TWI613133B - Wafer boat assembly - Google Patents

Wafer boat assembly Download PDF

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TWI613133B
TWI613133B TW101130077A TW101130077A TWI613133B TW I613133 B TWI613133 B TW I613133B TW 101130077 A TW101130077 A TW 101130077A TW 101130077 A TW101130077 A TW 101130077A TW I613133 B TWI613133 B TW I613133B
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Taiwan
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subcarrier
debris collection
subcarriers
bracket
wafer
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TW101130077A
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TW201315661A (en
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瑞達 克里斯G M 迪
丹 貝瑟琳 艾德恩 哈達格
艾迪恩 葛森
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Asm國際股份有限公司
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Abstract

晶舟封裝(1)包含一個支架(10),後者帶有多根垂直延伸的延伸桿件(12),該延伸桿件沿著其長度在多個位置被隔開,限定了多個副載波安裝位置(16);同時,支架中還帶有至少一塊碎片收集板(20),其中一塊還連接在上述延伸桿件(12)上,位於任意兩個相鄰的副載波安裝位置(16)之間。該封裝還包含多個副載波(30),每個被配置以支撐多個基本垂直、水平隔開的平面基底(40),且每個都以可拆卸方式安裝在支架(10)的副載波安裝位置(16)上。當副載波(30)安裝在支架(10)內時,每塊碎片收集板(20)都佔據了一處碎片收集區(22),後者延伸到了相應副載波安裝位置(16)所安裝的副載波(30)下方,跨越的面積至少達一處副載波所占的區域面積。 The boat assembly (1) includes a bracket (10) with a plurality of vertically extending extension members (12) spaced apart at a plurality of locations along its length defining a plurality of subcarriers Mounting position (16); at the same time, the bracket also has at least one debris collection plate (20), one of which is also connected to the extension rod member (12), located at any two adjacent subcarrier mounting positions (16) between. The package also includes a plurality of subcarriers (30), each configured to support a plurality of substantially vertical, horizontally spaced planar substrates (40), each detachably mounted to a subcarrier of the cradle (10) Mounting position (16). When the subcarriers (30) are mounted in the bracket (10), each of the debris collection plates (20) occupies a debris collection area (22) that extends to the side of the corresponding subcarrier mounting location (16). Below the carrier (30), the area spanned is at least the area occupied by one subcarrier.

Description

晶舟封裝 Crystal boat package

本發明係有關於半導體加工領域,尤其是與支撐多個薄半導體晶圓的垂直式晶舟封裝相關。 The present invention relates to the field of semiconductor processing, and more particularly to vertical wafer boat packages that support a plurality of thin semiconductor wafers.

垂直式晶舟主要用於當半導體晶圓在垂直式熔爐內加工時,為其提供足夠的支撐,最好能將晶圓上的局部重力應力和熱應力減至最小,以避免滑動和塑性變形。 The vertical boat is mainly used to provide sufficient support for the semiconductor wafer when it is processed in a vertical furnace. It is best to minimize the local gravity stress and thermal stress on the wafer to avoid sliding and plastic deformation. .

垂直式晶舟通常包括三根或更多垂直延伸桿件,每根限定了多個垂直分開的凹槽。同一垂直位置不同桿件上的三個或更多個凹槽可確定晶圓吸持位置,以便從水平方向支撐晶圓。因此,一個晶舟便可以支撐多個水平定向的晶圓,一個緊壓著另一個。這種晶舟配置在較老的技術中比較常見,十分適合支撐300毫米和直徑更小的晶圓。 Vertical boat typically includes three or more vertically extending bars, each defining a plurality of vertically spaced grooves. Three or more grooves on different rods in the same vertical position may determine the wafer holding position to support the wafer from the horizontal direction. Therefore, a wafer boat can support multiple horizontally oriented wafers, one pressed against the other. This boat configuration is more common in older technologies and is well suited for supporting wafers of 300 mm and smaller diameters.

然而,晶圓正呈逐漸變薄、變大之趨勢。舉例來說,與傳統的集成設備製造相比,如今的太陽能電池製造中採用了更薄的晶圓。因此,這些太陽能電池晶圓也相對更加脆弱。同樣,集成設備生產中所用晶圓的平均直徑也在穩步增大。雖然這些晶圓的厚度比前述太陽能電池晶圓大很多,但它們卻要承受相對更高的重力和熱應力,因此其受損的風險便順勢上升。總之,在進行加工過程中因晶圓承受應力,和在晶圓裝載到晶舟或從晶舟上卸載的過程中,晶圓都有可能會受到損壞。在任一情況下,晶圓都有可能 斷裂成肉眼可見或不可見的碎片,這些碎片可能會掉落在下方晶圓的加工表面上,從而導致其受損不可用。 However, wafers are becoming thinner and larger. For example, today's solar cell manufacturing uses thinner wafers than traditional integrated device manufacturing. Therefore, these solar cell wafers are also relatively more vulnerable. Similarly, the average diameter of wafers used in the production of integrated devices is steadily increasing. Although these wafers are much thicker than the aforementioned solar cell wafers, they are subject to relatively higher gravitational and thermal stresses, so the risk of damage increases. In summary, the wafer may be damaged during processing due to stress on the wafer and during loading or unloading of the wafer onto the boat. In either case, the wafer is possible Breaking into visible or invisible fragments that may fall onto the machined surface of the underlying wafer, rendering its damage unusable.

