TWI713094B - Ultraviolet ray irradiation apparatus and ultraviolet ray irradiation method - Google Patents
Ultraviolet ray irradiation apparatus and ultraviolet ray irradiation method Download PDFInfo
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
- G03F7/0022—Devices or apparatus
- G03F7/0032—Devices or apparatus characterised by heat providing or glossing means
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70458—Mix-and-match, i.e. multiple exposures of the same area using a similar type of exposure apparatus, e.g. multiple exposures using a UV apparatus
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
- H01L21/02299—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment
- H01L21/0231—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment treatment by exposure to electromagnetic radiation, e.g. UV light
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
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Abstract
本發明是關於紫外線照射裝置及紫外線照射方法。本發明的課題是提高將照射部的熱排出的配管的壽命。實施方式的紫外線照射裝置包括:照射部,所述照射部能向基板照射紫外線;排氣部,所述排氣部具有能排出所述照射部的熱的配管;和移動部,所述移動部能使所述照射部及所述配管同步移動。 The present invention relates to an ultraviolet irradiation device and an ultraviolet irradiation method. The subject of the present invention is to improve the life of the pipe that discharges the heat of the irradiation unit. The ultraviolet irradiation device according to the embodiment includes: an irradiation part capable of irradiating ultraviolet rays to a substrate; an exhaust part having a pipe capable of dissipating heat from the irradiation part; and a moving part, the moving part The irradiation unit and the pipe can be moved synchronously.
Description
本發明是關於紫外線照射裝置及紫外線照射方法。 The present invention relates to an ultraviolet irradiation device and an ultraviolet irradiation method.
在構成液晶顯示器等的顯示面板的玻璃基板上,形成有佈線圖案及電極圖案等微細的圖案。例如,這樣的圖案可利用光刻法等方法形成。光蝕刻法包括以下製程:將抗蝕劑膜塗布於玻璃基板的製程,將抗蝕劑膜曝光的製程,將曝光後的抗蝕劑膜顯影的製程及向顯影後的抗蝕劑膜照射紫外線等光的製程(固化(cure)製程)。 Fine patterns such as wiring patterns and electrode patterns are formed on glass substrates constituting display panels such as liquid crystal displays. For example, such a pattern can be formed by a method such as photolithography. The photoetching method includes the following processes: a process of coating a resist film on a glass substrate, a process of exposing the resist film, a process of developing the exposed resist film, and irradiation of ultraviolet rays to the developed resist film Iso-light process (cure process).
上述固化製程可利用向基板照射紫外線的紫外線照射裝置進行。例如,專利文獻1中公開了具有沿水準方向搬運基板的帶式搬運機構、和向基板照射紫外線的紫外線照射機構的構成。
The above-mentioned curing process can be performed by an ultraviolet irradiation device that irradiates ultraviolet rays to the substrate. For example,
專利文獻2中公開了具有保持基板的基板保持器、向基板照射紫外線的紫外線發生源、和改變從紫外線發生源發出的紫外線的照射方向的反射板的構成。
專利文獻1:日本特開平4-97515號公報 Patent Document 1: Japanese Patent Application Laid-Open No. 4-97515
專利文獻2:日本特開2006-114848號公報 Patent Document 2: Japanese Patent Application Publication No. 2006-114848
但是,就紫外線照射裝置而言,一般考慮的是使向基板照射紫外線的照射部移動的構成。在照射部處連接有將照射部的熱排出的配管。然而,對於這樣的構成而言,由於在移動照射部時配管以追隨照射部的移動的方式而被拉伸,因而有可能對配管施加過度的負荷。因此,在提高配管的壽命方面存在問題。 However, in the case of an ultraviolet irradiation device, it is generally considered to move the irradiation part that irradiates the substrate with ultraviolet rays. The irradiating part is connected with a pipe which discharges the heat of an irradiating part. However, with such a configuration, since the pipe is stretched to follow the movement of the irradiating portion when the irradiating portion is moved, an excessive load may be applied to the pipe. Therefore, there is a problem in improving the life of the pipe.
鑒於以上這樣的情況,本發明的目的在於提供能夠提高將照射部的熱排出的配管的壽命的紫外線照射裝置及紫外線照射方法。 In view of the above-mentioned circumstances, an object of the present invention is to provide an ultraviolet irradiation device and an ultraviolet irradiation method that can increase the life of a pipe that discharges the heat of the irradiation unit.
本發明之一態樣中的紫外線照射裝置,是包括:照射部,所述照射部能向基板照射紫外線;排氣部,所述排氣部具有能排出所述照射部的熱的配管;和移動部,所述移動部能使所述照射部及所述配管同步移動。 The ultraviolet irradiation device in one aspect of the present invention includes: an irradiation part capable of irradiating ultraviolet rays to the substrate; an exhaust part having a pipe capable of dissipating heat from the irradiation part; and A moving part capable of synchronously moving the irradiation part and the pipe.
依據上述構成,能夠使照射部及配管同步移動,因此,配管不會以追隨照射部的移動的方式而被拉伸。也就是說,即使在移動照射部時,也能夠抑制對配管施加過度 的負荷。由此,能夠提高配管的壽命。 According to the above configuration, the irradiation part and the pipe can be moved synchronously, and therefore, the pipe is not stretched to follow the movement of the irradiation part. In other words, even when moving the irradiator, it is possible to prevent excessive Load. This can increase the life of the pipe.
上述紫外線照射裝置中,所述排氣部可進一步包括排氣箱,所述排氣箱以能移動的方式連接所述配管,並以沿著所述照射部的移動方向的方式延伸,而且具有能排出來自所述配管的熱的排氣口。 In the above ultraviolet irradiation device, the exhaust part may further include an exhaust box, which is movably connected to the pipe and extends along the moving direction of the irradiation part, and has An exhaust port that can exhaust heat from the pipe.
依據上述構成,可以使配管一邊沿著排氣箱(其以沿著照射部的移動方向的方式延伸)的長度方向移動,同時從排氣口排出來自配管的熱。由此,可穩定地進行配管的移動,並且可確保從配管至排氣口的熱的排氣通路。 According to the above configuration, the pipe can be moved along the longitudinal direction of the exhaust box (which extends along the moving direction of the irradiated portion) while discharging heat from the pipe from the exhaust port. As a result, the pipe can be moved stably, and a hot exhaust passage from the pipe to the exhaust port can be secured.
上述紫外線照射裝置中,所述排氣部可進一步包括片材,所述片材以沿著所述照射部的移動方向的方式延伸,並覆蓋所述排氣箱的內部空間,而且能隨著所述配管的移動而移動。 In the above-mentioned ultraviolet irradiation device, the exhaust part may further include a sheet that extends along the moving direction of the irradiation part, covers the internal space of the exhaust box, and can follow The movement of the pipe moves.
依據上述構成,排氣箱的內部空間被隨配管的移動而移動的片材所覆蓋,因此,可抑制來自配管的熱向外部洩漏。由此,可藉由使用了片材的簡單構成來維持來自配管的熱的排出效率。 According to the above configuration, the internal space of the exhaust box is covered by the sheet material that moves in accordance with the movement of the pipe. Therefore, it is possible to suppress the heat from the pipe from leaking to the outside. Therefore, it is possible to maintain the efficiency of discharging heat from the piping with a simple configuration using a sheet.
上述紫外線照射裝置中,所述片材可以以沿著所述照射部的移動方向的方式,從所述配管與所述排氣箱的連接部向一側和另一側延伸,並且以連接成環狀的方式藉由同一構件形成為一體。 In the above-mentioned ultraviolet irradiation device, the sheet may extend from the connection part of the pipe and the exhaust box to one side and the other side in a manner along the moving direction of the irradiation part, and be connected in a form The ring-shaped method is integrated by the same member.
依據上述構成,能夠使形成為環狀的片材在其周向上轉動。因此,與片材形成為從連接部以直線狀向一側和另一側延伸的情況相比,可減小隨配管的移動而移動的片材 的移動軌跡。因此,能夠將裝置小型化。 According to the above-mentioned configuration, the sheet formed in a ring shape can be rotated in the circumferential direction. Therefore, compared with the case where the sheet is formed to extend linearly from the connecting portion to one side and the other side, it is possible to reduce the number of sheets that move with the movement of the pipe. The movement trajectory. Therefore, the device can be miniaturized.
上述紫外線照射裝置中,所述片材可包括第一片材和第二片材,所述第一片材以沿著所述照射部的移動方向的方式、從所述配管與所述排氣箱的連接部向一側延伸,所述第二片材從所述連接部向另一側延伸,並且能與所述第一片材同步移動。 In the above-mentioned ultraviolet irradiation device, the sheet may include a first sheet and a second sheet, and the first sheet may extend from the piping to the exhaust gas along the movement direction of the irradiation unit. The connecting part of the box extends to one side, and the second sheet extends from the connecting part to the other side, and can move synchronously with the first sheet.
