TW201351067A - Exposure apparatus, exposure method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To increase the productivity of exposure technology. SOLUTION: An exposure apparatus includes (1) a first moving part equipped with a first substrate-holding part for holding the substrate, and the first substrate holding part is moved between the first standby position and the first exposure position, when at the first exposure position the substrate is so disposed that its exposure surface is faced toward the first direction; (2) a second moving part equipped with a second substrate holding part for holding substrate, and the second substrate holding part is moved between the second standby position and the second exposure position, and when at the second exposure position, the exposure surface of the substrate held by the second substrate holding part faces toward the first direction, and the substrate held by the second substrate holding part is arranged in the second direction orthogonal to the exposure surface of the first exposure position and the first direction; and (3) an exposure part, which is equipped with a exposure head capable of moving between the first exposure position and the second exposure position along the guidance member disposed along the second direction for selectively exposing the substrate disposed at the first exposure position and the substrate disposed at the second exposure position.

Description

Exposure device, exposure method

The present invention relates to an exposure technique for a substrate using an exposure apparatus.

An exposure apparatus in which an exposure surface of a substrate having a photosensitive layer on its surface is exposed by exposure data indicating a binary pattern of a circuit or the like, thereby forming the binary pattern on a substrate is known. In such an exposure apparatus, one substrate is placed at a predetermined exposure position, and after exposure, the exposed substrate is moved from the exposure position, and the other substrate is placed at the exposure position to perform exposure or the like. The repetitive process is performed to perform exposure processing of a plurality of substrates.

In such a process, the period of time required for the movement of the exposed substrate from the exposure position and the arrangement of the other substrate to the exposure position is not possible, and thus the productivity is low. To this end, technology to improve productivity has been proposed. For example, Patent Document 1 listed below discloses an exposure apparatus including two moving stages that can reciprocate on the same primary track by loading a substrate, and an exposure part that is fixedly disposed on the track. . Such an exposure device is to make one mobile platform The exposure unit is relatively moved, and during the exposure processing of one substrate, the substrate on which the exposure is completed and the new substrate can be loaded on the other moving platform. Thereby, the time other than the exposure processing is shortened, and the productivity is improved.

[Advanced technical literature]

[Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open Publication No. 2008-191302

However, in the technique of Patent Document 1, in addition to the time for exposure processing, it takes much time to move the mobile platform or the like. Moreover, it is not possible to expose both sides of the substrate in a series of processes. For this reason, it is required to further improve the productivity of the exposure technology. Further, the general problem of the exposure apparatus is required to reduce the cost or size of the apparatus.

The present invention has been developed in order to solve at least a part of the above problems, and can be realized, for example, as follows.

A first aspect of the present invention provides an exposure apparatus for exposing a substrate. This exposure apparatus includes a first moving unit that includes a first substrate holding portion that holds a substrate. The first moving unit moves the first substrate holding unit between the first standby position and the first exposure position. In the first exposure position, the substrate is placed in a state in which the exposure surface of the substrate held by the first substrate holding portion faces the first direction. Further, the exposure device includes a second moving portion that includes a second substrate holding portion that holds the substrate. The second moving unit moves the second substrate holding portion between the second standby position and the second exposure position, and the second standby position is different from the first standby position, and the second exposure position is on the second substrate. The exposure surface of the substrate held by the holding portion is in the first direction, and the second substrate is placed in a state in which the exposure surface of the substrate disposed at the first exposure position is aligned with the second direction orthogonal to the first direction. The substrate held by the part. Further, the exposure apparatus includes an exposure unit including an exposure head that is movable between the first exposure position and the second exposure position along the guide, and the guide is disposed along the second direction. The exposure unit selectively exposes the substrate disposed at the first exposure position and the substrate disposed at the second exposure position by movement of the exposure head in the second direction.

According to the exposure apparatus of such a form, exposure can be alternately performed at two exposure positions. Therefore, the time at which exposure is performed at one exposure position can be assigned to a time for discharging the substrate that has been exposed at the other exposure position and arranging the new substrate at the other exposure position. Therefore, the productivity of the substrate can be improved. Further, by arranging the substrate exposed at one exposure position to the other exposure position, it is possible to expose both surfaces of the substrate using only one exposure portion. Therefore, the case where both surfaces of the substrate are exposed by using two exposure apparatuses contributes to cost reduction and downsizing of the apparatus.

According to a second aspect of the present invention, the first moving unit is provided with a double The two substrate holding portions are movable in a direction along the first direction and a direction intersecting the first direction as a first substrate holding portion. Similarly, the second moving portion includes two substrate holding portions that are doubled, and are movable in a direction along the first direction and a direction intersecting the first direction as a second substrate holding portion.

According to such an exposure apparatus, it is possible to simultaneously discharge the exposure from the exposure position of the substrate and the arrangement of the new substrate to the exposure position for one exposure position. Therefore, the time required for the operation other than the exposure can be extremely shortened. In such a configuration, for example, when one of the two substrate holding units is moved from the first exposure position or the second exposure position to the first standby position or the second standby position, the other may be placed from the first standby position or the second standby position. The configuration is realized by moving the position to the first exposure position or the second exposure position. Alternatively, the other may be moved from the first standby position or the second standby position to a predetermined position in advance by using the exposure time of another exposure position.

According to a third aspect of the present invention, the exposure apparatus of the second aspect may include a base member provided with a guide. Further, the exposure apparatus may include a reference plate and a reference plate attached to the base member, and has a frame shape in which the substrate can be inserted into a position inside the reference plate as the first exposure position and the second exposure position. In such an exposure apparatus, the first substrate holding portion and the second substrate holding portion can hold the substrate while the substrate is in a variable position. In a state where the predetermined portion of the reference plate, the predetermined portion of the first substrate holding portion, and the second substrate holding portion are in contact with the outer periphery of each of the substrates held by the first substrate holding portion and the second substrate holding portion, the substrate is Configured on The first exposure position and the second exposure position.

According to the exposure apparatus of the above-described aspect, the first moving unit and the second moving unit can move the first substrate holding unit and the second substrate holding unit without precision, and can be in the first exposure position and the first exposure position. In the exposure position, the first substrate holding portion and the second substrate holding portion of the holding substrate are preferably placed at predetermined positions with respect to the exposure head. As a result, the cost can be reduced. Moreover, since the first substrate holding portion and the second substrate holding portion that are movable can be made lighter, the conveyance speed of the substrate can be increased, and the productivity can be improved. Further, a strong basic structure for ensuring the movement accuracy of the height of the first moving portion and the second moving portion is not required, and the exposure apparatus can be downsized and the cost can be reduced.

According to a fourth aspect of the present invention, the first moving unit and the second moving unit included in the exposure apparatus of the first aspect are configured to be movable in the first direction, respectively, in the first substrate holding unit and the second substrate holding unit.

In this case, the exposure apparatus of the fourth aspect may be provided with the third aspect described above. Such an exposure apparatus achieves the same effects as those of the third aspect.

According to a fifth aspect of the present invention, in the reference plate provided in the exposure apparatus according to the third or fourth aspect, one of the pair of positioning members that are fitted to each other may be formed. The other of the first substrate holding portion and the second substrate holding portion may be formed on the outer side of the substrate held by the first substrate holding portion and the second substrate holding portion. The substrate held by the first substrate holding portion and the second substrate holding portion may be disposed in the first exposure position and the second exposure in a state in which the pair of positioning members are fitted together. Light position.

