TWI697466B - 氧化鋁燒結體之前驅物、氧化鋁燒結體之製造方法、研磨粒之製造方法及氧化鋁燒結體 - Google Patents
氧化鋁燒結體之前驅物、氧化鋁燒結體之製造方法、研磨粒之製造方法及氧化鋁燒結體 Download PDFInfo
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- TWI697466B TWI697466B TW107147173A TW107147173A TWI697466B TW I697466 B TWI697466 B TW I697466B TW 107147173 A TW107147173 A TW 107147173A TW 107147173 A TW107147173 A TW 107147173A TW I697466 B TWI697466 B TW I697466B
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- Prior art keywords
- sintered body
- alumina sintered
- mass
- precursor
- alumina
- Prior art date
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 title claims abstract description 214
- 239000002243 precursor Substances 0.000 title claims abstract description 98
- 238000004519 manufacturing process Methods 0.000 title claims description 41
- 239000006061 abrasive grain Substances 0.000 title claims description 24
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 66
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 44
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 44
- 229910052727 yttrium Inorganic materials 0.000 claims abstract description 43
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims abstract description 43
- 229910052751 metal Inorganic materials 0.000 claims abstract description 37
- 239000002184 metal Substances 0.000 claims abstract description 37
- 229910052742 iron Inorganic materials 0.000 claims abstract description 28
- 239000010949 copper Substances 0.000 claims abstract description 19
- 229910052802 copper Inorganic materials 0.000 claims abstract description 18
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims abstract description 17
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 17
- 239000010955 niobium Substances 0.000 claims abstract description 17
- 229910052709 silver Inorganic materials 0.000 claims abstract description 17
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 17
- 239000011701 zinc Substances 0.000 claims abstract description 17
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 16
- 229910052787 antimony Inorganic materials 0.000 claims abstract description 15
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 15
- 150000002739 metals Chemical class 0.000 claims abstract description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 13
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims abstract description 13
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 13
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910017052 cobalt Inorganic materials 0.000 claims abstract description 13
- 239000010941 cobalt Substances 0.000 claims abstract description 13
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 13
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000004332 silver Substances 0.000 claims abstract description 13
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000010937 tungsten Substances 0.000 claims abstract description 13
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 12
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims abstract description 12
- 238000000034 method Methods 0.000 claims description 37
- 239000000463 material Substances 0.000 claims description 36
- 150000001875 compounds Chemical class 0.000 claims description 29
- 238000010304 firing Methods 0.000 claims description 23
- 238000002156 mixing Methods 0.000 claims description 21
