TWI726036B - 含有氟原子之化合物及其利用 - Google Patents
含有氟原子之化合物及其利用 Download PDFInfo
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- TWI726036B TWI726036B TW106101243A TW106101243A TWI726036B TW I726036 B TWI726036 B TW I726036B TW 106101243 A TW106101243 A TW 106101243A TW 106101243 A TW106101243 A TW 106101243A TW I726036 B TWI726036 B TW I726036B
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- group
- chloride
- formula
- atom
- fluoro
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 90
- 125000001153 fluoro group Chemical group F* 0.000 title claims abstract description 85
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 64
- 125000003118 aryl group Chemical group 0.000 claims abstract description 29
- -1 4-(trifluoromethyl)phenyl Chemical group 0.000 claims description 388
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 57
- 239000003973 paint Substances 0.000 claims description 57
- 125000000217 alkyl group Chemical group 0.000 claims description 49
- 125000004432 carbon atom Chemical group C* 0.000 claims description 41
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 31
- 239000010408 film Substances 0.000 claims description 27
- 125000005843 halogen group Chemical group 0.000 claims description 27
- 229910052799 carbon Inorganic materials 0.000 claims description 26
- 229910052801 chlorine Inorganic materials 0.000 claims description 21
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 21
- 239000000126 substance Substances 0.000 claims description 21
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 20
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 19
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 19
- 229910052740 iodine Inorganic materials 0.000 claims description 19
- 239000003960 organic solvent Substances 0.000 claims description 19
- 239000010409 thin film Substances 0.000 claims description 19
- 238000005401 electroluminescence Methods 0.000 claims description 18
- 239000002019 doping agent Substances 0.000 claims description 16
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 15
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 15
- 125000004428 fluoroalkoxy group Chemical group 0.000 claims description 10
- 238000006467 substitution reaction Methods 0.000 claims description 10
- 125000004991 fluoroalkenyl group Chemical group 0.000 claims description 8
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 8
- 125000005348 fluorocycloalkyl group Chemical group 0.000 claims description 8
- 125000001188 haloalkyl group Chemical group 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims description 5
- 125000004986 diarylamino group Chemical group 0.000 claims description 5
- 125000004407 fluoroaryl group Chemical group 0.000 claims description 5
- 150000004820 halides Chemical class 0.000 claims description 5
- 125000002577 pseudohalo group Chemical group 0.000 claims description 4
- WGSXKYXKAARAKD-UHFFFAOYSA-N 1-fluoro-3-isocyanato-5-(trifluoromethyl)benzene Chemical group FC1=CC(N=C=O)=CC(C(F)(F)F)=C1 WGSXKYXKAARAKD-UHFFFAOYSA-N 0.000 claims description 3
- ZUSWDTWYONAOPH-UHFFFAOYSA-N [2-(trifluoromethyl)phenyl]hydrazine;hydrochloride Chemical group [Cl-].[NH3+]NC1=CC=CC=C1C(F)(F)F ZUSWDTWYONAOPH-UHFFFAOYSA-N 0.000 claims description 3
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical group FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 claims description 2
- 150000001350 alkyl halides Chemical class 0.000 claims description 2
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 69
- 239000010410 layer Substances 0.000 description 53
- JZRWCGZRTZMZEH-UHFFFAOYSA-N Thiamine Natural products CC1=C(CCO)SC=[N+]1CC1=CN=C(C)N=C1N JZRWCGZRTZMZEH-UHFFFAOYSA-N 0.000 description 46
- 235000019157 thiamine Nutrition 0.000 description 46
- 229960003495 thiamine Drugs 0.000 description 46
- 239000011721 thiamine Substances 0.000 description 46
- KYMBYSLLVAOCFI-UHFFFAOYSA-N thiamine Chemical compound CC1=C(CCO)SCN1CC1=CN=C(C)N=C1N KYMBYSLLVAOCFI-UHFFFAOYSA-N 0.000 description 43
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 42
- 239000002904 solvent Substances 0.000 description 41
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 36
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 description 30
- 229940073608 benzyl chloride Drugs 0.000 description 30
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 27
- 238000000034 method Methods 0.000 description 26
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 26
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 25
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 24
- 230000015572 biosynthetic process Effects 0.000 description 22
- 239000000706 filtrate Substances 0.000 description 22
- 238000003786 synthesis reaction Methods 0.000 description 22
- 239000000758 substrate Substances 0.000 description 21
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 21
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 20
- 238000006243 chemical reaction Methods 0.000 description 20
- 238000002347 injection Methods 0.000 description 19
- 239000007924 injection Substances 0.000 description 19
- 239000000203 mixture Substances 0.000 description 18
- 238000005160 1H NMR spectroscopy Methods 0.000 description 17
- 239000000725 suspension Substances 0.000 description 17
- 239000002585 base Substances 0.000 description 16
- 125000003342 alkenyl group Chemical group 0.000 description 15
- 229910052757 nitrogen Inorganic materials 0.000 description 14
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 14
- 239000002253 acid Substances 0.000 description 13
- 238000000576 coating method Methods 0.000 description 13
- 230000005525 hole transport Effects 0.000 description 13
- IAZDPXIOMUYVGZ-WFGJKAKNSA-N Dimethyl sulfoxide Chemical compound [2H]C([2H])([2H])S(=O)C([2H])([2H])[2H] IAZDPXIOMUYVGZ-WFGJKAKNSA-N 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 238000001914 filtration Methods 0.000 description 12
- 239000000463 material Substances 0.000 description 11
- 238000005259 measurement Methods 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 10
- 125000000304 alkynyl group Chemical group 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 239000002994 raw material Substances 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 10
- 150000001721 carbon Chemical group 0.000 description 9
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 9
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 8
