TWI613503B - Optical path adjusting mechanism - Google Patents

Optical path adjusting mechanism Download PDF

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Publication number
TWI613503B
TWI613503B TW106111043A TW106111043A TWI613503B TW I613503 B TWI613503 B TW I613503B TW 106111043 A TW106111043 A TW 106111043A TW 106111043 A TW106111043 A TW 106111043A TW I613503 B TWI613503 B TW I613503B
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spring
base
rotating base
sub
optical element
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TW106111043A
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TW201723631A (en
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林維賜
廖洽成
張語宸
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揚明光學股份有限公司
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • G03B21/14Details
    • G03B21/142Adjusting of projection optics
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • G03B21/14Details
    • G03B21/28Reflectors in projection beam

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Studio Devices (AREA)

Abstract

一種光路調整機構,包括旋轉基座、光學元件、線圈、第一彈簧以及第二彈簧。旋轉基座設有對角位置的第一區域與第二區域。光學元件設於旋轉基座內。線圈圍繞旋轉基座的外圍。第一彈簧的一端連接旋轉基座的第一區域。第二彈簧的一端連接旋轉基座的第二區域。另一種光路調整機構亦被提出。An optical path adjustment mechanism includes a rotation base, an optical element, a coil, a first spring, and a second spring. The rotating base is provided with a first region and a second region at diagonal positions. The optical element is disposed in the rotating base. The coil surrounds the periphery of the rotating base. One end of the first spring is connected to the first area of the rotating base. One end of the second spring is connected to the second area of the rotating base. Another light path adjustment mechanism has also been proposed.

Description

光路調整機構Light path adjustment mechanism

本發明是有關於一種光路調整機構。The invention relates to an optical path adjustment mechanism.

隨著科技的日益發展,許多利用逐層建構模型等加成式製造技術(Additive Manufacturing technology)來建造物理三維(Three-Dimensional, 3-D)模型的不同方法已紛紛被提出。一般而言,加成式製造技術是將利用電腦輔助設計(Computer-Aided Design, CAD)等軟體建構的3-D模型的設計資料轉換為連續堆疊的多個薄(准二維)橫截面層。然而,透過上述三維列印技術所列印出來的物體的表面精度仍無法符合市場需求,因此如何進一步地提升其所列印出來的物體的表面精度一直是本領域的技術人員所要解決的問題。With the increasing development of science and technology, many different methods of constructing physical three-dimensional (3-D) models using additive manufacturing technologies such as layer-by-layer construction models have been proposed. Generally speaking, additive manufacturing technology converts the design data of a 3-D model constructed using software such as Computer-Aided Design (CAD) into multiple thin (quasi-two-dimensional) cross-section layers that are continuously stacked. . However, the surface accuracy of the objects listed through the above-mentioned three-dimensional printing technology still cannot meet the market demand, so how to further improve the surface accuracy of the objects listed by them has always been a problem to be solved by those skilled in the art.

本發明提供一種光路調整機構,其可以使應用此光路調整機構的三維列印裝置所列印出來的三維列印物件具有良好的表面精度。The invention provides an optical path adjustment mechanism, which can make a three-dimensional printed object listed on a three-dimensional printing device to which the optical path adjustment mechanism is applied have good surface accuracy.

本發明的實施例提供一種光路調整機構,包括旋轉基座、光學元件、線圈、第一彈簧以及第二彈簧。旋轉基座設有對角位置的第一區域與第二區域。光學元件設於旋轉基座內。線圈圍繞旋轉基座的外圍。第一彈簧的一端連接旋轉基座的第一區域。第二彈簧的一端連接旋轉基座的第二區域。An embodiment of the present invention provides an optical path adjustment mechanism including a rotation base, an optical element, a coil, a first spring, and a second spring. The rotating base is provided with a first region and a second region at diagonal positions. The optical element is disposed in the rotating base. The coil surrounds the periphery of the rotating base. One end of the first spring is connected to the first area of the rotating base. One end of the second spring is connected to the second area of the rotating base.

本發明的實施例提供一種光路調整機構,基座、框架、光學元件、第一彈簧以及第二彈簧。框架設有對角位置的第一區域與第二區域。光學元件設於框架內。第一彈簧設有第一端與第二端。第一端連接框架的第一區域。第二端連接基座的一端,且第一彈簧在第一端與第二端之間設有第一平面。第二彈簧設有第一端與第二端。第一端連接框架的第二區域。第二端連接基座的另一端,且第二彈簧在第一端與第二端之間設有第二平面。An embodiment of the present invention provides an optical path adjustment mechanism, a base, a frame, an optical element, a first spring, and a second spring. The frame is provided with a first region and a second region at diagonal positions. The optical element is provided in the frame. The first spring is provided with a first end and a second end. The first end is connected to a first region of the frame. The second end is connected to one end of the base, and the first spring is provided with a first plane between the first end and the second end. The second spring is provided with a first end and a second end. The first end is connected to the second area of the frame. The second end is connected to the other end of the base, and the second spring is provided with a second plane between the first end and the second end.

基於上述,在本發明的範例實施例的光路調整結構中,由於第一彈簧與第二彈簧分別連接於位於旋轉基座對角位置的第一區域以及第二區域,旋轉基座透過上述彈簧之間的彈性力進行旋轉的做動方式。當影像光束經過旋轉基座上的光學元件時,影像光束的光路會因為光學元件被旋轉基座所帶動而被光學元件所改變。由於影像光束的光路會被本發明實施例的光路調整結構所改變,因此應用本發明實施例的光路調整結構的三維列印裝置能夠使影像光束所形成的影像畫面的像素提高,進而使三維列印裝置所列印出的三維列印物件具有更佳的表面精度。Based on the above, in the light path adjustment structure of the exemplary embodiment of the present invention, since the first spring and the second spring are respectively connected to the first region and the second region located at the diagonal positions of the rotary base, the rotary base passes through the spring. The elastic force is used to rotate. When the image beam passes through the optical element on the rotating base, the optical path of the image beam will be changed by the optical element because the optical element is driven by the rotating base. Since the optical path of the image beam is changed by the optical path adjustment structure of the embodiment of the present invention, the three-dimensional printing device applying the optical path adjustment structure of the embodiment of the present invention can increase the pixels of the image frame formed by the image beam, and further make the three-dimensional array The three-dimensional printed objects printed by the printing device have better surface accuracy.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above features and advantages of the present invention more comprehensible, embodiments are hereinafter described in detail with reference to the accompanying drawings.

有關本發明之前述及其他技術內容、特點與功效,在以下配合參考圖式之多個實施例的詳細說明中,將可清楚的呈現。以下實施例中所提到的方向用語,例如「上」、「下」、「前」、「後」、「左」、「右」等,僅是參考附加圖式的方向。因此,使用的方向用語是用來說明,而非用來限制本發明。圖1繪示一種光學裝置的結構示意圖。請參照圖1,光學裝置100包括照明系統110、數位微鏡裝置120、投影鏡頭130以及振動機構140。其中,照明系統110具有光源112,其適於提供光束114,且數位微鏡裝置120配置光束114的傳遞路徑上。此數位微鏡裝置120適於將光束114轉換為多數個子影像114a。此外,投影鏡頭130配置於這些子影像114a的傳遞路徑上,且數位微鏡裝置120係位於照明系統110與投影鏡頭130之間。另外,振動機構140配置於數位微鏡裝置120與投影鏡頭130之間,且位於這些子影像114a的傳遞路徑上。The foregoing and other technical contents, features, and effects of the present invention will be clearly presented in the following detailed description of various embodiments with reference to the drawings. The directional terms mentioned in the following embodiments, such as "up", "down", "front", "rear", "left", "right", etc., are only directions referring to the attached drawings. Therefore, the directional terms used are used for illustration, not for limiting the present invention. FIG. 1 is a schematic structural diagram of an optical device. Referring to FIG. 1, the optical device 100 includes an illumination system 110, a digital micromirror device 120, a projection lens 130, and a vibration mechanism 140. The lighting system 110 has a light source 112 adapted to provide a light beam 114, and the digital micromirror device 120 is disposed on a transmission path of the light beam 114. The digital micromirror device 120 is adapted to convert the light beam 114 into a plurality of sub-images 114a. In addition, the projection lens 130 is disposed on the transmission path of these sub-images 114a, and the digital micromirror device 120 is located between the illumination system 110 and the projection lens 130. In addition, the vibration mechanism 140 is disposed between the digital micromirror device 120 and the projection lens 130 and is located on a transmission path of these sub-images 114a.

上述之光學裝置100中,光源112所提供的光束114會依序經過色輪(color wheel) 116、集光柱(light integration rod) 117、鏡片組118及內部全反射稜鏡(TIR Prism) 119。之後,內部全反射稜鏡119會將光束114反射至數位微鏡裝置120。此時,數位微鏡裝置120會將光束114轉換成多數個子影像114a,而這些子影像114a會依序通過內部全反射稜鏡119及振動機構140,並經由投影鏡頭130將這些子影像114a投影於螢幕400上。In the optical device 100 described above, the light beam 114 provided by the light source 112 will sequentially pass through a color wheel 116, a light integration rod 117, a lens group 118, and a TIR Prism 119. Afterwards, the total internal reflection 稜鏡 119 reflects the light beam 114 to the digital micromirror device 120. At this time, the digital micromirror device 120 converts the light beam 114 into a plurality of sub-images 114a, and these sub-images 114a sequentially pass through the internal total reflection 119 and the vibration mechanism 140, and project these sub-images 114a through the projection lens 130. On screen 400.

當這些子影像114a經過振動機構140時,振動機構140會改變部分這些子影像114a的傳遞路徑。也就是說,通過此振動機構140的這些子影像114a會投影在螢幕400上的第一位置(未繪示),另一部份時間內通過此振動機構140的這些子影像114a則會投影在螢幕400上的第二位置(未繪示),其中第一位置與第二位置係在水平方向(X軸)或垂直方向(Z軸)上相差一固定距離。由於振動機構140僅能使這些子影像114a之成像位置在水平方向或垂直方向上移動一固定距離,因此能提高影像之水平解析度或垂直解析度。When the sub-images 114a pass through the vibration mechanism 140, the vibration mechanism 140 changes a transmission path of some of the sub-images 114a. That is, the sub-images 114a passing through the vibration mechanism 140 are projected on a first position (not shown) on the screen 400, and the sub-images 114a passing through the vibration mechanism 140 are projected on another part of the time. The second position (not shown) on the screen 400, wherein the first position and the second position are different by a fixed distance in the horizontal direction (X axis) or vertical direction (Z axis). Since the vibration mechanism 140 can only move the imaging positions of the sub-images 114a by a fixed distance in the horizontal or vertical direction, the horizontal or vertical resolution of the image can be improved.

圖2係繪示依照本發明一實施例所述之一種光學裝置的結構示意圖。請參照圖2,本實施例之光學裝置200包括照明系統210、反射式光閥220、投影鏡頭230、成像位移模組240以及螢幕400。其中,照明系統210具有光源212,其適於提供光束214,且反射式光閥220配置光束214的傳遞路徑上。此反射式光閥220適於將光束214轉換為多數個子影像214a。此外,投影鏡頭230配置於這些子影像214a的傳遞路徑上,且反射式光閥220係位於照明系統210與投影鏡頭230之間。FIG. 2 is a schematic structural diagram of an optical device according to an embodiment of the invention. Referring to FIG. 2, the optical device 200 in this embodiment includes an illumination system 210, a reflective light valve 220, a projection lens 230, an imaging displacement module 240, and a screen 400. The lighting system 210 has a light source 212, which is adapted to provide a light beam 214, and the reflective light valve 220 is disposed on a transmission path of the light beam 214. The reflective light valve 220 is adapted to convert the light beam 214 into a plurality of sub-images 214a. In addition, the projection lens 230 is disposed on the transmission path of these sub-images 214a, and the reflective light valve 220 is located between the illumination system 210 and the projection lens 230.

