TWI657227B - Thickness measurement apparatus - Google Patents

Thickness measurement apparatus Download PDF

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TWI657227B
TWI657227B TW104101553A TW104101553A TWI657227B TW I657227 B TWI657227 B TW I657227B TW 104101553 A TW104101553 A TW 104101553A TW 104101553 A TW104101553 A TW 104101553A TW I657227 B TWI657227 B TW I657227B
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substrate
laser displacement
measured
laminate
displacement meter
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TW201542999A (en
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稲尾吉浩
中村彰彦
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日商東京應化工業股份有限公司
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Abstract

提供一種不受到測定對象物的表背面有無凹凸等所影響,而能夠正確地測定測定對象物的厚度之厚度測定器及厚度測定方法。 A thickness measuring device and a thickness measuring method capable of accurately measuring the thickness of the object to be measured without being affected by the presence or absence of unevenness on the front and back surfaces of the object to be measured.

厚度測定器,具備:第一及第二雷射位移計(26、27),測定測定對象物的表面的位移;及算出裝置,由雷射位移計測定出的第一及第二位移,藉由演算算出測定對象物的厚度;第一及第二雷射位移計(26、27),係在一直線上相向配置,以便測定測定對象物的表背面的位移。 The thickness measuring device includes: first and second laser displacement meters (26, 27) for measuring a displacement of a surface of the object to be measured; and a calculating device for first and second displacements measured by a laser displacement meter The thickness of the object to be measured is calculated by calculation; the first and second laser displacement meters (26, 27) are arranged to face each other in a straight line so as to measure the displacement of the front and back surfaces of the object to be measured.

Description

厚度測定器 Thickness measuring device

本發明係有關測定測定對象物的厚度之厚度測定器及厚度測定方法。 The present invention relates to a thickness measuring device and a thickness measuring method for measuring the thickness of an object to be measured.

隨著行動電話、數位AV機器及IC卡等的高功能化,將所裝載之半導體矽晶片(下稱晶片)予以小型化及薄板化,藉此在封裝內將晶片高度積體化之要求逐漸增高。為了實現封裝內的晶片的高度積體化,必須將晶片的厚度減薄至25~150μm之範圍。 With the high functionality of mobile phones, digital AV devices, and IC cards, the semiconductor wafers (hereinafter referred to as wafers) to be mounted are miniaturized and thinned, thereby gradually increasing the height of the wafers in the package. Increase. In order to achieve a high degree of integration of the wafers in the package, the thickness of the wafer must be reduced to a range of 25 to 150 μm.

以往,作為晶片的基底之半導體晶圓(下稱晶圓)的厚度,或含有該晶圓之層積體的厚度,是藉由光譜干擾式雷射位移計(spectral interference laser displacement sensor)來測定。具體而言,例如從光譜干擾式雷射位移計照射雷射光至測定對象物亦即層積體的表面(上面),然後接收在晶圓表背面或層積體的各層反射之反射光亦即光譜,來測定晶圓的厚度或層積體的厚度。此外,專利文獻1中記載一種厚度計測裝置,係從光學式 位移計將光點(light spot)打在被搬運裝置搬運之測定對象物的表背面,並測定該測定對象物的表背面的位移,算出厚度。上述厚度計測裝置,為了避免從光學式位移計照射之光點彼此的干擾,係使第二光點偏離而打在供光穿透之測定對象物的背面當中,和打在表面之第一光點的位置相對應之位置的鄰近位置,並使測定時間點和測定對象物的搬運速度同步來測定。 Conventionally, the thickness of a semiconductor wafer (hereinafter referred to as a wafer) as a base of a wafer or the thickness of a laminate including the wafer is measured by a spectral interference laser displacement sensor. . Specifically, for example, the laser beam is irradiated from the spectral interference type laser displacement meter to the surface (upper surface) of the layer to be measured, and then the reflected light reflected on the back surface of the wafer or the layers of the laminate is received. The spectrum is used to determine the thickness of the wafer or the thickness of the laminate. Further, Patent Document 1 describes a thickness measuring device from an optical type. The displacement meter hits the front and back of the measurement object to be transported by the conveyance device, and measures the displacement of the front and back surfaces of the measurement object to calculate the thickness. In order to avoid interference between the light spots irradiated by the optical displacement meter, the thickness measuring device causes the second light spot to be displaced in the back surface of the object to be measured through which the light is transmitted, and the first light hitting the surface The position of the point corresponds to the position adjacent to the position, and the measurement time point is measured in synchronization with the conveyance speed of the measurement object.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1] 日本特開9-273912號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 9-273912

然而,按照以往接收在晶圓表背面或層積體的各層反射之反射光亦即光譜來測定晶圓的厚度或層積體的厚度之方法,例如若要測定形成有電路之晶圓(元件晶圓;device wafer)的厚度,那麼會有下述問題,即,晶圓表面的狀態(凹凸)因為該電路而依場所有所不同,或是因為晶圓的材質,或是因為形成於該電路之由金屬所構成的凸塊,而導致無法正確地測定晶圓的厚度或層積體的厚度。又,當層積體含有晶圓及支撐體亦即玻璃,而該晶圓及玻璃的折射率彼此相近的情形下,還會有光譜彼此重 疊而無法正確地測定厚度之問題。此外,專利文獻1記載之厚度計測裝置中,若裝置有微振動,或測定對象物的搬運速度有微變動,那麼第二光點便無法打在測定對象物的背面當中,和打在表面的第一光點的位置相對應之位置,而有無法正確地測定厚度之問題。 However, the method of measuring the thickness of the wafer or the thickness of the laminate by measuring the reflected light reflected on the back surface of the wafer or the layers of the laminate, for example, is to measure the wafer on which the circuit is formed (component) The thickness of the wafer is the problem that the state of the wafer surface (concavity and convexity) varies depending on the location of the wafer, or because of the material of the wafer, or because it is formed in the wafer The bumps made of metal of the circuit make it impossible to accurately measure the thickness of the wafer or the thickness of the laminate. Further, when the laminate includes a wafer and a support, that is, glass, and the refractive indices of the wafer and the glass are close to each other, the spectra are also heavy. The stack cannot be correctly measured for thickness. Further, in the thickness measuring device described in Patent Document 1, if the device has slight vibration or the conveying speed of the measuring object slightly changes, the second spot cannot be hit in the back surface of the measuring object, and the surface is hit. The position of the first spot corresponds to the position, and there is a problem that the thickness cannot be accurately measured.

本發明係考量上述問題而研發,其主要目的在於提供一種不受到裝置的微振動或測定對象物的表背面有無凹凸等所影響,而能夠正確地測定該測定對象物的厚度之厚度測定器及厚度測定方法。 The present invention has been made in view of the above problems, and a main object of the present invention is to provide a thickness measuring device capable of accurately measuring the thickness of the object to be measured without being affected by the microvibration of the device or the presence or absence of unevenness on the front and back surfaces of the object to be measured. Thickness measurement method.

為解決上述問題,本發明之厚度測定器,其特徵為,具備:第一雷射位移計及第二雷射位移計,測定測定對象物的表面的位移;及算出裝置,由上述雷射位移計測定出的第一位移及第二位移,藉由演算算出測定對象物的厚度;上述第一雷射位移計及第二雷射位移計,係在一直線上相向配置,以便測定測定對象物的表背面的位移。 In order to solve the above problems, the thickness measuring device according to the present invention includes: a first laser displacement meter and a second laser displacement meter that measure a displacement of a surface of the object to be measured; and a calculation device that is configured by the laser displacement Calculating the thickness of the object to be measured by calculating the first displacement and the second displacement; the first laser displacement meter and the second laser displacement meter are arranged in a line on the straight line to measure the object to be measured The displacement on the back of the watch.

為解決上述問題,本發明之厚度測定方法,其特徵為,至少具有:測定工程,在一直線上相向配置之第一雷射位移計及第二雷射位移計之間配置測定對象物,並測定該測定對象物的表面的第一位移及背面的第二位移;及算出工程,由上述第一位移及第二位移,藉由演算算出測定對象物的厚度。 In order to solve the above problems, the thickness measuring method of the present invention is characterized in that at least the measurement project is performed, and the object to be measured is placed between the first laser displacement meter and the second laser displacement meter which are arranged in line on the straight line, and is measured. a first displacement of the surface of the object to be measured and a second displacement of the back surface; and a calculation process for calculating the thickness of the object to be measured by the first displacement and the second displacement.

按照本發明,將發揮下述效果,即,能夠提供一種不受到裝置的微振動或測定對象物的表背面有無凹凸等所影響,而能夠正確地測定該測定對象物的厚度之厚度測定器及厚度測定方法。 According to the present invention, it is possible to provide a thickness measuring device capable of accurately measuring the thickness of the object to be measured without being affected by the microvibration of the device or the presence or absence of unevenness on the front and back surfaces of the object to be measured. Thickness measurement method.

