TWI687449B - Epoxy resin hardening accelerator - Google Patents

Epoxy resin hardening accelerator Download PDF

Info

Publication number
TWI687449B
TWI687449B TW105100213A TW105100213A TWI687449B TW I687449 B TWI687449 B TW I687449B TW 105100213 A TW105100213 A TW 105100213A TW 105100213 A TW105100213 A TW 105100213A TW I687449 B TWI687449 B TW I687449B
Authority
TW
Taiwan
Prior art keywords
epoxy resin
hardening accelerator
group
resin hardening
parts
Prior art date
Application number
TW105100213A
Other languages
Chinese (zh)
Other versions
TW201627345A (en
Inventor
陳礼翼
柴垣智幸
Original Assignee
日商三亞普羅股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商三亞普羅股份有限公司 filed Critical 日商三亞普羅股份有限公司
Publication of TW201627345A publication Critical patent/TW201627345A/en
Application granted granted Critical
Publication of TWI687449B publication Critical patent/TWI687449B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/0008Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0025Crosslinking or vulcanising agents; including accelerators
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/02Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring monocyclic with no unsaturation outside the aromatic ring
    • C07C39/08Dihydroxy benzenes; Alkylated derivatives thereof
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/02Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring monocyclic with no unsaturation outside the aromatic ring
    • C07C39/10Polyhydroxy benzenes; Alkylated derivatives thereof
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C57/00Unsaturated compounds having carboxyl groups bound to acyclic carbon atoms
    • C07C57/30Unsaturated compounds having carboxyl groups bound to acyclic carbon atoms containing six-membered aromatic rings
    • C07C57/34Unsaturated compounds having carboxyl groups bound to acyclic carbon atoms containing six-membered aromatic rings containing more than one carboxyl group
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C59/00Compounds having carboxyl groups bound to acyclic carbon atoms and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
    • C07C59/40Unsaturated compounds
    • C07C59/42Unsaturated compounds containing hydroxy or O-metal groups
    • C07C59/52Unsaturated compounds containing hydroxy or O-metal groups a hydroxy or O-metal group being bound to a carbon atom of a six-membered aromatic ring
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/54Quaternary phosphonium compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/4007Curing agents not provided for by the groups C08G59/42 - C08G59/66
    • C08G59/4071Curing agents not provided for by the groups C08G59/42 - C08G59/66 phosphorus containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/62Alcohols or phenols
    • C08G59/621Phenols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • C08K5/09Carboxylic acids; Metal salts thereof; Anhydrides thereof
    • C08K5/098Metal salts of carboxylic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • C08K5/13Phenols; Phenolates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/49Phosphorus-containing compounds
    • C08K5/50Phosphorus bound to carbon only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

本發明提供一種於模具填充時流動性優異且觸媒活性高、硬化性優異的環氧樹脂硬化促進劑。本發明為一種環氧樹脂硬化促進劑(Q),其特徵在於包含:通式(1)所表示的四級鏻(A)、包含通式(2)所表示的有機羧酸(B)的陰離子的鏻鹽(S)及通式(3)所表示的有機酚化合物(C)。

Figure 01_image002
The present invention provides an epoxy resin hardening accelerator that is excellent in fluidity, high in catalyst activity, and excellent in curability when filled in a mold. The present invention is an epoxy resin hardening accelerator (Q), which is characterized by comprising: a fourth-order phosphonium (A) represented by the general formula (1) and an organic carboxylic acid (B) represented by the general formula (2) The anionic phosphonium salt (S) and the organic phenol compound (C) represented by the general formula (3).
Figure 01_image002

Description

環氧樹脂硬化促進劑Epoxy resin hardening accelerator

本發明是有關於一種環氧樹脂硬化促進劑。更詳細而言,是有關於一種適合於製造半導體等電子零件用的環氧樹脂系密封材料的包含四級鏻鹽的環氧樹脂硬化促進劑。The invention relates to an epoxy resin hardening accelerator. More specifically, it relates to an epoxy resin hardening accelerator containing a quaternary phosphonium salt suitable for manufacturing an epoxy resin-based sealing material for electronic components such as semiconductors.

先前,環氧樹脂由於成形性以及硬化物的電特性等優異,因此用於例如半導體密封材料等電子零件的密封材料用途。作為密封材料樹脂,使用苯酚酚醛清漆類作為硬化劑且調配有大量填料等的環氧樹脂被廣泛使用。近年來,隨著半導體的高集成化、薄型化或者安裝方式的改良等,強烈期望密封材料的成形性、以及經密封的半導體的可靠性的提高等。針對該期望,作為密封材料的一成分的硬化促進劑的作用亦變大。 該些環氧樹脂的硬化促進劑通常使用四苯基鏻的四苯基硼酸酯鹽(以下簡稱為TPP-K)。Previously, epoxy resins have been used for sealing materials for electronic parts such as semiconductor sealing materials due to their excellent moldability and electrical characteristics of cured products. As a sealing material resin, phenol novolaks are used as hardeners, and epoxy resins prepared with a large amount of fillers are widely used. In recent years, as semiconductors have become more integrated, thinner, or improved in mounting methods, there has been a strong demand for moldability of sealing materials and improvement in reliability of sealed semiconductors. In response to this expectation, the role of the hardening accelerator as a component of the sealing material also becomes greater. The hardening accelerators of these epoxy resins usually use tetraphenylphosphonium tetraphenylborate (hereinafter abbreviated as TPP-K).

但是,TPP-K單獨時觸媒活性低,因此若僅單獨調配於環氧樹脂及硬化劑中,則硬化並不充分進行,需要預先調配於酚樹脂中,進行加熱而將四苯基硼酸酯鹽轉換為酚樹脂鹽,此時會生成具有毒性的苯,雖然微量,但會成為問題。 作為該問題的改良,提出了TPP的烷基四級化鏻的與酚樹脂的鹽(參照專利文獻1及專利文獻2)。However, when TPP-K is used alone, the catalyst activity is low. Therefore, if it is solely formulated in epoxy resin and hardener, the curing will not proceed sufficiently. It is necessary to prepare in advance in phenol resin and heat to heat tetraphenylboronic acid When the ester salt is converted to a phenol resin salt, toxic benzene is generated at this time, and although it is trace, it becomes a problem. As an improvement of this problem, the salt of TPP alkyl quaternary phosphonium and a phenol resin is proposed (refer patent document 1 and patent document 2).

