TWI726714B - Cyclical scanning of exposure machine - Google Patents
Cyclical scanning of exposure machine Download PDFInfo
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- TWI726714B TWI726714B TW109115257A TW109115257A TWI726714B TW I726714 B TWI726714 B TW I726714B TW 109115257 A TW109115257 A TW 109115257A TW 109115257 A TW109115257 A TW 109115257A TW I726714 B TWI726714 B TW I726714B
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- column assembly
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
- G03F7/70366—Rotary scanning
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- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
本發明提供一種循環式掃描曝光機,包括有底座,設置在底座上的曝光台,以及曝光裝置,曝光台上分別設有兩組用於工件供料的左供料機構和右供料機構,曝光裝置支架上設有驅動一排以上的曝光裝置移動的曝光裝置驅動機構;底座上設有驅動曝光裝置支架垂直曝光裝置支架移動的曝光裝置支架驅動機構。左供料機構和右供料機構可以同時把工件托起準備曝光,當左邊的工件曝光完畢,曝光裝置移動到右邊的工件直接進行曝光,同時左邊的供料機構把曝光的工件傳送出料,再把左邊支撐柱組件上未曝光的工件傳送托起準備曝光,依次循環;感測器用於檢測工件是否彎曲,從而剔除不合格的工件;從而曝光效率高,不需要有上料等待時間。The invention provides a cyclic scanning exposure machine, which includes a base, an exposure table arranged on the base, and an exposure device. The exposure table is respectively provided with two sets of left and right feeding mechanisms for workpiece feeding. The exposure device support is provided with an exposure device drive mechanism that drives more than one row of exposure devices to move; the base is provided with an exposure device support drive mechanism that drives the exposure device support to move vertically. The left feeding mechanism and the right feeding mechanism can simultaneously hold up the workpiece and prepare for exposure. When the left workpiece is exposed, the exposure device moves to the right workpiece for direct exposure, while the left feeding mechanism conveys and discharges the exposed workpiece. Then the unexposed workpieces on the left support column assembly are transported and held to prepare for exposure, and cycled in sequence; the sensor is used to detect whether the workpiece is bent, thereby rejecting unqualified workpieces; thus, the exposure efficiency is high, and there is no waiting time for loading.
Description
本發明涉及一種光學設備領域,尤其涉及一種循環式掃描曝光機。The invention relates to the field of optical equipment, in particular to a cyclic scanning exposure machine.
現有的曝光掃描方式通常是將工件放到曝光台上後,作曝光動作,交換工件方式必須等前一工件移開後,另工件才能移入。The existing exposure scanning method usually puts the workpiece on the exposure table and performs the exposure action. The method of exchanging the workpiece must wait for the previous workpiece to move before another workpiece can be moved in.
本發明的目的在於解決現有技術的工件曝光設備曝光效率低的問題。The purpose of the present invention is to solve the problem of low exposure efficiency of the workpiece exposure equipment in the prior art.
為解決本發明所提出的技術問題採用的技術方案為:本發明的循環式掃描曝光機包括有底座,設置在底座上的曝光台,以及用於工件曝光的曝光裝置,所述的曝光台上分別設有兩組用於工件供料的左供料機構和右供料機構,左供料機構和右供料機構把曝光台分成左曝光區和右曝光區,所述的左供料機構和右供料機構均包括有用於支撐放置工件的由多個相互平行設置的倒U形支撐柱組成的支撐柱組件,以及用於把支撐柱組件上的工件托起傳送的傳送板,傳送板上設有與支撐柱組件配合的頂柱組件,底座上設有驅動頂柱組件上下移動以及沿進出料方向移動的傳送驅動機構,所述的底座上設有橫跨曝光台的曝光裝置支架,一排以上所述的曝光裝置滑動設於曝光裝置支架上,曝光裝置支架上設有驅動一排以上的曝光裝置沿曝光裝置支架移動的曝光裝置驅動機構;所述的底座上設有驅動曝光裝置支架垂直曝光裝置支架移動的曝光裝置支架驅動機構。The technical solution adopted to solve the technical problem proposed by the present invention is: the cyclic scanning exposure machine of the present invention includes a base, an exposure table arranged on the base, and an exposure device for exposing a workpiece, on the exposure table There are two sets of left and right feeding mechanisms for workpiece feeding. The left feeding mechanism and the right feeding mechanism divide the exposure table into a left exposure area and a right exposure area. The left feeding mechanism and The right feeding mechanism includes a support column assembly composed of a plurality of inverted U-shaped support columns arranged parallel to each other for supporting and placing the workpiece, and a transfer plate for lifting and transferring the workpiece on the support column assembly. The transfer plate It is provided with a top column assembly that cooperates with the support column assembly. The base is provided with a transmission drive mechanism that drives the top column assembly to move up and down and along the material feeding and unloading direction. The base is provided with an exposure device bracket that spans the exposure table. The exposure device described above is slidably mounted on the exposure device support, and the exposure device support is provided with an exposure device drive mechanism that drives more than one row of exposure devices to move along the exposure device support; the base is provided with a drive exposure device support Exposure device support drive mechanism for vertical exposure device support movement.
