TWI667365B - 用於前驅物之大量蒸發的系統及方法 - Google Patents
用於前驅物之大量蒸發的系統及方法 Download PDFInfo
- Publication number
- TWI667365B TWI667365B TW104109678A TW104109678A TWI667365B TW I667365 B TWI667365 B TW I667365B TW 104109678 A TW104109678 A TW 104109678A TW 104109678 A TW104109678 A TW 104109678A TW I667365 B TWI667365 B TW I667365B
- Authority
- TW
- Taiwan
- Prior art keywords
- heating
- temperature
- liquid precursor
- partition
- spacers
- Prior art date
Links
- 239000002243 precursor Substances 0.000 title claims abstract description 31
- 238000000034 method Methods 0.000 title claims description 35
- 230000008016 vaporization Effects 0.000 title 1
- 238000009834 vaporization Methods 0.000 title 1
- 239000012705 liquid precursor Substances 0.000 claims abstract description 73
- 238000001704 evaporation Methods 0.000 claims abstract description 63
- 230000008020 evaporation Effects 0.000 claims abstract description 51
- 239000012159 carrier gas Substances 0.000 claims abstract description 29
- 239000000758 substrate Substances 0.000 claims abstract description 16
- 238000012545 processing Methods 0.000 claims abstract description 15
- 238000004891 communication Methods 0.000 claims abstract description 11
- 239000012530 fluid Substances 0.000 claims abstract description 7
- 238000010438 heat treatment Methods 0.000 claims description 135
- 125000006850 spacer group Chemical group 0.000 claims description 59
- 238000005192 partition Methods 0.000 claims description 52
- 239000007789 gas Substances 0.000 description 17
- 239000007788 liquid Substances 0.000 description 13
- 238000000429 assembly Methods 0.000 description 4
- 230000000712 assembly Effects 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 238000000231 atomic layer deposition Methods 0.000 description 3
- 238000004590 computer program Methods 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 239000006260 foam Substances 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 239000000443 aerosol Substances 0.000 description 1
- 238000009530 blood pressure measurement Methods 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24H—FLUID HEATERS, e.g. WATER OR AIR HEATERS, HAVING HEAT-GENERATING MEANS, e.g. HEAT PUMPS, IN GENERAL
- F24H9/00—Details
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
- C23C16/4482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45587—Mechanical means for changing the gas flow
- C23C16/45591—Fixed means, e.g. wings, baffles
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Combustion & Propulsion (AREA)
- Thermal Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical Vapour Deposition (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/227,503 US9964332B2 (en) | 2014-03-27 | 2014-03-27 | Systems and methods for bulk vaporization of precursor |
| US14/227,503 | 2014-03-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201546318A TW201546318A (zh) | 2015-12-16 |
| TWI667365B true TWI667365B (zh) | 2019-08-01 |
Family
ID=54162128
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104109678A TWI667365B (zh) | 2014-03-27 | 2015-03-26 | 用於前驅物之大量蒸發的系統及方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9964332B2 (https=) |
| JP (1) | JP6602030B2 (https=) |
| KR (2) | KR102395768B1 (https=) |
| CN (2) | CN109898071B (https=) |
| TW (1) | TWI667365B (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102629005B1 (ko) * | 2016-03-29 | 2024-01-25 | 주식회사 선익시스템 | 다수 종류의 증착물질의 혼합비율을 보완하여 줄 수 있는 복합증발장치 |
| US10480070B2 (en) * | 2016-05-12 | 2019-11-19 | Versum Materials Us, Llc | Delivery container with flow distributor |
| CN109029635A (zh) * | 2017-06-12 | 2018-12-18 | 北京北方华创微电子装备有限公司 | 一种固态源的检测装置及其检测方法 |
| US10822699B2 (en) * | 2017-12-29 | 2020-11-03 | Varian Semiconductor Equipment Associates, Inc. | Techniques for controlling precursors in chemical deposition processes |
| US11624113B2 (en) * | 2019-09-13 | 2023-04-11 | Asm Ip Holding B.V. | Heating zone separation for reactant evaporation system |