1‧‧‧層積體形成系統 1‧‧‧Layered body formation system

2‧‧‧貼合單元 2‧‧‧Fitting unit

3‧‧‧保持部 3‧‧‧ Keeping Department

4‧‧‧第一搬運手段(搬運裝置) 4‧‧‧First means of transport (handling device)

5‧‧‧第一搬運手段走行路徑 5‧‧‧The first way to move

6‧‧‧疊合部(貼附裝置) 6‧‧‧Overlay (attachment device)

7‧‧‧貼附部(貼附裝置) 7‧‧‧ Attachment (attachment device)

8‧‧‧閘 8‧‧‧ brake

9‧‧‧授受窗 9‧‧‧Acceptance window

21‧‧‧位移計保持部 21‧‧‧ Displacement Meter Maintenance Department

22‧‧‧測定對象物保持部 22‧‧‧Measurement object holding unit

23‧‧‧第一移動構件 23‧‧‧First moving member

24‧‧‧軌道構件 24‧‧‧ Track members

25‧‧‧第二移動構件 25‧‧‧Second moving member

26‧‧‧第一雷射位移計 26‧‧‧First Laser Displacement Meter

27‧‧‧第二雷射位移計 27‧‧‧Second laser displacement gauge

31‧‧‧保持平台(載置台) 31‧‧‧Maintaining platform (mounting table)

50‧‧‧輸送站(存放部) 50‧‧‧Transportation station (storage department)

51‧‧‧烘烤板(加熱裝置) 51‧‧‧Bake plate (heating device)

52‧‧‧旋轉器(塗布裝置) 52‧‧‧Rotator (coating device)

53‧‧‧洗淨裝置 53‧‧‧cleaning device

54‧‧‧第二搬運手段(搬運裝置) 54‧‧‧Second handling means (handling device)

55‧‧‧第二搬運手段走行路徑 55‧‧‧Second handling means

56‧‧‧溫度調節部 56‧‧‧ Temperature Regulation Department

57‧‧‧厚度測定器 57‧‧‧ Thickness measuring device

[圖1]本發明一個實施形態之厚度測定器的平面圖。 Fig. 1 is a plan view showing a thickness measuring device according to an embodiment of the present invention.

[圖2]上述厚度測定器的側面圖。 Fig. 2 is a side view of the above thickness measuring device.

[圖3]上述厚度測定器正在測定測定對象物亦即層積體的厚度之狀態示意概略截面圖。 [Fig. 3] A schematic cross-sectional view showing a state in which the thickness of the layer to be measured is measured.

[圖4]具備上述厚度測定器之層積體形成系統的全體構成示意概略平面圖。 Fig. 4 is a schematic plan view showing the overall configuration of a laminate forming system including the thickness measuring device.

[圖5]上述層積體形成系統所進行之層積體形成方法示意流程圖。 Fig. 5 is a schematic flow chart showing a method of forming a laminate by the above-described laminate forming system.

以下,詳細說明本發明之實施形態。 Hereinafter, embodiments of the present invention will be described in detail.

[測定對象物] [Measurement object]

測定對象物雖無特別限定,但理想為平板狀,例如良好為作為晶片的基底之晶圓、或含有該晶圓之層積體、支 承板(支撐體)。在上述晶圓的表面上,亦可形成有黏著層或分離層等各種層。此外,晶圓,亦可為在黏著層側的面形成有電子電路等微細構造之基板。又,亦可為透過黏著層而貼附有由玻璃、矽、丙烯酸系樹脂、陶瓷等構成的支承板之層積體。另,作為測定對象物,並不限定於層積體、支承板、由晶圓構成之基板,亦能選擇薄膜基板、撓性基板等任意基板。 The object to be measured is not particularly limited, but is preferably a flat plate. For example, it is preferably a wafer as a base of a wafer or a laminate or a branch containing the wafer. Shelf (support). Various layers such as an adhesive layer or a separation layer may be formed on the surface of the wafer. Further, the wafer may be a substrate having a fine structure such as an electronic circuit formed on the surface on the adhesive layer side. Further, a laminate of a support plate made of glass, enamel, acrylic resin, ceramics or the like may be attached to the adhesive layer. In addition, the object to be measured is not limited to a laminate, a support plate, or a substrate made of a wafer, and any substrate such as a film substrate or a flexible substrate can be selected.

以下,作為測定對象物,主要舉出由晶圓構成之基板、黏著層、及由玻璃構成之支承板所層積而成的層積體來作為例子說明。 In the following, as a measurement object, a laminate in which a substrate made of a wafer, an adhesive layer, and a support plate made of glass is laminated is mainly described as an example.

[厚度測定器] [thickness measuring device]

本發明一個實施形態之厚度測定器,以下利用圖1及圖2說明之。如圖1及圖2所示,厚度測定器57,係用來測定測定對象物亦即例如層積體的厚度之裝置,當測定層積體的表背面的複數處之厚度來得到厚度分布的情形下,也被稱為厚度分布測定裝置。此處,所謂測定對象物亦即層積體的厚度分布,係表示層積體的上面(支承板的上面)或下面(基板的下面)當中的面內分布。厚度測定器57,具備非接觸之雷射位移計,故能夠良好地測定層積體的厚度分布。 The thickness measuring device according to one embodiment of the present invention will be described below with reference to Figs. 1 and 2 . As shown in FIG. 1 and FIG. 2, the thickness measuring device 57 is a device for measuring the thickness of a measurement object, that is, for example, a laminate, and the thickness of the complex surface of the laminate is measured to obtain a thickness distribution. In this case, it is also called a thickness distribution measuring device. Here, the thickness distribution of the laminate, which is the object to be measured, indicates the in-plane distribution among the upper surface (the upper surface of the support plate) or the lower surface (the lower surface of the substrate) of the laminate. Since the thickness measuring device 57 is provided with a non-contact laser displacement meter, the thickness distribution of the laminate can be favorably measured.

如圖1及圖2所示,厚度測定器57主要具備:位移計保持部21,其將測定測定對象物亦即例如層積體的表面的位移(第一位移)之第一雷射位移計26及 測定層積體的背面的位移(第二位移)之第二雷射位移計27予以可移動地保持;以及測定對象物保持部22,其保持層積體。 As shown in FIG. 1 and FIG. 2, the thickness measuring device 57 mainly includes a displacement meter holding unit 21 that measures a displacement (first displacement) of a surface of a measurement object, that is, a first laser displacement meter. 26 and The second laser displacement meter 27 that measures the displacement (second displacement) of the back surface of the laminate is movably held, and the measurement object holding portion 22 holds the laminate.

位移計保持部21,主要由第一移動構件23、一對軌道構件24、及第二移動構件25所構成。此外,位移計保持部21,具備驅動第一移動構件23及第二移動構件25之驅動部(未圖示)。 The displacement gauge holding portion 21 is mainly composed of a first moving member 23, a pair of rail members 24, and a second moving member 25. Further, the displacement gauge holding unit 21 includes a driving unit (not shown) that drives the first moving member 23 and the second moving member 25.

一對軌道構件24,係隔著測定對象物保持部22彼此平行地配置,將第一移動構件23予以可移動地支撐,為用來使上述第一移動構件23朝接近測定對象物保持部22之方向、及遠離測定對象物保持部22之方向(圖1中的箭頭方向)移動之導件。 The pair of rail members 24 are disposed in parallel with each other across the measurement object holding portion 22, and the first moving member 23 is movably supported so that the first moving member 23 approaches the measurement object holding portion 22 The direction and the guide that moves away from the direction in which the object holding portion 22 is moved (the direction of the arrow in FIG. 1).

第一移動構件23,係將第二移動構件25予以可移動地支撐,為用來使上述第二移動構件25朝和第一移動構件23的移動方向正交之方向(圖1,2中的箭頭方向)移動之導件。 The first moving member 23 movably supports the second moving member 25 in a direction for making the second moving member 25 orthogonal to the moving direction of the first moving member 23 (in FIGS. 1 and 2) Arrow direction) Move the guide.

第二移動構件25,從側面觀看之形狀為朝向測定對象物保持部22側開口之「ㄈ」字型,在面向測定對象物保持部22側於上下突出之測定治具25a,25b的先端部,保持著第一雷射位移計26及第二雷射位移計27。具體而言,在於上側突出之測定治具25a的先端部保持著第一雷射位移計26,在於下側突出之測定治具25b的先端部保持著第二雷射位移計27。此外,在測定治具25a的先端部,設有用來進行第一雷射位移計26的對位之位 置調節構件26a。 The shape of the second moving member 25 is a "ㄈ" shape that opens toward the object to be measured holding portion 22, and the tip end portion of the measuring jigs 25a and 25b that protrude upward and downward toward the object to be measured object 22 is formed. The first laser displacement meter 26 and the second laser displacement meter 27 are maintained. Specifically, the first laser displacement meter 26 is held at the tip end portion of the measurement jig 25a protruding from the upper side, and the second laser displacement meter 27 is held at the tip end portion of the measurement jig 25b protruding from the lower side. Further, at the tip end portion of the measuring jig 25a, a position for performing the alignment of the first laser displacement gauge 26 is provided. The adjustment member 26a is placed.

上述第一雷射位移計26,具備:照射部,對測定對象物亦即層積體照射雷射光;及受光部,僅接收在層積體的表面反射之雷射光;及傳輸部,將接收之雷射光變換成訊號並傳輸至算出裝置(均未圖示)。同樣地,上述第二雷射位移計27,具備:照射部,對測定對象物亦即層積體照射雷射光;及受光部,僅接收在層積體的背面反射之雷射光;及傳輸部,將接收之雷射光變換成訊號並傳輸至算出裝置(均未圖示)。另,上述第一雷射位移計26及第二雷射位移計27,凡是能夠以非接觸方式測定測定對象物亦即層積體的表面的位移即可,並無特別限定,但較佳為光譜干擾式雷射位移計。 The first laser displacement meter 26 includes an illuminating unit that irradiates the laminated body to the laser beam, and the light receiving unit receives only the laser light reflected on the surface of the laminated body; and the transmitting unit receives the laser light. The laser light is converted into a signal and transmitted to a calculation device (none of which is shown). Similarly, the second laser displacement meter 27 includes an illuminating unit that irradiates the laminated body with the measuring object, that is, the laser beam, and the light receiving unit receives only the laser light that is reflected on the back surface of the laminated body; and the transmitting unit The received laser light is converted into a signal and transmitted to a calculation device (none of which is shown). In addition, the first laser displacement meter 26 and the second laser displacement meter 27 are not particularly limited as long as the displacement of the surface of the layered object, which is a measurement object, can be measured in a non-contact manner. Spectral interference laser displacement meter.