圖3繪示本實施例中,本實施例之光學裝置的成像示意圖。當子影像214a經過成像位移模組240時,成像位移模組240會改變部分這些子影像214a的傳遞路徑。也就是說,通過此成像位移模組240的這些子影像214a會投影在螢幕400上的第一位置(實線方格),而另一部份時間內通過此成像位移模組240的這些子影像214a則會投影在螢幕400上的第二位置(虛線方格),因此能同時提高影像之水平解析度及垂直解析度。上述之照明系統210例如是遠心照明系統或非遠心照明系統。此外,反射式光閥220例如是數位微鏡裝置或單晶矽反射式液晶面板,本實施例中係以數位微鏡裝置為例。上述之光源212提供的光束214會依序經過色輪216、集光柱217、鏡片組218及稜鏡219,而稜鏡219會將光束214反射至反射式光閥220。此時,反射式光閥220會將光束214轉換成多數個子影像214a,而這些子影像214a會依序通過成像位移模組240、稜鏡219或是依序通過稜鏡219、成像位移模組240,並經由投影鏡頭230將這些子影像214a投影於螢幕400上。應注意的是,若使用不同顏色的LED當光源212,則色輪216可被省略。另外,也可使用微透鏡陣列(lens array)取代集光柱217進行光均勻化。FIG. 3 illustrates an imaging schematic diagram of the optical device in this embodiment. When the sub-image 214a passes through the imaging displacement module 240, the imaging displacement module 240 changes a part of the transmission paths of these sub-images 214a. That is, the sub-images 214a passing through the imaging displacement module 240 are projected on the first position (solid line grid) on the screen 400, and the sub-images passing through the imaging displacement module 240 in another part of the time The image 214a is projected at the second position (the dotted line grid) on the screen 400, so the horizontal resolution and the vertical resolution of the image can be improved at the same time. The above-mentioned lighting system 210 is, for example, a telecentric lighting system or a non-telecentric lighting system. In addition, the reflective light valve 220 is, for example, a digital micromirror device or a monocrystalline silicon reflective liquid crystal panel. In this embodiment, a digital micromirror device is used as an example. The light beam 214 provided by the light source 212 described above will sequentially pass through the color wheel 216, the light collecting column 217, the lens group 218, and the 稜鏡 219, and the 稜鏡 219 will reflect the light beam 214 to the reflective light valve 220. At this time, the reflective light valve 220 will convert the light beam 214 into a plurality of sub-images 214a, and these sub-images 214a will sequentially pass through the imaging displacement module 240, 稜鏡 219, or sequentially through the 稜鏡 219, imaging displacement module 240, and these sub-images 214a are projected on the screen 400 via the projection lens 230. It should be noted that if LEDs of different colors are used as the light source 212, the color wheel 216 may be omitted. In addition, a micro lens array (lens array) may be used instead of the light collecting column 217 for light homogenization.

圖4、5、6分別繪示本發明一實施例之成像位移模組的結構立體示意圖、沿D-D虛線方向的剖面側視圖、以及沿A-A虛線方向的剖面側視圖。請參照圖4、5、6,本實施例中,成像位移模組240包括承載基座410及旋轉基座420。其中,旋轉基座420樞接於承載基座410上,且承載基座410適於控制旋轉基座420於一特定角度θ(未繪示)內來回振動。此旋轉基座420具有光學元件部422,此光學元件部422係位於上述這些子影像214a(如圖2中所示)的傳遞路徑上。而且,當旋轉基座420於此特定角度θ內來回振動時,此光學元件部422可使這些子影像214a之成像位置於一軸線430上移動一距離。換言之,成像位移模組240(如圖4中所示)之光學元件部422可使這些子影像214a之成像位置同時在水平方向(X軸)和在垂直方向(Z軸)上各移動一距離。Figs. 4, 5, and 6 respectively show a structural perspective view of an imaging displacement module according to an embodiment of the present invention, a cross-sectional side view along the D-D dotted line direction, and a cross-sectional side view along the A-A dotted line direction. Please refer to FIGS. 4, 5 and 6. In this embodiment, the imaging displacement module 240 includes a bearing base 410 and a rotating base 420. The rotating base 420 is pivotally connected to the supporting base 410, and the supporting base 410 is adapted to control the rotating base 420 to vibrate back and forth within a specific angle θ (not shown). The rotating base 420 has an optical element portion 422, and the optical element portion 422 is located on the transmission path of the sub-images 214a (as shown in FIG. 2). Moreover, when the rotating base 420 vibrates back and forth within this specific angle θ, the optical element portion 422 can move the imaging positions of the sub-images 214 a by a distance on an axis 430. In other words, the optical element portion 422 of the imaging displacement module 240 (as shown in FIG. 4) can move the imaging positions of these sub-images 214 a at the same time by a distance in the horizontal direction (X axis) and in the vertical direction (Z axis). .

上述之成像位移模組240中,承載基座410例如包括磁性材料座412、兩磁性材料414a、414b以及感應模組(未繪示)。旋轉基座420例如包括光學元件部422、承載座424、線圈模組426以及轉軸428。轉軸428上下兩端係藉由孔洞432而樞接於底座(未繪示)上。此外,感應模組配置於承載基座410上,而線圈模組426配置於旋轉基座420上,且感應模組係藉由線圈模組426控制旋轉基座420於此特定角度θ內來回振動。更詳細地說,承載基座410中例如具有磁性材料414a、414b,且感應模組係藉由改變線圈模組426之磁性,使線圈模組426與磁性材料414之間產生吸引力及排斥力兩者至少其中之一,以控制旋轉基座420於此特定角度θ內來回振動,進而改變上述這些子影像214a之成像位置。In the above-mentioned imaging displacement module 240, the supporting base 410 includes, for example, a magnetic material base 412, two magnetic materials 414a, 414b, and a sensing module (not shown). The rotation base 420 includes, for example, an optical element portion 422, a carrier 424, a coil module 426, and a rotating shaft 428. The upper and lower ends of the rotating shaft 428 are pivotally connected to the base (not shown) through the holes 432. In addition, the induction module is disposed on the bearing base 410, and the coil module 426 is disposed on the rotating base 420, and the induction module controls the rotating base 420 to vibrate back and forth within this specific angle θ by the coil module 426 . In more detail, the carrier base 410 includes, for example, magnetic materials 414a and 414b, and the induction module changes the magnetism of the coil module 426 to generate attractive and repulsive forces between the coil module 426 and the magnetic material 414. At least one of the two is used to control the rotating base 420 to vibrate back and forth within this specific angle θ, thereby changing the imaging positions of these sub-images 214a.

本發明一實施例中,感應模組例如包括電路板(未繪示)以及感應器(未繪示)。其中,電路板配置於底座上,而感應器配置於承載基座上。此感應器係用以感應旋轉基座之轉軸428擺動幅度,當轉軸428向磁性材料414a擺動一定幅度時,電路板會改變線圈模組426之磁性,使線圈模組426與磁性材料414a之間產生排斥力(使線圈模組426與磁性材料414b之間產生吸引力),進而使線圈模組426遠離磁性材料414a。而當轉軸428向磁性材料414b擺動一定幅度時,電路板會改變線圈模組426之磁性,使線圈模組426與磁性材料414b之間產生排斥力(使線圈模組426與磁性材料414a之間產生吸引力),進而使線圈模組426遠離磁性材料414b。藉由使線圈模組426貼近/遠離或遠離/貼近磁性材料414a/414b,可使旋轉基座420於此特定角度θ內來回振動,進而改變上述這些子影像214a之成像位置。In an embodiment of the present invention, the sensing module includes, for example, a circuit board (not shown) and a sensor (not shown). The circuit board is arranged on the base, and the sensor is arranged on the bearing base. This sensor is used to sense the swing amplitude of the rotating shaft 428 of the rotating base. When the rotating shaft 428 swings to the magnetic material 414a, the circuit board will change the magnetism of the coil module 426 so that between the coil module 426 and the magnetic material 414a. A repulsive force is generated (attractive force is generated between the coil module 426 and the magnetic material 414b), and the coil module 426 is further away from the magnetic material 414a. When the rotating shaft 428 swings to a certain extent to the magnetic material 414b, the circuit board will change the magnetism of the coil module 426, so that a repulsive force will be generated between the coil module 426 and the magnetic material 414b (to make the coil module 426 and the magnetic material 414a (Attractive force is generated), and the coil module 426 is further away from the magnetic material 414b. By making the coil module 426 close to / away from or away from / close to the magnetic material 414a / 414b, the rotating base 420 can be vibrated back and forth within this specific angle θ, thereby changing the imaging positions of these sub-images 214a.

上述之成像位移模組240中,線圈模組426例如包括線圈座426a以及線圈426b。其中,線圈426b係圍繞於線圈座426a上,電路板例如係藉由改變線圈426b中電流之方向,而使線圈模組426改變磁性。值得注意的是,在本實施例中,可藉由射出模具使旋轉基座420之轉軸428與光學元件部422一體成型。而在一實施例中,也可將旋轉基座420之轉軸428與光學元件部422是分開製造,再將光學元件部422與轉軸428組裝在一起。此外,光學元件部420可為一反射片或一透鏡。In the imaging displacement module 240 described above, the coil module 426 includes, for example, a coil holder 426a and a coil 426b. Among them, the coil 426b is surrounded on the coil base 426a. For example, the circuit board changes the magnetism of the coil module 426 by changing the direction of the current in the coil 426b. It is worth noting that, in this embodiment, the rotating shaft 428 of the rotation base 420 and the optical element portion 422 can be integrally formed by an injection mold. In one embodiment, the rotating shaft 428 and the optical element portion 422 of the rotating base 420 can be manufactured separately, and the optical element portion 422 and the rotating shaft 428 can be assembled together. In addition, the optical element portion 420 may be a reflection sheet or a lens.