- AIQRTHPXPDTMBQ-UHFFFAOYSA-K yttrium(3+);triacetate;tetrahydrate Chemical compound O.O.O.O.[Y+3].CC([O-])=O.CC([O-])=O.CC([O-])=O AIQRTHPXPDTMBQ-UHFFFAOYSA-K 0.000 claims description 14
- 238000006243 chemical reaction Methods 0.000 claims description 2
- 238000001354 calcination Methods 0.000 claims 1
- 238000000227 grinding Methods 0.000 description 56
- 239000002994 raw material Substances 0.000 description 47
- 239000000203 mixture Substances 0.000 description 30
- 238000005299 abrasion Methods 0.000 description 27
- 230000000052 comparative effect Effects 0.000 description 25
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 22
- 239000000843 powder Substances 0.000 description 20
- 239000004575 stone Substances 0.000 description 20
- 238000012360 testing method Methods 0.000 description 11
- 238000011156 evaluation Methods 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 238000005245 sintering Methods 0.000 description 9
- 239000011734 sodium Substances 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 8
- 239000011572 manganese Substances 0.000 description 7
- 239000004372 Polyvinyl alcohol Substances 0.000 description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
- 238000013329 compounding Methods 0.000 description 6
- 239000013078 crystal Substances 0.000 description 6
- 238000002425 crystallisation Methods 0.000 description 6
- 230000008025 crystallization Effects 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 229920002451 polyvinyl alcohol Polymers 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- -1 Co 2 O 3 Substances 0.000 description 5
- 239000010953 base metal Substances 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 229910052748 manganese Inorganic materials 0.000 description 5
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000000654 additive Substances 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 230000001186 cumulative effect Effects 0.000 description 4
- 150000004677 hydrates Chemical class 0.000 description 4
- 150000004679 hydroxides Chemical class 0.000 description 4
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 150000004767 nitrides Chemical class 0.000 description 4
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 4
- 238000005303 weighing Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 3
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 150000001242 acetic acid derivatives Chemical class 0.000 description 3
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 239000012153 distilled water Substances 0.000 description 3
- 150000004820 halides Chemical class 0.000 description 3
- 238000007373 indentation Methods 0.000 description 3
- 150000002823 nitrates Chemical class 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 238000007493 shaping process Methods 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- 229910000975 Carbon steel Inorganic materials 0.000 description 2
- 239000005751 Copper oxide Substances 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 229910000410 antimony oxide Inorganic materials 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 239000000292 calcium oxide Substances 0.000 description 2
- 239000010962 carbon steel Substances 0.000 description 2
- 229910000428 cobalt oxide Inorganic materials 0.000 description 2
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910000431 copper oxide Inorganic materials 0.000 description 2