上述第一雷射位移計26及第二雷射位移計27,係在一直線上相向配置,以便測定載置於測定對象物保持部22上之層積體(未圖示)的表背面的位移。此外,上述第一雷射位移計26及第二雷射位移計27,係被裝配於測定治具25a、25b的先端部,而使得連結第一雷射位移計26及第二雷射位移計27之直線,相對於載置於測定對象物保持部22上的層積體的表面或背面而言呈正交。是故,第一雷射位移計26及第二雷射位移計27,即使因位移計保持部21的驅動而移動,或是裝置有微振動,彼此的相對位置或距離仍總是一定。 The first laser displacement meter 26 and the second laser displacement meter 27 are arranged to face each other in a straight line so as to measure the displacement of the front and back surfaces of the laminate (not shown) placed on the object to be measured 22 . Further, the first laser displacement gauge 26 and the second laser displacement gauge 27 are attached to the leading end portions of the measuring jigs 25a and 25b so that the first laser displacement gauge 26 and the second laser displacement gauge are coupled. The straight line of 27 is orthogonal to the surface or the back surface of the laminate placed on the measurement object holding portion 22. Therefore, even if the first laser displacement gauge 26 and the second laser displacement gauge 27 are moved by the displacement of the displacement gauge holding portion 21 or the device is slightly vibrated, the relative position or distance between them is always constant.

又,位移計保持部21係設計成,令第一移動構件23及第二移動構件25移動,藉此使保持於測定治具 25a、25b的先端部之第一雷射位移計26及第二雷射位移計27,移動至載置於測定對象物保持部22上的層積體的所需位置。也就是說,位移計保持部21係構成為,相對於測定對象物保持部22而言,使第一雷射位移計26及第二雷射位移計27相對移動。具體而言,位移計保持部21係設計成,使第一雷射位移計26移動至上述層積體的表面當中的所需位置,且使第二雷射位移計27移動至上述層積體的背面當中和上述所需位置相對應之位置。但,本發明中所謂上述「所需位置」,係指和形成於保持平台31之,能夠使層積體的背面的一部分露出之複數個孔的位置相對應之位置。 Further, the displacement gauge holding portion 21 is designed to move the first moving member 23 and the second moving member 25, thereby holding the measuring fixture The first laser displacement gauge 26 and the second laser displacement gauge 27 at the tip end portions of the 25a and 25b are moved to a desired position of the laminate placed on the measurement object holding portion 22. In other words, the displacement meter holding unit 21 is configured to relatively move the first laser displacement gauge 26 and the second laser displacement gauge 27 with respect to the measurement target holding unit 22. Specifically, the displacement gauge holding portion 21 is designed to move the first laser displacement gauge 26 to a desired position among the surfaces of the laminate, and to move the second laser displacement gauge 27 to the laminate. The position on the back side corresponding to the above required position. However, the above-mentioned "required position" in the present invention means a position corresponding to the position of the plurality of holes which are formed on the holding platform 31 and which can expose a part of the back surface of the laminate.

測定對象物保持部22,具備保持平台(載置台)31,保持測定對象物亦即例如層積體。此外,上述保持平台31,具備吸附機構,用來將層積體載置並固定於保持平台31。使用吸附機構將層積體固定於保持平台31,藉此,厚度測定器57,即使遇到翹曲的層積體仍能抑制翹曲而正確地測定該層積體的厚度。另,吸附機構的構成並無特別限定,可使用具備真空泵浦等之周知的吸附裝置。 The measurement object holding unit 22 includes a holding platform (mounting table) 31, and holds a measurement object, that is, a laminate. Further, the holding platform 31 is provided with an adsorption mechanism for placing and fixing the laminate to the holding platform 31. The laminate is fixed to the holding stage 31 by the suction mechanism, whereby the thickness measuring device 57 can suppress the warpage and the thickness of the laminate can be accurately measured even if the warped laminate is encountered. Further, the configuration of the adsorption mechanism is not particularly limited, and a known adsorption device including vacuum pumping or the like can be used.

此外,在保持平台31,形成有例如配置成10mm間隔的棋盤格狀之多數個孔(開口部)(未圖示)。如此一來,在將層積體保持於保持平台31的狀態下,透過上述孔,便能夠使得該層積體的背面的一部分露出。另,孔彼此的間隔並無特別限定,例如可因應測定對 象物的大小等來適當設定。 Further, in the holding platform 31, for example, a plurality of holes (openings) (not shown) arranged in a checkerboard shape at intervals of 10 mm are formed. As a result, a part of the back surface of the laminate can be exposed through the hole while the laminate is held by the holding stage 31. In addition, the interval between the holes is not particularly limited, for example, it is possible to measure the pair The size of the object, etc., is appropriately set.

又,厚度測定器57,具備算出裝置(未圖示),係由上述第一雷射位移計26及第二雷射位移計27測定出的第一位移及第二位移,藉由演算算出層積體的厚度並輸出至例如外部顯示裝置。算出裝置的構成並無特別限定,只要具備周知之演算裝置、或記憶厚度之記憶裝置即可。 Further, the thickness measuring device 57 includes a calculation device (not shown), which is a first displacement and a second displacement measured by the first laser displacement gauge 26 and the second laser displacement gauge 27, and calculates a layer by calculation The thickness of the integrated body is output to, for example, an external display device. The configuration of the calculation device is not particularly limited, and any known calculation device or memory device having a memory thickness may be provided.

此外,厚度測定器57,具備控制部(未圖示),係控制位移計保持部21及測定對象物保持部22之驅動,或第一雷射位移計26及第二雷射位移計27的動作。是故,驅動第一移動構件23及第二移動構件25之驅動部,其動作是藉由上述控制部而受到控制。 Further, the thickness measuring device 57 includes a control unit (not shown) that controls driving of the displacement meter holding unit 21 and the measurement object holding unit 22, or the first laser displacement meter 26 and the second laser displacement meter 27 action. Therefore, the driving portions of the first moving member 23 and the second moving member 25 are driven, and the operation thereof is controlled by the control unit.

另,圖1及圖2中,位移計保持部21係構成為,相對於測定對象物保持部22而言,使第一雷射位移計26及第二雷射位移計27相對移動,但厚度測定器並不限定於該構成,測定對象物保持部可構成為相對於被保持於位移計保持部之第一雷射位移計及第二雷射位移計而言相對移動,亦可構成為位移計保持部及測定對象物保持部彼此相對移動。此外,位移計保持部及測定對象物保持部的相對移動,可為直線移動、旋轉移動等任何移動,只要設計成能夠測定層積體的表背面的複數處的厚度即可。 In addition, in FIG. 1 and FIG. 2, the displacement meter holding unit 21 is configured to relatively move the first laser displacement gauge 26 and the second laser displacement gauge 27 with respect to the measurement target holding unit 22. The measuring device is not limited to this configuration, and the measuring object holding portion may be configured to relatively move with respect to the first laser displacement meter and the second laser displacement meter held by the displacement meter holding portion, and may be configured to be displaced. The gauge holding unit and the measurement target holding unit move relative to each other. In addition, the relative movement of the displacement meter holding unit and the measurement object holding unit may be any movement such as linear movement or rotational movement, and may be designed to measure the thickness of the plurality of front and back surfaces of the laminate.

[厚度測定方法] [Measurement method of thickness]

接下來,一面參照圖3,依序說明使用上述構成的厚 度測定器57來測定層積體的厚度之方法。 Next, referring to FIG. 3, the thickness of the above configuration will be sequentially described. The degree measuring device 57 measures the thickness of the laminate.

首先,將測定對象物亦即層積體40載置於測定對象物保持部22的保持平台31,使用吸附機構將該層積體40固定於保持平台31。此時,位移計保持部21位於起始位置(初始位置)。 First, the laminate 40, which is a measurement object, is placed on the holding platform 31 of the measurement object holding portion 22, and the laminate 40 is fixed to the holding platform 31 by an adsorption mechanism. At this time, the displacement gauge holding portion 21 is located at the home position (initial position).

接下來,驅動位移計保持部21,令第一移動構件23及第二移動構件25移動,使第一雷射位移計26移動至上述層積體40的表面當中的所需位置,且使第二雷射位移計27移動至上述層積體40的背面當中和上述所需位置相對應之位置。如此一來,層積體40便會被配置於在一直線上相向配置之第一雷射位移計26及第二雷射位移計27之間。此外,相對於層積體40的表面或背面而言,會使連結上述第一雷射位移計26及第二雷射位移計27之直線呈正交。 Next, the displacement meter holding portion 21 is driven to move the first moving member 23 and the second moving member 25 to move the first laser displacement gauge 26 to a desired position among the surfaces of the laminated body 40, and The two laser displacement meters 27 are moved to a position corresponding to the desired position among the back surfaces of the above-described laminated body 40. As a result, the laminate 40 is disposed between the first laser displacement meter 26 and the second laser displacement meter 27 that are disposed opposite each other on a straight line. Further, the straight line connecting the first laser displacement gauge 26 and the second laser displacement gauge 27 is orthogonal to the front surface or the back surface of the laminated body 40.

移動後,從第一雷射位移計26,對層積體40的上面(支承板43的上面)照射雷射光,接收在層積體40反射之雷射光A,另一方面,從第二雷射位移計27,通過形成於保持平台31之孔32,對層積體40的下面(基板41的下面)照射雷射光,接收在層積體40反射之雷射光B。藉此,測定層積體40的表面的第一位移及背面的第二位移(測定工程)。 After the movement, from the first laser displacement meter 26, the upper surface of the laminated body 40 (the upper surface of the support plate 43) is irradiated with the laser light, and the laser light A reflected by the laminated body 40 is received, and on the other hand, from the second mine The displacement meter 27 irradiates the lower surface of the laminate 40 (the lower surface of the substrate 41) with laser light through the hole 32 formed in the holding stage 31, and receives the laser light B reflected by the laminate 40. Thereby, the first displacement of the surface of the laminated body 40 and the second displacement of the back surface (measurement engineering) were measured.

