TWI661275B - Light source device, exposure device and light source control method - Google Patents

Light source device, exposure device and light source control method Download PDF

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Publication number
TWI661275B
TWI661275B TW105117041A TW105117041A TWI661275B TW I661275 B TWI661275 B TW I661275B TW 105117041 A TW105117041 A TW 105117041A TW 105117041 A TW105117041 A TW 105117041A TW I661275 B TWI661275 B TW I661275B
Authority
TW
Taiwan
Prior art keywords
light
emitting element
exposure
wavelength characteristic
output
Prior art date
Application number
TW105117041A
Other languages
English (en)
Chinese (zh)
Other versions
TW201716876A (zh
Inventor
比企達也
木村文男
Original Assignee
日商亞多特克工程股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商亞多特克工程股份有限公司 filed Critical 日商亞多特克工程股份有限公司
Publication of TW201716876A publication Critical patent/TW201716876A/zh
Application granted granted Critical
Publication of TWI661275B publication Critical patent/TWI661275B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW105117041A 2015-06-02 2016-05-31 Light source device, exposure device and light source control method TWI661275B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015-111865 2015-06-02
JP2015111865A JP6503235B2 (ja) 2015-06-02 2015-06-02 光源装置、露光装置及び光源制御方法

Publications (2)

Publication Number Publication Date
TW201716876A TW201716876A (zh) 2017-05-16
TWI661275B true TWI661275B (zh) 2019-06-01

Family

ID=57440968

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105117041A TWI661275B (zh) 2015-06-02 2016-05-31 Light source device, exposure device and light source control method

Country Status (5)

Country Link
JP (1) JP6503235B2 (ja)
KR (1) KR102055670B1 (ja)
CN (1) CN107850850B (ja)
TW (1) TWI661275B (ja)
WO (1) WO2016194378A1 (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6503235B2 (ja) * 2015-06-02 2019-04-17 株式会社アドテックエンジニアリング 光源装置、露光装置及び光源制御方法
JP6623847B2 (ja) * 2016-03-07 2019-12-25 ウシオ電機株式会社 光源装置及びこれを備えた露光装置
CN109983396B (zh) 2016-11-17 2022-04-19 凸版印刷株式会社 反射型显示装置
CN110945430B (zh) * 2017-07-25 2022-08-12 凸版印刷株式会社 曝光装置及曝光方法
CN107678251B (zh) * 2017-11-10 2024-02-27 中国电子科技集团公司第四十一研究所 一种激光直写仪加工微波毫米波电路的样品台和使用方法
JP7060244B2 (ja) * 2018-12-12 2022-04-26 フェニックス電機株式会社 露光装置用光源、それを用いた露光装置、およびレジストの露光方法
US20220255288A1 (en) * 2019-05-22 2022-08-11 Cymer, Llc Apparatus for and method of generating multiple laser beams
CN110806682B (zh) * 2019-12-05 2024-05-28 中山新诺科技股份有限公司 阻焊线路一体曝光的多光谱数字化曝光方法及系统
WO2024023885A1 (ja) * 2022-07-25 2024-02-01 株式会社ニコン パターン露光装置、及びデバイス製造方法
WO2024166268A1 (ja) * 2023-02-08 2024-08-15 株式会社ニコン 露光方法、露光装置、及びデバイス製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003215809A (ja) * 2002-01-28 2003-07-30 Pentax Corp 露光装置および露光方法
JP2006017689A (ja) * 2004-07-04 2006-01-19 Ccs Inc 光源装置
JP2009237490A (ja) * 2008-03-28 2009-10-15 Fujifilm Corp 露光システム
JP2012063390A (ja) * 2010-09-14 2012-03-29 Dainippon Screen Mfg Co Ltd 露光装置および光源装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4458229B2 (ja) * 2002-08-30 2010-04-28 日亜化学工業株式会社 露光用半導体レーザ光源装置
JP4450739B2 (ja) * 2005-01-21 2010-04-14 富士フイルム株式会社 露光装置
JP4410134B2 (ja) 2005-03-24 2010-02-03 日立ビアメカニクス株式会社 パターン露光方法及び装置
JP4937808B2 (ja) * 2007-03-26 2012-05-23 フェニックス電機株式会社 光源装置ならびにこれを用いた露光装置
JP6093525B2 (ja) * 2012-08-31 2017-03-08 株式会社オーク製作所 照明モニタ装置およびそれを備えた露光装置
JP6503235B2 (ja) * 2015-06-02 2019-04-17 株式会社アドテックエンジニアリング 光源装置、露光装置及び光源制御方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003215809A (ja) * 2002-01-28 2003-07-30 Pentax Corp 露光装置および露光方法
JP2006017689A (ja) * 2004-07-04 2006-01-19 Ccs Inc 光源装置
JP2009237490A (ja) * 2008-03-28 2009-10-15 Fujifilm Corp 露光システム
JP2012063390A (ja) * 2010-09-14 2012-03-29 Dainippon Screen Mfg Co Ltd 露光装置および光源装置

Also Published As

Publication number Publication date
WO2016194378A1 (ja) 2016-12-08
CN107850850A (zh) 2018-03-27
TW201716876A (zh) 2017-05-16
JP2016224321A (ja) 2016-12-28
KR20180016471A (ko) 2018-02-14
CN107850850B (zh) 2021-06-08
KR102055670B1 (ko) 2019-12-13
JP6503235B2 (ja) 2019-04-17

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