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 229910001195 gallium oxide Inorganic materials 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000007561 laser diffraction method Methods 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- NFSAPTWLWWYADB-UHFFFAOYSA-N n,n-dimethyl-1-phenylethane-1,2-diamine Chemical compound CN(C)C(CN)C1=CC=CC=C1 NFSAPTWLWWYADB-UHFFFAOYSA-N 0.000 description 2
- 229910000484 niobium oxide Inorganic materials 0.000 description 2
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 2
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 2
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 2
- 238000004445 quantitative analysis Methods 0.000 description 2
- 238000012552 review Methods 0.000 description 2
- 239000010944 silver (metal) Substances 0.000 description 2
- 229910001923 silver oxide Inorganic materials 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910001930 tungsten oxide Inorganic materials 0.000 description 2
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 238000004131 Bayer process Methods 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000007723 die pressing method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 230000002706 hydrostatic effect Effects 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000010907 mechanical stirring Methods 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 239000011812 mixed powder Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 238000000634 powder X-ray diffraction Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 102200082816 rs34868397 Human genes 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 229910001256 stainless steel alloy Inorganic materials 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 239000003232 water-soluble binding agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/10—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on aluminium oxide
- C04B35/111—Fine ceramics
- C04B35/117—Composites
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/10—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on aluminium oxide
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/10—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on aluminium oxide
- C04B35/111—Fine ceramics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/10—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on aluminium oxide
- C04B35/111—Fine ceramics
- C04B35/1115—Minute sintered entities, e.g. sintered abrasive grains or shaped particles such as platelets
-
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Abstract
本發明係一種氧化鋁燒結體之前驅物,其係包含鋁與、釔、及選自由鐵、鋅、鈷、錳、銅、鈮、銻、鎢、銀及鎵所成群之至少1種金屬之氧化鋁燒結體之前驅物,其中前述鋁之含量,在前述氧化鋁燒結體之前驅物100質量%中,以氧化物(Al2
O3
)換算為98.0質量%以上,前述釔之含量,相對於前述氧化物換算之鋁之含量100質量份,以氧化物(Y2
O3
)換算為0.01~1.35質量份,選自前述群之金屬之合計含量,相對於前述氧化物換算之鋁之含量100質量份,以氧化物換算為0.02~1.55質量份,以α氧化鋁形態含有前述鋁。
Description
本發明係有關氧化鋁燒結體之前驅物、氧化鋁燒結體之製造方法、研磨粒之製造方法及氧化鋁燒結體。
氧化鋁燒結體係發揮高硬度、高強度、高耐熱性、高耐摩耗性及高耐藥品性等優異的特徵,在各種產業領域使用。特別是作為鐵鋼產業中之重磨削研磨石之原料的研磨粒使用。
又,最近,市場要求比以往「磨削比(grinding ratio)」更大的重磨削(Heavy Duty Grinding)研磨石。在此,「磨削比」係表示研磨石之性能的指標,以下述式(A)表示。磨削比越大,研磨石之性能可說是越佳。
磨削比=被削材被切削的量(磨削量)/研磨石之摩耗量 ・・・(A)
一般,以少的研磨石可切削多的被削材時,判斷為性能佳,但是研磨石之磨削比係受該研磨石所使用之研磨粒的「硬度」與「破壞靭性」的影響。認為在「磨削比與硬度」、及「磨削比與破壞韌性」之間,有如以下的關係。
(1)研磨粒之硬度變高時,磨削量增加,故磨削比變大。
(2)破壞韌性變高時,研磨粒之摩耗量變少,故磨削比變大。
考慮上述(1)及(2)之關係時,磨削比之式中之分子部分受磨削量影響,分母部分受摩耗量影響。為了提高研磨石之磨削比時,硬度及破壞韌性皆高較理想。
但是以往之重磨削研磨石用的研磨粒,例如使氧化鋁原料燒結的研磨粒等為所知。特別是非專利文獻1及2中檢討提高氧化鋁燒結體之硬度、強度及韌性等。
