JP2010036537A - Photo-fabricating apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a photo-fabricating apparatus capable of forming a solid molded object with favorable accuracy by curing a photo-curable resin quickly and exactly in spite of a depth of light in a resin bath. <P>SOLUTION: The photo-fabrication apparatus 100 is provided with the first optical system 110 and the second optical system 120 which emits light from different directions into a resin bath 101 in which the photo-curable resin 102 is stored. The first optical system 110 is constituted of two first photo-irradiating mechanisms 110a and 110b facing each other via the resin bath 101. In these, the first photo-irradiating mechanisms 110a and 110b are provided with MEMS mirrors 112a and 112b. The second optical system 120 is constituted of two second photo-irradiating mechanism 120a and 120b a facing each other through the resin bath 101. The photo-fabrication apparatus 100 molds a solid article W by curing a photo-curable resin 102 while displacing a crossing point P of the light emitted from the first optical system 110 and the second optical system 120. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to an optical modeling apparatus that models a desired three-dimensional model using a photocurable resin that is cured by irradiation with light.

Conventionally, a so-called optical modeling apparatus for manufacturing a desired three-dimensional (three-dimensional) shaped object (hereinafter referred to as “three-dimensional object”) using a photocurable resin that is cured by irradiation with light such as ultraviolet rays. It has been known. The optical modeling apparatus is mainly a free liquid surface method in which a three-dimensional model is modeled upward on a stage that supports the three-dimensional model in a resin tank in which a photocurable resin is stored (see Patent Document 1 below). And a regulated liquid level system (see Patent Document 2 below) in which a three-dimensional model is modeled toward the lower side of the stage in the resin tank.
JP 2006-297953 A JP 2003-39564 A

  However, in these stereolithography apparatuses, problems in modeling accuracy due to each modeling method have been pointed out. Specifically, in the free liquid level method, the surface (liquid level) of the photocurable resin is cured to form a three-dimensional modeled object, so that the smoothness of the surface of the photocurable resin stored in the resin tank is If it is damaged, the modeling accuracy of the three-dimensional model is remarkably lowered. Further, in the regulated liquid surface method, since the three-dimensional object is formed at the bottom of the resin tank in which the photocurable resin is stored, the three-dimensional object that is fixedly attached to the bottom of the resin tank or the transparent film disposed on the bottom is formed. The modeling accuracy of the three-dimensional model may be reduced by peeling off the model.

Therefore, in order to avoid the problems caused by each modeling method such as the free liquid level method and the regulated liquid level method, for example, in Patent Document 3 below, a resin tank storing a photocurable resin is mutually connected. There has been proposed an optical modeling apparatus that forms a three-dimensional object by irradiating light from two different directions and displacing the intersection of these two lights in a resin tank.
JP-A-63-251227

  However, in the above-described stereolithography apparatus, since the intensity (light quantity) of light irradiated into the resin tank attenuates as it travels through the resin tank, the photo-curing resin depends on the depth of light in the resin tank. There is a problem that it becomes difficult to cure and the modeling time of the three-dimensional model increases, and the modeling accuracy may decrease.

  The present invention has been made to address the above-described problem, and an object thereof is an optical modeling apparatus for modeling a three-dimensional modeled object by displacing an intersection of at least two lights in a resin tank storing a photocurable resin. Another object of the present invention is to provide an optical modeling apparatus capable of accurately and accurately modeling a three-dimensional model by quickly and accurately curing a photocurable resin regardless of the depth of light in a resin tank.

  In order to achieve the above object, a feature of the invention according to claim 1 is that a resin tank that stores a photocurable resin that is cured by irradiating a predetermined amount of light, and a resin tank that contains less than the predetermined amount of light. A first optical system for irradiating a light amount of light, a second optical system for irradiating a light amount of light less than the predetermined light amount into the resin tank from a direction different from the first optical system, and a first optical system An intersection displacing means for displacing the resin tank relative to the intersection of the light irradiated from the system and the light irradiated from the second optical system, and irradiated from the first optical system In an optical modeling apparatus that forms a three-dimensional model by curing a photocurable resin with light at an intersection of light and light irradiated from the second optical system, the first optical system is light in a resin tank. One first optical system light irradiating means for irradiating and the one first optical system via a resin tank The amount of light emitted from the one first optical system light irradiating means is provided by facing at least a part of the light emitted from the same first optical system light irradiating means. And the other first optical system light irradiating means for irradiating the light for making it constant.

