TWI700148B - Chuck table, grinding device and manufacturing method of grinding product - Google Patents
Chuck table, grinding device and manufacturing method of grinding product Download PDFInfo
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- TWI700148B TWI700148B TW108120515A TW108120515A TWI700148B TW I700148 B TWI700148 B TW I700148B TW 108120515 A TW108120515 A TW 108120515A TW 108120515 A TW108120515 A TW 108120515A TW I700148 B TWI700148 B TW I700148B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/30—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding plastics
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B19/00—Single-purpose machines or devices for particular grinding operations not covered by any other main group
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/04—Headstocks; Working-spindles; Features relating thereto
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
- B24B55/02—Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant
- B24B55/03—Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant designed as a complete equipment for feeding or clarifying coolant
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q2703/00—Work clamping
- B23Q2703/02—Work clamping means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q2703/00—Work clamping
- B23Q2703/02—Work clamping means
- B23Q2703/10—Devices for clamping workpieces of a particular form or made from a particular material
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
Abstract
本發明是一種夾盤台,用於吸附磨削對象物,所述夾盤台包括:本體,具有能夠配置磨削對象物的區域;多孔構件,設置於本體的能夠配置磨削對象物的區域內;以及吸附孔配置區域,設置於本體的能夠配置磨削對象物的區域內,且設置於多孔構件的外側。本發明的夾盤台能夠一方面抑制步驟變得複雜,一方面穩定地吸附保持磨削對象物,進而能夠抑制磨削品的外觀不良或運行不良的產生。本發明也提供一種磨削裝置及磨削品的製造方法。The present invention is a chuck table for adsorbing a grinding object. The chuck table includes: a main body having an area where the object to be ground can be placed; a porous member provided in the area where the object to be ground can be placed in the main body And the suction hole arrangement area is provided in the area of the main body where the object to be ground can be arranged, and is provided on the outside of the porous member. The chuck table of the present invention can prevent the steps from becoming complicated on the one hand, and on the other hand, it can stably suck and hold the object to be ground, and furthermore, it is possible to prevent the appearance of the ground product from being defective or the occurrence of poor operation. The present invention also provides a grinding device and a manufacturing method of grinding products.
Description
本發明是有關於一種夾盤台(chuck table)、磨削裝置及磨削品的製造方法。The present invention relates to a chuck table, a grinding device and a manufacturing method of grinding products.
從先前以來,一直進行的是利用磨削裝置對吸附於夾盤台的磨削對象物進行磨削。作為一個形態,有利用多孔構件形成磨削對象物的吸附保持部的方法。Conventionally, the grinding device has been used to grind the grinding object adsorbed on the chuck table. As one form, there is a method of forming an adsorption and holding portion of the grinding object using a porous member.
在日本專利特開2016-159412號公報(專利文獻1)中,公開了如下的技術:當利用多孔陶瓷(porous ceramics)等多孔構件形成吸附保持部時,通過利用薄片(sheet)覆蓋作為磨削對象物的封裝基板的外周緣,吸附保持薄片及封裝基板,來抑制抽吸力從封裝基板的外周緣與磨削對象物之間洩漏。In Japanese Patent Laid-Open No. 2016-159412 (Patent Document 1), the following technology is disclosed: when a porous member such as porous ceramics (porous ceramics) is used to form an adsorbing and holding portion, it is covered with a sheet for grinding The outer peripheral edge of the packaging substrate of the object sucks and holds the sheet and the packaging substrate to prevent the suction force from leaking between the outer peripheral edge of the packaging substrate and the object to be ground.
在專利文獻1中,可以一邊利用薄片矯正工件的翹曲,一邊防止抽吸力從保持面洩漏,所以能夠利用夾盤台確實地抽吸保持封裝基板(參照專利文獻1的段落[0014]等)。In
但是,在專利文獻1所述的磨削方法中,需要另外進行設置薄片的步驟,使得步驟可能變得複雜。並且,由於薄片的耐久性的限制,存在無法多次使用的情況。當在磨削步驟中薄片發生了破損或脫落時,無法進行封裝基板的外周緣的吸附保持,從而封裝基板有可能發生破損。封裝基板的破損會導致外觀不良,進而還有可能導致運行不良。However, in the grinding method described in
本發明的目的在於提供一種夾盤台及磨削裝置,能夠一方面抑制步驟變得複雜,一方面穩定地吸附保持磨削對象物,並且提供一種磨削品的製造方法,能夠抑制產品的外觀不良或運行不良的產生。The object of the present invention is to provide a chuck table and a grinding device, which can prevent the steps from becoming complicated on the one hand, and stably suck and hold the object to be ground on the other hand, and provide a method for manufacturing a ground product that can suppress the appearance of the product The occurrence of bad or poor operation.
