TWM510242U - Stereolithography machine with improved optical unit - Google Patents

Stereolithography machine with improved optical unit Download PDF

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Publication number
TWM510242U
TWM510242U TW103211817U TW103211817U TWM510242U TW M510242 U TWM510242 U TW M510242U TW 103211817 U TW103211817 U TW 103211817U TW 103211817 U TW103211817 U TW 103211817U TW M510242 U TWM510242 U TW M510242U
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Taiwan
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projection
mirror
molding machine
photocuring
optical unit
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TW103211817U
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Chinese (zh)
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Ettore Costabeber
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Ettore Costabeber
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Abstract

Stereolithography machine (1) comprising: a container (2) for a fluid substance (14); a source (3) of predefined radiation (3a) suited to solidify the fluid substance (14); an optical unit (4) suited to direct the radiation (3a) towards a reference surface (5) in the fluid substance (14); a logic control unit (6) configured to control the optical unit (4) and/or the source (3) so as to expose a predefined portion of the reference surface (5). The optical unit (4) comprises a micro-opto-electro-mechanical system (MOEMS) (7) provided with a mirror (8) associated with actuator means (7a) for the rotation around at least two rotation axes (X, Y) incident on and independent of each other, arranged so that it can direct the radiation (3a) towards each point of the reference surface (5) through a corresponding combination of the rotations around the two axes (X, Y).

Description

具有改良式光學單元的光固化成型機Photocuring machine with improved optical unit

本創作係關於一種光固化成型機,適用於以附屬個疊加層製造三維物件,每一層係藉由選擇性固化對應製造物件區域中之流動物質而形成。The present invention relates to a photocuring molding machine for fabricating three-dimensional articles with an associated superimposed layer, each layer being formed by selectively curing a flowing substance in a region corresponding to the article of manufacture.

已知型式的光固化成型機具有容置一般為液體或膏狀物的光感樹脂之流動物質容器。Known types of photocuring machines have a flow material container that houses a photosensitive resin, typically a liquid or paste.

此機器亦包含投射源,一般為放射適用於固化流動物質光線之發光類型。This machine also contains a projection source, typically a type of illumination that emits light suitable for curing the flowing material.

光學單元,用已傳遞所述放射至設置在容器內,對應欲固化物件的層的位置之基準面。The optical unit is configured to pass the radiation to a reference surface disposed in the container corresponding to the position of the layer of the article to be cured.

形成的三維物件係由模組板支承,其能相對於容器垂直地移動,用以能在鄰近基準面的位置排置物件最新形成的固化層。The formed three-dimensional object is supported by the module board and is vertically movable relative to the container for arranging the newly formed cured layer of the article adjacent to the reference surface.

如此,一旦每一層完成固化,模組板便會移動,以能再次在鄰近基準面的位置排置形成的固化層,且對完成的層重複此程序。Thus, once each layer is cured, the module board is moved to again lay the formed solidified layer adjacent the reference surface and the process is repeated for the finished layer.

此類型的光固化成型機可分成兩主要例子予以說明。例如,本案相同申請人之義大利專利申請案號VI2010A000004。This type of photocuring machine can be divided into two main examples. For example, the same applicant's Italian patent application number VI2010A000004.

依據前述例子的第一例,基準面係設置在鄰近容器的底部,其係透明以為投射。According to a first example of the foregoing example, the datum is placed adjacent to the bottom of the container, which is transparent for projection.

於此例子中,係從下方對流動物質進行照射,三維物件則形成於模組板下方。In this example, the flowing material is irradiated from below, and the three-dimensional object is formed under the module board.

依據第二例,基準面係設置在流動物質的自由表面之水平。According to a second example, the reference plane is placed at the level of the free surface of the flowing material.

於此第二例中係從上方對流動物質進行照射,三維物件則形成於模組板上方。In the second example, the flowing material is irradiated from above, and the three-dimensional object is formed above the module board.

於兩例子中,能利用各種已知之光學單元傳遞投射至基準面之不同點。第一類型之光學單元包含反射鏡陣列,其能各別控制以投射物件的層的影像至預定表面。In both examples, various known optical units can be utilized to deliver different points of projection to the reference plane. The first type of optical unit includes a mirror array that can be individually controlled to project an image of the layer of the object to a predetermined surface.

尤其每一反射鏡能設定兩個不同位置,一為主動位置,投射被反射至基準面之對應位置,一為被動位置,投射被反射至離散區域(dispersion area)。In particular, each mirror can be set to two different positions, one is the active position, the projection is reflected to the corresponding position of the reference surface, and the other is the passive position, and the projection is reflected to the dispersion area.

所述反射鏡陣列能同時照射整個基準面,因而能以單次投射之方式形成各個層,是為一特殊快速之方式。然 而反射鏡陣列有其限制,當形成不規則邊緣物件時即有所不便。The mirror array can simultaneously illuminate the entire reference plane, so that each layer can be formed in a single projection manner, which is a particularly fast manner. Of course The mirror array has its limitations, which is inconvenient when forming irregular edge objects.