  According to the feature of the invention according to claim 1 configured as described above, the optical modeling apparatus includes a first optical system that irradiates light from different directions in the resin tank in which the photocurable resin is stored, and a second optical system. It is equipped with the optical system. And among these 1st optical systems and 2nd optical systems, the 1st optical system is comprised by two 1st optical system light irradiation means in the state which mutually opposed through the resin tank. That is, the first optical system emits light from both sides of the resin tank. Thereby, the light of the light quantity required in order to harden photocurable resin in the whole region on the optical axis of the 1st optical system in a resin tank can be ensured substantially equally. As a result, regardless of the depth of light in the resin tank, the photo-curing resin can be quickly and accurately cured to accurately model the three-dimensional structure.

  According to a second aspect of the present invention, in the optical modeling apparatus, the second optical system further includes a second optical system light irradiation unit that irradiates light into the resin tank, and a resin tank. The second optical system light irradiation means is provided opposite to the one second optical system light irradiation means and overlaps at least a part of the light emitted from the same second optical system light irradiation means. And the other second optical system light irradiating means for irradiating light for making the amount of light emitted from the means constant.

  According to the characteristic of the invention which concerns on Claim 2 comprised in this way WHEREIN: Furthermore, in the said optical modeling apparatus, a 2nd optical system is two 2nd optical system light irradiation in the state which mutually opposed through the resin tank Consists of means. That is, in addition to the first optical system, the second optical system emits light from both sides of the resin tank. Thereby, the light quantity of light required in order to harden photocurable resin in the whole region on each optical axis of the 1st optical system and 2nd optical system in a resin tank can be ensured substantially equally. As a result, regardless of the depth of light in the resin tank, the photocurable resin can be cured quickly and accurately, and the three-dimensional modeled object can be modeled more accurately.

  According to a third aspect of the present invention, in the optical modeling apparatus, the optical axis of the one first light irradiation means and the optical axis of the other first light irradiation means in the first optical system coincide with each other. And / or the optical axis of the one second optical system light irradiation means in the second optical system and the optical axis of the other second optical system light irradiation means coincide.

  According to the characteristic of the invention concerning Claim 3 comprised in this way, in a 1st optical system and / or a 2nd optical system, both 1st optical system light irradiation means and / or both 2nd optical system light irradiation Each optical axis of the means is coincident. According to this, for example, when the optical axes of both the first optical system light irradiating means coincide with each other, the optical axis of one of the first optical system light irradiating means and the other of the first optical system irradiating means. With the optical axis, the amount of light is always substantially constant throughout the entire optical axis. That is, it is not necessary to control the light emitted from one of the first optical system light irradiating means and the light emitted from the other first optical system irradiating means. As a result, the configuration of the optical modeling apparatus can be simplified and a three-dimensional model can be accurately modeled.

  The invention according to claim 4 is characterized in that, in the optical modeling apparatus, each first optical system light irradiation means in the first optical system and / or each second optical system light irradiation means in the second optical system. Is composed of MEMS mirrors.

  According to the feature of the invention according to claim 4 configured as described above, both the first optical system light irradiation means of the first optical system and / or both the second optical system light irradiation means of the second optical system include: It consists of a MEMS (Micro Electro Mechanical System) mirror. As a result, the first optical system and / or the second optical system can be reduced in size as compared with the case where other mirror devices (for example, DMD (Digital Micromirror Device) or galvanometer mirror) are used, It is possible to save power, reduce noise, and reduce vibration of the optical modeling apparatus.

  Hereinafter, an embodiment of an optical modeling apparatus according to the present invention will be described with reference to the drawings. FIG. 1 is a schematic configuration diagram schematically showing the overall configuration of an optical modeling apparatus 100 according to the present invention. Note that each drawing referred to in the present specification is schematically represented by exaggerating some of the components in order to facilitate understanding of the present invention. For this reason, the dimension, ratio, etc. between each component may differ. This optical modeling apparatus 100 models a three-dimensional model desired by an operator by selectively irradiating light to a photocurable resin having a property of curing by irradiating light (ultraviolet rays). .

