TWI648221B - Modified silica microparticle and method producing the same, coating solution for sorming thin film, substrate with thin film and photoelectronic cell - Google Patents

Modified silica microparticle and method producing the same, coating solution for sorming thin film, substrate with thin film and photoelectronic cell Download PDF

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TWI648221B
TWI648221B TW103116500A TW103116500A TWI648221B TW I648221 B TWI648221 B TW I648221B TW 103116500 A TW103116500 A TW 103116500A TW 103116500 A TW103116500 A TW 103116500A TW I648221 B TWI648221 B TW I648221B
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cerium oxide
oligomer
fine particles
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TW201500282A (en
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二神涉
松田政幸
村口良
平井俊晴
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日商日揮觸媒化成股份有限公司
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Abstract

為了實現耐候性高的機能性薄膜,使用含有表面鍵結有4官能有機矽化合物的寡聚物之氧化矽微粒子的塗布液製作薄膜。在此,寡聚物為分子量1000至10000、單體鍵結而成之形態。表面鍵結有4官能有機矽化合物的寡聚物之氧化矽微粒子係耐酸性高,含有該微粒子之薄膜係緻密、耐候性高。而且,於塗布液的黏合劑成分中使用4官能有機矽化合物。構成寡聚物之有機矽化合物與黏合劑成分的有機矽化合物可為相同的化合物或不同的化合物。特別是可使用氧化矽中空微粒子等低折射率的微粒子,製作抗反射膜。 In order to realize a functional film having high weather resistance, a film is formed using a coating liquid containing cerium oxide fine particles having an oligomer of a tetrafunctional organic sulfonium compound bonded to the surface. Here, the oligomer is in a form having a molecular weight of 1,000 to 10,000 and a monomer bond. The cerium oxide fine particles having an oligomer of a tetrafunctional organic cerium compound bonded to the surface thereof have high acid resistance, and the film containing the fine particles is dense and has high weather resistance. Further, a tetrafunctional organic ruthenium compound is used for the binder component of the coating liquid. The organic ruthenium compound constituting the oligomer and the organic ruthenium compound of the binder component may be the same compound or different compounds. In particular, an antireflection film can be produced by using fine particles having a low refractive index such as cerium oxide hollow fine particles.

Description

改質氧化矽微粒子及其製造方法、薄膜形成用塗布液、附有薄膜之基材以及光電電池 Modified cerium oxide microparticles, a method for producing the same, a coating liquid for film formation, a substrate with a film, and a photovoltaic cell

本發明係有關於設於基材表面的薄膜、用於形成該薄膜之塗布液、以及該塗布液中所含有之改質金屬氧化物微粒子。本發明的改質金屬氧化物微粒子,係於金屬氧化物微粒子的表面鍵結有有機矽化合物的聚合物之形態。特別是有關於使用氧化矽中空微粒子作為金屬氧化物微粒子,形成抗反射膜之技術。 The present invention relates to a film provided on the surface of a substrate, a coating liquid for forming the film, and modified metal oxide fine particles contained in the coating liquid. The modified metal oxide fine particles of the present invention are in the form of a polymer in which an organic ruthenium compound is bonded to the surface of the metal oxide fine particles. In particular, there is a technique for forming an antireflection film by using cerium oxide hollow fine particles as metal oxide fine particles.

自以往以來,對應目的而於基板上設置各式各樣的機能性薄膜。機能性薄膜為了顯現其機能,多半含有金屬氧化物微粒子。例如,為了防止於玻璃、塑膠片、塑膠鏡片等透明基材表面的反射,而在基材表面設置抗反射膜。作為抗反射膜,係使用以含有氧化矽中空微粒子之黏合劑所構成之薄膜。亦即,抗反射膜形成之際,使用氧化矽中空微粒子等低折射率微粒子作為金屬氧化物微粒 子。如此之抗反射膜係藉由將含有氧化矽中空微粒子之塗布液塗布於基材表面而形成。此外,日本特開2010-128309號公報(專利文獻1)中,記載有為了在維持抗反射性能之同時提升抗反射膜的耐水性及撥水性,而以具有疏水性基之有機矽化合物對氧化矽中空微粒子進行表面處理者。 Since the past, various types of functional films have been provided on the substrate for the purpose. In order to visualize its function, functional thin films mostly contain metal oxide fine particles. For example, in order to prevent reflection on the surface of a transparent substrate such as glass, a plastic sheet, or a plastic lens, an anti-reflection film is provided on the surface of the substrate. As the antireflection film, a film composed of a binder containing cerium oxide hollow fine particles is used. That is, when the antireflection film is formed, low refractive index fine particles such as cerium oxide hollow fine particles are used as the metal oxide fine particles. child. Such an antireflection film is formed by applying a coating liquid containing cerium oxide hollow fine particles to the surface of a substrate. In addition, in order to improve the water resistance and water repellency of the antireflection film while maintaining the antireflection performance, the organic ruthenium compound having a hydrophobic group is oxidized in order to maintain the antireflection performance.矽 Hollow particles are surface treated.

此外,日本特開2003-298087號公報(專利文獻2)中,記載有於太陽電池單元的受光面設有作為抗反射膜之含有中空氧化矽微粒子與4官能水解性有機矽烷的部分水解物之塗膜,以減少因表面反射所致光的損失之例。 Japanese Patent Publication No. 2003-298087 (Patent Document 2) discloses that a light-receiving surface of a solar cell unit is provided with a partial hydrolyzate containing hollow cerium oxide microparticles and a tetrafunctional hydrolyzable organic decane as an antireflection film. Coating film to reduce the loss of light due to surface reflection.

如上所述,抗反射膜多形成於基材表面。因此,對於抗反射膜而言,不僅要求抗反射性能,也要求有耐擦傷性、耐刮強度、撥水性等。然而,專利文獻1所記載之抗反射膜無法得到充分的耐候性。特別是太陽電池系統係設置於屋外,故必須可承受雨或風、砂塵或溫度變化等。因此,太陽電池單元所使用之抗反射膜係要求高耐候性。然而,專利文獻1的抗反射膜無法得到充分的耐候性,無法滿足可靠性標準。這不僅限於抗反射膜,而是含有金屬氧化物微粒子之機能性薄膜的共通課題。亦即,黏合劑中存在有金屬氧化物微粒子形態之薄膜,由於金屬氧化物微粒子的存在,使得薄膜的耐候性等比黏合劑單體的耐候性等更為減低。 As described above, the antireflection film is often formed on the surface of the substrate. Therefore, for the antireflection film, not only antireflection properties but also scratch resistance, scratch resistance, water repellency, and the like are required. However, the antireflection film described in Patent Document 1 cannot obtain sufficient weather resistance. In particular, the solar cell system is installed outside the house, so it must withstand rain or wind, sand dust or temperature changes. Therefore, the antireflection film used in the solar cell unit requires high weather resistance. However, the antireflection film of Patent Document 1 cannot obtain sufficient weather resistance and cannot satisfy the reliability standard. This is not limited to the antireflection film, but is a common problem of a functional film containing metal oxide fine particles. That is, a film having a metal oxide fine particle form is present in the binder, and the weather resistance of the film is more reduced than the weather resistance of the binder monomer due to the presence of the metal oxide fine particles.

本案發明者們為了提升機能性薄膜的耐候性,認為必須使薄膜變得更為緻密。於是,發現經由4官能有機矽化合物的寡聚物表面處理過的金屬氧化物微粒子的耐酸性高,含有此金屬氧化物微粒子的薄膜變得比以往的薄膜更為緻密。 In order to improve the weather resistance of the functional film, the inventors of the present invention considered that it is necessary to make the film more dense. Then, it has been found that the metal oxide fine particles surface-treated with the oligomer of the tetrafunctional organic cerium compound have high acid resistance, and the film containing the metal oxide fine particles becomes denser than the conventional thin film.

於是在此,本發明的改質金屬氧化物微粒子,係在表面鍵結有4官能有機矽化合物的寡聚物之金屬氧化物微粒子。寡聚物係將4官能有機矽化合物的單體鍵結而成之形態,該寡聚物的平均分子量為1000至10000之範圍。在此,4官能有機矽化合物係以SiX4(惟,X係碳數1至4之烷氧基、羥基、鹵素、氫)表示。 Here, the modified metal oxide fine particles of the present invention are metal oxide fine particles in which an oligomer of a tetrafunctional organic germanium compound is bonded to the surface. The oligomer is a form in which a monomer of a tetrafunctional organic hydrazine compound is bonded, and the average molecular weight of the oligomer is in the range of 1,000 to 10,000. Here, the tetrafunctional organic sulfonium compound is represented by SiX 4 (exclusive, X-based alkoxy group having 1 to 4 carbon atoms, hydroxyl group, halogen, hydrogen).

此外,改質金屬氧化物微粒子的製造方法係包括:製作含有金屬氧化物微粒子之微粒子分散液之步驟;在酸的環境下將4官能有機矽化合物寡聚化之製作寡聚物分散液的步驟;以及自寡聚物分散液除去酸,添加微粒子分散液,將之攪拌,於金屬氧化物微粒子的表面鍵結4官能有機矽化合物的寡聚物的修飾步驟。為了鍵結4官能有機矽化合物的單體而製作寡聚物,可在酸的環境下進行。另一方面,為了使該寡聚物與金屬氧化物微粒子的表面鍵結,可除去酸,使pH為5至7之範圍。 Further, the method for producing a modified metal oxide fine particle includes a step of preparing a fine particle dispersion containing metal oxide fine particles; and a step of preparing an oligomer dispersion by oligomerizing a tetrafunctional organic germanium compound in an acid atmosphere And a step of modifying the oligomer of the tetrafunctional organic sulfonium compound by removing the acid from the oligomer dispersion, adding the fine particle dispersion, and stirring the surface of the metal oxide fine particles. The oligomer is produced by bonding a monomer of a tetrafunctional organic hydrazine compound, and it can carry out in an acid environment. On the other hand, in order to bond the oligomer to the surface of the metal oxide fine particles, the acid can be removed to have a pH in the range of 5 to 7.

