TWI695232B - 投影光學系統、曝光裝置及物品製造方法 - Google Patents

投影光學系統、曝光裝置及物品製造方法 Download PDF

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Publication number
TWI695232B
TWI695232B TW107127048A TW107127048A TWI695232B TW I695232 B TWI695232 B TW I695232B TW 107127048 A TW107127048 A TW 107127048A TW 107127048 A TW107127048 A TW 107127048A TW I695232 B TWI695232 B TW I695232B
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TW
Taiwan
Prior art keywords
reflective surface
concave
optical system
projection optical
image
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TW107127048A
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English (en)
Chinese (zh)
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TW201841078A (zh
Inventor
河野道生
深見清司
福岡亮介
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日商佳能股份有限公司
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/0615—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors off-axis or unobscured systems in wich all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0836—Catadioptric systems using more than three curved mirrors
    • G02B17/084—Catadioptric systems using more than three curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0852—Catadioptric systems having a field corrector only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/64—Imaging systems using optical elements for stabilisation of the lateral and angular position of the image
    • G02B27/642—Optical derotators, i.e. systems for compensating for image rotation, e.g. using rotating prisms, mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0836—Catadioptric systems using more than three curved mirrors
    • G02B17/0844—Catadioptric systems using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW107127048A 2016-10-14 2017-09-19 投影光學系統、曝光裝置及物品製造方法 TWI695232B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-203033 2016-10-14
JP2016203033A JP6635904B2 (ja) 2016-10-14 2016-10-14 投影光学系、露光装置及び物品の製造方法

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Publication Number Publication Date
TW201841078A TW201841078A (zh) 2018-11-16
TWI695232B true TWI695232B (zh) 2020-06-01

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TW106132027A TWI639063B (zh) 2016-10-14 2017-09-19 投影光學系統、曝光裝置及物品製造方法

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Country Status (5)

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US (2) US10067325B2 (OSRAM)
JP (1) JP6635904B2 (OSRAM)
KR (2) KR102115279B1 (OSRAM)
CN (2) CN111665688A (OSRAM)
TW (2) TWI695232B (OSRAM)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6635904B2 (ja) 2016-10-14 2020-01-29 キヤノン株式会社 投影光学系、露光装置及び物品の製造方法
US11754822B2 (en) 2018-08-01 2023-09-12 Samsung Electro-Mechanics Co., Ltd. Optical imaging system
JP2021015141A (ja) * 2019-07-10 2021-02-12 キヤノン株式会社 光学装置、投影光学系、露光装置、および、物品の製造方法
KR102258458B1 (ko) * 2019-07-20 2021-05-28 한남대학교 산학협력단 주간과 야간에 동시에 사용할 수 있으며 배율변화가 가능한 전방위 줌 광학계
JP7332415B2 (ja) * 2019-10-01 2023-08-23 キヤノン株式会社 投影光学系、走査露光装置および物品製造方法
JP7614962B2 (ja) * 2021-07-08 2025-01-16 キヤノン株式会社 投影光学系、露光装置、および物品の製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6072852A (en) * 1998-06-09 2000-06-06 The Regents Of The University Of California High numerical aperture projection system for extreme ultraviolet projection lithography
TW200741325A (en) * 2006-03-24 2007-11-01 Nikon Corp Reflection-type projection-optical systems, and exposure apparatus comprising same
TWI639063B (zh) * 2016-10-14 2018-10-21 日商佳能股份有限公司 投影光學系統、曝光裝置及物品製造方法