(Configuration of stereolithography apparatus 100)
The optical modeling apparatus 100 includes a resin tank 101. The resin tank 101 is a glass container having translucency for storing the liquid photocurable resin 102, and is formed in a rectangular parallelepiped shape having an open upper surface. A support column 101 a for supporting the three-dimensional model W to be modeled by curing the photocurable resin 102 is provided at the bottom center of the resin tank 101. Further, one end of a pipe 101 b for supplying and discharging the photocurable resin 102 into the resin tank 101 is connected to the edge side of the bottom of the resin tank 101. At the other end of the pipe 101b, a storage tank for storing the photocurable resin 102 via a liquid feed pump (not shown) for supplying and discharging the photocurable resin 102 to and from the resin tank 101. (Not shown) is connected.

  The resin tank 101 is supported on a displacement device 103 formed in a substantially box shape. The displacement device 103 has a built-in displacement mechanism including an electric motor and a screw feed mechanism (not shown), and displaces the resin tank 101 in the vertical direction (Z-axis direction in the drawing) and one horizontal direction (X-axis direction in the drawing). A first optical system 110 is provided outside the resin tank 101 along the horizontal one direction (X direction in the drawing). The first optical system 110 is composed of two first light irradiation mechanisms 110a and 110b arranged in a state of being opposed to each other via the resin tank 101.

  The two first light irradiation mechanisms 110a and 110b constituting the first optical system 110 mainly include light sources 111a and 111b, MEMES mirrors 112a and 112b, and collimator lenses 115a and 115b, respectively. The light sources 111a and 111b are optical elements that emit light rays that can cure the photocurable resin 102, specifically, ultraviolet rays. The amount of light emitted from each of the light sources 111a and 111b is about ¼ of the amount of light necessary to cure the photocurable resin 102.

  MEMS (Micro Electro Mechanical System) mirrors 112a and 112b reflect light emitted from the light sources 111a and 111b toward the resin layer 101 by the reflecting surfaces 113a and 113b, and scan in the same horizontal plane in the resin layer 101 ( This is an optical element to be referred to. The MEMS mirrors 112a and 112b are configured such that the reflecting surfaces 113a and 113b vibrate around the rotation shafts 114a and 114b (see the arrows in the drawing) by a pair of permanent magnets and coils (not shown). The collimating lenses 115a and 115b are optical lenses that convert light reflected toward the resin tank 101 by the MEMS mirrors 112a and 112b into parallel light.

  The scanning planes of each light in the resin tank 101 of these two first light irradiation mechanisms 110a and 110b are coincident with each other. Of the two first light irradiation mechanisms 110a and 110b, one first light irradiation mechanism 110a corresponds to one first optical system light irradiation means according to the present invention, and the other one. The first light irradiation mechanism 110b corresponds to the other first optical system light irradiation means according to the present invention.

  In the other horizontal direction (Y direction in the figure) orthogonal to the horizontal one direction (X direction in the figure) outside the resin tank 101, the two second light irradiation mechanisms 120a and 120b face each other through the resin tank 101. A second optical system 120 arranged and configured in the above state is provided. The two second light irradiation mechanisms 120a and 120b constituting the second optical system 120 are mainly configured by light sources 121a and 121b, respectively.

  The light sources 121a and 121b are optical elements that emit light rays, specifically ultraviolet rays, that can cure the photo-curable resin 102 in the same manner as the light sources 111a and 111b. In addition, these light sources 121a and 121b emit light having a light amount that is about ¼ of the light amount necessary for curing the photocurable resin 102, similarly to the light sources 111a and 111b. Of these two second light irradiation mechanisms 120a and 120b, one second light irradiation mechanism 120a corresponds to one second optical system light irradiation means according to the present invention, and the other. The second light irradiation mechanism 120b corresponds to the other second optical system light irradiation means according to the present invention.

  The optical axes of the light sources 121a and 121b in the two second light irradiation mechanisms 120a and 120b coincide with each other in the light scanning planes of the first light irradiation mechanism 110a and the first light irradiation mechanism 110b. That is, the optical axes of the first light irradiation mechanisms 110a and 110b and the optical axes of the second light irradiation mechanisms 120a and 120b are located in the same horizontal plane. The same horizontal plane where the optical axes of the first light irradiation mechanisms 110a and 110b and the optical axes of the second light irradiation mechanisms 120a and 120b are located is hereinafter referred to as a “processed horizontal plane”.