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- 239000012295 chemical reaction liquid Substances 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 125000001072 heteroaryl group Chemical group 0.000 description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 8
- XKBGEWXEAPTVCK-UHFFFAOYSA-M methyltrioctylammonium chloride Chemical compound [Cl-].CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC XKBGEWXEAPTVCK-UHFFFAOYSA-M 0.000 description 8
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 238000007789 sealing Methods 0.000 description 8
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 7
- 150000001448 anilines Chemical class 0.000 description 7
- 239000003054 catalyst Substances 0.000 description 7
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 229910000027 potassium carbonate Inorganic materials 0.000 description 7
- 235000011181 potassium carbonates Nutrition 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 125000000542 sulfonic acid group Chemical group 0.000 description 7
- PVSKKLFYHHQKFR-UHFFFAOYSA-N 1-(chloromethyl)-2,3,4,5-tetrafluorobenzene Chemical compound FC1=CC(CCl)=C(F)C(F)=C1F PVSKKLFYHHQKFR-UHFFFAOYSA-N 0.000 description 6
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 6
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- 229920001343 polytetrafluoroethylene Polymers 0.000 description 6
- 239000004810 polytetrafluoroethylene Substances 0.000 description 6
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 5
- 125000003172 aldehyde group Chemical group 0.000 description 5
- 125000003277 amino group Chemical group 0.000 description 5
- CSKNSYBAZOQPLR-UHFFFAOYSA-N benzenesulfonyl chloride Chemical compound ClS(=O)(=O)C1=CC=CC=C1 CSKNSYBAZOQPLR-UHFFFAOYSA-N 0.000 description 5
- 238000009835 boiling Methods 0.000 description 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 5
- 239000007810 chemical reaction solvent Substances 0.000 description 5
- 239000000460 chlorine Substances 0.000 description 5
- 238000005859 coupling reaction Methods 0.000 description 5
- 238000010304 firing Methods 0.000 description 5
- 239000011737 fluorine Substances 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 239000012046 mixed solvent Substances 0.000 description 5
- 239000012044 organic layer Substances 0.000 description 5
- 239000011148 porous material Substances 0.000 description 5
- 238000006722 reduction reaction Methods 0.000 description 5
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- 125000003107 substituted aryl group Chemical group 0.000 description 5
- 125000003396 thiol group Chemical group [H]S* 0.000 description 5
- 238000007740 vapor deposition Methods 0.000 description 5
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 4
- XMFMIKSWEJRJQE-UHFFFAOYSA-N 2,3,4,5-tetrafluorobenzamide Chemical compound NC(=O)C1=CC(F)=C(F)C(F)=C1F XMFMIKSWEJRJQE-UHFFFAOYSA-N 0.000 description 4
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- CAHQGWAXKLQREW-UHFFFAOYSA-N Benzal chloride Chemical compound ClC(Cl)C1=CC=CC=C1 CAHQGWAXKLQREW-UHFFFAOYSA-N 0.000 description 4
- 0 C*1C=CC(c2ccccc2C2(C(C=C3)=CC=CC3(C)N*F)C(C=C3)=CC=CC3(C)N*[Al])=C2C=C1 Chemical compound C*1C=CC(c2ccccc2C2(C(C=C3)=CC=CC3(C)N*F)C(C=C3)=CC=CC3(C)N*[Al])=C2C=C1 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 4
- 229940126062 Compound A Drugs 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 4
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
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- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- PASDCCFISLVPSO-UHFFFAOYSA-N benzoyl chloride Chemical compound ClC(=O)C1=CC=CC=C1 PASDCCFISLVPSO-UHFFFAOYSA-N 0.000 description 4
- 230000000903 blocking effect Effects 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
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- 125000004216 fluoromethyl group Chemical group [H]C([H])(F)* 0.000 description 4
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- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 4
- 229910052763 palladium Inorganic materials 0.000 description 4
- LVTJOONKWUXEFR-FZRMHRINSA-N protoneodioscin Natural products O(C[C@@H](CC[C@]1(O)[C@H](C)[C@@H]2[C@]3(C)[C@H]([C@H]4[C@@H]([C@]5(C)C(=CC4)C[C@@H](O[C@@H]4[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@@H](O)[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@H](CO)O4)CC5)CC3)C[C@@H]2O1)C)[C@H]1[C@H](O)[C@H](O)[C@H](O)[C@@H](CO)O1 LVTJOONKWUXEFR-FZRMHRINSA-N 0.000 description 4
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- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 4
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- QWXYZCJEXYQNEI-OSZHWHEXSA-N intermediate I Chemical compound COC(=O)[C@@]1(C=O)[C@H]2CC=[N+](C\C2=C\C)CCc2c1[nH]c1ccccc21 QWXYZCJEXYQNEI-OSZHWHEXSA-N 0.000 description 3
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- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
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- DHRLEVQXOMLTIM-UHFFFAOYSA-N phosphoric acid;trioxomolybdenum Chemical compound O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.OP(O)(O)=O DHRLEVQXOMLTIM-UHFFFAOYSA-N 0.000 description 3
- IYDGMDWEHDFVQI-UHFFFAOYSA-N phosphoric acid;trioxotungsten Chemical compound O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.OP(O)(O)=O IYDGMDWEHDFVQI-UHFFFAOYSA-N 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
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- 238000001308 synthesis method Methods 0.000 description 3
- 239000013076 target substance Substances 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
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- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
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- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
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- 229910018287 SbF 5 Inorganic materials 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- TWWQCBRELPOMER-UHFFFAOYSA-N [4-(n-phenylanilino)phenyl]boronic acid Chemical compound C1=CC(B(O)O)=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 TWWQCBRELPOMER-UHFFFAOYSA-N 0.000 description 1
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- CAQBYZXIJRIQIU-UHFFFAOYSA-N [Na].[Na].Nc1cc2ccc(cc2cc1S(O)(=O)=O)S(O)(=O)=O Chemical compound [Na].[Na].Nc1cc2ccc(cc2cc1S(O)(=O)=O)S(O)(=O)=O CAQBYZXIJRIQIU-UHFFFAOYSA-N 0.000 description 1
- JVVLMWOXRIHMTH-UHFFFAOYSA-N [Na].[Na].Nc1ccc2c(cccc2c1S(O)(=O)=O)S(O)(=O)=O Chemical compound [Na].[Na].Nc1ccc2c(cccc2c1S(O)(=O)=O)S(O)(=O)=O JVVLMWOXRIHMTH-UHFFFAOYSA-N 0.000 description 1
