CN205003441U - Exposure machine is directly write to two mesa laser - Google Patents
Exposure machine is directly write to two mesa laser Download PDFInfo
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- CN205003441U CN205003441U CN201520764904.1U CN201520764904U CN205003441U CN 205003441 U CN205003441 U CN 205003441U CN 201520764904 U CN201520764904 U CN 201520764904U CN 205003441 U CN205003441 U CN 205003441U
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Abstract
The utility model relates to an exposure machine is directly write to two mesa laser compares with prior art and has solved laser and directly write the defect that exposure machine work efficiency is low. The utility model discloses an install double -slider motion subassembly and step -by -step of accurate motion on the support base, double -slider motion subassembly all lies in the top that the mesa supported adjustment subassembly A and mesa support adjustment subassembly B with the step -by -step axle of precision motion, optic system installs on the motion slider of the step -by -step axle of precision motion and optic system's exposure orientation supports adjustment subassembly B towards mesa support adjustment subassembly A or mesa, install left CCD subassembly on the left slider of double -slider motion subassembly, install right CCD subassembly on the right slider of double -slider motion subassembly, the light source orientation of left side CCD subassembly and right CCD subassembly supports adjustment subassembly A or mesa support adjustment subassembly B towards the mesa. The utility model discloses save the time of establishing ties and waiting for greatly in the whole exposure link, improved the productivity greatly.
Description
Technical field
The utility model relates to laser direct-writing exposure machine technical field, specifically a kind of dual stage face laser direct-writing exposure machine.
Background technology
Laser direct-writing exposure machine is relative to traditional exposure machine, and save the operation making film egative film or light shield, its production capacity is high, aligning accuracy is high.But laser direct-writing exposure machine at present is on the market single table surface design, the exposure need of work completing a table top waits for cycle long period, and its production capacity cannot meet Production requirement.Laser direct-writing exposure machine before exposure, after first will carrying out assembling the aligning operation of Z axis based on the location of the optimal focal plane of exposure base, CCD system, just start the exposure operation of light path system, before exposure operation, the preliminary work time is longer, mostly be in the course of work to occur that operating personnel carry out manual operation after waiting for machine again, cause inefficiency, yield poorly.And most of enterprise is in order to meet production capacity demand, mostly adopts two single table surface to join transfer line system and work simultaneously, virtually improve production cost.How to develop a kind of work efficiency that can improve laser direct-writing exposure machine and become the technical matters being badly in need of solving.
Utility model content
The purpose of this utility model is to solve the defect that in prior art, laser direct-writing exposure machine work efficiency is low, provides a kind of dual stage face laser direct-writing exposure machine to solve the problems referred to above.
To achieve these goals, the technical solution of the utility model is as follows:
A kind of dual stage face laser direct-writing exposure machine, comprise integrated base, light path system, left CCD assembly and right CCD assembly, integrated base is provided with base for supporting, base for supporting is provided with mesa supports adjustment assembly A, mesa supports adjustment assembly A comprises scan axis, the top of scan axis is provided with gathering Z axis, assembles above Z axis and is provided with vacuum cup
Also comprise mesa supports adjustment assembly B, it is identical that mesa supports adjustment assembly B and mesa supports adjusts assembly A structure, and mesa supports adjusts assembly B and to be arranged on base for supporting and to adjust assembly A transverse direction corresponding with mesa supports;
Base for supporting is provided with double-slider moving parts and precise motion stepping axle, double-slider moving parts and precise motion stepping axle are all positioned at the top of mesa supports adjustment assembly A and mesa supports adjustment assembly B, on the moving slide block that light path system is arranged on precise motion stepping axle and the exposure directions of light path system towards mesa supports adjustment assembly A or mesa supports adjustment assembly B, the left slider of double-slider moving parts is provided with left CCD assembly, the right slide block of double-slider moving parts is provided with right CCD assembly, the light source direction of left CCD assembly and right CCD assembly is towards mesa supports adjustment assembly A or mesa supports adjustment assembly B.
