TWI618963B - 畫素電極之圖案形成方法及形成系統 - Google Patents

畫素電極之圖案形成方法及形成系統 Download PDF

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Publication number
TWI618963B
TWI618963B TW104133510A TW104133510A TWI618963B TW I618963 B TWI618963 B TW I618963B TW 104133510 A TW104133510 A TW 104133510A TW 104133510 A TW104133510 A TW 104133510A TW I618963 B TWI618963 B TW I618963B
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TW
Taiwan
Prior art keywords
photoresist
pixel electrode
pattern
spacer
electrode layer
Prior art date
Application number
TW104133510A
Other languages
English (en)
Chinese (zh)
Other versions
TW201629604A (zh
Inventor
藤田直紀
石田寛
八尋俊一
池田文彦
Original Assignee
東京威力科創股份有限公司
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Publication of TW201629604A publication Critical patent/TW201629604A/zh
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Publication of TWI618963B publication Critical patent/TWI618963B/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G02F1/134363—Electrodes characterised by their geometrical arrangement for applying an electric field parallel to the substrate, i.e. in-plane switching [IPS]
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G02F1/134372—Electrodes characterised by their geometrical arrangement for fringe field switching [FFS] where the common electrode is not patterned
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136218—Shield electrodes

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Geometry (AREA)
  • Liquid Crystal (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
TW104133510A 2014-10-23 2015-10-13 畫素電極之圖案形成方法及形成系統 TWI618963B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014-216489 2014-10-23
JP2014216489A JP6481994B2 (ja) 2014-10-23 2014-10-23 画素電極のパターン形成方法および形成システム

Publications (2)

Publication Number Publication Date
TW201629604A TW201629604A (zh) 2016-08-16
TWI618963B true TWI618963B (zh) 2018-03-21

Family

ID=55828555

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104133510A TWI618963B (zh) 2014-10-23 2015-10-13 畫素電極之圖案形成方法及形成系統

Country Status (4)

Country Link
JP (1) JP6481994B2 (enrdf_load_stackoverflow)
KR (1) KR102307416B1 (enrdf_load_stackoverflow)
CN (1) CN105549277B (enrdf_load_stackoverflow)
TW (1) TWI618963B (enrdf_load_stackoverflow)

Citations (4)

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TW200641490A (en) * 2005-01-11 2006-12-01 Idemitsu Kosan Co Method for manufacturing transparent electrode
US20070001979A1 (en) * 2005-06-30 2007-01-04 Lg Philips Lcd Co., Ltd. Method of forming fine pattern, liquid crystal display device having a fine pattern and fabricating method thereof
TW200945413A (en) * 2007-12-28 2009-11-01 Tokyo Electron Ltd Pattern forming method and semiconductor manufacturing device
TW201030843A (en) * 2008-11-26 2010-08-16 Univ Tohoku Method for manufacturing semiconductor device

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JPH11264993A (ja) * 1998-03-18 1999-09-28 Toshiba Corp 液晶表示装置および液晶表示装置の製造方法
JP4096933B2 (ja) * 2004-09-30 2008-06-04 セイコーエプソン株式会社 パターンの形成方法
US7579220B2 (en) * 2005-05-20 2009-08-25 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device manufacturing method
TW200913013A (en) * 2007-07-30 2009-03-16 Hoya Corp Method of manufacturing a gray tone mask, gray tone mask, method of inspecting a gray tone mask, and method of transferring a pattern
US8440569B2 (en) * 2007-12-07 2013-05-14 Cadence Design Systems, Inc. Method of eliminating a lithography operation
CN102498462B (zh) * 2009-09-11 2014-11-19 日本写真印刷株式会社 窄边框触摸输入薄片及其制造方法
JP5391055B2 (ja) * 2009-12-25 2014-01-15 東京エレクトロン株式会社 半導体装置の製造方法及び半導体装置の製造システム
JP2012008546A (ja) * 2010-05-24 2012-01-12 Hoya Corp 多階調フォトマスクの製造方法、及びパターン転写方法
FR2960657B1 (fr) * 2010-06-01 2013-02-22 Commissariat Energie Atomique Procede de lithographie a dedoublement de pas
KR101692407B1 (ko) * 2010-08-19 2017-01-04 삼성전자주식회사 라인 패턴 구조물의 형성 방법
KR20120133181A (ko) * 2011-05-30 2012-12-10 엘지디스플레이 주식회사 액정표시장치 어레이 기판의 제조 방법
JP5458059B2 (ja) 2011-06-02 2014-04-02 株式会社ジャパンディスプレイ 液晶パネル及び電子機器
CN103311109B (zh) * 2012-03-12 2016-02-10 上海华虹宏力半导体制造有限公司 侧墙的形成方法和用侧墙定义图形结构的方法
TWI488238B (zh) * 2012-03-29 2015-06-11 Powerchip Technology Corp 一種半導體線路製程
CN104471472B (zh) 2012-07-04 2017-03-15 Nlt科技股份有限公司 液晶显示装置
CN102945854B (zh) * 2012-11-13 2015-05-13 京东方科技集团股份有限公司 阵列基板及阵列基板上扇出导线的制作方法、显示装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200641490A (en) * 2005-01-11 2006-12-01 Idemitsu Kosan Co Method for manufacturing transparent electrode
US20070001979A1 (en) * 2005-06-30 2007-01-04 Lg Philips Lcd Co., Ltd. Method of forming fine pattern, liquid crystal display device having a fine pattern and fabricating method thereof
TW200945413A (en) * 2007-12-28 2009-11-01 Tokyo Electron Ltd Pattern forming method and semiconductor manufacturing device
TW201030843A (en) * 2008-11-26 2010-08-16 Univ Tohoku Method for manufacturing semiconductor device

Also Published As

Publication number Publication date
CN105549277B (zh) 2019-12-17
CN105549277A (zh) 2016-05-04
TW201629604A (zh) 2016-08-16
JP2016085287A (ja) 2016-05-19
KR102307416B1 (ko) 2021-09-29
KR20160048013A (ko) 2016-05-03
JP6481994B2 (ja) 2019-03-13

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