可使用該改質金屬氧化物微粒子製作薄膜形成用塗布液。亦即,依據本發明之塗布液,係含有4官能有機矽化合物的寡聚物鍵結於金屬氧化物微粒子的表面之表面改質金屬氧化物微粒子,與黏合劑成分。寡聚物係 將4官能有機矽化合物的單體鍵結之形態,其平均分子量為1000至10000之範圍。黏合劑成分中亦適合有4官能有機矽化合物。此時,形成寡聚物之有機矽化合物(以下,作為第一有機矽化合物)與黏合劑成分中所含之有機矽化合物(以下,作為第二有機矽化合物)係可為相同的化合物或不同的化合物。使用如此之塗布液所形成之機能性薄膜,係無損其機能而提升耐候性以及可靠性。 The coating liquid for film formation can be produced using the modified metal oxide fine particles. That is, the coating liquid according to the present invention is a surface-modified metal oxide fine particle in which an oligomer containing a tetrafunctional organic cerium compound is bonded to the surface of the metal oxide fine particle, and a binder component. Oligomer system The form in which the monomer of the tetrafunctional organic hydrazine compound is bonded has an average molecular weight of from 1,000 to 10,000. A 4-functional organic hydrazine compound is also suitable for the binder component. In this case, the organic ruthenium compound forming the oligomer (hereinafter, referred to as the first organic ruthenium compound) and the organic ruthenium compound (hereinafter referred to as the second organic ruthenium compound) contained in the binder component may be the same compound or different. compound of. The functional film formed by using such a coating liquid improves the weather resistance and reliability without impairing its function.

使用氧化矽中空微粒子作為金屬氧化物微粒子,可藉以製作抗反射膜。亦即,製作將4官能有機矽化合物的寡聚物鍵結於氧化矽中空微粒子的表面之改質氧化矽中空微粒子。以改質氧化矽中空微粒子與黏合劑成分構成抗反射膜形成用塗布液。寡聚物係將4官能有機矽化合物的單體鍵結之形態,寡聚物的平均分子量為1000至10000之範圍。黏合劑成分為4官能有機矽化合物(第二有機矽化合物),其可與形成寡聚物之4官能有機矽化合物(第一有機矽化合物)為不同的化合物或相同的化合物。藉由使用如此之塗布液成膜,可實現耐候性以及可靠性高的抗反射膜。 An antireflection film can be produced by using cerium oxide hollow fine particles as metal oxide fine particles. That is, the modified cerium oxide hollow fine particles in which the oligomer of the tetrafunctional organic cerium compound is bonded to the surface of the cerium oxide hollow fine particles are produced. The coating liquid for forming an antireflection film is composed of the modified cerium oxide hollow fine particles and the binder component. The oligomer is a form in which a monomer of a tetrafunctional organic hydrazine compound is bonded, and an average molecular weight of the oligomer is in the range of 1,000 to 10,000. The binder component is a tetrafunctional organic cerium compound (second organic cerium compound) which may be a different compound or the same compound as the 4-functional organic cerium compound (first organic cerium compound) forming the oligomer. By forming a film using such a coating liquid, an antireflection film having high weather resistance and high reliability can be realized.

同樣地,可藉由使用氧化矽微粒子作為金屬氧化物微粒子,實現適合於顯示裝置的前面板等的硬塗膜。 Similarly, a hard coat film suitable for a front panel or the like of a display device can be realized by using cerium oxide fine particles as metal oxide fine particles.

藉由將以4官能有機矽化合物的寡聚物修飾金屬氧化物微粒子表面之改質金屬氧化物微粒子使用於 機能性薄膜,可無損於機能性薄膜的機能特性而提升耐候性。 The modified metal oxide fine particles on the surface of the metal oxide fine particles are modified by using an oligomer of a tetrafunctional organic germanium compound. The functional film can improve the weather resistance without impairing the functional properties of the functional film.

本發明係於金屬氧化物微粒子中使用氧化矽微粒子,以實現機能性薄膜。有關於本發明之改質氧化矽微粒子,係為於氧化矽微粒子的表面鍵結有4官能有機矽化合物的寡聚物之構成,寡聚物的平均分子量為1000至10000之範圍。在此,寡聚物係將4官能有機矽化合物的單體鍵結之形態。如此改質氧化矽微粒子係耐酸性高,含有該微粒子的機能性薄膜係耐候性優異。特別較佳為單體為線狀鍵結形態之寡聚物。在此,4官能有機矽化合物係以SiX4表示。惟,X係碳數1至4之烷氧基、羥基、鹵素、氫中的任一者。具體而言,作為有機矽化合物,可例示4官能水解性有機矽烷。相較於4官能有機矽化合物,3官能或2官能有機矽化合物與構成薄膜之黏合劑的鍵結力低,故無法得到充分的薄膜硬度(鉛筆硬度,耐擦傷性)。因此,形成寡聚物之有機矽化合物以4官能者為適當。 The present invention is based on the use of cerium oxide microparticles in metal oxide microparticles to achieve a functional film. The modified cerium oxide microparticles according to the present invention are composed of an oligomer having a tetrafunctional organic quinone compound bonded to the surface of the cerium oxide microparticles, and the average molecular weight of the oligomer is in the range of 1,000 to 10,000. Here, the oligomer is a form in which a monomer of a tetrafunctional organic hydrazine compound is bonded. The modified cerium oxide microparticles have high acid resistance, and the functional film containing the microparticles is excellent in weather resistance. Particularly preferred is an oligomer in which the monomer is in the form of a linear bond. Here, the tetrafunctional organic sulfonium compound is represented by SiX 4 . However, X is any one of alkoxy groups having 1 to 4 carbon atoms, a hydroxyl group, a halogen, and hydrogen. Specifically, as the organic ruthenium compound, a tetrafunctional hydrolyzable organodecane can be exemplified. Compared with the tetrafunctional organic ruthenium compound, the bonding ability of the trifunctional or bifunctional organic ruthenium compound and the binder constituting the film is low, so that sufficient film hardness (pencil hardness, scratch resistance) cannot be obtained. Therefore, the organic ruthenium compound forming the oligomer is suitably a 4-functional one.

其次,說明該改質氧化矽微粒子的製造方法。首先,製作含有氧化矽微粒子之微粒子分散液。此外,將含有4官能有機矽化合物單體的單體溶液在酸的環境下攪拌。藉此,單體成為平均分子量1000至10000的寡聚物,從而製作寡聚物溶液。藉由使單體溶液為酸性,有機矽化 合物的單體係線狀地鍵結,形成寡聚物。特別期望單體溶液的pH為0.5至3.0。酸性愈強,寡聚物的分子量會變得愈大。此外,攪拌時的溫度較佳為20至100℃,時間較佳為24小時至30分鐘。分子量係依著溫度及時間而改變,故可適宜地設定攪拌條件。假設單體溶液係在鹼性環境下攪拌時,單體會立體性地鍵結,而不會成為本發明所期望的寡聚物形態。 Next, a method of producing the modified cerium oxide microparticles will be described. First, a fine particle dispersion containing cerium oxide fine particles is produced. Further, a monomer solution containing a tetrafunctional organic hydrazine compound monomer is stirred under an acidic environment. Thereby, the monomer becomes an oligomer having an average molecular weight of 1,000 to 10,000, thereby producing an oligomer solution. Organic deuteration by making the monomer solution acidic The single system of the compound is linearly bonded to form an oligomer. It is particularly desirable that the pH of the monomer solution is from 0.5 to 3.0. The stronger the acidity, the larger the molecular weight of the oligomer becomes. Further, the temperature at the time of stirring is preferably from 20 to 100 ° C, and the time is preferably from 24 hours to 30 minutes. Since the molecular weight changes depending on the temperature and time, the stirring conditions can be appropriately set. Assuming that the monomer solution is stirred under an alkaline environment, the monomers are sterically bonded without becoming an oligomeric form desired in the present invention.

其次,自該寡聚物溶液除去酸,添加前述微粒子分散液後攪拌。藉此,氧化矽微粒子的表面鍵結有4官能有機矽化合物的寡聚物,從而製作本發明的改質氧化矽微粒子。為使氧化矽微粒子與寡聚物鍵結,必須除去酸而使寡聚物分散液的pH為5至7之範圍。 Next, the acid is removed from the oligomer solution, and the fine particle dispersion is added and stirred. Thereby, an oligomer of a tetrafunctional organic sulfonium compound is bonded to the surface of the cerium oxide microparticles to prepare the modified cerium oxide microparticles of the present invention. In order to bond the cerium oxide microparticles to the oligomer, it is necessary to remove the acid so that the pH of the oligomer dispersion is in the range of 5 to 7.

