TWI722162B - Laser processing device and laser processing method - Google Patents

Laser processing device and laser processing method Download PDF

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TWI722162B
TWI722162B TW106111313A TW106111313A TWI722162B TW I722162 B TWI722162 B TW I722162B TW 106111313 A TW106111313 A TW 106111313A TW 106111313 A TW106111313 A TW 106111313A TW I722162 B TWI722162 B TW I722162B
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resin layer
laser
resin
cut
laser light
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TW201811479A (en
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池田剛史
荒川美紀
橋本百加
山本幸司
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日商三星鑽石工業股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/0006Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/40Removing material taking account of the properties of the material involved
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/40Removing material taking account of the properties of the material involved
    • B23K26/402Removing material taking account of the properties of the material involved involving non-metallic material, e.g. isolators
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/16Composite materials, e.g. fibre reinforced
    • B23K2103/166Multilayered materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/30Organic material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/30Organic material
    • B23K2103/42Plastics

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)

Abstract

本發明之課題在於使得當藉由雷射加工裝置對複數層樹脂基板進行全切加工時,於表面側之層之加工時內側之樹脂層不易被加工。 The subject of the present invention is to make it difficult for the inner resin layer to be processed when the surface side layer is processed when the multiple-layer resin substrate is fully cut by a laser processing device.

雷射加工裝置1係用以自表面側將具有第1樹脂層L1與第2樹脂層L2之複數層樹脂基板P切斷之裝置,且具備第1雷射振盪器9A與第2雷射振盪器9B。第1雷射振盪器9A係產生用以將第1樹脂層L1切斷之第1雷射光R1之裝置。第1雷射光R1係與相對於第1樹脂層L1而言相比,相對於第2樹脂層L2而言吸收率較低。第2雷射振盪器9B係產生用以將第2樹脂層L2切斷之第2雷射光R2之裝置。第2雷射光R2係與相對於第1樹脂層L1而言相比,相對於第2樹脂層L2而言吸收率較高。 The laser processing device 1 is a device for cutting a plurality of resin substrates P having a first resin layer L1 and a second resin layer L2 from the surface side, and includes a first laser oscillator 9A and a second laser oscillator器9B. The first laser oscillator 9A is a device for generating the first laser light R1 for cutting the first resin layer L1. The first laser light R1 has a lower absorptivity relative to the second resin layer L2 than the first resin layer L1. The second laser oscillator 9B is a device for generating the second laser light R2 for cutting the second resin layer L2. The second laser light R2 has a higher absorptivity with respect to the second resin layer L2 than the first resin layer L1.

Description

雷射加工裝置以及雷射加工方法 Laser processing device and laser processing method

本發明係關於一種雷射加工裝置以及雷射加工方法、尤其是藉由照射雷射光而將樹脂基板切斷之裝置以及方法。 The present invention relates to a laser processing device and a laser processing method, especially a device and method for cutting a resin substrate by irradiating laser light.

樹脂基板之種類分為單層樹脂基板與複數層樹脂基板。複數層樹脂基板包含不同材料之多個樹脂層。又,有時根據製品而積層功能性膜(無機、金屬、有機)。 The types of resin substrates are classified into single-layer resin substrates and multiple-layer resin substrates. The plural resin substrates include a plurality of resin layers of different materials. In addition, functional films (inorganic, metal, organic) may be laminated depending on the product.

作為將複數層樹脂基板切斷之裝置,使用雷射加工裝置(例如參照專利文獻1)。複數層樹脂基板藉由雷射加工裝置而僅將上側之層切斷(半切加工)或者將所有層切斷(全切加工)。 As an apparatus for cutting a plurality of resin substrates, a laser processing apparatus is used (for example, refer to Patent Document 1). In the plural-layer resin substrate, only the upper layer is cut (half-cut processing) or all the layers are cut (full-cut processing) by a laser processing device.