此時,第一雷射位移計26及第二雷射位移計27,可同時照射雷射光來同時測定層積體40的表背面的位移,亦可分別照射雷射光來分別測定層積體40的表背 面的位移。在一個孔32的測定當中,第一雷射位移計26及第二雷射位移計27的位置以表觀(apparent)而言係呈固定,故雷射光照射的時間點可彼此同時,亦可彼此相異。但,同時照射雷射光,能夠更正確地測定厚度,也能縮短測定時間。 At this time, the first laser displacement meter 26 and the second laser displacement meter 27 can simultaneously irradiate the laser light to simultaneously measure the displacement of the front and back surfaces of the laminated body 40, and can also separately irradiate the laser light to measure the laminated body 40, respectively. Back of the table The displacement of the face. In the measurement of one hole 32, the positions of the first laser displacement meter 26 and the second laser displacement meter 27 are fixed in terms of apparent, so that the time of the laser light irradiation can be simultaneously with each other, or Different from each other. However, by simultaneously irradiating the laser light, the thickness can be measured more accurately, and the measurement time can be shortened.

此外,第一雷射位移計26的受光部,僅接收在層積體40的表面反射之雷射光A,第二雷射位移計27的受光部,僅接收在層積體40的背面反射之雷射光B。也就是說,第一雷射位移計26及第二雷射位移計27,僅檢測來自層積體40的表背面之反射光,並不檢測穿透支承板43或黏著層42、基板41或是在該些各層反射之雷射光,故雷射光A、B不會彼此干擾。 Further, the light receiving portion of the first laser displacement meter 26 receives only the laser light A reflected on the surface of the laminated body 40, and the light receiving portion of the second laser displacement meter 27 receives only the back surface of the laminated body 40. Laser light B. That is, the first laser displacement gauge 26 and the second laser displacement gauge 27 detect only the reflected light from the front and back surfaces of the laminated body 40, and do not detect the penetrating support plate 43 or the adhesive layer 42, the substrate 41 or It is the laser light reflected by the layers, so the laser light A, B does not interfere with each other.

第一雷射位移計26及第二雷射位移計27,將接收之雷射光變換成訊號並傳輸至算出裝置。算出裝置,由上述第一位移及第二位移,藉由演算算出層積體40的厚度(算出工程),並將結果輸出至例如外部顯示裝置,或記憶於記憶裝置。 The first laser displacement meter 26 and the second laser displacement meter 27 convert the received laser light into a signal and transmit it to the calculation device. The calculation device calculates the thickness (calculation process) of the laminate 40 by the first displacement and the second displacement, and outputs the result to, for example, an external display device or to the memory device.

在一個孔32的層積體40的表背面的位移測定結束後,厚度測定器57會驅動位移計保持部21,令第一移動構件23及第二移動構件25移動,使第一雷射位移計26及第二雷射位移計27相對地移動至下一個測定位置,具體而言是和下一個孔32的位置相對應之位置。藉此,測定在下一個孔32的位置的層積體40的表背面的位移,算出層積體40的厚度。 After the displacement measurement of the front and back surfaces of the laminated body 40 of one of the holes 32 is completed, the thickness measuring device 57 drives the displacement gauge holding portion 21 to move the first moving member 23 and the second moving member 25 to shift the first laser beam. The gauge 26 and the second laser displacement gauge 27 are relatively moved to the next measurement position, specifically, the position corresponding to the position of the next hole 32. Thereby, the displacement of the front and back surfaces of the laminated body 40 at the position of the next hole 32 is measured, and the thickness of the laminated body 40 is calculated.

其後,因應層積體40的大小等來反覆上述測定,測定複數次層積體40的表面的位移。厚度測定器57,係令第一雷射位移計26及第二雷射位移計27相對於層積體40而言相對地移動來測定,故能夠遍布層積體40的表背面全體來測定厚度。是故,能夠測定層積體40的厚度分布。此外,第一雷射位移計26及第二雷射位移計27,彼此的相對位置或距離總是一定,故不會受到裝置的微振動、或層積體40的表背面有無凹凸等所影響,能夠正確地測定該層積體40的厚度。 Thereafter, the above measurement is repeated in accordance with the size of the layered body 40 or the like, and the displacement of the surface of the plurality of laminated bodies 40 is measured. The thickness measuring device 57 measures the relative movement of the first laser displacement gauge 26 and the second laser displacement gauge 27 with respect to the laminate 40, so that the thickness can be measured over the entire front and back surfaces of the laminate 40. . Therefore, the thickness distribution of the laminate 40 can be measured. Further, since the relative positions or distances of the first laser displacement gauge 26 and the second laser displacement gauge 27 are always constant, they are not affected by the microvibration of the device or the presence or absence of unevenness on the front and back surfaces of the laminated body 40. The thickness of the laminate 40 can be accurately measured.

另,上述說明,係為藉由位移計保持部21使第一雷射位移計26及第二雷射位移計27相對於測定對象物保持部22而言相對移動之方法,但厚度測定方法並不限定於該方法,亦可為使測定對象物保持部相對於被保持於位移計保持部之第一雷射位移計及第二雷射位移計而言相對移動之方法,或可為位移計保持部及測定對象物保持部彼此相對移動之方法。 In the above description, the displacement measuring unit 21 moves the first laser displacement gauge 26 and the second laser displacement gauge 27 relative to the measurement target holding unit 22, but the thickness measurement method is The method is not limited to this method, and may be a method of relatively moving the measurement target holding portion with respect to the first laser displacement gauge and the second laser displacement gauge held by the displacement gauge holding portion, or may be a displacement gauge A method in which the holding portion and the measurement object holding portion move relative to each other.

[層積體形成系統] [Layered body formation system]

以下利用圖4,說明具備上述構成的厚度測定器57之層積體形成系統。層積體形成系統,為將基板與支撐體亦即支承板,透過黏著層予以貼合來形成層積體之系統。 Hereinafter, a laminated body forming system including the thickness measuring device 57 having the above configuration will be described with reference to Fig. 4 . The laminate forming system is a system in which a substrate and a support, that is, a support plate, are bonded to each other through an adhesive layer to form a laminate.

若考量層積體形成後的基板薄化、組裝等製程,那麼層積體的厚度分布的值以較小為佳,為了製品的品質管理,較佳是於半導體晶圓的製造工程中測定層積體 的厚度分布。本實施形態中,層積體形成系統具備厚度測定器57,藉此,能夠於層積體形成的製程中測定層積體的厚度分布,較有效率。此外,層積體的厚度分布之相關資訊,例如可用於製造出之層積體的異常檢測。 If the substrate thinning and assembly process after the formation of the laminate is considered, the thickness distribution of the laminate is preferably small. For the quality management of the product, it is preferable to measure the layer in the manufacturing process of the semiconductor wafer. Integrated body Thickness distribution. In the present embodiment, the laminate forming system includes the thickness measuring device 57, whereby the thickness distribution of the laminate can be measured in the process of forming the laminate, which is more efficient. Further, information on the thickness distribution of the laminate can be used, for example, for the abnormality detection of the manufactured laminate.

此外,本實施形態中,厚度測定器57係測定與基板貼附前之支承板的厚度分布。層積體的厚度分布,也會受到支承板的厚度分布所影響,因此藉由事先測定支承板的厚度分布,便能瞭解製造出之層積體的異常是因何引起。此外,支承板的厚度分布之相關資訊,例如可用於支承板的異常檢測。 Further, in the present embodiment, the thickness measuring device 57 measures the thickness distribution of the support plate before the substrate is attached. The thickness distribution of the laminate is also affected by the thickness distribution of the support plate. Therefore, by measuring the thickness distribution of the support plate in advance, it is possible to understand the cause of the abnormality of the produced laminate. Further, information on the thickness distribution of the support plate can be used, for example, for abnormality detection of the support plate.

如圖4所示,層積體形成系統1,具備:旋轉器(spinner)(塗布裝置)52,於基板上塗布黏著劑;及烘烤板(加熱裝置)51,將已塗布黏著劑之基板予以加熱而於該基板上形成黏著層;及疊合部6和貼附部(貼附裝置)7,將基板與支承板透過黏著層予以貼合而形成層積體;及厚度測定器57,測定層積體的厚度分布。又,層積體形成系統1,更具備輸送站(carrier station)(存放部)50、溫度調節部56、第一搬運裝置4、第二搬運裝置54、洗淨裝置53。層積體形成系統1,亦可具備保持部3及疊合部6。另,層積體形成系統1,具備控制各裝置的動作之控制部(未圖示)。 As shown in FIG. 4, the laminate forming system 1 includes a spinner (coating device) 52 to which an adhesive is applied on a substrate, and a baking plate (heating device) 51 to apply a substrate to which an adhesive has been applied. Heated to form an adhesive layer on the substrate; and the overlapping portion 6 and the attaching portion (attaching device) 7, and the substrate and the supporting plate are bonded to each other through the adhesive layer to form a laminate; and a thickness measuring device 57; The thickness distribution of the laminate was measured. Further, the laminated body forming system 1 further includes a carrier station (storage unit) 50, a temperature adjustment unit 56, a first conveyance device 4, a second conveyance device 54, and a cleaning device 53. The laminate forming system 1 may include the holding portion 3 and the overlapping portion 6. Further, the laminate forming system 1 includes a control unit (not shown) that controls the operation of each device.

以下,說明層積體形成系統1的各裝置。 Hereinafter, each device of the laminate forming system 1 will be described.

(塗布裝置) (coating device)

旋轉器(塗布裝置)52,為於基板上塗布黏著劑之裝置。本實施形態中,第二搬運裝置54將基板搬入並載置於旋轉器52。旋轉器52,令被載置之基板以例如3000rpm一面旋轉一面於該基板上將黏著劑旋轉塗布。黏著劑對於基板之塗布方法並無特別限定,例如可舉出旋轉塗布、浸漬(dipping)、輥刀(roller blade)、噴霧塗布(spray coating)、狹縫塗布(slit coating)等方法。此外,基板的旋轉速度亦無特別限定,可因應黏著劑的種類、基板大小等來適當設定。 A rotator (coating device) 52 is a device for applying an adhesive to a substrate. In the present embodiment, the second conveyance device 54 carries the substrate and places it on the rotator 52. The rotator 52 spin-coats the substrate to be placed on the substrate while rotating the substrate at, for example, 3000 rpm. The method of applying the adhesive to the substrate is not particularly limited, and examples thereof include a method such as spin coating, dipping, roller blade, spray coating, and slit coating. Further, the rotation speed of the substrate is not particularly limited, and may be appropriately set depending on the type of the adhesive, the size of the substrate, and the like.