酸的除去可在使寡聚物鍵結於氧化矽微粒子之前為之,亦可從添加了微粒子分散液與寡聚物溶液之溶液除去酸。於該情況,藉由自添加微粒子分散液與寡聚物溶液之混合溶液除去酸而攪拌,使氧化矽微粒子的表面鍵結有4官能有機矽化合物的寡聚物。此時,係以使混合溶液的pH成為4至7之範圍的方式除去酸。 The removal of the acid may be carried out before the oligomer is bonded to the cerium oxide microparticles, and the acid may be removed from the solution to which the microparticle dispersion and the oligomer solution are added. In this case, the acid is removed by adding a mixed solution of the fine particle dispersion and the oligomer solution, and the surface of the cerium oxide microparticles is bonded with an oligomer of a tetrafunctional organic hydrazine compound. At this time, the acid is removed in such a manner that the pH of the mixed solution becomes in the range of 4 to 7.

其次,說明使用本發明之改質氧化矽微粒子的塗布液。依據本發明之塗布液,係於溶劑中添加前述改質氧化矽微粒子與黏合劑成分的溶液。於該溶液係添加作為觸媒之微量的酸(無機酸或有機酸)。改質氧化矽微粒子係4官能有機矽化合物的寡聚物鍵結在氧化矽微粒子的表面之形態,寡聚物的平均分子量為1000至10000。形成 寡聚物之4官能有機矽化合物可例示四甲氧基矽烷、四乙氧基矽烷、四異丙氧基矽烷、四丁氧基矽烷、四氯矽烷等。 Next, a coating liquid using the modified cerium oxide microparticles of the present invention will be described. According to the coating liquid of the present invention, a solution of the modified cerium oxide microparticles and a binder component is added to a solvent. To this solution, a trace amount of an acid (inorganic acid or organic acid) as a catalyst is added. The oligomer of the modified cerium oxide microparticle-based tetrafunctional organic cerium compound is bonded to the surface of the cerium oxide microparticles, and the average molecular weight of the oligomer is from 1,000 to 10,000. form The tetrafunctional organofluorene compound of the oligomer may, for example, be tetramethoxydecane, tetraethoxydecane, tetraisopropoxydecane, tetrabutoxydecane or tetrachlorodecane.

另一方面,黏合劑成分中係亦使用4官能有機矽化合物。此係為了使由塗布液所形成之薄膜的鉛筆硬度及耐擦傷性提高,故於黏合劑成分中適宜有4官能有機矽化合物。而為了容易於該黏合劑成分中分散並鍵結,寡聚物係適宜為以4官能有機矽化合形成者。在此,寡聚化之4官能有機矽化合物與黏合劑成分中所使用之4官能有機矽化合物,可為不同的化合物或相同的化合物。此外,黏合劑成分中不僅可添加4官能有機矽化合物,亦可添加3官能有機矽化合物。藉由添加具有氟基之3官能有機矽化合物(例如三氟丙基三甲氧基矽烷等),提升薄膜的耐擦傷性、防汚性、撥水性。如此,可添加3官能有機矽化合物,使薄膜持有附加機能。3官能有機矽化合物所持有之官能基可對應所欲附加之機能而適宜選擇。惟,因3官能有機矽化合物的存在會導致鍵結性減低,大量添加3官能有機矽化合物並不適當。4官能有機矽化合物與3官能有機矽化合物的比率,以莫耳比計較佳為99.5:0.5至90:10。3官能有機矽化合物比99.5:0.5少時,變得難以得到目標附加機能,比90:10多時,所得塗膜的硬度變得不充分。 On the other hand, a tetrafunctional organic ruthenium compound is also used in the binder component. In order to improve the pencil hardness and the scratch resistance of the film formed from the coating liquid, a tetrafunctional organic ruthenium compound is suitably used for the binder component. In order to facilitate dispersion and bonding in the binder component, the oligomer is suitably formed by the formation of a tetrafunctional organic oxime. Here, the tetrafunctional organofluorene compound used in the oligomeric tetrafunctional organic hydrazine compound and the binder component may be a different compound or the same compound. Further, not only a tetrafunctional organic ruthenium compound but also a trifunctional organic ruthenium compound may be added to the binder component. By adding a trifunctional organic sulfonium compound having a fluorine group (for example, trifluoropropyltrimethoxydecane, etc.), the scratch resistance, antifouling property, and water repellency of the film are improved. Thus, a trifunctional organic ruthenium compound can be added to impart additional function to the film. The functional group held by the trifunctional organic hydrazine compound can be appropriately selected depending on the function to be attached. However, the presence of a trifunctional organic ruthenium compound leads to a decrease in bonding property, and it is not appropriate to add a large amount of a trifunctional organic ruthenium compound. The ratio of the tetrafunctional organic cerium compound to the trifunctional organic cerium compound is preferably 99.5:0.5 to 90:10 in terms of molar ratio. When the trifunctional organic cerium compound is less than 99.5:0.5, it becomes difficult to obtain the target additional function, When the temperature is 90:10, the hardness of the obtained coating film becomes insufficient.

3官能有機矽化合物可例示乙烯基三甲氧基矽烷、3-環氧丙基氧基丙基三甲氧基矽烷、p-苯乙烯基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3- 胺基丙基三甲氧基矽烷、3-異氰酸酯丙基三乙氧基矽烷、3-巰基丙基三乙氧基矽烷、苯基三乙氧基矽烷等。 The trifunctional organic hydrazine compound can be exemplified by vinyl trimethoxy decane, 3-epoxypropyloxypropyl trimethoxy decane, p-styryl trimethoxy decane, 3-methyl propylene methoxy propyl trimethyl Oxydecane, 3- Aminopropyltrimethoxydecane, 3-isocyanatepropyltriethoxydecane, 3-mercaptopropyltriethoxydecane, phenyltriethoxydecane, and the like.

於基材表面塗布含有上述改質氧化矽微粒子的塗布液,使其硬化,藉此可形成耐候性高的機能性薄膜。塗布法可例示浸塗法、噴塗法、旋塗法、輥塗法、棒塗法、狹縫塗布印刷法、凹版印刷法、微凹版印刷法等。依據塗布部位及欲得之膜厚等選擇塗布法。順應塗布法適宜調整溶劑的種類或塗布液的固形分濃度。塗布後,進行乾燥、燒製處理,藉以可於基材上形成機能性薄膜。該機能性薄膜中含有表面鍵結有寡聚物之氧化矽微粒子,亦即改質氧化矽微粒子。如前所述,寡聚物係適宜為將4官能有機矽化合物的單體線狀鍵結之形態,且其平均分子量為1000至10000之範圍。機能性薄膜中,較佳為含有改質氧化矽微粒子20至95質量%。 A coating liquid containing the modified cerium oxide microparticles is applied to the surface of the substrate to be cured, whereby a functional film having high weather resistance can be formed. The coating method may, for example, be a dip coating method, a spray coating method, a spin coating method, a roll coating method, a bar coating method, a slit coating printing method, a gravure printing method, a micro gravure printing method, or the like. The coating method is selected depending on the application site and the desired film thickness. The type of the solvent or the solid content concentration of the coating liquid is appropriately adjusted in accordance with the coating method. After coating, drying and firing treatment are performed to form a functional film on the substrate. The functional film contains cerium oxide microparticles having an oligomer bonded to the surface, that is, modified cerium oxide microparticles. As described above, the oligomer is preferably a form in which a monomer of a tetrafunctional organic hydrazine compound is linearly bonded, and an average molecular weight thereof is in the range of 1,000 to 10,000. The functional film preferably contains 20 to 95% by mass of the modified cerium oxide microparticles.

本技術可適用之機能性薄膜可舉高加工性膜、低介電率膜、斷熱.遮熱膜、抗反射膜、反射膜、透明導電膜、硬塗膜等。此外,抗反射膜中,可使用氧化矽微粒子中的氧化矽中空微粒子。在此,氧化矽中空微粒子係外殻內部具有空洞的微粒子,空隙率(粒子中空洞所占比例)為10體積%以上80體積%以下。通常,空洞部係充滿氣體。另外,空隙率可由TEM所攝影之影像觀察粒子外徑與空洞部而測量。本發明中,氧化矽中空微粒子的平均粒徑適宜為10至300nm。此外,氧化矽中空微粒子,有時含有氧化矽以外作為雜質的化合物,例如,Al2O3、Na2O等。 本發明中,係以含有氧化矽成分95重量%以上者為氧化矽中空微粒子。 The functional film applicable to the technology can be a high processing film, a low dielectric film, and a heat break. A heat shielding film, an antireflection film, a reflective film, a transparent conductive film, a hard coat film, or the like. Further, in the antireflection film, cerium oxide hollow fine particles in the cerium oxide microparticles can be used. Here, the cerium oxide hollow fine particle sub-shell has fine particles inside the outer shell, and the void ratio (the proportion of the hollow of the particles) is 10% by volume or more and 80% by volume or less. Usually, the cavity is filled with gas. Further, the void ratio can be measured by observing the outer diameter of the particle and the cavity portion from the image photographed by the TEM. In the present invention, the average particle diameter of the cerium oxide hollow fine particles is suitably from 10 to 300 nm. Further, the cerium oxide hollow fine particles may contain a compound other than cerium oxide as an impurity, for example, Al 2 O 3 or Na 2 O. In the present invention, those containing 95% by weight or more of the cerium oxide component are cerium oxide hollow fine particles.