Described double-slider moving parts comprises the double-slider base be arranged on base for supporting, and double-slider base is provided with guide rail, and left slider and right slide block are arranged on to form on guide rail and with guide rail and are slidably matched.
Also comprise dividing plate, dividing plate to be arranged on base for supporting and between mesa supports adjustment assembly A and mesa supports adjustment assembly B.
Also comprise electric-control system, electric-control system is fixedly mounted on integrated base, and the control line of left slider drive motor, the control line of right slider-actuated motor are all connected on electric-control system, and the drived control line of precise motion stepping axle is connected on electric-control system.
Described left CCD assembly comprises left CCD support, left CCD support installing is on left slider, left CCD support is provided with left CCD system, left CCD system comprises the CCD be arranged on left CCD support and amplifies light path, the tail end that CCD amplifies light path is provided with CCD camera, and the front end that CCD amplifies light path is provided with CCD light source; Right CCD assembly comprises right CCD support, and right CCD support installing, on right slide block, right CCD support is provided with right CCD system, and right CCD system is identical with left CCD system structure.
beneficial effect
A kind of dual stage face of the present utility model laser direct-writing exposure machine, compared with prior art greatly saves in whole exposure link the time of connecting and waiting for, substantially increases production capacity, directly writes close to two single table surface the production capacity that exposure machine works simultaneously.And reduce cost, there is little, that power consumption the is little feature that takes up room.
Accompanying drawing explanation
Fig. 1 is structural perspective of the present utility model;
Fig. 2 is the structure front elevation of double-slider moving parts in the utility model;
Fig. 3 is the structure vertical view of vacuum cup in the utility model;
Fig. 4 is control method process flow diagram of the present utility model;
Fig. 5 is the structure vertical view of the utility model when the t4 time period;
Fig. 6 is the structure vertical view of the utility model when the t6 time period;
Fig. 7 is the structure vertical view of the utility model when the t10 time period;
Fig. 8 is the structure vertical view of the utility model when the t12 time period;
Wherein, 1-feet, 2-scan axis, 3-assembles Z axis, 4-vacuum cup, 5-electric-control system, 6-light path system, 7-precise motion stepping axle, 8-double-slider moving parts, the right CCD assembly of 9-, the left CCD assembly of 10-, 11-dividing plate, 12-base for supporting, 13-integrated base, 14-sucker camera, 15-demarcates Mark, 16-guide rail, 17-left slider, the left CCD support of 18-, the left CCD system of 19-, the right slide block of 20-, the right CCD support of 21-, the right CCD system of 22-, 23-double-slider base, 24-CCD light source, 25-CCD amplifies light path, 26-CCD camera, 30-mesa supports adjustment assembly A, 31-mesa supports adjustment assembly B.
Embodiment
For making to have a better understanding and awareness architectural feature of the present utility model and effect of reaching, coordinating detailed description in order to preferred embodiment and accompanying drawing, being described as follows:
As shown in Figure 1, a kind of dual stage face described in the utility model laser direct-writing exposure machine, comprise integrated base 13, light path system 6, left CCD assembly 10 and right CCD assembly 9, the bottom of integrated base 13 is provided with four feets 1, feet 1 is shock insulation feet, support the weight of whole dual stage face exposure machine, be effectively reduced in the vibration produced in the course of work of dual stage face, and the ground of certain frequency section or the extraneous vibration produced can be isolated.Integrated base 13 is provided with base for supporting 12, base for supporting 12 is marble gantry supporting structure, realizes the fixed installation by different level of light path system 6, left CCD assembly 10 and right CCD assembly 9.Base for supporting 12 is provided with mesa supports adjustment assembly A30, mesa supports adjustment assembly A30 is prior art content, and be table top A, it comprises scan axis 2, movement when scan axis 2 exposes on vacuum cup 4 for pcb board.The top of scan axis 2 is provided with assembles Z axis 3, assemble the optimal focal plane of Z axis 3 exposure base for finding, main method is that pattern generator projects to raster pattern on substrate, then move up and down and assemble Z axis 3, gathering Z axis 3 position when judging that raster image is best by the method for graphics process, i.e. passive focusing.Assemble above Z axis 3 and be provided with vacuum cup 4, vacuum cup 4 is for placing pcb board.