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- KVXNKFYSHAUJIA-UHFFFAOYSA-N acetic acid;ethoxyethane Chemical compound CC(O)=O.CCOCC KVXNKFYSHAUJIA-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
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- 125000005577 anthracene group Chemical group 0.000 description 1
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- 125000004429 atom Chemical group 0.000 description 1
- 125000003943 azolyl group Chemical group 0.000 description 1
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- 150000003519 bicyclobutyls Chemical group 0.000 description 1
- 150000005350 bicyclononyls Chemical group 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 1
- 235000019437 butane-1,3-diol Nutrition 0.000 description 1
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- HUCVOHYBFXVBRW-UHFFFAOYSA-M caesium hydroxide Inorganic materials [OH-].[Cs+] HUCVOHYBFXVBRW-UHFFFAOYSA-M 0.000 description 1
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- 239000003729 cation exchange resin Substances 0.000 description 1
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- 125000006547 cyclononyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- NLUNLVTVUDIHFE-UHFFFAOYSA-N cyclooctylcyclooctane Chemical group C1CCCCCCC1C1CCCCCCC1 NLUNLVTVUDIHFE-UHFFFAOYSA-N 0.000 description 1
- NXQGGXCHGDYOHB-UHFFFAOYSA-L cyclopenta-1,4-dien-1-yl(diphenyl)phosphane;dichloropalladium;iron(2+) Chemical compound [Fe+2].Cl[Pd]Cl.[CH-]1C=CC(P(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1.[CH-]1C=CC(P(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 NXQGGXCHGDYOHB-UHFFFAOYSA-L 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
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- 238000006731 degradation reaction Methods 0.000 description 1
- 238000001739 density measurement Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
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- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
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- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- QYUDDCLXBAJUNA-UHFFFAOYSA-L disodium;2-aminobenzene-1,4-disulfonate Chemical compound [Na+].[Na+].NC1=CC(S([O-])(=O)=O)=CC=C1S([O-])(=O)=O QYUDDCLXBAJUNA-UHFFFAOYSA-L 0.000 description 1
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- 238000005516 engineering process Methods 0.000 description 1
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- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 150000004673 fluoride salts Chemical class 0.000 description 1
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- 125000004785 fluoromethoxy group Chemical group [H]C([H])(F)O* 0.000 description 1
- 125000001207 fluorophenyl group Chemical group 0.000 description 1
- 239000003205 fragrance Substances 0.000 description 1
- 230000002140 halogenating effect Effects 0.000 description 1
- 125000006343 heptafluoro propyl group Chemical group 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- YAMHXTCMCPHKLN-UHFFFAOYSA-N imidazolidin-2-one Chemical compound O=C1NCCN1 YAMHXTCMCPHKLN-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 150000002500 ions Chemical group 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 1
- 229910052808 lithium carbonate Inorganic materials 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- LVWZTYCIRDMTEY-UHFFFAOYSA-N metamizole Chemical compound O=C1C(N(CS(O)(=O)=O)C)=C(C)N(C)N1C1=CC=CC=C1 LVWZTYCIRDMTEY-UHFFFAOYSA-N 0.000 description 1
- UKVIEHSSVKSQBA-UHFFFAOYSA-N methane;palladium Chemical compound C.[Pd] UKVIEHSSVKSQBA-UHFFFAOYSA-N 0.000 description 1
- RPNNPZHFJPXFQS-UHFFFAOYSA-N methane;rhodium Chemical compound C.[Rh] RPNNPZHFJPXFQS-UHFFFAOYSA-N 0.000 description 1
- NCPHGZWGGANCAY-UHFFFAOYSA-N methane;ruthenium Chemical compound C.[Ru] NCPHGZWGGANCAY-UHFFFAOYSA-N 0.000 description 1
- 125000005948 methanesulfonyloxy group Chemical group 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- 229940095102 methyl benzoate Drugs 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- KVBGVZZKJNLNJU-UHFFFAOYSA-N naphthalene-2-sulfonic acid Chemical compound C1=CC=CC2=CC(S(=O)(=O)O)=CC=C21 KVBGVZZKJNLNJU-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical compound [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 1
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 description 1
- MXQOYLRVSVOCQT-UHFFFAOYSA-N palladium;tritert-butylphosphane Chemical compound [Pd].CC(C)(C)P(C(C)(C)C)C(C)(C)C.CC(C)(C)P(C(C)(C)C)C(C)(C)C MXQOYLRVSVOCQT-UHFFFAOYSA-N 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 125000005003 perfluorobutyl group Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)* 0.000 description 1
- 125000005004 perfluoroethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 1
- 125000005009 perfluoropropyl group Chemical group FC(C(C(F)(F)F)(F)F)(F)* 0.000 description 1
- UHZYTMXLRWXGPK-UHFFFAOYSA-N phosphorus pentachloride Chemical compound ClP(Cl)(Cl)(Cl)Cl UHZYTMXLRWXGPK-UHFFFAOYSA-N 0.000 description 1
- OBCUTHMOOONNBS-UHFFFAOYSA-N phosphorus pentafluoride Chemical compound FP(F)(F)(F)F OBCUTHMOOONNBS-UHFFFAOYSA-N 0.000 description 1
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 1
- 229910003446 platinum oxide Inorganic materials 0.000 description 1
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- 150000003077 polyols Chemical class 0.000 description 1
- 229940005642 polystyrene sulfonic acid Drugs 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000011698 potassium fluoride Substances 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 150000003233 pyrroles Chemical class 0.000 description 1
- 238000011160 research Methods 0.000 description 1
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- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 1
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- 238000012546 transfer Methods 0.000 description 1
- 238000010023 transfer printing Methods 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 125000005951 trifluoromethanesulfonyloxy group Chemical group 0.000 description 1
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- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C233/00—Carboxylic acid amides
- C07C233/64—Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings
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Abstract
Description
本發明係關於含有氟原子之化合物及其利用。
有機電致發光(EL)元件,於顯示器或照明等領域的實用化受到期待,以低電壓驅動、高輝度、高壽命等為目的,有進行關於材料或元件構造之各種開發。
