TWI726060B - Transparent plate surface inspection device, transparent plate surface inspection method, and glass plate manufacturing method - Google Patents

Transparent plate surface inspection device, transparent plate surface inspection method, and glass plate manufacturing method Download PDF

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TWI726060B
TWI726060B TW106107004A TW106107004A TWI726060B TW I726060 B TWI726060 B TW I726060B TW 106107004 A TW106107004 A TW 106107004A TW 106107004 A TW106107004 A TW 106107004A TW I726060 B TWI726060 B TW I726060B
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main surface
stripe pattern
light source
transparent board
inspection
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TW106107004A
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TW201738551A (en
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木村友紀
有田祐介
池野田稔
東山明弘
北山大介
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日商Ａｇｃ股份有限公司
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896—Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • G01B11/254—Projection of a pattern, viewing through a pattern, e.g. moiré
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/898—Irregularities in textured or patterned surfaces, e.g. textiles, wood
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects

Abstract

本發明提供一種檢查精度提高之透明板表面檢查裝置。 本發明之透明板表面檢查裝置係檢查透明板之主表面之透明板表面檢查裝置，且具有包含條紋圖案之光源、設置於來自上述光源之光於上述主表面反射後之前方之線感測器相機、及將所拍攝之上述條紋圖案之圖像進行圖像處理之圖像處理裝置，且上述線感測器相機具有包含排列於特定方向上之複數個像素之攝像元件、及將上述條紋圖案於上述攝像元件上成像之透鏡，上述光源及上述攝像元件係兩者均配置於上述主表面之單側，且分別與上述主表面傾斜地對向，且配置於上述特定方向之一端之上述像素之上述主表面中之攝像點之面積(S1)與配置於上述特定方向之另一端之上述像素之上述主表面中之攝像點之面積(S2(S2＞S1))之比(S1/S2)為0.20以上。The invention provides a transparent board surface inspection device with improved inspection accuracy. The transparent board surface inspection device of the present invention is a transparent board surface inspection device for inspecting the main surface of the transparent board, and has a light source including a stripe pattern, and a line sensor arranged in front of the light from the light source after being reflected on the main surface A camera, and an image processing device that performs image processing on the captured image of the stripe pattern, and the line sensor camera has an imaging element including a plurality of pixels arranged in a specific direction, and the stripe pattern For the lens forming an image on the image pickup element, the light source and the image pickup element are both arranged on one side of the main surface, and respectively obliquely opposed to the main surface, and are arranged at one end of the specific direction of the pixel The ratio (S1/S2) of the area (S1) of the imaging point on the main surface and the area (S2 (S2>S1)) of the imaging point on the main surface of the pixel arranged at the other end of the specific direction is 0.20 or more.

Description

透明板表面檢查裝置、透明板表面檢查方法、及玻璃板之製造方法Transparent plate surface inspection device, transparent plate surface inspection method, and glass plate manufacturing method

本發明係關於一種透明板表面檢查裝置、透明板表面檢查方法、及玻璃板之製造方法。The invention relates to a transparent board surface inspection device, a transparent board surface inspection method, and a glass plate manufacturing method.

專利文獻1中記載之檢查裝置係利用設置於來自光源之光因透明板之檢查面反射後之前方之相機拍攝光源之條紋圖案，且藉由將由相機所拍攝之圖像進行圖像處理而檢查透明板之表面形狀。所拍攝之圖像具有亮部與暗部交替地反覆之條紋圖案。可藉由檢測該條紋圖案與基準圖案之偏移，而對檢查面之表面形狀進行檢查。作為基準圖案，於檢查面為理想平面之情形時使用相機拍攝之條紋圖案。 [先前技術文獻] [專利文獻] [專利文獻1]日本專利特開2005-345383號公報The inspection device described in Patent Document 1 uses a camera installed in front of the light from the light source to be reflected by the inspection surface of the transparent plate to photograph the stripe pattern of the light source, and inspects by image processing the image taken by the camera The surface shape of the transparent board. The captured image has a striped pattern in which bright parts and dark parts are alternately repeated. The surface shape of the inspection surface can be inspected by detecting the deviation between the stripe pattern and the reference pattern. As a reference pattern, use the stripe pattern taken by the camera when the inspection surface is an ideal plane. [Prior Art Document] [Patent Document] [Patent Document 1] Japanese Patent Laid-Open No. 2005-345383

[發明所欲解決之問題] 相機係包括含有直線上排列之複數個像素之攝像元件、及將條紋圖案在攝像元件中成像之透鏡。光源或攝像元件係兩者均配置於檢查面之單側，且分別與檢查面傾斜地對向。可藉由該配置，而有效地排列複數個檢查裝置。 先前，以檢查裝置之緊密化為目的，而使相機之位置靠近檢查面，且將廣角之透鏡用作相機之透鏡。 近年來，因透明板而要求較高之平坦度，從而先前之檢查裝置變得檢查精度不充分。 本發明係鑒於上述課題研製而成者，主要目的在於提供一種已將檢查精度提昇之透明板表面檢查裝置。 [解決問題之技術手段] 為解決上述課題，根據本發明之一態樣，提供一種透明板表面檢查裝置， 其係檢查透明板之主表面之透明板表面檢查裝置，且具有： 光源，其包含條紋圖案；線感測器相機，其設置於來自上述光源之光因上述主表面反射後之前方，拍攝上述條紋圖案；及圖像處理裝置，其係將所拍攝之上述條紋圖案之圖像進行圖像處理； 上述線感測器相機具有包含排列於特定方向上之複數個像素之攝像元件、及將上述條紋圖案於上述攝像元件上成像之透鏡， 上述光源及上述攝像元件係兩者均配置於上述主表面之單側，且分別與上述主表面傾斜地對向， 配置於上述特定方向之一端之上述像素之上述主表面中之攝像點之面積(S1)與配置於上述特定方向之另一端之上述像素之上述主表面中之攝像點之面積(S2(S2＞S1))之比(S1/S2)為0.20以上。 [發明之效果] 根據本發明之一態樣，提供一種檢查精度提高之透明板表面檢查裝置、透明板表面檢查方法、及玻璃板之製造方法。[Problem to be Solved by the Invention] The camera includes an imaging element including a plurality of pixels arranged on a straight line, and a lens that images a stripe pattern in the imaging element. Both the light source and the imaging element are arranged on one side of the inspection surface, and are respectively obliquely opposed to the inspection surface. With this configuration, a plurality of inspection devices can be effectively arranged. Previously, for the purpose of compacting the inspection device, the position of the camera was close to the inspection surface, and a wide-angle lens was used as the lens of the camera. In recent years, high flatness is required due to transparent plates, and the previous inspection devices have become insufficient in inspection accuracy. The present invention was developed in view of the above-mentioned problems, and its main purpose is to provide a transparent board surface inspection device that has improved inspection accuracy. [Technical Means for Solving the Problem] In order to solve the above-mentioned problems, according to one aspect of the present invention, a transparent board surface inspection device is provided, which is a transparent board surface inspection device for inspecting the main surface of the transparent board, and has: a light source, which includes Stripe pattern; a line sensor camera, which is arranged in front of the light from the light source after being reflected by the main surface, and photographs the stripe pattern; and an image processing device which takes the image of the stripe pattern taken Image processing; The line sensor camera has an imaging element including a plurality of pixels arranged in a specific direction, and a lens that images the stripe pattern on the imaging element, and both the light source and the imaging element are arranged On one side of the main surface, and respectively obliquely opposite to the main surface, the area (S1) of the imaging point in the main surface of the pixel arranged at one end of the specific direction and the other end arranged in the specific direction The ratio (S1/S2) of the area (S2 (S2>S1)) of the imaging point on the main surface of the pixel is 0.20 or more. [Effects of the Invention] According to one aspect of the present invention, a transparent board surface inspection device, a transparent board surface inspection method, and a glass plate manufacturing method with improved inspection accuracy are provided.