然而,若為高濃度地調配有無機填充材料的密封材料組成,則於使用TPP的烷基四級化鏻的酚樹脂鹽作為硬化促進劑的情況下,使環氧樹脂、硬化劑及硬化促進劑的混合物加熱熔融而成的調配液的黏度提高,因此成為如下的所謂液體流動性不良的原因:於模具填充時會衝擊半導體晶片的配線,或於調配物遍及各個角落之前黏度上升而形成未填充部分。 [現有技術文獻] [專利文獻]However, if the sealing material composition is prepared with an inorganic filler at a high concentration, when TPP alkyl quaternary phosphonium phenol resin salt is used as a hardening accelerator, the epoxy resin, hardener and hardening are accelerated The viscosity of the formulation liquid obtained by heating and melting the mixture of the agents is increased, which causes the so-called poor liquid flowability: when the mold is filled, it will impact the wiring of the semiconductor wafer, or the viscosity will increase before the formulation reaches all corners. Fill part. [Prior Art Literature] [Patent Literature]

[專利文獻1]日本專利特開2004-256643號公報 [專利文獻2]日本專利特開2005-162944號公報[Patent Document 1] Japanese Patent Laid-Open No. 2004-256643 [Patent Document 2] Japanese Patent Laid-Open No. 2005-162944

[發明所欲解決之課題][Problems to be solved by the invention]

因此,目的在於提供一種於模具填充時流動性優異、且觸媒活性高、硬化性優異的環氧樹脂硬化促進劑。 [解決課題之手段]Therefore, an object is to provide an epoxy resin hardening accelerator that is excellent in fluidity during mold filling, high in catalyst activity, and excellent in curability. [Means to solve the problem]

本發明者等人為了達成所述目的而進行了研究,結果達成本發明。 即,本發明為一種環氧樹脂硬化促進劑(Q),其特徵在於包含:通式(1)所表示的四級鏻(A)、包含通式(2)所表示的有機羧酸(B)的陰離子的鏻鹽(S)、以及通式(3)所表示的有機酚化合物(C)。The inventors of the present invention have conducted studies to achieve the above-mentioned object, and as a result, have achieved the invention. That is, the present invention is an epoxy resin hardening accelerator (Q), which is characterized by comprising: a fourth-order phosphonium (A) represented by the general formula (1) and an organic carboxylic acid (B) represented by the general formula (2) ), the anion phosphonium salt (S), and the organic phenol compound (C) represented by the general formula (3).

[化1]

Figure 02_image004
[Chemical 1]
Figure 02_image004

[式(1)中,R1 ~R3 表示碳數6~12的芳基,R4 表示碳數1~8的烷基或者碳數6~12的芳基][In formula (1), R 1 to R 3 represent an aryl group having 6 to 12 carbon atoms, and R 4 represents an alkyl group having 1 to 8 carbon atoms or an aryl group having 6 to 12 carbon atoms]

[化2]

Figure 02_image006
[Chem 2]
Figure 02_image006

[式(2)中,R5 ~R7 相同或不同,分別表示羥基、羧基、氫或者碳數1~4的烷基,R8 表示羥基或羧基][In formula (2), R 5 to R 7 are the same or different, and each represents a hydroxyl group, a carboxyl group, hydrogen, or a C 1-4 alkyl group, and R 8 represents a hydroxyl group or a carboxyl group]

[化3]

Figure 02_image008
[Chemical 3]
Figure 02_image008

[式(3)中,R9 ~R11 相同或不同,分別表示羥基、羧基、氫或者碳數1~4的烷基] [發明的效果][In formula (3), R 9 to R 11 are the same or different, and each represents a hydroxyl group, a carboxyl group, hydrogen, or a C 1-4 alkyl group] [Effect of the invention]

本發明由於包含四級鏻(A),因此可硬化促進環氧樹脂與硬化劑的反應。 另外,有機羧酸(B)的陰離子與有機酚化合物(C)於各自的1,3位上具有可進行氫鍵結的取代基(羥基、羰基),因此有機羧酸(B)的陰離子與有機酚化合物(C)的分子間的相互作用強力地發揮作用。藉此,有機羧酸(B)的陰離子的酸強度在表觀上變強,鏻鹽(S)變得難以解離。藉此,於將環氧樹脂、硬化劑以及硬化促進劑的混合物進行加熱熔融的溫度下,由於鏻鹽(S)難以解離而能夠抑制硬化反應,模具填充時的流動性優異。 另一方面,於模具填充後的硬化溫度下,有機羧酸(B)的陰離子與有機酚化合物(C)的氫鍵結弱化,由於鏻鹽(S)解離而硬化性優異。Since the present invention includes the fourth-order phosphonium (A), it can be hardened to accelerate the reaction between the epoxy resin and the hardener. In addition, the anion of the organic carboxylic acid (B) and the organic phenol compound (C) have hydrogen-bonding substituents (hydroxyl group and carbonyl group) at the respective 1,3 positions. Therefore, the anion of the organic carboxylic acid (B) and The intermolecular interaction of the organic phenol compound (C) works strongly. By this, the acid strength of the anion of the organic carboxylic acid (B) becomes apparently strong, and the phosphonium salt (S) becomes difficult to dissociate. With this, at a temperature at which the mixture of the epoxy resin, the hardener, and the hardening accelerator is heated and melted, the phosphonium salt (S) is difficult to dissociate and the hardening reaction can be suppressed, and the fluidity during mold filling is excellent. On the other hand, at the curing temperature after the mold is filled, the hydrogen bond of the anion of the organic carboxylic acid (B) and the organic phenol compound (C) is weakened, and the phosphonium salt (S) dissociates and the curability is excellent.

因此,本發明的環氧樹脂硬化促進劑(Q)於模具填充時流動性優異、且觸媒活性高、硬化性優異,因此適合於製造半導體等電子零件用的環氧樹脂系密封材料。Therefore, the epoxy resin hardening accelerator (Q) of the present invention is excellent in fluidity at the time of mold filling, and has high catalyst activity and excellent curability, so it is suitable for manufacturing epoxy resin-based sealing materials for electronic components such as semiconductors.

本發明的環氧樹脂硬化促進劑(Q)的特徵在於包含:含有四級鏻(A)的陽離子與有機羧酸(B)的陰離子的鏻鹽(S)、以及有機酚化合物(C)。The epoxy resin hardening accelerator (Q) of the present invention is characterized by including a phosphonium salt (S) containing a cation of a fourth-order phosphonium (A) and an anion of an organic carboxylic acid (B), and an organic phenol compound (C).

四級鏻(A)的陽離子為用以促進環氧樹脂與硬化劑的反應的必需成分,由下述通式(1)所表示。The cation of the fourth-order phosphonium (A) is an essential component for promoting the reaction of the epoxy resin and the hardener, and is represented by the following general formula (1).

[化4]

Figure 02_image004
[Chemical 4]
Figure 02_image004

[式(1)中,R1 ~R3 表示碳數6~12的芳基,R4 表示碳數1~8的烷基或者碳數6~12的芳基][In formula (1), R 1 to R 3 represent an aryl group having 6 to 12 carbon atoms, and R 4 represents an alkyl group having 1 to 8 carbon atoms or an aryl group having 6 to 12 carbon atoms]

通式(1)中的構成R1 ~R4 的碳數6~12的芳基例如可列舉:苯基、萘基、聯苯基、甲基苯基、乙基苯基、丙基苯基、丁基苯基、甲基萘基、乙基萘基等。Examples of the C 6-12 aryl groups constituting R 1 to R 4 in the general formula (1) include phenyl, naphthyl, biphenyl, methylphenyl, ethylphenyl, and propylphenyl , Butylphenyl, methylnaphthyl, ethylnaphthyl and so on.