本發明的夾盤台是一種用於吸附磨削對象物的夾盤台,其包括:本體,具有能夠配置磨削對象物的區域;多孔構件,設置於本體的能夠配置磨削對象物的區域內;以及吸附孔配置區域,設置於本體的能夠配置磨削對象物的區域內,且設置於多孔構件的外側。The chuck table of the present invention is a chuck table for adsorbing a grinding object, which includes a main body having an area where the grinding object can be placed; and a porous member provided in the area where the grinding object can be placed. And the suction hole arrangement area is provided in the area of the main body where the object to be ground can be arranged, and is provided on the outside of the porous member.
本發明的磨削裝置包括所述夾盤台、以及對吸附於夾盤台的磨削對象物進行磨削的磨削部。The grinding device of the present invention includes the chuck table, and a grinding part that grinds a grinding object adsorbed on the chuck table.
本發明的磨削品的製造方法包括如下的步驟:在所述夾盤台吸附磨削對象物;以及使配置有磨石的磨削部旋轉,利用磨石對磨削對象物進行磨削。The method of manufacturing a ground product of the present invention includes the steps of: sucking an object to be ground on the chuck table; and rotating a grinding part on which a grindstone is arranged, and grinding the object to be ground with the grindstone.
根據本發明,可以一方面抑制步驟變得複雜,一方面穩定地吸附保持磨削對象物。其結果為,能夠抑制磨削品的外觀不良或運行不良的產生。 本發明的所述目的及其它目的、特徵、形勢及優點將通過與附圖相關聯而理解的本發明的相關的如下的詳細說明而闡明。According to the present invention, it is possible to prevent the steps from becoming complicated, and to stably suck and hold the object to be ground. As a result, it is possible to suppress the occurrence of poor appearance or poor operation of the ground product. The objective and other objectives, features, situations, and advantages of the present invention will be clarified by the following detailed description of the present invention understood in conjunction with the accompanying drawings.
以下,對本發明的實施方式進行說明。再者,對相同或相當的部分標註相同的參照符號,並且有時不對其作重複說明。Hereinafter, embodiments of the present invention will be described. In addition, the same reference signs are attached to the same or equivalent parts, and the description thereof is not repeated in some cases.
再者,在以下說明的實施方式中,當說到個數、量等時,除了有特別說明的情況以外,本發明的範圍不一定限定於所述個數、量等。並且,在以下的實施方式中,各個構成元件除了有特別說明的情況以外,對本發明來說不一定為必需。In addition, in the embodiments described below, when talking about the number, amount, etc., the scope of the present invention is not necessarily limited to the number, amount, etc. unless otherwise specified. In addition, in the following embodiments, each constituent element is not necessarily essential to the present invention unless otherwise specified.
