TWI632635B - 物體搬送裝置及方法、曝光裝置及方法、平面顯示器之製造方法、及元件製造方法 - Google Patents

物體搬送裝置及方法、曝光裝置及方法、平面顯示器之製造方法、及元件製造方法 Download PDF

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Publication number
TWI632635B
TWI632635B TW105137060A TW105137060A TWI632635B TW I632635 B TWI632635 B TW I632635B TW 105137060 A TW105137060 A TW 105137060A TW 105137060 A TW105137060 A TW 105137060A TW I632635 B TWI632635 B TW I632635B
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TW
Taiwan
Prior art keywords
substrate
carrying
tray
holding portion
exposure
Prior art date
Application number
TW105137060A
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English (en)
Chinese (zh)
Other versions
TW201711127A (zh
Inventor
青木保夫
柳川卓也
Original Assignee
尼康股份有限公司
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Application filed by 尼康股份有限公司 filed Critical 尼康股份有限公司
Publication of TW201711127A publication Critical patent/TW201711127A/zh
Application granted granted Critical
Publication of TWI632635B publication Critical patent/TWI632635B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67736—Loading to or unloading from a conveyor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/061—Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063—Transporting devices for sheet glass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063—Transporting devices for sheet glass
    • B65G49/064—Transporting devices for sheet glass in a horizontal position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/04—Arrangements of vacuum systems or suction cups

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW105137060A 2011-05-13 2012-05-11 物體搬送裝置及方法、曝光裝置及方法、平面顯示器之製造方法、及元件製造方法 TWI632635B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011107789A JP5741834B2 (ja) 2011-05-13 2011-05-13 物体の搬出方法、物体の交換方法、物体保持装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
JPJP2011-107789 2011-05-13

Publications (2)

Publication Number Publication Date
TW201711127A TW201711127A (zh) 2017-03-16
TWI632635B true TWI632635B (zh) 2018-08-11

Family

ID=47176582

Family Applications (4)

Application Number Title Priority Date Filing Date
TW101116832A TWI564986B (zh) 2011-05-13 2012-05-11 物體之搬出方法、物體之更換方法、物體保持裝置、曝光裝置、平面顯示器之製造方法、及元件製造方法
TW105137060A TWI632635B (zh) 2011-05-13 2012-05-11 物體搬送裝置及方法、曝光裝置及方法、平面顯示器之製造方法、及元件製造方法
TW109111374A TW202030827A (zh) 2011-05-13 2012-05-11 物體搬送裝置、曝光裝置、平面顯示器之製造方法、及元件製造方法
TW107122816A TWI693662B (zh) 2011-05-13 2012-05-11 物體搬送裝置、曝光裝置、平面顯示器之製造方法、及元件製造方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW101116832A TWI564986B (zh) 2011-05-13 2012-05-11 物體之搬出方法、物體之更換方法、物體保持裝置、曝光裝置、平面顯示器之製造方法、及元件製造方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
TW109111374A TW202030827A (zh) 2011-05-13 2012-05-11 物體搬送裝置、曝光裝置、平面顯示器之製造方法、及元件製造方法
TW107122816A TWI693662B (zh) 2011-05-13 2012-05-11 物體搬送裝置、曝光裝置、平面顯示器之製造方法、及元件製造方法

Country Status (5)