依據上述構成,可使第二片材與第一片材同步移動,因此,可更加穩定地進行配管的移動。 According to the above configuration, the second sheet can be moved synchronously with the first sheet, and therefore, the pipe can be moved more stably.
上述紫外線照射裝置中,所述片材可以以包圍所述內部空間的方式沿著所述排氣箱的外周而配置。 In the ultraviolet irradiation device described above, the sheet may be arranged along the outer periphery of the exhaust box so as to surround the internal space.
依據上述構成,可盡可能地減小隨配管的移動而移動的片材的移動軌跡,因此,可有效地將裝置小型化。 According to the above configuration, the movement trajectory of the sheet material that moves with the movement of the pipe can be reduced as much as possible, and therefore, the device can be effectively miniaturized.
上述紫外線照射裝置中,所述片材可以為樹脂片材。 In the above ultraviolet irradiation device, the sheet may be a resin sheet.
依據上述構成,與片材為金屬片材的情況相比,能夠實現輕質化,因此,可隨著配管的移動而使片材順利地移動。另外,由於可發揮耐氧化性,因而可抑制部件劣化、提高片材的壽命。 According to the above-mentioned structure, compared with the case where the sheet is a metal sheet, weight reduction can be achieved. Therefore, the sheet can be moved smoothly with the movement of the pipe. In addition, since oxidation resistance can be exerted, deterioration of components can be suppressed and the life of the sheet can be improved.
上述紫外線照射裝置中,所述排氣部可進一步包括張緊器(tensioner),所述張緊器能調節所述片材的張力。 In the ultraviolet irradiation device described above, the exhaust portion may further include a tensioner that can adjust the tension of the sheet.
依據上述構成,當片材隨著配管的移動而移動時,可抑制片材被過度拉伸、或過度彎曲。因此,可更加穩定地進行配管的移動。 According to the above configuration, when the sheet material moves with the movement of the pipe, it is possible to suppress the sheet material from being excessively stretched or excessively bent. Therefore, the pipe can be moved more stably.
上述紫外線照射裝置中,所述排氣部可進一步包括引導板,所述引導板以沿著所述照射部的移動方向的方式延 伸,並引導所述片材,而且形成有能使來自所述配管的熱通過的貫穿孔。 In the above-mentioned ultraviolet irradiation device, the exhaust part may further include a guide plate extending along the moving direction of the irradiation part. The sheet material is stretched and guided, and a through hole is formed through which heat from the pipe can pass.
依據上述構成,能夠在片材隨著配管的移動而移動時,一邊引導片材、一邊經由引導板的貫穿孔將來自配管的熱從排氣口排出。因此,可更加穩定地進行配管的移動,並且可確保從配管至排氣口的熱的排氣通路。 According to the above configuration, when the sheet material moves along with the movement of the pipe, the heat from the pipe can be discharged from the exhaust port through the through hole of the guide plate while guiding the sheet material. Therefore, the pipe can be moved more stably, and a hot exhaust passage from the pipe to the exhaust port can be secured.
上述紫外線照射裝置中,所述引導板中的、所述配管與所述排氣箱的連接部處的所述貫穿孔的開口面積可以為所述排氣口的面積以上。 In the above-mentioned ultraviolet irradiation device, the opening area of the through hole at the connecting portion of the pipe and the exhaust box in the guide plate may be greater than the area of the exhaust port.
依據上述構成,可在來自配管的熱(排氣)從貫穿孔通過的前後將排氣的流量維持為一定,因此,可將照射部的溫度維持為一定。由此,可使從照射部照射出的紫外線的照度分佈均勻。 According to the above configuration, the flow rate of the exhaust gas can be maintained constant before and after the heat (exhaust gas) from the pipe passes through the through hole. Therefore, the temperature of the irradiated part can be maintained constant. Thereby, the illuminance distribution of the ultraviolet rays irradiated from the irradiation unit can be made uniform.
上述紫外線照射裝置中,可以以沿著所述照射部的移動方向的方式在所述引導板中規則地配置多個所述貫穿孔。 In the ultraviolet irradiation device described above, a plurality of the through holes may be regularly arranged in the guide plate so as to be along the moving direction of the irradiation section.
依據上述構成,可在使照射部及配管同步移動的期間,將配管與排氣箱的連接部處的貫穿孔的開口面積始終維持為一定。由此,在使照射部及配管同步移動的期間,能夠將排氣的流量維持為一定,因此,能夠將照射部的溫度維持為一定。因此,能夠使從照射部照射出的紫外線的照度分佈始終均勻。 According to the above configuration, the opening area of the through hole at the connection portion of the pipe and the exhaust box can always be kept constant while the irradiation unit and the pipe are moved synchronously. As a result, the flow rate of exhaust gas can be maintained constant while the irradiation unit and the pipe are moved synchronously, and therefore, the temperature of the irradiation unit can be maintained constant. Therefore, it is possible to make the illuminance distribution of the ultraviolet rays irradiated from the irradiation part uniform at all times.
上述紫外線照射裝置中,所述排氣部可進一步包括流量調節部,所述流量調節部能基於所述照射部的溫度而調 節從所述配管及所述排氣箱的至少一部分中通過的氣體的流量。 In the above-mentioned ultraviolet irradiation device, the exhaust portion may further include a flow rate adjustment portion that can be adjusted based on the temperature of the irradiation portion. To reduce the flow rate of gas passing through at least a part of the pipe and the exhaust box.
依據上述構成,能夠以適應照射部的溫度的方式調節排氣的流量,因此,能夠使從照射部照射出的紫外線的照度分佈更加均勻。 According to the above configuration, the flow rate of exhaust gas can be adjusted to suit the temperature of the irradiation unit, and therefore, the illuminance distribution of the ultraviolet rays irradiated from the irradiation unit can be made more uniform.
上述紫外線照射裝置中,所述移動部可包括共同驅動源,所述共同驅動源能使所述照射部及所述配管同步移動。 In the above-mentioned ultraviolet irradiation device, the moving part may include a common driving source, and the common driving source can move the irradiation part and the pipe synchronously.
依據上述構成,可使照射部及配管統一移動,因此,與使照射部及配管分別獨立地移動的情況相比,能夠實現裝置構成的簡單化。 According to the above-mentioned configuration, the irradiation unit and the pipe can be moved in a unified manner. Therefore, compared with the case where the irradiation unit and the pipe are moved independently, the device configuration can be simplified.
上述紫外線照射裝置中,可進一步包括能在密閉空間內收容所述基板的收容部,所述照射部、所述排氣部及所述移動部被設置於所述收容部的外部,所述移動部使所述照射部及所述配管在所述收容部的外部同步移動。 The above-mentioned ultraviolet irradiation device may further include a housing section capable of housing the substrate in a sealed space, the irradiation section, the exhaust section, and the moving section are provided outside the housing section, and the moving The part causes the irradiation part and the pipe to move synchronously outside the housing part.
依據上述構成,可在使基板在具有密閉空間的收容部的內部靜止的狀態下,一邊在收容部的外部使照射部及配管移動一邊向收容部內部的基板照射紫外線,因此,無需考慮伴隨基板的移動而產生粒子(particle)。另外,由於在收容部的外部進行照射部及配管的移動,因而即使假設伴隨照射部及配管的移動而產生粒子,藉由使收容部為密閉空間,也能避免粒子侵入到收容部內。因此,能夠抑制在收容部內產生粒子,能夠保持基板清潔。 According to the above configuration, the substrate in the receiving section can be irradiated with ultraviolet rays while moving the irradiation section and the piping outside the receiving section while the substrate is stationary inside the receiving section with a closed space. Therefore, there is no need to consider accompanying substrates. The movement produces particles. In addition, since the irradiation unit and the piping are moved outside the accommodating section, even if particles are generated accompanying the movement of the irradiating section and the piping, by making the accommodating section a closed space, it is possible to prevent the particles from entering the accommodating section. Therefore, the generation of particles in the accommodating portion can be suppressed, and the substrate can be kept clean.
另外,藉由在使基板靜止的狀態下移動照射部及配 管,從而即使使用平面視圖尺寸比照射部及配管大的基板,與在使照射部及配管靜止的狀態下移動基板的情況相比,也可節約向基板照射紫外線時所需要的空間,可減小設置面積(footprint)。 In addition, by moving the irradiating part and the arrangement while the substrate is stationary Therefore, even if a substrate with a plan view size larger than that of the irradiation part and piping is used, compared with the case where the substrate is moved while the irradiation part and the piping are stationary, the space required for irradiating the substrate with ultraviolet rays can be saved, which can reduce Small setting area (footprint).
另外,藉由形成為使基板在收容部內靜止的狀態,從而收容部內只要確保基板的收容空間即可,因此,與使基板在收容部內移動的情況相比,可減小收容部的容積,將會容易進行收容部內的氧濃度及露點的管理。另外,可削減在調節收容部內的氧濃度時使用的氮的消耗量。 In addition, by forming the substrate in a stationary state in the accommodating part, the accommodating part only needs to ensure a accommodating space for the substrate. Therefore, compared with the case where the substrate is moved in the accommodating part, the volume of the accommodating part can be reduced. It is easy to manage the oxygen concentration and dew point in the storage area. In addition, the consumption of nitrogen used when adjusting the oxygen concentration in the storage portion can be reduced.