| KR102272808B1 (ko) * | 2019-11-22 | 2021-07-02 | 세종대학교산학협력단 | 평탄화 장치 및 이를 포함하는 기판 처리 장치, 기판 처리 방법 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4962297A (en) * | 1988-03-30 | 1990-10-09 | Aktiebolaget Electrolux | Temperature controlled hot plate |
| US5451258A (en) * | 1994-05-11 | 1995-09-19 | Materials Research Corporation | Apparatus and method for improved delivery of vaporized reactant gases to a reaction chamber |
| US6444043B1 (en) * | 1999-03-29 | 2002-09-03 | Antec Solar Gmbh | Apparatus for depositing CdS and CdTe layers on substrates by means of a CSS process |
| US6453992B1 (en) * | 1999-05-10 | 2002-09-24 | Hyundai Electronics Industries Co., Ltd. | Temperature controllable gas distributor |
| EP1932942A2 (en) * | 2006-12-15 | 2008-06-18 | Air Products and Chemicals, Inc. | Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2405494A (en) * | 1944-03-29 | 1946-08-06 | Cedar Corp N O | Air treating apparatus |
| US3404210A (en) * | 1967-06-23 | 1968-10-01 | American Air Filter Co | Melting furnace |
| JPS5239652A (en) * | 1975-09-22 | 1977-03-28 | Microbial Chem Res Found | Process for isolating kanamycin b derivatives with high purity |
| US5133284A (en) * | 1990-07-16 | 1992-07-28 | National Semiconductor Corp. | Gas-based backside protection during substrate processing |
| JP3391829B2 (ja) * | 1991-12-26 | 2003-03-31 | キヤノン株式会社 | 液体状の原料を用いる化学気相堆積法及び装置 |
| KR100311672B1 (ko) * | 1994-05-11 | 2001-12-15 | 히가시 데츠로 | 반응가스송출장치및방법 |
| US5480678A (en) * | 1994-11-16 | 1996-01-02 | The B. F. Goodrich Company | Apparatus for use with CVI/CVD processes |
| US6718126B2 (en) * | 2001-09-14 | 2004-04-06 | Applied Materials, Inc. | Apparatus and method for vaporizing solid precursor for CVD or atomic layer deposition |
| TW200300701A (en) * | 2001-11-30 | 2003-06-16 | Asml Us Inc | High flow rate bubbler system and method |
| US6946033B2 (en) * | 2002-09-16 | 2005-09-20 | Applied Materials Inc. | Heated gas distribution plate for a processing chamber |
| US8518484B2 (en) | 2007-01-29 | 2013-08-27 | Praxair Technology, Inc. | Bubbler apparatus and delivery method |
| JP4306764B2 (ja) * | 2007-06-04 | 2009-08-05 | トヨタ自動車株式会社 | 車間距離制御装置 |
| DE102010033153B4 (de) * | 2010-08-03 | 2020-06-18 | Otto Männer Innovation GmbH | Spritzgießdüse |
| KR20120131947A (ko) * | 2011-05-27 | 2012-12-05 | 엘지디스플레이 주식회사 | 증발원 및 이를 이용한 증착장치 |
| JP2013044043A (ja) * | 2011-08-26 | 2013-03-04 | Hitachi Kokusai Electric Inc | 基板処理装置 |
-
2014
- 2014-03-27 US US14/227,503 patent/US9964332B2/en active Active
-
2015
- 2015-03-20 JP JP2015057019A patent/JP6602030B2/ja active Active
- 2015-03-26 CN CN201910129364.2A patent/CN109898071B/zh active Active
- 2015-03-26 CN CN201510136272.9A patent/CN104947078B/zh active Active
- 2015-03-26 TW TW104109678A patent/TWI667365B/zh active
- 2015-03-26 KR KR1020150042504A patent/KR102395768B1/ko active Active
-
2022
- 2022-05-03 KR KR1020220054780A patent/KR102563448B1/ko active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4962297A (en) * | 1988-03-30 | 1990-10-09 | Aktiebolaget Electrolux | Temperature controlled hot plate |
| US5451258A (en) * | 1994-05-11 | 1995-09-19 | Materials Research Corporation | Apparatus and method for improved delivery of vaporized reactant gases to a reaction chamber |
| US6444043B1 (en) * | 1999-03-29 | 2002-09-03 | Antec Solar Gmbh | Apparatus for depositing CdS and CdTe layers on substrates by means of a CSS process |
| US6453992B1 (en) * | 1999-05-10 | 2002-09-24 | Hyundai Electronics Industries Co., Ltd. | Temperature controllable gas distributor |
| EP1932942A2 (en) * | 2006-12-15 | 2008-06-18 | Air Products and Chemicals, Inc. | Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2016027611A (ja) | 2016-02-18 |
| CN109898071A (zh) | 2019-06-18 |
| KR20150112874A (ko) | 2015-10-07 |
| CN109898071B (zh) | 2021-12-31 |
| KR102563448B1 (ko) | 2023-08-03 |
| TW201546318A (zh) | 2015-12-16 |
| CN104947078B (zh) | 2019-03-22 |
| US20150276264A1 (en) | 2015-10-01 |
| JP6602030B2 (ja) | 2019-11-06 |
| US9964332B2 (en) | 2018-05-08 |
| KR102395768B1 (ko) | 2022-05-06 |
| KR20220064941A (ko) | 2022-05-19 |
| CN104947078A (zh) | 2015-09-30 |
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