TWI651585B - 光罩及顯示裝置之製造方法 - Google Patents

光罩及顯示裝置之製造方法 Download PDF

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Publication number
TWI651585B
TWI651585B TW107103718A TW107103718A TWI651585B TW I651585 B TWI651585 B TW I651585B TW 107103718 A TW107103718 A TW 107103718A TW 107103718 A TW107103718 A TW 107103718A TW I651585 B TWI651585 B TW I651585B
Authority
TW
Taiwan
Prior art keywords
pattern
light
photomask
film
semi
Prior art date
Application number
TW107103718A
Other languages
English (en)
Chinese (zh)
Other versions
TW201816503A (zh
Inventor
今敷修久
吉川裕
菅原浩幸
Original Assignee
日商Ｈｏｙａ股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商Ｈｏｙａ股份有限公司 filed Critical 日商Ｈｏｙａ股份有限公司
Publication of TW201816503A publication Critical patent/TW201816503A/zh
Application granted granted Critical
Publication of TWI651585B publication Critical patent/TWI651585B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
    • G03F7/2063—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam for the production of exposure masks or reticles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
TW107103718A 2014-07-17 2015-06-11 光罩及顯示裝置之製造方法 TWI651585B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014146847A JP6581759B2 (ja) 2014-07-17 2014-07-17 フォトマスク、フォトマスクの製造方法、フォトマスクブランク及び表示装置の製造方法
JP2014-146847 2014-07-17

Publications (2)

Publication Number Publication Date
TW201816503A TW201816503A (zh) 2018-05-01
TWI651585B true TWI651585B (zh) 2019-02-21

Family

ID=55247536

Family Applications (3)

Application Number Title Priority Date Filing Date
TW107103718A TWI651585B (zh) 2014-07-17 2015-06-11 光罩及顯示裝置之製造方法
TW108100864A TWI690770B (zh) 2014-07-17 2015-06-11 光罩及顯示裝置之製造方法
TW104118949A TWI621907B (zh) 2014-07-17 2015-06-11 光罩、光罩之製造方法、光罩基底及顯示裝置之製造方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
TW108100864A TWI690770B (zh) 2014-07-17 2015-06-11 光罩及顯示裝置之製造方法
TW104118949A TWI621907B (zh) 2014-07-17 2015-06-11 光罩、光罩之製造方法、光罩基底及顯示裝置之製造方法

Country Status (4)

Country Link
JP (1) JP6581759B2 (enExample)
KR (3) KR101837247B1 (enExample)
CN (2) CN110673436B (enExample)
TW (3) TWI651585B (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6259509B1 (ja) * 2016-12-28 2018-01-10 株式会社エスケーエレクトロニクス ハーフトーンマスク、フォトマスクブランクス及びハーフトーンマスクの製造方法
JP6808665B2 (ja) 2017-03-10 2021-01-06 Hoya株式会社 表示装置製造用フォトマスク、及び表示装置の製造方法
JP7080070B2 (ja) * 2017-03-24 2022-06-03 Hoya株式会社 フォトマスク、及び表示装置の製造方法
JP6964029B2 (ja) * 2017-06-06 2021-11-10 Hoya株式会社 フォトマスク、及び、表示装置の製造方法
TWI659262B (zh) 2017-08-07 2019-05-11 日商Ｈｏｙａ股份有限公司 光罩之修正方法、光罩之製造方法、光罩及顯示裝置之製造方法
TWI710649B (zh) * 2017-09-12 2020-11-21 日商Ｈｏｙａ股份有限公司 光罩及顯示裝置之製造方法
JP7261709B2 (ja) * 2019-09-13 2023-04-20 Hoya株式会社 フォトマスク、フォトマスクの製造方法及び表示装置の製造方法
JP7383490B2 (ja) * 2020-01-07 2023-11-20 株式会社エスケーエレクトロニクス フォトマスク

Citations (3)

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TW200732832A (en) * 2006-02-15 2007-09-01 Hoya Corp Mask blank and photomask
US20110183240A1 (en) * 2009-12-21 2011-07-28 Hoya Corporation Mask blank, mask blank manufacturing method, transfer mask, and transfer mask manufacturing method
TW201400977A (zh) * 2012-06-01 2014-01-01 Hoya Corp 光罩、光罩之製造方法及圖案之轉印方法

