b may include one or more DC bias power supplies 170. In some examples, as shown in FIG. 5, the polarization device 200 b includes a plurality of DC bias power supplies 170, and the number of these DC bias power supplies 170 is the same as the number of conductive stages 110. In such an example, the DC bias power supply 170 is configured to supply power to the corresponding conductive stage 110 respectively. In the example in which the polarization device 200a has only one DC bias power supply 170, the DC bias power supply 170 can supply power to all the conductive stages 110, and these conductive stages 110 are connected in parallel with the DC power supply. The bias power supply 170 is connected. The DC bias power supply 170 includes a fifth pole 172 and a sixth pole 174 with different potentials. The fifth pole 172 is electrically connected to the conductive carrier 110, and the sixth pole 174 can be grounded to provide a bias of the conducting point carrier 110. Pressure. Therefore, the polarization device 200b applies a bias voltage to the guide point carrier 110 to absorb electric charges different from the guide point carrier 110 to perform the polarization process of the piezoelectric material film 164.

Please refer to FIG. 6, which is a schematic diagram of a polarization device according to the sixth embodiment of the present invention. The structure of the polarization device 200c is similar to the structure of the polarization device 200b in the above embodiment. The difference between the two is that each dielectric shielding discharge plasma source 120 of the polarization device 200c and the corresponding conductive stage 110 There is a power grid 130 therebetween, and the polarization device 200c further includes at least one DC power supply 150 for applying power to the power grids 130. Like the polarization device 200a in FIG. 4, the third pole 152 of the DC power supply 150 is electrically connected to the power grid 130, and the fourth pole 154 is grounded. The structure and design of the DC power supply 150 of the polarization device 200c are the same as the structure and design of the DC power supply 150 of the polarization device 200a, and will not be repeated here.

The polarization device 200c combines the filtering charge method of the polarization device 200a of the above embodiment and the attracting charge method of the polarization device 200b, which can more efficiently shield all dielectrics from the plasma generated by the discharge plasma source 120. A specific electrical charge moves to the piezoelectric material film 164 carried on the corresponding conductive stage 110, thereby polarizing the piezoelectric material film 164 in a batch manner.

The polarization equipment of the present invention can also perform a continuous polarization process. Please refer to FIG. 7, which is a schematic diagram of a polarization device according to the seventh embodiment of the present invention. In some embodiments, the polarization device 300a includes at least one conductive transmission mechanism 310, at least one dielectric shielded discharge plasma source 120, at least one power grid 130, at least one dielectric shielded discharge power supply 140, and at least a constant Stream power supply 150. The polarization device 300a can be used to perform a polarization process on the continuous workpiece 320. The continuous workpiece 320 includes a piezoelectric material film 324. The piezoelectric material film 324 may, for example, comprise polyvinylidene fluoride Polymer piezoelectric materials such as olefin, or piezoelectric ceramic materials such as lead zirconate titanate. In some examples, the continuous workpiece 320 further includes a substrate 322, wherein the piezoelectric material film 324 covers the surface 322 a of the substrate 322. The substrate 322 may be made of, for example, a conductive material.

The polarization device 300a includes one or more conductive transmission mechanisms 310. For example, as shown in FIG. 7, the polarization device 300a includes a plurality of conductive transmission mechanisms 310, and these conductive transmission mechanisms 310 are a plurality of rollers. In other examples, the polarization device 300a may include a single conveying mechanism, such as a conveyor belt, which is conductive. In other examples, the conductive transmission mechanism of the polarization device 300a may include a combination of several rollers and a conveyor belt, wherein the conveyor belt is arranged on the rollers. The conductive transport mechanism 310 is configured to carry the continuous workpiece 320 in one direction 330. In this embodiment, these conductive transmission mechanisms 310 can be grounded.

The polarization device 300 a may include one or more dielectric shielded discharge plasma sources 120. The dielectric shielding discharge plasma source 120 is disposed above the predetermined section 312 of the conductive transmission mechanism 310. For example, the predetermined section 312 of the conductive transmission mechanism 310 may be a downstream section of the conductive transmission mechanism 310. Thereby, the dielectric shielded discharge plasma source 120 can apply plasma to the piezoelectric material film 324 carried by the conductive transmission mechanism 310 and passed through the predetermined section 312 of the conductive transmission mechanism 310.