構成R4 的碳數1~8的烷基例如可列舉:甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基、正戊基、異戊基、新戊基、第三戊基、正己基、1-甲基戊基、4-甲基-2-戊基、3,3-二甲基丁基、2-乙基丁基、正庚基、1-甲基己基、正辛基、第三辛基、1-甲基庚基、2-乙基己基、以及2-丙基戊基等。Examples of the alkyl group having 1 to 8 carbon atoms constituting R 4 include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second butyl, third butyl, and n-pentyl Group, isopentyl, neopentyl, tertiary pentyl, n-hexyl, 1-methylpentyl, 4-methyl-2-pentyl, 3,3-dimethylbutyl, 2-ethylbutyl Group, n-heptyl group, 1-methylhexyl group, n-octyl group, third octyl group, 1-methylheptyl group, 2-ethylhexyl group, 2-propylpentyl group and the like.

就熔融混練後的流動性的觀點、以及原料的獲取容易性的觀點而言,R1 ~R3 較佳為苯基、甲基苯基及萘基,尤佳為苯基。 就硬化性的觀點、以及合成的容易性的觀點而言,R4 較佳為碳數1~4的烷基以及碳數6~12的芳基,尤佳為甲基、乙基及苯基,特佳為甲基、乙基。From the viewpoint of fluidity after melt-kneading and the viewpoint of ease of obtaining raw materials, R 1 to R 3 are preferably phenyl, methylphenyl, and naphthyl, and particularly preferably phenyl. From the viewpoint of curability and ease of synthesis, R 4 is preferably a C 1-4 alkyl group and a C 6-12 aryl group, and particularly preferably a methyl group, an ethyl group, and a phenyl group , Particularly preferred are methyl and ethyl.

本發明的有機羧酸(B)為用以提高熔融混練後的流動性、於模具填充後的硬化溫度下進行硬化的必需成分,由下述通式(2)所表示。 [化5]

Figure 02_image006
The organic carboxylic acid (B) of the present invention is an essential component for improving fluidity after melt-kneading and curing at a curing temperature after mold filling, and is represented by the following general formula (2). [Chem 5]
Figure 02_image006

[式(2)中,R5 ~R7 相同或不同,分別表示羥基、羧基、氫或者碳數1~4的烷基,R8 表示羥基或羧基][In formula (2), R 5 to R 7 are the same or different, and each represents a hydroxyl group, a carboxyl group, hydrogen, or a C 1-4 alkyl group, and R 8 represents a hydroxyl group or a carboxyl group]

通式(2)中的構成R5 ~R7 的碳數1~4的烷基例如可列舉:甲基、乙基、正丙基、異丙基、正丁基、第二丁基、第三丁基等。Examples of the C 1-4 alkyl groups constituting R 5 to R 7 in the general formula (2) include, for example, methyl, ethyl, n-propyl, isopropyl, n-butyl, second butyl, and Tributyl, etc.

就有機羧酸(B)的獲取容易性、以及與有機酚化合物(C)的相互作用的容易性的觀點而言,R5 及R7 較佳為氫,R6 較佳為羥基及羧基。From the viewpoint of the ease of acquisition of the organic carboxylic acid (B) and the ease of interaction with the organic phenol compound (C), R 5 and R 7 are preferably hydrogen, and R 6 is preferably a hydroxyl group and a carboxyl group.

鏻鹽(S)的合成方法並無特別限定,例如可藉由四級鏻(A)的烷基碳酸鹽(A1)與有機羧酸(B)的鹽交換反應、以及四級鏻(A)的氫氧化物(A2)與有機羧酸(B)的鹽交換反應等而獲得。The synthesis method of the phosphonium salt (S) is not particularly limited. For example, the salt exchange reaction between the alkyl carbonate (A1) of the fourth-order phosphonium (A) and the organic carboxylic acid (B) and the fourth-order phosphonium (A) can be used. Obtained by the salt exchange reaction of the hydroxide (A2) and the organic carboxylic acid (B).

四級鏻(A)的烷基碳酸鹽(A1)例如藉由使對應的三級膦與碳酸二酯類進行反應而獲得。作為製造條件,於溫度50℃~150℃下在高壓釜中進行10小時~200小時,為了使反應快速且產率良好地完結,較佳為使用反應溶媒。反應溶媒並無特別限定,較佳為甲醇、乙醇等。溶媒的量並無特別限定。The alkyl carbonate (A1) of the quaternary phosphonium (A) is obtained, for example, by reacting the corresponding tertiary phosphine with carbonic acid diesters. As production conditions, the reaction is carried out in an autoclave at a temperature of 50° C. to 150° C. for 10 hours to 200 hours. In order to complete the reaction quickly and with good yield, it is preferable to use a reaction solvent. The reaction solvent is not particularly limited, but methanol, ethanol and the like are preferred. The amount of solvent is not particularly limited.

對應的三級膦例如可列舉:三苯基膦、三(4-甲基苯基)膦、2-(二苯基膦基)聯苯等。碳酸二酯只要是公知者即可,並無特別限定,具體而言可使用碳酸二乙酯、碳酸二甲酯、碳酸二丁酯、碳酸二苯酯等。Examples of corresponding tertiary phosphines include triphenylphosphine, tri(4-methylphenyl)phosphine, and 2-(diphenylphosphino)biphenyl. The diester carbonate is not particularly limited as long as it is well-known, and specifically, diethyl carbonate, dimethyl carbonate, dibutyl carbonate, diphenyl carbonate, and the like can be used.

四級鏻(A)的氫氧化物(A2)例如藉由使對應的三級膦與鹵代(溴或氯)烷基、或者鹵代(溴或氯)芳基進行反應後,利用無機鹼進行鹽交換而獲得。作為製造條件,於溫度20℃~150℃下進行1小時~20小時,為了使反應快速且產率良好地完結,較佳為使用反應溶媒。反應溶媒並無特別限定,較佳為甲醇、乙醇等。溶媒的量並無特別限定。The quaternary phosphonium (A) hydroxide (A2), for example, by reacting the corresponding tertiary phosphine with a halogenated (bromo or chloro) alkyl group or a halogenated (bromo or chloro) aryl group, using an inorganic base Obtained by salt exchange. As the production conditions, the reaction is carried out at a temperature of 20°C to 150°C for 1 hour to 20 hours. In order to complete the reaction quickly and with good yield, it is preferable to use a reaction solvent. The reaction solvent is not particularly limited, but methanol, ethanol and the like are preferred. The amount of solvent is not particularly limited.

對應的三級膦可列舉與所述相同者。鹵代烷基可列舉:溴乙烷、氯丁烷、2-乙基己基溴、2-丁基乙醇、2-氯丙醇等,鹵代芳基可列舉:溴苯、溴萘、溴聯苯等。 無機鹼可列舉:氫氧化鈉、氫氧化鉀、氫氧化鈣、氫氧化鋇、以及氫氧化鋁等。The corresponding tertiary phosphine may be the same as described above. Examples of the halogenated alkyl group include bromoethane, chlorobutane, 2-ethylhexyl bromide, 2-butylethanol, and 2-chloropropanol. Examples of the halogenated aryl group include bromobenzene, bromonaphthalene, and brominated biphenyl. . Examples of inorganic bases include sodium hydroxide, potassium hydroxide, calcium hydroxide, barium hydroxide, and aluminum hydroxide.