以下,詳細說明有關於使用氧化矽中空微粒子(以下,單純記載為中空微粒子)之抗反射膜。中空微粒子與實心微粒子相比係具有輕量、低折射率低介電率、高斷熱性、加工性佳等特徴,為適宜形成抗反射膜用的微粒子。特別是,使用中空微粒子的表面鍵結有4官能有機矽化合物的寡聚物之改質中空微粒子之抗反射膜係耐候性高。寡聚物較佳係有機矽化合物單體形成線狀鍵結之構成,其平均分子量適宜為1000至10000。如此改質中空微粒子的耐酸性高,含有該改質中空微粒子之膜係變得緻密。此時,中空微粒子的表面係鍵結有中空微粒子的重量之3至90%之重量的寡聚物。使用作為抗反射膜時,膜厚較佳為80至120nm或180至220nm。超脫該等範圍外時無法得到充分的抗反射效果。 Hereinafter, an antireflection film using cerium oxide hollow fine particles (hereinafter simply referred to as hollow fine particles) will be described in detail. The hollow fine particles have characteristics such as light weight, low refractive index, low dielectric constant, high heat-breaking property, and good workability as compared with solid fine particles, and are fine particles suitable for forming an anti-reflection film. In particular, the antireflection film of the modified hollow microparticles in which the oligomer of the tetrafunctional organic sulfonium compound is bonded to the surface of the hollow microparticles has high weather resistance. The oligomer preferably has an organic germanium compound monomer to form a linear bond, and has an average molecular weight of suitably from 1,000 to 10,000. The modified fine particles thus have high acid resistance, and the film system containing the modified hollow fine particles becomes dense. At this time, the surface of the hollow fine particles is bonded with an oligomer of 3 to 90% by weight based on the weight of the hollow fine particles. When used as an antireflection film, the film thickness is preferably from 80 to 120 nm or from 180 to 220 nm. When the detachment is outside the range, sufficient anti-reflection effect cannot be obtained.

其次,說明含有改質中空微粒子之塗布液。該抗反射膜形成用塗布液係於溶劑中添加前述改質中空微粒子與黏合劑成分之溶液。該溶液中係添加微量的酸作為觸媒。改質中空微粒子,係4官能有機矽化合物的寡聚物鍵結於表面之中空微粒子,寡聚物的平均分子量為1000至10000之範圍。黏合劑成分係使用4官能有機矽化合物。 Next, a coating liquid containing modified hollow fine particles will be described. The coating liquid for forming an antireflection film is a solution in which the modified hollow fine particles and the binder component are added to a solvent. A trace amount of acid is added to the solution as a catalyst. The modified hollow microparticles are hollow microparticles bonded to the surface of the oligomer of the tetrafunctional organic germanium compound, and the average molecular weight of the oligomer is in the range of 1,000 to 10,000. The binder component is a tetrafunctional organic ruthenium compound.

此時,塗布液的固形分濃度較佳為0.5至10%。0.5%以下時不僅易引起抗反射膜外觀不良,亦難以使 膜厚均一,生產性低且變得無實用性。10%以上時不僅難以得到具所期望膜厚的被膜,塗膜亦容易產生龜裂。 At this time, the solid content concentration of the coating liquid is preferably from 0.5 to 10%. When it is 0.5% or less, it is not only easy to cause an appearance of the antireflection film, but also difficult to make The film thickness is uniform, the productivity is low, and it becomes non-useful. When it is 10% or more, it is difficult to obtain a film having a desired film thickness, and the coating film is likely to be cracked.

塗布液的固形分係改質中空微粒子與黏合劑成分的總量和。改質中空微粒子與黏合劑成分的固形分比率適宜為95:5至20:80。中空微粒子的比率比95:5大時,所得被膜的硬度變弱,比20:80小時,使用作為抗反射膜時,所得被膜的折射率不充分,無法得到所期望的抗反射性能。 The solid fraction of the coating liquid modifies the total sum of the hollow fine particles and the binder component. The solid content ratio of the modified hollow microparticles to the binder component is suitably from 95:5 to 20:80. When the ratio of the hollow fine particles is larger than 95:5, the hardness of the obtained film is weak, and when 20:80 hours is used, when the antireflection film is used, the refractive index of the obtained film is insufficient, and desired antireflection performance cannot be obtained.

上述抗反射膜係可適用於光電電池。亦即,將上述抗反射膜形成用塗布液塗布於透明基板,進行乾燥處理與燒製處理。將該透明基板配置於光電電池的入光面側。透明基板可使用作為光電電池的保護基材,亦可於透明基板之另一面構成電極及光電變換元件,使用作為構成光電電池之基板。 The above anti-reflection film can be applied to a photovoltaic cell. In other words, the coating liquid for forming an antireflection film is applied onto a transparent substrate, and drying treatment and firing treatment are performed. The transparent substrate is placed on the light incident surface side of the photovoltaic cell. As the transparent substrate, a protective substrate for a photovoltaic cell can be used, and an electrode and a photoelectric conversion element can be formed on the other surface of the transparent substrate, and a substrate constituting the photovoltaic cell can be used.

以下,詳細說明關於抗反射膜之實施例。 Hereinafter, an embodiment of the antireflection film will be described in detail.

(實施例1) (Example 1)

本實施例係依序就改質中空微粒子及其製造方法、塗布液、抗反射膜予以說明。本實施例之改質中空微粒子為於中空微粒子的表面鍵結四乙氧基矽烷的寡聚物之構成,寡聚物的平均分子量為1500。 In the present embodiment, the modified hollow fine particles, the method for producing the same, the coating liquid, and the antireflection film will be described in order. The modified hollow fine particles of this example are composed of an oligomer of tetraethoxysilane which is bonded to the surface of the hollow fine particles, and the average molecular weight of the oligomer is 1,500.

以下,詳細說明改質中空微粒子的製造方法。 Hereinafter, a method of producing the modified hollow fine particles will be described in detail.

[中空微粒子的製作步驟] [Manufacturing procedure of hollow microparticles]

首先,製作中空微粒子。於氧化矽溶膠(日揮觸媒化成 股份有限公司製:CATALOID SI-550,平均粒徑5nm,SiO2濃度20質量%)10g中,添加純水390g後加溫至80℃。將該溶液保持在80℃,將作為SiO2之濃度1.5質量%之矽酸鈉水溶液8500g、作為Al2O3之濃度0.5質量%之鋁酸鈉水溶液8500g歷時24小時添加於溶液中。藉此製作複合氧化物微粒子(1)的水分散液。此時,複合氧化物微粒子(1)的平均粒徑以雷射散射法測定之結果為40nm。 First, hollow fine particles are produced. To 10 g of cerium oxide sol (manufactured by Nippon Chemical Co., Ltd.: CATALOID SI-550, average particle diameter: 5 nm, SiO 2 concentration: 20% by mass), 390 g of pure water was added, and the mixture was heated to 80 °C. The solution was kept at 80 ° C, and 8500 g of a sodium citrate aqueous solution having a concentration of SiO 2 of 1.5% by mass and 8500 g of an aqueous sodium aluminate solution having a concentration of 0.5% by mass of Al 2 O 3 were added to the solution for 24 hours. Thereby, an aqueous dispersion of the composite oxide fine particles (1) was produced. At this time, the average particle diameter of the composite oxide fine particles (1) was measured by a laser scattering method to be 40 nm.

次之,於該複合氧化物微粒子(1)的水分散液中,歷時50小時添加作為SiO2之濃度1.5質量%之矽酸鈉水溶液27000g、作為Al2O3之濃度0.5質量%之鋁酸鈉水溶液9000g,製作複合氧化物微粒子(2)的水分散液。此時,複合氧化物微粒子(2)的雷射散射平均粒徑為60nm。pH為12.5,固形分濃度為1.2%。於該複合氧化物微粒子(2)的水分散液中一邊添加純水一邊使用超過濾膜,洗淨至pH為10.0為止,然後,濃縮至固形分濃度為13質量%為止。結果得到複合氧化物微粒子(3)的水分散液。此時,複合氧化物微粒子(3)的雷射散射平均粒徑為59nm。 In the aqueous dispersion of the composite oxide fine particles (1), 27,000 g of a sodium citrate aqueous solution having a concentration of SiO 2 of 1.5% by mass and an alumina acid having a concentration of 0.5% by mass of Al 2 O 3 were added over 50 hours. 9000 g of a sodium aqueous solution was used to prepare an aqueous dispersion of the composite oxide fine particles (2). At this time, the composite scattering fine particle diameter of the composite oxide fine particles (2) was 60 nm. The pH was 12.5 and the solids concentration was 1.2%. An ultrafiltration membrane was added to the aqueous dispersion of the composite oxide fine particles (2) while using an ultrafiltration membrane, and the mixture was washed until the pH was 10.0, and then concentrated until the solid content concentration was 13% by mass. As a result, an aqueous dispersion of the composite oxide fine particles (3) was obtained. At this time, the laser oxide average particle diameter of the composite oxide fine particles (3) was 59 nm.

從該複合氧化物微粒子(3)的水分散液製作中空微粒子。於固形分濃度13質量%之複合氧化物微粒子(3)的水分散液500g中添加純水1125g。進一步滴加濃鹽酸(濃度35.5質量%),使pH為1.0。次之,一邊添加pH2的鹽酸水溶液10L與純水5L,一邊使用超過濾膜分離.洗淨溶解之鋁鹽。藉此得到中空微粒子(1)的水分散液。該水分散液的固形分濃度為20質量%,pH為3。 Hollow fine particles are produced from the aqueous dispersion of the composite oxide fine particles (3). 1125 g of pure water was added to 500 g of the aqueous dispersion of the composite oxide fine particles (3) having a solid content concentration of 13% by mass. Further, concentrated hydrochloric acid (concentration: 35.5 mass%) was added dropwise to adjust the pH to 1.0. Next, while adding 10L of hydrochloric acid aqueous solution of pH2 and 5L of pure water, it is separated by ultrafiltration membrane. Wash and dissolve the aluminum salt. Thereby, an aqueous dispersion of the hollow fine particles (1) was obtained. The aqueous dispersion had a solid content concentration of 20% by mass and a pH of 3.