The polarization device 300 a may include one or more power grids 130. The power grid 130 is disposed above the predetermined section 312 of the conductive transmission mechanism 310 and between the predetermined section 312 of the conductive transmission mechanism 310 and the dielectric shielding discharge plasma source 120. In some demonstrative examples, the grid 130 and the dielectric shield discharge The number of plasma sources 120 is the same. The power grid 130 is horizontally disposed above the predetermined section 312 of the conductive transmission mechanism 310 and may be adjacent to the conductive transmission mechanism 310. The power grid 130 may, for example, include a grid-like structure or a plurality of cables arranged at a predetermined interval. The structure and arrangement of the power grid 130 and the dielectric shielded discharge plasma source 120 are similar to the above-mentioned embodiments, and will not be repeated here.

Please continue to refer to FIG. 7, the polarization device 300 a may include one or more dielectric shielded discharge power supplies 140. The number of the dielectric shielded discharge power supply 140 may be the same as the number of the dielectric shielded discharge plasma source 120, for example. The dielectric shielded discharge power supply 140 is configured to supply power to the dielectric shielded discharge plasma source 120. The dielectric shielded discharge power supply 140 includes a first electrode 142 and a second electrode 144. The first electrode 142 is electrically connected to the electrode 122 of the dielectric shielded discharge plasma source 120, and the second electrode 144 is grounded.

The polarization device 300a may include one or more DC power supplies 150. The DC power supply 150 and the grid 130 may have the same number. The DC power supply 150 includes a third pole 152 and a fourth pole 152 with different potentials. The third pole 152 is electrically connected to the power grid 130, and the fourth pole 154 can be grounded.

With this design, when the conductive transmission mechanism 310 carries the continuous workpiece 320 in the direction 330, the dielectric shielded discharge plasma source 120 can resist the pressure of the continuous workpiece 320 passing through the preset section 312 through the power grid 130. The electrical material film 324 is applied with plasma to perform a polarization process on the piezoelectric material film 324 passing through the predetermined section 312. Therefore, the piezoelectric material film 324 of the continuous workpiece 320 can be continuously polarized.

Please refer to FIG. 8, which is a schematic diagram of a polarization device according to the eighth embodiment of the present invention. The structure of the polarization device 300b of this embodiment is similar to the structure of the polarization device 300a. The difference between the two is that the dielectric shielding discharge plasma source 120 of the polarization device 300b and the conductive transfer mechanism 310 are not The power grid is set, and the polarization device 300b further includes at least one DC bias power supply 170 to bias the conductive transmission mechanism 310.

As shown in FIG. 8, the DC bias power supply 170 includes a fifth pole 172 and a sixth pole 174, wherein the fifth pole 172 and the sixth pole 174 have different electric potentials. The fifth pole 172 of the DC bias power supply 170 is electrically connected to the conductive transmission mechanism 310, and the sixth pole 174 can be grounded to provide the conductive transmission mechanism 310 with a bias voltage. Thereby, the polarization device 300b can apply a bias voltage to the conductive transmission mechanism 310 to absorb charges of different electrical properties from the conductive transmission mechanism 310, and continuously perform the polarization process of the piezoelectric material film 324.

Please refer to FIG. 9, which is a schematic diagram of a polarization device according to a ninth embodiment of the present invention. The structure of the polarization device 300c is similar to the structure of the polarization device 300b of the above-mentioned embodiment. The difference between the two is that the dielectric shielding discharge plasma source 120 of the polarization device 300c and the conductive transmission mechanism 310 are arranged There is a power grid 130, and the polarization device 300c further includes at least one DC power supply 150 for applying power to the power grid 130. Like the polarization device 300a in FIG. 7, the third pole 152 of the DC power supply 150 is electrically connected to the power grid 130, and the fourth pole 154 is grounded. The structure and design of the DC power supply 150 of the polarization device 300c are the same as the structure and design of the DC power supply 150 of the polarization device 300a, and will not be repeated here.

The polarization device 300c combines the filtering charge method of the polarization device 300a of the above-mentioned embodiment and the attracting charge method of the polarization device 300b, which can more efficiently cause the dielectric shielding discharge plasma source 120 to contain one in the plasma generated by the plasma source 120 The specific electrical charge moves to the piezoelectric material film 324 of the continuous work piece 320 carried by the conductive transfer mechanism 310, so that the piezoelectric material film 324 can be continuously polarized.