  The stereolithography apparatus 100 includes a controller 130 that controls the operations of the liquid feed pump (not shown), the displacement device 103, the first light irradiation mechanisms 110a and 110b, and the second light irradiation mechanisms 120a and 120b. Yes. The controller 130 is configured by a microcomputer including a CPU, a ROM, a RAM, and the like, and executes a modeling process program (not shown) according to an instruction from an external computer device 140 connected via an interface 131, thereby supplying a liquid feed pump. (Not shown), the displacement device 103, the first light irradiation mechanisms 110a and 110b, and the second light irradiation mechanisms 120a and 120b are controlled to form a three-dimensional object. This modeling program is stored in advance in the ROM.

  The external computer device 140 is configured by a microcomputer including a CPU, ROM, RAM, hard disk, and the like, and executes various programs (not shown) according to instructions from the input device 141 including a keyboard and a mouse, thereby forming the optical modeling apparatus 100. The operation of the (controller 150) is controlled. In addition, the external computer device 140 causes the display device 142 formed of a liquid crystal display to appropriately display the operation state of the optical modeling device 100, each execution state of the machining program, and the like. That is, in the present embodiment, the external computer device 140 is assumed to be a personal computer for personal use (so-called personal computer). The external computer device 140 may be any type of computer device as long as it can control the operation of the optical modeling device 100.

(Operation of stereolithography apparatus 100)
Next, the operation of the optical modeling apparatus 100 according to the present invention will be described. First, the operator connects the optical modeling apparatus 100 and the external computer apparatus 140 via the interface 131, and turns on the optical modeling apparatus 100 and the external computer apparatus 140 respectively. Thereby, the stereolithography apparatus 100 and the external computer apparatus 140 will be in the standby state which waits for the input of the instruction | command from an operator by running the predetermined program which is not illustrated.

  Next, the operator causes the external computer device 140 to execute a modeling object drawing program (not shown) to generate the three-dimensional modeling object W to be modeled on the external computer apparatus 140. In this case, the three-dimensional image data representing the three-dimensional structure W on the external computer device 140 is represented in a vector (vector) format. Then, the operator operates the external computer device 140 to instruct the optical modeling device 100 to generate processing data.

  In response to this instruction, the external computer device 140 generates processing data based on the generated three-dimensional image data by executing a processing data generation program (not shown). Specifically, the controller device 140 generates the cross-sectional image data representing the cross-sectional shape of each layer obtained by dividing the three-dimensional structure W represented by the three-dimensional image data into a plurality of layers in the horizontal direction, and then the same cross section. Cross-sectional image data representing each cross-sectional shape in the image data is converted into image data represented in a bitmap format. In the present embodiment, the three-dimensional structure W is divided into layers having a thickness of about 34 μm in the horizontal direction.

  Next, the operator operates the external computer device 140 to instruct the modeling of the three-dimensional structure W by the optical modeling apparatus 100. In response to this instruction, the external computer device 140 outputs the generated processing data to the controller 130 of the optical modeling device 100. Accordingly, the optical modeling apparatus 100 sequentially stores the cross-sectional image data for each layer sequentially output from the external computer apparatus 140 and starts modeling the three-dimensional modeled object W. Specifically, the controller 130 of the optical modeling apparatus 100 executes a modeling processing program (not shown) to control the operation of a liquid feeding pump (not shown) to fill the resin tank 101 with the photocurable resin 102. Then, the operation of the displacement device 103 is controlled to position the upper surface of the support column 101a on the processing horizontal plane.

  Next, the controller 130 draws an image representing the cross-sectional shape of the first layer constituting the three-dimensional structure W on the support pillar 101a. Specifically, the controller 130 irradiates light from the light sources 111a and 111b of the first light irradiation mechanisms 110a and 110b and the light sources 121a and 121b of the second light irradiation mechanisms 120a and 120b, respectively. An intersection point P of light emitted from the light sources 111a and 111b is formed on the optical axes of 120a and 120b. In this case, the controller 130 controls the directions of the MEMS mirrors 112a and 112b (reflection surfaces 113a and 113b) in the first light irradiation mechanisms 110a and 110b, respectively, and intersects the optical axis of the second light irradiation mechanisms 120a and 120b with the intersection point P. Form.

  Then, the controller 130 continuously displaces the direction of the MEMS mirrors 112a and 112b in the first light irradiation mechanisms 110a and 110b and the position of the resin tank 101 in the horizontal one direction (X-axis direction in the drawing), thereby processing the horizontal surface. Inside, the said intersection P is displaced along the cross-sectional shape of the 1st layer which comprises the three-dimensional molded item W. FIG. The intersection P of the light displaced on the processing horizontal plane is each light emitted from the light sources 111a, 111b, 121a, and 121b, and is about a quarter of the amount of light necessary for curing the photocurable resin 102. It is constituted by a set of four lights having a light quantity of. That is, the intersection P of light is light with a light quantity more than that necessary for curing the photo-curable resin 102. For this reason, the photocurable resin 102 where the light intersection P is located starts to cure quickly. Thereby, the cross-sectional shape of the 1st layer which comprises the three-dimensional molded item W is modeled on the support pillar 101a.