就硬化性及流動性的觀點而言,將四級鏻(A)的烷基碳酸鹽(A1)或者氫氧化物(A2)與有機羧酸(B)進行鹽交換反應時的莫耳比通常為10/90~90/10,較佳為20/80~80/20。 作為製造條件,一邊於溫度30℃~170℃下進行1小時~20小時反應,一邊將副生成的醇、水、二氧化碳、以及視需要的反應溶媒等去除。From the viewpoint of hardenability and fluidity, the molar ratio of the salt exchange reaction between the alkyl carbonate (A1) or hydroxide (A2) of the fourth-order phosphonium (A) and the organic carboxylic acid (B) is usually It is 10/90 to 90/10, preferably 20/80 to 80/20. As production conditions, by-product alcohol, water, carbon dioxide, and a reaction solvent etc. are removed while performing the reaction at a temperature of 30°C to 170°C for 1 to 20 hours.

作為鏻鹽(S)的合成方法,就防止使電氣可靠性惡化的離子性雜質混入的觀點而言,較佳為四級鏻(A)的烷基碳酸鹽(A1)與有機羧酸(B)的鹽交換反應。As a method of synthesizing the phosphonium salt (S), from the viewpoint of preventing the mixing of ionic impurities that deteriorate electrical reliability, the alkyl carbonate (A1) of the fourth-order phosphonium (A) and the organic carboxylic acid (B )'S salt exchange reaction.

有機酚化合物(C)是為了與鏻鹽(S)中的有機羧酸(B)的陰離子相互作用,抑制熔融混練時的解離而提高流動性的必需成分,由下述通式(3)所表示。The organic phenol compound (C) is an essential component to improve the fluidity by interacting with the anion of the organic carboxylic acid (B) in the phosphonium salt (S), suppressing dissociation during melt kneading, and is represented by the following general formula (3) Said.

[化6]

Figure 02_image008
[化6]
Figure 02_image008

[式(3)中,R9 ~R11 相同或不同,分別表示羥基、羧基、氫或者碳數1~4的烷基][In formula (3), R 9 to R 11 are the same or different, and each represents a hydroxyl group, a carboxyl group, hydrogen, or a C 1-4 alkyl group]

通式(3)中的構成R9 ~R11 的碳數1~4的烷基例如可列舉:甲基、乙基、正丙基、異丙基、正丁基、第二丁基、第三丁基等。Examples of the C 1-4 alkyl groups constituting R 9 to R 11 in the general formula (3) include, for example, methyl, ethyl, n-propyl, isopropyl, n-butyl, second butyl, and Tributyl, etc.

就與羧酸(B)的陰離子的相互作用的容易性的觀點而言,有機酚化合物(C)較佳為R9 ~R11 為羥基、羧基及氫,尤佳為R9 及R11 為氫且R10 為羥基及羧基,特佳為R9 及R11 為氫且R10 為羥基。From the viewpoint of the ease of interaction with the anion of the carboxylic acid (B), the organic phenol compound (C) is preferably R 9 to R 11 being a hydroxyl group, a carboxyl group and hydrogen, particularly preferably R 9 and R 11 being Hydrogen and R 10 are hydroxy and carboxy, particularly preferably R 9 and R 11 are hydrogen and R 10 is hydroxy.

就與羧酸(B)的陰離子的相互作用的容易性的觀點而言,有機羧酸(B)與有機酚化合物(C)的莫耳比通常為10/90~90/10,較佳為20/80~80/20,特佳為30/70~70/30。From the viewpoint of the ease of interaction with the anion of the carboxylic acid (B), the molar ratio of the organic carboxylic acid (B) and the organic phenol compound (C) is usually 10/90 to 90/10, preferably 20/80~80/20, especially 30/70~70/30.

環氧樹脂硬化促進劑(Q)通常是藉由使鏻鹽(S)與有機酚化合物(C),通常於溫度50℃~200℃下以1小時~20小時均勻混合而獲得。為了使混合快速地完結,亦可使用溶媒,於均勻混合後,於溫度50℃~200℃下以減壓~常壓條件來去除溶媒等。溶媒並無特別限定,較佳為甲醇、乙醇等。 鏻鹽(S)與有機酚化合物(C)的調配比率是根據所述有機羧酸(B)與有機酚化合物(C)的莫耳比來適當決定。The epoxy resin hardening accelerator (Q) is usually obtained by uniformly mixing the phosphonium salt (S) and the organic phenol compound (C) at a temperature of 50°C to 200°C for 1 hour to 20 hours. In order to complete the mixing quickly, a solvent may also be used. After uniform mixing, the solvent is removed at a temperature of 50°C to 200°C under reduced pressure to normal pressure. The solvent is not particularly limited, but methanol, ethanol and the like are preferred. The blending ratio of the phosphonium salt (S) to the organic phenol compound (C) is appropriately determined according to the molar ratio of the organic carboxylic acid (B) to the organic phenol compound (C).

為了使與環氧樹脂組成物的混合變得容易,環氧樹脂硬化促進劑(Q)可進行以下方法:利用低黏度的酚樹脂進行母料化而降低軟化點的方法、進行粉碎而成為粉末狀的方法等。 低黏度的酚樹脂例如可列舉:雙酚A、雙酚F、苯酚酚醛清漆樹脂、甲酚酚醛清漆樹脂、苯酚芳烷基樹脂等。母料化的方法可利用公知的方法。 環氧樹脂硬化促進劑(Q)的軟化點通常為70℃~140℃,較佳為80℃~120℃,更佳為90℃~100℃。其原因在於:若低於70℃,則容易產生粉碎時的熔接或成為粉末狀的促進劑於貯存中的嵌段化,故而欠佳,另外,若超過140℃,則硬化促進劑無法與環氧樹脂熔融混合而變得不均勻,容易成為硬化不良的原因。In order to facilitate mixing with the epoxy resin composition, the epoxy resin hardening accelerator (Q) can be subjected to the following methods: a method of reducing the softening point by using a low viscosity phenol resin as a masterbatch, and pulverizing it into a powder Like method. Examples of the low-viscosity phenol resin include bisphenol A, bisphenol F, phenol novolak resin, cresol novolak resin, and phenol aralkyl resin. The method of masterbatch can use a well-known method. The softening point of the epoxy resin hardening accelerator (Q) is usually 70°C to 140°C, preferably 80°C to 120°C, and more preferably 90°C to 100°C. The reason is that if the temperature is lower than 70°C, welding at the time of pulverization or blocking of the powdered accelerator in storage is likely to occur, which is not good. In addition, if it exceeds 140°C, the hardening accelerator cannot be combined with the ring Oxygen resins are melt-mixed and become non-uniform, which is likely to cause poor curing.

作為進行粉碎而成為粉末狀的方法,例如可利用衝擊式粉碎機等進行粉碎而獲得粉末狀的硬化促進劑。使用時,該粉末狀的硬化促進劑的粒徑較佳為100目通過率(mesh pass)(利用噴氣篩(air jet sieve)法等來測定)為95%以上。其原因在於:若為小於95%者,則變得容易妨礙於環氧樹脂組成物中的均勻溶解,成為硬化不良的原因。As a method of pulverizing and turning into a powder, for example, pulverization using an impact mill or the like can be performed to obtain a powdery hardening accelerator. In use, the particle size of the powdery hardening accelerator is preferably 100 mesh pass (measured by an air jet sieve method or the like) of 95% or more. The reason is that if it is less than 95%, it becomes easy to prevent uniform dissolution in the epoxy resin composition, and it becomes a cause of poor curing.