對本發明作進一步限定的技術方案包括:The technical solutions that further limit the present invention include:
所述的左供料機構和右供料機構上均設有用於檢測工件彎曲的感測器。Both the left feeding mechanism and the right feeding mechanism are provided with sensors for detecting the bending of the workpiece.
所述的感測器設置在頂柱組件上,對應工件的四角下方均設有一個感測器。The sensor is arranged on the top column assembly, and one sensor is arranged under the four corners of the corresponding workpiece.
所述的感測器設置在支撐柱組件上,對應工件的四角側面均設有一個感測器。The sensor is arranged on the support column assembly, and a sensor is provided on the four corners of the corresponding workpiece.
所述的頂柱組件上設有用於把工件吸附在頂柱組件上的吸風口。The top column assembly is provided with an air suction port for sucking the workpiece on the top column assembly.
所述的傳送驅動機構包括有驅動頂柱組件上下移動的第一驅動氣缸和驅動第一驅動氣缸沿進出料方向移動的第二驅動氣缸,所述的頂柱組件與第一驅動氣缸的活塞桿固定連接。The transmission drive mechanism includes a first drive cylinder that drives the top column assembly to move up and down and a second drive cylinder that drives the first drive cylinder to move along the feeding and unloading direction. The top column assembly and the piston rod of the first drive cylinder Fixed connection.
所述曝光裝置驅動機構為曝光裝置直線電機驅動。The exposure device driving mechanism is driven by a linear motor of the exposure device.
所述曝光裝置支架驅動機構為曝光裝置支架直線電機驅動。The exposure device support drive mechanism is driven by a linear motor of the exposure device support.
通過上述技術方案,本發明的有益效果為:本發明的循環式掃描曝光機的左供料機構和右供料機構可以同時把工件托起準備曝光,當左邊的工件曝光完畢,曝光裝置移動到右邊的工件直接進行曝光,同時左邊的供料機構把曝光的工件傳送出料,再把左邊支撐柱組件上未曝光的工件傳送托起準備曝光,依次循環;感測器用於檢測工件是否彎曲,從而剔除不合格的工件;從而曝光效率高,不需要有上料等待時間。Through the above technical solutions, the beneficial effects of the present invention are: the left feeding mechanism and the right feeding mechanism of the circular scanning exposure machine of the present invention can simultaneously hold up the workpiece for exposure. When the left workpiece is exposed, the exposure device moves to The workpiece on the right is directly exposed, while the feeding mechanism on the left conveys the exposed workpiece, and then conveys the unexposed workpiece on the left support column assembly to prepare for exposure, and loops in turn; the sensor is used to detect whether the workpiece is bent, Thereby rejecting unqualified workpieces; thus, the exposure efficiency is high, and there is no need for waiting time for feeding.
以下結合附圖對本發明的結構做進一步說明。The structure of the present invention will be further described below in conjunction with the accompanying drawings.