以下，參照圖式，對用以實施本發明之透明板表面檢查裝置及透明板表面檢查方法之形態進行說明。於各圖式上，對於同一或對應之構成，標註同一或對應之符號且省略說明。 圖1係一實施形態之透明板表面檢查裝置之檢查透明板之表側之主表面時之剖視圖，且係沿著圖2之I-I而成之剖視圖。圖2係一實施形態之透明板表面檢查裝置之檢查透明板之表側之主表面時之俯視圖。 透明板表面檢查裝置10係如圖1及圖2所示，檢查透明板60之表側之主表面61(以下，亦稱為「檢查面61」)之形狀。作為透明板60，可列舉玻璃板、樹脂板等。透明板表面檢查裝置10具有例如光源20、線感測器相機30、及圖像處理裝置50。 光源20具有LED(Light-emitting diode，發光二極體)等光源本體21、及條紋圖案22。條紋圖案22係設置於光源本體21之發光面上。亦可於條紋圖案22與光源本體21之間，設置光擴散片等光學片。 線感測器相機30係設置於光源20之光被檢查面61反射後之前方，且拍攝光源20中所含之條紋圖案22。線感測器相機30具有包含排列於特定方向上之複數個像素之攝像元件31、及使條紋圖案22於攝像元件31中成像之透鏡32。作為攝像元件31，使用有例如CCD(Charge-coupled Device，電荷耦合元件)影像感測器、CMOS(Complementary Metal Oxide Semiconductor，互補金屬氧化物半導體)影像感測器等。 圖像處理裝置50係將利用線感測器相機30所拍攝之圖像進行圖像處理。圖像處理裝置50具有CPU(Central Processing Unit，中央處理單元)51、記憶體等記憶媒體52。圖像處理裝置50係藉由使CPU51執行記憶媒體52中記憶之程式而進行圖像處理。 圖3係表示藉由一實施形態之線感測器相機所拍攝之圖像之亮度分佈中之由透明板之表側之主表面反射所得之條紋圖案之像之亮度分佈之圖。於圖3中，橫軸表示線感測器相機30之像素之編號，縱軸表示亮度。像素之編號係表示像素排列之順序(整數)。如圖3所示，所拍攝之圖像具有亮部與暗部交替地反覆之條紋圖案。 圖像處理裝置50係檢測所拍攝之條紋圖案與基準圖案之偏移。作為基準圖案，於檢查面61為理想平面之情形時使用線感測器相機30所拍攝之條紋圖案。基準圖案係將藉由計算等而求出且預先記憶於記憶媒體52者讀出使用。 圖像處理裝置50可藉由檢測所拍攝之條紋圖案自基準圖案之偏移，而檢測檢查面61之各點上之斜率，且可藉由將該斜率進行積分而檢測表面形狀。對於根據條紋圖案之偏移導出表面形狀之方法，可使用一般性者，例如可使用上述專利文獻1中記載者。 且說，如圖1所示，光源20及攝像元件31兩者均配置於檢查面61之單側，且分別與檢查面61傾斜地對向。來自光源20之光之中心線相對於檢查面61之傾斜角θ1例如為35°以上55°以下，較佳為40°以上50°以下。而且，朝向攝像元件31之光之中心線相對於檢查面61之傾斜角θ2例如為35°以上55°以下，較佳為40°以上50°以下。傾斜角θ1與傾斜角θ2係於上述範圍內相等。 如上所述，可藉由使光源20及攝像元件31兩者均配置於檢查面61之單側且分別與檢查面61傾斜地對向，而有效地排列複數個透明板表面檢查裝置10。為提高該透明板表面檢查裝置10之檢查精度，本發明者著眼於攝像元件31之各像素之檢查面61中之攝像點之面積之不均。 圖4係利用一實施形態之攝像元件之一端之像素所拍攝之檢查面上之攝像點之面積之說明圖。於圖4中，將光源20之條紋圖案22上之一點22P1成像於攝像元件31之一端之像素31P1。該像素31P1之檢查面61中之攝像點之面積S1可使用下述式(1)～(3)進行運算。 S1＝α×Sf×β12 …(1) β1＝A1b/A1…(2) A1＝A1a＋A1b…(3) 此處，α係表示顯示檢查面61對於透鏡32之光軸正交面OP之傾斜的影響之係數，Sf係表示透鏡32之光圈面積，A1a係表示自透鏡32之光學中心32a至檢查面61中之攝像點之中心P1為止之距離，A1b係表示自P1至光源20之一點22P1為止之距離。所謂透鏡32之光軸正交面OP係指與透鏡32之光軸32b正交之平面。透鏡32之光圈面積Sf係透鏡32之焦距f與光圈值之函數，且為固定。 圖5係利用一實施形態之攝像元件之另一端之像素所拍攝之檢查面上之攝像點之面積之說明圖。於圖5中，將光源20之條紋圖案22上之一點22P2成像於攝像元件31之另一端之像素31P2。該像素31P2之檢查面61中之攝像點之面積S2可利用下述式(4)～(6)進行運算。 S2＝α×Sf×β22 …(4) β2＝A2b/A2…(5) A2＝A2a＋A2b…(6) 此處，α係表示顯示檢查面61相對於透鏡32之光軸正交面OP之傾斜的影響之係數，Sf係表示透鏡32之光圈面積，A2a係表示自透鏡32之光學中心32a至檢查面61中之攝像點之中心P2為止之距離，A2b係表示自P2至光源20之一點22P2為止之距離。再者，A1與A2相等。 圖6係利用一實施形態之攝像元件之中點之像素所拍攝之檢查面上之攝像點之面積之說明圖。圖6係將光源20之條紋圖案22上之一點22P3成像於攝像元件31之中點之像素31P3。該像素31P3之檢查面61中之攝像點之面積S3可利用下述式(7)～(9)進行運算。 S3＝α×Sf×β32 …(7) β3＝A3b/A3…(8) A3＝A3a＋A3b…(9) 此處，α係表示顯示檢查面61對於透鏡32之光軸正交面OP之傾斜的影響之係數，Sf係表示透鏡32之光圈面積，A3a係表示自透鏡32之光學中心32a至檢查面61中之攝像點之中心P3為止之距離，A3b係表示自P3至光源20之一點22P3為止之距離。P3係檢查面61中之與透鏡32之光軸之交點。 如根據圖1、圖4～圖6所明確，攝像元件31中所含之各像素之檢查面61中之攝像點之面積S中之最大值為S2，且最小值為S1。攝像點之面積S之不均能夠以作為S之最小值之S1與作為S之最大值之S2之比(S1/S2)表示。於上述式(1)、(4)中，Sf係完全相同之值，α係大致相同之值。因而，S1/S2係根據S1/S2＝β12 /β22 之近似式進行運算。S1/S2越接近1，則攝像點之面積S之不均變得越小。 再者，如上所述，光源20及攝像元件31係兩者均配置於檢查面61之單側且分別與檢查面61傾斜地對向，故而，理所當然地，S2大於S1，且S1/S2未達1。S1/S2根據透明板表面檢查裝置10之小型化及光學系統與透明板60之防止干擾等觀點，較佳為0.45以下。 本發明者將於實施例之欄目中說明詳情，但利用實驗等發現可藉由將S1/S2設為0.20以上，而提昇透明板表面檢查裝置10之檢查精度。 透鏡32之焦距f較佳為110 mm以上。若透鏡32之焦距f為110 mm以上，則可使用視角較狹窄之透鏡32，且因穿過透鏡32之複數個光線接近於平行線，故容易將S1/S2設為0.20以上。透鏡32之焦距f進而較佳為120 mm以上。 就透鏡32之焦距f而言，下述式(4)成立。 1/f＝1/A3＋1/B3  (4) 於上述式(4)中，A3為A3a與A3b之和。另一方面，B3表示自透鏡32之光學中心32a至攝像元件31之中點之像素31P3為止之距離。 於透鏡32之焦距f為110 mm以上之情形時，透鏡32之視角較狹窄，故為使檢查面61中之攝像範圍61A充分地變大，A3較佳為800 mm以上。 另一方面，根據透明板表面檢查裝置10之小型化之觀點，A3較佳為1500 mm以下。於A3為1500 mm以下之情形時，為使檢查面61中之攝像範圍61A充分地變大，透鏡32之焦距f較佳為225 mm以下。 且說，線感測器相機30係將於被表側之主表面61反射後之前方所觀測之條紋圖案22之像、與於被背側之主表面62反射後之前方所觀測之條紋圖案22之像重合地進行攝像。 於被表側之主表面61反射後之前方觀測之條紋圖案22之像係亮部與暗部之對比率高於在被背側之主表面62反射後之前方觀測之條紋圖案22之像。 該等像較佳為暗部彼此(或亮部彼此)不重合，以使容易分離。傾斜角θ1及傾斜角θ2較佳為35°以上55°以下，以避免暗部彼此(或亮部彼此)重合。 再者，如上所述，2個像係亮部與暗部之對比率不同，故即便2個像之暗部彼此(或亮部彼此)重合之情形時，亦可將2個像分離。 透明板表面檢查裝置10係於圖1中檢查表側之主表面61之表面形狀，但亦可如圖7所示地檢查背側之主表面62(以下，亦稱為「檢查面62」)之表面形狀。再者，透明板表面檢查裝置10亦可檢查兩主表面61、62之表面形狀。 透明板表面檢查裝置10於檢查背側之檢查面62之表面形狀之情形時，於「S1/S2」、「f」、「A3」等之說明中，將「檢查面61」替換為「檢查面62」即可。此處，「S1/S2」等係考慮到透明板60與空氣之交界處之光之折射而進行運算。再者，因透明板60之板厚充分小，故若對於表側之檢查面61而言，上述條件(例如S1/S2為0.20以上)成立，則對於背側之檢查面62而言，上述條件亦基本上成立。 再者，於本實施形態中，如圖2所示，於俯視下，於同一直線上配置有攝像元件31、透明板60之檢查面61中之攝像範圍61A、及光源20之條紋圖案22中之攝像範圍22A，但本發明不僅限於此。如圖8所示，於俯視下，攝像元件31、透明板60之檢查面61中之攝像範圍61A、及光源20之條紋圖案22中之攝像範圍22A亦可扭轉而不排列於直線上地配置。而且，亦可一邊搬送透明板60一邊檢查表面形狀。 而且，可將利用上述透明板表面檢查方法之檢查步驟適用於至少包含自熔融玻璃成形為板狀玻璃之步驟、及將板狀之玻璃切斷而切取玻璃板之步驟之玻璃板之製造方法。可藉由經由利用透明板表面檢查方法之檢查步驟，而確實地獲得預期之表面形狀之玻璃板。 [實施例] 以下，藉由實施例及比較例對本發明詳細地進行說明，但本發明並非限定於下述實施例。試驗例1為實施例，且試驗例2為比較例。 [試驗例1] 於試驗例1中，利用圖1等所示之透明板表面檢查裝置，檢查玻璃板之表側之主表面(以下，亦簡稱為「檢查面」)。玻璃板之檢查面係藉由預先研磨而無限地接近理想平面。而且，檢查面上之攝像範圍之左端P1(參照圖1)與右端P2(參照圖1)之距離L(參照圖1)設為250 mm。線感測器相機之像素數設為7450。 首先，利用設置於來自光源之光被檢查面反射後之前方之線感測器相機拍攝光源之條紋圖案，且藉由將所拍攝之圖像進行圖像處理而運算檢查面之形狀。運算形狀之範圍係設為(1)自左端P1起30 mm以內之部分(以下，亦稱為「左側之檢查部分」)、及(2)自右端P2起30 mm以內之部分(以下，亦稱為「右側之檢查部分」)之兩者。如此一來，獲得各檢查部分之與理想平面之偏移(高低差)之原始資料。不改變攝像範圍地將該操作反覆進行250次，藉此，獲得對於每一檢查部分之250次數之原始資料。 繼而，使用視窗函數，將250次數之原始資料進行迴旋積分，擷取(A)以波長10 mm為中心之週期帶之頻率成分(以下，亦稱為「第1頻率成分」)、及(B)以波長5 mm為中心之週期帶之頻率成分(以下，亦稱為「第2頻率成分」)。作為視窗函數，使用高斯視窗。如此一來，對於各檢查部分中之中央部分，運算各頻率成分之標準偏差，且將運算所得之標準偏差作為評價值。此處，各檢查部分之中央部分之左右長度設為5 mm。於運算標準偏差時，僅使用各檢查部分之中央部分之原因在於在獲得充分小之範圍內獲得評價值，且於迴旋積分之計算時將端部假設地摺疊。 再者，推定玻璃板中存在長週期成分與短週期成分之波動，將以波長10 mm為中心之第1頻率成分設為長週期成分，且將以波長5 mm為中心之第2頻率成分設為短週期成分進行評價。 [試驗例2] 於試驗例2中，除了以「S3」大致相同且「S1/S2」不同之方式，變更「f」、光圈、「A3」、「A3b」等以外，以與試驗例1相同之方式，檢查玻璃板之表側之主表面，求出評價值。 [總結] 將試驗條件及試驗結果示於表1中。於表1中，「FC1L」係表示左側之檢查部分之中央部分中之第1頻率成分之標準偏差，「FC2L」係表示左側之檢查部分之中央部分中之第2頻率成分之標準偏差，「FC1R」係表示右側之檢查部分之中央部分中之第1頻率成分之標準偏差，「FC2R」係表示右側之檢查部分之中央部分中之第2頻率成分之標準偏差。 [表1]