As shown in Figure 3, vacuum cup 4 is provided with sucker camera 14 by prior art mode and demarcates Mark15, sucker camera 14 and demarcation Mark15 are used for system calibration during long-term work, and sucker camera 14 is for demarcating the position relationship between each shaven head of light path system; Demarcate Mark15 and be used for the position relationship of periodic calibrating two CCD based on each table top coordinate system.
Mesa supports adjustment assembly B31 and mesa supports adjusts assembly A30 and support the use, and mesa supports adjusts assembly B31(table top B) to adjust assembly A30 structure identical with mesa supports, be made up of scan axis, focusing Z axis and vacuum cup equally.Mesa supports adjustment assembly B31 and mesa supports adjust that two scan axises of these two table system of assembly A30 are all parallel is installed on base for supporting 12, and focusing Z axis is when same position, and two table tops are consistent based on the height of base for supporting 12.Two table system focus on Z axis by two respectively based on the focal plane of light path system and regulate, and namely two focus on Z axis and constitute two independent autofocus systems.Equally, the vacuum system of two table system is arranged separately, adopts two fan blowers to carry out air feed respectively.Mesa supports adjustment assembly B31 is arranged on base for supporting 12 and adjust assembly A30 transverse direction corresponding with mesa supports, adjusts assembly A30 arrange in pairs or groups and use, to enhance productivity with mesa supports.
Base for supporting 12 is provided with double-slider moving parts 8 and precise motion stepping axle 7, double-slider moving parts 8 and precise motion stepping axle 7 are all positioned at the top of mesa supports adjustment assembly A30 and mesa supports adjustment assembly B31, and the installation that both are respectively used to left CCD assembly 10, right CCD assembly 9 and light path system 6 is fixed.The stepping axle that precise motion stepping axle 7 can use the model of Aerotech company to be PRO280LM-800, plays accurate positioning action.Light path system 6 is arranged on the moving slide block of precise motion stepping axle 7, the exposure directions of light path system 6 is towards mesa supports adjustment assembly A30 or mesa supports adjustment assembly B31, by the motion of moving slide block on precise motion stepping axle 7, drive light path system 6 laterally (X-direction) motion, exposure operation is carried out to the pcb board on mesa supports adjustment assembly A30 or mesa supports adjustment assembly B31.Precise motion stepping axle 7 can also adopt hollow structure, and light path system 6 penetrates from hollow structure, is conducive to reasonable distribution and the raising in precise motion stepping axle 7 life-span of the load of precise motion stepping axle 7.Further, light path system 6 is fixed on the moving slide block of precise motion stepping axle 7 with light path, moves left and right with precise motion stepping axle 7, and LASER Light Source is actionless relative to light path, avoids optical fiber long-term motion to cause damage.
As shown in Figure 2, double-slider moving parts 8 comprises the double-slider base 23 be arranged on base for supporting 12, double-slider base 23 is provided with guide rail 16.Left slider 17 and right slide block 20 are installed on track 16 and are formed with guide rail 16 and be slidably matched, left slider 17, right slide block 20 form with guide rail 16 mode be slidably matched and can adopt various ways of the prior art, as left slider 17, right slide block 20 block on track 16.The left slider 17 of double-slider moving parts 8 is provided with left CCD assembly 10, the right slide block 20 of double-slider moving parts 8 is provided with right CCD assembly 9.Left CCD assembly 10 comprises left CCD support 18, and left CCD support 18 is for installing left CCD system 19.Left CCD support 18 is arranged on left slider 17, and left CCD support 18 is provided with left CCD system 19.Left CCD system 19 comprises and is arranged on CCD on left CCD support 18 and amplifies tail end that light path 25, CCD amplifies light path 25 and be provided with the front end that CCD camera 26, CCD amplifies light path 25 and be provided with CCD light source 24.Right CCD system 22 is identical with the structure of left CCD system 19, amplifies light path, CCD system high definition camera and CCD system source equally form by CCD system.Right CCD assembly 9 comprises right CCD support 21, and right CCD support 21 is arranged on right slide block 20, is provided with right CCD system 22 on right CCD support 21.The light source direction of left CCD assembly 10 and right CCD assembly 9 is towards mesa supports adjustment assembly A30 or mesa supports adjustment assembly B31, by the motion of left slider 17 and right slide block 20, laterally (X-direction) motion of left CCD assembly 10 and right CCD assembly 9 can be driven, aligning positioning operation is carried out to the pcb board on mesa supports adjustment assembly A30 or mesa supports adjustment assembly B31.