圖7、8、9分別繪示本發明另一實施例之成像位移模組的結構立體示意圖、沿D-D虛線方向的剖面側視圖、以及沿A-A虛線方向的剖面側視圖。與圖4、5、6之實施例不同點在於,圖4中轉軸428上下兩端分別為水平和垂直配置,而本實施例將轉軸428上下兩端係水平配置。此外,本實施例將線圈模組分成兩部分427a、427b。當轉軸428向磁性材料414a擺動一定幅度時,電路板會改變線圈模組427a、427b之磁性,使線圈模組427a與磁性材料414a之間產生排斥力,同時使線圈模組427b與磁性材料部414b之間產生吸引力,進而使線圈模組427a遠離磁性材料414a。而當轉軸428向磁性材料414b擺動一定幅度時,電路板會改變線圈模組427a、427b之磁性,使線圈模組427b與磁性材料414b之間產生排斥力,同時使線圈模組427a與磁性材料部414a之間產生吸引力,進而使線圈模組427b遠離磁性材料414b。藉由使線圈模組427a、427b貼近/遠離或遠離/貼近磁性材料414a/414b,可使旋轉基座420於此特定角度θ內來回振動,進而改變上述這些子影像214a之成像位置。FIGS. 7, 8 and 9 respectively show a structural perspective view of an imaging displacement module according to another embodiment of the present invention, a cross-sectional side view along the D-D dotted line direction, and a cross-sectional side view along the A-A dotted line direction. The difference from the embodiments of FIGS. 4, 5 and 6 is that the upper and lower ends of the rotating shaft 428 in FIG. 4 are respectively arranged horizontally and vertically. In this embodiment, the upper and lower ends of the rotating shaft 428 are horizontally arranged. In addition, this embodiment divides the coil module into two parts 427a, 427b. When the rotating shaft 428 swings to the magnetic material 414a by a certain amount, the circuit board will change the magnetism of the coil modules 427a and 427b, so that a repulsive force is generated between the coil module 427a and the magnetic material 414a, and at the same time, the coil module 427b and the magnetic material portion An attractive force is generated between 414b, and the coil module 427a is further away from the magnetic material 414a. When the rotating shaft 428 swings to the magnetic material 414b, the circuit board will change the magnetism of the coil modules 427a and 427b, so that a repulsive force is generated between the coil module 427b and the magnetic material 414b, and at the same time, the coil module 427a and the magnetic material are caused. An attractive force is generated between the portions 414a, and the coil module 427b is further separated from the magnetic material 414b. By making the coil modules 427a, 427b close to / away from or away from / close to the magnetic material 414a / 414b, the rotating base 420 can be vibrated back and forth within this specific angle θ, and then the imaging positions of these sub-images 214a are changed.

圖10A繪示本發明另一實施例之成像位移模組的結構立體示意圖。圖10B繪示圖10A實施例的上視圖。圖10C繪示圖10A實施例的剖面側視圖。請先參照圖10A、圖10B以及圖10C,在本實施例中,成像位移模組1000a包括承載基座1100以及旋轉基座1200。旋轉基座1200經由至少一彈性件1300耦接至承載基座1100。承載基座1100適於控制旋轉基座1200相對於參考平面S的雙軸旋轉。在本實施例中,參考平面S的雙軸例如為第一方向X上的第一轉軸1610以及第二方向Y上的第二轉軸1620。第一轉軸1610以及第二轉軸1620的夾角為90度,並且第一轉軸1610以及第二轉軸1620定義出參考平面S。承載基座1100以及旋轉基座1200相對於第一轉軸1610對稱。旋轉基座1200相對於第一轉軸1610以及第二轉軸1620兩者之至少其中之一旋轉。FIG. 10A is a schematic structural perspective view of an imaging displacement module according to another embodiment of the present invention. FIG. 10B is a top view of the embodiment of FIG. 10A. FIG. 10C is a cross-sectional side view of the embodiment of FIG. 10A. Please refer to FIG. 10A, FIG. 10B and FIG. 10C first. In this embodiment, the imaging displacement module 1000 a includes a supporting base 1100 and a rotating base 1200. The rotating base 1200 is coupled to the supporting base 1100 via at least one elastic member 1300. The supporting base 1100 is adapted to control the biaxial rotation of the rotating base 1200 relative to the reference plane S. In this embodiment, the two axes of the reference plane S are, for example, the first rotation axis 1610 in the first direction X and the second rotation axis 1620 in the second direction Y. The included angle between the first rotating shaft 1610 and the second rotating shaft 1620 is 90 degrees, and the first rotating shaft 1610 and the second rotating shaft 1620 define a reference plane S. The supporting base 1100 and the rotating base 1200 are symmetrical with respect to the first rotation axis 1610. The rotation base 1200 rotates with respect to at least one of the first rotation shaft 1610 and the second rotation shaft 1620.

另一方面,在本實施例中,成像位移模組1000a更包括光學元件部1500。光學元件部1500設置在旋轉基座1200上。光學元件部包括反射鏡或透鏡。On the other hand, in this embodiment, the imaging displacement module 1000 a further includes an optical element portion 1500. The optical element portion 1500 is provided on the rotation base 1200. The optical element section includes a mirror or a lens.

在本實施例中,至少一彈性件包括一第一彈性件對1310以及一第二彈性件對1320。承載基座1100包括第一承載框1110以及第二承載框1120,第一承載框1110設置於第二承載框1120上。第二承載框1120環繞第一承載框1110。第一承載框1110經由第一彈性件對1310耦接至旋轉基座1200,第二承載框1120經由第二彈性件對1320耦接至第一承載框1110。第一彈性件對1310沿雙軸的其中之一轉軸1620設置在第一承載框1110的相對兩側,第二彈性件對1320沿雙軸的其中之另一轉軸1610設置在第二承載框1120之相對兩側。In this embodiment, the at least one elastic member includes a first elastic member pair 1310 and a second elastic member pair 1320. The supporting base 1100 includes a first supporting frame 1110 and a second supporting frame 1120. The first supporting frame 1110 is disposed on the second supporting frame 1120. The second bearing frame 1120 surrounds the first bearing frame 1110. The first supporting frame 1110 is coupled to the rotating base 1200 via a first pair of elastic members 1310, and the second supporting frame 1120 is coupled to the first supporting frame 1110 via a second pair of elastic members 1320. The first elastic member pair 1310 is disposed on the opposite sides of the first bearing frame 1110 along one of the biaxial rotating shafts 1610, and the second elastic member pair 1320 is disposed on the second bearing frame 1120 along the other rotating shaft 1610 of the biaxial. On opposite sides.

在本實施例中,至少一彈性件1300為彈簧。於其他實施例中,至少一彈性件1300也可以是其他彈性可變形的物體,如板金件、薄金屬、扭轉彈簧或者塑膠,本發明並不以此為限。In this embodiment, the at least one elastic member 1300 is a spring. In other embodiments, the at least one elastic member 1300 may also be another elastically deformable object, such as a sheet metal member, a thin metal, a torsion spring or plastic, which is not limited in the present invention.

在本實施例中,成像位移模組1000a更包括多個致動組件1400。這些多個致動組件1400設置在至少承載基座1100及旋轉基座1200兩者其中之一。承載基座1100係利用這些致動組件1400控制旋轉基座1200相對於參考平面S的雙軸旋轉。In this embodiment, the imaging displacement module 1000 a further includes a plurality of actuation components 1400. The plurality of actuating components 1400 are disposed on at least one of the bearing base 1100 and the rotating base 1200. The loading base 1100 controls the biaxial rotation of the rotating base 1200 relative to the reference plane S by using these actuating components 1400.

更具體來說,在本實施例中,這些多個致動組件1400包括第一致動組件1410以及第二致動組件1420。第一致動組件1410設置在承載基座1100上,沿著第二方向Y排列。承載基座1100利用第二致動組件1410控制旋轉基座1200相對於第一轉軸1610旋轉,此時旋轉基座1200與第一承載框1110同時相對於第二承載框1120旋轉。另一方面,第二致動組件1420設置在承載基座1100上,沿著第一方向X排列。承載基座1100利用第二致動組件1410控制旋轉基座1200相對於第二轉軸1620旋轉,此時旋轉基座1200相對於第一承載框1110旋轉。More specifically, in this embodiment, the plurality of actuation components 1400 include a first actuation component 1410 and a second actuation component 1420. The first moving unit 1410 is disposed on the supporting base 1100 and is arranged along the second direction Y. The supporting base 1100 uses the second actuating component 1410 to control the rotating base 1200 to rotate relative to the first rotating shaft 1610. At this time, the rotating base 1200 and the first supporting frame 1110 are rotated relative to the second supporting frame 1120 at the same time. On the other hand, the second actuating components 1420 are disposed on the supporting base 1100 and arranged along the first direction X. The supporting base 1100 uses the second actuating component 1410 to control the rotating base 1200 to rotate relative to the second rotating shaft 1620. At this time, the rotating base 1200 rotates relative to the first supporting frame 1110.

在本實施例中,第一致動組件1410包括兩個磁性材料M1、M2以及一個線圈模組C1。磁性材料M1、M2對稱第一轉軸1610設置於承載基座1100。線圈模組C1設置於第一轉軸1610上,並且第二磁性件C1位於磁性材料M1、M2之間。第二致動組件1420包括兩個磁性材料M3、M4以及兩個線圈模組C2、C3。兩個磁性材料M3、M4對稱第二轉軸1620設置於承載基座1100上。兩個線圈模組C2、C3對稱第二轉軸1620設置於光學元件部1500上。兩個線圈模組C2、C3位於兩個磁性材料M3、M4之間。磁性材料M3、M4與線圈模組C2、C3沿著第一方向X排列。值得一提的是,本實施例的成像位移模組1000a所使用的線圈總長度最小,其轉動慣量最小。In this embodiment, the first actuation component 1410 includes two magnetic materials M1, M2, and a coil module C1. The magnetic materials M1 and M2 are symmetrical to the first rotating shaft 1610 and disposed on the supporting base 1100. The coil module C1 is disposed on the first rotating shaft 1610, and the second magnetic member C1 is located between the magnetic materials M1 and M2. The second actuation component 1420 includes two magnetic materials M3 and M4 and two coil modules C2 and C3. The two magnetic materials M3 and M4 are symmetrically disposed on the bearing base 1100. The two coil modules C2 and C3 are disposed on the optical element portion 1500 in a symmetrical second rotation axis 1620. The two coil modules C2 and C3 are located between the two magnetic materials M3 and M4. The magnetic materials M3 and M4 are aligned with the coil modules C2 and C3 along the first direction X. It is worth mentioning that the total length of the coil used in the imaging displacement module 1000a of this embodiment is the smallest, and its moment of inertia is the smallest.

具體而言,在本實施例中,感應模組(未繪示)藉由改變線圈模組C1、C2、C3的磁性,以控制旋轉基座1200相對於參考平面S的雙軸旋轉。感應模組(未繪示)包括電路板以及感應器。感應器係用以感應第一轉軸1610以及第二轉軸1620的擺動幅度。當第一轉軸1610或第二轉軸1620的擺動一定幅度時,電路板藉由改變線圈模組C1、C2、C3上的電流方向,使線圈模組C1、C2、C3改變磁性。因此,線圈模組C1、C2、C3與磁性材料M1、M2、M3、M4之間產生排斥力或吸引力,使線圈模組C1、C2、C3遠離或靠近磁性材料M1、M2、M3、M4,進而控制旋轉基座1200相對於參考平面S的雙軸旋轉。Specifically, in this embodiment, the induction module (not shown) controls the biaxial rotation of the rotation base 1200 relative to the reference plane S by changing the magnetism of the coil modules C1, C2, and C3. The sensing module (not shown) includes a circuit board and a sensor. The sensor is used to sense the swing amplitude of the first rotating shaft 1610 and the second rotating shaft 1620. When the first rotating shaft 1610 or the second rotating shaft 1620 swings a certain amplitude, the circuit board changes the magnetic properties of the coil modules C1, C2, and C3 by changing the direction of the current on the coil modules C1, C2, and C3. Therefore, a repulsive force or an attractive force is generated between the coil modules C1, C2, and C3 and the magnetic materials M1, M2, M3, and M4, so that the coil modules C1, C2, and C3 are away from or close to the magnetic materials M1, M2, M3, and M4. , And then control the biaxial rotation of the rotation base 1200 relative to the reference plane S.