According to the exposure apparatus of the above-described aspect, the first moving unit and the second moving unit do not move the first substrate holding unit and the second substrate holding unit with high precision, and the surface orthogonal to the first direction The position of the substrate will still be correctly positioned. Therefore, the same effects as those of the third embodiment and the fourth embodiment can be obtained.

According to a sixth aspect of the invention, the exposure apparatus according to any one of the first to fifth aspects of the invention may further include a detection unit configured to be movable in the second direction and configured to be disposed at the first exposure position and the second exposure position At least one of the position and shape of the substrate. Further, the exposure unit may perform exposure based on the exposure data corrected in accordance with the detection result of the detection unit.

According to the exposure apparatus of such a form, the alignment mark applied to the substrate can be read, and based on the information, the position or shape of the substrate can be accurately recognized, and the exposure data corrected according to the position or shape of the substrate can be used. Proper exposure. When the substrate is placed in the exposure of one of the first exposure position and the second exposure position, the position of the other substrate is detected, and the productivity is not lowered.

According to a seventh aspect of the present invention, the guide provided in the exposure apparatus of the sixth aspect may be provided as a guide for both the movement of the exposure head in the second direction and the movement of the detection unit along the second direction.

According to the exposure apparatus of such a form, the exposure apparatus can be miniaturized.

According to an eighth aspect of the present invention, in any one of the first to seventh aspects The exposure apparatus may include a first transport unit that transports the substrate, a second transport unit that transports the substrate between the first transport unit and the first standby position, and a third transport unit that is coupled to the first transport unit. The substrate is transferred between the second standby position and the second standby position.

According to the exposure apparatus of such a form, the substrate can be efficiently processed continuously in a series of processes, and the productivity is improved.

According to a ninth aspect of the present invention, in the exposure apparatus of any one of the first to eighth aspects, the measuring unit may include a measuring unit that measures a distance between the exposure head and an exposure surface of the substrate disposed at the first exposure position and the second exposure position. . Further, the exposure apparatus may further include a third moving unit that moves the exposure head in the first direction. The third moving unit can also adjust the distance between the exposure head and the exposure surface in accordance with the measurement result of the measuring unit.

According to the exposure apparatus of such a form, the focus can be stably connected even to the exposure surface of the substrate which is not smooth.

According to a tenth aspect of the invention, the exposure head provided in the exposure apparatus according to any one of the first to ninth aspects may have a plurality of exposure units.

According to the exposure apparatus of such a form, the scanning width of each exposure unit becomes small by dividing into a plurality of exposure units. That is, the diameter of the lens used in the exposure unit can be reduced, so that the cost can be reduced.

An eleventh aspect of the present invention provides an exposure method for exposing a substrate by an exposure device. Such an exposure method is the first project to prepare an exposure apparatus. The exposed exposure device is set to have the first exposure a light position and a second exposure position in which the substrate is placed in a state in which the exposure surface of the substrate faces the first direction, and the second exposure position is in a state in which the exposure surface of the substrate faces the first direction, and The substrate is placed in a state in which the exposure surface of the substrate disposed at the exposure position and the second direction orthogonal to the first direction are arranged. Further, the exposure apparatus includes an exposure head that is movable between the first exposure position and the second exposure position along the second direction, and is selectively disposed by the movement of the exposure head in the second direction. The substrate at the first exposure position and the substrate disposed at the second exposure position are exposed.

Further, the exposure method includes a second process of disposing the second substrate different from the first substrate at the second exposure position until the exposure processing of the first substrate disposed at the first exposure position is completed; In the third process, the third substrate different from the second substrate is placed at the first exposure position until the exposure processing of the second substrate disposed at the second exposure position is completed.

According to such an exposure method, the same effect as the exposure apparatus of the first aspect is obtained.

In the eleventh aspect, the exposure apparatus prepared in the first aspect of the invention may further include a detecting unit that detects at least one of a position and a shape of the substrate disposed at the first exposure position and the second exposure position. Further, the exposure device may perform exposure based on the exposure data corrected in accordance with the detection result of the detecting unit. In this case, in the second project, the exposure processing to the first substrate placed at the first exposure position may be ended. Then, the second substrate is placed at the second exposure position, and the detection portion is detected on the second substrate disposed at the second exposure position. Further, not only the detection of the second substrate but also the correction of the exposure data based on the detection result can be performed. Similarly, in the third process, the third substrate may be placed at the first exposure position and the first exposure position may be placed until the exposure processing of the second substrate disposed at the second exposure position is completed. The third substrate is detected by the detecting unit. Further, not only the detection of the third substrate but also the correction of the exposure data based on the detection result can be performed.

The above-described configuration is merely an example, and each of the above-described various aspects may be appropriately combined or omitted in a range in which at least a part of the problems described in the present invention can be solved or at least a part of the effects described in the present invention can be obtained. For example, the present invention can also be provided as the twelfth to fourteenth aspects shown below. Any of the second to tenth aspects can also be applied to the twelfth to fourteenth aspects.

A twelfth aspect of the present invention provides an exposure apparatus. The exposure apparatus includes a first moving unit that includes a first substrate holding portion that holds the substrate, and moves the first substrate holding portion between the standby position and the exposure position, and the exposure position is on the exposure surface of the substrate. The second substrate is provided with a second substrate holding portion that holds the substrate, and the second substrate holding portion is moved between the standby position and the exposure position; and the exposure portion includes an exposure head. The exposure surface of the substrate placed at the exposure position is exposed while moving the exposure head in the second direction orthogonal to the first direction.

According to the exposure apparatus of such a form, the discharge of the substrate from the exposure by the exposure and the arrangement of the new substrate to the exposure position can be simultaneously performed. Therefore, the time required for the operation other than the exposure can be shortened, and the productivity is improved.

A thirteenth aspect of the present invention provides an exposure apparatus.

In the exposure apparatus, the substrate holding unit is provided with a substrate holding unit that moves the substrate holding unit until the exposure surface of the substrate held by the substrate holding unit faces the first direction, and the substrate is placed at the exposure position. An exposure unit having an exposure head that exposes an exposure surface of a substrate disposed at an exposure position while moving the exposure head in a second direction orthogonal to the first direction; and a base member for exposing the exposure head Moving along the second direction, and providing a guide disposed along the second direction; and a reference plate attached to the reference plate of the base member, having a substrate insertable into the interior of the reference plate as the exposure position The frame shape of the position.

In such an exposure apparatus, the moving portion is configured to be movable in the first direction by the constituent substrate holding portion. The substrate holding portion holds the substrate in a state where the substrate is variable. The substrate is placed at the exposure position in a state where the predetermined portion of the reference plate and the predetermined portion of the substrate holding portion are in contact with the outer periphery of the substrate held by the substrate holding portion.

According to the exposure apparatus of such a form, even if moving The portion is not a mechanism for moving the substrate holding portion with high precision, or the substrate holding portion for holding the substrate can be accurately placed at a predetermined position in the exposure position at the exposure position. As a result, the cost can be reduced. Moreover, since the substrate holding portion that can be moved can be made lighter, the conveyance speed of the substrate can be increased, and the productivity can be improved. Moreover, a strong basic structure for ensuring the movement accuracy of the height of the moving portion is not required, and the exposure apparatus can be downsized and the cost can be reduced.

A fourteenth aspect of the present invention provides an exposure apparatus.