Dividing plate 11 to be arranged on base for supporting 12 and between mesa supports adjustment assembly A30 and mesa supports adjustment assembly B31, making mesa supports adjust assembly B31 and mesa supports adjusts in the space that assembly A30 works alone belonging to oneself, when effectively prevent artificial upper and lower plates, the risk of damage can be caused in the gap between two suckers to staff.In order to realize the automation mechanized operation of equipment, electric-control system 5 can be installed additional, also can utilize and upper Automated condtrol being carried out to double-slider moving parts 8 and precise motion stepping axle 7.Wherein, when use electric-control system 5, it can be fixedly mounted on integrated base 13, base for supporting 12, mesa supports adjustment assembly B31 and mesa supports is adjusted assembly A30 and is all integrated on integrated base 13, be convenient to integration and debug and transport.The control line of left slider 17 drive motor, the control line of right slide block 20 drive motor are all connected on electric-control system 5, the drived control line of precise motion stepping axle 7 is connected on electric-control system 5 equally, is automatically controlled the movement of the moving slide block of left slider 17, right slide block 20 and precise motion stepping axle 7 by electric-control system 5.
As shown in Figure 4, a kind of automation control method for dual stage face laser direct-writing exposure machine is also provided at this, the workflow series connection chemical industry being completed mesa supports adjustment assembly A30 and mesa supports adjustment assembly B31 by multiple cycle regular time is done, CCD system location and exposure process are disassembled, two table tops synchronously carry out, in this practical application, can by manually placing pcb board on mesa supports adjustment assembly A30 and mesa supports adjustment assembly B31, if mix mechanically or transfer matic carry out fluctuating plate, production capacity can bring up to manually-operated more than 2 times of single table surface.It specifically comprises the following steps:
The first step, setting-up time cycle T, T={t1, t2, t3 ... the value of t12}, concrete t is determined according to the reality of work situation of laser direct-writing exposure machine, demarcates mesa supports adjustment assembly A30 and the work of mesa supports adjustment assembly B31 bi-directional synchronization with this.Artificial graphic documentation mesa supports being adjusted assembly A30 and mesa supports adjustment assembly B31 two sides imports profile server and carries out component process respectively, imports the storer of pattern generator after being disposed.
Second step, in the 0-t4 time period, light path system 6 couples of mesa supports adjustment assembly A30 carry out exposure operation, and exposure operation spended time is t1-t4 4 time period t altogether.
3rd step, synchronous when the t1 time period, electric-control system 5 controls double-slider moving parts 8 and drives left CCD assembly 10 and right CCD assembly 9 to move to the top of mesa supports adjustment assembly B31.
4th step, in the 0-t2 time period, carrying out the operation of folding and unfolding plate to mesa supports adjustment assembly B31, can be manual operation or production line upper and lower plates.
5th step, in the t2-t3 time period, mesa supports adjustment assembly B31 is by adjustment motion scan axle and assemble Z axis, makes it aim at starting point.
6th step, as shown in Figure 5, in the t3-t5 time period, left CCD assembly 10 and right CCD assembly 9 couples of mesa supports adjustment assembly B31 carry out aligning operation, complete the aligning operation of four anchor points (or the porous contraposition of matrix hole) of pcb board on mesa supports adjustment assembly B31 respectively.