在本實施例中,多個致動組件包括磁性材料及線圈所構成。於其他實施例中,這些致動組件也可以是利用壓電材料或者步進馬達來達到如同本實施例中的致動效果,本發明不以此為限。In this embodiment, the plurality of actuating components include a magnetic material and a coil. In other embodiments, these actuating components may also use piezoelectric materials or stepping motors to achieve the actuating effect as in this embodiment, and the present invention is not limited thereto.

在此必須說明的是,下述實施例沿用前述實施例的元件標號與部分內容,其中採用相同的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。It must be noted here that the following embodiments use the component numbers and parts of the foregoing embodiments, in which the same reference numerals are used to indicate the same or similar components, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments are not repeated.

圖11A繪示本發明另一實施例之成像位移模組的結構立體示意圖。圖11B繪示圖11A實施例之成像位移模組的上視圖。圖11C繪示圖11A實施例之成像位移模組的剖面側視圖。請同時參考圖11A、圖11B以及圖11C,本實施例的成像位移模組1000b與成像位移模組1000a主要的差異是在於:本實施例的第二致動組件1420中的線圈模組C4設置在旋轉基座1200上,並且線圈模組C4環繞旋轉基座1200的光學元件部1500。值得一提的是,本實施例的所使用到的線圈數量少,製程上相對來說較為簡單。FIG. 11A is a schematic structural perspective view of an imaging displacement module according to another embodiment of the present invention. FIG. 11B is a top view of the imaging displacement module of the embodiment in FIG. 11A. FIG. 11C is a cross-sectional side view of the imaging displacement module of the embodiment shown in FIG. 11A. Please refer to FIG. 11A, FIG. 11B, and FIG. 11C at the same time. The main difference between the imaging displacement module 1000b and the imaging displacement module 1000a in this embodiment is that the coil module C4 in the second actuation component 1420 of this embodiment is provided. On the rotation base 1200, the coil module C4 surrounds the optical element portion 1500 of the rotation base 1200. It is worth mentioning that the number of coils used in this embodiment is small, and the manufacturing process is relatively simple.

圖12A繪示本發明另一實施例之成像位移模組的結構立體示意圖。圖12B繪示圖12A實施例之成像位移模組的上視圖。圖12C繪示圖12A實施例之成像位移模組的剖面側視圖。請同時參考圖12A、圖12B以及圖12C,本實施例的成像位移模組1000c與成像位移模組1000a主要的差異例如如下。在本實施例中,承載基座1100以及旋轉基座1200除了相對於第一轉軸1610對稱之外還相對於第二轉軸1620對稱。在本實施例中,第一彈性件對1310沿著第一轉軸1610設置在第二承載框1120之相對兩側,第二彈性件對1320沿著第二轉軸1620設置在第一承載框1110的相對兩側。此外,在本實施例中,第一致動組件1410包括兩個磁性材料M5、M6以及兩個線圈模組C5、C6。磁性材料M5、M6皆對稱於第一轉軸1610,並設置在承載基座1100上。線圈模組C5、C6皆對稱於第一轉軸1610,並設置在光學元件部1500上。磁性材料M5、M6以及線圈模組C5、C6沿著第二方向排列,線圈模組C5、C6位於磁性材料M5、M6之間。FIG. 12A is a schematic structural perspective view of an imaging displacement module according to another embodiment of the present invention. FIG. 12B is a top view of the imaging displacement module of the embodiment in FIG. 12A. 12C is a cross-sectional side view of the imaging displacement module of the embodiment shown in FIG. 12A. Please refer to FIG. 12A, FIG. 12B, and FIG. 12C together. The main differences between the imaging displacement module 1000c and the imaging displacement module 1000a in this embodiment are as follows. In this embodiment, the bearing base 1100 and the rotating base 1200 are symmetrical with respect to the second rotation axis 1620 in addition to being symmetrical with respect to the first rotation axis 1610. In this embodiment, the first pair of elastic members 1310 is disposed on opposite sides of the second bearing frame 1120 along the first rotation axis 1610, and the second pair of elastic members 1320 is disposed on the first bearing frame 1110 along the second rotation axis 1620. Opposite sides. In addition, in this embodiment, the first actuation component 1410 includes two magnetic materials M5 and M6 and two coil modules C5 and C6. The magnetic materials M5 and M6 are symmetrical to the first rotating shaft 1610 and are disposed on the bearing base 1100. The coil modules C5 and C6 are both symmetrical to the first rotating shaft 1610 and are disposed on the optical element portion 1500. The magnetic materials M5 and M6 and the coil modules C5 and C6 are arranged along the second direction. The coil modules C5 and C6 are located between the magnetic materials M5 and M6.

在本實施例中,第一致動組件1410與第二致動組件1420分別對稱於第一轉軸1610以及第二轉軸1620配置。也就是說,本實施例的成像位移模組1000c的第一致動組件1410以及第二致動組件1420具有高度對稱性,馬達可以設定相同出力,控制上較為容易。再者,第一致動組件1410以及第二致動組件1420相對於前述的實施例具有較長的力臂,因此啟動成像位移模組1000c的所需的力量相對較小。此外,由於四個磁性材料或四個線圈模組之間距離較遠,相對於前述的實施例來說,彼此之間較不易被干擾。In this embodiment, the first actuation component 1410 and the second actuation component 1420 are disposed symmetrically to the first rotation shaft 1610 and the second rotation shaft 1620, respectively. That is, the first actuation component 1410 and the second actuation component 1420 of the imaging displacement module 1000c of this embodiment have a high degree of symmetry, and the motor can set the same output, which is easier to control. Furthermore, the first actuation component 1410 and the second actuation component 1420 have a longer force arm relative to the foregoing embodiment, so the force required to activate the imaging displacement module 1000c is relatively small. In addition, since the distance between the four magnetic materials or the four coil modules is relatively long, compared with the foregoing embodiments, they are less likely to be interfered with each other.

圖13A繪示本發明一實施例之子影像的移動方向的概要示意圖。圖13B和圖13C繪示圖13A實施例之子影像的成像位移結果的概要示意圖。請同時參照圖13A以及圖13B,在本發明實施例中,成像位移模組適用於光學裝置,成像位移模組切換多個子影像的成像位置,以讓這些子影像500沿多個移動方向的其中之一移動一距離。這些子影像500的位置係依據旋轉基座1200的旋轉方式來決定。具體來說,在本實施例中,當旋轉基座1200相對於第一轉軸1610或第二轉軸1620其中之一旋轉時,這些子影像500的位置例如在圖2的螢幕400上,沿多個移動方向其中之一移動一距離,多個移動方向例如是第一方向X 或第二方向Y。在本實施例中,此距離為約0.7倍畫素寬度。因此,這些子影像500由原先的位置(實線方格)可以擺動至四個不同的位置(虛線方格),換言之,可以提高影像解析度至原先的四倍影像解析度。在另一實施例中,請參考圖13C,當旋轉基座1200相對於第一轉軸1610或/且第二轉軸1620旋轉時,這些子影像500可沿多個移動方向例如是第一方向X、第二方向Y、第三方向XY1及第四方向XY2其中之一移動。更進一步的說,當旋轉基座1200相對於第一轉軸1610及第二轉軸1620同時旋轉時,這些子影像500例如在第三方向XY1或第四方向XY2上移動一距離,其中第三方向XY1及第四方向XY2是介於第一方向X及第二方向Y之間。13A is a schematic diagram illustrating a moving direction of a child image according to an embodiment of the present invention. FIG. 13B and FIG. 13C are schematic diagrams showing the imaging displacement results of the child images in the embodiment of FIG. 13A. Please refer to FIG. 13A and FIG. 13B at the same time. In the embodiment of the present invention, the imaging displacement module is suitable for an optical device. The imaging displacement module switches the imaging positions of multiple sub-images so that the sub-images 500 are in multiple moving directions One moves a distance. The positions of these sub-images 500 are determined according to the rotation method of the rotation base 1200. Specifically, in this embodiment, when the rotation base 1200 is rotated relative to one of the first rotation axis 1610 or the second rotation axis 1620, the positions of these sub-images 500 are, for example, on the screen 400 in FIG. One of the moving directions moves a distance, and the plurality of moving directions are, for example, the first direction X or the second direction Y. In this embodiment, this distance is about 0.7 times the pixel width. Therefore, these sub-images 500 can be swung from the original position (solid line grid) to four different positions (dotted line grid), in other words, the image resolution can be increased to four times the original image resolution. In another embodiment, please refer to FIG. 13C. When the rotation base 1200 is rotated with respect to the first rotation axis 1610 or / and the second rotation axis 1620, the sub-images 500 may be moved in multiple directions such as the first direction X, One of the second direction Y, the third direction XY1, and the fourth direction XY2 moves. Furthermore, when the rotation base 1200 rotates relative to the first rotation axis 1610 and the second rotation axis 1620 at the same time, these sub-images 500 move a distance, for example, in the third direction XY1 or the fourth direction XY2, where the third direction XY1 And the fourth direction XY2 is between the first direction X and the second direction Y.

圖14A繪示本發明另一實施例之子影像的移動方向和成像位置的概要示意圖。圖14B繪示圖14A實施例之旋轉基座在一圖框時間中相對不同方向旋轉時,其子影像的成像位置的概要對照圖。請先參照圖14A,在本實施例中,當旋轉基座相對於第一轉軸或第二轉軸其中之一旋轉時,這些子影像500沿方向X’或Y’其中之一移動。更進一步的說,當旋轉基座相對於第一轉軸及第二轉軸同時旋轉時,這些子影像500在方向X’Y’1或方向X’Y’2其中之一移動一距離,其中方向X’Y’1及方向X’Y’2是介於方向X’及方向Y’之間。14A is a schematic diagram illustrating a moving direction and an imaging position of a child image according to another embodiment of the present invention. FIG. 14B is a schematic comparison diagram of the imaging positions of the sub-images when the rotating base of the embodiment of FIG. 14A is rotated in different directions in a frame time. Please refer to FIG. 14A first. In this embodiment, when the rotary base rotates with respect to one of the first rotation axis or the second rotation axis, the sub-images 500 move in one of the directions X 'or Y'. Furthermore, when the rotary base is rotated simultaneously with respect to the first rotation axis and the second rotation axis, the sub-images 500 move a distance in one of the directions X'Y'1 or X'Y'2, where the direction X 'Y'1 and direction X'Y'2 are between the direction X' and the direction Y '.

請再參照圖14A,當旋轉基座相對於第一轉軸及第二轉軸兩者至少其中之一旋轉時,這些子影像500的位置沿方向X’、Y’、X’Y’1及X’Y’2位移的示意圖。具體來說,在本實施例中,這些子影像500在方向X’以及在方向Y’上移動的距離皆為1畫素寬度,這些子影像500在方向X’Y’1或方向X’Y’2上移動的距離約為1.4畫素寬度。Please refer to FIG. 14A again, when the rotation base is rotated with respect to at least one of the first rotation axis and the second rotation axis, the positions of the sub-images 500 are along the directions X ′, Y ′, X′Y′1, and X ′. Schematic of Y'2 displacement. Specifically, in this embodiment, the distances that the sub-images 500 move in the direction X ′ and the direction Y ′ are 1 pixel width. The sub-images 500 are in the direction X′Y'1 or the direction X'Y. The distance moved on '2 is about 1.4 pixel width.

