TWI686900B - 半導體元件結構以及在基板中形成半導體插塞的方法 - Google Patents
半導體元件結構以及在基板中形成半導體插塞的方法 Download PDFInfo
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- TWI686900B TWI686900B TW106119043A TW106119043A TWI686900B TW I686900 B TWI686900 B TW I686900B TW 106119043 A TW106119043 A TW 106119043A TW 106119043 A TW106119043 A TW 106119043A TW I686900 B TWI686900 B TW I686900B
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 325
- 239000000758 substrate Substances 0.000 title claims abstract description 139
- 238000000034 method Methods 0.000 title claims description 32
- 239000002019 doping agent Substances 0.000 claims abstract description 116
- 238000009792 diffusion process Methods 0.000 claims description 32
- 238000005530 etching Methods 0.000 claims description 17
- 238000000137 annealing Methods 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 15
- 238000011049 filling Methods 0.000 claims description 12
- 229910052710 silicon Inorganic materials 0.000 claims description 11
- 239000010703 silicon Substances 0.000 claims description 11
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 10
- 229920005591 polysilicon Polymers 0.000 claims description 10
- 239000010410 layer Substances 0.000 description 128
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 238000002955 isolation Methods 0.000 description 9
- 238000004088 simulation Methods 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 239000000370 acceptor Substances 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
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- 238000007796 conventional method Methods 0.000 description 1
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- 230000001052 transient effect Effects 0.000 description 1
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- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76897—Formation of self-aligned vias or contact plugs, i.e. involving a lithographically uncritical step
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- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0642—Isolation within the component, i.e. internal isolation
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
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- H01L29/861—Diodes
- H01L29/8611—Planar PN junction diodes
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Element Separation (AREA)
- Electrodes Of Semiconductors (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15/190,469 US20170373142A1 (en) | 2016-06-23 | 2016-06-23 | Semiconductor device having side-diffused trench plug |
US15/190,469 | 2016-06-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201803022A TW201803022A (zh) | 2018-01-16 |
TWI686900B true TWI686900B (zh) | 2020-03-01 |
Family
ID=60677857
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW106119043A TWI686900B (zh) | 2016-06-23 | 2017-06-08 | 半導體元件結構以及在基板中形成半導體插塞的方法 |
Country Status (6)
Country | Link |
---|---|
US (3) | US20170373142A1 (ko) |
EP (1) | EP3475974B1 (ko) |
KR (1) | KR102215893B1 (ko) |
CN (3) | CN116936457A (ko) |
TW (1) | TWI686900B (ko) |
WO (1) | WO2017222745A1 (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10985242B2 (en) * | 2019-03-06 | 2021-04-20 | Littelfuse, Inc. | Power semiconductor device having guard ring structure, and method of formation |
EP4407668A1 (en) * | 2023-01-27 | 2024-07-31 | Infineon Technologies Dresden GmbH & Co . KG | Semiconductor arrangement with guard structure |
Citations (2)
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US20090096021A1 (en) * | 2005-02-15 | 2009-04-16 | Loechelt Gary H | Semiconductor device having deep trench charge compensation regions and method |
US20150061007A1 (en) * | 2013-08-28 | 2015-03-05 | Taiwan Semiconductor Manufacturing Co., Ltd. | High-voltage super junction by trench and epitaxial doping |
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JPS59165455A (ja) * | 1983-03-10 | 1984-09-18 | Toshiba Corp | 半導体装置 |
JPH07112049B2 (ja) * | 1992-01-09 | 1995-11-29 | インターナショナル・ビジネス・マシーンズ・コーポレイション | ダイナミック・ランダム・アクセス・メモリ・デバイスおよび製造方法 |
US5539238A (en) * | 1992-09-02 | 1996-07-23 | Texas Instruments Incorporated | Area efficient high voltage Mosfets with vertical resurf drift regions |
GB2322736B (en) * | 1997-02-28 | 2002-06-26 | Int Rectifier Corp | Integrated photovoltaic switch with integrated power device |
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US6096598A (en) * | 1998-10-29 | 2000-08-01 | International Business Machines Corporation | Method for forming pillar memory cells and device formed thereby |
US6762447B1 (en) * | 1999-02-05 | 2004-07-13 | Infineon Technologies North America Corp. | Field-shield-trench isolation for gigabit DRAMs |
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TWI296844B (en) * | 2002-07-12 | 2008-05-11 | Winbond Electronics Corp | A plug structure having low contact resistance and manufacturing method thereof |
US7041572B2 (en) * | 2002-10-25 | 2006-05-09 | Vanguard International Semiconductor Corporation | Fabrication method for a deep trench isolation structure of a high-voltage device |
US6846744B1 (en) * | 2003-10-17 | 2005-01-25 | Nanya Technology Corp. | Method of fabricating a bottle shaped deep trench for trench capacitor DRAM devices |
KR100574560B1 (ko) * | 2004-12-31 | 2006-04-27 | 동부일렉트로닉스 주식회사 | 반도체 소자의 금속배선 형성 방법 |
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JP5222466B2 (ja) * | 2006-08-09 | 2013-06-26 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
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2016
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2017
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- 2017-05-26 WO PCT/US2017/034644 patent/WO2017222745A1/en unknown
- 2017-05-26 CN CN202311147153.4A patent/CN116936457A/zh active Pending
- 2017-05-26 KR KR1020197001871A patent/KR102215893B1/ko active IP Right Grant
- 2017-05-26 CN CN202311146054.4A patent/CN116936609A/zh active Pending
- 2017-05-26 CN CN201780045586.5A patent/CN109643686B/zh active Active
- 2017-06-08 TW TW106119043A patent/TWI686900B/zh active
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2019
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2020
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US20170373142A1 (en) | 2017-12-28 |
CN109643686B (zh) | 2023-08-29 |
US11688763B2 (en) | 2023-06-27 |
KR102215893B1 (ko) | 2021-02-16 |
WO2017222745A1 (en) | 2017-12-28 |
CN116936457A (zh) | 2023-10-24 |
US20190326390A1 (en) | 2019-10-24 |
CN109643686A (zh) | 2019-04-16 |
EP3475974A4 (en) | 2020-03-04 |
EP3475974A1 (en) | 2019-05-01 |
TW201803022A (zh) | 2018-01-16 |
US20210091178A1 (en) | 2021-03-25 |
EP3475974B1 (en) | 2023-10-11 |
US10943975B2 (en) | 2021-03-09 |
CN116936609A (zh) | 2023-10-24 |
KR20190019191A (ko) | 2019-02-26 |
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