7th step, as shown in Figure 5 and Figure 6, in the t4-t6 time period, mesa supports adjustment assembly A30 terminates exposure operation.Electric-control system 5 controls precise motion stepping axle 7 and drives light path system 6 to move to the exposure starting point of mesa supports adjustment assembly B31, prepares to expose the pcb board on mesa supports adjustment assembly B31.
8th step, as shown in Figure 6, in the t6-t7 time period, electric-control system 5 controls double-slider moving parts 8 and drives left CCD assembly 10 and right CCD assembly 9 to move to the top of mesa supports adjustment assembly A30.
9th step, in the t6-t8 time period, carries out the operation of folding and unfolding plate to mesa supports adjustment assembly A30.
Tenth step, as shown in Figure 7, in the t6-t10 time period, mesa supports adjustment assembly B31 carries out exposure operation.
11 step, as shown in Figure 7, in the t8-t9 time period, mesa supports adjustment assembly A30 adjustment moves to aligning starting point, same by adjusting motion scan axle and assembling Z axis, makes it aim at starting point.
12 step, in the t9-t11 time period, left CCD assembly 10 and right CCD assembly 9 couples of mesa supports adjustment assembly A30 carry out aligning operation.
13 step, in the t11-t12 time period, electric-control system 5 controls double-slider moving parts 8 and drives left CCD assembly 10 and right CCD assembly 9 to move to the top of mesa supports adjustment assembly B31.
14 step, in the t10-t12 time period, mesa supports adjustment assembly B31 end exposure, electric-control system 5 controls precise motion stepping axle 7 and drives light path system 6 to move to the exposure starting point of mesa supports adjustment assembly A30, restarts the flow process operation that another is taken turns.
More than show and describe ultimate principle of the present utility model, principal character and advantage of the present utility model.The technician of the industry should understand; the utility model is not restricted to the described embodiments; the just principle of the present utility model described in above-described embodiment and instructions; under the prerequisite not departing from the utility model spirit and scope, the utility model also has various changes and modifications, and these changes and improvements all fall in claimed scope of the present utility model.The protection domain that the utility model requires is defined by appending claims and equivalent thereof.
Claims (5)
1. a dual stage face laser direct-writing exposure machine, comprise integrated base (13), light path system (6), left CCD assembly (10) and right CCD assembly (9), integrated base (13) is provided with base for supporting (12), base for supporting (12) is provided with mesa supports adjustment assembly A(30), mesa supports adjustment assembly A(30) comprise scan axis (2), the top of scan axis (2) is provided with assembles Z axis (3), assemble Z axis (3) top and vacuum cup (4) be installed, it is characterized in that:
Also comprise mesa supports adjustment assembly B(31), mesa supports adjustment assembly B(31) adjust assembly A(30 with mesa supports) both structures are identical, mesa supports adjustment assembly B(31) and be arranged on base for supporting (12) above and adjust assembly A(30 with mesa supports) horizontal corresponding;
Base for supporting (12) is provided with double-slider moving parts (8) and precise motion stepping axle (7), double-slider moving parts (8) and precise motion stepping axle (7) are all positioned at mesa supports adjustment assembly A(30) and mesa supports adjust assembly B(31) top, on the moving slide block that light path system (6) is arranged on precise motion stepping axle (7) and the exposure directions of light path system (6) towards mesa supports adjustment assembly A(30) or mesa supports adjustment assembly B(31), the left slider (17) of double-slider moving parts (8) is provided with left CCD assembly (10), the right slide block (20) of double-slider moving parts (8) is provided with right CCD assembly (9), the light source direction of left CCD assembly (10) and right CCD assembly (9) is towards mesa supports adjustment assembly A(30) or mesa supports adjustment assembly B(31).