圖1是表示磨削裝置的整體結構的圖。如圖1所示,磨削裝置包括底座1、磨削液供給部2、磨削輪3、主軸(spindle)4、馬達5、連結部6、柱部7及抽吸裝置8。Fig. 1 is a diagram showing the overall structure of a grinding device. As shown in FIG. 1, the grinding device includes a
在底座1上設置夾盤台100(吸附夾具)。夾盤台100能夠吸附磨削對象物100α。A chuck table 100 (suction jig) is provided on the
夾盤台100是在底座1上與柱部7在X方向(水平方向)上隔開間隔而配置。在夾盤台100,設置磨削對象物100α。磨削液供給部2對磨削對象物100α的磨削面供給磨削液(例如純水)。磨削液供給部2只要能夠對磨削對象物100α的磨削面供給磨削液,對其結構就沒有特別限定。The chuck table 100 is arranged on the
磨削輪3(磨削部)包括環狀基台3A、以及安裝於環狀基台3A的磨削磨石3B。磨削磨石3B是將多個磨石配置成環狀而構成。磨削磨石3B例如是金剛石磨石。磨削輪3安裝於主軸4的與馬達5側的端部為相反側的端部。磨削輪3能夠以在Z方向上延伸的軸為中心而旋轉。The grinding wheel 3 (grinding part) includes an
主軸4將一端安裝於馬達5而沿Z方向(鉛垂向下方向)延伸。馬達5安裝於連結部6的X方向上的端部。連結部6從柱部7的與底座1側的端部為相反側的端部在X方向上延伸。柱部7從底座1的端部的區域在Z方向(鉛垂向上方向)上延伸。夾盤台100與包含真空幫浦等的抽吸裝置8連接。通過使抽吸裝置8運行,而使磨削對象物100α吸附保持於夾盤台100。The
圖2A是示意性地表示夾盤台100的平面圖,圖2B是圖2A的IIB-IIB剖面圖。圖3是表示夾盤台100的一部分的立體圖。再者,圖2A、圖2B、圖3示意性地表示夾盤台100,所以吸附孔131的個數或形狀等不一定完全一致。2A is a plan view schematically showing the chuck table 100, and FIG. 2B is a cross-sectional view taken along the line IIB-IIB in FIG. 2A. FIG. 3 is a perspective view showing a part of the chuck table 100. Furthermore, FIG. 2A, FIG. 2B, and FIG. 3 schematically show the chuck table 100, so the number or shape of the
如圖2A、圖2B、圖3所示,夾盤台100包括本體110、多孔構件120及吸附孔配置區域130。本體110包含陶瓷材料或不銹鋼等。As shown in FIGS. 2A, 2B, and 3, the chuck table 100 includes a
多孔構件120包括含有氧化鋁或碳化矽的多孔陶瓷材料,具有多個氣孔連通的連通氣孔結構。多孔構件120是具有多個100 μm以下的氣孔的構件。在圖2A、圖2B的示例中,多孔構件120具有矩形的平面形狀,但是多孔構件120的平面形狀並不限定於此,還可以是例如圓形或橢圓形狀、四邊形以外的多邊形形狀。並且,如圖3所示,多孔構件120的角落(corner)部也可以包含形成為曲線狀的部分。在吸附孔配置區域130,形成多個吸附孔131。在圖2A、圖2B的示例中,分別在多孔構件120的短邊上並排形成有三個吸附孔131,在長邊上並排形成有五個吸附孔131,但是吸附孔131的數量並不限定於此。在多孔構件120具有矩形形狀的情況下,作為一例,在一邊並排形成有三個以上的吸附孔131。多個吸附孔131既可以全部等間隔地配置,也可以將一部分吸附孔131配置成間隔不同。吸附孔131的形狀既可以是半圓狀,也可以具有橢圓形狀的一部分,也可以是矩形狀,還可以是其它形狀。吸附孔131的寬度或直徑例如為2 mm以上左右。多個吸附孔131之中一部分吸附孔131的形狀也可以與其它不同。The
在本體110上的磨削對象物配置區域110A配置磨削對象物100α。在靠近磨削對象物配置區域110A的中心的第一部分設置多孔構件120。吸附孔配置區域130位於多孔構件120的外側。多孔構件120的側面面向吸附孔131。即,多孔構件120的氣孔與吸附孔131連通。The grinding object 100α is arranged in the grinding
本體110包含抽吸路徑111及空間112。抽吸路徑111與抽吸裝置8連接。多孔構件120及吸附孔131設置於與抽吸路徑111連通的空間112上。通過多孔構件120及吸附孔131來吸附磨削對象物100α。多孔構件120的側面面向吸附孔131,因此即使連通氣孔的氣孔端的開口位於多孔構件120的側面,也可以將抽吸力用於磨削對象物100α的吸附,而不會作為洩漏成分而浪費。The
在多孔構件120上,抽吸力容易分散。在吸附孔131上,能夠利用比多孔構件120上更強的抽吸力來吸附固定磨削對象物100α。在圖2A、圖2B、圖3所示的夾盤台100中,能夠一邊在靠近磨削對象物配置區域110A的中心的區域內,使抽吸力分散,一邊在靠近磨削對象物配置區域110A的外周緣的區域內,利用吸附孔131進行更強力的吸附。由此,能夠抑制磨削對象物100α的翹曲或由磨削液噴出所造成的磨削對象物100α的端部的上浮而進行穩定的吸附,從而能夠獲得更平坦的磨削品。On the
圖4A是示意性地表示比較例的夾盤台200的平面圖,圖4B是圖4A的IVB-IVB剖面圖。4A is a plan view schematically showing a chuck table 200 of a comparative example, and FIG. 4B is a cross-sectional view taken along the line IVB-IVB in FIG. 4A.