前述系統更多的缺點在於其所產生的影像在整個表面造成不均勻的照射強度。因此造成所述系統的缺陷即在基準面的不同區域無法調整光線強度。A further disadvantage of the aforementioned system is that the image produced by it produces an uneven illumination intensity across the entire surface. Therefore, the defect of the system is that the light intensity cannot be adjusted in different areas of the reference plane.

第二類型之光學單元中,投射係傳遞至基準面之單一點,移動所述單一點,以逐步照射對應物件體積的基準面的整個部份。In the second type of optical unit, the projection system is transmitted to a single point of the reference plane, and the single point is moved to gradually illuminate the entire portion of the reference plane of the corresponding object volume.

相較於前開類型之光學單元,本案之光學單元所具備之優點在於,其能導引光束至基準面之任一點,使其涵蓋連續投射,而能形成物件且避免如前述光學單元類型所造成的錯誤。Compared with the optical unit of the front opening type, the optical unit of the present invention has the advantage that it can guide the light beam to any point of the reference surface so as to cover continuous projection, and can form an object and avoid the type of optical unit as described above. mistake.

再者,此類光學單元具有的優點在於能在基準面的不同區域調整光線強度。Furthermore, such optical units have the advantage of being able to adjust the light intensity in different areas of the reference plane.

依據前開第二類型之光學單元,藉由機械元件沿兩正交軸移動雷射投射源。According to the optical unit of the second type, the laser projection source is moved along the two orthogonal axes by the mechanical element.

然而此例子的缺點在於光束移動較慢,並且用以移動光束的機械元件存在故障的風險而需要相當程度的維護。A disadvantage of this example, however, is that the beam moves slower and the mechanical components used to move the beam are at risk of failure and require considerable maintenance.

依據不同光學單元的例子,以固定投射源與一對串接配置的電流計反射鏡用以導引光束。According to an example of a different optical unit, a galvanometer mirror with a fixed projection source and a pair of serially arranged mirrors is used to guide the light beam.

各反射鏡均由機械控制,用以繞相互正交之對應旋轉軸旋轉,藉由繞各自旋轉軸之組合,而能導引光束至基準面之任一點。Each of the mirrors is mechanically controlled to rotate about a mutually orthogonal axis of rotation, and by means of a combination of the respective axes of rotation, the beam can be directed to any point of the reference plane.

相較於前開習知系統,於此舉例之系統具備之優點在於,由於其電流計反射鏡的慣性小,而能快速移動光束,且因採用之機械元件少而能確保更高之可靠度。Compared with the prior art system, the system of this example has the advantage that the galvanometer mirror can move the beam quickly due to the small inertia of the mirror, and the reliability is ensured by the use of fewer mechanical components.

即便具備前述陳明之優點,建構此機器時,所述光學單元仍需對準兩個反射鏡,方可獲取光束正確的反射。Even with the advantages of the foregoing, when constructing the machine, the optical unit still needs to be aligned with the two mirrors in order to obtain the correct reflection of the beam.

事實上,為取得對應至反射鏡位置之光束方向,必需使光束於各旋轉軸之水平入射兩個反射鏡。In fact, in order to obtain the direction of the beam corresponding to the position of the mirror, it is necessary to have the beam incident on the two mirrors at the level of each axis of rotation.

前開對準操作造成的缺點是其非常複雜且增加光固化成型機的成本。A disadvantage of the front opening alignment operation is that it is very complicated and increases the cost of the photocuring machine.

在使用中,若有一個或兩個反射鏡損壞,勢將需要將其等加以替換,並再次正確地對準,這亦造成前述缺點的產生。In use, if one or two mirrors are damaged, the potential will need to be replaced and correctly aligned again, which also causes the aforementioned disadvantages.

另一項缺點是,電流計反射鏡相當昂貴,而明顯地左右了光固化成型機的成本。Another disadvantage is that the galvanometer mirrors are quite expensive and significantly dictate the cost of the photocuring machine.

採用電流計反射鏡的光學單元又一缺點是想對的笨重。成本高及尺寸大致使無法應用在小型工藝組織所需的小尺寸系列產品。Another disadvantage of optical units using galvanic mirrors is that they are cumbersome. The high cost and size make it impossible to apply to the small series of products required for small process organizations.

再者,電流計反射鏡必需搭載某些機械構件,因此相較前述機械移動式機器已無太多優勢。Furthermore, galvanometer mirrors must be equipped with certain mechanical components, so there is no advantage over the aforementioned mechanical mobile machines.

並且由於電流計反射鏡無法忽略的慣性,亦會影響光束的偏移速度乃至整體製造時間。And because of the inertia that the galvano mirror can't ignore, it also affects the beam's offset speed and overall manufacturing time.

本創作意欲克服前述習知技術類型提及之所有缺點。This creation is intended to overcome all of the disadvantages mentioned in the aforementioned prior art types.

尤以本創作之目的在於提供一種光固化成型機,具備以電流計反射鏡為主之類型的光固化成型機所有優點,但更簡單製造及使用。In particular, the purpose of this creation is to provide a photocuring molding machine having all the advantages of a photocuring molding machine of the type mainly composed of an ammeter mirror, but which is simpler to manufacture and use.