Figure 106107004-A0304-0001
自表1可明確，根據試驗例1，與試驗例2不同，S1/S2為0.20以上，故FC1L與FC1R之比(FC1L/FC1R)及FC2L與FC2R之比(FC2L/FC2R)分別接近1。該等比接近1表明左側之檢查部分之精度與右側之檢查部分之精度接近，從而可知能夠抑制攝像點之面積之不均造成之檢查精度之下降。 以上，對於透明板表面檢查裝置之實施形態等進行了說明，但本發明並非限定於上述實施形態等，於申請專利範圍中記載之本發明之要旨之範圍內，可進行各種變化及改良。Hereinafter, with reference to the drawings, the form of the transparent board surface inspection device and the transparent board surface inspection method for implementing the present invention will be described. In each drawing, the same or corresponding components are marked with the same or corresponding symbols and the description is omitted. 1 is a cross-sectional view of the transparent board surface inspection device of an embodiment when inspecting the main surface of the front side of the transparent board, and is a cross-sectional view taken along II of FIG. 2. Fig. 2 is a plan view of the transparent board surface inspection device of an embodiment when inspecting the main surface of the front side of the transparent board. The transparent board surface inspection device 10 is shown in FIGS. 1 and 2 to inspect the shape of the main surface 61 (hereinafter, also referred to as "inspection surface 61") on the front side of the transparent board 60. As the transparent board 60, a glass board, a resin board, etc. are mentioned. The transparent board surface inspection device 10 has, for example, a light source 20, a line sensor camera 30, and an image processing device 50. The light source 20 has a light source body 21 such as an LED (Light-emitting diode), and a stripe pattern 22. The stripe pattern 22 is arranged on the light-emitting surface of the light source body 21. An optical sheet such as a light diffusion sheet may also be provided between the stripe pattern 22 and the light source body 21. The line sensor camera 30 is arranged in front of the light of the light source 20 after being reflected by the inspection surface 61, and photographs the stripe pattern 22 contained in the light source 20. The line sensor camera 30 has an imaging element 31 including a plurality of pixels arranged in a specific direction, and a lens 32 that images the stripe pattern 22 in the imaging element 31. As the imaging element 31, for example, a CCD (Charge-coupled Device) image sensor, a CMOS (Complementary Metal Oxide Semiconductor) image sensor, etc. are used. The image processing device 50 performs image processing on the image taken by the line sensor camera 30. The image processing device 50 has a CPU (Central Processing Unit) 51 and a storage medium 52 such as a memory. The image processing device 50 performs image processing by causing the CPU 51 to execute a program stored in the storage medium 52. 3 is a diagram showing the brightness distribution of the image of the stripe pattern reflected by the main surface of the front side of the transparent plate in the brightness distribution of the image taken by the line sensor camera of an embodiment. In FIG. 3, the horizontal axis represents the pixel number of the line sensor camera 30, and the vertical axis represents the brightness. The number of pixels indicates the order of pixel arrangement (integer). As shown in Figure 3, the captured image has a striped pattern in which bright parts and dark parts are alternately repeated. The image processing device 50 detects the deviation of the photographed stripe pattern from the reference pattern. As a reference pattern, the stripe pattern photographed by the line sensor camera 30 is used when the inspection surface 61 is an ideal plane. The reference pattern is obtained by calculation and the like and stored in the storage medium 52 in advance to be read and used. The image processing device 50 can detect the slope of each point of the inspection surface 61 by detecting the deviation of the captured stripe pattern from the reference pattern, and can detect the surface shape by integrating the slope. For the method of deriving the surface shape from the deviation of the stripe pattern, a general one can be used, for example, the one described in the above-mentioned Patent Document 1 can be used. In addition, as shown in FIG. 1, both the light source 20 and the imaging element 31 are arranged on one side of the inspection surface 61, and respectively obliquely face the inspection surface 61. The inclination angle θ1 of the center line of the light from the light source 20 with respect to the inspection surface 61 is, for example, 35° or more and 55° or less, preferably 40° or more and 50° or less. In addition, the inclination angle θ2 of the center line of the light directed toward the imaging element 31 with respect to the inspection surface 61 is, for example, 35° or more and 55° or less, preferably 40° or more and 50° or less. The inclination angle θ1 and the inclination angle θ2 are equal within the above range. As described above, by arranging both the light source 20 and the imaging element 31 on one side of the inspection surface 61 and obliquely opposing the inspection surface 61 respectively, a plurality of transparent plate surface inspection devices 10 can be effectively arranged. In order to improve the inspection accuracy of the transparent plate surface inspection device 10, the present inventor focused on the unevenness of the area of the imaging point in the inspection surface 61 of each pixel of the imaging element 31. 4 is an explanatory diagram of the area of the imaging point on the inspection surface taken by the pixel at one end of the imaging element of an embodiment. In FIG. 4, a point 22P1 on the stripe pattern 22 of the light source 20 is imaged on the pixel 31P1 at one end of the imaging element 31. The area S1 of the imaging point in the inspection surface 61 of the pixel 31P1 can be calculated using the following equations (1) to (3). S1=α×Sf×β1 2 …(1) β1=A1b/A1…(2) A1=A1a＋A1b…(3) Here, α represents the inclination of the display inspection surface 61 with respect to the optical axis orthogonal plane OP of the lens 32 Sf is the aperture area of the lens 32, A1a is the distance from the optical center 32a of the lens 32 to the center P1 of the imaging point in the inspection surface 61, and A1b is the distance from P1 to a point 22P1 of the light source 20 The distance to the point. The optical axis orthogonal plane OP of the lens 32 refers to a plane orthogonal to the optical axis 32 b of the lens 32. The aperture area Sf of the lens 32 is a function of the focal length f of the lens 32 and the aperture value, and is fixed. Fig. 5 is an explanatory diagram of the area of the imaging point on the inspection surface taken by the pixel at the other end of the imaging element of an embodiment. In FIG. 5, a point 22P2 on the stripe pattern 22 of the light source 20 is imaged on the pixel 31P2 at the other end of the imaging element 31. The area S2 of the imaging point in the inspection surface 61 of the pixel 31P2 can be calculated using the following equations (4) to (6). S2=α×Sf×β2 2 …(4) β2=A2b/A2…(5) A2=A2a＋A2b…(6) Here, α represents the difference between the display inspection surface 61 and the optical axis orthogonal surface OP of the lens 32 The coefficient of the effect of tilt, Sf represents the aperture area of the lens 32, A2a represents the distance from the optical center 32a of the lens 32 to the center P2 of the imaging point in the inspection surface 61, and A2b represents the point from P2 to the light source 20 The distance up to 22P2. Furthermore, A1 and A2 are equal. Fig. 6 is an explanatory diagram of the area of the imaging point on the inspection surface taken by the pixels of the midpoint of the imaging element of an embodiment. FIG. 6 images a point 22P3 on the stripe pattern 22 of the light source 20 on the pixel 31P3 of the middle point of the imaging element 31. The area S3 of the imaging point on the inspection surface 61 of the pixel 31P3 can be calculated using the following equations (7) to (9). S3=α×Sf×β3 2 …(7) β3=A3b/A3…(8) A3=A3a+A3b…(9) Here, α represents the inclination of the display inspection surface 61 with respect to the optical axis orthogonal plane OP of the lens 32 Sf represents the aperture area of the lens 32, A3a represents the distance from the optical center 32a of the lens 32 to the center P3 of the imaging point in the inspection surface 61, and A3b represents the distance from P3 to a point 22P3 of the light source 20 The distance to the point. P3 is the intersection of the inspection surface 61 and the optical axis of the lens 32. As is clear from FIGS. 1 and 4 to 6, the maximum value of the area S of the imaging point in the inspection surface 61 of each pixel included in the imaging element 31 is S2, and the minimum value is S1. The unevenness of the area S of the imaging point can be expressed by the ratio of S1, which is the minimum value of S, to S2, which is the maximum value of S (S1/S2). In the above formulas (1) and (4), Sf is exactly the same value, and α is almost the same value. Therefore, S1/S2 is calculated based on the approximate formula S1/S2=β1 2 /β2 2. The closer S1/S2 is to 1, the smaller the unevenness of the area S of the imaging point becomes. Furthermore, as described above, both the light source 20 and the imaging element 31 are arranged on one side of the inspection surface 61 and are respectively obliquely opposed to the inspection surface 61. Therefore, of course, S2 is greater than S1, and S1/S2 is less than 1. S1/S2 is preferably 0.45 or less from the viewpoints of miniaturization of the transparent plate surface inspection device 10 and prevention of interference between the optical system and the transparent plate 60. The present inventor will explain the details in the column of the embodiment, but using experiments etc., it is found that the inspection accuracy of the transparent board surface inspection device 10 can be improved by setting S1/S2 to 0.20 or more. The focal length f of the lens 32 is preferably 110 mm or more. If the focal length f of the lens 32 is 110 mm or more, a lens 32 with a narrow viewing angle can be used, and since the plural rays of light passing through the lens 32 are close to parallel lines, it is easy to set S1/S2 to 0.20 or more. The focal length f of the lens 32 is further preferably 120 mm or more. Regarding the focal length f of the lens 32, the following formula (4) holds. 