有機EL元件之高功能化,係藉由功能分離之功能層的多層層合構造而實現,將前述功能層以功能別予以粗分時,係由電洞注入/傳輸層、發光層、電子注入/傳輸層3種。此等之中,電洞注入/傳輸層所達成之最重要的功能,係將自外部電源通過陽極所注入之電洞載子(carrier)效率良好地傳輸至發光層。又,為了使電洞載子與自陰極側所注入之電子載子於發光層內效率良好地再結合,亦要求防止電子載子自發光層流出至電洞注入/傳輸層的功能。
有機功能層膜之形成方法,粗分為以蒸鍍法為代表的乾式製程與以旋轉塗佈法為代表的濕式製程。比
較此等製程時,濕式製程較可大面積地製造平坦性高之薄膜,於低成本化、大面積化有優越性。特別是可成為發光層之下層的共通層之電洞注入/傳輸層,係強烈期望濕式製程化之實現。
有鑑於如此實情,本發明者等人有開發可應用於各種濕式製程,而且賦予應用於有機EL元件之電洞注入層時可實現優良特性之薄膜的電荷傳輸性材料、或對使用於其之有機溶劑的溶解性良好之化合物、及電荷傳輸性塗漆(專利文獻1~4)。
又,由於可有助於有機EL元件之輝度特性,故不僅電洞注入層,對電洞傳輸層等亦要求更高之均勻性(專利文獻5),且要求賦予平坦性優良的電荷傳輸性薄膜,進而亦可實現於其膜上以濕式製程所形成之電洞傳輸層或發光層的優良塗佈性之材料。
[專利文獻1]國際公開第2008/032616號
[專利文獻2]國際公開第2008/129947號
[專利文獻3]國際公開第2006/025342號
[專利文獻4]國際公開第2010/058777號
[專利文獻5]日本特開2008-27646號公報
本發明係有鑑於前述實情而為者,其目的為提供可獲得具有高電洞傳輸性及高電子阻擋性之薄膜的化合物及其利用。
本發明者等人,為了達成前述目的重複努力探討的結果,發現使用特定之含有氟原子之化合物所得到的薄膜具有高的電洞傳輸性及高的電子阻擋性,而完成本發明。
亦即,本發明係提供下述含有氟原子之化合物及其利用。
Ar係分別獨立地表示下述式(8)~(11)表示之基;
(式(8)中,R2表示氫原子、碳數1~20之烷基;可經氰基、硝基、鹵素原子、碳數1~20之烷基或碳數1~20之鹵烷基取代之碳數6~20之芳基;或下述式(12)~(14)
表示之基,式中,D表示各芳基分別獨立地為碳數6~20之芳基的二芳基胺基,式(8)~(14)中,R3~R77係分別獨立地表示氫原子、氰基、硝基、鹵素原子、碳數1~20之烷基或碳數1~20之鹵烷基);ArF係分別獨立地表示可經氰基、氯原子、溴原子、碘原子、硝基、碳數1~20之烷基、碳數1~20之氟烷基或碳數1~20之氟烷氧基取代的碳數6~20之氟芳基;經碳數1~20之氟烷基、碳數3~20之氟環烷基、碳數4~20之氟雙環烷基、碳數2~20之氟烯基或碳數2~20之氟炔基取代,而且可經氰基、鹵素原子或碳數1~20之氟烷氧基取代的碳數6~20之芳基]。
2.如1之含有氟原子之化合物,其中ArF係分別獨立地為
可經氰基、氯原子、溴原子、碘原子、硝基、碳數1~20之烷基、碳數1~20之氟烷基或碳數1~20之氟烷氧基取代的經3個以上之氟原子取代的苯基、或2-(三氟甲基)苯基、3-(三氟甲基)苯基、4-(三氟甲基)苯基、4-乙氧基-3-(三氟甲基)苯基、3-氟-4-三氟甲基苯基、4-氟-3-三氟甲基苯基、4-氟-2-三氟甲基苯基、2-氟-5-(三氟甲基)苯基、3-氟-5-(三氟甲基)苯基、3,5-二(三氟甲基)苯基、2,4,6-三(三氟甲基)苯基、4-(五氟乙基)苯基、4-(3,3,3-三氟丙基)苯基、2,3,5,6-四氟-4-三氟甲基苯基、4-(全氟乙烯基)苯基、4-(全氟丙烯基)苯基或4-(全氟丁烯基)苯基。
3.如1或2之含有氟原子之化合物,其中ArF為相同之基。
4.如1~3中任一項之含有氟原子之化合物,其中Z為式(2)表示之基。
5.如1~4中任一項之含有氟原子之化合物,其中R2為苯基。
6.如1~5中任一項之含有氟原子之化合物,其中R3~R77為氫原子。
7.一種電荷傳輸性物質,其係由如1~6中任一項之含有氟原子之化合物所構成。
8.一種電荷傳輸性塗漆,其含有如7之電荷傳輸性物質及有機溶劑。
9.如8之電荷傳輸性塗漆,其進一步含有不含有氟原子之電荷傳輸性物質。
10.如8或9之電荷傳輸性塗漆,其進一步含有摻雜劑。
11.一種電荷傳輸性薄膜,其係使用如8~10中任一項之電荷傳輸性塗漆所製作。
12.一種有機EL元件,其具備如11之電荷傳輸性薄膜。
使用本發明之含有氟原子之化合物所得到之
薄膜,具有高的電洞傳輸性及高的電子阻擋性。因而,可適合地使用作為以有機EL元件為首的電子裝置用薄膜。特別地,藉由應用該薄膜於有機EL元件之電洞注入層、電洞傳輸層、電洞注入傳輸層,可得到輝度特性優良的有機EL元件。又,含有本發明之含有氟原子之化合物的電荷傳輸性塗漆,即使使用旋轉塗佈法或狹縫塗佈法等可大面積地成膜的各種濕式製程,亦可再現性良好地製造電荷傳輸性優良的薄膜,進而會保持該表面之上層材料所使用的溶劑之高的塗覆性,亦可充分對應於近年來之有機EL元件領域中的進展。
本發明之含有氟原子之化合物,為下述式(1)表示者。
式(1)表示之含有氟原子之化合物,可列舉以下所示者,但不限定於此等。
式(1)中,Z表示以下述式(2)~(7)之任一者表示之基。再者,Z為式(4)或(5)表示之基時,該基中所含有的碳原子,係鄰接於式(1)中之氮原子。
式(2)~(7)中,R1係分別獨立地表示氫原子或碳數1~20之烷基,較佳為氫原子。
前述碳數1~20之烷基,係直鏈狀、分支狀、環狀的任意者均可,其具體例子可列舉甲基、乙基、n-丙基、異丙基、n-丁基、異丁基、sec-丁基、tert-丁基、n-戊基、n-己基、n-庚基、n-辛基、n-壬基、n-癸基等之碳數1~20之直鏈狀或分支狀烷基;環丙基、環丁
基、環戊基、環己基、環庚基、環辛基、環壬基、環癸基、雙環丁基、雙環戊基、雙環己基、雙環庚基、雙環辛基、雙環壬基、雙環癸基等之碳數3~20之環狀烷基。
Z較佳為式(2)、(3)、(4)、(5)或(6)表示之基;更佳為式(2)、(4)或(6)表示之基;又更佳為式(2)表示之基。
式(1)中,Ar係分別獨立地表示下述式(8)~(11)表示之基。
式(8)中,R2表示氫原子、碳數1~20之烷基;可經氰基、硝基、鹵素原子、碳數1~20之烷基或碳數1~20之鹵烷基取代之碳數6~20之芳基;或下述式(12)~(14)表示之基。
前述碳數1~20之烷基,可列舉與前述為相
同者。前述碳數6~20之芳基,可列舉苯基、1-萘基、2-萘基、1-蒽基、2-蒽基、9-蒽基、1-菲基、2-菲基、3-菲基、4-菲基、9-菲基等。前述二芳基胺基,可列舉二苯基胺基、二萘基胺基、二蒽基胺基、N-苯基-N-萘基胺基、N-苯基-N-蒽基胺基、N-萘基-N-蒽基胺基等。
式(12)~(14)表示之基,較佳為下述式(12-1)~(14-1)等表示者。
此等之中,R2較佳為氫原子、苯基、1-萘基、2-萘基、1-蒽基、2-蒽基、9-蒽基、1-菲基、2-菲基、3-菲基、4-菲基、9-菲基、式(12-1)表示之基、式(13-1)表示之基等;更佳為式(12-1)表示之基、式(13-1)表示之基、苯基;又更佳為苯基。
式(8)~(14)中,R3~R77係分別獨立地表示氫原子、氰基、硝基、鹵素原子、碳數1~20之烷基或碳數1~20之鹵烷基。前述碳數1~20之烷基,可列舉與前述為相同者。前述鹵素原子,可列舉氟原子、氯原子、溴原子、碘原子等。前述鹵烷基,可列舉前述烷基之氫原子的一部分或全部被前述鹵素原子取代者。此等之中,R3~R77,較佳為氫原子、氰基、硝基、鹵素原子、碳數1~10之烷基或碳數1~10之鹵烷基;更佳為氫原子、氰基、硝
基、鹵素原子、三氟甲基;;又更佳係全部為氫原子。
式(8)~(11)表示之基,可列舉以下所示者,但不限定於此等。
式(1)中,ArF係分別獨立地表示可經氰基、氯原子、溴原子、碘原子、硝基、碳數1~20之烷基、碳數1~20之氟烷基或碳數1~20之氟烷氧基取代的碳數6~20之氟芳基;經碳數1~20之氟烷基、碳數3~20之氟環烷基、碳數4~20之氟雙環烷基、碳數2~20之氟烯
基或碳數2~20之氟炔基取代,而且可經氰基、鹵素原子或碳數1~20之氟烷氧基取代的碳數6~20之芳基。
前述氟芳基,只要為碳原子上之至少1個氫原子被氟原子取代之芳基,則無特殊限定,可列舉例如2-氟苯基、3-氟苯基、4-氟苯基、2,3-二氟苯基、2,4-二氟苯基、2,5-二氟苯基、2,6-二氟苯基、3,4-二氟苯基、3,5-二氟苯基、2,3,4-三氟苯基、2,3,5-三氟苯基、2,3,6-三氟苯基、2,4,5-三氟苯基、2,4,6-三氟苯基、3,4,5-三氟苯基、2,3,4,5-四氟苯基、2,3,4,6-四氟苯基、2,3,5,6-四氟苯基、五氟苯基、2-氟-1-萘基、3-氟-1-萘基、4-氟-1-萘基、6-氟-1-萘基、7-氟-1-萘基、8-氟-1-萘基、4,5-二氟-1-萘基、5,7-二氟-1-萘基、5,8-二氟-1-萘基、5,6,7,8-四氟-1-萘基、七氟-1-萘基、1-氟-2-萘基、5-氟-2-萘基、6-氟-2-萘基、7-氟-2-萘基、5,7-二氟-2-萘基、七氟-2-萘基、10-氟-9-蒽基、九氟-1-蒽基、九氟-2-蒽基、九氟-9-蒽基、9-氟-1-菲基、1-氟-9-菲基、2-氟-9-菲基、九氟-1-菲基、九氟-2-菲基、九氟-3-菲基、九氟-9-菲基等。
作為前述氟芳基,當考慮到前述含有氟原子之化合物對有機溶劑之溶解性、前述含有氟原子之化合物之原料的獲得容易性等之平衡時,較佳為可經氰基、氯原子、溴原子、碘原子、硝基、碳數1~20之烷基、碳數1~20之氟烷基或碳數1~20之氟烷氧基取代的經3個以上之氟原子取代的苯基。
前述經碳數1~20之氟烷基、碳數3~20之
氟環烷基、碳數4~20之氟雙環烷基、碳數2~20之氟烯基或碳數2~20之氟炔基取代,而且可經氰基、鹵素原子或碳數1~20之氟烷氧基取代的碳數6~20之芳基(以下,方便上亦稱為經取代之芳基),只要為碳原子上之至少1個氫原子被碳數1~20之氟烷基、碳數3~20之氟環烷基、碳數4~20之氟雙環烷基、碳數2~20之氟烯基或碳數2~20之氟炔基取代的芳基,則無特殊限定,可列舉例如2-(三氟甲基)苯基、3-(三氟甲基)苯基、4-(三氟甲基)苯基、4-乙氧基-3-(三氟甲基)苯基、3-氟-4-三氟甲基苯基、4-氟-3-三氟甲基苯基、4-氟-2-三氟甲基苯基、2-氟-5-(三氟甲基)苯基、3-氟-5-(三氟甲基)苯基、3,5-二(三氟甲基)苯基、2,4,6-三(三氟甲基)苯基、4-(五氟乙基)苯基、4-(3,3,3-三氟丙基)苯基、2,3,5,6-四氟-4-三氟甲基苯基、4-(全氟乙烯基)苯基、4-(全氟丙烯基)苯基、4-(全氟丁烯基)苯基等。
作為前述經取代之芳基,當考慮到前述含有氟原子之化合物對有機溶劑之溶解性、前述含有氟原子之化合物之原料的獲得容易性等之平衡時,較佳為經碳數3~20之氟環烷基、碳數4~20之氟雙環烷基、碳數2~20之氟烯基或碳數2~20之氟炔基取代,而且可經氰基、鹵素原子或碳數1~20之氟烷氧基取代之苯基(以下,方便上,亦稱為經取代之苯基);更佳為經1~3個三氟甲基取代之苯基;又更佳為p-三氟甲基苯基。
前述氟烷基,只要為碳原子上之至少1個氫
原子被氟原子取代的直鏈狀或分支狀之烷基,則無特殊限定,可列舉例如氟甲基、二氟甲基、三氟甲基、1-氟乙基、2-氟乙基、1,2-二氟乙基、1,1-二氟乙基、2,2-二氟乙基、1,1,2-三氟乙基、1,2,2-三氟乙基、2,2,2-三氟乙基、1,1,2,2-四氟乙基、1,2,2,2-四氟乙基、1,1,2,2,2-五氟乙基、1-氟丙基、2-氟丙基、3-氟丙基、1,1-二氟丙基、1,2-二氟丙基、1,3-二氟丙基、2,2-二氟丙基、2,3-二氟丙基、3,3-二氟丙基、1,1,2-三氟丙基、1,1,3-三氟丙基、1,2,3-三氟丙基、1,3,3-三氟丙基、2,2,3-三氟丙基、2,3,3-三氟丙基、3,3,3-三氟丙基、1,1,2,2-四氟丙基、1,1,2,3-四氟丙基、1,2,2,3-四氟丙基、1,3,3,3-四氟丙基、2,2,3,3-四氟丙基、2,3,3,3-四氟丙基、1,1,2,2,3-五氟丙基、1,2,2,3,3-五氟丙基、1,1,3,3,3-五氟丙基、1,2,3,3,3-五氟丙基、2,2,3,3,3-五氟丙基、七氟丙基等。
作為前述氟烷氧基,只要為碳原子上之至少1個氫原子被氟原子取代的烷氧基,則無特殊限定,可列舉例如氟甲氧基、二氟甲氧基、三氟甲氧基、1-氟乙氧基、2-氟乙氧基、1,2-二氟乙氧基、1,1-二氟乙氧基、2,2-二氟乙氧基、1,1,2-三氟乙氧基、1,2,2-三氟乙氧基、2,2,2-三氟乙氧基、1,1,2,2-四氟乙氧基、1,2,2,2-四氟乙氧基、1,1,2,2,2-五氟乙氧基、1-氟丙氧基、2-氟丙氧基、3-氟丙氧基、1,1-二氟丙氧基、1,2-二氟丙氧基、1,3-二氟丙氧基、2,2-二氟丙氧基、2,3-二氟丙氧基、3,3-二氟丙氧基、1,1,2-三氟丙氧基、1,1,3-三氟丙氧基、1,2,3-三氟丙氧
基、1,3,3-三氟丙氧基、2,2,3-三氟丙氧基、2,3,3-三氟丙氧基、3,3,3-三氟丙氧基、1,1,2,2-四氟丙氧基、1,1,2,3-四氟丙氧基、1,2,2,3-四氟丙氧基、1,3,3,3-四氟丙氧基、2,2,3,3-四氟丙氧基、2,3,3,3-四氟丙氧基、1,1,2,2,3-五氟丙氧基、1,2,2,3,3-五氟丙氧基、1,1,3,3,3-五氟丙氧基、1,2,3,3,3-五氟丙氧基、2,2,3,3,3-五氟丙氧基、七氟丙氧基等。
前述氟環烷基,只要為碳原子上之至少1個氫原子被氟原子取代的環烷基,則無特殊限定,可列舉例如1-氟環丙基、2-氟環丙基、2,2-二氟環丙基、2,2,3,3-四氟環丙基、五氟環丙基、2,2-二氟環丁基、2,2,3,3-四氟環丁基、2,2,3,3,4,4-六氟環丁基、七氟環丁基、1-氟環戊基、3-氟環戊基、3,3-二氟環戊基、3,3,4,4-四氟環戊基、九氟環戊基、1-氟環己基、2-氟環己基、4-氟環己基、4,4-二氟環己基、2,2,3,3-四氟環己基、2,3,4,5,6-五氟環己基、十一氟環己基等。
前述氟雙環烷基,只要為碳原子上之至少1個氫原子被氟原子取代的雙環烷基,則無特殊限定,可列舉例如3-氟雙環[1.1.0]丁烷-1-基、2,2,4,4-四氟雙環[1.1.0]丁烷-1-基、五氟雙環[1.1.0]丁烷-1-基、3-氟雙環[1.1.1]戊烷-1-基、2,2,4,4,5-五氟雙環[1.1.1]戊烷-1-基、2,2,4,4,5,5-六氟雙環[1.1.1]戊烷-1-基、5-氟雙環[3.1.0]己烷-6-基、6-氟雙環[3.1.0]己烷-6-基、6,6-二氟雙環[3.1.0]己烷-2-基、2,2,3,3,5,5,6,6-八氟雙環[2.2.0]己烷-1-基、1-
氟雙環[2.2.1]庚烷-2-基、3-氟雙環[2.2.1]庚烷-2-基、4-氟雙環[2.2.1]庚烷-1-基、5-氟雙環[3.1.1]庚烷-1-基、1,3,3,4,5,5,6,6,7,7-十氟雙環[2.2.1]庚烷-2-基、十一氟雙環[2.2.1]庚烷-2-基、3-氟雙環[2.2.2]辛烷-1-基、4-氟雙環[2.2.2]辛烷-1-基等。
前述氟烯基,只要為碳原子上之至少1個氫原子被氟原子取代的烯基,則無特殊限定,可列舉例如1-氟乙烯基、2-氟乙烯基、1,2-二氟乙烯基、1,2,2-三氟乙烯基、2,3,3-三氟-1-丙烯基、3,3,3-三氟-1-丙烯基、2,3,3,3-四氟-1-丙烯基、五氟-1-丙烯基、1-氟-2-丙烯基、1,1-二氟-2-丙烯基、2,3-二氟-2-丙烯基、3,3-二氟-2-丙烯基、2,3,3-三氟-2-丙烯基、1,2,3,3-四氟-2-丙烯基、五氟-2-丙烯基等。