  Next, after forming the first layer of the three-dimensional structure W on the support pillar 101a, the controller 130 lowers the resin tank 101 by one layer (34 μm), thereby forming the first formed on the support pillar 101a. The upper surface of the layer is positioned on the processing horizontal plane. And the controller 130 models the 2nd layer in the three-dimensional molded item W like the modeling of the said 1st layer. As described above, the three-dimensional object W is formed on the support column 101a by repeatedly performing the formation of each layer representing each cross-sectional shape constituting the three-dimensional object W and the displacement of the resin tank 101 in the illustrated Z direction. . In this case, for example, in the case of modeling the three-dimensional structure W by positioning the intersection P of light at a position far from the first light irradiation mechanism 110a side in the processing horizontal plane in the resin tank 101, the same direction is used. The light emitted from the first light irradiation mechanism 110 a attenuates while passing through the photocurable resin 102. However, the light from the other first light irradiation mechanism 110b disposed opposite to the same first light irradiation mechanism 110a is at the intersection P of the light located far from the one first light irradiation mechanism 110a side. Therefore, the total amount of light at the intersection point P of light at the same position is not reduced. For this reason, the photocurable resin 102 at the same position can be quickly cured.

  And the controller 130 will perform 1st light irradiation mechanism 110a, 110b and 2nd light irradiation mechanism, when modeling of the three-dimensional molded item W is performed using all the cross-sectional image data showing the cross-sectional shape of the three-dimensional molded item W. The irradiation of light from 120a and 120b is stopped to return the position of the resin tank 101 to the origin, and the operation of a liquid feed pump (not shown) is controlled to discharge the photocurable resin 102 from the resin tank 101. Then, the execution of the modeling program is finished. An operator peels off the three-dimensional molded item W from the support column 101a in the resin tank 101 after the execution of the modeling program. Thereby, the modeling operation | work of the three-dimensional molded item W by the optical modeling apparatus 100 is complete | finished.

  As can be understood from the above description of the operation, according to the embodiment, the optical modeling apparatus 100 irradiates light from different directions into the resin tank 101 in which the photocurable resin 102 is stored. 110 and a second optical system 120 are provided. Of the first optical system 110 and the second optical system 120, the first optical system 110 is formed by the two first light irradiation mechanisms 110 a and 110 b in a state of facing each other through the resin tank 101. It is configured. The second optical system 120 includes two second light irradiation mechanisms 120a and 120b in a state of facing each other through the resin tank 101. That is, the first optical system 110 and the second optical system 120 emit light from both sides of the resin tank 101. Thereby, the amount of light necessary for curing the photo-curable resin 102 in the entire area on the optical axes of the first optical system 110 and the second optical system 120 in the resin tank 101 is ensured substantially evenly. Can do. As a result, regardless of the depth of light in the resin tank 101, the photocurable resin 102 can be cured quickly and accurately, and the three-dimensional structure W can be accurately modeled.

  Furthermore, in carrying out the present invention, the present invention is not limited to the above embodiment, and various modifications can be made without departing from the object of the present invention.

  For example, in the above-described embodiment, the first light irradiation mechanisms 110a and 110b configuring the first optical system 110 are configured by the light sources 111a and 111b, the MEMS mirrors 112a and 112b, and the collimating lenses 115a and 115b, and the second The second light irradiation mechanisms 120a and 120b constituting the optical system 120 are constituted by light sources 121a and 121b. However, the first light irradiation mechanisms 110a and 110b and the second light irradiation mechanisms 120a and 120b are provided to face the first light irradiation mechanism 110a and the second light irradiation mechanism 120a through the resin tank 101. The other first light irradiation mechanism 110b and the second light irradiation mechanism 120b are configured to irradiate light that overlaps at least a part of the light irradiated from the same first light irradiation mechanism 110a and second light irradiation mechanism 120. If it comprises, it will not be limited to the said embodiment.