例如,非專利文獻1記載藉由在氧化鋁原料中添加氧化釔,可抑制粒子成長,可提高所得之氧化鋁燒結體之彎曲強度、硬度、破壞靭性值等之機械特性。
又,非專利文獻2記載藉由在氧化鋁原料中添加氧化釔(yttria),在所得之氧化鋁燒結體中,氧化鋁晶界中釔產生偏析,可抑制潛變(creep)。
但是添加了如上述之氧化釔的氧化鋁燒結體時,因氧化釔之添加而妨礙燒結,難以得到緻密的燒結體,為了得到緻密的燒結體時,需要高溫度下之熱處理。因此,這種氧化鋁燒結體之製造,有生產成本增加的問題。
[先前技術文獻]
[非專利文獻]
[非專利文獻1] 愛知縣瀬戸窯業技術中心報告28號、第22~24頁 「添加氧化釔之氧化鋁陶瓷之特性」
[非專利文獻2] Materials Transactions, Vol.45, No.7 (2004)、第2078~2082頁
[發明所欲解決之課題]
因此,本發明之目的係提供相較於以往包含釔之氧化鋁原料混合物,以更低溫容易燒結,可得到緻密且機械特性優異之氧化鋁燒結體之氧化鋁燒結體之前驅物及使用該前驅物之氧化鋁燒結體之製造方法。
[用以解決課題之手段]
本發明人等精心檢討的結果,發現氧化鋁燒結體之前驅物為以所定量的關係含有鋁與釔、及選自由鐵、鋅、鈷、錳、銅、鈮、銻、鎢、銀及鎵所成群之至少1種金屬,以α氧化鋁形態含有前述鋁,可得到機械特性優異之氧化鋁燒結體,同時以更低溫容易燒結,而完成本發明。
亦即,本發明之要旨構成如下述。
[1] 一種氧化鋁燒結體之前驅物,其係包含鋁與釔、及選自由鐵、鋅、鈷、錳、銅、鈮、銻、鎢、銀及鎵所成群之至少1種金屬之氧化鋁燒結體之前驅物,
其中前述鋁之含量,在前述氧化鋁燒結體之前驅物100質量%中,以氧化物(Al2
O3
)換算為98.0質量%以上,
前述釔之含量,相對於前述氧化物換算之鋁之含量100質量份,以氧化物(Y2
O3
)換算為0.01~1.35質量份,
選自前述群之金屬之合計含量,相對於前述氧化物換算之鋁之含量100質量份,以氧化物換算為0.02~1.55質量份,以α氧化鋁形態含有前述鋁。
[2] 如上述[1]之氧化鋁燒結體之前驅物,其中以乙酸釔四水合物的形態含有前述釔。
[3] 如上述[1]或[2]之氧化鋁燒結體之前驅物,其係用於為了得到構成研磨粒之氧化鋁燒結體。
[4] 一種氧化鋁燒結體之製造方法,其係具有得到如上述[1]~[3]中任一項之氧化鋁燒結體之前驅物的步驟(I)與、
將前述氧化鋁燒結體之前驅物進行燒成,得到氧化鋁燒結體的步驟(II)。
[5] 如上述[4]之氧化鋁燒結體之製造方法,其中前述得到氧化鋁燒結體之前驅物的步驟(I)為包含混合α-氧化鋁與包含釔之化合物、及包含選自由鐵、鋅、鈷、錳、銅、鈮、銻、鎢、銀及鎵所成群之1種金屬之至少1個化合物的步驟。
[6] 如上述[4]或[5]之氧化鋁燒結體之製造方法,其中前述包含釔的化合物為乙酸釔四水合物。
[7] 如上述[4]~[6]中任一項之氧化鋁燒結體之製造方法,其中前述氧化鋁燒結體之前驅物之燒成溫度為1300~ 1575℃。
[8] 如上述[4]~[7]中任一項之氧化鋁燒結體之製造方法,其中前述氧化鋁燒結體之相對密度為95.0%以上。
[9] 一種研磨粒之製造方法,其係藉由如如上述[4]~[8]中任一項之氧化鋁燒結體之製造方法來進行。
[10] 一種氧化鋁燒結體,其係包含鋁與釔、及選自由鐵、鋅、鈷、錳、銅、鈮、銻、鎢、銀及鎵所成群之至少1種金屬的氧化鋁燒結體,
其中前述鋁之含量,在前述氧化鋁燒結體100質量%中,以氧化物(Al2
O3
)換算為98.0質量%以上,
前述釔之含量,相對於前述氧化物換算之鋁之含量100質量份,以氧化物(Y2
O3
)換算為0.01~1.35質量份,
選自前述群之金屬之合計含量,相對於前述氧化物換算之鋁之含量100質量份,以氧化物換算為0.02~1.55質量份,相對密度為95.0%以上。
[發明效果]
依據本發明時,可提供相較於以往包含釔之氧化鋁原料混合物,以更低溫容易燒結,可得到緻密且機械特性優異之氧化鋁燒結體之氧化鋁燒結體之前驅物及使用該前驅物之氧化鋁燒結體之製造方法。
[實施發明之形態]
以下詳細地說明本發明之氧化鋁燒結體之前驅物、使用前驅物之氧化鋁燒結體之製造方法、研磨粒之製造方法及氧化鋁燒結體之實施形態,但是本發明不限定於下述實施形態者。
<氧化鋁燒結體之前驅物>
本實施形態之氧化鋁燒結體之前驅物係包含鋁與釔、及選自由鐵、鋅、鈷、錳、銅、鈮、銻、鎢、銀及鎵所成群之至少1種金屬,前述鋁之含量,在前述氧化鋁燒結體之前驅物100質量%中,以氧化物(Al2
O3
)換算為98.0質量%以上,前述釔之含量,相對於前述氧化物換算之鋁之含量100質量份,以氧化物(Y2
O3
)換算為0.01~1.35質量份,選自前述群之金屬之合計含量,相對於前述氧化物換算之鋁之含量100質量份,以氧化物換算為0.02~1.55質量份,以α氧化鋁的形態含有前述鋁。
本發明之氧化鋁燒結體之前驅物係相較於以往包含釔之氧化鋁原料混合物,以更低溫容易燒結,可得到緻密且機械特性優異之氧化鋁燒結體。這種本發明之氧化鋁燒結體之前驅物,特別是適合得到高硬度且具有優異破壞靭性的氧化鋁燒結體。
在此,氧化鋁燒結體之前驅物(以下有時僅稱為「前驅物」)係指熱處理前之原料混合物。又,氧化鋁燒結體(以下有時僅稱為「燒結體」)係指前驅物經熱處理、燒結後的燒結體。
本實施形態之前驅物係以α氧化鋁形態包含鋁(Al)。Al之含量係在前驅物100質量%中,以氧化物(Al2
O3
)換算為98.0質量%以上,較佳為98.5質量%以上,又更佳為99.0質量%以上。藉由在上述範圍,可得到維持適度之硬度的燒結體。Al之含量降低時,氧化鋁燒結體中之氧化鋁的純度降低。一般,氧化鋁燒結體中之氧化鋁之純度降低時,燒結體之硬度降低已為人知。又,Al之含量的上限係以與釔等之添加成分之關係調整即可,無特別限定,例如也可為99.97質量%。又,前驅物之質量不包含將前驅物成形時使用之聚乙烯醇等之黏結劑樹脂或水等的溶劑。
本實施形態之前驅物包含釔(Y)。Y之含量係相對於Al2
O3
換算之鋁之含量100質量份,以氧化物(Y2
O3
)換算為0.01~1.35質量份。Y之含量為0.01質量份以上時,因Y之添加效果,在燒結體中提高機械特性。又,Y之含量為1.35質量份以下時,燒結體之相對密度提高。又,就得到更緻密,且機械特性優異之燒結體的觀點,Y之含量較佳為0.03~1.10質量份,更佳為0.05~1.00質量份。又,本實施形態之前驅物係以乙酸釔四水合物及氧化釔之至少一者的形態包含上述釔較佳,特別是以乙酸釔四水合物的形態含有更佳。
本實施形態之前驅物係包含選自由鐵(Fe)、鋅(Zn)、鈷(Co)、錳(Mn)、銅(Cu)、鈮(Nb)、銻(Sb)、鎢(W)、銀(Ag)及鎵(Ga)所成群之至少1種金屬(以下有時統稱為「Fe等之共添加成分」)。其中,作為Fe等之共添加成分,以包含選自由Fe、Zn、Co、Mn、Cu、Nb、Ag及Ga所成群之至少1種為佳。又,就提高燒結體之相對密度的觀點,較佳為選自由Fe、Zn、Co、Mn、Cu、Ag及Ga所成群之至少1種的金屬,更佳為選自由Fe、Zn及Cu所成群之至少1種的金屬,又更佳為包含Fe。又,Fe等之共添加成分可1種單獨使用,也可混合2種以上使用,更佳為1種單獨使用。
選自由Fe、Zn、Co、Mn、Cu、Nb、Sb、W、Ag及Ga所成群之金屬的合計含量係相對於Al2
O3
換算之鋁之含量100質量份,以氧化物(Fe2
O3
、ZnO、Co2
O3
、Mn2
O3
、CuO、Nb2
O5
、Sb2
O3
、WO3
、Ag2
O及Ga2
O3
)換算為0.02~ 1.55質量份。特別是Fe等之共添加成分之合計含量為0.02質量份以上時,即使包含Y,也可成為容易燒結的前驅物。因此,依據這種前驅物時,不需要提高熱處理溫度,可得到緻密且機械特性優異的燒結體。又,Fe等之共添加成分之合計含量為1.55質量份以下時,燒結體中,可維持氧化鋁之高純度。此外,就可得到更緻密,且機械特性優異之燒結體的觀點,Fe等之共添加成分之合計含量係以0.03~1.20質量份為佳,更佳為0.05~1.00質量份。又,Fe等之共添加成分為1種成分時,Fe等之共添加成分之合計含量為該1種成分的含量。又,前驅物係以各金屬之氧化物的形態包含上述Fe等之共添加成分之各自金屬為佳。