前述氟炔基,只要為碳原子上之至少1個氫原子被氟原子取代的炔基,則無特殊限定,可列舉例如氟乙炔基、3-氟-1-丙炔基、3,3-二氟-1-丙炔基、3,3,3-三氟-1-丙炔基、1-氟-2-丙炔基、1,1-二氟-2-丙炔基等。
此等之中,ArF尤以前述可經取代之碳數6~20之氟芳基或前述經取代之芳基為佳;更佳為前述可經取代之氟苯基或前述經取代之苯基;又更佳為前述可經取代之三氟苯基、前述可經取代之四氟苯基、前述可經取代之五氟苯基或經1~3個三氟甲基取代之苯基。又,由該含有氟原子之化合物的合成容易性之觀點而言,ArF,較佳為相同之基。
以下,列舉適合作為ArF之基的具體例子,但不限定於此等。
以下,列舉式(1)表示之含有氟原子之化合物的具體例子,但不限定於此等。
本發明之含有氟原子之化合物,可藉由下述流程A所示之方法合成。
鹵素原子,可列舉氟原子、氯原子、溴原子、碘原子等。又,擬鹵素基,可列舉甲烷磺醯氧基、三氟甲烷磺醯氧基、九氟丁烷磺醯氧基等之氟烷基磺醯氧基;苯磺醯氧基、甲苯磺醯氧基等之芳香族磺醯氧基等。
式(15)表示之化合物,可藉由以往公知之方法合成,例如,可遵照J.Mater.Chem.C,2014,pp.1068-1075記載之方法合成。
流程A中,第1步驟,係藉由偶合反應,由式(15)表示之化合物及式(16)表示之化合物得到式(17)表
示之中間體的步驟。再者,流程A中,係顯示利用鈴木/宮浦偶合反應之合成方法為例,但亦可利用其他之偶合反應合成。
鈴木/宮浦偶合反應中所用之觸媒,可列舉[1,1’-雙(二苯基膦基)二茂鐵]鈀(II)二氯化物(PdCl2(dppf))、肆(三苯基膦)鈀(Pd(PPh3)4)、雙(三苯基膦)二氯鈀(Pd(PPh3)2Cl2)、雙(亞苄基丙酮)鈀(Pd(dba)2)、參(亞苄基丙酮)二鈀(Pd2(dba)3)、雙(三tert-丁基膦)鈀(Pd(P-t-Bu3)2)、乙酸鈀(Pd(OAc)2)等之鈀觸媒等。此等之中,就效率良好地得到目標物之觀點而言,較佳之觸媒,係PdCl2(dppf)、Pd(PPh3)4、Pd(PPh3)2Cl2、Pd(P-t-Bu3)2;更佳為Pd(PPh3)4、Pd(P-t-Bu3)2。前述觸媒之使用量,相對於式(15)表示之化合物而言,通常為0.1~50mol%左右、較佳為0.1~30mol%、更佳為1~10mol%。
又,鈴木/宮浦偶合反應中亦使用鹼,前述鹼可列舉氫氧化鈉、氫氧化鉀、氫氧化銫等之氫氧化物類;tert-丁氧基鈉、tert-丁氧基鉀等之烷氧化物類;氟化鋰、氟化鉀、氟化銫等之氟化物鹽類;碳酸鋰、碳酸鈉、碳酸鉀、碳酸銫、碳酸氫鈉、碳酸氫鉀等之碳酸鹽類;磷酸鉀等之磷酸鹽類;三甲基胺、三乙基胺、二異丙基胺、n-丁基胺、二異丙基乙基胺等之胺類。此等之中,就效率良好地得到目標物之觀點而言,較佳之鹼為碳酸鈉、碳酸鉀、碳酸銫、碳酸氫鈉、碳酸氫鉀等之碳酸鹽類;磷酸鉀等之磷酸鹽類;更佳為碳酸鉀、碳酸銫。前述鹼之使用量,相
對於式(15)表示之化合物而言,通常為2~20當量左右、較佳為1~20當量、更佳為2~8當量。
第1步驟中所用之溶劑,只要係不對反應造成不良影響者,則無特殊限定,具體例子可列舉脂肪族烴(戊烷、n-己烷、n-辛烷、n-癸烷、十氫萘等)、鹵化脂肪族烴(氯仿、二氯甲烷、二氯乙烷、四氯化碳等)、芳香族烴(苯、硝基苯、甲苯、o-二甲苯、m-二甲苯、p-二甲苯、均三甲苯等)、醚(二乙基醚、二異丙基醚、tert-丁基甲基醚、四氫呋喃(THF)、二噁烷、1,2-二甲氧基乙烷、1,2-二乙氧基乙烷等)、醯胺(N,N-二甲基甲醯胺(DMF)、N,N-二甲基乙醯胺等)、內醯胺及內酯(N-甲基吡咯啶酮、γ-丁內酯等)、尿素衍生物(N,N-二甲基四氫咪唑酮、四甲基脲等)、亞碸(二甲基亞碸、環丁碸等)、腈(乙腈、丙腈、丁腈等)等。此等之中,就效率良好地得到目標物之觀點而言。較佳之溶劑,為脂肪族烴(戊烷、n-己烷、n-辛烷、n-癸烷、十氫萘等)、芳香族烴(苯、硝基苯、甲苯、o-二甲苯、m-二甲苯、p-二甲苯、均三甲苯等)、醚(二乙基醚、二異丙基醚、tert-丁基甲基醚、THF、二噁烷、1,2-二甲氧基乙烷、1,2-二乙氧基乙烷等);更佳為芳香族烴(苯、硝基苯、甲苯、o-二甲苯、m-二甲苯、p-二甲苯、均三甲苯等)、醚(二乙基醚、二異丙基醚、tert-丁基甲基醚、THF、二噁烷、1,2-二甲氧基乙烷、1,2-二乙氧基乙烷等)。
式(15)表示之化合物與式(16)表示之化合物之
饋入比,相對於式(15)表示之化合物而言,式(16)表示之化合物較佳為2~6當量、更佳為2~3當量。
第1步驟中,反應溫度係考慮所用之原料化合物或觸媒之種類或量,並且於溶劑之熔點至沸點的範圍中適當設定,但通常為0~200℃左右、較佳為0~50℃。又,反應時間雖依所用之原料化合物或反應溫度等而異,故不能一概規定,但通常為1~24小時左右。
流程A中,第2步驟為將式(17)表示之中間體還原而得到式(18)表示之中間體之步驟。還原方法可列舉接觸氫化、以金屬與酸所進行的化學還原等之公知方法。
藉由接觸氫化來進行還原時,只要使用鈀碳、雷氏鎳觸媒、氧化鉑、釕碳、銠碳、鉑碳等之公知觸媒來進行即可。又,接觸氫化之條件,可列舉例如氫壓力1~10氣壓、反應溫度20~100℃、反應時間1~48小時。
流程A中、第3步驟為使式(18)表示之中間體與式(19)表示之化合物反應,而合成式(1)表示之含有氟原子之化合物的步驟。
式(19)表示之化合物當中,Z為以式(2)表示者,可列舉2-氟苯甲醯氯、3-氟苯甲醯氯、4-氟苯甲醯氯、2-氟-4-甲基苯甲醯氯、2-氟-5-甲基苯甲醯氯、3-氟-4-甲基苯甲醯氯、3-氟-6-甲基苯甲醯氯、4-氟-2-甲基苯甲醯氯、4-氟-3-甲基苯甲醯氯、2,3-二氟苯甲醯氯、2,4-二
氟苯甲醯氯、2,5-二氟苯甲醯氯、2,6-二氟苯甲醯氯、3,4-二氟苯甲醯氯、3,5-二氟苯甲醯氯、3-氯-2-氟苯甲醯氯、4-氯-2-氟苯甲醯氯、5-氯-2-氟苯甲醯氯、2-氯-6-氟苯甲醯氯、2-氯-3-氟苯甲醯氯、2-氯-4-氟苯甲醯氯、2-氯-5-氟苯甲醯氯、3-氯-4-氟苯甲醯氯、3-氯-5-氟苯甲醯氯、3-溴-2-氟苯甲醯氯、4-溴-2-氟苯甲醯氯、5-溴-2-氟苯甲醯氯、2-溴-6-氟苯甲醯氯、2-溴-3-氟苯甲醯氯、2-溴-4-氟苯甲醯氯、2-溴-5-氟苯甲醯氯、3-溴-4-氟苯甲醯氯、3-溴-5-氟苯甲醯氯、2-氟-5-碘苯甲醯氯、2-氟-6-碘苯甲醯氯、2-氟-3-(三氟甲基)苯甲醯氯、2-氟-5-(三氟甲基)苯甲醯氯、2-氟-6-(三氟甲基)苯甲醯氯、3-氟-4-(三氟甲基)苯甲醯氯、3-氟-5-(三氟甲基)苯甲醯氯、3-氟-6-(三氟甲基)苯甲醯氯、4-氟-2-(三氟甲基)苯甲醯氯、4-氟-3-(三氟甲基)苯甲醯氯、2-氟-4-硝基苯甲醯氯、2-氟-5-硝基苯甲醯氯、3-氟-2-硝基苯甲醯氯、3-氟-4-硝基苯甲醯氯、3-氟-6-硝基苯甲醯氯、4-氟-2-硝基苯甲醯氯、4-氟-3-硝基苯甲醯氯、4-氰基-2-氟苯甲醯氯、3-氰基-5-氟苯甲醯氯、2,3,4-三氟苯甲醯氯、2,3,5-三氟苯甲醯氯、2,3,6-三氟苯甲醯氯、2,4,5-三氟苯甲醯氯、2,4,6-三氟苯甲醯氯、3,4,5-三氟苯甲醯氯、4-氯-2,4-二氟苯甲醯氯、2,4-二氯-5-氟-4-硝基苯甲醯氯、2,4,5-三氟-3-甲基-6-硝基苯甲醯氯、2,3,4,5-四氟苯甲醯氯、2,3,5,6-四氟苯甲醯氯、2,3,5,6-四氟-4-甲基-苯甲醯氯、2,3,4,5-四氟-6-硝基苯甲醯氯、2,3,4,5,6-五氟苯甲醯氯、2-(三氟甲基)苯甲醯氯、
3-(三氟甲基)苯甲醯氯、4-(三氟甲基)苯甲醯氯、3-三氟甲基-4-乙氧基苯甲醯氯、3,5-雙(三氟甲基)苯甲醯氯、2,4,6-參(三氟甲基)苯甲醯氯、4-(五氟乙基)苯甲醯氯、4-(3-四氟丙基)苯甲醯氯、2,3,5,6-四氟-4-(三氟甲基)苯甲醯氯、2,3,5,6-四氟-4-(三氟乙烯基)苯甲醯氯、2,3,5,6-四氟-4-(五氟烯丙基)苯甲醯氯等,但不限定於此等。
式(19)表示之化合物當中,Z為以式(3)表示者,可列舉2-氟硫苯甲醯氯、3-氟硫苯甲醯氯、4-氟硫苯甲醯氯、2-氟-4-甲基硫苯甲醯氯、2-氟-5-甲基硫苯甲醯氯、3-氟-4-甲基硫苯甲醯氯、3-氟-6-甲基硫苯甲醯氯、4-氟-2-甲基硫苯甲醯氯、4-氟-3-甲基硫苯甲醯氯、2,3-二氟硫苯甲醯氯、2,4-二氟硫苯甲醯氯、2,5-二氟硫苯甲醯氯、2,6-二氟硫苯甲醯氯、3,4-二氟硫苯甲醯氯、3,5-二氟硫苯甲醯氯、3-氯-2-氟硫苯甲醯氯、4-氯-2-氟硫苯甲醯氯、5-氯-2-氟硫苯甲醯氯、2-氯-6-氟硫苯甲醯氯、2-氯-3-氟硫苯甲醯氯、2-氯-4-氟硫苯甲醯氯、2-氯-5-氟硫苯甲醯氯、3-氯-4-氟硫苯甲醯氯、3-氯-5-氟硫苯甲醯氯、3-溴-2-氟硫苯甲醯氯、4-溴-2-氟硫苯甲醯氯、5-溴-2-氟硫苯甲醯氯、2-溴-6-氟硫苯甲醯氯、2-溴-3-氟硫苯甲醯氯、2-溴-4-氟硫苯甲醯氯、2-溴-5-氟硫苯甲醯氯、3-溴-4-氟硫苯甲醯氯、3-溴-5-氟硫苯甲醯氯、2-氟-5-碘硫苯甲醯氯、2-氟-6-碘硫苯甲醯氯、2-氟-3-(三氟甲基)硫苯甲醯氯、2-氟-5-(三氟甲基)硫苯甲醯氯、2-氟-6-(三氟甲基)硫苯甲醯氯、3-氟-4-(三氟甲基)硫苯甲醯氯、3-氟-5-(三氟
甲基)硫苯甲醯氯、3-氟-6-(三氟甲基)硫苯甲醯氯、4-氟-2-(三氟甲基)硫苯甲醯氯、4-氟-3-(三氟甲基)硫苯甲醯氯、2-氟-4-硝基硫苯甲醯氯、2-氟-5-硝基硫苯甲醯氯、3-氟-2-硝基硫苯甲醯氯、3-氟-4-硝基硫苯甲醯氯、3-氟-6-硝基硫苯甲醯氯、4-氟-2-硝基硫苯甲醯氯、4-氟-3-硝基硫苯甲醯氯、4-氰基-2-氟硫苯甲醯氯、3-氰基-5-氟硫苯甲醯氯、2,3,4-三氟硫苯甲醯氯、2,3,5-三氟硫苯甲醯氯、2,3,6-三氟硫苯甲醯氯、2,4,5-三氟硫苯甲醯氯、2,4,6-三氟硫苯甲醯氯、3,4,5-三氟硫苯甲醯氯、4-氯-2,4-二氟硫苯甲醯氯、2,4-二氯-5-氟-4-硝基硫苯甲醯氯、2,4,5-三氟-3-甲基-6-硝基硫苯甲醯氯、2,3,4,5-四氟硫苯甲醯氯、2,3,5,6-四氟硫苯甲醯氯、2,3,5,6-四氟-4-甲基-硫苯甲醯氯、2,3,4,5-四氟-6-硝基硫苯甲醯氯、2,3,4,5,6-五氟硫苯甲醯氯、2-(三氟甲基)硫苯甲醯氯、3-(三氟甲基)硫苯甲醯氯、4-(三氟甲基)硫苯甲醯氯、3-三氟甲基-4-乙氧基硫苯甲醯氯、3,5-雙(三氟甲基)硫苯甲醯氯、2,4,6-參(三氟甲基)硫苯甲醯氯、4-(五氟乙基)硫苯甲醯氯、4-(3-四氟丙基)硫苯甲醯氯、2,3,5,6-四氟-4-(三氟甲基)硫苯甲醯氯、2,3,5,6-四氟-4-(三氟乙烯基)硫苯甲醯氯、2,3,5,6-四氟-4-(五氟烯丙基)硫苯甲醯氯等,但不限定於此等。
式(19)表示之化合物當中,Z為以式(4)表示者,可列舉2-氟苯基胺甲醯氯、3-氟苯基胺甲醯氯、4-氟苯基胺甲醯氯、2-氟-4-甲基苯基胺甲醯氯、2-氟-5-甲基苯基胺甲醯氯、3-氟-4-甲基苯基胺甲醯氯、3-氟-6-甲基
苯基胺甲醯氯、4-氟-2-甲基苯基胺甲醯氯、4-氟-3-甲基苯基胺甲醯氯、2,3-二氟苯基胺甲醯氯、2,4-二氟苯基胺甲醯氯、2,5-二氟苯基胺甲醯氯、2,6-二氟苯基胺甲醯氯、3,4-二氟苯基胺甲醯氯、3,5-二氟苯基胺甲醯氯、3-氯-2-氟苯基胺甲醯氯、4-氯-2-氟苯基胺甲醯氯、5-氯-2-氟苯基胺甲醯氯、2-氯-6-氟苯基胺甲醯氯、2-氯-3-氟苯基胺甲醯氯、2-氯-4-氟苯基胺甲醯氯、2-氯-5-氟苯基胺甲醯氯、3-氯-4-氟苯基胺甲醯氯、3-氯-5-氟苯基胺甲醯氯、3-溴-2-氟苯基胺甲醯氯、4-溴-2-氟苯基胺甲醯氯、5-溴-2-氟苯基胺甲醯氯、2-溴-6-氟苯基胺甲醯氯、2-溴-3-氟苯基胺甲醯氯、2-溴-4-氟苯基胺甲醯氯、2-溴-5-氟苯基胺甲醯氯、3-溴-4-氟苯基胺甲醯氯、3-溴-5-氟苯基胺甲醯氯、2-氟-5-碘苯基胺甲醯氯、2-氟-6-碘苯基胺甲醯氯、2-氟-3-(三氟甲基)苯基胺甲醯氯、2-氟-5-(三氟甲基)苯基胺甲醯氯、2-氟-6-(三氟甲基)苯基胺甲醯氯、3-氟-4-(三氟甲基)苯基胺甲醯氯、3-氟-5-(三氟甲基)苯基胺甲醯氯、3-氟-6-(三氟甲基)苯基胺甲醯氯、4-氟-2-(三氟甲基)苯基胺甲醯氯、4-氟-3-(三氟甲基)苯基胺甲醯氯、2-氟-4-硝基苯基胺甲醯氯、2-氟-5-硝基苯基胺甲醯氯、3-氟-2-硝基苯基胺甲醯氯、3-氟-4-硝基苯基胺甲醯氯、3-氟-6-硝基苯基胺甲醯氯、4-氟-2-硝基苯基胺甲醯氯、4-氟-3-硝基苯基胺甲醯氯、4-氰基-2-氟苯基胺甲醯氯、3-氰基-5-氟苯基胺甲醯氯、2,3,4-三氟苯基胺甲醯氯、2,3,5-三氟苯基胺甲醯氯、2,3,6-三氟苯基胺甲醯氯、2,4,5-三氟苯基
胺甲醯氯、2,4,6-三氟苯基胺甲醯氯、3,4,5-三氟苯基胺甲醯氯、4-氯-2,4-二氟苯基胺甲醯氯、2,4-二氯-5-氟-4-硝基苯基胺甲醯氯、2,4,5-三氟-3-甲基-6-硝基苯基胺甲醯氯、2,3,4,5-四氟苯基胺甲醯氯、2,3,5,6-四氟苯基胺甲醯氯、2,3,5,6-四氟-4-甲基-苯基胺甲醯氯、2,3,4,5-四氟-6-硝基苯基胺甲醯氯、2,3,4,5,6-五氟苯基胺甲醯氯、2-(三氟甲基)苯基胺甲醯氯、3-(三氟甲基)苯基胺甲醯氯、4-(三氟甲基)苯基胺甲醯氯、3-三氟甲基-4-乙氧基苯基胺甲醯氯、3,5-雙(三氟甲基)苯基胺甲醯氯、2,4,6-參(三氟甲基)苯基胺甲醯氯、4-(五氟乙基)苯基胺甲醯氯、4-(3-四氟丙基)苯基胺甲醯氯、2,3,5,6-四氟-4-(三氟甲基)苯基胺甲醯氯、2,3,5,6-四氟-4-(三氟乙烯基)苯基胺甲醯氯、2,3,5,6-四氟-4-(五氟烯丙基)苯基胺甲醯氯等,但不限定於此等。
式(19)表示之化合物當中,Z為以式(5)表示者,可列舉2-氟苯基硫胺甲醯氯、3-氟苯基硫胺甲醯氯、4-氟苯基硫胺甲醯氯、2-氟-4-甲基苯基硫胺甲醯氯、2-氟-5-甲基苯基硫胺甲醯氯、3-氟-4-甲基苯基硫胺甲醯氯、3-氟-6-甲基苯基硫胺甲醯氯、4-氟-2-甲基苯基硫胺甲醯氯、4-氟-3-甲基苯基硫胺甲醯氯、2,3-二氟苯基硫胺甲醯氯、2,4-二氟苯基硫胺甲醯氯、2,5-二氟苯基硫胺甲醯氯、2,6-二氟苯基硫胺甲醯氯、3,4-二氟苯基硫胺甲醯氯、3,5-二氟苯基硫胺甲醯氯、3-氯-2-氟苯基硫胺甲醯氯、4-氯-2-氟苯基硫胺甲醯氯、5-氯-2-氟苯基硫胺甲醯氯、2-氯-6-氟苯基硫胺甲醯氯、2-氯-3-氟苯基硫胺甲醯