為了良好地容納安排相對較大和/或較薄的晶圓,近來推出的晶舟上配備了(附加的)支撐區域,通常為支承環或支撐板的形式。US 5,219,079提供了一個此類晶舟的樣品,帶有垂直分開的晶圓吸持位置,在其中,每個吸持位置由一個水平的支撐板界定,以便支撐水平定向的晶圓。雖然US’079晶舟減小了加工過程中晶圓上所受應力,但晶圓之間因中間支撐板而產生的較大垂直間距會增加經濟成本。而且,為便於將晶圓放置在支撐板上或將其從板上取下,每個支撐板都必須帶有一個明顯的開孔,便於為晶圓傳輸機器人末端執行器留出空間。因此,當晶圓破裂時,碎片仍可能會通過開孔掉落在下方晶圓的加工表面上。 In order to accommodate well-arranged relatively large and/or thin wafers, recently introduced wafer boats are equipped with (additional) support areas, typically in the form of support rings or support plates. US 5,219,079 provides a sample of such a boat with vertically separated wafer holding positions in which each holding position is defined by a horizontal support plate to support a horizontally oriented wafer. Although the US'079 wafer boat reduces the stress on the wafer during processing, the large vertical spacing between the wafers due to the intermediate support plate increases the economic cost. Moreover, to facilitate placement of the wafer on the support plate or removal from the board, each support plate must have a distinct opening to make room for the wafer transfer robot end effector. Therefore, when the wafer breaks, the debris may still fall through the opening onto the machined surface of the underlying wafer.

本發明的目標之一就是解決或減少一個或多個上述與已知晶舟封裝相關的問題。尤為重要的是,本發明的一個目標便是提供一個可降低晶圓破裂風險的晶舟封裝,萬一晶圓破裂,也能降低其損壞其他支承晶圓的風險。 One of the goals of the present invention is to solve or reduce one or more of the above problems associated with known wafer boat packaging. More importantly, it is an object of the present invention to provide a wafer boat package that reduces the risk of wafer breakage and, in the event of wafer breakage, also reduces the risk of damage to other wafer support wafers.

為此,本發明的首要方面是晶舟封裝。晶舟封裝包含一個支架,它至少包括一根基本垂直的延伸桿件,該桿件長度的多個隔開位置界定了多個副載波安裝位置,每個位置都可至少提供一個副載波安裝裝置。該支架還至少帶有一塊與上述(至少一根)延伸桿件相連的碎片收集板,後 者應向外延伸並大致與其垂直;並且,每兩個相鄰的副載波安裝位置之間都應提供一塊(“至少一塊”,最好是剛好“一”塊)碎片收集板。晶舟封裝還包含多個副載波,每個被配置以支撐多個基本垂直、水平隔開的平面基底,且每個都可以通過各自的副載波安裝裝置,以可拆卸方式安裝在支架的副載波安裝位置。當副載波被安裝在支架上各自的副載波安裝位置上時,每塊碎片收集板都佔據了一個碎片收集區,後者延伸到了相應副載波安裝位置所安裝的副載波下方,跨越的面積至少達一處副載波所占的區域面積。 To this end, the primary aspect of the invention is a wafer boat package. The boat assembly includes a bracket that includes at least one substantially vertical extension member, the plurality of spaced apart positions defining a plurality of subcarrier mounting locations, each of which provides at least one subcarrier mounting device . The bracket also has at least one debris collecting plate connected to the above (at least one) extension rod member, The person should extend outward and be substantially perpendicular thereto; and a piece ("at least one", preferably just "one") of debris collection plates should be provided between every two adjacent subcarrier mounting locations. The boat package also includes a plurality of subcarriers, each configured to support a plurality of substantially vertical, horizontally spaced planar substrates, and each of which can be detachably mounted to the sub-frame by a respective subcarrier mounting device Carrier installation location. When the subcarriers are mounted on the respective subcarrier mounting positions on the support, each of the debris collection plates occupies a debris collection area that extends below the subcarriers installed at the corresponding subcarrier mounting position, spanning at least The area occupied by a subcarrier.