此外,旋轉器52,亦可具備洗淨部,當於基板上塗布黏著劑時,更於基板塗布洗淨液以用來洗淨附著在基板的端面或背面的黏著劑。如此一來,便不需另行設置洗淨黏著劑之洗淨裝置,而能夠一面於基板上塗布黏著劑一面洗淨該基板的端面或背面。故,依本發明之層積體形成系統1,能夠節省空間,且能縮短層積體的形成時間。 Further, the rotator 52 may further include a cleaning portion that applies a cleaning liquid to the substrate to wash the adhesive adhering to the end surface or the back surface of the substrate when the adhesive is applied to the substrate. In this way, it is not necessary to separately provide a cleaning device for cleaning the adhesive, and the end surface or the back surface of the substrate can be cleaned while applying an adhesive to the substrate. Therefore, according to the laminated body forming system 1 of the present invention, space can be saved and the formation time of the laminated body can be shortened.

(加熱裝置) (heating equipment)

烘烤板(加熱裝置)51,為將藉由旋轉器52而塗布好黏著劑之基板予以加熱,而在基板上形成黏著層之裝置。本實施形態中,藉由旋轉器52於基板上塗布黏著劑後,將該基板載置於烘烤板51,烘烤黏著劑。將熱源裝配至烘烤板51,或將熱源裝配至頂板,藉此便能烘烤黏著劑。熱源的例子,例如可舉出溫水加熱器、溫風加熱 器、紅外線加熱器、電熱加熱器等。 The baking plate (heating device) 51 is a device for heating the substrate coated with the adhesive by the rotator 52 to form an adhesive layer on the substrate. In the present embodiment, after the adhesive is applied onto the substrate by the rotator 52, the substrate is placed on the baking sheet 51 to bake the adhesive. The heat source is assembled to the baking sheet 51, or the heat source is assembled to the top plate, whereby the adhesive can be baked. Examples of the heat source include, for example, a warm water heater and warm air heating. , infrared heaters, electric heaters, etc.

(疊合部) (overlap)

疊合部6,為將基板及支承板透過黏著層予以疊合之裝置。舉例來說,本實施形態中,疊合部6係設計成,利用位置調整部(未圖示)調整基板與支承板的相對位置後,將基板與支承板疊合。 The overlapping portion 6 is a device for laminating the substrate and the supporting plate through the adhesive layer. For example, in the present embodiment, the overlapping portion 6 is designed such that the relative position of the substrate and the support plate is adjusted by a position adjusting portion (not shown), and then the substrate and the supporting plate are superposed.

(貼附裝置) (attachment device)

貼附部(貼附裝置)7,為將基板與支承板透過黏著層予以貼合而形成層積體之裝置。貼附部7當中,將在疊合部6疊合好的基板及支承板一面推壓一面加熱黏著層。具體而言,例如可在貼附部7內的上下設置加壓板(press plate),並在該上下的加壓板間載置疊合好的基板及支承板,並予以推壓。藉此,便能形成層積體。 The attaching portion (attaching device) 7 is a device for bonding a substrate and a supporting plate through an adhesive layer to form a laminate. In the attaching portion 7, the adhesive layer is heated while pressing the substrate and the support plate which are superimposed on the overlapping portion 6. Specifically, for example, a press plate may be provided on the upper and lower sides of the attaching portion 7, and the stacked substrate and the support plate may be placed between the upper and lower pressurizing plates and pressed. Thereby, a laminate can be formed.

(貼合單元) (fitting unit)

本實施形態中,上述疊合部6及貼附部7,係構成貼合單元2。貼合單元2,能夠設計成在一個處理室的內部設置隔壁以分隔成二個處理隔間之構造。或是,貼合單元2,亦能夠設計成在疊合部6與貼附部7各自的側面沒有間隙地彼此相接之構造。在疊合部6及貼附部7的交界,設有閘8,用來進行在疊合部6疊合好的基板及支承板、以及在貼附部7貼合而形成之層積體的授受。閘8係藉由 擋門(shutter)來控制其開關。閘8的開關能夠使用習知周知之構造,例如能夠運用閘閥(gate valve)構造。 In the present embodiment, the overlapping portion 6 and the attaching portion 7 constitute the bonding unit 2. The fitting unit 2 can be designed to be provided with a partition wall inside a processing chamber to be partitioned into two processing compartments. Alternatively, the bonding unit 2 can also be configured to be in contact with each other on the side surfaces of the overlapping portion 6 and the attaching portion 7 without a gap. At the boundary between the overlapping portion 6 and the attaching portion 7, a gate 8 is provided for the substrate and the supporting plate which are superposed on the overlapping portion 6, and the laminated body formed by bonding the bonding portion 7 Grant. Gate 8 A shutter is used to control its switch. The switch of the gate 8 can be constructed using conventional techniques, such as the ability to utilize a gate valve configuration.

此外,在疊合部6,可開關地設有授受窗9,用來在貼合單元2與第一搬運裝置4之間進行基板、支承板、及層積體的授受。在疊合部6及貼附部7,分別設有周知之減壓裝置(未圖示),能夠分別獨立地控制疊合部6及貼附部7的內部壓力狀態。又,在貼合單元2,設有內部搬運裝置(未圖示),透過閘8在疊合部6及貼附部7間進行層積體的授受。 Further, a receiving window 9 is provided in the overlapping portion 6 for switching between the bonding unit 2 and the first conveying device 4 to transfer the substrate, the support plate, and the laminate. A well-known pressure reducing device (not shown) is provided in each of the overlapping portion 6 and the attaching portion 7, and the internal pressure state of the overlapping portion 6 and the attaching portion 7 can be independently controlled. Further, the bonding unit 2 is provided with an internal conveying device (not shown), and the transmission gate 8 transfers the laminate between the overlapping portion 6 and the attaching portion 7.

貼附部7為可減壓之構成,因此能夠在減壓環境下將基板與支承板透過黏著層予以貼合。在減壓環境下將基板壓接至黏著層,藉此,能夠在基板表面的凹凸圖樣的窪陷中不存在空氣之狀態下,使黏著層深入至該窪陷,因此可更確實地防止在黏著層與基板之間發生氣泡。 Since the attaching portion 7 is configured to be decompressible, the substrate and the support plate can be bonded to each other through the adhesive layer in a reduced pressure environment. By pressing the substrate to the adhesive layer in a reduced pressure environment, the adhesive layer can be made to penetrate into the depression without the presence of air in the depression of the uneven pattern on the surface of the substrate, so that it can be more reliably prevented. Air bubbles occur between the adhesive layer and the substrate.

閘8係形成為,在擋門開啟的狀態下,能夠使疊合好的基板及支承板從疊合部6移動至貼附部7,且能夠使層積體從貼附部7移動至疊合部6。是故,閘8之構造為,在令疊合部6及貼附部7均為減壓的狀態下開啟擋門,藉此便能夠使疊合好的基板及支承板於減壓下從疊合部6移動至貼附部7,且能夠使層積體於減壓下從貼附部7移動至疊合部6。 The gate 8 is formed such that the stacked substrate and the support plate can be moved from the overlapping portion 6 to the attaching portion 7 in a state where the shutter is opened, and the laminated body can be moved from the attaching portion 7 to the stack Joint part 6. Therefore, the gate 8 is configured to open the shutter in a state where the overlapping portion 6 and the attaching portion 7 are both decompressed, whereby the laminated substrate and the supporting plate can be stacked under reduced pressure. The joint portion 6 is moved to the attaching portion 7, and the laminated body can be moved from the attaching portion 7 to the overlapping portion 6 under reduced pressure.

(存放部) (storage department)

輸送站(存放部)50,係存放基板及支承板。此外, 本實施形態中,能夠透過輸送站50,將基板及支承板投入層積體形成系統1。此外,能夠將在貼附部7形成之層積體,透過輸送站50從層積體形成系統1取出。 The transfer station (storage unit) 50 is a storage substrate and a support plate. In addition, In the present embodiment, the substrate and the support plate can be introduced into the laminate forming system 1 through the transfer station 50. Further, the laminate formed on the attaching portion 7 can be taken out from the laminate forming system 1 through the transfer station 50.

(保持部) (holding section)

保持部3為進行基板及支承板的校準之裝置。保持部3,具備拍攝部及中心位置檢測部(未圖示),而設計成保持被疊合前的基板或支承板。 The holding portion 3 is a device for performing calibration of the substrate and the support plate. The holding unit 3 includes an imaging unit and a central position detecting unit (not shown), and is designed to hold the substrate or the support plate before being stacked.

拍攝部,例如以CCD相機所構成,而設計成對涵括被保持之基板或支承板的彼此不同的端面之區域分別予以拍攝。該區域,例如較佳是設定為被保持之基板或支承板的大致對角線上。 The imaging unit is configured, for example, by a CCD camera, and is designed to photograph the regions of the end faces that are different from each other including the held substrate or the support plate. This region, for example, is preferably set to be substantially diagonal to the substrate or support plate being held.

中心位置檢測部,依據拍攝部拍攝的複數個圖像,來檢測被保持之基板或支承板的中心位置。中心位置檢測部,可依據圓板的端面的圖像,來算出假想圓,以檢測中心位置。基於端面圖像之中心位置的檢測技術,可使用周知之圖像處理,並無特別限定。 The center position detecting unit detects the center position of the held substrate or the support plate based on the plurality of images captured by the imaging unit. The center position detecting unit calculates an imaginary circle based on the image of the end surface of the circular plate to detect the center position. The detection technique based on the center position of the end image can be performed using well-known image processing, and is not particularly limited.