1/f=1/A3+1/B3 (4) In the above formula (4), A3 is the sum of A3a and A3b. On the other hand, B3 represents the distance from the optical center 32a of the lens 32 to the pixel 31P3 of the midpoint of the imaging element 31. When the focal length f of the lens 32 is 110 mm or more, the angle of view of the lens 32 is narrow. Therefore, in order to sufficiently enlarge the imaging range 61A in the inspection surface 61, A3 is preferably 800 mm or more. On the other hand, from the viewpoint of miniaturization of the transparent board surface inspection device 10, A3 is preferably 1500 mm or less. When A3 is 1500 mm or less, in order to sufficiently enlarge the imaging range 61A in the inspection surface 61, the focal length f of the lens 32 is preferably 225 mm or less. In addition, the line sensor camera 30 will be the image of the stripe pattern 22 observed before after being reflected by the main surface 61 on the front side, and the image of the stripe pattern 22 observed before after being reflected by the main surface 62 on the back side. The images are taken with overlapping images. The image of the stripe pattern 22 observed before after being reflected by the main surface 61 on the front side has a higher contrast ratio of the bright part and the dark part than the image of the stripe pattern 22 observed before after being reflected by the main surface 62 on the back side. The images are preferably such that the dark parts (or the bright parts) do not overlap each other, so that they can be easily separated. The inclination angle θ1 and the inclination angle θ2 are preferably 35° or more and 55° or less to prevent the dark parts (or the bright parts) from overlapping each other. Furthermore, as described above, the contrast ratios of the bright part and the dark part of the two image systems are different. Therefore, even when the dark parts of the two images (or the bright parts) overlap each other, the two images can be separated. The transparent board surface inspection device 10 inspects the surface shape of the main surface 61 on the front side in FIG. 1, but it can also inspect the main surface 62 on the back side as shown in FIG. 7 (hereinafter, also referred to as "inspection surface 62"). Surface shape. Furthermore, the transparent board surface inspection device 10 can also inspect the surface shapes of the two main surfaces 61 and 62. When the transparent board surface inspection device 10 inspects the surface shape of the inspection surface 62 on the back side, in the description of "S1/S2", "f", "A3", etc., replace "inspection surface 61" with "inspection Face 62" is fine. Here, "S1/S2" etc. are calculated in consideration of the refraction of light at the interface between the transparent plate 60 and the air. Furthermore, since the thickness of the transparent plate 60 is sufficiently small, if the above condition (for example, S1/S2 is 0.20 or more) is established for the inspection surface 61 on the front side, the above condition is satisfied for the inspection surface 62 on the back side. It is basically established. Furthermore, in this embodiment, as shown in FIG. 2, in a plan view, the imaging element 31, the imaging range 61A in the inspection surface 61 of the transparent plate 60, and the stripe pattern 22 of the light source 20 are arranged on the same straight line. The camera range is 22A, but the present invention is not limited to this. As shown in FIG. 8, in a plan view, the imaging element 31, the imaging range 61A in the inspection surface 61 of the transparent plate 60, and the imaging range 22A in the stripe pattern 22 of the light source 20 can also be twisted and not arranged on a straight line. . Furthermore, the surface shape may be inspected while the transparent plate 60 is being transported. Furthermore, the inspection step using the above-mentioned transparent plate surface inspection method can be applied to a glass plate manufacturing method including at least a step of forming a plate glass from molten glass and a step of cutting the plate glass to cut out the glass plate. The glass plate with the expected surface shape can be obtained reliably by the inspection step using the transparent plate surface inspection method. [Examples] Hereinafter, the present invention will be described in detail with examples and comparative examples, but the present invention is not limited to the following examples. Test example 1 is an example, and test example 2 is a comparative example. [Test Example 1] In Test Example 1, the transparent plate surface inspection device shown in Fig. 1 etc. was used to inspect the main surface of the front side of the glass plate (hereinafter also referred to as "inspection surface"). The inspection surface of the glass plate is infinitely close to the ideal plane by pre-polishing. Moreover, the distance L (refer to Fig. 1) between the left end P1 (refer to Fig. 1) and the right end P2 (refer to Fig. 1) of the imaging range on the inspection surface is set to 250 mm. The number of pixels of the line sensor camera is set to 7450. First, a line sensor camera installed in front of the light from the light source is reflected by the inspection surface to capture the stripe pattern of the light source, and image processing is performed on the captured image to calculate the shape of the inspection surface. The calculation shape range is set to (1) the part within 30 mm from the left end P1 (hereinafter, also referred to as "the inspection part on the left"), and (2) the part within 30 mm from the right end P2 (hereinafter, also It is called "the inspection part on the right"). In this way, the original data of the offset (height difference) of each inspection part from the ideal plane is obtained. This operation is repeated 250 times without changing the imaging range, thereby obtaining original data of 250 times for each inspection part. Then, use the window function to convolute the original data of 250 times to extract (A) the frequency component of the periodic band with a wavelength of 10 mm as the center (hereinafter, also referred to as "the first frequency component"), and (B ) The frequency component of the periodic band with a wavelength of 5 mm as the center (hereinafter also referred to as "the second frequency component"). As the window function, a Gaussian window is used. In this way, for the central part of each inspection part, the standard deviation of each frequency component is calculated, and the calculated standard deviation is used as the evaluation value. Here, the left and right length of the central part of each inspection part is set to 5 mm. When calculating the standard deviation, the reason why only the central part of each inspection part is used is to obtain the evaluation value within a sufficiently small range, and to fold the ends hypothetically during the calculation of the cyclotron integral. Furthermore, it is estimated that there are fluctuations between the long-period component and the short-period component in the glass plate, the first frequency component centered at a wavelength of 10 mm is set as the long-period component, and the second frequency component centered at a wavelength of 5 mm is set Evaluate short-period components. [Test Example 2] In Test Example 2, except that "S3" is almost the same and "S1/S2" is different, the "f", aperture, "A3", "A3b", etc. are changed to be the same as those of Test Example 1. In the same way, check the main surface of the front side of the glass plate to obtain the evaluation value. [Summary] The test conditions and test results are shown in Table 1. In Table 1, "FC1L" means the standard deviation of the first frequency component in the central part of the inspection part on the left, and "FC2L" means the standard deviation of the second frequency component in the central part of the inspection part on the left, ""FC1R" means the standard deviation of the first frequency component in the central part of the inspection part on the right, and "FC2R" means the standard deviation of the second frequency component in the central part of the inspection part on the right. [Table 1]
Figure 106107004-A0304-0001
 As is clear from Table 1, according to Test Example 1, unlike Test Example 2, S1/S2 is 0.20 or more, so the ratio of FC1L to FC1R (FC1L/FC1R) and the ratio of FC2L to FC2R (FC2L/FC2R) are close to 1, respectively. The ratio close to 1 indicates that the accuracy of the inspection part on the left is close to the accuracy of the inspection part on the right, and it can be seen that the decrease in inspection accuracy caused by the unevenness of the area of the imaging points can be suppressed. The embodiments and the like of the transparent board surface inspection device have been described above, but the present invention is not limited to the above-mentioned embodiments and the like, and various changes and improvements can be made within the scope of the gist of the present invention described in the scope of the patent application.

