TWI683184B - 感光性黑色樹脂組成物、黑色硬化膜的製造方法、彩色濾光片及有機el顯示裝置 - Google Patents

感光性黑色樹脂組成物、黑色硬化膜的製造方法、彩色濾光片及有機el顯示裝置 Download PDF

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Publication number
TWI683184B
TWI683184B TW104131977A TW104131977A TWI683184B TW I683184 B TWI683184 B TW I683184B TW 104131977 A TW104131977 A TW 104131977A TW 104131977 A TW104131977 A TW 104131977A TW I683184 B TWI683184 B TW I683184B
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Taiwan
Prior art keywords
group
black
cured film
resin composition
mass
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TW104131977A
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English (en)
Chinese (zh)
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TW201612640A (en
Inventor
浜田大輔
久保田誠
江副利秀
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日商富士軟片股份有限公司
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Publication of TW201612640A publication Critical patent/TW201612640A/zh
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/38—Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
  • Optical Filters (AREA)
TW104131977A 2014-09-30 2015-09-30 感光性黑色樹脂組成物、黑色硬化膜的製造方法、彩色濾光片及有機el顯示裝置 TWI683184B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014201634 2014-09-30
JP2014-201634 2014-09-30

Publications (2)

Publication Number Publication Date
TW201612640A TW201612640A (en) 2016-04-01
TWI683184B true TWI683184B (zh) 2020-01-21

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TW104131977A TWI683184B (zh) 2014-09-30 2015-09-30 感光性黑色樹脂組成物、黑色硬化膜的製造方法、彩色濾光片及有機el顯示裝置

Country Status (3)

Country Link
JP (1) JP6476198B2 (ja)
TW (1) TWI683184B (ja)
WO (1) WO2016052328A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11603458B2 (en) 2020-09-29 2023-03-14 Echem Solutions Corp. Black resin composition, cured film, and black filter

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180085231A (ko) * 2017-01-18 2018-07-26 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 이로부터 제조된 화상표시장치용 블랙 매트릭스, 컬럼 스페이서 및 블랙 매트릭스 일체형 컬럼 스페이서

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201022373A (en) * 2008-10-03 2010-06-16 Fujifilm Corp Dispersion composition, polymerizable composition, light-blocking color filter, solid-state image sensor, liquid crystal display device, wafer level lens, and imaging unit

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5201821B2 (ja) * 2005-12-13 2013-06-05 東洋インキＳｃホールディングス株式会社 着色組成物、およびそれを用いたカラーフィルタ
JP5108300B2 (ja) * 2006-12-28 2012-12-26 新日鉄住金化学株式会社 感光性樹脂組成物及びそれを用いたカラーフィルター
JP2013054079A (ja) * 2011-08-31 2013-03-21 Fujifilm Corp 光硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子
JP6241153B2 (ja) * 2012-09-10 2017-12-06 三菱ケミカル株式会社 遮光材、着色樹脂組成物、カラーフィルタ、及び液晶表示装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201022373A (en) * 2008-10-03 2010-06-16 Fujifilm Corp Dispersion composition, polymerizable composition, light-blocking color filter, solid-state image sensor, liquid crystal display device, wafer level lens, and imaging unit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11603458B2 (en) 2020-09-29 2023-03-14 Echem Solutions Corp. Black resin composition, cured film, and black filter

Also Published As

Publication number Publication date
TW201612640A (en) 2016-04-01
JPWO2016052328A1 (ja) 2017-06-15
JP6476198B2 (ja) 2019-02-27
WO2016052328A1 (ja) 2016-04-07

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