圖4A、圖4B所示的比較例的夾盤台200包括本體210以及多個吸附孔231,本體210具有磨削對象物配置區域210A、抽吸路徑211及空間212,所述多個吸附孔231遍及磨削對象物配置區域210A的整個區域而形成。The chuck table 200 of the comparative example shown in FIGS. 4A and 4B includes a
在圖4A、圖4B的比較例中,是不使用多孔構件,而遍及磨削對象物配置區域210A的整個區域利用吸附孔231進行吸附,因此吸附孔231所抽吸的部分成為被拉伸的狀態,如果在所述狀態下對磨削對象物進行磨削,則吸附孔231上的部分會相對變厚,在磨削後會殘留轉印有吸附孔231的吸附痕跡,這將成為外觀不良的一個原因。In the comparative example of FIGS. 4A and 4B, the porous member is not used, and the entire area of the grinding
並且,從吸附孔231到磨削對象物配置區域210A的邊緣部為止的距離大於圖2A、圖2B、圖3的示例,因此例如存在如下的情況:由於因基板與模具樹脂的熱收縮率的不同而產生的磨削對象物的翹曲或由磨削液的噴出所造成的磨削對象物的端部的上浮,而使得磨削後的端部的厚度變小而發生破損。磨削對象物的端部的破損會導致產品的外觀不良,進而還有可能導致運行不良。In addition, the distance from the
與此相對,在本實施方式的夾盤台100中,能夠一邊在靠近磨削對象物配置區域110A的中心的區域內使抽吸力分散,一邊在靠近磨削對象物配置區域110A的外周緣的區域內進行強力的吸附而抑制端部的上浮。On the other hand, in the chuck table 100 of the present embodiment, the suction force can be dispersed in the area close to the center of the grinding
圖5A是示意性地表示另一實施方式的夾盤台100的平面圖,圖5B是圖5A的VB-VB剖面圖。在圖5A、圖5B所示的示例中,本體110具有凹部113。磨削對象物配置區域110A設置於凹部113的底面上。關於除此以外的方面,與圖2A、圖2B、圖3的示例相同,因此不重複進行詳細說明。FIG. 5A is a plan view schematically showing a chuck table 100 according to another embodiment, and FIG. 5B is a cross-sectional view taken along the line VB-VB in FIG. 5A. In the example shown in FIGS. 5A and 5B, the
在圖5A、圖5B所示的示例中,以多孔構件120及吸附孔配置區域130比外側部分凹陷的方式設置有凹部113。在所述凹部113嵌入磨削對象物100α。通過所述凹部113,可以提高抑制在磨削過程中所供給的磨削液從磨削對象物100α的端部滲入的效果。In the example shown in FIGS. 5A and 5B, the recessed
圖6是表示圖5A、圖5B所示的夾盤台100的變形例的平面圖。在圖6所示的變形例中,凹部113是遍及本體110的整個直徑方向而形成。Fig. 6 is a plan view showing a modification of the chuck table 100 shown in Figs. 5A and 5B. In the modification shown in FIG. 6, the
圖7是表示利用包含本實施方式的夾盤台100的磨削裝置而進行的磨削品的製造方法的流程的圖。FIG. 7 is a diagram showing a flow of a method of manufacturing a ground product by the grinding device including the chuck table 100 of the present embodiment.
如圖7所示,磨削品的製造方法包括:步驟(S1),在夾盤台100吸附磨削對象物100α;以及步驟(S2),使配置有磨削磨石3B的磨削輪3旋轉,利用磨削磨石3B對磨削對象物100α進行磨削。在所述磨削步驟(S2)中,對磨削對象物100α的磨削面供給磨削液。As shown in FIG. 7, the method of manufacturing a ground product includes: step (S1), sucking the object to be ground 100α on the chuck table 100; and step (S2), making the
圖8是表示磨削對象物100α的圖。在一個示例中,磨削對象物100α包括支撐構件101α、以及支撐構件101α上的密封樹脂102α。在對磨削對象物100α進行磨削的步驟(S2)中,以減少磨削對象物100α的厚度的方式,對至少密封樹脂102α的一部分進行磨削。即,對密封樹脂102α的上表面103α進行磨削。在磨削後,上表面104α露出。Fig. 8 is a diagram showing a grinding object 100α. In one example, the object to be ground 100α includes a supporting member 101α and a sealing resin 102α on the supporting member 101α. In the step (S2) of grinding the grinding object 100α, at least a part of the sealing resin 102α is ground so as to reduce the thickness of the grinding object 100α. That is, the upper surface 103α of the sealing resin 102α is ground. After grinding, the upper surface 104α is exposed.