本發明之一態樣中的紫外線照射方法,是使用下述紫外線照射裝置的紫外線照射方法,所述紫外線照射裝置包括:照射部,所述照射部能向基板照射紫外線;和排氣部,所述排氣部具有能排出所述照射部的熱的配管,所述紫外線照射方法包括使所述照射部及所述配管同步移動的移動步驟。 The ultraviolet irradiation method in one aspect of the present invention is an ultraviolet irradiation method using the following ultraviolet irradiation device, the ultraviolet irradiation device comprising: an irradiation section capable of irradiating ultraviolet rays to the substrate; and an exhaust section, The exhaust part has a pipe capable of discharging heat from the irradiation part, and the ultraviolet irradiation method includes a moving step of synchronously moving the irradiation part and the pipe.
依據上述方法,能夠使照射部及配管同步移動,因此,配管不會以追隨照射部的移動的方式而被拉伸。也就是說,即使在移動照射部時,也能夠抑制對配管施加過度的負荷。因此,能夠提高配管的壽命。 According to the above method, the irradiation part and the pipe can be moved synchronously, and therefore, the pipe is not stretched so as to follow the movement of the irradiation part. That is, even when the irradiation unit is moved, it is possible to suppress the application of excessive load to the pipe. Therefore, the life of the pipe can be increased.
上述紫外線照射方法中,可進一步包括流量調節步驟,所述流量調節步驟基於所述照射部的溫度而調節從所述配管及排氣箱的至少一部分中通過的氣體的流量,所述排氣箱以能移動的方式連接所述配管,並以沿著所述照射部的移動方向的方式延伸,而且具有能排出來自所述配管 的熱的排氣口。 The ultraviolet irradiation method described above may further include a flow rate adjustment step that adjusts the flow rate of the gas passing through at least a part of the pipe and the exhaust box based on the temperature of the irradiating part, the exhaust box The piping is connected in a movable manner and extends along the moving direction of the irradiating part, and has the ability to discharge from the piping The hot exhaust port.
依據上述方法,能夠以適應照射部的溫度的方式調節排氣的流量,因此,能夠使從照射部照射出的紫外線的照度分佈更加均勻。 According to the above method, the flow rate of the exhaust gas can be adjusted to suit the temperature of the irradiation unit, and therefore, the illuminance distribution of the ultraviolet rays irradiated from the irradiation unit can be made more uniform.
上述紫外線照射方法中,可進一步包括能在密閉空間內收容所述基板的收容部,所述照射部及所述排氣部被設置於所述收容部的外部,所述移動步驟使所述照射部及所述配管在所述收容部的外部同步移動。 The above-mentioned ultraviolet irradiation method may further include a housing section capable of housing the substrate in a closed space, the irradiation section and the exhaust section are provided outside the housing section, and the moving step causes the irradiation The part and the pipe move synchronously outside the receiving part.
依據上述方法,可在使基板在具有密閉空間的收容部的內部靜止的狀態下,一邊在收容部的外部使照射部及配管移動一邊向收容部內部的基板照射紫外線,因此,無需考慮伴隨基板的移動而產生粒子。另外,由於在收容部的外部進行照射部及配管的移動,因而即使假設伴隨照射部及配管的移動而產生粒子,藉由使收容部為密閉空間,也能避免粒子侵入到收容部內。因此,能夠抑制在收容部內產生粒子,能夠保持基板清潔。 According to the above method, the substrate in the receiving section can be irradiated with ultraviolet rays while moving the irradiation section and the piping outside the receiving section while the substrate is stationary inside the receiving section with a closed space. Therefore, there is no need to consider accompanying substrates. The movement produces particles. In addition, since the irradiation unit and the piping are moved outside the accommodating section, even if particles are generated accompanying the movement of the irradiating section and the piping, by making the accommodating section a closed space, it is possible to prevent the particles from entering the accommodating section. Therefore, the generation of particles in the accommodating portion can be suppressed, and the substrate can be kept clean.
另外,藉由在使基板靜止的狀態下移動照射部及配管,從而即使使用平面視圖尺寸比照射部及配管大的基板,與在使照射部及配管靜止的狀態下移動基板的情況相比,也能夠節約向基板照射紫外線時所需要的空間,能夠減小佔用空間。 In addition, by moving the irradiation part and the pipe while the substrate is stationary, even if a substrate with a plan view size larger than the irradiation part and the pipe is used, compared to the case of moving the substrate while the irradiation part and the pipe are stationary. It is also possible to save the space required when irradiating ultraviolet rays to the substrate and to reduce the occupied space.
另外,藉由形成為使基板在收容部內靜止的狀態,從而收容部內只要確保基板的收容空間即可,因此,與使基板在收容部內移動的情況相比,可減小收容部的容積,將 會容易進行收容部內的氧濃度及露點的管理。另外,可削減在調節收容部內的氧濃度時使用的氮的消耗量。 In addition, by forming the substrate in a stationary state in the accommodating part, the accommodating part only needs to ensure a accommodating space for the substrate. Therefore, compared with the case where the substrate is moved in the accommodating part, the volume of the accommodating part can be reduced. It is easy to manage the oxygen concentration and dew point in the storage area. In addition, the consumption of nitrogen used when adjusting the oxygen concentration in the storage portion can be reduced.
依據本發明,可提供能夠提高將照射部的熱排出的配管的壽命的紫外線照射裝置及紫外線照射方法。 According to the present invention, it is possible to provide an ultraviolet irradiation device and an ultraviolet irradiation method that can increase the life of a pipe that discharges heat from an irradiation unit.
1‧‧‧紫外線照射裝置 1‧‧‧Ultraviolet radiation device
10‧‧‧基板 10‧‧‧Substrate
11‧‧‧加熱機構 11‧‧‧Heating mechanism
2‧‧‧腔室(收容部) 2‧‧‧ Chamber (Containment Department)
20‧‧‧頂板 20‧‧‧Top plate
20h‧‧‧開口部 20h‧‧‧Opening
21‧‧‧周壁 21‧‧‧ Zhoubi
21a‧‧‧基板搬入搬出口 21a‧‧‧PCB loading and unloading exit
22‧‧‧底板 22‧‧‧Bottom plate
23‧‧‧透射部 23‧‧‧Transmission Department
25‧‧‧升降機構 25‧‧‧Lifting mechanism
25a‧‧‧升降銷 25a‧‧‧Lift pin
25b‧‧‧驅動源 25b‧‧‧Drive source
3‧‧‧工作台 3‧‧‧Working table
31‧‧‧支架 31‧‧‧Bracket
31a‧‧‧車輪 31a‧‧‧wheel
4‧‧‧照射單元 4‧‧‧ Irradiation unit
4a‧‧‧照射面 4a‧‧‧irradiated surface
40‧‧‧照射部 40‧‧‧ Irradiation Department
41‧‧‧聚光構件 41‧‧‧Condensing component
5‧‧‧搬運機構(移動部) 5‧‧‧Transportation mechanism (moving department)
50‧‧‧引導部(驅動源) 50‧‧‧Guide (drive source)
51‧‧‧導軌 51‧‧‧Guide
52‧‧‧滑塊 52‧‧‧Slider
53‧‧‧基座 53‧‧‧Pedestal
54‧‧‧門型框 54‧‧‧Door frame
54a‧‧‧門柱部 54a‧‧‧doorpost
54b‧‧‧連結部 54b‧‧‧Connecting part
54c‧‧‧保持部 54c‧‧‧Retention Department
6‧‧‧排氣部 6‧‧‧Exhaust
60‧‧‧配管 60‧‧‧Piping
61‧‧‧排氣箱 61‧‧‧Exhaust Box
61a‧‧‧第一底壁 61a‧‧‧First bottom wall
61b‧‧‧第二底壁 61b‧‧‧Second bottom wall
61c‧‧‧側壁 61c‧‧‧Wall
61d‧‧‧引導壁 61d‧‧‧Guide Wall
61e‧‧‧第一隔壁 61e‧‧‧The first next door
61f‧‧‧第二隔壁 61f‧‧‧Second next door
61s‧‧‧內部空間 61s‧‧‧Internal space
62‧‧‧纜線支持構件 62‧‧‧Cable support member
63h‧‧‧排氣口 63h‧‧‧Exhaust port
64‧‧‧引導板 64‧‧‧Guide Board
64h‧‧‧貫穿孔 64h‧‧‧through hole
65‧‧‧可動部(連接部) 65‧‧‧Moving part (connecting part)
65a‧‧‧基座部 65a‧‧‧Base
65b‧‧‧主體部 65b‧‧‧Main body
65c‧‧‧連接部 65c‧‧‧Connecting part
68‧‧‧流量調節部 68‧‧‧Flow control section
7‧‧‧氣體供給部 7‧‧‧Gas Supply Department
70‧‧‧片材 70‧‧‧Sheet
70a‧‧‧一端部 70a‧‧‧One end
70b‧‧‧另一端部 70b‧‧‧The other end
71~76‧‧‧第一輥~第六輥 71~76‧‧‧The first roll ~ the sixth roll
77‧‧‧第一罩蓋 77‧‧‧First cover
78‧‧‧第二罩蓋 78‧‧‧Second cover
79‧‧‧張緊器 79‧‧‧Tensioner
8‧‧‧控制部 8‧‧‧Control Department
170A‧‧‧第一片材 170A‧‧‧First sheet
170B‧‧‧第二片材 170B‧‧‧Second sheet
S1‧‧‧排氣口的面積 S1‧‧‧Exhaust area
S2‧‧‧貫穿孔的開口面積 S2‧‧‧The opening area of the through hole
〔圖1〕為實施方式中之紫外線照射裝置的立體圖。 [Fig. 1] is a perspective view of the ultraviolet irradiation device in the embodiment.