進一步於該中空微粒子(1)的水分散液中以使pH成為12.0的方式添加氨水。次之,將該水分散液於200℃攪拌45小時,降低溫度至25℃為止。然後,添加陽離子交換樹脂(三菱化學股份有限公司製:DIAION SK1BH)400g攪拌3小時。然後,分離陽離子交換樹脂,調整為25℃。然後添加陰離子交換樹脂(三菱化學股份有限公司製:DIAION SA20A)200g,於25℃攪拌3小時。然後,分離陰離子交換樹脂,即得到固形分濃度20質量%之中空微粒子(2)的水分散液。 Further, aqueous ammonia was added to the aqueous dispersion of the hollow fine particles (1) so that the pH became 12.0. Next, the aqueous dispersion was stirred at 200 ° C for 45 hours, and the temperature was lowered to 25 ° C. Then, 400 g of a cation exchange resin (manufactured by Mitsubishi Chemical Corporation: DIAION SK1BH) was added and stirred for 3 hours. Then, the cation exchange resin was separated and adjusted to 25 °C. Then, 200 g of an anion exchange resin (manufactured by Mitsubishi Chemical Corporation: DIAION SA20A) was added, and the mixture was stirred at 25 ° C for 3 hours. Then, the anion exchange resin was separated to obtain an aqueous dispersion of hollow fine particles (2) having a solid concentration of 20% by mass.

次之,使用超過濾膜,將該水分散液的溶劑置換為乙醇,得到固形分濃度20質量%之中空微粒子(2)的醇分散液。 Next, an ultrafiltration membrane was used, and the solvent of the aqueous dispersion was replaced with ethanol to obtain an alcohol dispersion of hollow fine particles (2) having a solid content concentration of 20% by mass.

[表面改質用寡聚物溶液的製作步驟] [Production Step of Surface Modification Oligomer Solution]

其次,製作修飾中空微粒子(2)表面之寡聚物溶液。將在乙醇1478g中添加純水240g與61質量%之硝酸32g之溶液調整為25℃。其次,於該溶液中緩慢添加作為4官能有機矽化合物之四乙氧基矽烷(多摩化學工業股份有限公司製:ETHYLSILICATE-40)250g,於50℃攪拌60分鐘。藉此,四乙氧基矽烷的單體彼此藉由水解縮合,形成寡聚物。此時,單體係線狀鍵結。此時溶液的pH為1.9。 Next, an oligomer solution for modifying the surface of the hollow fine particles (2) was produced. A solution of 240 g of pure water and 32 g of 61% by mass of nitric acid was added to 1478 g of ethanol to adjust to 25 °C. Next, 250 g of tetraethoxy decane (ETHYLSILICATE-40, manufactured by Tama Chemical Co., Ltd.) as a tetrafunctional organic ruthenium compound was slowly added to the solution, and the mixture was stirred at 50 ° C for 60 minutes. Thereby, the monomers of tetraethoxydecane are condensed by hydrolysis to form an oligomer. At this time, the single system is linearly bonded. The pH of the solution at this time was 1.9.

使該溶液成為25℃後,添加50g之兩性離子交換樹脂(羅門哈斯公司製:DUOLITE UP-7000)。攪拌該溶液1小時之後,分離離子交換樹脂。藉由進行離子交換,除去溶液的酸。如此得到表面改質用寡聚物溶液。此時, 寡聚物溶液的pH為5.5,以GPC測定之寡聚物的平均分子量為1500左右。此外,於1000℃蒸發該寡聚物溶液的溶劑時,固形分殘渣的濃度為5質量%。 After the solution was brought to 25 ° C, 50 g of an amphoteric ion exchange resin (manufactured by Rohm and Haas Company: DUOLITE UP-7000) was added. After the solution was stirred for 1 hour, the ion exchange resin was separated. The acid of the solution is removed by ion exchange. Thus, an oligomer solution for surface modification was obtained. at this time, The pH of the oligomer solution was 5.5, and the average molecular weight of the oligomer measured by GPC was about 1,500. Further, when the solvent of the oligomer solution was evaporated at 1000 ° C, the concentration of the solid residue was 5% by mass.

[改質中空微粒子的製作步驟] [Steps for making modified hollow microparticles]

準備500g前述固形分濃度5質量%之表面改質用的寡聚物溶液,於其中添加20質量%之中空微粒子(2)的醇分散液500g,於50℃攪拌19小時。此時,須自寡聚物溶液除去酸,調整pH為5至7之範圍。因此,於該步驟之前,期望進行酸的除去處理,例如進行離子交換。如此,於中空微粒子的表面鍵結四乙氧基矽烷的寡聚物,得到改質中空微粒子的醇分散液。此時,使寡聚物的固形分(Wor)與中空微粒子的固形分(Wpa)的重量比率(Wor/Wpa)為5至100%之方式,混合表面改質用的寡聚物溶液與中空微粒子(2)的醇分散液。即便是以如此比率混合,亦不代表要於本步驟將全部的寡聚物與中空微粒子鍵結,而是於中空微粒子鍵結相當於中空微粒子的重量之3至90%之重量的寡聚物。在此,使相對於中空微粒子的固形分的寡聚物的固形分重量為25%(500g*5%)/(500g*20%)=1/4=25%)之方式,混合中空微粒子的醇分散液與寡聚物溶液。 500 g of the oligomer solution for surface modification having a solid content of 5 mass% was prepared, and 500 g of an alcohol dispersion liquid of 20% by mass of the hollow fine particles (2) was added thereto, and the mixture was stirred at 50 ° C for 19 hours. At this time, the acid must be removed from the oligomer solution to adjust the pH to a range of 5 to 7. Therefore, prior to this step, it is desirable to carry out an acid removal treatment, for example, ion exchange. Thus, an oligomer of tetraethoxysilane is bonded to the surface of the hollow fine particles to obtain an alcohol dispersion of the modified hollow fine particles. At this time, the weight ratio (Wor/Wpa) of the solid content (Wor) of the oligomer to the solid content (Wpa) of the hollow fine particles is 5 to 100%, and the oligomer solution for hollow surface modification and the hollow are mixed. An alcohol dispersion of the microparticles (2). Even if it is mixed in such a ratio, it does not mean that all the oligomers are bonded to the hollow fine particles in this step, but the hollow fine particles are bonded to the oligomer corresponding to the weight of the hollow fine particles by 3 to 90% by weight. . Here, the hollow microparticles are mixed in such a manner that the solid content of the oligomer relative to the solid content of the hollow microparticles is 25% (500 g*5%) / (500 g * 20%) = 1/4 = 25%) Alcohol dispersion and oligomer solution.

藉由如此之製造方法,得到於中空微粒子的表面鍵結有4官能有機矽化合物的寡聚物之改質中空微粒子。 By such a production method, modified hollow fine particles of an oligomer having a tetrafunctional organic sulfonium compound bonded to the surface of the hollow fine particles are obtained.

改質中空微粒子的耐酸性係可由下列方式評價。以乙醇稀釋改質中空微粒子的醇分散液,調整改質 中空微粒子的濃度為0.3質量%。於該0.3質量%之醇分散液100g添加6.1質量%之硝酸0.16g,於25℃攪拌1分鐘,測定結束後與3小時後的平均粒徑。1分鐘後係65nm,3小時後係66nm。改質中空微粒子的耐酸性高時,平均粒徑不產生經時的變化。鍵結於中空微粒子的寡聚物的平均分子量為1000至10000時,改質中空微粒子的耐酸性高。含有如此改質中空微粒子之薄膜係緻密且耐候性高。 The acid resistance of the modified hollow microparticles can be evaluated in the following manner. Diluting the alcohol dispersion of the modified hollow microparticles with ethanol, adjusting the modification The concentration of the hollow fine particles was 0.3% by mass. 0.16 g of 6.1% by mass of nitric acid was added to 100 g of the 0.3% by mass alcohol dispersion, and the mixture was stirred at 25° C. for 1 minute, and the average particle diameter after the measurement and after 3 hours. After 1 minute, it was 65 nm, and after 3 hours, it was 66 nm. When the acid resistance of the modified hollow fine particles is high, the average particle diameter does not change with time. When the average molecular weight of the oligomer bonded to the hollow fine particles is from 1,000 to 10,000, the modified hollow fine particles have high acid resistance. The film containing such modified hollow microparticles is dense and has high weather resistance.

其次,製作含有該改質中空微粒子之抗反射膜形成用塗布液。 Next, a coating liquid for forming an antireflection film containing the modified hollow fine particles was produced.