本發明的環氧樹脂硬化促進劑(Q)添加於調配有環氧樹脂、硬化劑及填充劑等視需要的其他添加劑的混合物中來使用,最終獲得硬化環氧樹脂。環氧樹脂硬化促進劑(Q)的調配量是根據環氧樹脂或硬化劑的反應性來調整,相對於環氧樹脂100質量份,通常為1質量份~25質量份,較佳為2質量份~20質量份。最佳的調配量只要根據所要求的硬化特性等來設定即可。 [實施例]The epoxy resin hardening accelerator (Q) of the present invention is added to a mixture prepared with other additives as needed, such as epoxy resin, hardener and filler, to be used, and finally a hardened epoxy resin is obtained. The blending amount of the epoxy resin hardening accelerator (Q) is adjusted according to the reactivity of the epoxy resin or hardener, and is generally 1 to 25 parts by mass, preferably 2 parts by mass relative to 100 parts by mass of the epoxy resin. Parts ~ 20 parts by mass. The optimal blending amount can be set according to the required hardening characteristics and the like. [Example]

以下,藉由實施例及比較例來對本發明進一步進行說明,但本發明並不限定於該些例子。以下,只要未特別規定,則%表示重量%,份表示重量份。Hereinafter, the present invention will be further described by Examples and Comparative Examples, but the present invention is not limited to these examples. Hereinafter, unless otherwise specified,% means weight%, and parts means parts by weight.

<製造例1> <四級鏻鹼(A-Be1)的製造方法> 於攪拌式的高壓釜中,加入180份的碳酸二甲酯(東京化成工業股份有限公司製造)以及224份的溶媒甲醇,向其中加入262份的三苯基膦(東京化成工業股份有限公司製造),於反應溫度125℃下進行80小時反應。繼而將120份的甲醇減壓去除後,投入1200份的甲苯而使結晶析出。將該結晶分離,使其再次溶解於甲醇中,藉此獲得三苯基甲基鏻單甲基碳酸鹽的溶液(固體成分濃度為50%)作為四級鏻鹼(A-Be1)。<Production Example 1> <Production method of quaternary phosphonium base (A-Be1)> In a stirred autoclave, 180 parts of dimethyl carbonate (manufactured by Tokyo Chemical Industry Co., Ltd.) and 224 parts of solvent methanol are added 262 parts of triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) was added thereto, and the reaction was carried out at a reaction temperature of 125°C for 80 hours. After 120 parts of methanol was removed under reduced pressure, 1200 parts of toluene was added to precipitate crystals. The crystals were separated and dissolved in methanol again to obtain a solution of triphenylmethylphosphonium monomethyl carbonate (solid content concentration of 50%) as a quaternary phosphonium base (A-Be1).

<製造例2> <四級鏻鹼(A-Be2)的製造方法> 除了代替製造例1中的262份三苯基膦而使用304份的三(4-甲基苯基)膦(東京化成工業股份有限公司製造),代替碳酸二甲酯而使用碳酸二乙酯(東京化成工業股份有限公司製造),且將反應溫度設為130℃、反應時間設為150小時以外,以與製造例1相同的方式獲得三(4-甲基苯基)乙基鏻單乙基碳酸鹽的溶液(固體成分濃度50%)作為四級鏻鹼(A-Be2)。<Production Example 2> <Production method of quaternary phosphonium base (A-Be2)> In addition to 262 parts of triphenylphosphine in Production Example 1, 304 parts of tris(4-methylphenyl)phosphine (Tokyo Chemical Industrial Co., Ltd.), instead of dimethyl carbonate, diethyl carbonate (manufactured by Tokyo Chemical Industry Co., Ltd.) was used, and the reaction temperature was set to 130° C., and the reaction time was set to other than 150 hours. In the same manner, a solution of tris(4-methylphenyl)ethylphosphonium monoethyl carbonate (solid content concentration 50%) was obtained as a quaternary phosphonium base (A-Be2).

<製造例3> <四級鏻鹼(A-Be3)的製造方法> 於具備滴加漏斗及回流管的玻璃製圓底三口燒瓶中加入262份的三苯基膦、1000份的異丙醇,均勻溶解後,滴加投入157份的溴苯(東京化成工業股份有限公司製造),於60℃下使其進行2小時反應。繼而,投入40份的氫氧化鈉,於60℃下進行2小時反應,將所析出的鹽去除,藉此獲得氫氧化四苯基鏻溶液(固體成分濃度為25%)作為四級鏻鹼(A-Be3)。<Manufacturing Example 3> <Manufacturing method of quaternary phosphonium base (A-Be3)> In a glass round bottom three-necked flask equipped with a dropping funnel and a reflux tube, 262 parts of triphenylphosphine and 1000 parts of isopropanol are added After uniformly dissolving, 157 parts of bromobenzene (manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise and reacted at 60°C for 2 hours. Then, 40 parts of sodium hydroxide was added, and the reaction was carried out at 60°C for 2 hours to remove the precipitated salt, thereby obtaining a tetraphenylphosphonium hydroxide solution (solid content concentration of 25%) as a quaternary phosphonium base ( A-Be3).

<比較製造例1> <四級鏻鹼(A-Be'1)的製造方法> 於攪拌式的高壓釜中加入180份的碳酸二甲酯以及224份的溶媒甲醇,向其中滴加投入202份的三丁基膦,於反應溫度125℃下進行20小時反應,獲得三丁基甲基鏻單甲基碳酸鹽的溶液(固體成分濃度50%)作為四級鏻鹼(A-Be'1)。<Comparative Production Example 1> <Production method of quaternary phosphonium base (A-Be'1)> 180 parts of dimethyl carbonate and 224 parts of solvent methanol were added to a stirred autoclave, and 202 was added dropwise Three parts of tributylphosphine were reacted at a reaction temperature of 125°C for 20 hours to obtain a solution of tributylmethylphosphonium monomethyl carbonate (solid content concentration 50%) as a quaternary phosphonium base (A-Be'1).

<實施例1> 於具備滴加漏斗及回流管的玻璃製圓底三口燒瓶中加入製造例1中製造的640份四級鏻鹼(A-Be1),一邊於50℃下調整溫度一邊分批投入210份的偏苯三甲酸(東京化成工業股份有限公司製造)後,分批投入126份的1,2,4-三羥基苯(東京化成工業股份有限公司製造)。繼而投入200份的苯酚酚醛清漆樹脂(明和化成工業股份有限公司製造的「H-4」)後,一邊蒸餾去除溶劑(甲醇)一邊升溫至175℃後,將殘留的溶劑減壓去除,藉此獲得環氧樹脂硬化促進劑(Q-1)。<Example 1> A glass round bottom three-necked flask equipped with a dropping funnel and a reflux tube was charged with 640 parts of quaternary phosphonium base (A-Be1) produced in Production Example 1, and the batch was adjusted while adjusting the temperature at 50°C. After inputting 210 parts of trimellitic acid (manufactured by Tokyo Chemical Industry Co., Ltd.), 126 parts of 1,2,4-trihydroxybenzene (manufactured by Tokyo Chemical Industry Co., Ltd.) were added in batches. After adding 200 parts of phenol novolak resin ("H-4" manufactured by Meiwa Chemical Industry Co., Ltd.), the temperature was raised to 175°C while distilling off the solvent (methanol), and the residual solvent was removed under reduced pressure. Obtained epoxy resin hardening accelerator (Q-1).