參照圖1至圖5,一種循環式掃描曝光機包括有底座1,設置在底座1上的曝光台2,以及用於工件8曝光的曝光裝置3,曝光台2上分別設有兩組用於工件8供料的左供料機構4和右供料機構5,左供料機構4和右供料機構5把曝光台2分成左曝光區和右曝光區,左供料機構4和右供料機構5均包括有用於支撐放置工件的由多個相互平行設置的倒U形支撐柱組成的支撐柱組件41,以及用於把支撐柱組件41上的工件8托起傳送的傳送板42,傳送板42上設有與支撐柱組件41配合的頂柱組件421,底座1上設有驅動頂柱組件421上下移動以及沿進出料方向移動的傳送驅動機構。本實施例中,頂柱組件421上設有用於把工件8吸附在頂柱組件421上的吸風口。吸風口能夠把工件8吸附在頂柱組件421上,防止工件8晃動錯位。傳送驅動機構包括有驅動頂柱組件421上下移動的第一驅動氣缸和驅動第一驅動氣缸沿進出料方向移動的第二驅動氣缸。頂柱組件421與第一驅動氣缸的活塞桿固定連接。曝光時,第一驅動氣缸驅動頂柱組件421向上移動伸出支撐柱組件41,把工件8頂起準備曝光。工件8進料出料時,第二驅動氣缸驅動第一驅動氣缸沿進出料方向移動對工件8進行傳送。1 to 5, a cyclic scanning exposure machine includes a
底座1上設有橫跨曝光台2的曝光裝置支架6,一排以上的曝光裝置滑動設於曝光裝置支架6上,曝光裝置支架6上設有驅動一排以上的曝光裝置沿曝光裝置支架6移動的曝光裝置驅動機構;本實施例中,曝光裝置設有兩排。具體實施時,根據需要曝光裝置可以設置一排以上。本實施例中,曝光裝置驅動機構為曝光裝置直線電機驅動。曝光裝置驅動機構驅動兩排曝光裝置沿曝光裝置支架6移動,從一邊的曝光區移動到另外一邊的曝光區進行曝光。底座1上設有驅動曝光裝置支架6垂直曝光裝置支架6移動的曝光裝置支架驅動機構。本實施例中,曝光裝置支架驅動機構為曝光裝置支架直線電機驅動。曝光裝置支架驅動機構驅動曝光裝置支架6垂直曝光裝置支架6,從而可以依次把一邊曝光區的工件8曝光,從而提高曝光效率。The
本實施例中,左供料機構4和右供料機構5上均設有用於檢測工件8彎曲的感測器7。本實施例中,感測器7設置在頂柱組件421上,對應工件8的四角下方均設有一個感測器7。用於檢測頂柱組件421到工件8的距離來判斷工件8是否彎曲,感測器7把檢測的資料回饋給系統,系統判斷實際值是否超過設計值,超出則發出警報,從而剔除不合格的工件,提高曝光品質。具體實施時,感測器7設置在支撐柱組件41上,對應工件8的四角側面均設有一個感測器7。根據工件8板厚來檢測工件8是否彎曲。In this embodiment, both the
本發明的循環式掃描曝光機的左供料機構4和右供料機構5可以同時把工件8托起準備曝光,當左邊的工件8曝光完畢,曝光裝置移動到右邊的工件8直接進行曝光,同時左邊的供料機構4把曝光的工件8傳送出料,再把左邊支撐柱組件41上未曝光的工件8傳送托起準備曝光,依次循環;感測器7用於檢測工件8是否彎曲,從而剔除不合格的工件8;從而曝光效率高,不需要有上料等待時間。The
雖然結合附圖對本發明的具體實施方式進行了詳細地描述,但不應理解為對本發明的保護範圍的限定。在權利要求書所描述的範圍內,本領域技術人員不經創造性勞動即可做出的各種修改和變形仍屬於本發明的保護範圍。Although the specific embodiments of the present invention have been described in detail with reference to the accompanying drawings, they should not be understood as limiting the protection scope of the present invention. Within the scope described in the claims, various modifications and variations that can be made by those skilled in the art without creative work still belong to the protection scope of the present invention.