[先前技術文獻] [Prior Technical Literature]

[專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2014-8511號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2014-8511

於對複數層樹脂基板進行全切加工時,於相較表面層更下側之層(例如中間層)由相對於雷射光而言吸收率較高之材料構成的情形時,有時中間層較表面層先被加工。於該情形時,於表面層之內側產生之碎屑之排出受表面層阻礙。因此,碎屑進入至樹脂層之邊界或者堆積於內部或者發熱而使周邊部分變質。 When performing full-cut processing on multiple layers of resin substrates, when the layer below the surface layer (for example, the intermediate layer) is made of a material with a higher absorption rate than laser light, the intermediate layer may be more The surface layer is processed first. In this case, the discharge of debris generated inside the surface layer is hindered by the surface layer. Therefore, the debris enters the boundary of the resin layer or accumulates inside or generates heat to deteriorate the peripheral portion.

本發明之目的在於使得當藉由雷射加工裝置對複數層樹脂基板進行全切加工時,於表面側之層之加工時內側之樹脂層不易被加工。 The object of the present invention is to make it difficult for the inner resin layer to be processed when the surface side layer is processed when the multiple layer resin substrate is fully cut by a laser processing device.

以下,作為用以解決課題之手段而對多個態樣進行說明。該等態樣可視需要任意地組合。 Hereinafter, various aspects will be described as means for solving the problems. These aspects can be combined arbitrarily as needed.

本發明之一觀點之雷射加工裝置係用以自表面側將具有第1樹脂層與第2樹脂層之複數層樹脂基板切斷之裝置,且具備第1雷射裝置與第2雷射裝置。 A laser processing device of one aspect of the present invention is a device for cutting a plurality of resin substrates having a first resin layer and a second resin layer from the surface side, and includes a first laser device and a second laser device .

第1雷射裝置係產生用以將第1樹脂層切斷之第1雷射光之裝置。第1雷射光係與相對於第1樹脂層而言相比,相對於第2樹脂層而言吸收率較低。 The first laser device is a device for generating the first laser light for cutting the first resin layer. Compared with the first resin layer, the first laser system has a lower absorptivity relative to the second resin layer.

第2雷射裝置係產生用以將第2樹脂層切斷之第2雷射光之裝置。第2雷射光係與相對於第1樹脂層而言相比,相對於第2樹脂層而言吸收率較高。 The second laser device is a device for generating the second laser light for cutting the second resin layer. Compared with the first resin layer, the second laser light system has a higher absorptivity with respect to the second resin layer.

於該裝置,選定藉由第1雷射光將第1樹脂層切斷時第2樹脂層不被加工之條件(雷射功率等)。其原因在於,第1雷射光係與相對於第1樹脂層而言相比,相對於第2樹脂層而言吸收率較低。其結果,於 第1樹脂層之切斷時,第2樹脂層不易被加工。 In this device, the conditions (laser power, etc.) under which the second resin layer is not processed when the first resin layer is cut by the first laser light are selected. The reason is that the first laser system has a lower absorptivity relative to the second resin layer than the first resin layer. As a result, when the first resin layer is cut, the second resin layer is not easily processed.

於將第1樹脂層切斷後,藉由第2雷射光將第2樹脂層切斷。此時產生之碎屑自第1樹脂層之切斷部分向外部排出。因此,於第2樹脂層加工時產生之碎屑不會停留於第1樹脂層內。 After the first resin layer is cut, the second resin layer is cut by the second laser light. The debris generated at this time is discharged from the cut portion of the first resin layer to the outside. Therefore, the debris generated during the processing of the second resin layer does not stay in the first resin layer.

第1雷射光之相對於第2樹脂層之吸收率亦可為30%以下、較佳為20%以下。 The absorption rate of the first laser light with respect to the second resin layer may be 30% or less, preferably 20% or less.

第2雷射光之相對於第2樹脂層之吸收率亦可為70%以上、較佳為80%以上。 The absorption rate of the second laser light with respect to the second resin layer may be 70% or more, preferably 80% or more.

亦可為,第2樹脂層包含PI,第1雷射裝置為CO2雷射,且第2雷射裝置為UV雷射。 Alternatively, the second resin layer includes PI, the first laser device is a CO 2 laser, and the second laser device is a UV laser.

本發明之另一觀點之雷射加工方法係自表面側將具有第1樹脂層與第2樹脂層之複數層樹脂基板切斷之方法,且具備下述步驟。 Another aspect of the laser processing method of the present invention is a method of cutting a plurality of resin substrates having a first resin layer and a second resin layer from the surface side, and includes the following steps.