10‧‧‧透明板表面檢查裝置20‧‧‧光源21‧‧‧光源本體22‧‧‧條紋圖案22A‧‧‧攝像範圍22P1、22P2、22P3‧‧‧條紋圖案上之一點30‧‧‧線感測器相機31‧‧‧攝像元件31P1、31P2、31P3‧‧‧像素32‧‧‧透鏡32a‧‧‧光學中心32b‧‧‧光軸50‧‧‧圖像處理裝置51‧‧‧CPU(Central Processing Unit，中央處理單元)52‧‧‧記憶媒體60‧‧‧透明板61‧‧‧表側之主表面(檢查面)61A‧‧‧攝像範圍62‧‧‧背側之主表面(檢查面)A1a、A2a、A3a、A1b、A2b、A3b、B3‧‧‧距離L‧‧‧左端P1與右端P2之距離OP‧‧‧光軸正交面P1、P2、P3‧‧‧攝像點之中心θ1、θ2‧‧‧傾斜角10‧‧‧Transparent board surface inspection device 20‧‧‧Light source 21‧‧‧Light source body 22‧‧‧Stripe pattern 22A‧‧‧Camera range 22P1, 22P2, 22P3‧‧‧One point on the stripe pattern 30‧‧‧Line Sensor camera 31‧‧‧Image sensor 31P1, 31P2, 31P3‧‧‧Pixel 32‧‧‧Lens 32a‧‧Optical center 32b‧‧Optical axis 50‧‧‧Image processing device 51‧‧‧CPU( Central Processing Unit) 52‧‧‧Memory media 60‧‧‧Transparent plate 61‧‧‧The main surface on the front side (inspection surface) 61A‧‧‧Camera range 62‧‧‧The main surface on the back side (inspection surface )A1a、A2a、A3a、A1b、A2b、A3b、B3 θ1、θ2‧‧‧Tilt angle