尤以本創作之另一目的在於提供一種光固化成型機,無論是製造中或使用中均無需如前述反射鏡之對準操作。In particular, another object of the present invention is to provide a photocuring molding machine that does not require the alignment operation of the aforementioned mirrors, whether in manufacture or in use.

上述目的能為對應主要請求範圍之光固化成型機所達成。更多詳細之本創作特徵則見於各附屬申請專利範圍。The above object can be achieved for a photocuring molding machine corresponding to the main request range. More detailed features of this creation are found in the scope of each of the affiliated patent applications.

有利的是,無需對準反射鏡即足矣項較習知類型,相當地簡化本創作光固化成型機之架構,實現更低的成本。Advantageously, there is no need to align the mirrors, ie, the footer items are of a more conventional type, which considerably simplifies the architecture of the present photocuring machine and achieves lower cost.

可以理解的是,使用中更換光學單元,所述優點依然存在,因此能降低機器之維護成本。It will be appreciated that the replacement of the optical unit during use still exists, thereby reducing the maintenance cost of the machine.

並且,相較於具有相同能力的機器類型之整體尺寸,本創作之光固化成型機所具有整體尺寸更小。Moreover, the photocuring machine of the present invention has a smaller overall size than the overall size of the machine type having the same capabilities.

前開所舉之兩優點更有利於本創作之光固化成 型機應用於習知類型不適用之小型系列產品。The two advantages mentioned in the previous opening are more conducive to the solidification of the light of the creation. The machine is applied to small series of products that are not suitable for conventional types.

1‧‧‧光固化成型機1‧‧‧Light Curing Machine

2‧‧‧容器2‧‧‧ Container

2a‧‧‧底部2a‧‧‧ bottom

3‧‧‧投射源3‧‧‧Projection source

3a‧‧‧預定義投射3a‧‧‧Predefined projection

4‧‧‧光學單元4‧‧‧ Optical unit

5‧‧‧基準面5‧‧‧ datum

6‧‧‧邏輯控制單元6‧‧‧Logical Control Unit

7‧‧‧微光機電系統(MOEMS)7‧‧‧Micro-optical electromechanical systems (MOEMS)

7a‧‧‧致動元件7a‧‧‧Actuating element

7b‧‧‧連接元件7b‧‧‧Connecting components

8‧‧‧反射鏡8‧‧‧Mirror

9‧‧‧支撐結構9‧‧‧Support structure

10‧‧‧支架10‧‧‧ bracket

11‧‧‧第一連接區11‧‧‧First connection area

12‧‧‧第二連接區12‧‧‧Second connection area

13‧‧‧透鏡13‧‧‧ lens

14‧‧‧流動物質14‧‧‧Mobile substances

15‧‧‧三維物件15‧‧‧Three-dimensional objects

16‧‧‧模組板16‧‧‧Modular board

X,Y‧‧‧第一、第二旋轉軸X, Y‧‧‧ first and second axis of rotation

Z‧‧‧垂直移動軸Z‧‧‧ vertical movement axis

該等目的及優點,以及其他將於下文中顯示者,將可自下文中本創作一些非限制性範例的實施例的說明,並配合於後附圖式,而清楚得知。These objects and advantages, as well as others which will be shown hereinafter, will be apparent from the following description of the embodiments of the non-limiting examples, and in the accompanying drawings.

第1圖顯示根據本創作之光固化成型機。Figure 1 shows a photocuring machine according to the present invention.

第2圖顯示第1圖中光固化成型機之細部圖。Fig. 2 is a view showing a detail of the photocuring molding machine in Fig. 1.

本創作標的的光固化成型機於第1圖中係標示為1,其能藉由複數個相互疊加層之製程方法,製造三維物件15,該些層之形成係藉由預定義投射3a對流動物質14進行曝光以使其固化。The photocuring machine of the present invention is designated as 1 in Figure 1, which is capable of fabricating a three-dimensional object 15 by a plurality of mutually superposed layers, the formation of which is formed by a predefined projection 3a. Substance 14 is exposed to cure.

較佳地,該流動物質14係為光感樹脂,該預定義投射3a係為頻率位在可見光或紫外光範圍內之雷射光。Preferably, the flowing substance 14 is a photosensitive resin, and the predefined projection 3a is laser light having a frequency in the visible or ultraviolet range.

顯然地,本創作之變化範例中,該流動物質14可為任何液態物或膏狀物,適用於當以預定義投射3a對其曝光時可使其固化。Obviously, in a variation of the present creation, the flow material 14 can be any liquid or paste suitable for curing when exposed to a predefined projection 3a.

相似地,該投射3a之投射源3亦可投射有別於前開種類之投射3a,僅要能固化該流動物質14。Similarly, the projection source 3 of the projection 3a can also project a projection 3a different from the front opening type, and only the flowing substance 14 can be cured.

光固化成型機1包含容器2,用以容置流動物質14與模組板16,適用支承沿垂直移動軸Z成形而具體之物件15。The photocuring molding machine 1 comprises a container 2 for accommodating the flowing substance 14 and the module board 16, and is adapted to support the object 15 formed by the vertical movement axis Z.