◎第1切斷步驟,其藉由產生第1雷射光而將第1樹脂層切斷,上述第1雷射光係與相對於第1樹脂層而言相比,相對於第2樹脂層而言吸收率較低 ◎The first cutting step, which cuts the first resin layer by generating the first laser light. The first laser light system described above is compared with the first resin layer as compared to the second resin layer. Low absorption rate

◎第2切斷步驟,其於第1切斷步驟之後,藉由產生第2雷射光並照射至第1樹脂層之切斷部分而將第2樹脂層切斷,上述第2雷射光係與相對於第1樹脂層而言相比,相對於第2樹脂層而言吸收率較高 ◎The second cutting step, after the first cutting step, by generating a second laser light and irradiating the cut part of the first resin layer to cut the second resin layer, the above-mentioned second laser light system and Compared with the first resin layer, the absorption rate is higher than that of the second resin layer

於該方法中,藉由第1雷射光將第1樹脂層切斷時,第2樹脂層未被加工。其原因在於,第1雷射光係與相對於第1樹脂層而言相比,相對於第2樹脂層而言吸收率較低。其結果,於第1樹脂層之切斷時,不易產生因第2樹脂層之加工引起之不良情況。 In this method, when the first resin layer is cut by the first laser light, the second resin layer is not processed. The reason is that the first laser system has a lower absorptivity relative to the second resin layer than the first resin layer. As a result, when the first resin layer is cut, defects caused by the processing of the second resin layer are less likely to occur.

於將第1樹脂層切斷後,藉由第2雷射光將第2樹脂層切斷。此時產生之碎屑自第1樹脂層之切斷部分向外部排出。因此,於第2樹脂層加工時產生之碎屑不會停留於第1樹脂層內。 After the first resin layer is cut, the second resin layer is cut by the second laser light. The debris generated at this time is discharged from the cut portion of the first resin layer to the outside. Therefore, the debris generated during the processing of the second resin layer does not stay in the first resin layer.

於本發明之雷射加工裝置及雷射加工方法中,對複數層樹脂基板進行全切加工時,於表面側之樹脂層之加工時內側之樹脂層不易被加工。 In the laser processing device and the laser processing method of the present invention, when the multiple-layer resin substrate is fully cut, the resin layer on the inner side is not easily processed when the resin layer on the surface side is processed.

1‧‧‧雷射加工裝置 1‧‧‧Laser processing device

3‧‧‧雷射裝置 3‧‧‧Laser device

5‧‧‧機械驅動系統 5‧‧‧Mechanical drive system

7‧‧‧控制部 7‧‧‧Control Department

9‧‧‧雷射振盪器 9‧‧‧Laser Oscillator

9A‧‧‧第1雷射振盪器 9A‧‧‧The first laser oscillator

9B‧‧‧第2雷射振盪器 9B‧‧‧The second laser oscillator

11‧‧‧傳輸光學系統 11‧‧‧Transmission optical system

13‧‧‧底座 13‧‧‧Base

15‧‧‧加工台 15‧‧‧Processing table

17‧‧‧移動裝置 17‧‧‧Mobile device

19‧‧‧切斷部 19‧‧‧Cut off

L1‧‧‧第1樹脂層 L1‧‧‧The first resin layer

L2‧‧‧第2樹脂層 L2‧‧‧Second resin layer

L3‧‧‧第3樹脂層 L3‧‧‧The third resin layer

P‧‧‧樹脂基板 P‧‧‧Resin substrate

圖1係本發明之第1實施形態之雷射加工裝置之示意圖。 Fig. 1 is a schematic diagram of a laser processing apparatus according to the first embodiment of the present invention.

圖2係表示全切加工之控制動作之流程圖。 Figure 2 is a flow chart showing the control action of full-cut processing.

圖3係表示樹脂基板之構造之示意性剖面圖。 Fig. 3 is a schematic cross-sectional view showing the structure of the resin substrate.

圖4係表示樹脂基板之加工狀態之示意性剖面圖。 Fig. 4 is a schematic cross-sectional view showing the processing state of the resin substrate.

圖5係表示本發明之實施例中之切斷部分之狀態之俯視圖。 Fig. 5 is a plan view showing the state of the cut portion in the embodiment of the present invention.

圖6係表示比較例中之切斷部分之狀態之俯視圖。 Fig. 6 is a plan view showing the state of the cut portion in the comparative example.