  For example, the first light irradiation mechanisms 110a and 110b may be mainly composed of only the light sources 111a and 111b like the second light irradiation mechanisms 120a and 120b. In this case, in order to make the first light irradiation mechanisms 110a and 110b and the second light irradiation mechanisms 120a and 120b displaceable relative to the resin tank 101, the first light irradiation mechanisms 110a and 110b and the second light irradiation mechanisms 120a, Displacement means that enables displacement of the resin tank 101 with respect to the resin tank 101 or displacement means that displaces the resin tank 101 with respect to the first light irradiation mechanisms 110a and 110b and the second light irradiation mechanisms 120a and 120b may be provided. . Further, the number of light sources used in the first light irradiation mechanisms 110a and 110b and the second light irradiation mechanisms 120a and 120b is not necessarily two, and the light emitted from one light source is divided using a spectroscopic element or the like. Naturally, it may be guided into the resin tank 101.

  In addition to the light sources 121a and 121b, the second light irradiation mechanisms 120a and 120b are collimated lenses and MEMS mirrors similar to the MEMS mirrors 112a and 112b and the collimating lenses 115a and 115b, as in the first light irradiation mechanisms 110a and 110b. You may comprise using. In this case, the position of the intersection point P of the light is controlled by controlling the orientation of the reflecting surfaces of the MEMS mirrors 112a and 112b of the first light irradiation mechanisms 110a and 110b and the MEMS mirrors of the second light irradiation mechanisms 120a and 120b. Since it can be freely displaced inside, a mechanism for displacing the resin tank 101 in one horizontal direction (X-axis direction in the drawing) as in the above embodiment is unnecessary.

  In this case, the MEMS mirror used in the first light irradiation mechanisms 110a and 110b and the second light irradiation mechanisms 120a and 120b is of a type in which the reflection surface of the MEMS mirror vibrates in the vertical direction (Z-axis direction in the drawing). May be used. According to this, the intersection point P of light can be displaced in the vertical direction (Z-axis direction in the drawing), so that the resin tank 101 which is a heavy object can be displaced in the vertical direction (Z-axis direction in the drawing). In addition to simplifying the configuration of the optical modeling device 100, the modeling accuracy of the three-dimensional model W can be improved.

  In addition, the first light irradiation mechanisms 110a and 110b in the first optical system 110 or the second light irradiation mechanisms 120a and 120b in the second optical system 120 may be configured by a projector. In this case, the projector projects the cross-sectional shape of each layer obtained by dividing the three-dimensional structure W into a plurality of layers in the vertical direction in the resin layer 101. Then, the light irradiated from the second light irradiation mechanisms 120a and 120b or the light irradiated from the first light irradiation mechanisms 110a and 110b is projected in one horizontal direction (X direction in the drawing) onto the cross-sectional projection image projected into the resin tank 101. ) To form a three-dimensional structure W by scanning one layer at a time while being displaced by a predetermined amount (for example, 34 μm). Note that. In this case, the projectors facing each other via the resin tank 101 project the cross-sectional images inverted to each other toward the facing projector.

  In the above embodiment, the first optical system 110 and the second optical system 120 are configured to irradiate light from the sides facing each other through the resin tank 101. That is, the first optical system 110 is configured by the two first light irradiation mechanisms 110a and 110b in a state of being opposed to each other via the resin tank 101, and the second optical system 120 is configured via the resin tank 101. The second light irradiation mechanisms 120a and 120b are configured to face each other. However, in any one of the first optical system 110 and the second optical system 120, the light may be irradiated from the sides facing each other via the resin tank 101. However, in this case, the amount of light emitted from the other optical system is increased. According to this, the amount of light emitted from one of the optical systems becomes substantially uniform over the entire area, and therefore an effect according to the above embodiment can be expected.

  In the above embodiment, the optical axis of the light source 121a and the optical axis of the light source 121b in the second light irradiation mechanisms 120a and 120b are configured to coincide with each other. However, in the resin tank 101, if the light irradiated from the second light irradiation mechanisms 120a and 120b can overlap the light irradiated from the first light irradiation mechanisms 110a and 110b to form the intersection point P, the optical axis of the light source 121a is not necessarily obtained. And the optical axis of the light source 121b need not be configured to coincide with each other. However, in this case, the direction of the optical axis is applied to the second light irradiation mechanisms 120a and 120b so that the light irradiated from the second light irradiation mechanisms 120a and 120b overlaps the light irradiated from the first light irradiation mechanisms 110a and 110b. A mechanism to change the value is required. Also by this, the same effect as the above-mentioned embodiment can be expected.