〔圖2〕為實施方式中之紫外線照射裝置的俯視圖。 [Fig. 2] is a plan view of the ultraviolet irradiation device in the embodiment.
〔圖3〕為包含圖2的III-III剖視圖之實施方式中之紫外線照射裝置的側視圖。 [FIG. 3] is a side view of the ultraviolet irradiation device in the embodiment including the III-III cross-sectional view of FIG. 2.
〔圖4〕為實施方式中之排氣部的立體圖。 [Figure 4] is a perspective view of the exhaust part in the embodiment.
〔圖5〕為實施方式中之排氣部的俯視圖。 [Figure 5] is a plan view of the exhaust part in the embodiment.
〔圖6〕為包含圖5的VI-VI剖面之實施方式中之排氣部的側視圖。 [Fig. 6] is a side view of the exhaust portion in the embodiment including the VI-VI cross section of Fig. 5.
〔圖7〕為圖5的VII-VII剖視圖。 [Fig. 7] is a cross-sectional view taken along the line VII-VII in Fig. 5.
〔圖8〕為圖6的VIII-VIII剖視圖。 [Fig. 8] is a cross-sectional view taken along the line VIII-VIII in Fig. 6.
〔圖9〕是顯示實施方式中之排氣部的變形例的側視圖。 [Fig. 9] is a side view showing a modification of the exhaust part in the embodiment.
〔圖10〕是顯示實施方式中之排氣部的另一變形例的側視圖。 [Fig. 10] is a side view showing another modification of the exhaust portion in the embodiment.
以下,參照附圖來說明本發明的實施方式。在以下的說明中,設定XYZ直角坐標系,參照該XYZ直角坐標系對各構件的位置關係進行說明。將水平面內的規定方向作為X方向,將在水平面內與X方向垂直的方向作為Y方向,將與X方向及Y方向分別垂直的方向(即鉛垂方向)作為Z方向。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following description, an XYZ rectangular coordinate system is set, and the positional relationship of each member will be described with reference to the XYZ rectangular coordinate system. Let the predetermined direction in the horizontal plane be the X direction, the direction perpendicular to the X direction in the horizontal plane be the Y direction, and the directions perpendicular to the X direction and the Y direction (that is, the vertical direction) are the Z direction.
圖1為實施方式中之紫外線照射裝置1的立體圖。圖2為實施方式中之紫外線照射裝置1的俯視圖。圖3為包含圖2的III-III剖視圖之實施方式中之紫外線照射裝置的側視圖。
Fig. 1 is a perspective view of an
如圖1~圖3所示,紫外線照射裝置1是針對基板10進行紫外線照射的裝置。紫外線照射裝置1具有腔室(chamber)2(收容部)、工作台(stage)3、照射單元4、搬運機構5(移動部)、排氣部6、氣體供給部7及控制部8。控制部8總括控制紫外線照射裝置1的構成要素。
As shown in FIGS. 1 to 3, the
腔室2收容進行紫外線的照射處理的基板10。腔室2形成為箱狀,在俯視下成為矩形。具體而言,腔室2由下述要素形成:頂板20,所述頂板20覆蓋基板10的上方,為矩形板狀;周壁21,所述周壁21以包圍方式覆蓋
基板10的側面,為矩形框狀;和底板22,所述底板22覆蓋基板10的下方。在周壁21的-Y方向側,設置有基板搬入搬出口21a,所述基板搬入搬出口21a用於將基板10搬入腔室2及從腔室2搬出。
The
例如,頂板20、周壁21及底板22由遮擋紫外線的遮光構件形成。由此,可避免在向腔室2的內部的基板10照射紫外線時,紫外線透出至腔室2的外部。
For example, the
腔室2構成為能在密閉空間內收容基板10。例如,藉由利用焊接等將頂板20、周壁21及底板22的各連接部無縫連接,可提高腔室2內的氣密性。例如,可在腔室2中設置泵機構等減壓機構(未圖示)。由此,可在使腔室2內減壓的狀態下收容基板10。
The
如圖3所示,可在腔室2內設置對基板10進行加熱的加熱機構11。加熱機構11具有與基板10大致相同的平面視圖尺寸的矩形板狀,以從下方支援基板10的方式被配置。加熱機構11被安裝於工作台3。加熱機構11包括加熱器等(未圖示)。
As shown in FIG. 3, a
如圖2所示,在腔室2的頂板20上設置有可透射紫外線的透射部23。透射部23構成頂板20的一部分。透射部23形成為在俯視下比頂板20小的矩形板狀。透射部23被安裝於矩形的開口部20h,所述開口部20h使頂板20沿厚度方向開口。例如,透射部23使用石英、耐熱玻璃、樹脂片材、樹脂膜等。
As shown in FIG. 2, a
透射部23的尺寸被設定為大於基板10的尺寸。由
此,在向基板10照射紫外線時,可避免紫外線被頂板20的遮光部(透射部23以外的部分)遮擋,因此,可向基板10的上表面整體均勻地照射紫外線。
The size of the
需要說明的是,開口部20h的尺寸可被設定為能放入取出基板10的尺寸。另外,透射部23也可裝卸自如地被嵌入到開口部20h中。由此,在將透射部23嵌入開口部20h時,可使得腔室2內成為密閉空間,在從開口部20h拆卸下透射部23時,可將基板10放入到腔室2內或從腔室2內取出。
It should be noted that the size of the
工作台3由上表面支持腔室2及搬運機構5。工作台3形成為在Z方向上具有厚度的板狀。
The
工作台3被支架31從下方支持。
The
支架31是將多根鋼材等的棱柱組合成格子狀而形成的。
The
需要說明的是,在支架31的下端部,旋轉自如地安裝有多個車輪31a。由此,可使支架31在XY平面內自如地移動。
It should be noted that a plurality of
如圖3所示,在腔室2的下方,設置有升降機構25,所述升降機構25能使基板10沿Z方向移動。在升降機構25上設置有多個升降銷(lift pin)25a。多個升降銷
25a的頂端(+Z側的端部)被配置在與XY平面平行的同一面內。
As shown in FIG. 3, below the
多個升降銷25a的頂端被設置為能插通工作台3、底板22及加熱機構11。
The top ends of the plurality of
具體而言,在工作台3上形成有多個插通孔3a,所述多個插通孔3a使工作台3沿厚度方向開口。在底板22上形成有多個插通孔22a,所述多個插通孔22a在平面視圖中位於與各插通孔3a重合的位置,使底板22沿厚度方向開口。在加熱機構11中形成有多個插通孔11a,所述多個插通孔11a在平面視圖中位於與各插通孔22a重合的位置,使加熱機構11沿厚度方向開口。多個升降銷25a的頂端被設置為能經由各插通孔3a、22a、11a而與基板10的下表面抵接及遠離。因此,藉由多個升降銷25a的頂端,從而按照與XY平面平行的方式支撐基板10。
Specifically, a plurality of
升降機構25支持被收容在腔室2內的基板10並使其沿腔室2內的Z方向移動。圖3中,多個升降銷25a的頂端經由各插通孔3a、22a、11a與基板10的下表面抵接,並使所述基板10上升,由此,呈現出使基板10從加熱機構11離開的狀態。
The
需要說明的是,升降機構25中,在腔室2的外部配置驅動源25b,所述驅動源25b使多個升降銷25a升降。因此,即使假設伴隨驅動源25b的驅動而產生粒子,藉由使腔室2為密閉空間,也能避免粒子侵入到腔室2內。
It should be noted that, in the elevating
照射單元4被設置在腔室2的外部。照射單元4具有照射部40及聚光構件41。
The
照射部40構成為,能向基板10照射i線等紫外線。
The
此處,“紫外線”是指,波長範圍的下限為1nm左右、上限為可見光線的短波長端的光。 Here, "ultraviolet rays" means light whose lower limit of the wavelength range is about 1 nm and the upper limit of the short wavelength end of visible rays.