此機器1更包含投射源3適用於投射預定義投射3a,光學單元4適用於導引該投射3a至設置在該容器2,為流動物質14所占體積之水平的基準面5之任一點。The machine 1 further comprises a projection source 3 adapted to project a predefined projection 3a, the optical unit 4 being adapted to guide the projection 3a to any point of the reference surface 5 disposed in the container 2 at the level of the volume of the flowing substance 14.

較佳地,該基準面係為一平面且設置在鄰近容器2的底部2a。Preferably, the reference surface is a flat surface and is disposed adjacent to the bottom 2a of the container 2.

於此案例中,光學單元4係用以從下而上導引該預定義投射3a,使其入射至底部2a。In this case, the optical unit 4 is used to guide the predefined projection 3a from the bottom up to be incident on the bottom 2a.

並且,底部2a對投射3a而言係為透明,使投射(3a)能命中設置在靠近底部的流動物質14以使其固化。Also, the bottom portion 2a is transparent to the projection 3a so that the projection (3a) can hit the flowing substance 14 disposed near the bottom to solidify it.

依據本創作之此實施例,如第1圖所示可在模組板16下形成三維物件15。According to this embodiment of the present creation, a three-dimensional object 15 can be formed under the module board 16 as shown in FIG.

依據本創作於此為揭示之變化範例,相反地光學單元係用以從上而下導引該投射3a至位在容器2中流動物質14之自由表面。According to this variation, which is disclosed herein, the optical unit is used to guide the projection 3a from the top to the bottom to the free surface of the flowing substance 14 in the container 2.

於此案例中,物件係在模組板16上形成。In this case, the object is formed on the module board 16.

於前開提及之兩變化範例中,光固化成型機1均包含邏輯控制單元6,用以控制光學單元4及/或投射源3,以使投射3a可選擇性地對流動物質14於基準面的預定義部份之水平進行曝光。In the two variants mentioned above, the photocuring machine 1 comprises a logic control unit 6 for controlling the optical unit 4 and/or the projection source 3 such that the projection 3a selectively pairs the flowing substance 14 with the reference surface. The level of the predefined portion is exposed.

再者,具體而言,對應部份體積的該預定義部份係常時地對應三維物件15之每一層。Furthermore, in particular, the predefined portion of the corresponding partial volume corresponds to each layer of the three-dimensional object 15 at all times.

依據本創作,光學單元4包含採用積體電路技術之微光機電系統7,眾所周知縮寫為MOEMS。According to the present invention, the optical unit 4 comprises a micro-optical electromechanical system 7 using integrated circuit technology, abbreviated as MOEMS.

如眾所周知,MOEMS元件係如微機電中之相同技術製造之積體電路,例如藉由固相沉積、微影、蝕刻等。As is well known, MOEMS components are integrated circuits fabricated by the same techniques as in microelectromechanics, such as by solid phase deposition, lithography, etching, and the like.

該微光機電系統7之一可能實施例但並非限制之第2圖所示,包含微型化之反射鏡8,藉由連接元件7b與支撐結構9連接,用以為該反射鏡8定義相對於結構9的不同之第一、第二旋轉軸X、Y,其相互入射且較佳為相互正交。One of the micro-optical electromechanical systems 7 may be an embodiment, but not limited to FIG. 2, comprising a miniaturized mirror 8 connected to the support structure 9 by a connecting element 7b for defining a relative structure for the mirror 8 The first and second axes of rotation X, Y, which are different from each other, are incident on each other and are preferably orthogonal to each other.

該微光機電系統7亦可包含本質上為習知之致動元件7a,適用於分別獨立繞該第一、第二旋轉軸X、Y移動該反射鏡8。The micro-optical electromechanical system 7 can also comprise an actuating element 7a which is essentially known to be adapted to move the mirror 8 independently about the first and second axes of rotation X, Y, respectively.

致動元件7a可為電動型、磁動型、熱機械型或可藉由該MOEMS手段而得之其他已知類型。The actuating element 7a can be of the electric, magnetic, thermomechanical or other known type that can be obtained by the MOEMS means.

該反射鏡8係相對投射源3與容器2設置,能反射預定義投射3a,藉由繞該第一、第二旋轉軸X、Y之對應組合,以導引該預定義投射3a至該基準面之任一點。The mirror 8 is disposed relative to the projection source 3 and the container 2, and is capable of reflecting the predefined projection 3a by guiding the predefined projection 3a to the reference by a corresponding combination of the first and second rotation axes X, Y. Any point of the face.

因此,本創作能利用單一個反射鏡8導引投射3a至基準面之任一點。Therefore, the present invention can guide the projection 3a to any point of the reference plane by using a single mirror 8.

是以,無需如前開習知技術中所述需數個反射鏡相互對準,因而能實現簡化光固化成型機1製造之目的,而能降低其成本。Therefore, it is not necessary to align the plurality of mirrors with each other as described in the prior art, so that the purpose of simplifying the manufacture of the photocuring machine 1 can be achieved, and the cost can be reduced.