In the exposure apparatus, the substrate holding unit is provided with a substrate holding unit that moves the substrate holding unit until the exposure surface of the substrate held by the substrate holding unit faces the first direction, and the substrate is placed at the exposure position. An exposure unit having an exposure head that exposes an exposure surface of a substrate disposed at an exposure position while moving the exposure head in a second direction orthogonal to the first direction; and a base member for exposing the exposure head Moving along the second direction, and providing a guide disposed along the second direction; and a reference plate attached to the reference plate of the base member, having a substrate insertable into the interior of the reference plate as the exposure position The frame shape of the position.

In such an exposure apparatus, the moving portion is configured to be movable in the first direction by the constituent substrate holding portion. The substrate holding portion holds the substrate in a state where the substrate is variable. Forming a pair of mutually fitting ones in the reference plate One side. The other of the positioning portions of the substrate holding portion is formed at a position outside the substrate held by the substrate holding portion. The substrate is placed at the exposure position in a state in which the positioning of the pair of the reference plates and the substrate holding portion is formed.

According to the exposure apparatus of the above aspect, even if the moving portion does not move the substrate holding portion with high precision, the position of the substrate on the surface orthogonal to the first direction is accurately positioned. Therefore, the same effect as the thirteenth aspect can be obtained.

20,220‧‧‧Exposure device

30‧‧‧1st transport department

31~34‧‧‧Mobile platform

35‧‧‧Reversal device

36‧‧‧rails

40a‧‧‧The second transport department

40b‧‧‧3rd Transport Department

41a, 41b‧‧‧ adsorption mechanism

42a, 42b‧‧‧ rails

50a, 250a‧‧‧1st moving department

50b, 250b‧‧‧2nd Moving Department

60a, 260a‧‧‧1st Mobile Division 1st Series

60b, 260b‧‧‧2nd Mobile Division 1st Series

70a, 270a‧‧‧1st Mobile Division 2nd Series

70b, 270b‧‧‧2nd Mobile Division 2nd Series

61a, 71a, 71b, 261a, 261b, 271a, 271b‧‧‧ base member

62a, 72a, 72b, 262a, 262b, 272a, 272b‧‧‧ holding components

63a, 73a, 73b, 263a, 263b, 273a, 273b‧‧‧ recess

64a, 74a, 264a, 264b, 274a, 274b‧‧‧ support members

65a, 75a, 265a, 265b, 275a, 275b‧ ‧ spring

66a, 76a, 266a, 266b, 276a, 276b‧‧‧ moving mechanism

67a, 77a, 267a, 267b, 277a, 277b‧‧‧ moving mechanism

68a, 78a, 78b, 268a, 278a‧‧‧1st substrate holder

268b, 278b‧‧‧2nd substrate holder

80,280‧‧‧base member

81‧‧‧ base

82‧‧‧Guidance

83‧‧‧ wall

90a, 90b, 290a, 290b‧‧‧ reference board

91a, 91b‧‧‧through holes

92a, 92b‧‧ ‧ cylinder

93a‧‧ Locating pin

100a, 100b, 300a, 300b‧‧‧Detection Department

101a‧‧‧ camera

102a‧‧‧Support members

103a‧‧‧ wall

104a‧‧‧Mobile

110,310‧‧‧Exposure Department

111‧‧‧Exposure head

112‧‧‧Support

113‧‧‧Mobile

S1~S6‧‧‧Substrate

P11‧‧‧1st standby position

P12‧‧‧2nd standby position

P21‧‧‧1st exposure position

P22‧‧‧2nd exposure position

D1‧‧‧1st direction

D2‧‧‧2nd direction

D3‧‧‧3rd direction

D4‧‧‧4th direction

HP‧‧‧ original location

FIG. 1 is an explanatory view for explaining the overall configuration of an exposure apparatus 20 as an embodiment of the present invention.

FIG. 2 is an explanatory view showing a configuration of the periphery of the exposure unit 110 in the exposure device 20.

FIG. 3 is an explanatory view showing a configuration of the first moving unit 50a.

FIG. 4 is an explanatory view showing an operation of arranging the substrate at the first exposure position P21.

FIG. 5 is an explanatory diagram showing a flow of an operation of the exposure device 20.

FIG. 6 is an explanatory diagram showing a flow of an operation of the exposure device 20.

FIG. 7 is a timing chart showing the flow of the operation of the exposure device 20.

FIG. 8 is an explanatory view showing a configuration of an exposure device 220 as a second embodiment.

FIG. 9 is an explanatory view of the exposure device 220 as seen from the horizontal direction.

A. First embodiment:

Fig. 1 shows the overall configuration of an exposure apparatus 20 as an embodiment of the present invention. The exposure device 20 is an exposure surface of a substrate having a photosensitive layer on its surface, and is exposed on the basis of exposure data of a two-dimensional pattern such as a display circuit, thereby forming the pattern on the substrate. In the present embodiment, the exposure device 20 forms a pattern on both sides of the substrate. As shown in FIG. 1 , the exposure apparatus 20 includes a first transport unit 30 , a second transport unit 40 a , a third transport unit 40 b , a first moving unit 50 a , a second moving unit 50 b , a base member 80 , and a reference plate 90 a. 90b, detection units 100a and 100b, and exposure unit 110.

In the present case, a dedicated configuration for exposing the surface of the substrate is to attach "a" to the end of the symbol. Further, a dedicated configuration for exposing the back surface of the substrate is to attach "b" to the end of the symbol. On the other hand, the composition of the exposure common to the surface and the exposure of the back surface are not accompanied by "a" and "b". In other words, in FIG. 1, the second conveying unit 40a, the first moving unit 50a, the reference plate 90a, and the detecting unit 100a are configured to expose the surface. The third transport unit 40b, the second moving unit 50b, the reference plate 90b, and the detecting unit 100b are configured for back exposure. Further, the first conveying unit 30, the base member 80, and the exposure unit 110 have a common configuration. Hereinafter, a dedicated structure for exposing the surface is also referred to as a surface treatment series, and a dedicated configuration for exposing the back surface of the substrate is referred to as a back surface treatment series.

The first transport unit 30 transports the substrate in a predetermined direction along the flow of the exposure process. In the present embodiment, the first transport The unit 30 is provided with moving platforms 31 to 34 and guide rails 36. The moving platforms 31 to 34 are configured to be movable on the guide rail 36 in a state in which the substrate is placed. Fine through holes are formed in the mounting surface of the substrates of the moving platforms 31 to 34. The through hole is sucked toward the opposite side of the mounting surface, whereby the substrate placed thereon is fixedly held on the mounting surface.

In the middle of the conveyance path of the first conveyance unit 30, the second conveyance unit 40a and the third conveyance unit 40b are provided. The moving platform 31 is an installation position for transporting the unprocessed substrate S1 to the second conveying unit 40a. At the installation position of the second conveyance unit 40a, the substrate S1 is reloaded from the movement stage 31 to the second conveyance unit 40a, and only the substrate S4 whose surface is exposed is reloaded from the second conveyance unit 40a to the movement stage 32.

The substrate placed on the moving platform 32 is loaded on the moving platform 33 between the installation position of the second conveying unit 40a and the installation position of the third conveying unit 40b. At this time, the substrate is reversed in the back surface. Specifically, the mounting surfaces of the moving platforms 32, 33 are axially opposite to each other, and the opposite sides are rotatable upward. The mounting surfaces of the moving platforms 32, 33 are rotated by 90°, and the suction is performed on the moving platform 33 while the substrate S4 is placed in contact with each other, and the suction is released in the moving platform 32, whereby the substrate S4 is removed. The mobile platform 32 is loaded on the mobile platform 33. Such a moving platform 32 and a moving platform 33 have a function as an inverting device 35 that reverses the front and back of the substrate.