  Moreover, in the said embodiment, although it comprised so that the three-dimensional molded item W might be modeled toward upper direction from the upper surface of the support pillar 101b, naturally it is not limited to this. The present invention can be widely applied to a so-called stereolithography method for producing a desired three-dimensional model W using a photocurable resin that is cured by irradiating light. Therefore, for example, the support pillar 101b may be provided on one side surface of the resin tank 101 so as to form a three-dimensional modeled object in the horizontal direction, or a cover member provided with the support pillar 101b on the top of the resin tank 101 is prepared. Then, the three-dimensional modeled object may be configured to be modeled downward from the lower surface of the support column 101b. Also by these, the same effect as the above-mentioned embodiment can be expected.

  In the above-described embodiment, each of the light sources 111a, 111b, 121a, and 121b constituting the first optical system 110 and the second optical system is about a quarter of the amount of light that the photocurable resin 102 is cured. It was configured to emit light with a quantity of light. This is because the amount of light that the photocurable resin 102 cures at the intersection P of the light irradiated from the first optical system 110 and the second optical system, respectively. Therefore, in the above embodiment, the first optical system 110 and the second optical system are configured to irradiate a light amount that is a little more than half of the light amount that the photocurable resin 102 is cured.

  However, the amount of light emitted from the first optical system 110 and the amount of light emitted from the second optical system are the amounts of light necessary for the photocurable resin 102 to cure at the intersection P of the light. If it can be ensured, it does not necessarily have to be 1: 1. Moreover, in the said embodiment, although comprised so that light might be irradiated continuously from each light source 111a, 111b, 121a, 121b, light is irradiated intermittently only to the location where hardening of the photocurable resin 102 is required. Of course, it may be configured to do so.

1 is a schematic configuration diagram schematically illustrating the overall configuration of an optical modeling apparatus according to an embodiment of the present invention.

Explanation of symbols

W ... Solid modeling object, P ... Intersection of light, 100 ... Optical modeling apparatus, 101 ... Resin tank, 102 ... Photocurable resin, 103 ... Displacement apparatus, 110 ... First optical system, 110a, 110b ... First light Illumination mechanism, 111a, 111b ... light source, 112a, 112b ... MEMS mirror, 115a, 115b ... collimating lens, 120a, 120b ... second light irradiation mechanism, 121a, 121b ... light source, 130 ... controller, 131 ... interface, 140 ... external Computer device.

Claims (4)

A resin tank for storing a photocurable resin that is cured by irradiating a predetermined amount of light;
A first optical system that irradiates the resin tank with a light amount less than the predetermined light amount;
A second optical system for irradiating the resin tank with a light amount less than the predetermined light amount from a direction different from the first optical system;
An intersection displacing means for displacing the resin tank relative to the intersection of the light irradiated from the first optical system and the light irradiated from the second optical system;
In the optical modeling apparatus that forms the three-dimensional object by curing the photocurable resin by light at the intersection of the light irradiated from the first optical system and the light irradiated from the second optical system,
The first optical system is provided so as to face one first optical system light irradiation means for irradiating light into the resin tank and the one first optical system light irradiation means through the resin tank. Irradiating light for making the amount of light emitted from the one first optical system light irradiating means constant by overlapping at least part of the light emitted from the same first optical system light irradiating means An optical modeling apparatus, comprising: the other first optical system light irradiating means. The optical modeling apparatus according to claim 1, further comprising:
The second optical system is provided facing one second optical system light irradiating means for irradiating light into the resin tank and the one second optical system light irradiating means via the resin tank. Irradiating light for making the amount of light emitted from the second optical system light irradiating means constant by overlapping at least part of the light emitted from the same second optical system light irradiating means An optical modeling apparatus, comprising: the other second optical system light irradiation means. In the optical modeling apparatus according to claim 1 or 2,
The optical axis of the one first light irradiation means in the first optical system and the optical axis of the other first light irradiation means coincide, and / or the one second optical in the second optical system. An optical modeling apparatus characterized in that the optical axis of the system light irradiation means and the optical axis of the other second optical system light irradiation means coincide with each other. In the optical modeling apparatus according to any one of claims 1 to 3,
Each of the first optical system light irradiating means in the first optical system and / or each second optical system light irradiating means in the second optical system is constituted by a MEMS mirror. apparatus.

Images