此處所述晶舟在垂直而非水平方向上存儲晶圓,因此降低了加工過程中晶圓碎片的風險。這樣,晶圓就不太會因自身重量而變彎或變形,因此也減輕了晶圓上可能導致其破裂的重力應力。此外,晶圓的垂直定向也促成了具經濟價值的密集晶圓包裝,如在短距離(水平)內排列晶圓。 The wafer boat described here stores wafers in a vertical rather than horizontal direction, thus reducing the risk of wafer shards during processing. In this way, the wafer is less likely to bend or deform due to its own weight, thus also reducing the gravitational stress on the wafer that may cause it to rupture. In addition, the vertical orientation of the wafers also contributes to economically valuable dense wafer packages, such as aligning wafers over short distances (horizontal).

得益於晶圓的垂直定向以及副載波之間存在的碎片收集板,加工過程中因某些晶圓破裂而傷及其他晶圓的風險大大降低。晶圓破碎時,其碎片仍會下落。但由於晶圓呈垂直方向放置,破損晶圓的碎片會掉落在其相鄰的晶圓之間(而非下方晶圓上面),及其相應的副載波下方位置,並且會在碎片到達其下方副載波支承的圓片之前,被碎片收集板及時攔截。為了能最大化收集下落碎片,碎片收集表面至少會延伸至所安裝副載波下方的整個區域,最好還能超過該區域,如超出10釐米左右等。此外,為確保能 攔截所有肉眼可見和不可見的碎片,碎片收集板最好能帶有密閉的或連續的碎片收集表面。此外,為避免所收集到的碎片從碎片收集板上滑落,每塊板最好能與支架上縱向延伸的桿件基本垂直。 Thanks to the vertical orientation of the wafer and the debris collection plate that exists between the subcarriers, the risk of damage to other wafers due to cracking of some wafers during processing is greatly reduced. When the wafer is broken, its debris will still fall. However, because the wafer is placed in a vertical orientation, debris from the damaged wafer will fall between its adjacent wafers (not above the underlying wafer), and its corresponding subcarriers, and will reach the debris Before the disc supported by the subcarrier below, it is intercepted by the debris collection board in time. In order to maximize the collection of falling debris, the debris collection surface extends at least to the entire area below the installed subcarriers, preferably over the area, such as over 10 cm. In addition, to ensure All debris visible and invisible to the naked eye is intercepted, and the debris collection plate preferably has a closed or continuous debris collection surface. In addition, to prevent the collected debris from slipping off the debris collection plate, each panel is preferably substantially perpendicular to the longitudinally extending members of the stent.

副載波的使用也減少了晶圓傳輸操作的次數,該操作會使晶圓與末端執行器頻頻碰觸,以便在不同的垂直式熔爐裝置之間進行晶圓傳輸。這反過來又降低了操作中晶圓碎片的風險。由於晶圓碎片會再次從副載波底部開口掉落,而不會影響相鄰的晶圓,因此任何在副載波載入和卸載過程中破損的晶圓傷及其他晶圓的可能性極小。 The use of subcarriers also reduces the number of wafer transfer operations that cause the wafer to be in contact with the end effector for wafer transfer between different vertical furnace devices. This in turn reduces the risk of wafer fragmentation during operation. Since wafer shards will again fall from the bottom of the subcarrier without affecting adjacent wafers, any wafer that is damaged during subcarrier loading and unloading is less likely to damage other wafers.

下文詳細介紹了本發明的某些具體內容,您可以結合補充圖紙(旨在例證該發明,而非加以限制),更全面地瞭解該發明的上述及其他特徵和優勢。 The above and other features and advantages of the invention are more fully understood from the following detailed description of the invention.

圖1根據本發明,以示意圖形式例證了晶舟封裝的例示性實施例。晶舟封裝1計畫與分批式垂直式熔爐一起使用,顯示為帶有常規基座2支撐,後者由多塊隔熱板4組成。上述晶舟封裝1帶有一個支架10和多個副載波20,後者以可拆卸方式懸停在支架10內。如圖2所示,支架10也帶有基座2支撐,但不含副載波30;圖3A-B中單獨顯示了已載入的副載波20。下文還參照這些圖示,根據本發明用一般術語闡釋了晶舟封裝1的構造。 1 illustrates an exemplary embodiment of a boat assembly in schematic form in accordance with the present invention. The boat boat package 1 program is used with a batch vertical furnace, shown with a conventional base 2 support, the latter consisting of multiple heat shields 4. The boat pack 1 described above has a bracket 10 and a plurality of subcarriers 20 that are removably suspended within the bracket 10. As shown in Figure 2, the bracket 10 is also supported by the base 2, but without the subcarriers 30; the loaded subcarriers 20 are shown separately in Figures 3A-B. Referring now to these illustrations, the construction of the boat package 1 is illustrated in general terms in accordance with the present invention.