明顯地,即便使用中更換微光機電系統7整體或部份,所述優點依然存在,因此能降低機器1之維護成本。Obviously, even if the whole or part of the micro-optical electromechanical system 7 is replaced in use, the advantages still exist, so that the maintenance cost of the machine 1 can be reduced.

依然有利的一點,前述微光機電系統7於組裝時無需高精準之角度定位。It is still advantageous that the aforementioned micro-optical electromechanical system 7 does not require high precision angular positioning during assembly.

事實上,微光機電系統7之配置中任何細微的角度變化僅涉及基準面相對於容器2之移動,然且曝光之基準面及預定義部份的形狀不會產生相當程度之變形。In fact, any slight angular change in the configuration of the micro-optical electromechanical system 7 involves only the movement of the reference surface relative to the container 2, but the shape of the exposed reference surface and the predefined portion does not undergo a substantial degree of deformation.

依然有利的一點,相較於電流計反射鏡為主之系統,微光機電系統7具有之成本更低,能更進一步有利於降低光固化成型機1之成本。It is still advantageous that the micro-optical electromechanical system 7 has a lower cost than the galvano mirror-based system, and can further reduce the cost of the photo-curing molding machine 1.

並且,有利的一點,相較於電流計反射鏡,微光機電系統7具有更小的慣性,使其能實現更快的角度速度,而相較於習知類型的光固化成型機製造相同形狀物件時,能減少製造三維物件15的所需時間。Moreover, advantageously, the micro-optical electromechanical system 7 has a smaller inertia than a galvanometer mirror, enabling it to achieve a faster angular velocity, while producing the same shape as a conventional type of photocuring machine. When the object is used, the time required to manufacture the three-dimensional object 15 can be reduced.

依然有利的一點,相較於具有相同能力的電流計反射鏡的光學單元之整體尺寸,微光機電系統7所具有整體尺寸更小,而能縮小光固化成型機1之整體尺寸。It is still advantageous that the micro-optical electromechanical system 7 has a smaller overall size than the overall size of the optical unit of the galvanometer mirror having the same capability, and can reduce the overall size of the photo-curing machine 1.

是以,由於成本降低及整體尺寸縮小,本創作能提供適用在習知類型光固化成型機所無法應用之光固化成型機1。Therefore, due to cost reduction and overall size reduction, the present invention can provide a photocuring molding machine 1 which is not applicable to a conventional type of photocuring molding machine.

更有利的一點,相較於具有相當能力的習知類型光固化成型機,本案微光機電系統7吸收較少的能量。More advantageously, the micro-optical electromechanical system 7 of the present invention absorbs less energy than a conventional type of photocuring machine having considerable capabilities.

降低耗能加上相當之微型化,能使光固化成型機1以電池供電且可能攜帶。Reducing the energy consumption plus considerable miniaturization enables the photocuring machine 1 to be battery powered and possibly carryable.

可更理解的是,如前所述光固化成型機1具備光學單元採用電流計反射鏡之所有優點,特別是具備了同樣精確度以及對物件15的不同區域可調整投射3a之功率。It will be further appreciated that the photocuring machine 1 as described above has all of the advantages of using an galvanometer mirror for the optical unit, particularly with the same accuracy and adjustable power of the projection 3a for different regions of the object 15.

較佳地如圖2所示,連接元件7b包含可移動支架10繞第一旋轉軸X,旋轉地支承反射鏡8,並且繞第二旋轉軸Y,旋轉地與支撐結構9連接。Preferably, as shown in FIG. 2, the connecting member 7b includes a movable bracket 10 that rotatably supports the mirror 8 about the first axis of rotation X and is rotatably coupled to the support structure 9 about the second axis of rotation Y.

此連接方式使反射鏡8能分別獨立地繞著前開提及之第一、第二旋轉軸X,Y旋轉。This connection allows the mirror 8 to be independently rotatable about the first and second axes of rotation X, Y mentioned above.

並且,較佳地,反射鏡8、支架10及支撐結構9係為一體成型,藉由連接元件7b之第一連接區11及第二連接區12相互連接,並且薄至足以分別繞第一、第二旋轉軸X,Y彈性地屈變,以使反射鏡8相對支架10旋轉,支架10相對支撐結構9旋轉。Moreover, preferably, the mirror 8, the bracket 10 and the supporting structure 9 are integrally formed, and the first connecting portion 11 and the second connecting portion 12 of the connecting member 7b are connected to each other, and are thin enough to respectively surround the first, The second axis of rotation X, Y is elastically flexed to rotate the mirror 8 relative to the bracket 10, and the bracket 10 is rotated relative to the support structure 9.

值得一提的是,第一連接區11及第二連接區12分別可根據裝置的標準電壓,如同扭力彈簧般變形至一定程度。It is worth mentioning that the first connection area 11 and the second connection area 12 can respectively be deformed to a certain extent like a torsion spring according to the standard voltage of the device.

明顯地,本創作之變化範例中,微光機電系統7可為任意形狀,僅要反射鏡8能繞相互獨立且入射至兩軸旋轉即可。Obviously, in the variation example of the present creation, the micro-optical electromechanical system 7 can be of any shape, and only the mirror 8 can be rotated independently of each other and incident on both axes.