[塗布液的製作步驟] [Production Step of Coating Liquid]

塗布液係將該改質中空微粒子的醇分散液添加至黏合劑溶液而製作。首先,調製黏合劑溶液的溶劑。於改質醇104.4g中添加純水59.9g與61%硝酸0.99g於25℃攪拌15分鐘。次之,於該溶劑,歷時1分鐘添加作為黏合劑成分之四乙氧基矽烷(多摩化學工業股份有限公司製:ES-28)34.8g。將其於30℃攪拌3小時。然後冷卻至20℃。藉此得到黏合劑溶液。在此,於改質醇使用solmix AP-11(日本醇販賣股份有限公司製)。次之,於該黏合劑溶液200.0g添加20質量%之改質中空微粒子的醇分散液74.7g。此時,亦添加改質醇549.4g作為塗布液的溶劑。將如此所得溶液於25℃攪拌3小時得到抗反射膜用塗布液。 The coating liquid is produced by adding the alcohol dispersion of the modified hollow fine particles to a binder solution. First, the solvent of the binder solution is prepared. To 104.4 g of the reformed alcohol, 59.9 g of pure water and 0.99 g of 61% nitric acid were added and stirred at 25 ° C for 15 minutes. Next, 34.8 g of tetraethoxy decane (manufactured by Tama Chemical Co., Ltd.: ES-28) as a binder component was added to the solvent over 1 minute. It was stirred at 30 ° C for 3 hours. It was then cooled to 20 °C. Thereby a binder solution is obtained. Here, solmix AP-11 (manufactured by Nippon Alcohol Co., Ltd.) was used for the modified alcohol. Next, 74.7 g of an alcohol dispersion of 20% by mass of the modified hollow fine particles was added to 200.0 g of the binder solution. At this time, 549.4 g of a modified alcohol was also added as a solvent of the coating liquid. The solution thus obtained was stirred at 25 ° C for 3 hours to obtain a coating liquid for an antireflection film.

[抗反射膜的製作步驟] [Steps for making anti-reflection film]

其次,自該塗布液製作抗反射膜。該塗布液係以棒塗法(# 4)塗布於玻璃基板(濱新股份有限公司製之FL玻璃 (厚度3mm,折射率1.51,霧度0.1%,全光線透過率92.0%)。於80℃乾燥2分鐘後,於500℃加熱30分鐘。塗布液係硬化成為低折射率層,作用為抗反射膜。如此,於玻璃基板上製作抗反射膜。此時,抗反射膜的平均厚度為100nm。 Next, an antireflection film was produced from the coating liquid. The coating liquid was applied to a glass substrate by a bar coating method (#4) (FL glass manufactured by Binxin Co., Ltd.) (thickness 3 mm, refractive index 1.51, haze 0.1%, total light transmittance 92.0%). After drying at 80 ° C for 2 minutes, it was heated at 500 ° C for 30 minutes. The coating liquid is hardened into a low refractive index layer and functions as an antireflection film. Thus, an antireflection film was formed on the glass substrate. At this time, the average thickness of the antireflection film was 100 nm.

[抗反射膜的評價] [Evaluation of anti-reflection film]

評價如此製作之抗反射膜的性能。測定折射率、反射率、霧度、透過率、耐擦傷性、接觸角作為初期特性。折射率係使用反射分光膜厚計(大塚電子股份有限公司製:FE-3000)測定,透過率與霧度係使用霧度計(SUGA試驗機股份有限公司製)測定,反射率係使用分光光度計(日本分光公司製:Ubest-55)測定。測定結果為折射率1.33、反射率0.6%、霧度0.1%、透過率95.4%。進一步進行可靠性試驗(熱循環測試、高溫高濕測試),分別測定試驗後的反射率、霧度、透過率、耐擦傷性。熱循環測試係使抗反射膜處於靜置的狀態,在-20℃的環境下3小時,接續在80℃的環境下3小時作為1循環,重覆120循環。高溫高濕測試係使抗反射膜處於靜置的狀態,於85℃濕度85%之環境下曝露1000小時。實施以上的可靠性試驗之後,測定抗反射膜的耐擦傷性、全光線透過率、霧度、反射率。耐擦傷性的評價係以下列方式進行。以負重2kg/cm2滑動10次,目視觀察膜的表面,由以下的基準進行評價。 The performance of the antireflection film thus produced was evaluated. The refractive index, reflectance, haze, transmittance, scratch resistance, and contact angle were measured as initial characteristics. The refractive index was measured using a reflection spectroscopic film thickness meter (manufactured by Otsuka Electronics Co., Ltd.: FE-3000), and the transmittance and haze were measured using a haze meter (manufactured by SUGA Testing Co., Ltd.), and the reflectance was measured by spectrophotometry. The meter (manufactured by JASCO Corporation: Ubest-55) was measured. The measurement results were a refractive index of 1.33, a reflectance of 0.6%, a haze of 0.1%, and a transmittance of 95.4%. The reliability test (thermal cycle test, high temperature and high humidity test) was further carried out, and the reflectance, haze, transmittance, and scratch resistance after the test were measured. The thermal cycle test was carried out in a state where the antireflection film was allowed to stand, and was subjected to an environment of -20 ° C for 3 hours, followed by an environment of 80 ° C for 3 hours as 1 cycle, and repeated for 120 cycles. The high-temperature and high-humidity test was carried out by allowing the anti-reflection film to stand still and exposed to an environment of 85 ° C humidity of 85% for 1000 hours. After performing the above reliability test, the scratch resistance, total light transmittance, haze, and reflectance of the antireflection film were measured. The evaluation of the scratch resistance was carried out in the following manner. The film was slid 10 times under a load of 2 kg/cm 2 , and the surface of the film was visually observed and evaluated by the following criteria.

未確認到筋條狀之傷痕:◎ No rib-like scars were confirmed: ◎

少量確認到筋條狀之傷痕:○ A small amount of rib-like scars were confirmed: ○

大量確認到筋條狀之傷痕:△ A large number of scars were confirmed to the ribs: △

面係被整體地削下:× The facial system is cut off as a whole: ×

[試料的評價] [Evaluation of sample]

改變改質中空微粒子的製作條件製作塗布液,評價由該塗布液所得抗反射膜的性能。表1表示該評價結果。 The coating liquid was prepared by changing the production conditions of the modified hollow fine particles, and the performance of the antireflection film obtained from the coating liquid was evaluated. Table 1 shows the results of this evaluation.

表中的試料1係相當於實施例1。在此,塗料的黏合劑係使用4官能有機矽化合物之四乙氧基矽烷,改質中空微粒子與黏合劑之四乙氧基矽烷的重量比設為60:40。使用該塗料,於玻璃基板製作膜厚100nm的抗反射膜。 The sample 1 in the table corresponds to Example 1. Here, the binder of the coating was a tetraethoxy decane of a tetrafunctional organic hydrazine compound, and the weight ratio of the modified hollow microparticles to the tetraethoxy decane of the binder was set to 60:40. Using this coating material, an antireflection film having a thickness of 100 nm was formed on a glass substrate.

試料2與試料1的寡聚化條件相比,係低pH、高溫、長時間,與試料1相比,寡聚物的平均分子量大。試料3係在寡聚物由四甲氧基矽烷所構成之點與試料2不同。與試料2相比,試料3的寡聚物的平均分子量大。試料4所使用之改質中空微粒子係藉由混合中空微粒子的分散液與寡聚物後將酸除去,使寡聚物與中空微粒子鍵結者。試料5係於相對於中空微粒子的固形分量之寡聚物的固形分量(亦即,固形分量比)增加至70%之點與試料1不同。反之,試料6係將固形分量比調降10%。因寡聚物的量少,故無法得到與其他的試料同程度的性能,但在可靠性試驗後劣化亦少。 Sample 2 was lower in pH, higher temperature, and longer than the oligomerization conditions of Sample 1, and the average molecular weight of the oligomer was larger than that of Sample 1. Sample 3 differs from Sample 2 in that the oligomer is composed of tetramethoxynonane. The average molecular weight of the oligomer of the sample 3 was larger than that of the sample 2. The modified hollow fine particles used in the sample 4 are obtained by mixing a dispersion of hollow fine particles and an oligomer, and then removing the acid to bond the oligomer to the hollow fine particles. The sample 5 was different from the sample 1 in that the solid content (i.e., the solid content ratio) of the oligomer relative to the solid content of the hollow fine particles was increased to 70%. Conversely, sample 6 reduced the solid component ratio by 10%. Since the amount of the oligomer was small, the same performance as the other samples could not be obtained, but the deterioration was small after the reliability test.

比較試料1係使用表面未鍵結有機矽化合物之中空微粒子之塗布膜。在此使用之中空微粒子係在以成為0.3質量%之方式以乙醇稀釋之上述中空微粒子(2)的醇分散液100g中,添加6.1質量%之硝酸0.16g,於25℃攪拌1分鐘。此時中空微粒子的粒徑為89nm,但3小時後的粒徑為5097nm。含有如此中空微粒子之塗布液所形成之膜,初期耐擦傷性低,而且可靠性試驗後的反射率及霧度惡化。 Comparative Sample 1 used a coating film of hollow fine particles whose surface was not bonded with an organic cerium compound. The hollow fine particles used herein were added to 100 g of an alcohol dispersion of the hollow fine particles (2) diluted with ethanol to 0.3% by mass, and 0.16 g of 6.1% by mass of nitric acid was added thereto, followed by stirring at 25 ° C for 1 minute. At this time, the particle diameter of the hollow fine particles was 89 nm, but the particle diameter after 3 hours was 5097 nm. The film formed by the coating liquid containing such hollow fine particles had low initial scratch resistance and deteriorated reflectance and haze after the reliability test.