又,本實施形態之前驅物在不妨礙本發明效果的範圍內,也可再包含上述以外的成分。具體而言,可列舉如以下的成分。
本實施形態之前驅物也可包含矽(Si),Si之含量係相對於Al2
O3
換算之鋁之含量100質量份,以氧化物(SiO2
)換算較佳為0~0.12質量份。藉由將Si之含量以SiO2
換算為0.12質量份以下,可得到緻密的燒結體。又,前驅物係實質上不包含Si為佳,但是原料所使用的材料之純度比較低時,考慮無法避免而混入的Si,Si之含量係相對於Al2
O3
換算之鋁之含量100質量份,可為0.001質量份以上,較佳為0.07質量份以下,又更佳為0.05質量份以下,又再更佳為0.03質量份以下。
又,本實施形態之前驅物再包含鈉(Na)為佳。藉此可再提高燒結性。Na之含量係相對於Al2
O3
換算之鋁之含量100質量份,以氧化物(Na2
O)換算較佳為0.05~ 1.0質量份,更佳為0.08~0.70質量份,又更佳為0.10~0.70質量份。Na之含量藉由在上述範圍,可得到更緻密的燒結體。
本實施形態之前驅物,在不妨礙本發明效果的範圍內,也可包含上述以外之其他的成分。其他的成分,可列舉例如鎂(Mg)、鈣(Ca)、鉀(K)、鈦(Ti)等。其他成分的各含量係相對於Al2
O3
換算之鋁之含量100質量份,以各成分之氧化物換算分別為0.20質量份以下較佳,更佳為0.10質量份以下,又更佳為0.05質量份以下,又再較佳為0.03質量份以下。又,其他成分之合計含量係相對於Al2
O3
換算之鋁之含量100質量份,各成分之氧化物換算之合計量,較佳為0.20質量份以下,更佳為0.10質量份以下。
<氧化鋁燒結體之前驅物之製造方法>
以下說明本實施形態之氧化鋁燒結體之前驅物之較佳製造方法之一例。
本實施形態之前驅物之製造方法,無特別限定,包含步驟(1):混合原料的步驟,也可再包含步驟(2):將步驟(1)所得之原料混合物進行成形的步驟。
步驟(1):混合原料的步驟
作為原料,只要是成為前驅物所含之各成分的供給源者,可廣為使用公知的材料。這種材料,可列舉包含前驅物所含之金屬之中至少1種的化合物等。此等之材料,必要時可組合2種以上使用。
具體而言,成為Al之供給源的材料,可列舉例如Al之氧化物、氫氧化物、氮化物、氟化物及氯化物等之包含Al的化合物。此等之化合物也可為水合物。又,此等之化合物可組合2種以上使用。其中,更佳為使用以氧化鋁(Al2
O3
、氧化鋁)為主成分之氧化鋁原料粉末。此外,氧化鋁較佳為α-氧化鋁。在此,α-氧化鋁係指α結晶化率為90%以上的氧化鋁。作為這種α-氧化鋁之氧化鋁的α結晶化率,較佳為90%以上,更佳為95%以上,又更佳為98%以上。又,上述α結晶化率係以本實施例所記載之評價條件下所測量之值。
氧化鋁原料粉末係高純度者為佳,例如可使用以拜耳法(Bayer process)純化的氧化鋁。氧化鋁原料粉末中之氧化鋁量,較佳為90質量%以上,更佳為95質量%以上,又更佳為99質量%以上,又再較佳為99.5質量%以上。這種氧化鋁原料粉末中,主成分之氧化鋁以外的成分,可列舉例如Fe2
O3
、SiO2
、Na2
O、CaO、MgO、TiO2
及K2
O等。因此,使用純度低的氧化鋁原料粉末時,這種氧化鋁原料粉末不可避免也可成為後述Al以外之成分的供給源。
又,成為Y之供給源的材料,可列舉例如Y之氧化物、氫氧化物、鹵化物、氮化物、碳酸鹽、乙酸鹽、硝酸鹽及硫酸鹽等之包含Y的化合物。此等之化合物也可為水合物。又,此等化合物也可組合2種以上使用。其中,較佳為乙酸釔四水合物及氧化釔。特別是乙酸釔為水溶性,使溶解於水,可添加於原料混合物,可均勻地分散於前驅物中,故更佳。又,乙酸釔便宜,故較佳。
選自由Fe、Zn、Co、Mn、Cu、Nb、Sb、W、Ag及Ga所成群之至少1種金屬之成為供給源的材料,可列舉例如包含選自上述群之至少1種金屬的化合物。這種化合物,可列舉選自上述群之1種金屬、或包含1種以上之複合金屬之氧化物、氫氧化物、鹵化物、氮化物、碳酸鹽、乙酸鹽、硝酸鹽及硫酸鹽等。此等之化合物也可為水合物。又,此等之化合物也可組合2種以上使用。其中,包含選自上述群之1種金屬的化合物較佳,特別是該金屬之氧化物更佳。
成為Si之供給源的材料,可列舉例如氧化矽或、各種矽酸鹽等之包含Si的化合物。此等之化合物可組合2種以上使用。其中,上述氧化矽較佳。氧化矽可列舉燻製二氧化矽、矽酸及水玻璃等。
成為Na之供給源的材料,可列舉例如Na之氧化物、氫氧化物、鹵化物、氮化物、碳酸鹽、乙酸鹽、硝酸鹽及硫酸鹽等之包含Na的化合物。此等之化合物也可為水合物。又,此等之化合物也可組合2種以上使用。其中,氫氧化鈉或碳酸氫鈉較佳,更佳為氫氧化鈉。
又,一個材料也可成為2種以上之成分的供給源。這種材料可列舉Y3
Al5
O12
及Y3
Fe5
O12
等之包含2種以上之金屬的複合金屬氧化物或、如上述氧化鋁原料粉末之純度低的材料等。又,一個材料成為2種以上之成分的供給源時,作為前驅物全體,調整調配量以調整各成分的含量即可。
因此,就調配量之調整及燒結性之控制容易等的觀點,混合原料的步驟,較佳為混合氧化鋁與包含釔的化合物、及包含選自由鐵、鋅、鈷、錳、銅、鈮、銻、鎢、銀及鎵所成群之1種金屬之至少1個的化合物的步驟。藉由設為這種步驟,可將Al之供給源與、Y之供給源與、Fe等之共添加成分之供給源作為各自個別的化合物分開調配,故組成之調整及燒結性之控制變得容易。
此等原料的形態可列舉粉末、金屬粉末、漿料、水溶液等,可配合作業性或分散性之長處,適宜選擇。例如,就使用粉末狀的原料時,得到均質混合粉末的觀點,各種原料之累積體積50%徑(d50
),分別為3μm以下較佳,更佳為1μm以下。在此,各種粉末之累積體積積50%徑(d50
),可藉由雷射繞射法測量。
又,混合原料的步驟中,原料係依據各材料之調配比例,預先秤量所定量為佳。在此,秤量可藉由習知的方法進行,各材料之調配比例可依據前驅物之組成適宜調整即可。
又,混合方法,無特別限定,可使用公知的混合方式進行,例如,可使用容器旋轉式、機械攪拌式、流動攪拌式、無攪拌式、高速切斷・衝撃式等的方式混合。具體而言,可適合使用捏合機、摻混機等。
又,混合原料時,必要時可使用水、甲酸、甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、乙酸、二甲基亞碸、N,N-二甲基甲醯胺、乙腈、丙酮、四氫呋喃等的介質,此時,混合處理後,使原料混合物乾燥,必要時乾燥後可進行粉碎處理。如此所得之原料混合物的粒徑係以累積質量50%徑(d50
),較佳為3μm以下,更佳為1μm以下。原料混合物之累積質量50%徑(d50
),可藉由雷射繞射法測量。
如此所得之原料混合物為本發明之氧化鋁燒結體的前驅物。
步驟(2):將步驟(1)所得之原料混合物成形的步驟
又,此外,必要時,也可包含將上述步驟(1)所得之原料混合物成形的步驟。
本步驟中,將混合上述原料所得之原料混合物成形成任意的形狀,得到氧化鋁成形體。
氧化鋁成形體的形狀,無特別限定,可列舉例如φ0.5~5mm、長度1~10mm之圓柱狀或、金字塔形狀、星形形狀、三角形狀、不定形狀等。
又,將原料混合物成形的成形方法,可列舉例如模壓製、冷間靜水壓製、鑄入成形、射出成形、擠壓成形、薄片成形等。原料混合物中,必要時也可添加聚乙烯醇(PVA)、甲基纖維素等之水溶性的黏結劑。
如此所得之氧化鋁成形體也為本發明之氧化鋁燒結體之前驅物之一態樣。
<氧化鋁燒結體之製造方法>
其次,說明使用本實施形態之前驅物之氧化鋁燒結體之較佳之製造方法之一例。
本實施形態之氧化鋁燒結體之製造方法,較佳為具有步驟(I):得到氧化鋁燒結體之前驅物的步驟與、步驟(II):將步驟(I)所得之氧化鋁燒結體之前驅物進行燒成的步驟。
步驟(I):得到氧化鋁燒結體之前驅物的步驟
本步驟(I)係如上述前驅物之製造方法。亦即,其一例為包含步驟(1):混合原料的步驟,也可再包含步驟(2):將步驟(1)所得之原料混合物成形的步驟。