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3748015A (en) * 1971-06-21 1973-07-24 Perkin Elmer Corp Unit power imaging catoptric anastigmat
JPS6039205B2 (ja) 1975-07-02 1985-09-05 キヤノン株式会社 反射光学系
US4812028A (en) * 1984-07-23 1989-03-14 Nikon Corporation Reflection type reduction projection optical system
US4711535A (en) * 1985-05-10 1987-12-08 The Perkin-Elmer Corporation Ring field projection system
EP0452963B1 (en) * 1990-04-20 1996-07-31 Dainippon Screen Mfg. Co., Ltd. Objective lens system for use within microscope
US5078502A (en) 1990-08-06 1992-01-07 Hughes Aircraft Company Compact afocal reimaging and image derotation device
JPH0553057A (ja) * 1991-08-26 1993-03-05 Nikon Corp 反射光学系
JP3348467B2 (ja) 1993-06-30 2002-11-20 株式会社ニコン 露光装置及び方法
DE19910724A1 (de) * 1999-03-11 2000-09-14 Zeiss Carl Fa Mikrolithographie-Projektionsobjektiveinrichtung sowie Projektionsbelichtungsanlage
JP2002329655A (ja) * 2001-05-01 2002-11-15 Canon Inc 反射型縮小投影光学系、露光装置及びデバイス製造方法
JP2003243277A (ja) * 2002-02-13 2003-08-29 Canon Inc 反射型縮小投影光学系、露光装置及びデバイス製造方法
JP2004029625A (ja) * 2002-06-28 2004-01-29 Nikon Corp 投影光学系、露光装置及び露光方法
JP3938040B2 (ja) * 2002-12-27 2007-06-27 キヤノン株式会社 反射型投影光学系、露光装置及びデバイス製造方法
SG10201405231YA (en) * 2003-05-06 2014-09-26 Nippon Kogaku Kk Projection optical system, exposure apparatus, and exposure method
EP1513019B1 (en) * 2003-09-02 2012-07-25 Canon Kabushiki Kaisha Projection optical system, exposure apparatus and device fabricating method
GB0423595D0 (en) * 2004-10-23 2004-11-24 Qinetiq Ltd Scanning imaging apparatus
JP5196869B2 (ja) 2007-05-15 2013-05-15 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
JP5654735B2 (ja) 2008-05-15 2015-01-14 カール・ツァイス・エスエムティー・ゲーエムベーハー 結像光学器械及びその結像光学器械を含む投影露光装置
DE102010004827A1 (de) * 2009-01-21 2010-09-30 Carl Zeiss Smt Ag Katadioptrische Pupillen-Relaysysteme
JP2011039172A (ja) * 2009-08-07 2011-02-24 Canon Inc 露光装置およびデバイス製造方法
US8743342B2 (en) * 2009-11-17 2014-06-03 Nikon Corporation Reflective imaging optical system, exposure apparatus, and method for producing device
JP5782336B2 (ja) 2011-08-24 2015-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
CN103135356B (zh) * 2011-11-23 2015-04-15 上海微电子装备有限公司 反射式光刻投影物镜

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6072852A (en) * 1998-06-09 2000-06-06 The Regents Of The University Of California High numerical aperture projection system for extreme ultraviolet projection lithography
TW200741325A (en) * 2006-03-24 2007-11-01 Nikon Corp Reflection-type projection-optical systems, and exposure apparatus comprising same
TWI639063B (zh) * 2016-10-14 2018-10-21 日商佳能股份有限公司 投影光學系統、曝光裝置及物品製造方法

Also Published As

Publication number Publication date
TW201841078A (zh) 2018-11-16
JP2018063406A (ja) 2018-04-19
CN107957658B (zh) 2020-07-31
TWI639063B (zh) 2018-10-21
JP6635904B2 (ja) 2020-01-29
US10067325B2 (en) 2018-09-04
US20180106989A1 (en) 2018-04-19
TW201826037A (zh) 2018-07-16
KR102115279B1 (ko) 2020-05-26
CN107957658A (zh) 2018-04-24
US20180341093A1 (en) 2018-11-29
KR20200058356A (ko) 2020-05-27
KR102266723B1 (ko) 2021-06-21
US10578846B2 (en) 2020-03-03
KR20180041567A (ko) 2018-04-24
CN111665688A (zh) 2020-09-15

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