比較試料2係使用表面鍵結有機矽化合物的單體之中空微粒子之塗布膜。由可靠性試驗得知其性能劣化。在此使用之中空微粒子係以下列方式製作。於上述20質量%之中空微粒子(2)的醇分散液500g添加四乙氧基矽烷34.7g,於50℃熟成19小時,製作中空微粒子(3)的醇分散液。於將其以乙醇稀釋所得之0.3質量%之中空微粒子(3)的醇分散液100g中添加6.1質量%之硝酸0.16g,於25℃攪拌1分鐘。如此得到之中空微粒子的粒徑為75nm,3小時後的粒徑為351nm。於薄膜中使用經時粒徑變大的中空微粒子時,得知該薄膜的可靠性低。 In Comparative Sample 2, a coating film of hollow fine particles in which a monomer of an organic ruthenium compound was bonded to the surface was used. It is known from reliability tests that its performance is degraded. The hollow microparticles used herein are produced in the following manner. 34.7 g of tetraethoxy decane was added to 500 g of the alcohol dispersion liquid of the hollow fine particles (2) of the above-mentioned 20 mass%, and the mixture was aged at 50 ° C for 19 hours to prepare an alcohol dispersion liquid of hollow fine particles (3). To 100 g of the alcohol dispersion liquid of the hollow fine particles (3) of 0.3% by mass obtained by diluting with ethanol, 0.16 g of 6.1% by mass of nitric acid was added, and the mixture was stirred at 25 ° C for 1 minute. The hollow fine particles thus obtained had a particle diameter of 75 nm, and the particle diameter after 3 hours was 351 nm. When hollow fine particles having a large particle size were used for the film, the reliability of the film was found to be low.

比較試料3係中空微粒子中所鍵結之寡聚物的平均分子量增大為12000時的抗反射膜。為使平均分子量增大,與試料1相比,寡聚化的條件係設為高溫度.長時間,pH亦經調整。依據可靠性試驗其劣化少,但自初期的耐擦傷性低。 The antireflection film in which the average molecular weight of the oligomers bonded in the hollow crystal microparticles of the sample 3 was increased to 12,000 was compared. In order to increase the average molecular weight, the oligomerization conditions were set to a high temperature compared with the sample 1. The pH is also adjusted over a long period of time. According to the reliability test, the deterioration was small, but the scratch resistance was low from the initial stage.

其次,評價不改變改質中空微粒子的製作條件,而於塗布液的黏合劑成分中添加3官能有機矽化合物時,自該塗布液所得抗反射膜的性能。具體而言,改變3官能有機矽化合物的添加量以及中空微粒子與黏合劑成分的量比,調製塗布液。使用該塗布液於玻璃基板製作膜厚100nm的抗反射膜。於表2表示該評價結果。 Next, the performance of the antireflection film obtained from the coating liquid was evaluated when the trifunctional organic ruthenium compound was added to the binder component of the coating liquid without changing the production conditions of the modified hollow fine particles. Specifically, the amount of addition of the trifunctional organic sulfonium compound and the amount ratio of the hollow fine particles to the binder component are changed to prepare a coating liquid. An antireflection film having a thickness of 100 nm was formed on the glass substrate using the coating liquid. The evaluation results are shown in Table 2.

試料7至10之中空微粒子係與試料1相同,於表面接合四乙氧基矽烷的寡聚物,藉此改質表面。亦即,改質中空微粒子係以與試料1相同的方式製作。另一方面,比較試料4係於中空微粒子的表面接合四乙氧基矽烷單體之中空微粒子。為製作各試料所使用之塗布液,係含有屬於4官能有機矽化合物之四乙氧基矽烷與屬於3官能有機矽化合物之三氟丙基三甲氧基矽烷作為黏合劑成分,依表中所述之混合比混合。該黏合劑成分與中空微粒子的重量比亦以表中的比例混合。形成試料7之塗布液係持有四乙氧基矽烷與三氟丙基三甲氧基矽烷以99:1混合之黏合劑成分,以60:40之比例含有該黏合劑成分與中空微粒子。試料8係在四乙氧基矽烷與三氟丙基三甲氧基矽烷以95:5混合之點與試料7不同。試料9係在以80:20之比例含有黏合劑成分與中空微粒子之點與試料7不同。試料10係在以30:70之比例含有黏合劑成分與中空微粒子之點與試料7不同。試料9由於黏合劑成分少,故初期耐擦傷性低,但在可靠性試驗後幾乎無變化。比較試料4雖然顯示良好的初期性能,但於可靠性試驗後性能減低。 The hollow microparticles of the samples 7 to 10 were the same as the sample 1, and the oligomer of tetraethoxynonane was bonded to the surface, thereby modifying the surface. That is, the modified hollow fine particle system was produced in the same manner as the sample 1. On the other hand, the comparative sample 4 is a hollow fine particle in which a tetraethoxysilane monomer is bonded to the surface of the hollow fine particle. The coating liquid used for the preparation of each sample contains tetraethoxy decane which is a tetrafunctional organic hydrazine compound and trifluoropropyl trimethoxy decane which belongs to a trifunctional organic hydrazine compound as a binder component, as described in the table. The mixing ratio is mixed. The weight ratio of the binder component to the hollow fine particles was also mixed in the ratios in the table. The coating liquid forming the sample 7 was a binder component in which 99:1 was mixed with tetraethoxysilane and trifluoropropyltrimethoxydecane, and the binder component and the hollow fine particles were contained in a ratio of 60:40. The sample 8 was different from the sample 7 in that the tetraethoxy decane and the trifluoropropyltrimethoxy decane were mixed at 95:5. The sample 9 was different from the sample 7 in that the binder component and the hollow fine particles were contained in a ratio of 80:20. The sample 10 was different from the sample 7 in that the binder component and the hollow fine particles were contained in a ratio of 30:70. In the sample 9, since the amount of the binder was small, the initial scratch resistance was low, but there was almost no change after the reliability test. Comparative sample 4 showed good initial performance, but its performance was reduced after the reliability test.

(實施例2) (Example 2)

在此,說明將實施例1的抗反射膜適用於光電電池之情況。光電電池係以有效地使光傳達到光電變換層的方式,由光電變換層之入光面側設有抗反射膜。 Here, the case where the antireflection film of Example 1 is applied to a photovoltaic cell will be described. The photovoltaic cell is provided with an antireflection film on the light incident side of the photoelectric conversion layer in such a manner as to efficiently transmit light to the photoelectric conversion layer.

[光電電池] [Photocell]

本實施例之光電電池係在表面形成有透明電極之透明 基板與於表面形成對向電極之對向基板之間設有作為光電變換層之電解質的構成。透明電極的表面形成有吸附光增感材之金屬氧化物半導體膜。 The photovoltaic cell of the embodiment has a transparent surface formed with a transparent electrode The substrate is provided with an electrolyte as a photoelectric conversion layer between the opposite substrates on which the counter electrode is formed. A metal oxide semiconductor film that adsorbs a light sensitizing material is formed on the surface of the transparent electrode.

透明基板一側的表面係形成透明電極,另一側的表面設有抗反射膜。抗反射膜係以位於光電電池外側的方式所構成。亦即,須將抗反射膜設於光電電池的最外側之面(最外面)。於光電電池的外側配置基材時,該基材的最外面可設置抗反射膜。或者亦可於基材的兩面設置抗反射膜。 The surface on one side of the transparent substrate forms a transparent electrode, and the surface on the other side is provided with an anti-reflection film. The antireflection film is formed to be located outside the photovoltaic cell. That is, the anti-reflection film is provided on the outermost surface (outermost surface) of the photovoltaic cell. When the substrate is disposed outside the photovoltaic cell, an antireflection film may be disposed on the outermost surface of the substrate. Alternatively, an anti-reflection film may be provided on both sides of the substrate.

較佳為透明基板與透明電極之可見光透過率高者,具體而言為50%以上,特別是期望為90%以上。可見光透過率未達50%時光電變換效率會變低。透明電極與對向電極的電阻值較佳分別為100Ω/cm2以下。電極的電阻值高時光電變換效率會變低。 It is preferable that the transparent substrate and the transparent electrode have a high visible light transmittance, specifically, 50% or more, and particularly preferably 90% or more. When the visible light transmittance is less than 50%, the photoelectric conversion efficiency becomes low. The resistance values of the transparent electrode and the counter electrode are preferably 100 Ω/cm 2 or less, respectively. When the resistance value of the electrode is high, the photoelectric conversion efficiency becomes low.

作為透明基板,係可使用玻璃基板或PET等有機聚合物基板等透明且具有絶緣性之基板。此外,對向基板只要具有可承受使用之強度即可,除了玻璃基板、PET等有機聚合物基板等絶緣性基板外,亦可使用金屬鈦、金屬鋁、金屬銅、金屬鎳等導電性基板。 As the transparent substrate, a transparent and insulating substrate such as a glass substrate or an organic polymer substrate such as PET can be used. In addition, as long as the counter substrate has strength to withstand use, a conductive substrate such as metal titanium, metal aluminum, metal copper, or metal nickel may be used in addition to an insulating substrate such as a glass substrate or an organic polymer substrate such as PET.

透明電極可使用氧化錫,經Sb、F或P摻雜之氧化錫,經Sn與F之至少一者摻雜之氧化銦等電極材料。如此之透明電極,可由熱分解法或CVD法等方法形成。 As the transparent electrode, tin oxide, tin oxide doped with Sb, F or P, and an electrode material such as indium oxide doped with at least one of Sn and F may be used. Such a transparent electrode can be formed by a method such as thermal decomposition or CVD.

此外,形成於對向基板之對向電極係使用 具有還原觸媒能力之材料。如此之電極材料,可直接於對向基板上塗布、鍍覆或蒸鍍而成為對向電極。或者,可將使用於透明電極之電極材料以熱分解法或CVD法形成於對向基板上作為導電層,於該導電層上將具有還原觸媒能力之電極材料藉由鍍覆或蒸鍍設置,作為對向電極。 In addition, the opposite electrode system formed on the opposite substrate is used. A material that has the ability to reduce catalyst. Such an electrode material can be directly applied to a counter substrate, plated, or vapor-deposited to form a counter electrode. Alternatively, the electrode material used for the transparent electrode may be formed on the opposite substrate as a conductive layer by thermal decomposition or CVD, and the electrode material having the reducing catalyst capability may be disposed on the conductive layer by plating or evaporation. As a counter electrode.