步驟(II):將步驟(I)所得之氧化鋁燒結體之前驅物進行燒成得到氧化鋁燒結體的步驟
本步驟(II)係藉由將前驅物燒成(熱處理),使燒結的步驟。燒成可藉由習知的方法進行,例如可使用熱壓製法、常壓燒成法、氣體加壓燒成法、微波加熱燒成法等。
燒成溫度,例如可為1300~1700℃,本實施形態之前驅物,相較於以往包含釔之原料混合物,較容易燒結,故即使燒成溫度,例如為1575℃以下,進一步為1550℃以下,也可得到緻密且機械強度優異的燒結體。特別是就邊抑制結晶粒成長,邊得到緻密的燒結體的觀點,燒成溫度較佳為1300~1575℃,更佳為1300~1550℃,又更佳為1400~1550℃,又再較佳為1450~1550℃。
燒成時間係依據燒成溫度等適宜調整即可,例如15分鐘~4小時,較佳為15分鐘~3小時,更佳為15分鐘~2小時。
又,燒成環境必要時適宜調整即可,例如可為大氣環境等的氧化性環境。
又,燒成前之前驅物係預先成形為佳。成形方法係如上述前驅物之製造方法的步驟(2)。
藉由本實施形態之製造方法所得之氧化鋁燒結體係緻密且機械強度優異。這種氧化鋁燒結體之相對密度,較佳為95%以上,更佳為97%以上,又更佳為98%以上。又,結晶粒徑,較佳為0.5~2.5μm,更佳為0.7~ 2.0μm。又,維氏硬度,較佳為18.5GPa以上,更佳為19.0GPa以上。破壞靭性值,較佳為3.0MPa・m1/2
以上,更佳為3.5MPa・m1/2
以上。又,上述相對密度、結晶粒徑、維氏硬度及破壞靭性值皆在本實施例之評價條件之下所測量之值。
這種氧化鋁燒結體為高硬度,且具有優異的破壞靭性,例如適合作為磨削材、切削材、研磨材等之磨削、切削、研磨等之工具及鐵鋼產業中之重磨削用研磨石的研磨粒。
<氧化鋁燒結體>
本實施形態之氧化鋁燒結體係包含鋁與、釔與、選自由鐵、鋅、鈷、錳、銅、鈮、銻、鎢、銀及鎵所成群之至少1種的金屬,
其中前述鋁之含量,在前述氧化鋁燒結體之前驅物100質量%中,以氧化物(Al2
O3
)換算為98.0質量%以上,
前述釔之含量,相對於前述氧化物換算之鋁之含量100質量份,以氧化物(Y2
O3
)換算為0.01~1.35質量份,
選自前述群之金屬之合計含量,相對於前述氧化物換算之鋁之含量100質量份,以氧化物換算為0.02~1.55質量份,相對密度為95.0%以上。
本實施形態之氧化鋁燒結體,較佳為藉由上述本實施形態之氧化鋁燒結體之製造方法所得者。依據該製造方法時,即使以比以往更低的燒成溫度(例如,1300~ 1575℃),也可有效率地實現高的相對密度,可大幅降低生產成本。
又,本實施形態之氧化鋁燒結體之較佳的態樣係與藉由上述本實施形態之氧化鋁燒結體之製造方法所得者同樣。
<研磨粒>
本實施形態之研磨粒係藉由本實施形態之氧化鋁燒結體之製造方法所得之氧化鋁燒結體所構成為佳。
亦即,本實施形態之研磨粒之較佳的製造方法之一例係藉由本實施形態之氧化鋁燒結體之製造方法進行。
<研磨石>
本實施形態之研磨石係由基本金屬(Base Metals)與、該基本金屬之作用面具有本實施形態之研磨粒之層而成。
本實施形態之研磨石中之研磨粒對作用面之固定方法,可列舉樹脂結合劑(resin bond)、玻璃化熔結(vitrified bond)、金屬結合劑、電沉積等。
又,基本金屬之材質,可列舉鋼、不銹鋼合金、鋁合金等。
樹脂結合劑雖然切削性良好,但是耐久性低。玻璃化熔結雖然切削性良好,耐摩耗性也良好,但是研磨粒產生內部應力,研磨粒容易龜裂,或容易缺損。電沉積係形狀之自由度大,且切削性也良好。
有鑑於上述,研磨石係依據其用途,選擇研磨粒之固定方法。
具體而言,例如樹脂結合劑研磨石的情形,藉由混合酚樹脂、聚醯亞胺樹脂等之結合劑之粉末與研磨粒,或將結合劑塗覆於研磨粒,填充於模具中,進行模壓成形的方法(i)、或混合環氧樹脂、不飽和聚酯樹脂等之液狀結合劑與研磨粒,流入模具中使硬化的方法(ii),藉由將研磨粒層固定於基本金屬之作用面,得到本發明之研磨石。
本發明之研磨石的形狀無特別限制,依據研磨石之用途,可適宜選擇直線形或杯形等的形狀。
以上說明了本發明之實施形態,但是本發明不限定於上述實施形態者,而是包含本發明之概念及申請專利範圍所含有之各種態樣,在本發明之範圍內可有各種改變。
[實施例]
以下依據實施例更詳細地說明本發明,但是本發明不限定於該等者。
(實施例1)
使用桌上型捏合機(股份公司入江商会製「PNV-5」)將氧化鐵(關東化學股份公司製、d50
:0.52μm)2.5g及顆粒狀之聚乙烯醇(kuraray股份公司製、型號PVA-205)3.4g與、氧化鋁原料粉末(氧化鋁(Al2
O3
)之含量:99.75質量%、氧化鋁之α結晶化率:99%以上、d50
:0.62μm)1,000g混合10分鐘。然後,調製2.5g之乙酸釔(III)四水合物(關東化學股份公司製)溶解於蒸餾水300g之乙酸釔(III)四水合物水溶液,將該水溶液加入於上述混合物中,混練30分鐘,製作氧化鋁燒結體之前驅物。表1表示依據上述投入組成之調配組成。
又,對於上述氧化鋁原料粉末,藉由螢光X線元素分析法,預先確認組成。螢光X線元素分析之測量機器係使用股份公司Rigaku製之掃描型螢光X線分析裝置「ZSX Primus」。以使用模壓成形之顆粒之粉末壓製法調製測量試料,藉由基本參數法(fundamental parameter method(FP法))進行定量分析。
又,關於氧化鋁燒結體之前驅物之組成,也與氧化鋁原料粉末的情形同樣,藉由以上述掃描型螢光X線分析裝置之FP法進行定量分析,確認與投入組成一致。
又,氧化鋁原料粉末及氧化鐵之d50
係使用microtrac粒度分布測量裝置(「microtrac(註冊商標)HRA」、日機裝股份公司製)測量。
又,氧化鋁原料粉末中之氧化鋁之α結晶化率係使用粉末X射線繞射裝置(Panalytical公司製、機種名「X'pert PRO」),由以特性X線:CuKα線、管電壓40kV、管電流40mA之條件所得之繞射光譜,由來自氧化鋁α相(300)之2θ=68.1˚之波峰高度(I68.1
)與來自δ相、θ相、χ相、γ相、θ相及ε相之2θ=67.2˚之波峰高度(I67.2
),藉由下述式(1)算出。
α結晶化率=I68.1
/(I68.1
+I67.2
)×100(%) ・・・(1)
(比較例1)
比較例1中,未添加氧化鐵及乙酸釔(III)四水合物水溶液之僅氧化鋁原料粉末作為氧化鋁燒結體之前驅物。
(比較例2)
比較例2中,除未添加氧化鐵外,以與實施例1同樣的方法得到氧化鋁燒結體之前驅物。
(比較例3)
比較例3中,除未添加乙酸釔(III)四水合物水溶液外,以與實施例1同樣的方法得到氧化鋁燒結體之前驅物。
(比較例4)
比較例4中,除如表1所示之調配組成,變更氧化鐵之調配量外,以與實施例1同樣的方法,得到氧化鋁燒結體之前驅物。
[評價I]
使用實施例1及比較例1~4之氧化鋁燒結體之前驅物,使用以下的方法製作氧化鋁燒結體,對於該氧化鋁燒結體,進行如以下的試驗(評價)。
[1]氧化鋁燒結體之製作
使用擠壓成形機將氧化鋁燒結體之前驅物成形,製作氧化鋁成形體。然後,將此成形體以電爐(大氣環境),在表1所示之燒成溫度下保持1小時使燒結,得到氧化鋁燒結體(φ1.6mm、長度3.5mm之圓柱狀)。
[2]相對密度
相對密度係以JIS Z 8807:2012之液中秤量法測量的表觀密度除以真密度而求得。此時,添加的化合物等假設全部以氧化物的狀態存在,此外,真密度係以氧化鋁為3.95、氧化釔為5.01、氧化鐵為5.24、氧化矽為2.20、氧化鈉為2.27、氧化鎂為3.65、氧化鈣為3.34、氧化鋅為5.61、氧化鈷為6.11、氧化錳為5.03、氧化銅為6.31、氧化鈮為4.47、氧化銻為5.20、氧化鎢為7.16、氧化銀為7.14、氧化鎵為6.44算出。
[3]結晶粒徑