對於包含密封樹脂102α的半導體封裝,薄型化的要求逐年高漲,但是通過模具加工(mold process)自身,有時不一定能夠實現充分的薄型化。進而,磨削對象物100α處於大型化的傾向。並且,還存在想要抑制磨削後的產品的外觀不良的要求。通過使用本實施方式的夾盤台100,即使是比較大型的磨削對象物,也可以在平坦的狀態下穩定地進行吸附保持,所以能夠抑制磨削對象物的端部被過度磨削而發生破損。並且,在位於多孔構件120上的部分,也不會產生由吸附孔造成的吸附痕跡。作為以上的結果,根據本實施方式的夾盤台100,能夠一方面抑制產品的外觀不良或運行不良的產生,一方面製造充分平坦且薄型的半導體封裝。並且,根據本實施方式的夾盤台100,能夠不特別設置追加的步驟而穩定地吸附保持磨削對象物,所以也能夠抑制為了穩定的吸附保持而使步驟複雜化的情況。For semiconductor packages containing the sealing resin 102α, the demand for thickness reduction is increasing year by year, but the mold process itself may not necessarily achieve sufficient thickness reduction. Furthermore, the grinding object 100α tends to increase in size. In addition, there is also a demand for suppressing poor appearance of the product after grinding. By using the chuck table 100 of this embodiment, even a relatively large object to be ground can be sucked and held stably in a flat state, so it is possible to prevent the end of the object to be ground from being excessively ground. damaged. In addition, at the portion located on the
支撐構件101α是對半導體晶片、薄膜等進行支撐的構件,包括引線框架(lead frame)、襯底(substrate)、插入器(interposer)、半導體晶圓(矽晶圓等)、金屬基板、玻璃基板、陶瓷基板、樹脂基板、配線基板等。支撐構件101α既可以是實施了配線的構件,也可以是未實施配線的構件。Supporting member 101α is a member that supports semiconductor wafers, films, etc., including lead frame, substrate, interposer, semiconductor wafer (silicon wafer, etc.), metal substrate, glass substrate , Ceramic substrates, resin substrates, wiring substrates, etc. The supporting member 101α may be a member to which wiring is applied, or may be a member to which wiring is not applied.
密封樹脂102α是對支撐於支撐構件101α的半導體晶片、薄膜等的至少一面進行密封的樹脂。The sealing resin 102α is a resin that seals at least one surface of a semiconductor wafer, a film, or the like supported by the supporting member 101α.
本實施方式的磨削裝置的磨削對象並不限定於密封樹脂102α。除了模具樹脂(mold resin)以外,矽、銅、錫等也可以成為磨削對象。The grinding target of the grinding device of this embodiment is not limited to the sealing resin 102α. In addition to mold resin (mold resin), silicon, copper, tin, etc. can also be ground.
已對本發明的實施方式進行說明,但應認為,這次所公開的實施方式在所有方面都是例示而並非用於限制。本發明的範圍是由申請專利範圍來表示,並且意圖包含與申請專利範圍同等的含義及範圍內的所有變更。The embodiment of the present invention has been described, but it should be considered that the embodiment disclosed this time is an illustration in all aspects and is not intended to be limiting. The scope of the present invention is expressed by the scope of patent application, and intends to include the meaning equivalent to the scope of patent application and all changes within the scope.