例如,照射部40使用金屬鹵化物燈。
For example, the
需要說明的是,照射部40不限於此,也可使用高壓水銀燈、LED燈。另外,對於照射部40而言,也可組合多種上述燈。
It should be noted that the
例如,可在照射部40的下表面設置濾光器,所述濾光器阻隔波長低於300nm的成分。由此,通過濾光器而射出的紫外線的波長成為300nm以上,因此,可抑制因紫外線的照射而導致基板10溫度過度升高。
For example, a filter may be provided on the lower surface of the irradiating
聚光構件41將從照射部40射出的紫外線聚光至基板10上。通過使紫外線在基板10上聚光,可抑制從照射部40射出的紫外線擴散至基板10的外部,因此,可提高照度。
The condensing
如圖1及圖2所示,搬運機構5被設置在腔室2的外部。搬運機構5使照射單元4在腔室2的外部移動,以使得從腔室2的外部向被收容在腔室2內部的基板10照射紫外線。搬運機構5具有引導部50、基座53及門型框
54。搬運機構5構成為能使照射部40、和排氣部6的配管60同步移動。
As shown in FIGS. 1 and 2, the
引導部50具有一對導軌51、和滑塊(slider)52。例如,引導部50使用直線電動機驅動器。引導部50為能使照射部40、和排氣部6的配管60同步移動的共同驅動源。引導部50相當於請求項中記載的“驅動源”。
The
一對導軌51以從-Y方向側及+Y方向側夾隔腔室2的方式沿作為照射單元4的移動方向(照射部40的移動方向)的X方向延伸。
The pair of
滑塊52構成為能沿一對導軌51滑動。
The
基座53被設置在工作台3的四角,且設置多個(例如本實施方式中在四角各一個共計四個)。各基座53支持一對導軌51的X方向兩端部。
The
門型框54以在Y方向上跨越腔室2的方式形成為門型,並且被設置為能沿一對導軌51移動。門型框54具有沿Z方向延伸的一對門柱部54a、和以連結一對門柱部54a之間的方式沿Y方向延伸的連結部54b。在門型框54的各門柱部54a的下端部,安裝滑塊52。
The
如圖3所示,在門型框54的連結部54b的內部,設置有保持照射單元4的保持部54c。保持部54c形成從門型框54的Y方向中間部的下表面向上方凹陷的凹部。照射單元4中除照射面4a(下表面)之外的部分被保持部54c的凹部包圍,被門型框54的壁部被覆。例如,門型框54由遮擋紫外線的遮光構件形成。由此,在從照射單
元4照射紫外線時,能夠避免紫外線向門型框54的側面擴散,能夠朝向下方(腔室2內的基板10)照射紫外線。
As shown in FIG. 3, in the inside of the
如圖2所示,在X方向上,各導軌51的長度L1比腔室2的長度L2長(L1>L2)。本實施方式中,在X方向上,使各導軌51的長度L1比腔室2的長度L2、及門型框54的2倍長度(2×L3)加和的長度(L2+2×L3)更長。由此,俯視圖中,可使照射單元4從超出腔室2的-X方向端的區域移動至超出腔室2的+X方向端的區域。
As shown in Fig. 2, in the X direction, the length L1 of each
在腔室2中設置有氣體供給部7,所述氣體供給部7能調節腔室2的內部環境氣氛的狀態。氣體供給部7供給作為乾燥氣體的氮(N2)、氦(He)、氬(Ar)等非活性氣體。
A
通過氣體供給部7,可調節腔室2的內部環境氣氛的露點,可調節腔室2內的水分濃度。
The
例如,氣體供給部7調節乾燥氣體的供給,以將腔室2的內部環境氣氛的露點調節為-80℃(水分濃度在0.54ppm質量基準下)以上且為-5℃(水分濃度在4000ppm質量基準下)以下。
For example, the
例如,在將抗蝕劑膜的曝光後的預圖案(prepattern)固化時的氣氛中,藉由如上所述使露點設在該理想的上限以下,可使得圖案的固化容易進行。另一方面,藉由使 露點設在該理想的下限以上,可提高運用裝置方面的作業性等。 For example, in the atmosphere at the time of curing a prepattern after exposure of the resist film, by setting the dew point to be below the ideal upper limit as described above, the curing of the pattern can be facilitated. On the other hand, by making Setting the dew point above the ideal lower limit can improve the workability of the operating device.
另外,藉由氣體供給部7,也可調節腔室2的內部環境氣氛的氧濃度。腔室2的內部環境氣氛的氧濃度(以品質為基準)越低越好。具體而言,優選使腔室2的內部環境氣氛的氧濃度為1000ppm以下,更優選使腔室2的內部環境氣氛的氧濃度為500ppm以下。
In addition, the
例如,在將抗蝕劑膜的曝光後的預圖案固化時的氣氛中,藉由如上所述使氧濃度設為該理想的上限以下,可使得圖案的固化容易進行。 For example, in the atmosphere at the time of curing the pre-pattern after exposure of the resist film, by setting the oxygen concentration to be the ideal upper limit or less as described above, the pattern can be easily cured.
圖4為實施方式中之排氣部6的立體圖。圖5為實施方式中之排氣部6的俯視圖。圖6為包含圖5的VI-VI剖面之實施方式中之排氣部6的側視圖。圖7為圖5的VII-VII剖視圖。圖8為圖6的VIII-VIII剖視圖。需要說明的是,在圖5及圖8中,為了便於說明,省略了片材70的圖示。
FIG. 4 is a perspective view of the
如圖1所示,排氣部6被設置於腔室2的外部。排氣部6被配置在工作台3的+Y方向側。排氣部6具有配管60和排氣箱61,所述配管60能排出照射單元4(照射部40)的熱,所述排氣箱61以能移動的方式連接配管60。
As shown in FIG. 1, the
雖然未進行圖示,但在腔室2的外部設置有能將照射單元4冷卻的冷卻部。例如,冷卻部被安裝於門型框54
的側壁部(門柱部54a)。例如,冷卻部使用鼓風機。由此,能夠經由排氣部6(具體而言,配管60及排氣箱61)將由照射單元4產生的熱氣向外部排放。
Although not shown in the figure, a cooling part capable of cooling the
如圖1及圖4所示,配管60為筒狀構件,所述筒狀構件以跨越門型框54的+Y方向側的側壁部(門柱部54a)與後述的可動部65之間的方式延伸。配管60呈L字狀彎曲。配管60的一端部60a(-Y方向側的端部)被固定於門型框54的+Y方向側的側壁部(門柱部54a)。配管60的另一端部60b(-Z方向側的端部)被固定於後述的可動部65。由此,配管60能與照射部40一同在腔室2的外部沿X方向移動。
As shown in FIGS. 1 and 4, the
需要說明的是,配管60的一端部60a可拆卸地連接於門型框54的+Y方向側的側壁部。由此,可提高配管60的一端部60a的維護性。
It should be noted that one
如圖2及圖4所示,排氣箱61沿作為照射單元4的移動方向(照射部40的移動方向)的X方向延伸。排氣箱61具有排氣口63h,所述排氣口63h能將來自配管60的熱排放到外部。在X方向上,排氣箱61的長度L4為與各導軌51的長度L1實質上相同的長度(L4L1)。
As shown in FIGS. 2 and 4, the
如圖5~圖7所示,排氣箱61具有第一底壁61a、第
二底壁61b、一對側壁61c、一對引導壁61d、第一隔壁61e及第二隔壁61f。
As shown in Figures 5 to 7, the
第一底壁61a在Z方向上具有厚度,並沿X方向延伸。
The first
第二底壁61b配置在比第一底壁61a更靠-Z方向側的位置,並具有與第一底壁61a實質上相同的形狀。
The second
一對側壁61c在Y方向上具有厚度,並沿X方向延伸,而且,自第二底壁61b的Y方向兩端部沿+Z方向豎立從而將第一底壁61a與第二底壁61b的Y方向端部間連接,然後進一步沿+Z方向延伸。
The pair of
一對引導壁61d在Z方向上具有厚度,並沿X方向延伸,而且向一對側壁61c的上端部的Y方向間的內側突出。
The pair of
第一隔壁61e在X方向上具有厚度,並以跨越第一底壁61a及一對側壁61c的+X方向側的端部間的方式進行配置。即,第一隔壁61e自+X方向側將排氣箱61的內部空間61s密閉。
The
第二隔壁61f以在X方向上隔開排氣箱61的長度L4(參見圖2)程度的間隔的方式與第一隔壁61e對置。第二隔壁61f具有與第一隔壁61e實質上相同的形狀,並以跨越第一底壁61a及一對側壁61c的-X方向側的端部間的方式進行配置。即,第二隔壁61f自-X方向側將排氣箱61的內部空間61s密閉。
The
需要說明的是,排氣箱61的內部空間61s是由第一
底壁61a、一對側壁61c、第一隔壁61e、第二隔壁61f及後述的引導板64所包圍的空間。
It should be noted that the
如圖6及圖7所示,在第一底壁61a與第二底壁61b之間形成有能使片材70沿X方向移動的底壁側空間61t。底壁側空間61t在Z方向上的間隔比片材70的厚度大。即,底壁側空間61t在Z方向上的間隔被設定為能使片材70在第一底壁61a與第二底壁61b之間順利地移動的大小。