1.第1實施形態 1. The first embodiment

(1)整體構成 (1) Overall composition

於圖1中表示本發明之一實施形態之樹脂基板切斷用之雷射加工裝置1 之整體構成。圖1係本發明之第1實施形態之雷射加工裝置之示意圖。 Fig. 1 shows the overall structure of a laser processing apparatus 1 for cutting a resin substrate according to an embodiment of the present invention. Fig. 1 is a schematic diagram of a laser processing apparatus according to the first embodiment of the present invention.

雷射加工裝置1係對樹脂基板P進行全切加工之裝置。所謂樹脂基板係指亦稱為樹脂片、樹脂膜者。 The laser processing device 1 is a device that performs full-cut processing on the resin substrate P. The so-called resin substrate refers to what is also called a resin sheet or a resin film.

雷射加工裝置1具備雷射裝置3。雷射裝置3具有用以對樹脂基板P照射雷射光之第1雷射振盪器9A。第1雷射振盪器9A例如係CO2雷射。雷射裝置3具有用以對樹脂基板P照射雷射光之第2雷射振盪器9B。第2雷射振盪器9B例如係UV雷射。 The laser processing device 1 includes a laser device 3. The laser device 3 has a first laser oscillator 9A for irradiating the resin substrate P with laser light. The first laser oscillator 9A is, for example, a CO 2 laser. The laser device 3 has a second laser oscillator 9B for irradiating the resin substrate P with laser light. The second laser oscillator 9B is, for example, a UV laser.

雷射裝置3具有將雷射光傳輸至下述之機械驅動系統之傳輸光學系統11。傳輸光學系統11例如具有聚光透鏡、多個反射鏡、稜鏡、擴束器等,但未圖示。又,傳輸光學系統11例如具有用以使第1雷射振盪器9A、第2雷射振盪器9B及組入有其他光學系統之雷射照射頭(未圖示)於X軸方向上移動之X軸方向移動機構(未圖示)。 The laser device 3 has a transmission optical system 11 that transmits laser light to the mechanical drive system described below. The transmission optical system 11 has, for example, a condenser lens, a plurality of reflecting mirrors, a beam, a beam expander, etc., but it is not shown. In addition, the transmission optical system 11 has, for example, a first laser oscillator 9A, a second laser oscillator 9B, and a laser head (not shown) incorporating other optical systems to move in the X-axis direction. X-axis direction moving mechanism (not shown).

傳輸光學系統11可於第1雷射振盪器9A與第2雷射振盪器9B分別具有不同之光學機構,亦可為能夠切換使用共有之光學機構。 The transmission optical system 11 may have different optical mechanisms in the first laser oscillator 9A and the second laser oscillator 9B, or may be capable of switching and using a shared optical mechanism.

雷射加工裝置1具備機械驅動系統5。機械驅動系統5具有底座13、載置樹脂基板P之加工台15、及使加工台15相對於底座13沿水平方向移動之移動裝置17。移動裝置17係具有導軌、移動台、馬達等之公知之機構。 The laser processing device 1 includes a mechanical drive system 5. The mechanical drive system 5 has a base 13, a processing table 15 on which the resin substrate P is placed, and a moving device 17 that moves the processing table 15 in a horizontal direction relative to the base 13. The moving device 17 is a well-known mechanism having a guide rail, a moving table, a motor, and the like.

雷射加工裝置1具備控制部7。控制部7係具有處理器(例如CPU)、記憶裝置(例如ROM、RAM、HDD、SSD等)、及各種介面(例如A/D轉換器、D/A轉換器、通訊介面等)的電腦系統。控制部7藉由執行保存於記憶部(與記憶裝置之記憶區域之一部分或全部對應)之程式而 進行各種控制動作。 The laser processing device 1 includes a control unit 7. The control unit 7 is a computer system with a processor (such as CPU), a memory device (such as ROM, RAM, HDD, SSD, etc.), and various interfaces (such as A/D converter, D/A converter, communication interface, etc.) . The control section 7 performs various control actions by executing programs stored in the memory section (corresponding to part or all of the memory area of the memory device).

控制部7可由單一之處理器構成,亦可由為了各控制而獨立之多個處理器構成。 The control unit 7 may be composed of a single processor, or may be composed of a plurality of independent processors for each control.