氯、2-氯-4-氟苯基硫胺甲醯氯、2-氯-5-氟苯基硫胺甲醯氯、3-氯-4-氟苯基硫胺甲醯氯、3-氯-5-氟苯基硫胺甲醯氯、3-溴-2-氟苯基硫胺甲醯氯、4-溴-2-氟苯基硫胺甲醯氯、5-溴-2-氟苯基硫胺甲醯氯、2-溴-6-氟苯基硫胺甲醯氯、2-溴-3-氟苯基硫胺甲醯氯、2-溴-4-氟苯基硫胺甲醯氯、2-溴-5-氟苯基硫胺甲醯氯、3-溴-4-氟苯基硫胺甲醯氯、3-溴-5-氟苯基硫胺甲醯氯、2-氟-5-碘苯基硫胺甲醯氯、2-氟-6-碘苯基硫胺甲醯氯、2-氟-3-(三氟甲基)苯基硫胺甲醯氯、2-氟-5-(三氟甲基)苯基硫胺甲醯氯、2-氟-6-(三氟甲基)苯基硫胺甲醯氯、3-氟-4-(三氟甲基)苯基硫胺甲醯氯、3-氟-5-(三氟甲基)苯基硫胺甲醯氯、3-氟-6-(三氟甲基)苯基硫胺甲醯氯、4-氟-2-(三氟甲基)苯基硫胺甲醯氯、4-氟-3-(三氟甲基)苯基硫胺甲醯氯、2-氟-4-硝基苯基硫胺甲醯氯、2-氟-5-硝基苯基硫胺甲醯氯、3-氟-2-硝基苯基硫胺甲醯氯、3-氟-4-硝基苯基硫胺甲醯氯、3-氟-6-硝基苯基硫胺甲醯氯、4-氟-2-硝基苯基硫胺甲醯氯、4-氟-3-硝基苯基硫胺甲醯氯、4-氰基-2-氟苯基硫胺甲醯氯、3-氰基-5-氟苯基硫胺甲醯氯、2,3,4-三氟苯基硫胺甲醯氯、2,3,5-三氟苯基硫胺甲醯氯、2,3,6-三氟苯基硫胺甲醯氯、2,4,5-三氟苯基硫胺甲醯氯、2,4,6-三氟苯基硫胺甲醯氯、3,4,5-三氟苯基硫胺甲醯氯、4-氯-2,4-二氟苯基硫胺甲醯氯、2,4-二氯-5-氟-4-硝基苯基硫胺甲醯氯、2,4,5-三氟-3-甲基-6-硝基苯基硫胺甲醯氯、2,3,4,5-四氟苯基硫胺甲醯氯、2,3,5,6-四氟苯基硫胺甲醯氯、2,3,5,6-四氟-4-
甲基-苯基硫胺甲醯氯、2,3,4,5-四氟-6-硝基苯基硫胺甲醯氯、2,3,4,5,6-五氟苯基硫胺甲醯氯、2-(三氟甲基)苯基硫胺甲醯氯、3-(三氟甲基)苯基硫胺甲醯氯、4-(三氟甲基)苯基硫胺甲醯氯、3-三氟甲基-4-乙氧基苯基硫胺甲醯氯、3,5-雙(三氟甲基)苯基硫胺甲醯氯、2,4,6-參(三氟甲基)苯基硫胺甲醯氯、4-(五氟乙基)苯基硫胺甲醯氯、4-(3-四氟丙基)苯基硫胺甲醯氯、2,3,5,6-四氟-4-(三氟甲基)苯基硫胺甲醯氯、2,3,5,6-四氟-4-(三氟乙烯基)苯基硫胺甲醯氯、2,3,5,6-四氟-4-(五氟烯丙基)苯基硫胺甲醯氯等,但不限定於此等。
式(19)表示之化合物當中,Z為以式(6)表示者,可列舉2-氟苄基氯、3-氟苄基氯、4-氟苄基氯、2-氟-4-甲基苄基氯、2-氟-5-甲基苄基氯、3-氟-4-甲基苄基氯、3-氟-6-甲基苄基氯、4-氟-2-甲基苄基氯、4-氟-3-甲基苄基氯、2,3-二氟苄基氯、2,4-二氟苄基氯、2,5-二氟苄基氯、2,6-二氟苄基氯、3,4-二氟苄基氯、3,5-二氟苄基氯、3-氯-2-氟苄基氯、4-氯-2-氟苄基氯、5-氯-2-氟苄基氯、2-氯-6-氟苄基氯、2-氯-3-氟苄基氯、2-氯-4-氟苄基氯、2-氯-5-氟苄基氯、3-氯-4-氟苄基氯、3-氯-5-氟苄基氯、3-溴-2-氟苄基氯、4-溴-2-氟苄基氯、5-溴-2-氟苄基氯、2-溴-6-氟苄基氯、2-溴-3-氟苄基氯、2-溴-4-氟苄基氯、2-溴-5-氟苄基氯、3-溴-4-氟苄基氯、3-溴-5-氟苄基氯、2-氟-5-碘苄基氯、2-氟-6-碘苄基氯、2-氟-3-(三氟甲基)苄基氯、2-氟-5-(三氟甲基)苄基氯、2-氟-6-(三氟甲基)苄基
氯、3-氟-4-(三氟甲基)苄基氯、3-氟-5-(三氟甲基)苄基氯、3-氟-6-(三氟甲基)苄基氯、4-氟-2-(三氟甲基)苄基氯、4-氟-3-(三氟甲基)苄基氯、2-氟-4-硝基苄基氯、2-氟-5-硝基苄基氯、3-氟-2-硝基苄基氯、3-氟-4-硝基苄基氯、3-氟-6-硝基苄基氯、4-氟-2-硝基苄基氯、4-氟-3-硝基苄基氯、4-氰基-2-氟苄基氯、3-氰基-5-氟苄基氯、2,3,4-三氟苄基氯、2,3,5-三氟苄基氯、2,3,6-三氟苄基氯、2,4,5-三氟苄基氯、2,4,6-三氟苄基氯、3,4,5-三氟苄基氯、4-氯-2,4-二氟苄基氯、2,4-二氯-5-氟-4-硝基苄基氯、2,4,5-三氟-3-甲基-6-硝基苄基氯、2,3,4,5-四氟苄基氯、2,3,5,6-四氟苄基氯、2,3,5,6-四氟-4-甲基-苄基氯、2,3,4,5-四氟-6-硝基苄基氯、2,3,4,5,6-五氟苄基氯、2-(三氟甲基)苄基氯、3-(三氟甲基)苄基氯、4-(三氟甲基)苄基氯、3-三氟甲基-4-乙氧基苄基氯、3,5-雙(三氟甲基)苄基氯、2,4,6-參(三氟甲基)苄基氯、4-(五氟乙基)苄基氯、4-(3-四氟丙基)苄基氯、2,3,5,6-四氟-4-(三氟甲基)苄基氯、2,3,5,6-四氟-4-(三氟乙烯基)苄基氯、2,3,5,6-四氟-4-(五氟烯丙基)苄基氯等,但不限定於此等。
式(19)表示之化合物當中,Z為以式(7)表示者,可列舉2-氟苯磺醯氯、3-氟苯磺醯氯、4-氟苯磺醯氯、2-氟-4-甲基苯磺醯氯、2-氟-5-甲基苯磺醯氯、3-氟-4-甲基苯磺醯氯、3-氟-6-甲基苯磺醯氯、4-氟-2-甲基苯磺醯氯、4-氟-3-甲基苯磺醯氯、2,3-二氟苯磺醯氯、2,4-二氟苯磺醯氯、2,5-二氟苯磺醯氯、2,6-二氟苯磺醯氯、3,4-
二氟苯磺醯氯、3,5-二氟苯磺醯氯、3-氯-2-氟苯磺醯氯、4-氯-2-氟苯磺醯氯、5-氯-2-氟苯磺醯氯、2-氯-6-氟苯磺醯氯、2-氯-3-氟苯磺醯氯、2-氯-4-氟苯磺醯氯、2-氯-5-氟苯磺醯氯、3-氯-4-氟苯磺醯氯、3-氯-5-氟苯磺醯氯、3-溴-2-氟苯磺醯氯、4-溴-2-氟苯磺醯氯、5-溴-2-氟苯磺醯氯、2-溴-6-氟苯磺醯氯、2-溴-3-氟苯磺醯氯、2-溴-4-氟苯磺醯氯、2-溴-5-氟苯磺醯氯、3-溴-4-氟苯磺醯氯、3-溴-5-氟苯磺醯氯、2-氟-5-碘苯磺醯氯、2-氟-6-碘苯磺醯氯、2-氟-3-(三氟甲基)苯磺醯氯、2-氟-5-(三氟甲基)苯磺醯氯、2-氟-6-(三氟甲基)苯磺醯氯、3-氟-4-(三氟甲基)苯磺醯氯、3-氟-5-(三氟甲基)苯磺醯氯、3-氟-6-(三氟甲基)苯磺醯氯、4-氟-2-(三氟甲基)苯磺醯氯、4-氟-3-(三氟甲基)苯磺醯氯、2-氟-4-硝基苯磺醯氯、2-氟-5-硝基苯磺醯氯、3-氟-2-硝基苯磺醯氯、3-氟-4-硝基苯磺醯氯、3-氟-6-硝基苯磺醯氯、4-氟-2-硝基苯磺醯氯、4-氟-3-硝基苯磺醯氯、4-氰基-2-氟苯磺醯氯、3-氰基-5-氟苯磺醯氯、2,3,4-三氟苯磺醯氯、2,3,5-三氟苯磺醯氯、2,3,6-三氟苯磺醯氯、2,4,5-三氟苯磺醯氯、2,4,6-三氟苯磺醯氯、3,4,5-三氟苯磺醯氯、4-氯-2,4-二氟苯磺醯氯、2,4-二氯-5-氟-4-硝基苯磺醯氯、2,4,5-三氟-3-甲基-6-硝基苯磺醯氯、2,3,4,5-四氟苯磺醯氯、2,3,5,6-四氟苯磺醯氯、2,3,5,6-四氟-4-甲基-苯磺醯氯、2,3,4,5-四氟-6-硝基苯磺醯氯、2,3,4,5,6-五氟苯磺醯氯、2-(三氟甲基)苯磺醯氯、3-(三氟甲基)苯磺醯氯、4-(三氟甲基)苯磺醯氯、3-三氟甲
基-4-乙氧基苯磺醯氯、3,5-雙(三氟甲基)苯磺醯氯、2,4,6-參(三氟甲基)苯磺醯氯、4-(五氟乙基)苯磺醯氯、4-(3-四氟丙基)苯磺醯氯、2,3,5,6-四氟-4-(三氟甲基)苯磺醯氯、2,3,5,6-四氟-4-(三氟乙烯基)苯磺醯氯、2,3,5,6-四氟-4-(五氟烯丙基)苯磺醯氯等,但不限定於此等。
第3步驟中,亦可使用鹼。前述鹼可列舉與第1步驟中可使用的為相同者。此等之中,特別由操作容易而言,較適宜為三乙基胺、吡啶、二異丙基乙基胺等。
反應溶劑較佳為非質子性有機溶劑,可列舉例如N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯啶酮、1,3-二甲基-2-四氫咪唑酮、二甲基亞碸、四氫呋喃、二噁烷等。由反應後之反應溶劑的去除容易性之觀點而言,較適宜為N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、四氫呋喃、二噁烷、甲苯、二甲苯、均三甲苯等。
式(18)表示之中間體、與式(19)表示之化合物的饋入比,相對於式(18)表示之中間體而言,式(19)表示之化合物較佳為2~6當量、更佳為2~3當量。
第3步驟中,反應溫度係考慮所用之原料化合物或觸媒之種類或量,並且於由溶劑之熔點至沸點的範圍中適當設定,但通常為0~200℃左右、較佳為0~50℃。又,反應時間雖依所用之原料化合物或反應溫度等而異,故不能一概規定,但通常為1~24小時左右。
反應結束後,可遵照一般方法進行後處理,得到目標的含有氟原子之化合物。
再者,式(19)表示之化合物,可藉由公知之方法或獲得市售品而得到。
本發明之含有氟原子之化合物,可適合作為電荷傳輸性物質、特別是作為電洞傳輸性物質使用。本發明中,電荷傳輸性,係與導電性相同意義。電荷傳輸性物質,係指其本身具有電荷傳輸性者。又,電荷傳輸性塗漆,可為其本身具有電荷傳輸性者、亦可為藉由其所得到之固體膜具有電荷傳輸性者。
本發明之電荷傳輸性塗漆,為含有由前述含有氟原子之化合物所構成之電荷傳輸性物質、及有機溶劑者。
配製本發明之電荷傳輸性塗漆時所用的有機溶劑,可使用可良好地溶解前述含有氟原子之化合物的高溶解性溶劑。
如此之高溶解性溶劑,可列舉例如N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N,N-二甲基異丁基醯胺、N-甲基吡咯啶酮、1,3-二甲基-2-四氫咪唑酮等之醯胺系溶劑;氯仿、氯苯等之氯系溶劑;甲苯、二甲苯、四氫萘、環己基苯、3-苯氧基甲苯等之芳香族烴系溶劑;異佛酮、
環己酮等之酮系溶劑;乙酸乙酯、安息香酸甲酯等之酯系溶劑;乙二醇、二乙二醇等之多元醇系溶劑;四氫呋喃、二噁烷、苯甲醚、二乙二醇單甲基醚等之醚系溶劑;異丙醇、環己醇、苄醇等之醇系溶劑;二甲基亞碸等之亞碸系溶劑。此等溶劑可1種單獨或混合2種以上使用,其之使用量,可為使用於塗漆的全部溶劑中之5~100質量%。
再者,電荷傳輸性物質,較佳均完全溶解於前述溶劑、或成為均勻分散的狀態;更佳為完全溶解。
又,本發明中,於塗漆中可含有至少1種於25℃具有10~200mPa.s、特別是35~150mPa.s的黏度,且於常壓(大氣壓)下沸點50~300℃、特別是150~250℃的高黏度有機溶劑。藉由添加如此之溶劑,塗漆之黏度調整成為容易,再現性良好地賦予平坦性高的薄膜、可對應所使用之塗佈方法配製塗漆。
高黏度有機溶劑,可列舉例如環己醇、乙二醇、乙二醇二縮水甘油醚、1,3-辛二醇、二乙二醇、二丙二醇、三乙二醇、三丙二醇、1,3-丁二醇、2,3-丁二醇、1,4-丁二醇、丙二醇、己二醇等,但不限定於此等。高黏度有機溶劑亦可兼為高溶解性溶劑,此等係依主體之種類而決定。
本發明之塗漆所使用之全部溶劑中的高黏度有機溶劑之添加比例,較佳為固體不會析出的範圍內,只要固體不析出,添加比例較佳為5~90質量%。
進一步地,亦能夠以提高對基板之濕潤性、
調整溶劑之表面張力、調整極性、調整沸點等為目的,以使用於塗漆的全部溶劑中之1~90質量%、較佳為1~50質量%之比例混合其他溶劑。
如此之溶劑可列舉例如丙二醇單甲基醚、乙二醇單丁基醚、二乙二醇二乙基醚、二乙二醇單甲基醚、二乙二醇二甲基醚、二乙二醇單乙基醚乙酸酯、二乙二醇單丁基醚乙酸酯、二丙二醇單甲基醚、丙二醇單甲基醚乙酸酯、二乙二醇單乙基醚、二丙酮醇、γ-丁內酯、乳酸乙酯、乙酸n-己酯等,但不限定於此等。此等溶劑可1種單獨或混合2種以上使用。此等溶劑亦可兼為高溶解性溶劑,此等係依主體之種類而決定。
本發明中,由再現性良好地得到平坦性更高之薄膜的觀點而言,電荷傳輸性塗漆,較期望為將電荷傳輸性物質溶解於有機溶劑後,使用次微米等級之過濾器等過濾。
本發明之塗漆中之固體成分濃度,由抑制電荷傳輸性物質之析出的同時,確保充分的膜厚之觀點而言,通常為0.1~20質量%左右、較佳為0.5~10質量%。再者,此處所稱之固體成分,意指由塗漆中所含之成分中去除溶劑所殘留的成分。本發明之塗漆之黏度,通常於25℃為1~50mPa.s。
本發明之電荷傳輸性塗漆,亦可進一步含有不含有氟
原子之電荷傳輸性物質。如此之不含有氟原子之電荷傳輸性物質,可列舉苯胺衍生物、噻吩衍生物、吡咯衍生物等之電荷傳輸性寡聚物。前述不含有氟原子之電荷傳輸性寡聚物之分子量,通常為200~8,000,但由配製賦予電荷傳輸性高之薄膜的塗漆之觀點而言,較佳為300以上、更佳為400以上、又更較佳為500以上,由配製賦予平坦性高之薄膜的均勻之塗漆的觀點而言,較佳為6,000以下、更佳為5,000以下、又更佳為4,000以下、又再更佳為3,000以下。
前述不含有氟原子之電荷傳輸性寡聚物當中,考慮到對有機溶劑之溶解性與所得薄膜之電荷傳輸性的平衡時,較佳為苯胺衍生物。苯胺衍生物,可列舉日本特開2002-151272號公報記載之寡苯胺衍生物、國際公開第2004/105446號記載之寡苯胺化合物、國際公開第2008/032617號記載之寡苯胺化合物、國際公開第2008/032616號記載之寡苯胺化合物、國際公開第2013/042623號記載之芳基二胺化合物等。
又,亦可適合使用下述式(20)表示之苯胺衍生物。
式(20)中,X1表示-NY1-、-O-、-S-、-(CR107R108)L-
或單鍵,但k1或k2為0時,係表示-NY1-。
Y1係分別獨立地表示氫原子;可經Z11取代之碳數1~20之烷基、碳數2~20之烯基或碳數2~20之炔基;或可經Z12取代之碳數6~20之芳基或碳數2~20之雜芳基。
碳數1~20之烷基及碳數6~20之芳基之具體例,可列舉與前述為相同者。
碳數2~20之烯基,係直鏈狀、分支狀、環狀的任意者均可,其具體例子可列舉乙烯基、n-1-丙烯基、n-2-丙烯基、1-甲基乙烯基、n-1-丁烯基、n-2-丁烯基、n-3-丁烯基、2-甲基-1-丙烯基、2-甲基-2-丙烯基、1-乙基乙烯基、1-甲基-1-丙烯基、1-甲基-2-丙烯基、n-1-戊烯基、n-1-癸烯基、n-1-二十烯基等。
碳數2~20之炔基,係直鏈狀、分支狀、環狀的任意者均可,其具體例子可列舉乙炔基、n-1-丙炔基、n-2-丙炔基、n-1-丁炔基、n-2-丁炔基、n-3-丁炔基、1-甲基-2-丙炔基、n-1-戊炔基、n-2-戊炔基、n-3-戊炔基、n-4-戊炔基、1-甲基-n-丁炔基、2-甲基-n-丁炔基、3-甲基-n-丁炔基、1,1-二甲基-n-丙炔基、n-1-己炔基、n-1-癸炔基、n-1-十五炔基、n-1-二十炔基等。
碳數2~20之雜芳基之具體例子,可列舉2-噻吩基、3-噻吩基、2-呋喃基、3-呋喃基、2-噁唑基、4-噁唑基、5-噁唑基、3-異噁唑基、4-異噁唑基、5-異噁唑基、2-噻唑基、4-噻唑基、5-噻唑基、3-異噻唑基、4-異
噻唑基、5-異噻唑基、2-咪唑基、4-咪唑基、2-吡啶基、3-吡啶基、4-吡啶基等。
R107及R108,係分別獨立地表示氫原子、氯原子、溴原子、碘原子、硝基、氰基、胺基、醛基、羥基、硫醇基、磺酸基、羧基;可經Z11取代之碳數1~20之烷基、碳數2~20之烯基或碳數2~20之炔基;可經Z12取代之碳數6~20之芳基或碳數2~20之雜芳基;或-NHY2、-NY3Y4、-C(O)Y5、-OY6、-SY7、-SO3Y8、-C(O)OY9、-OC(O)Y10、-C(O)NHY11或-C(O)NY12Y13基。
Y2~Y13,係分別獨立地表示可經Z11取代之碳數1~20之烷基、碳數2~20之烯基或碳數2~20之炔基;或可經Z12取代之碳數6~20之芳基或碳數2~20之雜芳基。
Z11表示氯原子、溴原子、碘原子、硝基、氰基、胺基、醛基、羥基、硫醇基、磺酸基、羧基;或可經Z13取代之碳數6~20之芳基或碳數2~20之雜芳基。
Z12表示氯原子、溴原子、碘原子、硝基、氰基、胺基、醛基、羥基、硫醇基、磺酸基、羧基;或可經Z13取代之碳數1~20之烷基、碳數2~20之烯基或碳數2~20之炔基。
Z13表示氯原子、溴原子、碘原子、硝基、氰基、胺基、醛基、羥基、硫醇基、磺酸基、或羧基。
R107、R108及Y2~Y13之烷基、烯基、炔基、芳基及雜芳基,可列舉與前述相同者。