As shown in FIGS. 6 and 7, between the
如圖5及圖6所示,一對引導壁61d以能滑動的方式支援可動部65(其支持配管60)。一對引導壁61d的Y方向間的間隔大於形成於後述的引導板64中的貫穿孔64h的形成區域的Y方向上的長度。
As shown in FIGS. 5 and 6, the pair of
在一對側壁61c中的+Y方向側的壁部固定有形成排氣口63h的圓筒狀排氣管63。排氣管63與排氣箱61的內部空間61s連通。
A
如圖4所示,在排氣箱61的下部設置有纜線支持構件62。例如,纜線支持構件62為CABLE BEAR(註冊商標)。在纜線支持構件62上引導有未圖示的電源線等纜線(cable)。由此,能夠以將纜線彎曲的狀態驅動排氣部6。
As shown in FIG. 4, a
如圖4及圖6所示,排氣部6進一步具有片材70,所述片材70覆蓋排氣箱61的內部空間61s。片材70以沿
著作為照射單元4的移動方向(照射部40的移動方向)的X方向的方式延伸。片材70構成為能隨著配管60的移動而移動。
As shown in FIGS. 4 and 6, the
具體而言,片材70以沿著作為照射單元4的移動方向(照射部40的移動方向)的X方向的方式、從作為配管60與排氣箱61的連接部的可動部65向一側(-X方向側)和另一側(+X方向側)延伸,並且以連接成環狀的方式藉由同一構件形成為一體。片材70是以包圍內部空間61s的方式沿著排氣箱61的外周而配置的。例如,片材70為樹脂片材。
Specifically, the
如圖5及圖6所示,排氣部6具有卷掛片材70的多個(例如,在本實施方式中為六個)輥(具體而言,第一輥71、第二輥72、第三輥73、第四輥74、第五輥75及第六輥76)。片材70在排氣箱61的+X方向側被卷掛在兩個輥(具體而言,第一輥71及第二輥72)上。片材70在排氣箱61的-X方向側被卷掛在四個輥(具體而言,第三輥73、第四輥74、第五輥75及第六輥76)上。
As shown in FIGS. 5 and 6, the
排氣部6進一步具有第一罩蓋77及第二罩蓋78。
The
第一罩蓋77覆蓋第一輥71及第二輥72,並且旋轉自如地支持第一輥71及第二輥72。第一罩蓋77形成為朝-X方向側開口的箱狀,並且被可拆卸地安裝於排氣箱61的各壁(具體而言,第二底壁61b、一對側壁61c及一對引導壁61d)的+X方向側的端部。由此,可提高第一罩蓋77的內部(例如,第一輥71及第二輥72)的維護
性。
The
第二罩蓋78覆蓋第三輥73、第四輥74、第五輥75及第六輥76,並且旋轉自如地支持第三輥73、第四輥74、第五輥75及第六輥76。第二罩蓋78形成為朝+X方向側開口的箱狀,並且被可拆卸地安裝於排氣箱61的各壁(具體而言,第二底壁61b、一對側壁61c及一對引導壁61d)的-X方向側的端部。由此,可提高第二罩蓋78的內部(例如,第三輥73、第四輥74、第五輥75及第六輥76)的維護性。
The
排氣部6進一步具有張緊器79,所述張緊器79能調節片材70的張力。張緊器79被配置于第二罩蓋78的Y方向兩側部。張緊器79能使位於第四輥74與第六輥76之間的第五輥75靠近及遠離以在X方向上隔開間隔的方式排列的第四輥74及第六輥76。例如,在使第五輥75靠近第四輥74及第六輥76的情況下,可減弱片材70的張力。另一方面,在使第五輥75遠離第四輥74及第六輥76的情況下,可增強片材70的張力。
The
如圖5及圖6所示,可動部65具有基座部65a、主體部65b、連接部65c及一對引導片65d。
As shown in FIGS. 5 and 6, the
如圖6所示,基座部65a被配置在後述的引導板64
與引導壁61d之間。基座部65a在Z方向上具有厚度,並且在俯視下成為矩形框狀。即,在基座部65a中以在Z方向上開口的方式形成有貫通孔65h(其能使來自配管60的熱通過)。貫通孔65h經由引導板64的貫穿孔64h而與排氣箱61的內部空間61s連通。
As shown in FIG. 6, the
主體部65b連接於基座部65a中的貫通孔65h的周邊部。在圖6的剖面視圖中,主體部65b成為以越朝向+Z方向側、開口面積越小的方式在Z方向上延伸的筒狀。
The
連接部65c成為從主體部65b向+Z方向延伸的圓筒狀。在連接部65c上可拆卸地連接有配管60的另一端部60b(參見圖4)。由此,可提高配管60的另一端部60b及連接部65c的維護性。
The connecting
一對引導片65d從主體部65b向Y方向兩側延伸,並且以沿著引導壁61d的方式在X方向上延伸。一對引導片65d以在它們與基座部65a的Y方向兩端部之間夾持引導壁61d的方式進行配置。
The pair of
在基座部65a的+X方向側的端部設置有第一鎖定部66,所述第一鎖定部66可拆卸地鎖定片材70的一端部70a。在基座部65a的-X方向側的端部設置有第二鎖定部67,所述第二鎖定部67可拆卸地鎖定片材70的另一端部70b。
A
以下,對片材70的配置方法的一個例子進行說明。首先,將片材70的一端部70a經由第一鎖定部66鎖定在基座部65a的+X方向側的端部。然後,將片材70卷掛於
第一輥71及第二輥72。然後,在將片材70從另一端部70b側通過底壁側空間61t之後,將其卷掛於第三輥73、第四輥74、第五輥75及第六輥76。然後,將片材70的另一端部70b經由第二鎖定部67鎖定在基座部65a的-X方向的端部。然後,藉由張緊器79調節片材70的張力。藉由上述方式,片材70經由可動部65連接成環狀,並且被配置為包圍內部空間61s。
Hereinafter, an example of the arrangement method of the
如圖6所示,排氣部6進一步具有引導板64,所述引導板64引導片材70。引導板64在Z方向上具有厚度,並且沿作為照射單元4的移動方向(照射部40的移動方向)的X方向延伸。在引導板64中形成有能使來自配管60的熱通過的貫穿孔64h。
As shown in FIG. 6, the
如圖5所示,在俯視下,貫穿孔64h形成為圓形。沿作為照射單元4的移動方向(照射部40的移動方向)的X方向和Y方向,在引導板64中規則地配置有多個貫穿孔64h。例如,引導板64為沖孔金屬(punching rmetal)。
As shown in FIG. 5, in a plan view, the through
如圖6及圖8所示,引導板64中的、配管60與排氣箱61的連接部(即可動部65)處的貫穿孔64h的開口面積S2為排氣口63h的面積S1以上。此處,所謂貫穿孔64h的開口面積S2,是指形成於引導板64整體中的貫穿孔64h中的、僅在俯視下從貫通孔65h露出的貫穿孔64h
的開口面積。所謂排氣口63h的面積S1,是指排氣管63的開口面積。
As shown in FIGS. 6 and 8, the opening area S2 of the through
需要說明的是,為了便於說明,圖8中省略了一對引導片65d等的圖示。
It should be noted that, for convenience of description, the illustration of a pair of
如圖4所示,排氣部6進一步具有流量調節部68,所述流量調節部68能基於照射部40(參見圖1)的溫度而調節從配管60的至少一部分中通過的氣體的流量。流量調節部68被設置于配管60上。例如,流量調節部68為流量調節閥。
As shown in FIG. 4, the
接下來,說明本實施方式中之紫外線照射方法。本實施方式中,使用上述紫外線照射裝置1向基板10照射紫外線。由紫外線照射裝置1的各部分進行的動作可藉由控制部8進行控制。
Next, the ultraviolet irradiation method in this embodiment will be explained. In this embodiment, the above-mentioned
本實施方式中之紫外線照射方法包括收容步驟、照射步驟及移動步驟。 The ultraviolet irradiation method in this embodiment includes a storing step, an irradiation step, and a moving step.
收容步驟中,腔室2在密閉空間內收容基板10。例如,經由基板搬入搬出口21a將基板10搬運到腔室2內,然後關閉基板搬入搬出口21a而將腔室2密閉。
In the storing step, the
照射步驟中,照射單元4向基板10照射紫外線。
In the irradiation step, the
移動步驟中,搬運機構5使照射單元4在腔室2的外
部移動,以使得從腔室2的外部向收容在腔室2內部的基板10照射紫外線。
In the moving step, the
移動步驟中,使照射單元4及配管60同步移動。移動步驟中,使照射單元4在腔室2的外部移動,以使得經由透射部23向腔室2內部的基板10照射紫外線。如上所述,由於在門型框54的+Y方向側的側壁部安裝有配管60,因而在移動步驟中使配管60與照射單元4一同在腔室2的外部移動。
In the moving step, the
移動步驟中,使照射單元4在一對導軌51的-X方向端(一端)與+X方向端(另一端)之間往復移動。例如,圖3的俯視圖中,使照射單元4從超出腔室2的-X方向端的區域至超出腔室2的+X方向端的區域往復移動。
In the moving step, the
本實施方式中之紫外線照射方法進一步包括流量調節步驟。 The ultraviolet irradiation method in this embodiment further includes a flow adjustment step.