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JPH0315845A (ja) 1989-06-14 1991-01-24 Hitachi Ltd マスク及びマスク作製方法
JP3225535B2 (ja) * 1991-04-26 2001-11-05 ソニー株式会社 位相シフトマスク
JPH0683031A (ja) * 1992-08-31 1994-03-25 Sony Corp 露光マスク形成方法
JPH0695360A (ja) * 1992-09-10 1994-04-08 Fujitsu Ltd 光学マスク
JP3353124B2 (ja) * 1992-11-27 2002-12-03 大日本印刷株式会社 位相シフトフォトマスク
JPH0764274A (ja) * 1993-08-30 1995-03-10 Sony Corp 位相シフトマスク及びその製造方法
JP2000019710A (ja) * 1998-07-07 2000-01-21 Hitachi Ltd 半導体集積回路装置の製造方法
JP2000181048A (ja) * 1998-12-16 2000-06-30 Sharp Corp フォトマスクおよびその製造方法、並びにそれを用いた露光方法
JP2002323746A (ja) * 2001-04-24 2002-11-08 Matsushita Electric Ind Co Ltd 位相シフトマスク及び、それを用いたホールパターン形成方法
US7147975B2 (en) * 2003-02-17 2006-12-12 Matsushita Electric Industrial Co., Ltd. Photomask
JP3746497B2 (ja) * 2003-06-24 2006-02-15 松下電器産業株式会社 フォトマスク
JP4684584B2 (ja) * 2003-07-23 2011-05-18 キヤノン株式会社 マスク及びその製造方法、並びに、露光方法
JP2005150494A (ja) * 2003-11-18 2005-06-09 Sony Corp 半導体装置の製造方法
JP4645076B2 (ja) * 2004-06-28 2011-03-09 凸版印刷株式会社 位相シフトマスクおよびその製造方法およびパターン転写方法
JP3971774B2 (ja) * 2005-10-17 2007-09-05 松下電器産業株式会社 パターン形成方法
JP3971775B2 (ja) * 2005-10-17 2007-09-05 松下電器産業株式会社 フォトマスク
JP6186719B2 (ja) 2011-12-21 2017-08-30 大日本印刷株式会社 大型位相シフトマスクおよび大型位相シフトマスクの製造方法
JP6081716B2 (ja) * 2012-05-02 2017-02-15 Hoya株式会社 フォトマスク、パターン転写方法及びフラットパネルディスプレイの製造方法
JP6139826B2 (ja) * 2012-05-02 2017-05-31 Hoya株式会社 フォトマスク、パターン転写方法、及びフラットパネルディスプレイの製造方法
JP5916680B2 (ja) * 2012-10-25 2016-05-11 Hoya株式会社 表示装置製造用フォトマスク、及びパターン転写方法
JP6322250B2 (ja) * 2016-10-05 2018-05-09 Hoya株式会社 フォトマスクブランク

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200732832A (en) * 2006-02-15 2007-09-01 Hoya Corp Mask blank and photomask
US20110183240A1 (en) * 2009-12-21 2011-07-28 Hoya Corporation Mask blank, mask blank manufacturing method, transfer mask, and transfer mask manufacturing method
TW201400977A (zh) * 2012-06-01 2014-01-01 Hoya Corp 光罩、光罩之製造方法及圖案之轉印方法

Also Published As

Publication number Publication date
KR20170117987A (ko) 2017-10-24
CN105319831B (zh) 2019-11-12
KR102168149B1 (ko) 2020-10-20
TW201921091A (zh) 2019-06-01
KR102195658B1 (ko) 2020-12-28
CN110673436B (zh) 2023-10-27
KR20160010322A (ko) 2016-01-27
TW201604643A (zh) 2016-02-01
TW201816503A (zh) 2018-05-01
KR101837247B1 (ko) 2018-03-09
TWI690770B (zh) 2020-04-11
JP2016024264A (ja) 2016-02-08
CN105319831A (zh) 2016-02-10
TWI621907B (zh) 2018-04-21
CN110673436A (zh) 2020-01-10
KR20200120599A (ko) 2020-10-21
JP6581759B2 (ja) 2019-09-25

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