更詳細的說,在圖14A及14B中,其標記的數字標號1至9分別代表同一子影像於不同的時間下位於不同的位置標號。數字標號1代表的是子影像500沒有移動的位置。數字標號3、7代表的是子影像500在方向X’上向右或向左移動的位置。數字標號5、9代表的是子影像500在方向Y’上向下或向上移動的位置。數字標號2、6代表的是子影像500在方向X’Y’1上移動的位置。數字標號4、8代表的是子影像500在方向X’Y’2上移動的位置。In more detail, in Figs. 14A and 14B, the numerals 1 to 9 marked by them respectively represent the same sub-image located at different positions at different times. The numeral 1 represents a position where the sub-image 500 is not moved. Reference numerals 3 and 7 represent positions where the sub-image 500 moves to the right or left in the direction X '. The numerals 5 and 9 represent positions where the sub-image 500 moves downward or upward in the direction Y '. Reference numerals 2 and 6 represent positions where the sub-picture 500 moves in the direction X'Y'1. Reference numerals 4 and 8 represent positions where the sub-picture 500 moves in the direction X'Y'2.

圖14B中的數字標號1所代表的意思是在此時間區間內,這些子影像500在對應圖14A的數字標號1的位置上。同樣地,圖14B中的數字標號2至9所代表的意思是在各個不同時間區間內,這些子影像500在對應圖14A的數字標號2~9的位置上。The number 1 in FIG. 14B represents that the sub-images 500 are in positions corresponding to the number 1 in FIG. 14A during this time interval. Similarly, the numerals 2 to 9 in FIG. 14B represent that the sub-images 500 are at positions corresponding to the numerals 2 to 9 in FIG. 14A in different time intervals.

圖14B的縱軸對應到在不同的時間區間內,子影像500可沿著不同的方向移動(方向X’或/及方向Y’) 。舉例而言,當在數字標號為1時,其在方向X’及方向Y’對應的縱軸值皆為0,代表子影像500不往方向X’也不往方向Y’作動。當在數字標號為2時,其在方向X’及方向Y’對應的縱軸值皆為正,代表子影像500由位置1往方向X’和方向Y’之間的方向移動到位置2,也就是方向X’Y’1。當在數字標號為3時,其在方向X’對應的縱軸值為正及方向Y’對應的縱軸值為0,代表子影像500由位置1往方向X’作動到位置3。當在數字標號為4時,其在方向X’對應的縱軸值為正,在方向Y’對應的縱軸值為負,代表的是子影像500由位置1往方向X’和負的方向Y’向量合成的方向作動到位置4,也就是方向X’Y’的反方向。接續的數字標號以此類推,在此不再贅述。應注意的是,在此處僅為舉例這些子影像500可在方向X’、方向Y’方向X’Y’1或方向X’Y’2上移動的其中一種順序,本發明並不以此為限。另外,子影像500(實線方格)可以在圖14B移動至不同的九個位置(虛線方格),換言之,可以提高影像解析度至原先的九倍影像解析度。The vertical axis of FIG. 14B corresponds to that the sub-image 500 can be moved in different directions (direction X 'or / and direction Y') in different time intervals. For example, when the number label is 1, the vertical axis values corresponding to the directions X 'and Y' are both 0, which means that the sub-image 500 does not move in the direction X 'or Y'. When the number label is 2, the vertical axis values corresponding to the directions X 'and Y' are both positive, which means that the sub-image 500 moves from position 1 to the direction between the direction X 'and the direction Y' to position 2. That is the direction X'Y'1. When the numeral number is 3, the value of the vertical axis corresponding to the direction X 'is positive and the value of the vertical axis corresponding to the direction Y' is 0, which means that the sub-image 500 moves from position 1 to direction X 'to position 3. When the number label is 4, the vertical axis value corresponding to the direction X ′ is positive, and the vertical axis value corresponding to the direction Y ′ is negative, which represents the sub-image 500 from position 1 to the direction X ′ and the negative direction. The direction of the Y 'vector synthesis moves to position 4, which is the opposite direction of the direction X'Y'. The following numerical references are deduced by analogy, and are not repeated here. It should be noted that here is only an example of the order in which the sub-images 500 can be moved in the direction X ', the direction Y', the direction X'Y'1, or the direction X'Y'2. Limited. In addition, the sub-image 500 (solid line grid) can be moved to different nine positions (dotted line grid) in FIG. 14B. In other words, the image resolution can be increased to nine times the original image resolution.

圖15繪示本發明另一實施例之成像位移模組的結構立體示意圖。請參照圖15,在本實施例中,成像位移模組1000d與成像位移模組1000b主要的差異在於:本實施例的第一轉軸1610與第二轉軸1620具有一夾角。舉例而言,本實施例的夾角為45度,也就是說,本發明的範例實施例之第一轉軸1610與第二轉軸1620並不限定於兩者彼此互相垂直。FIG. 15 is a schematic structural perspective view of an imaging displacement module according to another embodiment of the present invention. Referring to FIG. 15, in this embodiment, the main difference between the imaging displacement module 1000d and the imaging displacement module 1000b is that the first rotation shaft 1610 and the second rotation shaft 1620 of this embodiment have an included angle. For example, the included angle of this embodiment is 45 degrees, that is, the first rotating shaft 1610 and the second rotating shaft 1620 of the exemplary embodiment of the present invention are not limited to the two being perpendicular to each other.

圖16A繪示本發明另一實施例之子影像的移動方向的概要示意圖。圖16B繪示圖16A實施例之子影像的成像位置的概要示意圖。請參照圖16A,具體來說,在本實施例中,當旋轉基座相對於第一轉軸或第二轉軸其中之一旋轉時,這些子影像的位置沿方向X”或方向Y”移動一距離。在本實施例中,此距離在沿方向X”時為1倍畫素寬度,沿方向Y”時為約1.1倍畫素寬度。因此,這些子影像由原先的位置(實線方格)可以擺動至四個不同的位置(虛線方格),換言之,可以提高影像解析度至原先的四倍影像解析度。16A is a schematic diagram illustrating a moving direction of a child image according to another embodiment of the present invention. FIG. 16B is a schematic diagram illustrating an imaging position of a child image in the embodiment of FIG. 16A. Please refer to FIG. 16A. Specifically, in this embodiment, when the rotation base is rotated with respect to one of the first rotation axis or the second rotation axis, the positions of these sub-images move a distance in the direction X ″ or the direction Y ″. . In this embodiment, this distance is 1 times the pixel width in the direction X ″ and about 1.1 times the pixel width in the direction Y ″. Therefore, these sub-images can be swung from their original positions (solid lines) to four different positions (dashed lines). In other words, the image resolution can be increased to four times the original image resolution.

圖17A繪示本發明一實施例之成像位移模組應用於投影鏡頭內部的立體示意圖。圖17B繪示本發明另一實施例之成像位移模組應用於投影鏡頭內部的立體示意圖。請同時參照圖17A以及圖17B,本發明之實施例的成像位移模組也可以置於投影鏡頭的內部或者投影鏡頭的前方,以使投射出的影像解析度提升為原先四倍的影像解析度。FIG. 17A is a schematic perspective view of an imaging displacement module applied to the inside of a projection lens according to an embodiment of the present invention. FIG. 17B is a schematic perspective view of an imaging displacement module applied to the inside of a projection lens according to another embodiment of the present invention. Please refer to FIG. 17A and FIG. 17B at the same time. The imaging displacement module according to the embodiment of the present invention may also be placed inside or in front of the projection lens, so that the projected image resolution is increased to four times the original image resolution. .

圖18A繪示本發明一實施例之成像位移模組的結構立體示意圖。圖18B繪示圖18A實施例之成像位移模組的第一彈性件的結構立體示意圖。圖18C繪示圖18A實施例之成像位移模組的第一彈性件之振幅與時間的關係圖。圖18D繪示用以驅動第一彈性件的訊號其振幅與時間的關係圖。FIG. 18A is a schematic structural perspective view of an imaging displacement module according to an embodiment of the present invention. FIG. 18B is a schematic structural perspective view of a first elastic member of the imaging displacement module in the embodiment of FIG. 18A. FIG. 18C is a graph showing the relationship between the amplitude and time of the first elastic member of the imaging displacement module of the embodiment of FIG. 18A. FIG. 18D illustrates the relationship between the amplitude and time of the signal used to drive the first elastic member.

圖18A的成像位移模組可以由前述實施例之敘述中獲致足夠的教示、建議與實施說明。因此,在圖18A中僅標示下列段落說明所需的元件符號,其他部分不再贅述。此外,由於本實施例中的第一彈性件對1310類似於第二彈性件對1320,因此下列段落係以第一彈性件對1310舉例來說明,第二彈性件對1320的操作方式可以此類推。The imaging displacement module of FIG. 18A can obtain sufficient teaching, suggestions, and implementation description from the description of the foregoing embodiment. Therefore, in FIG. 18A, only the component symbols required for the description in the following paragraphs are marked, and the other parts are not repeated. In addition, since the first elastic member pair 1310 in this embodiment is similar to the second elastic member pair 1320, the following paragraphs are described by taking the first elastic member pair 1310 as an example, and the operation manner of the second elastic member pair 1320 can be analogized .

請參照圖18A,舉例而言,在本實施例中,第一彈性件對1310包括第一彈性件1311以及第二彈性件1312。第一彈性件1311以及第二彈性件1312係以彼此垂直的方式沿著本實施例的成像位移模組1000e的第一轉軸1610設置,此配置方式可使第一轉軸1610通過光學元件部1500的軸心。Referring to FIG. 18A, for example, in this embodiment, the first elastic member pair 1310 includes a first elastic member 1311 and a second elastic member 1312. The first elastic member 1311 and the second elastic member 1312 are disposed along the first rotation axis 1610 of the imaging displacement module 1000e of this embodiment in a manner perpendicular to each other. This configuration allows the first rotation axis 1610 to pass through the optical element portion 1500. Axis.

一般來說,當第一彈性件1311的振幅由一方向轉換至另一方向時,其振幅轉換的過程所需的時間稱為轉換時間(transition time)T。轉換時間T的長短決定了子影像的顯示品質。由於轉換時間T與第一彈性件1311的自然頻率成反比,而自然頻率與第一彈性件1311的結構參數有關。因此前述所提到影響自然頻率的因素皆可為影響轉換時間T的因素。Generally, when the amplitude of the first elastic member 1311 is changed from one direction to another direction, the time required for the amplitude conversion process is referred to as the transition time T. The length of the transition time T determines the display quality of the sub-image. Since the conversion time T is inversely proportional to the natural frequency of the first elastic member 1311, the natural frequency is related to the structural parameters of the first elastic member 1311. Therefore, the aforementioned factors affecting the natural frequency can all be factors that affect the conversion time T.