The moving platform 33 is an installation position at which the inverted substrate S4 is transported to the third transport unit 40b. At the installation position of the third conveying unit 40b, the substrate S4 is reloaded from the moving platform 33 to the third conveying unit 40b, and is in the table. The substrate S6 on which the back surface is exposed after the surface is transferred from the third transfer unit 40b to the moving platform 34. In addition, FIG. 1 shows a state in which only the space for reloading the substrate S4 from the moving platform 33 in the third conveying portion 40b is shown, and the moving platform 34 is retracted to the downstream side.

The second transport unit 40a and the third transport unit 40b have the same configuration. Therefore, only the second transport unit 40a will be described below. The second conveying unit 40a includes an adsorption mechanism 41a and a guide rail 42a. The suction mechanism 41a is an installation position that is configured to be movable along the guide rail 42a to the first moving portion 50a. Further, the suction mechanism 41a is orthogonal to the direction in which the guide rail 42a extends, and is configured to be rotatable in a direction parallel to the horizontal direction as a rotation axis. Further, the suction mechanism 41a is configured to be rotatable upward.

In the state in which the second conveyance unit 40a is moved to the first conveyance unit 30 side, the substrate S1 stopped on the movement stage 31 directly below the adsorption mechanism 41a is adsorbed. Then, the second conveying unit 40a rotates the rotating shaft to the upper side while moving the suction mechanism 41a to the first moving unit 50a, and rotates the suction mechanism 41a so that the substrate S1 can move in the direction of the first moving unit 50a. . In the second transport unit 40a, the substrate S1 standing in the vertical direction is transferred to the first moving unit 50a in a state in which the suction mechanism 41a is closest to the first moving unit 50a. FIG. 1 shows a state in which the third transport unit 40b transfers the substrate S5 to the second moving unit 50b.

In the second transport unit 40a, the substrate S1 on which the surface is exposed is transferred from the first moving unit 50a by the operation opposite to the above operation, and is transferred to the moving platform 32.

The first moving unit 50a and the second moving unit 50b have the same configuration. Therefore, in the following description, only the first moving unit 50a will be mainly described. The first moving unit 50a includes a first moving unit first series 60a and a first moving unit second series 70a. The first moving unit first series 60a and the first moving unit second series 70a are doubled and have the same function.

The first moving unit first series 60a is provided with a first substrate holding portion 68a. The first substrate holding portion 68a includes a holding member 62a that directly holds the substrate, and a holding member 62a that forms a base member 61a that is larger than the holding member 62a at both end sides in the vertical direction. The base member 61a and the holding member 62a have a flat plate shape. Two recessed portions 63a are formed in a portion of the base member 61a that is outside the holding member 62a. The first moving unit first series 60a is also referred to as a first standby position P11 at a position where the substrate is transferred to and from the second transfer unit 40a. The first moving unit first series 60a and the first moving unit second series 70a are all delivered at the same first standby position P11. Similarly, the second moving unit 50b transfers the substrate at the second standby position P12.

The first moving unit first series 60a moves the first substrate holding portion 68a between the first standby position P11 and the first exposure position P21. The first exposure position P21 is a position at which the surface of the substrate is exposed, and the details thereof will be described later. In the present embodiment, the moving direction of the first substrate holding portion 68a is a direction along the first direction D1 (a direction opposite to the first direction D1 or the first direction D1) and a second direction D2. The first The direction D1 is a direction in which the exposure surface of the substrate disposed at the first exposure position P21 faces. In the present embodiment, the substrate is disposed at the first exposure position P21 such that the exposure surface thereof can be oriented in the horizontal direction (the direction orthogonal to the gravity direction). The second direction D2 is a direction orthogonal to the first direction D1. The second direction D2 is a direction parallel to the horizontal direction in this embodiment. The first moving unit second series 70a can also perform the same operation as the first moving unit first series 60a.

Similarly, the second moving unit 50b includes a second moving unit first series 60b (not shown in FIG. 1) and a second moving unit second series 70b. The second moving unit first series 60b moves the second substrate holding portion 68b between the second standby position P12 and the second exposure position P22. The second exposure position P22 is a position at which the back surface of the substrate is exposed, and the details thereof will be described later. Similarly, the second moving unit second series 70b moves the second substrate holding portion 68b between the second standby position P12 and the second exposure position P22. The second moving unit 50b is symmetrical with respect to the first moving unit 50a.

The base member 80 includes a base portion 81 that is formed in a substantially rectangular shape, a guide portion 82 that is formed on the first direction D1 side of the base portion 81, and a wall portion 83 that is formed on the side opposite to the first direction D1. The guide portion 82 is formed to extend along the second direction D2. A convex portion whose both sides protrude in a direction along the first direction D1 is formed in an upper portion of the guide portion 82. This convex portion has a function as a guide that moves in the second direction D2 by the detecting portions 100a and 100b and the exposure unit 110 which will be described later. The wall portion 83 is formed into a substantially rectangular frame shape. The inside of the wall portion 83 is formed with a through A substantially rectangular through hole in the first direction D1.

FIG. 2 is an enlarged view of the periphery of the exposure unit 110 in the exposure apparatus 20 illustrated in FIG. 1 . Hereinafter, the reference plates 90a and 90b, the detecting portions 100a and 100b, and the exposure unit 110 will be described with reference to Fig. 2. The two reference plates 90a and 90b are formed into a substantially rectangular frame shape. Inside the reference plates 90a and 90b, through-holes 91a and 91b which are formed in a substantially rectangular shape penetrating in the first direction D1 are formed. The reference plates 90a and 90b have a height that is substantially equal to the height of the through hole of the wall portion 83. The reference plates 90a and 90b are firmly fixed to the wall portion 83 in a state in which they are fitted into the through holes of the wall portion 83.

The reference plates 90a and 90b are arranged side by side in the second direction D2 on a plane orthogonal to the first direction D1. In the present embodiment, the reference plates 90a, 90b are arranged slightly apart. The distance between the reference plate 90a and the reference plate 90b is set such that the width of the region where the through hole is not formed between the through hole 91a and the through hole 91b is equal to or greater than the width of the exposure portion 110 to be described later. In the present embodiment, the separation distance is a minimum value set to meet this condition. As long as the condition is met, the reference plates 90a, 90b may or may not be separated and connected to each other. In this case, the reference plate may be configured as one plate in which two through holes are formed.

Among the reference plates 90a, two cylinders 92a are provided in the lower portion of the surface orthogonal to the first direction D1. Similarly, the reference plate 90b is provided with two cylinders 92b. The tasks of cylinders 92a, 92b will be described later.

The detecting unit 100a and the detecting unit 100b have the same configuration. Therefore, the following description will be given only for the detecting unit 100a. Detection department 100a is a position and a shape on a surface of the substrate perpendicular to the first direction D1 at which the first exposure position P21 is detected. The detecting unit 100a includes a camera 101a, a support member 102a, a wall portion 103a, and a moving body 104a. The camera 101a optically reads a registration mark or a pattern attached to a predetermined position on the substrate, and detects the shape and arrangement position of the substrate disposed at the first exposure position P21 based on the coordinate position of the read mark or the like ( Hereinafter, such an operation is also referred to as substrate measurement. The support member 102a is a support camera 101a. The wall portion 103a is formed to extend in the vertical direction, and supports the support member 102a so as to be movable in the vertical direction. The moving body 104a supports the wall portion 103a on the upper surface thereof and moves in the second direction D2 along the guide portion 82. That is, the detecting unit 100a of the present embodiment is configured to move the camera 101a in the vertical direction and the horizontal direction. Further, the detecting unit 100a may be at least one of detecting the position and shape of the substrate. Further, in the present embodiment, the number of the cameras 101a is one, but the detecting unit 100a may be provided with two or more cameras. Further, the exposure device 20 may have two or more detection units for one exposure position. In this way, it is possible to simultaneously read a plurality of marks and the like, and perform detection based on a plurality of marks, so that the shape recognition accuracy can be improved without impairing productivity.