Country Link
JP (1) JP5741834B2 (ko)
KR (2) KR102238208B1 (ko)
CN (2) CN106873313B (ko)
TW (4) TWI564986B (ko)
WO (1) WO2012157230A1 (ko)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5741834B2 (ja) * 2011-05-13 2015-07-01 株式会社ニコン 物体の搬出方法、物体の交換方法、物体保持装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
CN105775742B (zh) * 2016-03-28 2018-04-17 东莞市鼎胜网印设备有限公司 一种自动送取料机及其自动送取料方法
CN105824200B (zh) 2016-05-31 2017-08-29 京东方科技集团股份有限公司 一种基板支撑结构及曝光机
JP6723889B2 (ja) * 2016-09-28 2020-07-15 株式会社荏原製作所 めっき装置
WO2019064576A1 (ja) * 2017-09-29 2019-04-04 株式会社ニコン 基板搬送装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、基板搬送方法、及び露光方法
JP7205966B2 (ja) * 2018-06-29 2023-01-17 川崎重工業株式会社 基板搬送装置及びその運転方法
CN109384062B (zh) * 2018-09-19 2020-02-18 武汉华星光电技术有限公司 一种曝光机及其传送基板的方法
US10901328B2 (en) * 2018-09-28 2021-01-26 Applied Materials, Inc. Method for fast loading substrates in a flat panel tool
JP7285648B2 (ja) * 2019-01-31 2023-06-02 株式会社Ｓｃｒｅｅｎホールディングス 搬送装置、露光装置および搬送方法
CN118062576B (zh) * 2024-04-25 2024-06-21 肇庆南玻节能玻璃有限公司 应用于玻璃生产的柔性输送系统

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005274711A (ja) * 2004-03-23 2005-10-06 Pentax Corp 描画装置の基板の搬送機構
JP2006179571A (ja) * 2004-12-21 2006-07-06 Dainippon Screen Mfg Co Ltd 基板載置装置

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JPH0691150B2 (ja) * 1985-10-29 1994-11-14 キヤノン株式会社 基板処理方法
JPH11284052A (ja) * 1998-01-30 1999-10-15 Nikon Corp 基板搬送方法、基板搬送装置、及び露光装置、並びにデバイス製造方法
AU2186099A (en) 1998-02-09 1999-08-23 Nikon Corporation Apparatus for supporting base plate, apparatus and method for transferring base plate, method of replacing base plate, and exposure apparatus and method of manufacturing the same
JP4369866B2 (ja) * 2002-05-23 2009-11-25 キヤノンアネルバ株式会社 基板処理装置及び処理方法
JP4745040B2 (ja) * 2005-12-05 2011-08-10 東京エレクトロン株式会社 基板搬送装置及び基板処理装置
JP2008166348A (ja) * 2006-12-27 2008-07-17 Olympus Corp 基板搬送装置
JP4840595B2 (ja) * 2007-02-20 2011-12-21 株式会社Ｉｈｉ 基板搬送機
JP2011233776A (ja) * 2010-04-28 2011-11-17 Nikon Corp 物体搬送装置、物体支持装置、物体搬送システム、露光装置、デバイス製造方法、フラットパネルディスプレイの製造方法、及び物体搬送方法
JP5741834B2 (ja) * 2011-05-13 2015-07-01 株式会社ニコン 物体の搬出方法、物体の交換方法、物体保持装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005274711A (ja) * 2004-03-23 2005-10-06 Pentax Corp 描画装置の基板の搬送機構
JP2006179571A (ja) * 2004-12-21 2006-07-06 Dainippon Screen Mfg Co Ltd 基板載置装置

Also Published As

Publication number Publication date
TW201838077A (zh) 2018-10-16
TW202030827A (zh) 2020-08-16
KR20200037441A (ko) 2020-04-08
TWI693662B (zh) 2020-05-11
TW201301429A (zh) 2013-01-01
KR102238208B1 (ko) 2021-04-08
TWI564986B (zh) 2017-01-01
CN103534788A (zh) 2014-01-22
CN103534788B (zh) 2016-12-14
JP5741834B2 (ja) 2015-07-01
JP2012237913A (ja) 2012-12-06
WO2012157230A1 (ja) 2012-11-22
TW201711127A (zh) 2017-03-16
CN106873313B (zh) 2020-03-03
KR102097123B1 (ko) 2020-04-03
KR20140043750A (ko) 2014-04-10
CN106873313A (zh) 2017-06-20

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