圖1係一實施形態之透明板表面檢查裝置之檢查透明板之表側之主表面時之剖視圖，且係沿著圖2之I-I所得之剖視圖。 圖2係一實施形態之透明板表面檢查裝置之檢查透明板之表側之主表面時之俯視圖。 圖3係表示利用一實施形態之線感測器相機所拍攝之圖像之亮度分佈中之由透明板之表側之主表面反射而成之條紋圖案之像之亮度分佈之圖。 圖4係由一實施形態之攝像元件之一端之像素所拍攝之檢查面上之攝像點之面積之說明圖。 圖5係由一實施形態之攝像元件之另一端之像素所拍攝之檢查面上之攝像點之面積之說明圖。 圖6係由一實施形態之攝像元件之中點之像素所拍攝之檢查面上之攝像點之面積之說明圖。 圖7係一實施形態之透明板表面之檢查裝置檢查透明板之背側之主表面時之剖視圖。 圖8係變化例之透明板表面檢查裝置之檢查透明板之表側之主表面時之俯視圖。1 is a cross-sectional view of the transparent board surface inspection device of an embodiment when inspecting the main surface of the front side of the transparent board, and is a cross-sectional view taken along I-I of FIG. 2. Fig. 2 is a plan view of the transparent board surface inspection device of an embodiment when inspecting the main surface of the front side of the transparent board. 3 is a diagram showing the brightness distribution of the image of the stripe pattern reflected from the main surface of the front side of the transparent plate in the brightness distribution of the image taken by the line sensor camera of an embodiment. 4 is an explanatory diagram of the area of the imaging point on the inspection surface captured by the pixel at one end of the imaging element of an embodiment. 5 is an explanatory diagram of the area of the imaging point on the inspection surface captured by the pixel at the other end of the imaging element of an embodiment. Fig. 6 is an explanatory diagram of the area of the imaging point on the inspection surface captured by the pixels of the midpoint of the imaging element of an embodiment. Fig. 7 is a cross-sectional view of the inspection device for the surface of the transparent plate of an embodiment when inspecting the main surface of the back side of the transparent plate. Fig. 8 is a plan view of a modified example of the transparent board surface inspection device when inspecting the main surface of the front side of the transparent board.