The polarization equipment of the present invention can also perform a continuous roll-to-roll polarization process. Please refer to FIG. 10, which is a schematic diagram of a polarization device according to the tenth embodiment of the present invention. The polarization device 400a may mainly include a first roller 410, a dielectric shielded discharge plasma source 120, a power grid 130, a second roller 420, a dielectric shielded discharge power supply 140, and a DC power supply 150. The polarization device 400a can be used to perform a polarization process on the continuous workpiece 430. The continuous workpiece 430 includes a piezoelectric material film 434. The piezoelectric material film 434 may include, for example, a polymer piezoelectric material such as polyvinylidene fluoride, or a piezoelectric ceramic material such as lead zirconate titanate. In some examples, the continuous workpiece 430 may further include a conductive substrate 432, wherein the piezoelectric material film 434 covers the surface 432 a of the conductive substrate 432. In this embodiment, the continuous workpiece 430 may be composed of only the piezoelectric material film 434, or may include the conductive substrate 432 and the piezoelectric material film 434.

The first roller 410 is configured to roll the continuous workpiece 430, and the first roller 410 can rotate in a direction 440. In the example of FIG. 10, the direction 440 is counterclockwise. In other examples, the first roller 410 can rotate in a clockwise direction. The first roller 410 can drive the continuous workpiece 430 revolutions while rotating move. In this embodiment, the first roller 410 is made of conductive material, and the first roller 410 can be grounded.

The dielectric shielding discharge plasma source 120 is arranged above the first roller 410. Thereby, the dielectric shielding discharge plasma source 120 can apply plasma to the piezoelectric material film 434 carried by the first roller 410 and through the piezoelectric material film 434 under the dielectric shielding discharge plasma source 120.

The second roller 420 is configured to wind up the continuous workpiece 430 of plasma from the first roller 410 and applied by the dielectric shielding discharge plasma source 120. The second roller 420 can also rotate in the direction 440. The second roller 420 can wind the continuous workpiece 430 from the first roller 410 while rotating, so as to achieve a continuous roll-to-roll polarization process.

The power grid 130 is arranged above the first roller 410 and between the first roller 410 and the dielectric shielding discharge plasma source 120. The power grid 130 is transversely disposed above the first roller 410 and extends along the length of the first roller 410, and may be adjacent to the first roller 410. The power grid 130 may, for example, include a grid-like structure or a plurality of cables arranged at a predetermined interval. The structure and arrangement of the power grid 130 and the dielectric shielded discharge plasma source 120 are similar to the above-mentioned embodiments, and will not be repeated here.

The dielectric shielded discharge power supply 140 is configured to supply power to the dielectric shielded discharge plasma source 120. The dielectric shielded discharge power supply 140 includes a first electrode 142 and a second electrode 144. The first electrode 142 is electrically connected to the electrode 122 of the dielectric shielded discharge plasma source 120, and the second electrode 144 is grounded. The DC power supply 150 includes a third pole 152 with different potentials and The fourth pole 152, wherein the third pole 152 is electrically connected to the power grid 130, and the fourth pole 154 can be grounded.

With this design, when the first roller 410 rotates along the direction 440 with the continuous workpiece 430, the dielectric shielded discharge plasma source 120 can pass through the power grid 130 to protect the dielectric shielded discharge plasma source 120 underneath. Plasma is applied to the piezoelectric material film 434 of the continuous workpiece 430 to perform a polarization process on the piezoelectric material film 434. Therefore, the piezoelectric material film 434 of the continuous workpiece 430 can be continuously polarized in a roll-to-roll manner.

Please refer to FIG. 11, which is a schematic diagram of a polarization device according to the eleventh embodiment of the present invention. The architecture of the polarization device 400b in this embodiment is similar to that of the polarization device 400a. The difference between the two is that the dielectric shielding discharge plasma source 120 of the polarization device 400b and the first roller 410 are not The power grid is set, and the polarization device 400b further includes a DC bias power supply 170 to bias the first roller 410.