將所得之氧化鋁燒結體切斷,將該切剖面進行鏡面加工,藉由以比燒成溫度低100℃的溫度進行5分鐘熱蝕刻( thermal etching)。使用掃描型電子顯微鏡(日本電子股份公司製、機種名「JSM-6510V」)觀察該樣品,在任意點5處進行5000倍之剖面照片撮影。對於各剖面照片,使用圖像解析軟體((MOUNTECH(股)製)、軟體名「Mac-View ver.4」)進行圖像解析,由5張剖面照片,對於任意選擇之500個的結晶粒子,測量相當體積球之直徑,所得之測量值(N=500)平均,將該平均值作為結晶粒徑。
[4]維氏硬度
裝置使用AKASHI (股)(現今、Mitutoyo(股))製、機種名「MVK-VL、Hardness Tester」。測量係以荷重0.98N、壓頭(Indentation)之打入時間10秒的條件下進行,對於每個試料,任意選擇之氧化鋁燒結體15個同樣進行。此外,將所得之測量值(N=15)平均,該平均值作為維氏硬度。
[5]破壞靭性值
破壞靭性值係依據JIS R 1607:2015精密陶瓷之室溫破壞靭性試驗方法,藉由IF法(壓頭壓入法(Indentation Fracture))求得。裝置使用松澤精機股份公司(現今、松澤(股))製、機種名「DVK-1」,測量係最大荷重49N、壓頭之打入速度50μm/sec、壓頭之打入時間15秒的條件下進行,對於每個試料,任意選擇之氧化鋁燒結體10個同樣進行。此外,將所得之測量值(N=10)平均,該平均值作為破壞韌性值。
計算式如下述。
KIC
=0.026×E1/2
×P1/2
×a/c3/2
KIC
:破壞韌性值(MPa・m1/2
)
E:楊氏模數(Pa)
P:最大荷重(N)
a:壓痕尺寸(m)
c:龜裂之尺寸(m)
又,本發明中,上述楊氏模數E係使用氧化鋁之值(3.9×1011
Pa)。
[6]磨削比
磨削比通常係將由氧化鋁燒結體所成之研磨粒以樹脂黏固的研磨石,進行摩擦摩耗試驗,算出研磨石之摩耗量,一般藉由下述式(A)算出。
磨削比=被削材被切削的量(磨削量)/研磨石之摩耗量 ・・・(A)
但是本實施例中,取代研磨石而使用氧化鋁燒結體進行摩擦摩耗試驗,算出氧化鋁燒結體之摩耗量,使用氧化鋁燒結體之摩耗量作為上述式(A)中之研磨石之摩耗量,算出磨削比。又,上述式(A)中之被削材的被切削的量與、氧化鋁燒結體之摩耗量係使用以下方法求得。
首先,使用銷對盤式(pin‐on‐disk)摩擦摩耗試驗機,進行氧化鋁燒結體之摩擦摩耗試驗。
摩擦摩耗試驗係將製作的氧化鋁燒結體(φ1.6mm、長度3.5mm之圓柱狀)緊壓於旋轉之圓盤狀的被削材,在被削材之圓周速度10m/分鐘、緊壓荷重50N、磨削時間3分鐘的條件下進行。被削材為φ160mm、厚度10mm,與試驗體接觸之摩擦面之算術平均粗糙度Ra為3.2,將JIS G 4051:2016(機械構造用碳鋼鋼材)所規定之碳鋼的S45C未經淬火等之調質直接使用。
其次,對於試驗後之被削材算出摩耗重量。被削材(盤體)之摩耗重量係由摩耗痕之剖面積及摩耗部位直徑及被削材密度,藉由下述式(i)算出。
被削材摩耗量=πρrA ・・・(i)
上述式(i)中,ρ為被削材密度(g/cm3
)、r為試驗體摩耗部位直徑(mm)、A為摩耗痕剖面積(mm2
)。
又,摩耗痕之剖面積及摩耗部位直徑之測量係使用數位顯微鏡(股份公司KEYENCE製、型式:VHX-6000)進行。又,摩耗部位直徑係以通過摩耗痕之寬中心之圓的直徑進行測量。磨削材密度係作為被削材之表觀比重,依據JIS Z8807:2012所規定之液中秤量法測量。
此外,試驗後之氧化鋁燒結體係算出摩耗體積(mm3
)後,將該摩耗體積由氧化鋁燒結體之密度換算成重量,算出氧化鋁燒結體的摩耗量。氧化鋁燒結體之摩耗體積係由試驗前後中之摩耗長度與氧化鋁燒結體之直徑,藉由下述式(ii)算出。
氧化鋁燒結體之摩耗體積=摩耗長度×(氧化鋁燒結體之直徑/2)2
π ・・・(ii)
又,摩耗長度為試驗前與試驗後之氧化鋁燒結體之長度之差。氧化鋁燒結體之長度(mm)及直徑(mm)係藉由數位顯微鏡(同上)測量。
又,氧化鋁燒結體之密度為作為氧化鋁燒結體之表觀比重,依據JIS Z8807:2012所規定之液中秤量法測量。
算出之被削材的摩耗重量作為「被削材被切削的量」,而氧化鋁燒結體的摩耗重量作為「研磨石之摩耗量」,藉由上述式(A)算出磨削比。測量係對於每個試料,任意選擇之氧化鋁燒結體3個同樣進行。此外,將每個試料所得之測量值(N=3)平均,該平均值分別作為試料之磨削比。
又,磨削比之測量僅針對實施例1、比較例3及比較例4之燒結體進行。
如表1所示,實施例1中確認由於前驅物特別是含有所定量之釔及鐵,可得到緻密且機械強度優異的氧化鋁燒結體。這種實施例1之氧化鋁燒結體係因以本實施例中之方法測量的磨削比高,故即使實際作為研磨石使用時,預料可實現高的磨削比。
相對於此,比較例1中確認因前驅物不含釔及鐵,故相較於實施例1,特別是機械強度較低。
此外,前驅物僅含有釔的比較例2中確認因釔之添加而妨礙燒結,相同燒成溫度時,相較於不含釔之比較例1之前驅物,所得之燒結體之相對密度明顯降低。
這種比較例2之前驅物時,確認為了得到緻密的氧化鋁燒結體,必須提高燒成溫度。
又,比較例3為不含釔,僅添加鐵的前驅物,但是未確認如含有所定量之釔及鐵之實施例1之前驅物,以更低溫之良好的燒結性或、所得之氧化鋁燒結體之機械強度之提昇。又,比較例3之氧化鋁燒結體為以本實施例中之方法測量的磨削比,相較於實施例1之氧化鋁燒結體更大且差,故預料即使作為研磨石使用,也無法得到十分的磨削比。
又,如比較例4之前驅物,即使為含有釔及鐵兩者的情形,確認該前驅物中之鋁之含量以氧化鋁換算為98質量%以下,又,鐵之含量相對於氧化鋁之含量100質量份,以氧化鐵換算為超過1.55質量份時,所得之氧化鋁燒結體中,特別是維氏硬度降低,無法得到充分的機械強度。又,這種比較例4之氧化鋁燒結體,以本實施例中之方法測量的磨削比,相較於實施例1之氧化鋁燒結體更大且差,故預料即使作為研磨石使用,也無法得到十分的磨削比。
(實施例2~9及比較例5)
實施例2~9及比較例5中,除了如表2所示之調配組成,變更乙酸釔(III)四水合物之調配量外,以與實施例1同樣的方法得到氧化鋁燒結體之前驅物。
(實施例10~19)
實施例10~19中,除了如表2所示之調配組成,變更氧化鐵之調配量外,以與實施例1同樣的方法得到氧化鋁燒結體之前驅物。
(實施例20~22)
實施例20~22中,相對於氧化鋁原料粉末1000g,調配氧化鐵1.25g與成為如表2所示之調配組成秤量之所定量的燻製二氧化矽(日本AEROSIL股份公司製),再添加顆粒狀的聚乙烯醇3.4g,使用桌上型捏合機混合10分鐘。然後,調製將2.5g之乙酸釔(III)四水合物溶解於蒸餾水300g之乙酸釔(III)四水合物水溶液,將該水溶液加入於上述混合物中,混練30分鐘得到氧化鋁燒結體之前驅物。
(實施例23~25)
實施例23~25中,相對於氧化鋁原料粉末1000g,調配氧化鐵2.5g與成為如表2所示之調配組成秤量之所定量的氫氧化鈉(關東化學股份公司製),再添加顆粒狀的聚乙烯醇3.4g,使用桌上型捏合機混合10分鐘。然後,調製將2.5g之乙酸釔(III)四水合物溶解於蒸餾水300g之乙酸釔(III)四水合物水溶液,將該水溶液加入於上述混合物中,混練30分鐘得到氧化鋁燒結體之前驅物。
[評價II]
使用實施例2~25及比較例5之氧化鋁燒結體之前驅物,藉由上述[評價I]所記載的方法,製作氧化鋁燒結體,求相對密度。
此評價中,以1550℃進行1小時燒成,此時之相對密度的合格水平為97.0%以上。結果如表2所示。
又,表2中,實施例1係與表1所記載之實施例1相同數據。此外,比較例2係表1所記載之比較例2之中,與燒成溫度1550℃時之數據相同。
如表2所示,氧化鋁燒結體之前驅物所含有之釔及鐵的含量被控制於所定之範圍內時,可得到釔及鐵之共添加效果。結果未提高熱處理溫度,而可得到緻密的氧化鋁燒結體(實施例1~25)。而即使釔與鐵共添加時,釔過剩時,妨礙燒結,難以得到緻密的氧化鋁燒結體(比較例5)。
(實施例26~34)
實施例26~34中,除了如表3所示之金屬氧化物換算之調配比例,取代氧化鐵,以所定量添加包含以下特定之金屬的化合物外,以與實施例16同樣的方法得到氧化鋁燒結體之前驅物。