10‧‧‧透明板表面檢查裝置 10‧‧‧Transparent board surface inspection device

20‧‧‧光源 20‧‧‧Light source

21‧‧‧光源本體 21‧‧‧Light source body

22‧‧‧條紋圖案 22‧‧‧Striped pattern

22P1、22P2、22P3‧‧‧條紋圖案上之一點 22P1, 22P2, 22P3‧‧‧One point on the stripe pattern

30‧‧‧線感測器相機 30‧‧‧Line Sensor Camera

31‧‧‧攝像元件 31‧‧‧Camera element

31P1、31P2、31P3‧‧‧像素 31P1, 31P2, 31P3‧‧‧ pixels

32‧‧‧透鏡 32‧‧‧Lens

32a‧‧‧光學中心 32a‧‧‧Optical Center

32b‧‧‧光軸 32b‧‧‧Optical axis

50‧‧‧圖像處理裝置 50‧‧‧Image processing device

51‧‧‧CPU(Central Processing Unit，中央處理單元) 51‧‧‧CPU (Central Processing Unit, Central Processing Unit)

52‧‧‧記憶媒體 52‧‧‧Memory Media

60‧‧‧透明板 60‧‧‧Transparent board

61‧‧‧表側之主表面(檢查面) 61‧‧‧The main surface of the front side (inspection surface)

62‧‧‧背側之主表面(檢查面) 62‧‧‧The main surface of the back side (inspection surface)

A1a、A2a、A3a、A1b、A2b、A3b、B3‧‧‧距離 A1a, A2a, A3a, A1b, A2b, A3b, B3‧‧‧Distance

L‧‧‧左端P1與右端P2之距離 L‧‧‧The distance between the left end P1 and the right end P2

P1、P2、P3‧‧‧攝像點之中心 P1, P2, P3‧‧‧The center of the camera point

θ1、θ2‧‧‧傾斜角 θ1、θ2‧‧‧Tilt angle

Claims (8)