此等之中,作為R107及R108,尤以氫原子或可經Z11取代之碳數1~20之烷基為佳;更佳為氫原子或可經Z11取代之甲基;最佳係均為氫原子。
L表示-(CR107R108)-所表示之2價基的數目,且係1~20之整數,較佳為1~10、更佳為1~5、又更佳為1或2、最佳為1。再者,L為2以上時,複數個R107,可互為相同亦可相異,複數個R108亦可互為相同亦可相異。
特別地,作為X1,較佳為-NY1-或單鍵。又,作為Y1,較佳為氫原子或可經Z11取代之碳數1~20之烷基;更佳為氫原子或可經Z11取代之甲基;最佳為氫原子。
式(20)中,R101~R106,係分別獨立地表示氫原子、氯原子、溴原子、碘原子、硝基、氰基、胺基、醛基、羥基、硫醇基、磺酸基、羧基;可經Z11取代之碳數1~20之烷基、碳數2~20之烯基或碳數2~20之炔基;可經Z12取代之碳數6~20之芳基或碳數2~20之雜芳基;或-NHY2、-NY3Y4、-C(O)Y5、-OY6、-SY7、-SO3Y8、-C(O)OY9、-OC(O)Y10、-C(O)NHY11或-C(O)NY12Y13(Y2~Y13係表示與前述相同意義)。此等烷基、烯基、炔基、芳基及雜芳基,可列舉與前述相同者。
特別地,式(20)中,作為R101~R104,較佳為氫原子、鹵素原子、可經Z11取代之碳數1~10之烷基、或可經Z12取代之碳數6~14之芳基;更佳為氫原子、或
碳數1~10之烷基;最佳係全部為氫原子。
又,作為R105及R106,較佳為氫原子、氯原子、溴原子、碘原子、可經Z11取代之碳數1~10之烷基、可經Z12取代之碳數6~14之芳基、或可經Z12取代之二苯基胺基(Y3及Y4為可經Z12取代之苯基的-NY3Y4基);更佳為氫原子、或二苯基胺基;又更佳為同時為氫原子或二苯基胺基。
此等之中,尤以R101~R104為氫原子或碳數1~10之烷基、R105及R106為氫原子或二苯基胺基、X1為-NY1-或單鍵且Y1為氫原子或甲基的組合為佳;更佳係R101~R104為氫原子、R105及R106同時為氫原子或二苯基胺基、X1為-NH-或單鍵的組合。
式(20)中,k1及k2,係分別獨立地表示0以上之整數,且滿足1≦k1+k2≦20,但考慮到所得薄膜之電荷傳輸性與苯胺衍生物之溶解性的平衡時,較佳滿足2≦k1+k2≦8、更佳滿足2≦k1+k2≦6、又更佳滿足2≦k1+k2≦4。
Y1~Y13及R101~R108中,Z11較佳為氯原子、溴原子、碘原子、或可經Z13取代之碳數6~20之芳基;更佳為氯原子、溴原子、碘原子、或可經Z13取代之苯基;最佳為不存在(亦即非取代)。
Z12較佳為氯原子、溴原子、碘原子、或可經Z13取代之碳數1~20之烷基;更佳為氯原子、溴原子、碘原子、或可經Z13取代之碳數1~4之烷基;最佳為不
存在(亦即非取代)。
Z13較佳為氯原子、溴原子或碘原子;最佳為不存在(亦即非取代)。
Y1~Y13及R101~R108中,烷基、烯基及炔基之碳數較佳為10以下、更佳為6以下、又更佳為4以下。又,芳基及雜芳基之碳數較佳為14以下、更佳為10以下、又更佳為6以下。
再者,前述苯胺衍生物之合成法並無特殊限定,可列舉Bulletin of Chemical Society of Japan,67,pp.1749-1752(1994)、Synthetic Metals,84,pp.119-120(1997)、Thin Solid Films,520(24),pp.7157-7163(2012)、國際公開第2008/032617號、國際公開第2008/032616號、國際公開第2008/129947號、國際公開第2013/084664號等記載之方法。
式(20)表示之苯胺衍生物之具體例子,可列舉下述式表示者,但不限定於此等。再者,下述式中,DPA表示二苯基胺基、Ph表示苯基、TPA表示p-(二苯基胺基)苯基。
本發明之電荷傳輸性塗漆,亦可依所得薄膜之用途,以提高其電荷傳輸能力等為目的,而含有摻雜劑。摻雜劑只要為會溶解於塗漆所使用之至少1種溶劑者則無特殊限定,無機系摻雜劑、有機系摻雜劑均可使用。無機系及有機系之摻雜劑,可1種單獨使用、亦可組合2種以上使用。
本發明之電荷傳輸性塗漆含有摻雜劑時,其含量,相對於電荷傳輸性物質而言,以莫耳比計,較佳為0.01~20.0左右、更佳為0.4~5.0左右。
無機系摻雜劑可列舉氯化氫、硫酸、硝酸、磷酸等之無機酸;氯化鋁(III)(AlCl3)、四氯化鈦(IV)(TiCl4)、三溴化硼(BBr3)、三氟化硼醚錯合物(BF3.OEt2)、氯化鐵(III)(FeCl3)、氯化銅(II)(CuCl2)、五氯化銻(V)(SbCl5)、五氟化銻(V)(SbF5)、五氟化砷(V)(AsF5)、五氟化磷(PF5)、參(4-溴苯基)鋁六氯銻酸鹽(TBPAH)等之金屬鹵化物;Cl2、Br2、I2、ICl、ICl3、IBr、IF4等之鹵素;磷鉬酸、磷鎢酸等之雜多酸等。此等之中,較佳為磷
鉬酸、磷鎢酸等之雜多酸。
有機系摻雜劑,可列舉苯磺酸、甲苯磺酸、p-苯乙烯磺酸、2-萘磺酸、4-羥基苯磺酸、5-磺水楊酸、p-十二烷基苯磺酸、二己基苯磺酸、2,5-二己基苯磺酸、二丁基萘磺酸、6,7-二丁基-2-萘磺酸、十二烷基萘磺酸、3-十二烷基-2-萘磺酸、己基萘磺酸、4-己基-1-萘磺酸、辛基萘磺酸、2-辛基-1-萘磺酸、己基萘磺酸、7-己基-1-萘磺酸、6-己基-2-萘磺酸、二壬基萘磺酸、2,7-二壬基-4-萘磺酸、二壬基萘二磺酸、2,7-二壬基-4,5-萘二磺酸、國際公開第2005/000832號記載之1,4-苯并二噁烷二磺酸化合物、國際公開第2006/025342號記載之芳基磺酸化合物、國際公開第2009/096352號記載之芳基磺酸化合物、聚苯乙烯磺酸等之芳基磺酸化合物等。
又,下述式(21)或(22)表示之芳基磺酸化合物,亦可適合使用作為摻雜劑。
式(21)中,A1表示-O-或-S-,較佳為-O-。A2表示萘環或蒽環,較佳為萘環。A3表示2~4價之全氟聯苯基。j1表示A1與A3之鍵結數,且為滿足2≦j1≦4之整數,較佳係A3為2價之全氟聯苯基、且j1為2。j2表示鍵結於A2之磺酸基數,且為滿足1≦j2≦4之整數,較適
宜為2。
式(22)中,A4~A8,係分別獨立地表示氫原子、鹵素原子、氰基、碳數1~20之烷基、碳數1~20之鹵化烷基或碳數2~20之鹵化烯基,但A4~A8當中至少3者為鹵素原子。i表示鍵結於萘環之磺酸基數,且為滿足1≦i≦4之整數,較佳為2~4、更佳為2。
碳數1~20之鹵化烷基,可列舉三氟甲基、2,2,2-三氟乙基、全氟乙基、3,3,3-三氟丙基、2,2,3,3,3-五氟丙基、全氟丙基、4,4,4-三氟丁基、3,3,4,4,4-五氟丁基、2,2,3,3,4,4,4-七氟丁基、全氟丁基等。碳數2~20之鹵化烯基,可列舉全氟乙烯基、1-全氟丙烯基、全氟烯丙基、全氟丁烯基等。
鹵素原子、碳數1~20之烷基之例子可列舉與前述相同者,但作為鹵素原子,較佳為氟原子。
此等之中,A4~A8尤以氫原子、鹵素原子、氰基、碳數1~10之烷基、碳數1~10之鹵化烷基或碳數2~10之鹵化烯基,且A4~A8當中至少3者為氟原子為佳;更佳為氫原子、氟原子、氰基、碳數1~5之烷基、碳數1~5之氟化烷基或碳數2~5之氟化烯基,且A4~A8當中至少3者為氟原子;又更佳為氫原子、氟原子、氰基、碳數1~5之全氟烷基或碳數1~5之全氟烯基,且A4、A5及A8為氟原子。
再者,全氟烷基,係指烷基之全部氫原子被取代為氟原子之基,全氟烯基係指烯基之全部氫原子被取
代為氟原子之基。
進一步地,下述式(23)表示之芳基磺酸化合物亦可適合使用作為摻雜劑。
式(23)表示之芳基磺酸化合物,可藉由使式(26)表示之胺化合物與式(27)表示之酸鹵化物反應而得到式(23’)表示之芳基磺酸鹽,且將該鹽進行離子交換處理而得到。
式(26)表示之胺化合物,可列舉苯胺-2,4-二磺酸二鈉、苯胺-2,5-二磺酸二鈉、8-胺基-萘-1,5-二磺酸二鈉、2-胺基-萘-1,5-二磺酸二鈉、2-胺基-萘-3,6-二磺酸二鈉、7-胺基萘-1,5-二磺酸二鈉、7-胺基萘-2,4-二磺酸二鈉、7-胺基萘-1,3-二磺酸二鈉等,但不限定於此等。再者,式(26)表示之胺化合物,亦可使用水合物。
式(27)表示之酸鹵化物,可列舉苯甲醯氯、苯甲醯溴等。
反應溶劑較佳為非質子性極性有機溶劑,可列舉例如N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯啶酮、1,3-二甲基-2-四氫咪唑酮、二甲基亞碸、四氫呋喃、二噁烷等。由反應後之反應溶劑的去除容易性之觀點而言,較適宜為N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、四氫呋喃、二噁烷等。
反應溫度,通常可為-50℃至所使用之溶劑的沸點,較佳為0~140℃之範圍。反應時間通常為0.1~100小時。
反應結束後,藉由過濾、反應溶劑之餾去等以回收式(23’)表示之芳基磺酸鹽後,例如可藉由陽離子交換樹脂將磺酸鹽質子化,藉以製造式(23)表示之芳基磺酸化合物。
再者,式(27)表示之酸鹵化物,可藉由使安息
香酸與例如亞硫醯氯或草醯氯、磷醯氯、硫醯氯、三氯化磷、五氯化磷等之親電子性的鹵化劑反應而得到。
適合的摻雜劑之具體例子,可列舉磷鉬酸、磷鎢酸及以下所示者,但不限定於此等。
一併含有前述含有氟原子之化合物、不含有氟原子之電荷傳輸性物質、及摻雜劑的塗漆所用之高溶解性溶劑,可列舉例如環己酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N,N-二甲基異丁基醯胺、N-甲基吡咯啶酮、1,3-二甲基-2-四氫咪唑酮等之有機溶劑,但不限定於此等。又,與僅由含有氟原子之化合物所成的電荷傳輸性塗漆同樣地,作為塗漆之調整,可含有前述高黏度有機溶劑或其他溶劑,其溶劑種類亦與前述相同。
電荷傳輸性塗漆之配製方法並無特殊限定,可列舉例如將本發明之含有氟原子之化合物、不含有氟原
子之電荷傳輸性物質、摻雜劑等溶解於高溶解性溶劑,對其添加高黏度有機溶劑之方法;或混合高溶解性溶劑與高黏度有機溶劑,對其溶解本發明之含有氟原子之化合物、不含有氟原子之電荷傳輸性物質、摻雜劑等之方法。
藉由將本發明之電荷傳輸性塗漆塗佈於基材上並乾燥,可於基材上形成電荷傳輸性薄膜。
塗漆之塗佈方法,可列舉浸漬法、旋轉塗佈法、轉印印刷法、輥塗佈法、刷毛塗佈、噴墨法、噴霧法、狹縫塗佈法等,但不限定於此等。較佳為依塗佈方法,來調節塗漆之黏度及表面張力。
又,使用本發明之塗漆時,液膜之乾燥條件亦無特殊限定,例如有使用加熱板之加熱燒成。通常藉由於100~260℃左右之範圍內加熱燒成1分鐘~1小時左右,得到乾燥膜。再者,燒成環境亦無特殊限定。
電荷傳輸性薄膜之膜厚並無特殊限定,作為有機EL元件之功能層使用時,較佳為5~200nm。使膜厚變化之方法,係有使塗漆中之固體成分濃度變化、或使塗佈時基板上之溶液量變化等之方法。
使用本發明之電荷傳輸性薄膜的有機EL元件,係指具有一對電極,於此等電極之間具有作為發光層之有機
層,且於陽極與發光層之間具有本發明之電荷傳輸性薄膜者。有機EL元件之元件構造之一例,可列舉陽極/電洞注入層/電洞傳輸層/電子阻擋層/發光層/電洞阻擋層/電子傳輸層/電子注入層/陰極,但不限定於此。
本發明之電荷傳輸性薄膜,於有機EL元件中,可適合使用作為電洞注入層、電洞傳輸層、電洞注入傳輸層,可更適合使用作為電洞傳輸層。再者,「電洞注入層」、「電洞傳輸層」及「電洞注入傳輸層」,係指於發光層與陽極之間所形成之層,其係具有將電洞由陽極傳輸至發光層之功能者。於發光層與陽極之間僅設置1層電洞傳輸性材料之層時,其係「電洞注入傳輸層」,於發光層與陽極之間設置2層以上之電洞傳輸性材料之層時,較接近陽極之層為「電洞注入層」,其以外之層為「電洞傳輸層」。特別是電洞注入層及電洞注入傳輸層,係使用不僅自陽極之電洞接受性,且分別對電洞傳輸層及發光層之電洞注入性亦優良的薄膜。
使用本發明之電荷傳輸性塗漆來製作有機EL元件時的使用材料,並無特殊限定,可由以往公知之各種材料中適當選擇來使用。又,關於有機EL元件之製法亦無特殊限定。
以下,列舉合成例、實施例及比較例以更具體說明本發明,但本發明不受下述實施例限定。再者,所
使用之裝置係如以下所述。
(1)1H-NMR測定:Varian公司製、NMR system 400NB、BRUKER公司製、Ascend 500
(2)基板洗淨:長州產業(股)製、基板洗淨裝置(減壓電漿方式)
(3)塗漆之塗佈:Mikasa(股)製、旋轉塗佈器MS-A100
(4)膜厚測定:(股)小坂研究所製、微細形狀測定機Surfcorder ET-4000
(5)元件之製作:長州產業(股)製、多功能蒸鍍裝置系統C-E2L1G1-N
(6)元件之電流密度測定:(有)Tech-world製、I-V-L測定系統
遵照J.Mater.Chem.C,2014,pp.1068-1075記載之方法實施合成,得到中間體A(2,7-二溴-9,9-雙(4-硝基苯基)-9H-茀)。
於反應容器中加入中間體A 1.80g、(9-苯基-9H-咔唑-3-基)硼酸2.28g、肆-三苯基膦鈀0.18g、三辛基甲基氯化銨(Aliquat 336)0.30g、四氫呋喃18mL、及2mol/L碳酸鉀水溶液12mL,進行氮取代後,於60℃攪拌4.5小時。使反應液回到室溫後,添加甲苯與飽和食鹽水,進行分液。將所得之有機層之溶劑予以減壓餾去。將濃縮殘渣以管柱層析(氯仿/n-己烷70/30→90/10)進行精製,收集含目標物之區分,將溶劑減壓餾去。將濃縮殘渣溶解於氯仿後,滴下至n-己烷中,過濾懸浮液。將濾物乾燥,得到作為目標之中間體B(3,3’-(9,9-雙(4-硝基苯基)-9H-茀-2,7-二基)雙(9-苯基-9H-咔唑))2.44g(產率:86%)。
1H-NMR之測定結果如以下所示。
1H-NMR(400MHz,DMSO-d6)δ[ppm]:8.76(d,J=1.6Hz,2H),8.32(d,J=7.6Hz,2H),8.18-8.20(m,4H),8.14(d,J=8.0Hz,2H),7.89-7.94(m,4H),7.59-7.74(m,14H),7.52(t,J=7.2Hz,2H),7.35-7.44(m,6H),7.28(t,J=8.0Hz,2H)。
於反應容器中加入中間體B 1.80g、5%鈀碳(NE CHEMCAT公司製、AER型、49%含水)0.18g、及四氫呋喃18mL,進行氫取代後於50℃攪拌23小時。使反應液回到室溫後,添加四氫呋喃,進行過濾。將濾液濃縮,將濃縮液滴下至n-己烷中,將懸浮液於室溫下攪拌後,進行過濾。將濾物乾燥,得到含有作為目標之中間體C(4,4’-(2,7-雙(9-苯基-9H-咔唑-3-基)-9H-茀-9,9-二基)二苯胺)的混合物1.59g。再者,不進一步進行精製,而使用作為下一步驟之原料。
於反應容器中加入前述含有中間體C之混合物1.00g、N,N-二甲基甲醯胺10mL、及三甲基胺580μL,進行氮取代後,一邊於冰浴冷卻,一邊滴下2,3,4,5-四氟苯甲醯氯0.96g。滴下結束後,於室溫攪拌3小時。將反應混合物滴下至離子交換水中後,直接於室溫攪拌0.5小時。過濾所得到之懸浮液後,將濾物懸浮於2-丙醇,進行過濾。將濾物溶解於氯仿,滴下至甲醇中,將懸浮液於室溫下攪拌。進行過濾,將所得到之濾物乾燥,得到作為目標之含有氟原子之化合物A(N,N’-((2,7-雙(9-苯基-9H-咔唑-3-基)-9H-茀-9,9-二基)雙(4,1-伸苯基))雙(2,3,4,5-四氟苯甲醯胺))1.02g(產率:72%)。1H-NMR之測定結果如以下所示。