<實施例2> 除了代替實施例1中的210份偏苯三甲酸而變更為182份的5-羥基間苯二甲酸(東京化成工業股份有限公司製造),代替1,2,4-三羥基苯而變更為間苯三酚(東京化成工業股份有限公司製造)以外,以與實施例1相同的方式獲得環氧樹脂硬化促進劑(Q-2)。<Example 2> 5-hydroxyisophthalic acid (made by Tokyo Chemical Industry Co., Ltd.) was changed to 182 parts instead of 210 parts of trimellitic acid in Example 1 instead of 1,2,4-trihydroxy The benzene was changed to resorcinol (manufactured by Tokyo Chemical Industry Co., Ltd.), and an epoxy resin hardening accelerator (Q-2) was obtained in the same manner as in Example 1.

<實施例3> 除了代替實施例1中的四級鏻鹼(A-Be1)而變更為製造例2中製造的四級鏻鹼(A-Be2),代替偏苯三甲酸而變更為1,3,5-苯三羧酸(東京化成工業股份有限公司製造),且代替126份的1,2,4-三羥基苯而變更為70份的間苯二酚(東京化成工業股份有限公司製造)70份以外,以與實施例1相同的方式獲得環氧樹脂硬化促進劑(Q-3)。<Example 3> The quaternary phosphonium base (A-Be2) manufactured in Production Example 2 was replaced by the quaternary phosphonium base (A-Be1) in Example 1 instead of trimellitic acid, and was changed to 1, 3,5-benzenetricarboxylic acid (manufactured by Tokyo Chemical Industry Co., Ltd.), and replaced with 126 parts of 1,2,4-trihydroxybenzene to 70 parts of resorcinol (manufactured by Tokyo Chemical Industry Co., Ltd.) ) Except for 70 parts, an epoxy resin hardening accelerator (Q-3) was obtained in the same manner as in Example 1.

<實施例4> 除了代替實施例1中的640份四級鏻鹼(A-Be1)而變更為製造例3中製造的1200份四級鏻鹼(A-Be3),代替偏苯三甲酸而變更為180份的5-甲基間苯二甲酸(東京化成工業股份有限公司製造),且代替1,2,4-三羥基苯而變更為5-甲基間苯二酚(東京化成工業股份有限公司製造)以外,以與實施例1相同的方式獲得環氧樹脂硬化促進劑(Q-4)。<Example 4> Instead of 640 parts of quaternary phosphonium base (A-Be1) in Example 1, it was changed to 1200 parts of quaternary phosphonium base (A-Be3) produced in Production Example 3, instead of trimellitic acid Changed to 180 parts of 5-methylisophthalic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) and replaced 1,2,4-trihydroxybenzene to 5-methylresorcinol (Tokyo Chemical Industry Co., Ltd.) Except manufactured by Co., Ltd., an epoxy resin hardening accelerator (Q-4) was obtained in the same manner as in Example 1.

<實施例5> 除了代替實施例1中的1,2,4-三羥基苯而變更為間苯三酚以外,以與實施例1相同的方式獲得環氧樹脂硬化促進劑(Q-5)。<Example 5> An epoxy resin hardening accelerator (Q-5) was obtained in the same manner as in Example 1, except that 1,2,4-trihydroxybenzene was replaced with resorcinol in Example 1. .

<實施例6> 除了代替實施例3中的間苯二酚而變更為間苯三酚以外,以與實施例1相同的方式獲得環氧樹脂硬化促進劑(Q-6)。<Example 6> An epoxy resin hardening accelerator (Q-6) was obtained in the same manner as in Example 1 except that resorcinol was replaced by resorcinol in Example 3.

<比較例1> 除了代替實施例1中的四級鏻鹼(A-Be1)而變更為比較製造例1中製造的四級鏻鹼(A-Be'1)以外,以與實施例1相同的方式獲得環氧樹脂硬化促進劑(Q'-1)。<Comparative Example 1> The same as Example 1 except that the fourth-order phosphonium base (A-Be1) in Example 1 was replaced with the fourth-order phosphonium base (A-Be'1) manufactured in Comparative Manufacturing Example 1. Way to obtain epoxy resin hardening accelerator (Q'-1).

<比較例2> 除了不使用實施例2中的間苯三酚,且將苯酚酚醛清漆樹脂200份變更為326份以外,以與實施例2相同的方式獲得環氧樹脂硬化促進劑(Q'-2)。<Comparative Example 2> An epoxy resin hardening accelerator (Q′) was obtained in the same manner as in Example 2 except that the resorcinol in Example 2 was not used and the phenol novolac resin was changed from 200 parts to 326 parts. -2).

<比較例3> 除了代替實施例3中的1,3,5-苯三羧酸而變更為對苯二甲酸(東京化成工業股份有限公司製造)以外,以與實施例3相同的方式獲得環氧樹脂硬化促進劑(Q'-3)。<Comparative Example 3> A ring was obtained in the same manner as in Example 3, except that instead of 1,3,5-benzenetricarboxylic acid in Example 3 was changed to terephthalic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) Oxygen resin hardening accelerator (Q'-3).

<比較例4> 除了不使用實施例4中的5-甲基間苯二甲酸,且將苯酚酚醛清漆樹脂200份變更為480份以外,以與實施例4相同的方式獲得環氧樹脂硬化促進劑(Q'-4)。<Comparative Example 4> An epoxy resin hardening promotion was obtained in the same manner as in Example 4, except that the 5-methylisophthalic acid in Example 4 was not used and the phenol novolac resin was changed from 200 parts to 480 parts. Agent (Q'-4).

<比較例5> 除了將實施例1中的210份偏苯三甲酸變更為4-磺基鄰苯二甲酸的50%水溶液(東京化成工業股份有限公司製造)420份以外,以與實施例4相同的方式獲得環氧樹脂硬化促進劑(Q'-5)。<Comparative Example 5> Except that 210 parts of trimellitic acid in Example 1 was changed to 420 parts of a 50% aqueous solution of 4-sulfophthalic acid (manufactured by Tokyo Chemical Industry Co., Ltd.), the same as Example 4 The epoxy resin hardening accelerator (Q'-5) was obtained in the same way.

<性能評價> 利用以下方法,對實施例1~實施例6中製成的本發明的環氧樹脂硬化促進劑(Q-1)~環氧樹脂硬化促進劑(Q-6)、以及比較例1~比較例5中製成的用以比較的環氧樹脂硬化促進劑(Q'-1)~環氧樹脂硬化促進劑(Q'-5)的流動性、以及硬化性進行評價。<Performance Evaluation> The epoxy resin hardening accelerator (Q-1) to epoxy resin hardening accelerator (Q-6) of the present invention prepared in Examples 1 to 6 and the comparative example were prepared by the following methods The flowability and curability of the epoxy resin hardening accelerators (Q'-1) to epoxy resin hardening accelerators (Q'-5) prepared in Comparative Examples 5 to 5 were evaluated.