The exposure unit 110 includes an exposure head 111, a support portion 112, and a moving body 113. The exposure head 111 is a plurality of exposure units having a polygonal light source and a polygonal mirror that deflects the scanning light beam. The support portion 112 is an exposure head 111 which is formed in a vertical direction and supports a plurality of exposure units which are arranged in the entire height of the exposure surface of the substrate disposed at the first exposure position P21. The moving body 113 is supported on it The support portion 112 moves in the second direction D2 along the guide portion 82. In other words, the exposure unit 110 is movable in the second direction D2, whereby the substrate disposed at the first exposure position P21 and the substrate disposed at the second exposure position P22 can be selectively exposed. Further, in the exposure processing, it is important to keep the distance between the exposure head and the substrate constant, and the exposure unit 110 preferably oscillates in the first direction D1 and moves with high precision. Therefore, the exposure unit 110 is moved by the guide portion 82 constituting a part of the base member 80 that is a solid structure.

The operation of the exposure unit 110 is controlled by an image processing unit (not shown) that processes the exposure data. The image processing unit corrects the exposure data in accordance with the detection results of the detecting units 100a and 100b, and controls the exposure unit 110 based on the correction data. Then, the exposure unit 110 is moved to the detection unit from the position between the first exposure position P21 and the second exposure position P22 in the second direction D2 (hereinafter also referred to as the original position HP) in accordance with the reference plates 90a and 90b. In either direction of 100a, 100b, the desired beam of light on the substrate is illuminated according to the correction data.

As is clear from the above description, in the present embodiment, the guides (guide portions 82) for moving the detecting portions 100a, 100b and the exposure portion 110 are common. Therefore, the exposure device 20 can be miniaturized. These driving sources are, for example, linear motors that can utilize high movement accuracy.

FIG. 3 shows the configuration of the first moving unit 50a. FIG. 3 shows a state in which the exposure device 20 is viewed from the second moving portion 50b toward the first moving portion 50a. The base member 80 and the reference plate 90a are shown in cross section. Further, the first transport unit 30, the third transport unit 40b, and the second moving unit 50b and the detecting units 100a and 100b are not shown. The first moving unit 50a includes the first moving unit first series 60a and the first moving unit second series 70a described above. The first moving unit first series 60a and the first moving unit second series 70a have the same configuration and are arranged to be vertically symmetrical. Therefore, the following description will be given only for the first moving unit first series 60a.

In addition to the above-described first substrate holding portion 68a (base member 61a and holding member 62a), the first moving portion first series 60a further includes a supporting member 64a, a spring 65a, a front and rear moving mechanism 66a, and a right and left moving mechanism 67a. The support member 64a supports the first substrate holding portion 68a via an elastic member (here, a spring). Specifically, the support member 64a mainly supports the first substrate holding portion 68a in the horizontal direction (the direction orthogonal to the gravity direction) via the spring 65a on the upper side and the lower side of the surface provided on the first substrate holding portion 68a side. . Both ends of the spring 65a are fixed to the first substrate holding portion 68a (base member 61a) and the support member 64a at the same position in the vertical direction. Further, although not shown in the drawings, the actual supporting member 64a supports the first substrate holding portion 68a in the vertical direction via the hanging spring. One end of the suspension spring is fixed to the support member 64a, and the other end is fixed to the base member 61a at a lower side than one end. With such a configuration, the first substrate holding portion 68a is supported by the support member 64a in a state of being in a variable position, that is, in a floating state in which the position has a predetermined degree of freedom. The displacement of the first substrate holding portion 68a is caused by the displacement of the spring, and the amount of displacement is small. Of course, the substrate held by the first substrate holding portion 68a is also held in a floating state.

The front and rear moving mechanism 66a is configured to support the first substrate holding portion The support member 64a of 68a moves back and forth in the direction along the first direction D1. In the present embodiment, the front and rear moving mechanism 66a is provided with a ball screw and a motor as a drive mechanism. The movable range of the first substrate holding portion 68a and the support member 64a includes a position at which the substrate held by the first substrate holding portion 68a is disposed at the first exposure position P21. In addition, the movable range is the first substrate holding portion 78a and the support member 74a which are set so that the first substrate holding portion 68a and the support member 64a do not interfere with the first moving portion second series 70a, and can intersect in the second direction D2. In the present embodiment, the support member 64a is formed in a substantially L shape. Therefore, the two are not easily interfered, and the set movable range can be reduced. That is, the exposure device 20 can be miniaturized. The right and left moving mechanism 67a moves the support member 64a and the front-rear movement mechanism 66a that support the first substrate holding portion 68a to the left and right in the second direction D2 along the guide extending in the second direction D2. In the present embodiment, the right and left moving mechanism 67a is provided with a belt, a pulley, and a motor as a drive mechanism.

In the reference plate 90a, the positioning pin 93a protrudes from the surface of the back surface on the back surface of the installation position of the cylinder 92a. This positioning pin 93a has a function as a positioning structure together with the concave portion 63a formed in the base member 61a.

In the present embodiment, the positioning pin 93a is configured to be reciprocally movable in the direction along the first direction D1 by the cylinder 92a. Therefore, the positioning pin 93a is movable to a position accommodated on the front side of the back surface of the reference plate 90a. When the positioning pin 93a is housed in the reference plate 90a, the first substrate holding portion 68a does not easily interfere with the positioning pin as long as the support member 64a and the support member 74a cross the second direction D2. 93a, therefore, the movable range of the front and rear moving mechanism 66a can be reduced.

FIG. 4 shows an operation of arranging the substrate S3 at the first exposure position P21. In FIG. 4, the first moving unit second series 70a is described to move the substrate S3 to the first exposure position P21. (A) of FIG. 4 is a state in which the first substrate holding portion 78a is moved from the first standby position P11 to the back surface of the reference plate 90a along the second direction D2. At this time, the position of the substrate S3 is within the projection range of the through hole 91a of the reference plate 90a in the direction opposite to the first direction D1. Further, at this point of time, the accuracy of the height is not required for the position of the substrate S3.

(B) of FIG. 4 is a state in which the first substrate holding portion 78a is moved from the position shown in FIG. 4(A) to the position at which the substrate is placed at the first exposure position P21. As shown in the figure, the first substrate holding portion 78a moves to the first direction D1 until the flat surface on the surface side of the holding member 72a that holds the substrate and the reference plate 90a contacts the outer periphery of the substrate S3 held by the holding member 72a. In the present embodiment, the holding member 72a and the reference plate 90b are in contact with each other so as to be able to completely surround the outer periphery of the substrate S3.