The DC bias power supply 170 includes a fifth pole 172 and a sixth pole 174, wherein the fifth pole 172 and the sixth pole 174 have different potentials. The fifth pole 172 of the DC bias power supply 170 is electrically connected to the first roller 410, and the sixth pole 174 can be grounded, so as to provide the first roller 410 with a bias voltage. In this way, the polarization device 400b can apply a bias to the first roller 410 to absorb a different electrical charge from that of the first roller 410, and continuously perform the polarization process of the piezoelectric material film 434 on a roll-to-roll basis.

Please refer to FIG. 12, which is a schematic diagram of a polarization device according to the twelfth embodiment of the present invention. The architecture of the polarization device 400c is similar to the architecture of the polarization device 400b in the above embodiment, and the difference between the two is The difference is that a power grid 130 is further provided between the dielectric shielded discharge plasma source 120 of the polarization device 400c and the first roller 410, and the polarization device 400c further includes a DC power supply 150 for applying power to the power grid 130. Like the polarization device 400a in FIG. 10, the third pole 152 of the DC power supply 150 is electrically connected to the power grid 130, and the fourth pole 154 is grounded. The structure and design of the DC power supply 150 of the polarization device 400c are the same as the structure and design of the DC power supply 150 of the polarization device 400a, and will not be repeated here.

The polarization device 400c combines the filtering charge method of the polarization device 400a of the above embodiment and the attracting charge method of the polarization device 400b, which can more efficiently make the dielectric shielding discharge plasma source 120 generate a plasma. The specific electrical charge moves to the piezoelectric material film 434 of the continuous workpiece 430 rolled by the first roller 410, so that the piezoelectric material film 434 can be continuously polarized in a roll-to-roll manner.

It can be seen from the above-mentioned embodiments that one of the advantages of the present invention is that because the polarization device of the present invention replaces the conventional corona discharge source with a dielectric shielded discharge plasma source, it can generate a two-dimensional uniform plasma, so it can Avoid the problems of polarization blind zone and uneven discharge, and can improve the uniformity of polarization.

As can be seen from the above-mentioned embodiments, another advantage of the present invention is that because the polarization equipment of the present invention can generate uniform plasma, there is no need to add a moving mechanism and/or a rotating mechanism, and there is no need to lengthen the time of polarization treatment. The polarization speed can be accelerated, and the equipment cost and the space required for the equipment can be reduced. Moreover, the polarization equipment can be applied to batch polarization process, continuous polarization process, continuous roll-to-roll polarization process, and has a wide range of applications.

Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in this technical field can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention shall be subject to those defined by the attached patent application scope.

100a: Polarization equipment

110: Conductive stage

112: bearing surface

120: Electrically shielded discharge plasma source

122: Electrode

122a: bottom surface

124: Dielectric layer

130: Grid

132: Opening

140: Dielectric shielding discharge power supply

142: The first pole

144: second pole

150: DC power supply

152: The Third Pole

154: The Fourth Pole

160: Workpiece

162: Substrate

162a: Surface

164: Piezoelectric material film

Claims (24)