尤其請參照圖2。晶舟封裝1的支架10可能包含一個或多個延伸部件,互相平行的延伸桿件12,在使用中通常呈基本垂直方向延伸。所有延伸桿件12的高度或長度相等。圖1所示的支架10實施例包括三根延伸桿件12:兩根位於支架10(副載波20可能會插入支架10內或從中取出)前側的相對的邊桿12a,和一根位於支架10後側的背桿12b。然而,我們預期,支架10的其他實施例可能包括更少或更多延伸桿件12。這是因為在其下端和/或上端,延伸桿件12可能會被相應的底板和/或頂板互連在一起。在圖1的實施例中,延伸桿件12僅通過底板18互連。在本文中,桿件12a在其中被隔開的這一範圍被稱為寬度;而與寬度垂直,背桿12b在其中被移置,且與兩根邊桿12a相關的範圍被稱為深度。下文對副載波20進行特徵描述時,依然會沿用這些有關尺寸範圍的名稱,以便理解。 In particular, please refer to Figure 2. The stent 10 of the boat pack 1 may include one or more extension members, extending parallel to each other, generally extending in a substantially vertical direction in use. All of the extension members 12 are of equal height or length. The stent 10 embodiment shown in Figure 1 includes three extension members 12: two opposing side bars 12a on the front side of the support 10 (the subcarrier 20 may be inserted into or removed from the support 10), and one behind the support 10. Side back bar 12b. However, we anticipate that other embodiments of the stent 10 may include fewer or more extension bars 12. This is because at its lower and/or upper end, the extension bars 12 may be interconnected by respective bottom and/or top plates. In the embodiment of FIG. 1, the extension bars 12 are only interconnected by the bottom plate 18. Herein, the range in which the rod 12a is spaced is referred to as the width; and perpendicular to the width, the back rod 12b is displaced therein, and the range associated with the two side rods 12a is referred to as depth. When the subcarriers 20 are characterized below, these names of the relevant size ranges are still used for understanding.

我們也可能會沿著延伸桿件12的長度,為其提供多個副載波安裝裝置14,從而規定多個隔開的副載波安裝位置16。為方便或便於安裝副載波30,副載波安裝裝置14可能會帶有任何便利的結構特徵,如帶有凹槽、壓痕、凸出、凸起、拉手、夾具、標記等。在圖1的實施例中,副載波安裝裝置14由延伸桿件12上的凹槽形成。每個延伸桿件12都配備有兩個系列裝置14,14’凹槽。標記為14的系列通常與標記為14’的系列相同,只不過是沿著與後者相關的延伸桿件12長度對其系統地進行 替換。14系列凹槽主要配置用於與上述副載波20一起使用,14’系列則主要用於與替代類副載波聯用,後者設計有所不同,圖中未予以顯示。為了更詳細地介紹凹槽14的結構,我們提供了14系列的參考;當然如果略加修改,也適用於14’系列。兩根邊桿12a完全一樣,排列好後,所有凹槽14a剛好兩兩相對。背桿12b也配備了多個有規律隔開的14b凹槽。背桿12b上的每個凹槽14b均與一對14a凹槽相關聯,兩根邊桿12a每根上帶一個14a凹槽,而背桿12b上的凹槽14b已沿著與關聯對或邊桿12a上的14a凹槽相關的背桿12b長度向上被替換。顯然,凹槽14a、b主要用於安置副載波20,下文會詳細闡明。 We may also provide a plurality of subcarrier mounting devices 14 along the length of the extension member 12 to define a plurality of spaced apart subcarrier mounting locations 16. For ease or ease of installation of the subcarriers 30, the subcarrier mounting device 14 may carry any convenient structural features such as grooves, indentations, bulges, bumps, handles, clamps, indicia, and the like. In the embodiment of FIG. 1, subcarrier mounting device 14 is formed by a recess in extension member 12. Each of the extension members 12 is equipped with two series of means 14, 14' recesses. The series labeled 14 is generally the same as the series labeled 14', but is systematically performed along the length of the extension member 12 associated with the latter. replace. The 14 series of grooves are mainly configured for use with the subcarriers 20 described above, and the 14' series is mainly used for use with alternative subcarriers, the latter being designed differently and not shown. To provide a more detailed description of the structure of the recess 14, we provide a reference to the 14 series; of course, if modified slightly, it also applies to the 14' series. The two side bars 12a are identical and, after being arranged, all the grooves 14a are just opposite each other. The back bar 12b is also equipped with a plurality of regularly spaced 14b grooves. Each groove 14b on the back bar 12b is associated with a pair of 14a grooves, each of which has a 14a groove thereon, and the groove 14b on the back bar 12b has been associated with the pair or side The length of the back bar 12b associated with the 14a groove on the rod 12a is replaced upward. It will be apparent that the grooves 14a, b are primarily used to house the subcarriers 20, as will be explained in more detail below.