However, the form of the contact is not limited to the embodiment of the present embodiment, and the predetermined portion of the reference plate 90a and the first substrate holding portion 78a may be in contact with the outer periphery of the substrate S3. For example, a plurality of (for example, three) protruding portions protruding toward the holding member 72a at the same protruding height may be formed on the reference plate 90a, and the protruding portions may contact the flat surface of the holding member 72a on the surface side of the holding substrate and The outer circumference of the substrate S3. Such a protruding portion may be formed on the holding member 72a instead of the reference plate 90a. Alternatively, protrusions may be formed on both the reference plate 90a and the holding member 72a, and the other may be mutually contact. In this manner, the reference plate 90a and the first substrate holding portion 78a may be in contact with the separated plurality of portions along the outer circumference of the substrate S3. In such a case, the contact portion is preferably dispersedly arranged along the outer circumference of the substrate S3.

In such a contact state, the substrate S3 is located inside the through hole 91a of the reference plate 90a. This position at which the substrate S3 is disposed is the first exposure position P21. At the first exposure position P21, since the reference plate 90a and the first substrate holding portion 68a (more specifically, the holding member 72a) are in contact with each other, the exposure head 111 can be held at the first exposure position P21. The first substrate holding portion 68a is accurately placed in a predetermined position in the direction D1.

When the first substrate holding portion 78a moves in the first direction D1, the positioning pin 93a extends in a direction opposite to the first direction D1 to be fitted into the concave portion 73a. Therefore, the position of the substrate S3 in the plane direction orthogonal to the first direction D1 is correctly positioned. In the present embodiment, the outer edge of the recess 73a has a chamfered shape. Therefore, it is easy to guide the positioning pin 93a to the inside of the recessed portion 73a.

According to this configuration, even if the first moving unit 50a does not accurately move the first moving unit first series 60a and the first moving unit second series 70a, the exposure head 111 can be made the first The exposure position P21 holds the first substrate holding portion 68a of the substrate (more specifically, the holding members 62a, 72a) at a predetermined position with excellent precision in the plane direction orthogonal to D1. As a result, the cost can be reduced. Moreover, since the support members 64a and 74a and the first substrate holding portions 68a and 78a can be made lighter, the conveyance speed of the substrate can be increased, and the productivity can be improved. And, no A strong basic structure for ensuring the movement accuracy of the height of the first moving portion 50a is required, and the exposure apparatus 20 can be downsized and the cost can be reduced.

5 and 6 are flowcharts showing the operation of the exposure apparatus 20. FIG. 5(A) shows the state of the exposure apparatus 20 in an initial state. In FIG. 5 and FIG. 6, the direction from the exposure unit 110 to the detection unit 100a in the second direction D2 is also referred to as the third direction D3, and the direction from the detection unit 100a to the detection unit 100b is also referred to as the fourth direction. D4.

When the operation of the exposure device 20 is started, first, as shown in FIG. 5(B), the reference plate 90a is retracted so that the detecting portion 100a on the opposite side to the exposure portion 110 moves in the fourth direction D4. This action is an operation of moving the detecting unit 100a to the position of the registration mark attached to the predetermined portion of the substrate. For the present embodiment, the alignment mark is attached near the corners of the 4 corners of the substrate. Then, as shown in FIG. 5(C), the substrate S1 is placed inside the reference plate 90a (first exposure position P21) via the second transfer unit 40a and the first moving unit 50a. When the substrate S1 is placed, the detecting portion 100a is placed at the position shown in FIG. 5(C), that is, at the position of the second direction D2 of the two position marks in the vicinity of the corners of the four corners of the substrate. Detection of bit marks. In the present embodiment, the detecting unit 100a detects the two registration marks by moving the camera 101a in the vertical direction. As described above, the detecting unit 100a moves to the position of the registration mark of the substrate in advance, whereby the alignment mark can be quickly detected after the arrangement of the substrate S1.

Next, as shown in FIG. 5(D), the detecting unit 100a moves in the third direction D3, and performs the remaining two pairs attached to the substrate S1. Detection of bit marks. According to the detection result, the exposure data is corrected to generate correction data. Next, as shown in FIG. 5(E), the exposure unit 110 scans from the original position HP to the third direction D3, and exposes the exposure surface of the substrate S1 based on the correction data. At the time of exposure, the detecting unit 100a is evacuated to the initial position shown in FIG. 5(A). Once the exposure is over, the exposure unit 110 returns to the original position HP. Further, the exposed substrate S1 is moved to the first standby position P11. This movement operation is performed simultaneously with the operation of moving the substrate S2 disposed at the first standby position P11 to the first exposure position P21 during the exposure time of the substrate S1. That is, the substrate S1 and the substrate S2 move so as to be able to cross the second direction D2.

The operation of FIG. 5 (A) to FIG. 5 (E) is repeated until the substrate S1 whose surface is exposed at the first exposure position P21 passes through the second transport unit 40a, the first transport unit 30, and the third transport unit 40b. It is placed in the second standby position P12. In the present embodiment, during the second exposure operation of the first exposure position P21, the substrate S1 is placed at the second standby position P12.

(F) of FIG. 6 shows a state in which the exposure of the substrates S1 and S2 is completed at the first exposure position P21, and the substrate S3 is placed in the first exposure position P21. The exposure unit 110 is returned to the original position HP. At this time, the substrate S1 that is first exposed at the second standby position P12 is placed at the second standby position P12. Therefore, in the reference plate 90b, the detecting portion 100b located on the opposite side of the exposure portion 110 moves in the fourth direction D4 and stands by in the vicinity of the original position HP. As described above, the standby position is a position at which two alignment marks of the substrate disposed at the second exposure position P22 can be detected. Set.

Next, as shown in FIG. 6(G), the exposure unit 110 scans from the original position HP in the third direction D3 to expose the exposure surface of the substrate S3. During the exposure operation, the substrate S1 disposed at the second standby position P12 is disposed at the second exposure position P22. At this time, the detecting unit 100b detects the two registration marks of the substrate S1. Next, as shown in FIG. 6(H), the detecting unit 100b moves in the fourth direction D4, and detects the remaining two alignment marks for the substrate S1. This detection and the generation of the correction data based on the detection result are performed until the exposure of the substrate S3 shown in FIG. 6(G) is completed.

When the exposure of the substrate S3 is completed, the exposure portion 110 is returned to the original position HP as shown in Fig. 6(I). The detecting unit 100b is evacuated to the position shown in FIG. 5(A). Then, the exposed substrate S3 is moved from the first exposure position P21 to the first standby position P11, and the unprocessed substrate S4 is moved from the first standby position P11 to the first exposure position P21. FIG. 6(I) shows a state immediately after the display substrate S3 has moved from the first exposure position P21.

Next, as shown in FIG. 6(J), the exposure unit 110 scans from the original position HP in the fourth direction D4 to expose the exposure surface (back surface) of the substrate S1. During the exposure operation, the substrate S4 disposed at the first standby position P11 is disposed at the first exposure position P21. At this time, the detecting unit 100a detects the two registration marks of the substrate S4. Then, as shown in FIG. 6(K), the detection unit 100a moves in the fourth direction D4 during the period until the exposure of the substrate S1 is completed, and the substrate S4 is applied. To complete the detection of the remaining two alignment markers. The generation of the correction data based on the detection result is also performed until the exposure of the substrate S1 is completed.

Then, when the exposure of the substrate S1 is completed, the exposure unit 110 returns to the original position HP as shown in FIG. 6(L). Further, the substrate S1 disposed at the second exposure position P22 is moved from the second exposure position P22 to the second standby position P12.

By repeating the operations of FIGS. 6(F) to 6(L), the substrate supplied to the exposure apparatus 20 has both the front surface and the back surface in a series of processes, and one exposure unit is used. 110 to be exposed. During such a cycle, the exposure unit 110 continuously reciprocates between the reference plate 90a and the reference plate 90b.