A discharge polarization equipment includes: a conductive carrier with a bearing surface configured to carry a workpiece, wherein the workpiece includes a piezoelectric material film, and the conductive carrier is grounded; a dielectric shielding discharge plasma source, Set above the bearing surface and configured to apply plasma to the piezoelectric material film; a power grid is set between the bearing surface and the dielectric shielded discharge plasma source; a dielectric shielded discharge power supply The device includes a first pole and a second pole, wherein the first pole is electrically connected to the dielectric shielding discharge plasma source, and the second pole is grounded; and a DC power supply including a third pole and A fourth pole, wherein the third pole is electrically connected to the power grid, and the fourth pole is grounded. For example, the discharge polarization device of the first item of the scope of patent application, wherein the dielectric shielding discharge plasma source includes: an electrode electrically connected to the first electrode; and a dielectric layer bonded to a bottom surface of the electrode . For example, in the first item of the scope of the patent application, the electric discharge polarization device, wherein the power grid includes a grid-like structure or a plurality of cables, and the cables are arranged at a predetermined interval. A discharge polarization equipment, including: A conductive stage with a carrying surface configured to carry a workpiece, wherein the workpiece includes a piezoelectric material film; a dielectric shielding discharge plasma source is arranged above the carrying surface and arranged to face the piezoelectric The material film applies plasma; a dielectric shielded discharge power supply includes a first pole and a second pole, wherein the first pole is electrically connected to the dielectric shielded discharge plasma source, and the second pole is grounded And a DC bias power supply, including a fifth pole and a sixth pole, wherein the fifth pole is electrically connected to the conductive carrier, and the sixth pole is grounded to provide a bias voltage for the conductive carrier. For example, the discharge polarization equipment of item 4 of the scope of patent application further includes: a power grid arranged between the carrying surface and the dielectric shielding discharge plasma source; and a DC power supply including a third electrode and A fourth pole, wherein the third pole is electrically connected to the power grid, and the fourth pole is grounded. For example, the discharge polarization equipment of item 5 of the scope of patent application, wherein the power grid includes a grid-like structure or a plurality of cables, and the cables are arranged at a predetermined interval. A discharge polarization device, comprising: a cavity with a chamber; A plurality of conductive stages are arranged in the cavity, wherein each of the conductive stages has a bearing surface configuration to carry a workpiece, each of the workpieces includes a piezoelectric material film, and the conductive stages are grounded; A plurality of dielectric shielding discharge plasma sources are arranged in the chamber and are respectively arranged above the carrying surfaces, wherein the dielectric shielding discharge plasma sources are arranged to face the corresponding carrying surfaces Plasma is applied to the piezoelectric material films; a plurality of power grids are respectively arranged between the bearing surfaces and the corresponding dielectric shielded discharge plasma sources; at least one dielectric shielded discharge power supply, wherein Each of the at least one dielectric shielded discharge power supply includes a first pole and a second pole, the first pole is electrically connected to the dielectric shielded discharge plasma sources, and the second pole is grounded; and at least A DC power supply, wherein each of the at least DC power supply includes a third pole and a fourth pole, the third pole is electrically connected to the power grids, and the fourth pole is grounded. For example, the discharge polarization equipment of the seventh item in the scope of the patent application, wherein each of the power grids includes a grid-like structure or a plurality of cables, and the cables are arranged at a predetermined interval. A discharge polarization device, comprising: a cavity with a chamber; A plurality of conductive stages are arranged in the chamber, wherein each of the conductive stages has a bearing surface configured to carry a workpiece, and each of the workpieces includes a piezoelectric material film; a plurality of dielectrics shield the discharge current The plasma source is arranged in the chamber and respectively correspondingly arranged above the bearing surfaces, wherein the dielectric shielding discharge plasma sources are arranged to apply to the piezoelectric material films on the corresponding bearing surfaces Plasma; at least one dielectric shielded discharge power supply, wherein each of the at least one dielectric shielded discharge power supply includes a first pole and a second pole, the first pole is electrically connected to the dielectric A mass shielding discharge plasma source, the second pole is grounded; and at least a DC bias power supply, wherein each of the at least DC bias power supply includes a fifth pole and a sixth pole, the fifth pole The conductive stages are electrically connected, and the sixth pole is grounded to provide a bias voltage for each of the conductive stages. For example, the discharge polarization equipment of item 9 of the scope of patent application further includes: a plurality of power grids arranged between the carrying surface and the dielectric shielded discharge plasma source; and at least a DC power supply, wherein each of the At least the DC power supply includes a third pole and a fourth pole, wherein the third pole is electrically connected to the power grids, and the fourth pole is grounded. For example, the discharge polarization equipment of the tenth item of the scope of patent application, wherein each of the grids includes a grid structure or a plurality of cables, and the cables are arranged at a predetermined interval. A discharge polarization device includes: at least one conductive transmission mechanism configured to carry a continuous workpiece in one direction, wherein the continuous workpiece includes a piezoelectric material film, and the at least one conductive transmission mechanism is grounded; at least one dielectric The mass shielding discharge plasma source is