1:底座1: base
2:曝光台2: Exposure table
3:曝光裝置3: Exposure device
4:左供料機構4: Left feeding mechanism
41:支撐柱組件41: Support column assembly
42:傳送板42: transfer board
421:頂柱組件421: Top column assembly
5:右供料機構5: Right feeding mechanism
6:曝光裝置支架6: Exposure device bracket
7:感測器7: Sensor
8:工件8: Workpiece
圖1為本發明循環式掃描曝光機的立體結構示意圖。FIG. 1 is a schematic diagram of the three-dimensional structure of the circulating scanning exposure machine of the present invention.
圖2為本發明循環式掃描曝光機的立體結構示意圖。2 is a schematic diagram of the three-dimensional structure of the circulating scanning exposure machine of the present invention.
圖3為本發明循環式掃描曝光機的感測器位於工件四角下方時的結構示意圖。3 is a schematic diagram of the structure of the cyclic scanning exposure machine of the present invention when the sensors are located below the four corners of the workpiece.
圖4為本發明循環式掃描曝光機的感測器位於工件四角側面時的結構示意圖。Fig. 4 is a schematic structural diagram of the cyclic scanning exposure machine of the present invention when the sensors are located on the four corners of the workpiece.
圖5為本發明循環式掃描曝光機的感測器位於工件四角側面時的結構示意圖。5 is a schematic diagram of the structure of the cyclic scanning exposure machine of the present invention when the sensors are located on the four corners of the workpiece.
1:底座 1: base
2:曝光台 2: Exposure table
3:曝光裝置 3: Exposure device
4:左供料機構 4: Left feeding mechanism
6:曝光裝置支架 6: Exposure device bracket
8:工件 8: Workpiece
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201351067A (en) * | 2012-06-12 | 2013-12-16 | Sanei Giken Co Ltd | Exposure apparatus, exposure method |
CN104375388A (en) * | 2014-10-13 | 2015-02-25 | 江苏影速光电技术有限公司 | Multi-workpiece table direct-writing photoetching system |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR200169722Y1 (en) * | 1997-07-23 | 2000-03-02 | 김영환 | Wafer chuck for semiconductor exposure device |
JP4949439B2 (en) * | 2004-12-30 | 2012-06-06 | エーエスエムエル ネザーランズ ビー.ブイ. | PCB handler |
KR20120059630A (en) * | 2007-06-21 | 2012-06-08 | 에이에스엠엘 네델란즈 비.브이. | Method of loading a substrate on a substrate table, device manufacturing method, computer program, data carrier and apparatus |
US20110244396A1 (en) * | 2010-04-01 | 2011-10-06 | Nikon Corporation | Exposure apparatus, exchange method of object, exposure method, and device manufacturing method |
JP2012173337A (en) * | 2011-02-17 | 2012-09-10 | Nsk Technology Co Ltd | Mask, proximity scan exposure device, and proximity scan exposure method |
JP5724014B1 (en) * | 2014-04-22 | 2015-05-27 | 株式会社幸和 | Substrate support apparatus and substrate processing apparatus |
CN106575086B (en) * | 2014-08-01 | 2018-05-18 | 株式会社村田制作所 | Direct write type exposure device |
CN204790309U (en) * | 2015-05-27 | 2015-11-18 | 中山新诺科技股份有限公司 | A digital laser directly writes equipment that is used for printing half tone by a large scale to be makeed |
CN205003441U (en) * | 2015-09-30 | 2016-01-27 | 合肥芯碁微电子装备有限公司 | Exposure machine is directly write to two mesa laser |
CN106647185A (en) * | 2016-12-31 | 2017-05-10 | 江苏九迪激光装备科技有限公司 | Silk-screen printing direct platemaking system and platemaking method |
JP2019045875A (en) * | 2018-12-07 | 2019-03-22 | 株式会社ニコン | Exposure device, manufacturing method of flat panel display, device manufacturing method and exposure method |
CN210005856U (en) * | 2019-06-19 | 2020-01-31 | 深圳凯世光研股份有限公司 | circulating scanning exposure machine |
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TW201351067A (en) * | 2012-06-12 | 2013-12-16 | Sanei Giken Co Ltd | Exposure apparatus, exposure method |
CN104375388A (en) * | 2014-10-13 | 2015-02-25 | 江苏影速光电技术有限公司 | Multi-workpiece table direct-writing photoetching system |
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