流量調節步驟中,流量調節部68基於照射部40的溫度而調節從配管60的至少一部分中通過的氣體的流量。
In the flow rate adjustment step, the flow
需要說明的是,本實施方式中之紫外線照射方法進一步包括氣體供給步驟。 It should be noted that the ultraviolet irradiation method in this embodiment further includes a gas supply step.
氣體供給步驟中,氣體供給部7調節腔室2的內部環境氣氛的露點。另外,氣體供給步驟中,氣體供給部7調節腔室2的內部環境氣氛的氧濃度。
In the gas supply step, the
如上所述,依據本實施方式,能夠使照射部及配管60同步移動,因此,配管60不會以追隨照射部40的移
動的方式而被拉伸。也就是說,即使在移動照射部40時,也能夠抑制對配管60施加過度的負荷。由此,能夠提高配管60的壽命。
As described above, according to this embodiment, the irradiation unit and the
另外,排氣部6進一步包括排氣箱61,所述排氣箱61以能移動的方式連接配管60,並以沿著照射部40的移動方向的方式延伸,而且具有能排出來自配管60的熱的排氣口63h,由此,可一邊沿排氣箱61(其以沿著照射部40的移動方向的方式延伸)的長度方向移動配管60,一邊從排氣口63h排出來自配管60的熱。因此,可穩定地進行配管60的移動,並且可確保從配管60至排氣口63h的熱的排氣通路。
In addition, the
另外,排氣部6進一步包括片材70,所述片材70以沿著照射部40的移動方向的方式延伸,並且覆蓋排氣箱61的內部空間61s,而且能隨著配管60的移動而移動,由此,排氣箱61的內部空間61s被隨配管60的移動而移動的片材70所覆蓋,因此,可抑制來自配管60的熱向外部洩漏。由此,可藉由使用了片材70的簡單構成來維持來自配管60的熱的排出效率。
In addition, the
另外,片材70以沿著照射部40的移動方向的方式、從作為配管60與排氣箱61的連接部的可動部65向一側和另一側延伸,並且以連接成環狀的方式藉由同一構件形成為一體,由此,能夠使形成為環狀的片材70在其周方向上轉動。因此,與片材70形成為從可動部65以直線狀向一側和另一側延伸的情況相比,可減小隨配管60的移
動而移動的片材70的移動軌跡。因此,能夠將裝置小型化。
In addition, the
另外,片材70是以包圍內部空間61s的方式沿著排氣箱61的外周而配置的,由此,可盡可能地減小隨配管60的移動而移動的片材70的移動軌跡,因此,可有效地將裝置小型化。
In addition, the
另外,藉由使片材70為樹脂片材70,從而獲得以下效果。與片材70為金屬片材70的情況相比,能夠實現輕質化,因此,能夠隨著配管60的移動而使片材70順利地移動。另外,由於可發揮耐氧化性,因而能夠抑制部件劣化、提高片材70的壽命。
In addition, by making the
另外,排氣部6進一步包括張緊器79,所述張緊器79能調節片材70的張力,由此,當片材70隨著配管60的移動而移動時,可抑制片材70被過度拉伸、或過度彎曲。因此,可更加穩定地進行配管60的移動。
In addition, the
另外,排氣部6進一步包括引導板64,所述引導板64以沿著照射部40的移動方向的方式延伸,並且引導片材70,而且形成有能使來自配管60的熱通過的貫穿孔64h,由此,能夠在片材70隨著配管60的移動而移動時,一邊引導片材70、一邊經由引導板64的貫穿孔64h將來自配管60的熱從排氣口63h排出。因此,可更加穩定地進行配管60的移動,並且可確保從配管60至排氣口63h的熱的排氣通路。
In addition, the
另外,藉由使引導板64之中,作為配管60與排氣箱
61的連接部的可動部65處的貫穿孔64h的開口面積S2為排氣口63h的面積以上,從而能夠在來自配管60的熱(排氣)從貫穿孔64h通過的前後將排氣的流量維持為一定,因此,能夠將照射部40的溫度維持為一定。由此,能夠使從照射部40照射出的紫外線的照度分佈均勻。
In addition, by using the
另外,藉由以沿著照射部40的移動方向的方式在引導板64中規則地配置多個貫穿孔64h,從而可在使照射部40及配管60同步移動的期間,將作為配管60與排氣箱61的連接部的可動部65處的貫穿孔64h的開口面積S2始終維持為一定。由此,在使照射部40及配管60同步移動的期間,能夠將排氣的流量維持為一定,因此,能夠將照射部40的溫度維持為一定。因此,能夠使從照射部40照射出的紫外線的照度分佈始終均勻。
In addition, by regularly arranging a plurality of through
另外,排氣部6進一步包括流量調節部68,所述流量調節部68能基於照射部40的溫度而調節從配管60的至少一部分中通過的氣體的流量,由此,能夠以適應照射部40的溫度的方式調節排氣的流量,因此,能夠使從照射部40照射出的紫外線的照度分佈更加均勻。
In addition, the
另外,搬運機構5包括作為能使照射部40及配管60同步移動的共同驅動源的引導部50,由此,能夠使照射部40及配管60統一移動,因此,與使照射部40及配管60分別獨立地移動的情況相比,能夠實現裝置構成的簡單化。
In addition, the
另外,紫外線照射裝置1進一步具有能在密閉空間內
收容基板10的腔室2,照射部40、排氣部6及搬運機構5被設置於腔室2的外部,搬運機構5使照射部40及配管60在腔室2的外部同步移動,由此獲得以下的效果。
In addition, the
由於可在使基板10在具有密閉空間的腔室2的內部靜止的狀態下,一邊在腔室2的外部使照射部40及配管60移動一邊向腔室2內部的基板10照射紫外線,因而無需考慮伴隨基板10的移動而產生粒子。另外,由於在腔室2的外部進行照射部40及配管60的移動,因而即使假設伴隨照射部40及配管60的移動而產生粒子,藉由使腔室2為密閉空間,也能避免粒子侵入到腔室2內。因此,能夠抑制在腔室2內產生粒子,能夠保持基板10清潔。
Since the
另外,藉由在使基板10靜止的狀態下移動照射部40及配管60,從而即使使用平面視圖尺寸比照射部40及配管60大的基板10,與在使照射部40及配管60靜止的狀態下移動基板10的情況相比,也能夠節約向基板10照射紫外線時所需要的空間,能夠減小佔用空間。
In addition, by moving the
另外,藉由使基板10在腔室2內形成為靜止的狀態,從而腔室2內只要確保基板10的收容空間即可,因此,與使基板10在腔室2內移動的情況相比,可減小腔室2的容積,將會容易進行腔室2內的氧濃度及露點的管理。另外,可削減在調節腔室2內的氧濃度時使用的氮的消耗量。
In addition, by forming the
另外,藉由在腔室2內設置可透射紫外線的透射部23,從而可通過使用了透射部23的簡單構成,經由透射
部23向基板10照射紫外線。
In addition, by providing the
另外,藉由使腔室2包括覆蓋基板10上方的頂板20,並且在頂板20上設置透射部23,從而可利用在腔室2的頂板20上設置有透射部23的簡單構成,經由透射部23向基板10照射紫外線。另外,藉由在腔室2的一部分中設置透射部23,從而與在腔室2整體中設置透射部的情況相比,可提高透射部23的維護性。
In addition, by making the
另外,搬運機構5包括一對導軌51(引導部50)和門型框54,所述一對導軌51以夾隔腔室2的方式沿照射單元4的移動方向延伸,所述門型框54以跨越腔室2的方式形成為門型、並且被設置為能沿一對導軌51移動,而且在門型框54上設置有保持照射單元4的保持部54c,由此,與一般的沿導軌移動照射單元4的情況相比,可利用具有高剛性的門型框54使照射單元4沿一對導軌51移動,因此,可穩定地進行照射單元4的移動。
In addition, the
另外,藉由在腔室2的外部設置能將照射單元4冷卻的冷卻部(未圖示),可將照射單元4冷卻,因此,即使在向基板10連續照射紫外線等時連續驅動照射單元4的情況下,也能夠抑制照射單元4過熱。
In addition, by providing a cooling part (not shown) capable of cooling the
另外,藉由在腔室2內設置能調節腔室2的內部環境氣氛的氧濃度及露點的氣體供給部7,從而可將腔室2的內部環境氣氛的氧濃度調節為規定的濃度,因此,可在規定的氧濃度的條件下向基板10照射紫外線。另外,可將腔室2的內部環境氣氛的露點調節為規定的露點,因此,
可在規定的露點的條件下向基板10照射紫外線。
In addition, by providing a
另外,移動步驟中,藉由使照射單元4在一對導軌51的-X方向端(一端)與+X方向端(另一端)之間往復移動,從而與使照射單元4在一對導軌51的一端與另一端之間僅沿一個方向移動的情況相比,即使在向基板10反復照射紫外線時,也能夠順利且高效地照射。另外,由於設置一個照射單元4即足矣,因此,可實現裝置構成的簡單化。
In addition, in the moving step, by reciprocating the
接下來,使用圖9及圖10,對實施方式的變形例進行說明。 Next, a modification example of the embodiment will be described using FIGS. 9 and 10.