金屬氧化物半導體膜可含有選自氧化鈦、氧化鑭、氧化鋯、氧化鈮、氧化鎢、氧化鍶、氧化鋅、氧化錫、氧化銦之至少1種金屬氧化物。該金屬氧化物半導體膜的膜厚較佳為0.1至50μm之範圍。另外,金屬氧化物半導體膜可於對向基板的對向電極上形成。 The metal oxide semiconductor film may contain at least one metal oxide selected from the group consisting of titanium oxide, cerium oxide, zirconium oxide, cerium oxide, tungsten oxide, cerium oxide, zinc oxide, tin oxide, and indium oxide. The film thickness of the metal oxide semiconductor film is preferably in the range of 0.1 to 50 μm. Further, the metal oxide semiconductor film can be formed on the counter electrode of the counter substrate.

在此,金屬氧化物係球狀粒子,其平均粒徑較佳為1至600nm之範圍。另外,球狀粒子的粒徑可由雷射都卜勒式粒徑測定機(日機裝股份有限公司製:Microtrac)測定。球狀粒子的平均粒徑未達1nm時,形成之金屬氧化物半導體膜易產生龜裂,難藉由少次數形成無龜裂的厚膜,再者,金屬氧化物半導體膜之細孔徑、細孔容積減低,光增感材的吸附量亦減低。此外,球狀粒子的平均粒徑超過600nm時,金屬氧化物半導體膜的強度變得不充分。 Here, the metal oxide-based spherical particles preferably have an average particle diameter in the range of 1 to 600 nm. Further, the particle diameter of the spherical particles can be measured by a laser Doppler particle size measuring machine (manufactured by Nikkiso Co., Ltd.: Microtrac). When the average particle diameter of the spherical particles is less than 1 nm, the formed metal oxide semiconductor film is liable to be cracked, and it is difficult to form a thick film having no cracks by a small number of times, and further, the pore diameter and fineness of the metal oxide semiconductor film are small. The pore volume is reduced, and the amount of adsorption of the light-sensitizing material is also reduced. Further, when the average particle diameter of the spherical particles exceeds 600 nm, the strength of the metal oxide semiconductor film is insufficient.

如此之球狀粒子,較佳為結晶性氧化鈦。特別是較佳為含有銳鈦礦型(anatase-type)氧化鈦、板鈦礦型(brookite-type)氧化鈦、金紅石型(rutile-type)氧化鈦之至少1種。結晶性氧化鈦之能隙高且介電率高,與其他的金屬氧化物粒子相比光增感材的吸附量高,且具有安定性、 安全性、容易成膜等優異的特性。 Such spherical particles are preferably crystalline titanium oxide. In particular, at least one selected from the group consisting of anatase-type titanium oxide, brookite-type titanium oxide, and rutile-type titanium oxide is preferable. The crystalline titanium oxide has a high energy gap and a high dielectric constant, and has higher adsorption capacity than other metal oxide particles, and has stability and stability. Excellent properties such as safety and easy film formation.

Claims (15)

一種改質氧化矽微粒子,其係具有氧化矽微粒子、以及與前述氧化矽微粒子的表面鍵結之4官能有機矽化合物的寡聚物,前述寡聚物係前述4官能有機矽化合物的單體鍵結成線狀之形態,前述寡聚物的平均分子量為1000至10000之範圍。 An improved cerium oxide microparticle comprising an oxidized cerium microparticle and an oligomer of a tetrafunctional organic cerium compound bonded to a surface of the cerium oxide microparticle, wherein the oligomer is a monomeric bond of the tetrafunctional organogermanium compound In the form of a linear form, the average molecular weight of the aforementioned oligomer is in the range of 1,000 to 10,000. 如申請專利範圍第1項所述之改質氧化矽微粒子,其中,前述氧化矽微粒子係氧化矽中空微粒子。 The modified cerium oxide microparticles according to claim 1, wherein the cerium oxide microparticles are cerium oxide hollow microparticles. 如申請專利範圍第2項所述之改質氧化矽微粒子,其中,前述寡聚物鍵結至前述氧化矽中空微粒子表面之重量,係相當於前述氧化矽中空微粒子重量的3至90%。 The modified cerium oxide microparticles according to claim 2, wherein the weight of the oligomer bonded to the surface of the cerium oxide hollow microparticles is 3 to 90% by weight of the cerium oxide hollow microparticles. 如申請專利範圍第1至3項中任一項所述之改質氧化矽微粒子,其中,前述有機矽化合物係以SiX4表示者,惟X係碳數1至4的烷氧基、羥基、鹵素、氫。 The modified cerium oxide microparticles according to any one of claims 1 to 3, wherein the organogermanium compound is represented by SiX 4 , and the X-based alkoxy group having 1 to 4 carbon atoms, a hydroxyl group, Halogen, hydrogen. 如申請專利範圍第4項所述之改質氧化矽微粒子,其中,前述有機矽化合物係4官能水解性有機矽烷。 The modified cerium oxide microparticles according to claim 4, wherein the organogermanium compound is a tetrafunctional hydrolyzable organodecane. 一種改質氧化矽微粒子的製造方法,其含有,製作含有氧化矽微粒子之氧化矽分散液的步驟;在酸的環境下使4官能有機矽化合物寡聚化之寡聚物溶液的製作步驟;以及自前述寡聚物溶液除去酸,使該寡聚物溶液的pH 為5至7之範圍,添加前述氧化矽分散液並攪拌,藉此於前述氧化矽微粒子的表面鍵結前述4官能有機矽化合物的寡聚物之修飾步驟,其中前述寡聚物的平均分子量為1000至10000之範圍。 A method for producing modified cerium oxide microparticles, comprising the steps of: preparing a cerium oxide dispersion containing cerium oxide microparticles; and preparing a oligomer solution for oligomerizing a tetrafunctional organic cerium compound in an acid environment; Removing the acid from the aforementioned oligomer solution to adjust the pH of the oligomer solution a modification step of adding the foregoing cerium oxide dispersion and stirring to bond the oligomer of the above-mentioned tetrafunctional organic cerium compound to the surface of the cerium oxide microparticles in the range of 5 to 7, wherein the average molecular weight of the oligomer is A range of 1000 to 10,000. 如申請專利範圍第6項所述之改質氧化矽微粒子的製造方法,其中,前述修飾步驟係自添加有前述氧化矽分散液及前述寡聚物溶液之溶液中除去酸而進行攪拌之步驟。 The method for producing modified cerium oxide microparticles according to claim 6, wherein the modifying step is a step of agitating the acid from the solution in which the cerium oxide dispersion and the oligomer solution are added. 如申請專利範圍第7項所述之改質氧化矽微粒子的製造方法,其中,於前述修飾步驟,藉由將酸除去使該溶液的pH為4至7之範圍。 The method for producing modified cerium oxide microparticles according to claim 7, wherein in the modifying step, the pH of the solution is in the range of 4 to 7 by removing the acid. 如申請專利範圍第6至8項中任一項所述之改質氧化矽微粒子的製造方法,其中,前述氧化矽微粒子係氧化矽中空微粒子。 The method for producing modified cerium oxide microparticles according to any one of claims 6 to 8, wherein the cerium oxide microparticles are cerium oxide hollow fine particles. 一種薄膜形成用塗布液,其係含有將4官能第一有機矽化合物的寡聚物鍵結在氧化矽微粒子的表面而成之改質氧化矽微粒子及黏合劑成分之塗布液,前述寡聚物係前述第一有機矽化合物的單體鍵結成線狀之形態,前述寡聚物的平均分子量為1000至10000之範圍,前述黏合劑成分含有4官能第二有機矽化合物。 A coating liquid for forming a thin film comprising a coating liquid of modified cerium oxide fine particles and a binder component obtained by bonding an oligomer of a tetrafunctional first organic cerium compound to a surface of cerium oxide fine particles, the oligomer The monomer of the first organic ruthenium compound is bonded in a linear form, the average molecular weight of the oligomer is in the range of 1,000 to 10,000, and the binder component contains a tetrafunctional second organic ruthenium compound. 如申請專利範圍第10項所述之薄膜形成用塗布液,其中,前述氧化矽微粒子係氧化矽中空微粒子。 The coating liquid for film formation according to claim 10, wherein the cerium oxide microparticles are cerium oxide hollow fine particles. 如申請專利範圍第10或11項所述之薄膜形成用塗布液,其中,前述黏合劑成分亦含有3官能有機矽化合物。 The coating liquid for film formation according to claim 10, wherein the binder component further contains a trifunctional organic ruthenium compound. 一種附有薄膜之基材,係於表面具備如申請專利範圍第10至12項中任一項所述之塗布液所形成之薄膜。 A film-attached substrate is provided with a film formed on the surface of the coating liquid according to any one of claims 10 to 12. 如申請專利範圍第13項所述之附有薄膜之基材,其中,前述薄膜之厚度為80至120nm、或180至220nm中的任一範圍。 The film-attached substrate according to claim 13, wherein the film has a thickness of any one of 80 to 120 nm or 180 to 220 nm. 一種光電電池,係具備具有如申請專利範圍第10至12項中任一項所述之塗布液所形成之薄膜之透明基材,同時前述薄膜係作用為抗反射膜。 A photovoltaic cell comprising a transparent substrate having a film formed by the coating liquid according to any one of claims 10 to 12, wherein the film functions as an antireflection film.
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