支架10可能還會進一步包括一塊或多塊碎片收集板20。碎片收集板20會支承性地連接到一根或多根延伸桿件12上,從而向與之垂直的方向延伸。此外,碎片收集板20還可能會連接至延伸桿件12上每兩個相鄰副載波安裝位置16之間的某一方位,並且使得每兩個相鄰副載波安裝位置16被至少一塊碎片收集板20隔開。延伸至相應副載波安裝位置16下方的碎片收集板20被稱為與安裝位置16相關的碎片收集板20。 The stent 10 may also further include one or more debris collection plates 20. The debris collection plate 20 is supportively attached to one or more of the extension members 12 to extend in a direction perpendicular thereto. In addition, the debris collection plate 20 may also be coupled to a certain orientation between each two adjacent subcarrier mounting locations 16 on the extension bar 12 and such that each two adjacent subcarrier mounting locations 16 are collected by at least one piece of debris. The plates 20 are spaced apart. The debris collection plate 20 that extends below the respective subcarrier mounting location 16 is referred to as a debris collection plate 20 associated with the mounting location 16.

原則上說,碎片收集板20可以為任意合適的形狀,如橢圓或多邊形,但我們通常採用方形。關於碎片收集板20的尺寸,特別是碎片收集板20上表面形成碎片收集區22的尺寸,常與副載波30及其容納的平面基底40 的尺寸相關。當副載波30安裝在支架10的副載波安裝位置16內時,與該吸持位置16相關的碎片收集板20會延伸至所安裝的副載波30下方,跨越的面積至少達一處副載波所占的區域面積。在這種情況下,副載波30的“占地面積”指用於描述相應副載波30最大寬度和深度尺寸的地平面(這裏指:相關碎片收集板20所在的平面)投影面積。由於副載波30支承的平面基底40可能會延伸到空副載波30的占地面積以外,如圖1中清晰所示,因此與副載波安裝位置16相關的碎片收集板20很可能會延伸並跨越已載入副載波30的占地區域,也就是說,至少會跨越其支承的相關副載波30和平面基底40占地區域之和。 In principle, the debris collection plate 20 can be of any suitable shape, such as an ellipse or a polygon, but we typically use a square. Regarding the size of the debris collection plate 20, particularly the upper surface of the debris collection plate 20, the size of the debris collection region 22 is formed, often with the subcarrier 30 and the planar substrate 40 it accommodates. The size is related. When the subcarrier 30 is mounted in the subcarrier mounting position 16 of the bracket 10, the debris collection plate 20 associated with the holding position 16 extends below the installed subcarrier 30, spanning at least one subcarrier. The area occupied. In this case, the "footprint" of the subcarrier 30 refers to the projected area of the ground plane (here, the plane in which the associated debris collecting plate 20 is located) for describing the maximum width and depth size of the corresponding subcarrier 30. Since the planar substrate 40 supported by the subcarriers 30 may extend beyond the footprint of the empty subcarriers 30, as clearly shown in FIG. 1, the debris collection plate 20 associated with the subcarrier mounting location 16 is likely to extend and span. The footprint of the subcarrier 30 has been loaded, that is, at least the sum of the associated subcarrier 30 and the planar substrate 40 footprint.

如圖1所示,可以對當前提供的晶舟封裝1進行配置,使之專門適合支承方形平面基底40。為了能在該配置中進行密集垂直晶圓包裝,可將任意兩塊相鄰的碎片收集板20之間的垂直距離d選為略大於方形晶圓邊長(剛好能使副載波30支承多個平面基底40並使之介於其之間,但又不會與碎片收集板20相接觸)。此外,為了能有效地收集碎片,碎片收集板的深度最好能比相鄰的碎片收集板20之間這一垂直距離d略深。也就是說,如果在一個基本垂直的平面上配置了副載波30用於支承平面基底40,該平面沿著與豎直方垂直的第一個方向延伸,那麼在剛提及的第一個方向上測得的該碎片收集板20的深度要比兩塊相鄰的碎片收集板20之間這一垂直距 離d略深。 As shown in FIG. 1, the currently provided boat package 1 can be configured to be specifically adapted to support a square planar substrate 40. In order to be able to perform dense vertical wafer packaging in this configuration, the vertical distance d between any two adjacent debris collection plates 20 can be selected to be slightly larger than the square wafer side length (just enabling the subcarrier 30 to support multiple The planar substrate 40 is placed between it but not in contact with the debris collection plate 20). Furthermore, in order to efficiently collect debris, the depth of the debris collection plate is preferably slightly deeper than the vertical distance d between adjacent debris collection plates 20. That is, if subcarrier 30 is disposed on a substantially vertical plane for supporting planar substrate 40, the plane extends in a first direction perpendicular to the vertical, then in the first direction just mentioned The depth of the debris collection plate 20 measured above is slightly deeper than the vertical distance d between the two adjacent debris collection plates 20.