<流動性(流值)> 於100份的聯苯型環氧樹脂(軟化點為105℃,環氧當量為192)、78重量份的對伸二甲苯基酚樹脂(軟化點為80℃,羥基當量為174)、1000份的經1重量%的矽烷偶合劑進行處理的熔融二氧化矽粉末、1.5份的巴西棕櫚蠟、4份的三氧化銻及1份的碳黑中,均勻地粉碎混合12份的各例中所得的環氧樹脂硬化促進劑(Q)後,使用110℃的熱輥進行5分鐘熔融混練,冷卻後加以粉碎而獲得密封材料。關於該密封材料,依據EMMI 1-66的方法來測定175℃(70 kg/cm2 )下的螺旋流(spiral flow)的流值(單位為cm),作為流動性的指標。<Flowability (flow value)> 100 parts of biphenyl type epoxy resin (softening point 105°C, epoxy equivalent 192), 78 parts by weight of p-xylylphenol resin (softening point 80°C, hydroxyl group) Equivalent to 174), 1000 parts of fused silica powder treated with 1% by weight of silane coupling agent, 1.5 parts of carnauba wax, 4 parts of antimony trioxide and 1 part of carbon black, uniformly crushed and mixed After 12 parts of the epoxy resin hardening accelerator (Q) obtained in each example, it was melt-kneaded using a hot roll at 110° C. for 5 minutes, cooled, and then pulverized to obtain a sealing material. Regarding this sealing material, the flow value (in cm) of the spiral flow at 175°C (70 kg/cm 2 ) was measured according to the method of EMMI 1-66 as an index of fluidity.

<硬化性(硬化扭矩)> 使用Curelastometer V型(日合商務公司製造,商品名),於溫度為175℃、樹脂用晶片(dice)P-200以及振幅角度±1°的條件下,對各種所述密封劑測定硬化扭矩,將硬化扭矩的上升點作為凝膠時間(單位為秒),將自測定開始起90秒後的硬化扭矩的值(單位為kgf・cm)作為硬化性(脫模時的強度及硬度)的指標。<Curability (hardening torque)> Use the Curelastometer V type (manufactured by Nippon Trading Co., Ltd., brand name) at a temperature of 175°C, a resin Pice (Dice) P-200, and an amplitude angle of ±1° The sealant measures the hardening torque, the rise time of the hardening torque is taken as the gel time (in seconds), and the value of the hardening torque (in kgf·cm) after 90 seconds from the start of the measurement is taken as the hardenability (mold release) Strength and hardness).

將實施例1~實施例6以及比較例1~比較例5中獲得的環氧樹脂硬化促進劑(Q)的評價結果示於表1中。The evaluation results of the epoxy resin hardening accelerator (Q) obtained in Examples 1 to 6 and Comparative Examples 1 to 5 are shown in Table 1.

[表1]

Figure 105100213-A0304-0001
[Table 1]
Figure 105100213-A0304-0001

如表1所明示,可知:本發明的實施例1~實施例6的環氧樹脂硬化促進劑(Q)的熔融混練後的密封劑的流值高,流動性優異,另外,硬化扭矩亦高,硬化性優異。 另一方面,於包含四烷基鏻陽離子的比較例1中可知:由於鏻陽離子的穩定性低,因此熔融混練後的密封劑的流值變得非常低,成形性劣化。 另外,於不包含有機酚化合物(C)的比較例2、以及於有機羧酸(B)的間位不包含可進行氫鍵結的基團的比較例3中可知:由於有機羧酸(B)與有機酚化合物(C)的相互作用不充分,因此無法抑制熔融混練時的反應,流值降低。 於不包含有機羧酸(B)的比較例4中可知:由於在熔融混練的溫度下,觸媒解離,因此流值降低。 於在有機羧酸化合物(B)中含有作為強酸的磺酸基的比較例5中,由於在硬化溫度下,觸媒亦難以解離,因此硬化性不充分。 [產業上之可利用性]As clearly shown in Table 1, it can be seen that the flow rate of the sealant after melt-kneading of the epoxy resin hardening accelerators (Q) of Examples 1 to 6 of the present invention is high, the fluidity is excellent, and the hardening torque is also high , Excellent curability. On the other hand, in Comparative Example 1 containing tetraalkylphosphonium cations, it is known that since the stability of phosphonium cations is low, the flow value of the sealant after melt-kneading becomes very low, and the formability deteriorates. In addition, in Comparative Example 2 that does not include the organic phenol compound (C) and Comparative Example 3 that does not include a hydrogen-bondable group at the meta position of the organic carboxylic acid (B), it is known that the organic carboxylic acid (B ) The interaction with the organic phenol compound (C) is insufficient, so the reaction at the time of melt-kneading cannot be suppressed, and the flow value decreases. In Comparative Example 4 that does not contain the organic carboxylic acid (B), it is known that the catalyst dissociates at the temperature of melt-kneading, so the flow value decreases. In Comparative Example 5 in which the sulfonic acid group as a strong acid was contained in the organic carboxylic acid compound (B), since the catalyst was also difficult to dissociate at the curing temperature, the curability was insufficient. [Industry availability]

本發明的環氧樹脂硬化促進劑(Q)由於熔融混練後的流動性、以及硬化性優異,因此可用於製造半導體等電子零件用的環氧樹脂系密封材料。The epoxy resin hardening accelerator (Q) of the present invention is excellent in fluidity and curability after melt-kneading, and therefore can be used for manufacturing epoxy resin-based sealing materials for electronic components such as semiconductors.

no

no

Figure 01_image001
Figure 01_image001

Claims (5)

一種環氧樹脂硬化促進劑,其特徵在於包含:通式(1)所表示的四級鏻(A)、包含通式(2)所表示的有機羧酸(B)的陰離子的鏻鹽(S)、以及通式(3)所表示的有機酚化合物(C),
Figure 105100213-A0305-02-0020-1
[式(1)中,R1~R3表示碳數6~12的芳基,R4表示碳數1~8的烷基或者碳數6~12的芳基]
Figure 105100213-A0305-02-0020-2
[式(2)中,R5~R7相同或不同,分別表示羥基、羧基、氫或者碳數1~4的烷基,R8表示羥基或羧基]
Figure 105100213-A0305-02-0020-3
[式(3)中,R9~R11相同或不同,分別表示羥基、氫或者碳數1~4的烷基]。
An epoxy resin hardening accelerator, characterized by comprising: a fourth-order phosphonium (A) represented by the general formula (1), and a phosphonium salt (S) containing an anion of the organic carboxylic acid (B) represented by the general formula (2) ), and the organic phenol compound (C) represented by the general formula (3),
Figure 105100213-A0305-02-0020-1
[In formula (1), R 1 to R 3 represent an aryl group having 6 to 12 carbon atoms, and R 4 represents an alkyl group having 1 to 8 carbon atoms or an aryl group having 6 to 12 carbon atoms]
Figure 105100213-A0305-02-0020-2
[In formula (2), R 5 to R 7 are the same or different, and each represents a hydroxyl group, a carboxyl group, hydrogen, or a C 1-4 alkyl group, and R 8 represents a hydroxyl group or a carboxyl group]
Figure 105100213-A0305-02-0020-3
[In formula (3), R 9 to R 11 are the same or different, and each represents a hydroxyl group, hydrogen, or a C 1-4 alkyl group].
如申請專利範圍第1項所述的環氧樹脂硬化促進劑,其中通式(3)中,R9及R11為氫、R10為羥基。 The epoxy resin hardening accelerator as described in item 1 of the patent application scope, wherein in the general formula (3), R 9 and R 11 are hydrogen, and R 10 is a hydroxyl group. 如申請專利範圍第1項或第2項所述的環氧樹脂硬化促進劑,其中通式(2)中,R5及R7為氫,R6為羥基或羧基。 The epoxy resin hardening accelerator as described in Item 1 or Item 2 of the patent application scope, wherein in the general formula (2), R 5 and R 7 are hydrogen, and R 6 is a hydroxyl group or a carboxyl group. 如申請專利範圍第1項或第2項所述的環氧樹脂硬化促進劑,其中有機羧酸(B)與有機酚化合物(C)的莫耳比為80/20~20/80。 The epoxy resin hardening accelerator as described in item 1 or 2 of the patent application range, wherein the molar ratio of the organic carboxylic acid (B) to the organic phenol compound (C) is 80/20 to 20/80. 如申請專利範圍第1項或第2項所述的環氧樹脂硬化促進劑,其中藉由四級鏻(A)的烷基碳酸鹽與有機羧酸(B)的鹽交換反應來合成鏻鹽(S)。The epoxy resin hardening accelerator as described in item 1 or item 2 of the patent application scope, wherein the phosphonium salt is synthesized by the salt exchange reaction between the alkyl carbonate of the fourth-order phosphonium (A) and the organic carboxylic acid (B) (S).
TW105100213A 2015-01-30 2016-01-06 Epoxy resin hardening accelerator TWI687449B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015-016329 2015-01-30
JP2015016329 2015-01-30