1H-NMR(400MHz,DMSO-d6)δ[ppm]:8.63(d,J=1.6Hz,2H),8.39(d,J=8.0Hz,2H),8.12(d,J=8.0Hz,2H),7.92(dd,J=8.0,1.6Hz,2H),7.88(s,2H),7.64-7.78(m,16H),7.54-7.58(m,2H),7.30-7.48(m,12H)。
於反應容器中加入中間體A 1.81g、(4-(9H-咔
唑-9-基)苯基)硼酸2.28g、肆-三苯基膦鈀0.18g、三辛基甲基氯化銨(Aliquat 336)0.30g、四氫呋喃18mL、及2mol/L碳酸鉀水溶液12mL,進行氮取代後,於60℃攪拌3小時。使反應液回到室溫後,添加甲苯,進行分液。將所得之有機層之溶劑予以減壓餾去。對濃縮殘渣添加氯仿與n-己烷之混合溶劑,暫時於室溫下放置,過濾所得到之懸浮液。將濾物乾燥,得到作為目標之中間體D(9,9’-((9,9-雙(4-硝基苯基)-9H-茀-2,7-二基)雙(4,1-伸苯基))雙(9H-咔唑))2.46g(產率:87%)。1H-NMR之測定結果如以下所示。
1H-NMR(400MHz,THF-d8)δ[ppm]:8.19(d,J=9.2Hz,4H),8.11-8.15(m,6H),7.90-7.95(m,8H),7.68(d,J=8.8Hz,4H),7.64(d,J=9.2Hz,4H),7.34-7.42(m,8H),7.21-7.25(m,4H)。
於反應容器中加入中間體D 1.80g、5%鈀碳(NE CHEMCAT公司製、AER型、49%含水)0.31g、及四氫呋喃18mL,進行氫取代之後於50℃攪拌53小時。使反應液回到室溫後,添加四氫呋喃,進行過濾。將濾液濃
縮,將濃縮液滴下至n-己烷中,將懸浮液於室溫下攪拌後,進行過濾。將濾物乾燥,得到含有作為目標之中間體E(4,4’-(2,7-雙(4-(9H-咔唑-9-基)苯基)-9H-茀-9,9-二基)二苯胺)的混合物1.28g。再者,不進一步進行精製,而使用作為下一步驟之原料。
於反應容器中加入前述含有中間體E之混合物1.00g、N,N-二甲基甲醯胺10mL、及三甲基胺450μL,進行氮取代後,一邊於冰浴冷卻,一邊滴下2,3,4,5-四氟苯甲醯氯0.62g。滴下結束後,於室溫攪拌0.5小時。將反應混合物滴下至離子交換水中後,直接於室溫攪拌0.5小時。過濾所得到之懸浮液後,將濾物溶解於氯仿,滴下至n-己烷中,將懸浮液於室溫下攪拌。進行過濾,將所得之濾物以管柱層析進行精製,收集含有目標物之區分,將
溶劑減壓餾去。將濃縮殘渣溶解於氯仿,滴下至甲醇中,將懸浮液於室溫下攪拌0.5小時。進行過濾,將濾物乾燥,得到作為目標之含有氟原子之化合物B(N,N’-((2,7-雙(4-(9H-咔唑-9-基)苯基)-9H-茀-9,9-二基)雙(4,1-伸苯基))雙(2,3,4,5-四氟苯甲醯胺))0.88g(產率:62%)。1H-NMR之測定結果如以下所示。
1H-NMR(400MHz,DMSO-d6)δ[ppm]:10.63(s,2H),8.23(d,J=8.0Hz,4H),8.15(d,J=8.0Hz,2H),7.96(d,J=8.8Hz,4H),7.87-7.90(m,4H),7.69(d,J=8.8Hz,6H),7.64(d,J=8.8Hz,4H),7.39-7.44(m,8H),7.33(d,J=8.8Hz,4H),7.25-7.29(m,4H)。
於反應容器中加入中間體A 1.81g、(3-(9H-咔唑-9-基)苯基)硼酸2.28g、肆-三苯基膦鈀0.18g、三辛基甲基氯化銨(Aliquat 336)0.32g、四氫呋喃18mL、及2mol/L碳酸鉀水溶液12mL,進行氮取代後,於60℃攪拌3小時。使反應液回到室溫後,添加甲苯,進行分液。將
所得之有機層之溶劑予以減壓餾去。將濃縮殘渣以管柱層析(氯仿/n-己烷70/30→95/5)進行精製,收集含目標物之區分,將溶劑減壓餾去。將濃縮殘渣溶解於氯仿後,滴下至n-己烷中,過濾懸浮液。將濾物乾燥,得到作為目標之中間體F(9,9’-((9,9-雙(4-硝基苯基)-9H-茀-2,7-二基)雙(3,1-伸苯基))雙(9H-咔唑))2.28g(產率:80%)。1H-NMR之測定結果如以下所示。
1H-NMR(400MHz,DMSO-d6)δ[ppm]:8.26(d,J=8.0Hz,4H),8.18(d,J=8.4Hz,2H),8.14(d,J=8.8Hz,4H),7.94-7.96(m,6H),7.85(d,J=8.4Hz,2H),7.76(t,J=8.0Hz,2H),7.61-7.63(m,2H),7.57(d,J=8.8Hz,4H),7.41-7.44(m,8H),7.28-7.32(m,4H)。
於反應容器中加入中間體F 1.81g、5%鈀碳(NE CHEMCAT公司製、AER型、49%含水)0.18g、及四氫呋喃18mL,進行氫取代之後,於50℃攪拌33小時。使反應液回到室溫後,添加四氫呋喃,進行過濾。將濾液濃縮,將濃縮液滴下至n-己烷中,將懸浮液於室溫下攪拌
後,進行過濾。將濾物乾燥,得到含有作為目標之中間體G(4,4’-(2,7-雙(3-(9H-咔唑-9-基)苯基)-9H-茀-9,9-二基)二苯胺)的混合物1.56g。再者,不進一步進行精製,而使用作為下一步驟之原料。
於反應容器中加入前述含有中間體G之混合物1.00g、N,N-二甲基甲醯胺10mL、及三甲基胺450μL,進行氮取代後,一邊於冰浴冷卻,一邊滴下2,3,4,5-四氟苯甲醯氯0.62g。滴下結束後,於室溫攪拌2.5小時。將反應混合物滴下至離子交換水中後,直接於室溫攪拌0.5小時。過濾所得到之懸浮液後,將濾物溶解於氯仿,滴下至甲醇中,將懸浮液於室溫下攪拌。進行過濾,將所得到之濾物乾燥,得到作為目標之含有氟原子之化合物
C(N,N’-((2,7-雙(3-(9H-咔唑-9-基)苯基)-9H-茀-9,9-二基)雙(4,1-伸苯基))雙(2,3,4,5-四氟苯甲醯胺))1.18g(產率:83%)。1H-NMR之測定結果如以下所示。
1H-NMR(400MHz,DMSO-d6)δ[ppm]:10.59(s,2H),8.26(d,J=7.6Hz,4H),8.11(d,J=8.4Hz,2H),7.82-7.93(m,8H),7.76(t,J=7.6Hz,2H),7.66-7.73(m,2H),7.59-7.63(m,6H),7.42-7.47(m,8H),7.26-7.33(m,8H)。
於反應容器中加入中間體A 1.80g、(4-二苯基胺基)苯基硼酸2.30g、肆-三苯基膦鈀0.18g、三辛基甲基氯化銨(Aliquat 336)0.28g、四氫呋喃18mL、及2mol/L碳酸鉀水溶液12mL,進行氮取代後,於60℃攪拌4.5小時。使反應液回到室溫後,添加甲苯與飽和食鹽水,進行分液。將所得到之有機層的溶劑予以減壓餾去,過濾懸浮液。將濾物乾燥,得到作為目標之中間體H(4,4’-(9,9-雙(4-硝基苯基)-9H-茀-2,7-二基)雙(N,N-二苯基苯胺))2.39g(產率:84%)。1H-NMR之測定結果如以下所示。
1H-NMR(400MHz,THF-d8)δ[ppm]:8.11(d,J=9.2Hz,4H),
7.95(d,J=8.0Hz,2H),7.69-7.73(m,4H),7.54(d,J=8.8Hz,4H),7.47(d,J=8.8Hz,4H),7.20-7.25(m,8H),7.04-7.07(m,12H),6.99(t,J=7.2Hz,4H)。
於反應容器中加入中間體H1.80g、5%鈀碳(NE CHEMCAT公司製、AER型、49%含水)0.18g、及、四氫呋喃18mL,進行氫取代之後,於60℃攪拌22.5小時。使反應液回到室溫後,添加四氫呋喃,進行過濾。將濾液濃縮,將濃縮液滴下至n-己烷中,將懸浮液於室溫下攪拌後,進行過濾。將濾物乾燥,得到含有作為目標之中間體I(4,4’-(9,9-雙(4-胺基苯基)-9H-茀-2,7-二基)雙(N,N-二苯基胺))之混合物1.62g。再者,不進一步進行精製,而使用作為下一步驟之原料。
於反應容器中加入前述含有中間體I之混合物0.50g、N,N-二甲基甲醯胺30mL、及三甲基胺330μL,進行氮取代後,一邊於冰浴冷卻,一邊滴下2,3,4,5-四氟苯甲醯氯0.47g。滴下結束後,於室溫攪拌2.5小時。將反應混合物滴下至離子交換水中後,直接於室溫攪拌0.5小時。過濾所得到之懸浮液後,將濾物溶解於氯仿,添加離子交換水進行分液。將有機層以無水硫酸鈉乾燥後,將溶劑減壓餾去。將濃縮液滴下至甲醇與n-己烷之混合溶劑中,將懸浮液於室溫下攪拌。進行過濾,將濾物乾燥,得到作為目標之含有氟原子之化合物D(N,N’-((2,7-雙(4-(二苯基胺基)苯基-9H-茀-9,9-二基)雙(4,1-伸苯基))雙(2,3,4,5-四氟苯甲醯胺))0.45g(產率:63%)。1H-NMR之測定結果如以下所示。
1H-NMR(400MHz,DMSO-d6)δ[ppm]:10.59(s,2H),7.98(d,J=8.0Hz,2H),7.64-7.70(m,6H),7.55-7.58(m,8H),7.25-
7.29(m,8H),7.21(d,J=8.8Hz,4H),6.98-7.04(m,16H)。
將含有氟原子之化合物A 150mg,溶解於N,N-二甲基異丁基醯胺(DMIB)5g並攪拌,將所得到之溶液使用孔徑0.2μm之聚四氟乙烯(PTFE)製過濾器過濾,得到電荷傳輸性塗漆A。
將含有氟原子之化合物B 150mg,溶解於DMIB 5g並攪拌,將所得到之溶液使用孔徑0.2μm之PTFE製過濾器過濾,得到電荷傳輸性塗漆B。
將含有氟原子之化合物C 100mg,溶解於1,3-二甲基-2-四氫咪唑酮(DMI)1.65g、2,3-丁二醇(2,3-BD)2g及二丙二醇單甲基醚(DPM)1.35g之混合溶劑並攪拌,將所得到之溶液使用孔徑0.2μm之PTFE製過濾器過濾,得到電荷傳輸性塗漆C。
將含有氟原子之化合物D 100mg,溶解於DMI 1.65g、2,3-BD2g及DPM 1.35g之混合溶劑並攪拌,將所得到之
溶液使用孔徑0.2μm之PTFE製過濾器過濾,得到電荷傳輸性塗漆D。
將下述式表示之TFB聚合物(Luminescence Technology公司製LT-N148)50mg,溶解於3-苯氧基甲苯2.5g及環己基苯2.5g之混合溶劑並攪拌,將所得到之溶液使用孔徑0.2μm之PTFE製過濾器過濾,得到電荷傳輸性塗漆E。
以下之實施例及比較例中,係使用ITO於表面上以膜厚150nm被圖型化之25mm×25mm×0.7t的玻璃基板,作為ITO基板,使用前藉由O2電漿洗淨裝置(150W、30秒)去除表面上之雜質後使用。
將電荷傳輸性塗漆A使用旋轉塗佈器塗佈於ITO基板後,於大氣下、80℃進行1分鐘臨時燒成,接著於
230℃進行15分鐘主要燒成,於ITO基板上形成30nm之薄膜。
使用蒸鍍裝置(真空度2.0×10-5Pa)於其上層合鋁之薄膜,得到HOD。蒸鍍係以蒸鍍速率0.2nm/秒之條件進行。鋁之薄膜之膜厚為80nm。
再者,為了防止空氣中的氧、水等之影響而造成特性劣化,HOD係藉由密封基板密封後,評估其特性。密封係由以下順序進行。
於氧濃度2ppm以下,露點-85℃以下之氮環境中,將SLD容納於密封基板之間,將密封基板以接著材((股)MORESCO製Moresco Moisture Cut WB90US(P))貼合。此時,將捕水劑(Dynic(股)製HD-071010W-40)與SLD一起容納於密封基板內。對貼合之密封基板照射UV光(波長365nm、照射量6,000mJ/cm2)後,於80℃退火處理1小時使接著材硬化。
除了分別使用電荷傳輸性塗漆B~D以取代電荷傳輸性塗漆A以外,係以與實施例9相同之方法製作HOD。
除了使用電荷傳輸性塗漆E以取代電荷傳輸性塗漆A以外,係以與實施例9相同之方法製作HOD。
使用Al/Nd於表面上以膜厚150nm被圖型化之25mm×25mm×0.7t的玻璃基板作為Al/Nd基板,使用前以O2電漿洗淨裝置(150W、30秒)去除表面上之雜質。接著,將電荷傳輸性塗漆A使用旋轉塗佈器塗佈於Al/Nd基板後,於大氣下、80℃進行1分鐘臨時燒成,接著於230℃進行15分鐘主要燒成,於Al/Nd基板上形成30nm之薄膜。
使用蒸鍍裝置(真空度2.0×10-5Pa)於其上層合鋁之薄膜,得到EOD。蒸鍍係以蒸鍍速率0.2nm/秒之條件進行。鋁之薄膜之膜厚為80nm。
再者,為了防止空氣中的氧、水等之影響而造成特性劣化,EOD係藉由密封基板密封後,評估其特性。密封係以與前述相同之方法進行。
除了分別使用電荷傳輸性塗漆B~D以取代電荷傳輸性塗漆A以外,係以與實施例13相同之方法製作EOD。
除了使用電荷傳輸性塗漆E以取代電荷傳輸性塗漆A以外,係以與實施例13相同之方法製作EOD。
對於前述實施例及比較例所製作得各HOD及EOD,測定於驅動電壓3V之電流密度。結果示於表7。
如表7所示,由本發明之電荷傳輸性塗漆所製作的實施化合物,顯示比較例之TFB聚合物以上的電洞傳輸性,且較比較例之TFB聚合物電子阻擋性更優異。
Claims (13)
- 一種下述式(1)表示之含有氟原子之化合物;
- 如請求項1之含有氟原子之化合物,其中ArF係分別獨立地為可經氰基、氯原子、溴原子、碘原子、硝基、碳數1~20之烷基、碳數1~20之氟烷基或碳數1~20之氟烷氧基取代的經3個以上之氟原子取代的苯基;或2-(三氟甲基)苯基、3-(三氟甲基)苯基、4-(三氟甲基)苯基、4-乙氧基-3-(三氟甲基)苯基、3-氟-4-三氟甲基苯基、4-氟-3-三氟甲基苯基、4-氟-2-三氟甲基苯基、2-氟-5-(三氟甲基)苯基、3-氟-5-(三氟甲基)苯基、3,5-二(三氟甲基)苯基、2,4,6-三(三氟甲基)苯基、4-(五氟乙基)苯基、4-(3,3,3-三氟丙基)苯基、2,3,5,6-四氟-4-三氟甲基苯基、4-(全氟乙烯基)苯基、4-(全氟丙烯基)苯基或4-(全氟丁烯基)苯基。
- 如請求項1或2之含有氟原子之化合物,其中ArF為相同之基。
- 如請求項1或2之含有氟原子之化合物,其中Z為 式(2)表示之基。
- 如請求項1或2之含有氟原子之化合物,其中R2為苯基。
- 如請求項1或2之含有氟原子之化合物,其中R3~R77為氫原子。
- 一種電荷傳輸性物質,其係由如請求項1~6中任一項之含有氟原子之化合物所構成。
- 一種電荷傳輸性塗漆,其含有如請求項7之電荷傳輸性物質及有機溶劑。
- 如請求項8之電荷傳輸性塗漆,其進一步含有不含有氟原子之電荷傳輸性物質。
- 如請求項8或9之電荷傳輸性塗漆,其進一步含有摻雜劑。
- 一種電荷傳輸性薄膜,其係使用如請求項8~10中任一項之電荷傳輸性塗漆所製作。
- 一種有機電致發光元件,其具備如請求項11之電荷傳輸性薄膜。
- 一種下述式(1)表示之含有氟原子之化合物之製造方法,其包含使式(15)表示之化合物及式(16)表示之化合物反應而得到式(17)表示之中間體之步驟、將式(17)表示之中間體還原而得到式(18)表示之中間體之步驟、及使式(18)表示之中間體與式(19)表示之鹵化物反應之 步驟;
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