一種透明板表面檢查裝置，其係檢查透明板之主表面之透明板表面檢查裝置，且具有：光源，其包含條紋圖案；線感測器相機，其設置於來自上述光源之光於上述主表面反射後之前方，且拍攝上述條紋圖案；及圖像處理裝置，其係將所拍攝之上述條紋圖案之圖像進行圖像處理；上述線感測器相機具有包含排列於特定方向上之複數個像素之攝像元件、及將上述條紋圖案於上述攝像元件上成像之透鏡，上述光源及上述攝像元件係兩者均配置於上述主表面之單側，且分別與上述主表面傾斜地對向，配置於上述特定方向之一端之上述像素之上述主表面中之攝像點之面積(S1)與配置於上述特定方向之另一端之上述像素之上述主表面中之攝像點之面積(S2(S2>S1))之比(S1/S2)為0.20以上。 A transparent board surface inspection device, which is a transparent board surface inspection device for inspecting the main surface of the transparent board, and has: a light source, which includes a stripe pattern; a line sensor camera, which is arranged on the main surface of the light from the light source The front side after reflection, and the stripe pattern is photographed; and an image processing device that processes the image of the stripe pattern taken; the line sensor camera has a plurality of lines arranged in a specific direction The image pickup element of the pixel and the lens that forms the image of the stripe pattern on the image pickup element. The light source and the image pickup element are both arranged on one side of the main surface and are respectively obliquely opposed to the main surface. The area of the imaging point on the main surface of the pixel at one end of the specific direction (S1) and the area of the imaging point on the main surface of the pixel at the other end of the specific direction (S2 (S2>S1) ) The ratio (S1/S2) is 0.20 or more. 如請求項1之透明板表面檢查裝置，其中上述透鏡之焦距為110mm以上。 Such as the transparent board surface inspection device of claim 1, wherein the focal length of the above-mentioned lens is 110mm or more. 如請求項2之透明板表面檢查裝置，其中自上述透鏡之光學中心至上述主表面中之與上述透鏡之光軸之交點為止之距離、與自上述交點至上述光源之上述條紋圖案為止之距離之和為800mm以上。 The transparent board surface inspection device of claim 2, wherein the distance from the optical center of the lens to the intersection of the main surface with the optical axis of the lens, and the distance from the intersection to the stripe pattern of the light source The sum is more than 800mm. 一種透明板表面檢查方法，其係檢查透明板之主表面者， 利用設置於來自光源之光於上述主表面反射後之前方之線感測器相機拍攝上述光源中所含之條紋圖案，且將所攝像之上述條紋圖案之圖像進行圖像處理，上述線感測器相機具有包含排列於特定方向上之複數個像素之攝像元件、及將上述條紋圖案成像於上述攝像元件之透鏡，上述光源及上述攝像元件係兩者均配置於上述主表面之單側，且分別與上述主表面上傾斜地對向，配置於上述特定方向之一端之上述像素之上述主表面中之攝像點之面積(S1)、與配置於上述特定方向之另一端之上述像素之上述主表面中之攝像點之面積(S2(S2>S1))之比(S1/S2)為0.20以上。 A method for inspecting the surface of a transparent board, which inspects the main surface of the transparent board, The stripe pattern contained in the light source is captured by a line sensor camera arranged in front of the light from the light source after being reflected on the main surface, and the captured image of the stripe pattern is image-processed. The sensor camera has an imaging element including a plurality of pixels arranged in a specific direction, and a lens that images the stripe pattern on the imaging element, and both the light source and the imaging element are arranged on one side of the main surface. The area (S1) of the imaging point on the main surface of the pixel arranged at one end of the specific direction and the area (S1) of the imaging point of the pixel arranged at the other end of the specific direction are respectively obliquely opposed to the main surface. The ratio (S1/S2) of the area (S2(S2>S1)) of the imaging points on the surface is 0.20 or more. 如請求項4之透明板表面檢查方法，其中上述透鏡之焦距為110mm以上。 Such as claim 4, the transparent board surface inspection method, wherein the focal length of the above-mentioned lens is 110mm or more. 如請求項5之透明板表面檢查方法，其中自上述透鏡之光學中心至上述主表面中之與上述透鏡之光軸之交點為止之距離、與自上述交點至上述光源之上述條紋圖案為止之距離之和為800mm以上。 The transparent board surface inspection method of claim 5, wherein the distance from the optical center of the lens to the intersection of the main surface with the optical axis of the lens, and the distance from the intersection to the stripe pattern of the light source The sum is more than 800mm. 如請求項4至6中任一項之透明板表面檢查方法，其中上述透明板為玻璃板。 According to the method for inspecting the surface of a transparent plate according to any one of claims 4 to 6, wherein the transparent plate is a glass plate. 一種玻璃板之製造方法，其包括：自熔融玻璃成形為板狀之玻璃之步驟、切斷上述板狀之玻璃切取玻璃板之步驟、及利用如請求項7之透明板表面檢查方法之檢查步驟。 A method of manufacturing a glass plate, comprising: a step of forming a plate-shaped glass from molten glass, a step of cutting the plate-shaped glass to cut the glass plate, and an inspection step using the transparent plate surface inspection method as claimed in claim 7 .
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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3825680A4 (en) * 2018-07-19 2021-07-07 Fuji Corporation Test setting device and test setting method
CN110849912B (en) * 2019-11-25 2021-03-02 厦门大学 Glass defect developing device and glass defect detection equipment
CN112759230B (en) * 2020-12-31 2021-11-12 广州广钢气体能源股份有限公司 Glass kiln and glass product production device with same
CN112880737B (en) * 2021-01-14 2023-05-30 四川雅吉芯电子科技有限公司 Integrated system for detecting monocrystalline silicon epitaxial wafer

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101051619A (en) * 2006-04-03 2007-10-10 三星电子株式会社 Substrate check device and substrate check method
CN102445168A (en) * 2010-09-30 2012-05-09 旭硝子株式会社 Detecting method and detecting device for surface shape

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3348133B2 (en) * 1995-01-26 2002-11-20 株式会社リコー Disk appearance inspection method and apparatus
WO2002018980A2 (en) * 2000-09-01 2002-03-07 Applied Process Technologies Optical system for imaging distortions in moving reflective sheets
JP4633245B2 (en) * 2000-11-06 2011-02-16 住友化学株式会社 Surface inspection apparatus and surface inspection method
WO2002040970A1 (en) * 2000-11-15 2002-05-23 Real Time Metrology, Inc. Optical method and apparatus for inspecting large area planar objects
JP2004109106A (en) * 2002-07-22 2004-04-08 Fujitsu Ltd Method and apparatus for inspecting surface defect
JP4645068B2 (en) * 2004-06-04 2011-03-09 旭硝子株式会社 Surface shape inspection method and inspection apparatus
JP5169194B2 (en) * 2006-12-14 2013-03-27 日本電気硝子株式会社 Sheet glass defect detection apparatus, sheet glass manufacturing method
JP5034891B2 (en) 2007-11-21 2012-09-26 旭硝子株式会社 Apparatus for measuring shape of transparent plate and method for producing plate glass
JP2010048745A (en) * 2008-08-25 2010-03-04 Asahi Glass Co Ltd Defect inspection system and defect inspection method
CN201611253U (en) * 2010-01-18 2010-10-20 聊城大学 System used for detecting area of worn coin
JP2012021781A (en) * 2010-07-12 2012-02-02 Asahi Glass Co Ltd Method and device for evaluating surface shape
JP2012127675A (en) * 2010-12-13 2012-07-05 Asahi Glass Co Ltd Method and apparatus for evaluating front-surface shape
JP2016085034A (en) * 2013-02-19 2016-05-19 旭硝子株式会社 Image-capturing system for transparent plate-like body surface inspection
WO2015098887A1 (en) * 2013-12-27 2015-07-02 旭硝子株式会社 Shape measuring device, shape measuring method, and glass plate manufacturing method
CN103913468B (en) * 2014-03-31 2016-05-04 湖南大学 Many defects of vision checkout equipment and the method for large-scale LCD glass substrate on production line

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101051619A (en) * 2006-04-03 2007-10-10 三星电子株式会社 Substrate check device and substrate check method
CN102445168A (en) * 2010-09-30 2012-05-09 旭硝子株式会社 Detecting method and detecting device for surface shape

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JP2017191003A (en) 2017-10-19
JP6642223B2 (en) 2020-02-05
KR20170117313A (en) 2017-10-23
TW201738551A (en) 2017-11-01
CN107289878B (en) 2021-06-11
KR102238388B1 (en) 2021-04-09

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