Publications (2)

Publication Number Publication Date
TW201627345A TW201627345A (en) 2016-08-01
TWI687449B true TWI687449B (en) 2020-03-11

Family

ID=56542592

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105100213A TWI687449B (en) 2015-01-30 2016-01-06 Epoxy resin hardening accelerator

Country Status (5)

Country Link
JP (1) JP6640120B2 (en)
KR (1) KR102378915B1 (en)
CN (1) CN107075088B (en)
TW (1) TWI687449B (en)
WO (1) WO2016120925A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6741988B2 (en) * 2016-07-04 2020-08-19 パナソニックIpマネジメント株式会社 Encapsulating epoxy resin composition, method for producing encapsulating epoxy resin composition, cured product of encapsulating epoxy resin composition, and semiconductor device
WO2018015981A1 (en) * 2016-07-21 2018-01-25 パナソニックIpマネジメント株式会社 Semiconductor-sealing resin composition, cured product, and semiconductor device
JP6827210B2 (en) * 2016-07-29 2021-02-10 パナソニックIpマネジメント株式会社 Epoxy resin composition for encapsulation and method for manufacturing semiconductor devices
JP6688992B2 (en) * 2016-07-29 2020-04-28 パナソニックIpマネジメント株式会社 Epoxy resin composition for encapsulation, cured product, and semiconductor device
CN109904131B (en) * 2019-02-22 2020-11-17 西安航思半导体有限公司 High stability DFN packaged device
WO2021210384A1 (en) * 2020-04-14 2021-10-21 サンアプロ株式会社 Epoxy resin composition

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0320065A (en) * 1989-03-27 1991-01-29 Nitto Denko Corp Semiconductor device
JP2003286335A (en) * 2002-03-29 2003-10-10 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
TW583261B (en) * 2000-09-29 2004-04-11 Sumitomo Bakelite Co Thermosetting resin composition and its use in epoxy resin molding material and semiconductor device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003292582A (en) * 2002-03-29 2003-10-15 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
JP2004256643A (en) 2003-02-25 2004-09-16 Matsushita Electric Works Ltd Semiconductor sealing epoxy resin composition and semiconductor device
JP4317432B2 (en) 2003-12-04 2009-08-19 日東電工株式会社 Epoxy resin composition for semiconductor encapsulation and semiconductor device using the same
JP4429768B2 (en) * 2004-03-16 2010-03-10 サンアプロ株式会社 Epoxy resin composition for semiconductor encapsulation
JP2013216871A (en) * 2012-03-12 2013-10-24 San Apro Kk Epoxy resin curing accelerator
KR101593731B1 (en) * 2012-12-24 2016-02-12 제일모직주식회사 Tetravalent phosphonium salt, epoxy resin composition for encapsulating semiconductor device comprising the same and semiconductor device encapsulated with the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0320065A (en) * 1989-03-27 1991-01-29 Nitto Denko Corp Semiconductor device
TW583261B (en) * 2000-09-29 2004-04-11 Sumitomo Bakelite Co Thermosetting resin composition and its use in epoxy resin molding material and semiconductor device
JP2003286335A (en) * 2002-03-29 2003-10-10 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device

Also Published As

Publication number Publication date
JPWO2016120925A1 (en) 2017-11-09
KR102378915B1 (en) 2022-03-24
TW201627345A (en) 2016-08-01
JP6640120B2 (en) 2020-02-05
KR20170108934A (en) 2017-09-27
CN107075088B (en) 2020-08-11
WO2016120925A1 (en) 2016-08-04
CN107075088A (en) 2017-08-18

Similar Documents

Publication Publication Date Title
TWI687449B (en) Epoxy resin hardening accelerator
JP6023992B1 (en) Epoxy resin composition for sealing, cured product, and semiconductor device
TW201800439A (en) Epoxy resin curing accelerator
JP6917707B2 (en) Epoxy resin curing accelerator
JP3672225B2 (en) Thermosetting resin composition, epoxy resin molding material and semiconductor device using the same
JP5055679B2 (en) Thermosetting resin composition, epoxy resin molding material and semiconductor device using the same
JP4830543B2 (en) Method for producing latent catalyst and epoxy resin composition
TW201341421A (en) Epoxy resin hardening accelerator
JP2006307131A (en) Preparation method for latent catalyst, and epoxy resin composition
JP3672224B2 (en) Thermosetting resin composition, epoxy resin molding material and semiconductor device using the same
JP2018203916A (en) Epoxy resin composition
JP2018203963A (en) Epoxy resin curing accelerator and epoxy resin composition
JP6678075B2 (en) Epoxy resin curing accelerator
JP6857836B2 (en) Epoxy resin composition for encapsulation, cured product, and semiconductor device
JP2018002911A (en) Epoxy resin composition for sealing, cured product, and semiconductor device
JP4595223B2 (en) Thermosetting resin composition, epoxy resin molding material and semiconductor device
JP2003292732A (en) Thermosetting resin composition, epoxy resin molding material and semiconductor device
US6753086B2 (en) Thermosetting resin composition, epoxy resin molding material and semiconductor device
JP2003292584A (en) Thermosetting resin composition and epoxy resin molding material and semiconductor device using the same
JP2003292574A (en) Curing accelerator, thermosetting resin composition using the same and semiconductor device
JP2000319359A (en) Thermosetting resin composition
JP2002284854A (en) Thermosetting resin composition, epoxy resin molding material using the same, and semiconductor device
JP2002284855A (en) Thermosetting resin composition, epoxy resin molding material using the same, and semiconductor device
JP4622024B2 (en) Epoxy resin composition and semiconductor device
JP2007084702A (en) Phenolic resin salt of tetraalkylphosphonium