基板或支承板,於保持部3被檢測出中心位置後,藉由第一搬運裝置4,被搬運至疊合部6。然後,基板或支承板,於疊合部6,在疊合前,藉由位置調整部(未圖示)被調整位置,使得在保持部3檢測出的彼此的中心位置重疊。 The substrate or the support plate is conveyed to the overlapping portion 6 by the first conveying device 4 after the holding portion 3 is detected at the center position. Then, the substrate or the support plate is superposed on the center portion of the overlapping portion 6 by the position adjusting portion (not shown) so as to be overlapped at the center position detected by the holding portion 3.

(溫度調節部) (temperature adjustment unit)

溫度調節部56具備:冷卻板(未圖示),藉由冷卻基板,來進行基板的溫度調節;及位置調整裝置(未圖示),調整基板的位置。本實施形態中,第一搬運裝置4與第二搬運裝置54,係隔著溫度調節部56來進行基板的授受。 The temperature adjustment unit 56 includes a cooling plate (not shown) that cools the substrate to adjust the temperature of the substrate, and a position adjustment device (not shown) that adjusts the position of the substrate. In the present embodiment, the first transfer device 4 and the second transfer device 54 are configured to transfer and receive the substrate via the temperature adjustment unit 56.

藉由將基板或層積體載置於冷卻板,便能夠冷卻該些基板或層積體。此外,於冷卻時利用位置調整裝置,能夠進行基板的校準。故,能夠使層積體形成系統1節省空間,且能縮短層積體的形成時間。 By placing the substrate or the laminate on the cooling plate, the substrates or laminates can be cooled. Further, the substrate can be calibrated by the position adjustment device during cooling. Therefore, the laminated body forming system 1 can save space and shorten the formation time of the laminated body.

又,溫度調節部56具有冷卻區域,用來將形成黏著層後的基板及層積體自然冷卻。冷卻區域,可構成為能夠使基板及層積體的熱有效率地逸散。舉例來說,在冷卻區域形成用來支撐基板及層積體之支撐點,使基板及層積體的面的內周部以三點~十點支撐於支撐點,藉此便能使基板及層積體全體的熱有效率地逸散。 Further, the temperature adjustment portion 56 has a cooling region for naturally cooling the substrate and the laminate after the formation of the adhesive layer. The cooling zone can be configured to efficiently dissipate heat from the substrate and the laminate. For example, a support point for supporting the substrate and the laminate is formed in the cooling region, and the inner peripheral portion of the surface of the substrate and the laminate is supported at the support point by three to ten points, thereby enabling the substrate and the substrate The heat of the entire laminate is efficiently dissipated.

(第一搬運裝置) (first handling device)

第一搬運裝置4,係在輸送站50、貼合單元2、溫度調節部56及厚度測定器57之間搬運基板。此外,第一搬運裝置4,係朝圖4中的箭頭方向,在第一搬運裝置走行路徑5內移動。第一搬運裝置4,為了在必要的處理結束後進行下一處理,而將基板、支承板及層積體分別搬運至所需位置。 The first conveyance device 4 conveys the substrate between the conveyance station 50, the bonding unit 2, the temperature adjustment unit 56, and the thickness measuring device 57. Further, the first conveying device 4 moves in the first conveying device travel path 5 in the direction of the arrow in FIG. The first conveying device 4 transports the substrate, the support plate, and the laminate to a desired position in order to perform the next process after the necessary processing is completed.

(第二搬運裝置) (second handling device)

第二搬運裝置54,係在溫度調節部56、烘烤板51、旋轉器52、及洗淨裝置53之間搬運基板。此外,第二搬運裝置54,係朝圖4中的箭頭方向,也就是和第一搬運裝置4的移動方向正交之方向,在第二搬運裝置走行路徑55內移動。第二搬運裝置54,為了在必要的處理結束後進行下一處理,而將基板分別搬運至所需位置。 The second conveyance device 54 conveys the substrate between the temperature adjustment unit 56, the bake plate 51, the rotator 52, and the cleaning device 53. Further, the second conveying device 54 moves in the second conveying device travel path 55 in the direction of the arrow in FIG. 4, that is, in the direction orthogonal to the moving direction of the first conveying device 4. The second conveyance device 54 transports the substrates to the desired positions in order to perform the next process after the necessary processing is completed.

(洗淨裝置) (cleaning device)

洗淨裝置53,為將塗布有黏著劑的基板予以洗淨之裝置。本實施形態中,洗淨裝置53,是於基板上塗布黏著劑後,將附著於基板的端面或背面之黏著劑洗淨。作為洗淨方法,例如可使端面或背面附著有黏著劑之基板一面以3000rpm旋轉,一面將洗淨液塗布於端面或背面。 The cleaning device 53 is a device for washing a substrate coated with an adhesive. In the present embodiment, the cleaning device 53 is formed by applying an adhesive to the substrate and then adhering the adhesive adhering to the end surface or the back surface of the substrate. As a washing method, for example, the substrate on which the adhesive agent is adhered on the end surface or the back surface can be applied to the end surface or the back surface while rotating at 3000 rpm.

洗淨液,凡是含有能使黏著劑溶解之溶劑即可,並無特別限定,但例如能夠使用直鏈狀的碳氫化合物、碳數4至15的分枝狀的碳氫化合物、萜烯(terpene)系溶劑、內酯(lactone)類、酮類、多價醇類、多價醇類的衍生物、環式醚類、酯類、芳香族系有機溶劑等。作為洗淨液,較佳為丙二醇甲醚醋酸酯(propylene glycol monomethyl ether acetate;PGMEA)、丙二醇甲醚(propylene glycol monomethyl ether;PGME)。 The washing liquid is not particularly limited as long as it contains a solvent capable of dissolving the adhesive. For example, a linear hydrocarbon, a branched hydrocarbon having 4 to 15 carbon atoms, or a terpene can be used. Terpene) is a solvent, a lactone, a ketone, a polyvalent alcohol, a polyvalent alcohol derivative, a cyclic ether, an ester, or an aromatic organic solvent. As the washing liquid, propylene glycol monomethyl ether acetate (PGMEA) or propylene glycol monomethyl ether (PGME) is preferred.

[層積體形成方法] [Layered body formation method]

接下來,一面參照圖5所示流程圖,一面依序說明利用層積體形成系統1來形成層積體之工程。圖5所示步驟S1~S10,係表示有關基板之處理,步驟S11~S13,係表示有關支承板之處理,步驟S14~S17,係表示有關層積體之處理。 Next, a process of forming a laminate using the laminate forming system 1 will be described in order with reference to the flowchart shown in FIG. Steps S1 to S10 shown in Fig. 5 indicate the processing of the substrate, steps S11 to S13 indicate the processing of the support plate, and steps S14 to S17 indicate the processing of the laminate.

步驟S1中,第一搬運裝置4將基板從輸送站50投入層積體形成系統1內。第一搬運裝置4,在支撐著基板的狀態下將該基板搬運至溫度調節部56。 In step S1, the first conveyance device 4 loads the substrate from the conveyance station 50 into the laminate formation system 1. The first conveyance device 4 conveys the substrate to the temperature adjustment unit 56 while supporting the substrate.

步驟S2中,第一搬運裝置4將基板載置於溫度調節部56的冷卻板,溫度調節部56調節基板的溫度。然後,藉由溫度調節部56的位置調整裝置,在冷卻板上進行基板的校準。校準結束後,第二搬運裝置54,在支撐著基板的狀態下將該基板搬入旋轉器52(第一搬入工程)。 In step S2, the first conveyance device 4 places the substrate on the cooling plate of the temperature adjustment unit 56, and the temperature adjustment unit 56 adjusts the temperature of the substrate. Then, the substrate is calibrated on the cooling plate by the position adjusting device of the temperature adjusting portion 56. After the completion of the calibration, the second transfer device 54 carries the substrate into the rotator 52 while supporting the substrate (first carry-in process).

步驟S3中,第二搬運裝置54將基板載置於旋轉器52,旋轉器52於基板塗布黏著劑(黏著劑塗布工程)。由於步驟S2中進行了基板的校準,因此於基板表面能夠均等地將黏著劑旋轉塗布。此外,由於步驟S2中進行了基板的溫度調節,故能夠以一定的塗布條件塗布黏著劑。於基板塗布黏著劑後,設於旋轉器52之洗淨部,將基板的背面洗淨(背淋洗;back rinse)。此外,視必要,洗淨部亦可將基板的端面洗淨(邊緣/背淋洗;edge/back rimse)。洗淨結束後,第二搬運裝置54,在支撐著基板的狀態下將該基板搬入烘烤板51(第二搬入工 程)。 In step S3, the second transfer device 54 mounts the substrate on the rotator 52, and the rotator 52 applies an adhesive to the substrate (adhesive coating process). Since the calibration of the substrate is performed in step S2, the adhesive can be applied to the surface of the substrate in a uniform manner. Further, since the temperature of the substrate is adjusted in step S2, the adhesive can be applied under a constant coating condition. After the adhesive is applied to the substrate, it is placed in the cleaning portion of the rotator 52, and the back surface of the substrate is washed (back rinse). In addition, the cleaning unit may also wash the end faces of the substrate (edge/back rimse) as necessary. After the cleaning is completed, the second conveying device 54 carries the substrate into the baking sheet 51 while supporting the substrate (the second loading machine) Cheng).

步驟S4中,第二搬運裝置54將基板載置於烘烤板51,利用熱源烘烤塗布於基板之黏著劑。藉由烘烤黏著劑,能夠使溶劑適當地揮發。此外,烘烤黏著劑之溫度(t1℃),能夠因應黏著劑的種類來適當訂定。 In step S4, the second transfer device 54 mounts the substrate on the baking sheet 51, and bakes the adhesive applied to the substrate by a heat source. The solvent can be appropriately volatilized by baking the adhesive. Further, the temperature of the baking adhesive (t 1 ° C) can be appropriately set depending on the type of the adhesive.