關於致動元件7a移動反射鏡8,較佳地其用以依據邏輯控制單元6所發出設定具有代表角度位置的值的控制訊號,使反射鏡8分別繞第一、第二旋轉軸X,Y。Regarding the actuating element 7a, the mirror 8 is moved, preferably for rotating the mirror 8 around the first and second axes of rotation X, Y according to the control signal set by the logic control unit 6 having a value representative of the angular position. .

值得一提的是,邏輯控制單元6係用以移動該反射鏡8,以使投射3a可落於對應物件15的層的預定義部份內,以產生下述至少一連續投射。It is worth mentioning that the logic control unit 6 is used to move the mirror 8 such that the projection 3a can fall within a predefined portion of the layer of the corresponding object 15 to produce at least one continuous projection as described below.

較佳但非必要地,所述移動係依據涵蓋整個預定義部份之單一連續投射進行。Preferably, but not necessarily, the movement is based on a single continuous projection covering the entire predefined portion.

依據本創作之變化範例,微光機電系統7及對應之致動元件7a係用以產生反射鏡8之環運動,以使投射3a於每次週期中均能逐步刺激(stimulate)整個基準面5。According to a variation example of the present creation, the micro-optical electromechanical system 7 and the corresponding actuating element 7a are used to generate a ring motion of the mirror 8 so that the projection 3a can gradually stimulate the entire reference surface 5 in each cycle. .

例如,所述環運動可包含依據第一、第二旋轉軸X,Y之一,或者兩旋轉方向的反射鏡8的振盪。較佳地,其係運用各連接區11或12之共振頻率結合依據單一方向為準的另一軸的旋轉而得之。For example, the ring motion may comprise oscillation of the mirror 8 in accordance with one of the first and second axes of rotation X, Y, or both directions of rotation. Preferably, it is obtained by using the resonance frequency of each connection zone 11 or 12 in combination with the rotation of another axis which is based on a single direction.

藉此,投射3a入射基準面5且呈Z字型投射,其每一段落係於其一維橫跨基準面5,同時依據另一維移動。Thereby, the projection 3a is incident on the reference plane 5 and projected in a zigzag shape, each of which is traversed by the reference plane 5 in one dimension while moving according to another dimension.

於此最後一變化範例中,邏輯控制單元6係用以在反射鏡8之所述環運動中改變投射源3之強度。In this last variation, the logic control unit 6 is adapted to vary the intensity of the projection source 3 during the ring motion of the mirror 8.

值得一提的是,當入射點在基準面5的預定義部份內時,投射源3之強度會增加,以固化該點之流動物質14, 當入射點在預定義部份外時,強度則會降低,以避免固化對應部分之流動物質14。It is worth mentioning that when the incident point is within a predefined portion of the reference plane 5, the intensity of the projection source 3 increases to solidify the flow material 14 at that point, When the point of incidence is outside the predefined portion, the intensity is reduced to avoid solidifying the corresponding portion of the flowing material 14.

如前所述之微光機電系統7較佳地屬於一具有用於對機器1的電性連接插腳之積體電路,機器1具有對應之連接器或基座,用以安置該些插腳以機構固定該積體電路於機器1。The micro-optical electromechanical system 7 as described above preferably belongs to an integrated circuit having an electrical connection pin for the machine 1, the machine 1 having a corresponding connector or base for arranging the pins for the mechanism The integrated circuit is fixed to the machine 1.

較佳地,所述連接器或基座係為其插入僅需有限力道之類型。Preferably, the connector or base is of the type that requires only a limited force for its insertion.

於本創作之變化範例中,微光機電系統7係可直接焊接在支承電子電路上,可避免連接器或基座之使用。In this variation of the creation, the micro-optical electromechanical system 7 can be soldered directly to the supporting electronic circuit to avoid the use of connectors or pedestals.

關於光學單元4,較佳地包含至少一透鏡13,用以聚焦投射3a於基準面5。With regard to the optical unit 4, at least one lens 13 is preferably included for focusing the projection 3a on the reference plane 5.

較佳地,所述透鏡13係為所謂平坦像場(Flat field)透鏡,以聚焦投射3a於平坦基準面。Preferably, the lens 13 is a so-called flat field lens to focus the projection 3a on a flat reference plane.

從操作的角度來看,微光機電系統7係設置在光固化成型機1內部,以使投射源3所產生之投射3a對準反射鏡8。From the operational point of view, the micro-optical electromechanical system 7 is disposed inside the photo-curing machine 1 to align the projection 3a produced by the projection source 3 with the mirror 8.

較佳地,投射源3及微光機電系統7的位置係為當反射鏡8處於未旋轉狀態,亦即連接區11、12未扭轉,投射3a係被反射至基準面5之中心點。Preferably, the position of the projection source 3 and the micro-optical electromechanical system 7 is such that when the mirror 8 is in an unrotated state, that is, the connection regions 11, 12 are not twisted, the projection 3a is reflected to the center point of the reference surface 5.

然,如前所述,微光機電系統7之任何細微的角度失準,並不會影響機器1之功能。However, as mentioned earlier, any slight angular misalignment of the micro-optical electromechanical system 7 does not affect the function of the machine 1.