於控制部7連接有檢測樹脂基板P之大小、形狀及位置之感測器、用以檢測各裝置之狀態之感測器及開關、以及資訊輸入裝置,但未圖示。 A sensor for detecting the size, shape, and position of the resin substrate P, a sensor and a switch for detecting the state of each device, and an information input device are connected to the control unit 7, but not shown.

於本實施形態中,控制部7可對第1雷射振盪器9A及第2雷射振盪器9B進行控制。又,控制部7可控制移動裝置17。進而,控制部7可控制傳輸光學系統11。 In this embodiment, the control unit 7 can control the first laser oscillator 9A and the second laser oscillator 9B. In addition, the control unit 7 can control the mobile device 17. Furthermore, the control unit 7 can control the transmission optical system 11.

樹脂基板P如圖3所示,係由複數層樹脂構成之複數層樹脂基板。圖3係表示樹脂基板之構造之示意性剖面圖。具體而言,樹脂基板P係三層構造,自正側起具有第1樹脂層L1、第2樹脂層L2、及第3樹脂層L3。 As shown in FIG. 3, the resin substrate P is a plural-layer resin substrate composed of plural layers of resin. Fig. 3 is a schematic cross-sectional view showing the structure of the resin substrate. Specifically, the resin substrate P has a three-layer structure, and has a first resin layer L1, a second resin layer L2, and a third resin layer L3 from the front side.

作為一例,第1樹脂層L1包含PET。第2樹脂層L2包含PI。第3樹脂層L3包含PET。 As an example, the first resin layer L1 contains PET. The second resin layer L2 contains PI. The third resin layer L3 contains PET.

作為一例,各樹脂層藉由接著層而相互接著。 As an example, each resin layer is bonded to each other by an adhesive layer.

作為一例,於第2樹脂層L2之上表面形成有電路。 As an example, a circuit is formed on the upper surface of the second resin layer L2.

(2)動作 (2) Action

利用圖2~圖4,對利用雷射光實施之樹脂基板P之加工動作進行說明。圖2係表示全切加工之控制動作之流程圖。圖4係表示樹脂基板之加工狀態之示意性剖面圖。 2 to 4, the processing operation of the resin substrate P implemented by laser light will be described. Figure 2 is a flow chart showing the control action of full-cut processing. Fig. 4 is a schematic cross-sectional view showing the processing state of the resin substrate.

控制部7驅動雷射振盪器9而執行樹脂基板P之切斷。以下,對切斷動作具體地進行說明。 The control unit 7 drives the laser oscillator 9 to perform cutting of the resin substrate P. Hereinafter, the cutting operation will be specifically described.

於步驟S1中,將第1樹脂層L1切斷。具體而言,控制部7藉由驅動第1雷射振盪器9A而使雷射光沿著切斷線C移動。如圖3所示,藉由第1雷射光R1將第1樹脂層L1切斷。雷射光之掃描次數可為1次,亦可為多次。 In step S1, the first resin layer L1 is cut. Specifically, the control unit 7 drives the first laser oscillator 9A to move the laser light along the cutting line C. As shown in FIG. 3, the first resin layer L1 is cut by the first laser light R1. The scanning frequency of the laser light can be 1 time or multiple times.

藉由第1雷射光R1將第1樹脂層L1切斷時,第2樹脂層L2未被加工。其原因在於,第1雷射光R1係與相對於第1樹脂層L1而言相比,相對於第2樹脂層L2而言吸收率較低。其結果,於第1樹脂層L1之切斷時,不易產生因第2樹脂層L2之加工引起之不良情況。 When the first resin layer L1 is cut by the first laser light R1, the second resin layer L2 is not processed. The reason is that the first laser light R1 has a lower absorptivity relative to the second resin layer L2 than the first resin layer L1. As a result, when the first resin layer L1 is cut, defects caused by the processing of the second resin layer L2 are less likely to occur.

作為具體例,CO2雷射之相對於PI之吸收率係於9.4μ波段之情形時為30%左右。 As a specific example, the absorption rate of the CO 2 laser with respect to PI is about 30% when the absorption rate of the CO 2 laser is in the 9.4 μ band.