FIG. 7 is a timing chart of one cycle of the operation of the exposure apparatus 20 shown in FIGS. 6(F) to 6(L). As shown in the figure, the exposure apparatus 20 is in the first exposure position P21 of the surface treatment series, and the exposure processing period (period T11, T12) of the substrate processed by the first moving unit first series 60a is in the back surface processing series. The movement of the unprocessed substrate from the second standby position P12 to the second exposure position P22 (period T11) and the movement of the substrate from the second exposure position P22 to the second standby position P12 (period T11) And the substrate newly placed at the second exposure position P22, that is, the substrate of the substrate exposed in the next exposure process (period T12). In addition, the substrate measurement (period T42) of the substrate processed by the first moving unit first series 60a of the surface treatment series and the movement of the exposure unit 110 to the original position HP (period) In the period of T43) and the exposure (period T11, 12) and the subsequent movement of the exposure unit 110 to the original position HP (period T13), the processing processed by the first moving unit second series 70a can be completed. The movement of the substrate from the first standby position P11 to the first conveying unit 30 and the replacement operation of the unprocessed substrate from the first conveying unit 30 to the first standby position P11. The retracting operation of the detecting units 100a and 110b is performed in the same period as the moving operation of the exposure unit 110 to the original position HP (period T13, T23, T33, T43). Further, although not shown in the drawings, the correction of the exposure data actually measured by the substrate is performed in the same period as the movement operation of the exposure unit 110 to the original position HP. The points are the same for the substrates processed by the second moving portion first series 60b of the surface treatment series, the second moving portion first series 60b of the back surface processing series, and the second moving portion second series 70b.

As described above, the exposure device 20 can perform exposure processing for all the periods other than returning the exposure unit 110 to the original position HP after the exposure processing. The exposure processing for one substrate can be, for example, 12 seconds. The movement of the exposure unit 110 to the original position HP can be set to one time, for example, two seconds. In this case, the proportion of time taken for the exposure processing of the entire project is about 86%.

According to the exposure apparatus 20 described above, exposure can be alternately performed between the first exposure position P21 and the second exposure position P22. Therefore, the time at which exposure is performed at one exposure position can be assigned to a time for discharging the substrate that has been exposed at the other exposure position and arranging the new substrate at the other exposure position. Therefore, the substrate can be lifted Productive. Further, by the exposure device 20, the discharge from the first exposure position P21 of the substrate on which the exposure is completed and the arrangement of the new substrate to the first exposure position P21 can be simultaneously performed for the first exposure position P21. Therefore, the time required for exposure will be extremely short, which will greatly improve productivity. Further, since both surfaces of the substrate can be automatically exposed by one exposure unit 110, it contributes to cost reduction and downsizing of the device.

B. Second embodiment:

FIG. 8 is a perspective view showing a configuration of an exposure apparatus 220 as a second embodiment. Fig. 9 is a view showing the state of the exposure device 220 from the front. The exposure apparatus 220 of the second embodiment is a point at which the substrate is disposed at the first exposure position P21 and the second exposure position P22 so that the exposure surface thereof can be vertically upward, and the point attached thereto is the same as that of the first embodiment. The exposure device 20 is different. Hereinafter, only differences from the first embodiment will be described. In addition, FIG. 8 and FIG. 9 are symbols in which the respective constituent elements attached to the exposure apparatus 20 of the first embodiment are attached to the respective components of the exposure apparatus 220, and the description thereof is omitted.

As shown in FIG. 8, the exposure apparatus 220 is equipped with the exposure part 310 and the detection parts 300a and 300b which move along the upper surface of the base member 280. Inside the base member 280, the reference plates 290a and 290b are arranged side by side in the first direction D1 (the direction in the vertical direction) along the moving direction of the exposure unit 310. The first moving unit 250a and the second moving unit 250b are disposed below the reference plates 290a and 290b. The first moving unit 250a is provided with a first moving unit first series 260a and a first moving unit that are doubled. Department 2 series 270a.

The support member 264a of the first moving portion first series 260a supports the first substrate holding portion 268a while the first substrate holding portion 268a is located inside the right and left moving mechanisms 267a, 277a, and the left and right moving mechanisms 267a, 277a extend The second direction D2 (the direction orthogonal to the moving direction of the exposure unit 310) is formed. The first substrate holding portion 268a is configured such that the inside and the outside of the base member 280 can be moved in the second direction D2 via the opening formed in the base member 280 by the right and left moving mechanism 267a. Further, the first substrate holding portion 268a is configured to be movable in the direction along the first direction D1 by the front-rear movement mechanism 266a. With such a configuration, the first substrate holding portion 268a is configured to be movable between the first standby position P11 and the first exposure position P21. The first moving unit second series 270a has the same configuration as the first moving unit first series 260a. Further, the second moving unit 250b has the same configuration as the first moving unit 250a.

As shown in FIG. 9 , the first substrate holding portion 268 a and the first substrate holding portion 278 a can be disposed at different positions in the vertical direction, and thus can be simultaneously moved in the opposite direction so as to be able to cross the horizontal direction.

In the exposure apparatus 220 as described above, as shown in FIG. 8, the substrate is reloaded by the adsorption mechanism (not shown) in the order of the positions of the substrates S1, S2, S3, and S4. In other words, in the exposure device 220, the configuration of the guide rails 42a and 42b corresponding to the first embodiment can be omitted. Therefore, the exposure device 220 can be miniaturized.

C. Modifications: C-1. Modification 1:

The exposure device 20 may be a device that exposes only one surface of the substrate. In this case, the exposure device 20 may have two transport paths that independently discharge the substrates exposed at the first exposure position P21 and the second exposure position P22.

C-2. Modification 2:

The conveyance direction of the substrate of the exposure device 20 can be appropriately set. For example, when the first moving unit 50a is not doubled, the first moving unit 50a may be configured to transport the substrate only in the direction along the first direction D1. In this case, the second conveying unit 40a and the third conveying unit 40b may be omitted. For example, the first transport unit 30 that transports the substrate in the direction intersecting the first direction D1 is placed on the back side of the reference plate 90a, and the substrate is transferred from the first transport unit 30 to the first transport by the suction mechanism. The vicinity of the portion 30 is set to the first standby position P11 on the back surface of the reference plate 90a. According to such a configuration, the first moving unit 50a can transport the substrate along the first direction D1 from the first standby position P11 to the second standby position P12, and the substrate can be placed at the first exposure position P21.

Alternatively, the first moving portion 50a and the second moving portion 50b can be moved with a high degree of movement accuracy, and in the first exposure position and the second exposure position, the first substrate holding portion 68a and the second substrate can be provided for the exposure head 111. When the substrate holding portion 68b is accurately placed at a predetermined position, the reference plate 90a may be omitted, not only the second conveying portion 40a and the third conveying portion 40b. 90b. In this case, the first substrate holding portion 68a and the second substrate holding portion 68b are moved in the first direction D1, and are not necessarily disposed in the first exposure position P21 and the second exposure position P22. Therefore, the substrate can be transported only in the second direction D2, and is transported from the first standby position P11 or the second standby position P12 to the first line that is set on the extension line of the second direction D2 along the standby positions. The exposure position P21 or the second exposure position P22.

C-3. Modification 3:

The exposure device 20 may include an exposure unit 110 and a measurement unit that measures a distance from an exposure surface of the substrate disposed at the first exposure position P21 and the second exposure position P22. Such a measuring unit may be, for example, a laser distance meter. Further, the exposure device 20 may include a moving portion that moves the exposure unit 110 in the first direction D1. Such a moving portion may be, for example, a linear traveling mechanism. In the moving portion, the distance between the exposure portion 110 and the exposure surface of the substrate can be adjusted in accordance with the measurement result of the measurement portion.