關於實體三維物件15的製作,如本質上所眾知,其程序係相似於具有電流計反射鏡之光學單元。Regarding the fabrication of the solid three-dimensional object 15, as is known in the art, the programming is similar to an optical unit having a galvanometer mirror.

如前所述,應可理解的是本創作之光固化成型機能實現前述所有目的。As previously stated, it should be understood that the present photocuring machine achieves all of the foregoing objectives.

值得一提的是,以微光機電系統(MOEMS)取代電流計反射鏡,因而能僅採用單一反射鏡於兩獨立軸移動,代替兩個反射鏡分別於單一軸移動。It is worth mentioning that the galvanometer mirror is replaced by a micro-optical electromechanical system (MOEMS), so that only a single mirror can be used to move on two independent axes instead of two mirrors moving on a single axis.

單一反射鏡能避免採用電流計反射鏡的機器所需的複數反射鏡對準。A single mirror avoids the need for complex mirror alignment for machines that use galvanometer mirrors.

再者,相較於電流計系統,微光機電系統較經濟、不笨重以及少能耗。因此能製造出更適用於小型系列產品,甚至可攜式類型。Furthermore, compared to galvanometer systems, micro-optical electromechanical systems are economical, not bulky, and consume less energy. Therefore, it can be made more suitable for small series products, even portable types.

本創作的其他變化實施例,雖然未在本文內加以說明且未在圖式中加以顯示,但只要他們落於以下之申請專利範圍內,則仍應視為受到本案專利的保護。在申請專利範圍內所提及之技術特徵後面如果另有加附參考標號時,加入該等標號的目的僅係供增進申請專利範圍的可讀性而已,因此該等參考標號並不應對於以該等參考標號標示的元件的保護造成任何的限制作用。Other variations of the present invention, although not illustrated in the drawings and not shown in the drawings, are still considered to be protected by the present patent as long as they fall within the scope of the following patent application. In the case of the technical features mentioned in the patent application, if the reference numerals are attached, the purpose of adding the reference numerals is only for the readability of the patent application scope, and therefore the reference numerals should not be The protection of the elements indicated by these reference numerals imposes any limitation.

1‧‧‧光固化成型機1‧‧‧Light Curing Machine

2‧‧‧容器2‧‧‧ Container

2a‧‧‧底部2a‧‧‧ bottom

3‧‧‧投射源3‧‧‧Projection source

3a‧‧‧預定義投射3a‧‧‧Predefined projection

4‧‧‧光學單元4‧‧‧ Optical unit

5‧‧‧基準面5‧‧‧ datum

6‧‧‧邏輯控制單元6‧‧‧Logical Control Unit

7‧‧‧微光機電系統(MOEMS)7‧‧‧Micro-optical electromechanical systems (MOEMS)

7a‧‧‧致動元件7a‧‧‧Actuating element

8‧‧‧反射鏡8‧‧‧Mirror

9‧‧‧支撐結構9‧‧‧Support structure

10‧‧‧支架10‧‧‧ bracket

13‧‧‧透鏡13‧‧‧ lens

14‧‧‧流動物質14‧‧‧Mobile substances

15‧‧‧三維物件15‧‧‧Three-dimensional objects

16‧‧‧模組板16‧‧‧Modular board

X,Y‧‧‧旋轉軸X, Y‧‧‧ rotating shaft

Z‧‧‧垂直移動軸Z‧‧‧ vertical movement axis

Claims (10)