2. a kind of dual stage face according to claim 1 laser direct-writing exposure machine, it is characterized in that: described double-slider moving parts (8) comprises the double-slider base (23) be arranged on base for supporting (12), double-slider base (23) is provided with guide rail (16), it is upper and form with guide rail (16) and be slidably matched that left slider (17) and right slide block (20) are arranged on guide rail (16).
3. a kind of dual stage face according to claim 1 laser direct-writing exposure machine, it is characterized in that: also comprise dividing plate (11), dividing plate (11) is arranged on base for supporting (12) and goes up and be positioned at mesa supports adjustment assembly A(30) and mesa supports adjustment assembly B(31) between.
4. a kind of dual stage face according to claim 1 laser direct-writing exposure machine, it is characterized in that: also comprise electric-control system (5), electric-control system (5) is fixedly mounted on integrated base (13), the control line of the control line of left slider (17) drive motor, right slide block (20) drive motor is all connected on electric-control system (5), and the drived control line of precise motion stepping axle (7) is connected on electric-control system (5).
5. a kind of dual stage face according to claim 2 laser direct-writing exposure machine, it is characterized in that: described left CCD assembly (10) comprises left CCD support (18), left CCD support (18) is arranged on left slider (17), left CCD support (18) is provided with left CCD system (19), left CCD system (19) comprises the CCD be arranged on left CCD support (18) and amplifies light path (25), the tail end that CCD amplifies light path (25) is provided with CCD camera (26), and the front end that CCD amplifies light path (25) is provided with CCD light source (24); Right CCD assembly (9) comprises right CCD support (21), and right CCD support (21) is arranged on right slide block (20), and right CCD support (21) is provided with right CCD system (22), and both structures of right CCD system (22) and left CCD system (19) are identical.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520764904.1U CN205003441U (en) | 2015-09-30 | 2015-09-30 | Exposure machine is directly write to two mesa laser |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520764904.1U CN205003441U (en) | 2015-09-30 | 2015-09-30 | Exposure machine is directly write to two mesa laser |
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| Publication Number | Publication Date |
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| CN205003441U true CN205003441U (en) | 2016-01-27 |
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| CN201520764904.1U Active CN205003441U (en) | 2015-09-30 | 2015-09-30 | Exposure machine is directly write to two mesa laser |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105182699A (en) * | 2015-09-30 | 2015-12-23 | 合肥芯碁微电子装备有限公司 | Double-mesa laser direct writing exposure machine and control method therefor |
| CN109358476A (en) * | 2018-12-13 | 2019-02-19 | 苏州源卓光电科技有限公司 | Yellow light is to Barebone, litho machine and its alignment methods |
| CN110286563A (en) * | 2019-06-19 | 2019-09-27 | 深圳凯世光研股份有限公司 | A kind of circulating scanning exposure machine |
-
2015
- 2015-09-30 CN CN201520764904.1U patent/CN205003441U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105182699A (en) * | 2015-09-30 | 2015-12-23 | 合肥芯碁微电子装备有限公司 | Double-mesa laser direct writing exposure machine and control method therefor |
| CN105182699B (en) * | 2015-09-30 | 2017-06-30 | 合肥芯碁微电子装备有限公司 | A kind of dual stage face laser direct-writing exposure machine and its control method |
| CN109358476A (en) * | 2018-12-13 | 2019-02-19 | 苏州源卓光电科技有限公司 | Yellow light is to Barebone, litho machine and its alignment methods |
| CN110286563A (en) * | 2019-06-19 | 2019-09-27 | 深圳凯世光研股份有限公司 | A kind of circulating scanning exposure machine |
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Address after: 230088 the 11 level of F3 two, two innovation industrial park, No. 2800, innovation Avenue, Hi-tech Zone, Hefei, Anhui. Patentee after: Hefei Xinqi microelectronics equipment Co., Ltd Address before: 230088, Hefei province high tech Zone, 2800 innovation Avenue, 533 innovation industry park, H2 building, room two, Anhui Patentee before: HEFEI XINQI MICROELECTRONIC EQUIPMENT CO., LTD. |