於步驟S2中,將第2樹脂層L2切斷。具體而言,控制部7藉由驅動第2雷射振盪器9B而使雷射光沿著切斷線C移動。雷射光之掃描次數可為1次,亦可為多次。如圖4所示,藉由第2雷射光R2將第2樹脂層L2切斷。此時產生之碎屑自第1樹脂層L1之切斷部19向外部排出。再者,第2雷射光R2係與相對於第1樹脂層L1而言相比,相對於第2樹脂層L2而言吸收率較高,因此,有效地將第2樹脂層L2切斷。 In step S2, the second resin layer L2 is cut. Specifically, the control unit 7 drives the second laser oscillator 9B to move the laser light along the cutting line C. The scanning frequency of the laser light can be 1 time or multiple times. As shown in FIG. 4, the second resin layer L2 is cut by the second laser light R2. The debris generated at this time is discharged from the cut portion 19 of the first resin layer L1 to the outside. Furthermore, the second laser light R2 has a higher absorptivity with respect to the second resin layer L2 than with the first resin layer L1, and therefore effectively cuts the second resin layer L2.

作為具體例,UV雷射之相對於PI之吸收率為90%左右。 As a specific example, the absorption rate of UV laser relative to PI is about 90%.

於步驟S3中,將第3樹脂層L3切斷。此時,使用第2雷射振盪器9B即UV雷射。 In step S3, the third resin layer L3 is cut. At this time, the second laser oscillator 9B, that is, a UV laser is used.

其次,利用圖5及圖6,對實施例與比較例進行說明。圖5 係表示本發明之實施例中之切斷部分之狀態之俯視圖。圖6係表示比較例中之切斷部分之狀態之俯視圖。 Next, using FIGS. 5 and 6, an embodiment and a comparative example will be described. Fig. 5 is a plan view showing the state of the cut portion in the embodiment of the present invention. Fig. 6 is a plan view showing the state of the cut portion in the comparative example.

實施例:第1樹脂層為PET,第2樹脂層為PI,且雷射裝置為CO2雷射。 Example: The first resin layer is PET, the second resin layer is PI, and the laser device is a CO 2 laser.

比較例:第1樹脂層為PET,第2樹脂層為PI,且雷射裝置為UV雷射。 Comparative example: The first resin layer is PET, the second resin layer is PI, and the laser device is a UV laser.

於任一情形時,均僅將第1樹脂層切斷,並於該狀態下進行觀察。 In either case, only the first resin layer was cut, and observation was performed in this state.

如圖5所示,於實施例中,相對於切斷部19而碎屑擴展之區域之寬度Z較小。 As shown in FIG. 5, in the embodiment, the width Z of the area where the debris expands relative to the cut portion 19 is small.

如圖6所示,於比較例(例如,為了將第1層切斷而使用UV雷射之情形)中,如碎屑相對於切斷部19擴展般區域之寬度Z變得極長。 As shown in FIG. 6, in a comparative example (for example, a case where a UV laser is used to cut the first layer), the width Z of the area becomes extremely long as the debris expands with respect to the cut portion 19.

2.其他實施形態 2. Other implementation forms

以上,對本發明之一實施形態進行了說明,但本發明並不限定於上述實施形態,可於不脫離發明主旨之範圍內進行各種變更。 In the foregoing, one embodiment of the present invention has been described, but the present invention is not limited to the above-mentioned embodiment, and various changes can be made without departing from the spirit of the invention.

上述樹脂基板中樹脂層為3層,但樹脂層亦可為2層,還可為4層以上。 In the above-mentioned resin substrate, the resin layer has three layers, but the resin layer may be two layers or four or more layers.

上述基板全部由樹脂層構成,但亦可於2層樹脂層之下方設置其他層(例如金屬層、陶瓷層)。 The above-mentioned substrates are all composed of resin layers, but other layers (for example, metal layers, ceramic layers) may be provided under the two resin layers.

雷射裝置、機械驅動系統之具體構成並不限定於上述實施形態。 The specific configuration of the laser device and the mechanical drive system is not limited to the above-mentioned embodiment.

樹脂基板之形狀、切斷部之形狀並無特別限定。 The shape of the resin substrate and the shape of the cut portion are not particularly limited.