一種光固化成型機(1),包含:容器(2),用以容置適用於藉由曝光至預定義投射(3a)以固化之流動物質(14);預定義投射(3a)之投射源(3);光學單元(4),適用於可選擇性地導引該投射(3a)至設置在該容器(2)的基準面(5)之任一點;邏輯控制單元(6),用以控制該光學單元(4)及/或該投射源(3),以使該投射(3a)對該基準面(5)之預定義部份進行曝光,其特徵在於該光學單元(4)包含微光機電系統(MOEMS)(7),具有:反射鏡(8),藉由連接元件(7b)與支撐結構(9)連接,用以為該反射鏡(8)定義至少第一、第二旋轉軸(X、Y)相互入射;致動元件(7a),適用於分別獨立繞該第一、第二旋轉軸(X、Y)移動該反射鏡(8),該反射鏡(8)係相對投射源(3)與容器(2)設置,能藉由繞該第一、第二旋轉軸(X、Y)之對應組合,以導引該投射(3a)至該基準面(5)之任一點。 A photocuring molding machine (1) comprising: a container (2) for accommodating a flowing substance (14) suitable for curing by exposure to a predefined projection (3a); a projection source of a predefined projection (3a) (3) an optical unit (4) adapted to selectively guide the projection (3a) to any point of a reference plane (5) disposed in the container (2); a logic control unit (6) for Controlling the optical unit (4) and/or the projection source (3) such that the projection (3a) exposes a predefined portion of the reference plane (5), characterized in that the optical unit (4) comprises micro An electromechanical system (MOEMS) (7) having a mirror (8) connected to the support structure (9) by a connecting element (7b) for defining at least a first and a second axis of rotation for the mirror (8) (X, Y) are incident on each other; the actuating element (7a) is adapted to independently move the mirror (8) around the first and second axes of rotation (X, Y), the mirror (8) being relatively projected The source (3) and the container (2) are disposed to guide the projection (3a) to any one of the reference planes (5) by a corresponding combination of the first and second rotation axes (X, Y) . 根據申請專利範圍第1項所述之光固化成型機(1),其特徵在於該第一、第二旋轉軸(X、Y)係相互正交。 The photocuring molding machine (1) according to claim 1, wherein the first and second rotation axes (X, Y) are orthogonal to each other. 根據申請專利範圍第1項所述之光固化成型機(1),其特徵在於該連接元件(7b)包含支架(10),繞第一旋轉軸(X),旋轉地支承該反射鏡(8),該支架(10)繞該些旋轉軸的第二旋轉軸(Y),旋轉地與該支撐結構(9)連接。 The photocuring molding machine (1) according to claim 1, wherein the connecting member (7b) comprises a bracket (10) rotatably supporting the mirror about the first rotating shaft (X) (8) The bracket (10) is rotatably coupled to the support structure (9) about the second axis of rotation (Y) of the rotating shafts. 根據申請專利範圍第3項所述之光固化成型機(1),其特徵在於該連接元件(7b)包含第一連接區(11),設置在該反射鏡(8)與該支架(10)之間,繞該第一旋轉軸(X)彈性地屈變,及第二連接區(12),設置在該支架(10)與該支撐結構(9)之間,繞該第二旋轉軸(Y)彈性地屈變。 The photocuring molding machine (1) according to claim 3, characterized in that the connecting element (7b) comprises a first connecting region (11) disposed on the mirror (8) and the bracket (10) Between the first rotation axis (X) elastically flexing, and the second connection region (12), disposed between the bracket (10) and the support structure (9), around the second rotation axis ( Y) elastically flexive. 根據申請專利範圍第1項所述之光固化成型機(1),其特徵在於該致動元件(7a)用以分別獨立繞該第一、第二旋轉軸(X、Y)移動該反射鏡(8),以使該反射鏡(8)對應該邏輯控制單元(6)所發出,具有代表角度位置的值的控制訊號,處於該角度位置。 The photocuring molding machine (1) according to claim 1, wherein the actuating member (7a) is configured to independently move the mirror around the first and second rotating axes (X, Y) (8), so that the mirror (8) corresponds to the logic control unit (6), and the control signal having the value representing the angular position is at the angular position. 根據申請專利範圍第5項所述之光固化成型機(1),其特徵在於該邏輯控制單元(6)係用以移動該反射鏡(8),以使該投射(3a)於該基準面(5)的入射點定義之連續投射涵蓋該基準面(5)之整個該預定義部份。 The photocuring molding machine (1) according to claim 5, wherein the logic control unit (6) is configured to move the mirror (8) such that the projection (3a) is on the reference surface The continuous projection of the entry point definition of (5) covers the entire predefined portion of the reference plane (5). 根據申請專利範圍第1項所述之光固化成型機(1),其特徵在於該致動元件(7a)係用以產生該反射鏡(8)之環運動,以使該投射(3a)於每次週期中均能入射至整個該基準面(5),該邏輯控制單元(6)係用以可選擇性地改變該投射源(3)之強度,以當該投射(3a)落於該基準面(5)之該預定義部份時,該強度係大於當該投射(3a)落於該基準面(5)之該預定義部份外時之強度。 The photocuring molding machine (1) according to claim 1, wherein the actuating member (7a) is configured to generate a ring motion of the mirror (8) such that the projection (3a) is Each of the periods can be incident on the entire reference plane (5), and the logic control unit (6) is configured to selectively change the intensity of the projection source (3) so that when the projection (3a) falls on the In the predefined portion of the reference plane (5), the intensity is greater than the intensity when the projection (3a) falls outside the predefined portion of the reference plane (5). 根據申請專利範圍第1項所述之光固化成型機(1),其特徵在於該微光機電系統(7)屬於一具有用於電性連接插腳之 積體電路,該光固化成型機(1)包含對應連接元件,用以安置該些插腳以機構固定該積體電路。 The photocuring molding machine (1) according to claim 1, wherein the micro-optical electromechanical system (7) belongs to a device for electrically connecting pins In an integrated circuit, the photocuring machine (1) includes corresponding connecting elements for arranging the pins to mechanically fix the integrated circuit. 根據申請專利範圍第1項所述之光固化成型機(1),其特徵在於該投射源(3)係為雷射發射器。 The photocuring molding machine (1) according to the first aspect of the invention is characterized in that the projection source (3) is a laser emitter. 根據申請專利範圍中第1項至第9項中任一項所述之光固化成型機(1),其特徵在於該光學單元(4)包含至少一透鏡(13),用以聚焦該投射(3a)於該基準面(5)。 The photocuring machine (1) according to any one of the preceding claims, wherein the optical unit (4) comprises at least one lens (13) for focusing the projection ( 3a) on the reference plane (5).
TW103211817U 2014-07-03 2014-07-03 Stereolithography machine with improved optical unit TWM510242U (en)

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