現在,重點來看圖形3A-B,它舉例說明載入了垂直方向、水平隔開的平面基底40的副載波30。副載波30包括兩塊方向平行、但被隔開的側板32。兩塊側板32完全一樣,面對面,且尺寸通常比副載波30所支承的平面基底40尺寸小。側板32通常會被一些相互平行的支承桿件34、36互連在一起,後者規定了供平面基底40安置/倚靠的底部支承桿件34和背部支承桿件36。支承桿件34、36的數目和尺寸最好應符合下列要求,即副載波30的底部和背部均大體敞開。這樣,破碎晶圓的碎片就就會從副載波30下落,並有利於工藝氣體通過副載波30和平面基底40進行迴圈。支承桿件34、36上可能會帶有等距離隔開的缺口(圖中未顯示),用於規定副載波30的晶圓吸持位置。側板32中至少有一塊帶有一件或以上副載波安置裝置38,後者配置用於與支架10內的副載波安裝裝置14一起使用。在上述晶舟封裝1的實施例中,支架10的副載波安裝裝置14由凹槽14a、14b限定,側板32上的副載波安置裝置38可能會帶有一個向外突出的部分,其尺寸剛好適合上述邊桿12a上的凹槽14a中的一個。當然若反之,支架10的副載波安裝裝置14a被一個或多個突出部分限制,那麼支架側板上的副載波安置裝置38便可能會由相應的用於容納上述一個或多個突出部分的凹槽所限定。 Now, focusing on Figure 3A-B, it illustrates a subcarrier 30 loaded with a vertically spaced, horizontally spaced planar substrate 40. The subcarrier 30 includes two side plates 32 that are parallel in direction but are spaced apart. The two side panels 32 are identical, face to face, and are typically sized smaller than the planar base 40 supported by the subcarriers 30. The side panels 32 are typically interconnected by a plurality of mutually parallel support bars 34, 36 which define a bottom support bar member 34 and a back support bar member 36 for the planar base 40 to be placed/received. Preferably, the number and size of the support members 34, 36 are such that the bottom and back of the subcarrier 30 are generally open. Thus, the fragments of the broken wafer will fall from the subcarrier 30 and facilitate the looping of the process gas through the subcarrier 30 and the planar substrate 40. The support bars 34, 36 may have equally spaced gaps (not shown) for defining the wafer holding position of the subcarriers 30. At least one of the side panels 32 carries one or more subcarrier placement devices 38 that are configured for use with the subcarrier mounting device 14 within the bracket 10. In the above embodiment of the boat pack 1, the subcarrier mounting device 14 of the bracket 10 is defined by the recesses 14a, 14b, and the subcarrier placement means 38 on the side panel 32 may have an outwardly projecting portion of the size just right. One of the grooves 14a on the side bar 12a described above is suitable. Of course, if the vice-carrier mounting device 14a of the bracket 10 is limited by one or more protruding portions, the sub-carrier placement device 38 on the bracket side panel may be correspondingly recessed for receiving the one or more protruding portions. Limited.

如圖1所示,載入了平面基底40的副載波30可 能會懸停在支架10的副載波安裝位置16處。其背部晶圓支承桿件36可能會卡在背桿12b的凹槽14b上,同時邊板32上的突起部分38會滑進對應邊桿12a的凹槽14a內,以免環繞支承桿件36的副載波30發生傾斜。一旦停留在支架10內,任何由副載波30支撐著的平面基底40破碎碎片都會從副載波掉落,並被其下方延伸出的碎片收集板20接住,從而避免了下方副載波30支撐的平面基底40遭到損壞。 As shown in FIG. 1, the subcarrier 30 loaded with the planar substrate 40 can be It can hover at the subcarrier mounting position 16 of the bracket 10. The back wafer support bar member 36 may be caught on the recess 14b of the back bar 12b, and the protruding portion 38 on the side plate 32 may slide into the recess 14a of the corresponding side bar 12a so as not to surround the support bar member 36. The subcarrier 30 is tilted. Once in the cradle 10, any broken fragments of the planar substrate 40 supported by the subcarriers 30 will fall from the subcarriers and be caught by the debris collection plate 20 extending below it, thereby avoiding the support of the lower subcarrier 30. The planar substrate 40 is damaged.

雖然上文介紹了本發明的說明性實施例,部分還有關相關圖紙,但本發明顯然並不僅限於這些實施例。因此,任何與上述實施例有差異的情況均屬正常,後者也可能受某些精於實踐操作(上述)申請專利的發明、學習圖紙、實施例及附加專利申請人的影響而發生變動。在本規範全文中,當有關“一個實施例”或“某個實施例”時,指的是與該實施例相關的某一特點、結構或特性出現於本發明的一個或多個實施例中。因此,在本規範全文中,當出現“一個實施例”或“某個實施例”這一術語時,並不一定指同一個實施例。此外,請注意,可以以任何恰當方式將一個或多個實施例的特定特點、結構或特性相結合,從而形成新的、未明確介紹的實施例。 While the illustrative embodiments of the invention have been described above, and in part related to the drawings, the invention is obviously not limited to the embodiments. Therefore, any difference from the above embodiments is normal, and the latter may also be subject to change due to the influence of some inventions, study drawings, examples, and additional patent applicants who are skilled in the practice (above). Throughout the specification, when referring to "an embodiment" or "an embodiment", it is meant that a feature, structure, or characteristic relating to the embodiment is present in one or more embodiments of the invention. . Therefore, the term "one embodiment" or "an embodiment" when used in the specification does not necessarily refer to the same embodiment. In addition, it is noted that the specific features, structures, or characteristics of one or more embodiments may be combined in any suitable manner to form new, non-expressed embodiments.