[產業上之可利用性] [Industrial availability]

本發明可廣泛應用於藉由照射雷射光而將樹脂基板切斷之雷射加工裝置以及雷射加工方法。 The present invention can be widely applied to a laser processing device and a laser processing method for cutting a resin substrate by irradiating laser light.

L1‧‧‧第1樹脂層 L1‧‧‧The first resin layer

L2‧‧‧第2樹脂層 L2‧‧‧Second resin layer

L3‧‧‧第3樹脂層 L3‧‧‧The third resin layer

P‧‧‧樹脂基板 P‧‧‧Resin substrate

R2‧‧‧第2雷射光 R2‧‧‧The second laser beam

Claims (3)

一種雷射加工裝置,其係用以自表面側將具有第1樹脂層與第2樹脂層之複數層樹脂基板切斷者,且具備:第1雷射裝置,其係產生用以將上述第1樹脂層切斷之第1雷射光之裝置,且上述第1雷射光係與相對於上述第1樹脂層而言相比,相對於上述第2樹脂層而言吸收率較低;及第2雷射裝置,其係產生用以將上述第2樹脂層切斷之第2雷射光之裝置,且上述第2雷射光係與相對於上述第1樹脂層而言相比,相對於上述第2樹脂層而言吸收率較高;上述第1樹脂層包含PET,上述第2樹脂層包含PI,上述第1雷射裝置為CO2雷射,且上述第2雷射裝置為UV雷射。 A laser processing device, which is used to cut a plurality of resin substrates having a first resin layer and a second resin layer from the surface side, and is provided with: a first laser device for generating 1 A device for the first laser light cut by the resin layer, and the first laser light system has a lower absorptivity relative to the second resin layer than the first resin layer; and A laser device that generates a second laser light for cutting the second resin layer, and the second laser light system is relative to the second resin layer compared to the first resin layer. The resin layer has a higher absorption rate; the first resin layer includes PET, the second resin layer includes PI, the first laser device is a CO 2 laser, and the second laser device is a UV laser. 一種雷射加工方法,其係自表面側將具有第1樹脂層與第2樹脂層之複數層樹脂基板切斷者,且具備:第1切斷步驟,其藉由產生第1雷射光而將上述第1樹脂層切斷,上述第1雷射光係與相對於上述第1樹脂層而言相比,相對於上述第2樹脂層而言吸收率較低;及第2切斷步驟,其於上述第1切斷步驟之後,藉由產生第2雷射光並照射至上述第1樹脂層之切斷部分而將上述第2樹脂層切斷,上述第2雷射光係與相對於上述第1樹脂層而言相比,相對於上述第2樹脂層而言吸收率較高; 上述第1樹脂層包含PET,上述第2樹脂層包含PI,上述第1雷射裝置為CO2雷射,且上述第2雷射裝置為UV雷射。 A laser processing method, which cuts a plurality of resin substrates having a first resin layer and a second resin layer from the surface side, and includes: a first cutting step, which generates a first laser light to cut The first resin layer is cut, and the first laser light system has a lower absorptivity relative to the second resin layer than that of the first resin layer; and the second cutting step is After the first cutting step, the second resin layer is cut by generating a second laser light and irradiating it to the cut portion of the first resin layer. The second laser light is different from the first resin layer. In terms of layer, the absorption rate is higher than that of the second resin layer; the first resin layer includes PET, the second resin layer includes PI, the first laser device is a CO 2 laser, and the The second laser device is a UV laser. 一種雷射加工方法,其係自表面側將具有第1樹脂層與第2樹脂層之複數層樹脂基板切斷者;上述第1樹脂層包含PET,上述第2樹脂層包含PI,且具備:第1切斷步驟,其藉由產生CO2雷射而將上述第1樹脂層切斷;及第2切斷步驟,其於上述第1切斷步驟之後,藉由產生UV雷射並照射至上述第1樹脂層之切斷部分而將上述第2樹脂層切斷。 A laser processing method, which cuts a plurality of resin substrates having a first resin layer and a second resin layer from the surface side; the first resin layer includes PET, and the second resin layer includes PI, and includes: The first cutting step is to cut the first resin layer by generating CO 2 laser; and the second cutting step is to generate UV laser and irradiate it after the first cutting step. The cut portion of the first resin layer cuts the second resin layer.
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