圖9為示出實施方式中之排氣部的變形例的側視圖。需要說明的是,在圖9中省略了排氣箱61的各壁、引導板64等的圖示。
Fig. 9 is a side view showing a modification of the exhaust portion in the embodiment. It should be noted that the illustrations of the walls of the
如圖9所示,相對於實施方式,本變形例在片材170具有第一片材170A及第二片材170B方面是特別不同的。圖9中,對與實施方式同樣的構成標注同一符號,並省略其詳細說明。
As shown in FIG. 9, this modification is particularly different from the embodiment in that the
如圖9所示,第一片材170A以沿著照射部40的移動方向的方式,從作為配管60與排氣箱61的連接部的可動部65向一側(+X方向側)延伸。第一片材170A的一端部的一側捲繞於第一驅動輥171。第一片材170A的另一端部經由第一鎖定部66而被鎖定在基座部65a的+X方向
側的端部。
As shown in FIG. 9, the
第二片材170B以沿著照射部40的移動方向的方式,從可動部65向另一側(-X方向側)延伸。第二片材170B構成為能與第一片材170A同步移動。第二片材170B的一端部的一側捲繞於第二驅動輥172。第二片材170B的另一端部經由第二鎖定部67而被鎖定在基座部65a的-X方向側的端部。
The
第一驅動輥171構成為能繞著沿Y方向延伸的第一驅動軸171a而轉動。第二驅動輥172構成為能繞著沿Y方向延伸的第二驅動軸172a而轉動。圖9中,藉由使第一驅動輥171沿箭頭J1的方向轉動,並且使第二驅動輥172沿箭頭J2的方向轉動,從而呈現出第一片材170A及第二片材170B在-X方向(箭頭K的方向)上同步移動的狀態。
The
依據本變形例,可使第二片材170B與第一片材170A同步地移動,因此,可更加穩定地進行配管60(參見圖1)的移動。
According to this modification, the
圖10為示出實施方式中之排氣部的另一變形例的側視圖。需要說明的是,圖10中,省略了排氣箱61的各壁等的圖示。
Fig. 10 is a side view showing another modified example of the exhaust portion in the embodiment. It should be noted that, in FIG. 10, illustrations of the walls and the like of the
如圖10所示,相對於實施方式,本變形例在下述方面是特別不同的:片材70構成為能在卷掛於一對搬運輥180的狀態下以沿著照射部40的移動方向的方式移動。圖10中,對與實施方式同樣的構成標注同一符號,並省
略其詳細說明。
As shown in FIG. 10, compared with the embodiment, this modification is particularly different in the following point: the
一對搬運輥180構成為能以在X方向上隔開間隔的狀態沿X方向移動。在由一對搬運輥180、片材70及引導板64包圍的部分中,形成有貫穿部180h(其為能使來自配管60的熱通過的空間)。貫穿部180h經由引導板64的貫穿孔64h而與排氣箱61的內部空間61s(參見圖6)連通。
The pair of
例如,藉由使一對搬運輥180始終隔開一定的間隔,從而可將從貫穿部180h通過的氣體的流量始終維持為一定。另一方面,藉由增大或減小一對搬運輥180的間隔,從而可調節從貫穿部180h通過的氣體的流量。
For example, by keeping the pair of conveying
需要說明的是,上述例子中示出的各構成構件的各種形狀、組合等是一個例子,可根據設計要求等進行各種變更。 It should be noted that the various shapes, combinations, etc. of the constituent members shown in the above examples are just examples, and various changes can be made according to design requirements and the like.
例如,上述實施方式中設置了一個腔室2,但不限於此,也可設置2個以上的多個腔室2。
For example, in the above embodiment, one
另外,上述實施方式中,舉出引導板64的貫穿孔64h的俯視形狀為圓形的例子進行了說明,但不限於此。例如,引導板64的貫穿孔64h的俯視形狀也可以為橢圓形,還可以為三角形、四邊形等多邊形。另外,舉出引導板64為沖孔金屬的例子進行了說明,但不限於此,也可以是在俯視下成為梯狀的構件。即,對於引導板64的形狀而言,可根據設計方法採用各種形狀。
In addition, in the above-mentioned embodiment, the planar view shape of the through-
另外,上述實施方式中,舉出流量調節部68構成為
能調節從配管60的至少一部分中通過的氣體的流量的例子進行了說明,但不限於此。例如,流量調節部68也可以構成為能調節從排氣箱61的至少一部分中通過的氣體的流量。即,流量調節部68構成為能調節從配管60及排氣箱61的至少一部分中通過的氣體的流量即可。
In addition, in the above-mentioned embodiment, the flow
另外,上述實施方式中,舉出將排氣部6應用於紫外線照射裝置1中的例子進行了說明,但不限於此。例如,也可以將排氣部6應用於噴嘴的乾燥裝置等其他裝置中。
In addition, in the above-mentioned embodiment, an example in which the
需要說明的是,對於在上文中作為實施方式或其變形例而記載的各構成要素,可在不超出本發明的主旨的範圍內適當組合,另外,也可適當地不使用所組合的多種構成要素中的一部分構成要素。 It should be noted that each of the constituent elements described above as the embodiment or its modification can be appropriately combined within a range that does not deviate from the gist of the present invention, and it is also possible not to use a combination of multiple configurations as appropriate Some of the elements constitute the elements.
1‧‧‧紫外線照射裝置 1‧‧‧Ultraviolet radiation device
10‧‧‧基板 10‧‧‧Substrate
2‧‧‧腔室(收容部) 2‧‧‧ Chamber (Containment Department)
20‧‧‧頂板 20‧‧‧Top plate
20h‧‧‧開口部 20h‧‧‧Opening
21‧‧‧周壁 21‧‧‧ Zhoubi
21a‧‧‧基板搬入搬出口 21a‧‧‧PCB loading and unloading exit
22‧‧‧底板 22‧‧‧Bottom plate
23‧‧‧透射部 23‧‧‧Transmission Department
25‧‧‧升降機構 25‧‧‧Lifting mechanism
25a‧‧‧升降銷 25a‧‧‧Lift pin
25b‧‧‧驅動源 25b‧‧‧Drive source
3‧‧‧工作台 3‧‧‧Working table
31‧‧‧支架 31‧‧‧Bracket
31a‧‧‧車輪 31a‧‧‧wheel
4‧‧‧照射單元 4‧‧‧ Irradiation unit
4a‧‧‧照射面 4a‧‧‧irradiated surface
40‧‧‧照射部 40‧‧‧ Irradiation Department
41‧‧‧聚光構件 41‧‧‧Condensing component
5‧‧‧搬運機構(移動部) 5‧‧‧Transportation mechanism (moving department)
50‧‧‧引導部(驅動源) 50‧‧‧Guide (drive source)
51‧‧‧導軌 51‧‧‧Guide
52‧‧‧滑塊 52‧‧‧Slider
53‧‧‧基座 53‧‧‧Pedestal
54‧‧‧門型框 54‧‧‧Door frame
54a‧‧‧門柱部 54a‧‧‧doorpost
54b‧‧‧連結部 54b‧‧‧Connecting part
54c‧‧‧保持部 54c‧‧‧Retention Department
6‧‧‧排氣部 6‧‧‧Exhaust
60‧‧‧配管 60‧‧‧Piping
61‧‧‧排氣箱 61‧‧‧Exhaust Box
7‧‧‧氣體供給部 7‧‧‧Gas Supply Department
8‧‧‧控制部 8‧‧‧Control Department
Claims (15)
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JP2016007724A JP6600566B2 (en) | 2016-01-19 | 2016-01-19 | Ultraviolet irradiation apparatus and ultraviolet irradiation method |
JP2016-007724 | 2016-01-19 |
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TW201735123A TW201735123A (en) | 2017-10-01 |
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KR (1) | KR102703514B1 (en) |
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WO2011080852A1 (en) * | 2009-12-28 | 2011-07-07 | シャープ株式会社 | Method and apparatus for manufacturing liquid crystal display panel |
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JP2006114848A (en) | 2004-10-18 | 2006-04-27 | Apex Corp | Equipment and method for ultraviolet irradiation processing and semiconductor manufacturing equipment |
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TW201735123A (en) | 2017-10-01 |
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