包含特定金屬的化合物,在實施例26中,使用氧化鋅(關東化學股份公司製),實施例27中使用氧化鈷(關東化學股份公司製),實施例28中使用氧化錳(關東化學股份公司製),實施例29中使用氧化銅(關東化學股份公司製)、實施例30中使用氧化鈮(關東化學股份公司製)、實施例31中使用氧化銻(關東化學股份公司製)、實施例32中使用氧化鎢(關東化學股份公司製)、實施例33中使用氧化銀(關東化學股份公司製)、實施例34中使用氧化鎵(關東化學股份公司製)。
[評價III]
使用實施例26~34之氧化鋁燒結體之前驅物,藉由上述[評價I]所記載的方法,製作氧化鋁燒結體,求相對密度。
此評價中,以燒成溫度1550℃,進行時1小時燒成,此時之相對密度的合格水平為97.0%以上。結果如表3所示。
又,表3所記載的實施例16係與表2所記載的實施例16相同數據。
如表3所示確認取代鐵而將選自由鋅、鈷、錳、銅、鈮、銻、鎢、銀及鎵所成群之1種金屬與釔共添加時,可得到低溫且緻密的燒結體(實施例26~34)。
Claims (10)
- 一種氧化鋁燒結體之前驅物,其係包含鋁與釔、及選自由鐵、鋅、鈷、錳、銅、鈮、銻、鎢、銀及鎵所成群之至少1種金屬之氧化鋁燒結體之前驅物, 其中前述鋁之含量,在前述氧化鋁燒結體之前驅物100質量%中,以氧化物(Al2 O3 )換算為98.0質量%以上, 前述釔之含量,相對於前述氧化物換算之鋁之含量100質量份,以氧化物(Y2 O3 )換算為0.01~1.35質量份, 選自前述群之金屬之合計含量,相對於前述氧化物換算之鋁之含量100質量份,以氧化物換算為0.02~1.55質量份, 以α氧化鋁形態含有前述鋁。
- 如請求項1之氧化鋁燒結體之前驅物,其中以乙酸釔四水合物形態含有前述釔。
- 如請求項1或2之氧化鋁燒結體之前驅物,其係用於為了得到構成研磨粒之氧化鋁燒結體。
- 一種氧化鋁燒結體之製造方法,其係具有得到如請求項1~3中任一項之氧化鋁燒結體之前驅物的步驟(I)與、 將前述氧化鋁燒結體之前驅物進行燒成,得到氧化鋁燒結體的步驟(II)。
- 如請求項4之氧化鋁燒結體之製造方法,其中前述得到氧化鋁燒結體之前驅物的步驟(I)為包含混合α-氧化鋁與包含釔之化合物、及包含選自由鐵、鋅、鈷、錳、銅、鈮、銻、鎢、銀及鎵所成群之1種金屬之至少1個化合物的步驟。
- 如請求項4或5之氧化鋁燒結體之製造方法,其中前述包含釔的化合物為乙酸釔四水合物。
- 如請求項4或5之氧化鋁燒結體之製造方法,其中前述氧化鋁燒結體之前驅物之燒成溫度為1300~1575℃。
- 如請求項4或5之氧化鋁燒結體之製造方法,其中前述氧化鋁燒結體之相對密度為95.0%以上。
- 一種研磨粒之製造方法,其係藉由如請求項4~8中任一項之氧化鋁燒結體之製造方法來進行。
- 一種氧化鋁燒結體,其係包含鋁與釔、及選自由鐵、鋅、鈷、錳、銅、鈮、銻、鎢、銀及鎵所成群之至少1種金屬的氧化鋁燒結體, 其中前述鋁之含量,在前述氧化鋁燒結體100質量%中,以氧化物(Al2 O3 )換算為98.0質量%以上, 前述釔之含量,相對於前述氧化物換算之鋁之含量100質量份,以氧化物(Y2 O3 )換算為0.01~1.35質量份, 選自前述群之金屬之合計含量,相對於前述氧化物換算之鋁之含量100質量份,以氧化物換算為0.02~1.55質量份,相對密度為95.0%以上。
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JP2006151775A (ja) | 2004-12-01 | 2006-06-15 | Matsushita Electric Ind Co Ltd | 低温焼成酸化物セラミック材料の製造方法、低温焼成酸化物セラミック材料、低温焼成酸化物セラミック電子部品及びその製造方法 |
CN100509692C (zh) | 2007-09-04 | 2009-07-08 | 桂林工学院 | 一种钨刚玉陶瓷材料及低温烧结方法 |
KR102070215B1 (ko) | 2015-09-16 | 2020-01-29 | 다이니치 세이카 고교 가부시키가이샤 | 알루미나계 열 전도성 산화물 및 그의 제조 방법 |
CN107285746B (zh) * | 2016-04-12 | 2020-07-07 | 深圳光峰科技股份有限公司 | 一种氧化铝基质的荧光陶瓷的制备方法及相关荧光陶瓷 |
-
2018
- 2018-12-25 WO PCT/JP2018/047595 patent/WO2019131644A1/ja unknown
- 2018-12-25 KR KR1020207013918A patent/KR102363114B1/ko active IP Right Grant
- 2018-12-25 CN CN201880074716.2A patent/CN111356668A/zh active Pending
- 2018-12-25 US US16/768,231 patent/US11667574B2/en active Active
- 2018-12-25 JP JP2019562035A patent/JP6877586B2/ja active Active
- 2018-12-25 EP EP18896983.6A patent/EP3733629A4/en active Pending
- 2018-12-26 TW TW107147173A patent/TWI697466B/zh active
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2023
- 2023-04-05 US US18/130,985 patent/US20230339815A1/en active Pending
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US3711585A (en) * | 1968-08-19 | 1973-01-16 | Hitachi Ltd | Use of yttria-magnesia mixtures to produce highly transparent sintered alumina bodies |
US3900542A (en) * | 1973-04-26 | 1975-08-19 | Little Inc A | Process for sintering finely divided particulates and resulting ceramic products |
CN101343176A (zh) * | 2008-08-15 | 2009-01-14 | 苏州创元投资发展(集团)有限公司 | 一种自补强亚微米晶氧化铝陶瓷的制备方法 |
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KR102363114B1 (ko) | 2022-02-15 |
KR20200072511A (ko) | 2020-06-22 |
US20200308056A1 (en) | 2020-10-01 |
TW201930233A (zh) | 2019-08-01 |
JPWO2019131644A1 (ja) | 2020-07-27 |
WO2019131644A1 (ja) | 2019-07-04 |
CN111356668A (zh) | 2020-06-30 |
US20230339815A1 (en) | 2023-10-26 |
JP6877586B2 (ja) | 2021-05-26 |
US11667574B2 (en) | 2023-06-06 |
EP3733629A4 (en) | 2021-09-15 |
EP3733629A1 (en) | 2020-11-04 |
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