arranged above a predetermined section of the at least one conductive transmission mechanism, and is configured to apply plasma to the piezoelectric material film passing through the predetermined section; at least one power grid is arranged at Between the predetermined section of the at least one conductive transmission mechanism and the at least one dielectric shielded discharge plasma source; at least one dielectric shielded discharge dielectric shielded discharge power supply, wherein each of the at least one dielectric shielded discharge plasma source The electrical shielding discharge power supply includes a first electrode and a second electrode, wherein the first electrode is electrically connected to the at least one dielectric shielding discharge plasma source, and the second electrode is grounded; and at least a DC power supply is supplied Each of the at least DC power supply includes a third pole and a fourth pole, wherein the third pole is electrically connected to the at least one power grid, and the fourth pole is grounded. For example, the discharge polarization equipment of the 12th patent application, wherein the at least one conductive transmission mechanism includes a plurality of rollers, a conveyor belt, or a plurality of rollers and a conveyor belt arranged on the rollers. For example, the discharge polarization device of item 12 of the scope of patent application, wherein each of the at least one power grid includes a grid-like structure or a plurality of cables, and the cables are arranged at a predetermined interval. A discharge polarization device, comprising: at least one conductive transmission mechanism configured to carry a continuous workpiece in one direction, wherein the continuous workpiece includes a piezoelectric material film; at least one dielectric shielding discharge plasma source is arranged in The at least one conductive transmission mechanism is above a predetermined section and is configured to apply plasma to the piezoelectric material film passing through the predetermined section; at least one dielectric shielding discharge power supply, wherein each of the At least one dielectric shielded discharge power supply includes a first pole and a second pole, wherein the first pole is electrically connected to the at least one dielectric shielded discharge plasma source, and the second pole is grounded; and at least one DC bias power supplies, wherein each of the at least DC bias power supplies includes a fifth pole and a sixth pole, the fifth pole is electrically connected to the at least one conductive transmission mechanism, and the sixth pole is grounded, To provide the at least one conductive transmission mechanism with a bias voltage. For example, the discharge polarization equipment of item 15 of the scope of patent application, wherein the at least one conductive transmission mechanism includes a plurality of rollers, a conveyor belt, or a plurality of rollers and a conveyor belt arranged on the rollers. For example, the discharge polarization equipment of item 15 of the scope of patent application includes: At least one power grid is provided between the predetermined section of the at least one conductive transmission mechanism and the at least one dielectric shielded discharge plasma source; and at least a DC power supply, wherein each of the at least DC power supplies The device includes a third pole and a fourth pole, wherein the third pole is electrically connected to the at least one power grid, and the fourth pole is grounded. A discharge polarization equipment includes: a first roller configured to roll a continuous workpiece, wherein the continuous workpiece includes a piezoelectric material film, and the first roller is grounded; a dielectric shielding discharge plasma source, Is arranged above the first roller and configured to apply plasma to the piezoelectric material film; a power grid is arranged between the first roller and the dielectric shielding discharge plasma source; and a second roller is arranged To wind the continuous workpiece from the first roller and passing through the plasma; a dielectric shielded discharge power supply, including a first pole and a second pole, wherein the first pole is electrically connected to the dielectric The electrical shielding discharge plasma source, the second pole is grounded; and the DC power supply includes a third pole and a fourth pole, wherein the third pole is electrically connected to the power grid, and the fourth pole is grounded. For example, the discharge polarization device of the 18th patent application, wherein the continuous workpiece includes: a conductive substrate; and the piezoelectric material film covering a surface of the conductive substrate. For example, the discharge polarization equipment of the 18th patent application, in which the continuous workpiece is composed of the piezoelectric material film. A discharge polarization equipment, comprising: a first roller configured to roll a continuous workpiece, wherein the continuous workpiece includes a piezoelectric material film; a dielectric shielding discharge plasma source, arranged on the first roller Above, and configured to apply plasma to the piezoelectric material film; a second roller, configured to wind up the continuous workpiece from the first roller and passing through the plasma; a dielectric shielded discharge power supply , Including a first pole and a second pole, wherein the first pole is electrically connected to the dielectric shielding discharge plasma source, and the second pole is grounded; and a DC bias power supply including a fifth pole And a sixth pole, wherein the fifth pole is electrically connected to the first roller and the second roller, and the sixth pole is grounded to provide a bias to the first roller. For example, the discharge polarization equipment of item 21 of the scope of patent application further includes: a power grid arranged between the first roller and the dielectric shielded discharge plasma source; and a DC power supply including a third electrode And a fourth pole, wherein the third pole is electrically connected to the power grid, and the fourth pole is grounded. For example, the discharge polarization device of the 21st patent application, wherein the continuous workpiece includes: a conductive substrate; and the piezoelectric material film covering a surface of the conductive substrate. For example, the 21st patent application scope of the discharge polarization equipment, wherein the continuous workpiece is composed of the piezoelectric material film.

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