請參照圖18B。承上述,轉換時間T與第一彈性件1311的結構參數有關。在本實施例中,第一彈性件1311的頸部寬度NW的結構參數例如是第一彈性件1311的寬度w的0.2倍至0.6倍。此外,第一彈性件1311的厚度t也是影響轉換時間T的一個原因。在一實施例中,第一彈性件1311的厚度t至少在0.2毫米(mm)以上。此厚度的設計可使第一彈性件1311的自然頻率至少大於90Hz。由於自然頻率與轉換時間T成反比,因此此厚度設計也可以有效地降低轉換時間T。Please refer to FIG. 18B. Following the above, the transition time T is related to the structural parameters of the first elastic member 1311. In this embodiment, the structural parameter of the neck width NW of the first elastic member 1311 is, for example, 0.2 to 0.6 times the width w of the first elastic member 1311. In addition, the thickness t of the first elastic member 1311 is also a factor that affects the switching time T. In one embodiment, the thickness t of the first elastic member 1311 is at least 0.2 millimeters (mm) or more. The thickness is designed so that the natural frequency of the first elastic member 1311 is at least greater than 90 Hz. Since the natural frequency is inversely proportional to the conversion time T, this thickness design can also effectively reduce the conversion time T.

除了前述所提到的第一彈性件1311的結構參數會影響轉換時間T之外,影響轉換時間T的因素還包括第一彈性件1311的振動方式。請同時參照圖18C以及圖18D,在本實施例中,藉由改變第一彈性件1311的振動方式以降低轉換時間T。具體而言,在第一彈性件1311的振幅由一方向轉為另一方向時,其驅動訊號波形如同圖18D所示。此外,驅動訊號波形也不僅限於如圖18D所示的方波形式驅動訊號,也可以是正弦波形式的驅動訊號波形。轉換時間T小於1毫秒,較佳範圍在1~0.05毫秒之間,使得光學裝置可提供良好的顯示品質。In addition to the aforementioned structural parameters of the first elastic member 1311 that affect the conversion time T, factors that affect the conversion time T include the vibration mode of the first elastic member 1311. Please refer to FIG. 18C and FIG. 18D at the same time. In this embodiment, the switching time T is reduced by changing the vibration mode of the first elastic member 1311. Specifically, when the amplitude of the first elastic member 1311 is changed from one direction to another direction, the driving signal waveform is as shown in FIG. 18D. In addition, the driving signal waveform is not limited to the driving signal in the form of a square wave as shown in FIG. 18D, but may also be the driving signal waveform in the form of a sine wave. The conversion time T is less than 1 millisecond, and the preferred range is between 1 and 0.05 milliseconds, so that the optical device can provide good display quality.

為了更了解前述實施例中所提到的成像位移模組的實際應用,下列段落提出多個範例實施例。圖19A與圖19B分別繪示應用本發明上述任一實施例的成像位移模組的不同三維列印裝置示意圖,而圖19C所示為由圖19A或圖19B的不同三維列印裝置所三維列印出的三維列印物件示意圖。在本應用範例實施例中,三維列印裝置例如藉由計算機輔助設計(Computer Aided Design,簡稱為CAD)或動畫模擬軟件等建構而成的立體模型的多層橫截面逐步製造出三維物件。請先參照圖19A,在本應用範例實施例中的三維列印裝置1900a所採用的三維列印技術例如是採用立體光固化成型法(Stereo Lithography,簡稱為SLA),三維列印裝置1900a包括成型槽1910、投影裝置1920、升降載台1930以及前述實施例所述及的任一的成像位移模組1940,其中三維列印裝置1900a用以形成三維列印物件OB,其中圖19A的三維列印裝置例如是下沉式的三維列印裝置1900a。In order to better understand the practical application of the imaging displacement module mentioned in the foregoing embodiments, the following paragraphs propose a plurality of exemplary embodiments. FIG. 19A and FIG. 19B are schematic diagrams of different three-dimensional printing apparatuses to which the imaging displacement module of any one of the above-mentioned embodiments of the present invention is applied, and FIG. 19C is a three-dimensional array of different three-dimensional printing apparatuses of FIG. 19A or 19B. Schematic diagram of printed 3D printed objects. In the embodiment of the present application example, the three-dimensional printing device gradually produces three-dimensional objects by using a multi-layered cross-section of a three-dimensional model constructed by computer aided design (Computer Aided Design, CAD for short) or animation simulation software. Please refer to FIG. 19A first. The three-dimensional printing technology used by the three-dimensional printing device 1900a in this application example is, for example, a stereo light curing molding method (Stereo Lithography, SLA for short). The slot 1910, the projection device 1920, the lifting stage 1930, and any of the imaging displacement modules 1940 described in the foregoing embodiments, wherein the three-dimensional printing device 1900a is used to form a three-dimensional printing object OB, and the three-dimensional printing of FIG. 19A The device is, for example, a sink-type three-dimensional printing device 1900a.

以下段落將對本應用範例實施例中的三維列印裝置1900a的各組件進行詳細地介紹。The following paragraphs will introduce the components of the three-dimensional printing device 1900a in this application example in detail.

成型槽1910用以容置光敏感材料1912,其中光敏感材料1912在具有特定波長的光束照射下,會產生光聚合反應而固化。投影裝置1920中具有發光元件,其所採用的發光元件可以是發光二極體(Light Emitting Diode,簡稱為LED)、雷射(Laser)或其他適用的發光元件,發光元件適於發出影像光束B,其中影像光束B可提供能固化光敏感材料1912的波段的光線(例如紫外線),但影像光束B的波段並不以此為限制,只要是能夠固化光敏感材料1912即可。升降載台1930具有列印區1932,且適於在成型槽1910內移動。此外,本應用範例實施例中的三維列印裝置1900a還包括控制器(未繪示)與輸入介面(未繪示),控制器與投影裝置1920、升降載台1930以及輸入介面電性連接,使用者可以通過輸入介面並通過電腦輔助設計(Computer Aided Design,簡稱為:CAD)或動畫建模軟體以輸入三維列印物件OB的三維實體模型。具體而言,輸入介面可以是滑鼠、鍵盤、觸控裝置或者是其他能夠使使用者輸入三維列印物件OB的三維實體模型的介面。控制器依據三維實體模型控制升降載台1930與影像光束B的作動方式。具體而言,控制器可以是計算器、微處理器(Micro Controller Unit, 簡稱為:MCU)、中央處理單元(Central Processing Unit,簡稱為:CPU),或是其他可程式化的控制器(Microprocessor)、數位信號處理器(Digital Signal Processor,簡稱為:DSP)、可程式化控制器、專用積體電路(Application Specific Integrated Circuits,簡稱為:ASIC)、可程式化邏輯裝置(Programmable Logic Device,簡稱為:PLD)或其他類似裝置。在本應用範例實施例中,成像位移模組1940配置於投影裝置1920的外部,且成像位移模組1940配置於影像光束B的路徑上,在其他的應用範例實施例中,成像位移模組1940可以配置於投影裝置1920內,只要成像位移模組1940配置在影像光束B的路徑上即可,成像位移模組1940配置的位置並不以此為限。The molding groove 1910 is used to receive a light-sensitive material 1912. The light-sensitive material 1912 is cured by a photopolymerization reaction under the irradiation of a light beam with a specific wavelength. The projection device 1920 has a light-emitting element. The light-emitting element used in the projection device 1920 can be a light emitting diode (LED), a laser, or other applicable light-emitting elements. The light-emitting element is suitable for emitting an image beam B. The image beam B can provide light (such as ultraviolet rays) that can cure the light-sensitive material 1912, but the wavelength of the image beam B is not limited as long as it can cure the light-sensitive material 1912. The elevating stage 1930 has a printing area 1932 and is suitable for moving in the forming groove 1910. In addition, the three-dimensional printing device 1900a in this application example embodiment further includes a controller (not shown) and an input interface (not shown). The controller is electrically connected to the projection device 1920, the lifting platform 1930, and the input interface. The user can input the three-dimensional solid model of the three-dimensional printing object OB through an input interface and computer-aided design (Computer Aided Design, abbreviated as: CAD) or animation modeling software. Specifically, the input interface may be a mouse, a keyboard, a touch device, or another interface that enables a user to input a three-dimensional solid model of the three-dimensional printing object OB. The controller controls the operation mode of the lifting stage 1930 and the image beam B according to the three-dimensional solid model. Specifically, the controller may be a calculator, a microprocessor (Micro Controller Unit (abbreviated as: MCU)), a central processing unit (Central Processing Unit (abbreviated as: CPU)), or other programmable controller (Microprocessor ), Digital Signal Processor (DSP), Programmable Controller, Application Specific Integrated Circuits (ASIC), Programmable Logic Device (Programmable Logic Device) For: PLD) or other similar devices. In this application example embodiment, the imaging displacement module 1940 is disposed outside the projection device 1920, and the imaging displacement module 1940 is disposed on the path of the image beam B. In other application example embodiments, the imaging displacement module 1940 It can be disposed in the projection device 1920 as long as the imaging displacement module 1940 is disposed on the path of the image beam B, and the position of the imaging displacement module 1940 is not limited to this.

接下來介紹光固化成型的三維列印製程,其製程大致如下:首先,利用電腦輔助設計(Computer Aided Design,簡稱為:CAD)設計出三維實體模型,利用離散程式將三維實體模型進行切片處理,進而得到多個分層的掃描路徑。接著,依據各個切層的掃描路徑精確控制影像光束B和升降載台1930的運動。由圖19A可看出列印區1932浸入於光敏感材料1912中,影像光束B按第一切層的掃描路徑照射到部分光敏感材料1912,此部分光敏感材料1912產生光聚合反應而固化,生成出三維列印物件OB的其中一個截面,進而得到第一固化層附著於列印區1932上。之後,升降載台1930向下移動少許距離,且原先形成的第一固化層對應向下移動少許距離,而原先形成的第一固化層的上表面可以當作承載面,使第一固化層上覆蓋另一層光敏感材料1912,再依據第二切層的掃描路徑精確控制影像光束B,使影像光束B按第二切層的掃描路徑照射到另一層光敏感材料1912的表面,進而得到第二固化層,依照這樣的模式不斷製作多層後可形成如圖19C所繪示的三維列印物件OB。應注意的是,圖19C所繪示的三維列印物件OB的形狀僅為舉例,三維列印物件OB的形狀並不以此為限。Next, the three-dimensional printing process of light curing molding is introduced. The process is as follows: First, use computer aided design (CAD) to design a three-dimensional solid model, and use a discrete program to slice the three-dimensional solid model. Furthermore, multiple hierarchical scanning paths are obtained. Then, the movement of the image beam B and the lifting stage 1930 is precisely controlled according to the scanning path of each slice. It can be seen from FIG. 19A that the printing area 1932 is immersed in the light-sensitive material 1912, and the image beam B is irradiated to a part of the light-sensitive material 1912 according to the scanning path of the first slicing layer. This part of the light-sensitive material 1912 is cured by photopolymerization. One section of the three-dimensional printed object OB is generated, and then a first cured layer is attached to the printing area 1932. After that, the lifting stage 1930 moves down a little distance, and the first solidified layer originally formed corresponds to a little downward movement, and the upper surface of the originally formed first solidified layer can be used as a bearing surface, so that the first solidified layer can be placed on the first solidified layer. Cover another layer of light-sensitive material 1912, and then precisely control the image beam B according to the scanning path of the second slice layer, so that the image beam B is irradiated to the surface of the other layer of light-sensitive material 1912 according to the scanning path of the second slice layer, thereby obtaining a second layer After the solidified layer is continuously produced in multiple layers according to such a pattern, a three-dimensional printing object OB as shown in FIG. 19C can be formed. It should be noted that the shape of the three-dimensional printing object OB shown in FIG. 19C is merely an example, and the shape of the three-dimensional printing object OB is not limited thereto.