1‧‧‧晶舟封裝 1‧‧‧Crystal package

2‧‧‧基座 2‧‧‧Base

4‧‧‧隔熱板 4‧‧‧ Thermal insulation board

10‧‧‧支架 10‧‧‧ bracket

12‧‧‧延伸桿件 12‧‧‧Extension rods

12a、b‧‧‧邊桿(a)和背桿(b) 12a, b‧‧‧ side bars (a) and back bars (b)

14‧‧‧副載波安裝裝置 14‧‧‧Subcarrier mounting device

14a、b‧‧‧第一組副載波安裝裝置邊桿(a)和背桿(b)上的凹槽 14a, b‧‧‧First set of subcarrier mounting device grooves on the side bars (a) and back bars (b)

14a’、b’‧‧‧第二組副載波安裝裝置邊桿(a)和背桿(b)上的凹槽 14a’, b’‧‧‧ The second set of subcarrier mounting devices on the side bars (a) and the grooves on the back bar (b)

16‧‧‧副載波安裝位置 16‧‧‧Subcarrier installation location

18‧‧‧底板 18‧‧‧floor

20‧‧‧碎片收集板 20‧‧‧Shard collection board

22‧‧‧碎片收集區 22‧‧‧Shard collection area

30‧‧‧副載波 30‧‧‧Subcarrier

32‧‧‧側板 32‧‧‧ side panels

34‧‧‧底部晶圓支承桿件 34‧‧‧Bottom wafer support rod

36‧‧‧背部晶圓支承桿件 36‧‧‧Back wafer support rods

38‧‧‧副載波安裝裝置突起部位/向外突起部分 38‧‧‧Subcarrier mounting device protrusion/outward protrusion

40‧‧‧平面基底 40‧‧‧Flat base

d‧‧‧碎片收集板之間的垂直距離 d‧‧‧Vertical distance between debris collection plates

圖1是根據本發明繪製的晶舟封裝例示性實施例的透視圖,包括一個可垂直分開排列並懸放多個副載波的支 架;圖2是圖1中所示的晶舟封裝支架的透視圖;圖3A是圖1中所示的晶舟封裝已載入副載波透視前視圖;圖3B是圖3A中所示的已載入副載波透視後視圖。 1 is a perspective view of an exemplary embodiment of a boat assembly depicted in accordance with the present invention, including a branch that can vertically align and suspend a plurality of subcarriers Figure 2 is a perspective view of the boat-mounted package shown in Figure 1; Figure 3A is a perspective view of the wafer carrier package shown in Figure 1 loaded into the sub-carrier; Figure 3B is the view shown in Figure 3A Load the subcarrier perspective back view.

1‧‧‧晶舟封裝 1‧‧‧Crystal package

2‧‧‧基座 2‧‧‧Base

4‧‧‧隔熱板 4‧‧‧ Thermal insulation board

10‧‧‧支架 10‧‧‧ bracket

20‧‧‧碎片收集板 20‧‧‧Shard collection board

30‧‧‧副載波 30‧‧‧Subcarrier

40‧‧‧平面基底 40‧‧‧Flat base

Claims (6)