步驟S5中,進一步烘烤黏著劑。進一步烘烤黏著劑之溫度(t2℃),能夠因應黏著劑的種類來適當訂定。烘烤結束後,第二搬運裝置54,在支撐著基板的狀態下將該基板搬運至溫度調節部56。 In step S5, the adhesive is further baked. The temperature at which the adhesive is further baked (t 2 ° C) can be appropriately set in accordance with the type of the adhesive. After the baking is completed, the second conveyance device 54 conveys the substrate to the temperature adjustment unit 56 while supporting the substrate.

步驟S6中,第二搬運裝置54將基板載置於冷卻板,溫度調節部56將基板冷卻。然後,藉由位置調整裝置,在冷卻板上進行基板的校準。校準結束後,第二搬運裝置54,在支撐著基板的狀態下將該基板搬入洗淨裝置53。 In step S6, the second conveyance device 54 mounts the substrate on the cooling plate, and the temperature adjustment unit 56 cools the substrate. Then, the substrate is calibrated on the cooling plate by the position adjusting device. After the calibration is completed, the second conveyance device 54 carries the substrate into the cleaning device 53 while supporting the substrate.

步驟S7中,第二搬運裝置54將基板載置於洗淨裝置53,洗淨裝置53對基板的端面做邊緣/背淋洗,對基板的背面做背淋洗。藉此,當在旋轉器52將黏著劑旋轉塗布至基板時,能夠除去附著於該基板的端面及背面之黏著劑。此處,由於步驟S6中進行了基板的位置調整,故能夠正確地洗淨基板的端面(邊緣)。基板的洗淨結束後,第二搬運裝置54,在支撐著基板的狀態下將該基板搬運至烘烤板51。 In step S7, the second conveying device 54 mounts the substrate on the cleaning device 53, and the cleaning device 53 performs edge/backwashing on the end surface of the substrate, and backwashes the back surface of the substrate. Thereby, when the adhesive is spin-coated on the substrate in the rotator 52, the adhesive adhering to the end surface and the back surface of the substrate can be removed. Here, since the position adjustment of the substrate is performed in step S6, the end surface (edge) of the substrate can be accurately cleaned. After the cleaning of the substrate is completed, the second transfer device 54 transports the substrate to the baking sheet 51 while supporting the substrate.

步驟S8中,第二搬運裝置54將基板載置於烘烤板51,利用熱源進一步烘烤塗布於基板之黏著劑。 進一步烘烤黏著劑之溫度(t3℃),能夠因應黏著劑的種類來適當訂定。藉此,基板上的黏著劑會乾燥,而形成黏著層(黏著層形成工程)。 In step S8, the second transfer device 54 mounts the substrate on the baking sheet 51, and further applies an adhesive to the substrate by a heat source. The temperature at which the adhesive is further baked (t 3 ° C) can be appropriately set in accordance with the type of the adhesive. Thereby, the adhesive on the substrate is dried to form an adhesive layer (adhesive layer forming process).

步驟S4、S5及S8中,若將烘烤黏著劑之溫度分別訂為t1、t2、t3(℃),那麼較佳是以滿足t1<t2<t3(其中,較佳是t1≧60(℃)及t3≦250(℃))的方式,來階段性地提升步驟間烘烤黏著劑之溫度。若於黏著劑塗布結束後立即以高溫烘烤,那麼容易發生黏著劑收縮造成之基板翹曲、黏著劑表面皺褶、黏著劑發泡等問題,恐無法形成均一的黏著層,但藉由階段性地提升烘烤之溫度,便能形成均一的黏著層。 In steps S4, S5 and S8, if the temperatures of the baking adhesives are respectively set to t 1 , t 2 , t 3 (° C), it is preferable to satisfy t 1 <t 2 < t 3 (wherein It is a mode of t 1 ≧ 60 (°C) and t 3 ≦ 250 (°C) to gradually increase the temperature of the baking adhesive between steps. If the adhesive is baked at a high temperature immediately after the application of the adhesive, problems such as warpage of the substrate caused by shrinkage of the adhesive, wrinkles of the adhesive surface, foaming of the adhesive, etc. may occur, and a uniform adhesive layer may not be formed, but by the stage Slightly increase the baking temperature to form a uniform adhesive layer.

黏著層形成後,第二搬運裝置54,在支撐著基板的狀態下將該基板搬運至溫度調節部56。 After the adhesive layer is formed, the second conveyance device 54 conveys the substrate to the temperature adjustment portion 56 while supporting the substrate.

步驟S9中,第二搬運裝置54使基板支撐於冷卻區域的支撐點,溫度調節部56將基板自然冷卻。自然冷卻後,第一搬運裝置4,在支撐著基板的狀態下將該基板搬入至保持部3。 In step S9, the second conveyance device 54 supports the substrate at the support point of the cooling region, and the temperature adjustment portion 56 naturally cools the substrate. After the natural cooling, the first conveying device 4 carries the substrate into the holding portion 3 while supporting the substrate.

步驟S10中,第一搬運裝置4將基板搬入、載置於保持部3。保持部3,進行基板的校準。校準後,第一搬運裝置4,在支撐著基板的狀態下將該基板搬入疊合部6(第三搬入工程)。 In step S10, the first conveyance device 4 carries the substrate and places it on the holding portion 3. The holding unit 3 performs calibration of the substrate. After the calibration, the first conveying device 4 carries the substrate into the overlapping portion 6 while supporting the substrate (the third carrying-in process).

又,在有關基板之上述步驟S1~S10之前、結束後、或並行地,進行有關支承板之步驟S11~S13。首先,步驟S11中,第一搬運裝置4將支承板從輸送站 50投入層積體形成系統1內。第一搬運裝置4,在支撐著支承板的狀態下將該支承板搬入厚度測定器57。 Further, steps S11 to S13 regarding the support plate are performed before, after, or in parallel with the above-described steps S1 to S10 of the substrate. First, in step S11, the first handling device 4 carries the support plate from the delivery station. 50 is put into the laminated body formation system 1. The first conveying device 4 carries the support plate into the thickness measuring device 57 while supporting the support plate.

步驟S12中,第一搬運裝置4,將支承板載置於厚度測定器57,厚度測定器57測定支承板的厚度分布(支撐體厚度分布測定工程)。測定厚度分布後,第一搬運裝置4在支撐著支承板的狀態下將該支承板搬入至保持部3。在將支承板貼合至基板前,進行支承板的厚度分布之測定,藉此便能檢測支承板的異常。 In step S12, the first conveying device 4 mounts the support plate on the thickness measuring device 57, and the thickness measuring device 57 measures the thickness distribution of the support plate (support thickness distribution measurement project). After the thickness distribution is measured, the first conveying device 4 carries the support plate to the holding portion 3 while supporting the support plate. Before the support plate is attached to the substrate, the thickness distribution of the support plate is measured, whereby the abnormality of the support plate can be detected.

步驟S13中,第一搬運裝置4將支承板搬入、載置於保持部3。然後,保持部3將支承板校準。校準後,第一搬運裝置4在支撐著支承板的狀態下將該支承板搬入疊合部6(第四搬入工程)。 In step S13, the first conveying device 4 carries the loading plate and places it on the holding portion 3. Then, the holding portion 3 aligns the support plate. After the calibration, the first conveying device 4 carries the support plate into the overlapping portion 6 while supporting the support plate (fourth loading process).

當支承板上形成有分離層的情形下,第一搬運裝置4較佳是以分離層比支承板還位於鉛直上方的方式來搬運支承板,其後使支承板的上下翻轉,再搬運至疊合部6。直到搬入至疊合部6前,第一搬運裝置4係支撐未形成有分離層之支承板的背面,藉此,能夠縮短分離層與第一搬運裝置4接觸的時間,抑制分離層因第一搬運裝置4而受到污染或損傷。 In the case where the separation layer is formed on the support plate, the first conveying device 4 preferably conveys the support plate in such a manner that the separation layer is located vertically above the support plate, and then the support plate is turned upside down and then transported to the stack. Joint part 6. The first conveying device 4 supports the back surface of the support plate on which the separation layer is not formed until it is moved into the overlapping portion 6, whereby the time during which the separation layer comes into contact with the first conveying device 4 can be shortened, and the separation layer can be suppressed by the first The handling device 4 is contaminated or damaged.

第一搬運裝置4,以支承板比分離層還位於鉛直上方的方式來將支承板搬運至疊合部6。然後,將第三搬入工程中第一搬運裝置4搬運至疊合部6的基板,以及上述支承板,以分離層和黏著層面對面的狀態疊合。 The first conveying device 4 conveys the support plate to the overlapping portion 6 such that the support plate is positioned vertically above the separation layer. Then, the first conveyance device 4 in the third loading operation is conveyed to the substrate of the overlapping portion 6, and the support plate is superposed in a state in which the separation layer and the adhesive layer face each other.

基板及支承板的疊合,可利用疊合部6內的 位置調整部(未圖示)來調整基板與支承板之相對位置後再進行。藉此,基板及支承板的中心位置便不會偏離,能夠將它們的中心位置疊合。 The stack of the substrate and the support plate can be utilized in the overlap portion 6 The position adjustment unit (not shown) adjusts the relative position of the substrate and the support plate. Thereby, the center positions of the substrate and the support plate are not deviated, and their center positions can be overlapped.

內部搬運臂(未圖示),在支撐著疊合好的基板及支承板的狀態下,將該些基板及支承板搬入貼附部7。 The internal transfer arm (not shown) carries the substrates and the support plate into the attaching portion 7 while supporting the stacked substrate and the support plate.