請參照圖19B,圖19B繪示應用本發明上述實施例的成像位移模組的另一種三維列印裝置示意圖,請先參照圖19B,圖19B所示的三維列印裝置1900b類似於圖19A所示的三維列印裝置1900a,其主要差異在於:成型槽1910的材料包括透明材料或透光材料,且升降載台1930與投影裝置1920分別配置於成型槽1910的相對兩側,其中圖19B的三維列印裝置1900b例如是上拉式的三維列印裝置1900b。由於成型槽1910的材料包括透明材料或透光材料,因此影像光束B可以通過成型槽1910照射光敏感材料1912。當進行三維列印時,影像光束B按第一切層的掃描路徑照射到部分光敏感材料1912,此部分光敏感材料1912產生光聚合反應而固化,生成出三維列印物件OB的其中一個截面,進而得到第一固化層附著于列印區1932上。之後,升降載台1930向上移動少許距離,且原先形成的第一固化層對應向上移動少許距離,而原先形成的第一固化層的下表面可以當作承載面,以使第一固化層的下表面覆蓋另一層光敏感材料1912再依據第二切層的掃描路徑精確控制影像光束B,使影像光束B按第二切層的掃描路徑照射到另一層光敏感材料1912的表面,進而得到第二固化層,依照這樣的模式不斷製作多層後可形成如圖19C所繪示的三維列印物件OB。Please refer to FIG. 19B. FIG. 19B is a schematic diagram of another three-dimensional printing apparatus using the imaging displacement module of the above embodiment of the present invention. Please refer to FIG. 19B first. The three-dimensional printing apparatus 1900b shown in FIG. 19B is similar to that shown in FIG. 19A. The main difference between the three-dimensional printing device 1900a shown is that the material of the forming groove 1910 includes a transparent material or a light-transmitting material, and the lifting stage 1930 and the projection device 1920 are disposed on opposite sides of the forming groove 1910, respectively, of which FIG. 19B The three-dimensional printing device 1900b is, for example, a pull-up type three-dimensional printing device 1900b. Since the material of the molding groove 1910 includes a transparent material or a light-transmitting material, the image beam B can illuminate the light-sensitive material 1912 through the molding groove 1910. When performing three-dimensional printing, the image beam B is irradiated to a portion of the light-sensitive material 1912 according to the scanning path of the first slicing layer. This portion of the light-sensitive material 1912 undergoes photopolymerization and solidifies to generate one of the sections of the three-dimensional printed object OB , And then the first cured layer is attached to the printing area 1932. After that, the lifting stage 1930 is moved upward a little distance, and the originally formed first cured layer is moved upward a little distance, and the lower surface of the originally formed first cured layer can be used as a bearing surface, so that the lower part of the first cured layer The surface is covered with another layer of light-sensitive material 1912, and the image beam B is precisely controlled according to the scanning path of the second slice layer, so that the image beam B is irradiated to the surface of the other layer of light-sensitive material 1912 according to the scanning path of the second slice layer, and then a second After the solidified layer is continuously produced in multiple layers according to such a pattern, a three-dimensional printing object OB as shown in FIG. 19C can be formed.

請同時參照圖19A與圖19B,由於成像位移模組1940配置在影像光束B的路徑上,影像光束B經由成像位移模組1940後,在不同的時間下,影像光束B會投射至不同的位置,詳言之,圖19A與圖19B所繪示的實線,是影像光束B在某一時刻下,影像光束B所投射的位置;而圖19A與圖19B所繪示的虛線,則是影像光束B在另一時刻下,影像光束B所投射的位置。成像位移模組1940的細部的作動方式可以由前述實施例的敍述中獲致足夠的教示、建議與實施說明,在此不再贅述。因此,由於本應用範例實施例的三維列印裝置1900a與1900b具有前述任一實施例所提到的成像位移模組1940,可以使投影裝置1920所投射出的影像光束B的像素提高,以使三維列印裝置1900a與1900b固化光敏感材料1912時能夠獲得更高的解析度,進而使得三維列印物件OB具有更佳的表面精度。Please refer to FIGS. 19A and 19B at the same time. Since the imaging displacement module 1940 is arranged on the path of the image beam B, after the image beam B passes the imaging displacement module 1940, the image beam B will be projected to different positions at different times. In detail, the solid lines shown in FIGS. 19A and 19B are the positions where the image beam B is projected at a certain time; and the dotted lines shown in FIGS. 19A and 19B are the images. The position where the image beam B is projected at another moment of the beam B. The detailed operation method of the imaging displacement module 1940 can be obtained from the description of the foregoing embodiments with sufficient teaching, suggestions, and implementation description, and will not be repeated here. Therefore, since the three-dimensional printing devices 1900a and 1900b of this application example embodiment have the imaging displacement module 1940 mentioned in any of the foregoing embodiments, the pixels of the image beam B projected by the projection device 1920 can be increased so that The three-dimensional printing devices 1900a and 1900b can obtain higher resolution when curing the light-sensitive material 1912, so that the three-dimensional printing object OB has better surface accuracy.

綜上所述,在本發明的範例實施例的光路調整結構中,由於第一彈簧與第二彈簧分別連接於位於旋轉基座對角位置的第一區域以及第二區域,旋轉基座透過上述彈簧之間的彈性力進行旋轉的做動方式。當影像光束經過旋轉基座上的光學元件時,影像光束的光路會因為光學元件被旋轉基座所帶動而被光學元件所改變。由於影像光束的光路會被本發明實施例的光路調整結構所改變,因此應用本發明實施例的光路調整結構的三維列印裝置能夠使影像光束所形成的影像畫面的像素提高,進而使三維列印裝置所列印出的三維列印物件具有更佳的表面精度。In summary, in the light path adjustment structure of the exemplary embodiment of the present invention, since the first spring and the second spring are respectively connected to the first region and the second region at the diagonal positions of the rotating base, the rotating base passes through the above The elastic force between the springs rotates. When the image beam passes through the optical element on the rotating base, the optical path of the image beam will be changed by the optical element because the optical element is driven by the rotating base. Since the optical path of the image beam is changed by the optical path adjustment structure of the embodiment of the present invention, the three-dimensional printing device applying the optical path adjustment structure of the embodiment of the present invention can increase the pixels of the image frame formed by the image beam, and further make the three-dimensional array The three-dimensional printed objects printed by the printing device have better surface accuracy.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed as above with the examples, it is not intended to limit the present invention. Any person with ordinary knowledge in the technical field can make some modifications and retouching without departing from the spirit and scope of the present invention. The protection scope of the present invention shall be determined by the scope of the attached patent application.

100、200‧‧‧光學裝置
110、210‧‧‧照明系統
112、212‧‧‧光源
114、214‧‧‧光束
114a、214a、500‧‧‧子影像
116、216‧‧‧色輪
117、217‧‧‧集光柱
118、218‧‧‧鏡片組
119‧‧‧內部全反射稜鏡
120‧‧‧數位微鏡裝置
130、230‧‧‧投影鏡頭
140‧‧‧振動機構
219‧‧‧稜鏡
220‧‧‧反射式光閥
240、1000a、1000b、1000c、1000d、1000e、1940‧‧‧成像位移模組
242、246‧‧‧第一振動機構
242a、244a、322‧‧‧光學元件部
244‧‧‧第二振動機構
240‧‧‧成像位移模組
410、1100‧‧‧承載基座
412‧‧‧磁性材料座
414a、414b、M1、M2、M3、M4、M5、M6‧‧‧磁性材料
420、1200‧‧‧旋轉基座
422‧‧‧光學元件部
424‧‧‧承載座
426、C1、C2、C3、C4、C5、C6‧‧‧線圈模組
426a‧‧‧線圈座
426b‧‧‧線圈
428‧‧‧轉軸
430‧‧‧軸線
432‧‧‧孔洞
400‧‧‧螢幕
1110‧‧‧第一承載框
1120‧‧‧第二承載框
1300‧‧‧彈性件
1310‧‧‧第一彈性件對
1311‧‧‧第一彈性件
1312‧‧‧第二彈性件
1320‧‧‧第二彈性件對
1400‧‧‧致動組件
1410‧‧‧第一致動組件
1420‧‧‧第二致動組件
1500‧‧‧光學元件部
1610‧‧‧第一轉軸
1620‧‧‧第二轉軸
1900a、1900b‧‧‧三維列印裝置
1910‧‧‧成型槽
1912‧‧‧光敏感材料
1920‧‧‧投影裝置
1930‧‧‧升降載台
1932‧‧‧列印區
X‧‧‧第一方向
Y‧‧‧第二方向
XY1‧‧‧第三方向
XY2‧‧‧第四方向
Z‧‧‧第五方向
X’、Y’、X’Y’1、X’Y’2、X”、Y”‧‧‧方向
S‧‧‧參考平面
w‧‧‧寬度
NW‧‧‧頸部寬度
t‧‧‧厚度
B‧‧‧影像光束
OB‧‧‧三維列印物件
100, 200‧‧‧ optical devices
110, 210‧‧‧ lighting system
112, 212‧‧‧light source
114, 214‧‧‧beams
114a, 214a, 500‧‧‧ sub-images
116, 216‧‧‧ color wheel
117, 217‧‧‧light beam
118, 218‧‧‧ lens group
119‧‧‧ Internal total reflection 稜鏡
120‧‧‧Digital Micromirror Device
130, 230‧‧‧ projection lens
140‧‧‧Vibration mechanism
219‧‧‧ 稜鏡
220‧‧‧Reflective light valve
240, 1000a, 1000b, 1000c, 1000d, 1000e, 1940‧‧‧ imaging displacement module
242, 246‧‧‧The first vibration mechanism
242a, 244a, 322‧‧‧Optical Element Division
244‧‧‧Second vibration mechanism
240‧‧‧ imaging displacement module
410, 1100‧‧‧bearing base
412‧‧‧magnetic material holder
414a, 414b, M1, M2, M3, M4, M5, M6‧‧‧ magnetic materials
420, 1200‧‧‧Swivel base
422‧‧‧Optical Element Division
424‧‧‧bearing seat
426, C1, C2, C3, C4, C5, C6‧‧‧ Coil modules
426a‧‧‧coil seat
426b‧‧‧coil
428‧‧‧Shaft
430‧‧‧ axis
432‧‧‧hole
400‧‧‧screen
1110‧‧‧ the first bearing frame
1120‧‧‧Second loading frame
1300‧‧‧Elastic piece
1310‧‧‧ the first pair of elastic members
1311‧‧‧First elastic member
1312‧‧‧Second elastic member
1320‧‧‧Second elastic pair
1400‧‧‧actuating assembly
1410‧‧‧First Actuator
1420‧‧‧Second Actuating Assembly
1500‧‧‧Optical Element Division
1610‧‧‧First shaft
1620‧‧‧Second shaft
1900a, 1900b‧‧‧3D printing device
1910‧‧‧Forming groove
1912‧‧‧ Light Sensitive Materials
1920‧‧‧ projection device
1930‧‧‧ Lifting platform
1932‧‧‧Printing Area
X‧‧‧ first direction
Y‧‧‧ second direction
XY1‧‧‧third direction
XY2‧‧‧Fourth direction
Z‧‧‧ fifth direction
X ', Y', X'Y'1, X'Y'2, X ", Y" ‧‧‧ directions
S‧‧‧ reference plane
w‧‧‧ width
NW‧‧‧Neck width
t‧‧‧ thickness
B‧‧‧Image Beam
OB‧‧‧3D Printing Object