According to the exposure apparatus of such a form, the focus can be stably connected even to the exposure surface of the substrate which is not smooth.

C-4. Modification 4:

The means for selectively irradiating light from the light source to any field of the exposure surface of the substrate is not limited to a polygonal mirror, and may be realized in various forms. For example, the means may also be a DMD (Digital Mirror Device). Moreover, the light source is not limited to a laser light source, and various types of Luminescent element. For example, the light source may also be a UV lamp or an LED or the like.

The embodiments of the present invention have been described above based on a few embodiments, but the embodiments of the present invention are intended to facilitate the understanding of the present invention and are not intended to limit the invention. It is a matter of course that the invention can be modified or modified without departing from the spirit and scope of the invention. Further, in the range in which at least a part of the above-mentioned problems or at least a part of the effects can be solved, the respective constituent elements described in the claims and the description can be combined or omitted.

20‧‧‧Exposure device

30‧‧‧1st transport department

31~34‧‧‧Mobile platform

35‧‧‧Reversal device

36‧‧‧rails

40a‧‧‧The second transport department

40b‧‧‧3rd Transport Department

41a, 41b‧‧‧ adsorption mechanism

42a, 42b‧‧‧ rails

50a‧‧‧1st mobile department

50b‧‧‧2nd Moving Department

60a‧‧‧1st Mobile Division 1st Series

70a‧‧‧1st Mobile Division 2nd Series

70b‧‧‧2nd Mobile Division 2nd Series

61a, 71b‧‧‧ base member

62a, 72b‧‧‧ Keeping components

63a, 73b‧‧‧ recess

Mobile agencies around 77a‧‧

68a, 78b‧‧‧1st substrate holder

80‧‧‧base member

81‧‧‧ base

82‧‧‧Guidance

83‧‧‧ wall

90a, 90b‧‧‧ reference board

100a, 100b‧‧‧Detection Department

110‧‧‧Exposure Department

S1~S6‧‧‧Substrate

P11‧‧‧1st standby position

P12‧‧‧2nd standby position

P21‧‧‧1st exposure position

P22‧‧‧2nd exposure position

HP‧‧‧ original location

Claims (11)

An exposure apparatus that exposes a substrate is characterized in that: a first moving portion includes a first substrate holding portion that holds the substrate, and the first substrate holding portion is moved to a first standby position and In the first exposure position, the substrate is disposed in a state in which the exposure surface of the substrate held by the first substrate holding portion is in the first direction, and the second moving portion is provided to hold the substrate. The second substrate holding portion moves the second substrate holding portion between the second standby position and the second exposure position, the second standby position being different from the first standby position, wherein the second exposure position is the first (2) a state in which the exposure surface of the substrate held by the substrate holding portion is in the first direction, and the exposure surface of the substrate disposed at the first exposure position is aligned with a second direction orthogonal to the first direction The substrate held by the second substrate holding portion is disposed in a state, and the exposure portion includes an exposure head that is movable between the first exposure position and the second exposure position along the guide. The member is disposed along the second direction, and selectively moves the substrate disposed at the first exposure position and the second exposure position by movement of the exposure head along the second direction The above substrate is exposed. The exposure apparatus according to the first aspect of the invention, wherein the first moving unit and the second moving unit respectively include two substrate holding units that are doubled, and are movable in a direction along the first direction And with The direction in which the first direction intersects is the first substrate holding portion or the second substrate holding portion. The exposure apparatus of claim 2, further comprising: a base member provided with the guide member; and a reference plate attached to the reference plate of the base member, wherein the substrate is insertable In the frame shape of the position of the inside of the reference plate in the first exposure position and the second exposure position, the first substrate holding portion and the second substrate holding portion hold the substrate while the substrate is in a variable position. a predetermined portion of the reference plate, a predetermined portion of the first substrate holding portion and the second substrate holding portion, and a state of the outer periphery of each of the substrates held by the first substrate holding portion and the second substrate holding portion The substrate is placed at the first exposure position and the second exposure position. The exposure apparatus of claim 1, further comprising: a base member provided with the guide member; and a reference plate attached to the reference plate of the base member, wherein the substrate is insertable a frame shape of a position of the inside of the reference plate at the first exposure position and the second exposure position, wherein the first moving portion and the second moving portion respectively constitute the first substrate holding portion and the second substrate holding portion Moving along the first direction, The first substrate holding portion and the second substrate holding portion hold the substrate in a state where the substrate is variable, and a predetermined portion of the reference plate, the first substrate holding portion, and the second substrate holding portion are predetermined. The substrate is placed in the first exposure position and the second exposure position in a state where the portion is in contact with the outer periphery of each of the substrates held by the first substrate holding portion and the second substrate holding portion. The exposure apparatus according to the third or fourth aspect of the invention, wherein the reference plate is formed with a pair of positioning members that are fitted to each other, and the first substrate holding portion and the second substrate holding portion are The other of the positioning structures is formed at a position outside the substrate held by the first substrate holding portion and the second substrate holding portion, and is held by the first substrate holding portion and the second substrate holding portion. The substrate is placed in the first exposure position and the second exposure position in a state in which the pair of positioning members are fitted. The exposure apparatus according to any one of claims 1 to 4, further comprising: a detecting unit configured to be movable in the second direction and configured to be disposed in the first exposure position And at least one of a position and a shape of the substrate at the second exposure position, wherein the exposure unit performs the exposure based on exposure data corrected in accordance with a detection result of the detection unit. The exposure apparatus of claim 6, wherein the guide is used as the movement of the exposure head along the second direction and the inspection The measuring unit is provided along the guide for both the movement in the second direction. The exposure apparatus according to any one of claims 1 to 4, further comprising: a first transport unit that transports the substrate; and a second transport unit that is coupled to the first transport unit The substrate is transported between the first standby positions, and the third transport unit transports the substrate between the first transport unit and the second standby position. The exposure apparatus according to any one of claims 1 to 4, further comprising: a measuring unit that measures the exposure head and the first exposure position and the second exposure position; a distance between the exposure surface of the substrate; and a third moving portion that moves the exposure head along the first direction, wherein the third moving portion adjusts the exposure head and the exposure according to a measurement result of the measurement unit The distance of the face. The exposure apparatus according to any one of claims 1 to 4, wherein the exposure head has a plurality of exposure units. An exposure method is an exposure method for exposing a substrate by an exposure device, characterized in that: a first project for preparing an exposure device, wherein a first exposure position and a second exposure position are set, the first exposure position The substrate is placed in a state in which the exposure surface of the substrate faces the first direction, and the second exposure position is The exposure surface of the substrate is in the first direction, and the exposure of the substrate is arranged in a state in which the exposure surface of the substrate disposed at the first exposure position and the second direction orthogonal to the first direction are arranged. The apparatus includes an exposure head that is movable between the first exposure position and the second exposure position along the second direction, and is selectively selectively moved by the movement of the exposure head along the second direction The substrate disposed at the first exposure position and the substrate disposed at the second exposure position are exposed; and the second project is performed until the exposure processing of the first substrate disposed at the first exposure position is completed a second substrate different from the first substrate is disposed at the second exposure position; and a third project is performed until the exposure process of the second substrate disposed at the second exposure position is completed The third substrate having a different second substrate is disposed at the first exposure position.