步驟S14中,貼附部7將疊合好的基板及支承板透過黏著層予以貼合(貼附工程)。此時,以加壓板一面推壓基板及支承板,一面加熱形成黏著層之熱可塑性材料至成為玻璃轉化點以上的溫度為止。藉此,黏著層的熱流動性會提升,變得容易變形,因此能夠形成層積體。 In step S14, the attaching portion 7 bonds the laminated substrate and the support plate through the adhesive layer (attachment process). At this time, the substrate and the support plate are pressed by the pressurizing plate, and the thermoplastic material forming the adhesive layer is heated to a temperature equal to or higher than the glass transition point. Thereby, the thermal fluidity of the adhesive layer is improved and it is easily deformed, so that a laminate can be formed.

層積體形成後,第一搬運裝置4,在支撐著層積體的狀態下將該層積體搬運至溫度調節部56。步驟S15中,第一搬運裝置4使層積體支撐於冷卻區域的支撐點,溫度調節部56將層積體自然冷卻。藉由自然冷卻,能夠減低層積體的翹曲。此外,除了自然冷卻以外還緩緩地進行強制排氣以使基板內不產生溫度分布,藉此冷卻會在更短時間內完成。冷卻結束後,第一搬運裝置4,在支撐著層積體的狀態下將該層積體搬入厚度測定器57(第五搬入工程)。 After the formation of the laminate, the first conveyance device 4 conveys the laminate to the temperature adjustment portion 56 while supporting the laminate. In step S15, the first conveyance device 4 supports the laminate at the support point of the cooling zone, and the temperature adjustment unit 56 naturally cools the laminate. By natural cooling, the warpage of the laminate can be reduced. Further, in addition to the natural cooling, the forced exhaust is gradually performed so that no temperature distribution occurs in the substrate, whereby the cooling is completed in a shorter time. After the completion of the cooling, the first conveyance device 4 carries the laminate into the thickness measuring device 57 while supporting the laminate (the fifth loading operation).

步驟S16中,測定被搬入至厚度測定器57之層積體的厚度分布(層積體厚度分布測定工程)。由於步驟S15中將層積體自然冷卻,因此能夠測定室溫(例如25℃)下的層積體的厚度分布。 In step S16, the thickness distribution (layer thickness distribution measurement project) of the laminate carried into the thickness measuring device 57 is measured. Since the laminate is naturally cooled in step S15, the thickness distribution of the laminate at room temperature (for example, 25 ° C) can be measured.

藉由測定層積體的厚度分布,能夠確認層積體的品質。此外,由於步驟S12中測定了支承板的厚度分布,因此藉由比較支承板的厚度分布與層積體的厚度分布,便能瞭解層積體中的凹凸是因支承板或黏著層的哪一者所引起。 The quality of the laminate can be confirmed by measuring the thickness distribution of the laminate. Further, since the thickness distribution of the support plate is measured in the step S12, it is possible to know which of the support plate or the adhesive layer is the unevenness in the laminate by comparing the thickness distribution of the support plate with the thickness distribution of the laminate. Caused by the person.

此外,藉由對基板或支承板設置產品編號等,便能管理每個層積體的貼附精度,能夠反饋給層積體形成處理。 Further, by providing a product number or the like on the substrate or the support plate, the adhesion accuracy of each laminate can be managed, and feedback processing can be fed back to the laminate.

步驟S17中,層積體的厚度分布的測定結束後,第一搬運裝置4,將層積體從厚度測定器57搬運至輸送站50。然後,將層積體從輸送站50取出。 In step S17, after the measurement of the thickness distribution of the laminate is completed, the first conveyance device 4 conveys the laminate from the thickness measuring device 57 to the transfer station 50. Then, the laminate is taken out from the transfer station 50.

故,藉由步驟S1~S17的步驟,能夠形成將基板及支承板透過黏著層貼合而成之層積體。 Therefore, by the steps of steps S1 to S17, it is possible to form a laminate in which the substrate and the support plate are bonded to each other through the adhesive layer.

此外,藉由分別使用上述二個搬運裝置(第一搬運裝置4、第二搬運裝置54)進行搬運,即使將構成層積體形成系統1的多數個裝置如圖4所示般緊密地配置,仍能有效率地進行裝置間的基板、支承板及層積體之授受,是故能夠有效率地形成層積體。 Further, by using the above-described two transport devices (the first transport device 4 and the second transport device 54), a plurality of devices constituting the laminate forming system 1 are closely arranged as shown in FIG. Since the substrate, the support plate, and the laminate between the devices can be efficiently transferred, the laminate can be efficiently formed.

從輸送站50取出的基板,係在被支撐於支承板之層積體的狀態下,供應給薄化、組裝等製程。又,製程結束後,將光透過支承板照射至分離層,使分離層變質,藉此便能容易地分離支承板與基板。 The substrate taken out from the transfer station 50 is supplied to a thinner, assembled, or the like in a state of being supported by the laminate of the support plate. Further, after the completion of the process, the light is transmitted through the support plate to the separation layer to degrade the separation layer, whereby the support plate and the substrate can be easily separated.

本發明並非限定於上述實施形態,於申請專利範圍所示範圍內可做各種變更,針對將不同實施形態中 各別揭示之技術手段予以適當組合而得之實施形態,同樣包含在本發明之技術範圍中。 The present invention is not limited to the above embodiments, and various modifications can be made within the scope of the claims. The embodiments obtained by appropriately combining the technical means disclosed are also included in the technical scope of the present invention.

[產業利用性] [Industry Utilization]

本發明之厚度測定器及厚度測定方法,例如能夠廣泛地利用於半導體晶圓的製造工程中。 The thickness measuring device and the thickness measuring method of the present invention can be widely used, for example, in the manufacturing process of a semiconductor wafer.

Claims (9)

一種厚度測定器,其特徵為,具備:第一雷射位移計及第二雷射位移計,測定測定對象物的表面的位移;及位移計保持部,可移動地保持上述第一雷射位移計及第二雷射位移計;及算出裝置,由上述雷射位移計測定出的第一位移及第二位移,藉由演算算出測定對象物的厚度;及測定對象物保持部,可移動地保持測定對象物;上述第一雷射位移計及第二雷射位移計,係在一直線上相向配置,以便測定測定對象物的表背面的位移,上述測定對象物保持部,具備載置測定對象物之載置台,上述載置台,具有使測定對象物的背面的一部分露出之複數個開口部。 A thickness measuring device comprising: a first laser displacement meter and a second laser displacement meter for measuring a displacement of a surface of the object to be measured; and a displacement gauge holding unit movably holding the first laser displacement Taking the second laser displacement meter; and the calculation device, the first displacement and the second displacement measured by the laser displacement meter are calculated by calculating the thickness of the object to be measured; and the object holding portion is movably The first laser displacement meter and the second laser displacement meter are arranged to face each other in a straight line so as to measure the displacement of the front and back surfaces of the object to be measured, and the object to be measured is provided with a measurement target. The mounting table has a plurality of openings that expose a part of the back surface of the object to be measured. 如申請專利範圍第1項所述之厚度測定器,其中,上述第一雷射位移計及第二雷射位移計,係同時測定測定對象物的表背面的位移。 The thickness measuring device according to claim 1, wherein the first laser displacement meter and the second laser displacement meter simultaneously measure the displacement of the front and back surfaces of the object to be measured. 如申請專利範圍第1或2項所述之厚度測定器,其中,連結上述第一雷射位移計及第二雷射位移計之直線,相對於測定對象物的表面或背面而言係正交。 The thickness measuring device according to claim 1 or 2, wherein the straight line connecting the first laser displacement meter and the second laser displacement meter is orthogonal to the surface or the back surface of the object to be measured . 如申請專利範圍第1或2項所述之厚度測定器,其中,上述第一雷射位移計及第二雷射位移計,係光譜干擾式雷射位移計。 The thickness measuring device according to claim 1 or 2, wherein the first laser displacement meter and the second laser displacement meter are spectral interference type laser displacement meters. 如申請專利範圍第1或2項所述之厚度測定器,其中,上述載置台,具備用來保持測定對象物之吸附機構。 The thickness measuring device according to claim 1 or 2, wherein the mounting table includes an adsorption mechanism for holding the object to be measured. 一種層積體形成系統,其特徵為,具備:貼附裝置,將形成有黏著層之基板、及支撐體,透過上述黏著層予以貼合而形成層積體;及如申請專利範圍第1至5項任一項所述之厚度測定器,測定作為測定對象物之上述層積體的厚度。 A laminate forming system comprising: a bonding device, a substrate on which an adhesive layer is formed, and a support are bonded to each other through the adhesive layer to form a laminate; and Patent Application No. 1 to The thickness measuring device according to any one of the items 5, wherein the thickness of the laminate as the object to be measured is measured. 如申請專利範圍第6項所述之層積體形成系統,其中,更具備:塗布裝置,於基板上塗布黏著劑;及加熱裝置,將已塗布上述黏著劑之基板予以加熱而在基板上形成黏著層。 The laminate forming system according to claim 6, further comprising: a coating device for applying an adhesive on the substrate; and a heating device for heating the substrate coated with the adhesive to form on the substrate Adhesive layer. 如申請專利範圍第7項所述之層積體形成系統,其中,更具備:存放部,存放基板;溫度調節部,調整基板的溫度;第一搬運裝置,在上述存放部、上述貼附裝置、及上述溫度調節部之間搬運基板;及第二搬運裝置,在上述溫度調節部、上述塗布裝置、及上述加熱裝置之間搬運基板。 The laminate forming system according to claim 7, further comprising: a storage unit for storing a substrate; a temperature adjustment unit for adjusting a temperature of the substrate; and a first conveying device at the storage portion and the attaching device And transporting the substrate between the temperature adjustment units; and the second transfer device transporting the substrate between the temperature adjustment unit, the coating device, and the heating device. 如申請專利範圍第8項所述之層積體形成系統,其中,上述溫度調節部,具備:冷卻板,調整基板的溫度;及位置調整裝置,調整上述冷卻板上的基板的位置。 The laminate forming system according to claim 8, wherein the temperature adjusting unit includes a cooling plate to adjust a temperature of the substrate, and a position adjusting device that adjusts a position of the substrate on the cooling plate.
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