圖1為一種光學裝置的結構示意圖。 圖2繪示本發明一實施例所述之光學裝置的結構示意圖。 圖3繪示本發明一實施例之光學裝置的成像示意圖。 圖4繪示本發明一實施例之成像位移模組的結構示意圖。 圖5繪示本發明圖4實施例之沿D-D虛線方向的剖面側視圖。 圖6繪示本發明圖4實施例之沿A-A虛線方向的剖面側視圖。 圖7繪示本發明另一實施例之成像位移模組的結構示意圖。 圖8繪示本發明圖7實施例之沿D-D虛線方向的剖面側視圖。 圖9繪示本發明圖7之沿A-A虛線方向的剖面側視圖。 圖10A、圖11A、圖12A分別繪示本發明不同實施例之成像位移模組的結構示意圖。 圖10B、圖11B、圖12B分別繪示圖10A、圖11A、圖12A實施例之成像位移模組的上視圖。 圖10C、圖11C、圖12C分別繪示圖10A、圖11A、圖12A實施例之成像位移模組的剖面側視圖。 圖13A繪示本發明一實施例之子影像移動方向概要示意圖。 圖13B和圖13C繪示圖13A實施例之子影像的成像位移結果的概要示意圖。 圖14A繪示本發明另一實施例之子影像的移動方向和成像位置的概要示意圖。 圖14B繪示圖14A實施例之旋轉基座在一圖框時間中相對不同方向旋轉時,其子影像的成像位置的概要對照圖。 圖15繪示本發明另一實施例之成像位移模組的結構立體示意圖。 圖16A繪示本發明另一實施例之子影像的移動方向的概要示意圖。 圖16B繪示圖16A實施例之子影像成像位置概要示意圖。 圖17A繪示本發明一實施例之成像位移模組應用於投影鏡頭內部的立體示意圖。 圖17B繪示本發明另一實施例之成像位移模組應用於投影鏡頭內部的立體示意圖。 圖18A繪示本發明一實施例成像位移模組結構立體示意圖。 圖18B繪示圖18A實施例之成像位移模組的第一彈性件的結構立體示意圖。 圖18C繪示圖18A實施例之成像位移模組的第一彈性件其振幅與時間的關係圖。 圖18D繪示第一彈性件其振幅與時間的關係圖。 圖19A與圖19B分別繪示應用本發明上述任一實施例的成像位移模組的不同三維列印裝置示意圖。 圖19C繪示由圖19A或圖19B的不同三維列印裝置所三維列印出的三維列印物件示意圖。FIG. 1 is a schematic structural diagram of an optical device. FIG. 2 is a schematic structural diagram of an optical device according to an embodiment of the present invention. FIG. 3 illustrates an imaging schematic diagram of an optical device according to an embodiment of the invention. FIG. 4 is a schematic structural diagram of an imaging displacement module according to an embodiment of the present invention. FIG. 5 is a cross-sectional side view of the embodiment of FIG. 4 along the D-D dashed line. Fig. 6 is a cross-sectional side view of the embodiment of Fig. 4 in the direction of the dashed line A-A. FIG. 7 is a schematic structural diagram of an imaging displacement module according to another embodiment of the present invention. FIG. 8 is a cross-sectional side view of the embodiment of FIG. 7 along the D-D dashed line. FIG. 9 is a cross-sectional side view taken along the line A-A of FIG. 7 according to the present invention. FIG. 10A, FIG. 11A, and FIG. 12A are schematic structural diagrams of imaging displacement modules according to different embodiments of the present invention, respectively. FIG. 10B, FIG. 11B, and FIG. 12B are top views of the imaging displacement module according to the embodiments of FIG. 10A, FIG. 11A, and FIG. 12A, respectively. 10C, FIG. 11C, and FIG. 12C are cross-sectional side views of the imaging displacement module according to the embodiments of FIG. 10A, FIG. 11A, and FIG. 12A, respectively. FIG. 13A is a schematic diagram illustrating a moving direction of a child image according to an embodiment of the present invention. FIG. 13B and FIG. 13C are schematic diagrams showing the imaging displacement results of the child images in the embodiment of FIG. 13A. 14A is a schematic diagram illustrating a moving direction and an imaging position of a child image according to another embodiment of the present invention. FIG. 14B is a schematic comparison diagram of the imaging positions of the sub-images when the rotating base of the embodiment of FIG. 14A is rotated in different directions in a frame time. FIG. 15 is a schematic structural perspective view of an imaging displacement module according to another embodiment of the present invention. 16A is a schematic diagram illustrating a moving direction of a child image according to another embodiment of the present invention. FIG. 16B is a schematic diagram illustrating a sub-image imaging position of the embodiment in FIG. 16A. FIG. 17A is a schematic perspective view of an imaging displacement module applied to the inside of a projection lens according to an embodiment of the present invention. FIG. 17B is a schematic perspective view of an imaging displacement module applied to the inside of a projection lens according to another embodiment of the present invention. FIG. 18A is a schematic perspective view showing the structure of an imaging displacement module according to an embodiment of the present invention. FIG. 18B is a schematic structural perspective view of a first elastic member of the imaging displacement module in the embodiment of FIG. 18A. FIG. 18C is a diagram showing the relationship between the amplitude and time of the first elastic member of the imaging displacement module of the embodiment of FIG. 18A. FIG. 18D illustrates the relationship between the amplitude and time of the first elastic member. 19A and 19B are schematic diagrams of different three-dimensional printing apparatuses to which the imaging displacement module of any one of the above embodiments of the present invention is applied, respectively. FIG. 19C is a schematic diagram of a three-dimensional printing object three-dimensionally printed by different three-dimensional printing devices of FIG. 19A or 19B.

1000a‧‧‧成像位移模組 1000a‧‧‧ imaging displacement module

1100‧‧‧承載基座 1100‧‧‧bearing base

1110‧‧‧第一承載框 1110‧‧‧ the first bearing frame

1120‧‧‧第二承載框 1120‧‧‧Second loading frame

1200‧‧‧旋轉基座 1200‧‧‧Swivel base

1300‧‧‧彈性件 1300‧‧‧Elastic piece

1310‧‧‧第一彈性件對 1310‧‧‧ the first pair of elastic members

1320‧‧‧第二彈性件對 1320‧‧‧Second elastic pair

1400‧‧‧致動組件 1400‧‧‧actuating assembly

1410‧‧‧第一致動組件 1410‧‧‧First Actuator

1420‧‧‧第二致動組件 1420‧‧‧Second Actuating Assembly

1500‧‧‧光學元件部 1500‧‧‧Optical Element Division

1610‧‧‧第一轉軸 1610‧‧‧First shaft

1620‧‧‧第二轉軸 1620‧‧‧Second shaft

M1~M4‧‧‧磁性材料 M1 ~ M4‧‧‧ Magnetic material

C1~C3‧‧‧線圈模組 C1 ~ C3‧‧‧ Coil Module

X‧‧‧第一方向 X‧‧‧ first direction

Y‧‧‧第二方向 Y‧‧‧ second direction

Claims (10)

一種光路調整機構,包括:一旋轉基座,設有對角位置的一第一區域與一第二區域;一光學元件,設於該旋轉基座內;一線圈,圍繞該旋轉基座的外圍;一第一彈簧,該第一彈簧的一端連接該旋轉基座的該第一區域;以及一第二彈簧,該第二彈簧的一端連接該旋轉基座的該第二區域。 An optical path adjusting mechanism includes: a rotating base provided with a first area and a second area at diagonal positions; an optical element provided in the rotating base; and a coil surrounding the periphery of the rotating base A first spring, one end of which is connected to the first region of the rotating base; and a second spring, one end of which is connected to the second region of the rotating base. 如申請專利範圍第1項所述之光路調整機構,其中該第一彈簧在該一端和另一端之間設有一第一平面,該第二彈簧在該一端和另一端之間設有一第二平面,且該第一彈簧的該第一平面不平行於該第二彈簧的該第二平面。 The light path adjusting mechanism according to item 1 of the scope of patent application, wherein the first spring is provided with a first plane between the one end and the other end, and the second spring is provided with a second plane between the one end and the other end And the first plane of the first spring is not parallel to the second plane of the second spring. 如申請專利範圍第1項所述之光路調整機構,其中該旋轉基座和該光學元件為一體成型。 The light path adjusting mechanism according to item 1 of the scope of patent application, wherein the rotating base and the optical element are integrally formed. 一種光路調整機構,包括:一基座;一框架,設有對角位置的一第一區域與一第二區域;一光學元件,設於該框架內;一第一彈簧,設有一第一端與一第二端,該第一端連接該框架的該第一區域,該第二端連接該基座的一端,且該第一彈簧在該第一端與該第二端之間設有一第一平面;以及 一第二彈簧,設有一第三端與一第四端,該第三端連接該框架的該第二區域,該第四端連接該基座的另一端,且該第二彈簧在該第三端與該第四端之間設有一第二平面。 An optical path adjustment mechanism includes: a base; a frame provided with a first region and a second region at diagonal positions; an optical element provided in the frame; a first spring provided with a first end And a second end, the first end is connected to the first region of the frame, the second end is connected to one end of the base, and the first spring is provided with a first between the first end and the second end A plane; and A second spring is provided with a third end and a fourth end, the third end is connected to the second region of the frame, the fourth end is connected to the other end of the base, and the second spring is in the third A second plane is disposed between the end and the fourth end. 如申請專利範圍第4項所述之光路調整機構,其中該框架和該光學元件為一體成型。 The light path adjusting mechanism according to item 4 of the scope of patent application, wherein the frame and the optical element are integrally formed. 如申請專利範圍第1至5項任一項所述之光路調整機構,其中該第一彈簧為一薄金屬,該第二彈簧為一薄金屬。 The light path adjusting mechanism according to any one of claims 1 to 5, wherein the first spring is a thin metal and the second spring is a thin metal. 如申請專利範圍第1至5項任一項所述之光路調整機構,其中該光學元件包括一反射片或一透鏡。 The light path adjusting mechanism according to any one of claims 1 to 5, wherein the optical element includes a reflection sheet or a lens. 如申請專利範圍第1至5項任一項所述之光路調整機構,可用於一光學裝置,其中該光學裝置還包含一內部全反射稜鏡。 The light path adjusting mechanism according to any one of claims 1 to 5 of the patent application scope can be used in an optical device, wherein the optical device further includes an internal total reflection chirp. 如申請專利範圍第1至5項任一項所述之光路調整機構,可用於一光學裝置,其中該光學裝置還包含一光閥,該光閥垂直該光學元件。 The light path adjusting mechanism according to any one of claims 1 to 5 of the scope of patent application can be used in an optical device, wherein the optical device further includes a light valve, the light valve is perpendicular to the optical element. 如申請專利範圍第1至3項任一項所述之光路調整機構,可用於一光學裝置,其中該光學裝置還包含一光閥,該光閥的法線與該旋轉基座轉軸的夾角約為45度。The light path adjusting mechanism according to any one of the claims 1 to 3 can be used in an optical device, wherein the optical device further includes a light valve, and the angle between the normal of the light valve and the rotation axis of the rotating base is about 45 degrees.
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