1‧‧‧底座
2‧‧‧磨削液供給部
3‧‧‧磨削輪
3A‧‧‧環狀基台
3B‧‧‧磨削磨石
4‧‧‧主軸
5‧‧‧馬達
6‧‧‧連結部
7‧‧‧柱部
8‧‧‧抽吸裝置
100、200‧‧‧夾盤台
100α‧‧‧磨削對象物
101α‧‧‧支撐構件
102α‧‧‧密封樹脂
103α、104α‧‧‧上表面
110、210‧‧‧本體
110A、210A‧‧‧磨削對象物配置區域
111、211‧‧‧抽吸路徑
112、212‧‧‧空間
113‧‧‧凹部
120‧‧‧多孔構件
130‧‧‧吸附孔配置區域
131、231‧‧‧吸附孔
S1、S2‧‧‧步驟1‧‧‧
圖1是能夠安裝本發明的一個實施方式的夾盤台的磨削裝置的整體圖。 圖2A是示意性地表示本發明的一個實施方式的夾盤台的平面圖,圖2B是圖2A的IIB-IIB剖面圖。 圖3是表示圖2A、圖2B所示的夾盤台的一部分的立體圖。 圖4A是示意性地表示比較例的夾盤台的平面圖,圖4B是圖4A的IVB-IVB剖面圖。 圖5A是示意性地表示本發明的另一實施方式的夾盤台的平面圖,圖5B是圖5A的VB-VB剖面圖。 圖6是表示圖5A、圖5B所示的夾盤台的變形例的平面圖。 圖7是表示利用包含本發明的一個實施方式的夾盤台的磨削裝置而進行的磨削品的製造方法的流程的圖。 圖8是表示磨削對象物的圖。Fig. 1 is an overall view of a grinding device capable of mounting a chuck table according to an embodiment of the present invention. 2A is a plan view schematically showing a chuck table according to an embodiment of the present invention, and FIG. 2B is a cross-sectional view taken along the line IIB-IIB in FIG. 2A. Fig. 3 is a perspective view showing a part of the chuck table shown in Figs. 2A and 2B. 4A is a plan view schematically showing a chuck table of a comparative example, and FIG. 4B is a cross-sectional view taken along the line IVB-IVB in FIG. 4A. Fig. 5A is a plan view schematically showing a chuck table according to another embodiment of the present invention, and Fig. 5B is a VB-VB sectional view of Fig. 5A. Fig. 6 is a plan view showing a modification of the chuck table shown in Figs. 5A and 5B. Fig. 7 is a diagram showing a flow of a method of manufacturing a ground product performed by a grinding device including a chuck table according to an embodiment of the present invention. Fig. 8 is a diagram showing an object to be ground.
100‧‧‧夾盤台 100‧‧‧Chuck table
110‧‧‧本體 110‧‧‧Ontology
110A‧‧‧磨削對象物配置區域 110A‧‧‧Grinding object placement area
120‧‧‧多孔構件 120‧‧‧Porous component
130‧‧‧吸附孔配置區域 130‧‧‧Adsorption hole configuration area
131‧‧‧吸附孔 131‧‧‧Adsorption hole
Claims (9)
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TW500015U (en) * | 2001-03-21 | 2002-08-21 | Ultra Tera Corp | Grinding machine for workpiece |
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JP2005169592A (en) * | 2003-12-15 | 2005-06-30 | Okamoto Machine Tool Works Ltd | Chucking mechanism of non-magnetic workpiece |
JP2008296334A (en) * | 2007-05-31 | 2008-12-11 | Toshiba Corp | Vacuum suction chuck and grinding machine using the same |
KR101610832B1 (en) * | 2010-03-03 | 2016-04-08 | 삼성전자주식회사 | Chemical Mechanical Polishing Appratus |
JP2015085414A (en) * | 2013-10-29 | 2015-05-07 | 株式会社ディスコ | Processing method of package substrate |
JP6495054B2 (en) * | 2015-03-04 | 2019-04-03 | 株式会社ディスコ | Package substrate grinding method |
CN106217087A (en) * | 2016-06-30 | 2016-12-14 | 山东鲁南机床有限公司 | A kind of lossless clamping device for thick gum base sheet |
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TW500015U (en) * | 2001-03-21 | 2002-08-21 | Ultra Tera Corp | Grinding machine for workpiece |
TW556619U (en) * | 2003-02-17 | 2003-10-01 | Hotshine Prec Machine Co Ltd | Improved vacuum absorbing table board |
TW200940255A (en) * | 2007-12-21 | 2009-10-01 | Tokyo Seimitsu Co Ltd | Wafer grinding machine and wafer grinding method |
TW201805091A (en) * | 2016-08-12 | 2018-02-16 | 鄧榮貴 | Object sucking mechanism including a holder, a plurality of sucking members, a plurality of suction control members and a flow path structure |
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