一種晶舟封裝(1),包括:支架(10),包括:至少一根基本垂直的延伸桿件(12),該延伸桿件長度的多個隔開位置界定了多個副載波安裝位置(16),每個位置都提供了至少一個副載波安裝裝置(14);一塊或多塊碎片收集板(20),與前述一根或多根延伸桿件(12)相連,兩者基本垂直,且每兩個相鄰的副載波安裝位置(16)之間都會帶有一塊碎片收集板(20);多個副載波(30),每個被配置以支撐多個基本垂直、水平隔開的平面基底(40),且每個都可以通過各自的副載波安裝裝置(14),以可拆卸方式安裝在支架(10)的副載波安裝位置(16);在每一塊碎片收集板(20)上,當副載波(30)被安裝在支架(10)上相應的副載波安裝位置(16)上時,每塊碎片收集板都佔據了一個碎片收集區(22),後者延伸到了相應副載波安裝位置(16)所安裝的副載波(30)下方,跨越的面積至少達一處副載波所占的區域面積,且其中每一塊碎片收集板(20)上的前述碎片收集區域(22)為密閉區域,以確保能攔截肉眼可見和肉眼不可見的碎片。 A wafer boat package (1) comprising: a bracket (10) comprising: at least one substantially vertical extending rod member (12), the plurality of spaced apart positions of the length of the extending rod member defining a plurality of subcarrier mounting positions ( 16) each position provides at least one subcarrier mounting device (14); one or more debris collection plates (20) connected to one or more of the aforementioned extension members (12), the two being substantially vertical, And each of the two adjacent subcarrier mounting locations (16) carries a debris collection plate (20); a plurality of subcarriers (30), each configured to support a plurality of substantially vertical, horizontally spaced Planar substrates (40), and each of which can be detachably mounted to the subcarrier mounting location (16) of the bracket (10) by a respective subcarrier mounting device (14); at each debris collection plate (20) Above, when the subcarriers (30) are mounted on the corresponding subcarrier mounting locations (16) on the bracket (10), each of the debris collection plates occupies a debris collection area (22) that extends to the corresponding subcarriers. Below the subcarrier (30) installed in the installation location (16), the area spanned is at least one area occupied by subcarriers. Product, and wherein each of the fragments on a fragment collecting plate (20) collection area (22) is enclosed area, to ensure that debris can intercept the visible and invisible to the eye. 如申請專利範圍第1項所述的晶舟封裝(1),碎片收集板(20)的深度等於或略大於相鄰碎片收集板之間的垂直距離(d)。 The depth of the debris collection plate (20) is equal to or slightly greater than the vertical distance ( d ) between adjacent debris collection plates, as in the wafer boat package (1) of claim 1. 如申請專利範圍第1項所述的晶舟封裝,每塊碎片 收集板通常呈方形。 Such as the wafer boat package described in claim 1 of the patent scope, each piece The collection plate is usually square. 如申請專利範圍第1項所述的晶舟封裝,其中每個副載波(30)包含兩塊隔開的側板(32),後者通常會被一些相互平行的晶圓支承桿件(34,36)互連在一起。 The wafer boat package of claim 1, wherein each subcarrier (30) comprises two spaced apart side plates (32) which are typically supported by a plurality of mutually parallel wafer support members (34, 36). ) Interconnected. 如申請專利範圍第1項所述的晶舟封裝,其中支架(10)上的一個副載波安裝裝置(14)具有下列結構特點之一:一根或多根桿件(12)上帶有凹槽,同時一根或多根桿件(12)上帶有突起部位;每個副載波(30)上帶有上述凹槽和突起部位的對應結構,與前述副載波安裝裝置(14)共同發揮支承作用。 The wafer boat package of claim 1, wherein a subcarrier mounting device (14) on the bracket (10) has one of the following structural features: one or more of the bars (12) are concave a slot having one or more bars (12) with protrusions thereon; each subcarrier (30) having a corresponding structure of the grooves and protrusions described above, and the subcarrier mounting device (14) Supporting effect. 如申請專利範圍第1項所述的晶舟封裝,其中每個副載波(30)均支撐著多個基本垂直、水平隔開的平面基底(40),其中,每個副載波(30)均以可拆卸方式安裝在支架(10)的副載波安裝位置(16)上,並且其中,每塊碎片收集板(20)至少會跨越其支承的相關副載波和基底的占地區域之和。 The wafer boat package of claim 1, wherein each subcarrier (30) supports a plurality of substantially vertical, horizontally spaced planar substrates (40), wherein each subcarrier (30) Removably mounted on the subcarrier mounting location (16) of the bracket (10), and wherein each debris collection plate (20) spans at least the sum of the associated subcarriers supported by it and the footprint of the substrate.
TW101130077A 2011-08-22 2012-08-20 Wafer boat assembly TWI613133B (en)

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TW101130077A TWI613133B (en) 2011-08-22 2012-08-20 Wafer boat assembly

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0590392A (en) * 1991-09-25 1993-04-09 Sony Corp Wafer boat for vertical diffusion furnace
US5219079A (en) * 1991-10-11 1993-06-15 Rohm Co., Ltd. Wafer jig
TW320342U (en) * 1997-06-20 1997-11-11 Winbond Electronics Corp Reinforced type quartz wafer
JP2001358085A (en) * 2000-06-12 2001-12-26 Hitachi Kokusai Electric Inc Semiconductor manufacturing device
TWM311113U (en) * 2006-11-10 2007-05-01 Puu Feng Corp Quartz crystal boat
CN201148275Y (en) * 2007-12-19 2008-11-12 可士达科技有限公司 Wafer rack

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0590392A (en) * 1991-09-25 1993-04-09 Sony Corp Wafer boat for vertical diffusion furnace
US5219079A (en) * 1991-10-11 1993-06-15 Rohm Co., Ltd. Wafer jig
TW320342U (en) * 1997-06-20 1997-11-11 Winbond Electronics Corp Reinforced type quartz wafer
JP2001358085A (en) * 2000-06-12 2001-12-26 Hitachi Kokusai Electric Inc Semiconductor manufacturing device
TWM311113U (en) * 2006-11-10 2007-05-01 Puu Feng Corp Quartz crystal boat
CN201148275Y (en) * 2007-12-19 2008-11-12 可士达科技有限公司 Wafer rack

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